Supply liquid production device

Abstract

To provide a supplied liquid manufacturing apparatus that can make concentrations of gas dissolved liquid (supplied liquid) higher.SOLUTION: A supplied liquid manufacturing apparatus 1 comprises: a raw material gas supply part 2 that supplies raw material gas; a raw material liquid supply part 3 that supplies raw material liquid; a gas / liquid mixing part 4 that mixes the raw material gas with the raw material liquid to produce raw material gas dissolved liquid; a gas / liquid separating part 11 that separates the gas dissolved liquid produced by the gas / liquid mixing part 4 into supplied liquid that is supplied to a use point and undissolved gas that is ejected through an exhaust port; and a gas / liquid contacting part 12 arranged between the gas / liquid mixing part 4 and the gas / liquid separating part 11. The gas dissolved liquid introduced to the gas / liquid contacting part 12 is contacted with the undissolved gas, using fillings filled into a filing part 17 of the gas / liquid contacting part 12 to dissolve the undissolved gas into the gas dissolved liquid.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a supply liquid producing device that produces a gas-dissolved liquid (supply liquid) by mixing a source gas and a source liquid. [Background technology]

[0002] In recent years, cleaning of products in semiconductor device factories and electronic component manufacturing factories for liquid crystal and other products has become increasingly sophisticated as manufacturing processes become more complex and circuit patterns become finer. For example, special liquids (called cleaning liquids) made by dissolving high-purity gases or high-purity gases and chemicals in functional water (such as ultrapure water) are used to remove fine particles, metals, organic matter, etc. that have adhered to silicon wafers.

[0003] As cleaning methods, in addition to the "batch processing method" in which multiple silicon wafers are simultaneously immersed and cleaned repeatedly, the "single wafer processing method" in which chemical cleaning and ultrapure water cleaning are performed on each wafer individually to accommodate high-mix, low-volume production of products is also used. Compared to the batch processing method, the single wafer processing method requires a longer cleaning process time (takt time) per wafer and requires a larger amount of cleaning liquid, so there is a demand for shortening the takt time and reducing the amount of cleaning liquid used. Currently, in order to perform effective cleaning in a short time and reduce the amount of cleaning liquid used, advanced cleaning processes are being carried out in which multiple functional waters and chemicals are used alone or simultaneously, and the cleaning process is switched between in a short time.

[0004] As functional water, for example, ozone water in which ozone gas is dissolved in ultrapure water is used. Ozone dissolved in ultrapure water has a very strong oxidizing power even at a low concentration (a few ppm), making it possible to remove organic matter and metals. This ozone water is generally produced in an ozone water production device. For example, in a conventional supply liquid production device, ozone gas (raw material gas) and ultrapure water (raw material liquid) are mixed in a gas-liquid mixing section to produce ozone water (supply liquid) (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2017-127861 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, in conventional supply liquid manufacturing devices, after the raw material gas and raw material liquid are mixed in the gas-liquid mixing section to generate ozone water (supply liquid), the ozone gas and water separate before being sent to the gas-liquid separation section, making it difficult to further increase the dissolution efficiency of the ozone gas (to further increase the concentration of ozone water).

[0007] The present invention has been made in consideration of the above-mentioned problems, and aims to provide a supply liquid manufacturing device that can increase the concentration of a gas-dissolved liquid (supply liquid) by mixing a raw material gas and a raw material liquid to manufacture the gas-dissolved liquid (supply liquid). [Means for solving the problem]

[0008] The supply liquid manufacturing device of the present invention includes a raw material gas supplying section which supplies a raw material gas that is a raw material for a gas-dissolved liquid, a raw material liquid supplying section which supplies a raw material liquid that is a raw material for the gas-dissolved liquid, a gas-liquid mixing section which mixes the raw material gas and the raw material liquid to produce the gas-dissolved liquid, a gas-liquid separation section which separates the gas-dissolved liquid produced by the gas-liquid mixing section into a supply liquid that is supplied to a point-of-use and an undissolved gas that is exhausted from an exhaust port, and a gas-liquid contacting section which is disposed between the gas-liquid mixing section and the gas-liquid separation section, and the gas-liquid contacting section is configured to receive the gas-dissolved liquid produced by the gas-liquid mixing section and to contact the gas-liquid contacting section. an undissolved gas inlet portion into which the undissolved gas separated by the gas-liquid separation portion is introduced; a filling portion filled with a filling material that brings the gas-dissolved liquid introduced from the gas-dissolved liquid inlet portion into contact with the undissolved gas introduced from the undissolved gas inlet portion to dissolve the undissolved gas in the gas-dissolved liquid; a gas-dissolved liquid outlet portion that delivers the gas-dissolved liquid in which the undissolved gas has been dissolved by the filling portion to the gas-liquid separation portion; and an undissolved gas outlet portion that delivers the undissolved gas that has not been dissolved in the gas-dissolved liquid by the filling portion to the exhaust port.

