Support of optical element

Abstract

The present invention relates to an arrangement of a microlithography imaging device, particularly for use with light in the extreme UV (EUV) range, comprising a holding device (110) for holding an optical element (109), the optical element (109) including an optical surface (109.1) and defining a main extension plane, which defines radial and circumferential directions. The holding device (110) comprises a base unit (110.1) and four or more separate holding units (110.2), the base unit (110.1) including a plurality of support interface units (110.3) spaced apart in the circumferential direction for connecting the holding device (110) to a support structure (102.1). The holding units (110.2) are connected to the base unit (110.1) and are arranged so as to be distributed and spaced apart along the circumferential direction. The holding units (110.2) are configured to hold the optical element (109) relative to the base unit (110.1). The base unit includes at least one support membrane element (110.4), which extends primarily along the circumferential and radial directions and has a thickness dimension transverse to the circumferential and radial directions, and the holding unit (110.2) is arranged on the front side of the at least one support membrane element (110.4) facing the optical element (109).

Description

Technical Field

[0001] [Cross - Reference to Related Applications] This application claims the priority of German Patent Application No. 10 2019 112 224.4, filed on May 10, 2019, under 35 U.S.C. § 119, and the entire contents of the above - mentioned application are incorporated herein by reference.

Background Art

[0002] The present invention relates to an optical arrangement for microlithography suitable for the use of UV imaging light, particularly light in the extreme ultraviolet (EUV) range. Further, the present invention relates to an optical imaging apparatus provided with such an arrangement. The present invention can be used together with any desired optical imaging method. The present invention can be particularly advantageously used in the manufacture or inspection of ultra - small electronic circuits and optical components (e.g., optical masks) used for that purpose.

[0003] Optical devices used in the manufacture of ultra - small electronic circuits usually comprise a plurality of optical element units, and the optical element units include one or more optical elements such as lens elements, mirrors, or optical gratings arranged in an imaging optical path. These optical elements usually cooperate in an imaging process to transfer an image of an object (e.g., a pattern formed on a mask) onto a substrate (e.g., a so - called wafer). The optical elements are usually combined into one or more functional groups, which may in some cases be held in separate imaging units. In particular, in the case of refractive systems operating mainly at wavelengths in the so - called vacuum ultraviolet range (e.g., VUV with a wavelength of 193 nm), such imaging units are often formed from a stack of optical modules holding one or more optical elements. The optical module usually includes a support structure having a substantially ring - shaped outer support unit that supports one or more optical element holders, and the optical element holders further hold each optical element.

[0004] With the continuous progress in the miniaturization of semiconductor components, there is always a demand for higher resolution in the optical systems used in their manufacturing. Due to this demand for higher resolution, it is necessary to increase the numerical aperture (NA) of the optical system and improve the imaging accuracy.

[0005] One approach to obtaining high optical resolution is to shorten the wavelength of the light used in the imaging process. Recently, there has been a tendency to promote the development of systems that use light in the so-called extreme ultraviolet (EUV) region, which typically has a wavelength of 5 nm to 20 nm, and in most cases, a wavelength of approximately 13 nm. In this EUV region, the use of conventional refractive optical systems has become impossible. The reason is that in this EUV region, the absorbance of the materials used for refractive optical systems is too high to achieve acceptable imaging results with the available optical power. Therefore, in this EUV region, it is necessary to use reflective optical systems for imaging.

[0006] This transition to pure reflective optical systems with high numerical apertures (e.g., NA > 0.4 - 0.5) in the EUV region poses significant challenges in the design of imaging devices.

[0007] The above factors lead to very strict requirements regarding the position and / or orientation between the optical elements involved in imaging and the deformation of individual optical elements in order to achieve the desired imaging accuracy. Furthermore, it is necessary to ultimately maintain this high imaging accuracy throughout the operation during the entire life cycle of the system.

[0008] As a result, the components of the optical imaging device that cooperate during the imaging process (i.e., for example, the optical elements of the illumination device, the mask, the optical elements of the projection device, and the substrate) must be supported in a defined manner to maintain a defined clear spatial relationship between these components and minimize unwanted deformation of these components, ultimately achieving the maximum imaging quality.

[0009] Here, a particular problem specific to the EUV system is that each of the illumination device, the projection device, and the optical element is a relatively large and heavy optical unit. However, in order to meet the requirements regarding accuracy, these heavy units should be replaceable and adjustably adaptable, and further, these units should not undergo undesirable or ill-defined deformations as a result of the design of their mounts. For these reasons, for example, as known from Patent Document 1 (Scherle et al., the entire disclosure of which is incorporated herein by reference), for the purpose of supporting these optical units or elements, so-called three-point support is usually utilized by three removable holding units (the holding units are usually designed in the form of so-called hexapod kinematics) evenly distributed along the perimeter.

[0010] In order to avoid undesirable parasitic stresses and the resulting deformations in the optical unit that may occur due to manufacturing errors or deformations of the support structure, such three-point support can be used to obtain a statically determinate mount or avoid a statically indeterminate mount.

[0011] The drawback of such a statically determinate three-point support is that, in the case of impact loads that may occur, for example, during the transportation of the imaging device, in the case of the most unfavorable load, i.e., if the load is in a specific load direction, two of the other holding units are substantially compliant in this load direction and thus cannot support any load, so the main load has to be supported by only one of the three holding units. Therefore, the holding units must have a relatively robust and complex design to ensure reliable support of the optical element. Thus, in particular, the removable connection to the optical element has a complex design to avoid or reduce the introduction of parasitic stresses (and the resulting parasitic deformations) as much as possible.

[0012] Patent Document 2 (Heintel et al., the entire disclosure of which is incorporated herein by reference) discloses holding an optical element at its outer periphery by a plurality of holding units adhesively bonded to the outer periphery of the optical element and disposed on a support ring. Thereby, the distribution of the operating load is improved and the configuration is miniaturized by the adhesive bonding. However, the problem that arises is that, first of all, due to the adhesive bonding, the simple replacement of the optical element cannot be easily performed. Furthermore, when an impact acts on the arrangement configuration, the impact loads in the individual holding units vary greatly depending on the direction of the impact (or the acceleration acting on the component). Here, the ratio of the maximum impact load to the minimum impact load can be up to 20 in some cases. Therefore, also in this case, the distribution of the impact load on the individual holding units is not uniform, and most of the impact load has to be absorbed by some individual holding units. Furthermore, a problem that naturally occurs due to this redundant support is that parasitic stresses in the case of deformation of the support ring are introduced into the optical element.

Prior Art Documents

Patent Documents

[0013]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0014] Therefore, the present invention is based on the object of providing a microlithography optical arrangement configuration and a corresponding optical imaging device including the arrangement configuration, and a method of supporting an optical element, which have no or at least few of the above-mentioned drawbacks, and in particular, can easily obtain a support for an optical element that is as robust as possible against impact loads and has a small size.

Means for Solving the Problems

[0015] The present invention achieves this object by the features of the independent claims.

[0016] The present invention is based at least to some extent on the technical teaching that when a plurality of holding units for separately holding optical elements, preferably four or more holding units, are provided, and the holding units are arranged on at least one support film element of the base unit, and the support film element preferably extends along the circumferential direction and the radial direction, a support for an optical element that is robust against impact loads but of small size can be easily obtained. At least partly due to the load, especially the impact load, occurring in the optical element during the manufacture, transportation, and operation of the imaging device being divided among a plurality of holding units, preferably four or more holding units, it is possible to first achieve a reduction in the maximum load acting on a single holding unit even in an undesirable case (for example, the worst case usually defined by the manufacturer and / or user of the system for design purposes).

