Current supply configuration, plasma generation device, and method for controlling a plurality of plasma processes

Abstract

A current supply configuration (10) for a plurality of plasma generators (17a, 17b, …, 17n) that are each specifically designed to excite a gas into a gas plasma at a location remote from the plasma treatment position, a) a power input terminal (2) for connection to a supply power source (7), b) a data connection (13) for connection to a control mechanism (4) and comprising, c) the current supply configuration (10) is designed to convert the power from the power input terminal (2) into AC voltage power in an AC voltage generator stage (6), d) the current supply configuration (10) is adapted, via the data connection (13), to ensure that the AC voltage power can be delivered as a first AC voltage power to a first load (9a) and as a second AC voltage power to a second load (9b) located at a location remote from the first load, and in particular that power is not supplied to the two loads simultaneously, and further, the first and second AC voltage powers are output current, output voltage, output frequency, output power, output profile of current and / or voltage adapted to be controllable to adjust different characteristics with at least one or a plurality of control values of, e) the current supply configuration (10) is adapted to output a control signal for impedance matching devices (15a, 15b, …, 15n) assigned to one of the AC voltage powers, the current supply configuration (10).

Description

Technical Field

[0001] The present invention relates to a current supply configuration for a plurality of plasma generators, a plasma generator equipped with such a current supply configuration, and a method for controlling a plurality of plasma processes equipped with such a current supply configuration.

Background Art

[0002] Here, the plasma generator can be designed to excite a gas into a gas plasma, particularly at a location remote from the plasma processing position. Such a plasma generator is also called a "remote plasma source". Such a plasma generator is described, for example, in (Patent Document 1) or (Patent Document 2).

[0003] The current supply configuration is often provided integrally with the plasma generator, i.e., the plasma chamber in which the gas plasma is generated. When processing and / or manufacturing materials in a processing chamber, multiple such gas plasma generators located at a distance are often required. These can be used, for example, to excite a gas so that the excited gas is used in the processing. Similarly, these can also be used, for example, to excite a gas so that the gas emitted from the processing chamber is excited.

[0004] A plurality of units consisting of a current supply configuration and a plasma generator are costly, and as the number of such units increases, the risk of one of the units failing increases.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

Patent Document 3

[0006] An object of the present invention is to provide a current supply configuration, a plasma generator, and / or a method for controlling some plasma processes that overcome these drawbacks. [Means for Solving the Problems]

[0007] This problem is achieved by the current supply configuration according to claim 1, the plasma generator according to claim 11, and / or the method according to claim 15. Advantageous forms are disclosed in the dependent claims and / or in this specification.

[0008] Therefore, in one aspect for solving the problem, a current supply configuration for a plurality of plasma generators, which are specifically designed to excite a gas into a gas plasma at a location remote from the plasma processing position, a) a power input terminal for connecting to a supply power source, b) a data connection for connecting to a control mechanism and comprising, c) the current supply configuration is designed to convert the power from the power input terminal into alternating voltage power in an alternating voltage generator stage, d) the current supply configuration, via the data connection, · Adapted to ensure that alternating voltage power can be delivered as first alternating voltage power to a first load and as second alternating voltage power to a second load located at a location remote from the first load, and in particular not powered to the two loads simultaneously, and further, · The first and second alternating voltage powers, · Output current, · Output voltage, · Output frequency, · Output power, · Output profile of current and / or voltage Can be controlled to have different characteristics with at least one or more control values among them, e) The current supply configuration is adapted to output a control signal for an impedance matching device assigned to one of the alternating voltage powers, A current supply configuration is disclosed.

[0009] "Characteristics regarding control values" means specific given values regarding one or more control values.

[0010] For example, regarding the first alternating voltage power, the output power is 3 kW, the output frequency is 30 kHz, and the output profile of the current may be a rectangular pulse with a pulse duty ratio of 70% and a repetition frequency of 100 Hz. For example, regarding the second alternating voltage power, the output power is 4 kW, the output frequency is 35 kHz, and the output profile of the current may be a rectangular pulse with a pulse duty ratio of 70% and a repetition frequency of 100 Hz, similar to the first alternating voltage power.

[0011] As control value characteristics, additionally or alternatively, extreme values, i.e., values that must not be exceeded (e.g., maximum current 10 A or minimum power 100 W), can also be specified regarding one or more control values.

[0012] At least one of these control value characteristics is different between the first and second alternating voltage powers.

[0013] In one aspect, the control value characteristics are such that at least two of these control value characteristics are different, and particularly preferably at least three are different.

[0014] As used herein, an impedance matching device means a device that can convert an output impedance connected, for example, in the direction of a load so that a given impedance can be adjusted at its input. There are many types of impedance matching devices. Descriptions of such impedance matching devices are given, for example, in (Patent Document 3), (Patent Document 4), (Patent Document 5), and (Patent Document 6). These often include both variable reactance and fixed reactance, that is, both inductance and capacitance. Also known are elements that change impedance, such as transmission lines, resistors, transducers, baluns, and couplers. The variable elements can be variably controlled electronically. Here, for example, a vacuum capacitor can be changed by a motor, or the reactance can be switched on and off.

[0015] An AC voltage generator stage means an electronic circuit adapted to convert a first power, for example, DC power, into AC power. AC power is characterized by the voltage and current periodically changing their signs. Here, the current and voltage can have different profiles. The voltage and / or current can be, for example, approximately sinusoidal or approximately rectangular. In the latter case, it is often called a bipolar voltage generator stage. Such an AC voltage generator stage often comprises a bridge circuit composed of switching elements, particularly transistors, preferably MOSFETs or IGBTs.

[0016] In one aspect, the current supply configuration is a) a first power output terminal for delivering a first AC voltage power to a first load, and b) a second power output terminal for delivering a second AC voltage power to a second load located at a location remote from the first load and further comprises.

