Ultraviolet treatment devices and method of operating ultraviolet treatment device

Abstract

To provide an ultraviolet treatment device capable of accurately applying ultraviolet rays to an affected area of a person to be treated with a relatively small number of light sources.SOLUTION: An ultraviolet treatment device 100 includes: a housing 1 capable of accommodating a person 200 therein; an annular structure 30 disposed inside the housing 1; a light source structure 3 having a semiconductor light source 4 installed in the annular structure 30 for applying ultraviolet rays to an affected part; a linear movement mechanism for linearly moving the light source structure 3 along a height direction (a Y direction), the longitudinal direction of the person 200 inside the housing 1; and a rotary movement mechanism for rotatingly moving the semiconductor light source 4 installed in the annular structure 30 along the periphery of the person 200.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an ultraviolet treatment device. [Background technology]

[0002] Conventional phototherapy involves ultraviolet light therapy using ultraviolet light in wavelength ranges such as UVA (wavelength 320nm to 400nm) and UVB (wavelength 280nm to 320nm). In ultraviolet light therapy, ultraviolet light irradiation is used to suppress the immune system and achieve therapeutic effects. For example, Patent Documents 1 and 2 disclose ultraviolet light treatment devices equipped with a plurality of LEDs that emit ultraviolet light for treating skin diseases. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Special Publication No. 2022-52750 [Patent Document 2] Patent No. 6305933 Summary of the Invention [Problem to be solved by the invention]

[0004] However, with the above-mentioned conventional devices, since people of different heights and areas to be treated vary from person to person, in order to irradiate the optimal area for each patient with ultraviolet light, it is necessary to arrange many light sources within the device and turn on the light sources in the necessary areas. In other words, there is a problem that the number of light sources increases, leading to increased costs. Furthermore, since the light source is fixed within the device, if the area to be treated is located between the light sources, it can be difficult to correctly irradiate the ultraviolet light onto the area to be treated on the patient. Therefore, an object of the present invention is to provide an ultraviolet treatment device and an operating method thereof that can accurately irradiate the affected area of ​​a person to be treated with ultraviolet light using a relatively small number of light sources. [Means for solving the problem]

[0005] In order to solve the above problems, one aspect of the ultraviolet therapy device of the present invention is an ultraviolet therapy device that performs treatment by irradiating an affected area with ultraviolet light, and includes a housing capable of accommodating a person or part of a person inside, a structure disposed inside the housing, and a light source structure having a semiconductor light source installed on the structure for irradiating the affected area with ultraviolet light, a linear movement mechanism that moves the light source structure linearly along the longitudinal direction of the person or part of a person inside the housing, and a rotational movement mechanism that moves the semiconductor light source installed on the structure in a rotational movement around the person or part of a person. In the ultraviolet therapy device, the light source structure may be configured such that the semiconductor light source is positioned in at least a portion of the person or part of the person that corresponds to an affected area.

[0006] In addition, in the above-mentioned ultraviolet therapy device, the structure may be a ring-shaped structure capable of accommodating a person or a part of a person inside, the light source structure may be configured such that the semiconductor light source is fixed to the ring-shaped structure, and the rotational movement mechanism may rotate the light source structure around an axis whose axis is the center of the ring-shaped structure, thereby rotating the semiconductor light source around the person or a part of a person. In the ultraviolet treatment device, the light source structure may include a plurality of the semiconductor light sources mounted on the structure. In the ultraviolet therapy device, the plurality of semiconductor light sources may be configured as a plurality of groups each having a different peak wavelength. In the ultraviolet treatment device, the semiconductor light source may be configured by arranging a plurality of single light sources on a substrate.

[0007] In addition, in the above-mentioned ultraviolet treatment device, the single light source may be an LED (Light Emitting Diode), and the semiconductor light source may be a plurality of LEDs arranged on the substrate so that the ultraviolet rays emitted from each LED overlap at the target irradiation position. In the ultraviolet treatment device, the light source structure may be arranged along a direction in which the plurality of semiconductor light sources rotate. In the ultraviolet treatment device, the light source structure may be arranged along a direction in which the plurality of semiconductor light sources move linearly.

[0008] In addition, in the above-mentioned ultraviolet treatment device, the light source structure may have a plurality of first semiconductor light sources arranged at predetermined intervals along a direction perpendicular to the movement direction of the light source structure, and a plurality of second semiconductor light sources arranged at positions adjacent to the positions between each of the plurality of first semiconductor light sources and shifted in the movement direction.

[0009] In addition, in the above-mentioned ultraviolet treatment device, the semiconductor light source may have a first plurality of single light sources arranged along a direction perpendicular to the movement direction of the light source structure, and a second plurality of single light sources arranged at positions adjacent to the positions between each of the first plurality of single light sources and shifted in the movement direction. The ultraviolet treatment device may further include a control unit that controls the operations of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism. In addition, in the above ultraviolet therapy device, the control unit may control the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so as to irradiate the affected area with ultraviolet light while moving the semiconductor light source. In the ultraviolet therapy device, the control unit may perform control to adjust the amount of ultraviolet light irradiated onto the affected area by controlling the moving speed of the light source structure. In addition, in the above-mentioned ultraviolet treatment device, the control unit may control the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so that the semiconductor light source is stopped at the affected area and ultraviolet light is irradiated onto the affected area. In the ultraviolet therapy device, the control unit may perform control to adjust the amount of ultraviolet light irradiated onto the affected area by controlling the lighting time of the semiconductor light source. In the ultraviolet treatment device, the light source structure may include a swing mechanism that swings the semiconductor light source up and down.

[0010] In addition, in the above ultraviolet therapy device, the structure is a ring-shaped structure that can accommodate a person or a part of a person inside, the light source structure is configured so that the semiconductor light source is fixed to the ring-shaped structure, the rotational movement mechanism rotates the light source structure around an axis whose axis is the center of the ring-shaped structure, thereby rotating the semiconductor light source along the periphery of the person or a part of a person, the semiconductor light source is fixed to the inner periphery of the ring-shaped structure so as to irradiate ultraviolet light inward, and the device may be equipped with a protrusion mechanism that can protrude the semiconductor light source radially inward and a distance measuring sensor that measures the distance from the semiconductor light source to the affected area, and the control unit may control the amount of protrusion of the semiconductor light source based on distance information measured by the distance measuring sensor. In addition, the above-mentioned ultraviolet treatment device may be provided with an imaging device that captures an image of a person or a part of a person inside the housing, and the control unit may control the linear movement and rotational movement of the light source structure based on the captured image data obtained by capturing an image of the person or a part of a person with the imaging device.

[0011] In addition, in the above-mentioned ultraviolet treatment device, the structure may be a ring-shaped structure capable of accommodating a person or a part of a person inside, the light source structure may be configured such that the semiconductor light source is fixed to the ring-shaped structure, the rotational movement mechanism may rotate the light source structure around an axis whose axis is the center of the ring-shaped structure, thereby rotating the semiconductor light source around the person or a part of a person, and the imaging device may be fixed to the ring-shaped structure in a position with the imaging axis facing radially inward.