[0017] As a result of arranging each holding unit on the support film element, it is further possible to set the rigidity of the holding device between the optical unit side force application point of each holding unit (in the optical element) and the support structure side force application point of each support boundary unit (of the support structure) by the design of the support film element and / or the method of connecting the support film element to the support boundary unit. Thus, as can be advantageously achieved thereby, in particular, this rigidity in each specific degree of freedom is preferably substantially equalized at least mutually among a plurality of holding units (preferably all holding units) to the maximum extent. The higher the degree of this equalization in a specific degree of freedom (therefore, the smaller the difference in rigidity between the individual holding units in this degree of freedom, or the narrower the distribution of this rigidity among the holding units), the higher the uniformity of the impact load divided among the holding units in each degree of freedom. If desired, in some cases even ideally, it is even possible to obtain at least substantially the same rigidity for all holding units with respect to the support structure side force application point in each degree of freedom. In this case, the impact load in each degree of freedom is substantially evenly distributed among all holding units.

[0018] Therefore, the risk that the impact load expected in the most adverse case (normally defined by the system manufacturer and / or user for design purposes) in a certain holding unit exceeds the holding force of the holding unit can be surely reduced without the need to increase the safety factor of the holding unit and thus without increasing the size. Therefore, in some embodiments, it is advantageous that, despite the simplification of the holding unit, the impact safety or reliability against system failure under impact load can be enhanced. Therefore, the holding unit can have a simpler and thus more space-saving design, which further facilitates increasing the number of holding units. Ultimately, in some embodiments, this enables the realization of an advantageous number of holding units with the impact load evenly distributed among the holding units.

[0019] Yet another advantage of the support film element in at least some embodiments is that the optical element is advantageously evenly supported in many respects, and thus its wavy deformation caused by the weight of the optical element can be substantially reduced. In addition to improving the stability against impact, this can also improve the achievable imaging quality. Furthermore, by using the support film element, an advantageous low rigidity of the holding device with respect to the optical element can be obtained.

[0020] Yet another advantage of the support film element in at least some embodiments is that the holding units can be separated from each other with respect to the degree of freedom of inclination with an axis of inclination in the support film element. This is particularly due to the fact that the support film element can be deformed relatively easily, especially by means of a depression. Advantageously, in at least some embodiments, this can reduce the parasitic stress introduced into the optical element during the deformation of the holding device.

[0021] Accordingly, according to a first aspect, the present invention relates to an arrangement configuration of a microlithography imaging apparatus, particularly for using light in the extreme ultraviolet (EUV) region, the arrangement configuration comprising a holding device for holding an optical element. The optical element includes an optical surface and defines a main extension plane, and the radial direction and the circumferential direction are defined in the main extension plane. The holding device includes a base unit and a plurality of separate holding units, particularly four or more separate holding units, and the base unit includes a plurality of support boundary units spaced apart from each other in the circumferential direction for connecting the holding device to a support structure. The holding units are connected to the base unit and are arranged to be distributed along the circumferential direction and spaced apart from each other. Further, the holding units are configured to hold the optical element with respect to the base unit. The base unit includes at least one support film element, and at least one support film element mainly extends along the circumferential direction and the radial direction, and at least one support film element has a thickness dimension transverse to the circumferential direction and the radial direction. Here, the holding unit is arranged on the front side of at least one support film element facing the optical element.

[0022] In principle, the support film element can have any suitable design and arrangement to obtain the above function of separating and equalizing rigidity between individual holding units. As an example, any winding and / or folding configuration of the film element can be realized (in a cross-section extending perpendicular to the circumferential direction) to set the rigidity or compliance of (one or more) specific degrees of freedom as desired. Accordingly, the cross-sectional contour of the film element can have at least a partially straight line and / or at least a partially polygonal and / or a partially curved path. Of course, in the case of a straight path of the cross-sectional contour, it is a particularly simple design.

[0023] In a variant having a particularly simple design, at least one support film element is configured like a thin-walled ring-shaped disk or like a thin-walled hollow truncated cone. A configuration that can be particularly easily manufactured can thereby be obtained.

[0024] The arrangement of the support film elements can, in principle, be selected in any suitable manner and adapted to the pair of the optical element and the holding device (in particular the holding units) in order to obtain a desired separation and / or equalization of rigidity between the individual holding units. In a particular advantageous variant, at least one support film element has a cross-section extending radially and perpendicular to the circumferential direction, and is inclined by 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction. In these variants, in particular, a suitable narrow-band rigidity distribution between the holding units can be obtained in the degree of freedom perpendicular to the main extension plane of the optical element. Here, the rigidity can be influenced by the above-mentioned inclination angle, and the rigidity in the direction perpendicular to the main extension plane increases with the inclination angle. When at least one support film element extends at least substantially parallel to the radial direction, a particularly simple configuration can be obtained.

[0025] In a particular variant, at least one support film element has an inner part and an outer part spaced therefrom in the radial direction. Here, at least one support film element can have an intermediate part between the inner part and the outer part, and the intermediate part can have a somewhat larger extent (in the radial direction). As an addition or alternative thereto, at least one (preferably a plurality of holding units, in particular all holding units) of the holding units can be connected to at least one support film element between the inner part and the outer part in the radial direction. Thereby, the possibility of such support film elements (for separation and / or equalization of rigidity) can be particularly fully exploited. Here, it may be advantageous if each holding element is arranged in the central region between the inner part and the outer part in the radial direction.

[0026] This particularly applies to an advantageous variant in which at least one support film element is connected to a circumferential outer ring structure extending circumferentially in the region of the outer part. Here, in particular, the outer ring structure can protrude completely or partially in the direction of the optical element beyond the support film element. When the outer ring structure is arranged on the back side of at least one support film element opposite to the front side of at least one support film element (that is, in other words, the outer ring structure does not face the optical element), a design that can be particularly easy to manufacture and assemble can be obtained.

[0027] In certain embodiments, it can be equally advantageous if at least one support film element is connected to a circumferentially inner ring structure, in particular a thin-walled inner ring structure, which extends circumferentially in the region of the inner part. The inner ring structure can also project in the direction of the optical element beyond the support film element. Similarly, additionally or alternatively, the inner ring structure can be arranged on the back side of at least one support film element opposite the front side of the at least one support film element.

[0028] In this case, in addition to achieving the desired improvement in the rigidity of the holding device, each inner and outer ring structure is advantageous because a further adaptation of the rigidity distribution between the holding units is relatively simple and flexible due to the design of the ring structure and / or its connection to each support film element.

[0029] Here, in particular, since at least some, in particular three, support boundary units of the support boundary unit are formed in the outer ring structure or the inner ring structure, a particularly simple connection of the holding device to the outer support structure is possible. Here, these support boundary units can be evenly distributed along the perimeter of the holding device. However, the adaptability of the rigidity distribution is particularly well reflected when the support boundary units are distributed at irregular intervals along the circumferential direction, for example, due to being predetermined by the optical element of the imaging device and / or adjacent components.

[0030] In principle, it may be sufficient if only the outer ring structure and / or the inner ring structure are connected to each support film element. In a particularly preferred embodiment having a good narrow-band distribution of rigidity between the holding units, at least one web element interconnecting the outer ring structure and the inner ring structure is provided, and a gap is formed between the at least one web element and the at least one support film element in the direction of the thickness dimension (of the film element).

[0031] Here, the flow of force between each support boundary unit and each holding unit can be appropriately directed and distributed according to the arrangement and / or design of the web elements, and as a result, it is also possible to affect or set the rigidity of each holding unit with respect to each support boundary unit.

[0032] Here, due to the gap, it is ensured that the separability of the support film element is not restricted or is affected as required by regulations. Here, the gap can extend over 50% or more, preferably 70% or more, and more preferably 90% - 100% of the length of the web element between the outer ring structure and the inner ring structure. Of course, the region without a gap (i.e., where the web element contacts the support film element) restricts the deformability of this region of the support film element. As a result, such a region has the effect of increasing rigidity. Using this supplementary rigidity effect, the rigidity can also be locally adjusted by locally closing the gap.

