Processing liquid circulation method and substrate processing method

Abstract

To provide a processing liquid circulation method that can reduce effectively particles included in processing liquid.SOLUTION: In a processing liquid circulation method, processing liquid is circulated in a processing liquid supply device 200. The processing liquid supply device 200 includes a pump 34, a filter 37, and a pressure regulation valve 43. The pump 34 pumps the processing liquid. The filter 37 captures particles included in the processing liquid. The pressure regulation valve 43 regulates the pressure of the processing liquid circulating in an external circulation pump 60. The processing liquid circulation method includes: a step S1 of keeping the pressure of the pump 34 constant; and a step S4 of circulating the processing liquid through the external circulation pump 60 by causing the pressure regulation valve 43 to set the pressure of the processing liquid to first pressure P1 with the pressure of the pump 34 kept constant. The first pressure P1 is lower than second pressure P2. The second pressure is the pressure of the processing liquid flowing in the external circulation pump 60 when a nozzle 14 discharges the processing liquid to a substrate W.SELECTED DRAWING: Figure 7

Description

[Technical field]

[0001] The present invention relates to a processing liquid circulating method and a substrate processing method. [Background technology]

[0002] The liquid processing apparatus described in Patent Document 1 includes a tank, a circulation line, a pump, a filter, a back pressure valve, and a control unit. The tank stores the processing liquid. The circulation line returns the processing liquid sent from the tank to the tank. The pump forms a circulating flow of the processing liquid in the circulation line. The filter is provided in the circulation line downstream of the pump. The back pressure valve is provided in the circulation line downstream of the filter. The control unit controls the pump and the back pressure valve. When starting to circulate the processing liquid in the circulation line, the control unit controls the pump discharge pressure so that the pump discharge pressure rises to a first pressure and increases to a second pressure greater than the first pressure after a predetermined time has elapsed.

[0003] By controlling the discharge pressure of the pump to be the first pressure and starting the circulation of the treatment liquid, the pressure difference between the upstream side and the downstream side of the filter can be kept small. As a result, it is possible to prevent foreign matter (particles) from passing through the filter due to the discharge pressure of the pump immediately after starting the circulation of the treatment liquid. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2019-41039 A Summary of the Invention [Problem to be solved by the invention]

[0005] The inventors of the present application have conducted extensive research into a technique for reducing particles contained in a processing liquid using a method different from that of the liquid processing apparatus described in Patent Document 1.

[0006] An object of the present invention is to provide a processing liquid circulating method and a substrate processing method that can effectively reduce particles contained in the processing liquid. [Means for solving the problem]

[0007] According to one aspect of the present invention, in a processing liquid circulation method, a processing liquid supplying device that supplies a processing liquid to a nozzle that ejects the processing liquid onto a substrate circulates the processing liquid. The processing liquid supplying device includes a processing liquid tank, a first circulation pipe, a pipe, a pump, a filter, and a pressure adjustment valve. The processing liquid tank stores the processing liquid. The first circulation pipe has an upstream end connected to the processing liquid tank and a downstream end connected to the processing liquid tank, and the processing liquid circulates through the pipe. The pipe is connected to the first circulation pipe and supplies the processing liquid to the nozzle. The pump is disposed in the first circulation pipe and sends out the processing liquid. The filter is disposed in the first circulation pipe and captures particles contained in the processing liquid. The pressure adjustment valve is disposed in the first circulation pipe downstream of the filter and adjusts the pressure of the processing liquid circulating through the first circulation pipe. The processing liquid circulation method includes a pressure maintaining step of maintaining a constant pressure of the pump, and a first circulation step of circulating the processing liquid through the first circulation pipe by setting the pressure of the processing liquid to a first pressure by the pressure regulating valve while the pressure of the pump is maintained constant. The first pressure is lower than a second pressure. The second pressure indicates a pressure of the processing liquid flowing through the first circulation pipe when the nozzle ejects the processing liquid onto the substrate.

[0008] In the pressure holding step, the pressure of the pump may be held constant at a first pump pressure.In the first circulation step, the pump pressure may be held constant at the first pump pressure.The processing liquid circulating method may include a processing liquid supply step of setting the pressure of the processing liquid flowing through the first circulation piping to a second pressure by the pressure regulating valve in a state in which the pump pressure is held at the first pump pressure, circulating the processing liquid through the first circulation piping, and supplying the processing liquid flowing through the first circulation piping to the nozzle. In one aspect of the present invention, the first circulation step preferably includes a first pre-dispensing step. The aboveIn the first pre-dispense step, it is preferable to supply the processing liquid from the first circulation pipe to the nozzle, thereby causing the nozzle to execute a first pre-dispense process. The first pre-dispense process includes a process of discharging the processing liquid from the nozzle toward a liquid receiving part before the nozzle discharges the processing liquid onto the substrate. include It is preferred. The first pre-dispense step may be performed in a state in which the pressure of the processing liquid flowing through the first circulation pipe is set to the first pressure by the pressure regulating valve.

[0009] In one aspect of the present invention, the processing liquid supplying device preferably further includes a drainage pipe extending from the filter. The processing liquid circulating method preferably further includes a drainage step, which preferably includes discharging the processing liquid from the filter to the drainage pipe before the first circulation step while the pressure of the pump is kept constant.

[0010] In one aspect of the present invention, the processing liquid supplying device includes a first circulation pipe that is connected to the processing liquid tank on the upstream side of the filter. Extend It is preferable that the treatment liquid circulating method further includes a circulating step, in which the treatment liquid is circulated by supplying the treatment liquid to the second circulation piping while the pressure of the pump is kept constant, prior to the draining step.

[0011] In one aspect of the present invention, the treatment liquid circulating method preferably further includes a second circulation step, in which, after the first circulation step, the pressure of the treatment liquid is set to the second pressure by the pressure regulating valve while the pressure of the pump is kept constant, thereby circulating the treatment liquid through the first circulation pipe. In the second circulation step, the pressure of the treatment liquid may be set to the second pressure while the pressure of the pump is kept constant at the first pump pressure.

[0012] In one aspect of the present invention, the second circulation step preferably includes a second pre-dispense step. In the second pre-dispense step, the nozzle is preferably caused to execute a second pre-dispense process by supplying the processing liquid from the first circulation pipe to the nozzle. The second pre-dispense process preferably includes a process in which the nozzle discharges the processing liquid toward a liquid receiving part before the nozzle discharges the processing liquid onto the substrate. include It is preferable.

[0013] In one aspect of the present invention, The above Processing liquid supply facility The process After the second pre-dispensing step, the processing liquid is supplied to the nozzle from the first circulation pipe. It may include a step.

