Method and device with dual exhaust plenum

Abstract

To provide the invention related to a method and a device comprising a dual exhaust plenum.SOLUTION: Various embodiments of the present technology may provide a device having two separate exhaust plenums. The device may include an upper part having at least one inlet and a first exhaust plenum and a second exhaust plenum. The device may further include a bottom portion having a plurality of first exhaust through-holes coupled to the first exhaust plenum and a plurality of second exhaust through-holes coupled to the second exhaust plenum.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates generally to methods and apparatus with dual exhaust plenums. More particularly, the present disclosure relates to showerheads having two separate exhaust paths. [Background technology]

[0002] Reaction chambers used in semiconductor manufacturing typically utilize an exhaust system to remove unused precursors and co-reactants from the reaction space. In conventional systems, a single exhaust plenum and exhaust line are used to remove unused precursors and co-reactants. Summary of the Invention

[0003] Various embodiments of the present technology may provide an apparatus having two separate exhaust plenums. The apparatus may include an upper portion having at least one inlet and a first exhaust plenum and a second exhaust plenum. The apparatus may further include a bottom portion having a plurality of first exhaust through-holes connected to the first exhaust plenum and a plurality of second exhaust through-holes connected to the second exhaust plenum.

[0004] According to one aspect, the apparatus includes: an upper portion comprising an inlet plenum, a first exhaust plenum, and a second exhaust plenum; and a bottom portion coupled to the upper portion, the bottom portion comprising a showerhead region comprising a first surface and an opposing second surface and a plurality of inlet through-holes extending between the first surface and the second surface, a plurality of first exhaust through-holes fluidly coupled to the first exhaust plenum, and a plurality of second exhaust through-holes fluidly coupled to the second exhaust plenum.

[0005] In one embodiment, the first and second exhaust plenums are disposed concentrically with the inlet plenum, and the first exhaust plenum is separated from the second exhaust plenum.

[0006] In one embodiment, the first exhaust plenum has a first volume and the second exhaust plenum has a second volume that is greater than the first volume.

[0007] In one embodiment, the apparatus further comprises a sealing mechanism disposed in the second exhaust plenum and configured to separate the second exhaust plenum from the reaction space, the sealing mechanism comprising a ring and an actuator coupled to the ring.

[0008] In one embodiment, the apparatus further includes a first exhaust line coupled to the first exhaust plenum and extending outward from the first portion, and a second exhaust line coupled to the second exhaust plenum and extending outward from the second portion.

[0009] In one embodiment, the first exhaust plenum has a first volume, the second exhaust plenum has a second volume substantially equal to the first volume, the first exhaust through-hole has a first diameter, and the second exhaust through-hole has a second diameter substantially equal to the first diameter.

[0010] In one embodiment, the apparatus further comprises a first isolation valve coupled to the first exhaust plenum and a second valve coupled to the second exhaust plenum.

[0011] In one embodiment, the apparatus further comprises a first pump connected downstream from the first isolation valve and a second pump connected downstream from the second isolation valve.

[0012] In one embodiment, the first exhaust through-hole has a first diameter and the second exhaust through-hole has a second diameter that is greater than the first diameter.

[0013] In one embodiment, the first and second exhaust through-holes are disposed radially outward from the showerhead region.

[0014] In one embodiment, each exhaust through-hole from the first plurality of exhaust holes converges with a respective exhaust through-hole from the second plurality of exhaust through-holes in the second surface of the showerhead plate.

[0015] In one embodiment, the second exhaust through-holes are oriented vertically and the first exhaust through-holes are angled relative to the second exhaust through-holes.

[0016] In another aspect, the apparatus includes: an upper portion, the upper portion including an inlet plenum, a first exhaust plenum, and a second exhaust plenum, the first exhaust plenum having a first volume and the second exhaust plenum having a second volume greater than the first volume; a bottom portion, the bottom portion including a showerhead plate coupled to the upper portion, the showerhead plate having a first surface and an opposing second surface; a showerhead region including a plurality of through-holes extending between the first surface and the second surface; a plurality of first exhaust through-holes fluidly coupled to the first exhaust plenum; a plurality of second exhaust through-holes fluidly coupled to the second exhaust plenum;

[0017] In one embodiment, the apparatus further comprises a sealing mechanism disposed within the second exhaust plenum and configured to separate the second exhaust plenum from the reaction space.