[0009] According to this configuration, the gas-liquid contact section disposed between the gas-liquid mixing section and the gas-liquid separation section can dissolve the undissolved gas (undissolved gas introduced from the undissolved gas inlet section) separated by the gas-liquid separation section in the gas-dissolved liquid (gas-dissolved liquid introduced from the gas-dissolved liquid inlet section) generated by the gas-liquid mixing section. This allows the undissolved gas separated by the gas-liquid separation section to be dissolved again in the gas-dissolved liquid, making it possible to increase the concentration of the gas-dissolved liquid. In addition, since the undissolved gas can be reused, the amount of raw material gas supplied from the raw material gas supply section can be reduced, and further, the amount of exhaust gas (undissolved gas) discharged from the exhaust port can be reduced.

[0010] In addition, the supply liquid manufacturing apparatus of the present invention includes a pump that pressurizes the undissolved gas discharged from the undissolved gas outlet, and the gas-liquid separation section includes a supply liquid storage section in which the supply liquid to be supplied to the use point is stored, and an undissolved gas storage section in which the undissolved gas that is not dissolved in the supply liquid is stored, and the supply liquid storage section may be provided with a pressurized gas inlet section into which the undissolved gas pressurized by the pump is introduced.

[0011] According to this configuration, the undissolved gas discharged from the undissolved gas outlet of the gas-liquid contact section is pressurized by the pump and introduced into the gas-liquid separation section from the pressurized gas inlet provided in the supply liquid storage section of the gas-liquid separation section. This allows the undissolved gas discharged from the gas-liquid contact section to be dissolved again in the supply liquid (liquid in which gas is dissolved) in the gas-liquid separation section, making it possible to increase the concentration of the supply liquid (liquid in which gas is dissolved).

[0012] In addition, the supply liquid manufacturing apparatus of the present invention includes a pump that pressurizes the undissolved gas discharged from the undissolved gas outlet port, and the gas-liquid separation section includes a supply liquid storage section in which the supply liquid to be supplied to the use point is stored, and an undissolved gas storage section in which the undissolved gas that is not dissolved in the supply liquid is stored, and the undissolved gas storage section is provided with a pressurized gas inlet port into which the undissolved gas pressurized by the pump is introduced, and the undissolved gas introduced from the pressurized gas inlet port may be introduced to the gas-liquid contact section from the undissolved gas inlet port.

[0013] According to this configuration, the undissolved gas discharged from the undissolved gas outlet of the gas-liquid contact section is pressurized by the pump and introduced into the gas-liquid separation section from the pressurized gas inlet provided in the undissolved gas storage section of the gas-liquid separation section. The undissolved gas introduced from the pressurized gas inlet is then introduced into the gas-liquid contact section from the undissolved gas inlet. This allows the undissolved gas discharged from the gas-liquid contact section to be returned to the gas-liquid contact section and dissolved in the gas-dissolved liquid, thereby making it possible to increase the concentration of the gas-dissolved liquid.

[0014] The supply liquid producing device of the present invention may further include a cooling section for cooling the filling section.

[0015] According to this configuration, the cooling unit can cool the filling unit. Therefore, in the case where the solubility of the source gas in the source liquid decreases as the temperature increases, the filling unit can be kept at a low temperature by cooling, and the solubility of the source gas in the source liquid can be kept high. This makes it possible to increase the concentration of the gas-dissolved liquid.

[0016] In the supply liquid manufacturing apparatus of the present invention, the gas-liquid contact section and the gas-liquid separation section may be integrally configured, and the gas-liquid contact section may be disposed above the gas-liquid separation section.

