Method for producing low chlorine epoxy resin and method for producing chlorine removing agent

Abstract

To relate to a technical field of an epoxy resin, specifically to a method for producing a low chlorine epoxy resin and a method for producing a chlorine removing agent.SOLUTION: A method for producing a low chlorine epoxy resin includes reacting a fluorine-containing tertiary amine-based chlorine removing agent with a chlorine-containing epoxy resin and producing a quaternary ammonium salt compound, then removing the quaternary ammonium salt compound, and obtaining a low chlorine epoxy resin, wherein a mass ratio of the epoxy resin to the fluorine-containing tertiary amine-based chlorine removing agent is 1,000:2 to 8, a structural formula of the fluorine-containing tertiary amine-based chlorine removing agent is represented by chemical formula 1, wherein R1, R2 and R3 are the same or different and represent an alkyl group, carbon chains of R1, R2 and R3 have 1 to 3 carbon atoms, R4 represents a perfluoroalkyl group and has a carbon chain having 4 to 5 carbon atoms, and Y1 represents a sulfonamide group, a sulfonimide group or a phenoxy group.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present application relates to the technical field of epoxy resins, and more particularly to a method for producing a low-chlorine epoxy resin and a method for producing a chlorine scavenger. [Background technology]

[0002] Epoxy resin is a polymeric synthetic material with good adhesion, corrosion resistance, electrical insulation and high strength. It is widely used in fields such as electronic component packaging materials for smart terminals, nonlinear optical materials and electronic component packaging materials for new energy vehicles. In order to ensure the insulation grade and reliability of the electrical properties of the related electronic components, there is a strong demand for increasing the purity of epoxy resin and reducing the total chlorine content in it.

[0003] The total chlorine content is one of the main characteristic indicators of the purity of epoxy resin. The total chlorine in the epoxy resin includes easily hydrolyzable chlorine and hardly hydrolyzable chlorine. The chlorine in epoxy resins releases free chlorine ions under the influence of high temperature, high humidity, and amine-based curing agents. These chlorine ions have a significant impact on the performance of semiconductor components, thereby affecting the safety and service life of packaging materials. As the semiconductor industry develops, the line width of electronic components becomes narrower and narrower, and the impact of material corrosion on the stability of electronic components becomes greater and greater. Therefore, there is an urgent need to develop high-purity, low-chlorine epoxy resins. Summary of the Invention [Problem to be solved by the invention]

[0004] The object of the present invention is to provide a method for producing a low-chlorine epoxy resin and a method for producing a chlorine scavenger, which address the drawback of epoxy resins having a high total chlorine content. The present invention is realized in the following examples. [Means for solving the problem]

[0005] A first aspect of the present invention provides a method for producing a low-chlorine epoxy resin, the method comprising: a fluorine-containing tertiary amine-based chlorine scavenger reacts with a chlorine-containing epoxy resin to produce a quaternary ammonium salt compound, and then the quaternary ammonium salt compound is removed to obtain a low-chlorine epoxy resin; the mass ratio of the epoxy resin to the fluorine-containing tertiary amine-based chlorine remover is 1000:2 to 8; The structural formula of the fluorine-containing tertiary amine-based chlorine remover is: [ka] and In the formula, R1, R2, and R3 are the same or different and represent an alkyl group, the carbon chain of which has 1 to 3 carbon atoms; R4 represents a perfluoroalkyl group and the carbon chain has 4 to 5 carbon atoms; and Y1 represents a sulfonamide group, a sulfonimide group, or a phenoxy group.

[0006] In some embodiments, the reaction scheme in which a fluorine-containing tertiary amine-based chlorine scavenger reacts with a chlorine-containing epoxy resin to produce a quaternary ammonium salt compound is as follows: [ka] and The R5 is [ka] or [ka] Represents.

[0007] In some embodiments, the reaction conditions for the fluorine-containing tertiary amine-based chlorine removal agent to react with the chlorine-containing epoxy resin are grinding in an aqueous phase for 2 to 6 hours, and the reaction temperature is 5 to 25°C.

[0008] In some embodiments, the reaction conditions for the fluorine-containing tertiary amine-based chlorine scavenger to react with the chlorine-containing epoxy resin are 4 hours of grinding in an aqueous phase, and the reaction temperature is 23°C.

