Plasma generation device using a resonant waveguide with a tuner

Abstract

A plasma generator using a resonant waveguide is disclosed. The plasma generator includes a ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface, a first input waveguide tangentially connected to the central waveguide to allow electromagnetic waves to pass therethrough, an electromagnetic wave supplier transmitting electromagnetic waves to the input waveguide, and a plasma chamber having an electromagnetic wave input window located at the exit of the slots to seal the interior of the central waveguide and through which the electromagnetic waves introduced through the slots can be radiated to the outside.

Description

[Technical Field]

[0001] The present invention relates to a plasma generator using a resonant waveguide, and more particularly to a plasma generator using a resonant waveguide that can generate uniform plasma over a large area. [Background technology]

[0002] In general, it is very efficient to use the roll-to-roll method for large-area substrates, especially flexible OLED thin film processes and plasma processing of functional textiles.

[0003] This roll-to-roll method requires a plasma source large enough to cover the entire substrate, as it processes the substrate by scanning it from one end to the other. However, conventional microwave plasma sources have a length or diameter that is limited to within the wavelength of the microwave, which limits the processing of substrates larger than a certain size.

[0004] To solve these problems, plasma sources using electromagnetic waves formed in an elliptical track shape that is long in one direction have been developed and used to plasma treat large-area workpieces, but this has had problems such as difficulty in applying power to generate plasma uniformly along the length of the long track shape, making it difficult to generate uniform large-area plasma, and difficulty in controlling the density of the large-area plasma. Summary of the Invention [Problem to be solved by the invention]

[0005] Therefore, an object of the present invention is to provide a plasma generation device using a resonant waveguide, which can generate large-area plasma with uniform density and uniformity in a plasma chamber by maintaining the power of electromagnetic waves uniformly throughout the entire section of the resonant waveguide.

[0006] Another object is to provide a plasma generating device using a resonant waveguide that can make the plasma density more uniform and increase the plasma density. [Means for solving the problem]

[0007] A plasma generator using a resonant waveguide according to one embodiment of the present invention includes a ring-shaped or elliptical central waveguide having a plurality of slots on its inner surface, a first input waveguide tangentially connected to the central waveguide to allow electromagnetic waves to pass therethrough, an electromagnetic wave supplier for transmitting electromagnetic waves to the input waveguide, and a plasma chamber having an electromagnetic wave input window disposed at the exit of the slots to seal the interior of the central waveguide and formed therein, through which the electromagnetic waves introduced through the slots can be radiated to the outside. Electromagnetic waves are input into the central waveguide in a normal direction and resonate while rotating around the central waveguide, generating strong resonant electromagnetic waves within the central waveguide, which can then be emitted through the slits.

[0008] In one embodiment, the plasma source may include a second incident waveguide tangent-connected to the central waveguide at a point symmetrical to the center point of the central waveguide with respect to the first incident waveguide, allowing electromagnetic waves to pass through. When the incident waveguides are placed diagonally, waves in the central waveguide propagate in the same direction, inducing resonance and compensating for the drawback of power reduction as the distance increases in the incident waveguide. The central waveguide reduces electromagnetic wave loss by forming resonance and induces plasma generation within the chamber by uniformly distributing the electromagnetic waves. This plasma source provides a structure in which plasma is generated within the chamber by electromagnetic waves applied through a plurality of slits at designated positions within the linear section of the central waveguide.

[0009] This solves the conventional problem of relatively strong electromagnetic waves being generated near the incident waveguide, which weaken as the distance from the incident waveguide increases, resulting in non-uniform plasma in the linear section. To solve this problem, the present invention introduces a structure in which electromagnetic waves are incident in both directions, with the first and second incident waveguides positioned symmetrically from the center point, allowing microwaves to propagate within the waveguide in the same direction. At the same time, this solves the problem of non-uniform strength of electromagnetic waves weakening as the distance from the incident section increases by supplying electromagnetic waves from both directions.

[0010] In one embodiment, the waveguide may include a third incident waveguide parallel to the first incident waveguide and tangentially connected to the central waveguide in the same row as the second incident waveguide so as to allow electromagnetic waves to pass through, and a fourth incident waveguide parallel to the second incident waveguide and tangentially connected to the central waveguide in the same row as the first incident waveguide so as to allow electromagnetic waves to pass through. The four incident waveguides are configured to input waves in two different directions, thereby inducing a standing wave within the waveguide. By forming a standing wave, electromagnetic waves of uniform strength can be induced in each slit. Furthermore, the first, second, third, and fourth incident waveguides are positioned in normal directions symmetrical to the center of the central waveguide, reducing the problem of non-uniform electric field strength around the different incident waveguides.