[0017] In one aspect, the current supply configuration further comprises a switching unit, which is in particular part of the current supply configuration. The current supply configuration is controllable via a data connection such that the switching unit can feed the alternating voltage power generated by the alternating voltage generator stage to one of the power output terminals and / or the load, and in so doing is adapted to be able to adjust different characteristics of the respective alternating voltage power. Here, the switching unit means an electronic component adapted to conduct an electrical signal from a first contact to a second contact in a first setting and to impede, in particular prevent, this conduction in a second setting. Advantageously, the switching unit can conduct the electrical signal from the first contact to a third contact in a second position in the second setting and can impede, in particular prevent, this conduction in the first setting. The switching unit may be a transistor, in particular a power transistor, advantageously an IGBT or a MOSFET. Other embodiments are also conceivable, such as PIN diodes or electromechanical switches.

[0018] In one aspect, a current supply configuration for a plurality of plasma generators, each designed in particular to excite a gas to a gas plasma at a location remote from the plasma treatment location, a) a power input terminal for connection to a supply power source, b) a data connection for connection to a control mechanism which can be arranged in particular inside or outside the current supply configuration and c) the current supply configuration is designed to convert the power from the power input terminal into first and second alternating voltage powers in an alternating voltage generator stage, the current supply configuration further d) a first power output terminal for delivering the first alternating voltage power to a first load, e) a second power output terminal for delivering the second alternating voltage power to a second load located at a location remote from the first load and f) the current supply configuration is such that via the data connection, the first and second alternating voltage powers · output current, · output voltage, · Output frequency, · Output power, · Output profile of current and / or voltage is adapted to be controllable so as to be able to have different characteristics with at least one or a plurality of control values among them, g) The current supply configuration is adapted to output one, in particular one control signal for each impedance matching device, in particular a plurality of control signals, assigned to one of the AC voltage powers, A current supply configuration is disclosed.

[0019] Accordingly, a plurality of plasma processes or a plurality of plasma generators can be operated with one current supply configuration. This improves reliability and significantly reduces costs. By providing one or more control signals for the impedance matching device assigned to the plasma generator, these control signals can also be individually prepared according to the respective AC voltage power of each plasma generator.

[0020] In one aspect, the current supply configuration can comprise one, in particular a plurality of switching units, and the current supply configuration is adapted via a data connection to ensure that the switching unit feeds the AC voltage power generated by the AC voltage generator stage into each one of the power output terminals, and the current supply configuration can be further adapted to be able to adjust different characteristics of the respective AC voltage power. Accordingly, an AC voltage generator stage can be provided for individual plasma generators with one current supply configuration. This saves a considerable amount of cost.

[0021] In one aspect, one or more switching units can be arranged outside the current supply configuration, and the current supply configuration is adapted via a data connection such that the switching unit can be controlled to feed the AC voltage power generated by the AC voltage generator stage into each of the power output terminals, where different characteristics of each AC voltage power can be adjusted. Thus, with one current supply configuration, an AC voltage generator stage can be provided for individual plasma generators. This can result in significant cost savings and is also highly adaptable to corresponding applications.

[0022] Between the impedance matching device and the current supply configuration, one connection line having a length of 1 m or more, particularly 3 m or more, can be arranged for transmitting the AC voltage power. This makes the use of the current supply configuration particularly flexible, thereby increasing the cost-effectiveness.

[0023] In one aspect, the current supply configuration can be designed such that the sum of the rated powers of all the AC voltage powers deliverable, particularly outputtable, to the load is greater than the rated power of the AC voltage generator stage. Thus, an AC voltage generator stage with a relatively low rated power can be used to supply power to multiple plasma generators, each of which individually does not require more rated power than the AC voltage generator stage can provide, but at the same time, when all are added together, a considerably high rated power is required. This works because the plasma generators can be powered sequentially in time, i.e., they are not all powered simultaneously.

[0024] In one aspect, the current supply configuration can be adapted to output different drive signals for a plurality of impedance matching devices assigned to each of the AC voltage powers.

[0025] In one aspect, the current supply configuration can be adapted to receive one and / or a plurality of plasma signals, in particular one and / or a plurality of plasma voltages, transmitted from one of the plasma generators. A plasma signal means a signal determined within or in the immediate vicinity of the generated plasma, i.e., for example, a measured signal. This is, for example, a signal measured on the winding side of the excitation transformer by which the plasma is excited. It can also be an optical signal to be measured, an electromagnetic wave in an invisible range such as the UV or X-ray range, an electric field or a magnetic field, a noise signal, a vibration signal, or an ultrasonic signal. Particularly preferably, it is a plasma voltage measurable in particular on the winding side of the excitation transformer.

[0026] In one aspect, the current supply configuration can be adapted to assign one or more of the transmitted plasma signals to the characteristics of the AC voltage power, and in particular to adjust the characteristics of the AC voltage power according to each plasma signal. Thereby, all plasma generators can be controlled individually, very precisely and reliably, by the current supply configuration.

[0027] In one aspect, the current supply configuration can be adapted to receive one and / or a plurality of voltages and / or current intensities transmitted from a current and / or voltage measurement sensor arranged and adapted to measure the current and / or voltage of the AC voltage power. In particular here, the current supply configuration can be further adapted to assign one or more of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power, and in particular to adjust the characteristics of the AC voltage power according to each voltage and / or current intensity. Thereby, all plasma generators can be controlled individually, very precisely and reliably, by the current supply configuration.

[0028] In one aspect, the current supply configuration can be adapted to receive one and / or a plurality of voltages and / or current intensities transmitted from a current and / or voltage measurement sensor arranged and adapted to measure the current and / or voltage within or at the impedance matching device. In particular here, the current supply configuration can be further adapted such that it assigns one or more of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power, in particular adjusts the characteristics of the AC voltage power according to each voltage and / or current intensity. Thereby, all plasma generators can be controlled individually, very precisely and reliably by the current supply configuration.

[0029] In one aspect, the control mechanism can be integrated into the current supply configuration. This enables further cost savings and thus all plasma generators can be controlled individually, very precisely and reliably by the current supply configuration.

[0030] In one aspect, the plasma generating device a) the current supply configuration described above, and b) a plurality of plasma generators connected to the current supply configuration, in particular to its power output terminals, and operable according to respective control value characteristics can be provided.

