Coated Cutting Tools

Abstract

The present invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), the coating (6) being Ti 1-x Al x The first 5-nanoparticle type (9) with N (0.45≦x<0.67), Cr 1-y Al y A second nanolayer type (10) in which N (0.60≦y≦0.80) and Ti 1-z S z and a nanolayer (8) of about 0.5 to about 10 μm that is an alternating nanolayer of a third nanolayer type (11) having a thickness of 0.14≦z≦0.25, wherein each nanolayer type Ti in the nanolayer (8) is 1-x Al x N(9), Cr 1-y Al y N(10), and Ti 1-z S z The average nanolayer thickness of N(11) relates to a coated cutting tool (1) that is ≧1 nm but <3 nm.

Description

[Technical field]

[0001] The present invention is 1-x Al x N(0.45≦x<0.67), Cr 1-y Al y N(0.60≦y≦0.80), and Ti 1-z S z The present invention relates to a coated cutting tool comprising a coating comprising a nanomultilayer, N (0.14≦y≦0.25) alternating nanolayers. [Background technology]

[0002] Metal machining operations include, for example, turning, milling, and drilling. To provide long tool life, coated cutting tools, such as inserts, should be highly resistant to various types of wear. To enhance the wear resistance of cutting tools, various types of wear-resistant coatings are known in the art.

[0003] A cutting tool generally has at least one rake face and at least one flank face. A cutting edge exists where the rake face and the flank face meet.

[0004] Flank wear occurs obviously on the flank of the cutting edge, mainly from the abrasive wear mechanism. The flank is subjected to the movement of the workpiece, and too much flank wear will result in poor surface texture of the workpiece, leading to inaccurate cutting process and increased friction in the cutting process.

[0005] If better flank wear resistance is provided, it will result in longer tool life for a particular metal machining operation.

[0006] Different metal machining operations affect coated cutting tools in different ways. Turning, for example, is a continuous metal machining operation, while milling is more intermittent in nature. In milling, thermal and mechanical loads change over time. Thermal loads induce thermal tensions that can result in so-called thermal cracks (herein called "comb cracks") in the coating, while the latter can cause fatigue in the cutting edge and lead to chipping, i.e. small fragments of the cutting edge detached from the rest of the substrate. Thus, the common wear types of coated cutting tools in milling are cracking and chipping. Therefore, in such cutting operations, high comb crack resistance is very important for tool life.

[0007] Chipping can also be reduced due to the high level of toughness of the coating, especially at the cutting edge. High cutting edge toughness therefore also increases tool life.

[0008] To provide cutting tools with superior properties over those currently available on the market, there is a continuing demand for coated cutting tools, where the coating has superior properties in terms of wear resistance, comb crack resistance, etc. Improvements in one or more of the above mentioned properties will result in longer tool life.

[0009] Nano multilayer coatings are used in the field of cutting tools for metal machining. In these coatings, at least two layers that differ in some respect form alternating coatings of a stack of nanolayers. Summary of the Invention

[0010] It is an object of the present invention to provide a coated cutting tool which at least exhibits high flank wear resistance and preferably also high comb crack resistance, most preferably high edge line toughness.

[0011] The object of the present invention is to provide a coated cutting tool comprising a substrate and a coating, the coating being of Ti1-x Al x A first nano-layer type where N(0.45 ≦ x < 0.67), Cr 1-y Al y A second nano-layer type (10) where N(0.60 ≦ y ≦ 0.80), and Ti 1-z Si z Including a nano-multilayer of about 0.5 to about 10 μm which is an alternating nano-layer of a third nano-layer type (11) where N(0.14 ≦ z ≦ 0.25), and for each nano-layer type in the nano-multilayer Ti 1-x Al x N(9), Cr 1-y Al y N(10), and Ti 1-z Si z Realized by a coated cutting tool where the average nano-layer thickness of N(11) is ≧ 1 nm but < 3 nm.

[0012] As used herein, "a nano-multilayer which is an alternating nano-layer of a first nano-layer type, a second nano-layer type, and a third nano-layer type" means that different types of nano-layers are generally alternating in a specific order in the nano-multilayer. However, due to the method selected for depositing the nano-multilayer in a PVD reactor, for example, using the so-called three rotations of the tool to be coated, there can be a change in the order of the three types of nano-layers at some locations within the nano-multilayer.

[0013] In one embodiment, the ratio between the sums of all nano-layer thicknesses of each nano-layer type in the nano-multilayer, Ti 1-x Al x N:Cr 1-y Al y N:Ti 1-z Si z N is a:b:c [where 0.5 < a < 3, 0.5 < b < 3, 0.5 < c < 3, preferably, 0.75 < a < 2.5, 0.75 < b < 2.5, 0.75 < c < 2.5, most preferably, 0.9 < a < 2.25, 0.9 < b < 2.25, 0.9 < c < 2.25].

[0014] The ratio between the sums of the nanolayer thicknesses of each nanolayer type in the nanomultilayer, Ti 1-x Al x N:Cr 1-y Al y N:Ti 1-z Si z N, that is, a:b:c can be determined by scanning transmission electron microscopy (STEM) analysis, preferably in combination with energy-dispersive X-ray spectroscopy (EDS), over a distance perpendicular to the substrate surface, where the elemental composition and the thickness of the individual nanolayers are determined. A distance of at least 25 times the average nanolayer thickness is used. The first nanolayer type Ti 1-x Al x The sum of the nanolayer thicknesses of the N nanolayers is "a", and the second nanolayer type Cr 1-y Al y The sum of the nanolayer thicknesses of the N nanolayers is "b", and the third nanolayer type Ti 1-z Si z The sum of the nanolayer thicknesses of the N nanolayers is "c".

[0015] Each nanolayer type Ti in the nanomultilayer 1-x Al x N, Cr 1-y Al y N, and Ti 1-z Si z The average nanolayer thickness of N can also be determined by the above-described STEM / EDS analysis.

[0016] When the first nanolayer type is Ti 1-x Al x N, appropriately 0.50 ≦ x ≦ 0.62, preferably 0.55 ≦ x ≦ 0.62.

[0017] When the second nanolayer type is Cr 1-y Al y N, appropriately 0.65 ≦ y ≦ 0.75.

[0018] When the third nanolayer type is Ti 1-z Si z N, appropriately 0.15 < z ≦ 0.23, preferably 0.16 < z ≦ 0.21.

