Conveying system

Abstract

We provide a transport system that allows for miniaturization of equipment while improving expandability. [Solution] The substrate transport system 1 includes a vacuum transport chamber 7 equipped with a transport path 19 through which a semiconductor substrate W is transported, a plurality of processing chambers 9 arranged along the X-axis around the vacuum transport chamber 7 for performing predetermined processing on the semiconductor substrate W, a plurality of stators 11 each equipped with a coil unit 22 and arranged along the transport path 19 within the vacuum transport chamber 7, and a movable element 13 equipped with a magnet unit 27 that floats and moves along the transport path 19 to transport the semiconductor substrate W. The transport path 19 has a first transport path 19A in which the plurality of stators 11 are arranged in a line along the X-axis.

Description

Technical Field

[0001] The disclosed embodiments relate to a transport system.

Background Art

[0002] Patent Document 1 describes semiconductor processing equipment used for transferring a semiconductor substrate between processing chambers. This semiconductor processing equipment includes a planar motor having an array of coils, and a substrate carrier that includes magnets and floats due to the interaction between the magnetic field generated by the coils and the magnetic field of the magnets and whose position is controlled. The substrate carrier has a substrate support surface on which the substrate is placed and transports the substrate between processing chambers.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In the semiconductor processing equipment of the above prior art, the trajectory and control of the substrate carrier are complicated, which causes the equipment to be enlarged and lacks scalability.

[0005] The present invention has been made in view of such problems, and an object thereof is to provide a transport system that can miniaturize the equipment and improve scalability.

Means for Solving the Problems

[0006] To solve the above problems, according to one aspect of the present invention, a transport system is applied which includes a transport chamber equipped with a transport path through which an object to be processed is transported, a plurality of processing chambers arranged along a first direction around the transport chamber for performing predetermined processing on the object to be processed, a plurality of stators each equipped with a coil and arranged within the transport chamber along the transport path, and a movable element equipped with a magnet that levitates and moves along the transport path to transport the object to be processed, wherein the transport path has a first transport path in which the plurality of stators are arranged in a line along the first direction. [Effects of the Invention]

[0007] According to the embodiments of the disclosure, the equipment can be miniaturized and its scalability can be improved. [Brief explanation of the drawing]

[0008] [Figure 1] This diagram conceptually represents an example of the overall configuration of a substrate transport system. [Figure 2] This diagram conceptually represents a stator unit and an example of the stator coil configuration. [Figure 3] This is a diagram conceptually representing an example of the configuration of a movable element. [Figure 4] This is an explanatory diagram illustrating an example of motion control when two movable parts pass each other. [Figure 5] This is an explanatory diagram illustrating an example of motion control when one movable element overtakes the other. [Figure 6] This is an explanatory diagram illustrating an example of motion control when a moving element bypasses other moving elements. [Figure 7] This is an explanatory diagram illustrating an example of motion control when a movable element is approached to a specific processing chamber from one side in the X-axis direction. [Figure 8] This is an explanatory diagram illustrating an example of the operation when a movable element is approached a specific processing chamber by circling around it from the other side in the X-axis direction. [Figure 9] This is an explanatory diagram illustrating an example of motion control to prevent collisions of movable parts. [Figure 10]It is an explanatory diagram showing another example of operation control for preventing the collision of the mover. [Figure 11] It is a plan view showing an example of the configuration as viewed from above the stator unit. [Figure 12] It is a cross-sectional view corresponding to the XII-XII cross-section of FIG. 11, showing an example of the cross-sectional structure of the stator unit. [Figure 13] It is a diagram showing an example of the arrangement of the sensor substrate and the sensor in the stator unit. [Figure 14] It is a diagram showing another example of the arrangement of the sensor substrate and the sensor in the stator unit. [Figure 15] It is an explanatory diagram showing an example of the heat transfer direction by the heat transfer member. [Figure 16] It is a perspective view showing an example of the layer structure of the coil unit. [Figure 17] It is a perspective view showing an example of the layer structure of the first substrate coil unit. [Figure 18] It is a perspective view showing an example of the layer structure of the second substrate coil unit. [Figure 19] It is a conceptual diagram conceptually showing an example of the layer structure of the first substrate coil unit. [Figure 20] It is a conceptual diagram conceptually showing an example of the layer structure of the second substrate coil unit. [Figure 21] It is a top view showing an example of the shape of the first coil pattern in the first substrate coil unit. [Figure 22] It is a top view showing an example of the shape of the first coil pattern in the first substrate coil unit. [Figure 23] It is a top view showing an example of the shape of the first coil pattern in the first substrate coil unit. [Figure 24] It is a top view showing an example of the shape of the second coil pattern in the second substrate coil unit. [Figure 25] It is a top view showing an example of the shape of the second coil pattern in the second substrate coil unit. [Figure 26] It is a top view showing an example of the shape of the second coil pattern in the second substrate coil unit. [Figure 27] It is a circuit diagram showing an example of a servo amplifier that supplies current to the first substrate coil and a circuit configuration. [Figure 28] It is a circuit diagram showing an example of a servo amplifier that supplies current to the first substrate coil and a circuit configuration. [Figure 29] It is a circuit diagram showing an example of a servo amplifier that supplies current to the second substrate coil and a circuit configuration. [Figure 30] It is a circuit diagram showing an example of a servo amplifier that supplies current to the second substrate coil and a circuit configuration. [Figure 31] It is an explanatory diagram showing an example of a region where a propulsive force in the X-axis direction can be obtained in the coil unit of the stator. [Figure 32] It is an explanatory diagram showing an example of a region where a propulsive force in the Y-axis direction can be obtained in the coil unit of the stator. [Figure 33] It is an explanatory diagram showing an example of a region where a levitation force in the Z-axis direction can be surely obtained in the coil unit of the stator. [Figure 34] It is an explanatory diagram showing an example of the relationship between the sizes of the coil unit of the stator and the magnet unit of the mover. [Figure 35] It is a diagram conceptually showing an example of the overall configuration of a substrate transfer system in a modified example where the second transfer path is formed at a position facing the processing chamber. [Figure 36] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 37] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 38] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 39] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 40] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 41] It is a diagram showing variations in the arrangement of the stator in the stator unit. [Figure 42] This diagram shows an example of how to connect a stator unit in a modified configuration. [Figure 43] This diagram shows an example of how to connect a stator unit in a modified configuration. [Figure 44] This figure shows an example of the shape of the first coil pattern in a modified example in which the first coil pattern and the second coil pattern are formed on both sides of a common substrate. [Figure 45] This figure shows an example of the shape of the second coil pattern in a modified example in which the first coil pattern and the second coil pattern are formed on both sides of a common substrate. [Figure 46] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 47] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 48] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 49] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 50] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 51] This is a conceptual diagram illustrating variations in the coil configuration of a coil unit. [Figure 52] This diagram conceptually represents an example of the overall configuration of a substrate transport system, in a modified example where the winding configuration of the substrate coil differs between the first and second movable elements, and the first and second movable elements are shown separately. [Modes for carrying out the invention]

[0009] The embodiments will be described below with reference to the drawings.

[0010] <1. Configuration of the PCB transport system> Referring to Figures 1 to 3, an example of the configuration of the substrate transport system according to the embodiment will be described. The substrate transport system 1 is a system that transports a semiconductor substrate W (an example of a workpiece) in a vacuum environment and performs a predetermined process on the semiconductor substrate W. The semiconductor substrate W is also called a semiconductor wafer. Note that a workpiece other than a semiconductor substrate W may be transported and a predetermined process may be performed on it.

[0011] Figure 1 conceptually shows an example of the overall configuration of the substrate transport system 1. As shown in Figure 1, the substrate transport system 1 (an example of a transport system) includes an atmospheric transport chamber 3, a load lock chamber 5, a vacuum transport chamber 7, a plurality of processing chambers 9, a stator 11, a movable element 13, and a controller 15.

[0012] The atmospheric transport chamber 3 is in an atmospheric environment and is equipped with an atmospheric transport device (not shown) for transporting semiconductor substrates W. The atmospheric transport device takes out the semiconductor substrates W contained in the load port (not shown) and places them in the load lock chamber 5. The atmospheric transport device also takes out the semiconductor substrates W placed in the load lock chamber 5 and places them in the load port.

[0013] The load lock chamber 5 has a mounting platform (not shown) on which the semiconductor substrate W is placed, and controls the pressure between atmospheric pressure and vacuum when transporting the semiconductor substrate W between the atmospheric transport chamber 3 and the vacuum transport chamber 7.

[0014] The vacuum transport chamber 7 (an example of a transport chamber) is depressurized to a vacuum atmosphere inside, and the semiconductor substrate W is transported in this vacuum atmosphere. In the example shown in Figure 1, the vacuum transport chamber 7 is formed in a roughly rectangular shape when viewed from above. Multiple processing chambers 9 (for example, three each, a total of six) are connected to opposing walls 7a and 7b on the long side of the vacuum transport chamber 7 via opening / closing doors 17. A load lock chamber 5 is connected to one wall 7c on the short side of the vacuum transport chamber 7 via an opening / closing door (not shown). In this embodiment, the longitudinal direction of the vacuum transport chamber 7, that is, the direction in which multiple processing chambers 9 with opening / closing doors 17 facing the same direction are lined up horizontally along wall 7a or wall 7b of the vacuum transport chamber 7, is defined as the X-axis direction (an example of a first direction). The short direction of the vacuum transport chamber 7, that is, the direction in which two processing chambers 9 with opening / closing doors 17 facing each other are defined as the Y-axis direction (an example of a second direction). The vertical direction is defined as the Z-axis direction. The X, Y, and Z axes are orthogonal to each other. Note that the X and Y axes do not necessarily have to be orthogonal; they only need to intersect. In this case, the vacuum transport chamber 7 may have a shape other than a rectangle (for example, a parallelogram or trapezoid).

[0015] The vacuum transport chamber 7 is provided with a transport path 19 through which semiconductor substrates W are transported. The transport path 19 is formed by arranging a plurality of stators 11 in a row. The transport path 19 comprises a first transport path 19A, a second transport path 19B, and a third transport path 19C. The first transport path 19A is formed by arranging a plurality of stators 11 in a row along the X-axis direction. The vacuum transport chamber 7 has two first transport paths 19A that are spaced apart from each other in the Y-axis direction and extend substantially parallel to each other in the X-axis direction. Note that the number of first transport paths 19A is not limited to two; there may be one or three or more.

[0016] The second transport path 19B is formed by arranging at least one stator 11 in a line along the Y-axis direction and connecting the two first transport paths 19A in the Y-axis direction. In the example shown in Figure 1, for example, four second transport paths 19B are arranged. Of these four second transport paths 19B, the two innermost second transport paths 19B connect the two first transport paths 19A at a position between two adjacent processing chambers 9 in the X-axis direction. Each second transport path 19B is formed by, for example, two stators 11. Note that the second transport path 19B may be formed by one stator 11, or by three or more stators 11.

[0017] The third transport path 19C is formed by arranging at least one stator 11 in a line along the Y-axis direction and connects the first transport path 19A to the processing chambers 9. In the example shown in Figure 1, for example, six third transport paths 19C are arranged, each connecting the first transport path 19A to one of the six processing chambers 9. Each third transport path 19C is formed by, for example, one stator 11. Note that the third transport path 19C may be formed by two or more stators 11.

[0018] Each stator 11 is equipped with multiple coils and is arranged along the transport path 19 within the vacuum transport chamber 7. The stator 11 is formed in a roughly rectangular shape (rectangle or square) when viewed from the Z-axis direction. Each movable element 13 is equipped with multiple magnets and levitates and moves along the transport path 19 to transport the semiconductor substrate W. The stator 11 and movable elements 13 constitute a planar motor 20. The movable elements 13 levitate due to the interaction of the magnetic field generated by the coils of the stator 11 and the magnetic field generated by the magnets of the movable elements 13, and their position is controlled by the controller 15. The movable elements 13 are equipped with substrate support parts 13a that support the semiconductor substrate W. The movable elements 13 transport the semiconductor substrate W between the load lock chamber 5 and the processing chamber 9, and between multiple processing chambers 9. Although Figure 1 shows, for example, three movable elements 13, the number of movable elements 13 may be one or more than three. It is preferable that the number of movable elements 13 be at least two or more.

[0019] The processing chambers 9 are arranged around the vacuum transfer chamber 7, and predetermined processing is performed on the semiconductor substrate W. In the example shown in Figure 1, for example, six processing chambers 9 are connected to the walls 7a and 7b, three each, via opening / closing doors 17. The three processing chambers 9 connected to wall 7a are arranged along the X-axis, and the three processing chambers 9 connected to wall 7b are also arranged along the X-axis. In each processing chamber 9, predetermined processing is performed on the semiconductor substrate W, such as film deposition, etching, ashing, and cleaning. The number of processing chambers 9 is not particularly limited and may be one or more than six, depending on the number of processing steps to be performed. The opening / closing doors 17 open and close the openings of the processing chambers 9. The opening / closing doors 17 are also called gate valves. In each processing chamber 9, with the opening / closing doors 17 open, the semiconductor substrate W is transferred between the substrate support portion 13a of the movable element 13.

[0020] The controller 15 controls the operation of each component of the substrate transport system 1. For example, the controller 15 controls the processing of semiconductor substrates W in each processing chamber 9, the position of each movable element 13 and the operation of the substrate support part 13a in the vacuum transport chamber 7, and the opening and closing of the opening and closing door 17. The controller 15 is configured as, for example, a computer. Although not shown in the figures, the controller 15 may have, for example, a processor such as a CPU, memory such as ROM or RAM, an input device, an output device, a recording device, a communication device, etc.

[0021] Figure 2 conceptually shows an example of the coil configuration of the stator unit 21 and the stator 11. As shown in Figure 2, the stator unit 21 is composed of a base 32, which has a larger area than the stator 11 when viewed from the Z-axis direction, and multiple stators 11 (four in the example shown in Figure 2) arranged on the upper surface of the base 32. The transport path 19 is formed by connecting multiple stator units 21. Details of the configuration of the stator unit 21 will be described later.

[0022] The stator 11 has a coil unit 22. The coil unit 22 is formed by integrating multiple substrate coils. The coil unit 22 has two sets of first substrate coils 23A, 23B, each formed in a substantially rectangular shape with the X-axis direction as its longitudinal direction and equipped with multiple substrate coils with different phases (in the example shown in Figure 2, there are three phases: U-phase, V-phase, and W-phase), and two sets of second substrate coils 25A, 25B, each formed in a substantially rectangular shape with the Y-axis direction as its longitudinal direction and equipped with multiple substrate coils with different phases (in the example shown in Figure 2, there are three phases: U-phase, V-phase, and W-phase). The first substrate coil 23A has a U-phase substrate coil Uy1, a V-phase substrate coil Vy1, and a W-phase substrate coil Wy1. The substrate coils Uy1, Vy1, and Wy1 are each formed in a substantially rectangular shape with the X-axis direction as its longitudinal direction and are arranged adjacent to each other in the Y-axis direction. Similarly, the first substrate coil 23B has a U-phase substrate coil Uy2, a V-phase substrate coil Vy2, and a W-phase substrate coil Wy2. The substrate coils Uy2, Vy2, and Wy2 are each formed in a substantially rectangular shape with the X-axis direction as their longitudinal direction, and are arranged adjacent to each other in the Y-axis direction. The two first substrate coils 23A and 23B are arranged adjacent to each other in the Y-axis direction.

[0023] Furthermore, the second substrate coil 25A has a U-phase substrate coil Ux1, a V-phase substrate coil Vx1, and a W-phase substrate coil Wx1. Each of the substrate coils Ux1, Vx1, and Wx1 is formed in a substantially rectangular shape with the Y-axis direction as its longitudinal direction and is arranged adjacent to each other in the X-axis direction. Similarly, the second substrate coil 25B has a U-phase substrate coil Ux2, a V-phase substrate coil Vx2, and a W-phase substrate coil Wx2. Each of the substrate coils Ux2, Vx2, and Wx2 is formed in a substantially rectangular shape with the Y-axis direction as its longitudinal direction and is arranged adjacent to each other in the X-axis direction. The two second substrate coils 25A and 25B are arranged adjacent to each other in the X-axis direction.

