Exposure device

Abstract

To provide an exposure device capable of accurately forming an exposure pattern on one or both of surfaces of a substrate while enabling continuous drawing of an exposure pattern.SOLUTION: An exposure device 1 includes a first exposure unit 30 arranged opposite an exposure part WR between a substrate feeding roll 15 and a substrate winding roll 16. An air injection mechanism 40 is composed of a first air injection unit 41 and a second air injection unit 42 arranged respectively on front and rear sides of the exposure part WR, including an exposure surface WS. The first air injection unit 41 and the second air injection unit 42 have light beam passing holes 46, 47, 48 which are arranged across a space S1 relative to the exposure surface WS and can pass light beams L1, L2, L3 emitted from the first exposure unit 30. The air injection mechanism 40 injects air from front and rear surface sides of a substrate W1. This can secure the flatness of the exposure part WR and enables an exposure pattern to be formed with high accuracy.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an exposure apparatus. [Background technology]

[0002] There is known an exposure device that can vertically transport a photosensitive film (corresponding to a substrate) to be exposed and irradiate both the front and back sides of the photosensitive film with exposure light to form an exposure pattern. Some such exposure devices have an air supply source that discharges air from above the vertical movement area (corresponding to an exposure section) of the photosensitive film, and an air suction source below that sucks in air sent from the air supply source. The air supply source and the air suction source form so-called air curtains along the front and back sides of the photosensitive film (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-34846 Summary of the Invention [Problem to be solved by the invention]

[0004] The exposure device described in Patent Document 1 forms air curtains along the front and back surfaces of the photosensitive film. The purpose of providing the air curtains is to remove dust adhering to the photosensitive film. However, when exposing the photosensitive film while moving the substrate vertically, it is not possible to hold the substrate by suction on a stage or the like during the exposure process. Therefore, it is difficult to maintain the flatness of the photosensitive film in the vertical movement area, resulting in the inability to form an accurate exposure pattern. Furthermore, although the exposure device described in Patent Document 1 is equipped with air curtains, the air flow can cause the photosensitive film to ripple. While the air flow can be stopped during the exposure process, this may cause the photosensitive film to lose flatness in the vertical movement area, which also poses the problem of inability to form an accurate exposure pattern.

[0005] Furthermore, this exposure device uses a photomask and draws (forms an exposure pattern) by intermittently feeding the photosensitive film, so it cannot be adapted to an exposure device that draws continuously while feeding the photosensitive film.

[0006] Therefore, the present invention has been made to solve these problems, and aims to provide an exposure apparatus that is capable of forming exposure patterns with high precision on one or both sides of a substrate while enabling continuous drawing of exposure patterns. [Means for solving the problem]

[0007] [1] The exposure device of the present invention is an exposure device that scans a light beam to form an exposure pattern on an exposure surface of a substrate, and is characterized in that it comprises an exposure unit that is arranged at a position facing the exposure surface between a substrate feed roll and a substrate take-up roll, and an air injection mechanism that is arranged on both the front and back sides of an exposure section that includes the exposure surface and includes a first air injection unit and a second air injection unit that inject air toward the substrate, and the first air injection unit and the second air injection unit are arranged with a space between them and the exposure section, and have a light beam passing hole that can pass the light beam irradiated from the exposure unit.

[0008] [2] In the exposure apparatus of the present invention, it is preferable that the exposure apparatus further has an actuator that adjusts the distance between the first air injection unit and the second air injection unit, and the distance between the substrate and the first air injection unit and the second air injection unit is determined by the pressure of the air injected by the first air injection unit and the second air injection unit onto the substrate and the positioning operation of the actuator.

[0009] [3] In the exposure apparatus of the present invention, it is preferable that the first air injection unit and the second air injection unit are composed of an air injection plate and a support member that supports the air injection plate, and have an air supply space formed between the air injection plate and the support member, and a compressed air supply hole that communicates with the air supply space.

[0010] [4] In the exposure apparatus of the present invention, it is preferable that a sealing material having high light transmittance is embedded in the light beam passing hole.

