Mass spectrometer and control method thereof

Abstract

To provide a mass spectrometer and a control method thereof that can suppress the decrease in sensitivity even when the atmospheric pressure around the device fluctuates.SOLUTION: A mass spectrometer includes an ion source that ionizes a sample, a mass analyzer that detects ions by mass-to-charge ratio, a control unit that controls the flow rate of gas, and a memory, and the ion source includes an ion source chamber, an inlet for introducing the sample into the ion source chamber, a first gas inlet for introducing first gas into the ion source chamber, a second gas inlet for introducing second gas for ionizing the sample into the ion source chamber, an outlet for ejecting ions from the ion source chamber to the mass analyzer, and a gas outlet for discharging gas from the ion source chamber. The storage unit stores a table of the relationship between a measurement condition and the flow rate of the second gas, and the control unit changes the flow rate of the second gas according to the measurement condition on the basis of the table, and suppresses pressure fluctuations inside the ion source chamber by controlling the flow rate of the first gas.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present invention relates to a mass spectrometer and a control method thereof. [Background technology]

[0002] Mass spectrometers can separate ions in a vacuum based on the mass-to-charge ratio (m / z) of molecular ions, and can separate and detect ions with high sensitivity and precision. In mass spectrometry, ions are separated by their mass-to-charge ratio (m / z). Mass spectrometers are commonly used as detectors for liquid chromatographs (LC), and an analytical technique called liquid chromatography mass spectrometry (LC / MS) is often used.

[0003] Electrospray ionization and atmospheric pressure chemical ionization, which generate ions under atmospheric pressure, are widely used as ionization methods for mass spectrometers. In these ionization methods, the pressure inside the ion source is almost atmospheric pressure, so the sensitivity of the mass spectrometer can vary depending on the atmospheric pressure around the device.

[0004] Patent Document 1 discloses a method of controlling the pressure inside an airtight ion source by adjusting the flow rates of a nebulizer gas and a heating gas introduced into the ion source. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] U.S. Pat. No. 8,952,326 Summary of the Invention [Problem to be solved by the invention]

[0006] Patent Document 1 discloses a method of controlling the pressure inside an ion source by adjusting the flow rates of gases used for ionizing a sample, such as a nebulizer gas, a heating gas, and a counter gas, which are introduced into an airtight ion source.

[0007] However, the flow rate of the gas used for ionization has a specific optimum value that depends on the sample being measured, the composition of the sample solution, and the flow rate of the sample solution. Therefore, when the gas flow rate is adjusted to counteract the fluctuations in pressure inside the ion source, the gas flow rate deviates from the optimum value, which causes a problem of reduced sensitivity of the mass spectrometer.

[0008] The present invention has been made to solve these problems, and has an object to provide a mass spectrometer and a control method thereof that can suppress a decrease in sensitivity even when the air pressure around the device fluctuates. [Means for solving the problem]

[0009] An example of a mass spectrometer according to the present invention is A mass spectrometer comprising an ion source for ionizing a sample, a mass analyzer for detecting ions for each mass-to-charge ratio, a controller for controlling a gas flow rate, and a memory unit, The ion source comprises: an ion source chamber; an inlet for introducing a sample into the ion source chamber; a first gas inlet for introducing a first gas into the ion source chamber; a second gas inlet for introducing a second gas into the ion source chamber for ionizing a sample; an outlet for ejecting ions from the ion source chamber to the mass analyzer; a gas exhaust port for exhausting gas from the ion source chamber; Equipped with the storage unit stores a table of a relationship between a measurement condition and a flow rate of the second gas; The control unit is changing a flow rate of the second gas in accordance with the measurement conditions based on the table; The flow rate of the first gas is controlled to reduce pressure fluctuations within the ion source chamber. Furthermore, one example of a method for controlling a mass spectrometer according to the present invention includes the steps of: changing a flow rate of the second gas in accordance with the measurement conditions based on a table of a relationship between the measurement conditions and a flow rate of the second gas for ionizing the sample; Suppressing fluctuations in pressure within the ion source chamber by controlling a flow rate of the first gas; Equipped with. Effect of the Invention

[0010] According to the mass spectrometer and the control method thereof of the present invention, a decrease in sensitivity can be suppressed even when the atmospheric pressure around the apparatus fluctuates. [Brief description of the drawings]

[0011] [Figure 1] FIG. 1 is a configuration diagram of a mass spectrometer according to a first embodiment. [Diagram 2] FIG. 3 is a diagram showing the configuration of a flow path resistance in the first embodiment. [Diagram 3] 3 is a control flow of the first embodiment. [Figure 4] FIG. 2 is a diagram illustrating the principle of the first embodiment. [Diagram 5] FIG. 11 is a configuration diagram of an ion source according to a second embodiment. [Figure 6] 11 is a control flow of the third embodiment. [Figure 7] 13 is a control flow diagram of the fourth embodiment. [Figure 8] Formulas used in Examples 1 to 4. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Example 1 1 shows the configuration of a mass spectrometer 1 according to a first embodiment. The mass spectrometer 1 executes the control method described in this specification. The mass spectrometer 1 includes an ion source 2 and a vacuum chamber 3. The ion source 2 includes an ion source chamber 4 and ionizes a sample. The vacuum chamber 3 includes a mass analyzer 81 therein, and the mass analyzer 81 detects ions for each mass-to-charge ratio.

