Optical structure, terminal shell, and terminal

The optical structure addresses the lack of three-dimensional feel in device shells by using a base material layer, pattern layer, and microlens layer to create a three-dimensional effect, enhancing aesthetic appeal.

JP2025526971AInactive Publication Date: 2025-08-15BYD CO LTD
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Patent Information

Application Number
JP2025511380
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-08-25
Filing Date
2023-04-27
Publication Date
2025-08-15
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

Existing device shells lack a three-dimensional feel, with microlens arrays providing only flat optical effects.

Method used

An optical structure comprising a base material layer, pattern layer, and microlens layer, where the pattern layer includes pattern units arranged in an array, and each microlens corresponds to a pattern unit, forming a three-dimensional effect through the microlenses.

Benefits of technology

The optical structure creates a three-dimensional presentation of patterns, enhancing the aesthetic appeal of electronic devices by projecting a three-dimensional effect on their surfaces.

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Abstract

The present invention provides an optical structure, a terminal shell, and a terminal. The optical structure includes a substrate layer, a pattern layer, and a microlens layer. The substrate layer has a first surface and a second surface facing each other. The pattern layer is disposed on a first surface of the base material layer and includes a plurality of pattern units arranged in an array, each pattern unit being part of a preset pattern. The microlens layer is disposed on a second surface of the base material layer and includes a plurality of microlenses arranged in an array, each microlens corresponding to one pattern unit, and each pattern unit is located within the projection of the corresponding microlens on the pattern layer. The microlenses are used to enable the pattern units to form a preset pattern with a three-dimensional effect. According to the optical structure, terminal shell, and terminal provided by the present invention, each pattern unit in the pattern layer is set as part of a preset pattern so that a preset pattern with a three-dimensional effect can be formed through the plurality of microlenses.
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Description

[Technical Field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims priority to Chinese Patent Application No. 202211030391.2, filed on August 25, 2022, entitled "OPTICAL STRUCTURE, TERMINAL SHELL AND TERMINAL," which is incorporated herein by reference in its entirety.

[0002] The present application relates to the field of optical structures, and in particular to optical structures, terminal shells, and terminals. [Background technology]

[0003] As consumer spending levels rise, users have increasingly higher requirements for the aesthetic appearance of device shells. Microlens arrays and patterns are typically placed on the housings of electronic devices, such as mobile phones and tablet computers. The magnifying effect of the microlens array creates an enlarged pattern, improving the apparent aesthetics of the electronic device.

[0004] Currently, the patterns presented by device shells are all flat optical effects, lacking a three-dimensional feel. Summary of the Invention

[0005] A first aspect of the present application provides an optical structure. The optical structure 100 includes a base material layer 10, a pattern layer 20, and a microlens layer 30. The base material layer 10 has a first surface 11 and a second surface 12 facing each other. The pattern layer 20 is disposed on the first surface 11 of the base material layer 10 and includes a plurality of pattern units 21 arranged in an array, each of which is a part of a preset pattern. The microlens layer 30 is disposed on the second surface 12 of the base material layer 10 and includes a plurality of microlenses 31 arranged in an array. Each of the microlenses 31 corresponds to one of the pattern units 21, and each of the pattern units 21 is located within the projection of a corresponding microlens 31 on the pattern layer 20. The plurality of microlenses 31 are used to cause the plurality of pattern units 21 to form a preset pattern having a three-dimensional (3D) effect.

[0006] In the example of the present application, the preset pattern is a projection onto a plane of a figure placed on a three-dimensional structure, and the projection onto the plane of the figure on the three-dimensional structure has no overlapping areas.

[0007] In the example of the present application, the plurality of pattern units 21 in each row of pattern units satisfy a first preset condition. The first preset condition includes a first combination pattern that overlaps with a first sub-pattern of a corresponding preset pattern, the first combination pattern being formed by translating and combining the plurality of pattern units 21 in each row of pattern units in a first preset direction, the first sub-pattern being a partial pattern of the preset pattern extending a first preset distance in a second preset direction, the second preset direction being perpendicular to the first preset direction. The plurality of pattern units 21 in each column of pattern units satisfy a second preset condition. The second preset condition includes a second combination pattern that overlaps with a second sub-pattern of a corresponding preset pattern, the second combination pattern being formed by translating and combining the plurality of pattern units 21 in each column of pattern units in a second preset direction, the second sub-pattern being a partial pattern of the preset pattern extending a second preset distance in the first preset direction.

[0008] In the example of the present application, the absolute value of the difference in dimensions between every two adjacent pattern units 21 in each row of pattern units in the first preset direction is equal, and the absolute value of the difference in dimensions between every two adjacent pattern units 21 in each column of pattern units in the second preset direction is equal.

[0009] In the example of the present application, two adjacent pattern units 21 in each row of pattern units are partially identical. A first preset condition includes a first combination pattern that overlaps with a corresponding first sub-pattern, and the first combination pattern is formed by combining multiple pattern units 21 so that the identical portions overlap. Two adjacent pattern units 21 in each column of pattern units are partially identical. A second preset condition includes a second combination pattern that overlaps with a corresponding second sub-pattern, and the second combination pattern is formed by combining multiple pattern units 21 so that the identical portions overlap.

[0010] In the present example, the plurality of pattern units 21 in each row of pattern units are each a portion cut out of a corresponding first sub-pattern in a first preset direction, and the plurality of pattern units 21 in each column of pattern units are each a portion cut out of a corresponding second sub-pattern in a second preset direction.

[0011] In the example of the present application, the first and last pattern units 21 in each row of pattern units each include both end portions of the corresponding first sub-pattern in the first preset direction. The cut-out portions in each row of pattern units gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion in the central pattern unit 21 includes at least the central portion of the corresponding first sub-pattern. The first and last pattern units 21 in each column of pattern units each include both end portions of the corresponding second sub-pattern in the second preset direction. The cut-out portions in each pattern unit each gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion in the central pattern unit 21 includes at least the central portion of the corresponding second sub-pattern.

[0012] In the example of the present application, the pattern layer 20 includes a plurality of pattern areas 22 arranged in an array. Each of the pattern areas 22 corresponds to one microlens 31, and the center of each of the pattern areas 22 is aligned with the center of the corresponding microlens 31. Each of the pattern units 21 is arranged at a preset position within the corresponding pattern area 22 such that each of the pattern units 21 corresponds to a preset portion of the corresponding microlens 31, and a corresponding pattern is formed through the corresponding microlens 31.

[0013] In the example of the present application, the shape of the patterned area 22 is the same as the shape of the projection of each microlens 31 onto the patterned layer 20 .