[0009] In some embodiments, removing the quaternary ammonium salt compound comprises thoroughly washing with purified water multiple times and filtering.

[0010] In some embodiments, thoroughly washing multiple times with purified water comprises washing with ultrapure water having an electrical resistivity greater than 15 MΩ·cm until the electrical resistivity of the eluate is greater than 10 MΩ·cm.

[0011] A second aspect of the present application provides a method for producing a chlorine removing agent, the chlorine removing agent including a fluorine-containing tertiary amine-based chlorine removing agent, the method comprising: [ka] Including, wherein X1 represents a primary amino group, X2 represents a sulfonyl fluoride group, and Y1 represents a sulfonamide group; When X1 represents a secondary amino group and X2 represents a sulfonyl fluoride group, Y1 represents a sulfonimide group; When X1 represents a phenolic hydroxy group and X2 represents an alkene, Y1 represents a phenoxy group; R1, R2, and R3 are the same or different and represent alkyl groups, and the carbon chains of R1, R2, and R3 have 1 to 3 carbon atoms; R4 represents a perfluoroalkyl group and has a carbon chain with 4 to 5 carbon atoms.

[0012] In some embodiments, the molar ratio of compound I to compound II is 0.9-1.2:1, the reaction temperature is 10-25° C., and the reaction time is 2-4 hours.

[0013] In some embodiments, the molar ratio of compound I to compound II is 1.1:1, the reaction temperature is 25° C., and the reaction time is 2 hours.

[0014] In some embodiments, a carbonate salt is added as an acid-binding agent when the compound I and the compound II are reacted. [Effects of the Invention]

[0015] The beneficial effects of the present invention are as follows: In a first aspect of the present application, a fluorine-containing tertiary amine-based chlorine-scavenging agent reacts with a hydrophobic chlorine-containing epoxy resin to produce a water-soluble quaternary ammonium salt compound, and then the quaternary ammonium salt compound is removed, followed by drying to obtain a high-purity low-chlorine epoxy resin product. Measurements showed that the epoxy resin produced by the method of the present invention had a total chlorine content reduced by 700 ppm to 1000 ppm.

[0016] In the second embodiment of the present application, a fluorine-containing tertiary amine-based chlorine remover is produced by reacting a tertiary amine-based compound I having an active group X1 with a fluorine-containing segment compound II having an active group X2.

[0017] The fluorine-containing tertiary amine chlorine-scavenging agent of the present invention can react with a hydrophobic chlorine-containing epoxy resin to produce a water-soluble quaternary ammonium salt compound, thereby achieving the objective of removing easily hydrolyzable chlorine and hardly hydrolyzable chlorine. Furthermore, the fluorine-containing segment of the fluorine-containing tertiary amine chlorine-scavenging agent can improve the reactivity of the tertiary amine group, making the fluorine-containing tertiary amine chlorine-scavenging agent more reactive with chlorine in the epoxy resin (here, "more reactive" refers to the reactivity compared to that of a tertiary amine that does not contain a fluorine segment). Furthermore, the fluorine-containing segment can reduce the surface tension and interfacial tension of the quaternary ammonium salt compound, improving the water solubility of the quaternary ammonium salt compound, allowing it to be separated and removed more efficiently during filtration.

[0018] The method for producing a low-chlorine epoxy resin and the method for producing a chlorine scavenger of the present invention have a clear reaction mechanism, simple reaction conditions, and easy post-treatment operations, which are advantageous for scaling up production. Furthermore, by adjusting the type and amount of the fluorine-containing tertiary amine-based chlorine remover, it is possible to obtain epoxy resin products with different total chlorine contents. DETAILED DESCRIPTION OF THE INVENTION

[0019] In order to enable those skilled in the art to understand the features and advantages of the present invention, the following general explanations and definitions are provided for terms and expressions used in the specification and claims. Unless otherwise specified, all technical and scientific terms used herein have their ordinary meanings as known to those skilled in the art with respect to the present invention, and in case of conflict, the definitions herein shall control.

[0020] The theories or mechanisms described and disclosed herein, whether true or false, do not limit the scope of the present invention in any way; that is, the present invention can be practiced without being limited to any particular theory or mechanism.

[0021] Any characteristics defined herein in the form of numerical ranges or percentage ranges, such as values, amounts, contents, concentrations, are so specified for ease of description. With this in mind, when a numerical range or percentage range is stated, all possible sub-ranges and individual numerical values ​​(including integers and fractions) within the range are considered to be covered and specifically disclosed.