[0011] [5] In the exposure apparatus of the present invention, it is preferable that the substrate has the exposure surface on either the front or back side, and the exposure unit arranged opposite the exposure surface has an exposure head adjustment means that can adjust the distance between the exposure head and the exposure surface.

[0012] [6] In the exposure device of the present invention, it is preferable that the substrate has the exposure surface on both the front and back sides, the exposure unit is positioned opposite the exposure surface, and the exposure unit positioned opposite the exposure surface that is on the outside when the substrate is wound around the substrate feed roll has an exposure head adjustment means that can adjust the distance between the exposure head and the exposure surface. [Effects of the Invention]

[0013] The exposure apparatus has an air injection mechanism including an exposure unit disposed at a position facing the exposure surface of the substrate, and a first air injection unit and a second air injection unit disposed on both sides of the exposure portion of the substrate with a space therebetween. The first air injection unit and the second air injection unit inject air toward the exposure portion from both the front and back sides. This ensures the flatness of the exposure portion, making it possible to form (draw) exposure patterns continuously and with high precision. The exposure apparatus can arrange exposure units facing the exposure surfaces on the front and back sides of the substrate, respectively. By arranging the exposure units in this manner, it becomes possible to simultaneously form exposure patterns on both the front and back sides of the substrate.

[0014] As described above, the exposure apparatus of the present invention makes it possible to form exposure patterns on one or both sides of a substrate with high precision while enabling continuous drawing of exposure patterns. [Brief explanation of the drawings]

[0015] [Figure 1] 1 is a front view showing an example of the configuration of an exposure apparatus 1. FIG. [Figure 2] FIG. 2 is an explanatory diagram schematically showing the configuration of a first exposure unit 30. [Figure 3] FIG. 2 is a perspective view showing an example of the configuration of an air injection mechanism 40. [Figure 4] 4 is a cross-sectional view showing the air injection mechanism 40 taken along the line AA in FIG. 3. [Figure 5] 4 is an explanatory diagram illustrating the operation of the first air injection unit 41 and the second air injection unit 42. FIG. [Figure 6] FIG. 2 is a front view showing the configuration of an exposure device 2 capable of simultaneous double-sided exposure. [Figure 7] FIG. 2 is an explanatory diagram schematically showing the configuration of a second exposure unit 60. DETAILED DESCRIPTION OF THE INVENTION

[0016] Hereinafter, exposure apparatuses 1 and 2 according to embodiments of the present invention will be described with reference to Figures 1 to 7. Note that the embodiments described below do not limit the invention according to the claims. Furthermore, not all of the elements and combinations thereof described in each embodiment are necessarily essential to the solution of the present invention.

[0017] (Configuration of exposure apparatus 1) FIG. 1 is a front view showing one configuration example of an exposure apparatus 1. In each figure described below, the left-right direction when viewing the exposure apparatus 1 from the front is the X direction, the depth direction of the paper (the width direction of the substrate W1) is the Y direction, and the direction perpendicular to the XY plane (i.e., the vertical direction) is the Z direction or up-down direction. The exposure apparatus 1 has a substrate transport mechanism 11 that uses a so-called roll-to-roll system. The substrate W1 shown in FIG. 1 is a long film with a photosensitive layer such as resist (not shown) formed on one side.

[0018] The substrate transport mechanism 11 has a substrate feed roll 15 and a substrate take-up roll 16 arranged vertically and spaced apart. The substrate transport mechanism 11 is configured with a guide roller 17, a transport roller 18, a guide roller 19, and a substrate take-up roll 16 arranged in this order from the substrate feed roll 15 side. The substrate W1 is transported vertically downward by the guide roller 17 and the transport roller 18. The range of the substrate W1 transported vertically between the guide roller 17 and the transport roller 18 is defined as a vertical plane portion W1a. The vertical plane portion W1a includes areas before and after the position scanned by the light beams L1 to L3 (see FIG. 2) in the substrate transport direction. The substrate feed roll 15, the transport roller 18, and the substrate take-up roll 16 each have a drive motor (not shown). The guide roller 17 and the transport roller 18 apply tension to the substrate W1 to a degree that does not cause stretching. The transport direction of the substrate W1 is indicated by an arrow.