[0031] In one aspect, the plasma generation device includes a first transformer configuration for coupling AC voltage power to the load, particularly one transformer configuration for each plasma generator, and preferably the transformer configuration is arranged very close to the load. This enables further cost savings, and thus all plasma generators can be individually, very accurately and reliably controlled by the current supply configuration. Here, the transformer configuration includes a first winding and a second winding, and is an electrical induction component capable of transmitting the AC power applied to the first winding (primary winding) to the second winding (secondary winding). Such transformer configurations have many different structural options, and the windings can be wound around a magnetic core, for example, or arranged planar on a circuit board, or a combination of both structural styles can be used, and further other deformation forms are also possible. A possible second "winding" can be, for example, the generated plasma itself. An example regarding such a transformer configuration is disclosed as "transformer 35" in (Patent Document 7), for example.

[0032] In one aspect, the plasma generation device includes impedance matching devices, particularly a plurality of impedance matching devices, and preferably one impedance matching device is arranged between the current supply configuration and each plasma generator. This enables further cost savings, and thus all plasma generators can be individually, very accurately and reliably controlled by the current supply configuration.

[0033] In one aspect, the plasma generation device can include a connection line having a length of 1 m or more, particularly 3 m or more, between the impedance matching device and the current supply configuration. This makes the plasma generation device particularly flexible to use.

[0034] In one aspect, the plasma generation device can use a plasma generator for post-treating the gas discharged from the plasma processing device. In one aspect, the plasma generation device can use a plasma generator for pre-treating the gas introduced into the plasma processing device. In particular, the plasma generation device can include both plasma generators.

[0035] In one aspect, the impedance matching device a) inductance, b) capacitance can include one or more components of, where the inductance and / or capacitance can be adjustable and is controlled by a signal connected to the data terminal. This enables further cost savings, and thus all plasma generators can be individually, very precisely and reliably controlled by the current supply configuration.

[0036] In one aspect, one, in particular a plurality, of the plasma generators can be designed to excite a gas into a gas plasma at a location remote from the plasma treatment position. Thus, advantageously, it is used as a so-called remote plasma source.

[0037] In one aspect, a method for controlling a plurality of plasma processes each specifically designed to excite a gas into a gas plasma at a location remote from the plasma treatment position, a) supplying supply power to a current supply configuration; b) converting the supply power into a first alternating voltage power and delivering the first alternating voltage power to a first load of a first plasma generator; c) converting the supply power into a second alternating voltage power and delivering the second alternating voltage power to a second load of a second plasma generator, wherein in particular steps b) and c) are not performed simultaneously, steps; d) · output current, · output voltage, · output frequency, · output power, · output profile of current and / or voltage, controlling the alternating voltage power according to various characteristics with one or more of the control values of; e) generating and outputting a control signal for an impedance matching device assigned to one of the alternating voltage powers A method including this can be provided.

[0038] Therefore, a plurality of plasma processes or a plurality of plasma generators can be operated with one current supply configuration. This improves reliability and significantly reduces costs. By providing one or more control signals for the impedance matching device assigned to the plasma generator, these control signals can be provided individually according to the respective AC voltage power of each plasma generator. All the features of the aforementioned device can significantly develop this method.

[0039] In one aspect, this method can deliver a plurality of AC voltage powers to each one load of the associated plasma generator, and the delivery of the AC voltage power to the load is not performed simultaneously. Each load operates with its associated control characteristics. In particular, it generates and outputs a plurality of control signals for the impedance matching device assigned to one of the AC voltage powers.

[0040] In one aspect, the first and / or second AC voltage power can be transmitted via connection lines having a length of 1 m or more, particularly 3 m or more, respectively. This makes the method particularly flexible, thereby making it cost-effective.

[0041] In one aspect, a computer program product can be provided for controlling the aforementioned current supply configuration, particularly with respect to features g) and f), and / or with respect to method steps d) and e).

[0042] In one aspect, a non-volatile memory medium can be provided, and instructions for execution by a processor, or instructions for configuring a programmable logic device for executing the control of the aforementioned current supply configuration particularly for features g) and f) and / or with respect to method steps d) and e) are stored therein.

[0043] Further features and advantages of the present invention will become apparent from the following detailed description of exemplary embodiments of the invention with reference to the figures showing the essential details of the invention, and from the claims. The features shown therein are not necessarily drawn to scale and are illustrated so as to clearly view the characteristics according to the present invention. In variations of the present invention, various features can be realized individually or in any combination of pluralities thereof.

[0044] Exemplary embodiments of the present invention are shown in schematic diagrams and will be described in the following description.

Brief Description of the Drawings

[0045]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Modes for Carrying Out the Invention

[0046] Figure 1 shows a first plasma generating apparatus 1 including a first current supply configuration 10 and, by way of example, three plasma generators 17a, 17b, …, 17n. The plasma generating units 17a, 17b, …, 17n each include a load 9a, 9b, …, 9n, and the loads 9a, 9b, …, 9n are connected to power output terminals 3a, 3b, …, 3n via impedance matching devices 15a, 15b, …, 15n, respectively.

[0047] For clarity, in each case only three plasma generating units 17a, 17b, …, 17n each having one impedance matching device 15a, 15b, …, 15n are shown. Of course, there may be four or more such devices. This is suggested, for example, by the three-point leader symbol between power output terminals 3b and 3n. The power output terminals 3a, 3b, …, 3n each have measurement sensors CT1a, CT1b, …, CT1n for measuring current and / or voltage, for example. The signals determined there are fed to a data connection 13 connected to a control mechanism 4 via a data bus 16. Here, there may also be measurement sensors for frequency, phase, power, particularly forward power and / or reflected power.

[0048] The loads 9a, 9b, …, 9n are here in particular so-called “remote plasma sources” (RPS). These are special plasma generators 17a, 17b, …, 17n adapted to excite a gas into a gas plasma at a location remote from the plasma processing position. Advantageously, transformer configurations T1a, T1b, …, T1n are used for this type of plasma excitation. At the secondary side of these transformer configurations facing the plasma, a plurality of plasma signals CT4a, CT4b, …, CT4n, particularly one and / or a plurality of plasma voltages, can be detected. These can also be transmitted to the data connection 13 via the data bus 16.