[0024] The coil unit 22 is constructed by stacking two first substrate coils 23A and 23B and two second substrate coils 25A and 25B in the Z-axis direction. Details of the configuration of the coil unit 22 will be described later. In Figure 2, an example is shown in which the second substrate coils 25A and 25B are stacked below the first substrate coils 23A and 23B, but the opposite is also possible, where the first substrate coils 23A and 23B are stacked below the second substrate coils 25A and 25B. Furthermore, the number of first substrate coils 23A and 23B and second substrate coils 25A and 25B is not limited to two sets each when the three phases (U-phase, V-phase, and W-phase) are considered as one set. For example, there may be one set, or three or more sets. Also, the number of first substrate coils 23A and 23B and the number of second substrate coils 25A and 25B are not limited to the same number, but may be different numbers.

[0025] Figure 3 conceptually shows an example of the configuration of the movable element 13. As shown in Figure 3, the movable element 13 comprises the aforementioned substrate support portion 13a and the base 13b. The movable element 13 is formed in a substantially rectangular shape (rectangle or square) when viewed from the Z-axis direction. When viewed from the Z-axis direction, the dimensions of the movable element 13 in both the X-axis direction and the Y-axis direction are substantially the same as those of the stator 11. However, the movable element 13 does not have to be the same size as the stator 11, as long as it is large enough to prevent passing each other on the transport path 19. Furthermore, the movable element 13 may be configured so that the dimension in either the X-axis direction or the Y-axis direction is substantially the same as that of the stator 11.

[0026] The movable element 13 has a magnet unit 27 mounted on a base 13b and levitates and moves on the stator 11. The magnet unit 27 has four magnet units 27A, 27B, which consist of two magnet units 27A and two magnet units 27B. The magnet units 27A and 27B have different orientations from each other. The magnet unit 27A has a permanent magnet 27n that is elongated in the Y-axis direction and has the N pole on the side facing the stator 11, and a permanent magnet 27s that is elongated in the Y-axis direction and has the S pole on the side facing the stator 11, and is configured as a Halbach array in which another permanent magnet is inserted between the permanent magnets 27n and 27s so that its magnetization direction is perpendicular to the magnetization direction of the permanent magnets 27n and 27s. The magnet unit 27B has a permanent magnet 27n that is elongated in the X-axis direction and has the N pole on the side facing the stator 11, and a permanent magnet 27s that is elongated in the X-axis direction and has the S pole on the side facing the stator 11. It is configured as a Halbach array in which another permanent magnet is inserted between the permanent magnets 27n and 27s so that its magnetization direction is perpendicular to the magnetization direction of the permanent magnets 27n and 27s. The four magnet units 27A and 27B are arranged alternately around the rotation axis AX. That is, two magnet units 27A are arranged point-symmetrically with respect to the rotation axis AX, and two magnet units 27B are arranged point-symmetrically with respect to the rotation axis AX. The arrangement area of ​​the magnet units 27 has dimensions in both the X-axis and Y-axis directions that are approximately the same as those of the stator 11 when viewed from the Z-axis direction.

[0027] The movable element 13 obtains thrust in the X-axis direction through the interaction of the magnetic fields from the second substrate coils 25A and 25B of the stator 11 and the magnetic field from the magnet unit 27A. The movable element 13 also obtains thrust in the Y-axis direction through the interaction of the magnetic fields from the first substrate coils 23A and 23B of the stator 11 and the magnetic field from the magnet unit 27B. Furthermore, the movable element 13 obtains rotational thrust around the rotation axis AX through the combination of the above X-axis and Y-axis thrusts. As a result, the movable element 13 is able to move horizontally (in all directions on the XY plane, including the X-axis and Y-axis directions) and rotate in the rotational direction around the rotation axis AX. In other words, it is capable of three degrees of freedom of movement. In addition, the movable element 13 obtains buoyancy in the Z-axis direction through the interaction of the magnetic fields from the first substrate coils 23A and 23B and the second substrate coils 25A and 25B and the magnetic fields from the magnet units 27A and 27B. Therefore, by adjusting the current phase of the first substrate coils 23A, 23B and the second substrate coils 25A, 25B, it is also possible to adjust the levitation height in the Z-axis direction, the rotation direction θx around the X-axis, and the rotation direction θy around the Y-axis. In this case, 6-degree-of-freedom operation becomes possible.

[0028] <2. Control of the movement of the movable element> The controller 15 independently controls the current supplied to the substrate coils 23A, 23B, 25A, and 25B of the stator 11 for each stator 11. Furthermore, the controller 15 independently controls the current supplied to the four substrate coils 23A, 23B, 25A, and 25B in each stator 11 for each individual substrate coil. This allows the controller 15 to independently control the operation of each of the multiple movable elements 13. Next, a specific example of the controller 15's control of the movable elements 13 will be explained with reference to Figures 4 to 10. For convenience of explanation, in Figures 4 to 10, the positive Y-axis direction will be referred to as the upper side, the negative Y-axis direction as the lower side, the positive X-axis direction as the right side, and the negative X-axis direction as the left side.

[0029] Figure 4 shows an example of motion control when two movable elements 13 pass each other. As shown in the upper part of Figure 4, when the two movable elements 13 move toward each other on the upper first transport path 19A (an example of one of the first transport paths), the controller 15 controls the movement so that the two movable elements 13 pass each other, as shown in the lower part of Figure 4, by moving the movable element 13 located on the right (an example of one of the movable elements) to the lower first transport path 19A (an example of the other first transport path) via the second transport path 19B. In this case, the controller 15 may either move the movable element 13 that has been moved to the lower first transport path 19A back to the upper first transport path 19A via the second transport path 19B, or it may control it to continue moving along the lower first transport path 19A.

[0030] Figure 5 shows an example of motion control when one movable element 13 overtakes the other movable element 13. As shown in the upper part of Figure 5, when the two movable elements 13 move in the same direction on the upper first transport path 19A (an example of one of the first transport paths), the controller 15 controls the movement so that the rear movable element 13 moves to the lower first transport path 19A (an example of the other first transport path) via the second transport path 19B, as shown in the lower part of Figure 5, and overtakes the front movable element 13 in the direction of movement. In this case, the controller 15 may, for example, decrease the speed of the front movable element 13 in the direction of movement (including stopping it) and increase the speed of the rear movable element 13 in the direction of movement.

[0031] Figure 6 shows an example of operation control when a moving movable element 13 bypasses another movable element 13. As shown in the upper part of Figure 6, when another movable element 13 is in front of a movable element 13 moving on the upper first transport path 19A (an example of one of the first transport paths), the controller 15 controls the moving movable element 13 to move to the lower first transport path 19A (an example of the other first transport path) via the second transport path 19B, as shown in the lower part of Figure 6, to bypass the other movable element 13. Note that the other movable element 13 may be in a moving state or a stopped state. Other movable elements 13 include, for example, a movable element 13 that is inserting and removing semiconductor substrates W between itself and the processing chamber 9 (put and get), or a movable element 13 that has become unable to move due to a malfunction or the like.

[0032] Figure 7 shows an example of operation control when the movable element 13 approaches a specific processing chamber 9 from one side in the X-axis direction, and Figure 8 shows an example of operation when the movable element 13 approaches a specific processing chamber 9 from the other side in the X-axis direction. As shown in Figure 7, when the controller 15 moves the movable element 13 toward a specific processing chamber 9 connected to the upper first transport path 19A (an example of one of the first transport paths), it controls the movable element 13 to move toward the specific processing chamber 9 from the left side (an example of one side in the first direction) in the upper first transport path 19A. Also, as shown in Figure 8, when the controller 15 moves the movable element 13 toward a specific processing chamber 9 connected to the upper first transport path 19A (an example of one of the first transport paths), it controls the movable element 13 to move toward the specific processing chamber 9 from the right side (an example of the other side in the first direction), by having it wrap around from the upper first transport path 19A through the second transport path 19B and the lower first transport path 19A.

[0033] Figure 9 shows an example of motion control to prevent collisions of the movable elements 13. As shown in Figure 9, the controller 15 controls the position of each movable element 13 so that no more than two movable elements 13 are located on a single stator 11. In the example shown in Figure 9, for example, a part of the right movable element 13, which moves along arrow 29, is located on the central stator 11 of the stator unit 21, so the movement of the left movable element 13 onto the central stator 11 is prohibited. In this case, when the right movable element 13 moves along arrow 29 and passes the central stator 11, and the entire right movable element 13 (including a part of it) is no longer located on the central stator 11, the movement of the left movable element 13 onto the central stator 11 is permitted.

[0034] Figure 10 shows another example of motion control to prevent collisions of the movable elements 13. As shown in Figure 10, the controller 15 may control the position of each movable element 13 so that no more than two movable elements 13 are located on a single stator unit 21 (base 32). In the example shown in Figure 10, for example, a portion of the right movable element 13 moving along arrow 31 is located on the central stator 11 of the right stator unit 21, so the movable element 13 on the left stator unit 21 is prohibited from moving onto the right stator unit 21. In this case, the movement of the left movable element 13 onto the right stator unit 21 is permitted when the right movable element 13 moves along arrow 31 and passes the right stator unit 21, and the entirety (including a portion) of the right movable element 13 is no longer located on the right stator unit 21.

[0035] <3. Stator Unit Configuration> Next, an example of the configuration of the stator unit 21 will be described with reference to Figures 11 to 15. Figure 11 is a plan view showing an example of the configuration of the stator unit 21 as seen from above, and Figure 12 is a cross-sectional view corresponding to the XII-XII section in Figure 11, showing an example of the cross-sectional structure of the stator unit 21. Note that the covering member 34 of the stator unit 21 is not shown in Figure 11.

[0036] As shown in Figures 11 and 12, the stator unit 21 is composed of a base 32, which has a larger area than the stator 11 when viewed from above in the Z-axis direction, and a plurality of stators 11 (four in the example shown in Figure 11) arranged on the upper surface of the base 32. The stator unit 21 is configured such that the four stators 11 are arranged adjacent to each other on the upper surface of the base 32. The base 32 is formed in a roughly rectangular shape when viewed from the Z-axis direction. The upper surface of the base 32 is divided into nine regions, each divided into three equal parts in the vertical and horizontal directions, and a plurality of stators 11 are arranged in predetermined regions among the nine regions. In the example shown in Figure 11, four stators 11 are arranged in four of the nine regions, and these four stators 11 are arranged so as to be in contact with three of the four edges of the base 32 when viewed from the Z-axis direction. As a result, the four stators 11 are arranged in a roughly T-shape. The areas on the upper surface of the base 32 other than the stator 11, that is, the five areas out of the nine areas where the stator 11 is not located, are filled with resin 33.

[0037] The number of compartments on the upper surface of the base 32 may be other than nine. For example, it may be four regions divided equally in the vertical and horizontal directions (see Figures 39 to 41 below), or it may be sixteen regions divided equally in the vertical and horizontal directions. The number of compartments in the vertical and horizontal directions may also be different. Furthermore, the arrangement of the stator 11 may be other than a T-shape, such that the stator 11 is in contact with at least two of the four edges of the base 32 (see Figures 36 to 38 below).

[0038] The transport path 19 shown in Figure 1 is formed by connecting multiple stator units 21. For example, in the example shown in Figure 1, stator units 21, each having four stators 11 arranged in a roughly T-shape, are alternately arranged in the X-axis direction with one stator 11 protruding on the negative side of the Y-axis and one stator 11 protruding on the positive side of the Y-axis. Furthermore, the transport path 19 is formed by arranging the stator 11 protruding on the negative side of the Y-axis and the stator 11 protruding on the positive side of the Y-axis to be adjacent (facing each other) in the Y-axis direction.

[0039] As shown in Figure 12, the stator unit 21 has a plurality of stators 11 arranged on the upper surface of the base 32 and a covering member 34 that covers the resin 33. The covering member 34 is made of a non-magnetic material such as stainless steel. The covering member 34 is formed in a rectangular shape that is approximately the same size as the base 32 when viewed from the Z-axis direction. The lower ends of the four sides of the covering member 34 are fixed to the upper surface of the base 32 by welding or the like, and the inside of the covering member 34 is sealed.

[0040] Furthermore, as shown in Figure 12, the stator unit 21 has a sensor board 35 positioned between the base 32 and the stator 11. At least one sensor 36 for detecting the position of the movable element 13 is mounted on the sensor board 35.

[0041] Figure 13 shows an example of the arrangement of the sensor substrate and sensors in the stator unit 21. As shown in Figure 13, the sensor substrate 35 is formed in a rectangular shape that is approximately the same size as the stator 11 when viewed from the Z-axis direction, and is positioned in each of the four regions where the stator 11 is located. Multiple sensors 36 are positioned in predetermined locations on each sensor substrate 35. Note that the number and arrangement of sensors 36 shown in Figure 13 is just an example, and other numbers and arrangements may be used. The type of sensor 36 is not particularly limited, but for example, a Hall element may be used.

[0042] Figure 14 shows another example of the arrangement of sensor substrates and sensors in the stator unit 21. In the example shown in Figure 14, a sensor substrate 37 different from sensor substrate 35 is placed in the region where the stator 11 connected to the processing chamber 9 is located. In this region, the semiconductor substrate W is inserted and removed (put and get) between the movable element 13 and the processing chamber 9, so in order to detect the position of the movable element 13 with higher accuracy, a sensor 38 is placed in a predetermined position on the sensor substrate 37 in addition to the sensor 36. That is, the stator unit 21 is configured such that the number of sensors in the region where the stator 11 connected to the processing chamber 9 is located is greater than the number of sensors in the region where the stator 11 not connected to the processing chamber 9 is located. Note that sensor 38 may be the same sensor as sensor 36, or it may be a different type of sensor with higher detection accuracy than sensor 36. Also, the number and arrangement of sensors 36 and 38 shown in Figure 14 is just an example, and other numbers and arrangements may be used.

[0043] As shown in Figure 1, the vacuum transport chamber 7 includes a first stator unit 21A (a stator unit 21 positioned opposite the processing chamber 9 in the Y-axis direction) which has a stator 11 connected to the processing chamber 9, and a second stator unit 21B (a stator unit 21 positioned between the processing chambers 9 in the X-axis direction) which does not have a stator 11 connected to the processing chamber 9. The sensor arrangement in both the first stator unit 21A and the second stator unit 21B may be as shown in Figure 13. Alternatively, the sensor arrangement in the first stator unit 21A may be as shown in Figure 14, and the sensor arrangement in the second stator unit 21B may be as shown in Figure 13. In this case, the number of sensors in the first stator unit 21A connected to the processing chamber 9 will be greater than the number of sensors in the second stator unit 21B not connected to the processing chamber 9.

[0044] As shown in Figure 12, the stator unit 21 is positioned between the base 32 and the stator 11 and has a heat transfer member 39 that transfers heat generated in the stator 11 to the base 32. The heat transfer member 39 is not particularly limited, but for example, a metal plate (e.g., aluminum, copper, etc.) or a heat pipe may be used. Figure 15 shows an example of the heat transfer direction by the heat transfer member 39. As shown in Figure 15, the heat transfer member 39 is formed in a rectangular shape that is approximately the same size as the base 32 when viewed from the Z-axis direction. As shown by the arrows in Figure 15, the heat generated in each stator 11 is transferred from the four regions where the stator 11 is positioned to the surrounding area and then to the entire heat transfer member 39. As a result, the heat generated in the stator 11 is efficiently transferred from the heat transfer member 39 to the base 32.

