Substrate processing equipment

Abstract

The present invention provides a substrate processing device suitable for suppressing unintended operation of various parts during the transfer of substrates between boats. [Solution] The substrate processing apparatus 1 comprises a first shaft body 10 that supports a first boat 110 from below, a second shaft body 20 that supports a second boat 120 from below, a holding mechanism that holds the second shaft body so that it can be displaced vertically relative to the first shaft body, a holding rotation mechanism 30 that rotates the first shaft body and the second shaft body synchronously around their axes, a support body 40 that supports the second shaft body from below in a rotatable state outside the processing chamber 2 in which the first boat and the second boat are housed, a mounting body 50 on which the support body is placed on a mounting surface 51 whose height changes continuously, and a displacement mechanism 60 that displaces the mounting body so that the position in contact with the lower part of the support body on the mounting surface moves.

Description

Technical Field

[0001] The present disclosure relates to a substrate processing apparatus that performs a film forming process on a semiconductor substrate placed on a boat.

Background Art

[0002] Conventionally, a substrate processing apparatus is known in which a plurality of semiconductor substrates (hereinafter also simply referred to as "substrates") are placed on a boat, and the boat is accommodated in a processing chamber, and a film forming process is performed on each substrate. In this type of substrate processing apparatus, since the film forming process is performed in a state where the substrate is placed in the recesses formed in each of the plurality of support columns constituting the boat, a film that spreads from the substrate to the recesses may be formed, and the substrate may stick to the boat. Such sticking is not desirable because it causes a decrease in film forming quality, such as peeling of the film when the substrate is taken out of the boat.

[0003] In recent years, in order to prevent such sticking, a substrate processing apparatus has been proposed in which the second boat is configured to be able to move up and down relative to the first boat among the first and second boats provided coaxially (see Patent Document 1). In this apparatus, by moving the second boat up and down during the film forming process to transfer the substrate between the first boat and the second boat, it is possible to suppress the formation of a film that spreads from the substrate to the recesses, and as a result, prevent the substrate from sticking to the boat.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0005] The transfer of substrates between boats using substrate processing equipment can cause unintended movements of various parts, such as vibration and contact, which can lead to a decrease in film deposition quality. Therefore, measures are needed to prevent such unintended movements.

[0006] This disclosure addresses the need for such a modification and aims to provide a technology suitable for suppressing unintended movements of various parts during the transfer of substrates between boats in a substrate processing apparatus configured such that the second boat, of which two boats are provided coaxially, can be raised and lowered relative to the first boat. [Means for solving the problem]

[0007] To solve the above problems, the substrate processing apparatus of the first phase comprises: a first shaft body that supports from below a first boat on which one or more substrates can be placed vertically at regular intervals; a second shaft body that supports from below a second boat on which one or more substrates can be placed vertically at the same intervals as the first boat, and is arranged coaxially with the first shaft body; a holding mechanism that holds the second shaft body so that it can be displaced vertically with respect to the first shaft body; a rotation mechanism that rotates the first shaft body and the second shaft body synchronously around their axes; a support body that supports the second shaft body from below in a rotatable state outside the processing chamber in which the first boat and the second boat are housed; a mounting body having a mounting surface of continuously changing height on which the support body is placed; and a displacement mechanism that displaces the mounting body so that the position in contact with the lower part of the support body on the mounting surface moves.

[0008] In this configuration, the substrate processing apparatus raises and lowers the mounting surface on the support body in accordance with the displacement of the mounting body, thereby raising and lowering the second boat via the support body and the second shaft body, and transferring the substrate between the first boat and the second boat. In this way, the structure, in which the support body raises and lowers the mounting surface that changes in height continuously, thereby raising and lowering the second boat which is supported from below by the support body, can suppress vibrations of each part that occur during the raising and lowering process.

[0009] Furthermore, since the second boat moves up and down within a height range on the mounting surface, by defining this height to the extent necessary for transferring substrates between the boats, the height to which the second boat moves up and down can be physically limited, preventing it from moving up and down more than necessary and causing parts to come into contact. Here, there is no need for special configurations such as detecting the height to which the second boat moves up and down and stopping the movement, or providing a physical stopper to prevent the second boat from moving up and down more than necessary, thus simplifying the device configuration.