[0019] The exposure apparatus 1 has a first exposure unit 30 arranged opposite one surface of the vertical flat surface W1a. The first exposure unit 30 is made up of exposure heads 31 and 32 arranged side by side at the same height in the Y direction, and an exposure head 33 arranged above the exposure heads 31 and 32. The configuration of the first exposure unit 30 will be described with reference to FIG. 2.

[0020] Although not shown, the exposure heads 31, 32, and 33 each comprise an exposure optical system including a light source, a polygon mirror, and an fθ lens. The exposure heads 31, 32, and 33 scan light beams L1 to L3, which are exposure light, in the Y direction and irradiate an exposure surface WS (see FIG. 1), which is the exposure target surface on which a photosensitive layer is formed on the vertical flat surface W1a of the substrate W1 (see FIG. 2). The first exposure unit 30 can form any exposure pattern (not shown) by appropriately adjusting the scanning speed and scanning range of the light beams L1 to L3 and the transport speed of the substrate W1.

[0021] The exposure apparatus 1 also has an exposure head adjustment means 35 that can move the first exposure unit 30 back and forth in the vertical direction toward the exposure surface WS. The exposure head adjustment means 35 is made up of an X-axis movement mechanism 36 and a drive motor 37. The exposure head adjustment means 35 adjusts the focal length of the exposure heads 31, 32, and 33 relative to the exposure surface WS on the vertical plane portion W1a so that it is optimal. The exposure head adjustment means 35 is disposed on the upper table 22 of the stand 21.

[0022] The exposure apparatus 1 has an air injection mechanism 40 that is disposed on the front side of the vertical flat portion W1a of the substrate W1 and that injects air vertically toward both the back and rear surfaces of the vertical flat portion W1a. The air injection mechanism 40 is composed of a first air injection unit 41 that is disposed between the vertical flat portion W1a and the first exposure unit 30, and a second air injection unit 42 that is disposed facing the first air injection unit 41 across the vertical flat portion W1a. The first air injection unit 41 and the second air injection unit 42 are disposed in positions that do not contact the substrate W1. The air injection mechanism 40 is provided to ensure the flatness of the vertical flat portion W1a. The configuration of the air injection mechanism 40 will be described in detail with reference to FIGS. 3 and 4.

[0023] FIG. 1 shows an example in which the exposure surface WS is located on the surface on the X(+) side of the vertical flat surface W1a. However, the exposure apparatus 1 can also be applied to cases in which the exposure surface WS is located on the surface on the X(-) side of the vertical flat surface W1a. In such a case, the first exposure unit 30 is positioned on the X(-) side of the vertical flat surface W1a in a position that allows it to irradiate light beams L1 to L3 (see FIG. 2(b), but facing in opposite directions) toward the exposure surface WS (in brackets). In a configuration in which the first exposure unit 30 is positioned on the X(-) side of the vertical flat surface W1a, the surface position of the exposure surface WS is determined by the guide rollers 17 and the transport rollers 18 regardless of the thickness of the substrate W1, so the exposure head adjustment means 35 can be omitted.

[0024] 2 is an explanatory diagram showing a schematic configuration of the first exposure unit 30. FIG. 2(a) is a front view of the first exposure unit 30 seen from the vertical plane portion W1a side (see FIG. 1), and FIG. 2(b) is a plan view showing the exposure situation of the first exposure unit 30 seen from above. FIG. 2(c) shows an example of the formation of exposure lines LS1, LS2, and LS3 by the first exposure unit 30. As shown in FIG. 2(a), the first exposure unit 30 is made up of exposure heads 31 and 32 arranged side by side at the same height in the Y direction, and exposure head 33 arranged above and between exposure heads 31 and 32.

[0025] As shown in FIG. 2(b), the air injection mechanism 40 is composed of a first air injection unit 41 and a second air injection unit 42 arranged to face the first air injection unit 41 across the vertical flat surface W1a. A space S1 is provided between the first air injection unit 41 and the second air injection unit 42, allowing the substrate W1 to pass through. The exposure head 31 irradiates the vertical flat surface W1a with a light beam L1, scanning it horizontally in the Y direction. The exposure head 32 irradiates the vertical flat surface W1a with a light beam L2, scanning it horizontally in the Y direction. The exposure head 33 irradiates the vertical flat surface W1a with a light beam L3, scanning it horizontally in the Y direction.