[0013] Ions generated in the ion source 2 are introduced into the vacuum chamber 3 through a fine hole 90 in the introduction electrode 17, and are analyzed in a mass analysis unit 81. A variable voltage is applied to the mass analysis unit 81 by a power supply 9. The timing of voltage application by the power supply 9 and the voltage value are controlled by a control unit 10.

[0014] The vacuum chamber 3 includes one or more vacuum chambers. In the example of Fig. 1, multiple stages of vacuum chambers 101, 102, 103 are provided, and each vacuum chamber is connected by fine holes 91 and 92. The vacuum chambers 101, 102, 103 are provided with vacuum pumps 104, 105, 106, respectively, and each vacuum chamber is evacuated by each vacuum pump. In this embodiment, the vacuum chambers 101, 102, 103 are maintained at about 100 to 1000 Pa, about 1 to 10 Pa, and 0.1 Pa or less, respectively.

[0015] An ion transport section 80 for converging and transmitting ions may be provided in the vacuum chamber. The ion transport section 80 may be a multipole electrode, an electrostatic lens, or the like.

[0016] The mass analyzer 81 includes a detector 82 in addition to the above-mentioned mass analyzer 81. The mass analyzer 81 separates or dissociates ions. The mass analyzer 81 can be configured using an ion trap, a quadrupole filter electrode, a collision cell, a time-of-flight mass analyzer, or a combination of these.

[0017] The ions that have passed through the mass analysis section 81 are detected by a detector 82. For example, an electron multiplier tube can be used as the detector 82. The ions detected by the detector 82 are converted into an electrical signal.

[0018] The mass spectrometer 1 includes a control unit 10. The control unit 10 analyzes the mass-to-charge ratio and intensity of ions. The control unit 10 can be configured using a computer equipped with a calculation unit and a storage unit. The control unit 10 includes, for example, an input / output unit and a memory, and the memory stores software required for controlling the power supply 9. The voltage supplied from the power supply 9 to the mass analysis unit 81 can be a radio frequency voltage, a direct current voltage, an alternating current voltage, or a combination of these.

[0019] A configuration example of the ion source 2 will be described. In the ion source 2, a sample solution is introduced into a tubular capillary 16, and ions or droplets of the sample are sprayed from the downstream end of the capillary 16. The generated ions move toward the introduction electrode 17 due to the electric field between the capillary 16 and the introduction electrode 17, and are introduced into the vacuum chamber 3 from the pore 90 of the introduction electrode 17.

[0020] The ion source chamber 4 comprises the following components: - A capillary 16 (inlet) for introducing the sample into the ion source chamber 4. A pressure adjusting gas inlet 5 (first gas inlet) for introducing a pressure adjusting gas (first gas) into the ion source chamber 4 . A second gas inlet for introducing a gas (second gas) for ionizing a sample into the ion source chamber 4. In this embodiment, the second gas includes a nebulizer gas, a heating gas, and a counter gas, and the second gas inlet includes a nebulizer gas inlet 6, a heating gas inlet 7, and a counter gas inlet 8. - An aperture 90 (outlet) for ejecting ions from the ion source chamber 4 to the mass analyzer 81. - An exhaust port 13 (gas outlet) for exhausting gases from the ion source chamber 4.

[0021] The ion source chamber 4 is sealed or nearly sealed, and is configured such that no gas enters or leaves the chamber other than through the above-mentioned openings. This prevents droplets of the sample solution and their vaporized components from leaking out of the ion source 2, and also prevents impurities around the mass spectrometer 1 from entering the ion source 2 and affecting ionization.

[0022] The exhaust port 13 is included in the exhaust line. The exhaust port 13 may be connected to an exhaust duct or the like of the facility in which the mass spectrometer 1 is installed. The exhaust port 13 may include a flow path resistance 14.

[0023] Fig. 2 shows examples of schematic diagrams of flow path resistance 14. Fig. 2(a) is a perspective view of a first example, Fig. 2(c) is an end view of the first example in a cross section including the axis, Fig. 2(b) is a perspective view of a second example, and Fig. 2(d) is an end view of the second example in a cross section including the axis.

[0024] 2(a) and (c), the flow resistance 14 has a plate with holes. In the example of FIG. 2(b) and (d), the flow resistance 14 has a flow passage that is narrower than the flow passages before and after it. Note that the flow resistance 14 does not need to be an independent component, and may be configured as part of the shape of the exhaust port 13, for example.