[0011] In one embodiment, the central waveguide includes a first straight rectangular waveguide, a second straight rectangular waveguide parallel to the first straight rectangular waveguide, a first curved rectangular waveguide connecting ends of the first straight rectangular waveguide and the second straight rectangular waveguide at one side so as to be able to communicate with each other by electromagnetic waves, and a second curved rectangular waveguide connecting ends of the first straight rectangular waveguide and the second straight rectangular waveguide at the other side so as to be able to communicate with each other by electromagnetic waves, and the first incident waveguide may be connected to an end portion of the first straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to be able to communicate with each other by electromagnetic waves.

[0012] In one embodiment, the waveguide may include a second incident waveguide tangentially connected to the central waveguide at a point symmetrical to the center point of the central waveguide with respect to the first incident waveguide so as to be electromagnetically communicable, and the second incident waveguide may be connected in parallel to the second curved rectangular waveguide at an end portion of the second straight rectangular waveguide so as to be electromagnetically communicable.

[0013] In one embodiment, the waveguide includes: a third incident waveguide that is parallel to the first incident waveguide and tangentially connected to a point where the third incident waveguide intersects with the central waveguide in the same row as the second incident waveguide so as to be electromagnetically communicable; and a fourth incident waveguide that is parallel to the second incident waveguide and tangentially connected to a point where the fourth incident waveguide intersects with the central waveguide in the same row as the first incident waveguide so as to be electromagnetically communicable; and the third incident waveguide is connected to an end portion of the first straight rectangular waveguide in parallel to the second curved rectangular waveguide so as to be electromagnetically communicable;

[0014] The fourth input waveguide may be connected to an end portion of the second straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to be electromagnetically conductive.

[0015] In one embodiment, the straight rectangular waveguide and the curved rectangular waveguide are in TE mode, and one of two surfaces perpendicular to the electric field in the straight rectangular waveguide and the curved rectangular waveguide is erected so as to face inward, and the slit can be formed on the inner surface of the straight rectangular waveguide.

[0016] In one embodiment, the straight rectangular waveguide may be WR430, the curved rectangular waveguide may be WR284, and the input waveguide may be WR340.

[0017] In one embodiment, the linear rectangular waveguide may include a tuner installed on a surface opposite the slot. A tuner is provided for each slot, thereby adjusting the wavelength within the resonant waveguide and thereby adjusting the microwave power intensity applied to each slit. Adjusting the position of the tuner located on the surface opposite each slit in the linear rectangular waveguide changes the wavelength within each guide, which in turn changes the intensity of the electromagnetic wave applied to the slit. This may also affect the intensity of the electromagnetic wave applied to the next slit. This is a means for independently controlling the intensity of the electromagnetic wave (plasma density) applied to each slit in each of the plasma generation source structures. As the plasma generation device becomes larger, the problem of non-uniformity of the electromagnetic wave applied to each slit becomes more serious. To solve this problem, a tuner for controlling each slit is located on the surface opposite the slit.

[0018] In one embodiment, the tuners may be included in a number corresponding to the number of slots.

[0019] In one embodiment, the tuner is a stub tuner, and the tuner may be installed by penetrating from the outside to the inside of the outer surface. [Effects of the Invention]

[0020] The plasma generation device using a resonant waveguide according to the present invention has the advantage that the power of the electromagnetic wave is maintained uniformly throughout the entire section of the resonant waveguide, and therefore electromagnetic waves of uniform power can be radiated into the plasma chamber through a plurality of slots, thereby generating a large-area plasma in the plasma chamber with uniform density and uniformity.

