Apparatus for treating gaseous pollutants with plasma

Abstract

To provide a torch suppressing electric power consumption and fuel consumption.SOLUTION: A device for treating a gaseous pollutant with plasma comprises a microwave source 10, a waveguide assembly 20, and a resonant chamber 40. The microwave source generates a microwave oscillation. The waveguide assembly is coupled to the microwave source, and the resonant chamber is coupled to the waveguide assembly. The microwave oscillation is substantially transmitted towards a waveguide direction. The resonant chamber comprises a first chamber and a second chamber, and the waveguide direction is substantially parallel to a reference axis of the first chamber. The first chamber has an inner wall surrounding the reference axis, and the inner wall comprises a first inner wall inclined towards the reference axis and a second inner wall substantially parallel to the reference axis. The area of the first inner wall is larger than that of the second inner wall, so that the first chamber is formed as a gradually-reduced tapered space. The microwave oscillation reacts in the second chamber with an ignition gas to form a torch.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an apparatus for treating gaseous pollutants, and in particular to an apparatus for treating gaseous pollutants with a plasma. [Background technology]

[0002] Exhaust gas from semiconductor manufacturing processes contains various chemicals that are harmful to humans and the environment, and the ones that have attracted the most attention from the public are perfluorocompounds (PFCs) including CF4, C2F6, and C3F8. Conventional exhaust gas treatment equipment includes combustion, plasma, heating, water washing, and catalytic types, and as perfluorocompounds have a high decomposition temperature, they are generally treated using the combustion or plasma type. The plasma type is a mature and stable technology, and the high temperatures generated by the torch are particularly suitable for decomposing perfluorocompounds, so it is attracting a lot of attention as a successor to the combustion type.

[0003] Depending on the plasma source, the torch-type exhaust gas treatment equipment mainly includes a DC torch and a microwave torch, and such are described as prior art in Patent Documents 1 to 10, etc.

[0004] However, the conventional technology has a drawback in that it requires a large amount of electricity and fuel consumption, so that the cost of treating exhaust gas using a torch cannot be reduced to a reasonable range. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] U.S. Patent Application Publication No. US20180071751A1 [Patent Document 2] US Patent No. US9937467 [Patent Document 3] US Patent No. US9346005 [Patent Document 4] US Patent No. US9371581 [Patent Document 5] US Patent No. US10064262 [Patent Document 6] US Patent No. US9512518 [Patent Document 7] US Patent No. US9277636 [Patent Document 8] U.S. Patent Application Publication No. US20100074821A1 [Patent Document 9] U.S. Patent Application Publication No. US20100290966A1 [Patent Document 10] U.S. Patent Application Publication No. US20090301298A1 Summary of the Invention [Problem to be solved by the invention]

[0006] The main objective of the present invention is to solve the problem that conventional torches require high power and fuel consumption. [Means for solving the problem]

[0007] In order to achieve the above object, the present invention provides a microwave source that generates microwave vibrations, a waveguide assembly that is coupled to the microwave source to transmit the microwave vibrations, and a resonant chamber that is coupled to the waveguide assembly and transmits the microwave vibrations substantially in a guided wave direction therein, the resonant chamber including a first chamber close to the waveguide assembly and a second chamber far from the waveguide assembly, the first chamber including an inlet end connected to the waveguide assembly and an outlet end far from the waveguide assembly, the second chamber including a communication end that communicates with the outlet end and a closed end far from the communication end, the second chamber including a resonant chamber that communicates with the first chamber, and a resonating chamber receiving the microwave vibrations passing through the resonating chamber, the microwave vibrations reacting with an ignition gas in the second chamber to produce a torch, the waveguiding direction being substantially parallel to a reference axis of the first chamber, the first chamber having an inner wall surrounding and extending along the reference axis, the inner wall including a first region inclined toward the reference axis and a second region substantially parallel to the reference axis, the first region having an area greater than that of the second region such that the first chamber is formed as a tapered space tapering from the inlet end to the outlet end.

[0008] In one embodiment, the inner wall includes a first inner wall and a second inner wall opposite the first inner wall, the first inner wall and the second inner wall sloping inwardly relative to the reference axis from the inlet end to the outlet end.