[0033] Depending on the rigidity distribution to be obtained between the holding units, a single web element may be sufficient. In a specific deformation mode, at least one pair of web elements assigned to each other is provided, and the at least one pair of two web elements engages with the inner ring structure adjacent to each other in the circumferential direction. This enables a particularly suitable setting of the force flow to be obtained, and thus the rigidity distribution. It should be understood that in principle, any number of pairs of web elements can be provided according to the rigidity distribution to be obtained. When three such pairs of web elements assigned to each other are provided, a particularly suitable configuration is usually obtained.

[0034] When there are multiple pairs of such web elements, different pairs of web elements may intersect. However, it can be particularly advantageous if at least one pair of two web elements engages with the outer ring structure adjacent to each other, that is, if there is no such thing as the intersection of web elements.

[0035] Depending on the rigidity distribution between the holding units to be obtained, the arrangement or distribution of the web elements extending around can be implemented in any suitable form. In a preferred variant, at least one pair of two web elements engage with the outer ring structure between two support boundary units adjacent to each other in the circumferential direction. Thereby, a particularly suitable distribution or setting of the force flow to be obtained between the support boundary units and the holding units, and thus the rigidity (in one or more degrees of freedom), becomes possible.

[0036] In principle, each pair of two web elements can be arbitrarily and suitably aligned relative to each other to obtain the desired rigidity distribution. Preferably, at least one pair of two web elements each define a longitudinal axis, and the two longitudinal axes are inclined to extend with respect to each other by 10° or less, preferably 5° or less, more preferably 2° or less, particularly 0° (thus, the longitudinal axes extend parallel to each other or are in the same straight line in some cases) in the plan view of the main extension plane.

[0037] As an addition or alternative thereto, each pair of two web elements can be aligned in any suitable form with respect to the two ring structures and / or with respect to the support boundary units. In an advantageous variant, at least one pair of two web elements each define a longitudinal axis, and in the plan view of the main extension plane, at least one of the two longitudinal axes, preferably each of the two longitudinal axes, extends inclined by 30° or less, preferably 10° or less, more preferably 2° or less with respect to the connection line connecting two support boundary units of the outer ring structures adjacent to each other in the circumferential direction, and each web element (of the pair) engages between the support boundary units. Here, within the scope of the meaning of the present disclosure, the connection line between the two support boundary units is preferably defined by the connection between the action points of the support forces (of the support structure of the imaging device) obtained at each support boundary unit. As a result, it is possible to obtain a particularly suitable distribution of the force flow between the support boundary units and the holding units, and thus a suitable narrow-band rigidity distribution (in one or more degrees of freedom) between the holding units.

[0038] In yet another variant, at least one support film element is connected on its back side, opposite the front side, to a circumferentially extending circumferential support ring structure. Here, it is preferred that the support boundary units, in particular three support boundary units, are formed in the support ring structure. Here too, the support boundary units can be evenly distributed over the circumference. However, the advantages are particularly well reflected when the support boundary units are distributed at irregular intervals along the circumferential direction.

[0039] In this design, it is possible to connect at least one support film element to the support ring structure, i.e., to ensure that there is no gap between the support ring structure and the support film element. However, it should be understood that in yet another variant, it is also possible to provide such a gap, at least in part, in relation to the web element as already described above in order to at least partially release the deformation capacity of the support film structure in this region.

[0040] Also in these designs, the force flow between the support boundary units and the individual holding units, and thus the rigidity distribution between the holding units, can be set by the design and / or profile of the support ring structure. In a particular variant, for this purpose, the distance of the support ring structure from the inner part of at least one support film element (in particular from the inner edge of at least one support film element) varies along the circumferential direction between at least two, in particular all, support boundary units adjacent to each other circumferentially.

[0041] It is even more advantageous if the support ring structure connects at least two (preferably all) support boundary units adjacent to each other circumferentially along an essentially shortest path without protruding radially inwards beyond the inner edge of at least one support film element. In this way, a particularly suitable force flow distribution can be obtained.

[0042] It will be understood that, in principle, a combination of at least one support film element and a support ring structure may be sufficient as a holding device. However, in a preferred variant, the support ring structure is connected on the back side opposite the support film element to at least one stiffening film element that mainly extends along the circumferential and radial directions. As a result, the rigidity of the entire holding device can be advantageously increased, and in particular, an advantageous high resonance frequency of the holding device can be obtained.

[0043] In principle, the stiffening film element can be designed in any suitable desired manner. In particular, this can be of the same configuration as the support film element, or even the same configuration. Preferably, at least one stiffening film element is configured like a thin-walled ring-shaped disk or like a thin-walled hollow truncated cone. Further, in a cross-section extending perpendicular to the radial direction and the circumferential direction, at least one stiffening film element extends additionally or alternatively at an angle of 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction. It is also particularly advantageous here if at least one stiffening film element extends at least substantially parallel to the radial direction. Regarding the design and arrangement of the stiffening film element, the above description regarding the support film element generally applies, and reference is made to it in this regard.

[0044] Even with these designs, the holding unit can in principle be configured in any suitable form for holding an optical element. In a design with a rear support ring structure, preferably, at least one (preferably each) of the two holding units positioned directly adjacent in the circumferential direction is connected to at least one support film element via a separation part. Thereby, it can be easily ensured that the limitation of the deformation ability of the support film element by the rear support ring structure is compensated by this separation part. Here, in principle, the separation via the separation part can be of any design and can be matched to one or more required degrees of freedom. Usually, it is particularly advantageous if the separation part releases the degree of freedom of inclination around an inclination axis parallel to the radial direction.

[0045] As a rule, a membrane element in the sense of the present disclosure is a thin-walled element whose thickness dimension is significantly (usually by at least one order of magnitude) smaller than the dimensions in the other two spatial directions. Preferably, in a cross-section perpendicular to the circumferential direction, the width dimension of at least one support membrane element is defined, and the thickness dimension of at least one support membrane element is 2% to 30%, preferably 5% to 25%, more preferably 10% to 20% of the width dimension of at least one support membrane element. Thereby, particularly suitable properties regarding the narrow-band stiffness distribution to be obtained between the holding units can be obtained. Here, it should be understood that the absolute width dimension can have an influence, and the relative thickness dimension can also increase with the increase of the width dimension. In any case, it is preferable to make the stiffness of the support membrane element in the direction perpendicular to the main extension plane at least one order of magnitude smaller than the stiffness of the adjacent components of the base unit (in the corresponding spatial direction).

[0046] As an addition or an alternative thereto, the thickness dimension of at least one support membrane element can vary along the circumferential direction, and the thickness dimension can vary particularly according to the angular distance to the nearest support boundary unit along the circumferential direction. Here, in particular, the thickness dimension can be increased with the increase of the angular distance to the nearest support boundary unit. Due to such a change in the thickness dimension, in any case, it is possible to finely set the deformation characteristics of each support membrane element, and thus (alone or together with other measures described herein) to obtain the desired narrow-band stiffness distribution between the holding units. As an addition or an alternative thereto, for this purpose, it is of course also possible to vary the thickness dimension of at least one support membrane element along the radial direction. Here, the thickness dimension can vary particularly according to the desired stiffness profile of the support membrane element in the radial direction.

[0047] As an addition or an alternative thereto, at least one support membrane element can have at least one through-opening in at least one region located between two directly adjacent holding units in the circumferential direction, particularly in each region between two directly adjacent holding units. Correspondingly, of course, options are also obtained that affect the deformation characteristics of each support membrane element and further the narrow-band stiffness distribution between the holding units.

[0048] Preferably, each holding unit includes a holding boundary unit for connection to an optical element, and a first rigidity in a first direction perpendicular to the main extension plane and a second rigidity around an axis parallel to the radial direction are defined for the holding boundary unit of each holding unit with respect to each support boundary unit. Here, for at least one support boundary unit, preferably for all support boundary units, and for a group of holding units including 80% or more, preferably 90% or more, more preferably 95% - 100% of the holding units, the Difference is configured such that the holding device, in particular the base unit, and in particular at least one support film element, is 900% or less, preferably 100% or less, more preferably 10% - 1% of the minimum first rigidity of the holding units of the group of holding units. Generally, the Difference of the first rigidity between the holding units of the group of holding units is desirably less than 1% of the minimum first rigidity of the holding units of the group of holding units. In this way, a particularly suitable narrow-band rigidity distribution in the first direction (i.e., perpendicular to the main extension plane of the optical element) is advantageously obtained.