[0026] Next, the formation of an exposure pattern by the exposure device 1 will be described with reference to Figures 2(b) and 2(c). The exposure head 31 forms an exposure line LS1 on the exposure surface WS on which a photosensitive layer has been formed by scanning with a light beam L1. The exposure head 32 forms an exposure line LS2 by scanning with a light beam L2. The exposure head 33 forms an exposure line LS3 by scanning with a light beam L3. The exposure lines LS1, LS2, and LS3 are made to slightly overlap in the Y direction (width direction), and any exposure pattern can be formed by appropriately adjusting the substrate transport speed, light beam scanning speed, and scanning range.

[0027] 1 and 2 are examples in which the first exposure unit 30 is configured with exposure heads 31, 32, and 33, but the configuration of the exposure heads is not limited to this. For example, a configuration of exposure heads 31 and 32 is possible, and by arranging the exposure lines LS1 and LS2 so that they partially overlap, any desired exposure pattern can be formed. In a similar way, a combination of exposure heads 31 and 33, or a combination of exposure heads 32 and 33, or any of exposure heads 31, 32, and 33 alone is also possible as long as a sufficient scanning range is ensured.

[0028] When the area including the exposure lines LS1 to LS3 is defined as the exposure unit WR, at least the exposure unit WR must maintain verticality and flatness. The verticality is determined by the guide rollers 17 and the transport rollers 18 (see FIG. 1). Therefore, an air injection mechanism 40 is provided to maintain the flatness of the exposure unit WR. The air injection mechanism 40 constitutes a so-called air clamp. Next, the configuration of the air injection mechanism 40 will be described with reference to FIGS. 3 and 4.

[0029] 3 is a perspective view showing one configuration example of the air injection mechanism 40. The air injection mechanism 40 is composed of a first air injection unit 41 and a second air injection unit 42 arranged to face the first air injection unit 41 with the substrate W1 in between. A space S1 is provided between the first air injection unit 41 and the second air injection unit 42, allowing the substrate W1 to be transported. The first air injection unit 41 and the second air injection unit 42 are configured so that they can move toward or away from each other. In other words, the first air injection unit 41 and the second air injection unit 42 can change the distances D1, D2 (see FIG. 4) between them and the substrate W1.

[0030] The first air spray unit 41 is equipped with actuators 43. The actuators 43 are arranged at two diagonal corners of the first air spray unit 41. The actuators 43 are air cylinders or robo-cylinders (for example, electric cylinders). The actuators 43 have a rod 44 that can move forward and backward, and the tip of the rod 44 is fixed to the second air spray unit 42. By driving the two actuators 43, the rod 44 moves forward and backward, and the distances D1 and D2 (see FIG. 4) between the first air spray unit 41 and the second air spray unit 42 can be changed.

[0031] The first air injection unit 41 has a guide post 45 that stands upright toward the second air injection unit 42 at a position away from the rod 44. The guide post 45 penetrates the second air injection unit 42. By providing the guide post 45, the first air injection unit 41 can be advanced and retreated while maintaining parallelism with high precision relative to the second air injection unit 42. The second air injection unit 42 can be provided with an actuator 43 instead of the guide post 45. In such a configuration, the four actuators 43 are driven at the same time.

[0032] 3, the first air injection unit 41 has light beam passing holes 46, 47, and 48 through which pass the light beams L1, L2, and L3 (see FIG. 2) emitted by the first exposure unit 30. The light beam passing hole 46 has a size and shape that includes the scanning range of the light beam L1, the light beam passing hole 47 has a size and shape that includes the scanning range of the light beam L2, and the light beam passing hole 48 has a size and shape that includes the scanning range of the light beam L3.