[0014] In the example of the present application, the shape of the patterned areas 22 is different from the shape of the projection of each of the microlenses 31 onto the patterned layer 20 .

[0015] In the example of the present application, the matrix layer 10 includes at least one of a transparent polymer layer and a glass layer.

[0016] In the example of the present application, the base material layer 10 is a glass layer. A plurality of microlenses 31 are portions of the glass layer extending outward from the glass, and / or a plurality of grooves 13 arranged in an array are arranged on the surface of the glass layer remote from the microlenses 31. Each of the grooves 13 corresponds to one pattern unit and is covered by a corresponding pattern unit 21, and the shape of each of the grooves 13 is the same as the corresponding pattern unit 21.

[0017] In the example of the present application, the outer contour of the microlens 31 is arc-shaped, the projection of the microlens 31 on the base material layer 10 is circular, and the diameter of the projection is a value within a range of 100 to 300 μm. The height of the microlens 31 is a value within a range of 0.1 to 20 μm, and the height of the microlens 31 is the distance between the end of the microlens 31 farthest from the base material layer 10 and the base material layer 10.

[0018] In the example of the present application, the thickness of the base material layer 10 is a value within the range of 0.1 to 0.6 mm, and the thickness of the base material layer 10 is the distance between the first surface 11 and the second surface 12.

[0019] In the example of the present application, the pattern unit 21 can be made of a metal material or a color-developing material.

[0020] A second aspect of the present application provides a terminal shell 200. The terminal shell 200 includes the optical structure 100 according to the first aspect.

[0021] In the example of the present application, the terminal shell 200 includes a transparent back cover 50. The optical structure 100 is disposed on a surface of the transparent back cover 50 that is close to the interior of the terminal. The pattern layer 20 of the optical structure 100 is bonded to the transparent back cover 50, and an optical adhesive may be disposed between the pattern layer 20 and the transparent back cover 50 to adhere the optical structure 100 to the inner surface of the transparent back cover 50.

[0022] In the example of the present application, the preset pattern is formed by incident light entering through the transparent back cover 50, passing through the pattern layer 20, reaching the microlens layer 30, and being reflected by the plurality of microlenses 31 to generate reflected light. The reflected light propagates into the pattern layer 20 and forms an image on the surface of the pattern layer 20 farther from the base layer 10, thereby forming the preset pattern with a three-dimensional suspension effect.

[0023] In the present application, the transparent back cover 50 may be made of a transparent polymer or glass.

[0024] A third aspect of the present application provides a terminal, the terminal including a terminal shell 200 according to the second aspect.

[0025] In order to more clearly illustrate the technical solutions of the present application, the accompanying drawings that need to be used in examples are briefly introduced below, and the accompanying drawings described below are some examples of the present application, and it is obvious that those skilled in the art can also obtain other accompanying drawings according to these accompanying drawings without expending creative efforts. [Brief explanation of the drawings]

[0026] [Figure 1] 1 is a side view of an optical structure provided by an example of the present application. [Figure 2] FIG. 2 is a schematic plan view of the pattern layer in FIG. [Figure 3] FIG. 2 is a schematic plan view of a microlens layer in FIG. [Figure 4] 2 is a schematic plan perspective view showing the pattern layer and the microlens layer in FIG. 1. FIG. [Figure 5] FIG. 2 is a schematic diagram of a preset pattern with a three-dimensional effect formed by the optical structure in FIG. 1. [Figure 6] 1 is a schematic diagram of a preset pattern provided by an example of the present application. [Figure 7] FIG. 10 is a schematic diagram of a preset pattern provided by another example of the present application. [Figure 8] FIG. 1 is a schematic diagram of a first sub-pattern provided by an example of the present application. [Figure 9] FIG. 10 is a schematic diagram of a second sub-pattern provided by an example of the present application. [Figure 10] FIG. 2 is a schematic plan view of a pattern layer provided by another example of the present application. [Figure 11] FIG. 10 is a schematic diagram of a first sub-pattern provided by another example of the present application. [Figure 12] FIG. 10 is a schematic diagram of a second sub-pattern provided by another example of the present application. [Figure 13] FIG. 2 is a side view of an optical structure provided by another example of the present application. [Figure 14]1 is a schematic diagram of a line SL1 and a line segment LS1 provided by an example of the present application. [Figure 15] FIG. 10 is a schematic diagram of the movement of the first pattern frame. [Figure 16] FIG. 2 is a schematic diagram illustrating a plurality of first division patterns. [Figure 17] 1 is a schematic diagram of a line SL2 and a line segment LS2 provided by an example of the present application. [Figure 18] FIG. 10 is a schematic configuration diagram of a plurality of second division patterns. [Figure 19] FIG. 2 is a side view of a terminal shell provided by an example of the present application. DETAILED DESCRIPTION OF THE INVENTION

[0027] Hereinafter, the technical solutions in the examples of the present application will be clearly and comprehensively described with reference to the accompanying drawings in the examples of the present application, and it is clear that the described examples are only a part of the examples of the present application, not all of the examples. According to the examples in the present application, any other examples obtained by those skilled in the art without spending creative efforts belong to the protection scope of the present application.

[0028] In the description of this application, terms such as "first," "second," etc. are used to distinguish various objects and are not used to describe a particular order. In addition, the orientation or positional relationship indicated by terms such as "upper," "lower," "inner," and "outer" is based on the orientation or positional relationship shown in the drawings and is used only to facilitate and simplify the description of this application, and does not indicate or imply that the referred-to device or element must have a particular orientation, be configured in a particular orientation, or be operated in a particular orientation, and therefore may not be understood as a limitation of this application.

[0029] In the description of this application, unless expressly specified and defined otherwise, the term "connected" should be broadly understood, for example, such a term may mean fixed, detachable, or integrally connected, may mean directly connected or indirectly connected through an intermediate medium, or may mean internal communication between two elements, a communication connection, or an electrical connection. Those skilled in the art can understand the specific meanings of the above terms in this application according to specific circumstances.

[0030] It should be noted that the drawings provided in the examples of the present application merely illustrate the basic concepts of the present application in a schematic manner, and that only components relevant to the present application are shown in the drawings rather than being drawn according to the number, shape, and dimensions of the components in an actual embodiment, and that the type, number, and scale of each component in an actual embodiment may be changed arbitrarily, and that the layout of the components may be made more complex.

[0031] To solve the above technical problems, the present application provides an optical structure, a terminal shell, and a terminal, thereby forming a preset pattern with a three-dimensional effect.