[0017] According to this configuration, the gas-liquid contact section and the gas-liquid separation section are integrally configured, thereby making it possible to save space. In this case, the gas-liquid contact section can be disposed above the gas-liquid separation section.

[0018] The supply liquid producing method of the present invention is a supply liquid producing method carried out in a supply liquid producing apparatus, the supply liquid producing apparatus comprising: a raw material gas supplying section which supplies a raw material gas serving as a raw material for a gas-dissolved liquid; a raw material liquid supplying section which supplies a raw material liquid serving as a raw material for the gas-dissolved liquid; a gas-liquid mixing section which mixes the raw material gas and the raw material liquid to produce the gas-dissolved liquid; a gas-liquid separation section which separates the gas-dissolved liquid produced by the gas-liquid mixing section into a supply liquid to be supplied to a point-of-use and undissolved gas to be exhausted from an exhaust port; and a gas-liquid contact section which is disposed between the gas-liquid mixing section and the gas-liquid separation section, introducing the gas-dissolved liquid produced by the gas-liquid mixing section into the gas-liquid contact section; introducing the undissolved gas separated by the gas-liquid separation section into the gas-liquid contact section; using a filler filled in the filling section of the gas-liquid contact section to bring the gas-dissolved liquid introduced into the gas-liquid contact section into contact with the undissolved gas to dissolve the undissolved gas in the gas-dissolved liquid; delivering the gas-dissolved liquid in which the undissolved gas has been dissolved by the filling section to the gas-liquid separation section; and delivering the undissolved gas that has not been dissolved in the gas-dissolved liquid by the filling section to the exhaust port.

[0019] In this supply liquid production method, as in the above-mentioned device, the gas-liquid contact section disposed between the gas-liquid mixing section and the gas-liquid separation section can dissolve the undissolved gas (undissolved gas introduced from the undissolved gas inlet section) separated by the gas-liquid separation section in the gas-dissolved liquid (gas-dissolved liquid introduced from the gas-dissolved liquid inlet section) generated by the gas-liquid mixing section. This allows the undissolved gas separated by the gas-liquid separation section to be dissolved again in the gas-dissolved liquid, making it possible to increase the concentration of the gas-dissolved liquid. In addition, since the undissolved gas can be reused, the amount of raw material gas supplied from the raw material gas supply section can be reduced, and further, the amount of exhaust gas (undissolved gas) discharged from the exhaust port can be reduced. Effect of the Invention

[0020] According to the present invention, the gas-dissolved liquid (supply liquid) can be made highly concentrated. [Brief description of the drawings]

[0021] [Figure 1] FIG. 1 is an explanatory diagram of a supply liquid producing device according to a first embodiment of the present invention. [Diagram 2] 5 is an explanatory diagram of a modified example of the supply liquid producing device according to the first embodiment. FIG. [Diagram 3] FIG. 11 is an explanatory diagram of a supply liquid producing device according to a second embodiment of the present invention. [Figure 4] 13 is an explanatory diagram of a modified example of the supply liquid producing device according to the second embodiment. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0022] Hereinafter, a supply liquid producing apparatus according to an embodiment of the present invention will be described with reference to the drawings. In this embodiment, a supply liquid producing apparatus used for producing ozone water for cleaning electronic parts such as semiconductor devices and liquid crystal displays will be described as an example.

[0023] (First embodiment) The configuration of a supply liquid manufacturing apparatus according to a first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus according to this embodiment. As shown in FIG. 1, the supply liquid manufacturing apparatus 1 includes a raw material gas supply section 2 that supplies a raw material gas that is a raw material for the gas-dissolved liquid, a raw material liquid supply section 3 that supplies a raw material liquid that is a raw material for the gas-dissolved liquid, and a gas-liquid mixing section 4 that mixes the raw material gas and the raw material liquid to generate the gas-dissolved liquid. In this embodiment, ozone gas is used as the raw material gas for the ozone water (gas-dissolved liquid), and ultrapure water is used as the raw material liquid. In addition, a dissolution nozzle is used as the gas-liquid mixing section 4.

[0024] The piping 5 from the raw material gas supply unit 2 to the gas-liquid mixing unit 4 is provided with a valve 6 for starting / stopping the supply of the raw material gas, a flowmeter 7 for measuring the flow rate of the raw material gas, a pressure sensor 8 for measuring the pressure of the raw material gas, a pressure regulating valve 9 for regulating the pressure of the raw material gas, and a pump 10 for increasing the pressure of the raw material gas.