[0009] In one embodiment, the inner wall has a first inner wall and a second inner wall opposite the first inner wall, with a width difference between the first inner wall and the second inner wall that gradually decreases along the reference axis.

[0010] In one embodiment, the inner wall of the first chamber has a first top wall and a first bottom wall, and the second chamber has a second top wall and a second bottom wall, the second top wall having a first height difference relative to the first top wall.

[0011] In one embodiment, the inner wall of the first chamber has a first top wall and a first bottom wall, and the second chamber has a second top wall and a second bottom wall, the second bottom wall having a second height difference relative to the first bottom wall.

[0012] In one embodiment, the device further includes an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber and having a first end close to the ignition source and a second end remote from the ignition source, the second chamber having a second top wall and a second bottom wall, the second end of the dielectric tube protruding from the second chamber and having a third height difference relative to the second bottom wall of the second chamber.

[0013] In one embodiment, the device further includes an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber, the ignition source including a probe assembly, the probe assembly including a carrier and at least one tip attached to the carrier, the tip having an outer diameter of 1.6 mm to 2 mm.

[0014] In one embodiment, the ignition gas is selected from the group consisting of air, nitrogen and argon.

[0015] The present invention relates to a microwave source for generating microwave vibrations, a waveguide assembly coupled to the microwave source for transmitting the microwave vibrations, and a resonating chamber coupled to the waveguide assembly and within which the microwave vibrations are transmitted substantially in a guided wave direction, the resonating chamber including a first chamber close to the waveguide assembly and a second chamber remote from the waveguide assembly, the first chamber including an inlet end connected to the waveguide assembly and an outlet end remote from the waveguide assembly, the second chamber including a communication end communicating with the outlet end and a closed chamber remote from the communication end. and a resonating chamber having an inlet end, the second chamber receiving the microwave vibrations passing through the first chamber, the microwave vibrations reacting with an ignition gas in the second chamber to produce a torch, the waveguiding direction being substantially parallel to a reference axis of the first chamber, the first chamber including a first inner wall, a second inner wall opposite the first inner wall, a first top wall, and a first bottom wall, the first inner wall and the second inner wall sloping inwardly with respect to the reference axis from the inlet end to the outlet end.

[0016] In one embodiment, the first inner wall has a tapered width difference between the first inner wall and the second inner wall along the reference axis.

[0017] In one embodiment, the second chamber has a second top wall and a second bottom wall, the second top wall having a first height difference relative to the first top wall of the first chamber.

[0018] In one embodiment, the second chamber has a second top wall and a second bottom wall, the second bottom wall having a second height difference relative to the first bottom wall of the first chamber.

[0019] In one embodiment, the device further includes an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber and having a first end close to the ignition source and a second end remote from the ignition source, the second chamber having a second top wall and a second bottom wall, the second end of the dielectric tube protruding from the second chamber and having a third height difference relative to the second bottom wall of the second chamber.

[0020] In one embodiment, the device further includes an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber, the ignition source including a probe assembly, the probe assembly including a carrier and at least one tip attached to the carrier, the tip having an outer diameter of 1.6 mm to 2 mm.

[0021] The present invention further provides an apparatus for treating gaseous pollutants that does not require fuel, the apparatus comprising: a microwave source that generates microwave vibrations; a waveguide assembly coupled to the microwave source to transmit the microwave vibrations; and a resonating chamber coupled to the waveguide assembly and extending along a waveguiding direction, the resonating chamber including a tapered chamber close to the waveguide assembly and a combustion chamber remote from the waveguide assembly, the combustion chamber receiving the microwave vibrations passing through the tapered chamber, the microwave vibrations reacting with a non-fuel ignition gas in the combustion chamber to generate a torch.

[0022] In one embodiment, the inner wall of the tapered chamber has a first top wall and a first bottom wall, and the combustion chamber has a second top wall and a second bottom wall, the second top wall having a first height difference relative to a bottom edge of the first top wall.

[0023] In one embodiment, the inner wall of the tapered chamber has a first top wall and a first bottom wall, and the combustion chamber has a second top wall and a second bottom wall, the second bottom wall having a second height difference relative to the first bottom wall.

