Method for decomposing a compound having a fluorooxyalkylene group as a repeating unit

JP7679019B1Active Publication Date: 2025-05-19SHIN ETSU CHEMICAL CO LTD +1
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Patent Information

Application Number
JP2025500217
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2024-10-11
Publication Date
2025-05-19
Estimated Expiration
2044-10-11

AI Technical Summary

Benefits of technology

【0018】 本発明によれば、フルオロポリエーテル化合物の新しい分解処理方法が提供される。

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Abstract

To provide a new method for decomposing fluoropolyether compounds. [Solution] Compounds having fluorooxyalkylene groups as repeating units (i.e., fluoropolyether compounds) to be decomposed can be decomposed by contacting them with subcritical water at 300° C. or higher in the presence of at least one basic compound selected from the group consisting of alkali metal hydroxides and alkaline earth metal hydroxides. After the decomposition, fluorine atoms contained in the fluoropolyether compounds remain in the reaction solution as fluoride ions, which can be recovered as solid calcium fluoride by adding calcium ions.
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Claims

1. A method for decomposing a compound having a fluorooxyalkylene group as a repeating unit, comprising the step of contacting the compound to be decomposed, the compound having a fluorooxyalkylene group as a repeating unit, with subcritical water at 300°C or higher in the presence of at least one basic compound selected from the group consisting of alkali metal hydroxides and alkaline earth metal hydroxides.

2. 2. The method according to claim 1, wherein the fluorooxyalkylene group has 1 to 6 carbon atoms.

3. The fluorooxyalkylene group is -CF 2 O-, -CF 2 CF 2 O-, -CF(CF 3 ) CF 2 O-, -CF 2 CF 2 CF 2 O-, -CF 2 CF 2 CF 2 CF 2 O-, -CF 2 CF 2 CF 2 CF 2 CF 2 O- and -CF 2 CF 2 CF 2 CF 2 CF 2 CF 2 The decomposition method according to claim 1, further comprising at least one divalent group selected from the group consisting of O-.

4. 2. The method according to claim 1, wherein the compound to be decomposed is a polymer having a repeating structure composed of the repeating unit in the main chain.

5. 2. The method according to claim 1, wherein the step of contacting with subcritical water is carried out at 350° C. or higher.

6. 2. The method according to claim 1, wherein the basic compound is potassium hydroxide.

7. 2. The decomposition method according to claim 1, wherein the concentration of the basic compound in the subcritical water is 0.5 mol / L to 6.0 mol / L.

8. The fluorooxyalkylene group is -CF 2 O-, -CF 2 CF 2 O-, -CF(CF 3 ) CF 2 O- and -CF 2 CF 2 CF 2 The method for decomposing according to any one of claims 1 to 7, wherein the divalent group is selected from the group consisting of O-.

Citation Information

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