[0025] The conductance of the flow resistance 14 is smaller than that of other points in the exhaust line (for example, before and after the flow resistance 14). A pressure difference exists between the downstream of the flow resistance 14 and the upstream of the flow resistance 14 (i.e., the inside of the ion source chamber 4). The pressure difference varies depending on the conductance of the flow resistance 14 and the flow rate of the gas flowing through the flow resistance 14.

[0026] The presence of this pressure difference makes it easier to control the pressure inside the ion source chamber 4. For example, the smaller the conductance of the flow path resistance 14, the greater the change in pressure inside the ion source can be with a small change in flow rate, making it easier to adjust the pressure inside the ion source. On the other hand, if the conductance of the flow path resistance 14 is too small, an undesirable air flow (e.g., backflow) occurs inside the ion source, which can cause carryover and the like.

[0027] The mass spectrometer 1 includes a pressure gauge 15. The pressure gauge 15 is disposed downstream of the flow path resistance 14. The pressure gauge 15 measures the pressure (back pressure) in the exhaust line downstream of the flow path resistance 14.

[0028] In the exhaust line, an exhaust mechanism 12 such as a fan or a pump may be provided downstream of the location where the pressure gauge 15 is installed. By providing the exhaust mechanism 12, a pressure difference can be created between the upstream and downstream of the exhaust mechanism 12.

[0029] When generating positive ions, a voltage of 1 to 10 kV is applied to the capillary 16, and when generating negative ions, a voltage of −1 to −10 kV is applied to the capillary 16. The flow rate of the sample solution is set in the range of about 1 nL / min to 10 mL / min.

[0030] A substantially cylindrical nebulizer gas spray tube used for spraying the nebulizer gas is disposed around the capillary 16. The space between the capillary 16 and the nebulizer gas spray tube forms a flow path for the nebulizer gas, and the downstream end of the flow path forms the above-mentioned nebulizer gas inlet 6. The nebulizer gas is sprayed from the nebulizer gas inlet 6. The flow rate of the nebulizer gas is about 0.5 L / min to 10 L / min.

[0031] By using a nebulizer gas, the droplets sprayed from the downstream end of the capillary 16 can be made finer to promote vaporization, thereby improving the ionization efficiency.

[0032] In order to efficiently atomize the droplets, it is necessary to set the flow rate of the nebulizer gas high so that the velocity of the nebulizer gas when it is ejected is sufficiently high. On the other hand, if the flow rate of the nebulizer gas is too high, the sample ions are diluted by the nebulizer gas and the density decreases, which reduces the sensitivity of the mass spectrometry.

[0033] The optimal flow rate of the nebulizer gas depends on the conditions related to the measurement (hereinafter referred to as "measurement conditions"). The measurement conditions include, for example, the composition of the sample solution and the flow rate of the sample solution. Specific examples may include the ease of vaporization of the sample solution, the ease of thermal decomposition of the sample, the size of the ions, and the like. Furthermore, the measurement conditions are not limited to the sample itself, and may include conditions related to the measurement operation and conditions specific to the mass spectrometer 1.

[0034] The space into which ions or droplets are sprayed from the downstream end of the capillary 16 can be heated by a heating gas (for example, up to about 800°C) to promote ionization of the sample. A double cylinder (for example, a double cylinder) for spraying the heating gas is provided on the outside of the nebulizer gas spray tube. The space between the inner and outer cylinders of this double cylinder forms a flow path for the heating gas, and its downstream end forms the above-mentioned heating gas inlet 7. The flow rate of the heating gas is about 0.5 L / min to 50 L / min.

[0035] The higher the temperature or flow rate of the heating gas, the greater the effect of evaporating the solvent from the charged droplets and promoting ionization. The more difficult the sample solution is to evaporate, the higher the optimal flow rate and temperature of the heating gas. On the other hand, if the temperature or flow rate of the heating gas is high, the sensitivity of mass spectrometry for samples that are easily thermally decomposed decreases. For this reason, the optimal flow rate of the heating gas depends on the measurement conditions.

[0036] A counter electrode 18 is provided opposite the introduction electrode 17. The counter electrode 18 has, for example, an opening and is provided so as to cover the introduction electrode 17 and the fine hole 90, and a counter gas can be caused to flow between the introduction electrode 17 and the counter electrode 18.

[0037] Spraying the counter gas between introducing electrode 17 and counter electrode 18 can prevent neutral droplets and the like from entering the hole in introducing electrode 17. The flow rate of the counter gas is about 0.5 L / min to 10 L / min, and the diameter of the hole (opening) in counter electrode 18 is 1 mm or more. A voltage of, for example, about ±1 to 10 kV is applied to counter electrode 18.