[0045] As shown in Figure 12, a coolant piping 41 is provided inside the base 32, and coolant is introduced through the coolant inlet 41a and coolant outlet 41b. This allows the heat transferred from the heat transfer member 39 to the base 32 to be cooled more efficiently. The base 32 may also be configured without the coolant piping 41.

[0046] As shown in Figures 11 and 12, the base 32 is fixed to the bottom 7d of the vacuum transport chamber 7 by bolts 45 at four locations, for example, at the four corners. Through holes for routing stator wiring 43 are provided in each area of ​​the base 32 and the bottom 7d where the stator 11 is positioned, and the stator wiring 43 is connected to the stator 11 via wiring entry terminals 43a. In addition, although not shown in the figures, through holes for routing sensor wiring are provided in each area of ​​the base 32 and the bottom 7d where the sensor substrates 35 and 37 are positioned, and the sensor wiring is connected to the sensor substrates 35 and 37 via wiring entry terminals.

[0047] <4. Coil Unit Configuration> Next, an example of the configuration of the coil unit 22 provided by the stator 11 will be described with reference to Figures 16 to 26. Note that the substrate coils shown in Figures 16 to 18 and 21 to 26 are simplified in their illustrations by reducing the number of turns.

[0048] Figure 16 shows an example of the layer configuration of the coil unit 22. As shown in Figure 16, the coil unit 22 has a first substrate coil unit 47 and a second substrate coil unit 49. The first substrate coil unit 47 and the second substrate coil unit 49 are stacked in the Z-axis direction, for example, via an insulating layer 51. The first substrate coil unit 47 is a coil unit with the X-axis direction as its longitudinal direction, and the second substrate coil unit 49 is a coil unit with the Y-axis direction as its longitudinal direction. The first substrate coil unit 47 is configured as a multilayer substrate, and is formed as a coil unit by stacking and integrating a plurality (3 layers in the example shown in Figure 16) of first substrate coils 53A, 53B, 53C and a plurality (2 layers in the example shown in Figure 16) of insulating layers 55 arranged between the first substrate coils in the Z-axis direction. The second substrate coil unit 49 is configured as a multilayer substrate, and is formed by stacking and integrating multiple (three layers in the example shown in Figure 16) second substrate coils 57A, 57B, and 57C and multiple (two layers in the example shown in Figure 16) insulating layers 59 placed between the second substrate coils in the Z-axis direction, thereby forming a coil unit.

[0049] The first substrate coil 53A has two sets of first substrate coils 53A1 and 53A2. The first substrate coils 53A1 and 53A2 are arranged adjacent to each other along the Y-axis. The first substrate coil 53A1 has a first substrate coil 53A1u corresponding to the U phase, a first substrate coil 53A1v corresponding to the V phase, and a first substrate coil 53A1w corresponding to the W phase. The first substrate coils 53A1u, 53A1v, and 53A1w are arranged adjacent to each other along the Y-axis. Similarly, the first substrate coil 53A2 has a first substrate coil 53A2u corresponding to the U phase, a first substrate coil 53A2v corresponding to the V phase, and a first substrate coil 53A2w corresponding to the W phase. The first substrate coils 53A2u, 53A2v, and 53A2w are arranged adjacent to each other along the Y-axis.

[0050] The first substrate coil 53B has two sets of first substrate coils 53B1 and 53B2 (not shown in Figure 16). The first substrate coils 53B1 and 53B2 are arranged adjacent to each other along the Y-axis. The first substrate coil 53B1 has a first substrate coil 53B1u corresponding to the U phase, a first substrate coil 53B1v corresponding to the V phase, and a first substrate coil 53B1w corresponding to the W phase. The first substrate coils 53B1u, 53B1v, and 53B1w are arranged adjacent to each other along the Y-axis. Similarly, the first substrate coil 53B2 has a first substrate coil 53B2u corresponding to the U phase, a first substrate coil 53B2v corresponding to the V phase, and a first substrate coil 53B2w corresponding to the W phase. The first substrate coils 53B2u, 53B2v, and 53B2w are arranged adjacent to each other along the Y-axis.

[0051] The first substrate coil 53C consists of two sets of first substrate coils 53C1 and 53C2 (these are denoted by reference numerals in Figure 16). The first substrate coils 53C1 and 53C2 are arranged adjacent to each other along the Y-axis. The first substrate coil 53C1 has a first substrate coil 53C1u corresponding to the U phase, a first substrate coil 53C1v corresponding to the V phase, and a first substrate coil 53C1w corresponding to the W phase. The first substrate coils 53C1u, 53C1v, and 53C1w are arranged adjacent to each other along the Y-axis. Similarly, the first substrate coil 53C2 has a first substrate coil 53C2u corresponding to the U phase, a first substrate coil 53C2v corresponding to the V phase, and a first substrate coil 53C2w corresponding to the W phase. The first substrate coils 53C2u, 53C2v, and 53C2w are arranged adjacent to each other along the Y-axis.

[0052] The second substrate coil 57A has two sets of second substrate coils 57A1 and 57A2. The second substrate coils 57A1 and 57A2 are arranged adjacent to each other along the X-axis. The second substrate coil 57A1 has a second substrate coil 57A1u corresponding to the U phase, a second substrate coil 57A1v corresponding to the V phase, and a second substrate coil 57A1w corresponding to the W phase. The second substrate coils 57A1u, 57A1v, and 57A1w are arranged adjacent to each other along the X-axis. Similarly, the second substrate coil 57A2 has a second substrate coil 57A2u corresponding to the U phase, a second substrate coil 57A2v corresponding to the V phase, and a second substrate coil 57A2w corresponding to the W phase. The second substrate coils 57A2u, 57A2v, and 57A2w are arranged adjacent to each other along the X-axis.

[0053] The second substrate coil 57B has two sets of second substrate coils 57B1 and 57B2 (not shown in Figure 16). The second substrate coils 57B1 and 57B2 are arranged adjacent to each other along the X-axis direction. The second substrate coil 57B1 has a second substrate coil 57B1u corresponding to the U phase, a second substrate coil 57B1v corresponding to the V phase, and a second substrate coil 57B1w corresponding to the W phase. The second substrate coils 57B1u, 57B1v, and 57B1w are arranged adjacent to each other along the X-axis direction. Similarly, the second substrate coil 57B2 has a second substrate coil 57B2u corresponding to the U phase, a second substrate coil 57B2v corresponding to the V phase, and a second substrate coil 57B2w corresponding to the W phase. The second substrate coils 57B2u, 57B2v, and 57B2w are arranged adjacent to each other along the X-axis direction.

[0054] The second substrate coil 57C has two sets of second substrate coils 57C1 and 57C2 (notation omitted in Figure 16). The second substrate coils 57C1 and 57C2 are arranged adjacent to each other along the X-axis. The second substrate coil 57C1 has a second substrate coil 57C1u corresponding to the U phase, a second substrate coil 57C1v corresponding to the V phase, and a second substrate coil 57C1w corresponding to the W phase. The second substrate coils 57C1u, 57C1v, and 57C1w are arranged adjacent to each other along the X-axis. Similarly, the second substrate coil 57C2 has a second substrate coil 57C2u corresponding to the U phase, a second substrate coil 57C2v corresponding to the V phase, and a second substrate coil 57C2w corresponding to the W phase. The second substrate coils 57C2u, 57C2v, and 57C2w are arranged adjacent to each other along the X-axis.

[0055] Furthermore, the first substrate coil unit 47 or the second substrate coil unit 49 may have a configuration other than three layers. For example, it may be a single-layer configuration consisting of one substrate coil, or it may be a multilayer substrate with a number of layers other than three. Also, although the above configuration uses two sets of substrate coils arranged in parallel, with U-phase, V-phase, and W-phase substrate coils as one set, it may also use one set of substrate coils, or a configuration in which three or more sets of substrate coils are arranged in parallel.

[0056] Figure 17 shows an example of the layer configuration of the first substrate coil unit 47. Note that the insulating layer 55 is not shown in Figure 17. As shown in Figure 17, the first substrate coils 53A, 53B, and 53C of the first substrate coil unit 47 each consist of a first substrate 61A, 61B, and 61C made of an insulating material (e.g., resin), and a first coil pattern formed on the front and back surfaces of the first substrates 61A, 61B, and 61C, respectively. That is, the first substrate coils 53A, 53B, and 53C are printed circuit boards on which the first coil pattern is formed as a wiring pattern by printing technology on the first substrates 61A, 61B, and 61C. Printing technology includes, for example, forming a thin film such as copper foil on the substrate, applying a photoresist to expose the coil pattern, and then removing the unnecessary thin film by etching.

[0057] The first substrate coil 53A is constructed by forming a roughly rectangular spiral first coil pattern 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, 63A2w on the surface 61Aa (the upper surface in the Z-axis direction; an example of the first surface) of the first substrate 61A, with the X-axis direction as its longitudinal direction, and forming a first coil pattern 63B1u, 63B1v, 63B1w, 63B2u, 63B2v, 63B2w on the back surface 61Ab (the lower surface in the Z-axis direction; an example of the second surface) of the first substrate 61A. The first substrate 61A may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The X-axis direction is the direction along the surface 61Aa or back surface 61Ab of the first substrate 61A.

[0058] The first coil pattern 63A1u is formed in a roughly rectangular spiral shape with the X-axis as its longitudinal direction, such that its starting end EA1 (an example of one end) in the direction of current flow is located near the edge of the first substrate coil 53A1u (see Figure 16), and its ending end EA2 (an example of the other end) is located near the center of the first substrate coil 53A1u in the Y-axis direction. The first coil pattern 63A1u is spiral in a clockwise direction when viewed from above in the Z-axis direction with respect to the direction of current flow. The first coil pattern 63B1u is formed in a region that overlaps with the first coil pattern 63A1u when viewed from the Z-axis direction. The first coil pattern 63B1u is formed in a roughly rectangular spiral shape with the X-axis as its longitudinal direction, such that its starting end EB1 in the direction of current flow is located near the center of the first substrate coil 53A1u in the Y-axis direction, and its ending end EB2 is located near the edge of the first substrate coil 53A1u. The first coil pattern 63B1u is spiral-shaped in a clockwise direction when viewed from above in the Z-axis direction with respect to the direction of current flow. The first coil pattern 63A1u and the first coil pattern 63B1u are formed such that their wiring patterns overlap when viewed in the Z-axis direction. The end EA2 of the first coil pattern 63A1u and the start EB1 of the first coil pattern 63B1u are electrically connected by a through-hole TH that penetrates the first substrate 61A. The first coil patterns 63A1u, 63B1u and the first substrate 61A configured as described above form a concentrated-winding first substrate coil 53A1u (see Figure 16).

[0059] The first coil patterns 63A1v and 63B1v are configured in the same way as the first coil patterns 63A1u and 63B1u. The first coil patterns 63A1v and 63B1v and the first substrate 61A form a concentrated winding first substrate coil 53A1v (see Figure 16). The first coil patterns 63A1w and 63B1w are configured in the same way as the first coil patterns 63A1u and 63B1u. The first coil patterns 63A1w and 63B1w and the first substrate 61A form a concentrated winding first substrate coil 53A1w (see Figure 16). The first coil patterns 63A2u and 63B2u are configured in the same way as the first coil patterns 63A1u and 63B1u. The first coil patterns 63A2u and 63B2u and the first substrate 61A form a concentrated winding first substrate coil 53A2u (see Figure 16). The first coil patterns 63A2v and 63B2v are configured in the same manner as the first coil patterns 63A1u and 63B1u. The first coil patterns 63A2v, 63B2v and the first substrate 61A form a concentrated winding first substrate coil 53A2v (see Figure 16). The first coil patterns 63A2w and 63B2w are configured in the same manner as the first coil patterns 63A1u and 63B1u. The first coil patterns 63A2w, 63B2w and the first substrate 61A form a concentrated winding first substrate coil 53A2w (see Figure 16).

[0060] The first substrate coil 53B is constructed by forming a roughly rectangular spiral first coil pattern 65A1u, 65A1v, 65A1w, 65A2u, 65A2v, 65A2w on the surface 61Ba (upper surface in the Z-axis direction; an example of the first surface) of the first substrate 61B, with the X-axis direction as the longitudinal direction, and forming a first coil pattern 65B1u, 65B1v, 65B1w, 65B2u, 65B2v, 65B2w on the back surface 61Bb (lower surface in the Z-axis direction; an example of the second surface) of the first substrate 61B. The first substrate 61B may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The X-axis direction is along the surface 61Ba or back surface 61Bb of the first substrate 61B.

[0061] The first coil patterns 65A1u and 65B1u are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A1u and 65B1u and the first substrate 61B form a concentrated winding first substrate coil 53B1u (see Figure 16). The first coil patterns 65A1v and 65B1v are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A1v and 65B1v and the first substrate 61B form a concentrated winding first substrate coil 53B1v (see Figure 16). The first coil patterns 65A1w and 65B1w are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A1w and 65B1w and the first substrate 61B form a concentrated winding first substrate coil 53B1w (see Figure 16). The first coil patterns 65A2u and 65B2u are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A2u, 65B2u and the first substrate 61B form a concentrated winding first substrate coil 53B2u (see Figure 16). The first coil patterns 65A2v and 65B2v are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A2v, 65B2v and the first substrate 61B form a concentrated winding first substrate coil 53B2v (see Figure 16). The first coil patterns 65A2w and 65B2w are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 65A2w, 65B2w and the first substrate 61B form a concentrated winding first substrate coil 53B2w (see Figure 16).

[0062] The terminal EB2 of the first coil pattern 63B1u of the first board coil 53A and the starting end EA1 of the first coil pattern 65A1u of the first board coil 53B are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 63B1v of the first board coil 53A and the starting end EA1 of the first coil pattern 65A1v of the first board coil 53B are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 63B1w of the first board coil 53A and the starting end EA1 of the first coil pattern 65A1w of the first board coil 53B are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 63B2u of the first board coil 53A and the starting end EA1 of the first coil pattern 65A2u of the first board coil 53B are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 63B2v of the first substrate coil 53A and the starting end EA1 of the first coil pattern 65A2v of the first substrate coil 53B are electrically connected by a connecting wire 67. Likewise, the terminal EB2 of the first coil pattern 63B2w of the first substrate coil 53A and the starting end EA1 of the first coil pattern 65A2w of the first substrate coil 53B are electrically connected by a connecting wire 67. The connecting wire 67 may be provided inside or outside the first substrate coils 53A and 53B in the XY plane.

[0063] The first substrate coil 53C is constructed by forming a roughly rectangular spiral first coil pattern 69A1u, 69A1v, 69A1w, 69A2u, 69A2v, 69A2w on the surface 61Ca (upper surface in the Z-axis direction; an example of the first surface) of the first substrate 61C, with the X-axis direction as the longitudinal direction, and forming a first coil pattern 69B1u, 69B1v, 69B1w, 69B2u, 69B2v, 69B2w on the back surface 61Cb (lower surface in the Z-axis direction; an example of the second surface) of the first substrate 61C. The first substrate 61C may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The X-axis direction is along the surface 61Ca or back surface 61Cb of the first substrate 61C.

[0064] The first coil patterns 69A1u and 69B1u are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A1u and 69B1u and the first substrate 61C form a concentrated winding first substrate coil 53C1u (see Figure 16). The first coil patterns 69A1v and 69B1v are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A1v and 69B1v and the first substrate 61C form a concentrated winding first substrate coil 53C1v (see Figure 16). The first coil patterns 69A1w and 69B1w are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A1w and 69B1w and the first substrate 61C form a concentrated winding first substrate coil 53C1w (see Figure 16). The first coil patterns 69A2u and 69B2u are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A2u and 69B2u and the first substrate 61C form a concentrated winding first substrate coil 53C2u (see Figure 16). The first coil patterns 69A2v and 69B2v are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A2v and 69B2v and the first substrate 61C form a concentrated winding first substrate coil 53C2v (see Figure 16). The first coil patterns 69A2w and 69B2w are configured in the same way as the first coil patterns 63A1u and 63B1u described above. The first coil patterns 69A2w, 69B2w and the first substrate 61C form a concentrated winding first substrate coil 53C2w (see Figure 16).