[0033] FIG. 4 is a cross-sectional view showing the air injection mechanism 40 taken along the line AA in FIG. 3. Note that FIG. 4 does not show the actuator 43 and the guide post 45. The first air injection unit 41 is composed of a support member 50 and an air injection plate 51 arranged on the substrate W1 side of the support member 50. The support member 50 has a recess 50b surrounded by a peripheral wall portion 50a. The air injection plate 51 is attached inside this recess 50b. The support member 50 has light beam passing holes 46, 47, and 48 that allow the light beams L1, L2, and L3 to pass therethrough (see also FIG. 3). The light beam passing holes 46, 47, and 48 pass through the air injection plate 51. The air injection plate 51 is large enough to cover the exposure section WR (see FIG. 2(c)).

[0034] Protrusions 50d, 50e, and 50f are formed inside the recess 50b, extending from the recess bottom surface 50c to the air injection plate 51. The protrusion 50d protrudes to the periphery of the light beam passing hole 46. The protrusion 50e protrudes to the periphery of the light beam passing hole 47. The protrusion 50f protrudes to the periphery of the light beam passing hole 48. Inside the recess 50b, the air injection plate 51 is fixed to the inner surface of the peripheral wall 50a while abutting against the tips of the protrusions 50d, 50e, and 50f, making the inside of the recess 50b airtight. The recess 50b sealed with the air injection plate 51 becomes an air supply space for supplying compressed air.

[0035] The support member 50 has compressed air supply holes 52 that connect the recess 50b to the outside and supply compressed air to the inside of the recess 50b. The compressed air supply holes 52 are connected to a compressed air supply device (not shown). The air injection plate 51 also has a number of air injection holes (not shown) that can inject the supplied compressed air toward the substrate W1. The air injection holes are arranged approximately evenly across the entire air injection plate 51. The air injection plate 51 may be, for example, a porous ceramic plate, or may be a plate material having a number of small-diameter holes penetrating in the thickness direction or a number of slit-shaped holes penetrating in the thickness direction. The air injected from the air injection plate 51 is sprayed across the entire surface of the exposure unit WR (see FIG. 2(c)) at the same air pressure across the entire air injection plate 51.

[0036] The second air injection unit 42 can have the same configuration as the first air injection unit 41, so explanation of each component will be omitted, and components necessary for explanation will be assigned the same reference numerals as the first air injection unit 41. However, the second air injection unit 42 is disposed with its air injection plate 51 facing the substrate W1. In other words, the first air injection unit 41 and the second air injection unit 42 are disposed symmetrically with the substrate W1 in between. Here, it is preferable that the distance D1 between the first air injection unit 41 and the substrate W1 and the distance D2 between the second air injection unit 42 and the substrate W1 are adjusted to be the same. However, as long as the air injection pressure sprayed by the first air injection unit 41 onto the substrate W1 and the air injection pressure sprayed by the second air injection unit 42 onto the substrate W1 are the same, the distance D1 and the distance D2 do not necessarily have to be the same.

[0037] A sealant 55, such as glass with high light transmittance, is embedded in the light beam passing holes 46, 47, and 48. The sealant 55 is preferably positioned flush with the outer surface 51a of the air injection plate 51. When compressed air is supplied to the recess 50b, the inside of the light beam passing holes 46, 47, and 48 may become negative pressure relative to the surroundings. This may cause the substrate W1 to wobble and lose its flatness if the substrate W1 is a film having a thickness of several tens of micrometers. However, by providing the sealant 55, the light beam passing holes 46, 47, and 48 do not become negative pressure relative to the space S1, preventing the substrate W1 from wobbling and maintaining the flatness of the substrate W1. Next, the operation of the first air injection unit 41 and the second air injection unit 42 will be described with reference to FIG. 5.

[0038] 5 is an explanatory diagram illustrating the operation of the first air spray unit 41 and the second air spray unit 42. Note that FIG. 5 shows a simplified configuration of the first air spray unit 41 and the second air spray unit 42. First, as shown in FIG. 5(a), the actuator 43 moves the first air spray unit 41 and the second air spray unit 42 to a position where they come into contact with the substrate W1. This determines the initial relative positions of the first air spray unit 41 and the second air spray unit 42 and the substrate W1. During this operation, the first air spray unit 41 and the second air spray unit 42 do not press against the substrate W1.