[0038] If the flow rate of the counter gas is high, especially for large ions, the ions are swept away by the counter gas and are not taken into the vacuum chamber, resulting in a large loss of ions. On the other hand, if the flow rate of the counter gas is low, neutral molecules such as droplets will enter the vacuum chamber and cause contamination of the electrodes. Therefore, the optimal flow rate of the counter gas depends on the measurement conditions.

[0039] The mass spectrometer 1 includes a flow controller 11 as a flow control mechanism for controlling the flow rate of gas. The flow controller 11 controls the flow rates of gases used for ionization (in this embodiment, a nebulizer gas, a heating gas, and a counter gas) according to instructions from the control unit 10. The gases used for ionization are, for example, inert gases such as nitrogen and argon.

[0040] The optimal flow rates of the gases used for ionization of the sample, such as the nebulizer gas, heating gas, and counter gas, depend on the measurement conditions. Therefore, in order to perform measurements with high sensitivity, it is necessary to change the flow rates of the gases used for ionization for each condition.

[0041] Before starting the measurement, a preliminary evaluation can be performed to determine the optimum flow rate of the gas used for ionization under each condition, and the optimum flow rate can be stored in advance in table form in the memory unit of the control unit 10. For example, the memory unit stores a table of the relationship between the measurement conditions and the flow rate of the gas used for ionization.

[0042] Similarly, a pre-evaluation can be performed to determine the pressure (target pressure) inside the ion source chamber 4 under each condition, and the determined pressure can be stored in advance in table form in the storage unit of the control unit 10. For example, the storage unit stores a table of the relationship between the measurement conditions and the target pressure.

[0043] During measurement, the control unit 10 controls the flow controller 11 based on this table, thereby changing the flow rate of the gas used for ionization according to the measurement conditions. In this way, the control unit 10 can determine the optimal flow rate according to the measurement conditions, and can control the flow rate of the gas used for ionization to that optimal flow rate.

[0044] In this case, the flow rate of the gas used for ionization can be set to an optimal value for various conditions, enabling highly sensitive measurement. In this embodiment, since the pressure inside the ion source chamber 4 is controlled to a predetermined target pressure, it is preferable to store in the control unit 10 the pressure inside the ion source chamber 4 when the optimal flow rate is determined.

[0045] The pressure p1 inside the airtight ion source chamber 4 is given by formula 1 or formula 2 in Fig. 8. In formulas 1 and 2, Q1 is the total flow rate of gas used for ionization, Q2 is the flow rate of pressure adjustment gas, C1 is the conductance of flow resistance 14 of the exhaust line, C2 is the conductance of pore 90 of introduction electrode 17, p0 is the pressure downstream of flow resistance 14 of the exhaust line (i.e., back pressure), and p'0 is the pressure in the vacuum chamber downstream of introduction electrode 17 (vacuum chamber 101 in the example of Fig. 1). Generally, p'0<<p0 and C1>>C2, so formula 1 can be approximated by formula 2.

[0046] The pressure inside the ion source chamber 4 affects the optimum voltage value and the settable voltage range for each part of the mass spectrometer 1. For example, with regard to the voltage applied to the capillary 16 of the ion source 2, when the pressure inside the ion source chamber 4 decreases, discharge becomes more likely to occur and the upper limit of the voltage that can be applied decreases. For this reason, when the voltage of the capillary 16 is low, the sensitivity decreases in the case of a sample that is difficult to ionize.

[0047] In addition, the ion transport section 80 reduces and converges the ions' kinetic energy through collisions with neutral gas molecules flowing in from the ion source 2. For this reason, the optimal value of the electrode voltage shifts depending on the pressure of the ion source 2, which becomes a factor of fluctuation in sensitivity.

[0048] The conventional control method corresponds to the case where the flow rate (Q2) of the pressure adjustment gas is set to zero in formula 2. In this case, the back pressure (p0) is a value that varies depending on the atmospheric pressure around the device, and the conductance (C1) of the flow path resistance 14 is a fixed value determined by the device configuration, so the only controllable parameter for adjusting the pressure inside the ion source is the total flow rate (Q1) of the gas used for ionization.

[0049] However, in order to perform measurements with high sensitivity, the flow rate of the gas used for ionization needs to be set to an optimal value according to the measurement conditions. For this reason, with the conventional control method, when the total flow rate (Q1) of the gas used for ionization is adjusted to counteract fluctuations in the pressure inside the ion source, the gas flow rate deviates from the optimal value, resulting in a decrease in the sensitivity of the mass spectrometer.

[0050] In this embodiment, the pressure adjustment gas is introduced from an inlet (pressure adjustment gas inlet 5) different from that of the gas used for ionization. The flow rate of the pressure adjustment gas can be, for example, about 0.5 L / min to 100 L / min. The pressure adjustment gas is, for example, a gas that does not have a direct effect on ionization (except for an effect that depends on pressure). For example, a gas that is not for ionizing a sample (or a gas that does not ionize a sample) can be used as the pressure adjustment gas. Specific components may be an inert gas such as nitrogen or argon, or dry air. The flow rate of the pressure adjustment gas can be controlled by the control unit 10 and the flow controller 11.