[0010] Thus, in the substrate processing apparatus described above, unintended operation of each part during the transfer of substrates between boats can be suppressed. Furthermore, in the substrate processing apparatus described above, the support that moves up and down on the mounting surface of the substrate is located outside the processing chamber, so there is no risk of particles or gases associated with this movement entering the processing chamber.

[0011] Furthermore, this phase may be as shown in the second phase below. In the second phase, the above-described mounting body has a cylindrical upper surface in which the height changes continuously from one of the maximum height and minimum height to the other around the axis of the cylinder, and then the height changes continuously from the other to the first, thereby forming the above-described mounting surface. The displacement mechanism rotates the above-described mounting body around the axis of the cylinder, thereby displacing the position in contact with the lower part of the support on the above-described mounting surface.

[0012] In this type of substrate processing apparatus, the second boat can be raised and lowered via the support and second shaft by rotating a cylindrical mounting body and causing the mounting surface formed on its upper surface to move up and down on the support.

[0013] Furthermore, this phase may be as shown in the third phase below. In the third phase, multiple mounting bodies are provided at equal angular intervals around the axis of the shaft and at the same horizontal distance from that axis, and each is arranged in a direction such that the position in contact with the lower part of the support on the mounting surface is at the same height, and the displacement mechanism rotates each of the mounting bodies in the same direction, thereby displacing the position in contact with the lower part of the support on each of the mounting surfaces.

[0014] In this type of substrate processing apparatus, the second boat can be raised and lowered in a balanced manner via the support and the second shaft body by using multiple mounting bodies that are spaced at equal angular intervals around the axis of the shaft body and at the same distance from the axis.

[0015] Furthermore, this phase may be as shown in the fourth phase below. In the fourth phase, the support body is provided with a plurality of wheels positioned at equal angular intervals around the axis of the shaft and at the same horizontal distance from the shaft, each wheel being oriented to orbit the axis of the shaft, and the lower part of each wheel rests on the aforementioned mounting surface.

[0016] In this type of substrate processing apparatus, the second boat can be raised and lowered via the support and the second shaft by moving the mounting surface formed on the upper surface of the mounting body up and down on the wheels of the support.

[0017] Furthermore, this phase may be as shown in the fifth phase below. In the fifth phase, the wheels are provided so as to protrude from the sides of the main body of the support, and each of the members is arranged to sandwich the wheel from above between itself and the mounting body described above, and the clamping surface of this member that contacts the wheel is formed as a surface whose height changes continuously, similar to the mounting surface of the mounting body described above, and the connecting member connects the mounting body described above and the clamping members, which are arranged to sandwich the wheel, so as to rotate synchronously around the axis of the mounting body.

[0018] In the substrate processing measures in this situation, since each wheel is held by being sandwiched from above and below by the placement body and the clamping body, the wheel does not leave the placement surface. As a result, even if an unintended upward force is generated on the second boat, the second shaft body, and the support body due to a pressure difference between the area where the support body is installed and the processing chamber, etc., this force does not cause the lower part (wheel) of the support body to leave the placement surface. Thus, the appropriate up and down movement of the placement surface by the support body can be realized.

[0019] For example, in a substrate processing apparatus as described above, a large pressure difference occurs between the mechanism part for displacing the boat and the processing chamber in which this boat is accommodated, and a situation may occur where the boat, the shaft body, and the support body are pulled upward. Such a situation would cause the lower part (wheel) of the support body to leave the placement surface, inhibiting the appropriate up and down movement of the placement surface by the support body. However, in the substrate processing apparatus in the above situation, since the wheel does not leave the placement surface due to the force caused by the pressure difference, the appropriate up and down movement of the placement surface by the support body can be realized.