[0049] It should be understood that for a single degree of freedom, in particular the degree of freedom where a main impact load is expected, it may be sufficient to adapt the rigidity distribution between the holding units in this way. Preferably, such adaptation is also carried out for other degrees of freedom. Similarly, it is of course possible to carry out the adaptation with only one or more other degrees of freedom.

[0050] Therefore, in a specific deformation mode, for at least one support boundary unit, preferably for all support boundary units, and for yet another group of holding units including 80% or more, preferably 90%, more preferably 95% - 100% of the holding units, the second rigidity between the holding units of the yet another group of holding units DifferenceThe holding device, in particular the base unit, and in particular at least one support film element, can be configured such that it is 900% or less, preferably 100% or less, and more preferably 10% to 1% of the minimum second stiffness of the holding units of said further separate holding unit group. It will be understood that the two holding unit groups with respect to the first stiffness (i.e., the first group) and the second stiffness (i.e., the second group) as described above can be the same. However, they may also be different by one or more holding units.

[0051] In principle, the holding unit can be designed in any suitable way to hold the optical element during operation. Here, basically, friction and / or fitting and / or adhesive connection techniques can be used individually or in any desired combination. Thus, for example, the holding unit can be designed such that a conventional adhesive connection, such as an adhesive bond, etc., is used for the connection of the optical element.

[0052] In a preferred variant, a detachable connection is used. Here, a holding unit that holds the optical element via a separate clamping connection for each is preferred. Here, each clamping connection ensures simple releasability of the connection and thus simple replaceability of the optical element. Furthermore, the clamp is advantageous because the holding force obtained therefrom (i.e., the friction between the clamping surfaces) can be set with relatively high precision by the contact force on the clamping surfaces. Thus, the risk that the impact load expected in the most adverse case in the holding unit exceeds the holding force of the holding unit can be reliably reduced without the need to increase the safety factor of the holding unit and thus without increasing the dimensions. Therefore, it is advantageous that the impact safety or failure safety of the system under impact load can be enhanced despite the simplification of the holding unit.

[0053] In principle, the clamping connection between each holding unit and the optical element can be established in any suitable way. In particular, the frictional engagement between one or more of each contact surface of the holding unit and the optical element required for clamping can be brought about in any suitable way. Therefore, a single clamping element can be provided for each holding unit, and the clamping element is pressed against the corresponding contact surface of the optical element by a suitable tensioning device to obtain the frictional engagement of the clamp. For example, the clamping element can be pretensioned against the optical element by its respective support on the base unit. In that case, the contact forces acting on the optical element in the assembled state at least partially, but at least overall, cancel each other out, and corresponding reaction forces can be applied by one or more adjacent holding units so that the specified position and orientation of the optical element are obtained.

[0054] A particularly simple design is obtained when at least one, preferably each, of the holding units includes a holding boundary unit for connection to the optical element, and the holding boundary unit particularly includes a first clamping element and a second clamping element. Here, the first clamping element and the second clamping element are simply tightened against each other to establish the clamping connection, and the holding boundary portion of the optical element is particularly easily clamped between the first clamping element and the second clamping element. Preferably, in such a configuration, a particularly simple overall design is achieved, so this configuration is selected for each holding unit.

[0055] A particularly advantageous deformation mode is obtained in which there is a low risk of introducing parasitic stress into the optical element when the first and second clamping elements are tightened against each other by a simple tension element to establish a clamping connection. Here, the tension element can be designed, for example, in the form of a clamping bracket or a tie rod. Preferably, as a result of the tension element extending into the recess of the boundary portion, a particularly uniform distribution of the clamping force can be obtained, especially locally. Here, the tension element preferably extends into the recess of the boundary portion with a play in order to avoid contact between the tension element and the boundary of the optical element, which could otherwise lead to parasitic stress in the optical element.

[0056] Preferably, a compensation spring device configured to reduce the loss of tension in the tension element is provided. In principle, this compensation spring device can be designed in any suitable way. As an example, this can be easily designed like a disc spring or a disc spring packet (which may also be referred to as a Belleville washer or a Belleville washer packet respectively).

[0057] In principle, the tension element can have any design suitable for obtaining the clamping of the clamping elements against each other and thus the clamping of the boundary portion. As mentioned, this can relate to a clamping bracket that engages and supports around two clamping elements. A particularly simple and compact configuration is obtained when the tension element includes a threaded portion that is screwed into one of the clamping elements for tightening. Here, it is particularly advantageous if at least one of the clamping elements is connected to the base unit by a connection portion, in which case the connection portion is preferably configured to limit the rotational freedom about an axis extending substantially parallel to the longitudinal axis of the threaded portion. This can ensure in a simple way that the connection portion absorbs at least most of the tightening torque of the threaded connection so that no or only very little parasitic stress is introduced into the optical element at this point.

[0058] It should be understood that each holding unit can have a holding boundary unit for connecting an optical element, and each holding boundary unit can be connected to the base unit in principle in any suitable way. In particular, a part of the holding boundary unit, for example, one of the clamp elements, can only be indirectly connected to the base unit via the tension element, while another part, for example, the other clamp element, can be directly connected to the base unit. Preferably, at least one of the holding boundary units, in particular each of the holding boundary units, is connected to the support film element via a connection part. When using the clamp element, for example, the first clamp element can be connected to the support film element via a connection part, and / or the second clamp element can be connected to the support film element via a connection part.

[0059] It should be understood that the first clamp element and the second clamp element can be connected to the base unit via a common connection part. However, in other variants, the first clamp element can be connected to the base unit via a first connection part, and the second clamp element can be connected to the base unit via a (separate) second connection part if necessary. Here, when the first connection part and the second connection part extend substantially parallel to each other, it can be advantageous because, despite being particularly easy to manufacture and assemble, it results in a configuration with advantageous rigidity with a certain degree of freedom from a dynamic perspective. As an addition or alternative to this, the first connection part and the second connection part can be configured in a parallel guide manner such that they guide the clamp element to be clamped against each other substantially parallel to the radial direction. In both variants, it is possible to obtain the above-mentioned radial compliance (for thermal deformation separation) while still having high rigidity that is dynamically advantageous under specific conditions with the remaining degrees of freedom. However, under certain conditions, this high rigidity of the connection part can lead to relatively high parasitic stresses in the optical element in the case of deformation of the holding device, so it can also have an adverse effect.

[0060] In principle, the connection part can be designed in any suitable way as desired. Thus, by way of example, the connection part can be configured in a leaf spring manner. Thereby, a particularly simple, small and cost-effective deformation form can be obtained. As an addition or an alternative thereto, the connection part can be configured to have compliance in the radial direction (of the optical element). In particular, this is advantageous when the coefficients of thermal expansion of the optical element and the holding device are different. In that case, good thermal deformation separation can be obtained between the optical element and the holding device due to the radial compliance. As an addition or an alternative thereto, the connection part can extend substantially in a plane perpendicular to the radial direction. Also thereby, a particularly cost-effective and small design can be obtained.

[0061] In a specific deformation form, the connection part is configured to limit the rotational freedom about an axis extending substantially parallel to the radial direction. In particular, when using, for fixing purposes, screws aligned in the radial direction, etc., this is advantageous because the connection part can absorb at least part of the tightening torque of the screw connection (as already described above for the clamp connection).

[0062] In principle, the connection part can be aligned in any suitable way to realize the above deformation forms. In a specific deformation form, the connection part defines a longitudinal axis that extends substantially perpendicular to the main extension plane or substantially parallel to the main extension plane. In both cases, the above radial compliance can be realized particularly simply.