[0018] In one embodiment, each exhaust through hole from the plurality of first exhaust holes merges with a respective exhaust through hole from a plurality of second exhaust through holes in the second surface of the showerhead plate, the second exhaust through holes being oriented vertically and the first exhaust through holes being angled relative to the second exhaust through holes.

[0019] In yet another aspect, the apparatus comprises: an upper portion comprising: an inlet plenum, a first exhaust plenum, and a second exhaust plenum; a bottom portion coupled to the upper portion; a showerhead plate comprising a first surface and an opposing second surface; a showerhead region comprising a plurality of through-holes extending between the first surface and the second surface; a plurality of first exhaust through-holes fluidly coupled to the first exhaust plenum; a plurality of second exhaust through-holes fluidly coupled to the second exhaust plenum, wherein each exhaust through-hole from the plurality of first exhaust through-holes merges with a respective exhaust through-hole from the plurality of second exhaust through-holes in the second surface of the showerhead plate; and a sealing mechanism disposed within the second exhaust plenum and configured to separate the second exhaust plenum from the reaction space.

[0020] In one embodiment, the first and second exhaust plenums are disposed concentrically with the inlet plenum, and the first exhaust plenum is separated from the second exhaust plenum.

[0021] In one embodiment, the sealing mechanism comprises a ring-shaped plug formed from a metallic or ceramic material.

[0022] In one embodiment, the apparatus further comprises a pressure sensor for measuring the pressure in the reaction space, and an actuator coupled to the sealing mechanism and configured to actuate the sealing mechanism based on data from the pressure sensor.

[0023] In one embodiment, the first exhaust through-hole has a first diameter and the second exhaust through-hole has a second diameter, the first diameter being 20-25% of the second diameter.

[0024] The present technology may be more fully understood by reference to the detailed description in light of the following illustrative drawings, in which like elements and steps are designated with like reference numerals throughout. [Brief explanation of the drawings]

[0025] [Figure 1] FIG. 1 is a diagram illustrating an exemplary system according to some embodiments of the present technology. [Figure 2] FIG. 2 is a cross-sectional view of a reactor according to some embodiments of the present technology. [Figure 3] FIG. 3 is a top view of a gas channel plate in accordance with some embodiments of the present technology. [Figure 4] FIG. 4 is a top view of a gas channel plate in accordance with some embodiments of the present technology. [Figure 5] FIG. 5 shows a top view of a showerhead plate in accordance with embodiments of the present technique. [Figure 6] FIG. 6 is a top view of a showerhead plate in accordance with some embodiments of the present technique. [Figure 7] FIG. 7 is a block diagram of an exhaust system in accordance with one embodiment of the present technology. [Figure 8] FIG. 8 is a block diagram of an alternative exhaust system in accordance with an embodiment of the present technology. [Figure 9] FIG. 9 is a cross-sectional view of a portion of a system in accordance with some embodiments of the present technology. DETAILED DESCRIPTION OF THE INVENTION

[0026] The present technology may be described in terms of functional block components and various processing steps. These functional blocks may be realized by any number of components configured to perform the specified functions and achieve various results. For example, the present technology may employ various gas lines, valves, controllers, reaction chambers, vessels, susceptors, and temperature sensors.

[0027] 1 , an exemplary system 100 may include a reactor 105 configured to perform a process on an object to be processed, such as a substrate 150 (e.g., a wafer). For example, the reactor 105 may be configured to perform heating, deposition, etching, polishing, ion implantation, and / or other processes on the object to be processed. In some embodiments, the reactor 105 may be configured to perform transfer, vacuum sealing, and evacuation functions. In some embodiments, the reactor 105 may be configured to perform atomic layer deposition (ALD) or chemical vapor deposition (CVD) processes.