[0021] In addition, the tuner can adjust the power of the electromagnetic waves flowing into each of the multiple slots so that it is uniform, which has the advantage of making the density of plasma in the plasma chamber more uniform or generating high-density plasma. [Brief explanation of the drawings]

[0022] [Figure 1] 1 is a cross-sectional view illustrating the configuration of a plasma generation device using a resonant waveguide according to an embodiment of the present invention. [Figure 2] FIG. 2 is a perspective view showing the central waveguide and the input waveguide shown in FIG. 1. [Figure 3] 1 is a cross-sectional view showing the transmission of electromagnetic waves and plasma generation in a plasma generating device using a resonant waveguide according to an embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0023] Hereinafter, a plasma generation device using a resonant waveguide according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. The present invention may be modified in various ways and may have various forms, and specific embodiments are illustrated in the drawings and described in detail herein. However, this is not intended to limit the present invention to the particular disclosed form, but it should be understood that the present invention includes all modifications, equivalents, and alternatives falling within the spirit and technical scope of the present invention. In describing the various drawings, like reference numerals are used to refer to like elements. In the accompanying drawings, the dimensions of structures are exaggerated for clarity.

[0024] Terms such as "first" and "second" may be used to describe various components, but the components are not limited by these terms. These terms are used only to distinguish one component from another. For example, a first component may be referred to as a second component, and similarly, a second component may be referred to as a first component, without departing from the scope of the present invention.

[0025] The terms used in this application are used only to describe specific embodiments and are not intended to limit the present invention. The singular expressions include the plural expressions unless the context clearly dictates otherwise. In this application, the terms "comprise" or "have" are intended to specify the presence of a feature, step, operation, component, part, or combination thereof described in the specification, but should be understood not to preclude the presence or additional possibility of one or more other features, steps, operations, components, parts, or combinations thereof.

[0026] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. Terms as defined in commonly used dictionaries should be interpreted to have a meaning consistent with the meaning they have in the context of the relevant art, and should not be interpreted in an idealized or overly formal sense unless expressly defined in this application.

[0027] FIG. 1 is a cross-sectional view illustrating the configuration of a plasma generation device using a resonant waveguide according to one embodiment of the present invention, and FIG. 2 is a perspective view showing a central waveguide and an incident waveguide shown in FIG.

[0028] 1 and 2, a resonant waveguide according to an embodiment of the present invention may include a central waveguide 110, a first incident waveguide 141, an electromagnetic wave feeder, and a plasma chamber .

[0029] The central waveguide 110 may be provided in a track shape so that electromagnetic waves can be transmitted in a clockwise or counterclockwise direction. For example, it may be provided in a ring shape or an ellipse shape. The central waveguide 110 is a rectangular waveguide.

[0030] Specifically, the central waveguide 110 may include a first straight rectangular waveguide 111 , a second straight rectangular waveguide 112 , a first curved rectangular waveguide 113 , and a second curved rectangular waveguide 114 .

[0031] The first straight rectangular waveguide 111 is a waveguide that extends linearly in one direction from the central waveguide 110 .

[0032] The second straight rectangular waveguide 112 is a waveguide that is parallel to the first straight rectangular waveguide 111 at the central waveguide 110 .

[0033] The first curved rectangular waveguide 113 connects the ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 at one side of the central waveguide 110, i.e., in the direction of one end of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112, so as to be able to transmit electromagnetic waves.

[0034] The second curved rectangular waveguide 114 connects the ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 on the other side of the central waveguide 110, i.e., in the direction of the other ends of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112, so as to be able to transmit electromagnetic waves.

[0035] In this structure of the central waveguide 110, the first and second straight rectangular waveguides 112 and the first and second curved rectangular waveguides 114 are in TE mode, and the central waveguide 110 may be arranged upright such that one of two surfaces perpendicular to the electric field in the first and second straight rectangular waveguides 112 and the first and second curved rectangular waveguides 114 faces the inside of the ring or ellipse of the central waveguide 110. In this case, of the two upright surfaces of each of the rectangular waveguides 111, 112, 113, and 114, the surface facing the inside of the ring or ellipse of the central waveguide 110 is the inner surface of the central waveguide 110, and the surface facing the outside of the ring or ellipse of the central waveguide 110 is the outer surface of the central waveguide 110.

[0036] In one embodiment, the first and second straight rectangular waveguides 112 may be comprised of WR430 waveguides, and the first and second curved rectangular waveguides 114 may be comprised of WR284 waveguides.