[0019] Each nanolayer type Ti in nanomultilayer 1-x Al x N, Cr 1-y Al y N, and Ti 1-z S z The average nanolayer thickness in the N nanomultilayer is suitably 1-2.8 nm, preferably 1-2.5 nm, more preferably 1.5-2.5 nm, most preferably 1.8-2.2 nm.

[0020] Nano-layer type Ti in nano-multilayer 1-x Al x N, Cr 1-y Al y N, and Ti 1-z S z N and nano-layer type Ti 1-x Al x N, Cr 1-y Al y N, and Ti 1-z S z The ratio of the average nanolayer thickness in the nanomultilayer between any of the remaining two of N is suitably 0.1-10, preferably 0.5-5, most preferably 0.8-2.

[0021] Suitably, within a series of 10 consecutive nanolayers, preferably 8, most preferably 6 consecutive nanolayers in the nanomultilayer, nanolayer type Ti 1-x Al x N, Cr 1-y Al y N, and Ti 1-z S z All of N exist.

[0022] The thickness of the nanomultilayer is suitably from about 1 to about 8 μm, preferably from about 1.5 to about 5 μm.

[0023] In one embodiment, the coating comprises an inner layer below the nano-multilayer, preferably closest to the substrate, of one or more nitrides of Ti and Cr, or one or more of Ti and Cr in combination with Al. More specifically, in one embodiment, the inner layer is TiN, CrN, (Ti,Cr)N, (Cr,Al)N, or (Ti,Al)N. In one embodiment, the inner layer is (Cr,Al)N or (Ti,Al)N. In another embodiment, the inner layer is TiN or (Ti,Al)N. The (Ti,Al)N layer can be either a single layer or a nano-multilayer with alternating nano-layers of different Ti / Al ratios. The (Cr,Al)N layer can be either a single layer or a nano-multilayer with alternating nano-layers of different Cr / Al ratios.

[0024] Preferably, the inner layer is (Ti,Al)N. When (Ti,Al)N is used as the inner layer, the (Ti,Al)N is suitably Ti 1-t Al t N (0.45≦t≦0.67, preferably 0.50≦t≦0.62, most preferably 0.55≦t≦0.62). In a preferred embodiment, the Ti-Al relationship in the (Ti,Al)N of the inner layer is the same as the Ti-Al relationship in the first nanolayer type of the nanomultilayer, since this simplifies manufacturing when the same targets can be used as already used in the nanomultilayer.

[0025] The thickness of the inner layer is suitably about 0.1 to about 3 μm, preferably about 0.2 to about 2 μm, and most preferably about 0.5 to about 2 μm.

[0026] In one embodiment, for the purpose of controlling the color of the coated cutting tool, the coating comprises a first nano-layer type Ti 1-x Al x N(0.45≦x<0.67, 0.50≦x≦0.62, or 0.55≦x≦0.62), second nano-layer type Cr 1-y Al y N (0.60≦y≦0.80 or 0.65≦x≦0.75), or the third nanolayer type Ti 1-z S zN (0.14≦z≦0.25, 0.15≦x≦0.23, or 0.16≦x≦0.21).

[0027] The values ​​of x, y, or z of the outermost layer are preferably the nano-multilayer Ti 1-x Al x N, Cr 1-y Al y N, or Ti 1-z S z It is the same as x, y, or z of N, since this simplifies manufacturing if the same targets can be used as already used in the nanomultilayer.

[0028] The thickness of this outermost layer is suitably about 0.1 to about 0.5 μm, preferably about 0.1 to about 0.3 μm.

[0029] The nanolayers of the first nanolayer type, the second nanolayer type, and the third nanolayer type are suitably cathodic arc evaporation deposited layers, and the optional inner layer of TiN or (Ti,Al)N, as well as the optional outermost monolayer, are suitably cathodic arc evaporation deposited layers.

[0030] The substrate of the coated cutting tool may be selected from the group of cemented carbide, cermet, ceramic, cubic boron nitride, and high speed steel. In one embodiment, the substrate is a cemented carbide containing 5-18 wt% Co.

[0031] The coated cutting tool is suitably a cutting tool insert, a drill or a solid end mill for metal machining. The cutting tool insert is, for example, a turning insert or a milling insert. [Brief description of the drawings]

[0032] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of a cutting tool that is a milling insert. [Diagram 2]FIG. 1 is a schematic diagram illustrating an embodiment of a cutting tool that is a turning insert. [Diagram 3] 1 is a schematic diagram illustrating a cross-section of one embodiment of a coated cutting tool of the present invention showing a substrate and a multi-layer coating. [Figure 4] 1 is a schematic diagram showing a cross-section of one embodiment of a coated cutting tool of the present invention illustrating a substrate and a coating comprising different layers. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0033] Detailed description of the embodiments in the drawings Figure 1 shows a schematic diagram of an embodiment of a cutting tool 1 with a rake face 2, a flank face 3 and a cutting edge 4. The cutting tool 1 is in this embodiment a milling insert. Figure 2 shows a schematic diagram of an embodiment of a cutting tool 1 with a rake face 2, a flank face 3 and a cutting edge 4. The cutting tool 1 is in this embodiment a turning insert. Figure 3 shows a schematic diagram of a cross section of an embodiment of a coated cutting tool of the invention with a substrate 5 and a coating 6. The coating 6 is made of Ti 1-x Al x N9, Cr 1-y Al y N10, and Ti 1-z S z 4 shows a schematic diagram of a cross-section of one embodiment of a coated cutting tool of the present invention having a substrate 5 and a coating 6. The coating 6 is made up of a first (Ti,Al)N innermost layer 7, followed by a Ti 1-x Al x N9, Cr 1-y Al y N10, and Ti 1-z S z N11, consisting of nanomultilayers 8 of alternating nanolayers 9, 10, and 11.

[0034] In one embodiment, the ratio of the nanolayer thicknesses of the nanolayer types 9, 10, 11 in the nanomultilayer 8 to the sum of the nanolayer thicknesses of the nanolayer types 9, 10, 11 in the nanomultilayer 8 is a:b:c. 1-x Alx N:Cr 1-y Al y N:Ti 1-z Si z There is N, 0.75 < a < 1.25, 0.75 < b < 1.25, 1.5 < c < 2.5, preferably, 0.9 < a < 1.1, 0.9 < b < 1.1, 1.75 < c < 2.25. In this embodiment, the nanomultilayer 8 is suitably Ti 1-x Al x N / Ti 1-z Si z N / Cr 1-y Al y N / Ti 1-z Si z In the order of N, it is the first nanolayer type 9, Ti 1-x Al x N, the second nanolayer type 10, Cr 1-y Al y N, and the third nanolayer type 11, Ti 1-z Si z N, including a repeating sequence of continuous nanolayers. The nanomultilayer 8 is suitably (Ti 1-x Al x N / Ti 1-z Si z N / Cr 1-y Al y N / Ti 1-z Si z N..) m and is composed of, where m = 15 to 1500, suitably m = 30 to 800.

