Curable composition, film, optical filter and solid-state imaging device

Abstract

Provided are a curable composition capable of forming a film in which the occurrence of foreign matter defects is suppressed, a film, an optical filter, and a solid-state imaging device. [Solution] A curable composition comprising a colorant containing an inclusion compound a, which has a polymethine dye a1 as a core and a cyclic amide compound a2 that encapsulates the core as a shell, a compound represented by formula (1), a curable compound, and a solvent. JPEG2026043806000079.jpg27170

Description

[Technical Field]

[0001] The present invention relates to a curable composition containing a colorant. The present invention also relates to a film, an optical filter, and a solid-state imaging device using the curable composition containing a colorant. [Background technology]

[0002] BACKGROUND ART Optical filters such as color filters, infrared transmission filters, and infrared cut filters are produced using curable compositions containing coloring materials.

[0003] Known coloring materials include polymethine dyes such as squarylium dyes. Patent Document 1 describes a clathrate compound in which a specific squarylium dye is used as a core and this core is enclosed with a specific cyclic amide compound. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Korean Patent Publication No. 10-2023-0043000 Summary of the Invention [Problem to be solved by the invention]

[0005] Polymethine dyes tend to have poor durability against heat, light, etc. By incorporating them into a cyclic amide compound or the like to form an inclusion compound, it is possible to improve durability against heat, light, etc. However, according to the inventors' investigations, it has been found that incorporating polymethine dyes into a cyclic amide compound to form an inclusion compound increases crystallinity, making the dyes more likely to aggregate in the film and thus more likely to cause foreign matter defects.

[0006] Therefore, an object of the present invention is to provide a curable composition capable of forming a film in which the occurrence of foreign matter defects is suppressed. Another object of the present invention is to provide a film, an optical filter, and a solid-state imaging device using the curable composition. [Means for solving the problem]

[0007] The present invention provides the following:

[0008] <1> a colorant containing an inclusion compound a having a polymethine dye a1 as a core and a cyclic amide compound a2 as a shell that encompasses the core; A compound represented by formula (1), a curable compound; A solvent, a curable composition comprising: [ka] In formula (1), L a1 and L a2 each independently represents a single bond or a divalent linking group, A 1 and A 2 each independently represents a divalent linking group, R 1 and R 2 each independently represents a hydrogen atom or a substituent, n1 represents an integer of 1 to 10. <2> A in the above formula (1) 1 is a group represented by formula (A1-1) or formula (A1-2), A in the above formula (1) 2 is a group represented by any one of formulas (A2-1) to (A2-4), <1> a curable composition according to the above item (1); [ka] In the formula, the wavy line represents a bond. R 11 ~R 17 , R 21 ~R 26 , R 31 ~R 34each independently represents a hydrogen atom or a substituent, R 11 and R 12 may be bonded to form a ring, R 13 and R 14 may be bonded to form a ring, R 15 and R 16 may be bonded to form a ring, R 16 and R 17 may be bonded to form a ring, R 21 and R 22 may be bonded to form a ring, R 22 and R 23 may be bonded to form a ring, R 24 and R 25 may be bonded to form a ring, R 25 and R 26 may be bonded to form a ring, R 31 and R 32 may be bonded to form a ring, R 33 and R 34 may be bonded to form a ring. <3> The cyclic amide compound a2 encapsulating the core is a compound represented by formula (20): <1> a curable composition according to the above item (1); [ka] In formula (20), L b1 and L b2 each independently represents a single bond or a divalent linking group, A 21 and A 22 each independently represents a divalent linking group, n20 represents an integer of 1 to 10. <4> The cyclic amide compound a2 encompassing the core is a compound represented by any one of formulas (21) to (23): <1> ~ <3> the curable composition according to any one of the above items (1) to (5); [ka] In the formula, R 101 ~R 114 , R 121 ~R 134 , R 141 ~R 152 each independently represents a hydrogen atom or a substituent, R 101 ~R 114 two adjacent groups may be bonded to form a ring; R 121 ~R 134 two adjacent groups may be bonded to form a ring; R 141 ~R 152 Two adjacent groups among these may be bonded to form a ring. <5> The polymethine dye a1 is a squarylium dye. <1> ~ <4> 10. The curable composition according to claim 9, wherein the curable composition is a curable composition having a molecular weight of 100 or more. <6> The compound represented by formula (1) is contained in an amount of 1 to 50,000 ppm by mass relative to the inclusion compound a. <1> ~ <5> 10. The curable composition according to claim 9, wherein the curable composition is a curable composition having a molecular weight of 100 or more. <7> The compound represented by formula (1) is contained in an amount of 150 to 40,000 ppm by mass relative to the inclusion compound a. <1> ~ <5> 10. The curable composition according to claim 9, wherein the curable composition is a curable composition having a molecular weight of 100 or more. <8> Furthermore, the compound represented by formula (2) <1> ~ <7> the curable composition according to any one of the above items (1) to (5); [ka] In formula (2), L a3 and L a4 each independently represents a single bond or a divalent linking group, A 3 and A 4 each independently represents a divalent linking group, n2 represents an integer of 1 to 10. <9> <1> ~ <8> A film obtained by using the curable composition according to any one of the above items. <10> <9> An optical filter comprising the film according to claim 1. <11> <9> A solid-state imaging device comprising the film according to claim 1. [Effects of the Invention]

[0009] According to the present invention, it is possible to provide a curable composition capable of forming a film in which the occurrence of foreign matter defects is suppressed. The present invention also provides a film, an optical filter, and a solid-state imaging device. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor. DETAILED DESCRIPTION OF THE INVENTION

[0011] The present invention will be described in detail below. In this specification, the symbol "to" is used to mean that the numerical values ​​before and after it are included as the lower limit and upper limit. In the description of groups (atomic groups) in this specification, when a notation does not specify whether they are substituted or unsubstituted, it encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups without a substituent (unsubstituted alkyl groups) but also alkyl groups with a substituent (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. In this specification, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In this specification, the weight average molecular weight and number average molecular weight are defined as values ​​converted into polystyrene by gel permeation chromatography (GPC) measurement. In this specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, a pigment means a coloring material that is difficult to dissolve in a solvent. In this specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved. In this specification, symbols (e.g., a, a1, a2, etc.) added before or after a name are terms used to distinguish components, and do not limit the type, number, or superiority of the components.

[0012] <Curable composition> The curable composition of the present invention comprises: a colorant containing an inclusion compound a having a polymethine dye a1 as a core and a cyclic amide compound a2 as a shell that encompasses the core; A compound represented by formula (1), a curable compound; A solvent, The present invention is characterized by comprising:

[0013] The curable composition of the present invention, despite containing the inclusion compound a, can form a film in which the occurrence of foreign matter defects is suppressed. The reason for this effect is presumed to be as follows: Because the curable composition of the present invention contains the inclusion compound a and the compound represented by formula (1), hydrogen bonds are formed between the cyclic amide compound a2, which is the shell of the inclusion compound a, and the compound represented by formula (1), thereby suppressing crystal growth of the inclusion compound a. As a result, a film in which the occurrence of foreign matter defects is suppressed can be formed.

[0014] Furthermore, the curable composition of the present invention can also form a film having excellent adhesion to a support. It is presumed that the interaction between the compound represented by formula (1) and the support can improve the adhesion of the resulting film to the support.

[0015] The curable composition of the present invention can be used as a curable composition for optical filters, such as color filters, infrared cut filters, and infrared transmission filters.

[0016] Each component used in the curable composition of the present invention will be described below.

[0017] <<Colorants>> The curable composition of the present invention contains a colorant.

[0018] (Specific inclusion compounds) The curable composition of the present invention contains, as a colorant, an inclusion compound a, which has a polymethine dye a1 as a core and a cyclic amide compound a2 as a shell that encapsulates the core. Hereinafter, the inclusion compound a is also referred to as a specific inclusion compound.

[0019] As used herein, an inclusion compound refers to a compound in which a core compound penetrates the inner space of a ring of a cyclic compound forming a shell, thereby forming an integrated compound. Specifically, the inclusion compound a in the present invention refers to a compound in which a polymethine dye a1, which is the core, penetrates the inner space of a ring of a cyclic amide compound a2, which is the shell, thereby forming an integrated compound. The existence of an inclusion compound can be confirmed by combining thin-layer chromatography with a mass spectrometric method such as Maldi-tof-MS (Matrix Assisted Laser Desorption / Ionization Time-of-Flight Mass Spectrometry).

[0020] The inclusion compound may have a crosslinkable group. Examples of the crosslinkable group include ethylenically unsaturated bond-containing groups (such as vinyl, allyl, (meth)acryloyl, (meth)acryloyloxy, and (meth)acryloylamide groups), epoxy, oxetanyl, and alkoxysilyl groups. When the inclusion compound has a crosslinkable group, the crosslinkable group may be contained in the polymethine dye a1, which is the core, or in the cyclic amide compound a2, which is the shell.

[0021] -About the core- The specific inclusion compound has a polymethine dye a1 as a core. Examples of the polymethine dye a1, which is the core of the specific inclusion compound, include squarylium dyes, croconium dyes, and cyanine dyes. The polymethine dye a1 may be a dye multimer having two or more polymethine dye structures in one molecule. The polymethine dye a1 is preferably a squarylium dye. Examples of squarylium dyes include a compound represented by formula (SQ) and a squarylium dye multimer having two or more squarylium dye structures derived from a compound represented by formula (SQ) in one molecule.

[0022] The maximum absorption wavelength of the polymethine dye a1 is preferably in the wavelength range of 400 to 1800 nm, more preferably in the wavelength range of 500 to 1600 nm, and even more preferably in the wavelength range of 550 to 1500 nm.

[0023] [ka]

[0024] In formula (SQ), R sq1 and R sq2 each independently represents an aryl group, a heterocyclic group, or a group represented by formula (R1);

[0025] [ka]

[0026] In formula (R1), * represents a linking hand, Rs 1 ~Rs 3 each independently represents a hydrogen atom or an alkyl group, As 3 represents a heterocyclic group, n s1 represents an integer greater than or equal to 0, Rs 1 and Rs. 2 may be bonded to each other to form a ring, Rs 1 and As 3 may be bonded to each other to form a ring, Rs 2 and Rs. 3 may be bonded to each other to form a ring, n s1 If is 2 or more, multiple Rs 2 and Rs. 3 may be the same or different.

[0027] R sq1 and R sq2The aryl group represented by the formula (I) preferably has 6 to 48 carbon atoms, more preferably 6 to 22 carbon atoms, and particularly preferably 6 to 12 carbon atoms. R sq1 and R sq2 The heterocyclic group represented by is preferably a 5- or 6-membered heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 4 fused rings, and even more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 or 3 fused rings. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and even more preferably 1 to 12. The aryl group and heterocyclic group may have a substituent, such as the substituent T described below.

[0028] * in formula (R1) represents a connecting hand. Rs in formula (R1) 1 ~Rs 3 Rs each independently represents a hydrogen atom or an alkyl group. 1 ~Rs 3 The number of carbon atoms in the alkyl group represented by Rs is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and is preferably linear or branched. 1 ~Rs 3 is preferably a hydrogen atom. 3 Examples of the heterocyclic group represented by are the heterocyclic groups described above, and the preferred ranges are also the same.

[0029] n in formula (R1) s1 represents an integer greater than or equal to 0. s1 is preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.

[0030] In formula (R1), Rs 1 and Rs. 2 may be bonded to each other to form a ring, and Rs1 and As 3 may be bonded to each other to form a ring, and Rs 2 and Rs. 3 may be bonded to each other to form a ring. When forming the above ring, the linking group is preferably a divalent linking group selected from the group consisting of -CO-, -O-, -NH-, an alkylene group having 1 to 10 carbon atoms, and a combination thereof. The alkylene group as the linking group may be unsubstituted or may have a substituent. Examples of the substituent include the substituent T described below.

[0031] In formula (R1), n s1 If is 2 or more, multiple Rs 2 and Rs. 3 may be the same or different.

[0032] Examples of the substituent T include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably or an aryloxy group having 6 to 30 carbon atoms), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably a an acylamino group having 0 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heterocyclicthio group (preferably a heterocyclicthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms),Heterocyclic sulfonyl groups (preferably heterocyclic sulfonyl groups having 1 to 30 carbon atoms), heterocyclic sulfonylamino groups (preferably heterocyclic sulfonylamino groups having 1 to 30 carbon atoms), alkylsulfinyl groups (preferably alkylsulfinyl groups having 1 to 30 carbon atoms), arylsulfinyl groups (preferably arylsulfinyl groups having 6 to 30 carbon atoms), heterocyclic sulfinyl groups (preferably heterocyclic sulfinyl groups having 1 to 30 carbon atoms), ureido groups (preferably ureido groups having 1 to 30 carbon atoms), hydroxy groups, nitro groups, carboxy groups, sulfo groups, Examples of such groups include a phosphate group, a carboxylic acid amide group, a sulfonamide group, an imide group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heterocyclic azo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, an imino group, an ethylenically unsaturated bond-containing group (such as a vinyl group, an allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, or a (meth)acryloylamide group), an epoxy group, an oxetanyl group, or an alkoxysilyl group. When these groups are further substitutable, they may further have a substituent.