[0039] Next, as shown in FIG. 5(b), air at the same pressure P1 is supplied to the first air spray unit 41 and the second air spray unit 42 from the compressed air supply holes 52. Air is then sprayed from the air spray plate 51 onto both the front and back surfaces of the substrate W1, and the reaction force of the pressure P1 causes the first air spray unit 41 and the second air spray unit 42 to move away from the substrate W1 (indicated by the thick dotted arrows in the figure). The actuator 43 moves the rod 44 a predetermined distance in accordance with the movement of the first air spray unit 41 and the second air spray unit 42 due to the air pressure. This determines the distances D1 and D2 between the substrate W1 and the first air spray unit 41 and the second air spray unit 42. The first air spray unit 41 and the second air spray unit 42 can spray the same air pressure onto the substrate W1, which makes it possible to maintain the flatness of the exposure section WR (see FIG. 2).

[0040] The exposure apparatus 1 described above forms an exposure pattern (not shown) on a substrate W1 having an exposure surface WS on either the front or back side. As described in FIG. 1, the exposure apparatus 1 is configured so that the first exposure unit 30 can be disposed on the X(+) side or the X(-) side with respect to the exposure portion WR of the substrate W1. However, by adding a second exposure unit 60, the exposure apparatus 1 can be configured as a double-sided exposure apparatus that can simultaneously form the same or different exposure patterns on both the front and back sides of the substrate W1. This will be described with reference to FIGS. 6 and 7.

[0041] FIG. 6 is a front view showing the configuration of an exposure apparatus 2 capable of simultaneous double-sided exposure. The exposure apparatus 2 is the same as the exposure apparatus 1 described above, with a second exposure unit 60 added. Therefore, in FIG. 5, parts common to the exposure apparatus 1 are given the same reference numerals as in FIG. 1, and the first exposure unit 30, substrate transport mechanism 11, and air injection mechanism 40 provided in the exposure apparatus 1 can also be used in the exposure apparatus 2, so their description will be omitted here. The second exposure unit 60 is composed of exposure heads 61 and 62 arranged side by side at the same height in the Y direction, and an exposure head 63 located above and between the exposure heads 61 and 62. The configuration of the second exposure unit 60 will be described with reference to FIG. 6.

[0042] Although not shown, the exposure heads 61, 62, and 63 each include an exposure optical system including a light source, a polygon mirror, and an fθ lens. Each of the exposure heads scans light beams L4, L5, and L6 horizontally in the Y direction on the exposure surface WS2 on the back side of the vertical flat portion W1a of the substrate W1, where the photosensitive layer is formed (see FIG. 6). The second exposure unit 60 can form any exposure pattern (not shown) by appropriately adjusting the scanning speed and scanning range of the light beams L4, L5, and L6 and the transport speed of the substrate W1. Therefore, the second exposure unit 60 can have a common configuration with the first exposure unit 30. The second exposure unit 60 can also be a fixed type without the exposure head adjustment means 35.

[0043] Fig. 7 is an explanatory diagram showing a schematic configuration of the second exposure unit 60. Fig. 6(a) is a front view of the second exposure unit 60 seen from the vertical plane portion W1a side (see Fig. 5), and Fig. 6(b) is a plan view showing the exposure situation of the first exposure unit 30 and the second exposure unit 60 seen from above. Fig. 6(c) shows an example of the formation of exposure lines LS4, LS5, and LS6 by the second exposure unit 60. As shown in Fig. 6(a), the second exposure unit 60 is made up of exposure heads 61 and 62 arranged side by side at the same height in the Y direction, and an exposure head 63 arranged above and between the exposure heads 61 and 62.

[0044] As shown in FIG. 6(b), the air injection mechanism 40 is composed of a first air injection unit 41 and a second air injection unit 42 arranged to face the first air injection unit 41 across the vertical flat surface W1a. A space S1 is provided between the first air injection unit 41 and the second air injection unit 42, allowing the substrate W1 to pass through. The exposure head 61 irradiates the exposure surface WS2 with a light beam L4, scanning it horizontally in the Y direction. The exposure head 62 irradiates the exposure surface WS2 with a light beam L5, scanning it horizontally in the Y direction. The exposure head 63 irradiates the exposure surface WS2 with a light beam L6, scanning it horizontally in the Y direction. The exposure surface WS2 is the back side when the exposure surface WS shown in FIG. 5 is the front side.