[0035] In a further embodiment, a:b:c is the ratio in the nanomultilayer 8 between the total of the nanolayer thicknesses of each of the nanolayer types 9, 10, 11 in the nanomultilayer 8, for Ti 1-x Al x N:Cr 1-y Al y N:Ti 1-z Si z There is N, 1.5 < a < 2.5, 0.75 < b < 1.25, 0.75 < c < 1.25, preferably, 1.75 < a < 2.25, 0.9 < b < 1.1, 0.9 < c < 1.1. In this embodiment, the nanomultilayer 8 is suitably Ti 1-x Al x N / Cr1-y Al y N / Ti 1-x Al x N / Ti 1-z Si z In the order of N, Ti which is the first nano-layer type 9 1-x Al x N, Cr which is the second nano-layer type 10 1-y Al y N, and Ti which is the third nano-layer type 11 1-z Si z It includes a repeating sequence of continuous nano-layers of N. The nano-multilayer (8) is preferably (Ti 1-x Al x N / Cr 1-y Al y N / Ti 1-x Al x N / Ti 1-z Si z N) n and is composed of, where n = 15 to 1500, preferably n = 30 to 800.

[0036] In a further embodiment, the ratio in the nano-multilayer 8 between the total nano-layer thicknesses of each nano-layer type 9, 10, 11 in the nano-multilayer 8, Ti 1-x Al x N:Cr 1-y Al y N:Ti 1-z Si z N is a:b:c, where 0.75 < a < 1.25, 1.5 < b < 2.5, 0.75 < c < 1.25, preferably 1.75 < a < 2.25, 0.9 < b < 1.1, 0.9 < c < 1.1. In this embodiment, the nano-multilayer 8 is preferably Ti 1-x Al x N / Cr 1-y Al y N / Ti 1-z Si z N / Cr 1-y Al y N, Ti which is the first nano-layer type 9 in the order of 1-x Al x N, Cr which is the second nano-layer type 10 1-y Al y N, and Ti which is the third nano-layer type 11 1-z Siz It includes a repeating sequence of N consecutive nanolayers. The nanomultilayer (8) preferably consists of (Ti 1-x Al x N / Ti 1-y Si y N / Ti 1-z Al z N / Ti 1-y Si y N) n and is composed of n = 15 to 1500, preferably n = 30 to 800.

[0037] In a further embodiment, the ratio in the nanomultilayer 8 between the sums of the nanolayer thicknesses of each nanolayer type 9, 10, 11 in the nanomultilayer 8, Ti 1-x Al x N:Cr 1-y Al y N:Ti 1-z Si z N is a:b:c, where 0.75 < a < 1.25, 0.75 < b < 1.25, 0.75 < c < 1.25, preferably 0.9 < a < 1.1, 0.9 < b < 1.1, 0.9 < c < 1.1. In this embodiment, the nanomultilayer 8 preferably consists of Ti 1-x Al x N / Cr 1-y Al y N / Ti 1-z Si z N in the order of, the first nanolayer type 9 being Ti 1-x Al x N, the second nanolayer type 10 being Cr 1-y Al y N, and the third nanolayer type 11 being Ti 1-z Si z N, including a repeating sequence of consecutive nanolayers. The nanomultilayer 8 preferably consists of (Ti 1-x Al x N / Cr 1-y Al y N / Ti 1-z Si z N) q and is composed of q = 20 to 2000, preferably q = 40 to 1000.

Examples

[0038] It should be noted that there are slight deviations between the elemental relationships of Ti and Al, Cr and Al, and Ti and Si in the targets used in the PVD deposition process, and their elemental relationships in the respective deposited nitride layers. One reason for this could be, for example, different tendencies for resputtering of different elements.

[0039] The actual elemental composition in different nanomultilayer types can be determined, for example, by using energy dispersive X-ray spectroscopy (EDS) in a transmission electron microscope (TEM) on cross-sections of the coatings.

[0040] Alternatively, the actual elemental composition in different nanomultilayer types can be found by using energy dispersive X-ray spectroscopy (EDS) in a TEM or scanning electron microscope (SEM) of a single layer deposited in the same conditions as the respective nanolayer.

[0041] Within the relevant ranges of content of elements in the nanolayer of the present invention, the following estimations can be made:

[0042] In the case of a (Ti,Al)N layer, the actual proportion of Al in Ti+Al is about 1-2 at.% units lower than the Al content in the (Ti,Al) target.

[0043] In the case of the (Cr,Al)N layer, the actual proportion of Al in Cr+Al is about 2-3 at.% units lower than the Al content in the (Cr,Al) target.

[0044] In the case of the (Ti,Si)N layer, the actual proportion of Si in Ti+Si is about 2 to 3 at.% units lower than the Si content in the (Ti,Si) target.

[0045] Therefore, only minor deviations from the theoretical compositions are observed. In the following examples, the Ti, Al, Cr, and Si contents in the deposited nitride layers are described as being present in the respective target compositions used in the PVD deposition process.

[0046] The nanolayer thickness can be measured by using transmission electron microscopy (TEM) analysis.

[0047] Example 1 Ti deposited on sintered cemented carbide cutting tool insert blanks with the geometries CNMG120408MM and R390-11T308M-PM 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.80 S 0.20 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti 0.40 Al 0.60 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0048] An uncoated blank was mounted on a pin that underwent three rotations in the PVD chamber.

[0049] The chamber is placed under high vacuum (10 -2 The chamber was pumped down to a pressure of less than 1 Pa and heated to approximately 450-550° C. by a heater located within the chamber. The blank was then etched in an Ar plasma for 60 min.

[0050] First, Ti 0.40 Al 0.60 By using only the target, Ti 0.40 Al 0.60 An innermost layer of N (based on the target composition) was deposited.

[0051] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -50 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 70 minutes (each) (two flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 0.25 μm was deposited on the blank assembly. 0.40 Al 0.60 A layer of N was deposited on the blank.