[0063] In principle, the optical element can have any design to establish each connection to the holding unit. Thus, the optical element can, for example, include a single holding boundary provided for connection to the holding unit. In a specific deformation form, the optical element includes separate holding boundaries for establishing connection to each holding unit, and the holding boundaries serve for connection to each holding unit. In that case, for example, as described above, the holding boundary of the optical element can be clamped between two clamp elements of the holding unit.

[0064] The holding boundary part and the holding unit can be combinable with each other as desired. That is, no specific pairing is given between the holding boundary part and the holding unit (thus, for example, the optical element and the base unit having the holding unit can be arbitrarily rotated relative to each other along the circumferential direction). In other variants, such a specific pairing is realized by appropriately different designs and / or arrangements of the components. Here, the holding boundary part can be configured to be combinable with the first holding unit but not with the second holding unit.

[0065] In principle, the holding boundary part of the optical element can be realized in any suitable way in the optical element. When the holding boundary part of the optical element is constituted by the protrusion of the optical element, a particularly small and simple design can be obtained. A plurality of holding boundary parts can be formed on the common protrusion of the optical element. Further, all the holding boundary parts can be formed on the ring-shaped protrusion of the optical element. The protrusion of the optical element can extend in a direction perpendicular to the plane defined by the circumferential direction and / or the circumferential direction and the radial direction.

[0066] In principle, each holding boundary part can be designed in any suitable desired way. As an example, this can be directly formed on the body of the optical element. In a preferred variant that can be easily and accurately executed, each holding boundary part can be constituted by a holding boundary element connected to the optical element. Here, the holding boundary element can be inserted into the recess of the optical element, and in particular, the boundary element can be inserted into the recess of the protrusion of the optical element. Such a configuration can be manufactured particularly easily. The holding boundary element can include, for example, a connection bush. This connection bush can include a collar that facilitates simple and accurate manufacturing and assembly.

[0067] In principle, the optical element can be manufactured from any suitable material, either as a single-component or multi-component type. Preferably, the optical element is manufactured from a ceramic material containing at least SiSiC in the region of at least the protrusion, and / or from a material containing Zerodur and / or a lens material. Further other materials suitable for the optical element are aluminum (Al), aluminum alloys, especially aluminum silicon (AlSi), beryllium (Be), beryllium alloys, especially aluminum beryllium (AlBe), ULE® (ultra-low expansion glass by Corning Inc., located in Corning, New York 14831, USA), copper (Cu), molybdenum (Mo), silicon carbide (SiC), and silicon (Si). In the deformed form having a boundary element, it is preferable that the boundary element can be manufactured from a material containing invar and / or stainless steel and / or molybdenum. Further other materials suitable for the boundary element are aluminum (Al), aluminum alloys, especially aluminum silicon (AlSi), beryllium (Be), beryllium alloys, especially aluminum beryllium (AlBe), ceramic materials, especially SiSiC, but also glass fiber reinforced plastic (GFRP) or carbon fiber reinforced plastic (CFRP).

[0068] In principle, the optical surface can be any refractive and / or reflective and / or diffractive optical surface. The advantages described herein are particularly effective when the optical surface is a reflective optical surface. In that case, the optical surface is preferably arranged on the body of the optical element. The body preferably includes at least one protrusion on the side opposite to the optical surface, and the protrusion forms a boundary portion for at least one of the holding units.

[0069] In principle, the base unit can also have any design. In a preferred small deformed form, the base unit has a ring-shaped configuration. Here, the base unit can have a circular ring-shaped design in the simplest case. However, any other ring form, for example, a ring that is at least partially polygonal or a ring combining curved and straight portions, is also possible. Usually, the form of the base unit is matched to the form of the optical element to be supported.

[0070] In a particularly advantageous design, the base unit defines a main extension plane of the base unit, and at least one of the holding units projects from the base unit substantially perpendicular to the main extension plane of the base unit. Preferably, this applies to all of the holding units, and all of the holding units project from the base unit substantially perpendicular to the main extension plane of the base unit. In a variant having a ring-shaped base unit, a coronal design is thereby obtained, and the holding units project from the ring-shaped base unit like the claws of a crown.

[0071] In principle, the holding device can be composed in any suitable way from a plurality of separate components of a so-called differential design. In the case of a particular variant that is particularly robust and manufactured with high precision, the base unit has a monolithic configuration. As an addition or an alternative thereto, the support film element can be formed monolithically with at least one (preferably all) of the holding units.

[0072] In principle, any suitable material can be used for the holding device or its components. This can be, for example, stainless steel, aluminum (Al), or beryllium (Be), individually or in any desired combination. Further suitable materials are aluminum alloys, in particular aluminum silicon (AlSi), beryllium alloys, in particular aluminum beryllium (AlBe), ceramic materials, in particular SiSiC, but also glass fiber reinforced plastics (GFRP) or carbon fiber reinforced plastics (CFRP).

[0073] As already described above, it is preferable to have as many holding units as possible, and the number thereof is limited by the available installation space according to the size of the optical element. Preferably, 6 or more, more preferably 9 or more, and even more preferably 18 to 36 holding units are provided. However, depending on the dimensions of the optical element or the available installation space, many more holding units can also be provided. Thus, in the case of a large optical element, it is preferable to have as many holding units as possible. The holding units can be provided in any distribution. Here, the number of holding units can be 120 or more. The holding units can be arranged in any distribution. In particular, the distribution can be adapted to the mass distribution of the optical element and / or the expected load direction (especially of the impact load). In a particular variant, the holding units are arranged in a substantially uniform distribution along the circumferential direction. In particular, this allows for situations where the load can occur in any direction to be taken into account.

[0074] According to a second aspect, the present invention relates to an arrangement configuration of a microlithography imaging apparatus, particularly for using light in the extreme ultraviolet (EUV) region, the arrangement configuration comprising a holding device for holding an optical element. The optical element includes an optical surface and defines a main extension plane, and the radial direction and the circumferential direction are defined in the main extension plane. The holding device includes a base unit and a plurality of separate holding units, particularly four or more separate holding units. The base unit includes a plurality of support boundary units spaced apart from each other in the circumferential direction for connecting the holding device to a support structure. The holding units are connected to the base unit and are arranged to be distributed along the circumferential direction and spaced apart from each other. The holding units are configured to hold the optical element with respect to the base unit, and each holding unit includes a holding boundary unit for connection to the optical element. For each of the support boundary units, a first stiffness in a first direction, particularly a first direction perpendicular to the main extension plane, is defined with respect to each holding boundary unit of each holding unit. The base unit includes at least one support film element, and the holding units are arranged on at least one support film element, particularly on the front side of at least one support film element facing the optical element. For at least one support boundary unit, preferably for all support boundary units, and for a group of holding units including 80% or more, preferably 90%, more preferably 95% to 100% of the holding units, the Difference first stiffness between the holding units of the group of holding units is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum first stiffness of the holding units of the group of holding units, and at least a part of the holding device including at least one support film element is configured. Generally, the Difference stiffness between the holding units of the group of holding units is desirably less than 1% of the minimum stiffness of the holding units of the group of holding units.

[0075] As already described above, as a result of arranging each holding unit on the support film element, it is further possible to set the rigidity of the holding device between the optical unit side force application point of each holding unit (in the optical element) and the support structure side force application point of each support boundary unit (of the support structure) by the design of the support film element and / or the method of connecting the support film element to the support boundary unit. Therefore, as can be advantageously achieved thereby, in particular, this rigidity in each degree of freedom is maximally equalized among a plurality of holding units (preferably all holding units). The higher the degree of this equalization in a particular degree of freedom (thus, the smaller the difference in rigidity between individual holding units in this degree of freedom, or the narrower the distribution of this rigidity among the holding units), the higher the uniformity of the impact load distributed among the holding units in each degree of freedom. Ideally, it is even possible to obtain at least substantially the same rigidity for all holding units with respect to the support structure side force application point in each degree of freedom. In this case, the impact load in each degree of freedom is substantially evenly distributed among all holding units.