[0065] The terminal EB2 of the first coil pattern 65B1u of the first board coil 53B and the starting end EA1 of the first coil pattern 69A1u of the first board coil 53C are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 65B1v of the first board coil 53B and the starting end EA1 of the first coil pattern 69A1v of the first board coil 53C are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 65B1w of the first board coil 53B and the starting end EA1 of the first coil pattern 69A1w of the first board coil 53C are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 65B2u of the first board coil 53B and the starting end EA1 of the first coil pattern 69A2u of the first board coil 53C are electrically connected by a connecting wire 67. Similarly, the terminal EB2 of the first coil pattern 65B2v of the first substrate coil 53B and the starting end EA1 of the first coil pattern 69A2v of the first substrate coil 53C are electrically connected by a connecting wire 67. Likewise, the terminal EB2 of the first coil pattern 65B2w of the first substrate coil 53B and the starting end EA1 of the first coil pattern 69A2w of the first substrate coil 53C are electrically connected by a connecting wire 67. The connecting wire 67 may be provided inside or outside the first substrate coils 53B and 53C in the XY plane.

[0066] The first substrate coil unit 47 has first current inlet sections 71u1, 71v1, 71w1, 71u2, 71v2, and 71w2 for supplying current to the first substrate coil. The first current inlet sections 71u1, 71v1, 71w1, 71u2, 71v2, and 71w2 are concentrated at the positive end (one example) in the X-axis direction. For example, the first current inlet section 71u1 is connected to the starting end EA1 of the first coil pattern 63A1u on the surface 61Aa of the first substrate 61A. The first current inlet section 71v1 is connected to the starting end EA1 of the first coil pattern 63A1v on the surface 61Aa of the first substrate 61A. The first current inlet section 71w1 is connected to the starting end EA1 of the first coil pattern 63A1w on the surface 61Aa of the first substrate 61A. The first current inlet 71u2 is connected to the starting end EA1 of the first coil pattern 63A2u on the surface 61Aa of the first substrate 61A. The first current inlet 71v2 is connected to the starting end EA1 of the first coil pattern 63A2v on the surface 61Aa of the first substrate 61A. The first current inlet 71w2 is connected to the starting end EA1 of the first coil pattern 63A2w on the surface 61Aa of the first substrate 61A.

[0067] The first substrate coil unit 47 has first neutral points 73A and 73B (see also Figure 23) that connect multiple first substrate coils with different phases (three in total: U-phase, V-phase, and W-phase). The first neutral points 73A and 73B are concentrated at the positive end (one example) in the X-axis direction. For example, the first neutral point 73A connects the termination EB2 of the first coil pattern 69B1u, the termination EB2 of the first coil pattern 69B1v, and the termination EB2 of the first coil pattern 69B1w on the back surface 61Cb of the first substrate 61C (see also Figure 23). The first neutral point 73B connects the termination EB2 of the first coil pattern 69B2u, the termination EB2 of the first coil pattern 69B2v, and the termination EB2 of the first coil pattern 69B2w on the back surface 61Cb of the first substrate 61C (see also Figure 23).

[0068] With the above configuration, a star connection (Y connection) is formed, in which current flowing in from the first current inlet 71u1 flows through the first coil patterns 63A1u, 63B1u, 65A1u, 65B1u, 69A1u, 69B1u and flows into the first neutral point 73A; current flowing in from the first current inlet 71v1 flows through the first coil patterns 63A1v, 63B1v, 65A1v, 65B1v, 69A1v, 69B1v and flows into the first neutral point 73A; and current flowing in from the first current inlet 71w1 flows through the first coil patterns 63A1w, 63B1w, 65A1w, 65B1w, 69A1w, 69B1w and flows into the first neutral point 73A. Similarly, the current flowing in from the first current inlet 71u2 flows through the first coil patterns 63A2u, 63B2u, 65A2u, 65B2u, 69A2u, 69B2u and flows into the first neutral point 73B; the current flowing in from the first current inlet 71v2 flows through the first coil patterns 63A2v, 63B2v, 65A2v, 65B2v, 69A2v, 69B2v and flows into the first neutral point 73B; and the current flowing in from the first current inlet 71w2 flows through the first coil patterns 63A2w, 63B2w, 65A2w, 65B2w, 69A2w, 69B2w and flows into the first neutral point 73B, thus forming a star connection (Y connection).

[0069] Figure 18 shows an example of the layer configuration of the second substrate coil unit 49. Note that the insulating layer 59 is not shown in Figure 18. As shown in Figure 18, the second substrate coils 57A, 57B, and 57C of the second substrate coil unit 49 each consist of a second substrate 75A, 75B, and 75C made of an insulating material (e.g., resin), and a second coil pattern formed on the front and back surfaces of the second substrates 75A, 75B, and 75C, respectively. That is, the second substrate coils 57A, 57B, and 57C are printed circuit boards on which the second coil pattern is formed as a wiring pattern by printing technology on the second substrates 75A, 75B, and 75C. Printing technology includes, for example, forming a thin film such as copper foil on the substrate, applying a photoresist to expose the coil pattern, and then removing the unnecessary thin film by etching. Note that the second substrates 75A, 75B, and 75C are different substrates from the first substrates 61A, 61B, and 61C.

[0070] The second substrate coil 57A is constructed by forming a roughly rectangular spiral second coil pattern 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, 77A2w on the surface 75Aa (the upper surface in the Z-axis direction; an example of the first surface) of the second substrate 75A, with the Y-axis direction as its longitudinal direction, and forming a second coil pattern 77B1u, 77B1v, 77B1w, 77B2u, 77B2v, 77B2w on the back surface 75Ab (the lower surface in the Z-axis direction; an example of the second surface) of the second substrate 75A. The second substrate 75A may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The Y-axis direction is along the surface 75Aa or the back surface 75Ab of the second substrate 75A.

[0071] The second coil pattern 77A1u is formed in a roughly rectangular spiral shape with the Y-axis as its longitudinal direction, such that its starting end EA1 (an example of one end) in the direction of current flow is located near the edge of the second substrate coil 57A1u (see Figure 16), and its ending end EA2 (an example of the other end) is located near the center of the second substrate coil 57A1u in the X-axis direction. The second coil pattern 77A1u is spiral in a clockwise direction when viewed from above in the Z-axis direction with respect to the direction of current flow. The second coil pattern 77B1u is formed in a region that overlaps with the second coil pattern 77A1u when viewed from the Z-axis direction. The second coil pattern 77B1u is formed in a roughly rectangular spiral shape with the Y-axis as its longitudinal direction, such that its starting end EB1 in the direction of current flow is located near the center of the second substrate coil 57A1u in the X-axis direction, and its ending end EB2 is located near the edge of the second substrate coil 57A1u. The second coil pattern 77B1u is spiral-shaped in a clockwise direction when viewed from the upper side in the Z-axis direction with respect to the direction of current flow. The second coil pattern 77A1u and the second coil pattern 77B1u are formed such that their wiring patterns overlap when viewed from the Z-axis direction. The end EA2 of the second coil pattern 77A1u and the start EB1 of the second coil pattern 77B1u are electrically connected by a through-hole TH that penetrates the second substrate 75A. The second coil patterns 77A1u, 77B1u and the second substrate 75A configured as described above form a concentrated winding second substrate coil 57A1u (see Figure 16).

[0072] The second coil patterns 77A1v and 77B1v are configured in the same way as the second coil patterns 77A1u and 77B1u. The second coil patterns 77A1v and 77B1v and the second substrate 75A form a concentrated winding second substrate coil 57A1v (see Figure 16). The second coil patterns 77A1w and 77B1w are configured in the same way as the second coil patterns 77A1u and 77B1u. The second coil patterns 77A1w and 77B1w and the second substrate 75A form a concentrated winding second substrate coil 57A1w (see Figure 16). The second coil patterns 77A2u and 77B2u are configured in the same way as the second coil patterns 77A1u and 77B1u. The second coil patterns 77A2u and 77B2u and the second substrate 75A form a concentrated winding second substrate coil 57A2u (see Figure 16). The second coil patterns 77A2v and 77B2v are configured in the same way as the second coil patterns 77A1u and 77B1u. The second coil patterns 77A2v, 77B2v and the second substrate 75A form a concentrated winding second substrate coil 57A2v (see Figure 16). The second coil patterns 77A2w and 77B2w are configured in the same way as the second coil patterns 77A1u and 77B1u. The second coil patterns 77A2w, 77B2w and the second substrate 75A form a concentrated winding second substrate coil 57A2w (see Figure 16).

[0073] The second substrate coil 57B is constructed by forming a roughly rectangular spiral second coil pattern 79A1u, 79A1v, 79A1w, 79A2u, 79A2v, 79A2w on the surface 75Ba (upper surface in the Z-axis direction; an example of the first surface) of the second substrate 75B, with the Y-axis direction as its longitudinal direction, and forming a second coil pattern 79B1u, 79B1v, 79B1w, 79B2u, 79B2v, 79B2w on the back surface 75Bb (lower surface in the Z-axis direction; an example of the second surface) of the second substrate 75B. The second substrate 75B may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The Y-axis direction is along the surface 75Ba or back surface 75Bb of the second substrate 75B.

[0074] The second coil patterns 79A1u and 79B1u are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A1u and 79B1u and the second substrate 75B form a concentrated winding second substrate coil 57B1u (see Figure 16). The second coil patterns 79A1v and 79B1v are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A1v and 79B1v and the second substrate 75B form a concentrated winding second substrate coil 57B1v (see Figure 16). The second coil patterns 79A1w and 79B1w are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A1w and 79B1w and the second substrate 75B form a concentrated winding second substrate coil 57B1w (see Figure 16). The second coil patterns 79A2u and 79B2u are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A2u, 79B2u and the second substrate 75B form a concentrated winding second substrate coil 57B2u (see Figure 16). The second coil patterns 79A2v and 79B2v are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A2v, 79B2v and the second substrate 75B form a concentrated winding second substrate coil 57B2v (see Figure 16). The second coil patterns 79A2w and 79B2w are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 79A2w, 79B2w and the second substrate 75B form a concentrated winding second substrate coil 57B2w (see Figure 16).

[0075] The terminal EB2 of the second coil pattern 77B1u of the second board coil 57A and the starting end EA1 of the second coil pattern 79A1u of the second board coil 57B are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 77B1v of the second board coil 57A and the starting end EA1 of the second coil pattern 79A1v of the second board coil 57B are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 77B1w of the second board coil 57A and the starting end EA1 of the second coil pattern 79A1w of the second board coil 57B are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 77B2u of the second board coil 57A and the starting end EA1 of the second coil pattern 79A2u of the second board coil 57B are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 77B2v of the second substrate coil 57A and the starting end EA1 of the second coil pattern 79A2v of the second substrate coil 57B are electrically connected by a connecting wire 81. Likewise, the terminal EB2 of the second coil pattern 77B2w of the second substrate coil 57A and the starting end EA1 of the second coil pattern 79A2w of the second substrate coil 57B are electrically connected by a connecting wire 81. Note that the connecting wire 81 may be provided inside or outside the second substrate coils 57A and 57B in the XY plane.

[0076] The second substrate coil 57C is constructed by forming a roughly rectangular spiral second coil pattern 83A1u, 83A1v, 83A1w, 83A2u, 83A2v, 83A2w on the surface 75Ca (upper surface in the Z-axis direction; an example of the first surface) of the second substrate 75C, with the Y-axis direction as its longitudinal direction, and forming a second coil pattern 83B1u, 83B1v, 83B1w, 83B2u, 83B2v, 83B2w on the back surface 75Cb (lower surface in the Z-axis direction; an example of the second surface) of the second substrate 75C. The second substrate 75C may be separated into three phases: U-phase, V-phase, and W-phase, or into each of the U-phase, V-phase, and W-phase. The Y-axis direction is along the surface 75Ca or back surface 75Cb of the second substrate 75C.

[0077] The second coil patterns 83A1u and 83B1u are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A1u and 83B1u and the second substrate 75C form a concentrated winding second substrate coil 57C1u (see Figure 16). The second coil patterns 83A1v and 83B1v are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A1v and 83B1v and the second substrate 75C form a concentrated winding second substrate coil 57C1v (see Figure 16). The second coil patterns 83A1w and 83B1w are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A1w and 83B1w and the second substrate 75C form a concentrated winding second substrate coil 57C1w (see Figure 16). The second coil patterns 83A2u and 83B2u are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A2u, 83B2u and the second substrate 75C form a concentrated winding second substrate coil 57C2u (see Figure 16). The second coil patterns 83A2v and 83B2v are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A2v, 83B2v and the second substrate 75C form a concentrated winding second substrate coil 57C2v (see Figure 16). The second coil patterns 83A2w and 83B2w are configured in the same way as the second coil patterns 77A1u and 77B1u described above. The second coil patterns 83A2w, 83B2w and the second substrate 75C form a concentrated winding second substrate coil 57C2w (see Figure 16).

[0078] The terminal EB2 of the second coil pattern 79B1u of the second board coil 57B and the starting end EA1 of the second coil pattern 83A1u of the second board coil 57C are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 79B1v of the second board coil 57B and the starting end EA1 of the second coil pattern 83A1v of the second board coil 57C are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 79B1w of the second board coil 57B and the starting end EA1 of the second coil pattern 83A1w of the second board coil 57C are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 79B2u of the second board coil 57B and the starting end EA1 of the second coil pattern 83A2u of the second board coil 57C are electrically connected by a connecting wire 81. Similarly, the terminal EB2 of the second coil pattern 79B2v of the second substrate coil 57B and the starting end EA1 of the second coil pattern 83A2v of the second substrate coil 57C are electrically connected by a connecting wire 81. Likewise, the terminal EB2 of the second coil pattern 79B2w of the second substrate coil 57B and the starting end EA1 of the second coil pattern 83A2w of the second substrate coil 57C are electrically connected by a connecting wire 81. The connecting wire 81 may be provided inside or outside the second substrate coils 57B and 57C in the XY plane.

[0079] The second substrate coil unit 49 has second current inlet sections 83u1, 83v1, 83w1, 83u2, 83v2, and 83w2 for supplying current to the second substrate coil. The second current inlet sections 83u1, 83v1, 83w1, 83u2, 83v2, and 83w2 are concentrated at the positive side (one example) end in the Y-axis direction. For example, the second current inlet section 83u1 is connected to the starting end EA1 of the second coil pattern 77A1u on the surface 75Aa of the second substrate 75A. The second current inlet section 83v1 is connected to the starting end EA1 of the second coil pattern 77A1v on the surface 75Aa of the second substrate 75A. The second current inlet section 83w1 is connected to the starting end EA1 of the second coil pattern 77A1w on the surface 75Aa of the second substrate 75A. The second current inlet 83u2 is connected to the starting end EA1 of the second coil pattern 77A2u on the surface 75Aa of the second substrate 75A. The second current inlet 83v2 is connected to the starting end EA1 of the second coil pattern 77A2v on the surface 75Aa of the second substrate 75A. The second current inlet 83w2 is connected to the starting end EA1 of the second coil pattern 77A2w on the surface 75Aa of the second substrate 75A.

[0080] The second substrate coil unit 49 has second neutral points 85A and 85B (see also Figure 26) that connect multiple second substrate coils with different phases (three in total: U-phase, V-phase, and W-phase). The second neutral points 85A and 85B are concentrated at the positive side (one example) in the Y-axis direction. For example, the second neutral point 85A connects the termination EB2 of the second coil pattern 83B1u, the termination EB2 of the second coil pattern 83B1v, and the termination EB2 of the second coil pattern 83B1w on the back surface 75Cb of the second substrate 75C (see also Figure 26). The second neutral point 85B connects the termination EB2 of the second coil pattern 83B2u, the termination EB2 of the second coil pattern 83B2v, and the termination EB2 of the second coil pattern 83B2w on the back surface 75Cb of the second substrate 75C (see also Figure 26).