[0028] In an exemplary embodiment, the reactor 105 may comprise a reaction chamber 115 comprising a reaction space 155 above and / or around the substrate 150. For example, the reaction chamber 115 may comprise a sidewall and a bottom coupled to the sidewall.

[0029] The system 100 may further include a pressure sensor 130 configured to measure the pressure within the reaction chamber 115, and in particular to measure the pressure within the reaction space 155. For example, the pressure sensor 130 may be located within or near the reaction space 155. The pressure sensor 130 may include any suitable pressure sensor, such as a pressure transducer, that measures pressure and converts the measured pressure into an electrical signal.

[0030] In various embodiments, the system 100 may further include a substrate mounting unit disposed within the reaction chamber 115 of the reactor 105. The substrate mounting unit may include a susceptor 145 for supporting the substrate 150 and a heater (not shown) for heating the substrate 150 supported by the susceptor 145. The heater may be embedded within the susceptor 145. The substrate mounting unit may further include a pedestal for supporting the susceptor 145. For loading and unloading of the substrate, the substrate mounting unit may be connected to a drive unit (not shown) so as to be movable vertically (up and down). The susceptor 145 may be disposed within or adjacent to the reaction space 155. For example, the susceptor 145 may be disposed to position the substrate 150 within the reaction space 155.

[0031] In various embodiments, and referring again to FIGS. 1 and 2 , the reactor 105 may further include a gas distribution system 110 for delivering vapor into the reaction chamber 115. In an exemplary embodiment, the gas distribution system 110 is disposed above the susceptor 145. The gas distribution system 110 may include a top portion 120 (i.e., a gas channel plate) and a bottom portion 125 (i.e., a showerhead plate). The top portion 120 and the bottom portion 125 may be in direct contact with each other. For example, the top portion 120 may include a first surface 250 and an opposite, parallel second surface 255, and the bottom portion 125 may include a first surface and an opposite, parallel second surface 260. A surface of the top portion 120 (e.g., second surface 255) may be in direct contact with a surface of the bottom portion 125 (e.g., first surface 262). In some embodiments, the first portion 120 and the second portion 125 may be coupled together with fasteners, such as screws.

[0032] In various embodiments, the gas distribution system 110 may be disposed adjacent to the reaction chamber 115. For example, the gas distribution system 110 may be located on a sidewall of the reaction chamber 115 opposite the bottom of the reaction chamber 115. In some embodiments, the gas distribution system 110 may be fixed to the sidewall, while in other cases, the gas distribution system 110 may simply rest on the sidewall of the reaction chamber 115. In various embodiments, the gas distribution system 110, together with the sidewall of the reaction chamber 115, forms an enclosed space that includes the reaction space 155.

[0033] In various embodiments, upper portion 120 may further include a first exhaust plenum 205 and a second exhaust plenum 210. First exhaust plenum 205 may be separate from second exhaust plenum 210. In an exemplary embodiment, first exhaust plenum has a first volume and second exhaust plenum has a second volume that is larger than the first volume.

[0034] In an alternative embodiment, the first and second exhaust plenums have approximately (+ / - 5%) the same volume.

[0035] The first exhaust plenum 205 may include an inlet at the second surface 255 and an outlet 270 at the first surface 250. The second exhaust plenum 210 may include an inlet at the second surface 255 and an outlet 275 at the first surface 250. The outlets 270, 275 may be coupled to the exhaust system 140. For example, gas may flow from the plenums 205, 210 through the respective outlets into the exhaust system 140.

[0036] 1, 2, and 7-8, exhaust system 140 may include a foreline and a pump (e.g., a vacuum pump). In some embodiments, exhaust system 140 may include a single pump 800 coupled to both plenum outlets 270, 275 via a single foreline (e.g., as shown in FIG. 8).

[0037] In other embodiments, each plenum outlet 270, 275 may be connected to a dedicated foreline and pump. For example, referring to FIG. 7 , the outlet 270 of the first exhaust plenum 205 may be connected to a first pump 700 and a first foreline 710, and the outlet 275 of the second exhaust plenum 210 may be connected to a second pump 705 and a second foreline 715. The first pump 700 and the second pump 705 and their respective forelines 710, 715 may be physically separated from one another. In this case, each foreline 710, 715 is exhausted to atmosphere.