[0049] At least one plasma generator 17a is connected to the power output terminal 3a of the current supply configuration 10 via an impedance matching device 15a. In this exemplary embodiment, all the plasma generators 17a, 17b, …, 17n are each connected to each one of the power output terminals 3a, 3b, …, 3n of the current supply configuration 10 via one impedance matching device 15a, 15b, …, 15n, respectively.

[0050] The impedance matching devices 15a, 15b, …, 15n have, for example, a plurality of switchable inductances L1a, L2a, L3a, L1b, L2b, L3b, …, L1n, L2n, L3n. These are provided switchably, particularly in parallel with the connection lines between the plasma generators 17a, 17b, …, 17n and the power output terminals 3a, 3b, …, 3n of the current supply configuration 10. Thereby, impedance matching can be carried out very quickly and stepwise. The currents passing through these inductances L1a, L2a, L3a, L1b, L2b, L3b, …, L1n, L2n, L3n can be determined using measurement sensors CT2a, CT2b, …, CT2n. These determined signals can also be fed to the data bus 16 in the same manner.

[0051] The impedance matching devices 15a, 15b, …, 15n have, for example, one capacitance C1a, C1b, …, C1n each. This may be, in particular, an adjustable capacitance by means of an adjustable vacuum capacitor, for example. As shown here, the capacitance can be provided in series between the plasma generators 17a, 17b, …, 17n and the power output terminals 3a, 3b, …, 3n of the current supply configuration 10. Thereby, impedance matching can be carried out very reliably.

[0052] Similarly, as shown here, further inductances L4a, L4b, …, L4n can also be provided in series between the plasma generators 17a, 17b, …, 17n and the power output terminals 3a, 3b, …, 3n of the current supply configuration 10. This can be realized at least partly by the leakage inductances of the transformer configurations T1a, T1b, …, T1n.

[0053] Additional measurement sensors CT4a, CT4b, …, CT4n suitable for detecting current, voltage, phase, impedance, and / or power can be provided at or inside the outputs of impedance matching devices 15a, 15b, …, 15n. These detected signals can also be fed to the data bus 16 in the same manner.

[0054] The current supply configuration 10 includes a power input terminal 2 for connecting to the supply power source 7.

[0055] The current supply configuration 10 further includes a first power converter stage 5 configured to convert the input power at the power input terminal 2 into intermediate power, preferably DC intermediate circuit power 12. A plurality of first power converter stages 5 for converting the input power at the power input terminal 2 into intermediate power, preferably intermediate circuit power 12, can also be part of the current supply configuration 10 and can preferably be connected in parallel.

[0056] The current supply configuration 10 particularly further includes an AC voltage generator stage 6, and the AC voltage generator stage 6 is connected downstream of the first power converter stage 5 and is configured to convert the intermediate power from the first power converter stage into bipolar output power.

[0057] An energy storage element such as an inductor or a capacitor can be mounted between the power converter stage 5 and the further AC voltage generator stage 6, particularly for smoothing the current or voltage.

[0058] The current supply configuration 10 here further includes a plurality of switching units 8a, 8b, …, 8n arranged, for example, between the AC voltage generator stage 6 and the power output terminals 3a, 3b, …, 3n.

[0059] One or more switching units can also be arranged outside the current supply configuration 10, particularly near, immediately before or after, or inside one of the impedance matching devices 15a, 15b, …, 15n (not shown). Since the data bus 16 has a connection outside the current supply configuration 10 in any case, the control of the switching unit is also possible outside the current supply configuration 10.

[0060] The current supply configuration 10 further includes a control mechanism 4, which is configured to adjust the current supply configuration 10 to pass bipolar output power to the power output terminals 3a, 3b, …, 3n using at least one control parameter among power, voltage, current, excitation frequency, or a threshold value for protection measures, and at least one of the control parameters at the first power output terminal 3a is different from the corresponding control parameters at the other power output terminals 3b, …, 3n.

[0061] In this example, the control mechanism 4 has connections to the power converter stage 5 and the switching units 8a, 8b, …, 8n. Some of these connections, for example, the connection to the power converter stage 5, may be optional. The control mechanism 4 can be configured to switch the switching units 8a, 8b, …, 8n from the closed state to the open state only when the absolute value of the current through the switch is less than 1 ampere, preferably zero. This has the advantage that switching units 8a, 8b, …, 8n that do not need to be designed to switch higher currents can be used. This makes the device less expensive.

[0062] The plasma generation device 1 can include a control mechanism outside the current supply configuration 10. This external control mechanism can also control the plasma process at the loads 9a, 9b, …, 9n.

[0063] The control mechanism 4 can also be configured to switch the switching units 8a, 8b, …, 8n from the open state to the closed state only when the absolute value of the voltage between both ends of the open switch is less than 20 volts, preferably zero. This has the advantage that switching units that do not need to be designed to switch higher voltages can be used. As a result, the device becomes even less expensive.

[0064] The current supply configuration 10 can convert the input power into bipolar output power and deliver this output power to at least two independent loads 9a, 9b, …, 9n. The current supply configuration - a power input terminal 2 for connecting to the supply power source 7, - at least two, preferably three or more, power output terminals 3a, 3b, …, 3n for connecting to one of the respective loads 9a, 9b, …, 9n, - a control mechanism 4 configured to control the current supply configuration to deliver bipolar output power to the power output terminals using at least one control parameter among power, voltage, current, excitation frequency, or a threshold value for protection measures by obtaining a complete set of target values regarding the parameters of the power output terminals and The control mechanism 4 is further designed in particular to calculate whether the current supply configuration can deliver each target value to each power output terminal, and if it can, to calculate a sequence of pulses for delivering power to the power output terminals to provide power for the plasma process.

[0065] In a further aspect, the control mechanism 4 can be configured to control the current supply configuration 10 such that at least one of the control parameters at the first power output terminals 3a, 3b, …, 3n is not equal to the corresponding control parameter of another power output terminal. Thereby, a single current supply configuration having a given maximum power can be used instead of a plurality of current supply configurations.