[0081] With the above configuration, a star connection (Y connection) is formed, in which current flowing in from the second current inlet 83u1 flows through the second coil patterns 77A1u, 77B1u, 79A1u, 79B1u, 83A1u, 83B1u and flows into the second neutral point 85A; current flowing in from the second current inlet 83v1 flows through the second coil patterns 77A1v, 77B1v, 79A1v, 79B1v, 83A1v, 83B1v and flows into the second neutral point 85A; and current flowing in from the second current inlet 83w1 flows through the second coil patterns 77A1w, 77B1w, 79A1w, 79B1w, 83A1w, 83B1w and flows into the second neutral point 85A. Similarly, current flowing in from the second current inlet 83u2 flows through the second coil patterns 77A2u, 77B2u, 79A2u, 79B2u, 83A2u, 83B2u and flows into the second neutral point 85B; current flowing in from the second current inlet 83v2 flows through the second coil patterns 77A2v, 77B2v, 79A2v, 79B2v, 83A2v, 83B2v and flows into the second neutral point 85B; and current flowing in from the second current inlet 83w2 flows through the second coil patterns 77A2w, 77B2w, 79A2w, 79B2w, 83A2w, 83B2w and flows into the second neutral point 85B, thus forming a star connection (Y connection).

[0082] Figure 19 conceptually shows an example of the layer configuration of the first substrate coil unit 47. The symbols of each first coil pattern in Figure 19 correspond to those in Figure 17. As shown in Figure 19, the first substrate coil unit 47 consists of first coil patterns 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, 63A2w, a first substrate 61A, first coil patterns 63B1u, 63B1v, 63B1w, 63B2u, 63B2v, 63B2w, an insulating layer 55, and first coil patterns 65A1u, 65A1v, 65A1w, 65A2u, 65A2v, 65A2w The first substrate 61B, the first coil patterns 65B1u, 65B1v, 65B1w, 65B2u, 65B2v, 65B2w, the insulating layer 55, the first coil patterns 69A1u, 69A1v, 69A1w, 69A2u, 69A2v, 69A2w, the first substrate 61C, and the first coil patterns 69B1u, 69B1v, 69B1w, 69B2u, 69B2v, 69B2w are stacked in the Z-axis direction.

[0083] The first coil patterns 63A1u, 63B1u, 65A1u, 65B1u, 69A1u, 69B1u, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned U-phase substrate coil Uy1. The first coil patterns 63A1v, 63B1v, 65A1v, 65B1v, 69A1v, 69B1v, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned V-phase substrate coil Vy1. The first coil patterns 63A1w, 63B1w, 65A1w, 65B1w, 69A1w, 69B1w, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned W-phase substrate coil Wy1. The substrate coils Uy1, Vy1, and Wy1 constitute the aforementioned first substrate coil 23A.

[0084] Furthermore, the first coil patterns 63A2u, 63B2u, 65A2u, 65B2u, 69A2u, 69B2u, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned U-phase substrate coil Uy2. The first coil patterns 63A2v, 63B2v, 65A2v, 65B2v, 69A2v, 69B2v, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned V-phase substrate coil Vy2. The first coil patterns 63A2w, 63B2w, 65A2w, 65B2w, 69A2w, 69B2w, the first substrates 61A, 61B, 61C, and the insulating layer 55 correspond to the aforementioned W-phase substrate coil Wy2. The substrate coils Uy2, Vy2, and Wy2 constitute the aforementioned first substrate coil 23B.

[0085] Figure 20 conceptually shows an example of the layer configuration of the second substrate coil unit 49. The symbols for each second coil pattern in Figure 20 correspond to those in Figure 18. As shown in Figure 20, the second substrate coil unit 49 consists of second coil patterns 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, 77A2w, a second substrate 75A, second coil patterns 77B1u, 77B1v, 77B1w, 77B2u, 77B2v, 77B2w, an insulating layer 59, and second coil patterns 79A1u, 79A1v, 79A1w, 79A2u, 79A2v, 79A2w The second substrate 75B, the second coil patterns 79B1u, 79B1v, 79B1w, 79B2u, 79B2v, 79B2w, the insulating layer 59, the second coil patterns 83A1u, 83A1v, 83A1w, 83A2u, 83A2v, 83A2w, the second substrate 75C, and the second coil patterns 83B1u, 83B1v, 83B1w, 83B2u, 83B2v, 83B2w are stacked in the Z-axis direction.

[0086] The second coil patterns 77A1u, 77B1u, 79A1u, 79B1u, 83A1u, 83B1u, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned U-phase substrate coil Ux1. The second coil patterns 77A1v, 77B1v, 79A1v, 79B1v, 83A1v, 83B1v, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned V-phase substrate coil Vx1. The second coil patterns 77A1w, 77B1w, 79A1w, 79B1w, 83A1w, 83B1w, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned W-phase substrate coil Wx1. The substrate coils Ux1, Vx1, and Wx1 constitute the aforementioned second substrate coil 25A.

[0087] Furthermore, the second coil patterns 77A2u, 77B2u, 79A2u, 79B2u, 83A2u, 83B2u, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned U-phase substrate coil Ux2. The second coil patterns 77A2v, 77B2v, 79A2v, 79B2v, 83A2v, 83B2v, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned V-phase substrate coil Vx2. The second coil patterns 77A2w, 77B2w, 79A2w, 79B2w, 83A2w, 83B2w, the second substrates 75A, 75B, 75C, and the insulating layer 59 correspond to the aforementioned W-phase substrate coil Wx2. The substrate coils Ux2, Vx2, and Wx2 constitute the aforementioned second substrate coil 25B.

[0088] Figures 21 to 23 show an example of the shape of the first coil pattern in the first substrate coil unit 47. Figure 21 is a view of the first substrate coil 53A from above in the Z-axis direction. As shown in Figure 21, the first coil patterns 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, and 63A2w are formed on the surface 61Aa of the first substrate 61A.

[0089] The first coil pattern 63A1u has a plurality of first longitudinal coil pattern portions 87 extending in the X-axis direction and a plurality of first short coil pattern portions 89 extending in the Y-axis direction. The first coil pattern 63A1u is formed in a substantially rectangular spiral shape by connecting the first longitudinal coil pattern portions 87 and the first short coil pattern portions 89 at substantially right angles. As described above, the first coil pattern 63A1u is formed in a substantially rectangular spiral shape with the X-axis direction as its longitudinal direction such that the starting end EA1 (an example of one end) in the direction of current flow is located near the edge of the first coil pattern 63A1u (first substrate coil 53A1u) and the ending end EA2 (an example of the other end) is located near the center position of the first coil pattern 63A1u (first substrate coil 53A1u) in the Y-axis direction. The first coil pattern 63A1u is spiral in a clockwise direction when viewed from above in the Z-axis direction with respect to the direction of current flow.

[0090] The first substrate coil 53A1u (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 63A1u extends in the Y-axis direction. The first coil end portions 91 are roughly triangular regions where the first short coil pattern portions 89 are arranged. The first current inlet portion 71u1 connected to the start end EA1 is located at the positive side (one example) end in the X-axis direction. The first current inlet portion 71u1 is located in the first coil end portion 91.

[0091] The first coil patterns 63A1v, 63A1w, 63A2u, 63A2v, and 63A2w are also formed in the same shape as the first coil pattern 63A1u described above.

[0092] Figure 22 is a view of the first substrate coil 53A seen from above in the Z-axis direction, with light passing through the first substrate 61A. As shown in Figure 22, the first coil patterns 63B1u, 63B1v, 63B1w, 63B2u, 63B2v, and 63B2w are formed on the back surface 61Ab of the first substrate 61A.

[0093] The first coil pattern 63B1u has a plurality of first longitudinal coil pattern portions 93 extending in the X-axis direction and a plurality of first short coil pattern portions 95 extending in the Y-axis direction. The first coil pattern 63B1u is formed in a substantially rectangular spiral shape by connecting the first longitudinal coil pattern portions 93 and the first short coil pattern portions 95 at substantially right angles. As mentioned above, the first coil pattern 63B1u is formed in a region that overlaps with the first coil pattern 63A1u when viewed from the Z-axis direction. The first coil pattern 63B1u is formed in a substantially rectangular spiral shape with the X-axis direction as its longitudinal direction such that the starting end EB1 in the direction of current flow is located near the center position of the first coil pattern 63B1u (first substrate coil 53A1u) in the Y-axis direction and the ending end EB2 is located near the edge of the first coil pattern 63B1u (first substrate coil 53A1u). The first coil pattern 63B1u is spiral-shaped in a clockwise direction when viewed from the upper side in the Z-axis direction with respect to the direction of current flow. The first coil pattern 63A1u and the first coil pattern 63B1u are formed such that their wiring patterns overlap when viewed from the Z-axis direction. The end EA2 of the first coil pattern 63A1u and the start EB1 of the first coil pattern 63B1u are electrically connected by a through-hole TH that penetrates the first substrate 61A.

[0094] The first substrate coil 53A1u (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 63B1u extends in the Y-axis direction. The first coil end portions 91 are approximately triangular regions where the first short coil pattern portions 95 are arranged. The through-holes TH are located in the first coil end portions 91.

[0095] The first coil patterns 63B1v, 63B1w, 63B2u, 63B2v, and 63B2w are also formed in the same shape as the first coil pattern 63B1u described above.

[0096] Although not shown in the diagram, the front and back sides of the first substrate coil 53B and the front side of the first substrate coil 53C have the same configuration as in Figures 21 and 22 above. However, the first current inlet is not provided in the first substrate coil 53B and the first substrate coil 53C.

[0097] Figure 23 is a view of the first substrate coil 53C seen from above in the Z-axis direction, with light passing through the first substrate 61C. As shown in Figure 23, the first coil patterns 69B1u, 69B1v, 69B1w, 69B2u, 69B2v, and 69B2w are formed on the back surface 61Cb of the first substrate 61C.

[0098] The first coil patterns 69B1u, 69B1v, 69B1w, 69B2u, 69B2v, and 69B2w are configured similarly to the first coil patterns 63B1u, 63B1v, 63B1w, 63B2u, 63B2v, and 63B2w in Figure 22, but differ in that they have first neutral points 73A and 73B. As mentioned above, the first neutral points 73A and 73B are located at the positive end (one example) in the X-axis direction. The first neutral point 73A connects the terminal EB2 of the first coil pattern 69B1u, the terminal EB2 of the first coil pattern 69B1v, and the terminal EB2 of the first coil pattern 69B1w, respectively. The first neutral point 73B connects the termination EB2 of the first coil pattern 69B2u, the termination EB2 of the first coil pattern 69B2v, and the termination EB2 of the first coil pattern 69B2w, respectively.

[0099] The first substrate coil 53C1u (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 69B1u extends in the Y-axis direction. The first substrate coil 53C1v (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 69B1v extends in the Y-axis direction. The first coil end portions 91 are substantially triangular regions where the first short coil pattern portions 95 are arranged. The first neutral point 73A is located in the first coil end portions 91 of the first substrate coils 53C1u and 53C1v.

[0100] The first substrate coil 53C2u (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 69B2u extends in the Y-axis direction. The first substrate coil 53C2v (see Figure 16) has first coil end portions 91 at both ends in the X-axis direction, which are regions where the first coil pattern 69B2v extends in the Y-axis direction. The first coil end portions 91 are roughly triangular regions where the first short coil pattern portions 95 are arranged. The first neutral point 73B is located in the first coil end portions 91 of the first substrate coils 53C2u and 53C2v.

[0101] Figures 24 to 26 show examples of the shape of the second coil pattern in the second substrate coil unit 49. Figure 24 is a view of the second substrate coil 57A from above in the Z-axis direction. As shown in Figure 24, the second coil patterns 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, and 77A2w are formed on the surface 75Aa of the second substrate 75A.

[0102] The second coil pattern 77A1u has a plurality of second longitudinal coil pattern portions 97 extending in the Y-axis direction and a plurality of second short coil pattern portions 99 extending in the X-axis direction. The second coil pattern 77A1u is formed in a substantially rectangular spiral shape by connecting the second longitudinal coil pattern portions 97 and the second short coil pattern portions 99 at substantially right angles. As described above, the second coil pattern 77A1u is formed in a substantially rectangular spiral shape with the Y-axis direction as its longitudinal direction such that the starting end EA1 (an example of one end) in the direction of current flow is located near the edge of the second coil pattern 77A1u (second substrate coil 57A1u) and the ending end EA2 (an example of the other end) is located near the center position of the second coil pattern 77A1u (second substrate coil 57A1u) in the X-axis direction. The second coil pattern 77A1u is spiral in a clockwise direction when viewed from above in the Z-axis direction with respect to the direction of current flow.

[0103] The second substrate coil 57A1u (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 77A1u extends in the X-axis direction. The second coil end portion 101 is a roughly triangular region where the second short coil pattern portion 99 is arranged. The second current inlet portion 83u1 connected to the start end EA1 is located at the positive side (one example) end in the Y-axis direction. The second current inlet portion 83u1 is located in the second coil end portion 101.

[0104] The second coil patterns 77A1v, 77A1w, 77A2u, 77A2v, and 77A2w are also formed in the same shape as the second coil pattern 77A1u described above.

[0105] Figure 25 is a view of the second substrate coil 57A seen from above in the Z-axis direction, with light passing through the second substrate 75A. As shown in Figure 25, the second coil patterns 77B1u, 77B1v, 77B1w, 77B2u, 77B2v, and 77B2w are formed on the back surface 75Ab of the second substrate 75A.

[0106] The second coil pattern 77B1u has a plurality of second longitudinal coil pattern portions 103 extending in the Y-axis direction and a plurality of second short coil pattern portions 105 extending in the X-axis direction. The second coil pattern 77B1u is formed in a substantially rectangular spiral shape by connecting the second longitudinal coil pattern portions 103 and the second short coil pattern portions 105 at substantially right angles. As mentioned above, the second coil pattern 77B1u is formed in a region that overlaps with the second coil pattern 77A1u when viewed from the Z-axis direction. The second coil pattern 77B1u is formed in a substantially rectangular spiral shape with the Y-axis direction as its longitudinal direction, such that the starting end EB1 in the direction of current flow is located near the center position of the second coil pattern 77B1u (second substrate coil 57A1u) in the X-axis direction and the ending end EB2 is located near the edge of the second coil pattern 77B1u (second substrate coil 57A1u). The second coil pattern 77B1u is spiral-shaped in a clockwise direction when viewed from the upper side in the Z-axis direction with respect to the direction of current flow. The second coil pattern 77A1u and the second coil pattern 77B1u are formed such that their wiring patterns overlap when viewed from the Z-axis direction. The end EA2 of the second coil pattern 77A1u and the start EB1 of the second coil pattern 77B1u are electrically connected by a through-hole TH that penetrates the second substrate 75A.

[0107] The second substrate coil 57A1u (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 77B1u extends in the X-axis direction. The second coil end portion 101 is a roughly triangular region where the second short coil pattern portion 105 is located. The through-hole TH is located in the second coil end portion 101.

[0108] The second coil patterns 77B1v, 77B1w, 77B2u, 77B2v, and 77B2w are also formed in the same shape as the second coil pattern 77B1u described above.

[0109] Although not shown in the diagram, the front and back sides of the second substrate coil 57B and the front side of the second substrate coil 57C have the same configuration as in Figures 24 and 25 above. However, the second current inlet is not provided in the second substrate coil 57B and the second substrate coil 57C.

[0110] Figure 26 is a view of the second substrate coil 57C seen from above in the Z-axis direction, with light passing through the second substrate 75C. As shown in Figure 26, the second coil patterns 83B1u, 83B1v, 83B1w, 83B2u, 83B2v, and 83B2w are formed on the back surface 75Cb of the second substrate 75C.