[0076] This distribution of rigidity between the holding units according to the second aspect is understood to be optionally combined, in particular, with the features and variants (or combinations of features) described above with respect to the first aspect of the present invention. In particular, the same advantages as described above for each feature can be achieved. Therefore, please refer clearly to the above description.

[0077] The present invention also relates to an optical imaging apparatus, particularly for microlithography, comprising an illumination device including a first group of optical elements, an object device for accommodating an object, a projection device having a second group of optical elements, and an image device, wherein the illumination device is configured to illuminate the object and the projection device is configured to project an image of the object onto the image device. The illumination device and / or the projection device includes at least one arrangement configuration according to the present invention. Thus, the above-described variants and advantages can be realized to the same extent, so please refer to the above description in this regard.

[0078] The present invention further relates to a method of supporting a microlithography optical element, particularly for use with light in the extreme ultraviolet (EUV) range, the method comprising holding an optical element (109) that includes an optical surface and defines a main extension plane, the main extension plane defining a radial direction and a circumferential direction, by a holding device. Here, the optical element is held with respect to a base unit of the holding device by a plurality of separate holding units of the holding device, particularly four or more separate holding units, the holding units being distributed along the circumferential direction and arranged so as to be spaced apart from each other. The base unit is connected to a support structure by a plurality of support boundary units spaced apart from each other in the circumferential direction. Here, at least one support film element of the base unit extends mainly along the circumferential direction and the radial direction, and the at least one support film element has a thickness dimension transverse to the circumferential direction and the radial direction. The holding units are arranged on the front side of at least one of the support film elements facing the optical element. Thus, the deformation modes and advantages described above with respect to the first aspect can be realized to the same extent, and reference is made to the above description in this regard.

[0079] The present invention further relates to a method of supporting a microlithography optical element, particularly for use with light in the extreme ultraviolet (EUV) range, the method comprising holding an optical element (109) that includes an optical surface and defines a main extension plane, and defines a radial direction and a circumferential direction in the main extension plane, by a holding device. Here, the optical element is held with respect to a base unit of the holding device by a plurality of separate holding units of the holding device, particularly four or more separate holding units, and the holding units are distributed along the circumferential direction and arranged so as to be spaced apart from each other. The base unit is connected to a support structure by a plurality of support boundary units spaced apart from each other in the circumferential direction. Each holding unit includes a holding boundary unit connected to the optical element. For each of the support boundary units, a first rigidity in a first direction, particularly a first direction perpendicular to the main extension plane, is defined for each holding boundary unit of each holding unit. The holding units are arranged on at least one support film element of the base unit, particularly on the front side of the at least one support film element facing the optical element. For at least one support boundary unit, preferably for all support boundary units, and for a group of holding units including 80% or more, preferably 90%, more preferably 95% to 100% of the holding units, the Difference first rigidity between the holding units of the group of holding units is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum first rigidity of the holding units of the group of holding units, and at least a part of the holding device including at least one support film element is configured accordingly. Thus, the deformation modes and advantages described above with respect to the second aspect can be realized to the same extent, and reference is made to the above description in this regard.

[0080] Considering a stress-free or defined assembly (where generation of parasitic stress in the optical element is at least mainly avoided), the method is particularly advantageous when each connection between the three holding units of the holding device and the optical element is established in a first step such that the optical element is spatially fixed relative to the base unit. As a result, it is thus possible to first realize a fixation such as a conventional three-point support. Here, this can relate to three (first) holding units that are specifically designed for this initial mounting of the optical element and are different from the remaining holding units. In particular, these three (first) holding units can have a higher stiffness design than the remaining (second) holding units. Subsequently, each connection between the remaining (second) holding units of the holding device and the optical element is established in a second step following the first step. Here, in particular in the movement direction required for clamping, the remaining (second) holding units can have a significantly lower stiffness than the three (first) holding units, so that manufacturing errors can be compensated without generating significant restoring forces and thus parasitic stresses.

[0081] Further aspects and embodiments of the invention will be apparent from the following description of the preferred embodiments with reference to the dependent claims and the accompanying drawings. All combinations of the disclosed features are within the scope of the invention, regardless of whether they are the subject of the claims.

Brief Description of the Drawings

[0082]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Embodiments for Carrying Out the Invention

[0083] First Embodiment A preferred embodiment of the microlithography projection exposure apparatus 101 according to the present invention, which includes a preferred embodiment of the optical arrangement configuration according to the present invention, will be described below with reference to FIGS. 1 to 4. To simplify the following description, an xyz coordinate system is illustrated, and the z direction corresponds to the direction of gravity. Needless to say, it is possible to select any other desired orientation of the xyz coordinate system with other configurations as well.

[0084] FIG. 1 is a schematic non-scale diagram of a projection exposure apparatus 101 used in a microlithography process for manufacturing semiconductor components. The projection exposure apparatus 101 includes an illumination device 102 and a projection device 103. The projection device 103 is designed to transfer the image of the structure of the mask 104.1 disposed on the mask unit 104 to the substrate 105.1 disposed on the substrate unit 105 in the exposure process. For this purpose, the illumination device 102 illuminates the mask 104.1. The optical projection device 103 receives light from the mask 104.1 and projects the image of the mask structure of the mask 104.1 onto a substrate 105.1 such as a wafer.

[0085] The illumination device 102 includes an optical unit 106 including an optical element group 106.1. The projection device 103 includes another optical element unit 107 including an optical element group 107.1. The optical element groups 106.1 and 107.1 are arranged along the folded central ray path 101.1 of the projection exposure apparatus 101. Each of the optical element groups 106.1 and 107.1 may include a plurality of optical elements.

[0086] In a preferred embodiment, the projection exposure apparatus 101 operates with exposure light (extreme ultraviolet light) in the EUV region having a wavelength of 5 nm to 20 nm, particularly a wavelength of 13 nm. Therefore, the optical elements of the element groups 106.1 and 107.1 of the illumination apparatus 102 and the projection apparatus 103 are limited to reflective optical elements. The optical element groups 106.1 and 107.1 may include one or more optical arrangement configurations according to the present invention as described below based on the optical arrangement configuration 108. The optical units 106 and 107 are each supported by a support structure 101.2.

[0087] In still another configuration of the present invention, of course, any type of optical element (refractive, reflective, diffractive) can be used alone or in any desired combination for the remaining optical modules (particularly depending on the wavelength of the illumination light).

[0088] The optical arrangement configuration according to the present invention will be illustratively described below based on the arrangement configuration 108. FIG. 2 shows a schematic plan view of the front side of the arrangement configuration 108, and FIG. 3 shows a schematic cross-sectional view of a part of the arrangement configuration 108 (along line III-III in FIG. 2). FIG. 4 shows a schematic plan view of the back side of a part of the arrangement configuration 108 from FIG. 2.

[0089] As can be seen from FIG. 2 and particularly from FIG. 3 (showing the detail D in FIG. 2), in this example, the arrangement configuration 108 is an optical arrangement configuration and includes an optical element 109 in the form of a collector mirror of the illumination apparatus 102 and a holding device 110 for holding the optical element 109. Here, FIG. 2 shows a plan view of the front side of the holding device 110 (along the z direction) facing the optical element 109. The optical element 109 is shown by its dashed outer contour.

[0090] The optical element 109 includes a reflective optical surface 109.1 formed (in the conventional manner) on one side (front side) of the main body 109.2 of the optical element 109. The optical element 109 defines a main extension plane (parallel to the xy plane or the plane of the figure in FIG. 2), and defines a radial direction R and a circumferential direction U in the main extension plane.