[0022] For the sake of simplicity, this specification does not describe all possible combinations of each technical feature according to each embodiment or example. Therefore, as long as there is no contradiction in the combination of those technical features, the technical features of each embodiment or example can be combined arbitrarily, and all possible combinations are considered to be included in the description of this specification.

[0023] The present invention will now be further described with reference to specific examples. It should be understood that these examples are illustrative of the invention and are not intended to limit the scope of the invention. Furthermore, it should be understood that those skilled in the art, after reading the teachings of the present invention, can make various changes or modifications to the present invention, and that equivalent forms thereof also fall within the scope defined by the claims of this application.

[0024] The chlorine scavenger provided by the present invention, the preparation of the chlorine scavenger, and the method for preparing a low-chlorine epoxy resin using the chlorine scavenger will be further described below with reference to specific examples.

[0025] In the present invention, a fluorine-containing tertiary amine-based chlorine remover is produced by reacting a tertiary amine-based compound I having an active group X1 with a fluorine-containing segment compound II having an active group X2, and the reaction formula is as follows: [ka] and wherein X1 represents a primary amino group, X2 represents a sulfonyl fluoride group, and Y1 represents a sulfonamide group; When X1 represents a secondary amino group and X2 represents a sulfonyl fluoride group, Y1 represents a sulfonimide group; When X1 represents a phenolic hydroxy group and X2 represents an alkene, Y1 represents a phenoxy group; R1, R2, and R3 are the same or different and represent an alkyl group, the carbon chain of R1, R2, and R3 having 1 to 3 carbon atoms; R4 represents a perfluoroalkyl group and the carbon chain has 4 to 5 carbon atoms; and Y1 represents a sulfonamide group, a sulfonimide group, or a phenoxy group.

[0026] Fluorine-containing tertiary amine chlorine-scavenging agents can react with hydrophobic chlorine-containing epoxy resins to produce water-soluble quaternary ammonium salt compounds, thereby achieving the goal of removing chlorine-containing epoxy resins. Furthermore, the fluorine-containing segments of the fluorine-containing tertiary amine chlorine-scavenging agents can improve the reactivity of the tertiary amine groups, making the fluorine-containing tertiary amine chlorine-scavenging agents more reactive with chlorine in epoxy resins (here, "more reactive" refers to the reactivity of tertiary amines that do not contain fluorine segments). Furthermore, the fluorine-containing segments can reduce the surface and interfacial tension of the quaternary ammonium salt compounds, improving the water solubility of the quaternary ammonium salt compounds, allowing them to be separated and removed more efficiently during filtration.

[0027] Example 1: Synthesis of fluorine-containing tertiary amine-based chlorine removal agent C-1 N,N-dimethyl-1,3-propanediamine (10.7 g, 0.105 mol), perfluorobutanesulfonyl fluoride (30.2 g, 0.1 mol), and 50 mL of toluene as a solvent were added to a 2-L reaction vessel, and potassium carbonate was further added as an acid binder. After reacting for 6 hours at 20°C (the reaction formula is shown below), deionized water was added and the mixture was thoroughly stirred to make it homogenous. Once homogenous, extraction was carried out, the aqueous phase and the organic phase were separated, and the solvent was removed from the organic phase by rotary evaporation, yielding fluorine-containing tertiary amine-based chlorine removal agent C-1. [ka]

[0028] Example 2: Synthesis of fluorine-containing tertiary amine-based chlorine removal agent C-2 N-aminoethylpiperazine (14.1 g, 0.11 mol), perfluorobutanesulfonyl fluoride (30.2 g, 0.1 mol), and 50 mL of toluene as a solvent were added to a 2-liter reaction vessel, and sodium carbonate was then added as an acid binder. After reacting for 2 hours at 25°C, deionized water was added and the mixture was thoroughly stirred to make it homogenous. Once homogenous, extraction was carried out, and the aqueous and organic phases were separated. The solvent was removed from the organic phase by rotary evaporation, yielding fluorine-containing tertiary amine chlorine removal agent C-2. [ka]