[0014] According to another aspect of the present invention, there is provided a method for processing a substrate with a processing liquid, the method comprising the steps of: discharging the processing liquid, which is supplied to the nozzle in the processing liquid supplying step of the processing liquid circulating method, onto the substrate by the nozzle. Effect of the Invention

[0015] According to the processing liquid circulating method and substrate processing method of the present invention, particles contained in the processing liquid can be effectively reduced. [Brief description of the drawings]

[0016] [Figure 1] 1 is a plan view showing an inside of a substrate processing apparatus according to an embodiment of the present invention; [Diagram 2] FIG. 2 is a side view showing the inside of the processing unit according to the embodiment. [Diagram 3] 1 is a diagram showing a configuration of a treatment liquid supplying device according to an embodiment of the present invention; [Figure 4] 4 is a flowchart showing a substrate processing method according to the present embodiment. [Diagram 5] 5A to 5C are diagrams illustrating an internal circulation operation of the processing liquid supplying device according to the embodiment. [Figure 6]6A and 6B are diagrams illustrating a filter drainage operation of the treatment liquid supplying device according to the embodiment. [Figure 7] 6A and 6B are diagrams illustrating an external circulation operation at a first pressure of the treatment liquid supplying device according to the embodiment. [Figure 8] 5A to 5C are diagrams illustrating a pre-dispensing operation of the treatment liquid supplying device according to the embodiment. [Figure 9] 13 is a diagram showing an external circulation operation at a second pressure of the treatment liquid supplying device according to the embodiment. FIG. [Figure 10] 5A to 5C are diagrams illustrating a processing liquid supplying operation of the processing liquid supplying device according to the embodiment. [Figure 11] 5 is a graph showing a time change in the primary side pressure of the pressure regulating valve and a time change in the number of particles according to the embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0017] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference symbols and the description will not be repeated. For convenience of explanation, the drawings also appropriately depict a three-dimensional orthogonal coordinate system (X, Y, Z). In the drawings, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0018] First, a substrate processing apparatus 100 will be described with reference to Fig. 1. Fig. 1 is a plan view showing the inside of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Fig. 1 processes a substrate W with a processing liquid.

[0019] The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display device, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, or a substrate for a solar cell.

[0020] The processing liquid is, for example, a chemical liquid, such as dilute hydrofluoric acid (DHF), hydrofluoric acid (HF), hydrofluoric nitric acid (a mixture of hydrofluoric acid and nitric acid (HNO3)), buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), phosphoric acid (H3PO4), sulfuric acid, acetic acid, nitric acid, hydrochloric acid, ammonia water, hydrogen peroxide water, organic acid (e.g., citric acid, oxalic acid), organic alkali (e.g., TMAH: tetramethylammonium hydroxide), sulfuric acid hydrogen peroxide water mixture (SPM), ammonia hydrogen peroxide water mixture (SC1), hydrochloric acid hydrogen peroxide water mixture (SC2), isopropyl alcohol (IPA), a surfactant, or a corrosion inhibitor.

[0021] As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of load ports LP, an indexer robot IR, a center robot CR, a plurality of processing units 1, a control device 2, a plurality of fluid boxes 3, and a processing liquid cabinet 4.

[0022] Each load port LP accommodates a stack of substrates W. The indexer robot IR transports the substrates W between the load port LP and the center robot CR. The center robot CR transports the substrates W between the indexer robot IR and the processing units 1. Each processing unit 1 supplies a processing liquid to the substrate W to process the substrate W. Each fluid box 3 accommodates fluidic equipment. The processing liquid cabinet 4 accommodates a processing liquid.

[0023] Specifically, the multiple processing units 1 form multiple towers TW (four towers TW in the example of FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes multiple processing units 1 (three processing units 1 in the example of FIG. 1) stacked vertically. The multiple fluid boxes 3 correspond to the multiple towers TW, respectively. The processing liquid in the processing liquid cabinet 4 is supplied to all processing units 1 included in the tower TW corresponding to the fluid box 3 via any of the fluid boxes 3.

[0024] The control device 2 controls the load port LP, the indexer robot IR, the center robot CR, the processing unit 1, the fluid box 3, and the processing liquid cabinet 4. The control device 2 is, for example, a computer.

[0025] The control device 2 includes a control unit 21 and a memory unit 22. The control unit 21 includes a processor such as a CPU (Central Processing Unit). The memory unit 22 includes a storage device and stores data and computer programs. Specifically, the memory unit 22 includes a main storage device such as a semiconductor memory, and an auxiliary storage device such as a semiconductor memory, a solid state drive, and / or a hard disk drive. The memory unit 22 may include removable media. The memory unit 22 corresponds to an example of a non-transitory computer-readable storage medium.

[0026] Next, the processing unit 1 will be described with reference to Fig. 2. Fig. 2 is a side view showing the inside of the processing unit 1.

[0027] 2, the processing unit 1 includes a chamber 11, a spin chuck 12, a spin motor 13, a nozzle 14, a nozzle moving unit 15, a plurality of guards 16, a waiting pod 17, and a nozzle 18. The substrate processing apparatus 100 further includes a processing liquid supplying apparatus 200, a drainage pipe 7, a valve 8, a valve 19, and a pipe 20. The processing liquid supplying apparatus 200 includes a valve 5 and a pipe 6. The drainage pipe 7 and the valve 8 can also be regarded as components of the processing liquid supplying apparatus 200.

[0028] Chamber 11 has a substantially box shape and accommodates spin chuck 12, spin motor 13, nozzle 14, nozzle moving section 15, multiple guards 16, waiting pod 17, nozzle 18, part of piping 6, part of drainage piping 7, and part of piping 20. For example, valves 5, 8, and 19 may also be accommodated in chamber 11.

[0029] The spin chuck 12 holds the substrate W. Specifically, the spin motor 13 rotates the spin chuck 12 about a rotation axis AX1. Thus, the spin chuck 12 rotates the substrate W about the rotation axis AX1 while holding the substrate W horizontally. Specifically, the spin chuck 12 includes a spin base 121 and a plurality of chuck members 122. The spin base 121 is substantially disk-shaped and supports the plurality of chuck members 122 in a horizontal position. The plurality of chuck members 122 hold the substrate W in a horizontal position.

[0030] The nozzle 14 ejects the processing liquid onto the substrate W. The nozzle moving unit 15 raises and lowers the nozzle 14 and rotates the nozzle 14 horizontally around a rotation axis AX2. The nozzle moving unit 15 includes, for example, a ball screw mechanism and an electric motor that provides a driving force to the ball screw mechanism in order to raise and lower the nozzle 14. The nozzle moving unit 15 also includes, for example, an electric motor in order to rotate the nozzle 14 horizontally.

[0031] The processing liquid supplying device 200 supplies the processing liquid to the nozzle 14. Specifically, a pipe 6 of the processing liquid supplying device 200 supplies the processing liquid to the nozzle 14. Thus, the processing liquid flows through the pipe 6. The valve 5 is disposed in the pipe 6. The valve 5 opens and closes the flow path of the pipe 6, and switches between supplying and stopping the processing liquid to the nozzle 14.