[0037] Meanwhile, the central waveguide 110 may include a plurality of slots 115. The slots 115 may be configured to radiate electromagnetic waves within the central waveguide 110 to the outside. For example, the plurality of slots 115 may be arranged at predetermined intervals on the inner surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112. The shape of the slots 115 is not particularly limited, and for example, the slots 115 may be configured to expand in size from the inside of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112 toward the inner surfaces of the first linear rectangular waveguide 111 and the second linear rectangular waveguide 112.

[0038] The first incident waveguide 141 inputs an electromagnetic wave into the central waveguide 110. The first incident waveguide 141 may be tangentially connected to the central waveguide 110 to allow electromagnetic waves to pass through. In this case, the first incident waveguide 141 may be connected in parallel to the first curved rectangular waveguide 113 to an end portion of the first straight rectangular waveguide 111 connected to the first curved rectangular waveguide 113 to allow electromagnetic waves to pass through. The transmission path of the electromagnetic wave input from the first incident waveguide 141 is such that the wave is input to the first straight rectangular waveguide 111, then passes through the second curved rectangular waveguide 114, and then propagates in a clockwise direction, passing through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. For example, the first incident waveguide 141 may have a surface connected to the outer surface of the first straight rectangular waveguide 111 tapered toward the first straight rectangular waveguide 111 .

[0039] The electromagnetic wave supply unit 120 transmits an electromagnetic wave to the first incident waveguide 141. For example, the electromagnetic wave supply unit may include a power supply unit and a magnetron that emits an electromagnetic wave to the first incident waveguide 141. A plurality of electromagnetic wave supply units 120 may be provided, and in this case, each electromagnetic wave supply unit 120 may transmit an electromagnetic wave to the first incident waveguide 141 and second to fourth incident waveguides 152, which will be described later.

[0040] The plasma chamber 130 is arranged along the inner surface of the central waveguide 110 and is located inside the central waveguide 110, so that electromagnetic waves can be incident into the plasma chamber 130 from the central waveguide 110. For example, the plasma chamber 130 may be formed in a ring or ellipse shape.

[0041] In order to inject electromagnetic waves into the plasma chamber 130, the plasma chamber 130 may include an electromagnetic wave injection window 131. The electromagnetic wave injection window 131 is disposed to face the plurality of slots 115 of the central waveguide 110. That is, the electromagnetic wave injection window 131 is located at the outlet side of the plurality of slots 115 to seal the interior of the central waveguide 110, and may be configured so that the electromagnetic waves introduced through the plurality of slots 115 are radiated outside the plurality of slots 115, i.e., into the plasma chamber 130. There may be a plurality of electromagnetic wave injection windows 131, which may correspond to the inner surfaces of the first and second linear rectangular waveguides 111 and 112 and cover the outlet sides of the plurality of slots 115 provided in each of the linear rectangular waveguides 111 and 112.

[0042] Meanwhile, the plasma generation apparatus using a resonant waveguide according to an embodiment of the present invention may further include a second incident waveguide 142.

[0043] The second incident waveguide 142 inputs an electromagnetic wave into the central waveguide 110. The second incident waveguide 142 may be tangentially connected to the central waveguide 110 at a point symmetrical to the center point of the central waveguide 110 with respect to the first incident waveguide 141 so as to be electromagnetically transmittable. In this case, the second incident waveguide 142 may be connected in parallel to the second curved rectangular waveguide 114 to an end portion of the second straight rectangular waveguide 112 connected to the second curved rectangular waveguide 114 so as to be electromagnetically transmittable. In one embodiment, the second incident waveguide 142 may be disposed diagonally to the first incident waveguide 141. The transmission path of the electromagnetic wave incident from the second incident waveguide 142 may be such that the electromagnetic wave is incident to the second straight rectangular waveguide 112, passes through the first curved rectangular waveguide 113, and then is transmitted in a clockwise direction, passing through the first straight rectangular waveguide 111 and the second curved rectangular waveguide 114. The frequency of the electromagnetic wave incident through the second incident waveguide 142 may be the same as the frequency of the electromagnetic wave incident through the first incident waveguide 141. As an example, the second incident waveguide 142 may have a surface connected to an outer surface of the second straight rectangular waveguide 112 tapered toward the second straight rectangular waveguide 112.

[0044] Meanwhile, the plasma generation apparatus using a resonant waveguide according to an embodiment of the present invention may further include a third incident waveguide 151 and a fourth incident waveguide 152.