[0033] In addition, in formula (SQ), the cation exists in a delocalized state as shown below. [ka]

[0034] The compound represented by formula (SQ) is preferably a compound represented by any one of formulas (SQ1) to (SQ-5).

[0035] [ka]

[0036] In formula (SQ1), X 1 and X 2 each independently represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR X1 - represents R 1 ~R14 , and R X1 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a15 each independently represents an alkyl group, an aryl group, or a heterocyclic group.

[0037] R 1 ~R 14 and R X1 Examples of the halogen atom represented by include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

[0038] R 1 ~R 14 , R X1 , R a11 ~R a15 The number of carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and is preferably linear or branched. The alkyl group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and the substituent is preferably at least one selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group. The alkyl group is preferably a halogen-substituted alkyl group, or is preferably a fluoroalkyl group.

[0039] R 1 ~R 14 , R X1 , R a11 ~R a15The number of carbon atoms in the aryl group represented by is preferably 6 to 48, more preferably 6 to 22, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and the substituent is preferably at least one selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group.

[0040] R 1 ~R 14 , R X1 , R a11 ~R a15 The heterocyclic group represented by is preferably a 5- or 6-membered heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 4 fused rings, and even more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 or 3 fused rings. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and even more preferably 1 to 12. The heterocyclic group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and it is preferably at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group.

[0041] R 1 ~R 14 and R X1 The number of carbon atoms in the alkoxy group represented by is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkoxy group is preferably linear or branched. The alkoxy group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and the substituent is preferably at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group.

[0042] R 1 ~R 14 , R X1 , R a11 and R a12 The number of carbon atoms in the acyl group represented by is preferably 2 to 30, more preferably 2 to 15, and even more preferably 2 to 8. Examples of the acyl group include a formyl group, an alkylcarbonyl group, and an arylcarbonyl group. The number of carbon atoms in the alkylcarbonyl group is preferably 2 to 30, more preferably 2 to 15, and even more preferably 2 to 8. The number of carbon atoms in the arylcarbonyl group is preferably 7 to 30, more preferably 7 to 20, and even more preferably 7 to 12. The acyl group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and it is preferably at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group.

[0043] R 1 ~R 14 and R X1 The number of carbon atoms in the alkoxycarbonyl group represented by is preferably 2 to 30, more preferably 2 to 15, and even more preferably 2 to 8. The alkoxycarbonyl group may have a substituent. Examples of the substituent include the above-mentioned substituent T, and the substituent is preferably at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, and an amino group.

[0044] X in equation (SQ1) 1 and X 2 each independently represents an oxygen atom, a sulfur atom, or -NR X1 - is preferred. X1 is preferably a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and more preferably a hydrogen atom or an alkyl group.

[0045] R in equation (SQ1) 1 and R 2are each independently preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0046] R in equation (SQ1) 3 ~R 14 are each independently a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, or -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 is preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, or —NR a11 R a12 It is more preferable that:

[0047] [ka]

[0048] In formula (SQ2), X 3 and X 4 each independently represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR X2 - represents R 21 ~R 34 , and R X2 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a15 each independently represents an alkyl group, an aryl group, or a heterocyclic group.

[0049] The halogen atom, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, and alkoxycarbonyl group have the same meanings as those explained in formula (SQ1).

[0050] X in equation (SQ2) 3 and X 4 each independently represents an oxygen atom, a sulfur atom, or -NR X2 - is preferred. X2 is preferably a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and more preferably a hydrogen atom or an alkyl group.

[0051] R in equation (SQ2) 21 and R 22 are each independently preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0052] R in equation (SQ1) 23 ~R 34 are each independently a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, or -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 is preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, or —NR a11 R a12 It is more preferable that:

[0053] [ka]

[0054] In formula (SQ3), R 41 ~R 44are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a15 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 45 ~R 48 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR b11 R b12 , -NHCOR b13 , -NHSO2R b14 , -NHCSNHR b15 , -SR b16 , -SO2R b17 , or -OSO2R b18 represents R b11 and R b12 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; R b13 ~R b18 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 51 ~R 54 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; R 51 and R 52 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 51 and R 41may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 52 and R 42 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 53 and R 54 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 53 and R 43 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 54 and R 44 may be linked to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom; However, R 51 and R 52 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, or R 51 and R 41 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, or R 52 and R 42 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, and, R 53 and R 54 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, or R 53 and R 43 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, or R 54 and R 44 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom.

[0055] The halogen atom, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, and alkoxycarbonyl group have the same meanings as those explained in formula (SQ1).

[0056] R in equation (SQ3) 45 and R 46 One of them is -NHCOR b13 or -NHSO2R b14 Preferably, -NHCOR b13 It is more preferable that R 45 and R 46 The other is preferably a hydrogen atom. R 47 and R 48 One of them is -NHCOR b13 or -NHSO2R b14 Preferably, -NHCOR b13 It is more preferable that R 47 and R 48 The other is preferably a hydrogen atom. Above R b13 and R b14 Preferably, each R is independently an alkyl group. b13 and R b14 The alkyl group represented by R is preferably a halogen-substituted alkyl group, and is also preferably a fluoroalkyl group. b13 and R b14 The alkyl group represented by is also preferably a branched or cyclic alkyl group.

[0057] In equation (SQ3), R 51 and R 41 are bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, and R 53 and R 43 are preferably bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, and R 51 and R 41 are bonded to form a 5-membered heterocyclic ring containing at least one nitrogen atom, and R 53 and R 43 are more preferably bonded to form a five-membered heterocycle containing at least one nitrogen atom.

[0058] [ka]

[0059] In formula (SQ4), R 215 ~R 218 , R 220 ~R 224 , each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -NHCOR a13 , -NHSO2R a14 , -NHCSNHR a15 , -SR a16 , -SO2R a17 , or -OSO2R a18 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a18 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 213 , R 214 and R 219 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; R 213 and R 214 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 217 and R 218 may be linked to form a 5- or 6-membered aromatic or heterocyclic ring.

[0060] [ka]

[0061] In equation (SQ5), R 229 ~R 232are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -NHCOR a13 , -NHSO2R a14 , -NHCSNHR a15 , -SR a16 , -SO2R a17 , or -OSO2R a18 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a18 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 225 ~R 228 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; R 225 and R 226 may be bonded to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom, R 227 and R 228 may be linked to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom.

[0062] The compound represented by formula (SQ3) may be a compound represented by formula (SQ3a). [ka]

[0063] In formula (SQ3a), R 61 ~R 64 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR b11 R b12 , -NHCORb13 , -NHSO2R b14 , -NHCSNHR b15 , -SR b16 , -SO2R b17 , or -OSO2R b18 represents R b11 and R b12 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; R b13 ~R b18 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 65 ~R 76 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 R a12 , -SR a13 , -SO2R a14 , or -OSO2R a15 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a15 each independently represents an alkyl group, an aryl group, or a heterocyclic group.

[0064] The halogen atom, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, and alkoxycarbonyl group have the same meanings as those explained in formula (SQ1).

[0065] R in equation (SQ3a) 61 and R 62 One of them is -NHCOR b13 or -NHSO2R b14 Preferably, -NHCOR b13 It is more preferable that R 61 and R 62 The other is preferably a hydrogen atom. R 63 and R 64One of them is -NHCOR b13 or -NHSO2R b14 Preferably, -NHCOR b13 It is more preferable that R 63 and R 64 The other is preferably a hydrogen atom. Above R b13 and R b14 Preferably, each R is independently an alkyl group. b13 and R b14 The alkyl group represented by R is preferably a halogen-substituted alkyl group, and is also preferably a fluoroalkyl group. b13 and R b14 The alkyl group represented by is also preferably a branched or cyclic alkyl group.

[0066] R in equation (SQ3a) 65 and R 66 is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0067] R in equation (SQ3a) 67 ~R 76 are each independently preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group, more preferably a hydrogen atom or an alkyl group.

[0068] The compound represented by formula (SQ3) may be a compound represented by formula (SQ3b). [ka]

[0069] In formula (SQ3b), R 241 ~R 248 , R 237 ~R 240 are each independently a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR a11 Ra12 , -NHCOR a13 , -NHSO2R a14 , -NHCSNHR a15 , -SR a16 , -SO2R a17 , or -OSO2R a18 represents R a11 and R a12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or an acyl group; R a13 ~R a18 each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 233 ~R 236 each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0070] Examples of dye multimers used as the polymethine dye a1 include a dye multimer having a repeating unit represented by formula (A) (hereinafter also referred to as dye multimer (A)), a dye multimer having a repeating unit represented by formula (B) (hereinafter also referred to as dye multimer (B)), a dye multimer having a repeating unit represented by formula (C) (hereinafter also referred to as dye multimer (C)), and a dye multimer represented by formula (D) (hereinafter also referred to as dye multimer (D)), and dye multimer (A) or dye multimer (D) is preferred.

[0071] (Dye multimer (A)) The dye multimer (A) contains a repeating unit represented by formula (A). The proportion of the repeating unit represented by formula (A) is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 50% by mass or more, of all repeating units constituting the dye multimer (A). The upper limit can be set to 100% by mass or less, or can be set to 95% by mass or less. [ka] In formula (A), X 1 represents a trivalent linking group, L 1 represents a single bond or a divalent linking group, DyeI represents the structure of a polymethine dye.

[0072] X in formula (A) 1 Examples of the trivalent linking group represented by include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, a polystyrene linking group, a bisphenol linking group, and a novolac linking group, and a poly(meth)acrylic linking group is preferred.

[0073] L in formula (A) 1 Examples of the divalent linking group represented by include an alkylene group, an arylene group, a heterocyclic group, -CH=CH-, -O-, -S-, -CO-, -COO-, -NR-, -CONR-, -OCO-, -SO-, -SO2-, and linking groups formed by linking two or more of these. R represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0074] The number of carbon atoms in the alkylene group is preferably 1 to 30. The upper limit is more preferably 25 or less, and even more preferably 20 or less. The lower limit is more preferably 2 or more, and even more preferably 3 or more. The alkylene group may be linear, branched, or cyclic. The alkylene group may have a substituent or may be unsubstituted. The number of carbon atoms in the arylene group is preferably 6 to 20, more preferably 6 to 12. The arylene group may have a substituent or may be unsubstituted. The heterocyclic group is preferably a 5- or 6-membered ring. The heteroatoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent or may be unsubstituted.

[0075] The polymethine dye structure represented by DyeI in formula (A) is preferably a squarylium dye structure, and more preferably a residue in which one hydrogen atom has been removed from the compound represented by formula (SQ) above.

[0076] The dye multimer (A) may contain other repeating units in addition to the repeating unit represented by formula (A). Examples of the other repeating units include repeating units having a crosslinkable group and repeating units having an acid group. Examples of the crosslinkable group include the crosslinkable groups described above. Examples of the acid group include a carboxy group, a sulfo group, and a phosphate group.

[0077] The proportion of repeating units having a crosslinkable group is preferably 50% by mass or less of all repeating units constituting the dye multimer (A). The lower limit is preferably 1% by mass or more, more preferably 3% by mass or more. The upper limit is preferably 35% by mass or less, more preferably 30% by mass or less.

[0078] The proportion of repeating units having an acid group is preferably 50% by mass or less of all repeating units constituting the dye multimer (A). The lower limit is preferably 1% by mass or more, more preferably 3% by mass or more. The upper limit is preferably 35% by mass or less, more preferably 30% by mass or less.

[0079] (Dye multimer (B)) The dye multimer (B) contains a repeating unit represented by formula (B). The proportion of the repeating unit represented by formula (B) is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 50% by mass or more, of all repeating units constituting the dye multimer (B). The upper limit can be set to 100% by mass or less, or can be set to 95% by mass or less. [ka] In formula (B), X 2 represents a trivalent linking group, L 2 represents a single bond or a divalent linking group, Dye II is Y 2 represents a polymethine dye structure having an ionic bond or a group capable of bonding with Y 2 represents a group capable of forming an ionic or coordinate bond with Dye II.

