Gas exhaust conduit pair
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- ASM IP HLDG BV
- Filing Date
- 2025-11-21
- Publication Date
- 2026-06-23
AI Technical Summary
【0040】 本発明の任意の特定の実施形態のすべてが本明細書に開示される本発明の範囲内であることが意図される。特定のおよび他の実施形態は、添付の図面を参照して、以下のある特定の実施形態の詳細な説明から当業者には容易に明らかとなり得るが、本発明は、開示されるいかなる特定の実施形態にも限定されない。
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Figure 2026102467000001_ABST
Abstract
Claims
1. The first gas exhaust conduit, A first end configured to connect to a first gas exhaust line, The second end opposite to the first end, which is closed, A first gas exhaust conduit wall extending in a first direction between the first end and the second end and surrounding the first gas conduction channel, A first gas exhaust conduit including a first set of holes formed in the wall of the first gas exhaust conduit, The second gas exhaust conduit, A first end configured to connect to a second gas exhaust line, The second end opposite to the first end, which is closed, A second gas exhaust conduit wall extends in the first direction between the first end and the second end and surrounds the second gas conduction channel, The second set of holes formed in the wall of the second gas exhaust conduit, A pair of gas exhaust conduits comprising: a second gas conduit having holes in the first set having a different arrangement from the holes in the second set.
2. The gas exhaust conduit pair according to claim 1, wherein the holes in the first set have a first hole diameter, the holes in the second set have a second hole diameter, and the diameter of the first hole is different from the diameter of the second hole.
3. The gas exhaust conduit pair according to claim 1 or 2, wherein each hole in the first set of holes has the same first hole diameter.
4. The gas exhaust conduit pair according to claim 1 or 2, wherein each hole in the second set of holes has the same second hole diameter.
5. The gas exhaust conduit pair according to claim 2, wherein the diameter of the first hole increases toward the first end of the first gas exhaust conduit, and the diameter of the second hole decreases toward the first end of the second gas exhaust conduit.
6. A pair of gas exhaust conduits according to any one of claims 1, 2, or 5, wherein the holes of the first set have a first hole spacing, the holes of the second set have a second hole spacing, and the first hole spacing is different from the second hole spacing.
7. The gas exhaust conduit pair according to claim 6, wherein the first hole spacing decreases toward the first end of the first gas exhaust conduit, and the second hole spacing decreases toward the second end of the second gas exhaust conduit.
8. In a plane perpendicular to the first direction, the first gas exhaust conduit and the second gas exhaust conduit each have a length in a second direction perpendicular to the first direction and a width in a third direction perpendicular to both the first and second directions, wherein the length is greater than the width, the gas exhaust conduit pair according to any one of claims 1, 2, 5, or 7.
9. The gas exhaust conduit pair according to claim 8, wherein the length is at least 1.5 times the width.
10. The gas exhaust conduit pair according to claim 8, wherein the holes of the first set are formed in a portion of the wall of the first gas exhaust conduit extending in the third direction, and the holes of the second set are formed in a portion of the wall of the second gas exhaust conduit extending in the third direction.
11. The first gas conduction channel and the second gas conduction channel each have a plane perpendicular to the first direction, with a length of at least 2000 mm 2 A pair of gas exhaust conduits according to any one of claims 1, 2, 5, 7, 9, or 10, having the cross-sectional area of the following:
12. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the holes of the first set and the holes of the second set are distributed over at least 50% of the length of each conduit.
13. A pair of gas exhaust conduits according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the first gas exhaust conduit is tapered along the first direction, so that the cross-sectional area of the first gas exhaust conduit at the second end is smaller than the cross-sectional area of the first gas exhaust conduit at the first end, and the second gas exhaust conduit is tapered along the first direction, so that the cross-sectional area of the second gas exhaust conduit at the second end is smaller than the cross-sectional area of the second gas exhaust conduit at the first end, and the cross-sectional area is the area of the cross-section cut by a plane perpendicular to the first direction.
14. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein each of the holes in the first set and the holes in the second set includes at least 10 holes.
15. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein each of the holes in the first set and the holes in the second set includes at least 50 holes.
16. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the smallest hole in the first set of holes and the smallest hole in the second set of holes have a diameter of at least 1 mm.
17. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the largest hole in the first set and the hole in the second set have a diameter of 15 mm or less.
18. A pair of gas exhaust conduits according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the average hole size of the holes in the first set and the average hole size of the holes in the second set are each less than 7 mm.
19. The gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein the first gas exhaust conduit is configured to preferentially extract gas from the upper region of the process chamber, and the second gas exhaust conduit is configured to preferentially extract gas from the lower region of the process chamber.
20. A semiconductor processing device, A process chamber configured to receive multiple substrates supported by a substrate boat, At least one gas injector for supplying gas to the process chamber, At least two gas exhaust ports for removing gas from the process chamber, A gas exhaust conduit pair according to any one of claims 1, 2, 5, 7, 9, or 10, wherein each gas exhaust conduit of the gas exhaust conduit pair is connected to its respective gas exhaust port, comprising: A semiconductor processing apparatus in which each of the gas exhaust conduits extends vertically inside the process chamber over at least a portion of the substrate boat.