[0052] The nanomultilayers were then deposited by using all the mounted targets.

[0053] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas, and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode (each) with a current of 150 A (four flanges). The table rotation speed was 5 rpm. A nano-multilayer coating with a thickness of about 2.8 μm was deposited on the blank.

[0054] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used is used to determine the thickness of each nanolayer Ti. 0.40 Al 0.60N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 It was concluded that this correlates with an average individual nanolayer thickness of about 2 nm for N. The number of nanolayers in the nanomultilayer is about 1400.

[0055] Nano multilayer is Ti 0.40 Al 0.60 N / Ti 0.80 S 0.20 N / Cr 0.30 Al 0.70 N / Ti 0.80 S 0.20 N, comprising a repeating sequence of successive nanolayers.

[0056] In the nano-multilayer, each nano-layer Ti 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 N is the ratio of the total thickness of each nanolayer, i.e., Ti 0.40 Al 0.60 N:Cr 0.30 Al 0.70 N:Ti 0.80 S 0.20 N is approximately 1:1:2. This ratio is estimated from the deposition rate from each target, which is assumed to be the same, the rotation during deposition, and the deposition time.

[0057] Ti 0.40 Al 0.60 The actual elemental relationship in the nanomultilayer (Ti,Al)N layer deposited using the target is Ti 0.42 Al 0.58 It was estimated to be N.

[0058] Cr 0.30 Al 0.70 The actual elemental relationship in the nanomultilayer (Cr,Al)N layer deposited using the target is Cr 0.32 Al 0.68 It was estimated to be N.

[0059] EDS in TEM of a single (Ti,Si)N layer deposited under the same conditions as the (Ti,Si)N layers in the nanomultilayers showed that Ti 0.80 S 0.20 The actual elemental relationship in nanomultilayered (Ti,Si)N layers deposited using the Ti target 0.83 S 0.17 It was estimated to be N.

[0060] The coated cutting tool is designated "Sample 1 (Invention)."

[0061] Example 2 Ti deposited on sintered cemented carbide cutting tool insert blanks with the geometries CNMG120408MM and R390-11T308M-PM 0.50 Al 0.50 N, Cr 0.30 Al 0.70 N, and Ti 0.85 S 0.15 A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.50 Al 0.50 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti 0.85 S 0.15 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0062] An uncoated blank was mounted on a pin that underwent three rotations in the PVD chamber.

[0063] The chamber is placed under high vacuum (10 -2 The chamber was pumped down to a pressure of less than 1 Pa and heated to about 450-550° C. by a heater located inside the chamber. The blank was then etched in an Ar plasma for 60 min.

[0064] First, Ti 0.50 Al 0.50 By using only the target, Ti 0.50 Al 0.50 An innermost layer of N (based on the target composition) was deposited.

[0065] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -50 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 70 minutes (each) (two flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 1.4 μm was deposited on the blank assembly. 0.50 Al 0.50 A layer of N was deposited on the blank.

[0066] Next, Cr 0.30 Al 0.70 and Ti 0.85 S 0.15 By alternating the use of targets, nano-multilayers were deposited, with a thickness of about 35 nm for Cr. 0.30 Al 0.70 N / Ti 0.85 S 0.15 The first sequence of N nano-multilayers was produced. The table rotation speed was 5 rpm. Then, Ti 0.50 Al 0.50 Using only the target, a Ti film with a thickness of about 35 nm was 0.50 Al 0.50 This procedure was repeated for Ti 0.50 Al 0.50 Nanolayer Cr combined with "monolayer" of N 0.30Al 0.70 N and Ti 0.85 S 0.15 This was repeated until 20 sequences of N nanomultilayer sequences were completed. The total thickness of the deposited nanomultilayers was approximately 1.4 μm.

[0067] The chamber pressure (reaction pressure) was set to 4 Pa ​​of N2 gas, and Cr 0.30 Al 0.70 and Ti 0.85 S 0.15 When using a Ti target, a DC bias voltage of -40 V (relative to the chamber wall) is applied. 0.50 Al 0.50 When using targets, a DC bias voltage of -80 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode (each) for 70 minutes (two flanges at a time) with a current of 150 A. The table rotation speed was 5 rpm. A nano-multilayer coating with a thickness of about 1.4 μm was deposited on the blank.

[0068] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used will result in the thickness of each nanolayer Cr 0.30 Al 0.70 N and Ti 0.85 S 0.15 It was concluded that N correlates with an average individual nanolayer thickness of about 2 nm.

[0069] Finally, to obtain uniform color among the individual coated cutting tools produced, Ti 0.85 S 0.15 By using only the target, Ti 0.85 S 0.15 An outermost layer of N (based on the target composition) was deposited. All deposition parameters were the same as for depositing the previous layer (one flange), except that the bias was -60 V and the cathode was operated for 10 minutes. 0.85 S 0.15 A layer of N was deposited to a thickness of about 0.2 μm.

[0070] Ti 0.50 Al 0.50 The actual elemental relationship in the (Ti,Al)N layer deposited using this target is Ti 0.52 Al 0.48 It was estimated to be N.

[0071] Cr 0.30 Al 0.70 The actual elemental relationship in the (Cr,Al)N layer deposited using this target is Cr 0.32 Al 0.68 It was estimated to be N.

[0072] Ti 0.85 S 0.15 The actual elemental relationship in the (Ti,Si)N layer deposited using this target is Ti 0.87 S 0.13 It was estimated to be N.

[0073] The coated cutting tool is designated "Sample 2 (comparative)."

[0074] Example 3 Ti deposited on sintered cemented carbide cutting tool insert blanks with the geometries CNMG120408MM and R390-11T308M-PM 0.50 Al 0.50 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.50 Al 0.50 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti0.80 S 0.20 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0075] An uncoated blank was mounted on a pin that underwent three rotations in the PVD chamber.

[0076] The chamber is placed under high vacuum (10 -2 The chamber was pumped down to a pressure of less than 1 Pa and heated to approximately 450-550° C. by a heater located within the chamber. The blank was then etched in an Ar plasma for 60 min.

[0077] First, Ti 0.50 Al 0.50 By using only the target, Ti 0.50 Al 0.50 An innermost layer of N (based on the target composition) was deposited.

[0078] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -50 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 70 minutes (each) (two flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 1.4 μm was deposited on the blank assembly. 0.50 Al 0.50 A layer of N was deposited on the blank.