[0024] In one embodiment, the combustion chamber further includes an ignition source and a dielectric tube, the dielectric tube being inserted into the combustion chamber and having a first end proximate to the ignition source and a second end distal to the ignition source, the combustion chamber having a second top wall and a second bottom wall, the second end of the dielectric tube protruding from the combustion chamber and having a third height difference relative to the combustion chamber.

[0025] In the present invention, a special design of the chamber structure is used to increase the tapered surface of the first chamber, and obtain a space, such as a double cone-shaped chamber, to increase the microwave field strength and maximize the microwave field strength of the second chamber. This significantly reduces the power required for the microwave source, and does not require the use of fuel gas, which not only reduces costs but also saves energy. In addition, the ignition source of the present invention only requires a probe, and does not require the placement of an ignition transformer and a glow discharge electrode as in the prior art, and does not require the ignition transformer to supply power to the glow discharge electrode.

[0026] Furthermore, the device for treating gaseous pollutants with the plasma of the present invention may be used as an exhaust gas treatment system as it is, or the device for treating gaseous pollutants with the plasma of the present invention may be incorporated into other types of exhaust gas treatment systems as an exhaust gas treatment module. [Brief description of the drawings]

[0027] [Figure 1] FIG. 2 is a three-dimensional schematic diagram of an assembly of an embodiment of the present invention. [Diagram 2] 2 is a three-dimensional schematic diagram of a partial cross section in the XZ plane of FIG. 1. [Figure 3A] FIG. 2 is a schematic cross-sectional view taken along the XZ plane of FIG. [Figure 3B] FIG. 3B is a partially enlarged schematic view of FIG. 3A. [Figure 4A] FIG. 2 is a schematic cross-sectional view taken along the XY plane of FIG. [Figure 4B] FIG. 4B is a partially enlarged schematic view of FIG. 4A. [Diagram 5]FIG. 2 is a three-dimensional schematic diagram of the assembly of the probe assembly according to one embodiment of the present invention. [Figure 6A] FIG. 1 is a three-dimensional schematic diagram of a partial assembly of the first embodiment of the present invention. [Figure 6B] FIG. 6B is a schematic side view of FIG. 6A. [Figure 7A] FIG. 11 is a three-dimensional schematic diagram of a partial assembly of the second embodiment of the present invention. [Figure 7B] FIG. 7B is a schematic side view of FIG. 7A. [Figure 8A] FIG. 11 is a three-dimensional schematic diagram of a partial assembly of the third embodiment of the present invention. [Figure 8B] FIG. 8B is a schematic side view of FIG. 8A. [Figure 9] FIG. 11 is a partial schematic diagram of a fourth embodiment of the present invention. [Figure 10] FIG. 13 is a three-dimensional schematic diagram of an assembly of another embodiment of the present invention. [Figure 11] FIG. 11 is a schematic cross-sectional view taken along the YZ plane of FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0028] Hereinafter, the technical contents of the present invention will be described in detail with reference to the drawings. The present invention discloses an apparatus for treating gaseous pollutants with plasma, and as shown in FIG. 1 to FIG. 4B, in one embodiment, the apparatus includes a microwave source 10, a waveguide assembly 20, a spacer 30, a resonating chamber 40, a dielectric tube 50, a probe assembly 60, a moving member 70, a cooling assembly 80, and a dielectric window assembly 90, wherein the microwave source 10 is used to generate microwave vibration, and in this embodiment, a magnetron is used as the microwave source 10, the waveguide assembly 20 is close to and coupled to the microwave source 10, the waveguide assembly 20 includes a chamber 21, the chamber 21 is rectangular, the chamber 21 includes an inlet end 21a and an outlet end 21b, the inlet end 21a is connected to the microwave source 10, and the spacer 30 is provided between the waveguide assembly 20 and the resonating chamber 40. The dielectric window assembly 90 includes at least one first dielectric window 90a and at least one second dielectric window 90b, where the first dielectric window 90a is disposed between the waveguide assembly 20 and the spacer 30, and the second dielectric window 90b is disposed between the spacer 30 and the resonating chamber 40. In this embodiment, the spacer 30 includes a circulator and a water load, and the first dielectric window 90a and the second dielectric window 90b are made of quartz glass.