[0111] The second coil patterns 83B1u, 83B1v, 83B1w, 83B2u, 83B2v, and 83B2w are configured similarly to the second coil patterns 77B1u, 77B1v, 77B1w, 77B2u, 77B2v, and 77B2w in Figure 25, but differ in that they have second neutral points 85A and 85B. As mentioned above, the second neutral points 85A and 85B are located at the positive end (one example) in the Y-axis direction. The second neutral point 85A connects the termination EB2 of the second coil pattern 83B1u, the termination EB2 of the second coil pattern 83B1v, and the termination EB2 of the second coil pattern 83B1w, respectively. The second neutral point 85B connects the termination EB2 of the second coil pattern 83B2u, the termination EB2 of the second coil pattern 83B2v, and the termination EB2 of the second coil pattern 83B2w, respectively.

[0112] The second substrate coil 57C1u (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 83B1u extends in the X-axis direction. The second substrate coil 57C1v (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 83B1v extends in the X-axis direction. The second coil end portion 101 is a roughly triangular region where the second short coil pattern portion 105 is arranged. The second neutral point 85A is located in the second coil end portion 101 of the second substrate coils 57C1u and 57C1v.

[0113] The second substrate coil 57C2u (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 83B2u extends in the X-axis direction. The second substrate coil 57C2v (see Figure 16) has a second coil end portion 101 at both ends in the Y-axis direction, which is the region where the second coil pattern 83B2v extends in the X-axis direction. The second coil end portion 101 is a roughly triangular region where the second short coil pattern portion 105 is arranged. The second neutral point 85B is located in the second coil end portion 101 of the second substrate coils 57C2u and 57C2v.

[0114] <5. Servo Amplifier Configuration> Next, with reference to Figures 27 to 30, an example of the configuration of a servo amplifier that supplies current to the stator 11 will be described.

[0115] As described above, the stator 11 has two sets of first board coils 23A, 23B and two sets of second board coils 25A, 25B (see Figure 2). These four board coils 23A, 23B, 25A, and 25B are not electrically connected to each other and are configured as independent electrical circuits. The controller 15 independently controls the current supplied to the four board coils 23A, 23B, 25A, and 25B for one stator 11, via four servo amplifiers 107A, 107B, 107C, and 107D for each board coil. The four servo amplifiers 107A, 107B, 107C, and 107D may be incorporated into the stator unit 21 to form a unit.

[0116] As shown in Figure 27, the first substrate coil 23A is composed of substrate coils Uy1, Vy1, and Wy1. The current inlet 71u1 of substrate coil Uy1, the current inlet 71v1 of substrate coil Vy1, and the current inlet 71w1 of substrate coil Wy1 are connected to the servo amplifier 107A. The ends of substrate coils Uy1, Vy1, and Wy1 opposite to the servo amplifier 107A are connected to the neutral point 73A, forming a star connection (Y connection).

[0117] As shown in Figure 28, the first substrate coil 23B is composed of substrate coils Uy2, Vy2, and Wy2. The current inlet 71u2 of substrate coil Uy2, the current inlet 71v2 of substrate coil Vy2, and the current inlet 71w2 of substrate coil Wy2 are connected to the servo amplifier 107B. The ends of substrate coils Uy2, Vy2, and Wy2 opposite to the servo amplifier 107B are connected to the neutral point 73B, forming a star connection (Y connection).

[0118] As shown in Figure 29, the second substrate coil 25A is composed of substrate coils Ux1, Vx1, and Wx1. The current inlet 83u1 of substrate coil Ux1, the current inlet 83v1 of substrate coil Vx1, and the current inlet 83w1 of substrate coil Wx1 are connected to the servo amplifier 107C. The ends of substrate coils Ux1, Vx1, and Wx1 opposite to the servo amplifier 107C are connected to the neutral point 85A, forming a star connection (Y connection).

[0119] As shown in Figure 30, the second substrate coil 25B is composed of substrate coils Ux2, Vx2, and Wx2. The current inlet 83u2 of substrate coil Ux2, the current inlet 83v2 of substrate coil Vx2, and the current inlet 83w2 of substrate coil Wx2 are connected to the servo amplifier 107D. The ends of substrate coils Ux2, Vx2, and Wx2 opposite to the servo amplifier 107D are connected to the neutral point 85B, forming a star connection (Y connection).

[0120] Furthermore, the wiring of each circuit board coil is not limited to a star connection (Y connection); for example, a delta connection may also be used.

[0121] <6. Relationship between the size of the stator coil unit and the movable magnet unit> Next, with reference to Figures 31 to 34, an example of the relationship between the size of the coil unit 22 of the stator 11 and the magnet unit 27 of the movable element 13 will be explained.

[0122] Figure 31 shows the region in the coil unit 22 of the stator 11 where thrust in the X-axis direction is obtained. As shown in Figure 31, of the substrate coils in the coil unit 22, it is the second substrate coils 25A and 25B that impart thrust in the X-axis direction to the movable element 13. Of the second substrate coils 25A and 25B, the second coil end portion 101 (white portion in Figure 31), which is the region where the second coil pattern extends in the X-axis direction, is a region that does not contribute to thrust in the X-axis direction. Therefore, the region of the coil unit 22 other than the second coil end portion 101 (gray portion in Figure 31) is the region where thrust in the X-axis direction is obtained.

[0123] Figure 32 shows the region in the coil unit 22 of the stator 11 where thrust in the Y-axis direction is obtained. As shown in Figure 32, of the substrate coils in the coil unit 22, the first substrate coils 23A and 23B are the ones that impart thrust in the Y-axis direction to the movable element 13. Of the first substrate coils 23A and 23B, the first coil end portion 91 (white portion in Figure 32), which is the region where the first coil pattern extends in the Y-axis direction, is a region that does not contribute to thrust in the Y-axis direction. Therefore, the region of the coil unit 22 other than the first coil end portion 91 (gray portion in Figure 32) is the region where thrust in the Y-axis direction is obtained.

[0124] Figure 33 shows the region in the coil unit 22 of the stator 11 where levitation force in the Z-axis direction can be reliably obtained. As shown in Figure 33, the coil unit 22 has coil end portions 91 and 101 (white portion in Figure 33) which are the sum of a first coil end portion 91, which is the region where the first coil patterns of the first substrate coils 23A and 23B extend in the Y-axis direction, and a second coil end portion 101, which is the region where the second coil patterns of the second substrate coils 25A and 25B extend in the X-axis direction, when viewed from the Z-axis direction. The region other than the coil end portions 91 and 101 (gray portion in Figure 33) is a region where thrust force can be obtained in both the X-axis and Y-axis directions, and therefore high levitation force can be obtained. On the other hand, the region of the coil end portions 91 and 101 is a region where thrust force can be obtained in only one of the X-axis or Y-axis directions, so a decrease in thrust force and levitation force occurs.

[0125] Figure 34 shows an example of the size relationship between the coil unit 22 of the stator 11 and the magnet unit 27 of the movable element 13. As shown in Figure 34, the movable element 13 is configured such that, at a position facing the stator 11, the outer circumference of the installation range of the magnet unit 27 overlaps with both the regions on one side and the other side in the X-axis direction of the coil end portion 91, and also overlaps with both the regions on one side and the other side in the Y-axis direction of the coil end portion 101, when viewed from the Z-axis direction. Furthermore, the movable element 13 is configured such that the dimensions of the outer circumference of the installation range of the magnet unit 27 in the X-axis direction and the Y-axis direction are less than or equal to the dimensions of the coil unit 22 of the stator 11 in the X-axis direction and the Y-axis direction, respectively. In other words, the movable element 13 is configured such that the size of the outer circumference of the installation range of the magnet unit 27 is larger than the rectangular region formed by connecting the inner vertices of the coil end portions 91 and 101, and less than or equal to the size of the outer circumference of the rectangle of the coil unit 22.

[0126] Furthermore, the movable element 13 may be configured such that the outer circumference of the installation range of the magnet unit 27 overlaps with both the one and the other regions of the coil end portion 91 in the X-axis direction, but does not overlap with both the one and the other regions of the coil end portion 101 in the Y-axis direction.

[0127] The movable element 13 moves along at least one of the X-axis and Y-axis directions, overcoming the coil end portions 91 and 101 of a plurality of stators 11 arranged in a row. In this process, by maintaining the size relationship between the coil unit 22 of the stator 11 and the magnet unit 27 of the movable element 13 as described above, the effects of the reduction in thrust and levitation force due to the coil end portions 91 and 101 (cogging, ripple, etc.) can be suppressed, thereby improving the stability of the movement of the movable element 13.

[0128] <7. Effects of the Embodiment> As described above, in the substrate transport system 1 of this embodiment, a first transport path 19A is formed by arranging a plurality of stators 11 in a line along the X-axis direction. The movable element 13 levitates and moves along the first transport path 19A to transport the semiconductor substrate W. According to this embodiment, the trajectory and control of the movable element 13 can be simplified, so the substrate transport system 1 can be miniaturized and its expandability can be improved.

[0129] Furthermore, in this embodiment, the two first transport paths 19A may be spaced apart in the Y-axis direction. In this case, even if the movable element 13 stops due to a malfunction or the like in one of the first transport paths 19A, the movable element 13 can be operated in the other first transport path 19A. This reduces the downtime of the substrate transport system 1.

[0130] Furthermore, in this embodiment, a second transport path 19B may be formed that connects the two first transport paths 19A in the Y-axis direction. In this case, a ladder-shaped transport path 19 can be formed. This allows for planar movement of the movable element 13 while simplifying the configuration and control compared to the case of a free track. Also, when multiple movable elements 13 are arranged, even if one of the movable elements 13 stops due to failure or the like, the other movable elements 13 can overtake, pass, or go around it, allowing the system to continue operating. Therefore, the system downtime can be further reduced.

[0131] Furthermore, in this embodiment, the second transport path 19B may connect the two first transport paths 19A at a position between two adjacent processing chambers 9 in the X-axis direction. In this case, even if a movable element 13 stops due to a malfunction or the like in front of a processing chamber 9, other movable elements 13 can overtake, pass, or go around it, allowing the system to continue operating. In addition, a ladder-shaped transport path 19 can be formed using stator units 21 with the same arrangement pattern of stators 11.

[0132] Furthermore, in this embodiment, a third transport path 19C may be formed to connect the first transport path 19A and the processing chamber 9 in the Y-axis direction. In this case, the movable element 13 can be moved in a direction toward or away from the processing chamber 9 by the third transport path 19C. This allows the position of the movable element 13 to be adjusted when inserting or removing the semiconductor substrate W into or from the processing chamber 9.

[0133] Furthermore, in this embodiment, multiple stators 11 may be arranged on the upper surface of the base 32 and unitized as a stator unit 21, and the transport path 19 may be formed by connecting multiple stator units 21. In this case, the transport path 19 can be easily expanded or modified by adding or changing the stator units 21. Therefore, a flexible system can be realized.

[0134] Furthermore, in this embodiment, multiple stators 11 may be arranged adjacent to each other on the upper surface of the base 32 of the stator unit 21. In this case, a transport path corresponding to the arrangement of the stators 11 can be formed on the upper surface of the base 32.

[0135] Furthermore, in this embodiment, the upper surface of the base 32 may be divided into nine regions by dividing it into three equal parts in the vertical and horizontal directions, and multiple stators 11 may be arranged in predetermined regions among the nine regions. In this case, the following effects can be obtained. That is, if the upper surface of the base 32 is divided into four (2x2) regions, the number of possible transport path patterns is too small, while if the upper surface of the base 32 is divided into sixteen (4x4) regions, the number of possible transport path patterns increases, but the unit configuration becomes complex. According to this embodiment, by dividing the upper surface of the base 32 into nine (3x3) regions, it is possible to achieve both simplification of the unit configuration and a large number of transport path patterns. This makes it easy to expand or change the transport path 19.

[0136] Furthermore, in this embodiment, the stator unit 21 may be configured such that the stator 11 is in contact with at least two of the four edges of the base 32 when viewed from the Z-axis direction. In this case, a stator unit 21 can be formed that corresponds to various transport path patterns, such as a straight shape, an L-shape, a T-shape, or a cross shape.

[0137] Furthermore, in this embodiment, the dimensions of the movable element 13 in the X-axis and Y-axis directions may be approximately the same as those of the stator 11. In this case, since the movable element 13 has approximately the same dimensions as the stator 11, the design of the transport path 19 can be simplified.

[0138] Furthermore, in this embodiment, when the two movable elements 13 move toward each other along one of the first transport paths 19A, the controller 15 may control one of the movable elements 13 to move toward the other first transport path 19A via the second transport path 19B, so that the two movable elements 13 pass each other. In this case, the two movable elements 13 can be operated to pass each other along the ladder-shaped transport path 19.

[0139] Furthermore, in this embodiment, when the two movable elements 13 move in the same direction along one of the first transport paths 19A, the controller 15 may control the rear movable element 13 to move to the other first transport path 19A via the second transport path 19B in the direction of movement, so that it overtakes the front movable element 13 in the direction of movement. In this case, the rear movable element 13 can be operated to overtake the front movable element 13 in the ladder-shaped transport path 19.

[0140] Furthermore, in this embodiment, if another movable element 13 is located in front of one movable element 13 moving along one of the first transport paths 19A, the controller 15 may move one movable element 13 to the other first transport path 19A via the second transport path 19B, thereby controlling the first movable element 13 to bypass the other movable element 13. In this case, in the ladder-shaped transport path 19, the moving movable element 13 can be operated to bypass a movable element 13 that is stopped in front of it.

[0141] Furthermore, in this embodiment, when moving the movable element 13 to a specific processing chamber 9 connected to one of the first transport paths 19A, the controller 15 may, in addition to moving the movable element 13 closer to the specific processing chamber 9 from one side in the X-axis direction, also control the movable element 13 to curve around via the other first transport path 19A and approach the specific processing chamber 9 from the other side in the X-axis direction. In this case, the number of transport path options when moving the movable element 13 to a specific destination (specific processing chamber 9, etc.) increases, thereby increasing the degree of freedom of the transport path.

[0142] Furthermore, in this embodiment, the controller 15 may control the position of the movable elements 13 so that two or more movable elements 13 are not positioned on a single stator 11. In this case, collisions between the movable elements 13 can be avoided.

[0143] Furthermore, in this embodiment, the controller 15 may control the position of the movable elements 13 so that two or more movable elements 13 are not positioned on a single base 32. In this case, it is possible to avoid the movable elements 13 approaching each other.

[0144] Furthermore, in this embodiment, the stator 11 on the upper surface of the stator unit 21 may be covered with a covering member 34. In this case, the following effects can be obtained. That is, the coil of the stator 11 is molded with resin 33, but in a vacuum environment, moisture is released from the resin 33, which causes the pressure to rise. Also, when the vacuum transport chamber 7 is in a vacuum environment, corrosive gases may enter from the processing chamber 9, and these corrosive gases may corrode the stator 11 and the resin 33. According to this embodiment, the stator 11 and the resin 33 can be sealed by covering the stator 11 on the upper surface of the stator unit 21 with a covering member 34, so the above concerns can be avoided. Therefore, a system that can withstand a vacuum environment can be realized.

[0145] Furthermore, in this embodiment, the stator unit 21 may have at least one sensor 36, 38 between the base 32 and the stator 11 for detecting the position of the movable element 13. In this case, the position of the movable element 13 can be controlled with high precision.

[0146] Furthermore, in this embodiment, the stator unit 21 may be configured such that the number of sensors on the stator 11 connected to the processing chamber 9 (number of sensors 36 and 38) is greater than the number of sensors on the stator 11 not connected to the processing chamber 9 (number of sensors 36). In this case, the positioning accuracy of the movable element 13 when inserting and removing the semiconductor substrate W into and from the processing chamber 9 can be improved compared to the positioning accuracy when moving the semiconductor substrate W.