[0032] The waiting pod 17 is disposed below the waiting position of the nozzle 14. The waiting position indicates a position outside the spin chuck 12 with respect to the rotation axis AX1. The waiting pod 17 receives the processing liquid discharged by the nozzle 14 positioned at the waiting position. The nozzle moving unit 15 horizontally rotates the nozzle 14 between the waiting position and the processing position. The processing position of the nozzle 14 indicates a position above the substrate W. The nozzle 14 performs a pre-dispense process at the waiting position before discharging the processing liquid onto the substrate W. The pre-dispense process is a process of discharging the processing liquid toward the waiting pod 17 before discharging the processing liquid onto the substrate W. Meanwhile, the nozzle 14 discharges the processing liquid toward the substrate W at the processing position. The waiting pod 17 corresponds to an example of a "liquid receiving unit" of the present invention.

[0033] A drainage pipe 7 is connected to the standby pod 17. In the pre-dispense process, the processing liquid received by the standby pod 17 is discharged through the drainage pipe 7. The drainage pipe 7 is connected to, for example, a drainage tank. A valve 8 is disposed in the drainage pipe 7. The valve 8 opens and closes the flow path of the drainage pipe 7, and switches between discharging the processing liquid through the drainage pipe 7 and stopping the discharge.

[0034] The nozzle 18 supplies the rinsing liquid toward the substrate W. As a result, the processing liquid is washed away from the substrate W. The rinsing liquid is, for example, deionized water, carbonated water, electrolytic ionized water, hydrogen water, ozone water, or hydrochloric acid water with a diluted concentration (for example, about 10 ppm to 100 ppm).

[0035] The pipe 20 supplies the rinse liquid to the nozzle 18. Therefore, the rinse liquid flows through the pipe 20. The valve 19 is disposed in the pipe 20. The valve 19 opens and closes the flow path of the pipe 20, and switches between supplying and stopping the supply of the rinse liquid to the nozzle 18.

[0036] Each guard 16 has a generally cylindrical shape. Each guard 16 receives the processing liquid or rinsing liquid discharged from the substrate W.

[0037] Next, the processing liquid supplying apparatus 200 will be described in detail with reference to Fig. 3. Fig. 3 is a diagram showing the processing liquid supplying apparatus 200. As shown in Fig. 3, the processing liquid supplying apparatus 200 further includes a processing liquid tank 30, heaters 31 and 32, a temperature sensor 33, a pump 34, a pulse damper 35, a valve 36, a filter 37, a valve 38, temperature sensors 39 and 40, a pressure gauge 41, a temperature sensor 42, a pressure adjusting valve 43, valves 44, 45, 46, 47, 48, and 49, an outer circulation pipe 60, an inner circulation pipe 61, a drainage pipe 62, a pipe 63, a drainage pipe 64, and pipes 65 and 66. The processing liquid supplying apparatus 200 also includes a plurality of pipes 6 and a plurality of valves 5 corresponding to a plurality of processing units 1.

[0038] The heaters 31, 32, the pump 34, the valve 36, the valve 38, the pressure regulating valve 43, and the valves 5, 8, 44, 45, 46, 47, 48, 49 are controlled by the control device 2. In addition, the temperature sensors 33, 39, 40, 42 detect the temperature of the processing liquid and output a detection value indicating the detected temperature to the control device 2. In addition, the pressure gauge 41 detects the pressure of the processing liquid and output a detection value indicating the detected pressure to the control device 2.

[0039] Furthermore, for example, the processing liquid tank 30, heaters 31, 32, temperature sensor 33, pump 34, pulse damper 35, valve 36, filter 37, valve 38, temperature sensor 39, valves 44, 45, 46, 47, 48, 49, part of the external circulation piping 60, the internal circulation piping 61, part of the drainage piping 62, piping 63, part of the drainage piping 64, piping 65, and part of the piping 66 are housed in the processing liquid cabinet 4 (Figure 1).

[0040] On the other hand, for example, a part of the external circulation piping 60, the temperature sensor 40, the pressure gauge 41, the temperature sensor 42, the pressure regulating valve 43, the valve 5, and a part of the piping 6 are housed in the fluid box 3 (FIG. 1).

[0041] The processing liquid tank 30 stores the processing liquid. The pipe 66 replenishes new processing liquid to the processing liquid tank 30. The valve 49 is disposed in the pipe 66 and opens and closes the flow path of the pipe 66.

[0042] The upstream end 70 and the downstream end 71 of the external circulation pipe 60 are connected to the treatment liquid tank 30. The external circulation pipe 60 includes a first pipe 601 and a second pipe 602. One end of the first pipe 601 is connected to the treatment liquid tank 30, and the other end of the first pipe 601 is connected to the filter 37. One end of the first pipe 601 is the upstream end of the external circulation pipe 60. One end of the second pipe 602 is connected to the filter 37, and the other end of the second pipe 602 is connected to the treatment liquid tank 30. The other end of the second pipe 602 is the downstream end of the external circulation pipe 60. Although not shown in the figure for the sake of simplicity, a plurality of second pipes 602 are provided corresponding to a plurality of towers TW (FIG. 1), respectively. The plurality of second pipes 602 branch off on the secondary side of the filter 37.

[0043] The heater 31, the heater 32, the pump 34, the pulse damper 35, the valve 36, and the filter 37 are arranged in this order from upstream to downstream in the external circulation pipe 60 (specifically, the first pipe 601). The filter 37 is arranged at a position 73 in the external circulation pipe 60. The position 73 is a position downstream of the pump 34 and a position upstream of the branch position 74 and the pressure regulating valve 43.

[0044] The heaters 31 and 32 heat the processing liquid in the processing liquid tank 30 to adjust the temperature of the processing liquid in the processing liquid tank 30. In this embodiment, the processing liquid supplying device 200 has two heaters 31 and 32 connected in series, but may have one heater or three or more heaters.

[0045] The pump 34 sends out the processing liquid in the processing liquid tank 30 to the external circulation pipe 60. Specifically, the pump 34 sends out the processing liquid in the processing liquid tank 30 to the first pipe 601. The temperature sensor 33 detects the temperature of the processing liquid flowing through the first pipe 601 at a position 80 between the heater 32 and the pump 34. The pulse damper 35 suppresses pulsation of the processing liquid sent out from the pump 34. The valve 36 opens and closes the flow path of the first pipe 601 on the primary side of the filter 37.

[0046] The filter 37 captures particles contained in the processing liquid passing through the filter 37. In other words, the filter 37 removes particles contained in the processing liquid passing through the filter 37. In other words, the filter 37 filters the processing liquid.

[0047] For example, the filter 37 has a large number of holes (not shown). The processing liquid passes through the holes of the filter 37. As a result, the processing liquid is filtered by the filter 37. Specifically, when particles contained in the processing liquid pass through the holes of the filter 37, they are adsorbed by the wall surfaces that define the holes and are captured within the holes. As a result, the particles are removed from the processing liquid.