[0012] On the other hand, in order to solve the above-mentioned problems, one aspect of the method of operating an ultraviolet therapy device according to the present invention is a method of operating an ultraviolet therapy device that performs treatment by irradiating an affected area with ultraviolet light, the ultraviolet therapy device comprising: a light source structure having a ring-shaped structure capable of accommodating a person or a portion of a person inside, and a semiconductor light source installed in the ring-shaped structure for irradiating the affected area with ultraviolet light; a rectilinear movement mechanism that moves the light source structure linearly along the longitudinal direction of the person or portion of a person; a rotational movement mechanism that moves the semiconductor light source rotationally around the periphery of the person or portion of a person inside the ring-shaped structure; and a control unit that controls the operation of the semiconductor light source, the rectilinear movement mechanism, and the rotational movement mechanism, and the control unit has a control step in which the control unit controls the operation of the semiconductor light source, the rectilinear movement mechanism, and the rotational movement mechanism so as to irradiate the affected area with ultraviolet light while moving the semiconductor light source. [Effects of the Invention]

[0013] The ultraviolet light therapy device of the present invention can accurately irradiate the affected area of ​​a person to be treated with ultraviolet light using a relatively small number of light sources. [Brief explanation of the drawings]

[0014] [Figure 1] 1(a) and 1(b) are diagrams showing a schematic configuration of an ultraviolet treatment device in a first embodiment. [Figure 2] 1(a) and 1(b) are plan views showing a schematic configuration of a light source structure of an ultraviolet treatment device in a first embodiment. [Figure 3] 3(a) and 3(b) are diagrams showing an example of the configuration of a semiconductor light source of an ultraviolet treatment device in the first embodiment. [Figure 4] FIG. 2 is a diagram illustrating an example of the optical configuration of a semiconductor light source according to the first embodiment. [Figure 5] FIG. 10 is a plan view showing a schematic configuration of a light source structure in a first modified example of the first embodiment. [Figure 6] FIG. 10 is a partially enlarged view showing a first arrangement example of a plurality of semiconductor light sources according to a first modification of the first embodiment. [Figure 7]FIG. 10 is a partially enlarged view showing a second arrangement example of a plurality of light sources according to Modification 1 of the first embodiment. [Figure 8] FIG. 10 is a diagram showing a schematic configuration of an ultraviolet treatment device in a second embodiment. [Figure 9] 10 is a flowchart showing an ultraviolet treatment process according to a second embodiment. [Figure 10] FIG. 10 is a diagram showing a schematic configuration of an ultraviolet treatment device in a second embodiment. [Figure 11] FIG. 10 is a diagram showing a schematic configuration of an ultraviolet treatment device in a third embodiment. [Figure 12] 13(a) to 13(c) are perspective views showing a schematic configuration of a light source structure according to a first modified example of the third embodiment. [Figure 13] 13(a) to 13(c) are perspective views showing a schematic configuration of a light source structure according to a second modification of the third embodiment. [Figure 14] FIG. 10 is a diagram showing a schematic configuration of an ultraviolet treatment device according to another modified example. [Figure 15] 10(a) and 10(b) are plan views showing a schematic configuration of a semiconductor light source according to another modified example. DETAILED DESCRIPTION OF THE INVENTION

[0015] Various embodiments for carrying out the present invention will be described in detail below with reference to the accompanying drawings. The embodiment described below is an example of a means for realizing the present invention, and should be appropriately modified or changed depending on the configuration of the device to which the present invention is applied and various conditions, and the present invention is not limited to the embodiment described below.

[0016] In addition, in the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. However, it should be noted that the drawings are schematic, and the vertical and horizontal dimensions and scales of the components or parts may differ from those of the actual parts. Therefore, the specific dimensions and scales should be determined by taking into consideration the following explanation. Furthermore, it goes without saying that the dimensional relationships and ratios may differ between the drawings. [First embodiment] 〔composition〕 A first embodiment of the present invention will be described below with reference to the drawings, in which: Figures 1 to 4 show the first embodiment.

[0017] Fig. 1 is a diagram showing a schematic configuration of an ultraviolet treatment device 100 in a first embodiment, Fig. 1(a) shows a state where there is no person in the housing 1, and Fig. 1(b) shows a state where there is a person 200 in the housing 1, and shows how the light source structure 3 moves linearly. Fig. 2(a) is a plan view showing a schematic configuration of the light source structure 3 of the ultraviolet treatment device 100 in the first embodiment, and Fig. 2(b) is a diagram showing a state where it has rotated in the -X direction and the +X direction from the position in (a). The ultraviolet treatment device 100 in the first embodiment is a device that performs treatment by irradiating ultraviolet rays onto a site to be treated (affected area) of a person 200 using a semiconductor light source capable of emitting ultraviolet rays, thereby suppressing the immune system of the affected area. 1 and 2, the rotation direction of the light source structure 3 is the X direction, and the linear movement direction of the light source structure 3 (height direction of the ultraviolet treatment device 100) is the Y direction. This also applies to Figures 3 and onwards.

[0018] 1(a) and 1(b), the ultraviolet treatment device 100 includes a housing 1, a support 2, a light source structure 3, a linear movement mechanism (not shown), and a rotational movement mechanism (not shown). The support 2, the light source structure 3, the linear movement mechanism, and the rotational movement mechanism are located inside the housing 1.

[0019] The housing 1 is generally cylindrical with a top and bottom, and is made of a material that can diffusely reflect or absorb ultraviolet rays. In other words, it is configured to prevent ultraviolet rays from leaking to the outside. Although not shown, the housing 1 is provided with a door that allows people to enter and exit. Note that a glass section may be provided so that the inside can be seen from the outside, or a video camera may be installed. The support pillar 2 is a generally rectangular cylindrical shape with a top and a bottom, and extends from the bottom surface of the housing 1 to the ceiling. That is, one end of the support pillar 2 is fixed to the ceiling and the other end is fixed to the bottom surface. Although not shown in the figure, a linear movement mechanism is installed on the support pillar 2.

[0020] The linear movement mechanism has a linear movement part connected to the light source structure 3, and is a mechanism that moves the light source structure 3 linearly in the +Y direction (upward) and the −Y direction (downward) along the support 2. The linear movement mechanism can be configured, for example, by a ball screw actuator, or by a set of a pulley, a belt, a guide rail, a slider, and an electric motor.

[0021] A guide rail that opens to the outside is provided on one surface of the support 2 that faces the inside of the housing 1. Through the opening of the guide rail, for example, the nut of the ball screw actuator or the slider is fixed to a non-rotating part of a rotational movement mechanism of the light source structure 3, which will be described later. The light source structure 3 includes an annular structure 30 (hereinafter referred to as the “annular structure 30 ”) and a semiconductor light source 4 . The annular structure 30 has an inner diameter and height that allow a portion of a person to be accommodated therein, that is, the annular structure 30 is configured to have a size that corresponds to at least a portion of the affected area of ​​a person. The semiconductor light source 4 is composed of a light source that emits UVA (ultraviolet A rays) or UVB (ultraviolet B rays), and is fixed to the inner periphery of the annular structure 30. The semiconductor light source 4 is arranged so as to emit ultraviolet light toward the center (radially inward) of the annular structure 30.

[0022] Although not shown, the rotational movement mechanism is a mechanism that rotates and moves the annular structure 30 around an axis (i.e., in the +X direction and the -X direction) with the center of the annular structure 30 as the axis. The rotational movement mechanism can be configured, for example, from a known MRI rotational movement mechanism or a known rotational movement mechanism that uses an arc-type linear motor.