Brief Description of the Drawings

[0020] [Figure 1] Front view of a substrate processing apparatus which is an embodiment of the present disclosure [Figure 2] Perspective view showing a boat in an embodiment of the present disclosure [Figure 3] Front cross-sectional view of a substrate processing apparatus which is an embodiment of the present disclosure [Figure 4] Main part plan view of a substrate processing apparatus which is an embodiment of the present disclosure [Figure 5] Perspective view showing a placement body and a clamping body in an embodiment of the present disclosure [Figure 6] Main part front view showing the operating state of a substrate processing apparatus which is an embodiment of the present disclosure

Modes for Carrying Out the Invention

[0021] Embodiments of the present invention will be described below with reference to the drawings. (1) Overall Configuration

[0022] As shown in Figure 1, the substrate processing apparatus 1 is a device that houses a boat 100 on which multiple semiconductor substrates (hereinafter also simply referred to as "substrates") are placed inside a processing chamber 2, and performs film deposition processing on each substrate.

[0023] As shown in Figure 2, the boat 100 consists of a first boat 110 on which one or more substrates can be mounted vertically at regular intervals, and a second boat 120 on which one or more substrates can be mounted at the same intervals as the first boat 110. The boat 100 is used with the second boat 120 housed inside the first boat 110.

[0024] These first boat 110 and second boat 120 are cylindrical members, each consisting of a circular top plate 111, 121 and a circular bottom plate 113, 123 connected by multiple columns 115, 125. Multiple recesses 117, 127 for placing substrates are formed vertically at equal intervals on the columns 115, 125. These recesses 117, 127 are concave grooves that open inward, and substrates are placed in the recesses 117, 127 that are at the same height.

[0025] As shown in Figures 1 and 3, the substrate processing apparatus 1 includes a first shaft body 10 that supports the first boat 110 from below, a second shaft body 20 that supports the second boat 120 from below, a holding and rotating mechanism 30 that rotatably holds the first shaft body 10 and the second shaft body 20, a support body 40 that supports the second shaft body 20 from below in a rotatable state, a mounting body 50 on which the support body 40 is placed, a displacement mechanism 60 that displaces the mounting body 50, and a clamping body 70 positioned above the mounting body 50.

[0026] The first shaft body 10 includes a through hole 13 that penetrates the shaft body 11 vertically along its axis, and a first mounting portion 15 at its upper end for mounting the first boat 110.

[0027] The second shaft body 20 is housed in the through hole 13 of the first shaft body 10, is arranged coaxially with the first shaft body 10, and has a second mounting portion 25 on the upper end of the shaft body 21 for mounting the second boat 120.

[0028] The holding and rotating mechanism 30 includes a ball spline 31 interposed between the first shaft body 10 and the second shaft body 20, a holding and rotating pulley 33 that rotates the ball spline nut 31a constituting the ball spline 31 at its lower end, a holding and rotating belt 35 stretched over the holding and rotating pulley 33, and a holding and rotating motor 37 for rotationally driving the holding and rotating pulley 33 via the holding and rotating belt 35.

[0029] Of these, the ball spline 31 consists of a ball spline shaft 31b formed in a part of the shaft body 21 of the second shaft body 20, and a ball spline nut 31a arranged to surround the ball spline shaft 31b.

[0030] This holding and rotating mechanism 30 can displace the second shaft 20 vertically relative to the first shaft 10 by means of a ball spline 31. Furthermore, this holding and rotating mechanism 30 rotates the first shaft 10 and the second shaft 20 synchronously around the axis 200 by rotating the ball spline nut 31a with a holding and rotating motor 37.

[0031] The support 40 is a structure located outside the processing chamber 2, below the second shaft 20, and supports the second shaft 20 from below in a rotatable manner. As shown in Figure 4, the support 40 is equipped with a plurality of wheels 41 (two at 180-degree intervals in this embodiment) positioned at equal angular intervals around the axis 200 and at the same horizontal distance from the shafts 10 and 20. In this embodiment, the wheels 41 are provided so as to protrude from the sides of the main body portion 43 of the support 40.