[0066] In the present disclosure, bipolar output power means output power having an alternating current in which the direction of the current changes at a frequency (excitation frequency) capable of exciting a plasma process. The control parameter may be a measured value or a target value of the above parameters.

[0067] The measured value and the target value may be an absolute value, an instantaneous value, an effective value such as an RMS (root mean square) value, or an extreme value (for example, a maximum value or a minimum value).

[0068] The input power may be power delivered from an AC power grid. It may also be a DC power line (AC: alternating current, DC: direct current).

[0069] The control mechanism 4 may be composed of a microcontroller in which a software program is executed when the current supply configuration is operating. The control mechanism 4 can have a plurality of interfaces, for example, external components that can be connected wired or wirelessly, data connections to a monitor, a keyboard, etc.

[0070] The control mechanism can have a calculation part and a memory part. The memory part can be subdivided for various purposes, for example, a monitor memory, a RAM, a data memory, a program memory, etc.

[0071] The threshold value may be a value used to recognize ignition or destruction of the plasma. The threshold value can be set differently for each output port and may change over time.

[0072] The bipolar output power may be a power value exceeding 1 kW, preferably exceeding 10 kW.

[0073] The bipolar output power can have a frequency exceeding 1 kHz, preferably exceeding 10 kHz, preferably exceeding 50 kHz.

[0074] In a further aspect, the current supply configuration 10 can include a power converter stage 5 configured to convert the input power into intermediate power, preferably DC intermediate circuit power.

[0075] In a further aspect, the current supply arrangement can include at least one AC voltage generator stage 6 configured to convert the intermediate power from the first power converter stage 5 into bipolar output power.

[0076] In a further aspect, the current supply arrangement 10 can include at least two further AC voltage generator stages 6a, 6b, …, 6n, which are configured to convert the intermediate power from the first power converter stage 5 into a plurality of bipolar output power signals and send this power to the power output terminals.

[0077] In a further aspect, the control mechanism 4 can be configured to control the power converter stage 5 and / or the AC voltage generator stages 6, 6a, 6b, …, 6n. In use, the current supply arrangement 10 delivers a first power output signal at a first time point over a first time frame, in particular at a first power output terminal, and a second power output signal at a second time point over a second time frame, in particular at a second power output terminal, the first time point being different from the second time point and / or the first time frame being different from the second time frame.

[0078] In a further aspect, the current supply arrangement can include one or more switching units 8a, 8b, …, 8n between the power converter stage and the power output terminals 3a, 3b, …, 3n.

[0079] In a further aspect, the switching units 8a, 8b, …, 8n are controlled by the control mechanism 4.

[0080] In a further aspect, the control mechanism 4 can be configured to control the power converter stage 5 and / or the AC voltage generator stages 6, 6a, 6b, …, 6n and / or the switching units 8a, 8b, …, 8n. In use, the current supply configuration delivers a first output power signal at a first power output terminal over a first time frame at a first point in time and a second power signal at a second power output terminal over a second time frame at a second point in time, where the first point in time is different from the second point in time and / or the first time frame is different from the second time frame.

[0081] In a further aspect, the switching units 8a, 8b, …, 8n are configured to conduct current in two opposite directions.

[0082] In a further aspect, the control mechanism 4 can be configured to switch the switching units 8a, 8b, …, 8n from a closed state to an open state only when the value of the current through the switch is less than 1 ampere, preferably zero.

[0083] In a further aspect, the control mechanism 4 can also be configured to operate the switching unit from an open state to a closed state only when the value of the voltage across the open switch is less than 20 volts, preferably zero.

[0084] In a further aspect, at least one of the power converter stage 5 and / or the AC voltage generator stages 6, 6a, 6b, …, 6n includes a bridge circuit, preferably a full bridge circuit.

[0085] The bridge circuit may be a rectifier bridge circuit capable of rectifying AC power.

[0086] The bridge circuit may also be a switching bridge circuit for generating bipolar output power.

[0087] In a further aspect, the current supply configuration 10 can include a housing surrounding all other components of the unit.

[0088] In a further aspect, the input terminal can be directly connected to the control panel.

[0089] In a further aspect, the power output terminals 3a, 3b, …, 3n can be directly connected to the housing.

[0090] In a further aspect, the plasma processing apparatus 1 - two, preferably three or more loads 9a, 9b, …, 9n, and - the electric current supply configuration 10 described above can be included.

[0091] Each load 9a, 9b, …, 9n can be connected to one of the power output terminals 3a, 3b, …, 3n of the current supply configuration.

[0092] The problem of the present invention is also solved by a control mechanism 4 for controlling a plurality of plasma processes in a plurality of loads by converting input power into bipolar output power and delivering this output power to the loads, where the control mechanism obtains a complete set of target values regarding the parameters of the power output terminals, and uses at least one control parameter among power, voltage, current, excitation frequency, or a threshold value for protection measures to control the current supply configuration so as to deliver the bipolar output power to the power output section, where the control mechanism calculates whether the current supply configuration can deliver each target value to each power output terminal, and if it can, is further designed to calculate a sequence of pulses for delivering power to the power output terminals to provide power for the plasma process.

[0093] In a further embodiment of the control mechanism 4, the complete set of target values can preferably be provided by interface connection from a control mechanism external to the current supply configuration, and the external control mechanism also controls the plasma process in the plasma chamber.

[0094] In a further embodiment of the control mechanism 4, the calculation can include determining the maximum target power at all times and comparing it with the maximum power of the current supply configuration.

[0095] In a further embodiment of the control mechanism 4, if the calculation shows that it is not possible to deliver the target power to each power output terminal, an error message can be given.

[0096] In a further embodiment of the control mechanism 4, if the calculation shows that it is not possible to deliver the target power to each power output terminal, one or more possibilities to change the process using a new set of target values can be provided.

[0097] In a further embodiment of the control mechanism 4, the control mechanism can control the current supply configuration such that at least one control parameter of the first plasma chamber is not equal to the corresponding control parameter of another plasma chamber.