[0045] Next, the formation of an exposure pattern by the exposure device 2 will be described with reference to Figures 6(b) and 6(c). The exposure head 61 forms an exposure line LS4 on the exposure surface WS2 on which a photosensitive layer has been formed by scanning with a light beam L4. The exposure head 62 forms an exposure line LS5 by scanning with a light beam L5. The exposure head 63 forms an exposure line LS6 by scanning with a light beam L6. The exposure lines LS4, LS5, and LS6 are made to overlap slightly in the Y direction (width direction), and any desired exposure pattern can be formed by appropriately adjusting the substrate transport speed and light beam scanning speed.

[0046] The light beams L4, L5, and L6 pass through light beam passing holes 46, 47, and 47 (see FIG. 4) provided in the second air injection unit 42. Specifically, the light beam L4 passes through the light beam passing hole 46 provided in the second air injection unit 42, and the light beam L5 passes through the light beam passing hole 47 provided in the second air injection unit 42. Furthermore, the light beam L6 passes through the light beam passing hole 48 provided in the second air injection unit 42.

[0047] The exposure apparatus 1 has an air injection mechanism 40 consisting of a first exposure unit 30 arranged opposite the exposure surface WS, and a first air injection unit 41 and a second air injection unit 42 arranged on both the front and back sides of the exposure section WR of the substrate W1. The first air injection unit 41 and the second air injection unit 42 inject air from both sides of the exposure section WR of the substrate W1 toward the exposure section WR. This ensures the planarity of the exposure section WR and makes it possible to form an exposure pattern with high precision. The exposure apparatus 1 makes it possible to form (draw) an exposure pattern on the exposure surface WS on either the front or back side of the substrate W1.

[0048] The exposure apparatus 2 has a first exposure unit 30 and a second exposure unit 60 arranged on both the front and back sides of the exposure section WR. The first exposure unit 30 forms an exposure pattern on the exposure surface WS, and the second exposure unit 60 forms an exposure pattern on the exposure surface WS2. The exposure apparatus 2 is equipped with an air injection mechanism 40, which ensures the planarity of the exposure section WR and enables the exposure patterns to be formed (drawn) with high precision on the exposure surfaces WS and WS2 provided on both the front and back sides of the substrate W1.

[0049] The distances D1, D2 between the substrate W1 and the first air spraying unit 41 and the second air spraying unit 42 are determined by moving the rod 44 a predetermined distance in accordance with the positioning operation that is performed by the reaction force of the air pressure P1 sprayed onto the substrate W1 by the first air spraying unit 41 and the second air spraying unit 42, and the air pressure of the first air spraying unit 41 and the second air spraying unit 42. In this way, it is possible to make the air pressure (pressure P1) sprayed onto the substrate W1 by the first air spraying unit 41 and the second air spraying unit 42 the same, thereby maintaining the flatness of the exposure part WR (see FIG. 2).

[0050] The first air injection unit 41 and the second air injection unit 42 are each composed of an air injection plate 51 and a support member 50 that supports the air injection plate 51. The support member 50 has a recess 50b that serves as an air supply space when the air injection plate 51 is attached. The air injection plate 51 may be, for example, a porous ceramic plate, or may be a plate material having a large number of small-diameter holes that penetrate through the thickness direction, or a large number of slit-shaped holes that penetrate through the thickness direction. The air injected from such an air injection plate 51 has the same pressure throughout the entire air injection plate 51, making it possible to maintain the flatness of the exposure unit WR.

[0051] The first air spraying unit 41 and the second air spraying unit 42 have light beam passing holes 46, 47, 48, and a sealing material 55 such as glass having high light transmittance is embedded in the light beam passing holes 46, 47, 48. By embedding the sealing material 55 in the light beam passing holes 46, 47, 48, the light beam passing holes 46, 47, 48 do not become negative pressure relative to the space S1 between the first air spraying unit 41 and the second air spraying unit 42 through which air is injected, which makes it possible to prevent shaking of the substrate W1 and maintain flatness.