[0032] The mounting body 50 has a mounting surface 51 whose height changes continuously, and the support 40 is placed on this mounting surface 51. As shown in Figure 5, the mounting body 50 has a cylindrical member, and the top surface of the cylindrical member changes in height continuously from one of the maximum height and minimum height to the other around the axis of the cylinder, and then changes in height continuously from the other to the first, thereby forming the mounting surface 51. The height of this mounting surface 51 is defined as a height necessary for transferring the substrate between boats, as will be described later.

[0033] Furthermore, multiple mounting bodies 50 are provided at equal angular intervals around the axis 200, and at the same horizontal distance from the axes 10 and 20 (in this embodiment, two are spaced 180 degrees apart). Each mounting body 50 is positioned on the mounting surface 51 so that it is at the same height where it contacts the lower part of the support 40 (wheels 41).

[0034] Each of the mounting units 50 is fixed on the base 53 so that it can rotate around its cylindrical axis 300 as the center of rotation.

[0035] Each clamping body 70 is positioned to clamp the wheel 41 from above between itself and the mounting body 50. The clamping surface 71 of each clamping body 70 that contacts the wheel 41 is formed as a surface with a continuously changing height, similar to the mounting surface 51 of the mounting body 50. As a result, the mounting surface 51 and the clamping surface 71 maintain a constant distance in the vertical direction (specifically, the height of the wheel 41) regardless of their position around the axis 300.

[0036] Furthermore, multiple clamping bodies 70 are provided at equal angular intervals around the axis 200 and at the same horizontal distance from the axis 200 (in this embodiment, two at 180-degree intervals). Each clamping body 70 is positioned such that the contact points with the upper part of the support 40 (wheel 41) on the clamping surface 71 are at the same height.

[0037] Furthermore, the mounting body 50 and the clamping body 70, which are positioned on either side of the wheel 41, are connected by a cylindrical connecting body 80 in the direction of the axis 300 of the mounting body 50, thereby enabling the clamping body 70 to rotate synchronously with the mounting body 50 around the axis 300.

[0038] The displacement mechanism 60 comprises a first displacement pulley 61 provided at the bottom of each mounting body 50, a first displacement belt 63 stretched between the first displacement pulleys 61, a second displacement pulley 65 provided at the top of either clamping body 70, a second displacement belt 67 stretched across the second displacement pulley 65, and a displacement motor 69 for rotationally driving the second displacement pulley 65 via the second displacement belt 67.

[0039] This displacement mechanism 60 displaces the mounting body 50 so that the position in contact with the lower part (wheel 41) of the support 40 on the mounting surface 51 changes. Here, the position in contact with the lower part (wheel 41) of the support 40 on the mounting surface 51 is displaced by rotating the mounting body 50 around the axis 300 as a cylinder. At this time, by rotating each mounting body 50 synchronously in the same direction, the position in contact with the lower part (wheel 41) of the support 40 on each mounting surface 51 is displaced.

[0040] In addition, the substrate processing apparatus 1 described above has shafts 10 and 20 and spline nuts 31 surrounded by a casing 90, and is fixed to the processing chamber by a flange 91 formed on the upper end side of the casing 90.

[0041] In the substrate processing apparatus 1 configured in this way, the mounting surface 51 on the support body 40 moves up and down in accordance with the displacement of the mounting body 50, causing the second boat 120 to move up and down via the support body 40 and the second shaft body 20, as shown in Figure 5, and the substrate W is transferred between the first boat 110 and the second boat 120 as a result of this movement (Figure (a)→(b) or (b)→(a)).

[0042] (2) Variant Although embodiments of the present invention have been described above, it goes without saying that the present invention is not limited in any way to the above embodiments and can take various forms as long as they fall within the technical scope of the present invention.

[0043] For example, in the above embodiment, a configuration was illustrated in which a mechanism for holding the second shaft 20 so that it can be displaced vertically relative to the first shaft 10, and a mechanism for rotating the first shaft 10 and the second shaft 20 synchronously around the axis 200 are realized by a single holding and rotating mechanism 30. However, the holding and rotating mechanism 30 may also be intended to be configured in which the mechanism for holding the second shaft 20 so that it can be displaced vertically relative to the first shaft 10, and the mechanism for rotating the first shaft 10 and the second shaft 20 synchronously around the axis 200 are configured by separate mechanisms.