[0029] Example 3: Synthesis of fluorine-containing tertiary amine-based chlorine removal agent C-3 A 2-liter reaction vessel was charged with 3-(dimethylamino)phenol (12.3 g, 0.09 mol), perfluoropropene [trimer] (15 g, 0.1 mol), and 50 mL of toluene as a solvent. Potassium carbonate was then added as an acid binder (the reaction formula is shown below). After reacting at 23°C for 4 hours, deionized water was added and the mixture was thoroughly stirred to make it homogenous. Once homogenous, extraction was carried out, the aqueous and organic phases were separated, and the solvent was removed from the organic phase by rotary evaporation, yielding fluorine-containing tertiary amine chlorine removal agent C-3. [ka]

[0030] The chlorine-containing epoxy resin includes easily hydrolyzable chlorine-containing epoxy resin. [ka] and hardly hydrolyzable chlorine-containing epoxy resin [ka] wherein R5 is [ka] or [ka] Represents. The fluorine-containing tertiary amine-based chlorine remover of the present invention can react with both easily hydrolyzable chlorine and hardly hydrolyzable chlorine in epoxy resins, and the reaction formula is shown below. [ka]

[0031] The following examples illustrate the process for producing low-chlorine epoxy resins by reacting a fluorine-containing tertiary amine-based chlorine scavenger with a biphenyldiphenol-type epoxy resin and a bisphenol F-type epoxy resin, respectively. The fluorine-containing tertiary amine-based chlorine-removing agent of the present invention has a similar chlorine-reducing effect on other types of epoxy resins, such as bisphenol A-type epoxy resins, phenol-type epoxy resins, and aliphatic epoxy resins, and the production process can be estimated from the following examples. Therefore, the process for producing a low-chlorine epoxy resin by reacting a fluorine-containing tertiary amine-based chlorine-removing agent with other types of epoxy resins will not be described here.

[0032] In the present application, the total chlorine content is measured according to the method specified in ISO21627-3-2009, the easily hydrolyzable chlorine content is measured according to the method specified in ISO21627-2-2009, and the hardly hydrolyzable chlorine content is the difference between the total chlorine content and the easily hydrolyzable chlorine content.

[0033] Example 4: Preparation of low-chlorine epoxy resin LCE-1 The fluorine-containing tertiary amine-based chlorine removal agent C-1 (2 g) prepared in Example 1 and tetramethylbiphenyldiphenol-type epoxy resin (1000 g, epoxy equivalent 187 g / eq, total chlorine content 1351 ppm, easily hydrolyzable chlorine content 164 ppm, hardly hydrolyzable chlorine content 1187 ppm) were added to a polishing machine, and 500 g of water was added. After polishing and reacting at a reaction temperature of 20°C for 2 hours (the reaction formula is shown below), the solid product was filtered and washed. When the solid product was filtered and washed, it was washed with ultrapure water with a resistivity of more than 15 MΩ cm until the resistivity of the eluate became more than 10 MΩ cm. Finally, the solid product was dried under nitrogen heating, and high-purity tetramethylbiphenyldiphenol-type epoxy resin LCE-1 was obtained in an 85% yield. Measurements showed that the high-purity tetramethylbiphenyldiphenol epoxy resin LCE-1 had an epoxy equivalent of 181 g / eq, a total chlorine content of 651 ppm, an easily hydrolyzable chlorine content of 92 ppm, and a hardly hydrolyzable chlorine content of 286 ppm. [ka] [ka]

[0034] In the formula, R5 is [ka] Represents.

[0035] Example 5: Preparation of low-chlorine epoxy resin LCE-2 The fluorine-containing tertiary amine-based chlorine removal agent C-1 (6 g) prepared in Example 1 and tetramethylbiphenyldiphenol-type epoxy resin (1000 g, epoxy equivalent 187 g / eq, total chlorine content 1351 ppm, easily hydrolyzable chlorine content 164 ppm, hardly hydrolyzable chlorine content 1187 ppm) were added to a polishing machine, 500 g of water was added, and the mixture was polished at a reaction temperature of 20°C for 2 hours. The solid product was then filtered to wash, and the cake was washed with ultrapure water with a resistivity of greater than 15 MΩ cm until the resistivity of the eluate exceeded 10 MΩ cm. Finally, the product was dried under nitrogen heating, yielding a high-purity tetramethylbiphenyldiphenol-type epoxy resin in an 80% yield. Measurements showed that the high-purity tetramethylbiphenyldiphenol-type epoxy resin LCE-2 had an epoxy equivalent of 180 g / eq, a total chlorine content of 251 ppm, an easily hydrolyzable chlorine content of 29 ppm, and a hardly hydrolyzable chlorine content of 222 ppm.