[0051] FIG. 3 shows a flow of the control operation of the first embodiment. This control operation is executed by, for example, the control unit 10. In this example, Equation 2 is used. First, a pre-evaluation is performed before starting the measurement, and an optimal value of the "flow rate of gas used for ionization" (Q1) and a pressure (target pressure) inside the ion source chamber 4 corresponding to the optimal value are determined for one or more measurement conditions (preferably multiple measurement conditions). t ) is associated with each other (step S1).

[0052] The specific format of this table can be designed arbitrarily. It may be a single table, or a table of the relationship between the measurement conditions and Q1 (first table) and a table of the relationship between the measurement conditions and p t A table of relations between Q1 and p (second table) may be defined separately. t It can also be said that the table is related to the above.

[0053] Here, since the relationship between the target pressure and the optimal flow rate of the gas used for ionization under each measurement condition is constant, it is sufficient to perform pre-evaluation once for each measurement condition, and thereafter, pre-evaluation can be omitted for the same measurement conditions.

[0054] When measuring a sample, first, the “optimum flow rate of the gas used for ionization” (Q1) in the measurement conditions for the measurement to be performed next and the pressure inside the ion source chamber 4, i.e., the target pressure (p t ) is acquired (step S2).

[0055] Next, the control unit 10 calculates the target pressure (p t ) into p1 of Equation 2, and further substitute the back pressure (p0) measured by the pressure gauge 15 and the conductance (C1) of the flow path resistance 14 (which can be stored in the control unit 10, for example) into Equation 2, thereby calculating the "total flow rate of gas introduced into the ion source" (Q1+Q2) (step S3). That is, the control unit 10 calculates the target pressure (p t ) calculate the sum of the “flow rate of gas used for ionization” (Q1) and the “flow rate of gas for pressure adjustment” (Q2).

[0056] Next, the control unit 10 calculates the "flow rate of pressure adjustment gas" (Q2) as the difference between the "total flow rate of gas introduced into the ion source" (Q1+Q2) calculated in step S3 and the "flow rate of gas used for ionization" (Q1) acquired in step S1 (step S4). That is, the control unit 10 calculates the "flow rate of pressure adjustment gas" (Q2) by subtracting the "flow rate of gas used for ionization (Q1)" from the "total flow rate of gas introduced into the ion source" (Q1+Q2).

[0057] After that, the control unit 10 instructs the flow controller 11 on the "flow rate of the pressure adjustment gas" (Q2) and the "flow rate of the gas used for ionization" (Q1) (step S5). Then, the mass spectrometer 1 performs a measurement on the sample (step S6). After step S6, the process returns to step S2, and the above-mentioned control is repeated.

[0058] Figure 4 shows a schematic diagram of the relationship between gas flow rate and pressure when control is performed according to the control flow in Figure 3. When the back pressure (p0) is constant and the measurement conditions are switched from measurement condition 1 to measurement condition 2, the "flow rate of pressure adjustment gas" (Q2) is controlled so that the sum of the "flow rate of gas used for ionization" (Q1) and the "flow rate of pressure adjustment gas" (Q2) becomes constant. In the example in Figure 4, Q2 increases by ΔQ, thereby maintaining the pressure (p1) inside the ion source chamber 4 constant.

[0059] On the other hand, when the back pressure (p0) fluctuates, in addition to the change in the “gas flow rate used for ionization” (Q1), the “flow rate of pressure adjustment gas” (Q2) is controlled to cancel the pressure fluctuation inside the ion source chamber 4 due to the change in the back pressure (p0).

[0060] As a specific example, as shown in Figure 4, p0 is Δp x If the voltage drops by only C1Δp x On the other hand, the back pressure is set higher by Δp y When the pressure in the ion source chamber 4 rises by C1Δpy, Q2 is set lower by C1Δpy to maintain the pressure in the ion source chamber 4 at a constant target pressure (p t ) can be maintained.

[0061] In this manner, the control unit 10 controls the "flow rate of the pressure adjusting gas" (Q2) to maintain the pressure inside the ion source chamber 4 constant or suppress fluctuations in the pressure.

[0062] As described above, according to this embodiment, the "flow rate of gas used for ionization" (Q1) is set to an optimal value, and then the "flow rate of pressure adjustment gas" (Q2), which does not directly affect sensitivity, is adjusted to maintain a constant pressure inside the ion source chamber 4. This enables highly sensitive and robust measurements to be performed at all times, regardless of the atmospheric pressure around the mass spectrometer 1 or the exhaust capacity of the facility in which the mass spectrometer 1 is installed.

[0063] In addition, in this embodiment, the control unit 10 controls the “flow rate of the pressure adjustment gas” (Q2) based on the measurement value of the pressure gauge 15, which improves accuracy compared to control based on the pressure inside the vacuum chambers 101, 102, and 103.