[0044] Furthermore, the holding and rotating mechanism 30 is exemplified in which the ball spline nut 31a is indirectly rotationally driven by the holding and rotating motor 37 via the holding and rotating pulley 33 and the holding and rotating belt 35. However, this holding and rotating mechanism 30 may also be configured so that the ball spline nut 31a is directly rotationally driven by a drive source such as a motor.

[0045] Furthermore, the displacement mechanism 60 is exemplified in which the mounting body 50 is indirectly rotationally driven by the displacement motor 69 via the first displacement pulley 61, the first displacement belt 63, the clamping body 70, the second displacement pulley 65, and the second displacement belt 67. However, this displacement mechanism 60 may also be configured so that the mounting body 50 is directly rotationally driven by a drive source such as a motor. Alternatively, the clamping body 70 may be configured so that it is directly rotationally driven by a drive source such as a motor, while the mounting body 50 is indirectly rotationally driven from it via the first displacement belt 63 and the first displacement pulley 61.

[0046] (3) Action, effect In the above embodiment, the substrate processing apparatus 1 raises and lowers the mounting surface 51 on the support body 40 in accordance with the displacement of the mounting body 50, thereby raising and lowering the second boat 120 via the support body 40 and the second shaft body 20, and transferring the substrate W between the first boat 110 and the second boat 120. In this way, the support body 40 raises and lowers the mounting surface 51, which has a continuously changing height, thereby raising and lowering the second boat 120 which is supported from below by the support body 40. This structure makes it possible to suppress vibrations of each part that occur during the raising and lowering.

[0047] Furthermore, since the second boat 120 moves up and down within a height range on the mounting surface 51, by defining this height to the extent necessary for transferring substrates between boats, the height to which the second boat 120 moves up and down can be physically limited, preventing it from moving up and down more than necessary and causing contact between parts (for example, the upper surface of the substrate W and the area between vertically adjacent recesses on the boat 100 after transfer; see Figure 5). In this case, there is no need for any special configuration to limit the height to which the second boat 120 moves up and down, such as detecting the height to which the second boat 120 moves up and down and stopping the movement, or providing a physical stopper to prevent the second boat 120 from moving up and down more than necessary, thus simplifying the device configuration.

[0048] Thus, the substrate processing apparatus 1 of the above embodiment can suppress unintended operation of each part that occurs when substrates are transferred between boats.

[0049] Furthermore, in the substrate processing apparatus 1 of the above embodiment, the second boat 120 can be raised and lowered via the support 40 and the second shaft 20 by rotating the cylindrical mounting body 50 and moving the mounting surface 51 formed on its upper surface up and down on the support 40.

[0050] Furthermore, in the substrate processing apparatus 1 of the above embodiment, the second boat 120 can be raised and lowered in a balanced manner via the support body 40 and the second shaft body 20 by a plurality of mounting bodies 50 that are spaced at equal angular intervals around the axis 200 and at the same distance from the axis.

[0051] Furthermore, in the substrate processing apparatus 1 of the above embodiment, the second boat 120 can be raised and lowered via the support body 40 and the second shaft body 20 by moving the mounting surface 51 formed on the upper surface of the mounting body 50 up and down on the wheels 41 of the support body 40.

[0052] Furthermore, in the substrate processing apparatus 1 of the above embodiment, each wheel 41 is held in place by being sandwiched from above and below by the mounting body 50 and the clamping body 70, so that the wheels 41 do not leave the mounting surface 51. As a result, even if an unintended upward force is generated on the second boat 120, the second shaft body 20, and the support 40 due to a pressure difference between the area where the support 40 is installed and the processing chamber 2, this force will not cause the lower part of the support 40 (wheels 41) to leave the mounting surface 51. In this way, the upward and downward movement of the support 40 on the mounting surface 51 can be appropriately achieved.