[0052] The exposure apparatus 1 has a first exposure unit 30 disposed opposite the exposure surface WS. The first exposure unit 30 has an exposure head adjustment means 35 that moves the exposure heads 31, 32, and 33 toward and away from the exposure surface WS. By providing the exposure head adjustment means 35, the exposure apparatus 1 can appropriately adjust the focal lengths (spot diameters) of the light beams L1, L2, and L3 that are irradiated onto the exposure surface WS, thereby enabling the exposure pattern to be formed (drawn) with high precision.

[0053] The exposure apparatus 2 has a first exposure unit 30 arranged facing the exposure surface WS, and a second exposure unit 60 arranged facing an exposure surface WS2 on the back side of the exposure surface WS. The exposure apparatus 2 configured in this manner can simultaneously form exposure patterns on both the front and back sides of the substrate W1. Furthermore, the first exposure unit 30 has an exposure head adjustment means 35, which allows appropriate adjustment of the focal length (spot diameter) of the light beams L1, L2, and L3 irradiated onto the exposure surface WS, making it possible to form (draw) the exposure patterns with high precision. In the exposure apparatus 2, driving either the first exposure unit 30 or the second exposure unit 60 makes it possible to form an exposure pattern on one side of the substrate W1. [Explanation of symbols]

[0054] 1, 2... exposure device, 15... substrate feed roll, 16... substrate take-up roll, 30... first exposure unit, 31, 32, 33, 61, 62, 63... exposure head, 35... exposure head adjustment means, 40... air injection mechanism, 41... first air injection unit, 42... second air injection unit, 43... actuator, 46, 47, 48... light beam passage hole, 50... support member, 51... air injection plate, 52... compressed air supply hole, 55... sealant, 60... second exposure unit, D1, D2... distance, L1 to L6... light beam, P1... pressure, S1... space, W1... substrate, WR... exposure section, WS, WS2... exposure surface

Claims

1. An exposure apparatus that scans a light beam to form an exposure pattern on an exposure surface of a substrate, an exposure unit disposed at a position facing the exposure surface between the substrate delivery roll and the substrate take-up roll; an air injection mechanism including a first air injection unit and a second air injection unit, which are arranged on both the front and rear sides of an exposure section including the exposure surface and which inject air toward the substrate; and the first air injection unit and the second air injection unit are arranged with a space between them and the exposure unit, and each have a light beam passing hole that can pass the light beam irradiated from the exposure unit. An exposure apparatus characterized by:

2. 2. The exposure apparatus according to claim 1, further comprising an actuator for adjusting the distance between the first air injection unit and the second air injection unit; a distance between the substrate and the first air spraying unit and the second air spraying unit is determined by the pressure of air sprayed by the first air spraying unit and the second air spraying unit onto the substrate and a positioning operation of the actuator; An exposure apparatus characterized by:

3. 2. The exposure apparatus according to claim 1, the first air injection unit and the second air injection unit are each composed of an air injection plate and a support member that supports the air injection plate, an air supply space formed between the air injection plate and the support member, and a compressed air supply hole communicating with the air supply space; An exposure apparatus characterized by:

4. 2. The exposure apparatus according to claim 1, a sealing material with high light transmittance is embedded in the light beam passing hole; An exposure apparatus characterized by:

5. 2. The exposure apparatus according to claim 1, the substrate has the exposure surface on either one of its front and back surfaces, the exposure unit disposed opposite the exposure surface has an exposure head adjustment means capable of adjusting the distance between the exposure head and the exposure surface; An exposure apparatus characterized by:

6. 2. The exposure apparatus according to claim 1, the substrate has the exposure surfaces on both the front and back sides, the exposure unit is disposed at a position facing the exposure surface, the exposure unit, which is disposed opposite the exposure surface that is on the outside when the substrate is wound around the substrate feed roll, has an exposure head adjustment means that can adjust the distance between the exposure head and the exposure surface; An exposure apparatus characterized by:

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