[0045] The third incident waveguide 151 inputs an electromagnetic wave into the central waveguide 110. The third incident waveguide 151 may be parallel to the first incident waveguide 141 and tangentially connected to a point where the second incident waveguide 142 intersects with the central waveguide 110 in the same row as the first incident waveguide 141 so as to be electromagnetically communicateable. In this case, the third incident waveguide 151 may be connected in parallel to the second curved rectangular waveguide 114 to an end of the first straight rectangular waveguide 111 connected to the second curved rectangular waveguide 114 so as to be electromagnetically communicateable. The transmission path of the electromagnetic wave input from the third incident waveguide 151 is such that the wave is input to the first straight rectangular waveguide 111, then propagates counterclockwise through the first curved rectangular waveguide 113, and then passes through the second straight rectangular waveguide 112 and the second curved rectangular waveguide 114. The frequency of the electromagnetic wave incident on the third incident waveguide 151 may be the same as the frequency of the electromagnetic waves incident on the first incident waveguide 141 and the second incident waveguide 142. In this case, the electromagnetic wave incident on the third incident waveguide 151 may be an electromagnetic wave having the same frequency, amplitude, and phase angle as the electromagnetic waves incident on the first incident waveguide 141 and the second incident waveguide 142. As an example, the third incident waveguide 151 may be configured such that one surface connected to the outer surface of the first straight rectangular waveguide 111 is tapered toward the first straight rectangular waveguide 111.

[0046] The fourth incident waveguide 152 inputs an electromagnetic wave into the central waveguide 110. The fourth incident waveguide 152 is parallel to the second incident waveguide 142 and may be tangentially connected to a point where the fourth incident waveguide 152 intersects with the central waveguide 110 in the same row as the first incident waveguide 141 so as to be electromagnetically communicateable. In this case, the fourth incident waveguide 152 may be connected to an end of the second straight rectangular waveguide 112 connected to the first curved rectangular waveguide 113 in parallel with the first curved rectangular waveguide 113 so as to be electromagnetically communicateable. The transmission path of the electromagnetic wave input to the fourth incident waveguide 152 is such that the electromagnetic wave is input to the second straight rectangular waveguide 112, then propagates counterclockwise through the second curved rectangular waveguide 114, and then passes through the first straight rectangular waveguide 111 and the first curved rectangular waveguide 113. The frequency of the electromagnetic wave incident on the fourth incident waveguide 152 may be the same as the frequency of the electromagnetic wave incident on the third incident waveguide 151. As an example, the fourth incident waveguide 152 may be configured such that one surface connected to the outer surface of the second straight rectangular waveguide 112 is tapered toward the second straight rectangular waveguide 112.

[0047] In one embodiment, the first to fourth input waveguides 152 may be made of WR340 waveguides.

[0048] Meanwhile, the plasma generation apparatus using a resonant waveguide according to an embodiment of the present invention may further include a tuner 160 .

[0049] A plurality of tuners 160 may be provided and installed within the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 of the central waveguide 110 on the surfaces facing the plurality of slots 115, i.e., on the outer surfaces of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112.

[0050] The tuners 160 may be provided in a number corresponding to the number of the plurality of slots 115 and may be arranged opposite each of the plurality of slots 115 on the outer surfaces of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112.

[0051] In one embodiment, the tuner 160 may be a stub tuner and may be installed by penetrating the outer surfaces of the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112 from the outside to the inside. In this case, the tuner 160 may have a fixed insertion length or may have an insertion length adjustable to adjust the distance between the slots 115. If the insertion length of the tuner 160 is fixed, the tuner 160 may be installed so that its insertion length varies in the propagation direction of the electromagnetic wave in the central waveguide 110, and the distances between the tuners facing each slot 115 may be configured to vary from one another in the propagation direction of the electromagnetic wave. For example, the tuner 160 may be installed in a structure that allows the insertion length to be adjustable.

[0052] Hereinafter, an electromagnetic wave injection process and a plasma generation process of a plasma generation device using a resonant waveguide according to an embodiment of the present invention will be described with reference to Fig. 3. Fig. 3 is a cross-sectional view showing the transmission of electromagnetic waves and plasma generation of a plasma generation device using a resonant waveguide according to an embodiment of the present invention.

[0053] To form a plasma in the plasma chamber 130 , electromagnetic waves are injected into the central waveguide 110 via the first to fourth input waveguides 152 .