[0080] X in formula (B) 2 is X in formula (A). 1 The same applies to the preferred range.

[0081] L in formula (B) 2 Examples of the divalent linking group represented by include an alkylene group, an arylene group, a heterocyclic group, -CH=CH-, -O-, -S-, -CO-, -COO-, -NR-, -CONR-, -OCO-, -SO-, -SO2-, and linking groups formed by linking two or more of these. R represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0082] Y in formula (B) 2 Examples of the group represented by the formula (I) that can form an ionic bond or a coordinate bond with Dye II include an anionic group and a cationic group.

[0083] The anionic group is -SO3 - , -COO - , -PO4H - , a group containing an anionic structure containing a boron atom, a group containing a bis(sulfonyl)imide anionic structure, and a group containing a tris(sulfonyl)methide anionic structure.

[0084] The cationic group includes substituted or unsubstituted onium cations (e.g., ammonium, pyridinium, imidazolium, and phosphonium), and the ammonium cation is particularly preferred. The ammonium cation is -N(R)3 + Each R independently represents a hydrogen atom or an alkyl group, and at least one R represents an alkyl group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms. The alkyl group may be linear, branched, or cyclic, but is preferably linear.

[0085] Dye II in formula (B) is Y 2 represents a polymethine dye structure having an ionic bond or a group capable of bonding with Y. 2Examples of the group that can form an ionic bond or bond with the ionic group include anionic groups and cationic groups. Specific examples of the anionic group and cationic group include the groups described above.

[0086] The polymethine dye structure represented by Dye II in formula (B) is preferably a squarylium dye structure, and is a structure represented by the above formula (SQ), which has Y as a substituent. 2 It is preferable that the structure has a group capable of forming an ionic bond or a coordinate bond with the

[0087] The dye multimer (B) may contain, in addition to the repeating unit represented by formula (B), other repeating units as described for the dye multimer (A), etc. Furthermore, the dye multimer (B) may further contain the repeating unit represented by formula (A) described above and the repeating unit represented by formula (C) described below.

[0088] (Dye polymer (C)) The dye multimer (C) contains a repeating unit represented by formula (C). The proportion of the repeating unit represented by formula (C) is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and particularly preferably 50% by mass or more, of all repeating units constituting the dye multimer (C). The upper limit can be set to 100% by mass or less, or can be set to 95% by mass or less. [ka] In formula (C), L 3 represents a single bond or a divalent linking group, Dye III represents a polymethine dye structure, m represents 0 or 1.

[0089] L in formula (C) 3Examples of the divalent linking group represented by include an alkylene group, an arylene group, a heterocyclic group, -CH=CH-, -O-, -S-, -CO-, -COO-, -NR-, -CONR-, -OCO-, -SO-, -SO2-, and linking groups formed by linking two or more of these. Each R independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0090] The number of carbon atoms in the alkylene group is preferably 1 to 30. The upper limit is more preferably 25 or less, and even more preferably 20 or less. The lower limit is more preferably 2 or more, and even more preferably 3 or more. The alkylene group may be linear, branched, or cyclic. The alkylene group may have a substituent or may be unsubstituted. The number of carbon atoms in the arylene group is preferably 6 to 20, more preferably 6 to 12. The arylene group may have a substituent or may be unsubstituted. The heterocyclic group is preferably a 5- or 6-membered ring. The heteroatoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent or may be unsubstituted.

[0091] The polymethine dye structure represented by DyeIII in formula (C) is preferably a squarylium dye structure, and more preferably a residue obtained by removing two hydrogen atoms from the compound represented by formula (SQ) above.

[0092] In formula (C), m represents 0 or 1, with 1 being preferred.

[0093] The dye multimer (C) may contain, in addition to the repeating unit represented by formula (C), other repeating units as explained in connection with the dye multimer (A).

[0094] (Dye multimer (D)) The dye multimer (D) is a compound represented by formula (D). [ka] In formula (D), L4 represents a (n+k)-valent linking group, n represents an integer of 2 to 20; k represents an integer from 0 to 20, Dye IV represents a polymethine dye structure, P 4 represents a substituent, The n Dye IVs may be different from each other, If k is 2 or more, multiple P 4 may be different from each other, n+k represents an integer of 2 to 20.

[0095] In formula (D), n is preferably 2 to 14, more preferably 2 to 8, particularly preferably 2 to 7, and even more preferably 2 to 6. In formula (D), k is preferably 0 to 13. The lower limit can be 1 or more, or can be 2 or more. The upper limit is preferably 10 or less, more preferably 8 or less, even more preferably 7 or less, and still more preferably 6 or less.

[0096] L in formula (D) 4 Examples of the (n+k)-valent linking group represented by include groups consisting of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms. The (n+k)-valent linking group is preferably the following structural unit or a group composed of two or more of the following structural units combined together (which may form a ring structure). In the following formulae, * represents a bond. [ka]

[0097] L 4 The (n+k)-valent linking group represented by is preferably a linking group derived from a polyfunctional thiol, a linking group derived from a polyfunctional alcohol, or a linking group derived from an acid anhydride, and more preferably a linking group derived from a polyfunctional thiol.

[0098] L4 The (n+k)-valent linking group represented by is preferably a group represented by any one of formulas (Za-1) to (Za-5). [ka] In formula (Za-1), La 2 represents a divalent group, and Ta 2 represents a single bond or a divalent linking group, and two Ta 2 may be the same or different from each other. In formula (Za-2), La 3 represents a trivalent group, and Ta 3 represents a single bond or a divalent linking group, and three Ta 3 may be the same or different from each other. In formula (Za-3), La 4 represents a tetravalent group, and Ta 4 represents a single bond or a divalent linking group, and there are four Ta 4 may be the same or different from each other. In formula (Za-4), La 5 represents a pentavalent group, and Ta 5 represents a single bond or a divalent linking group, and there are five Ta 5 may be the same or different from each other. In formula (Za-5), La 6 represents a hexavalent group, and Ta 6 represents a single bond or a divalent linking group, and there are six Ta 6 may be the same or different from each other. In the above formula, * represents a bond.

[0099] La 2 , Ta 2 ~Ta 6 Examples of the divalent linking group represented by include an alkylene group, an arylene group, a heterocyclic group, -CH=CH-, -O-, -S-, -CO-, -COO-, -NR-, -CONR-, -OCO-, -SO-, -SO2-, and linking groups formed by linking two or more of these. Each R independently represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group.

[0100] The number of carbon atoms in the alkyl group and alkylene group is preferably 1 to 30. The upper limit is more preferably 25 or less, and even more preferably 20 or less. The lower limit is more preferably 2 or more, and even more preferably 3 or more. The alkyl group and alkylene group may be linear, branched, or cyclic. The aryl group and arylene group preferably have 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. The heterocyclic group is preferably a 5- or 6-membered ring. The heteroatoms constituting the ring of the heterocyclic group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The alkylene group, arylene group, heterocyclic group, alkyl group and aryl group may be unsubstituted or may have a substituent.

[0101] La 3 Examples of the trivalent group represented by include groups in which one hydrogen atom has been removed from the divalent linking group described above. 4 Examples of the tetravalent group represented by include groups in which two hydrogen atoms have been removed from the above divalent linking groups. 5 Examples of the pentavalent group represented by include groups in which three hydrogen atoms have been removed from the divalent linking group described above. 6 Examples of the hexavalent group represented by include groups in which four hydrogen atoms have been removed from the divalent linking group described above. 3 ~La 6 The trivalent to hexavalent group represented by may have the above-mentioned substituent.

[0102] Specific examples of the (n+k)-valent linking group include the linking groups described in paragraphs 0071 to 0072 of JP 2008-222950 A, the linking groups described in paragraph 0176 of JP 2013-029760 A, and the linking groups described in paragraphs 0022 to 0024 of WO 2016 / 031442 A.

[0103] The polymethine dye structure represented by Dye IV in formula (D) is preferably a squarylium dye structure, and more preferably a residue in which one hydrogen atom has been removed from the compound represented by formula (SQ) above.

[0104] P in formula (D) 4 Examples of the substituent represented by include the groups listed above as the substituent T, an acid group, a crosslinkable group, etc. 4 The substituent represented by may be a monovalent polymer chain having a repeating unit. The monovalent polymer chain having a repeating unit is preferably a monovalent polymer chain having a repeating unit derived from a vinyl compound. When k is 2 or more, k P 4 may be the same or different.

[0105] P 4 is a monovalent polymer chain with repeating units, P 4 Examples of the repeating units constituting the dye multimer (A) include the other repeating units explained in the description of the above-mentioned embodiments of the dye multimer (A). The other repeating units are preferably at least one selected from the above-mentioned repeating units having an acid group and repeating units having a crosslinkable group.

[0106] Specific examples of polymethine dye a1 include compounds B-1 to B-22 described in the examples below, and the compounds described in paragraphs 0042 to 0045 of JP 2021-039369 A.

[0107] -About Shell- The specific inclusion compound has a cyclic amide compound a2 as a shell. The cyclic amide compound refers to a compound having at least one amide bond in the ring portion, and forming a ring by bonding the amide bond to at least one group selected from a divalent aromatic hydrocarbon group, a divalent aromatic heterocyclic group, and a divalent aliphatic hydrocarbon group. The number of amide bonds contained in the ring portion is preferably two or more, more preferably three or more. The upper limit is preferably six or less, more preferably five or less.

[0108] The cyclic amide compound a2 preferably contains a divalent aromatic hydrocarbon group such as a phenylene group or a divalent aromatic heterocyclic group such as a pyridinyl group in the ring portion.

[0109] The cyclic amide compound a2 is preferably a compound represented by formula (20). [ka]

[0110] In formula (20), L b1 and L b2 each independently represents a single bond or a divalent linking group, A 21 and A 22 each independently represents a divalent linking group, n20 represents an integer of 1 to 10.

[0111] L in equation (20) b1 and L b2 are each independently a single bond or a divalent linking group, and are preferably divalent linking groups. The divalent linking group is preferably an alkylene group. The alkylene group preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, even more preferably 1 to 3 carbon atoms, still more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

[0112] A in equation (20) 21 The divalent linking group represented by is A in the compound represented by formula (1) described below. 1 The same applies to preferred embodiments.

[0113] A in equation (20) 22 The divalent linking group represented by is A in the compound represented by formula (1) described below. 2 The same applies to preferred embodiments.

[0114] In the formula (20), n20 represents an integer of 1 to 10, preferably an integer of 2 to 10, more preferably an integer of 2 to 4, and even more preferably 2.

[0115] The cyclic amide compound a2 is preferably a compound represented by any one of formulas (21) to (23). [ka]

[0116] In the formula, R 101 ~R 114 , R 121 ~R 134 , R 141 ~R 152 each independently represents a hydrogen atom or a substituent, R 101 ~R 114 two adjacent groups may be bonded to form a ring; R 121 ~R 134 two adjacent groups may be bonded to form a ring; R 141 ~R 152 Two adjacent groups among these may be bonded to form a ring.

[0117] R 101 ~R 114 , R 121 ~R 134 , R 141 ~R 152 Examples of the substituent represented by include the groups exemplified for the substituent T described above, and are preferably a halogen atom, an alkyl group, an alkoxy group, an ethylenically unsaturated bond-containing group (such as a vinyl group, an allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, or a (meth)acryloylamide group), an epoxy group, an oxetanyl group, or an alkoxysilyl group.

[0118] Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include the substituent T described above. The number of carbon atoms in the alkoxy group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkoxy group may be either linear or branched. The alkoxy group may have a substituent. Examples of the substituent include the substituent T described above.

[0119] R 101 ~R 114 , R 121 ~R 134 , R 141 ~R 152 The substituent represented by is also preferably a group containing an ethylenically unsaturated bond, an epoxy group, an oxetanyl group or an alkoxysilyl group.

[0120] R in equation (21) 101 ~R 114 Two adjacent groups among these may be bonded to form a ring. R in equation (22) 121 ~R 134 Two adjacent groups among these may be bonded to form a ring. R in equation (23) 141 ~R 152 Two adjacent groups among these may be bonded to form a ring. The ring formed above may be a hydrocarbon ring or a heterocycle. The hydrocarbon ring and heterocycle may be an aromatic ring or a non-aromatic ring. The hydrocarbon ring and heterocycle may be a monocycle or a fused ring. The ring formed is preferably a 5- or 6-membered hydrocarbon ring or heterocycle, more preferably a 5- or 6-membered hydrocarbon ring, and even more preferably a 6-membered hydrocarbon ring.

[0121] Specific examples of the cyclic amide compound a2 include cyclic amide compounds C-1 to C-7 in the examples described below.