[0098] The plasma processes at different loads 9a, 9b,..., 9n may be different or the same. Even if they are the same, their states may be different. That is, the plasma process at the first load is, for example, in the first gas excitation state, and the plasma process at another load is initially in the gas conversion state.

[0099] As shown in FIGS. 7 and 8, bipolar transistors 81, 82, 91, 92 can be used for the switching units 8a, 8b,..., 8n. These bipolar transistors are much cheaper than MOSFETs. The bipolar transistors 81, 82, 91, 92 may be IGBTs, and IGBTs are cost-effective transistors that pass high currents with low energy losses. This eliminates the need for an expensive cooling device, making the current supply configuration 10 even cheaper.

[0100] In FIGS. 7 and 8, additional diodes 83, 84, 93, 94 are connected to allow current to flow in the desired direction and block current in the undesired direction.

[0101] The power converter stage 5 can include a rectifier circuit, preferably a rectifier bridge circuit 50 as shown in FIG. 5. Four rectifier diodes 52, 53, 54, 55 are connected to form a bridge circuit, which rectifies the alternating current from the first terminal 51 to the second terminal 56. Additionally, at least one element of a filter, an overvoltage protection circuit, and an overcurrent protection circuit can be connected to the first terminal 51. The filter can consist of one or more energy storage elements such as capacitors and inductances.

[0102] The alternating voltage generator stage 6 can include a switching bridge, preferably a full-bridge circuit 60 as shown in FIG. 6. This full-bridge circuit 60 includes four switching units 62, 63, 64, 65. These switching units can be transistors, bipolar transistors, IGBTs, and particularly preferably MOSFETs. A filter circuit with one or more energy storage elements such as a capacitor 61 and / or inductances 66, 67 can be located at the input of the second alternating voltage generator stage 6. The full-bridge circuit 60 can further include several diodes as shown.

[0103] The current supply configuration 10 can include a housing that surrounds all other components of the current supply configuration 10. The housing is made of metal and can thus provide excellent protection against electromagnetic interference. The power input terminal 2 can be directly connected to the housing. The power output terminals 3a, 3b, …, 3n can also be directly connected to the housing 10 in the same way.

[0104] In the current supply configuration 10, the combined current feeding capacity of all the switching units 8a, 8b, …, 8n can be higher than the maximum current delivery capacity of the power converter stage 5.

[0105] Figure 2 shows a second plasma generating device 1' having a second current supply configuration 10'. The second current supply configuration 10' is an alternative form of the first current supply configuration 10 as shown in Figure 1. All elements corresponding to the elements in Figure 1 are given the same reference numbers. The current supply configuration 10' shown in Figure 2 includes a plurality of power converter stages 6a, 6b, …, 6n instead of the switching units 8a, 8b, …, 8n. The power converter stages 6a, 6b, …, 6n are configured to convert the DC intermediate power 12 from the first power converter stage 5 into a plurality of bipolar output power signals and send these powers to the power output terminals 3a, 3b, …, 3n. All the power converter stages 6a, 6b, …, 6n are controllable by the control mechanism 4. All the power converter stages 6a, 6b, …, 6n may consist of a full bridge 60 and filter elements 61, 66, 67 as shown in Figure 6.

[0106] Measurement sensors CT1a, CT1b, …, CT1n for detecting voltage, current, frequency, or power may be connected to the power output terminals 3a, 3b, …, 3n. The current supply configuration 10' also belongs to a plurality of power converter stages 5. These power converter stages 5 are configured to convert the input power at the power input terminal 2 into intermediate power, preferably DC intermediate circuit power 12, and are preferably connected in parallel.

[0107] The connection lines for transmitting AC voltage power between the current supply configuration 10' and one or more impedance matching devices 15a, 15b, …, 15n can have a length of 1 m or more, particularly 3 m or more. These cables can particularly have a given impedance, which may preferably be a real impedance without an imaginary part and particularly preferably in the range of 45 to 80 Ω. In such a case, one or more impedance matching devices 15a, 15b, …, 15n and the control signals therefor are particularly useful.

[0108] FIG. 3 shows a timing diagram of the output power at the first power output terminal 3a. Axis t is the time axis, and axis S30 can be, for example, a voltage axis, a current axis, or a power axis. Axis S30 represents the actual values of these parameters, and axis S31 represents the effective values of these parameters. In the first graph of FIG. 3 having axis S30, bipolar signals are shown by two signal sequences 31, 32. Signal sequence 31 has an excitation frequency with a period of 2 / 11 of the time window, starts at time point T31, and ends at time point T32. Signal sequence 32 has an excitation frequency with a period of 2 / 11 of the time window, starts at time point T33, and ends at time point T34. In this example, these frequencies are the same, but they may also be different. In the second graph of FIG. 3 having axis S31, the effective values of the two signal sequences 31, 32 are shown by two signal sequences 33, 34. Two threshold lines 35, 36 are also shown in this graph. These can be used to recognize plasma breakdown such as plasma arc or ignition when the effective value of one of the parameters of power, voltage, or current exceeds such a threshold.

[0109] In the current supply configuration 10’, the total current feeding capacity of all the power converter stages 6a, 6b, …, 6n can be higher than the total maximum current delivery capacity of all the power converter stages 5.

[0110] Figure 4 shows a timing diagram of the output power at another power output terminal 3b, …, 3n. Axis t is the time axis, and axis S40 can be, for example, a voltage axis, a current axis, or a power axis. Axis S40 represents the actual value of these parameters, and axis S41 represents the effective value of these parameters. In the first graph of Figure 4 having axis S40, bipolar signals are shown by two signal sequences 41, 42. Signal sequence 41 has an excitation frequency having a period of 1 / 7 of the time window, starts at time point T41, and ends at time point T42. At time point T43, the second pulse 44 starts, and its end cannot be seen in this graph. At time point T43, the second signal sequence 42 starts. From this example, it can be seen that the frequencies of signal sequences 31, 32 and signal sequences 41, 42 are different, and the frequencies of signal sequences 41, 42 are higher than the frequencies of signal sequences 31, 32.

[0111] In addition to or instead of exciting with different frequencies, it is also possible to make the power, voltage, current, or threshold value for protection measures different between two different power output terminals 3a, 3b, …, 3n or at two different loads 9a, 9b, …, 9n.