[0023] That is, as shown in Fig. 1(b), the light source structure 3 can be moved linearly along the height direction (-Y direction and +Y direction), which is the longitudinal direction of the human body, by the linear movement mechanism. Furthermore, as shown in Fig. 2(b), the light source structure 3 can be moved rotationally in the -X direction and +X direction by the rotation movement mechanism. That is, the light source structure 3 can be moved linearly along the body of a person inside the annular structure 30, and can be moved rotationally around the periphery of the inner human body part, with the person inside the annular structure 30 as the center. Next, a specific configuration of the semiconductor light source 4 will be described. Figures 3(a) and 3(b) are diagrams showing a first configuration example and a second configuration example of the semiconductor light source 4. The semiconductor light source 4 according to the first embodiment can be configured as, for example, a first or second configuration example shown in FIGS. 3(a) and 3(b).

[0024] 3(a), the first configuration example is a configuration including a substrate 7, one single light source 40, and a condenser lens 8. Specifically, the relatively large single light source 40 is disposed at the center position on the substrate 7, and the relatively large condenser lens 8 is disposed on the surface of the single light source 40 on the ultraviolet radiation side.

[0025] 3(b), the second configuration example is a configuration including a substrate 7, a plurality of single light sources 40, and a plurality of condenser lenses 8. Specifically, the plurality of single light sources 40 are arranged in an array on the substrate 7, and a condenser lens 8 is arranged on the surface of each single light source 40 on the ultraviolet radiation side.

[0026] Here, the single light source 40 can be configured, for example, from an LED (Light Emitting Diode), an LD (Semiconductor Laser), or the like, which can emit UVA or UVB. In the first embodiment, as an example, the single light source 40 is configured from an LED chip.

[0027] The second configuration example can increase the amount of ultraviolet light irradiation compared to the first configuration example. Also, by configuring the single light sources 40 so that they can be turned on and off individually or in units of a predetermined number, the amount of irradiation can be controlled by the number of lit single light sources 40. Also, the second configuration example has been described as including nine single light sources 40, but the present invention is not limited to this configuration and may include fewer than nine or ten or more single light sources. Next, an optical configuration example for reducing variations in radiation characteristics when the semiconductor light source 4 is configured as the second configuration example will be described. Fig. 4 is a diagram showing an optical configuration example of the semiconductor light source 4 according to the first embodiment.

[0028] As shown in Fig. 4, the semiconductor light source 4 may have an optical configuration including a first optical lens 121 and a second optical lens 122 to reduce variations in radiation characteristics. The configuration illustrated in Fig. 4 is an example of a Koehler illumination optical system. That is, light emitted from the multiple single light sources 40 of the semiconductor light source 4 is collected by the first optical lens 121, and converted from an angular component to a position component by the second optical lens 122. As a result, ultraviolet light emitted from each single light source 40 of the semiconductor light source 4 is uniformly irradiated onto the target position (affected area) of the person 200.

[0029] 4, an example is shown in which the light from three single light sources 40 overlaps and the wavelengths mix at the location to be treated (affected area), resulting in a uniform wavelength distribution. For example, if the wavelength does not fall within a predetermined range with this positional configuration, one of the three single light sources 40 can be replaced with another single light source 40 to design it so that the wavelength falls within the predetermined range. That is, the radiant flux of the ultraviolet light emitted by each single light source 40 may vary by several nanometers, and the peak wavelength may vary by so-called individual difference. In light therapy, deviations in irradiance and differences in peak wavelength of several nanometers can affect the treatment, and deviations from the appropriate range can cause problems such as erythema in the patient. For this reason, as described above, the light from each single light source 40 is configured to overlap at the target irradiation position. Note that the present invention is not limited to the Koehler illumination optical system, and other optical system configurations such as an integrator illumination optical system may be used as long as the configuration can reduce variations in irradiation characteristics. The essence of the present invention is a technology that allows the wavelengths of the three single light sources 40 to overlap at the location to be treated (affected area). Furthermore, although not shown, the ultraviolet therapy device 100 includes a control unit that controls the on / off operation of the semiconductor light source 4, the linear movement by the linear movement mechanism, and the rotational movement by the rotational movement mechanism.

[0030] The control unit includes a processor that controls the entire ultraviolet treatment device 100 based on a control program, and a ROM (Read Only Memory) that stores the control program, setting data, etc. In addition, it includes a RAM (Random Access Memory) that stores data read from the ROM and calculation results required in the processor's calculation process, and an I / F (Interface) that mediates data input / output to / from external devices. These are connected to each other by a bus, which is a signal line for transferring data, so that data can be sent and received. The control unit is electrically connected to the semiconductor light source 4, the linear movement mechanism, the rotational movement mechanism, the opening and closing door, etc. via the I / F, and controls the operations of these.

[0031] In the first embodiment, the doctor can send an operation command to the control unit by operating an operating device (not shown). Therefore, the doctor can move the light source structure 3 linearly and rotationally to move the irradiation position of the semiconductor light source 4 to the affected area of ​​the patient. Furthermore, by turning the semiconductor light source 4 on and off, the doctor can irradiate the affected area with ultraviolet light for the required irradiation time. That is, the doctor can operate the operating device to control the control unit's lighting time and adjust the amount of ultraviolet light irradiated onto the affected area. The operating device may also be configured to gradually control the movement speed (motor rotation speed) by, for example, the amount of tilt of an analog operation stick. This allows, for example, the doctor to increase the movement speed until the doctor approaches the affected area to a certain extent, and then decrease the movement speed after approaching the affected area to fine-tune the position.

[0032] The ultraviolet therapy device 100 can be operated not only by doctors but also by medical personnel without medical qualifications under the supervision of a doctor. Specifically, it is possible for a doctor to determine the location of the affected area, and for a medical personnel without medical qualifications to perform the subsequent ultraviolet irradiation treatment. [Effects of the first embodiment]

[0033] As described above, the ultraviolet therapy device 100 according to the first embodiment is configured to include a housing 1 capable of accommodating a person 200 therein, an annular structure 30 disposed inside the housing 1, a light source structure 3 having a semiconductor light source 4 disposed in the annular structure 30 for irradiating an affected area with ultraviolet light, a linear movement mechanism for linearly moving the light source structure 3 along the height direction (Y direction) of the person 200 within the housing 1, and a rotational movement mechanism for rotationally moving the semiconductor light source 4 disposed in the annular structure 30 along the periphery of the person 200. Furthermore, the light source structure 3 is configured such that the semiconductor light source 4 is positioned in at least a portion of the part of the person 200 corresponding to the affected area. Furthermore, the rotational movement mechanism is configured to rotationally move the light source structure 3 around an axis centered at the center of the annular structure 30.