[0025] The supply liquid manufacturing apparatus 1 also includes a gas-liquid separation section 11 that separates the gas-dissolved liquid generated by the gas-liquid mixing section 4 into a supply liquid to be supplied to a point of use and an undissolved gas to be discharged from an exhaust port. Here, the supply liquid is ozone water, and the undissolved gas is ozone gas. A gas-liquid contact section 12 is disposed between the gas-liquid mixing section 4 and the gas-liquid separation section 11. A valve 14 is disposed in a pipe 13 from the gas-liquid mixing section 4 to the gas-liquid contact section 12 to start / stop the supply of the gas-dissolved water generated by the gas-liquid mixing section 4. In this embodiment, the gas-liquid contact section 12 and the gas-liquid separation section 11 are integrally configured, and more specifically, the gas-liquid contact section 12 is disposed above the gas-liquid separation section 11.

[0026] The gas-liquid contact section 12 includes a gas-dissolved liquid inlet section 15 into which the gas-dissolved liquid produced by the gas-liquid mixing section 4 is introduced, an undissolved gas inlet section 16 into which the undissolved gas separated by the gas-liquid separation section 11 is introduced, and a filling section 17 which is filled with a filling material that brings the gas-dissolved liquid (the gas-dissolved liquid introduced from the gas-dissolved liquid inlet section 15) into contact with the undissolved gas (the undissolved gas introduced from the undissolved gas inlet section 16) and dissolves the undissolved gas in the gas-dissolved liquid.

[0027] The filler disturbs the flow of the gas-dissolved liquid and the undissolved gas, intensifies the mixing, and increases the contact area, thereby dissolving the undissolved gas in the gas-dissolved liquid. The filler is required to have a large porosity, low resistance to the gas flow, be unlikely to cause flooding or drift when the gas and liquid flow in countercurrent, and be corrosion-resistant to the gas and liquid that flow. In this embodiment, known fillers can be used, but Teflon (registered trademark), which is corrosion-resistant to ozone gas and ozone water, is used as the filler material.

[0028] The gas-liquid contact section 12 also includes a gas-dissolved liquid outlet section 18 that delivers the gas-dissolved liquid in which the undissolved gas is dissolved by the filling section 17 to the gas-liquid separation section 11, and an undissolved gas outlet section 19 that delivers the undissolved gas that is not dissolved in the gas-dissolved liquid even by the filling section 17 to the exhaust port. In this embodiment, the undissolved gas inlet section 16 and the gas-dissolved liquid outlet section 18 are integrally configured, and can be configured, for example, of a Teflon net. The gas-liquid contact section 12 also includes a cooling section 20 that cools the filling section 17. As the cooling section 20, for example, a cooling pipe in which a cooling medium such as cooling water flows is used.

[0029] The piping 21 from the undissolved gas outlet 19 to the exhaust port is provided with a valve 22 for starting / stopping the delivery of the undissolved gas to the exhaust port, a gas decomposer 23 for decomposing the undissolved gas discharged from the exhaust port, and a pressure regulating valve 24 for adjusting the pressure of the gas discharged from the exhaust port (gas decomposed by the gas decomposer 23) to atmospheric pressure. The piping 21 from the undissolved gas outlet 19 branches midway and is connected to the gas-liquid separation section 11. The piping 25 from the undissolved gas outlet 19 to the gas-liquid separation section 11 (piping 25 branched from the piping 21) is provided with a pump 26 for pressurizing the undissolved gas delivered from the undissolved gas outlet 19.

[0030] The gas-liquid separation section 11 includes a supply liquid storage section 27 for storing the supply liquid to be supplied to the point of use, and an undissolved gas storage section 28 for storing undissolved gas that is not dissolved in the supply liquid. The supply liquid storage section 27 is provided with a pressurized gas inlet section 29 into which undissolved gas pressurized by the pump 26 is introduced. The supply liquid storage section 27 is also provided with a supply liquid outlet 30 for sending the supply liquid stored in the supply liquid storage section 27 to the point of use.