[0036] Example 6: Preparation of low-chlorine epoxy resin LCE-3 The fluorine-containing tertiary amine-based chlorine remover C-2 (8 g) prepared in Example 2 and tetramethylbiphenyldiphenol-type epoxy resin (1000 g, epoxy equivalent 187 g / eq, total chlorine content 1351 ppm, easily hydrolyzable chlorine content 164 ppm, hardly hydrolyzable chlorine content 1187 ppm) were added to a polishing machine, and 500 g of water was added. The mixture was polished at a reaction temperature of 20°C for 2 hours, and then filtered to wash the solid product. The solid product was washed with ultrapure water with a resistivity of greater than 15 MΩ cm until the resistivity of the eluate became greater than 10 MΩ cm. Finally, the product was dried under nitrogen heating, yielding a high-purity tetramethylbiphenyldiphenol-type epoxy resin in an 86% yield. Measurements showed that the high-purity tetramethylbiphenyldiphenol epoxy resin LCE-2 had an epoxy equivalent of 181 g / eq, a total chlorine content of 421 ppm, an easily hydrolyzable chlorine content of 56 ppm, and a hardly hydrolyzable chlorine content of 365 ppm.

[0037] Example 7: Preparation of low-chlorine epoxy resin LCE-4 The fluorine-containing tertiary amine-based chlorine remover C-2 (8 g) prepared in Example 2 and tetramethylbisphenol F epoxy resin (1000 g, epoxy equivalent 195 g / eq, total chlorine content 1257 ppm, easily hydrolyzable chlorine content 186 ppm, hardly hydrolyzable chlorine content 1071 ppm) were added to a polishing machine, and 500 g of water was added. The mixture was polished at a reaction temperature of 20°C for 2 hours, and then filtered to wash the solid product. The solid product was washed with ultrapure water with a resistivity of greater than 15 MΩ cm until the resistivity of the eluate became greater than 10 MΩ cm. Finally, the product was dried under nitrogen heating, yielding high-purity tetramethylbisphenol F epoxy resin in an 89% yield. Measurements showed that the high-purity tetramethylbisphenol F epoxy resin LCE-4 had an epoxy equivalent of 186 g / eq, a total chlorine content of 327 ppm, an easily hydrolyzable chlorine content of 46 ppm, and a hardly hydrolyzable chlorine content of 281 ppm. [ka]

[0038] In the formula, R5 is [ka] Represents.

[0039] (Comparative Example) N-aminoethylpiperazine (0.12 mol, 15.4 g), benzenesulfonyl chloride (0.1 mol, 17.7 g), and 50 mL of toluene as a solvent were added to a 2-liter reaction vessel, and potassium carbonate was then added as an acid binder. After reacting for 2 hours at 25°C, deionized water was added and the mixture was thoroughly stirred to make it homogenous. Once homogenous, extraction was carried out, and the aqueous and organic phases were separated. The solvent was removed from the organic phase by rotary evaporation, yielding tertiary amine chlorine remover C-4.

[0040] The resulting tertiary amine chlorine remover C-4 (8 g) and tetramethylbisphenol F epoxy resin (1000 g, epoxy equivalent 195 g / eq, total chlorine 1257 ppm, easily hydrolyzable chlorine content 186 ppm, difficultly hydrolyzable chlorine content 1071 ppm) were added to a polishing machine, and 500 g of water was added. The mixture was polished at a reaction temperature of 20°C for 2 hours, after which the solid product was filtered and washed. The solid product was then washed with ultrapure water with a resistivity greater than 15 MΩ·cm until the resistivity of the eluate was greater than 10 MΩ·cm. Finally, the product was dried under N2 heating, yielding high-purity tetramethylbisphenol F epoxy resin with a yield of 95%. Measurements showed that the high-purity tetramethylbisphenol F epoxy resin LCE-5 had an epoxy equivalent of 194 g / eq, a total chlorine content of 1123 ppm, an easily hydrolyzable chlorine content of 156 ppm, and a hardly hydrolyzable chlorine content of 967 ppm.