[0091] In this example, the holding device 110 includes a base unit 110.1 and a separate holding unit 110.2. The holding unit 110.2 is connected to the base unit 110.1 and is arranged to be distributed along the circumferential direction U and spaced apart from each other. The holding unit 110.2 holds the optical element 109 in a predetermined position and orientation with respect to the base unit 110.1. In this example, each holding unit 110.2 establishes a clamping connection that is separate from other holding units 110.2 between the optical element 109 and the base unit 110.1. However, it should be understood that any other connection technique can be used between each holding unit 110.2 and the optical element 109 in other variations.

[0092] As already described, it is preferably that there are as many holding units 110.2 as possible, and the number is limited by the available installation space according to the size of the optical element 109. In this example, 18 holding units 110.2 are provided. However, different numbers can be provided in other variations. In particular, in certain variations, 6 or more, preferably 9 or more, and more preferably 18 to 36 holding units 110.2 can be provided.

[0093] In this example, the holding units 110.2 are evenly distributed and arranged at an angular interval of 20° each along the circumferential direction U. Thereby, regardless of the load direction of the load introduced into the optical element, such as an impact load, the attachment can always have substantially the same behavior, or a specific load direction that increases the risk of displacement of the optical element 109 due to the impact load can be eliminated.

[0094] However, in other deformation forms, it should also be understood that the holding unit 110.2 can be arranged at least partially in an uneven distribution as desired. In particular, the distribution of the holding unit 110.2 can be adapted to the mass distribution of the optical element 109 and / or the predicted acceleration of the arrangement configuration 108 and the resulting load direction in such cases. Since the holding unit 110.2 can receive a large load in a specific area, especially in the case of an asymmetric optical element 109, it is advantageous to have an asymmetric distribution with a higher density of the holding unit 110.2 (i.e., locally more holding units per circumferential angle) in those areas where a large load is predicted during operation.

[0095] Furthermore, the base unit 110.1 includes a plurality of support boundary units 110.3 spaced apart from each other in the circumferential direction U for connecting the holding device 110 to the support structure 102.1 of the lighting device 102. In this example, three support boundaries 110.3 are provided. However, it should be understood that in other deformation forms, any other (fewer or more) number of support boundaries 110.3 can be provided.

[0096] As can be seen from FIG. 3, the base unit 110.1 includes a support film element 110.4. The support film element 110.4 mainly extends along the circumferential direction U and the radial direction R and has a thickness dimension D in a direction transverse (more precisely, perpendicular in this example) to the circumferential direction U and the radial direction R. Here, the holding unit 110.2 is arranged on the front side of the support film element 110.4 facing the optical element 109.

[0097] As will be described in more detail below, further, by arranging the holding unit 110.2 on the support film element 110.4, the rigidity of the holding device 110 between the optical unit side force action point of each holding unit 110.2 (in the optical element 109) and the support structure side force action point of each support boundary unit 110.3 (in the support structure 102.1) can be set by the design of the support film element 110.4 and / or the method of connecting the support film element 110.4 to the support boundary unit 110.3.

[0098] Therefore, it is advantageous that this rigidity, particularly at a specific applicable degree of freedom, can be maximally equalized among a plurality of holding units 110.2, and most preferably this is the case for all holding units. The higher the equalization of the rigidity of a specific degree of freedom (thus, the smaller the difference in rigidity between individual holding units 110.2 of this degree of freedom, or the narrower the bandwidth of the distribution of this rigidity among holding units 110.2), the higher the uniformity of the impact load divided among holding units 110.2 at each degree of freedom. Ideally, it is even possible for all holding units 110.2 to obtain at least substantially the same rigidity with respect to the support structure side force action point at the support boundary unit 110.3 at each degree of freedom. In this case, the impact load at each degree of freedom is substantially evenly distributed among all holding units 110.2.

[0099] Therefore, the risk that the impact load expected in the most adverse case in a certain holding unit 110.2 exceeds the maximum achievable holding force of the holding unit can be reliably reduced without the need to increase the safety factor of the holding unit 110.2 and thus without increasing the size. Therefore, it is advantageous that the impact safety or reliability against system failures under impact loads can be enhanced even though the holding unit 110.2 has a relatively simple design. Therefore, the holding unit 110.2 can have a simpler and thus more space-saving design, which further facilitates increasing the number of holding units 110.2. Ultimately, this enables the realization of an advantageous large number of holding units 110.2 with the impact load evenly distributed among the holding units 110.2.

[0100] Yet another advantage of the support membrane element 110.4 is to separate the holding units 110.2 from each other with respect to the degree of freedom of inclination in which the support membrane element 110.4 has an axis of inclination. In particular, it is possible to achieve separation with respect to an axis of inclination extending parallel to the radial direction R. This is especially due to the fact that the support membrane element 110.4 can be deformed relatively easily by bulging. As a result (for example, in the case of deformation of the base unit 110.1), the holding units 110.2 can tilt relative to each other about these axes of inclination, and as a result, the introduction of deformation-induced parasitic stresses into the optical element 109 via the holding units 110.2 is reduced.

[0101] In this example, the support membrane element 110.4 is designed particularly simply, like a thin-walled ring-shaped disk. However, it should be understood that in other embodiments, it is not necessary to use a ring-shaped circumferential membrane. Instead, a plurality of individual support membrane elements 110.4 configured, for example, like ring segments, may be provided.

[0102] It should be further understood that in other embodiments, the support membrane element 110.4 can also be configured like a thin-walled hollow frustum. Similarly, in other embodiments, the support membrane element 110.4 can have another suitable design and arrangement to obtain the above-mentioned function of separating and equalizing rigidity between the individual holding units 110.2. As an example, any winding and / or folding configuration of the support membrane element 110.4 can be realized (in a cross-section extending perpendicular to the circumferential direction U) in order to set the rigidity or compliance of the holding device 110 of (one or more) specific degrees of freedom as desired. Thus, the cross-sectional contour of the support membrane element 110.4 can have at least a partially straight and / or partially polygonal and / or partially curved path. Of course, as in the case of this example, it results in a particularly simple design in the case of a straight path of the cross-sectional contour.

[0103] In the design of the support film element 110.4 as a ring-shaped disk, the support film element 110.4 extends in a cross-section perpendicular to the radial direction R and the circumferential direction U, parallel to the radial direction R, and thus at an inclination of 0° with respect to the radial direction R, because this provides a particularly good fit to the geometric conditions of the optical element 109 and the holding unit 110.2 in this example. In this case, this enables, in particular, a suitable narrow-band stiffness distribution between the holding units 110.2 in the degree of freedom perpendicular to the main extension plane of the optical element 109 (i.e., along the z-direction in this example).

[0104] However, in order to obtain a matched configuration of the optical element 109 and the holding device 110 (especially the holding unit 110.2), the arrangement of the support film element 110.4 can be made different in other embodiments, so that it should be understood that a desired separation and / or equalization of stiffness can be obtained for the individual holding units 110.2. Preferably, each support film element 110.2 extends with a cross-section perpendicular to the radial direction R and the circumferential direction U, and is inclined to extend at an angle of 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction. Thereby, depending on the usage example, it is also possible to obtain a suitable narrow-band stiffness distribution between the holding units 110.2 in a specific degree of freedom, especially in the degree of freedom perpendicular to the main extension plane of the optical element 109.

[0105] In this example, the support film element 110.4 has an inner part 110.5 and an outer part 110.6 spaced apart therefrom in the radial direction R, and an intermediate part 110.7 is positioned between the inner part 110.5 and the outer part 110.6, and the holding unit 110.2 is connected to the support film element 110.4 in the region of the intermediate part. Thereby, the possibility (of stiffness separation and / or equalization) of the support film element 110.4 can be particularly fully exploited.

[0106] In this example, in the region of the outer part 110.6, the support film element 110.4 is connected to a circumferential outer ring structure 110.8 extending in the circumferential direction, while in the region of the inner part 110.5, the support film element 110.4 is connected to a circumferential thin-walled inner ring structure 110.9 extending in the circumferential direction U.