[0053] For example, in the substrate processing apparatus 1 described above, a large pressure difference can occur between the mechanism for displacing the boat 100 and the processing chamber in which the boat 100 is housed, causing the boat 100, shafts 10 and 20, and support 40 to be pulled upward. This situation causes the lower part of the support 40 (wheels 41) to move away from the mounting surface 51, hindering the proper raising and lowering of the mounting surface 51 by the support 40. However, in the substrate processing apparatus 1 described above, the wheels 41 do not move away from the mounting surface 51 due to the force caused by the pressure difference, thus enabling the proper raising and lowering of the mounting surface 51 by the support 40.

[0054] Furthermore, in the substrate processing apparatus 1 of the above embodiment, the support 40 that moves up and down on the mounting surface 51 of the mounting body 50 is located outside the processing chamber 2, so that particles and gases associated with this up and down movement do not enter the processing chamber 2. [Explanation of symbols]

[0055] 1...Substrate processing device, 2...Processing chamber, 10...First shaft body, 20...Second shaft, 11...Shaft body, 13...Through hole, 21...Shaft body, 30...Holding and rotating mechanism, 31...Ball spline, 31a...Ball spline nut, 31b...Ball spline shaft, 33...Holding and rotating pulley, 35...Holding and rotating belt, 37...Holding and rotating motor, 40...Support, 41...Wheel, 43...Main body, 50...Mounting body, 5 1... Mounting surface, 53... Base, 60... Displacement mechanism, 69... Displacement motor, 70... Clamping body, 71... Clamping surface, 80... Connecting body, 90... Casing, 91... Flange, 100... Boat, 110... First boat, 111... Top plate, 113... Bottom plate, 115... Column, 117... Recess, 120... Second boat, 121... Top plate, 123... Bottom plate, 125... Column, 127... Recess, 200... Axis, 300... Axis, W... Substrate.

Claims

1. A first shaft body that supports from below a first boat on which one or more substrates can be mounted vertically at regular intervals, A shaft that supports a second boat from below, on which one or more substrates can be mounted vertically at the same intervals as the first boat, and the second shaft is arranged coaxially with the first shaft, A holding mechanism that holds the second shaft so that it can be displaced vertically relative to the first shaft, A rotation mechanism that rotates the first shaft and the second shaft synchronously around their respective axes, Outside the processing chamber in which the first and second boats are housed, a support is provided that supports the second shaft from below in a rotatable manner, A mounting body having a mounting surface of continuously changing height, on which the support is placed, The system includes a displacement mechanism that displaces the aforementioned mounting body so that the position in contact with the lower part of the support on the mounting surface moves. Circuit board processing equipment.

2. The aforementioned mounting body has a cylindrical upper surface in which the height changes continuously around the axis of the cylinder from one of the maximum height and minimum height to the other, and then the height changes continuously from the other to the first, thereby forming the mounting surface described above. The displacement mechanism rotates the aforementioned mounting body around its cylindrical axis, thereby displacing the position on the aforementioned mounting surface that contacts the lower part of the support. The substrate processing apparatus according to claim 1.

3. The mounting body is provided in multiple units at equal angular intervals around the axis of the shaft and at the same horizontal distance from that axis, and each unit is arranged in such a way that it contacts the lower part of the support on the mounting surface described above at the same height. The displacement mechanism rotates each of the aforementioned mounting bodies in the same direction, thereby displacing the position on each of the aforementioned mounting surfaces that contacts the lower part of the support. The substrate processing apparatus according to claim 2.

4. The support comprises a plurality of wheels positioned at equal angular intervals around the axis of the shaft and at the same horizontal distance from the shaft. Each of the wheels is provided in a orientation that orients itself around the axis of the shaft, and the lower part of each wheel rests on the aforementioned mounting surface. The substrate processing apparatus according to claim 3.

5. The wheels are provided so as to protrude from the sides of the main body portion of the support, moreover, Each of these members is positioned to sandwich the wheel from above between itself and the aforementioned mounting body, and the clamping surface of this member that contacts the wheel is formed as a surface whose height changes continuously, similar to the mounting surface of the aforementioned mounting body, and The system comprises a connecting body that connects the aforementioned mounting body and the clamping body, which are positioned on either side of the wheel, so that they rotate synchronously around the axis of the mounting body. The substrate processing apparatus according to claim 4.

Images