[0041] As can be seen from Examples 4 to 7, the fluorine-containing tertiary amine-based chlorine removal agent of the present invention can react with a fluorine-containing epoxy resin to reduce the total amount of chlorine in the fluorine-containing epoxy resin, of which the contents of both easily hydrolyzable chlorine and hardly hydrolyzable chlorine are reduced. Furthermore, by increasing the amount of the fluorine-containing tertiary amine-based chlorine removal agent used, the objective of improving the chlorine removal effect can be achieved.

[0042] Although the present invention is disclosed above in preferred embodiments, the present invention is not limited thereto. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, and therefore the scope of protection of the present invention is governed by the claims.

Claims

1. A method for producing a low-chlorine epoxy resin, comprising: a fluorine-containing tertiary amine-based chlorine scavenger reacts with a chlorine-containing epoxy resin to produce a quaternary ammonium salt compound, and then the quaternary ammonium salt compound is removed to obtain a low-chlorine epoxy resin; the mass ratio of the epoxy resin to the fluorine-containing tertiary amine-based chlorine remover is 1000:2 to 8; The structural formula of the fluorine-containing tertiary amine-based chlorine remover is: 【Chemistry 1】 and In the formula, R １ , R ２ and R ３ are the same or different and represent an alkyl group, １ , R ２ and R ３ The carbon number in the carbon chain of R is 1 to 3, ４ represents a perfluoroalkyl group having 4 to 5 carbon atoms in the carbon chain; Y １ represents a sulfonamide group, a sulfonimide group, or a phenoxy group.

2. The reaction formula by which a fluorine-containing tertiary amine chlorine remover reacts with a chlorine-containing epoxy resin to produce a quaternary ammonium salt compound is as follows: 【Chemistry 2】 and The R ５ teeth, 【Transformation 3】 or 【Chemistry 4】 The method for producing a low-chlorine epoxy resin according to claim 1, characterized in that

3. 2. The method for producing a low-chlorine epoxy resin according to claim 1, wherein the reaction conditions for the fluorine-containing tertiary amine-based chlorine remover to react with the chlorine-containing epoxy resin are grinding in an aqueous phase for 2 to 6 hours at a reaction temperature of 5 to 25°C.

4. 4. The method for producing a low-chlorine epoxy resin according to claim 3, wherein the reaction conditions for the fluorine-containing tertiary amine-based chlorine remover to react with the chlorine-containing epoxy resin are 4 hours of grinding in an aqueous phase and a reaction temperature of 23°C.

5. 2. The method for producing a low-chlorine epoxy resin according to claim 1, wherein the removing of the quaternary ammonium salt compound comprises thoroughly washing with pure water multiple times and filtering.

6. 6. The method for producing a low-chlorine epoxy resin according to claim 5, wherein the step of thoroughly washing the epoxy resin multiple times with pure water includes washing the epoxy resin with ultrapure water having a resistivity of more than 15 MΩ cm until the resistivity of the eluate becomes more than 10 MΩ cm.

7. A method for producing a chlorine remover, comprising: The chlorine removing agent includes a fluorine-containing tertiary amine-based chlorine removing agent, The manufacturing method includes: 【Transformation 5】 Including, Here, X １ represents a primary amino group, and X ２ represents a sulfonyl fluoride group, Y １ represents a sulfonamide group, The X １ represents a secondary amino group, ２ represents a sulfonyl fluoride group, １ represents a sulfonimide group, The X １ represents a phenolic hydroxy group, ２ represents an alkene, １ represents a phenoxy group, R １ , R ２ and R ３ are the same or different and represent an alkyl group, １ , R ２ and R ３ The carbon number in the carbon chain of R is 1 to 3, ４ represents a perfluoroalkyl group and has 4 to 5 carbon atoms in the carbon chain.

8. The method for producing a chlorine remover according to claim 7, wherein the molar ratio of compound I to compound II is 0.9 to 1.2:1, the reaction temperature is 10 to 25°C, and the reaction time is 2 to 4 hours.

9. 9. The method for producing a chlorine remover according to claim 8, wherein the molar ratio of compound I to compound II is 1.1:1, the reaction temperature is 25°C, and the reaction time is 2 hours.

10. 8. The method for producing a chlorine remover according to claim 7, wherein a carbonate is added as an acid binder when the compound I and the compound II are reacted.

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