[0029] As shown in Figures 2, 3A and 3B, the resonating chamber 40 includes a first chamber 41, a second chamber 42, an inlet end 43, a communicating end 44 and a closed end 45, and in one embodiment of the present invention, the first chamber 41 extends along a reference axis L, the microwave vibration is transmitted in the resonating chamber 40 substantially parallel to a waveguiding direction, the waveguiding direction being close to or substantially the same as the reference axis L, the first chamber 41 has an inner wall 411, the inner wall 411 surrounds the reference axis L and extends along the reference axis L, the inner wall 411 includes a first region and a second region, the first region is inclined toward the reference axis L and the second region is substantially parallel to the reference axis L, and the area of ​​the first region is larger than that of the second region, such that the first chamber 41 is formed as a tapered space tapering from the inlet end 43 to the communicating end 44. In another embodiment of the present invention, the resonating chamber 40 is coupled to the waveguide assembly 20 and extends along the waveguide direction, the resonating chamber 40 includes a tapered chamber close to the waveguide assembly 20 and a combustion chamber far from the waveguide assembly, the combustion chamber receives the microwave vibrations passing through the tapered chamber, and the microwave vibrations react with a non-fuel ignition gas in the combustion chamber to generate a torch T.

[0030] As shown in Figures 3A to 4B, in this embodiment, the inner wall 411 includes a first inner wall 411a, a second inner wall 411b, a first top wall 411c, and a first bottom wall 411d, the first inner wall 411a and the second inner wall 411b are inclined symmetrically inward with respect to a reference axis L, and the first inner wall 411a or the second inner wall 411b forms an included angle θ2 with the reference axis L, the included angle θ2 being 1° to 5°, and preferably, the included angle θ2 being 1° to 3°. The first top wall 411c is inclined inwardly with respect to the reference axis L, and the first top wall 411c and the reference axis L form an included angle θ1, the included angle θ1 being 10° to 15°, preferably 10° to 13°, the first top wall 411c includes a high end close to the inlet end 43 and a low end close to the communication end 44, and the first bottom wall 411d is substantially parallel to the reference axis L. In other words, in this embodiment, the first region includes the first inner side wall 411a, the second inner side wall 411b, and the first top wall 411c, and the second region includes the first bottom wall 411d, and in this embodiment, the area ratio of the first region to the second region is 1.2 to 2. As shown in FIG. 4B, there is a width difference W1 between the first inner side wall 411a and the second inner side wall 411b that gradually changes so as to gradually decrease along the reference axis L. D As shown in FIG. 3B, there is a height difference H1 between the first top wall 411c and the first bottom wall 411d that gradually decreases along the reference axis L. D has.

[0031] 3A to 4B, in this embodiment, the second chamber 42 includes a first inner wall 421a, a second inner wall 421b, a second top wall 421c, and a second bottom wall 421d, the second top wall 421c includes an upper opening 422, the second bottom wall 421d includes a lower opening 423, the dielectric tube 50 is inserted into the upper opening 422 and the lower opening 423, the dielectric tube 50 includes a first section 51, a second section 52, a third section 53, an upper end 54, and a bottom end 55, the first section 51 and the third section 53 protruding from the upper opening 422 and the lower opening 423, respectively, and the second section 52 is located within the second chamber 42. In this embodiment, the first inner wall 421a of the second chamber 42 and the first inner wall 411a of the first chamber 41 form a continuous inclined surface with respect to the reference axis L, the second inner wall 421b of the second chamber 42 and the second inner wall 411b of the first chamber 41 also form a continuous inclined surface with respect to the reference axis L, the second top wall 421c and the second bottom wall 421d of the second chamber 42 are parallel to each other, and in one embodiment, the second bottom wall 421d of the second chamber 42 and the first bottom wall 411d of the first chamber 41 are located at the same height, and the second top wall 421c of the second chamber 42 is located at the same height as the lower end of the first top wall 411c of the first chamber. There is a height difference H2 between the second top wall 421c and the second bottom wall 421d of the second chamber 42. D In this embodiment, the height difference H2 D is a constant value along the reference axis L, and in another embodiment, the height difference H2 D is a gradually varying value or step along the reference axis L.