[0122] -About specific inclusion compounds- The specific inclusion compound may be a pigment or a dye.

[0123] The maximum absorption wavelength of the specific inclusion compound is preferably in the wavelength range of 400 to 1800 nm, more preferably in the wavelength range of 500 to 1600 nm, and even more preferably in the wavelength range of 550 to 1500 nm.

[0124] The specific inclusion compound is preferably a chromatic colorant or an infrared absorbing colorant, and more preferably a green colorant or an infrared absorbing colorant.

[0125] Specific examples of the specific inclusion compounds include inclusion compounds A-1 to A-19 described in the Examples below.

[0126] (Other colorants) The curable composition of the present invention may further include colorants other than the specific clathrate compounds described above. Examples of other colorants include chromatic colorants, black colorants, and infrared absorbing colorants.

[0127] The other coloring material may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment.

[0128] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from a photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles that are not aggregated.

[0129] The crystallite size of the pigment is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the half-width of the diffraction angle peak using an X-ray diffractometer and calculated using the Scherrer equation. The crystallite size of the pigment can be adjusted by known methods such as adjusting the production conditions or pulverizing the pigment after production.

[0130] The specific surface area of ​​pigments is 1 to 300 m 2 / g. The lower limit is 10m 2 / g or more is preferable, and 30m 2 / g or more is more preferable. The upper limit is 250m 2 / g or less, and 2 / g or less. The specific surface area value can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0131] -Chromatic color materials- Examples of chromatic colorants include colorants having a maximum absorption wavelength in the wavelength range of 400 to 700 nm, such as green colorants, red colorants, yellow colorants, purple colorants, blue colorants, and orange colorants.

[0132] Examples of red colorants include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, and thioindigo compounds, and are preferably diketopyrrolopyrrole compounds, anthraquinone compounds, and azo compounds, and more preferably diketopyrrolopyrrole compounds.Furthermore, the red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0133] Specific examples of red colorants include CI (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, Examples of red pigments include 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, and 297. In addition, as a red colorant, the compound described in paragraph 0034 of WO 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

[0134] As the red colorant, CI Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, CI Pigment Red 254, 264, and 272 are more preferred, and CI Pigment Red 254 and 264 are even more preferred.

[0135] Examples of green coloring materials include phthalocyanine compounds and squarylium compounds, and the phthalocyanine compounds are preferred. The green coloring material is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0136] Specific examples of green colorants include green pigments such as CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Furthermore, halogenated zinc phthalocyanine pigments having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used as green colorants. Specific examples include compounds described in International Publication No. 2015 / 118720. Furthermore, compounds described in paragraph 0029 of International Publication No. 2022 / 085485, aluminum phthalocyanine compounds described in JP-A-2020-070426, and diarylmethane compounds described in JP-A-2020-504758 can also be used as green colorants.

[0137] As the green colorant, CI Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0138] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. The orange colorant is preferably a pigment (orange pigment). Specific examples of orange colorants include CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0139] Examples of the yellow colorant include an azo compound, an azomethine compound, an isoindoline compound, a pteridine compound, a quinophthalone compound, and a perylene compound. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of yellow colorants include CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, and 120. , 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236 and the like.

[0140] As the yellow coloring material, an azobarbituric acid nickel complex having the following structure can also be used. [ka]

[0141] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

[0142] Examples of purple colorants include oxazine compounds, quinacridone compounds, perylene compounds, and indigo compounds, with oxazine compounds being preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of purple colorants include CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0143] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0144] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. The dye is preferably a xanthene dye.

[0145] A dye multimer can also be used as a chromatic colorant. The dye multimer is preferably a dye dissolved in a solvent before use. The dye multimer may also form particles. When the dye multimer is in the form of particles, it is usually used in a state dispersed in a solvent. A particulate dye multimer can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and production methods described in JP-A No. 2015-214682 include the compounds and production methods described in JP-A No. 2015-214682. The dye multimer has two or more dye structures in one molecule, preferably three or more dye structures. The upper limit is not particularly limited, but can be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight-average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. The lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A Nos. 2011-213925, 2013-041097, 2015-028144, 2015-030742, WO 2016 / 031442, etc. can also be used.

[0146] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Application Laid-Open No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2020-160279, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069442, compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730, and compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730. Compounds represented by formula 1 described in Korean Patent Publication No. 2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176, phenothiazine compounds described in Japanese Patent Application Laid-Open No. 2021-187913, halogenated zinc phthalocyanines described in International Publication No. 2022 / 004261, and Halide zinc phthalocyanine described in Korean Patent Publication No. 2021 / 250883, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dye described in Korean Patent Publication No. 10-2020-0061793, chromatic colorant described in JP 2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP 2020-090676 A, compounds described in JP 2020-055956 A, compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in U.S. Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP 2018-178039 A,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described on pages 80 to 84 of the Journal of the Japan Color Materials Association (published in 2022), compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2014 / 014906 Compounds described in JP-A-2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP-A-2020-180176, compounds described in JP-A-2023-013209, compounds described in JP-A-2023-013166, xanthene compounds described in WO 2023 / 286526, compounds described in JP-A-2021-155746, compounds described in JP-A-2021-155747, JP-A- Compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018 / 051876, compounds described in JP-A-2020-083981, compounds described in JP-A-2023-056463, compounds described in JP-T-2023-515473, dioxane compounds described in JP-T-2022-549530, pigment preparations described in JP-A-2022-061494, diketopyrrolopyrrole pigments described in JP-A-2023-057917, Diketopyrrolopyrrole compounds described in JP-A-2023-519314, phthalocyanines described in JP-A-2023-080419, quinophthalones described in JP-A-2023-103177, phthalocyanine compounds described in JP-A-2023-103177, isoindoline compounds described in JP-A-2020-026521, squarylium compounds described in Korean Patent Publication No. 10-2023-0043000, squarylium compounds described in Korean Patent Publication No. 10-2023-0050069, diketopyrrolopyrrole compounds described in JP-A-2023-127878,Triarylmethane compounds described in JP 2023-150459 A, triarylmethane compounds described in JP 2023-149735 A, core-shell dyes described in JP 2023-123349 A, xanthene compounds described in JP 2023-543717 A, compounds described in Chinese Patent Application Publication No. 116102441 A, compounds described in JP 2023-150459 A, compounds described in JP 2023-167345 A, Korean Patent Publication Compounds described in Japanese Patent No. 10-2023-0061078, compounds described in Japanese Patent Application Publication No. 2020-183509, colorants described in Japanese Patent Application Publication No. 2020-079395, compounds represented by formula (1) described in US Patent Application Publication No. 2022 / 0119643, dyes described in Japanese Patent Application Publication No. 2023-048989, compounds described in Japanese Patent Application Publication No. 2024-014738, pigments described in Chinese Patent Application Publication No. 115873417, etc. can also be used. The chromatic colorant may also be a rotaxane. The dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

[0147] Two or more chromatic colorants may be used in combination. When two or more chromatic colorants are used in combination, the combination of two or more chromatic colorants may form a black color. Examples of such combinations include the following embodiments (1) to (7). When the curable composition contains two or more chromatic colorants and exhibits black color through the combination of two or more chromatic colorants, the curable composition can be preferably used as a curable composition for forming an infrared transmission filter. (1) An embodiment containing a red coloring material and a blue coloring material. (2) An embodiment containing a red coloring material, a blue coloring material, and a yellow coloring material. (3) An embodiment containing a red coloring material, a blue coloring material, a yellow coloring material, and a purple coloring material. (4) An embodiment containing a red color material, a blue color material, a yellow color material, a purple color material, and a green color material. (5) An embodiment containing a red coloring material, a blue coloring material, a yellow coloring material, and a green coloring material. (6) An embodiment containing a red coloring material, a blue coloring material, and a green coloring material. (7) An embodiment containing a yellow coloring material and a purple coloring material.

[0148] -Black color material- The black coloring material is not particularly limited, and known materials can be used. The black coloring material may be an inorganic black coloring material or an organic black coloring material. The black coloring material is preferably a pigment. In this specification, the black coloring material means a coloring material that exhibits absorption over the entire wavelength range of 400 to 700 nm.

[0149] Examples of inorganic black colorants include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. Titanium black can be the titanium black described in paragraph 0044 of International Publication No. 2022 / 085485. Zirconium nitride powder described in JP-A-2023-048173 can also be used as the inorganic black colorant.

[0150] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. The organic black colorant may be a compound described in paragraph 0166 of International Publication No. 2022 / 065215. Furthermore, perylene black (such as Lumogen Black FK4280) described in paragraphs 0016 to 0020 of JP-A-2017-226821, or a black azo pigment described in JP-A-2022-121935 may also be used.

[0151] The black coloring material may be any of those described in pages 294 to 307 of the Journal of the Color Materials Association, Vol. 96, No. 9, 2023.

[0152] -Infrared absorbing colorant- Examples of infrared absorbing colorants include pyrrolopyrrole compounds, squarylium compounds, croconium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds, naphthalocyanine compounds, iminium compounds, quaterylene compounds, aminium compounds, azo compounds, anthraquinone compounds, porphyrin compounds, oxonol compounds and hexaphyrin compounds, and are preferably at least one selected from pyrrolopyrrole compounds, squarylium compounds, polymethine compounds, indigo compounds, phthalocyanine compounds and naphthalocyanine compounds. Specific examples of these include the compounds described in paragraph 0114 of WO 2022 / 065215. Other examples of the infrared absorber include the compounds described in paragraph 0121 of WO 2022 / 065215, the compounds described in Table 1 of U.S. Pat. No. 11,261,172, the compounds described in paragraphs 0188 to 0192 of WO 2022 / 181422, the squarylium compounds described in JP 2020-075959 A, and the compounds described in Korean Patent Publication No. 10-2019-01 Copper complexes described in JP-A-35217, croconic acid compounds described in JP-A-2021-195515, infrared absorbing dyes described in JP-A-2022-022070, croconium compounds described in WO 2019 / 021767, compounds described in JP-A-2019-127549, compounds described in WO 2022 / 059619, and JP-A-2022-151682 the squarylium compounds described in JP 2022-188858 A, the squarylium compounds described in JP 2022-184710 A, the squarylium compounds described in JP 2022-189736 A, the squarylium compounds described in JP 2023-004570 A, the squarylium compounds described in WO 2019 / 230660, the squarylium compounds described in WO 2020 / 218615 compounds described above, diiminium compounds described in JP 2023-068643 A, squarylium compounds described in JP 2023-052770 A, phthalocyanine compounds described in Korean Patent Publication No. 10-2022-0163680 A, indigo monoboron complexes described in JP 2023-073064 A, phthalocyanine compounds described in JP 2023-066025 A,Phthalocyanine compounds described in JP 2020-041127 A, indigo compounds described in JP 2023-073064 A, indigo compounds described in Korean Patent Publication No. 10-2023-0016355 A, squarylium compounds described in WO 2019 / 230570 A, diiminium compounds described in JP 2023-095824 A, compounds described in JP 2023-159964 A, compounds described in JP 2023-176615 A, compounds described in JP 2024-500537 A Compounds described in Japanese Patent Laid-Open No. 2024-019936, phthalocyanine compounds described in Korean Patent Registration No. 10-2575190, polymethine compounds described in Japanese Patent Laid-Open No. 2024-017061, boron derivatives described in Chinese Patent Publication No. 116715690, phthalocyanine compounds described in Japanese Patent Laid-Open No. 2024-020454, compounds described in Chinese Patent Publication No. 116891482, and compounds described in Japanese Patent Publication No. 2024-511242 can also be used.

[0153] The content of the specific inclusion compound in the total solid content of the curable composition is preferably 0.1 to 85% by mass. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less. The lower limit is preferably 0.2% by mass or more, more preferably 0.3% by mass or more. Furthermore, because a thin film with excellent spectral properties can be formed, the content of the specific inclusion compound in the total solid content of the curable composition can be 1% by mass or more, 2% by mass or more, 3% by mass or more, or even 5% by mass or more. Only one type of specific inclusion compound may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0154] The content of the colorant in the total solid content of the curable composition is preferably 0.1 to 85% by mass. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less. The lower limit is preferably 0.2% by mass or more, more preferably 0.3% by mass or more. Furthermore, because a thin film having excellent spectral characteristics can be formed, the content of the colorant in the total solid content of the curable composition can be 1% by mass or more, 2% by mass or more, 3% by mass or more, or even 5% by mass or more. Only one type of colorant may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0155] The content of the specific inclusion compound in the colorant contained in the curable composition is preferably 1 to 100% by mass, more preferably 5 to 100% by mass, even more preferably 10 to 100% by mass, and particularly preferably 20 to 100% by mass.