[0032] In the optical structure, terminal shell, and terminal provided by the present application, each pattern unit in the pattern layer is set as part of a preset pattern that is originally a planar pattern, and the optical function of the microlens layer allows the preset pattern formed by multiple microlenses to exhibit a three-dimensional effect.

[0033] 1 to 3, FIG. 1 is a side view of an optical structure 100 provided by an example of the present application, FIG. 2 is a schematic plan view of the pattern layer 20 in FIG. 1, and FIG. 3 is a schematic plan view of the microlens layer 30 in FIG. 1. As shown in FIG. 1, the optical structure 100 includes a base material layer 10, a pattern layer 20, and a microlens layer 30. The base material layer 10 includes a first surface 11 and a second surface 12 facing each other. The pattern layer 20 is disposed on the first surface 11 of the base material layer 10. The pattern layer 20 includes a plurality of pattern units 21 arranged in an array. As shown in FIG. 2, each of the pattern units 21 is a part of a preset pattern. As shown in FIGS. 1 and 3, the microlens layer 30 is disposed on the second surface 12 of the base material layer 10. The microlens layer 30 includes a plurality of microlenses 31 arranged in an array. Each of the microlenses 31 corresponds to one pattern unit 21, and each of the pattern units 21 is placed within the projection of the corresponding microlens 31 on the pattern layer 20, and multiple microlenses 31 are used to make multiple pattern units 21 form preset patterns with a three-dimensional (3D) effect.

[0034] In the optical structure 100 provided by the example of the present application, each pattern unit 21 in the pattern layer 20 is set as part of a preset pattern which is originally a planar pattern, and the optical function of the microlens layer 30 allows the preset pattern formed by the multiple microlenses 31 to exhibit a three-dimensional effect.

[0035] 4, which is a schematic planar perspective view showing both the pattern layer 20 and the microlens layer 30 in FIG. 1. As shown in FIG. 4, each of the microlenses 31 corresponds to one pattern unit 21, and each of the pattern units 21 is located within the projection of the corresponding microlens 31 on the pattern 20 layer.

[0036] 2 and 4, the pattern layer 20 includes a plurality of pattern areas 22 arranged in an array. Each of the pattern areas 22 corresponds to one microlens 31, and the center of each of the pattern areas 22 is aligned with the center of the corresponding microlens 31. Each of the pattern units 21 is disposed at a preset position within the corresponding pattern area 22 such that each of the pattern units corresponds to a preset portion of the corresponding microlens and a corresponding pattern is formed through the corresponding microlens.

[0037] Each preset position of the pattern area 22 overlaps with the projection of the preset portion of the corresponding microlens 31 on the pattern layer 20. By aligning the pattern area 22 with the corresponding microlens 31, the pattern unit 21 at the preset position of the pattern area 22 overlaps with the projection of the preset portion of the corresponding microlens 31 on the pattern layer 20, so that the pattern unit 21 can form the corresponding pattern through the corresponding microlens 31, and multiple pattern units 21 can form a preset pattern with a three-dimensional effect through multiple microlenses 31.

[0038] According to the imaging requirements of the pattern units 21, each pattern unit 21 needs to overlap with the projection of a preset portion of the microlens 31 on the pattern layer 20. By predetermining each of the pattern units to be placed at a preset position within the pattern region 22, the preset position satisfies the requirement that the projection of the preset portion of the microlens 31 on the pattern layer 20 exactly overlaps with the pattern unit 21 when the microlens 31 is aligned with the corresponding pattern region 22. The preset position at which each of the pattern units 21 is placed within the pattern region 22 may be determined by a pre-imaging experiment.

[0039] In some examples, the shape of the patterned region 22 is the same as the shape of the projection of each microlens 31 on the patterned layer 20, e.g., the shape of the projection of each microlens 31 on the patterned layer 20 is circular, and the shape of the patterned region 22 is also circular. The dimensions of the patterned region 22 may be equal to or smaller than the dimensions of the projection of each microlens 31 on the patterned layer 20, e.g., the diameter of the projection of each microlens 31 on the patterned layer 20 is greater than or approximately equal to the diameter of the patterned region 22. By setting each of the patterned regions 22 to overlap with the projection of the corresponding microlens 31 on the patterned layer 20, each of the patterned regions 22 may be aligned with the corresponding microlens 31 such that the pattern unit 21 installed at the preset position of the patterned region 22 overlaps with the corresponding position of the projection of the corresponding microlens 31 on the patterned layer 20, and the pattern unit 21 can form the corresponding pattern through the corresponding microlens 31.

[0040] In some examples, the shape of patterned region 22 differs from the shape of the projection of each microlens 31 on patterned layer 20, e.g., the shape of the projection of each microlens 31 on patterned layer 20 is circular and the shape of patterned region 22 is a square circumscribed on a circle.

[0041] Referring to Figure 5, Figure 5 is a schematic diagram of preset patterns with a three-dimensional effect formed by the optical structure 100 in Figure 1. A, B, and C are preset patterns observed from different viewing angles, respectively.

[0042] The pattern regions 22 of the pattern layer 20 may be spaced apart. Alternatively, two adjacent pattern regions 22 may be connected. The microlenses 31 arranged in an array may be spaced apart. Alternatively, two adjacent microlenses 31 may contact each other. For example, each microlens 31 may be hemispherical, and the projections of every two adjacent microlenses 31 on the pattern layer 20 are in contact.

[0043] The projection of each microlens 31 onto the pattern layer 20 is an orthogonal projection of the microlens 31 onto the pattern layer 20 .

[0044] In some examples, the preset pattern is a projection of a shape placed on the three-dimensional structure onto a plane, where the projection of the shape on the three-dimensional structure onto the plane does not have any overlapping areas. For example, the shape placed on the three-dimensional structure may be a letter or Chinese character placed on a sphere, such as the letter "M" or the Chinese character "Di" placed on a sphere, as shown in Figures 6 and 7.

[0045] In this application, a projection of a figure arranged on a three-dimensional structure onto a plane is used as a preset pattern. The preset pattern is divided into multiple parts, which function as multiple pattern units 21. Each of the pattern units 21 is imaged by a corresponding microlens 31. The multiple pattern units 21 form images through their corresponding microlenses 31, and the images are joined together to present a complete preset pattern with a three-dimensional floating effect. For example, the preset pattern is the letter "M" arranged on a sphere. The letter "M" is divided into multiple parts, which function as multiple pattern units 21 (as shown in FIG. 2). Each of the pattern units 21 is imaged by a corresponding microlens 31. The multiple pattern units 21 form images through their corresponding microlenses 31, and the images are joined together to present a complete letter "M" with a three-dimensional floating effect (as shown in FIG. 5).