[0032] In the resonating chamber 40, the inlet end 43 has a first height H1 and a first width W1, the communicating end 44 has a second height H2 and a second width W2, and the closed end 45 has a third height H3 and a third width W3; in this embodiment, the first height H1 and the first width W1 of the inlet end 43 are greater than the second height H2 and the second width W2 of the communicating end 44, respectively, the second height H2 of the communicating end 44 is equal to the third height H3 of the closed end 45, and the second width W2 of the communicating end 44 is greater than the third width W3 of the closed end 45; in other embodiments, the second width W2 of the communicating end 44 may be equal to the third width W3 of the closed end 45.

[0033] As shown in Figures 2 and 3B, the cooling assembly 80 is mounted toward the upper end 54 of the dielectric tube 50 and covers the first section 51 of the dielectric tube 50, and the moving member 70 is connected to the probe assembly 60 and mounted to the cooling assembly 80, and the probe assembly 60 includes a carrier 61 and at least one tip 62 provided on an end surface 611 of the carrier 61. The moving member 70 controls the vertical movement of the probe assembly 60 relative to the second chamber 42, the cooling assembly 80 includes a gas chamber 81, a gas pipe 82, and a cooling pipe 83, the gas chamber 81 communicates with the hollow part H of the dielectric tube 50, the inner wall of the gas chamber 81 has at least one gas hole 811, at least one ignition gas enters the gas chamber 81 through the gas hole 811 and enters the hollow part H of the dielectric tube 50, in one embodiment, the ignition gas is a non-fuel gas, for example, an inert gas such as nitrogen (N2) or argon (Ar) or compressed dry air (Clean Dry Air / Compressed dry air, CDA), and a cooling fluid flows through the cooling pipe 83 to control the temperature of the gas chamber 81 and prevent damage to the element. In this embodiment, the probe assembly 60, the moving member 70, and the cooling assembly 80 constitute an ignition source, but this is only an example for explanation, and in reality, the ignition source may have other configurations.

[0034] 3B, the microwave vibration reaches a maximum intensity in the second chamber 42 of the resonating chamber 40, and the maximum intensity is generated in the hollow H in the second section 52 of the dielectric tube 50, and when the ignition gas fills the hollow H of the dielectric tube 50, the moving member 70 controls the probe assembly 60 to enter downward into the hollow H in the second section 52, and when the maximum intensity of the microwave vibration reaches a minimum threshold, a torch T is generated at the tip 62 of the probe assembly 60. In this embodiment, a cylinder can be used as the moving member 70.

[0035] 5, in one embodiment of the present invention, the probe assembly 60 includes a first tip 62a and a second tip 62b, each of which includes a tapered end, the diameter of the end being 1.6 mm to 2.0 mm, the length of the first tip 62a and the second tip 62b being 30 mm to 50 mm, and the material of the first tip 62a and the second tip 62b may be copper (Cu), tungsten (W) or a nickel-chromium alloy, such as Inconel® 600. Installing multiple such tips increases the possibility of ignition, and in other embodiments, the diameter of the end may be less than 1.6 mm.

[0036] According to one embodiment of the present invention, the first top wall 411c of the first chamber 41 has a first height difference with the second top wall 421c of the second chamber 42. According to another embodiment of the present invention, the first bottom wall 411d of the first chamber 41 has a second height difference with the second bottom wall 421d of the second chamber 42, and the bottom end 55 of the dielectric tube 50 protrudes from the second chamber 42 and has a third height difference with the second bottom wall 421d of the second chamber 42.

[0037] 6A to 9, in different embodiments of the present invention, the microwave field intensity can be further adjusted or enhanced by changing or adjusting the first height difference, the second height difference, and the third height difference, and the size of each section of the dielectric tube. As shown in FIG. 6A, which is a schematic three-dimensional view of a partial assembly of the first embodiment of the present invention, and FIG. 6B, which is a schematic side view, in this embodiment, the second chamber 42 includes a first body 42a and a second body 42b, and the first body 42a and the second body 42b each have a height H a , H b and the distance between the bottom end 55 of the dielectric tube 50 and the outer bottom wall of the first body 42a of the second chamber 42 is H d The first body 42a is a cylindrical body, and the second body 42b is a cuboid. aThe height H of the second body 42b is 20 mm, the diameter of the second body 42b is 80 mm, the diameter of the opening 424 of the first body 42a is 36 mm, and the total length of the dielectric tube 50 is 20 cm. b and distance H d The maximum field strength (V / m) in the second chamber 42 was measured from JPEG0007676467000001.jpg74170