[0079] Next, Cr 0.30 Al 0.70 Target and Ti 0.80 S 0.20 By alternating the use of targets, nano-multilayers were deposited, with a thickness of about 35 nm for Cr.0.30 Al 0.70 N / Ti 0.80 S 0.20 The first sequence of N nano-multilayers was produced. The table rotation speed was 5 rpm. Then, Ti 0.50 Al 0.50 Using only the target, a Ti film with a thickness of about 35 nm was 0.50 Al 0.50 This procedure was repeated for Ti 0.50 Al 0.50 Nanolayer Cr combined with "monolayer" of N 0.30 Al 0.70 N and Ti 0.80 S 0.20 This was repeated until 20 sequences of N nanomultilayer sequences were completed. The total thickness of the deposited nanomultilayers was approximately 1.4 μm.

[0080] The chamber pressure (reaction pressure) was set to 4 Pa ​​of N2 gas, and Cr 0.30 Al 0.70 and Ti 0.80 S 0.20 When using a Ti target, a DC bias voltage of -40 V (relative to the chamber wall) is applied. 0.50 Al 0.50 When using targets, a DC bias voltage of -80 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode (each) for 70 minutes (two flanges at a time) with a current of 150 A. The table rotation speed was 5 rpm. A nano-multilayer coating with a thickness of about 1.4 μm was deposited on the blank.

[0081] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used will result in the thickness of each nanolayer Cr 0.30 Al 0.70 N and Ti 0.80 S 0.20 It was concluded that N correlates with an average individual nanolayer thickness of about 2 nm.

[0082] Finally, to obtain uniform color among the individual coated cutting tools produced, Ti 0.80 S 0.20 By using only the target, Ti 0.80 S 0.20 An outermost layer of N (based on the target composition) was deposited. All deposition parameters were the same as for depositing the previous layer, and the cathode was operated for 10 minutes (one flange). 0.80 S 0.20 A layer of N was deposited to a thickness of about 0.2 μm.

[0083] Ti 0.50 Al 0.50 The actual elemental relationship in the (Ti,Al)N layer deposited using this target is Ti 0.52 Al 0.48 It was estimated to be N.

[0084] Cr 0.30 Al 0.70 The actual elemental relationship in the (Cr,Al)N layer deposited using this target is Cr 0.32 Al 0.68 It was estimated to be N.

[0085] Ti 0.80 S 0.20 The actual elemental relationship in the (Ti,Si)N layer deposited using this target is Ti 0.83 S 0.17 It was estimated to be N.

[0086] The coated cutting tool is designated "Sample 3 (comparative)."

[0087] Example 4 Ti deposited on a sintered cemented carbide cutting tool blank, a solid end mill with four cutting edges, geometry 2P342-1200-PA, diameter 12 mm 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.40 Al 0.60 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti 0.80 S 0.20 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0088] An uncoated blank was mounted in a holder that underwent three rotations in the PVD chamber.

[0089] The chamber is placed under high vacuum (10 -2 The chamber was pumped down to a pressure of less than 1 Pa and heated to approximately 450-550° C. by a heater located within the chamber. The blank was then etched in an Ar plasma for 60 min.

[0090] First, Ti 0.40 Al 0.60 By using only the target, Ti 0.40 Al 0.60 An innermost layer of N (based on the target composition) was deposited.

[0091] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 70 minutes (each) (two flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 1 μm was deposited on the blank assembly. 0.40 Al 0.60 A layer of N was deposited on the blank.

[0092] The nanomultilayers were then deposited by using all the mounted targets.

[0093] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas, and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 47 minutes (each) (four flanges). The table rotation speed was 5 rpm. A nano-multilayer coating with a thickness of about 2 μm was deposited on the blank.

[0094] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used is used to determine the thickness of each nanolayer Ti. 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 It was concluded that this correlates with an average individual nanolayer thickness of about 2 nm for N. The number of nanolayers in the nanomultilayer is about 1000.

[0095] Nano multilayer is Ti 0.40 Al 0.60 N / Cr 0.30 Al 0.70 N / Ti 0.40 Al 0.60 N / Ti 0.80 S 0.20 N, comprising a repeating sequence of successive nanolayers.

[0096] In the nano-multilayer, each nano-layer Ti 0.40Al 0.50 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 N is the ratio of the total thickness of each nanolayer, i.e., Ti 0.40 Al 0.60 N:Cr 0.30 Al 0.70 N:Ti 0.80 S 0.20 N is approximately 2:1:1. This ratio is estimated from the deposition rate from each target, which is assumed to be the same, the rotation during deposition, and the deposition time.

[0097] Ti 0.40 Al 0.60 The actual elemental relationship in the nanomultilayer (Ti,Al)N layer deposited using this target is Ti 0.42 Al 0.58 It was estimated to be N.

[0098] Cr 0.30 Al 0.70 The actual elemental relationship in the nanomultilayer (Cr,Al)N layer deposited using the target is Cr 0.32 Al 0.68 It was estimated to be N.

[0099] EDS in TEM of a single (Ti,Si)N layer deposited under the same conditions as the (Ti,Si)N layers in the nanomultilayers showed that Ti 0.80 S 0.20 The actual elemental relationship in nanomultilayered (Ti,Si)N layers deposited using the Ti target 0.83 S 0.17 It was estimated to be N.

[0100] The coated cutting tool is designated "Sample 4 (Invention)."

[0101] The prepared samples 1 to 4 are listed in Table 1. TIFF2025500047000002.tif118170* All elemental compositions based on target composition ** Approx. 35 nm TiAlN *** CrAlN / TiSiN nanomultilayer of about 35 nm

[0102] Table 2 further summarizes Samples 1-4. TIFF2025500047000003.tif109170* All elemental compositions based on target composition

[0103] Example 5 Cutting tests were carried out to determine the performance of the prepared cutting tool insert samples.

[0104] Sample 1 was operated in a separate test run from samples 2-3, so the results are based on the approximately 3 μm thick Ti 0.40 Al 0.60 For example, "155%" in the results table indicates that the performance (tool life) is improved by 100% compared to the TiN reference coating. 0.40 Al 0.60 The results for the reference coated cutting tool were 155% of those for the reference with a TiN coating (based on the target composition). The reference coated cutting tool was a sintered cemented carbide cutting tool blank of the same type as samples 1-3, i.e., cutting tool insert blanks of the shapes CNMG120408MM and R390-11T308M-PM. 0.40 Al 0.60 The cemented carbide was also prepared by depositing a layer of TiN on the surface of the specimen. The cemented carbide was the same, i.e. 10 wt% Co, 0.4 wt% Cr, and the balance WC. 0.40 Al 0.60 The targets were mounted in the evaporator at the four flanges. The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -70 V (with respect to the chamber wall) was applied to the blank assembly. The cathodes were operated (each) in arc discharge mode with a current of 150 A (four flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 3 μm was 0.40 Al 0.60 A layer of N was deposited on the blank.