[0034] With this configuration, by moving the light source structure 3 linearly and rotationally, the semiconductor light source 4 can be moved to a position facing any affected area on a person. This allows ultraviolet light to be accurately irradiated onto the affected area of ​​the person to be treated with a relatively small number of light sources (minimum one). As a result, the cost of the device can be significantly reduced. Moreover, the ultraviolet therapy device 100 according to the first embodiment has a configuration in which the semiconductor light source 4 has a plurality of single light sources 40 arranged on a substrate. With this configuration, the amount of ultraviolet light irradiation can be increased by using a plurality of single light sources 40. In addition, in the ultraviolet treatment device 100 according to the first embodiment, the single light source 40 is composed of an LED, and the semiconductor light source 4 is composed of multiple LEDs arranged on the substrate 7 so that the ultraviolet rays emitted from each LED overlap at the target irradiation position (the position of the affected area on a person). With this configuration, the affected area of ​​the person 200 can be uniformly irradiated with ultraviolet light emitted from the plurality of LEDs. The ultraviolet treatment device 100 according to the first embodiment is configured to include a control unit that controls the operations of the semiconductor light source 4, the linear movement mechanism, and the rotational movement mechanism.

[0035] With this configuration, the operation of the linear movement mechanism and the rotational movement mechanism can be controlled by the doctor's operation input on the operation device, thereby moving the semiconductor light source 4 to the position of the affected area. Furthermore, the doctor's operation input on the operation device can be used to control the turning on and off of the semiconductor light source 4, thereby irradiating the affected area with ultraviolet light. [Modification 1 of the First Embodiment] 〔composition〕 Next, a first modification of the first embodiment of the present invention will be described with reference to the drawings. Figures 5 to 7 show the first modification. The present first modification differs from the first embodiment in the configuration of the light source structure. Below, differences from the first embodiment will be described in detail, and descriptions of overlapping parts will be omitted as appropriate. Fig. 5 is a plan view showing a schematic configuration of a light source structure 3A in this modified example 1, Fig. 6 is a partially enlarged view showing a first example of an arrangement of a plurality of semiconductor light sources in this modified example 1. Fig. 7 is a partially enlarged view showing a second example of an arrangement of a plurality of semiconductor light sources in this modified example 1.

[0036] As shown in Fig. 5, the light source structure 3A according to the first modification includes a plurality of semiconductor light sources 41 arranged at equal intervals along the circumferential direction (X direction) on the inner peripheral surface of the annular structure 30. The semiconductor light sources 41 have the same configuration as the semiconductor light source 4 of the first embodiment (see Figs. 3(a) and 3(b)). The plurality of semiconductor light sources 41 are configured so that they can be individually controlled to be turned on and off, and ultraviolet therapy can be performed by turning on only the semiconductor light source 41 facing the affected area.

[0037] With this configuration, even if there is a slight difference in the wavelength of the irradiance of the ultraviolet light emitted from each semiconductor light source 41, by rotating the light source structure 3A, the light from each semiconductor light source 41 will overlap on the surface of the treatment area of ​​the patient. This reduces the difference in irradiance and wavelength, and further improves wavelength uniformity.

[0038] The light source structure 3A may be configured to include a plurality of semiconductor light sources 41 arranged at equal intervals along the Y direction in addition to the X direction on the inner circumferential surface of the annular structure 30. That is, the plurality of semiconductor light sources 41 may be arranged in at least one of a first arrangement example and a second arrangement example shown in FIGS.

[0039] 6, the first arrangement configuration example is a configuration in which a plurality of first semiconductor light sources 41 are arranged at equal intervals along a direction (Y direction) perpendicular to the rotational movement direction (X direction). Furthermore, a plurality of second semiconductor light sources 410 are arranged at positions adjacent to positions between the plurality of first semiconductor light sources 41 arranged along the Y direction, but shifted in the X direction. Here, the first semiconductor light sources 41 and the second semiconductor light sources 410 are given different reference numerals for convenience of explanation, but both are light sources with the same configuration. In other words, the first arrangement configuration example is a configuration in which the plurality of first semiconductor light sources 41 are arranged in a staggered pattern suitable for preventing dark areas from occurring at the irradiation positions when the plurality of first semiconductor light sources 41 are rotated and moved in the X direction.

[0040] For example, suppose that the affected area of ​​the patient is wide in the X direction and ultraviolet light is irradiated over a width L in Fig. 6, and the light source structure 3A is moved in the X direction while irradiating ultraviolet light. In this case, when the light source structure 3A rotates in the X direction, the second semiconductor light source 410 can supplement the ultraviolet light irradiation between one first semiconductor light source 41 and another adjacent first semiconductor light source 41. This allows ultraviolet light to be irradiated more uniformly over a wide area of ​​the affected area of ​​the patient.

[0041] 7, the second arrangement configuration example is a configuration in which a plurality of first semiconductor light sources 41 are arranged at equal intervals along a direction (X direction) perpendicular to the linear movement direction (Y direction). Furthermore, a plurality of second semiconductor light sources 410 are arranged at positions adjacent to positions between the plurality of first semiconductor light sources 41 arranged along the X direction, but shifted in the Y direction. That is, the second arrangement configuration example is a configuration in which the plurality of first semiconductor light sources 41 are arranged in a staggered pattern suitable for preventing dark areas from occurring at the irradiation positions when the plurality of first semiconductor light sources 41 are moved linearly in the Y direction.

[0042] For example, suppose that the affected area of ​​the patient is wide in the Y direction and ultraviolet light is irradiated over a width N in Fig. 7, and the light source structure 3A is moved in the Y direction while irradiating ultraviolet light. In this case, when the light source structure 3A moves linearly in the Y direction, the second semiconductor light source 410 can supplement the ultraviolet light irradiation between one first semiconductor light source 41 and another adjacent first semiconductor light source 41. This allows ultraviolet light to be irradiated more uniformly over the wide affected area of ​​the patient.

[0043] Furthermore, for example, the arrangement of the first arrangement configuration example and the arrangement of the second arrangement configuration example can be mixed half and half. In this case, by rotating and moving the semiconductor light sources of these two arrangement configurations, it is possible to more uniformly irradiate the affected area of ​​the patient with ultraviolet light even if the affected area is wide in the X and Y directions. [Effects of Modification 1 of the First Embodiment] As described above, the ultraviolet therapy device 100 of the first modification of the first embodiment is configured such that the plurality of semiconductor light sources 41 are arranged at equal intervals along the rotation direction (circumferential direction) on the inner periphery of the annular structure 30.

[0044] With this configuration, even if there is a slight difference in the wavelength of the irradiance of the ultraviolet light emitted from each semiconductor light source 41, by rotating the light source structure 3A, the light from each semiconductor light source 41 can be made to overlap on the surface of the treatment area of ​​the patient. This reduces the difference in irradiance and wavelength, and further improves wavelength uniformity.

[0045] In addition, the ultraviolet treatment device 100 of the first embodiment, variant 1, is configured so that the light source structure 3A has a plurality of first semiconductor light sources 41 arranged at predetermined intervals along a direction perpendicular to the movement direction of the light source structure 3A, and a plurality of second semiconductor light sources 410 arranged at positions adjacent to the positions between the plurality of first semiconductor light sources 41 and shifted in the movement direction.