[0147] Furthermore, in this embodiment, the number of sensors in the stator unit 21 connected to the processing chamber 9 (the number of sensors 36 and 38) may be greater than the number of sensors in the stator unit 21 not connected to the processing chamber 9 (the number of sensors 36). In this case, the positioning accuracy of the movable element 13 when it is located near the processing chamber 9 can be improved compared to the positioning accuracy when it is located far from the processing chamber 9.

[0148] Furthermore, in this embodiment, the stator unit 21 may have a heat transfer member 39 between the base 32 and the stator 11 that transfers heat generated in the stator 11 to the base 32. In this case, the heat generated in the stator 11 can be efficiently distributed and transferred to the base 32 by the heat transfer member 39, thereby improving heat dissipation.

[0149] Furthermore, as described above, the stator 11 of the planar motor 20 in the substrate transport system 1 of this embodiment has a plurality of concentrated-winding first substrate coils 53A, 53B, 53C, each having a substantially rectangular spiral-shaped first coil pattern formed on the first substrates 61A, 61B, 61C with the X-axis direction as the longitudinal direction. By forming a coil pattern on the substrate to form the substrate coil, it is possible to realize a coil with a large area and high flatness compared to a wound coil. This reduces factors such as cogging and ripple. In addition, it is possible to increase the number of turns while suppressing an increase in volume compared to a wound coil, and the increase in the dimensions of the coil end is also suppressed, so the stator 11 can be made smaller (thinner). Furthermore, by making the substrate coil a concentrated winding, a planar turn configuration can be made on the surface of the substrate, which makes manufacturing easier compared to distributed winding which has a three-dimensional turn configuration. In addition, since it is easier to increase the number of turns compared to distributed winding, the range of outputtable thrust can be expanded and versatility can be improved.

[0150] Furthermore, in this embodiment, the stator 11 of the planar motor 20 has a plurality of concentrated winding second substrate coils 57A, 57B, 57C, each having a substantially rectangular spiral second coil pattern formed on the second substrates 75A, 75B, 75C with the Y-axis direction as its longitudinal direction, and the first substrate coils 53A, 53B, 53C and the second substrate coils 57A, 57B, 57C may be stacked in the Z-axis direction. In this case, the movable element 13 can be controlled to 3 degrees of freedom, including horizontal movement (all directions on the plane including the X-axis and Y-axis directions) and rotational movement around the axis in the Z-axis direction. Furthermore, it is also possible to control it to 6 degrees of freedom, including vertical movement in the Z-axis direction, rotational movement around the axis in the X-axis direction, and rotational movement around the axis in the Y-axis direction.

[0151] Furthermore, in this embodiment, the first substrates 61A, 61B, 61C for forming the first coil pattern and the second substrates 75A, 75B, 75C for forming the second coil pattern may be separate substrates. In this case, the manufacturing of the substrate coils can be simplified.

[0152] Furthermore, in this embodiment, each of the first substrate coils 53A, 53B, 53C and the second substrate coils 57A, 57B, 57C may be configured by forming coil patterns on both sides of the substrate and connecting them with through-holes TH. In this case, the number of coil turns can be further increased while suppressing an increase in volume.

[0153] Furthermore, in this embodiment, the outer shape of the installation range of the magnet unit 27 of the movable element 13 may be configured to overlap with the coil end portions 91, 101 of one of the stator 11 in at least one of the X-axis and Y-axis directions when viewed from the Z-axis direction. In this case, compared to the case where the outer shape of the installation range of the magnet unit 27 of the movable element 13 is smaller than the coil end portions 91, 101, the effects of the reduction in thrust and levitation force due to the coil end portions 91, 101 of the stator 11 (cogging, ripple, etc.) can be suppressed, thereby improving the stability of the movable element 13 during operation.

[0154] Furthermore, in this embodiment, the dimensions of the installation range of the magnet unit 27 of the movable element 13 in the X-axis direction and the Y-axis direction may be configured to be less than or equal to the dimensions of the coil unit 22 of the stator 11 in the X-axis direction and the Y-axis direction, respectively. In this case, the movable element 13 and the stator 11 can be configured to have approximately the same dimensions, which facilitates the design and manufacture of the planar motor 20 and the transport path 19.

[0155] Furthermore, in this embodiment, the first coil pattern may have a plurality of first longitudinal coil pattern portions 87 extending in the X-axis direction and a plurality of first short coil pattern portions 89 extending in the Y-axis direction, and may be formed in a substantially rectangular spiral shape by connecting the first longitudinal coil pattern portions 87 and the first short coil pattern portions 89 at substantially right angles. Alternatively, the second coil pattern may have a plurality of second longitudinal coil pattern portions 97 extending in the Y-axis direction and a plurality of second short coil pattern portions 99 extending in the X-axis direction, and may be formed in a substantially rectangular spiral shape by connecting the second longitudinal coil pattern portions 97 and the second short coil pattern portions 99 at substantially right angles. In this case, the coil end portion that does not contribute to thrust can be reduced compared to a wound coil in which the coil end portion is bent in an arc shape. As a result, the region that contributes to thrust in the substrate coil can be expanded to near the outer circumference, thereby improving the operating efficiency (stability of thrust) of the planar motor 20.

[0156] Furthermore, in this embodiment, the first coil pattern may be formed in a spiral shape such that one end is located near the edge of the first substrate coil and the other end is located near the center position of the first substrate coil in the Y-axis direction. Similarly, the second coil pattern may be formed in a spiral shape such that one end is located near the edge of the second substrate coil and the other end is located near the center position of the second substrate coil in the X-axis direction. In this case, the air core portion (the area where the central coil pattern is not formed) can be reduced compared to the case of a wound coil, and the coil's packing factor (the ratio of conductors to the cross-section of the coil) can be improved.

[0157] Furthermore, in this embodiment, the current inlet sections for supplying current to each substrate coil may be concentrated and arranged at one end of each substrate coil in the longitudinal direction. In this case, the routing of the wiring connected to each substrate coil becomes easier.

[0158] Furthermore, in this embodiment, the first current inlet may be located in the first coil end portion 91. Also, the second current inlet may be located in the second coil end portion 101. In this case, the current inlet can be provided inside the substrate, so the stator 11 can be made smaller compared to the case where the current inlet is provided outside the substrate. In addition, since the current inlet is located in the coil end portions 91 and 101 which do not contribute to thrust, the influence on thrust can be reduced.

[0159] Furthermore, in this embodiment, the neutral points 73A, 73B, 85A, and 85B that connect multiple substrate coils with different phases may be concentrated and arranged at one end in the longitudinal direction of each substrate coil. In this case, the reduction in the number of turns of the coil can be suppressed compared to when the neutral points 73A, 73B, 85A, and 85B are arranged in the middle of the longitudinal direction of each substrate coil.

[0160] Furthermore, in this embodiment, the first neutral points 73A and 73B may be located in the first coil end portion 91. Also, the second neutral points 85A and 85B may be located in the second coil end portion 101. In this case, the neutral points 73A, 73B, 85A, and 85B can be provided inside the substrate, so the stator 11 can be made smaller compared to the case where the neutral points 73A, 73B, 85A, and 85B are provided outside the substrate. In addition, since the neutral points 73A, 73B, 85A, and 85B are located in the coil end portions 91 and 101 which do not contribute to thrust, the influence on thrust can be reduced.

[0161] Furthermore, in the substrate transport system 1 of this embodiment, the stator 11 has a plurality of concentrated-winding second substrate coils 57A, 57B, and 57C, each having a substantially rectangular spiral-shaped second coil pattern with the Y-axis direction as its longitudinal direction. In addition, the plurality of stators 11 are arranged in a line along the X-axis direction to form a first transport path 19A. The movable element 13 levitates along the first transport path 19A and moves in the X-axis direction by the thrust in the X-axis direction generated between it and the second substrate coils 57A, 57B, and 57C, thereby transporting the semiconductor substrate W. According to this embodiment, the trajectory and control of the movable element 13 can be simplified, so the substrate transport system 1 can be miniaturized and its expandability can be improved. Also, by using concentrated winding for the substrate coils, a planar turn configuration can be achieved on the surface of the substrate, making manufacturing easier compared to distributed winding, which has a three-dimensional turn configuration. Furthermore, since it is easier to increase the number of turns compared to distributed winding, the range of outputtable thrust can be expanded, improving versatility.

[0162] Furthermore, in the substrate transport system 1 of this embodiment, the stator 11 has first substrate coils 53A, 53B, 53C and second substrate coils 57A, 57B, 57C. In addition, a plurality of stators 11 are arranged in a line along the X-axis to form a first transport path 19A, and at least one stator 11 is arranged in a line along the Y-axis to form a second transport path 19B that connects the two first transport paths 19A. The movable element 13 levitates on the first transport path 19A and the second transport path 19B and moves in the X-axis and Y-axis directions due to the thrust in the X-axis and Y-axis directions generated between the first substrate coils 53A, 53B, 53C and the second substrate coils 57A, 57B, 57C, and transports the semiconductor substrate W. According to this embodiment, the trajectory and control of the movable element 13 can be simplified, so the substrate transport system 1 can be miniaturized and its expandability can be improved. Furthermore, by using concentrated winding for the substrate coils, a planar turn configuration can be achieved on the surface of the substrate, simplifying manufacturing compared to distributed winding, which results in a three-dimensional turn configuration. In addition, since it is easier to increase the number of turns compared to distributed winding, the range of outputtable thrust can be expanded, improving versatility. Moreover, by configuring the stator 11 as a stack of first substrate coils 53A, 53B, 53C and second substrate coils 57A, 57B, 57C, the movable element 13 can be controlled to three degrees of freedom, including horizontal movement (all directions on the plane, including the X-axis and Y-axis) and rotational movement around the Z-axis axis. Furthermore, it becomes possible to control it to six degrees of freedom, including vertical movement in the Z-axis direction, rotational movement around the X-axis axis, and rotational movement around the Y-axis axis. As a result, the levitation force and thrust become even more stable, and the degrees of freedom in the direction of propulsion increase.

[0163] Furthermore, in this embodiment, the movable element 13 may move along at least one of the X-axis and Y-axis directions while overcoming the coil end portions 91, 101 of a plurality of stators 11 arranged in a row. In this case, the effects of thrust reduction due to the coil end portions 91, 101 of the stators 11 (cogging, ripple, etc.) can be suppressed, thereby improving the stability of the movement of the movable element 13.

[0164] <8. Variation> The embodiments of the disclosure are not limited to those described above, and various modifications are possible without departing from the spirit and technical idea thereof. Such modifications are described below.

[0165] (8-1. When the second transport path is formed in a position opposite the processing chamber) In the embodiment described above, the second transport path 19B was formed between two adjacent processing chambers 9 in the X-axis direction. However, as shown in Figure 35, for example, the second transport path 19B may be formed in a position facing the processing chamber 9. In this modified example, the second transport path 19B connects the two first transport paths 19A in a position facing the opening / closing door 17 of the processing chamber 9 in the Y-axis direction.

[0166] According to this modified version, for example, when moving the movable element 13 between two processing chambers 9 facing each other in the Y-axis direction, it can be moved along the shortest distance.

[0167] (8-2. Variations in stator arrangement in stator units) In the above-described embodiment, the upper surface of the base 32 of the stator unit 21 was divided into nine (3x3) regions, and four stators 11 were arranged in a roughly T-shape, but the arrangement of the stators 11 is not limited to the above.

[0168] For example, as shown in Figure 36, the three stators 11 may be arranged in a straight line so as to be in contact with two opposing edges of the four edges of the base 32 in relation to the nine regions on the upper surface of the base 32. Alternatively, as shown in Figure 37, the three stators 11 may be arranged in a roughly L-shape so as to be in contact with two adjacent edges of the four edges of the base 32. Furthermore, as shown in Figure 38, for example, five stators 11 may be arranged in a roughly cross shape so as to be in contact with all four edges of the base 32. By combining these various patterns of stator units 21, various shapes of transport paths can be formed.

[0169] Furthermore, as shown in Figures 39 to 41, the upper surface of the base 32 may be divided into four (2x2) regions by dividing it in half vertically and horizontally, and multiple stators 11 may be placed in predetermined regions among the four regions. For example, as shown in Figure 39, three stators 11 may be placed in the four regions of the upper surface of the base 32 so as to be in contact with all four edges of the base 32, forming a roughly T-shape. Alternatively, as shown in Figure 40, two stators 11 may be placed in the four regions of the upper surface of the base 32 so as to be in contact with three edges of the base 32, forming a straight line. Alternatively, as shown in Figure 41, two stators 11 may be placed in the four regions of the upper surface of the base 32 so as to be in contact with two edges in the center of the base 32, forming a straight line.

[0170] By connecting the stator units 21 shown in Figures 39 and 40, for example as shown in Figure 42, the distance between the two spaced-apart first transport paths 19A can be reduced from the equivalent of two stators 11 to the equivalent of one, compared to the case where the upper surface of the base 32 is divided into nine (3x3) regions as in the previously described embodiment. Therefore, the substrate transport system 1 can be further miniaturized. Also, by connecting the stator units 21 shown in Figures 39 and 41, for example as shown in Figure 43, the length of the third transport path 19C in the Y-axis direction can be reduced by half compared to the case in Figure 42. Therefore, the substrate transport system 1 can be further miniaturized.

[0171] (8-3. When forming the first coil pattern and the second coil pattern on both sides of the substrate) In the embodiment described above, the first substrate on which the first coil pattern is formed and the second substrate on which the second coil pattern is formed are separate substrates. However, the first coil pattern and the second coil pattern may be formed on both sides of a common substrate.

[0172] Figures 44 and 45 show examples of the shapes of the first and second coil patterns of this modified example. Figure 44 is a view of the substrate coil 109 from above in the Z-axis direction. As shown in Figure 44, the first coil patterns 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, and 63A2w are formed on the surface 111a (an example of the first surface) of the substrate 111. The configuration of the first coil patterns 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, and 63A2w is the same as in Figure 21 described above, so no explanation is given. Figure 45 is a view of the substrate coil 109 seen through the substrate 111 from above in the Z-axis direction. As shown in Figure 45, the back surface 111b of the substrate 111 (an example of the second surface) has second coil patterns 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, and 77A2w formed on it. The configuration of the second coil patterns 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, and 77A2w is the same as in Figure 24 above, so no explanation is given. The substrate coil 109 is both the first substrate coil and the second substrate coil.

[0173] As shown in Figure 44, the terminations EA2 of the first coil patterns 63A1u, 63A1v, and 63A1w are connected via through-holes TH to the first neutral point 73A on the back surface 111b of the substrate 111. Similarly, the terminations EA2 of the first coil patterns 63A2u, 63A2v, and 63A2w are connected via through-holes TH to the first neutral point 73B on the back surface 111b of the substrate 111. As shown in Figure 45, the first neutral points 73A and 73B are spaced apart from the second coil patterns 77A1u, 77A1v, 77A1w, 77A2u, 77A2v, and 77A2w.

[0174] As shown in Figure 45, the terminations EA2 of the second coil patterns 77A1u, 77A1v, and 77A1w are connected via through-holes TH to a second neutral point 85A on the surface 111a of the substrate 111. Similarly, the terminations EA2 of the second coil patterns 77A2u, 77A2v, and 77A2w are connected via through-holes TH to a second neutral point 85B on the surface 111a of the substrate 111. As shown in Figure 44, the second neutral points 85A and 85B are spaced apart from the first coil patterns 63A1u, 63A1v, 63A1w, 63A2u, 63A2v, and 63A2w. Multiple substrate coils 109 configured as described above may be stacked in the Z-axis direction.

[0175] According to this modified example, the first coil pattern and the second coil pattern are formed on both sides of the substrate 111. This makes it possible to reduce the size (thinner) in the stacking direction compared to the case where the first coil pattern and the second coil pattern are formed on separate substrates.