[0031] The piping 31 from the supply liquid outlet 30 to the use point is equipped with a valve 32 for starting / stopping the delivery of the supply liquid from the gas-liquid separation unit 11, a pressure sensor 33 for measuring the pressure of the supply liquid delivered from the gas-liquid separation unit 11, a concentration meter 34 for measuring the concentration of the supply liquid delivered from the gas-liquid separation unit 11 (the dissolved concentration of the raw material gas in the raw material liquid), a flow meter 35 for measuring the flow rate of the supply liquid delivered from the gas-liquid separation unit 11, and a valve 36 for starting / stopping delivery to the use point.

[0032] According to the supply liquid manufacturing apparatus 1 of the first embodiment, the gas-liquid contact section 12 disposed between the gas-liquid mixer 4 and the gas-liquid separator 11 can dissolve the undissolved gas (undissolved gas introduced from the undissolved gas inlet 16) separated by the gas-liquid separator 11 in the gas-dissolved liquid (gas-dissolved liquid introduced from the gas-dissolved liquid inlet 15) generated by the gas-liquid mixer 4. This allows the undissolved gas separated by the gas-liquid separator 11 to be dissolved again in the gas-dissolved liquid, making it possible to increase the concentration of the gas-dissolved liquid. In addition, since the undissolved gas can be reused, the amount of raw material gas supplied from the raw material gas supply section 2 can be reduced, and further, the amount of exhaust gas (undissolved gas) discharged from the exhaust port can be reduced.

[0033] In this embodiment, the undissolved gas discharged from the undissolved gas outlet 19 of the gas-liquid contact section 12 is pressurized by the pump 26 and introduced into the gas-liquid separation section 11 from the pressurized gas inlet 29 provided in the supply liquid storage section 27 of the gas-liquid separation section 11. This allows the undissolved gas discharged from the gas-liquid contact section 12 to be dissolved again in the supply liquid (liquid in which gas is dissolved) in the gas-liquid separation section 11, making it possible to increase the concentration of the supply liquid (liquid in which gas is dissolved).

[0034] In this embodiment, the filling section 17 can be cooled by the cooling section 20. Therefore, in the case where the solubility of the source gas in the source liquid decreases as the temperature increases, a low temperature state can be maintained by cooling the filling section 17, and the solubility of the source gas in the source liquid can be maintained high. This makes it possible to increase the concentration of the gas-dissolved liquid.

[0035] In addition, in this embodiment, space can be saved by integrally configuring the gas-liquid contact section 12 and the gas-liquid separation section 11. In this case, the gas-liquid contact section 12 can be disposed above the gas-liquid separation section 11.

[0036] In this embodiment, an example in which the gas-liquid contact section 12 and the gas-liquid separation section 11 are integrally configured has been described, but the gas-liquid contact section 12 and the gas-liquid separation section 11 may be configured as separate bodies as shown in Fig. 2. In this case, the undissolved gas inlet section 16 and the dissolved gas outlet section 18 are also configured as separate bodies. A known packed tower can be used as the gas-liquid contact section 12 in Fig. 2.

[0037] (Second embodiment) Next, a supply liquid manufacturing apparatus 1 according to a second embodiment of the present invention will be described. Here, the differences between the supply liquid manufacturing apparatus 1 according to the second embodiment and the first embodiment will be mainly described. Unless otherwise specified, the configuration and operation of this embodiment are the same as those of the first embodiment.

[0038] Fig. 3 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus 1 of this embodiment. As shown in Fig. 3, in this embodiment, the pipe 21 from the undissolved gas outlet 19 of the gas-liquid contact section 12 to the exhaust port branches midway and is connected to the undissolved gas storage section 28 of the gas-liquid separation section 11. A pump 26 for pressurizing the undissolved gas sent out from the undissolved gas outlet 19 is provided in the pipe 25 from the undissolved gas outlet 19 to the gas-liquid separation section 11 (pipe 25 branched from the pipe 21), and the undissolved gas storage section 28 is provided with a pressurized gas inlet section 29 into which the undissolved gas pressurized by the pump 26 is introduced, and the undissolved gas introduced from the pressurized gas inlet section 29 is introduced from the undissolved gas inlet section 16 to the gas-liquid contact section 12.

[0039] The supply liquid producing device 1 according to the second embodiment as described above also provides the same effects as those of the first embodiment.