[0064] Example 2 In the second embodiment, the shape of the pressure adjusting gas inlet 5 is changed from that in the first embodiment. Hereinafter, description of parts common to the first embodiment may be omitted.

[0065] Figure 5 shows the shape of the pressure adjustment gas inlet 5 in Example 2. A roughly cylindrical nebulizer gas spray tube is provided around the capillary 16, and a roughly cylindrical heated gas spray tube is provided further outside that. In Example 2, a roughly cylindrical pressure adjustment gas flow passage outer cylinder is installed further outside the heated gas spray tube. The space between the heated gas spray tube and the pressure adjustment gas flow passage outer cylinder forms the flow passage for the pressure adjustment gas.

[0066] Thus, in Example 2, the pressure adjustment gas inlet 5 is provided on the outer periphery of at least a portion of the second gas inlet (in Example 2, this is the nebulizer gas inlet 6 and the heating gas inlet 7, but does not include the counter gas inlet 8), so as to surround said at least a portion.

[0067] In the configuration of Example 2, the pressure adjustment gas does not disturb the flow of the gas used for ionization, so higher sensitivity can be obtained compared to the configuration of Example 1. On the other hand, the configuration of Example 1 has a simpler structure than Example 2, and the manufacturing cost is reduced.

[0068] Example 3 In the first and second embodiments, the back pressure (p0) is measured directly. In the third embodiment, the back pressure is not measured directly in the first or second embodiment, but is calculated based on the pressure measured by a vacuum gauge in the vacuum chamber. Hereinafter, the description of the parts common to the first and second embodiments may be omitted.

[0069] The number of vacuum chambers (number of stages) provided in mass spectrometer 1 is N (where N≧1). In the example of FIG. 1, N=3. Each vacuum chamber is represented by a number n (where 1≦n≦N). Vacuum chambers 101, 102, and 103 are the first (n=1), second (n=2), and third (n=3) vacuum chambers, respectively. Mass spectrometer 1 is provided with vacuum gauges (i.e., vacuum gauges 40 and 41 in FIG. 1) for measuring the pressure of each vacuum chamber (i.e., vacuum chambers 101 and 102) other than the last stage.

[0070] Flow rate q' of gas flowing into the nth vacuum chamber n is given by Equation 3 in Figure 8, where S n is the pumping speed of the nth vacuum pump, and p' n is the pressure in the nth vacuum chamber, and q' n+1 is the flow rate of gas flowing into the n+1th vacuum chamber (i.e., the flow rate of gas flowing from the nth vacuum chamber to the n+1th vacuum chamber).

[0071] Flow rate of gas flowing into the next vacuum chamber q' n+1 is the flow rate of gas exhausted by the vacuum pump, S n p' n 8 can be approximated as Equation 4. In addition, in the last stage vacuum chamber (vacuum chamber 103 corresponding to n=3 in the example of FIG. 1), the flow rate flowing out to the next stage vacuum chamber is zero, so in Equation 3, q' n+1 =0, and equation 4 holds true.

[0072] Also, let the conductance between the nth vacuum chamber and the n+1th vacuum chamber be C'. n+1 8 is satisfied. Note that c'1 is the conductance between the ion source chamber 4 and the initial vacuum chamber 101. In equation 5, p'0 when n=0 represents the pressure in the ion source chamber 4. This p'0 corresponds to p1 in the first and second embodiments.

[0073] In addition, in the last stage vacuum chamber (vacuum chamber 103 corresponding to n=3 in the example of FIG. 1), there is no next stage, and the conductance to the next stage vacuum chamber is C' n+1and the pressure p' in the next vacuum chamber n+1 is zero, the right hand side of equation 5 is zero.

[0074] In Equations 3 to 5, the pumping speed S of each vacuum pump n and the conductance C' between each vacuum chamber n is a constant determined by the specific configuration of the mass spectrometer 1, and can be determined before the start of the analysis operation. n is the value measured by the vacuum gauge in each vacuum chamber.

[0075] From the above, the pressure inside the ion source chamber 4 can be calculated based on the formulas 3 to 5. For example, when approximating formula 3 with formula 4 in each vacuum chamber, first, if n=1 in formula 4, then q'1=S1p'1, and q'1 can be calculated by substituting S1 and p'1 into this formula. Next, if n=0 in formula 5, then q'1=c'1(p'0-p'1), and q'1, c'1, and p'1 can be substituted into this formula to solve for p'0, i.e., the pressure inside the ion source chamber 4.

[0076] In addition, when equation 3 is not approximated by equation 4 for each vacuum chamber, first consider the last stage vacuum chamber 103 in equation 3 (i.e., when n = N), since the flow rate flowing out to the next stage vacuum chamber is zero as described above, q' n+1 = 0, and q' N =S N p' N This equation is expressed as S N and p' N Substituting q' N Calculate the calculated q' N Substituting into Equation 3, q' N-1 , q' N-2 Finally, by setting n=0 in Equation 5, q'1=c'1(p'0-p'1), and by substituting q'1, c'1, and p'1 into this equation, p'0, i.e., the pressure in the ion source chamber 4, can be calculated.