[0046] With this configuration, dark areas that appear between the first semiconductor light sources 41 in response to movement in the X or Y direction can be compensated for by the ultraviolet light emitted from the second semiconductor light source 410. This allows the ultraviolet light to be more uniformly irradiated onto the affected area over a wide area of ​​the patient. [Modification 2 of the First Embodiment] 〔composition〕 Next, a second modification of the first embodiment of the present invention will be described with reference to the drawings. Figure 8 shows the second modification. The present modified example 2 differs from the first embodiment and modified example 1 thereof in the configuration of the light source structure. Below, differences from the first embodiment and its first modification will be described in detail, and descriptions of overlapping parts will be omitted as appropriate. FIG. 8 is a plan view showing a schematic configuration of a light source structure 3B according to the second modification. As shown in FIG. 8, a light source structure 3B according to the second modification includes a plurality of semiconductor light sources 41 and 42 arranged on the inner circumferential surface of an annular structure 30 at equal intervals along the circumferential direction (X direction).

[0047] Semiconductor light sources 41 and 42 are each composed of a single light source with a different peak wavelength. For example, semiconductor light source 41 is composed of a single light source with a peak wavelength in the UVA wavelength range (wavelength 320 nm to 400 nm), and semiconductor light source 42 is composed of a single light source with a peak wavelength in the UVB wavelength range (wavelength 280 to 320 nm). Note that the combination is not limited to UVA and UVB, and may be, for example, a combination of different peak wavelengths within UVB (e.g., a combination of 308 nm and 311 nm). The semiconductor light sources 41 and 42 each have the same configuration as the semiconductor light source 4 of the first embodiment described above (see Figures 3(a) and (b)), but the peak wavelengths of the single light sources constituting each semiconductor light source are different from each other. In the example of FIG. 8, the number of semiconductor light sources 41 is half and the number of semiconductor light sources 42 is half, and the groups of multiple semiconductor light sources 41 and the groups of multiple semiconductor light sources 42 are arranged half and half. The arrangement of the multiple semiconductor light sources 41 and 42 can be at least one of the first and second arrangement examples of variant 1 of the first embodiment (see Figures 6 and 7).

[0048] Furthermore, the plurality of semiconductor light sources 41 and the plurality of semiconductor light sources 42 are configured so that each semiconductor light source can be individually controlled to be turned on and off, thereby enabling ultraviolet light therapy to be performed by turning on only the semiconductor light source that faces the affected area and has a peak wavelength appropriate for treating the affected area. [Effects of Modification 2 of First Embodiment]

[0049] As described above, the ultraviolet treatment device 100 of the second modification of the first embodiment has a plurality of semiconductor light sources configured into two groups each consisting of semiconductor light sources 41 and 42 with different peak wavelengths. For example, the group of semiconductor light sources 41 is a light source group having a wavelength peak in the UVA (wavelength 320 nm to 400 nm) region, and the group of semiconductor light sources 42 is a light source group having a wavelength peak in the UVB (wavelength 280 to 320 nm) region. With this configuration, a single ultraviolet therapy device has semiconductor light sources that emit ultraviolet light in two wavelength ranges, and as a result, the light source structure 3B rotates around the patient, allowing different light therapies to be performed using a single ultraviolet therapy device. Second Embodiment 〔composition〕 Next, a second embodiment of the present invention will be described with reference to the drawings, in which Figures 9 and 10 show the second embodiment. The second embodiment differs from the first embodiment and its variations in that it has an imaging device for photographing the affected area of ​​a person inside the housing, and that the movement control and irradiation control of the light source structure are automatically performed by setting the position of the affected area. Below, differences from the first embodiment and its modifications will be described in detail, and overlapping portions will be omitted as appropriate. FIG. 9 is a diagram showing a schematic configuration of an ultraviolet treatment device 102 in the second embodiment. As shown in FIG. 9, an ultraviolet treatment device 102 in the second embodiment has a configuration in which an image capturing device 6 is added to the ultraviolet treatment device 100 in the first embodiment. The imaging device 6 is installed on the ceiling inside the housing 1 and is configured to be able to capture an image of a person inside the housing 1. Although not shown, the ultraviolet treatment device 102 includes a display device in the housing 1 or outside the housing 1 for displaying an image captured by the imaging device 6. For example, a person inside the light source structure 3 in the housing 1 is asked to stand with the affected side facing the imaging device 6, and the affected area is photographed. The imaging device 6 may be provided with a swing mechanism that allows it to swing up and down and left and right, so that its orientation can be controlled by operating an operating device.

[0050] The ultraviolet therapy device 102 allows a doctor to identify the location of an affected area and set the coordinate position of the identified affected area by operating the operation device while viewing a captured image of the patient displayed on the display device, thanks to the function of a program executed by the control unit. Furthermore, the doctor can select an ultraviolet irradiation method by operating the operation device. In the second embodiment, two irradiation methods can be selected: pinpoint irradiation and scanning irradiation. Pinpoint irradiation is an irradiation method in which the semiconductor light source 4 is stopped at a position facing the affected area and irradiates ultraviolet light. This is suitable, for example, for treating a relatively small area of ​​an affected area that can be treated with a single irradiation. On the other hand, scanning irradiation is an irradiation method in which the light source structure 3 is moved within the area of ​​the affected area and irradiates the affected area with ultraviolet light. This is suitable for treating a relatively large area of ​​an affected area that cannot be treated with a single irradiation.

[0051] The ultraviolet treatment device 102 is further capable of automatically treating the affected area by controlling the semiconductor light source 4, the linear movement mechanism, and the rotational movement mechanism based on the set position of the affected area and the selected irradiation method through the function of a program executed by the control unit. [Ultraviolet light treatment] FIG. 10 is a flowchart showing the ultraviolet treatment process. The processor of the control unit starts a control program stored in a predetermined area of ​​the ROM, and executes the ultraviolet treatment process shown in the flowchart of FIG. 10 in accordance with the program. When the ultraviolet treatment process is executed in the processor, the process first proceeds to step S100 as shown in FIG. In step S100, when the position of the affected area is set on the captured image by the doctor's user operating the operation device, this coordinate information is converted into actual coordinates within the housing 1 to set the coordinates of the affected area. Then, the process proceeds to step S102. In step S102, when the doctor operates the operation device to select an ultraviolet irradiation method, the selected irradiation method is set, and then the process proceeds to step S104.

[0052] In step S104, it is determined whether or not a command to start treatment has been issued by the doctor operating the operating device. If it is determined that a command has been issued (Yes), the process proceeds to step S106. If it is determined that a command has not been issued (No), the process repeats the determination process until a command is issued. Note that if a command to cancel treatment has been issued instead of a command to start treatment, the process proceeds to step S100. When the process proceeds to step S106, the linear movement mechanism and the rotational movement mechanism are controlled based on the set coordinate information to move the light source structure 3 to the affected area position, and then the process proceeds to step S108. In step S108, it is determined whether the set irradiation method is pinpoint irradiation or not, and if it is determined that it is pinpoint irradiation (Yes), the process proceeds to step S110, and if it is determined that it is not pinpoint irradiation (No), the process proceeds to step S114.

[0053] When the process proceeds to step S110, the movement of the light source structure 3 is stopped, and the lighting operation of the semiconductor light source 4 is controlled to irradiate the affected area with ultraviolet light. Then, the process proceeds to step S112. Here, the irradiation amount of ultraviolet light in the case of pinpoint irradiation is adjusted by controlling the lighting time of the semiconductor light source 4. Therefore, the control unit is provided with a timer for measuring the irradiation time. The irradiation amount of ultraviolet light may be set in advance or when the irradiation method is selected. In step S112, it is determined whether or not the ultraviolet irradiation for the set irradiation time has been completed. If it is determined that it has been completed (Yes), the series of processes ends; if it is determined that it has not been completed (No), the process proceeds to step S110 and ultraviolet irradiation continues.