[0046] The graphic placed on the three-dimensional structure may be any graphic or a combination of multiple arbitrary graphics, for example, the graphic placed on the three-dimensional structure may be multiple characters or Chinese characters, such as the Chinese character "Beijing", the character combination "MN", etc.

[0047] The three-dimensional structure may be any three-dimensional structure, such as an irregularly undulating three-dimensional figure like an ellipsoid, hill, cone, etc. The final three-dimensional floating effect will vary depending on the three-dimensional structure chosen.

[0048] Referring again to FIG. 2, in some examples, as shown in FIG. 2, a plurality of pattern units 21 in each row of pattern units satisfy a first preset condition. The first preset condition includes a first combination pattern that overlaps a first sub-pattern of a corresponding preset pattern, where the first combination pattern is formed by translating and combining a plurality of pattern units 21 in a first preset direction (the X direction shown in FIG. 2), and the first sub-pattern is a partial pattern of the preset pattern that extends a first preset distance in a second preset direction (the Y direction shown in FIG. 6), where the second preset direction is perpendicular to the first preset direction. A plurality of pattern units 21 in each column of pattern units satisfy the second preset condition. The second preset condition includes a second combination pattern that overlaps with a second sub-pattern of the corresponding preset pattern, and the second combination pattern is formed by translating and combining multiple pattern units 21 in a second preset direction (Y direction shown in FIG. 2), and the second sub-pattern is a partial pattern of the preset pattern that extends a second preset distance in the first preset direction (X direction shown in FIG. 6).

[0049] The preset pattern may be obtained by combining a plurality of first combination patterns, which are formed by translating and combining a plurality of pattern units 21 in all row pattern units 21. The preset pattern may be obtained by combining a plurality of second combination patterns, which are formed by translating and combining a plurality of pattern units 21 in all column pattern units 21.

[0050] In some examples, as shown in Figure 2, two adjacent pattern units 21 in each row of pattern units are partially identical. A first preset condition includes a first combination pattern that overlaps with a corresponding first sub-pattern, and the first combination pattern is formed by combining multiple pattern units 21 so that the identical portions overlap. Two adjacent pattern units 21 in each column of pattern units are partially identical. A second preset condition includes a second combination pattern that overlaps with a corresponding second sub-pattern, and the second combination pattern is formed by combining multiple pattern units 21 so that the identical portions overlap.

[0051] For example, as shown in FIG. 2 , the plurality of pattern units 21 of the pattern layer 20 may be divided into a plurality of rows of pattern units 21. The rows of the plurality of pattern units 21 include a row of first pattern units 21, a row of second pattern units 21, ..., and a row of i-th pattern units 21, which are consecutively arranged in the Y direction. A first combination pattern overlaps with the first sub-pattern of the preset pattern shown in FIG. 8 , and the first combination pattern is formed by translating and combining the plurality of pattern units 21 in the row of the first pattern units 21 in the X direction. The plurality of pattern units 21 of the pattern layer 20 may be further divided into a plurality of columns of pattern units 21. The columns of the plurality of pattern units 21 include a row of first pattern units 21, a row of second pattern units 21, ..., and a row of j-th pattern units 21, which are consecutively arranged in the X direction, where j and i may or may not be equal. The second combination pattern overlaps with the second sub-pattern of the preset pattern shown in Figure 9, and the second combination pattern is formed by translating and combining multiple pattern units 21 in the row of the first pattern unit 21 in the Y direction.

[0052] In the present application, a preset pattern may be obtained by combining a plurality of first combination patterns so that identical portions overlap, and the plurality of first combination patterns are formed by translating and combining a plurality of pattern units 21 in all row pattern units 21. A preset pattern may be obtained by combining a plurality of second combination patterns so that identical portions overlap, and the second combination pattern is formed by translating and combining a plurality of pattern units 21 in all column pattern units 21.

[0053] In another example, the endpoints of two adjacent pattern units 21 in each row of pattern units may overlap, and the endpoints may be far from the center of the pattern units 21 in the first preset direction, i.e., two adjacent pattern units 21 in each row of pattern units may be just connected to each other. A plurality of pattern units 21 in each row of pattern units satisfy a condition, the condition including a first combination pattern that overlaps with a corresponding first sub-pattern, and the first combination pattern is formed by combining every two adjacent pattern units 21 such that the two pattern units are connected one behind the other. The endpoints of two adjacent pattern units 21 in each column of pattern units may overlap, and the endpoints may be far from the center of the pattern units 21 in the second preset direction, i.e., two adjacent pattern units 21 in each column of pattern units may be just connected to each other. A plurality of pattern units 21 in each row of pattern units satisfy a condition, the condition including a second combination pattern that overlaps with a corresponding second sub-pattern, and the second combination pattern is formed by combining every two adjacent pattern units 21 such that the two pattern units are connected one behind the other.

[0054] In the present application, a first combination pattern formed by combining multiple pattern units 21 in each row of the pattern units overlaps with a first sub-pattern of the corresponding preset pattern, and a second combination pattern formed by combining multiple pattern units 21 in each column of the pattern units overlaps with a second sub-pattern of the corresponding preset pattern, so that the multiple pattern units 21 of the pattern layer 20 may be imaged by multiple microlenses 31 to obtain a complete preset pattern.

[0055] In some examples, the absolute values of the differences in dimensions between every two adjacent pattern units 21 in each row of pattern units in the first preset direction are equal. The dimensions of the pattern units 21 in the first preset direction are the lengths of the pattern units 21, such as L1, L2, and L3 shown in FIG. 2. The absolute values of the differences in dimensions between every two adjacent pattern units 21 in the first preset direction are equal, i.e., the absolute values of the differences in lengths between every two adjacent pattern units 21 are equal, and also, as shown in FIG. 2, the absolute value of the difference between L1 and L2 is equal to the absolute value of the difference between L2 and L3.

[0056] The difference in dimensions between every two adjacent pattern units 21 in a first preset direction is equal to the difference in a first preset distance, a first sub-pattern extends by a first preset distance in a second preset direction, the first sub-pattern corresponds to a first combination pattern, and the first combination pattern is formed by translating and combining multiple pattern units 21 in every two adjacent pattern units 21.

[0057] In some examples, the absolute values of the differences in dimensions between every two adjacent pattern units 21 in each row of pattern units in the second preset direction are equal. The dimensions of the pattern units 21 in the second preset direction are the widths of the pattern units 21, such as W1, W2, and W3 shown in FIG. 2. The absolute values of the differences in dimensions between every two adjacent pattern units 21 in the second preset direction are equal, i.e., the absolute values of the differences in widths between every two adjacent pattern units 21 are equal, and also, as shown in FIG. 2, the absolute value of the difference between W1 and W2 is equal to the absolute value of the difference between W2 and W3.