[0156] <<Compound represented by formula (1)>> The curable composition of the present invention contains a compound represented by formula (1).

[0157] [ka]

[0158] In formula (1), L a1 and L a2 each independently represents a single bond or a divalent linking group, A 1 and A 2 each independently represents a divalent linking group, R 1 and R 2 each independently represents a hydrogen atom or a substituent, n1 represents an integer of 1 to 10.

[0159] L in equation (1) a1 and L a2are each independently a single bond or a divalent linking group, and are preferably divalent linking groups. The divalent linking group is preferably an alkylene group. The alkylene group preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, even more preferably 1 to 3 carbon atoms, still more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

[0160] A in equation (1) 1 The divalent linking group represented by is preferably a group represented by formula (A1-1) or formula (A1-2), and more preferably a group represented by formula (A1-1).

[0161] A in equation (1) 2 The divalent linking group represented by is preferably a group represented by any one of formulas (A2-1) to (A2-4), more preferably a group represented by any one of formulas (A2-1) to (A2-3), and even more preferably a group represented by formula (A2-1) or formula (A2-2).

[0162] [ka]

[0163] In the formula, the wavy line represents a bond. R 11 ~R 17 , R 21 ~R 26 , R 31 ~R 34 each independently represents a hydrogen atom or a substituent, R 11 and R 12 may be bonded to form a ring, R 13 and R 14 may be bonded to form a ring, R 15 and R 16 may be bonded to form a ring, R 16 and R 17 may be bonded to form a ring, R 21and R 22 may be bonded to form a ring, R 22 and R 23 may be bonded to form a ring, R 24 and R 25 may be bonded to form a ring, R 25 and R 26 may be bonded to form a ring, R 31 and R 32 may be bonded to form a ring, R 33 and R 34 may be bonded to form a ring.

[0164] R 11 ~R 17 , R 21 ~R 26 , R 31 ~R 34 Examples of the substituent represented by include the groups exemplified above for the substituent T, and it is preferably a group containing a halogen atom, an alkyl group, an alkoxy group or a crosslinkable group.

[0165] Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include the substituent T described above. The number of carbon atoms in the alkoxy group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkoxy group may be either linear or branched. The alkoxy group may have a substituent. Examples of the substituent include the substituent T described above.

[0166] Examples of the crosslinkable group include an ethylenically unsaturated bond-containing group (such as a vinyl group, an allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, or a (meth)acryloylamide group), an epoxy group, an oxetanyl group, or an alkoxysilyl group.

[0167] Examples of the group containing a crosslinkable group include a group represented by formula (T-101). -L t1 -R t1 ···(T-101) In formula (T-101), L t1 represents a single bond or a divalent linking group, and R t1 represents a crosslinkable group.

[0168] L t1 Examples of the divalent linking group represented by include an alkylene group, an arylene group, -O-, -S-, -CO-, -COO-, -OCO-, -SO2-, -NH-, -NHCO-, -CONH-, -NHCONH-, -NHCOO-, -OCONH-, and groups formed by combining two or more of these groups. R t1 Examples of the crosslinkable group represented by the formula (I) include an ethylenically unsaturated bond-containing group (such as a vinyl group, an allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, or a (meth)acryloylamide group), an epoxy group, an oxetanyl group, or an alkoxysilyl group.

[0169] R 11 and R 12 may be bonded to form a ring, R 13 and R 14 may be bonded to form a ring, R 15 and R 16 may be bonded to form a ring, R 16 and R 17 may be bonded to form a ring, R 21 and R 22 may be bonded to form a ring, R 22 and R 23may be bonded to form a ring, R 24 and R 25 may be bonded to form a ring, R 25 and R 26 may be bonded to form a ring, R 31 and R 32 may be bonded to form a ring, R 33 and R 34 may be bonded to form a ring. The ring formed above may be a hydrocarbon ring or a heterocycle. The hydrocarbon ring and heterocycle may be an aromatic ring or a non-aromatic ring. The hydrocarbon ring and heterocycle may be a monocycle or a fused ring. The ring formed is preferably a 5- or 6-membered hydrocarbon ring or heterocycle, more preferably a 5- or 6-membered hydrocarbon ring, and even more preferably a 6-membered hydrocarbon ring.

[0170] R in Equation (1) 1 and R 2 Examples of the substituent represented by include the groups listed above as the substituent T.

[0171] R 1 is preferably a hydrogen atom, an alkyl group or an acyl group. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. The acyl group is preferably an arylcarbonyl group or a heteroarylcarbonyl group. The number of carbon atoms in the acyl group is preferably 2 to 30, more preferably 2 to 20. The lower limit of the number of carbon atoms in the acyl group is preferably 6 or more, more preferably 7 or more. The arylcarbonyl group preferably has 7 to 30 carbon atoms, and more preferably 7 to 20 carbon atoms. The alkyl group and acyl group may further have a substituent. Examples of the further substituent include the groups exemplified above as the substituent T, and are preferably a carboxy group, an alkoxycarbonyl group, an ethylenically unsaturated bond-containing group, an epoxy group, an oxetanyl group, an alkoxysilyl group, or a group containing these functional groups.

[0172] R 2 is preferably a hydroxy group, an alkyl group, an alkoxy group or an alkylamino group. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. The number of carbon atoms in the alkoxy group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkoxy group may be either linear or branched. The alkoxy group may have a substituent. The alkylamino group is preferably a monoalkylamino group. The alkyl moiety in the alkylamino group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and even more preferably 1 to 8 carbon atoms. The alkyl group, alkoxy group, and alkylamino group may further have a substituent. Examples of the further substituent include the groups exemplified above as the substituent T, and are preferably an aryl group, a heterocyclic group, an ethylenically unsaturated bond-containing group, an epoxy group, an oxetanyl group, an alkoxysilyl group, or a group containing these functional groups.

[0173] In formula (1), n1 represents an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 6, and even more preferably an integer of 1 to 4.

[0174] The molecular weight of the compound represented by formula (1) is preferably 100 to 3,000, more preferably 150 to 2,000, and even more preferably 200 to 1,500.

[0175] Specific examples of the compound represented by formula (1) include amide compounds (a-1) to (a-11) described in the examples below.

[0176] The curable composition of the present invention may contain only one compound represented by formula (1), or may contain two or more compounds represented by formula (1). It is preferable to contain two or more compounds represented by formula (1) because this can more effectively suppress the occurrence of foreign matter defects.

[0177] The curable composition of the present invention preferably contains the compound represented by formula (1) in an amount of 1 to 50,000 ppm by mass relative to the specific inclusion compound described above, and more preferably 150 to 40,000 ppm by mass, because this more effectively suppresses the occurrence of foreign matter defects. When two or more types of compounds represented by formula (1) are contained, the total amount thereof is preferably within the above range.

[0178] <<Compound represented by formula (2)>> The curable composition of the present invention preferably further contains a compound represented by formula (2) in addition to the specific inclusion compound described above. This embodiment can more effectively suppress the occurrence of foreign matter defects. Note that the compound represented by formula (2) is a compound different from the specific inclusion compound described above and does not encapsulate a polymethine dye.

[0179] [ka]

[0180] In formula (2), L a3 and L a4 each independently represents a single bond or a divalent linking group, A 3 and A 4 each independently represents a divalent linking group, n2 represents an integer of 1 to 10.

[0181] L in equation (2) a3 and L a4are each independently a single bond or a divalent linking group, and are preferably divalent linking groups. The divalent linking group is preferably an alkylene group. The alkylene group preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, even more preferably 1 to 3 carbon atoms, still more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom.

[0182] A in equation (2) 3 The divalent linking group represented by is A in the compound represented by the above formula (1). 1 The same applies to preferred embodiments.

[0183] A in equation (2) 4 The divalent linking group represented by is A in the compound represented by the above formula (1). 2 The same applies to preferred embodiments.

[0184] In formula (2), n20 represents an integer of 1 to 10, preferably an integer of 2 to 10, and more preferably an integer of 2 to 4.

[0185] Specific examples of the compound represented by formula (2) include amide compounds (b-1) to (b-14) described in the examples below.

[0186] The curable composition of the present invention may contain only one compound represented by formula (2), or may contain two or more compounds represented by formula (2). It is preferable to contain two or more compounds represented by formula (2) because this can more effectively suppress the occurrence of foreign matter defects.

[0187] The curable composition of the present invention preferably contains the compound represented by formula (1) and the compound represented by formula (2) in a total amount of 1 to 60,000 ppm by mass, more preferably 150 to 40,000 ppm by mass, relative to the specific inclusion compound. The ratio of the compound represented by formula (1) to the compound represented by formula (2) is preferably 1 to 10,000 parts by mass, more preferably 2 to 5,000 parts by mass, and even more preferably 5 to 1,000 parts by mass, of the compound represented by formula (2) relative to 100 parts by mass of the compound represented by formula (1). When two or more types of compounds represented by formula (2) are contained, the total amount thereof is preferably within the above range.

[0188] <<Curable compound>> The curable composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, an allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Preferred are an allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and more preferred is a (meth)acryloyloxy group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. Preferred is an epoxy group.

[0189] As the curable compound, it is preferable to use one that contains at least a resin. Furthermore, when the curable composition of the present invention is used as a curable composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

[0190] (polymerizable compound) Examples of the polymerizable compound include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. A compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.

[0191] Examples of resin-type polymerizable compounds include resins containing repeating units having polymerizable groups.

[0192] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight-average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight-average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight-average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

[0193] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a trifunctional to 15-functional (meth)acrylate compound, more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0194] Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer). Furthermore, examples of compounds having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide)-modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can also be used.

[0195] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), and KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0196] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group and a urethane bond (hereinafter also referred to as a polymerizable compound having a urethane bond) as the compound having an ethylenically unsaturated bond-containing group. By using such a compound, the heat resistance of the resulting film can be further improved. The reason for this effect is presumed to be that the urethane bond portion forms a physically crosslinked structure due to intermolecular hydrogen bonding.

[0197] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a (meth)acrylate having a hydroxy group with a polyfunctional isocyanate, and urethane (meth)acrylates obtained by reacting a polyhydric alcohol with a polyfunctional isocyanate and then reacting the resulting mixture with a (meth)acrylate having a hydroxy group.

[0198] Examples of the (meth)acrylate having a hydroxy group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy group-containing compound and a carboxy(meth)acrylate, and a hydroxy group-containing polyol polyacrylate.

[0199] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as tolylene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; and biuret derivatives, isocyanate nurate derivatives, and trimethylolpropane adducts thereof.

[0200] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A No. 2022-173080 can also be used.

[0201] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

[0202] As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used.For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, and the contents thereof are incorporated herein.Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

[0203] The compound having an ethylenically unsaturated bond-containing group may also be a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a tri- to hexa-functional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0204] The compound having an ethylenically unsaturated bond-containing group may also be a polymerizable compound having a fluorene skeleton. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0205] It is also preferable to use a compound having an ethylenically unsaturated bond-containing group that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0206] Examples of the compound having a cyclic ether group include a compound having an epoxy group and a compound having an oxetanyl group, and the compound having an epoxy group is preferred. Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0207] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0208] Examples of compounds having a cyclic ether group that can be used include the compounds described in paragraphs 0034 to 0036 of JP 2013-011869 A, the compounds described in paragraphs 0147 to 0156 of JP 2014-043556 A, the compounds described in paragraphs 0085 to 0092 of JP 2014-089408 A, and the compounds described in JP 2017-179172 A.

[0209] Commercially available compounds having a cyclic ether group include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), Celloxide 2021P, Celloxide 2081, Celloxide 2083, Celloxide 2085, EHPE3150, and EPOLEAD PB. 3600, PB 4700 (all manufactured by Daicel Corporation), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), Adeka Glycirol Examples of suitable monomers include ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (manufactured by NOF Corporation, epoxy group-containing polymers), OXT-101, OXT-121, OXT-212, and OXT-221 (all manufactured by Toagosei Co., Ltd., oxetanyl group-containing monomers), and OXE-10 and OXE-30 (all manufactured by Osaka Organic Chemical Industry Ltd., oxetanyl group-containing monomers).

[0210] Compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Preferred compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs

[0134] to

[0147] of JP 2004-295116 A and paragraphs

[0095] to

[0126] of JP 2014-089408 A can also be used.

[0211] (resin) The curable composition of the present invention can use a resin as the curable compound. It is preferable to use a curable compound that contains at least a resin. Resins are blended, for example, for dispersing pigments and the like in the curable composition or for use as a binder. Resins used primarily to disperse pigments and the like in the curable composition are also called dispersants. However, these uses of resins are merely examples, and resins can also be used for purposes other than these uses. Resins having polymerizable groups also fall under the category of polymerizable compounds.