[0054] On the other hand, if it is determined that the set irradiation method is not pinpoint irradiation and the process proceeds to step S114, the set irradiation method becomes scan irradiation. Therefore, the control unit controls the semiconductor light source 4, the linear movement mechanism, and the rotational movement mechanism to turn on the semiconductor light source 4 while moving the light source structure 3 so that the irradiation position is located on the affected area. Here, in the case of scan irradiation, the irradiation amount of ultraviolet light is adjusted by controlling the movement speed of the semiconductor light source 4. That is, the movement speed of the semiconductor light source 4 is controlled by controlling the rotational speed, etc., of the electric motor that drives the linear movement mechanism and the rotational movement mechanism. In step S116, it is determined whether ultraviolet irradiation of the entire affected area has been completed. If it is determined that it has been completed (Yes), the series of processes is terminated; if it is determined that it has not been completed (No), the process proceeds to step S114 and scanning irradiation continues. [Effects of the second embodiment] As described above, in the ultraviolet treatment device 102 of the second embodiment, the control unit controls the operation of the semiconductor light source 4, the linear movement mechanism, and the rotational movement mechanism so that the semiconductor light source 4 is moved and turned on while irradiating the affected area.

[0055] With this configuration, ultraviolet light can be irradiated onto a relatively large affected area while moving the irradiation position, which shortens the treatment time compared to a configuration in which irradiation is performed while the irradiation position is stationary. Furthermore, if multiple semiconductor light sources are arranged along the rotational or linear movement direction, variation in irradiation due to movement can be reduced. Moreover, the ultraviolet treatment device 102 of the second embodiment is configured so that the control unit controls the moving speed of the light source structure 3 to adjust the irradiation amount of ultraviolet light irradiated onto the affected area. With this configuration, in a treatment in which ultraviolet light is irradiated while the irradiation position is moved, the amount of ultraviolet light irradiated onto the affected area can be appropriately adjusted.

[0056] In addition, in the ultraviolet therapy device 102 of the second embodiment, the control unit controls the operations of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so that the semiconductor light source 4 is stopped at the affected area and ultraviolet light is irradiated onto the affected area. With this configuration, ultraviolet light can be irradiated with pinpoint accuracy onto an affected area of ​​a size that can be treated with one irradiation.

[0057] Furthermore, in the ultraviolet therapy device 102 of the second embodiment, the control unit controls the amount of ultraviolet light irradiated onto the affected area by controlling the lighting time of the semiconductor light source 4. With this configuration, the amount of ultraviolet light irradiated onto the affected area can be appropriately adjusted in treatment in which ultraviolet light is irradiated while the semiconductor light source 4 is stopped at the irradiation position. In addition, the ultraviolet treatment device 102 of the second embodiment is equipped with an imaging device 6 that captures an image of the person 200 inside the housing 1, and the control unit controls the linear movement and rotational movement of the light source structure 3 based on the captured image data obtained by capturing an image of the person 200 with the imaging device 6.

[0058] With this configuration, the affected area can be easily identified from the captured image data, and after the affected area is identified, the linear and rotational movement of the light source structure 3 can be controlled based on the coordinate information of the identified affected area, and the operation of the semiconductor light source 4 can be controlled to perform ultraviolet treatment automatically. Third Embodiment 〔composition〕 Next, a third embodiment of the present invention will be described with reference to the drawings. Figure 11 shows the third embodiment. The third embodiment differs from the second embodiment in that the imaging device 6 is installed in the light source structure 3, and the position of the affected area is identified by moving the imaging device 6 around the person by moving the light source structure using a linear movement mechanism and a rotational movement mechanism. Below, differences from the second embodiment will be described in detail, and descriptions of overlapping parts will be omitted as appropriate. FIG. 11 is a diagram showing a schematic configuration of an ultraviolet treatment device 103 in the third embodiment.

[0059] 11, an ultraviolet treatment device 103 in the third embodiment has a configuration in which the imaging device 6 in the ultraviolet treatment device 102 in the second embodiment is installed on the light source structure 3 instead of on the ceiling. Specifically, the imaging device 6 is fixed to the upper part of the annular structure 30 of the light source structure 3 in an attitude in which the imaging axis faces inward (toward the center) in the radial direction.

[0060] With this configuration, the imaging device 6 can move linearly in the Y direction and rotationally in the X direction together with the light source structure 3 by the linear movement mechanism and the rotational movement mechanism. That is, while moving the light source structure 3 linearly and rotationally, it is possible to image the human body inside the light source structure 3. This allows the doctor to confirm the position of the affected area while viewing the captured image displayed on the display device, and also to set the position coordinates of the affected area.

[0061] The control unit may be configured to automatically detect the affected area by analyzing the captured image based on preset conditions and automatically set the position coordinates of the detected affected area. However, the automatically detected affected area is subject to final confirmation by a doctor, and treatment is performed on the affected area that has been confirmed by the doctor. [Effects of the third embodiment] As described above, the ultraviolet treatment device 103 of the third embodiment is configured so that the imaging device 6 is fixed to the annular structure 30 in a position in which the imaging axis faces inward in the radial direction.

[0062] With this configuration, the light source structure 3 is moved by the linear movement mechanism and the rotational movement mechanism, so that the imaging device 6 can be moved along the periphery of the human body. As a result, the whole body is photographed by the imaging device 6, and the affected area can be identified based on the photographed image data. In addition, the affected area can be automatically detected based on the photographed image data. [Modification 1 of the third embodiment] 〔composition〕 Next, a first modification of the third embodiment of the present invention will be described with reference to the drawings. Figure 12 is a diagram showing this first modification. The present modified example 1 differs from the third embodiment in that the semiconductor light source includes a swing mechanism. Below, differences from the third embodiment will be described in detail, and descriptions of overlapping parts will be omitted as appropriate. 12(a) to 12(c) are perspective views showing a schematic configuration of a light source structure 3C according to the first modification. As shown in FIGS. 12(a) to 12(c), a light source structure 3C according to the present first modification includes a semiconductor light source 4A instead of the semiconductor light source 4 in the light source structure 3 of the third embodiment.

[0063] Although not shown, the semiconductor light source 4A includes a swing mechanism that swings in the Y direction (hereinafter also referred to as the "up-down direction"). The swing mechanism is driven by an electric motor (not shown). The swing mechanism can be configured, for example, similar to the swing mechanism of a known television camera or the like. The swing mechanism allows ultraviolet light to be irradiated in an up-down and diagonal direction (for example, up to a maximum of 45° up-down). This allows ultraviolet light to be irradiated from a diagonal downward or upward direction to positions that are difficult to irradiate only from the front along the radial direction, such as the top of the head or uneven parts of the human body.