[0048] The particle capturing ability of the filter 37 increases as the flow rate of the processing liquid passing through the filter 37 increases. In other words, when the circulating flow rate of the processing liquid in the external circulation piping 60 increases, more processing liquid passes through the filter 37, and more particles are captured by the filter 37. On the other hand, the particle capturing ability of the filter 37 decreases as the flow rate of the processing liquid passing through the filter 37 decreases. In other words, when the circulating flow rate of the processing liquid in the external circulation piping 60 decreases, the flow rate of the processing liquid passing through the filter 37 decreases, and the particle capturing ability of the filter 37 decreases.

[0049] The valve 38 opens and closes the flow path of the second pipe 602 on the secondary side of the filter 37. The temperature sensor 39 detects the temperature of the treatment liquid flowing through the second pipe 602 (external circulation pipe 60) at a position 81 downstream of the filter 37 and the valve 38. The temperature sensor 40 detects the temperature of the treatment liquid flowing through the second pipe 602 (external circulation pipe 60) at a position 82 downstream of the temperature sensor 39. The position 82 is upstream of the branch position 74.

[0050] The pressure gauge 41 detects the pressure of the processing liquid flowing through the second pipe 602 (external circulation pipe 60) at position 83 on the primary side of the pressure regulating valve 43. That is, the pressure gauge 41 detects the primary side pressure of the pressure regulating valve 43. Position 83 is a position downstream of the branching position 74. The temperature sensor 42 detects the temperature of the processing liquid flowing through the second pipe 602 (external circulation pipe 60) at position 84 on the primary side of the pressure regulating valve 43. That is, the temperature sensor 42 detects the primary side temperature of the pressure regulating valve 43. Position 84 is a position downstream of the branching position 74.

[0051] The pressure regulating valve 43 is disposed in the second pipe 602 (external circulation pipe 60) at a position downstream of the filter 37 and the branch position 74. The pressure regulating valve 43 adjusts the pressure of the processing liquid to keep the pressure of the processing liquid constant. For example, when the primary pressure of the pressure regulating valve 43 becomes equal to or higher than the target pressure, the pressure regulating valve 43 releases the primary pressure to the secondary side to keep the primary pressure at the target pressure. That is, the pressure regulating valve 43 sets the pressure of the processing liquid on the primary side of the pressure regulating valve 43 to the target pressure set for the pressure regulating valve 43. For example, the control device 2 (FIG. 1) sets the target pressure for the pressure regulating valve 43. The pressure regulating valve 43 is, for example, a back pressure valve or a relief valve.

[0052] The treatment liquid flows through the external circulation piping 60 at a flow rate according to the target pressure set by the pressure regulating valve 43. For example, the smaller the target pressure set by the pressure regulating valve 43, the greater the flow rate of the treatment liquid flowing through the external circulation piping 60. In other words, the greater the target pressure set by the pressure regulating valve 43, the smaller the flow rate of the treatment liquid flowing through the external circulation piping 60.

[0053] A plurality of pipes 6 are connected to a plurality of branch positions 74 of the external circulation pipe 60 (second pipe 602), respectively. The pipes 6 extend from the branch positions 74 to the nozzle 14. The branch positions 74 are located downstream of the filter 37 and upstream of the pressure regulating valve 43. Hereinafter, the pressure regulating valve 43 may be simply referred to as the "valve 43".

[0054] The internal circulation pipe 61 extends from a branching position 72 of the first pipe 601 (external circulation pipe 60) to the processing liquid tank 30. The branching position 72 is downstream of the pump 34 and upstream of the filter 37. The valve 44 is disposed in the internal circulation pipe 61. The valve 44 opens and closes the flow path of the internal circulation pipe 61.

[0055] The drainage pipe 62 extends from the filter 37. The drainage pipe 62 is a pipe for discharging the processing liquid present inside the filter 37 (specifically, the inside primary side). Specifically, one end of the drainage pipe 62 is connected to the primary side space inside the filter 37, and the other end of the drainage pipe 62 is connected to, for example, a drainage tank. The valve 45 is disposed in the drainage pipe 62. The valve 45 opens and closes the flow path of the drainage pipe 62.

[0056] The drainage pipe 64 extends from the filter 37. The drainage pipe 64 is a pipe for discharging the processing liquid present inside the filter 37 (specifically, on the internal secondary side). Specifically, one end of the drainage pipe 64 is connected to the secondary side space inside the filter 37, and the other end of the drainage pipe 64 is connected to, for example, a drain tank. The valve 46 is disposed in the drainage pipe 64. The valve 46 opens and closes the flow path of the drainage pipe 64.

[0057] The pipe 63 extends from the filter 37 to the processing liquid tank 30. The pipe 63 is a pipe for removing air bubbles inside the filter 37 (specifically, the internal primary side) that cause particle generation. Specifically, one end of the pipe 63 is connected to the internal primary side space of the filter 37, and the other end of the pipe 63 is connected to the processing liquid tank 30. The valve 47 is disposed in the pipe 63. The valve 47 opens and closes the flow path of the pipe 63.

[0058] The pipe 65 extends from the filter 37 to the processing liquid tank 30. The pipe 65 is a pipe for removing air bubbles inside the filter 37 (specifically, on the internal secondary side) that cause particle generation. Specifically, one end of the pipe 65 is connected to the internal secondary side space of the filter 37, and the other end of the pipe 65 is connected to the processing liquid tank 30. The valve 48 is disposed in the pipe 65. The valve 48 opens and closes the flow path of the pipe 65.

[0059] Next, the substrate processing method according to the present embodiment will be described with reference to FIGS. 4 to 10. FIG. 4 is a flow chart showing the substrate processing method according to the present embodiment. FIG. 5 is a diagram showing an internal circulation operation of the processing liquid supplying apparatus 200. FIG. 6 is a diagram showing a filter drainage operation of the processing liquid supplying apparatus 200. FIG. 7 is a diagram showing an external circulation operation of the processing liquid supplying apparatus 200 at a first pressure P1. FIG. 8 is a diagram showing a pre-dispense operation of the processing liquid supplying apparatus 200. FIG. 9 is a diagram showing an external circulation operation of the processing liquid supplying apparatus 200 at a second pressure P2. FIG. 10 is a diagram showing a processing liquid supplying operation of the processing liquid supplying apparatus 200.

[0060] In the symbols showing valves 5, 8, 36, 38, 43, 44, 45, 46, 47, and 48 in Figures 5 to 10, white indicates that the valve is closed, and black indicates that the valve is open. In the symbol showing pump 34, a white triangle indicates that pump 34 is stopped, and a black triangle indicates that pump 34 is operating. Furthermore, the flow path of the processing liquid is indicated by a thick line.

[0061] As shown in Fig. 4, the substrate processing method according to this embodiment includes steps S1 to S10. Step S4 includes step S40. Step S5 includes step S50. The substrate processing method is performed by the substrate processing apparatus 100. In particular, steps S1 to S5 constitute a processing liquid circulating method. The processing liquid circulating method is performed by the processing liquid supplying apparatus 200. In the processing liquid circulating method, the processing liquid is circulated in the processing liquid supplying apparatus 200, which supplies the processing liquid to the nozzle 14 that discharges the processing liquid onto the substrate W.