[0038] In various embodiments, the first and second exhaust plenums 205, 210 may be disposed concentrically with the inlet plenum. For example, the first exhaust plenum 205 may have a ring shape that surrounds the inlet plenum 200 and has a first diameter larger than the inlet plenum 200, and the second exhaust plenum 205 may have a ring shape that surrounds the first diameter of the first exhaust plenum 205 and has a second diameter larger than the first diameter of the first exhaust plenum 205. Alternatively, the first exhaust plenum 205 (i.e., the plenum having a smaller volume) may be disposed outside of and surround the second exhaust plenum 210 (i.e., the plenum having a larger volume).

[0039] In an exemplary embodiment, the second exhaust plenum 210 (i.e., the larger volume plenum) may include a funnel-shaped region with inwardly angled sidewalls, with a larger diameter portion of the funnel-shaped region above a smaller diameter region.

[0040] In various embodiments, the upper portion 120 may be formed as a single unit. In other embodiments, the upper portion 120 may be formed from multiple sections. For example, a first section may include the inlet plenum 200, and a second section may include first and second exhaust plenums. A gap 265 may separate the first section from the second section.

[0041] In various embodiments, system 100 may further include a vessel 135 configured to contain a chemical (i.e., a precursor). Vessel 135 may be configured to hold a solid or liquid chemical and may further be configured to convert the solid or liquid to a vapor. Vessel 135 may be coupled to gas distribution system 110. For example, system 100 may further include various gas conduits and / or valves for flowing the vapor from vessel 135 into gas distribution system 110.

[0042] In various embodiments, and with reference to FIGS. 2-6 , the top portion 120 of the gas distribution system 110 may include an inlet plenum 200 configured to receive vapor from the vessel 135. Additionally, the bottom portion 125 may include a plurality of inlet through-holes 230 extending through the first surface 262 and the second surface 260. The plurality of inlet through-holes 230 may include approximately 1000 to 1200 through-holes. The plurality of inlet through-holes 230 may be disposed in a central region 280 (also referred to as a showerhead region) of the bottom portion 125. The inlet plenum 200 may be in fluid communication with the plurality of inlet through-holes 230. For example, vapor flowing from the vessel 135 into the inlet plenum 200 may continue to flow through the plurality of through-holes 230. The plurality of inlet through-holes 230 may be in fluid communication with the reaction space 155. For example, vapor may flow into the reaction space 155 through the plurality of inlet through-holes 230.

[0043] Additionally, the bottom portion 125 of the gas distribution system 110 may further include a plurality of first exhaust through-holes 240 (e.g., 20-100 holes, particularly 65-80 holes) fluidly connected to the first exhaust plenum 205 and a plurality of second exhaust through-holes 245 (e.g., 20-100 holes, particularly 65-80 holes) fluidly connected to the second exhaust plenum 210.

[0044] In various embodiments, the number of first exhaust holes 240 is equal to the number of second exhaust holes 245. However, in other embodiments, the number of first exhaust holes 240 is less than the number of second exhaust holes 245.

[0045] Furthermore, each first exhaust through-hole 240 may have a first diameter, and each second exhaust through-hole 245 may have a second diameter larger than the first diameter. For example, the diameter of first exhaust hole 240 may be 20 to 25% of the diameter of second exhaust hole 245. For example, second exhaust hole 245 may be 4 to 5 mm, and first exhaust hole 240 may be approximately 1 mm.

[0046] In an alternative embodiment, the diameters of the first exhaust through-hole 240 and the second exhaust through-hole 245 may be substantially the same (eg, + / - 5%).