[0038] As shown in FIG. 7A which is a schematic three-dimensional view of a partially assembled second embodiment of the present invention, and FIG. 7B which is a schematic side view, in this embodiment, the second chamber 42 includes a first body 42a and a second body 42b. The first body 42a and the second body 42b each have a height H a , H b and the distance between the bottom end 55 of the dielectric tube 50 and the outer bottom wall of the first body 42a of the second chamber 42 is H d The first body 42a and the second body 42b are both rectangular parallelepipeds. a The height H of the second body 42b is 20 mm, the side length of the second body 42b is 80 mm, the diameter of the opening 424 of the first body 42a is 36 mm, and the total length of the dielectric tube 50 is 20 cm. b and distance H d The maximum field strength (V / m) in the second chamber 42 was measured from JPEG0007676467000002.jpg81170

[0039] As shown in FIG. 8A which is a schematic three-dimensional view of a partially assembled third embodiment of the present invention, and FIG. 8B which is a schematic side view, in this embodiment, the second chamber 42 includes a first body 42a, a second body 42b, and a third body 42c, and the first body 42a, the second body 42b, and the third body 42c each have a height H a , H b , H c and the distance between the bottom end 55 of the dielectric tube 50 and the outer bottom wall of the third body 42c of the second chamber 42 is H dThe first body 42a, the second body 42b, and the third body 42c are all cuboids. a The height H of the second body 42b is 20 mm, the side length of the first body 42a and the third body 42c is 80 mm, the diameter of the opening 424 of the first body 42a is 36 mm, and the total length of the dielectric tube 50 is 20 cm. b , the height H of the third body 42c c and distance H d The maximum field strength (V / m) in the second chamber 42 was measured from JPEG0007676467000003.jpg82170JPEG0007676467000004.jpg81170Here, the last combination in Table 4 is confirmed to have the best maximum field strength, and the specific structure of this combination can be seen in FIG.

[0040] Please refer to Fig. 10 which is a three-dimensional schematic diagram of the assembly of another embodiment of the present invention, and Fig. 11 which is a schematic cross-sectional diagram in the YZ plane of Fig. 10. In this embodiment, the apparatus for treating gaseous pollutants further includes an air intake module 100, which includes a first pipe 100a and a second pipe 100b, the first pipe 100a and the second pipe 100b are mounted on the cooling assembly 80 and communicate with the gas chamber 81, and the air intake module 100 is used to take at least one gaseous pollutant G to be treated into the gas chamber 81, which enters the hollow part H of the dielectric tube 50 from the gas chamber 81 and is decomposed by the high temperature generated by the torch. [Explanation of symbols]

[0041] θ2 included angle G Gaseous pollutants H Hollow part H1 D Gradually changing height difference H2 D Height difference H1 First height H2 Second height H3 3rd height H a , Hb , H c height H d distance L Reference axis T Torch W1 D Gradually changing width difference W1 1st width W2 Second width W3 3rd width 10 Microwave Source 20 Waveguide Assembly 21 Chamber 21a Inlet end 21b Outlet end 30 Spacer 40 Resonating Chamber 41 First Chamber 411 Interior wall 411a 1st inner wall 411b 2nd inner wall 411c 1st ceiling wall 411d 1st bottom wall 42 Chamber 2 42a First Body 42b Second Body 42c Third Body 421a First inner wall 421b 2nd inner wall 421c 2nd ceiling wall 421d 2nd bottom wall 422 Top opening 423 Lower opening 424 Aperture 43 Inlet end 44 Communication end 45 Closed end 50 Dielectric tube 51 Section 1 52 Section 2 53 Third Section 54 Top 55 bottom end 60 Probe Assembly 61 Career 611 End face 62 Tip 62a First tip 62b 2nd tip 70 Moving parts 80 Cooling Assembly 81 Gas Chamber 811 Gas hole 82 Gas Pipeline 83 Cooling pipe line 90 Dielectric window assembly 90a First dielectric window 90b Second dielectric window 100 Air Supply Module 100a 1st pipeline 100b 2nd pipeline