[0062] 4 and 5, first, in step S1, the processing liquid supplying apparatus 200 drives the pump 34 to maintain the pressure (discharge pressure) of the pump 34 constant. Specifically, the control device 2 (FIG. 1) controls the pump 34 so that the pressure (discharge pressure) of the pump 34 is maintained constant. Step S1 corresponds to an example of a "pressure maintaining step" of the present invention.

[0063] Next, in step S2, the processing liquid supplying device 200 internally circulates the processing liquid. The internal circulation means that the processing liquid is circulated by the internal circulation piping 61. The step S2 corresponds to an example of the "circulation step" of the present invention.

[0064] 5, the processing liquid supplying device 200 opens the valve 44 and closes the valves 5, 8, 36, 38, 43, 45, 46, 47, and 48 under the control of the control device 2. As a result, the processing liquid stored in the processing liquid tank 30 circulates through the first pipe 601 and the internal circulation pipe 61. In this case, the control device 2 controls the heaters 31 and 32 so that the temperature of the processing liquid circulating internally becomes a target temperature while monitoring the temperature of the processing liquid detected by the temperature sensor 33. When the temperature of the processing liquid circulating internally reaches the target temperature, the process proceeds to step S3.

[0065] That is, in step S2, the processing liquid supplying device 200 circulates the processing liquid by supplying the processing liquid to the internal circulation pipe 61 while keeping the pressure of the pump 34 constant before step S3. As a result, the temperature of the processing liquid can reach the target temperature before step S3.

[0066] 4 and 6, in step S3, the processing liquid supplying device 200 discharges the processing liquid inside the filter 37 to the drainage pipe 62. In the example of Fig. 6, the processing liquid supplying device 200 discharges the processing liquid present in the primary side space inside the filter 37 to the drainage pipe 62. Step S3 corresponds to an example of the "discharge step" of the present invention.

[0067] 6, the processing liquid supplying device 200 opens the valves 36 and 45 and closes the valves 5, 8, 38, 43, 44, 46, 47, and 48 for a predetermined liquid drainage period under the control of the control device 2. Therefore, during the predetermined liquid drainage period, the processing liquid inside the filter 37 is discharged to the drainage pipe 62. As a result, particles in the processing liquid are also discharged from the drainage pipe 62. The predetermined liquid drainage period is determined in advance, for example, experimentally and / or empirically.

[0068] That is, before step S4, the processing liquid supplying apparatus 200 discharges the processing liquid from the filter 37 to the drain pipe 62 while the pressure of the pump 34 is kept constant. Therefore, particles present on the primary side of the filter 37 and particles present inside the filter 37 (inner primary side) can be discharged through the drain pipe 62. As a result, the particles contained in the processing liquid can be effectively reduced.

[0069] For example, in step S3, the processing liquid supplying apparatus 200 may open the valve 46 for a certain period of time simultaneously with opening the valve 45, after opening the valve 45, or before opening the valve 45. In this case, particles present inside the filter 37 (internal secondary side) can be discharged through the drain pipe 64. As a result, the particles contained in the processing liquid can be further effectively reduced.

[0070] Next, as shown in FIG. 4 and FIG. 7, in step S4, the processing liquid supplying device 200 externally circulates the processing liquid. External circulation refers to circulating the processing liquid through the external circulation piping 60. In particular, in step S4, the processing liquid supplying device 200 sets the pressure of the processing liquid to a first pressure P1 and externally circulates the processing liquid. The first pressure P1 is lower than the second pressure P2. The second pressure P2 indicates the pressure of the processing liquid flowing through the external circulation piping 60 when the nozzle 14 discharges the processing liquid onto the substrate W. In other words, the second pressure P2 indicates the pressure of the processing liquid when the processing liquid is supplied from the external circulation piping 60 to the nozzle 14 through the piping 6 when the nozzle 14 discharges the processing liquid onto the substrate W. Step S4 corresponds to an example of the "first circulation step" of the present invention.

[0071] Specifically, as shown in FIG. 7, the processing liquid supplying device 200 opens the valves 36, 38, and 43 and closes the valves 5, 8, 45, 46, 47, and 48 only during the first circulation period under the control of the control device 2. As a result, during the first circulation period, the processing liquid stored in the processing liquid tank 30 circulates through the external circulation piping 60. In this case, the control device 2 sets the target pressure of the pressure regulating valve 43 to the first pressure P1, thereby setting the pressure of the processing liquid to the first pressure P1. Therefore, the processing liquid circulates through the external circulation piping 60 at a flow rate according to the first pressure P1. Note that the first circulation period is, for example, determined in advance experimentally and / or empirically. The first circulation period is an external circulation period at the first pressure P1. In addition, when the target pressure of the pressure regulating valve 43 is set to the first pressure P1, the pressure of the processing liquid on the primary side of the pressure regulating valve 43 becomes the first pressure P1, so that the pressure of the processing liquid detected by the pressure gauge 41 is the first pressure P1.

[0072] That is, in step S4, the processing liquid supplying device 200 circulates the processing liquid through the external circulation piping 60 by setting the pressure of the processing liquid to the first pressure P1 by the pressure regulating valve 43 while the pressure of the pump 34 is kept constant. Therefore, the flow rate of the processing liquid flowing through the external circulation piping 60 can be increased compared to the case where the pressure of the processing liquid is set to the second pressure P2 (>first pressure P1). As a result, the particle capturing ability of the filter 37 is improved, and the particles contained in the processing liquid can be further effectively reduced.

[0073] The degree of opening of the pressure regulating valve 43 when the target pressure of the pressure regulating valve 43 is set to the first pressure P1 is relatively larger than the degree of opening of the pressure regulating valve 43 when the target pressure of the pressure regulating valve 43 is set to the second pressure P2. This is because the first pressure P1 is smaller than the second pressure P2.

[0074] As shown in FIGS. 4 and 8, the processing liquid supplying apparatus 200 preferably performs step S40 during the execution of step S4.

[0075] In step S40, the processing liquid supplying apparatus 200 causes the nozzle 14 to perform a first pre-dispense process. The first pre-dispense process refers to a process in which the nozzle 14 discharges the processing liquid toward the waiting pod 17 during execution of step S4, before the nozzle 14 discharges the processing liquid onto the substrate W. In particular, in step S40, the processing liquid supplying apparatus 200 sets the pressure of the processing liquid to a first pressure P1, and causes the nozzle 14 to perform the first pre-dispense process. Step S40 corresponds to an example of a "first pre-dispense process" of the present invention.