[0064] Furthermore, the oscillating mechanism is connected to the control unit's I / F, and the operation of the oscillating mechanism can be controlled by the control unit. This makes it possible to use the control unit to adjust the irradiation angle appropriately for affected areas that cannot be covered by frontal irradiation alone during ultraviolet therapy. Furthermore, the semiconductor light source 4A may be configured so that it can be swung in any direction by operating an operating device (not shown). The swing mechanism is not limited to a swing mechanism in the Y direction (up and down), and may also include a swing mechanism in the X direction (left and right). [Effects of Modification 1 of the Third Embodiment]

[0065] As described above, in the ultraviolet therapy device 103 according to the first modification of the third embodiment, the light source structure 3C is configured to include a swing mechanism that swings the semiconductor light source 4A up and down. With this configuration, it is possible to irradiate ultraviolet light onto areas (such as the top of the head) that cannot be irradiated by simply moving the semiconductor light source, for example, whose ultraviolet light irradiation direction is fixed to the front, in a linear and rotational direction. [Modification 2 of the third embodiment] 〔composition〕 Next, a second modification of the third embodiment of the present invention will be described with reference to the drawings. Fig. 13 is a diagram showing the second modification. This variant example 2 differs from the above-mentioned third embodiment and its variant examples in that it is equipped with a protrusion mechanism that protrudes the semiconductor light source radially inward of the annular structure and a distance measuring sensor that measures the distance between the semiconductor light source and the affected area, and controls the amount of protrusion of the protrusion mechanism based on the distance between the semiconductor light source and the affected area. Below, differences from the third embodiment and its modifications will be described in detail, and overlapping portions will be omitted as appropriate. As shown in FIGS. 13(a) to 13(c), a light source structure 3D according to the present second modification includes a semiconductor light source 4B instead of the semiconductor light source 4A in the light source structure 3C according to the first modification of the third embodiment. Although not shown, the semiconductor light source 4B includes a protrusion mechanism and a distance measurement sensor.

[0066] The protrusion mechanism is a mechanism that moves the semiconductor light source 4B in a direction that protrudes radially inward from the annular structure 30 of the light source structure 3D and in a direction that retracts from the protruding position. The protrusion mechanism can be configured, for example, with a known linear actuator or a known ball screw actuator. The protrusion mechanism allows at least the light source portion of the semiconductor light source 4B to protrude radially inward from the annular structure 30 and retract from the protruding position. The distance measurement sensor is a sensor that measures the distance between the ultraviolet radiation position of the semiconductor light source 4B and the affected area of ​​a person inside the annular structure 30 of the light source structure 3D. The distance measurement sensor can be configured from a known distance measurement sensor that uses, for example, a laser or ultrasonic wave.

[0067] Furthermore, the protrusion mechanism and the distance measuring sensor are connected to the I / F of the control unit, and the operation of the protrusion mechanism is configured to be controllable by the control unit, and distance information measured by the distance measuring sensor is configured to be input to the control unit. This allows the control unit to control the ultraviolet light irradiation position to an appropriate irradiation position based on the distance information measured by the distance measuring sensor when performing ultraviolet light therapy. [Effects of Modification 2 of the Third Embodiment]

[0068] As described above, the ultraviolet therapy device 103 of the second modification of the third embodiment has the semiconductor light source 4B fixed to the inner periphery of the annular structure 30 so as to irradiate ultraviolet light inward, and the light source structure 3D has a protrusion mechanism that can protrude the semiconductor light source 4B radially inward. Furthermore, the ultraviolet therapy device 103 is provided with a distance measuring sensor that measures the distance from the semiconductor light source 4B to the affected area, and the protrusion amount of the semiconductor light source 4B is controlled based on the distance information measured by the distance measuring sensor. With this configuration, the irradiation distance of the ultraviolet light can be adjusted to an appropriate distance depending on the body shape of the person 200 (thin, fat, etc.). [Other Modifications]

[0069] In the above embodiment and its modified examples, the semiconductor light source is rotated by rotating the annular structure using a rotational movement mechanism, but the present invention is not limited to this configuration. For example, a guide rail may be formed on the inner circumferential surface of the annular structure, motor-driven wheels may be provided on the light source structure, and the semiconductor light source may be rotated along the guide rail. For example, a configuration similar to that of a roller coaster or a monorail may be adopted.

[0070] Furthermore, in the above embodiment and its modified examples, the light source structure is supported by one support column 2, but this configuration is not limited thereto, and the light source structure may be supported by two or more support columns so that it can move linearly and rotationally. For example, by supporting the non-rotating part of the rotational movement mechanism of the light source structure with four support columns, the tilt of the light source structure can be reduced. Furthermore, by increasing the number of drive sources for the linear movement mechanism, it is possible to compensate for power shortages when lifting the light source structure.

[0071] In the above embodiment and its modified examples, the configuration has been described as an example in which two types of semiconductor light source groups each having a different peak wavelength range are arranged as the plurality of semiconductor light sources, but the configuration is not limited to this. For example, a configuration in which three or more types of semiconductor light source groups are arranged may also be used.

[0072] In the above embodiment and its modified examples, the configuration in which 24 semiconductor light sources 41 are arranged at equal intervals along the circumferential direction of the light source structure 3A as the plurality of semiconductor light sources has been described as an example, but the present invention is not limited to this configuration. For example, the number of semiconductor light sources may be less than 24.

[0073] In the above embodiment and its modified examples, the plurality of semiconductor light sources are configured by two groups of semiconductor light sources each having a wavelength range with a different peak wavelength, each group consisting of 12 semiconductor light sources (see FIG. 8), but this configuration is not limited to this. For example, each group may consist of less than 12 semiconductor light sources, or may consist of one semiconductor light source of each type, not limited to groups. Furthermore, in the above embodiment and its variations, the housing 1 is configured to be large enough to accommodate an entire person, but this configuration is not limited thereto, and it may be configured to be large enough to accommodate, for example, a part of the human body, such as the upper body, lower body, one arm, or one leg.

[0074] In the above embodiment and its modified examples, an ultraviolet therapy device configured to perform treatment while a person is standing has been described as an example, but the present invention is not limited to this configuration and may be configured to perform treatment while a person is lying down. A specific example will be described below. Fig. 14 is a diagram showing the schematic configuration of an ultraviolet therapy device 104 according to another modified example.

[0075] As shown in FIG. 14, the ultraviolet therapy device 104 is configured by turning the ultraviolet therapy device 103 of the third embodiment on its side and adding a bed 9 on which a patient can lie. The light source structure 3 of this modification is configured to rotate around the bed 9 and person 200 inside it. A space is formed between the bed 9 and the support 2, and a part of the light source structure 3 is disposed in this space. The bed 9 is made of a material that transmits ultraviolet light, such as synthetic quartz glass. Therefore, as shown in FIG. 14, even if the person 200 is lying face up on the bed 9, the back side can be treated with ultraviolet light.

[0076] In the above embodiment and its modified examples, when the single light sources constituting the semiconductor light source are arranged in an array, a configuration has been described in which the number of single light sources in both the X and Y directions is the same and the light sources are arranged at equal intervals, as shown in Fig. 3(b). This configuration is not limiting, and other arrangements may be used, such as different numbers of single light sources in the X and Y directions or unequal intervals. Specific examples will be described below. Fig. 15(a) is a plan view showing a schematic configuration of a semiconductor light source 4C according to another modified example, and Fig. 15(b) is a plan view showing a schematic configuration of a semiconductor light source 4D according to another modified example.