[0112] This graph also shows two threshold lines 45, 46. These can be used to recognize plasma breakdown such as plasma arc or ignition when the effective value of one of the parameters of power, voltage, or current exceeds such a threshold value.

[0113] In the present invention, as shown by signal sequences 31, 32, 41, 42, input power is converted into bipolar output power, and this output power is passed to loads 9a, 9b, …, 9n, so as to operate to control a plurality of plasma processes in the plurality of loads 9a, 9b, …, 9n using a control mechanism 4. The control mechanism 4 obtains a complete set of target values regarding the parameters of power output terminals 3a, 3b, …, 3n, and uses at least one control parameter among power, voltage, current, excitation frequency, or threshold values for protection measures to control current supply configurations 10, 10' to pass bipolar output power to the power output terminals 3a, 3b, …, 3n. The control mechanism 4 further calculates whether the current supply configurations 10, 10' can deliver each target value to each power output terminal 3a, 3b, …, 3n, and when it can be delivered, it is designed to calculate a pulse sequence for delivering power to the power output terminals 3a, 3b, …, 3n to provide power for the plasma process.

[0114] For this purpose, the control mechanism 4 can control the power converter stages 6, 6a, 6b, …, 6n or the switching units 8a, 8b, …, 8n such that the unit 1 delivers a first output power signal to the first power output terminal 3a over a first time frame T31 - T32 at a first time point T31 during operation, and delivers a second power signal to the second to nth power output terminals 3b, …, 3n over a second time frame T41 - T42 at a second time point T41, where the first time points T31, T41 are different from the second time points T32, T42, and / or the first time frame T31 - T32 is different from the second time frame T41 - T42.

[0115] The plasma generating device 1 in FIG. 1 and the plasma generating device 1' in FIG. 2 impose restrictions on the simultaneous operation of a plurality of power output terminals 3a, 3b, …, 3n. In the case of the plasma generating device 1' in FIG. 2, these restrictions occur, for example, when the total power or processing capacity of the output stage connected to the input stage exceeds the power or instantaneous capacity of this input stage, and it is not possible to provide the maximum output power simultaneously at all the power output terminals 3a, 3b, …, 3n. In the case of the plasma generating device in FIG. 1, it is also possible to provide the maximum output power to only one of the power output terminals 3a, 3b, …, 3n, or to provide a part of the power to a plurality of the power output terminals 3a, 3b, …, 3n. If independent operation of different plasma processes is required, this can be achieved as long as the sum of the total duty cycles of all the processes and the time for switching between outputs is shorter than the total cycle time.

[0116] These restrictions define the range within which operation is possible and the range outside which operation is not possible within the above parameter ranges. For each requirement to provide power at the output or in a set of the power output terminals 3a, 3b, …, 3n during current supply, it is necessary to determine whether the state is within or outside the range where operation is possible. As a result, sequence control is required.

[0117] The sequence control 14 may be part of the control mechanism 4. The algorithm of the sequence control 14 determines, for each requirement for the current supply configuration 1 or for a requirement to change one or more parameters, whether the requirement is within the possible operating range and the output power to be delivered for each power output terminal. Regarding the processes shown in FIGS. 3 and 4 where power is delivered to the power output terminals 3a, 3b, …, 3n and different power output terminals 3a, 3b, …, 3n operate at different powers, different pulse duty cycles, or different pulse frequencies, the sequence control ensures the following. - To avoid pulse overlap, the pulse frequencies are integer multiples of each other (in the case of the plasma device 1' in FIG. 2). - When pulses overlap, the required total power and total current do not exceed the possible maximum values (in the case of the plasma device 1' in FIG. 2). - If the maximum value possible for a limited period within a cycle is exceeded, a pattern without this excess is found (in the case of the plasma device 1' in Figure 2). - The sum of the time for switching between pulses and the output at several points is less than the minimum pulse cycle frequency (in the case of the plasma device 1 in Figure 1). - The newly requested output pulse pattern at a specific output is activated at an appropriate time so as to match the existing pulse pattern of another output (in the case of the plasma device 1 in Figure 1). - Do not exceed the total average power limit and current. - If the requested sequence is outside the possible range, a warning is issued to the user. - A possible modified sequence is recommended to the user.

[0118] Figure 9 shows a flowchart regarding the method procedure. This method can be characterized particularly by its suitability for controlling a plurality of plasma processes, and the plasma processes are each designed to excite a gas into a gas plasma at a location remote from the plasma processing position, that is, to control a plurality of so-called "remote plasma sources" RPS, and includes the following steps. Step 71: Supply power to the current supply configuration 10. Step 72: Convert the supplied power into first AC voltage power and deliver the first AC voltage power to the first load 9a of the first plasma generator 17a. Step 73: Convert the supplied power into second AC voltage power and deliver the second AC voltage power to the second load 9b of the second plasma generator 17b. Here, Step 73 and Step 72 are not performed simultaneously. Step 74: · Output current, · Output voltage, · Output frequency, · Output power, · Output profile of current and / or voltage Control the AC voltage power according to various characteristics with one or more of the control values among them, and Step 75: Generate and output a control signal for impedance matching devices 15a, 15b, …, 15n assigned to one of the AC voltage powers.