[0054] The electromagnetic wave incident on the first incident waveguide 141 is incident on the first straight rectangular waveguide 111 of the central waveguide 110, and then transmitted in the direction of the second straight rectangular waveguide 112 via the second curved rectangular waveguide 114.

[0055] The electromagnetic wave incident at the second incident waveguide 142 is incident into the second straight rectangular waveguide 112 of the central waveguide 110, and then transmitted toward the first straight rectangular waveguide 111 via the first curved rectangular waveguide 113.

[0056] The electromagnetic waves incident via the first incident waveguide 141 and the second incident waveguide 142 are electromagnetic waves of the same frequency, and are joined together and transmitted in the same direction (clockwise direction).

[0057] The electromagnetic wave incident at the third incident waveguide 151 is incident into the first straight rectangular waveguide 111 of the central waveguide 110, and then transmitted in the direction of the second straight rectangular waveguide 112 via the first curved rectangular waveguide 113.

[0058] The electromagnetic wave incident at the fourth incident waveguide 152 is incident into the second straight rectangular waveguide 112 of the central waveguide 110, and then transmitted toward the first straight rectangular waveguide 111 via the second curved rectangular waveguide 114.

[0059] The electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 are electromagnetic waves of the same frequency, and are combined and transmitted in the same direction (counterclockwise). In addition, the electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 may be electromagnetic waves with the same frequency, amplitude, and phase angle as the electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142.

[0060] Therefore, the electromagnetic waves incident through the first incident waveguide 141 and the second incident waveguide 142 and the electromagnetic waves incident through the third incident waveguide 151 and the fourth incident waveguide 152 travel in opposite directions, causing interference, and a standing wave can be induced within the central waveguide 110 as electromagnetic waves of the same attribute.

[0061] Next, the electromagnetic waves in the central waveguide 110 flow into a plurality of slots 115 arranged in the first straight rectangular waveguide 111 and the second straight rectangular waveguide 112, and are then radiated into the plasma chamber 130 through the electromagnetic wave entrance window 131 of the plasma chamber 130, thereby generating plasma in the plasma chamber 130.

[0062] During this electromagnetic wave transmission process and plasma generation process, the power of the electromagnetic wave incident from the first incident waveguide 141 may decrease as it moves away from the first incident waveguide 141. However, since an additional electromagnetic wave is incident from the second incident waveguide 142 in the same direction as the electromagnetic wave incident and transmitted from the first incident waveguide 141 and then merges and travels, even if the power of the electromagnetic wave incident and transmitted from the first incident waveguide 141 gradually decreases, the power of the electromagnetic wave can be maintained uniform throughout the entire section of the central waveguide 110 due to the additional electromagnetic wave incident from the second incident waveguide 142 and transmitted in the same direction.

[0063] This structure that solves the problem of electromagnetic wave power reduction also works in the same way on electromagnetic waves that are incident through the third incident waveguide 151 and the fourth incident waveguide 152 and transmitted within the central waveguide 110.

[0064] In addition, the electromagnetic waves transmitted after being incident on the third incident waveguide 151 and the fourth incident waveguide 152 have the same attributes as the electromagnetic waves transmitted after being incident on the first incident waveguide 141 and the second incident waveguide 142 but travel in the opposite direction, so that a standing wave is induced within the central waveguide 110 and electromagnetic waves of uniform power can flow into the multiple slots 115.

[0065] In this way, the power of the electromagnetic waves is maintained uniformly throughout the entire section of the central waveguide 110, and electromagnetic waves of uniform power are introduced into the multiple slots 115, so that plasma with uniform density and uniformity can be generated throughout the entire area of ​​the plasma chamber 130.

[0066] Meanwhile, in the process of transmitting the electromagnetic wave and generating the plasma, the power of the electromagnetic wave applied to the plasma chamber 130 can be adjusted using the tuner 160 .

[0067] That is, the tuners 160 facing each slot 115 along the propagation direction of the electromagnetic waves incident and transmitted through the first incident waveguide 141 and the second incident waveguide 142 have their insertion lengths set or variable to the spacing between the slots 115 so that the power of the electromagnetic waves entering each slot 115 can be made more uniform, and the density of the plasma generated in the plasma chamber 130 can be made more uniform or high-density plasma can be generated.