[0212] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0213] Examples of resins include (meth)acrylic resins, epoxy resins, enethiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. These resins may be used alone or in combination of two or more. Norbornene resins are preferred as cyclic olefin resins in terms of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, examples of the resin include the resins described in paragraphs 0091 to 0099 of WO 2022 / 065215, the blocked polyisocyanate resins described in JP 2016-222891 A, the resins described in JP 2020-122052 A, the resins described in JP 2020-111656 A, the resins described in JP 2020-139021 A, the resins described in JP 2017-138503 A containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, and the resins described in JP 2020 The alkali-soluble resin described in JP-A-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the copolymer containing an epoxy group and an acid group described in WO 2022 / 030445, the resin described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in JP-A-2021-134350, and the copolymer described in JP-A-2020-041046 can also be used. In addition, a resin having a fluorene skeleton can also be preferably used as the resin.Examples of resins having a fluorene skeleton include those described in U.S. Patent Application Publication No. 2017 / 0102610. Also usable as the resin are those described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, alkali-soluble resins described in Japanese Patent Application Laid-Open No. 2020-186325, resins represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339, resins described in Japanese Patent Application Laid-Open No. 2021-134350, and resins described in Japanese Patent Application Laid-Open No. 2022-174597.

[0214] It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, even more preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0215] It is also preferable to use a resin having a polymerizable group as the resin. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

[0216] The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol % or more is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The acid groups possessed by the acidic dispersant (acidic resin) are preferably carboxy groups. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol % is preferred, when the total amount of the acid groups and the basic groups is taken as 100 mol %. The basic groups possessed by the basic dispersant are preferably amino groups.

[0217] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, please refer to paragraphs 0025 to 0094 of JP-A No. 2012-255128, the contents of which are incorporated herein by reference.

[0218] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0219] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0220] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0221] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803 A, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803 A, and the like can also be used.

[0222] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0223] The content of the curable compound in the total solid content of the curable composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0224] When the curable composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the curable composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0225] When the curable composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the curable composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0226] When the curable composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the curable composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0227] When the curable composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the curable composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0228] When the curable composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the curable composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, even more preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0229] The curable composition of the present invention may contain only one type of curable compound or may contain two or more types of curable compounds. When two or more types of curable compounds are contained, the total amount thereof is preferably within the above range.

[0230] <<Solvent>> The curable composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, see paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. Ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable methyl alcohols include ethylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol or 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount can be reduced to 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0231] The metal content of the organic solvent is preferably low. For example, the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less. If necessary, organic solvents with metal contents at the mass ppt (parts per trillion) level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0232] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0233] The organic solvent may contain isomers (compounds with the same number of atoms but different structures), and may contain only one type of isomer or multiple types of isomers.

[0234] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0235] The content of the solvent in the curable composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The curable composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

[0236] <<Photopolymerization initiator>> The curable composition of the present invention may contain a photopolymerization initiator. When the curable composition of the present invention contains a polymerizable compound, it is preferable that the curable composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0237] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. The photopolymerization initiator is preferably a trihalomethyltriazine compound, benzyl dimethyl ketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, hexaarylbiimidazole compound, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound, or 3-aryl-substituted coumarin compound, more preferably an oxime compound, α-hydroxyketone compound, α-aminoketone compound, or acylphosphine compound, even more preferably an α-aminoketone compound or oxime compound, and particularly preferably an oxime compound.

[0238] Examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, the peroxide-based photopolymerization initiators described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, the photopolymerization initiators described in WO 2018 / 221177 A, the photopolymerization initiators described in WO 2018 / 110179 A, ​​the photopolymerization initiators described in JP 2019-043864 A, the photopolymerization initiators described in JP 2019-044030 A, the peroxide-based initiators described in JP 2019-167313 A, and the aminoacetophenone having an oxazolidine group described in JP 2020-055992 A. fluorine-containing fluorene oxime ester photoinitiators described in JP 2021-507058 A, fluorine-containing fluorene oxime ester photoinitiators described in JP 2020-172619 A, compounds represented by formula 1 described in WO 2020 / 152120 A, compounds described in JP 2021-181406 A, photopolymerization initiators described in JP 2022-013379 A, ​​compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester photoinitiators described in JP 2021-507058 A, Initiators described in Patent Application Publication No. 110764367, initiators described in JP-T-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, and oxime ester compounds described in Chinese Patent Application Publication No. 110066225 , compounds described in Korean Patent Publication No. 10-2022-0076157, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062 of WO 2019 / 013112, oxime ester photopolymerization initiators described in Japanese Patent Publication No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in WO 2019 / 013112, photopolymerization initiators described in JP 2023-033731 A,Initiators described in JP-T-2022-515524, initiators described in JP-T-2023-517304, initiators described in Chinese Patent Application Publication No. 114149517, aminoketone compounds described in Chinese Patent Application Publication No. 115925596, compounds described in JP-A-2023-159489, compounds described in JP-A-2023-159487, compounds described in Taiwan Patent Application Publication No. 202336003, compounds described in Chinese Patent Application Publication No. 113527138, organosilicon compounds described in JP-T-2022-502526, and the like.

[0239] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0240] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0241] Examples of oxime compounds include the compounds described in paragraph 0142 of International Publication No. 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by general formula (1) and the compounds described in paragraphs 0022 to 0024 of Japanese Patent Publication No. 2021-173858, the compounds represented by general formula (1) and the compounds described in paragraphs 0117 to 0120 of Japanese Patent Publication No. 2021-170089, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), etc. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure Examples of suitable oxime compounds include OXE05 (manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR-PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, and TR-PBG-B (manufactured by TRONLY), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). It is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA Arcles NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation).

[0242] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0243] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0244] [ka] In formula (OX-1), X 1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring, R 1a represents a hydrogen atom or an acyl group, R 2a represents an alkyl group or an aryl group, R 3a and R 4a each independently represents a hydrogen atom or an alkyl group, Alk 1 and Alk 2 each independently represents an alkyl group, R 3a and R 4a may be bonded to form a ring, Alk 1 and Alk 2 may be bonded to form a ring, n represents 0 or 1.

[0245] X in formula (OX-1) 1aExamples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic ring groups are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic groups are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring group and a heterocyclic group are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic ring groups together, heterocyclic groups together, or aromatic ring groups and heterocyclic groups include -CH2-, -O-, -CO-, -S-, -NR x - and combinations thereof. x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0246] X in formula (OX-1) 1a is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6). [ka]

[0247] R in the formula X1 ~R X9 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and * represents a bond.

[0248] R X1 ~R X9 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0249] R X1 ~R X9The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0250] R X1 ~R X9 The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0251] R X1 ~R X9 The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0252] R X1 ~R X9 The heteroaryl group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heteroaryl group are preferably oxygen, nitrogen, or sulfur atoms. The number of heteroatoms contained in the heteroaryl group is preferably 1 to 3. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0253] R in formula (OX-1) 1a represents a hydrogen atom or an acyl group, and is preferably an acyl group.

[0254] R in formula (OX-1) 2a represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. R 2aThe number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 2a The alkyl group represented by is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. R 2a The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0255] R in formula (OX-1) 3a and R 4a each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. R 3a and R 4a The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R 3a and R 4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0256] Alk of formula (OX-1) 1 and Alk 2each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk 1 and Alk 2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0257] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0258] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0259] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0260] [ka]

[0261] In formula (OX-2), R 1b and R 2b each independently represents a substituent, R 3b ~R 7b each independently represents a hydrogen atom or a substituent, and Ar 1b represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent; and n represents 0 or 1.

[0262] R 1b and R 2b Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0263] R 3b ~R 7b Examples of the substituent represented by include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and aryl group include those described above. R 3b ~R 7b is preferably a hydrogen atom.

[0264] Ar 1b represents an optionally substituted aryl group or an optionally substituted heteroaryl group, Ar 1b is preferably an aryl group which may have a substituent. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred.

[0265] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0266] [ka]

[0267] In formula (OX-3), Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, R 1c ~R 3c each independently represents a substituent, L 1c is a single bond or CR 11c R 12c represents R 11c and R 12c each independently represents a hydrogen atom, an alkyl group, or an aryl group; X 1c represents -CH2-, -N-, -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0268] R 1c and R 2c Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group. R 2c is preferably an alkyl group having a branched or cyclic structure.

[0269] R 3cExamples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group and an acyl group, and an acyl group is preferred.

[0270] L 1c is a single bond or CR 11c R 12c represents R 11c and R 12c R each independently represents a hydrogen atom, an alkyl group, or an aryl group. 11c and R 12c The alkyl and aryl groups in R 1c and R 2c When k is 1, L 1c is preferably a single bond.

[0271] X 1c represents -CH2-, -N-, -O- or -S-, and is preferably -O- or -S-.

[0272] Ar 1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0273] Ar 2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0274] k represents 0 or 1, and is preferably 0. m represents an integer of 0 to 4, preferably 0 or 1, and more preferably 1. n represents 0 or 1, and is preferably 0.

[0275] As the photopolymerization initiator, a ketoxime ester compound having an aryloxy group at the ortho position, represented by formula (OX-4), can also be suitably used. Examples of such compounds include the compounds described in Chinese Patent Application Publication No. 117342977. [ka]

[0276] In formula (OX-4), R 1d and R 2d each independently represents an alkyl group, an aryl group, or a heterocyclic group; R 3d , R 4d , R 5d , R 6d each independently represents a hydrogen atom, a halogen atom, CN, NO2, CF3, R, OR, SR, SOR, SO2R, or NRR'; R and R' each independently represent an alkyl group or an aryl group, and when R and R' are present at the same time, R and R' may be bonded to form a ring, and one or more -CH2- groups in the alkyl group or aryl group represented by R and R' may each independently be replaced by -O-, -N-, -S-, -CO-, -COO-, -OCO- or a benzene ring; R 7d , R 8d and R 9d each independently represents a hydrogen atom or a methyl group.

[0277] The photopolymerization initiator may also be a compound represented by formula (OX-5). Examples of such compounds include those described in WO 2024 / 101219. [ka]

[0278] In formula (OX-5), R 1e ~R e5each independently represents a hydrocarbon group which may have a substituent; n represents an integer of 0 to 4;

[0279] Specific examples of the oxime compound include the compounds shown below.

[0280] [ka]

[0281] [ka]

[0282] [ka]

[0283] [ka]

[0284] [ka] [ka]

[0285] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photopolymerization initiator may be used. Specific examples of bifunctional or trifunctional or higher functional photopolymerization initiators include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0286] The content of the photopolymerization initiator in the total solid content of the curable composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less. Only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0287] <<Dye derivatives>> The curable composition of the present invention may contain a dye derivative. The dye derivative is used as a dispersing aid. Examples of the dye derivative include a compound having a structure in which an acid group or a basic group is bonded to a dye skeleton.

[0288] Examples of dye skeletons constituting the dye derivative include a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a quinacridone dye skeleton, an anthraquinone dye skeleton, a dianthraquinone dye skeleton, a benzisoindole dye skeleton, a thiazine indigo dye skeleton, an azo dye skeleton, a quinophthalone dye skeleton, a phthalocyanine dye skeleton, a naphthalocyanine dye skeleton, a dioxazine dye skeleton, a perylene dye skeleton, a perinone dye skeleton, a benzimidazolone dye skeleton, a benzothiazole dye skeleton, a benzimidazole dye skeleton, and a benzoxazole dye skeleton. Of these, a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a phthalocyanine dye skeleton, a quinacridone dye skeleton, and a benzimidazolone dye skeleton are preferred, and a squarylium dye skeleton and a pyrrolopyrrole dye skeleton are more preferred.

[0289] Examples of the acid group include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonamide group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K. + etc.), alkaline earth metal ions (Ca 2+ , Mg2+ Examples of the carboxylic acid amide group include -NHCOR X1 As the sulfonamide group, a group represented by -NHSO2R is preferred. X2 As the imide acid group, a group represented by -SO2NHSO2R is preferred. X3 , -CONHSO2R X4 , -CONHCOR X5 or -SO2NHCOR X6 A group represented by the formula: -SO2NHSO2R is preferred. X3 is more preferable. X1 ~R X6 R each independently represents an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

[0290] Examples of basic groups include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0291] Specific examples of dye derivatives include those disclosed in JP-A-56-118462, JP-A-63-264674, JP-A-01-217077, JP-A-03-009961, JP-A-03-026767, JP-A-03-153780, JP-A-03-045662, JP-A-04-285669, JP-A-06-145546, Also included are compounds described in JP-A Nos. 06-212088, 06-240158, 10-030063, 10-195326, paragraphs 0086 to 0098 of WO 2011 / 024896, and paragraphs 0063 to 0094 of WO 2012 / 102399, the contents of which are incorporated herein by reference.