[0058] The difference in dimensions between every two adjacent pattern units 21 in the second preset direction is equal to the difference in the second preset distance, and a second sub-pattern extends by the second preset distance in the first preset direction, and the second sub-pattern corresponds to a second combination pattern, and the second combination pattern is formed by translating and combining multiple pattern units 21 in every two adjacent pattern units 21.

[0059] By setting the difference in length between every two adjacent pattern units 21 in each row of pattern units to be equal, and by setting the difference in width between every two adjacent pattern units 21 in each column of pattern units to be equal, it is possible to avoid distortion of the image formed by the multiple microlenses 31, which will affect the presentation effect of the preset pattern.

[0060] In some examples, as shown in Figure 2, the plurality of pattern units 21 in each row of pattern units are each portions cut out of a corresponding first sub-pattern in a first preset direction, and the plurality of pattern units 21 in each column of pattern units are each portions cut out of a corresponding second sub-pattern in a second preset direction.

[0061] For example, as shown in Figures 2, 8, and 9, the pattern units 21 in a row of the first pattern unit 21 in Figure 2 are each portions cut out in the X direction from the first sub-pattern shown in Figure 8. The pattern units 21 in a column of the first pattern unit 21 in Figure 2 are each portions cut out in the Y direction from the second sub-pattern shown in Figure 9.

[0062] The plurality of pattern units 21 arranged in a first preset direction in each pattern unit row are portions cut out of a corresponding first sub-pattern in the first preset direction, and the plurality of pattern units 21 arranged in a second preset direction in each pattern unit column are portions cut out of a corresponding second sub-pattern in the second preset direction.

[0063] By setting the plurality of pattern units 21 arranged in a first preset direction in each column of pattern units as portions cut out from the corresponding first sub-pattern in the same direction, and by setting the plurality of pattern units 21 arranged in a second preset direction in each column of pattern units as portions cut out from the corresponding second sub-pattern in the same direction, pattern misalignment in the plurality of pattern units 21 in each row of pattern units and pattern misalignment in the plurality of pattern units 21 in each column of pattern units can be avoided, thereby avoiding misalignment in the image formed by the plurality of microlenses 31, and resulting in a better presentation effect of the preset pattern.

[0064] In some examples, the first and last pattern units 21 in each row of pattern units each include both end portions of the corresponding first sub-pattern in the first preset direction. The cut-out portions in each row of pattern units gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion in the central pattern unit 21 includes at least the central portion of the corresponding first sub-pattern. The first and last pattern units 21 in each column of pattern units each include both end portions of the corresponding second sub-pattern in the second preset direction. The cut-out portions in each column of pattern units gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion in the central pattern unit 21 includes at least the central portion of the corresponding second sub-pattern.

[0065] 2, 8, and 9, the first and last pattern units 21 in a row of first pattern units 21 in Fig. 2 each include both end portions in the first preset direction of the first sub-pattern shown in Fig. 8. The cut-out portions included in the row of first pattern units 21 gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion included in the central pattern unit 21 includes at least the central portion of the corresponding first sub-pattern shown in Fig. 8. The first and last pattern units 21 of the multiple pattern units 21 in a column of first pattern units 21 in Fig. 2 each include both end portions in the second preset direction of the second sub-pattern shown in Fig. 9. The cut-out portions included in the row of first pattern units 21 gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portions included in the central pattern unit 21 include at least the central portion of the second sub-pattern shown in Figure 9.

[0066] Referring to FIG. 10 , FIG. 10 is a schematic plan view of a pattern layer 20 provided by another example of the present application. As shown in FIG. 10 , the plurality of pattern units 21 of the pattern layer 20 may be divided into a plurality of rows of pattern units 21. The rows of the plurality of pattern units 21 include a first row of pattern units 21, a second row of pattern units 21, ..., and a pth row of pattern units 21, which are arranged consecutively in the Y direction. A first combination pattern overlaps with the first sub-pattern of the preset pattern shown in FIG. 11 , and the first combination pattern is formed by translating and combining the plurality of pattern units 21 in the row of the first pattern unit 21 in the X direction. The plurality of pattern units 21 of the pattern layer 20 may be further divided into a plurality of columns of pattern units 21. The row of the plurality of pattern units 21 includes a row of the first pattern units 21, a row of the second pattern units 21, ..., and a row of the qth pattern units 21, which are consecutively arranged in the X direction, where p and q may be equal or unequal. The second combination pattern overlaps with the second sub-pattern of the preset pattern shown in Figure 12, and is formed by translating and combining the plurality of pattern units 21 in the row of the first pattern units 21 in the Y direction.

[0067] As shown in Figures 10, 11, and 12, the plurality of pattern units 21 in a row of first pattern units 21 are each portions cut out in the X direction from the first sub-pattern shown in Figure 11. The plurality of pattern units 21 in a column of first pattern units 21 are each portions cut out in the Y direction from the second sub-pattern shown in Figure 12.

[0068] 10, 11, and 12, the first and last pattern units 21 in a row of first pattern units 21 each include both end portions in the first preset direction of the first sub-pattern shown in Fig. 11. The cut-out portions included in the row of first pattern units gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portion included in the central pattern unit 21 includes at least the central portion of the first sub-pattern shown in Fig. 11. The first and last pattern units 21 of the multiple pattern units 21 in a column of first pattern units 21 each include both end portions in the second preset direction of the second sub-pattern shown in Fig. 12. The cut-out portions included in the row of first pattern units 21 gradually increase from the first and last pattern units 21 to the central pattern unit 21, and the cut-out portions included in the central pattern unit 21 include at least the central portion of the second sub-pattern shown in Figure 12.

[0069] In some examples, the matrix layer 10 includes at least one of a transparent polymer layer and a glass layer.

[0070] The material of the transparent polymer layer may be selected from PC (polycarbonate), PET (polyethylene ethyl terephthalate), PI (polyimide), and the like.

[0071] 13, which is a side view of an optical structure 100 provided by another example of the present application. In some examples, the base material layer 10 is a glass layer. As shown in FIG. 13, a plurality of microlenses 31 are portions of the glass layer extending outward from the glass, and / or a plurality of grooves 13 arranged in an array are disposed on the surface of the glass layer remote from the microlenses 31. Each of the grooves 13 corresponds to one pattern unit and is covered by a corresponding pattern unit 21, and the shape of each of the grooves 13 is the same as the corresponding pattern unit 21.