[0076] Specifically, as shown in FIG. 8, the processing liquid supplying device 200 opens the valves 5, 8, 36, 38, and 43 and closes the valves 45, 46, 47, and 48 only during the first drainage period under the control of the control device 2. As a result, during the first drainage period, the processing liquid flowing through the external circulation pipe 60 is supplied from the pipe 6 to the nozzle 14. Then, the nozzle 14 ejects the processing liquid into the standby pod 17 during the first drainage period. Therefore, during the first drainage period, the processing liquid in the standby pod 17 is discharged into the drainage pipe 7. As a result, particles in the processing liquid are also discharged from the drainage pipe 7. The first drainage period is, for example, predetermined experimentally and / or empirically.

[0077] That is, in step S40, the nozzle 14 is caused to execute the first pre-dispense process by supplying the processing liquid from the external circulation piping 60 to the nozzle 14. Therefore, particles present between the secondary side of the filter 37 and the nozzle 14 are removed by the drainage piping 7. As a result, the particles contained in the processing liquid can be further effectively reduced.

[0078] Furthermore, the processing liquid supplying apparatus 200 may perform step S40 multiple times during the execution of step S4. By performing step S40 multiple times, it is possible to more effectively reduce particles contained in the processing liquid. When performing step S40 multiple times, the processing liquid supplying apparatus 200 performs step S40 periodically or irregularly, for example.

[0079] For example, the lower the temperature of the processing liquid, the more times the processing liquid supplying apparatus 200 executes step S40. This is because the lower the temperature of the processing liquid, the greater the viscosity of the processing liquid, making it more difficult for the processing liquid to circulate. If the processing liquid is less likely to circulate, the filter 37 will have a lower ability to capture particles. Therefore, by increasing the number of times of step S40, particles can be effectively reduced. Furthermore, for the same reason, for example, the processing liquid supplying apparatus 200 may execute step S40 more times as the concentration of the processing liquid increases. Furthermore, for the same reason, for example, the processing liquid supplying apparatus 200 may execute step S40 more times as the viscosity of the processing liquid increases.

[0080] In addition, the processing liquid supplying apparatus 200 may remove air bubbles inside the filter 37 by opening the valves 47 and 48 in step S4.

[0081] Next, as shown in Fig. 4 and Fig. 9, in step S5, the processing liquid supplying device 200 externally circulates the processing liquid. Particularly, in step S5, the processing liquid supplying device 200 sets the pressure of the processing liquid to a second pressure P2, and externally circulates the processing liquid. The second pressure P2 is higher than the first pressure P1. Step S5 corresponds to an example of a "second circulation step" of the present invention.

[0082] Specifically, as shown in FIG. 9, the processing liquid supplying device 200 opens the valves 36, 38, and 43 and closes the valves 5, 8, 45, 46, 47, and 48 only during the second circulation period under the control of the control device 2. As a result, during the second circulation period, the processing liquid stored in the processing liquid tank 30 circulates through the external circulation piping 60. In this case, the control device 2 sets the target pressure of the pressure regulating valve 43 to the second pressure P2, thereby setting the pressure of the processing liquid to the second pressure P2. Therefore, the processing liquid circulates through the external circulation piping 60 at a flow rate according to the second pressure P2. Note that the second circulation period is, for example, determined in advance experimentally and / or empirically. The second circulation period is an external circulation period at the second pressure P2. In addition, when the target pressure of the pressure regulating valve 43 is set to the second pressure P2, the pressure of the processing liquid on the primary side of the pressure regulating valve 43 becomes the second pressure P2, so that the pressure of the processing liquid detected by the pressure gauge 41 indicates the second pressure P2.

[0083] That is, in step S5, the processing liquid supplying apparatus 200 circulates the processing liquid through the external circulation pipe 60 by setting the pressure of the processing liquid to the second pressure P2 (>first pressure P1) by the pressure regulating valve 43 while keeping the pressure of the pump 34 constant. Therefore, the pressure of the processing liquid increases. As a result, the pressure of the processing liquid can be set to a value suitable for discharging the processing liquid onto the substrate W by the nozzle 14.

[0084] As shown in FIGS. 4 and 8, the processing liquid supplying apparatus 200 preferably executes step S50 during execution of step S5.

[0085] In step S50, the processing liquid supplying apparatus 200 causes the nozzle 14 to perform a second pre-dispense process. The second pre-dispense process refers to a process in which the nozzle 14 discharges the processing liquid toward the waiting pod 17 during execution of step S5, before the nozzle 14 discharges the processing liquid onto the substrate W. In particular, in step S50, the processing liquid supplying apparatus 200 sets the pressure of the processing liquid to a second pressure P2, and causes the nozzle 14 to perform the second pre-dispense process. Step S50 corresponds to an example of a "second pre-dispense process" of the present invention.

[0086] Specifically, as shown in FIG. 8, the processing liquid supplying device 200 opens the valves 5, 8, 36, 38, and 43 and closes the valves 45, 46, 47, and 48 only during the second drainage period under the control of the control device 2. As a result, during the second drainage period, the processing liquid flowing through the external circulation pipe 60 is supplied from the pipe 6 to the nozzle 14. Then, the nozzle 14 ejects the processing liquid into the standby pod 17 during the second drainage period. Therefore, during the second drainage period, the processing liquid in the standby pod 17 is discharged into the drainage pipe 7. As a result, particles in the processing liquid are also discharged from the drainage pipe 7. The second drainage period is, for example, predetermined experimentally and / or empirically.

[0087] That is, in step S50, the nozzle 14 is caused to execute the second pre-dispense process by supplying the processing liquid from the external circulation piping 60 to the nozzle 14. Therefore, particles present between the secondary side of the filter 37 and the nozzle 14 are removed by the drainage piping 7. As a result, the particles contained in the processing liquid can be further effectively reduced.

[0088] Furthermore, the processing liquid supplying apparatus 200 may execute step S50 multiple times during execution of step S5. By executing step S50 multiple times, it is possible to more effectively reduce particles contained in the processing liquid. When executing step S50 multiple times, the processing liquid supplying apparatus 200 executes step S50 periodically or irregularly, for example.

[0089] For example, the lower the temperature of the processing liquid, the more times the processing liquid supplying apparatus 200 executes step S50. The reason is the same as when step S40 is executed multiple times. Also, for the same reason, for example, the higher the concentration of the processing liquid, the more times the processing liquid supplying apparatus 200 may execute step S50. Furthermore, for the same reason, for example, the higher the viscosity of the processing liquid, the more times the processing liquid supplying apparatus 200 may execute step S50.

[0090] In addition, the processing liquid supplying apparatus 200 may remove air bubbles inside the filter 37 by opening the valves 47 and 48 in step S5.

[0091] 1, 2 and 4, in step S6, the center robot CR carries the substrate W into the processing unit 1. Then, in the processing unit 1, the spin chuck 12 rotates the substrate W while holding it.

[0092] 4 and 10, in step S7, the processing liquid supplying device 200 supplies the processing liquid from the external circulation piping 60 through the piping 6 to the nozzle 14. As a result, the nozzle 14 ejects the processing liquid onto the substrate W. Then, the substrate W is processed with the processing liquid. Step S7 corresponds to an example of the "processing liquid supplying step" of the present invention. Note that step S7 may be included in the processing liquid circulating method according to the present embodiment.