Explanation of Signs

[0119] 1 Plasma generator 2 Power input terminal 3a, 3b, …, 3n Power output terminals 4 Control mechanism 5 Power converter stage 6 AC voltage generator stage 7 Power supply source 8a, 8b, …, 8n Switching unit 9a, 9b, …, 9n Load 10 Current supply configuration 13 Data connection 15a, 15b, …, 15n Impedance matching devices 17a, 17b, …, 17n Plasma generators CT1a, CT1b, …, CT1n Current and / or voltage measurement sensors CT2a, CT2b, …, CT2n Current and / or voltage measurement sensors CT3a, CT3b, …, CT3n Current and / or voltage measurement sensors CT4a, CT4b, …, CT4n Plasma signals T1a, T1b, …, T1n Transformer configuration

Claims

1. A current supply configuration (10) for a plurality of plasma generators (17a, 17b,..., 17n) specifically designed to excite a gas into gas plasma at a location remote from the plasma treatment location, a) a power input terminal (2) for connection to a supply power source (7), b) a data connection (13) for connection to a control mechanism (4) and comprising, c) the current supply configuration (10) being designed to convert the power from the power input terminal (2) into AC voltage power by an AC voltage generator stage (6), d) the current supply configuration (10) via the data connection (13), such that the AC voltage power can be delivered as a first AC voltage power to a first load (9a) and as a second AC voltage power to a second load (9b) located at a location remote from the first load, and in particular not supplying power to the two loads simultaneously, and further, the first AC voltage power and the second AC voltage power, output current, output voltage, output frequency, output power, output profile of current and / or voltage are controllable so as to be able to have different characteristics with at least one or a plurality of control values among them, e) the current supply configuration (10) being adapted to output a control signal for impedance matching devices (15a, 15b,..., 15n) assigned to one of the AC voltage powers, Current supply configuration (10).

2. a) a first power output terminal (3a) for delivering the first AC voltage power to the first load (9a), b) a second power output terminal (3b) for delivering the second AC voltage power to the second load (9b) located at a location remote from the first load The current supply configuration (10) according to claim 1, comprising.

3. In particular, a switching unit (8a, 8b) which is part of the current supply configuration (10) is further provided, and the current supply configuration (10) via the data connection (13) ensures that the switching unit (8a, 8b) can input the AC voltage power generated by the AC voltage generator stage (6) to one of the power output terminals (3a, 3b) and / or each of the loads (9a / 9b), and in that case is adapted to be able to adjust the different characteristics of the respective AC voltage powers, The current supply configuration (10) according to claim 1 or 2.

4. The current supply configuration (10) according to any one of claims 1 to 3, designed such that the sum of the rated powers of all the AC voltage powers deliverable to the loads (9a, 9b, …, 9n) is greater than the rated power of the AC voltage generator stage (6).

5. The current supply configuration (10) according to any one of claims 1 to 4, adapted to output different control signals for a plurality of impedance matching devices (15a, 15b) assigned to each one of the AC voltage powers.

6. The current supply configuration (10) according to any one of claims 1 to 5, adapted to receive one and / or a plurality of plasma signals (CT4a, CT4b, …, CT4n), in particular one and / or a plurality of plasma voltages, transmitted from one of the plasma generators (17a, 17b, …, 17n).

7. The current supply configuration (10) according to any one of claims 1 to 6, adapted to assign one or a plurality of the transmitted plasma signals (CT4a, CT4b, …, CT4n) to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power according to each plasma signal (CT4a, CT4b, …, CT4n).

8. The current supply configuration (10) according to any one of claims 1 to 7, adapted to receive one and / or a plurality of voltages and / or current intensities transmitted from current and / or voltage measurement sensors (CT1a, CT1b, …, CT1n) arranged and adapted to measure the current and / or voltage of the AC voltage power, and the current supply configuration (10) is further adapted to assign one or a plurality of the transmitted voltages and / or current intensities to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power according to each voltage and / or current intensity.

9. One and / or a plurality of voltages and / or current intensities transmitted from current and / or voltage measurement sensors (CT2a, CT2b,..., CT2n, CT3a, CT3b,..., CT3n) arranged and adapted to measure current and / or voltage within the impedance matching devices (15a, 15b,..., 15n) or at the impedance matching devices (15a, 15b,..., 15n), the current supply configuration (10) being adapted to receive the same, in particular to assign one or more of the transmitted voltages and / or current intensities to the characteristics of the alternating voltage power, and further adapted to adjust the characteristics of the alternating voltage power in particular according to the respective voltages and / or current intensities, the current supply configuration (10) according to any one of claims 1 to 8.

10. The current supply configuration (10) according to any one of claims 1 to 9, wherein the control mechanism (4) is integrated into the current supply configuration (10).

11. a) A current supply configuration (10) according to any one of claims 1 to 10, b) A plurality of plasma generators (17a, 17b,..., 17n) connected to the current supply configuration (10), in particular to its power output terminals (3a, 3b,..., 3n), and operable according to respective control value characteristics A plasma generating device (1).

12. A first transformer configuration (T1a) for coupling the alternating voltage power to the load (9a, 9b,..., 9n), in particular one transformer configuration (T1a, T1b,..., T1n) for each plasma generator (17a, 17b,..., 17n), preferably the transformer configurations (T1a, T1b,..., T1n) being arranged in the immediate vicinity of the load (9a, 9b,..., 9n), the plasma generating device (1) according to claim 11.

13. The plasma generating device (1) according to claim 11 or 12, further comprising impedance matching devices (15a), in particular a plurality of impedance matching devices (15a, 15b,..., 15n), preferably one impedance matching device (15a, 15b,..., 15n) being arranged between the current supply configuration (10) and the plasma generators (17a, 17b,..., 17n).

14. One, or in particular a plurality, of said plasma generators (17a, 17b, …, 17n) (so-called remote plasma sources) are designed to excite a gas into a gas plasma at a location remote from the plasma treatment position, the plasma generating device (1) according to any one of claims 11 to 13.

15. A method for controlling a plurality of plasma processes, each specifically designed to excite a gas into a gas plasma at a location remote from the plasma treatment position, comprising: a) supplying supply power to a current supply configuration (10); b) converting the supply power into a first alternating voltage power and delivering the first alternating voltage power to a first load (9a) of a first plasma generator (17a); c) converting the supply power into a second alternating voltage power and delivering the second alternating voltage power to a second load (9b) of a second plasma generator (17b), wherein steps b) and c) are not performed simultaneously; d) controlling the alternating voltage power according to various characteristics with one or more control values of output current, output voltage, output frequency, output power, output profile of current and / or voltage; e) generating and outputting a control signal for an impedance matching device (15a, 15b, …, 15n) assigned to one of the alternating voltage powers. A method comprising the steps of: e) generating and outputting a control signal for an impedance matching device (15a, 15b, …, 15n) assigned to one of the alternating voltage powers. A method including the steps of:

Images