[0072] By setting the plurality of microlenses 31 as an outwardly extending portion of the base material layer 10, the microlens layer 30 may be directly manufactured on the base material layer 10 so as to simplify the manufacturing process.

[0073] By forming multiple grooves 13 on the surface of the base material layer 10 remote from the microlens layer 30 and forming multiple pattern units 21 within the multiple grooves 13, the thickness of the optical structure 100 may be reduced to contribute to a lighter and more compact product.

[0074] In some examples, the outer contour of the microlens 31 is arc-shaped, the projection of the microlens 31 onto the base material layer 10 is circular, and the diameter of the projection is a value within the range of 100 to 300 μm.

[0075] The orthogonal projection of the microlens 31 on the base material layer 10 is circular.

[0076] In other examples, the microlenses 31 may also have other shapes, such as a cylindrical shape.

[0077] In some examples, the height of the microlens 31 is a value within a range of 0.1 to 20 μm, and the height of the microlens 31 is the distance between the end of the microlens 31 farthest from the base material layer 10 and the base material layer 10. When the microlens 31 is a portion of the glass layer that extends outward from the glass, the height of the microlens 31 is the dimension of the microlens 31 that extends outward.

[0078] In some examples, the thickness of the base material layer 10 is a value within the range of 0.1 to 0.6 mm, and the thickness of the base material layer 10 is the distance between the first surface 11 and the second surface 12.

[0079] In some examples, the pattern unit 21 may be formed of a metallic material such as chrome, or a color developing material such as ink. The material of the microlens 31 may be a transparent polymer or glass.

[0080] In some examples, a method for designing a plurality of pattern units 21 of a pattern layer 20 may include the following steps: determining a straight line SL1, the extension direction of which is parallel to a first preset direction, and the straight line SL1 passes through the center of the preset pattern as shown in Fig. 14. Two points on the straight line SL1 located on either side of the preset pattern are selected to serve as two endpoints of a line segment LS1, and the two endpoints are connected to obtain the line segment LS1 as shown in Fig. 14. The line segment LS1 is evenly divided into a plurality of sub-line segments to obtain endpoints of the sub-line segments, for example, C1 to C8 shown in Fig. 14. The first pattern frame is moved in a first preset direction from the farthest end point (C1 shown in FIG. 14) from the preset pattern, and moved multiple times. After each movement, the center of the first pattern frame overlaps with one end point (as shown in FIG. 15). A portion of the preset pattern that fits into the first pattern frame after each movement is then obtained, which serves as a first divided pattern (as shown in FIG. 16). The first divided pattern and the first pattern frame are combined to obtain a first divided pattern region. A straight line SL2 is determined, the extension direction of which is parallel to the second preset direction, and the straight line SL2 passes through the centers of each of the first divided pattern regions, as shown in FIG. 17. Two points on the straight line SL2 on either side of the first divided pattern are selected to serve as the two end points of a line segment LS2, and the two end points are connected to obtain the line segment LS2, as shown in FIG. 17. The line segment LS2 is equally divided into multiple sub-segments to obtain multiple sub-segment end points, for example, C9 to C16 shown in Fig. 17. A second pattern frame is moved in a second preset direction from the end point farthest from the first divided pattern (C9 shown in Fig. 17) multiple times, and the center of the second pattern frame after each movement overlaps with one end point. A portion of the first divided pattern that falls into the second pattern frame after each movement is obtained, and then the portion functions as a second divided pattern (as shown in Fig. 18). The multiple second pattern frames constitute multiple pattern regions 22, and the multiple second divided patterns constitute multiple pattern units 21.

[0081] In some examples, the shape and dimensions of the first pattern frame are the same as the projection of the microlens 31. For example, the projection of the microlens 31 on the pattern layer 20 is circular, and the first pattern frame is circular and has a diameter equal to the projection of the microlens 31 on the pattern layer 20. In other examples, the projection of the microlens 31 on the pattern layer 20 is circular, and the first pattern frame is a square circumscribing the circle.

[0082] In some examples, the shape and dimensions of the second pattern frame are the same as the projection of the microlens 31. For example, the projection of the microlens 31 on the pattern layer 20 is circular, and the second pattern frame is circular and has a diameter equal to the projection of the microlens 31 on the pattern layer 20. In other examples, the projection of the microlens 31 on the pattern layer 20 is circular, and the first pattern frame is a square circumscribing the circle.

[0083] In some examples, a method for manufacturing the optical structure 100 may include the following steps: a microlens mold is provided; a microlens layer 30 is formed on the first surface 11 of the base material layer 10 by the microlens mold; a coating layer is formed on the second surface 12 of the base material layer 10; a photoresist layer is formed on a side of the coating layer remote from the base material layer 10; portions of the photoresist layer corresponding to the outside of the plurality of pattern units 21 are removed to expose portions of the coating layer corresponding to the outside of the plurality of pattern units 21; the exposed portions of the coating layer are removed, and portions of the coating layer corresponding to the plurality of pattern units 21 are retained to form the plurality of pattern units 21; and a remaining portion of the photoresist layer is removed.

[0084] The microlens mold with the registration points may be prepared by laser directly writing, mechanical processes, etc.

[0085] The microlens layer 30 may be formed on the first surface 11 of the base material layer 10 using a microlens mold by UV transfer, nanoimprint, hot pressing, or the like. The microlens layer 30 has a positioning point. For example, the microlens layer 30 may be formed on the first surface 11 of the base material layer 10 by UV transfer using a microlens mold. Specifically, UV adhesive is applied to the first surface 11 of the base material layer 10, the microlens mold is pressed against the UV adhesive, and ultraviolet light is irradiated onto the surface of the microlens mold farthest from the UV adhesive to cure the UV adhesive. The uncured UV adhesive is then removed, and the UV adhesive is separated from the microlens mold to obtain the microlens layer 30.

[0086] The coating layer may be a metal layer, such as a chromium layer.

[0087] The photoresist layer may be formed by scraping, spraying, slit spraying, and the like.

[0088] The portions of the photoresist layer corresponding to the outside of the plurality of pattern units 21 may be exposed by laser direct writing or film exposure, and the exposed portions of the photoresist layer can be removed using a developer to remove the portions of the photoresist layer corresponding to the outside of the plurality of pattern units 21, and the portions of the coating layer corresponding to the outside of the plurality of pattern units 21 can be exposed. Specifically, the portions of the photoresist layer corresponding to the outside of the plurality of pattern units 21 can be directly exposed by laser light according to the positioning points of the microlens layer 30, or a mask is placed on the side of the photoresist layer far from the base material layer 10 according to the positioning points of the microlens layer 30, and a light-shielding layer is placed on the mask, the shape and dimensions of the light-shielding layer are the same as the shape and dimensions of the plurality of pattern units 21, and the mask is irradiated with a light source on the side of the mask far from the photoresist layer, allowing light to pass through areas of the mask other than the light-shielding layer, so that the portions of the photoresist layer corresponding to the outside of the plurality of pattern units 21 can be exposed, and then the exposed portions of the photoresist layer can be removed using a developer to expose the portions of the coating layer corresponding to the outside of the plurality of pattern units 21.