[0068] Furthermore, the central waveguide 110 and the plasma chamber 130 are formed in a ring or ellipse shape, so that a large area of ​​plasma can be generated.

[0069] The description of the presented embodiments is provided to enable any person skilled in the art to use or practice the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the scope of the present invention. Therefore, the present invention is not intended to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. a central waveguide having an annular or elliptical shape and including a plurality of slots on its inner surface; a first incident waveguide tangentially connected to the central waveguide so as to be capable of transmitting electromagnetic waves; an electromagnetic wave supply unit that transmits an electromagnetic wave to the incident waveguide; and a plasma chamber located at an exit side of the slot so as to be sealed with the inside of the central waveguide, the plasma chamber having an electromagnetic wave entrance window formed therein through which the electromagnetic wave introduced through the slot can be radiated to the outside, Plasma generation device using a resonant waveguide.

2. 2. The plasma generation device using a resonant waveguide according to claim 1, further comprising a second incident waveguide tangentially connected to the central waveguide at a point symmetrical to the center point of the central waveguide with respect to the first incident waveguide so that electromagnetic waves can be transmitted therethrough.

3. a third incident waveguide parallel to the first incident waveguide and tangentially connected to a point where the third incident waveguide intersects with the central waveguide in the same row as the second incident waveguide so as to be electromagnetically communicable; and a fourth input waveguide parallel to the second input waveguide and tangentially connected to a point where the fourth input waveguide intersects with the central waveguide in the same row as the first input waveguide so as to allow electromagnetic waves to pass therethrough.

4. The central waveguide is a first linear rectangular waveguide; a second straight rectangular waveguide parallel to the first straight rectangular waveguide; a first curved rectangular waveguide that connects ends of the first straight rectangular waveguide and the second straight rectangular waveguide at one side so as to be able to transmit electromagnetic waves; and a second curved rectangular waveguide that connects ends of the first straight rectangular waveguide and the second straight rectangular waveguide at the other side so as to be able to transmit electromagnetic waves; 2. The plasma generation device using a resonant waveguide according to claim 1, wherein the first incident waveguide is connected to an end portion of the first straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to be able to transmit electromagnetic waves.

5. a second incident waveguide connected to the central waveguide by a tangent at a point symmetrical to the central waveguide with respect to the first incident waveguide with respect to a center point of the central waveguide so as to be capable of transmitting electromagnetic waves; 5. The plasma generation device using a resonant waveguide according to claim 4, wherein the second incident waveguide is connected to an end portion of the second straight rectangular waveguide in parallel with the second curved rectangular waveguide so as to be able to transmit electromagnetic waves.

6. a third incident waveguide parallel to the first incident waveguide and tangentially connected to a point where the third incident waveguide intersects with the central waveguide in the same row as the second incident waveguide so as to be electromagnetically communicable; and a fourth input waveguide parallel to the second input waveguide and tangentially connected to a point where the fourth input waveguide intersects with the central waveguide in the same row as the first input waveguide so as to be electromagnetically communicable; the third input waveguide is connected to an end portion of the first straight rectangular waveguide in parallel with the second curved rectangular waveguide so as to be capable of transmitting electromagnetic waves; 6. The plasma generation device using a resonant waveguide according to claim 5, wherein the fourth incident waveguide is connected to an end portion of the second straight rectangular waveguide in parallel with the first curved rectangular waveguide so as to be able to transmit electromagnetic waves.

7. the straight rectangular waveguide and the curved rectangular waveguide are in TE mode; one of two surfaces perpendicular to the electric field in the straight rectangular waveguide and the curved rectangular waveguide is set up so as to face inward, 7. The plasma generation device using a resonant waveguide according to claim 4, wherein the slit is formed on an inner surface of the linear rectangular waveguide.

8. the straight rectangular waveguide is WR430; the curved rectangular waveguide is WR284; 8. The resonant waveguide plasma generator of claim 7, wherein said input waveguide is WR340.

9. 7. The plasma generation device using a resonant waveguide according to claim 4, further comprising a tuner installed in the linear rectangular waveguide on a surface opposite to the slot.

10. The plasma generation device using a resonant waveguide according to claim 9 , wherein the number of the tuners is equal to the number of the slots.

11. the tuner is a stub tuner, The plasma generation device using a resonant waveguide according to claim 9 , wherein the tuner is installed to penetrate from the outside to the inside of the outer surface.

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