[0047] Each of the plurality of first exhaust through-holes 240 may have a first opening in a first surface 255 of the bottom portion 125 of the gas distribution system 110. The first openings of the plurality of first exhaust through-holes 240 may be arranged in a ring pattern (e.g., as shown in FIGS. 5 and 6 ). Furthermore, the first openings of the plurality of first exhaust through-holes 240 may be positioned to be in fluid communication with the first exhaust plenum 205. In particular, the first openings of the plurality of first exhaust through-holes 240 may be aligned with the inlet of the first exhaust plenum 205. In the exemplary embodiment, the first exhaust through-holes 240 and the first exhaust plenum 205 always allow gas to flow therethrough into the exhaust system 140. In other words, there are no features within the first exhaust through-holes 240 and the first exhaust plenum 205 that would completely block the flow of gas.

[0048] Additionally, first openings of the plurality of first exhaust through-holes 240 may be disposed radially outward from the plurality of inlet through-holes 230. Each of the first exhaust through-holes 240 may have a second opening that fluidly connects the through-hole to a through-hole from the plurality of second through-holes 245. In other words, each first exhaust through-hole 240 may merge with or otherwise join a respective second exhaust through-hole 245.

[0049] The plurality of second exhaust through-holes 245 may have a first opening in the first surface 255 of the bottom portion 125 and a second opening adjacent to the reaction space 155. For example, the second opening may be disposed outside the central region 280. Furthermore, the first opening of the second exhaust through-hole 245 may be concentric with the first exhaust through-hole 240 (e.g., as illustrated in FIGS. 5 and 6 ). Furthermore, the first opening of the plurality of second exhaust through-holes 245 may be positioned to be in fluid communication with the second exhaust plenum 210. In particular, the first opening of the plurality of second exhaust through-holes 245 may be aligned with an inlet of the second exhaust plenum 210.

[0050] In an exemplary embodiment, each second exhaust through-hole 245 may be vertically oriented within bottom portion 125. Additionally, each of first exhaust through-holes 240 may be angled relative to a respective second exhaust through-hole 245. For example, first exhaust through-holes 240 may have an angle in the range of 20 degrees to 60 degrees, such as 45 degrees. In other words, when viewed along a cross-section, first exhaust through-hole 240 and second exhaust through-hole 245 may form a branching shape, with first exhaust through-hole 240 extending (i.e., branching) from second exhaust through-hole 245 (e.g., as shown in FIG. 2).

[0051] In an alternative embodiment, referring to FIG. 9, a plurality of first through-holes may connect the second exhaust plenum 210 to the first exhaust plenum 205 .

[0052] In some cases, referring to FIG. 6, when there are fewer than 240 second exhaust through-holes, some of the second exhaust through-holes 245 may not branch and may contain only one flow path from the reaction space 155 to the second plenum 210.

[0053] In various embodiments, system 100 may further include a sealing mechanism configured to seal or otherwise block gas flow in at least one of the first and second plenums from reaction space 155. In an exemplary embodiment, the sealing mechanism may include a ring-shaped plug 235 disposed within the larger volume exhaust plenum (e.g., second exhaust plenum 210). Plug 235 may have a configuration having substantially the same diameter as second exhaust plenum 210. Plug 235 may be formed from a metal / metal material, such as elemental aluminum, a ceramic material (e.g., aluminum oxide), quartz, sapphire, or any other suitable material capable of providing a seal and capable of withstanding high temperatures (e.g., 150°C to 500°C).

[0054] In the exemplary embodiment, the sealing mechanism may further include an actuator 220 coupled to the plug 235 and configured to actuate the plug 235 (i.e., move it up and down). The actuator 220 may comprise any device or system suitable for generating mechanical movement, such as a stepper motor or the like. In the exemplary embodiment, the sealing mechanism includes multiple actuators, such as a first actuator 220(a), a second actuator 220(b), and a third actuator 220(c). The actuators 220(a), 220(b), and 220(c) may be attached to the plug 235 at equal distances from one another, for example, every 120 degrees. In the down position, as shown in FIG. 2 , the plug 235 may be configured to seal off flow from the plurality of second exhaust through-holes 245 to the second exhaust plenum 210. For example, the plug 235 may rest on and directly contact the angled sidewall of the second plenum 210. In contrast, in the up position, the plug 235 may allow flow to the second exhaust plenum 210 .