[0105] Explanation of terms used: The following expressions / terms are commonly used in metal cutting and are explained in the following table: V c (m / min): cutting speed in meters per minute f z (mm / tooth): Feed rate in millimeters per tooth (in milling) f n (mm / rev): Feed rate per revolution (in turning) z: (number) number of teeth on the cutting tool a e (mm): Radial cutting depth in millimeters a p (mm): Axial cutting depth in millimeters

[0106] Flank wear test: Vertical turning Workpiece material: Sverker 21 (tool steel), hardness approximately 210HB, D=180, L=700mm V c =125m / min f n =0.072mm / rev a p =2mm No cutting fluid

[0107] The cut-off criterion for tool life is a flank wear VB of 0.15 mm.

[0108] Comb crack resistance: Operation: Shoulder milling Tool holder: C5-391.20-25080 Material of workpiece: Toolox33 (tool steel), L=600mm, I=200mm, h=100mm Insert type: R390-11T308M-PM Cutting speed V c =250m / min Feed rate f z =0.2mm / rev Cutting depth ap =3mm Radial Fit a e =12.5mm With cutting fluid

[0109] The criterion for the end of tool life is a maximum chipping height VB of more than 0.3 mm.

[0110] The results are presented in Table 3. TIFF2025500047000004.tif84170

[0111] It can be concluded that Sample 1 within the present invention has high flank wear resistance and exhibits much less flank wear than Comparative Samples 2-3 outside the present invention. Furthermore, Sample 1 exhibits much higher comb crack resistance than the Comparative Samples.

[0112] Example 6 Cutting tests were carried out to determine the performance of the cutting tool, sample 4, which was an end mill.

[0113] In addition, to serve as a reference, a sintered cemented carbide cutting tool blank of the same type as above, i.e. a solid end mill with four cutting edges, shape 2P342-1200-PA, diameter 12 mm, was used with Ti. 0.40 Al 0.60 Coated cutting tools were prepared by depositing a layer of N (based on the target composition). The cemented carbide was the same, i.e. 10 wt.% Co, 0.4 wt.% Cr, and balance WC. Ti 0.40 Al 0.60 The targets were mounted in the evaporator at the four flanges. The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -50 V (with respect to the chamber wall) was applied to the blank assembly. The cathodes were operated (each) in arc discharge mode with a current of 150 A (four flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 3 μm was 0.40 Al 0.60 A layer of N was deposited on the blank.

[0114] The coated cutting tool is designated "Sample 5 (Baseline)."

[0115] Flank wear test: Dry shoulder milling Material of workpiece: C45 (P1 steel), hardness 200HB, size: 600 x 220 x 50mm Material of workpiece: 42CrMo4 (P2 steel), hardness 302-305HB, size: 600 x 200 x 50mm V c =235m / min f z =0.055(mm / tooth) a p =5mm a e =1.2mm z=4 blades L=220mm (C45, P1 steel), 200mm (42CrMo4, P2 steel) No cutting fluid

[0116] The predetermined number of cutting passes is 400 or Vb3≧0.1 mm.

[0117] Tool wear (Vb3 local flank wear) was measured against the depth of cut (DOC) at the tool corners and cutting edges. Lower values ​​are better.

[0118] Results from test cutting in 42CrMo4 and P2 steels are seen in Table 4. TIFF2025500047000005.tif67170

[0119] Results from test cutting on C45 and P1 steels are seen in Table 5. TIFF2025500047000006.tif67170

[0120] From both the workpiece material removal, it can be concluded that sample 4 within the present invention shows much less flank wear than the reference sample. The low level of Vb3 is considered to be a very good result.

[0121] Example 7 To evaluate the effect of different nanolayer thicknesses in the nanomultilayers, the following samples were prepared:

[0122] Ti deposited on sintered cemented carbide cutting tool insert blanks with the geometries CNMG120408MM and R390-11T308M-PM 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.40 Al 0.60 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti 0.80 S 0.20 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0123] An uncoated blank was mounted in a holder that underwent three rotations in the PVD chamber.

[0124] The chamber is placed under high vacuum (10 -2The chamber was pumped down to a pressure of less than 1 Pa and heated to approximately 450-550° C. by a heater located within the chamber. The blank was then etched in an Ar plasma for 60 min.

[0125] First, Ti 0.40 Al 0.60 By using only the target, Ti 0.40 Al 0.60 An innermost layer of N (based on the target composition) was deposited.

[0126] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode with a current of 150 A for 40 minutes (each) (two flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 0.8 μm was deposited on the blank assembly. 0.40 Al 0.60 A layer of N was deposited on the blank.

[0127] The nanomultilayers were then deposited by using all the mounted targets.

[0128] The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas, and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated in arc discharge mode (each) for 55 minutes (four flanges) with a current of 150 A. For the first sample "Sample 5 (invention)", the table rotation speed was 5 rpm.

[0129] In a further run, a second set of coated cutting tools was made using the same process conditions as those used to make Sample 5 (invention) above, but using a table rotation speed of 2.4 rpm. The resulting coated cutting tools are designated "Sample 6 (comparative)".

[0130] In a further run, a third set of coated cutting tools was made using the same process conditions as those used to make Sample 5 (invention) above, but using a table rotation speed of 1.5 rpm. The resulting coated cutting tools are designated "Sample 7 (comparative)".

[0131] In all cases, a nanomultilayer coating with a thickness of about 2.2 μm was deposited on the blank.

[0132] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used is used to determine the thickness of each nanolayer Ti. 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 It was concluded that this correlates with an average individual nanolayer thickness of about 2 nm for N. The number of nanolayers in the nanomultilayer is about 1000.

[0133] The current deposition rate and table rotation speed of 2.4 rpm for the equipment used is 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 This correlates with an average individual nanolayer thickness of about 4 nm for N. The number of nanolayers in the nanomultilayer is about 500.

[0134] The current deposition rate and table rotation speed of 1.5 rpm for the equipment used is 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 This correlates with an average individual nanolayer thickness of N of about 6 nm. The number of nanolayers in the nanomultilayer is about 330.