[0089] The exposed portions of the coating layer can be removed using a reagent such as hydrochloric acid or nitric acid, while the portions of the coating layer corresponding to the plurality of pattern units 21 are retained, i.e., a pattern layer 20 can be obtained, and then the remaining portions of the photoresist layer may be removed using a dry etching process or a wet etching process.

[0090] In some examples, a method for manufacturing the optical structure 100 may include the following steps: a first surface 11 of the base material layer 10 is etched to form the microlens layer 30; a second surface 12 of the base material layer 10 is etched to form a plurality of grooves 13; and a plurality of pattern units 21 are formed in the plurality of grooves 13.

[0091] The microlens layer 30 may be formed by a dry etching process. Specifically, a photoresist layer is formed on the first surface 11 of the base material layer 10, portions of the photoresist layer corresponding to the outside of the plurality of microlenses 31 are exposed, the exposed portions of the photoresist layer are removed using a developer to expose portions of the first surface 11 of the base material layer 10 corresponding to the outside of the plurality of microlenses 31, the exposed portions of the base material layer 10 are etched away using the dry etching process to form the microlens layer 30, and then the remaining portions of the photoresist layer are removed using a wet etching process.

[0092] The plurality of grooves 13 may be formed by a dry etching process or a wet etching process. Specifically, a photoresist layer is formed on the second surface 12 of the base material layer 10, portions of the photoresist layer corresponding to the plurality of pattern units 21 are exposed, the exposed portions of the photoresist layer are removed using a developer to expose portions of the second surface 12 of the base material layer 10 corresponding to the plurality of pattern units 21, and the exposed portions of the base material layer 10 are etched and removed using a dry etching process or a wet etching process to form the plurality of grooves 13.

[0093] The pattern layer 20 may be obtained by plating a metal film such as a chromium film, or by filling a color developing material such as ink into the plurality of grooves 13 to form a plurality of pattern units 21, and then removing the remaining portions of the photoresist layer using a dry etching or wet etching process.

[0094] The base material layer 10 may be a glass layer.

[0095] In another example, a method for manufacturing the optical structure 100 may include the following steps: a microlens mold is provided; a microlens layer 30 is formed on a first surface 11 of a base material layer 10 by the microlens mold; a second surface 12 of the base material layer 10 is etched to form a plurality of grooves 13; and a plurality of pattern units 21 are formed in the plurality of grooves 13.

[0096] In another example, a method for manufacturing the optical structure 100 may include the following steps: etching the first surface 11 of the base material layer 10 to form the microlens layer 30; forming a coating layer on the second surface 12 of the base material layer 10; forming a photoresist layer on a side of the coating layer remote from the base material layer 10; removing portions of the photoresist layer corresponding to the exterior of the plurality of pattern units 21 to expose portions of the coating layer corresponding to the exterior of the plurality of pattern units 21; removing the exposed portions of the coating layer to retain portions of the coating layer corresponding to the plurality of pattern units 21 to form the plurality of pattern units 21; removing the remaining portions of the photoresist layer.

[0097] 19, which is a side view of a terminal shell 200 provided by an example of the present application. In some examples, as shown in FIG. 19, the terminal shell 200 includes the optical structure 100 provided by any of the examples described above.

[0098] 19, the terminal shell 200 includes a transparent back cover 50 for covering the rear of the terminal. The optical structure 100 is disposed on the side of the transparent back cover 50 closest to the interior of the terminal, i.e., on the inner surface of the transparent back cover 50. The pattern layer 20 of the optical structure 100 is bonded to the transparent back cover 50, and an optical adhesive may be disposed between the pattern layer 20 and the transparent back cover 50 to adhere the optical structure 100 to the inner surface of the transparent back cover 50.

[0099] Incident light enters from the transparent back cover 50, passes through the pattern layer 20, reaches the microlens layer 30, and is reflected by the multiple microlenses 31 to generate reflected light. The reflected light propagates to the pattern layer 20 and forms an image on the surface of the pattern layer 20 farther from the base layer 10, thereby forming a preset pattern with a three-dimensional floating effect.

[0100] The transparent back cover 50 may be made of a transparent polymer or glass.

[0101] In some examples, the base material layer 10 is a glass layer. The device shell 200 is made of glass. The base material layer 10 is a transparent back cover 50 of the device shell 200. The microlens layer 30 is closer to the inside of the device than the pattern layer 20, i.e., the pattern layer 20 is disposed on the outer surface. The device shell 200 may further include a protective layer disposed on the side of the pattern layer 20 remote from the microlens layer 30 to protect the pattern layer 20 from physical damage or chemical corrosion.

[0102] The present application also provides a terminal. The terminal includes the terminal shell 200 described above. The terminal shell 200 is used to cover the back of the terminal, which is the surface opposite to the surface on which the terminal screen is installed. The terminal may be an electronic device such as a mobile phone, a computer, a tablet, a wearable device, a display screen, or another type of electronic device.

[0103] It should be noted that those skilled in the art will recognize that the examples described herein are general examples and that the acts involved are not necessarily required for the present application.

[0104] The above is an example of the present application. It should be pointed out to those skilled in the art that some improvements and modifications may be made without departing from the principle of the examples of the present application, and these improvements and modifications are also considered to be within the protection scope of the present application. [Explanation of symbols]

[0105] 100 Optical structures 10 Base material layer 20 pattern layers 30 microlens layer 21 Pattern Units 22 Pattern Area 31 Microlens 11 First Surface 12 Second Surface 13 Groove 200 Terminal Shell 50 Transparent Back Cover

Claims

1. a base material layer 10 having a first surface 11 and a second surface 12 opposite to each other; a pattern layer (20) disposed on the first surface (11) of the base material layer (10), the pattern layer (20) comprising a plurality of pattern units (21) arranged in an array, each of the pattern units (21) being a portion of a preset pattern; a microlens layer (30) disposed on the second surface (12) of the base material layer (10), the microlens layer (30) comprising a plurality of microlenses (31) arranged in an array, each of the microlenses corresponding to one pattern unit, the pattern unit (21) being located within the projection of the corresponding microlens (31) on the pattern layer (20), and the plurality of microlenses (31) being used to cause the plurality of pattern units (21) to form the preset pattern having a three-dimensional (3D) effect; The optical structure 100 comprises:

2. The optical structure 100 of claim 1, wherein the preset pattern is a projection onto a plane of a figure disposed on a three-dimensional structure, and the projection onto the plane of the figure on the three-dimensional structure does not have any overlapping areas.