[0055] In the exemplary embodiment, the sealing mechanism may further include a bellows 215 disposed inside the second exhaust plenum 210. The bellows 215 may couple the actuator 220 to the plug 235 and facilitate movement of the plug 235. For example, the actuator 220 may move the bellows 215 to expand or contract. The expansion or contraction of the bellows 215 pushes or pulls the plug 235 to a lower or upper position, respectively.

[0056] In various embodiments, system 100 may further include a first valve 290 coupled to outlet 270 of first exhaust plenum 205, particularly coupled between exhaust system 140 and first exhaust plenum 205. First valve 290 may include any suitable valve, such as an isolation valve.

[0057] The system 100 may further include a second valve 225 coupled to the outlet 275 of the second exhaust plenum 210, particularly coupled between the exhaust system 140 and the second exhaust plenum 210. The second valve 225 may include a fast-acting isolation valve.

[0058] In exemplary embodiments, either a sealing mechanism or second valve 225 is utilized to block flow through second exhaust plenum 210. For example, in one embodiment, only second valve 225 is utilized without a sealing mechanism, or vice versa.

[0059] In various embodiments, and with reference to FIG. 4 , the system 100 may further include a controller 400 configured to control the operation of various components within the system, such as the first valve 290 and the second valve 225 and the actuators 220(a), 220(b), and 220(c). For example, the controller 400 may be electrically and / or variably coupled to the first valve 290 and the second valve 225 and the actuators 220(a), 220(b), and 220(c) and may send control signals to each indicating an operating mode. For example, a first control signal may open or close the second valve 225, and a second control signal may induce movement of the actuator. In some cases, the controller 400 may operate the actuator 220 and the plug 235 according to a predetermined pulse and purge cycle.

[0060] The controller 400 may also receive information, data, or signals from other components, such as the pressure sensor 130, and the controller 400 may operate the actuators 220(a), 220(b), and 220(c) based on the measured pressure from the pressure sensor 130. For example, the controller 400 may receive the measured pressure from the pressure sensor 130 and determine whether the measured pressure is at a desired pressure or within a desired pressure range. If the measured pressure is not at a desired pressure or within a desired pressure range, the controller 400 may send a signal to the actuator 220 to move it up or down. Moving the actuator 220 to move the plug 235 to an upward position decreases the pressure in the reaction space 155, while moving the actuator to move the plug 235 to a downward position increases the pressure in the reaction space 155.

[0061] In some embodiments, it is desirable to maintain a controllable outflow, in which case the first exhaust plenum 205 may be smaller than the second exhaust plenum 210, and the first plurality of through-holes 240 may be smaller in diameter than the second plurality of through-holes 245. Additionally, the exhaust system 140 may be configured as shown in FIG. 8 using a single pump 800.

[0062] In some embodiments, it may be desirable to separate the exhaust of the various precursors. In this case, the first exhaust plenum 205 may have the same volume as the second exhaust plenum 210, and the first plurality of through-holes 240 may have the same diameter as the second plurality of through-holes 245. In this case, the sealing mechanism may be omitted, and first and second valves 290, 225 may be utilized to block gas flow through the respective exhaust plenums 205, 210. Additionally, the exhaust system 140 may be configured as shown in FIG. 7 using two separate pumps 700, 705.

[0063] 1-7, system 100 may be configured to perform atomic layer deposition (ALD), in which precursors from reservoir 135 are pulsed into reaction space 155 via gas distribution system 110 and then purged using an inert gas, such as argon. During the pulsing step, plug 235 may be placed in a lowered position to seal second exhaust plenum 210 from reaction space 155. During the purging step, plug 235 may be raised to a raised position to allow gas from reaction space 155 to flow into second exhaust plenum 210. Movement of plug 235 may be synchronized with the timing of pulsing and purging via controller 400.

[0064] In an alternative operation, the second valve 225 may be closed during the pulsing step to block gas flow through the second exhaust plenum 210. The second valve 225 may be configured to be open during the purging step. In this case, the first valve 290 may be closed during the pulsing step and open during the purging step. The operation of the first valve 290 and the second valve 225 may alternate. For example, the first valve 290 may be open during the purging of a first precursor, and the second valve 225 may be open during the purging of a second precursor different from the first precursor.