[0135] All nanomultilayers of samples 5 to 7 were Ti 0.40 Al 0.60 N / Cr0.30 Al 0.70 N / Ti 0.40 Al 0.60 N / Ti 0.80 S 0.20 N, comprising a repeating sequence of successive nanolayers.

[0136] In the nano-multilayer, each nano-layer Ti 0.40 Al 0.50 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 N is the ratio of the total thickness of each nanolayer, i.e., Ti 0.40 Al 0.60 N:Cr 0.30 Al 0.70 N:Ti 0.80 S 0.20 N is approximately 2:1:1. This ratio is estimated from the deposition rate from each target, which is assumed to be the same, the rotation during deposition, and the deposition time.

[0137] Ti 0.40 Al 0.60 The actual elemental relationship in the nanomultilayer (Ti,Al)N layer deposited using this target is Ti 0.42 Al 0.58 It was estimated to be N.

[0138] Cr 0.30 Al 0.70 The actual elemental relationship in the nanomultilayer (Cr,Al)N layer deposited using the target is Cr 0.32 Al 0.68 It was estimated to be N.

[0139] EDS in TEM of a single (Ti,Si)N layer deposited under the same conditions as the (Ti,Si)N layers in the nanomultilayers showed that Ti 0.80 S 0.20 The actual elemental relationship in nanomultilayered (Ti,Si)N layers deposited using the Ti target 0.83 S 0.17 It was estimated to be N.

[0140] Example 8 A sample was prepared without the (Ti,Al)N inner layer.

[0141] Ti deposited on sintered cemented carbide cutting tool insert blanks with the geometries CNMG120408MM and R390-11T308M-PM 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 A coated cutting tool was provided that contained a nano-multilayer of TiN (based on the target composition). The composition of the cemented carbide was 10 wt.% Co, 0.4 wt.% Cr, and balance WC. The cemented carbide blank was coated by cathodic arc evaporation in a vacuum chamber containing four arc flanges (each flange containing multiple cathodic evaporators). 0.40 Al 0.60 The targets were mounted in the evaporator at two of the flanges facing each other. The remaining target, Cr 0.30 Al 0.70 and Ti 0.80 S 0.20 was mounted in the evaporator with the remaining two flanges facing each other. The target was circular and flat, with a diameter of 100 mm, which is available on the general market. Suitable target technology packages for arc evaporation are available from market suppliers such as IHI Hauzer Techno Coating BV, Kobelco (Kobe Steel Ltd.) and Oerlikon Balzers.

[0142] An uncoated blank was mounted in a holder that underwent three rotations in the PVD chamber.

[0143] The chamber is placed under high vacuum (10 -2 The chamber was pumped down to a pressure of less than 1 Pa and heated to approximately 450-550° C. by a heater located within the chamber. The blank was then etched in an Ar plasma for 60 min.

[0144] Nanomultilayers were deposited by using all the mounted targets.

[0145] The chamber pressure (reaction pressure) was set at 4 Pa ​​N2 gas and a DC bias voltage of -70 V (relative to the chamber wall) was applied to the blank assembly. The cathodes were operated (four flanges) in arc discharge mode with a current of 150 A for 75 minutes (each). The table rotation speed was 5 rpm.

[0146] A nano-multilayer coating with a thickness of about 3 μm was deposited on the blank.

[0147] The rotation speed is correlated with the thickness of a particular step, and a table rotation speed of 5 rpm for the current deposition rate and the equipment used is used to determine the thickness of each nanolayer Ti. 0.40 Al 0.60 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 It was concluded that this correlates with an average individual nanolayer thickness of about 2 nm for N. The number of nanolayers in the nanomultilayer is about 1000.

[0148] Nano multilayer is Ti 0.40 Al 0.60 N / Cr 0.30 Al 0.70 N / Ti 0.40 Al 0.60 N / Ti 0.80 S 0.20 N, comprising a repeating sequence of successive nanolayers.

[0149] In the nano-multilayer, each nano-layer Ti 0.40 Al 0.50 N, Cr 0.30 Al 0.70 N, and Ti 0.80 S 0.20 N is the ratio of the total thickness of each nanolayer, i.e., Ti 0.40 Al 0.60 N:Cr 0.30 Al 0.70N:Ti 0.80 S 0.20 N is approximately 2:1:1. This ratio is estimated from the deposition rate from each target, which is assumed to be the same, the rotation during deposition, and the deposition time.

[0150] Ti 0.40 Al 0.60 The actual elemental relationship in the nanomultilayer (Ti,Al)N layer deposited using this target is Ti 0.42 Al 0.58 It was estimated to be N.

[0151] Cr 0.30 Al 0.70 The actual elemental relationship in the nanomultilayer (Cr,Al)N layer deposited using the target is Cr 0.32 Al 0.68 It was estimated to be N.

[0152] EDS in TEM of a single (Ti,Si)N layer deposited under the same conditions as the (Ti,Si)N layers in the nanomultilayers showed that Ti 0.80 S 0.20 The actual elemental relationship in nanomultilayered (Ti,Si)N layers deposited using the Ti target 0.83 S 0.17 It was estimated to be N.

[0153] The coated cutting tool is designated "Sample 8 (Invention)."

[0154] Table 6 summarizes samples 5-8. TIFF2025500047000007.tif109170* All elemental compositions based on target composition

[0155] Example 9 To determine the performance of cutting tool insert samples 5-8, cutting tests were conducted.

[0156] Approximately 3 μm thick Ti was included in all test runs. 0.40 Al 0.60Cutting inserts with N reference coating. The reference coated cutting tools were sintered cemented carbide cutting tool blanks of the same type as samples 5-8 to be tested, i.e., cutting tool insert blanks of the shape CNMG120408MM and R390-11T308M-PM coated with TiN. 0.40 Al 0.60 The cemented carbide was also prepared by depositing a layer of TiN on the surface of the specimen. The cemented carbide was the same, i.e. 10 wt% Co, 0.4 wt% Cr, and the balance WC. 0.40 Al 0.60 The targets were mounted in the evaporator at the four flanges. The chamber pressure (reaction pressure) was set to 4 Pa ​​N2 gas and a DC bias voltage of -70 V (with respect to the chamber wall) was applied to the blank assembly. The cathodes were operated (each) in arc discharge mode with a current of 150 A (four flanges). The table rotation speed was 5 rpm. Ti with a thickness of about 3 μm was 0.40 Al 0.60 A layer of N was deposited on the blank.