[0077] As shown in FIG. 15(a), the semiconductor light source 4C according to this modification has a configuration in which a plurality of first single light sources 40a are arranged at equal intervals along a direction (Y direction) perpendicular to the rotational movement direction (X direction). Furthermore, a plurality of second single light sources 40b are arranged at positions adjacent to the positions between the plurality of first single light sources 40a arranged along the Y direction, but offset in the X direction. Here, the first single light sources 40a and the second single light sources 40b are given different reference numerals for convenience of explanation, but they are single light sources with the same configuration. This arrangement is a staggered arrangement suitable for preventing dark areas from occurring at the illumination position when the semiconductor light source 4C is rotated in the X direction.

[0078] 15(b), the semiconductor light source 4D according to this modification has a configuration in which a plurality of first single light sources 40a are arranged at equal intervals along a direction (X direction) perpendicular to the linear movement direction (Y direction). Furthermore, a plurality of second single light sources 40b are arranged at positions adjacent to the positions between the plurality of first single light sources 40a arranged along the X direction, but shifted in the Y direction. This arrangement is a staggered arrangement suitable for preventing dark areas from occurring at the irradiation position when the semiconductor light source 4D is moved linearly in the Y direction. [Explanation of symbols]

[0079] 100-104...ultraviolet treatment device, 1...housing, 2...support, 3, 3A-3D...light source structure, 4, 4A-4D, 41, 42, 410...semiconductor light source, 6...imaging device, 7...substrate, 8...condensing lens, 30...annular structure, 40, 40a, 40b...single light source, 121, 122...optical lens, 200...person

Claims

1. An ultraviolet treatment device that treats an affected area by irradiating it with ultraviolet light, a housing capable of accommodating a person or a part of a person therein; a light source structure including a structure disposed inside the housing and a semiconductor light source installed on the structure for irradiating the affected area with ultraviolet light; a linear movement mechanism that moves the light source structure linearly along a longitudinal direction of the person or a part of the person within the housing; and a rotational movement mechanism that rotates and moves the semiconductor light source installed on the structure around a person or a part of a person.

2. 2. The ultraviolet treatment device according to claim 1, wherein the light source structure is configured so that the semiconductor light source is positioned at least in a portion corresponding to an affected area of ​​the person or part of the person.

3. the structure is an annular structure capable of accommodating a person or a portion of a person therein; the light source structure has a configuration in which the semiconductor light source is fixed to the annular structure, The ultraviolet treatment device of claim 2, characterized in that the rotational movement mechanism rotates the light source structure around an axis whose axis is the center of the annular structure, thereby rotating the semiconductor light source around a part of a person or a part of a person.

4. 4. The ultraviolet treatment device according to claim 3, wherein the light source structure has a plurality of the semiconductor light sources mounted thereon.

5. 5. The ultraviolet treatment device according to claim 4, wherein the plurality of semiconductor light sources are configured as a plurality of groups each having a different peak wavelength.

6. 6. The ultraviolet treatment device according to claim 1, wherein the semiconductor light source is configured by arranging a plurality of single light sources on a substrate.

7. the single light source is an LED (Light Emitting Diode), 7. The ultraviolet treatment device according to claim 6, wherein the semiconductor light source has a plurality of LEDs arranged on the substrate so that the ultraviolet rays emitted from the respective LEDs overlap at the target irradiation position.

8. 6. The ultraviolet treatment device according to claim 4, wherein the light source structure has the plurality of semiconductor light sources arranged along a direction of rotational movement.

9. 6. The ultraviolet treatment device according to claim 4, wherein the light source structure includes a plurality of semiconductor light sources arranged along a direction of linear movement.

10. The ultraviolet treatment device described in claim 4 or 5, characterized in that the light source structure has a plurality of first semiconductor light sources arranged at a predetermined interval along a direction perpendicular to the movement direction of the light source structure, and a plurality of second semiconductor light sources arranged at positions adjacent to the positions between each of the plurality of first semiconductor light sources and shifted in the movement direction.

11. The ultraviolet treatment device of claim 6, characterized in that the semiconductor light source has a first plurality of single light sources arranged along a direction perpendicular to the movement direction of the light source structure, and a second plurality of single light sources arranged at positions adjacent to the positions between each of the first plurality of single light sources and shifted in the movement direction.

12. 6. The ultraviolet treatment device according to claim 1, further comprising a control unit for controlling operations of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism.

13. 13. The ultraviolet treatment device according to claim 12, wherein the control unit controls the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so as to irradiate the affected area with ultraviolet light while moving the semiconductor light source.

14. 14. The ultraviolet treatment device according to claim 13, wherein the control unit controls the moving speed of the light source structure to adjust the amount of ultraviolet light irradiated onto the affected area.

15. The ultraviolet treatment device of claim 12, wherein the control unit controls the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so that the semiconductor light source is stopped at the affected area and ultraviolet light is irradiated to the affected area.

16. 16. The ultraviolet treatment device according to claim 15, wherein the control unit controls the amount of ultraviolet light irradiated onto the affected area by controlling the lighting time of the semiconductor light source.

17. 6. The ultraviolet treatment device according to claim 1, wherein the light source structure includes a swing mechanism for swinging the semiconductor light source up and down.

18. the structure is an annular structure capable of accommodating a person or a portion of a person therein; the light source structure has a configuration in which the semiconductor light source is fixed to the annular structure, the rotational movement mechanism rotates the light source structure around an axis having a center of the annular structure as an axis, thereby rotating the semiconductor light source along a periphery of a person or a part of a person; the semiconductor light source is fixed to an inner periphery of the annular structure so as to irradiate ultraviolet light inward, a protrusion mechanism that allows the semiconductor light source to protrude radially inward; a distance measuring sensor for measuring the distance from the semiconductor light source to the affected area, 6. The ultraviolet treatment device according to claim 3, wherein the control unit controls the protrusion amount of the semiconductor light source based on distance information measured by the distance measuring sensor.

19. an imaging device that captures an image of a person or a part of a person inside the housing; The ultraviolet treatment device of claim 12, wherein the control unit controls the linear movement and rotational movement of the light source structure based on the captured image data obtained by capturing an image of a person or a part of a person with the imaging device.

20. the structure is an annular structure capable of accommodating a person or a portion of a person therein; the light source structure has a configuration in which the semiconductor light source is fixed to the annular structure, the rotational movement mechanism rotates the light source structure around an axis having a center of the annular structure as an axis, thereby rotating the semiconductor light source along a periphery of a person or a part of a person; 20. The ultraviolet treatment device according to claim 19, wherein the imaging device is fixed to the annular structure with an imaging axis directed radially inward.

21. A method for operating an ultraviolet treatment device that treats an affected area by irradiating the affected area with ultraviolet light, comprising: The ultraviolet therapy device includes a light source structure having an annular structure capable of accommodating a person or a portion of a person inside, and a semiconductor light source installed in the annular structure for irradiating an affected area with ultraviolet light; a linear movement mechanism that moves the light source structure linearly along the longitudinal direction of the person or portion of a person; a rotational movement mechanism that moves the semiconductor light source rotationally around the periphery of the person or portion of a person inside the annular structure; and a control unit that controls the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism; A method for operating an ultraviolet treatment device, characterized in that the control unit controls the operation of the semiconductor light source, the linear movement mechanism, and the rotational movement mechanism so as to irradiate the affected area with ultraviolet light while moving the semiconductor light source.

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