[0065] In yet another alternative operation, during the pulse step, the second valve 225 may be closed to block gas flow through the second exhaust plenum 210. During the purge step, the second valve 225 may be open, in which case the first valve 290 is omitted or remains open during both the pulse step and the purge step.

[0066] In the foregoing description, the present technology has been described with reference to certain exemplary embodiments. The specific examples shown and described are illustrative of the present technology and its best mode and are not intended to limit the scope of the present technology in any way. Also, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the present methods and systems may not be described in detail. Furthermore, connecting lines shown in the various figures are intended to represent example functional relationships and / or steps between the various elements. Many alternative or additional functional relationships or physical connections may exist in an actual system.

[0067] The present technology has been described with reference to specific exemplary embodiments. However, various modifications and changes can be made without departing from the scope of the present technology. The description and drawings are to be considered in an illustrative manner, not restrictive, and all variations are intended to be included within the scope of the present technology. Thus, the scope of the present technology should be determined not only by the specific examples described above, but also by the general embodiments described and their legal equivalents. For example, steps described in an embodiment of a method or process may be performed in any order unless otherwise explicitly specified, and are not limited to the explicit order presented in the particular example. Furthermore, the components and / or elements described in an embodiment of any apparatus may be assembled or operably configured in various forms to produce substantially the same results as the present technology, and therefore are not limited to the specific configurations described in the particular example.

[0068] Although benefits, other advantages, and solutions to problems have been described above with reference to specific embodiments, any benefit, advantage, solution to a problem, or any element that may cause or make more pronounced any particular benefit, advantage, or solution, is not to be construed as a critical, required, or essential feature or component.

[0069] The terms "comprises," "comprising," or any variation thereof are intended to indicate a non-limiting inclusion, such that a process, method, article, composition, or apparatus comprising the listed elements includes not only those elements described, but may also include other elements not expressly described or inherent to such process, method, article, composition, or apparatus. In addition to those not specifically described, other combinations and / or variations of the above-described structures, configurations, applications, proportions, elements, materials, or components used in the practice of the present technology may be changed or specifically adapted to particular environments, manufacturing specifications, design parameters, or other operating requirements without departing from the general principles thereof.

[0070] The present technology has been described above with reference to exemplary embodiments. However, changes and modifications may be made to the exemplary embodiments without departing from the scope of the technology. These and other changes or modifications are intended to be included within the scope of the technology, as expressed in the following claims. [Explanation of symbols]

[0071] 100 systems 105 Reactor 110 Gas Distribution System 115 Reaction Chamber 120 Upper part 125 Bottom part 130 Pressure Sensor 135 Container 140 Exhaust System 145 Susceptor 150 Base material 155 Reaction Space 200 Entrance Plenum 205, 210 Exhaust Plenum 215 Bellows 220 Actuator 225 Second Valve 230 Through hole 235 Plug 240 First exhaust through hole 245 Second exhaust through hole 250 First Surface 255 Second Surface 260 Second Surface 262 First Surface 265 void 270, 275 Plenum Exit 280 Central area 290 First Valve 400 Controller 700, 705 Pumps 710, 715 Foreline 800 pump

Claims

1. An upper portion, The entrance plenum and a first exhaust plenum; a second exhaust plenum; and an upper portion comprising: a bottom portion coupled to the top portion, a first surface and an opposing second surface; a showerhead region including a plurality of inlet through-holes extending between the first surface and the second surface; a plurality of first exhaust through-holes fluidly connected to the first exhaust plenum; a bottom portion comprising a plurality of second exhaust through-holes fluidly connected to the second exhaust plenum.

2. The apparatus of claim 1 , wherein the first exhaust plenum and the second exhaust plenum are disposed concentrically with the inlet plenum, and the first exhaust plenum is separated from the second exhaust plenum.

3. The apparatus of claim 1 , wherein the first exhaust plenum has a first volume and the second exhaust plenum has a second volume greater than the first volume.