[0157] Flank wear test: Vertical turning Workpiece material: Sverker 21 (tool steel), hardness approximately 210HB, D=180, L=700mm V c =125m / min f n =0.072mm / rev a p =2mm No cutting fluid

[0158] The cut-off criterion for tool life is a flank wear VB of 0.15 mm.

[0159] Comb crack resistance: Operation: Shoulder milling Tool holder: C5-391.20-25080 Workpiece material: Toolox33 (tool steel), L=600mm, I=200mm, h=100mm Insert type: R390-11T308M-PM Cutting speed V c =250m / min Feed rate f z =0.2mm / rev Cutting depth a p =3mm Radial Fit a e =12.5mm With cutting fluid

[0160] The criterion for the end of tool life is a maximum chipping height VB of more than 0.3 mm.

[0161] The results are presented in Table 7. TIFF2025500047000008.tif99170

[0162] It is concluded that sample 5 within the present invention has high flank wear resistance and shows less flank wear than comparative samples 6-7 outside the present invention which have larger nanolayer thicknesses (average 4 nm and 6 nm respectively). Sample 8, which does not have any internal (Ti,Al)N layer, also performs very well in the flank wear test and also shows good results in the comb crack resistance test. All samples perform well in the comb crack resistance test, and sample 5 within the present invention also passed the test 37 times, but the samples within the present invention show a combination of excellent flank wear resistance combined with high comb crack resistance.

Claims

1. A coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) is Ti １－ｘ Al ｘ The first nanolayer type (9) is N (0.45≦x<0.67), Cr １－ｙ Al ｙ A second nanolayer type (10) is N (0.60≦y≦0.80), and Ti １－ｚ Si ｚ and a nanolayer (8) of about 0.5 to about 10 μm, which are alternating nanolayers of a third nanolayer type (11) of Ti (0.14≦z≦0.25), and each nanolayer type Ti in the nanolayer (8). １－ｘ Al ｘ N(9), Cr １－ｙ Al ｙ N(10), and Ti １－ｚ Si ｚ Coated cutting tool (1) with an average nanolayer thickness of N(11) ≥ 1 nm but < 3 nm.

2. The ratio between the sum of all thicknesses of each nanolayer type in the nanomultilayer (8), Ti １－ｘ Al ｘ N(9): Ti １－ｙ Si ｙ N(10): Ti １－ｚ Al ｚ 2. The coated cutting tool (1) according to claim 1, wherein N(11) is a:b:c, where 0.5<a<3, 0.5<b<3, 0.5<c<3, preferably 0.75<a<2.5, 0.75<b<2.5, 0.75<c<2.

5.

3. The first nanolayer type (9) is Ti １－ｘ Al ｘ 2. A coated cutting tool (1) according to claim 1, wherein, if x is N, then suitably 0.50≦x≦0.62, preferably 0.55≦x≦0.

62.

4. The second nanolayer type (10) is Cr １－ｙ Al ｙ 2. The coated cutting tool (1) according to claim 1, wherein N, 0.65≦y≦0.

75.

5. The third nanolayer type (11) is Ti １－ｚ Si ｚ 2. The coated cutting tool (1) according to claim 1, wherein N, 0.15<z≦0.23, preferably 0.16<z≦0.

21.

6. Each nanolayer type Ti in the nanomultilayer １－ｘ Al ｘ N, Ti １－ｙ Si ｙ N, and Ti １－ｚ Al ｚ 2. The coated cutting tool (1) according to claim 1, wherein the average nanolayer thickness in the N nanomultilayer (8) is between 1 and 2.5 nm.

7. Nano-layer type Ti in nano-multilayer １－ｘ Al ｘ N(9), Cr １－ｙ Al ｙ N(10), and Ti １－ｚ Si ｚ N(11) and nanolayer type Ti １－ｘ Al ｘ N(9), Cr １－ｙ Al ｙ N(10), and Ti １－ｚ Si ｚ 2. The coated cutting tool (1) according to claim 1, wherein the ratio of the average nanolayer thickness in the nanomultilayer (8) to any of the remaining two of N (11) is suitably 0.1 to 10, preferably 0.5 to 5, most preferably 0.8 to 2.

8. In the nano-multilayer (8), within a series of 10 consecutive nano-layers, preferably 8, most preferably 6 consecutive nano-layers, nano-layer type Ti １－ｘ Al ｘ N(9), Cr １－ｙ Al ｙ N(10), and Ti １－ｚ Si ｚ 2. The coated cutting tool (1) of claim 1, wherein all of N(11) are present.

9. The ratio in the nanomultilayer (8) between the sum of the nanolayer thicknesses of each nanolayer type (9), (10), (11) in the nanomultilayer (8), Ti １－ｘ Al ｘ N: Cr １－ｙ Al ｙ N: Ti １－ｚ Si ｚ 3. The coated cutting tool (1) according to claim 2, wherein N is a:b:c, with 0.75<a<1.25, 0.75<b<1.25, and 1.5<c<2.

5.

10. The ratio in the nanomultilayer (8) between the sum of the nanolayer thicknesses of each nanolayer type (9), (10), (11) in the nanomultilayer (8), Ti １－ｘ Al ｘ N: Cr １－ｙ Al ｙ N: Ti １－ｚ Si ｚ 3. The coated cutting tool (1) according to claim 2, wherein N is a:b:c, with 1.5<a<2.5, 0.75<b<1.25, and 0.75<c<1.

25.

11. The coated cutting tool (1) according to claim 1, wherein the nano-multilayer (8) has a thickness of about 1 to about 8 μm, preferably about 1.5 to about 5 μm.

12. 2. The coated cutting tool (1) of claim 1, wherein the coating (6) comprises an inner layer (7) of TiN or (Ti,Al)N having a thickness of about 0.1 to 3 μm below the nano-multilayer (8) closest to the substrate (5).

13. The inner layer (7) is Ti １－ｔ Al ｔ 13. The coated cutting tool (1) according to claim 12, wherein N (0.35≦t≦0.70).

14. 2. The coated cutting tool (1) of claim 1, wherein the substrate (5) of the coated cutting tool (1) is selected from the group consisting of cemented carbide, cermet, ceramic, cubic boron nitride, and high speed steel.

15. The coated cutting tool (1) according to claim 1, wherein the coated cutting tool (1) is a cutting tool insert, a drill or a solid end mill for metal machining.

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