3. A plurality of pattern units 21 in each row of pattern units satisfy a first preset condition, the first preset condition comprising a first combination pattern overlapping a first sub-pattern of the corresponding preset pattern, the first combination pattern being formed by translating and combining the plurality of pattern units 21 in each row of pattern units in a first preset direction, the first sub-pattern being a partial pattern of the preset pattern extending a first preset distance in a second preset direction, the second preset direction being perpendicular to the first preset direction.

3. The optical structure 100 according to claim 1, wherein the plurality of pattern units 21 in each row of pattern units are perpendicular to each other, and a plurality of pattern units 21 in each row of pattern units satisfy a second preset condition, the second preset condition comprising a second combination pattern that overlaps with a second sub-pattern of the corresponding preset pattern, the second combination pattern being formed by translating and combining the plurality of pattern units 21 in each row of pattern units in a second preset direction, and the second sub-pattern being a partial pattern of the preset pattern extending a second preset distance in the first preset direction.

4. 4. The optical structure 100 of claim 3, wherein the absolute values of the differences in dimensions between every two adjacent pattern units 21 in each row of pattern units in the first preset direction are equal, and the absolute values of the differences in dimensions between every two adjacent pattern units 21 in each column of pattern units in the second preset direction are equal.

5. 5. The optical structure 100 of claim 3 or 4, wherein two adjacent pattern units 21 in each row of pattern units are partially identical, the first preset condition comprises a first combination pattern that overlaps with a corresponding first sub-pattern, and the first combination pattern is formed by combining the plurality of pattern units 21 so that the identical portions overlap, and wherein two adjacent pattern units 21 in each column of pattern units are partially identical, the second preset condition comprises a second combination pattern that overlaps with a corresponding second sub-pattern, and the second combination pattern is formed by combining the plurality of pattern units 21 so that the identical portions overlap.

6. 6. The optical structure 100 of claim 3, wherein a plurality of pattern units 21 in each row of pattern units are each portions cut out of the corresponding first sub-pattern in a first preset direction, and a plurality of pattern units 21 in each column of pattern units are each portions cut out of the corresponding second sub-pattern in a second preset direction.

7. 7. The optical structure 100 of claim 3, wherein the first and last pattern units 21 in each row of pattern units each comprise both end portions of the corresponding first sub-pattern in the first preset direction, the cut-out portions included in each row of pattern units gradually increasing from the first and last pattern units 21 to a central pattern unit 21, the cut-out portions included in the central pattern unit 21 comprising at least a central portion of the corresponding first sub-pattern, and the first and last pattern units 21 in each column of pattern units each comprise both end portions of the corresponding second sub-pattern in the second preset direction, the cut-out portions included in each column of pattern units gradually increasing from the first and last pattern units 21 to the central pattern unit 21, the cut-out portions included in the central pattern unit 21 comprising at least a central portion of the corresponding second sub-pattern.

8. 8. The optical structure 100 of any one of claims 1 to 7, wherein the pattern layer 20 comprises a plurality of pattern areas 22 arranged in an array, each of the pattern areas 22 corresponding to one microlens 31, the center of each of the pattern areas 22 being aligned with the center of the corresponding microlens 31, and each of the pattern units 21 being arranged at a preset position within the corresponding pattern area 22, whereby each of the pattern units 21 corresponds to a preset portion of the corresponding microlens 31 and a corresponding pattern is formed through the corresponding microlens 31.

9. The optical structure (100) of claim 8, wherein the shape of the patterned area (22) is the same as the shape of the projection of each of the microlenses (31) on the patterned layer (20).

10. 9. The optical structure (100) of claim 8, wherein the shape of the patterned area (22) is different from the shape of the projection of each of the microlenses (31) on the patterned layer (20).

11. 11. The optical structure (100) of claim 1, wherein the base material layer (10) comprises at least one of a transparent polymer layer and a glass layer.

12. The optical structure 100 of any one of claims 1 to 11, wherein the base material layer 10 is a glass layer, the plurality of microlenses 31 are portions of the glass layer extending outward from the glass, and / or a plurality of grooves 13 arranged in an array are arranged on the surface of the glass layer far from the microlenses 31, each of the grooves 13 corresponds to one pattern unit and is covered by a corresponding pattern unit 21, and the shape of each of the grooves 13 is the same as the corresponding pattern unit 21.

13. An optical structure 100 described in any one of claims 1 to 12, wherein the outer contour of the microlens 31 is arc-shaped, the projection of the microlens 31 on the base material layer 10 is circular, the diameter of the projection is a value in the range of 100 to 300 μm, the height of the microlens 31 is a value in the range of 0.1 to 20 μm, and the height of the microlens 31 is the distance between the end of the microlens 31 farthest from the base material layer 10 and the base material layer 10.

14. An optical structure 100 described in any one of claims 1 to 13, wherein the thickness of the base material layer 10 is a value in the range of 0.1 to 0.6 mm, and the thickness of the base material layer 10 is the distance between the first surface 11 and the second surface 12.

15. 15. The optical structure 100 according to any one of claims 1 to 14, wherein the pattern units 21 can be formed of a metallic material or a color developing material.

16. A terminal shell (200) comprising an optical structure (100) according to any one of claims 1 to 15.

17. The terminal shell 200 has a transparent back cover 50, and the optical structure 100 is disposed on a surface of the transparent back cover 50 close to the interior of the terminal; The terminal shell 200 of claim 16, wherein the pattern layer 20 of the optical structure 100 is bonded to the transparent back cover 50, and an optical adhesive can be disposed between the pattern layer 20 and the transparent back cover 50 to adhere the optical structure 100 to the inner surface of the transparent back cover 50.

18. 18. The terminal shell 200 of claim 17, wherein the preset pattern is formed by incident light entering from the transparent back cover 50, passing through the pattern layer 20, reaching the microlens layer 30, being reflected at the plurality of microlenses 31 to generate reflected light, and the reflected light propagating to the pattern layer 20 to form an image on the surface of the pattern layer 20 farther from the base material layer 10, thereby forming the preset pattern having a three-dimensional floating effect.

19. The terminal shell 200 according to claim 17 or 18, wherein said transparent back cover 50 can be made of transparent polymer or glass.

20. A terminal comprising a terminal shell 200 according to any one of claims 16 to 19.

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