[0292] The content of the dye derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of dye derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

[0293] <<Surfactants>> The curable composition of the present invention may contain a surfactant. Various surfactants, such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants, can be used as the surfactant. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For details of the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0294] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0295] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0296] Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419 OIL (manufactured by Dow-Toray Industries, Inc.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, and KF-6003 (manufactured by Shin-Etsu Chemical Co., Ltd.), and BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, and BYK-UV3510 (manufactured by BYK-Chemie). Compounds having the following structure can also be used as silicone surfactants. [ka]

[0297] The content of the surfactant in the total solid content of the curable composition is preferably 0.001 to 5% by mass. The lower limit is preferably 0.005% by mass or more. The upper limit is preferably 3% by mass or less, more preferably 1% by mass or less, even more preferably 0.5% by mass or less, and particularly preferably 0.2% by mass or less. Only one type of surfactant may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0298] <<Silane coupling agents>> The curable composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, more preferably a silane compound having both a hydrolyzable group and another functional group. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include a vinyl group, a styrene group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with a (meth)acryloyl group and an epoxy group being preferred. Examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the curable composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, and more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. Only one type of silane coupling agent may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0299] <<Ultraviolet absorber>> The curable composition of the present invention may contain an ultraviolet absorber, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. The ultraviolet absorber includes compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, compounds described in paragraphs 0052 to 0072 of JP 2012-208374 A, compounds described in paragraphs 0317 to 0334 of JP 2013-068814 A, compounds described in paragraphs 0061 to 0080 of JP 2016-162946 A, compounds described in paragraphs 0059 to 0076 of WO 2016 / 181987 A, compounds described in paragraphs 0052 and 0074 of WO 2021 / 131355 A, compounds described in paragraphs 0021 / 132247 A, The compounds described in paragraphs 0022 to 0024 of the same publication, the compounds described in paragraph 0179 of International Publication No. 2022 / 085485, the reactive triazine ultraviolet absorbers described in JP 2021-178918 A, the ultraviolet absorbers described in JP 2022-007884 A, the compounds described in Korean Patent Publication No. 10-2022-0014454 A, the compounds described in JP 2023-013321 A, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 A, the compounds described in JP 2023-178225 A can also be used. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Further, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Oil & Fats (The Chemical Daily, February 1, 2016). The content of the ultraviolet absorber in the total solid content of the curable composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. Only one type of ultraviolet absorber may be used, or two or more types may be used.When two or more types are used, the total amount thereof is preferably within the above range.

[0300] <<Curing agent>> When the curable composition of the present invention contains a compound having a cyclic ether group, the curable composition of the present invention preferably further contains a curing agent. Examples of curing agents include amine compounds, acid anhydride compounds, amide compounds, phenolic compounds, polycarboxylic acids, and thiol compounds. Specific examples of curing agents include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). The curing agent may also be a compound described in paragraphs 0072 to 0078 of JP 2016-075720 A or a compound described in JP 2017-036379 A. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

[0301] <<Antioxidants>> The curable composition of the present invention may contain an antioxidant. Examples of antioxidants include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, and ADK STAB HP-10 (all manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be any of the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, WO 2017 / 006600, WO 2017 / 164024, and Korean Patent Publication No. 10-2019-0059371. The antioxidant content of the total solid content of the curable composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less.The antioxidant may be used alone or in combination of two or more kinds. When two or more kinds are used, the total amount thereof is preferably within the above range.

[0302] <<Polymerization inhibitor>> The curable composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), and 2,2,6,6-tetramethylpiperidine 1-oxyl, with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the curable composition is preferably 0.0001 to 5% by mass. One type of polymerization inhibitor may be used alone, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0303] <<Other ingredients>> The curable composition of the present invention may contain, as necessary, sensitizers, fillers, heat curing accelerators, plasticizers, and other auxiliary agents (e.g., conductive particles, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. These components can be compounds described in paragraph 0182 of WO 2022 / 085485. In addition, thiol compounds described in JP 2020-109068 A can be used as chain transfer agents. In addition, other components can be compounds having two or more triethoxysilyl groups described in JP 2023-180607 A.

[0304] The curable composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the curable composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with an ion-exchange resin, and purification with an inorganic adsorbent such as hydrotalcite.

[0305] From the viewpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the curable composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, relative to the total solids content of the curable composition. The curable composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a curable composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The curable composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt, within the maximum allowable range.

[0306] From the viewpoint of environmental regulations, the content of the fluorine-containing compound in the curable composition may be 5% by mass or less, 1% by mass or less, 100 ppm by mass or less, or 1 ppm by mass or less, or may be substantially free of the fluorine-containing compound.

[0307] <Containment Container> The container for storing the curable composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the container.

[0308] <Method for preparing curable composition> The curable composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the curable composition, all components may be simultaneously dissolved or dispersed in a solvent to prepare the curable composition, or, if necessary, two or more solutions or dispersions in which the respective components are appropriately blended may be prepared in advance, and these may be mixed at the time of use (application) to prepare the curable composition.

[0309] The preparation of the curable composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads or increase the bead packing ratio, thereby increasing the grinding efficiency. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, as described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, and in paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, the pigment may be subjected to a salt milling process to refine the pigment. For details on the materials, equipment, and processing conditions used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The curable composition may contain 1 to 10,000 ppm of the beads.

[0310] When preparing the curable composition, it is preferable to filter the curable composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the type of filter and filtration method used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0311] <Membrane> Next, the film of the present invention will be described. The film of the present invention is obtained from the curable composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples include color filters, infrared cut filters, and infrared transmission filters. Examples of infrared cut filters include infrared cut filters on the light-receiving side of a solid-state imaging device (e.g., as an infrared cut filter for a wafer-level lens), infrared cut filters on the back side (opposite the light-receiving side) of a solid-state imaging device, and infrared cut filters for ambient light sensors (e.g., an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, or a color correction sensor that adjusts the color tone). In particular, the film can be preferably used as an infrared cut filter on the light-receiving side of a solid-state imaging device. Examples of infrared transmission filters include filters that block visible light and selectively transmit infrared rays of a specific wavelength or above.

[0312] The film of the present invention may have a pattern or may be a film without a pattern (flat film). The film of the present invention may be used by being laminated on a support, or may be used by being peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0313] A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, or the like may be formed on the semiconductor substrate used as a support. Furthermore, a partition wall is sometimes formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include metal, metal oxide, and black matrix. If necessary, a primer layer may be provided on the semiconductor substrate to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0314] The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. Examples of substrates include glass, resin, and other materials. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Examples of copper-containing glass include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.).

[0315] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0316] When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. Furthermore, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less. Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0317] When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has, for example, any one of the following spectral characteristics (i1) to (i3). (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of over 950 nm. (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of over 1050 nm. (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film with such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of over 1150 nm.

[0318] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs ​​(complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication devices (for both transmission and reception), and image display devices.

[0319] <Membrane manufacturing method> The film of the present invention can be produced through a step of applying the curable composition of the present invention.

[0320] Examples of the support include those described above. As a method for applying the curable composition, known methods such as spin coating can be used. For example, the application method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0321] The composition layer formed by applying the curable composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0322] The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. Note that when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern will be described in detail below.

[0323] (When forming patterns using photolithography) The pattern formation method by photolithography preferably includes a step of patternwise exposing a composition layer formed by applying the curable composition of the present invention (exposure step), and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

[0324] In the exposure step, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0325] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0326] Furthermore, the exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light irradiation and pauses are repeated in short cycles (for example, milliseconds or less).

[0327] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm 2 is preferable, and 0.05 to 1.0 J / cm 2The oxygen concentration during exposure can be appropriately selected. In addition to exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m 2 ~100,000W / m 2 (e.g., 5000W / m 2 , 15000W / m 2 , or 35,000 W / m 2 The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m 2 , oxygen concentration 35% by volume, illuminance 20000W / m 2 etc.

[0328] Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0329] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0330] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to heat the developed film to the above conditions. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0331] (When patterning using dry etching) Pattern formation by dry etching can be performed by applying the curable composition of the present invention to a support, curing the resulting composition layer to form a cured layer, forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas as a mask. Prebaking is preferably performed to form the photoresist layer. For details about pattern formation by dry etching, see paragraphs 0010 to 0067 of JP 2013-064993 A, the contents of which are incorporated herein by reference.

[0332] <Optical filters> The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

[0333] In addition to the above-described film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc. Examples of ultraviolet absorbing layers include the absorbing layers described in paragraphs 0040-0070 and 0119-0145 of International Publication No. 2015 / 099060. Examples of dielectric multilayer films include the dielectric multilayer films described in paragraphs 0255-0259 of Japanese Patent Application Laid-Open No. 2014-041318. Examples of copper-containing layers include glass substrates made of copper-containing glass (copper-containing glass substrates) and layers containing copper complexes (copper complex-containing layers). Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercially available copper-containing glass products include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, and BG-61 (all manufactured by Schott Corporation), and CD5000 (manufactured by HOYA Corporation).

[0334] The optical filter of the present invention may be formed on a support. Examples of the support include those described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass. Furthermore, the optical filter may be formed directly on various elements.

[0335] <Solid-state imaging element> The film of the present invention can be used in a solid-state imaging device. The configuration of the solid-state imaging device is not particularly limited as long as it has a configuration including the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

[0336] The solid-state imaging device has a support on which a plurality of photodiodes constituting a light-receiving area and transfer electrodes made of polysilicon or the like are disposed; a light-shielding film made of tungsten or the like is disposed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed; a device protection film made of silicon nitride or the like is disposed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes; and a film of the present invention disposed on the device protection film. Furthermore, the device protection film may have a light-focusing means (e.g., a microlens, etc.; the same applies hereinafter) disposed below the film of the present invention (on the side closer to the support), or a light-focusing means disposed on the film of the present invention. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in spaces partitioned, for example, in a lattice pattern, by partition walls. In this case, the partition walls preferably have a lower refractive index than the pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A and JP 2014-179577 A.

[0337] <Image display device> The film of the present invention can also be used in image display devices. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. Definitions and details of image display devices are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display devices to which the present invention can be applied. For example, the present invention can be applied to various types of liquid crystal display devices described in "Next Generation Liquid Crystal Display Technology." The image display device may include a white organic EL element. The white organic EL element preferably has a tandem structure. The tandem structure of organic EL elements is described in, for example, JP 2003-045676 A and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Know-How Collection," Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). It is more preferable that the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks. The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

[0338] <Infrared sensor> The film of the present invention can also be used in an infrared sensor. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. One embodiment of the infrared sensor will be described below with reference to the drawings.

[0339] In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on an imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0340] The infrared cut filter 111 can be formed using the curable composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible range. There are no particular limitations on the color filter 112, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification are incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the curable composition of the present invention.

[0341] 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual bandpass filter may be used as the other infrared cut filter.

[0342] <Camera module> The film of the present invention can also be used in a camera module. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, a camera module can be configured to have a solid-state image sensor, a lens, and a circuit for processing images obtained from the solid-state image sensor. Known lenses and circuits for processing images obtained from the solid-state image sensor used in the camera module can be used. Examples of camera modules include the camera modules described in JP 2016-006476 A and JP 2014-197190 A, the contents of which are incorporated herein by reference.

[0343] <Light-emitting element> The film of the present invention can also be used in a light-emitting device. The configuration of the light-emitting device is not particularly limited as long as it functions as a light-emitting device, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical-cavity surface-emitting lasers (VICSELs). The film of the present invention may be formed directly on the light-emitting device or may be disposed on the light-emitting path.

[0344] <Optical communication element> The film of the present invention can also be used in optical communication elements. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and it may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmitting / receiving path. [Example]

[0345] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In addition, in the structural formulas shown below, Me is a methyl group.