Claims

1. A microwave source that generates microwave vibrations; a waveguide assembly coupled to the microwave source to transmit the microwave vibrations; a resonating chamber coupled to the waveguide assembly and through which the microwave vibrations are transmitted in a substantially guided direction, the resonating chamber including a first chamber close to the waveguide assembly and a second chamber remote from the waveguide assembly, the first chamber including an inlet end connected to the waveguide assembly and an outlet end remote from the waveguide assembly, the second chamber including a communication end communicating with the outlet end and a closed end remote from the communication end, the second chamber receiving the microwave vibrations passing through the first chamber, the microwave vibrations reacting with an ignition gas in the second chamber to generate a torch; the waveguiding direction is substantially parallel to a reference axis of the first chamber, the first chamber having an inner wall surrounding the reference axis and extending along the reference axis, the inner wall including a first region inclined toward the reference axis and a second region substantially parallel to the reference axis, the first region having a larger area than the second region, such that the first chamber is formed as a tapered space tapering from the inlet end to the outlet end; 1. An apparatus for treating gaseous contaminants with plasma, wherein the inner walls of the first chamber include a first inner wall, a second inner wall opposite the first inner wall, a first top wall, and a first bottom wall, the first inner wall and the second inner wall sloping inwardly with respect to the reference axis from the inlet end to the outlet end.

2. 2. The apparatus for treating gaseous contaminants with a plasma as recited in claim 1, further comprising a width difference between said first inner wall and said second inner wall that gradually decreases along said reference axis.

3. 2. The apparatus for treating gaseous contaminants with a plasma as recited in claim 1, wherein the second chamber has a second top wall and a second bottom wall, the second top wall having a first height difference relative to the first top wall.

4. 2. The apparatus for treating gaseous contaminants with a plasma as recited in claim 1, wherein the second chamber has a second top wall and a second bottom wall, the second bottom wall having a second height difference relative to the first bottom wall.

5. 2. The apparatus for treating gaseous contaminants with plasma as described in claim 1, further comprising an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber and having a first end close to the ignition source and a second end far from the ignition source, the second chamber having a second top wall and a second bottom wall, the second end of the dielectric tube protruding from the second chamber and having a third height difference with respect to the second bottom wall of the second chamber.

6. 2. The apparatus for treating gaseous contaminants with plasma as described in claim 1, further comprising an ignition source and a dielectric tube, the dielectric tube being inserted into the second chamber, the ignition source comprising a probe assembly, the probe assembly comprising a carrier and at least one tip mounted on the carrier, the tip having an outer diameter of 1.6 mm to 2 mm.

7. 2. The apparatus for treating gaseous contaminants with a plasma as recited in claim 1, wherein said ignition gas is selected from the group consisting of air, nitrogen and argon.

8. A microwave source that generates microwave vibrations; a waveguide assembly coupled to the microwave source to transmit the microwave vibrations; a resonating chamber coupled to the waveguide assembly and extending along a waveguiding direction, the resonating chamber including a tapered chamber proximate the waveguide assembly and a combustion chamber distal from the waveguide assembly, the combustion chamber receiving the microwave vibrations passing through the tapered chamber, the microwave vibrations reacting with a non-fuel ignition gas in the combustion chamber to produce a torch, the waveguiding direction being substantially parallel to a reference axis of the tapered chamber; 1. A gaseous pollutant treatment device that does not require fuel, wherein the tapered chamber includes a first inner wall, a second inner wall opposite the first inner wall, a first top wall, and a first bottom wall, and the first inner wall, the second inner wall, and the first top wall are inclined inwardly with respect to the reference axis of the tapered chamber.

9. 9. The apparatus for treating gaseous pollutants that does not require fuel as described in claim 8, wherein the combustion chamber has a second top wall and a second bottom wall, the second top wall having a first height difference relative to a bottom end of the first top wall.

10. 9. The fuel-free gaseous pollutant treatment apparatus of claim 8, wherein the combustion chamber has a second top wall and a second bottom wall, the second bottom wall having a second height difference relative to the first bottom wall.

11. 9. The device for treating gaseous pollutants as described in claim 8, further comprising an ignition source and a dielectric tube, the dielectric tube being inserted into the combustion chamber and having a first end close to the ignition source and a second end remote from the ignition source, the combustion chamber having a second top wall and a second bottom wall, the second end of the dielectric tube protruding from the combustion chamber and having a third height difference with respect to the combustion chamber.

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