4. 10. The apparatus of claim 1, further comprising a sealing mechanism disposed in the second exhaust plenum and configured to separate the second exhaust plenum from a reaction space, the sealing mechanism comprising a ring and an actuator coupled to the ring.

5. a first exhaust line coupled to the first exhaust plenum and extending outward from the first portion; The apparatus of claim 1 , further comprising: a second exhaust line coupled to the second exhaust plenum and extending outward from the second portion.

6. 2. The apparatus of claim 1, wherein the first exhaust plenum has a first volume, the second exhaust plenum has a second volume substantially equal to the first volume, the first exhaust through-hole has a first diameter, and the second exhaust through-hole has a second diameter substantially equal to the first diameter.

7. The apparatus of claim 6 , further comprising a first isolation valve coupled to the first exhaust plenum and a second valve coupled to the second exhaust plenum.

8. 8. The apparatus of claim 7, further comprising a first pump connected downstream from the first isolation valve and a second pump connected downstream from the second valve.

9. The apparatus of claim 1 , wherein the first exhaust through-hole has a first diameter and the second exhaust through-hole has a second diameter greater than the first diameter.

10. The apparatus of claim 1 , wherein the first and second exhaust through-holes are positioned radially outward from the showerhead region.

11. The apparatus of claim 1 , wherein each exhaust through-hole from the first plurality of exhaust through-holes merges with a respective exhaust through-hole from the second plurality of exhaust through-holes at the second surface of the bottom portion.

12. The apparatus of claim 1 , wherein the second exhaust through-holes are vertically oriented and the first exhaust through-holes are angled relative to the second exhaust through-holes.

13. An upper portion, The entrance plenum and a first exhaust plenum; an upper portion comprising a second exhaust plenum, the first exhaust plenum having a first volume and the second exhaust plenum having a second volume greater than the first volume; a bottom portion coupled to the top portion, a showerhead plate having a first surface and an opposing second surface; a showerhead region including a plurality of through holes extending between the first surface and the second surface; a plurality of first exhaust through-holes fluidly connected to the first exhaust plenum; a plurality of second exhaust through-holes fluidly connected to the second exhaust plenum; a bottom portion, the first exhaust through-hole having a first diameter and the second exhaust through-hole having a second diameter greater than the first diameter.

14. 14. The apparatus of claim 13, further comprising a sealing mechanism disposed within the second exhaust plenum and configured to separate the second exhaust plenum from a reaction space.

15. each exhaust through hole from the plurality of first exhaust through holes merges with a respective exhaust through hole from the plurality of second exhaust through holes at the second surface of the showerhead plate; The apparatus of claim 13 , wherein the second exhaust through-holes are vertically oriented and the first exhaust through-holes are angled relative to the second exhaust through-holes.

16. An upper portion, The entrance plenum and a first exhaust plenum; a second exhaust plenum; and an upper portion comprising: a bottom portion coupled to the top portion, a showerhead plate having a first surface and an opposing second surface; a showerhead region including a plurality of through holes extending between the first surface and the second surface; a plurality of first exhaust through-holes fluidly connected to the first exhaust plenum; a plurality of second exhaust through-holes fluidly connected to the second exhaust plenum, each exhaust through-hole from the first plurality of exhaust through-holes merging with a respective exhaust through-hole from the second plurality of exhaust through-holes in the second surface of the showerhead plate; a bottom portion comprising a sealing mechanism disposed within the second exhaust plenum and configured to separate the second exhaust plenum from a reaction space.

17. The apparatus of claim 16 , wherein the first and second exhaust plenums are disposed concentrically with the inlet plenum, and the first exhaust plenum is separated from the second exhaust plenum.

18. 17. The device of claim 16, wherein the sealing mechanism comprises a ring-shaped plug formed from a metallic or ceramic material.

19. a pressure sensor for measuring the pressure in the reaction space; 17. The apparatus of claim 16, further comprising: an actuator coupled to the sealing mechanism and configured to actuate the sealing mechanism based on data from the pressure sensor.

20. 17. The apparatus of claim 16, wherein the first exhaust through-hole has a first diameter and the second exhaust through-hole has a second diameter, the first diameter being 20-25% of the second diameter.

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