[0093] 10, the processing liquid supplying apparatus 200 opens valves 5, 36, 38, and 43 and closes valves 8, 45, 46, 47, and 48 for a predetermined processing period under the control of the control device 2. As a result, during the predetermined processing period, the processing liquid flowing through the external circulation piping 60 is supplied from the piping 6 to the nozzle 14. During the predetermined processing period, the nozzle 14 ejects the processing liquid onto the substrate W. When the predetermined processing period has elapsed since the valve 5 was opened, the valve 5 is closed and ejection of the processing liquid from the nozzle 14 is stopped. The predetermined processing period is determined in advance according to the processing purpose of the substrate W.

[0094] That is, in step S7, the processing liquid supplying apparatus 200 supplies the processing liquid from the outer circulation piping 60 to the nozzle 14 after step S5. In the example of Fig. 4, in step S7, the processing liquid supplying apparatus 200 supplies the processing liquid from the outer circulation piping 60 to the nozzle 14 after step S50. Then, the processing liquid supplied to the nozzle 14 is discharged onto the substrate W by the nozzle 14. As a result, the substrate W can be processed with the processing liquid with reduced particles.

[0095] 2 and 4, in step S8, the nozzle 18 ejects a rinsing liquid onto the substrate W. As a result, the processing liquid on the substrate W is washed away by the rinsing liquid.

[0096] 2, when the valve 19 is opened, the nozzle 18 ejects the rinsing liquid onto the substrate W. When a predetermined rinsing period has elapsed since the valve 19 was opened, the valve 19 is closed and ejection of the rinsing liquid from the nozzle 18 is stopped. The predetermined rinsing period is determined in advance, for example, experimentally and / or empirically.

[0097] Next, as shown in FIGS. 2 and 4, in step S9, the substrate W is dried by rotating the substrate W at high speed.

[0098] Specifically, the spin motor 13 accelerates the substrate W in the rotation direction, and rotates the substrate W at a high rotation speed that is higher than the rotation speed of the substrate W in steps S7 and S8. As a result, the liquid is removed from the substrate W, and the substrate W is dried. When a predetermined drying period has elapsed since the high-speed rotation of the substrate W was started, the spin motor 13 stops rotating. Then, the rotation of the substrate W is stopped. Note that the predetermined drying period is, for example, determined in advance experimentally and / or empirically.

[0099] 1, 2 and 4, in step S10, the center robot CR unloads the substrate W from the processing unit 1. That is, the processed substrate W is unloaded from the chamber 11. Then, the substrate processing method is completed.

[0100] Next, with reference to Fig. 4 and Fig. 11, it will be described how the processing liquid supplying apparatus 200 according to this embodiment can effectively reduce the number of particles in the processing liquid. Fig. 11 is a graph showing the time change of the primary side pressure of the pressure regulating valve 43 and the time change of the number of particles. In graph GP1, the horizontal axis indicates time, and the vertical axis indicates the pressure of the processing liquid. In this case, the pressure of the processing liquid indicates the primary side pressure of the pressure regulating valve 43. In other words, the pressure of the processing liquid indicates the pressure of the processing liquid measured by the pressure gauge 41. Moreover, in graph GP2, the horizontal axis indicates time, and the vertical axis indicates the number of particles in the processing liquid. The number of particles indicates the number of particles contained in the processing liquid on the substrate W after the processing liquid is discharged onto the substrate W.

[0101] As shown in FIG. 11, when the internal circulation (step S2) is performed, the number of particles is the largest at time t1.

[0102] Then, by performing the filter drainage (step S3), the number of particles at time t2 is reduced compared to the number of particles at time t1 because the particles present on the primary side of the filter 37 and the particles present inside the filter 37 are discharged through the drainage pipe 62.

[0103] Next, by performing external circulation (step S4) under the first pressure P1, the number of particles at time t3 is reduced below the number of particles at time t2. This is because the pressure of the processing liquid is set to the first pressure P1 (< the second pressure P2) at time t3, thereby increasing the circulating flow rate of the processing liquid and allowing the filter 37 to capture more particles. In other words, when the circulating flow rate of the processing liquid increases, more processing liquid passes through the filter 37, and more particles are captured by the filter 37. Specifically, particles present on the secondary side of the filter 37 flow into the filter 37 from the primary side by external circulation and are captured by the filter 37.

[0104] Next, at time t4 immediately after the start of external circulation by the first pressure P1, the first pre-dispense process (step S40) is executed. Therefore, particles present between the secondary side of the filter 37 and the nozzle 14 are removed by the drain pipe 7. As a result, the number of particles at time t4 is smaller than the number of particles at time t3.

[0105] Next, at time t5 during external circulation by the first pressure P1, the first pre-dispense process (step S40) is executed again. Therefore, particles present between the secondary side of the filter 37 and the nozzle 14 are further removed by the drainage pipe 7. As a result, the number of particles at time t5 is smaller than the number of particles at time t4.

[0106] Next, by performing external circulation (step S5) under the second pressure P2, the number of particles at time t6 increases slightly more than the number of particles at time t5. This is because, by setting the pressure of the processing liquid to the second pressure P2 (>first pressure P1) at time t6, the circulating flow rate of the processing liquid decreases, and the particle capturing ability of the filter 37 decreases slightly. In other words, when the circulating flow rate of the processing liquid decreases, the flow rate of the processing liquid passing through the filter 37 decreases, and the particle capturing ability of the filter 37 decreases.

[0107] Therefore, at time t7 immediately after the start of external circulation by the second pressure P2, the second pre-dispense process (step S50) is executed. Therefore, particles present between the secondary side of the filter 37 and the nozzle 18 are removed by the drain pipe 7. As a result, the number of particles at time t7 is smaller than the number of particles at time t6.

[0108] Then, the supply of the processing liquid to the nozzle 14 is put on hold by external circulation caused by the second pressure P2. In this case, the number of particles contained in the processing liquid is significantly reduced. As a result, the substrate W can be processed with the processing liquid containing an extremely small number of particles. In addition, the second pressure P2 (>first pressure P1) ensures a discharge pressure required when the nozzle 14 discharges the processing liquid onto the substrate W.

[0109] The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments, and can be implemented in various aspects without departing from the gist of the present invention. In addition, the components disclosed in the above embodiments can be modified as appropriate. For example, a certain component among all the components shown in one embodiment may be added to a component of another embodiment, or some components among all the components shown in one embodiment may be deleted from the embodiment.

[0110] The drawings show each component diagrammatically to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each component shown in the drawings may differ from the actual ones due to the convenience of creating the drawings. Furthermore, the configurations of each component shown in the above embodiment are merely examples, and are not particularly limited, and it goes without saying that various modifications are possible within a range that does not substantially deviate from the effects of the present invention.