[0040] That is, according to the present embodiment, the gas-liquid contact section 12 disposed between the gas-liquid mixer 4 and the gas-liquid separator 11 can dissolve the undissolved gas (undissolved gas introduced from the undissolved gas inlet 16) separated by the gas-liquid separator 11 in the gas-dissolved liquid (gas-dissolved liquid introduced from the gas-dissolved liquid inlet 15) generated by the gas-liquid mixer 4. This allows the undissolved gas separated by the gas-liquid separator 11 to be dissolved again in the gas-dissolved liquid, making it possible to increase the concentration of the gas-dissolved liquid. In addition, since the undissolved gas can be reused, the amount of raw material gas supplied from the raw material gas supply section 2 can be reduced, and further, the amount of exhaust gas (undissolved gas) discharged from the exhaust port can be reduced.

[0041] In this embodiment, the undissolved gas delivered from the undissolved gas outlet 19 of the gas-liquid contact section 12 is pressurized by the pump 26 and introduced into the gas-liquid separation section 11 from the pressurized gas inlet 29 provided in the undissolved gas storage section 28 of the gas-liquid separation section 11. The undissolved gas introduced from the pressurized gas inlet 29 is then introduced into the gas-liquid contact section 12 from the undissolved gas inlet 16. This allows the undissolved gas discharged from the gas-liquid contact section 12 to be returned to the gas-liquid contact section 12 again and dissolved in the gas-dissolved liquid, making it possible to increase the concentration of the gas-dissolved liquid.

[0042] In this embodiment, the filling section 17 can be cooled by the cooling section 20. Therefore, in the case where the solubility of the source gas in the source liquid decreases as the temperature increases, a low temperature state can be maintained by cooling the filling section 17, and the solubility of the source gas in the source liquid can be maintained high. This makes it possible to increase the concentration of the gas-dissolved liquid.

[0043] In addition, in this embodiment, space can be saved by integrally configuring the gas-liquid contact section 12 and the gas-liquid separation section 11. In this case, the gas-liquid contact section 12 can be disposed above the gas-liquid separation section 11.

[0044] In this embodiment, an example in which the gas-liquid contact section 12 and the gas-liquid separation section 11 are integrally configured has been described, but the gas-liquid contact section 12 and the gas-liquid separation section 11 may be configured as separate bodies as shown in Fig. 4. In this case, the undissolved gas inlet section 16 and the dissolved gas outlet section 18 are also configured as separate bodies. A known packed tower can be used as the gas-liquid contact section 12 in Fig. 4.

[0045] Although the embodiments of the present invention have been described above by way of example, the scope of the present invention is not limited to these, and changes and modifications can be made according to the purpose within the scope of the claims.

[0046] For example, in the above embodiment, the case of mixing ozone gas and water is exemplified, but the scope of the present invention is not limited to this. That is, the raw material gas is not limited to ozone gas, and the raw material liquid is not limited to pure water. For example, carbon dioxide may be dissolved in pure water to produce carbonated water, and nitrogen may be dissolved in pure water to produce nitrogen water. In addition, hydrogen may be dissolved in pure water to produce hydrogen water. In addition, the present invention can be applied to gas dissolution for producing functional water. [Industrial Applicability]

[0047] INDUSTRIAL APPLICABILITY As described above, the supply liquid manufacturing apparatus according to the present invention has the effect of being able to increase the concentration of a gas dissolved liquid (supply liquid), and is useful for cleaning electronic parts such as semiconductor devices and liquid crystal displays. [Explanation of symbols]

[0048] 1 Supply liquid production equipment 2. Raw gas supply section 3 Raw material liquid supply section 4 Gas-liquid mixing section 5 Piping 6 Valves 7 Flowmeter 8. Pressure Sensors 9. Pressure Regulating Valve 10. Pump 11 Gas-liquid separation section 12 Gas-liquid contact part 13 Piping 14 Valve 15 Gas solution inlet 16 Undissolved gas inlet 17 Filling section 18 Gas solution outlet 19 Undissolved gas outlet 20 Cooling section 21 Piping 22 Valve 23 Gas cracker 24 Pressure Regulating Valve 25 Piping 26 Pump 27 Supply liquid reservoir 28 Undissolved gas storage section 29 Pressurized gas inlet 30 Supply liquid outlet 31 Piping 32 Valve 33 Pressure Sensor 34 Densitometer 35 Flow meter 36 Valve