[0176] (8-4. Variations in the coil configuration of the coil unit) In the above-described embodiment, the coil unit 22 was configured such that two sets of first substrate coils 23A and 23B, each having substrate coils for U-phase, V-phase, and W-phase respectively, and two sets of second substrate coils 25A and 25B, each having substrate coils for U-phase, V-phase, and W-phase respectively, were stacked in the Z-axis direction. However, the coil configuration of the coil unit 22 is not limited to the above.

[0177] For example, as shown in Figure 46, a configuration may be used in which a set of first substrate coils 23A, each having substrate coils for U-phase, V-phase, and W-phase, and a set of second substrate coils 25A, each having substrate coils for U-phase, V-phase, and W-phase, are stacked in the Z-axis direction. Alternatively, as shown in Figure 47, for example, a configuration may be used in which three or more sets of first substrate coils 23A, 23B, 23C, each having substrate coils for U-phase, V-phase, and W-phase, and three or more sets of second substrate coils 25A, 25B, 25B, each having substrate coils for U-phase, V-phase, and W-phase, are stacked in the Z-axis direction.

[0178] Furthermore, the number of sets of U-phase, V-phase, and W-phase substrate coils may differ between the first substrate coil and the second substrate coil. For example, as shown in Figure 48, a configuration may be provided in which one set of first substrate coils 23A, each equipped with U-phase, V-phase, and W-phase substrate coils, and two or more sets of second substrate coils 25A, 25B, each equipped with U-phase, V-phase, and W-phase substrate coils, are stacked in the Z-axis direction. Alternatively, as shown in Figure 49, for example, a configuration may be provided in which two or more sets of first substrate coils 23A, 23B, each equipped with U-phase, V-phase, and W-phase substrate coils, and three or more sets of second substrate coils 25A, 25B, 25C, each equipped with U-phase, V-phase, and W-phase substrate coils, are stacked in the Z-axis direction.

[0179] Furthermore, at least one of the first substrate coil and the second substrate coil may be configured to be separated in the longitudinal direction. For example, as shown in Figure 50, a configuration may be used in which one set of first substrate coils 23A equipped with U-phase, V-phase, and W-phase substrate coils and two or more sets of second substrate coils 25A, 25B, each equipped with U-phase, V-phase, and W-phase substrate coils, are stacked in the Z-axis direction. The second substrate coil 25A consists of two second substrate coils 25A1 and 25A2 arranged separately in the longitudinal direction, and the second substrate coil 25B consists of two second substrate coils 25B1 and 25B2 arranged separately in the longitudinal direction.

[0180] Furthermore, as shown in Figure 51, for example, a configuration may be used in which two or more sets of first substrate coils 23A, 23B, each having a substrate coil for U-phase, V-phase, and W-phase, and three or more sets of second substrate coils 25A, 25B, 25C, each having a substrate coil for U-phase, V-phase, and W-phase, are stacked in the Z-axis direction. In the first substrate coil 23A, two first substrate coils 23A1, 23A2 are arranged separately in the longitudinal direction, and in the first substrate coil 23B, two first substrate coils 23B1, 23B2 are arranged separately in the longitudinal direction. The second substrate coil 25A consists of three second substrate coils 25A1, 25A2, and 25A3 arranged separately in the longitudinal direction, the second substrate coil 25B consists of three second substrate coils 25B1, 25B2, and 25B3 arranged separately in the longitudinal direction, and the second substrate coil 25C consists of three second substrate coils 25C1, 25C2, and 25C3 arranged separately in the longitudinal direction.

[0181] (8-5. Others) In the embodiments described above, the coil configuration of all stators 11 was common, but this is not limited to this. For example, as shown in Figure 52, if the stator 11 for moving the movable element 13 in one linear direction is the first stator 11A (vertical and horizontal hatching in Figure 52), and the stator 11 for moving the movable element 13 in two or more linear directions is the second stator 11B (grid hatching in Figure 52), the winding configuration of the substrate coils of the first stator 11A and the second stator 11B may be different. The winding configuration of the substrate coil refers to, for example, the wiring length of the coil pattern constituting the substrate coil, the number of turns, the number of layers of the substrate, etc. Generally, the thrust required for the first stator 11A is smaller than the thrust required for the second stator 11B. For this reason, at least one of the wiring length, number of turns, and number of layers of the substrate coil of the second stator 11B may be larger than that of the first stator 11A.

[0182] According to this modified example, by configuring the circuit board coils of the first stator 11A and the second stator 11B with winding configurations corresponding to the thrust required for each stator, it is possible to reduce the cost of the stators 11 compared to the case where the winding configuration of all stators 11 is common.

[0183] In the above explanation, where terms such as "perpendicular," "parallel," and "plane" are used, these terms do not have a strict meaning. These terms "perpendicular," "parallel," and "plane" refer to situations where design and manufacturing tolerances and errors are acceptable, meaning they are "effectively perpendicular," "effectively parallel," and "effectively plane."

[0184] In the above explanation, if there are descriptions such as "identical," "same," "equal," or "different" regarding external dimensions, size, shape, position, etc., these descriptions do not have a strict meaning. These "identical," "same," "equal," and "different" terms mean that tolerances and errors in design and manufacturing are allowed, and that they are "substantially identical," "substantially the same," "substantially equal," or "substantially different."

[0185] In addition to what has already been described above, the methods of the above embodiments and their respective modifications may be used in appropriate combinations. Furthermore, although not exemplified individually, the above embodiments and their respective modifications may be implemented with various modifications, without departing from their intended purpose.

[0186] The problems and effects that the embodiments and modifications described above aim to solve are not limited to those stated above. The embodiments and modifications may solve problems not mentioned above, or produce effects not mentioned above, and may solve only some of the problems described or produce only some of the effects described. [Explanation of Symbols]

[0187] 1. Substrate transport system (an example of a transport system) 3. Air Conveying Chamber 5 Load Lock Room 7. Vacuum transport chamber (an example of a transport chamber) 9 Processing Room 11 Stator 13 Mover 15 Controllers 17 Opening and closing doors 19 Conveyor path 19A First transport path 19B Second transport route 19C Third transport route 20 Planar Motors 21 Stator Unit 22 Coil Units 23A First board coil 23B First board coil 23C First board coil 25A Second board coil 25B Second circuit board coil 25C Second Circuit Board Coil 27 Magnet Unit 32 bases 34 Covering member 36 sensors 38 sensors 39 Heat transfer components 47. First circuit board coil unit 49. Second circuit board coil unit 53A First board coil 53B First circuit board coil 53C First circuit board coil 57A Second circuit board coil 57B Second circuit board coil 57C Second circuit board coil 61A First board 61Aa Surface (an example of the first surface) 61Ab Reverse side (an example of the second side) 61B First board 61Ba surface (an example of the first surface) 61Bb Reverse side (an example of side 2) 61C First circuit board 61Ca surface (an example of the first surface) 61Cb Reverse side (an example of side 2) 63A1u First coil pattern 63A1v First coil pattern 63A1w First coil pattern 63A2u First coil pattern 63A2v First Coil Pattern 63A2w First coil pattern 63B1u First Coil Pattern 63B1v First Coil Pattern 63B1w First Coil Pattern 63B2u First Coil Pattern 63B2v First Coil Pattern 63B2w First Coil Pattern 65A1u First Coil Pattern 65A1v First Coil Pattern 65A1w First Coil Pattern 65A2u First Coil Pattern 65A2v First Coil Pattern 65A2w First Coil Pattern 65B1u First Coil Pattern 65B1v First Coil Pattern 65B1w First Coil Pattern 65B2u First Coil Pattern 65B2v First Coil Pattern 65B2w First Coil Pattern 69A1u First coil pattern 69A1v First coil pattern 69A1w First coil pattern 69A2u First Coil Pattern 69A2v First Coil Pattern 69A2w First coil pattern 69B1u First coil pattern 69B1v First Coil Pattern 69B1w First coil pattern 69B2u First Coil Pattern 69B2v First Coil Pattern 69B2w First coil pattern 71u1 1st current inflow section 71u2 1st current inflow section 71v1 1st current inflow section 71v2 1st current inflow section 71w1 1st current inflow section 71w2 1st current inflow section 73A 1st neutral point 73B 1st neutral point 75A Second board 75Aa Surface (an example of the first surface) 75Ab Reverse side (an example of the second side) 75B Second board 75Ba surface (an example of the first surface) 75Bb Reverse side (an example of side 2) 75C 2nd board 75Ca surface (an example of the first surface) 75Cb Reverse side (an example of side 2) 77A1u Second coil pattern 77A1v Second coil pattern 77A1w Second coil pattern 77A2u Second Coil Pattern 77A2v Second Coil Pattern 77A2w Second coil pattern 77B1u Second Coil Pattern 77B1v Second Coil Pattern 77B1w Second Coil Pattern 77B2u Second Coil Pattern 77B2v Second Coil Pattern 77B2w Second Coil Pattern 79A1u Second coil pattern 79A1v Second coil pattern 79A1w Second coil pattern 79A2u Second Coil Pattern 79A2v Second Coil Pattern 79A2w Second coil pattern 79B1u Second Coil Pattern 79B1v Second Coil Pattern 79B1w Second Coil Pattern 79B2u Second Coil Pattern 79B2v Second Coil Pattern 79B2w Second Coil Pattern 83A1u Second coil pattern 83A1v Second Coil Pattern 83A1w Second coil pattern 83A2u Second Coil Pattern 83A2v Second Coil Pattern 83A2w Second coil pattern 83B1u Second Coil Pattern 83B1v Second coil pattern 83B1w Second Coil Pattern 83B2u Second Coil Pattern 83B2v Second Coil Pattern 83B2w Second Coil Pattern 83u1 2nd current inflow section 83u2 2nd current inflow section 83v1 2nd current inflow section 83v2 2nd current inflow section 83w1 2nd current inflow section 83w2 2nd current inflow part 85A 2nd neutral point 85B 2nd neutral point 87 First Longitudinal Coil Pattern Section 89 First short coil pattern section 91 First coil end section 93 First Longitudinal Coil Pattern Section 95 First short coil pattern section 97 Second Longitudinal Coil Pattern Section 99 Second short coil pattern section 101 Second coil end section 103 Second Longitudinal Coil Pattern Section 105 Second short coil pattern section 111 circuit board 111a Surface (an example of the first surface) 111b Reverse side (an example of the second side) EA1 Starting point (an example of one end) EA2 termination (an example of the other end) TH Through Hole W Semiconductor substrate (an example of a material to be processed)

Claims

1. A conveying room equipped with a conveying path through which the materials to be processed are transported, A plurality of processing chambers are arranged around the transport chamber along a first direction for performing predetermined processing on the object to be processed, Each of the stators is equipped with a coil, and a plurality of stators are arranged in the transport chamber along the transport path, It has a movable element equipped with a magnet, which floats and moves along the transport path and transports the object to be processed, The aforementioned transport path is The transport path has a plurality of stators arranged in a line along the first direction, Conveyor system.

2. The aforementioned transport path is The first transport path has two sections spaced apart from each other in a second direction intersecting the first direction and extending substantially parallel to the first direction, The transport system according to claim 1.

3. The aforementioned transport path is At least one of the stators is formed in a row along the second direction, and there is at least one second transport path connecting the two first transport paths in the second direction. The transport system according to claim 2.

4. The second transport path is, The two first transport paths are connected at a position between two adjacent processing chambers in the first direction. The transport system according to claim 3.

5. The second transport path is, The two first transport paths are connected at a position opposite the opening / closing door of the processing chamber in the second direction. The transport system according to claim 3.

6. The aforementioned transport path is At least one of the stators is formed in a row along the second direction, and a third transport path connects the first transport path and the processing chamber. The transport system according to any one of claims 2 to 5.

7. The stator unit further comprises a base having a larger area than the stator when viewed from a third direction perpendicular to the first and second directions, and a plurality of the stators arranged on the upper surface of the base, The aforementioned transport path is Multiple stator units are connected to form a structure. The transport system according to claim 6.

8. The stator unit is The base is configured such that a plurality of stators are arranged adjacent to each other on the upper surface of the base. The transport system according to claim 7.

9. The stator unit is When viewed from the third direction, the base is substantially rectangular in shape, and the upper surface of the base is divided into nine regions by dividing it into three equal parts in the vertical and horizontal directions, and a plurality of stators are arranged in a predetermined region among the nine regions. The transport system according to claim 8.

10. The stator unit is The stator is configured to be in contact with at least two of the four edges of the base when viewed from the third direction. The transport system according to claim 9.

11. The stator unit is When viewed from the third direction, the base is substantially rectangular in shape, and the upper surface of the base is divided into four regions by dividing it in half vertically and horizontally, and a plurality of stators are arranged in a predetermined region among the four regions. The transport system according to claim 8.

12. The aforementioned movable element is When viewed from a third direction perpendicular to the first and second directions, the dimensions of at least one of the first and second directions are substantially the same as those of the stator. The transport system according to claim 6.

13. The aforementioned movable element is At least two are placed, The system further includes controllers for individually controlling the aforementioned movable elements. The aforementioned controller, When the two movable elements move toward each other along one of the first transport paths, the system controls the movement of one of the movable elements to the other first transport path via the second transport path, so that the two movable elements pass each other. The transport system according to claim 12.

14. The aforementioned movable element is At least two are placed, The system further includes controllers for individually controlling the aforementioned movable elements. The aforementioned controller, When two of the movable elements move along one of the first transport paths in the same direction, the rear movable element is controlled to move along the second transport path to the other first transport path in the direction of movement, so that it overtakes the front movable element in the direction of movement. The transport system according to claim 12.

15. The aforementioned movable element is At least two are placed, The system further includes controllers for individually controlling the aforementioned movable elements. The aforementioned controller, When another movable element is located in front of one of the movable elements moving along one of the first transport paths, the first movable element is moved to the other first transport path via the second transport path, and the first movable element is controlled to bypass the other movable element. The transport system according to claim 12.

16. The aforementioned movable element is At least two are placed, The system further includes controllers for individually controlling the aforementioned movable elements. The aforementioned controller, When moving the movable element toward a specific processing chamber connected to one of the first transport paths, the movable element is controlled to move toward the specific processing chamber from one side in the first direction along the first transport path, or to move toward the specific processing chamber from the other side in the first direction by circling around from the first transport path through the second transport path and the other first transport path. The transport system according to claim 12.

17. The aforementioned movable element is At least two are placed, The system further includes controllers for individually controlling the aforementioned movable elements. The aforementioned controller, The position of the movable elements is controlled so that two or more movable elements are not positioned on one stator. The transport system according to claim 12.

18. The aforementioned movable element is At least two are placed, A controller for individually controlling the aforementioned movable elements, The stator unit further comprises a base with a larger area than the stator when viewed from the third direction, and a plurality of the stators arranged on the upper surface of the base, The aforementioned controller, The position of the movable elements is controlled so that two or more movable elements are not positioned on one base. The transport system according to claim 12.

19. The aforementioned plurality of stators, A first stator for moving the movable element in one linear direction, The movable element has two or more second stators for moving it in the linear direction, The coils of the first stator and the coils of the second stator have different winding configurations. The transport system according to claim 12.

20. The stator unit is The base has a non-magnetic covering member that covers the plurality of stators arranged on the upper surface of the base, The transport system according to claim 7.

21. The stator unit is Displaced between the base and the stator, and having at least one sensor for detecting the position of the movable element, The transport system according to claim 20.

22. The stator unit is The number of sensors on the stator connected to the processing chamber is configured to be greater than the number of sensors on the stator not connected to the processing chamber. The transport system according to claim 21.

23. The number of sensors in the stator unit connected to the processing chamber is greater than the number of sensors in the stator unit not connected to the processing chamber. The transport system according to claim 21.

24. The stator unit is A heat transfer member is positioned between the base and the stator and transfers heat generated in the stator to the base. The transport system according to claim 20.

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