[0111] (1) In this embodiment, the processing liquid circulation method shown in Fig. 4 may include at least step S1 and step S4. This is because particles contained in the processing liquid can be effectively removed. Therefore, the processing liquid circulation method does not have to include step S2, step S3, and step S5. Furthermore, the processing liquid circulation method may include one or more steps of step S2, step S3, and step S5. Furthermore, step S4 does not have to include step S40. Furthermore, step S5 does not have to include step S50.

[0112] (2) The processing liquid supplying device 200 shown in Fig. 3 does not need to have the valve 38. The reason is as follows. For example, in step S3, when the temperature of the processing liquid is relatively low, the viscosity of the processing liquid is relatively high, so that the processing liquid does not easily flow to the secondary side of the filter 37 even in the absence of the valve 38. Therefore, the processing liquid flows into the drainage pipe 62, and step S3 can be easily performed.

[0113] (3) The processing liquid supplying device 200 shown in Fig. 3 does not need to have the valve 36. The reason is as follows. For example, in step S2, the temperature of the processing liquid is relatively low and the viscosity of the processing liquid is relatively high, so that even in the absence of the valve 36, the processing liquid is unlikely to flow to the secondary side of the filter 37 and the drainage pipe 62. Therefore, the processing liquid flows into the internal circulation pipe 61, and step S2 can be easily performed.

[0114] (4) The processing liquid supplying apparatus 200 shown in Fig. 3 does not need to have the valves 36 and 38. The reason is as described above in (1) and (2). [Industrial Applicability]

[0115] The present invention relates to a processing liquid circulating method and a substrate processing method, and has industrial applicability. [Explanation of symbols]

[0116] 6 Piping 14 Nozzles 17 Waiting pod (liquid receiving part) 30 Processing liquid tank 34 Pump 37 Filters 43 Pressure Regulating Valve 60 External circulation piping (1st circulation piping) 61 Internal circulation piping (second circulation piping) 62, 64 Drainage piping 100 Substrate processing apparatus 200 Processing liquid supply device

Claims

1. 1. A method for circulating a processing liquid in a processing liquid supplying apparatus that supplies a processing liquid to a nozzle that discharges the processing liquid onto a substrate, comprising: The processing liquid supply device includes: a processing liquid tank for storing the processing liquid; a first circulation pipe having an upstream end connected to the treatment liquid tank and a downstream end connected to the treatment liquid tank, through which the treatment liquid circulates; a pipe connected to the first circulation pipe and configured to supply the treatment liquid to the nozzle; a pump disposed in the first circulation pipe for pumping out the treatment liquid; a filter disposed in the first circulation pipe and configured to capture particles contained in the treatment liquid; a pressure regulating valve that is disposed in the first circulation pipe downstream of the filter and that adjusts the pressure of the treatment liquid circulating through the first circulation pipe; Equipped with The processing liquid circulation method includes: a pressure maintaining step of maintaining the pressure of the pump constant at a first pump pressure; a first circulation step of circulating the treatment liquid through the first circulation pipe by setting a pressure of the treatment liquid to a first pressure by the pressure regulating valve while a pressure of the pump is constantly held at the first pump pressure; a processing liquid supplying step of setting a pressure of the processing liquid flowing through the first circulation pipe to a second pressure by the pressure regulating valve while the pressure of the pump is maintained at the first pump pressure, circulating the processing liquid through the first circulation pipe, and supplying the processing liquid flowing through the first circulation pipe to the nozzle; Including, the first pressure is less than the second pressure; The second pressure indicates a pressure of the processing liquid flowing through the first circulation pipe when the nozzle ejects the processing liquid onto the substrate.

2. the first circulation step includes a first pre-dispense step of supplying the processing liquid from the first circulation pipe to the nozzle in a state in which the pressure of the processing liquid flowing through the first circulation pipe is set to the first pressure by the pressure regulating valve, thereby causing the nozzle to execute a first pre-dispense process; The processing liquid circulating method according to claim 1 , wherein the first pre-dispense process includes a process in which the nozzle discharges the processing liquid toward a liquid receiving part before an operation in which the nozzle discharges the processing liquid onto the substrate.

3. A processing liquid circulation method for circulating a processing liquid in a processing liquid supplying apparatus that supplies the processing liquid to a nozzle that ejects the processing liquid onto a substrate, comprising: The processing liquid supply device includes: a processing liquid tank for storing the processing liquid; a first circulation pipe having an upstream end connected to the treatment liquid tank and a downstream end connected to the treatment liquid tank, through which the treatment liquid circulates; a pipe connected to the first circulation pipe and configured to supply the treatment liquid to the nozzle; a pump disposed in the first circulation pipe for pumping out the treatment liquid; a filter disposed in the first circulation pipe and configured to capture particles contained in the treatment liquid; a pressure regulating valve disposed in the first circulation pipe downstream of the filter, for adjusting a pressure of the treatment liquid circulating through the first circulation pipe; a drainage pipe extending from the filter; Equipped with The processing liquid circulation method includes: a pressure maintaining step of maintaining the pressure of the pump constant; a first circulation step of circulating the treatment liquid through the first circulation pipe by setting a pressure of the treatment liquid to a first pressure by the pressure regulating valve while a pressure of the pump is kept constant; a draining step of draining the treatment liquid from the filter to the drain pipe while maintaining the pressure of the pump constant, prior to the first circulation step; Including, the first pressure is less than the second pressure; The second pressure indicates a pressure of the processing liquid flowing through the first circulation pipe when the nozzle ejects the processing liquid onto the substrate.

4. the processing liquid supply device further includes a second circulation pipe extending from the first circulation pipe to the processing liquid tank on a primary side of the filter; 4. The method for circulating a processing liquid according to claim 3, further comprising a circulation step of circulating the processing liquid by supplying the processing liquid to the second circulation pipe while maintaining a constant pressure of the pump, prior to the drainage step.

5. 3. The method for circulating a processing liquid according to claim 1, further comprising, after the first circulation step, a second circulation step of circulating the processing liquid through the first circulation piping by setting a pressure of the processing liquid to the second pressure by the pressure regulating valve while a pressure of the pump is kept constant at the first pump pressure.

6. the second circulation process includes a second pre-dispense process of causing the nozzle to execute a second pre-dispense process by supplying the processing liquid from the first circulation pipe to the nozzle, The processing liquid circulating method according to claim 5 , wherein the second pre-dispense process includes a process in which the nozzle discharges the processing liquid toward a liquid receiving part before an operation in which the nozzle discharges the processing liquid onto the substrate.

7. The treatment liquid circulation method described in claim 6, wherein the treatment liquid supplying process includes a process of supplying the treatment liquid from the first circulation piping to the nozzle after the second pre-dispensing process.

8. A substrate processing method for processing a substrate with a processing liquid, comprising the steps of:

8. A substrate processing method, comprising the steps of: discharging the processing liquid supplied to the nozzle in the processing liquid supplying step of the processing liquid circulating method according to claim 7 onto the substrate by the nozzle.

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