Claims

1. a raw material gas supply unit for supplying a raw material gas serving as a raw material for the gas solution; a raw material liquid supply unit for supplying a raw material liquid serving as a raw material for the gas solution; a gas-liquid mixing section for mixing the source gas and the source liquid to generate the gas-dissolved liquid; a gas-liquid separation section that separates the gas-dissolved liquid generated by the gas-liquid mixing section into a supply liquid that is supplied to a point of use and an undissolved gas that is exhausted from an exhaust port; a gas-liquid contact section disposed between the gas-liquid mixing section and the gas-liquid separation section; Equipped with The gas-liquid contact section is a gas-dissolved liquid inlet portion into which the gas-dissolved liquid generated by the gas-liquid mixing portion is introduced; an undissolved gas inlet portion into which the undissolved gas separated by the gas-liquid separation portion is introduced; a filling section filled with a filling material that brings the gas-dissolved liquid introduced from the gas-dissolved liquid inlet port into contact with the undissolved gas introduced from the undissolved gas inlet port, thereby dissolving the undissolved gas in the gas-dissolved liquid; a gas-dissolved liquid outlet portion for delivering the gas-dissolved liquid in which the undissolved gas is dissolved by the filling portion to the gas-liquid separation portion; an undissolved gas outlet portion for delivering the undissolved gas that has not been dissolved in the gas dissolving liquid by the filling portion to the exhaust port; A supply liquid producing device comprising:

2. The supply liquid producing device includes: a pump for pressurizing the undissolved gas discharged from the undissolved gas outlet, The gas-liquid separation section is a supply liquid storage section for storing the supply liquid to be supplied to the point of use; an undissolved gas storage section for storing the undissolved gas that is not dissolved in the supply liquid; Equipped with 2. The supply liquid producing device according to claim 1, wherein the supply liquid storage section is provided with a pressurized gas inlet section into which the undissolved gas pressurized by the pump is introduced.

3. The supply liquid producing device includes: a pump for pressurizing the undissolved gas discharged from the undissolved gas outlet, The gas-liquid separation section is a supply liquid storage section for storing the supply liquid to be supplied to the point of use; an undissolved gas storage section for storing the undissolved gas that is not dissolved in the supply liquid; Equipped with the undissolved gas storage section is provided with a pressurized gas inlet section into which the undissolved gas pressurized by the pump is introduced, 2. The supply liquid manufacturing device according to claim 1, wherein the undissolved gas introduced from the pressurized gas inlet is introduced from the undissolved gas inlet into the gas-liquid contact section.

4. 4. The supply liquid producing device according to claim 1, further comprising a cooling section for cooling the filling section.

5. The gas-liquid contact section and the gas-liquid separation section are integrally constructed, 5. The supply liquid manufacturing device according to claim 1, wherein the gas-liquid contact section is disposed above the gas-liquid separation section.

6. A supply liquid producing method carried out by a supply liquid producing device, comprising: The supply liquid producing device includes: a raw material gas supply unit for supplying a raw material gas serving as a raw material for the gas solution; a raw material liquid supply unit for supplying a raw material liquid serving as a raw material for the gas solution; a gas-liquid mixing section for mixing the source gas and the source liquid to generate the gas-dissolved liquid; a gas-liquid separation section that separates the gas-dissolved liquid generated by the gas-liquid mixing section into a supply liquid that is supplied to a point of use and an undissolved gas that is exhausted from an exhaust port; a gas-liquid contact section disposed between the gas-liquid mixing section and the gas-liquid separation section; Equipped with The supply liquid producing method includes: introducing the gas-dissolved liquid produced by the gas-liquid mixing section into the gas-liquid contact section; introducing the undissolved gas separated by the gas-liquid separation section into the gas-liquid contact section; contacting the gas-dissolved liquid introduced into the gas-liquid contact section with the undissolved gas using a packing packed in a packed section of the gas-liquid contact section to dissolve the undissolved gas in the gas-dissolved liquid; sending the gas-dissolved liquid in which the undissolved gas has been dissolved by the filling unit to the gas-liquid separation unit; sending the undissolved gas that has not been dissolved in the gas dissolving liquid by the filling section to the exhaust port; 13. A method for producing a supply liquid comprising:

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