[0077] In the above, the pressure p' in the final vacuum chamber 103 N However, the method of acquiring or calculating this value can be designed appropriately. For example, a vacuum gauge for measuring the pressure of the vacuum chamber 103 may be provided.

[0078] 6 shows a control flow of the third embodiment. This control operation is executed by, for example, the control unit 10. First, similar to step S1 in FIG. 3, a pre-evaluation is performed before starting the measurement, and for one or more measurement conditions, the “optimum flow rate of the gas used for ionization” (Q1) and the pressure inside the ion source chamber 4 corresponding to the optimal flow rate (p t ) is associated with each other (step S11).

[0079] Next, an arbitrary value is set in the flow controller 11 as the "total flow rate of gases introduced into the ion source" (Q1+Q2) (step S12). This value is an initial value, and for example, Q1 and Q2, which are determined according to the measurement conditions, may be determined in advance and this value may be used.

[0080] Next, based on the pressure measured by the vacuum gauge of each vacuum chamber, the pressure p1 inside the ion source chamber 4 is calculated using Equations 3 to 5 in FIG. 8 (step S13).

[0081] Next, the back pressure p0 is calculated from the "total flow rate of gases introduced into the ion source" (Q1+Q2) using Equation 2 (step S14).

[0082] Next, from the back pressure p0 calculated in step S14, the pressure inside the ion source is set to the target pressure (p t ) is calculated as "the total flow rate of gases introduced into the ion source" (Q1+Q2) (step S15).

[0083] Next, based on the table stored in the control unit 10, the "optimum flow rate of the gas used for ionization" (Q1) under the measurement conditions for the measurement to be performed next is obtained (step S16).

[0084] The subsequent processes (steps S17 to S19) can be similar to steps S4 to S6 in the embodiment 1 (FIG. 3). After step S19, the process returns to step S13, and the above-mentioned control is repeated.

[0085] Thus, in the third embodiment, the control unit 10 controls the "flow rate of the pressure adjustment gas" (Q2) based on the measured values ​​of the vacuum gauges 40 and 41. Therefore, in the third embodiment, the pressure gauge 15 is not necessary compared to the first embodiment, and there is an advantage in that the cost is lower. In addition, the vacuum gauge installed in the vacuum chamber is more robust than the pressure gauge installed in the flow path through which the exhaust gas from the sample flows, and there is also an advantage in that it can be used for a longer period of time without maintenance.

[0086] Example 4 In the fourth embodiment, a threshold determination process for the pressure difference is added to the first embodiment. Hereinafter, a description of the parts common to the first embodiment may be omitted.

[0087] FIG. 7 shows a control flow of the fourth embodiment. In the fourth embodiment, after step S2, the pressure (p1) inside the ion source chamber 4 is calculated using the formula 2 based on the back pressure (p0) measured by the pressure gauge (step S21). Next, the pressure (p1) inside the ion source chamber 4 and the target pressure (p t ) exceeds a predetermined threshold value (first threshold value) (step S22).

[0088] If the difference exceeds the first threshold, the "flow rate of the pressure adjustment gas" (Q2) is changed (steps S3 to S6) according to the same control flow as in Example 1. If the difference does not exceed the threshold, the "flow rate of the pressure adjustment gas" (Q2) is not changed.

[0089] Generally, after changing the "flow rate of pressure adjustment gas" (Q2) introduced into the ion source chamber 4, ionization becomes unstable during the period until the flow rate of the pressure adjustment gas stabilizes, and the measurement data during that period may not be usable. For this reason, from the viewpoint of ionization stability, it is preferable to change the "flow rate of pressure adjustment gas" (Q2) less frequently.

[0090] In the embodiment 4, when the difference between the pressure inside the ion source 2 and the target pressure is equal to or less than the threshold, the "flow rate of the pressure adjustment gas" (Q2) is not changed, so the frequency of changes in the "flow rate of the pressure adjustment gas" (Q2) is lower than that in the embodiment 1. Therefore, it is possible to perform measurements with a higher throughput than that in the embodiment 1. [Explanation of symbols]

[0091] 1...Mass spectrometer 2…Ion source 3…Vacuum chamber 4…Ion source chamber 5...Pressure adjustment gas inlet (first gas inlet) 6...Nebulizer gas inlet (second gas inlet) 7…Heating gas inlet (second gas inlet) 8...Counter gas inlet (second gas inlet) 9…Power supply 10...Control section 11...Flow controller 12...Exhaust system 13...Exhaust port (gas exhaust port) 14...Flow resistance 15…Pressure gauge 16…Capillary (entrance) 17...Introduction electrode 18...Counter electrode 40,41...Vacuum gauge 80…Ion transport section 81...Mass spectrometry department 82…Detector 90...hole (outlet) 91,92…pores 101~103…Vacuum chamber 104~106…Vacuum pump