[0346] <Synthesis example> (Synthesis of squarylium compound (B-1)) A squarylium compound (B-1) is synthesized by the method described in paragraph 0256 of JP 2020-076995 A. [ka]

[0347] (Synthesis Example 1-1) Synthesis of inclusion compound A-1 5 mmol of squarylium compound (B-1) was dissolved in 600 mL of chloroform. 20 mmol of p-xylylenediamine and 20 mmol of triethylamine were then added and dissolved to obtain a mixed solution. Separately, a solution of 20 mmol of isophthaloyl chloride dissolved in 60 mL of chloroform was prepared and added dropwise to the mixed solution at room temperature over 5 hours. The mixture was stirred at room temperature for 12 hours, and the precipitated solid was filtered off. The filtrate was concentrated and then dissolved in 100 mL of dichloromethane. 200 mL of methanol was added dropwise over 10 minutes while stirring. The precipitated solid was filtered and washed with methanol to obtain inclusion compound A-1. Inclusion compound A-1 is a compound with a structure in which the squarylium compound (B-1) is the core and the cyclic amide compound (C-1) (compound with the structure shown below) that encapsulates the core is the shell. [ka]

[0348] (Synthesis Examples 1-2 to 1-27) Synthesis of inclusion compounds A-2 to A-27 Clathrate compounds A-2 to A-27 are synthesized in the same manner as in Synthesis Example 1-1, except that the types of core and shell compounds are changed to the compounds shown in the table below.

[0349] [Table 1]

[0350] (core) B-1 to B-22: Compounds having the following structures: B-1 to B-21 are squarylium dyes, and B-22 is a cyanine dye. [ka] [ka] [ka] [ka] [ka] [ka]

[0351] (shell) C-1 to C-7: Compounds having the following structure (cyclic amide compounds) [ka]

[0352] (Synthesis Example 2-1) Synthesis of amide compound (a-1), amide compound (a-2), and amide compound (b-1) 30 mmol of isophthaloyl chloride was added to 600 mL of chloroform and dissolved. Separately, a solution of 10 mmol of p-xylylenediamine and 10 mmol of triethylamine was prepared in 60 mL of chloroform and added dropwise to the above isophthaloyl chloride chloroform solution over 5 hours at room temperature. The mixture was stirred at room temperature for 12 hours, and the precipitated solid was filtered off. 100 mL of methanol was added to the filtrate and then concentrated. The resulting concentrated solution was dissolved in 100 mL of dichloromethane, and 200 mL of methanol was added dropwise over 10 minutes while stirring. The precipitated solid was filtered and washed with methanol to obtain a mixture containing approximately 60% by mass of amide compound (a-1), approximately 20% by mass of amide compound (b-1), and approximately 10% by mass of amide compound (a-2).

[0353] (Synthesis Example 2-2) Synthesis of amide compound (a-1) 30 mmol of isophthaloyl chloride is dissolved in 100 mL of chloroform, and then 50 mL of a chloroform solution containing 5 mmol of p-xylylenediamine and 30 mmol of triethylamine is added dropwise at room temperature over 1 hour while stirring. After stirring at the same temperature for 1 hour, 100 mL of methanol is added, and the precipitated solid is filtered to obtain amide compound (a-1).

[0354] (Synthesis Example 2-3) Amide compounds (a-3) to (a-12) and amide compounds (b-2) to (b-6) are obtained in the same manner as in Synthesis Example 2-1 or Synthesis Example 2-2, except that the raw materials are changed as appropriate.

[0355] Amide compounds (a-1) to (a-12) and amide compounds (b-2) to (b-6) are compounds having the following structures: Amide compounds (a-1) to (a-12) are compounds corresponding to the compound represented by formula (1), and amide compounds (b-1) to (b-6) are compounds corresponding to the compound represented by formula (2). [ka] [ka] [ka]

[0356] <Preparation of the mixture> Mixtures Z-1 to Z-24 were prepared by adding the amide compounds shown in the table below to the inclusion compounds shown in the table below. The values ​​in the column for the amount of amide compound added in the table indicate the content of each amide compound relative to the inclusion compound, and the values ​​in the column for the content of the compound represented by formula (1) indicate the total amount of amide compounds (a-1) to (a-12) relative to the inclusion compound. [Table 2]

[0357] <Production of Composition> The materials other than the solvent shown in the table below are mixed in the ratios shown in the table below, and the solvent shown in the table below is added to adjust the solids concentration to 35% by mass, followed by stirring and filtering through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce a composition. The solids concentration of the composition is adjusted by the amount of solvent added.

[0358] [Table 3] [Table 4] [Table 5]

[0359] [Table 6]

[0360] Details of the materials listed in the table above are as follows: The compositions of Comparative Example 1 and Comparative Example 101 are compositions to which the above-mentioned inclusion compound A-1 was added instead of the above-mentioned mixtures Z-1 to Z-32, and are compositions that do not contain the amide compound represented by formula (1).

[0361] (clathrate compounds) A-1: The above-mentioned inclusion compound A-1

[0362] (mixture) Z-1 to Z-32: The above-mentioned mixtures Z-1 to Z-32 (mixtures of inclusion compounds and amide compounds)

[0363] (resin) P-1: Resin with the following structure (the numbers attached to the main chain are molar ratios. Weight average molecular weight: 11,000, acid value: 69.2 mg KOH / g) [ka] P-2: Resin with the following structure (the number attached to the main chain is the molar ratio. Weight average molecular weight: 21,000) [ka] P-3: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 16,000, acid value: 67 mg KOH / g) [ka] P-4: Resin with the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight 18,000, acid value 82.1 mgKOH / g) [ka] P-5: Resin with the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 10,000, dispersity 2.0) [ka] P-6: Resin with the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 8000, dispersity 1.8) [ka] P-7: ARTON F4520 (JSR Corporation, cyclic polyolefin resin) P-8: EPICLON NM-695 (novolac epoxy resin, manufactured by DIC Corporation)

[0364] (polymerizable monomer) M-1: Compound of the following structure [ka] M-2: Compound of the following structure [ka] M-3: KAYARAD DPHA (a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.) M-4: Compound of the following structure [ka] M-5: A mixture of compounds having the following structure (containing 55 mol% to 63 mol% of the compound on the left) [ka] M-6: A compound having the following structure. [ka]

[0365] (Photopolymerization initiator) I-1 to I-9: Compounds of the following structure [ka]

[0366] (surfactant) F-1: FTX-218D (Neos Corporation, fluorine-based surfactant) F-2: Megafac F-554 (DIC Corporation, fluorine-based surfactant) F-3: KF-6001 (Shin-Etsu Chemical Co., Ltd., silicone surfactant)

[0367] (polymerization inhibitor) G-1: p-Methoxyphenol

[0368] (antioxidant) U-1 to U-3: Compounds with the following structures [ka]

[0369] (ultraviolet absorber) UV-1: Compound with the following structure [ka]

[0370] (solvent) S-1: Propylene glycol monomethyl ether acetate

[0371] (Production Example 1) Method for producing a film using the compositions of Examples 1 to 32 and Comparative Example 1 Each composition was applied by spin coating onto an 8-inch (1 inch = 2.54 cm) silicon wafer sprayed with hexamethyldisilazane, and then heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The resulting composition layer was then exposed to 500 mJ / cm2 of light using an i-line stepper exposure system FPA-3000i5+ (Canon Corporation) through a mask having island patterns with sizes varying in 0.1 μm increments from 0.9 μm square to 1.2 μm square. 2 The i-line is irradiated at an exposure dose of . Next, puddle development is performed using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) at 25° C. for 40 seconds, followed by rinsing with running water for 30 seconds and spray drying to form a patterned film (pixels).

[0372] (Production Example 2) Method for producing a film using the compositions of Examples 101 to 124 and Comparative Example 101 Each composition is applied to a glass substrate by spin coating, and heated on a hot plate at 100° C. for 2 minutes, and then at 200° C. for 8 minutes to produce a film having a thickness of 1.0 μm.

[0373] <Evaluation of foreign matter defect suppression> The films obtained in Production Examples 1 and 2 are observed for foreign matter on the film surface using an optical microscope at 200x bright field magnification, and are evaluated according to the following criteria. The closer the evaluation result is to A, the better the suppression of foreign matter defects. -Evaluation criteria- A: No foreign object is found B: A small amount of foreign matter was found, but it is not a problem for practical use. C: Foreign matter was found and there is a problem with practical use.

[0374] <Evaluation of Adhesion> (Regarding the film obtained in Production Example 1) The adhesion of the film (pixels) obtained in Production Example 1 is evaluated using a scanning electron microscope (S-9220, manufactured by Hitachi, Ltd.). The pattern size when all pixels are in close contact is evaluated on a four-level scale (A to D) according to the following evaluation criteria. The closer the evaluation result is to A, the better the adhesion is. -Evaluation criteria- A: All pixels with a pattern size of 0.9 μm or more are in close contact. B: There is some peeling in pixels with a pattern size of 0.9 μm, but all pixels of 1.0 μm or larger are in close contact. C: There is some peeling in pixels with a pattern size of 1.0 μm or less, but all pixels with a size of 1.1 μm or more are in close contact. D: If the pattern size is not 1.2 μm or larger, all pixels will not be in close contact.

[0375] (Regarding the film obtained in Production Example 2) The film obtained in Production Example 2 was heated at 150°C for 2000 hours, and the cross section was observed with a scanning electron microscope (SEM) to examine the interface between the film and the substrate. The result was evaluated on a four-point scale (A to D) according to the following evaluation criteria. The closer the evaluation result was to A, the better the adhesion. -Evaluation criteria- A: No cracks and no peeling B: Cracks and no peeling C: No cracks and peeling D: Cracks and peeling

[0376] [Table 7]

[0377] As shown in the above table, in the examples, foreign matter defects are suppressed and a film with excellent adhesion can be formed. [Explanation of symbols]

[0378] 110: solid-state imaging element, 111: infrared cut filter, 112: color filter, 114: infrared transmission filter, 115: microlens, 116: flattening layer

Claims

1. a colorant containing an inclusion compound a having a polymethine dye a1 as a core and a cyclic amide compound a2 as a shell that encompasses the core; A compound represented by formula (1), a curable compound; A solvent, a curable composition comprising: 【Chemistry 1】 In formula (1), L ａ１ and L ａ２ each independently represents a single bond or a divalent linking group, A １ and A ２ each independently represents a divalent linking group, R １ and R ２ each independently represents a hydrogen atom or a substituent, n1 represents an integer of 1 to 10.

2. A of the formula (1) １ is a group represented by formula (A1-1) or formula (A1-2), A of the formula (1) ２ is a group represented by any one of formulas (A2-1) to (A2-4); 【Chemistry 2】 In the formula, the wavy line represents a bond. R １１ ~R １７ , R ２１ ~R ２６ , R ３１ ~R ３４ each independently represents a hydrogen atom or a substituent, R １１ and R １２ may be bonded to form a ring, R １３ and R １４ may be bonded to form a ring, R １５ and R １６ may be bonded to form a ring, R １６ and R １７ may be bonded to form a ring, R ２１ and R ２２ may be bonded to form a ring, R ２２ and R ２３ may be bonded to form a ring, R ２４ and R ２５ may be bonded to form a ring, R ２５ and R ２６ may be bonded to form a ring, R ３１ and R ３２ may be bonded to form a ring, R ３３ and R ３４ may be bonded to form a ring.

3. The curable composition according to claim 1, wherein the cyclic amide compound a2 encompassing the core is a compound represented by formula (20): 【Transformation 3】 In formula (20), L ｂ１ and L ｂ２ each independently represents a single bond or a divalent linking group, A ２１ and A ２２ each independently represents a divalent linking group, n20 represents an integer of 1 to 10.

4. The curable composition according to claim 1 or 2, wherein the cyclic amide compound a2 encompassing the core is a compound represented by any one of formulas (21) to (23): 【Chemistry 4】 In the formula, R １０１ ~R １１４ , R １２１ ~R １３４ , R １４１ ~R １５２ each independently represents a hydrogen atom or a substituent, R １０１ ~R １１４ two adjacent groups may be bonded to form a ring, R １２１ ~R １３４ two adjacent groups may be bonded to form a ring, R １４１ ~R １５２ Two adjacent groups among these may be bonded to form a ring.

5. The curable composition according to claim 1 or 2, wherein the polymethine dye a1 is a squarylium dye.

6. 3. The curable composition according to claim 1, wherein the compound represented by formula (1) is contained in an amount of 1 to 50,000 ppm by mass relative to the inclusion compound a.

7. 3. The curable composition according to claim 1, wherein the compound represented by formula (1) is contained in an amount of 150 to 40,000 ppm by mass relative to the inclusion compound a.

8. The curable composition according to claim 1 or 2, further comprising a compound represented by formula (2): 【Transformation 5】 In formula (2), L ａ３ and L ａ４ each independently represents a single bond or a divalent linking group, A ３ and A ４ each independently represents a divalent linking group, n2 represents an integer of 1 to 10.

9. A film obtained by using the curable composition according to claim 1 or 2.

10. An optical filter comprising the film of claim 9.

11. A solid-state imaging device comprising the film according to claim 9.

Images