Claims

1. A mass spectrometer comprising an ion source for ionizing a sample, a mass analyzer for detecting ions for each mass-to-charge ratio, a controller for controlling a gas flow rate, and a memory unit, The ion source comprises: an ion source chamber; an inlet for introducing a sample into the ion source chamber; a first gas inlet for introducing a first gas into the ion source chamber; a second gas inlet for introducing a second gas into the ion source chamber for ionizing a sample; an outlet for ejecting ions from the ion source chamber to the mass analyzer; a gas exhaust port for exhausting gas from the ion source chamber; Equipped with The gas exhaust port has a flow resistance, the mass spectrometer includes a pressure gauge disposed downstream of the flow resistance; the storage unit stores a table of a relationship between a measurement condition and a flow rate of the second gas; The control unit is changing a flow rate of the second gas in accordance with the measurement conditions based on the table; a flow rate of the first gas is controlled based on the pressure gauge reading to suppress pressure fluctuations within the ion source chamber; A mass spectrometer comprising:

2. A mass spectrometer comprising an ion source for ionizing a sample, a mass analyzer for detecting ions for each mass-to-charge ratio, a controller for controlling a gas flow rate, and a memory unit, The ion source comprises: an ion source chamber; an inlet for introducing a sample into the ion source chamber; a first gas inlet for introducing a first gas into the ion source chamber; a second gas inlet for introducing a second gas into the ion source chamber for ionizing a sample; an outlet for ejecting ions from the ion source chamber to the mass analyzer; a gas exhaust port for exhausting gas from the ion source chamber; Equipped with the mass spectrometer comprises one or more vacuum chambers and a vacuum gauge for measuring the pressure of each vacuum chamber; the storage unit stores a table of a relationship between a measurement condition and a flow rate of the second gas, and a table of a relationship between the measurement condition and a target pressure inside the ion source chamber; The control unit is changing a flow rate of the second gas in accordance with the measurement conditions based on the table; calculating a sum of a flow rate of the first gas and a flow rate of the second gas based on the measurement values ​​of the vacuum gauges and the target pressure; The flow rate of the first gas is calculated by subtracting the flow rate of the second gas from the sum, thereby controlling the flow rate of the first gas and suppressing fluctuations in the pressure inside the ion source chamber. A mass spectrometer comprising:

3. 3. The mass spectrometer of claim 2, The gas exhaust port has a flow resistance, a pressure differential exists between the downstream of the flow resistance and the interior of the ion source chamber; A mass spectrometer comprising:

4. The mass spectrometer according to any one of claims 1 to 3, The first gas inlet is provided on an outer periphery of at least a portion of the second gas inlet so as to surround the at least a portion. A mass spectrometer comprising:

5. 2. The mass spectrometer of claim 1, The control unit is calculating a pressure within the ion source chamber based on the measurements of the pressure gauge; not changing the flow rate of the first gas if a difference between a pressure within the ion source chamber and a predetermined target pressure does not exceed a first threshold. A mass spectrometer comprising:

6. A mass spectrometer comprising an ion source for ionizing a sample, a mass analyzer for detecting ions for each mass-to-charge ratio, a controller for controlling a gas flow rate, and a memory unit, The ion source comprises: an ion source chamber; an inlet for introducing a sample into the ion source chamber; a first gas inlet for introducing a first gas into the ion source chamber; a second gas inlet for introducing a second gas into the ion source chamber for ionizing a sample; an outlet for ejecting ions from the ion source chamber to the mass analyzer; a gas exhaust port for exhausting gas from the ion source chamber; Equipped with the storage unit stores a table of a relationship between a measurement condition and a flow rate of the second gas, and a table of a relationship between the measurement condition and a target pressure inside the ion source chamber; The control unit is changing a flow rate of the second gas in accordance with the measurement conditions based on the table; Calculating a sum of a flow rate of the first gas and a flow rate of the second gas based on the target pressure; calculating a flow rate of the first gas by subtracting a flow rate of the second gas from the sum; A mass spectrometer comprising:

7. A method for controlling a mass spectrometer, comprising the steps of: changing the flow rate of the second gas according to the measurement conditions based on a table of the relationship between the measurement conditions and the flow rate of the second gas for ionizing the sample and a table of the relationship between the measurement conditions and a target pressure inside the ion source chamber; calculating a sum of a flow rate of a first gas and a flow rate of the second gas based on pressure measurements of one or more vacuum chambers of the mass spectrometer and the target pressure; calculating a flow rate of the first gas by subtracting a flow rate of the second gas from the sum, and suppressing fluctuations in pressure inside the ion source chamber by controlling the flow rate of the first gas; A method for controlling a mass spectrometer comprising:

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