[0107] In this example, both the outer ring structure 110.8 and the inner ring structure 110.9 are arranged on the back side of the support film element 110.4, which is opposite to the front side of the support film element 110.4. Therefore, both the outer ring structure 110.8 and the inner ring structure 110.9 consequently face the side opposite to the optical element 109. However, it should be understood that in other embodiments, the outer ring structure 110.8 and / or the inner ring structure 110.9 can protrude completely or partially in the direction of the optical element 109 beyond the support film element 110.4.

[0108] Here, the position in the radial direction R where the holding unit 110.2 is connected to the support film element 110.4 affects the separation obtained by the support film structure 110.4 and the rigidity between the holding unit 110.2 and each support boundary unit 110.3. The closer this connection point of the holding unit 110.2 approaches one of the auxiliary rigid ring structures 110.8, 110.9, the smaller the separation degree or the larger the value of this rigidity. Therefore, generally (i.e., for any configuration), if the distance of this connection point of the holding unit 110.2 from the auxiliary rigid structure (for example, one of the ring structures 110.8, 110.9) is maximized, a particularly high separation degree is achieved. In this example, this can be achieved by arranging the connection point of each holding unit 110.2 in the central region of the support film element 110.4 (in the radial direction R), that is, approximately in the center between the auxiliary rigid ring structures 110.8, 110.9. From this, it is clear that the position of the connection point of the holding unit 110.2 is a further parameter that can set the rigidity distribution between the holding units 110.2.

[0109] In addition to increasing the rigidity of the holding device 110 as desired, the advantages of the inner and outer ring structures 110.9, 110.8 respectively are that a further adaptation of the rigidity distribution between the holding units 110.2 is possible relatively simply and flexibly by the design of the above ring structures and / or their connection to the support film element 110.4.

[0110] In this example, the holding unit 110.2 protrudes from the base unit 110.1 substantially perpendicular to the main extension plane of the base unit 110.1. Thereby, a coronal design is obtained, and the holding unit 110.2 protrudes from the ring-shaped base unit 110.1 like the claws of a crown.

[0111] Here, by forming the support boundary unit 110.3 in the outer ring structure 110.8, a particularly simple connection of the holding device 110 to the outer support structure 102.1 is realized by the outer ring structure 110.8. However, it will be understood that in other variants, at least some of the support boundary units 110.3 may be formed in the inner ring structure 110.9. In particular, it is also possible to form all of the support boundary units 110.3 in the inner ring structure 110.9.

[0112] In a particular variant, the support boundary units 110.3 can be evenly distributed along the perimeter of the holding device 110. However, in this example, since the support boundary units 110.3 are distributed at irregular intervals along the circumferential direction U because, for example, they are predetermined by the optical element 109 of the imaging device 101 and / or adjacent components, the compatibility regarding the rigidity distribution is particularly well reflected.

[0113] In order to obtain a good narrow-band distribution of rigidity (with respect to the support boundary units 110.3) between the holding units 110.2, in this example, web elements 110.10 are provided, which are arranged in pairs 110.11 and interconnect the outer ring structure 110.8 and the inner ring structure 110.9 (see particularly FIG. 4). Here, gaps 110.12 are respectively formed between the web elements 110.10 and the support film elements 110.4 in the direction of the thickness dimension D of the support film elements 110.4.

[0114] Here, the force flow between each support boundary unit 110.3 and each holding unit 110.2 (only schematically shown in FIG. 4) can be preferably directed and distributed by the arrangement and / or design of each web element 110.10. As a result, it is also possible to affect or set the rigidity of each holding unit 110.2 with respect to each support boundary unit 110.3.

[0115] Here, the gap 110.12 ensures that the separability of the support film element 110.4 is not restricted or is subject to a defined influence as required. Therefore, the gap can extend over 50% or more, preferably 70% or more, and more preferably 90% to 100% of the length of the web element 110.10 between the outer ring structure 110.8 and the inner ring structure 110.9. Of course, in this case, the region without the gap 110.12 (i.e., where the web element 110.10 contacts the support film element 110.4) restricts the deformability of this region of the support film element 110.4. As a result, such a region has the effect of increasing rigidity.

[0116] In this example, three pairs 110.11 of web elements 110.10 assigned to each other are provided. However, it should be understood that, in principle, any number of pairs 110.11 of web elements 110.10 can be provided according to the desired rigidity distribution.

[0117] In this example, the two web elements 110.10 of each pair 110.11 are adjacent to each other in the circumferential direction U and engage with the inner ring structure 110.9. Thereby, the force flow, and thus the rigidity distribution, can be set particularly preferably. Further, the two web elements 110.10 of each pair 110.11 also engage with the outer ring structure 110.8 adjacent to each other. Therefore, the web elements 110.10 of different pairs 110.11 do not cross each other. However, in other deformation modes, it should be understood that the web elements 110.10 of different pairs 110.11 can cross each other as required, and of course, additional stiffening of the holding device 110 can be obtained thereby.

[0118] Depending on the stiffness distribution between the holding units 110.2 to be obtained, the arrangement or distribution of the web elements 110.10 over the entire circumference of the holding device 110 can be implemented in any suitable form. In a preferred variant such as in this example, the two web elements 110.10 of each pair 110.11 engage with the outer ring structure 110.8 between two support boundary units 110.3 adjacent to each other in the circumferential direction U. Thereby, a particularly suitable distribution or setting of the stiffness of the force flow to be obtained between the support boundary unit 110.3 and the holding unit 110.2, thus (in one or more degrees of freedom) becomes possible.

[0119] In this example, the longitudinal axes 110.13 of the two web elements 110.10 of each pair 110.11 extend in the same straight line with respect to each other. However, in other variants, in order to obtain a desired stiffness distribution between the holding units 110.2, the web elements 110.10 of each pair 110.11 may be inclined and aligned with respect to each other. Preferably, the longitudinal axes 110.13 of the two web elements 110.10 extend inclined with respect to each other by 10° or less, preferably 5° or less, and more preferably 2° or less in the plan view of the main extension plane (Figure 4).

[0120] In the plan view of the main extension plane, the two longitudinal axes 110.13 of the pair 110.11 further extend at least substantially parallel to the connecting line 110.14, which connects two support boundary units 110.3 adjacent to each other in the circumferential direction U in the outer ring structure 110.8, and the web elements 110.10 of each pair 110.11 engage between the two support boundary units. Here, as already described above, the connecting line 110.14 between the two support boundary units 110.3 is defined by the connection between the acting points of the support forces (of the support structure 102.2 of the imaging device 101) obtained at each support boundary unit 110.3. As a result, it is possible to obtain a particularly suitable distribution of the force flow between the support boundary unit 110.3 and the holding unit 110.2, and thus a suitable narrow-band stiffness distribution (in one or more degrees of freedom) between the holding units 110.2 becomes possible.

[0121] However, it should be understood that in other deformation forms, the two longitudinal axes 110.13 of each pair 110.11 can also extend while being inclined with respect to each other. However, preferably, the two longitudinal axes 110.13 of each pair 110.11 extend while being inclined at 30° or less, preferably 10° or less, and more preferably 2° or less with respect to each other.

[0122] In this example, the support film element 110.4 is a thin-walled element whose thickness dimension D is significantly (usually by one digit or more) smaller than the dimensions in the other two spatial directions. In this example, the support film element 110.4 has a cross-section perpendicular to the circumferential direction U, defines the width dimension B of the support film element 110.4, and the thickness dimension D of the support film element is 2% to 30%, preferably 5% to 25%, and more preferably 10% to 20% of the width dimension B of the support film element 110.4. Thereby, particularly suitable characteristics regarding the narrow-band rigidity distribution to be obtained between the holding units 110.2 can be obtained.

[0123] Here, the thickness dimension D of the support film element 110.2 can vary along the circumferential direction U. In particular, the thickness dimension D can vary according to the angular distance to the nearest support boundary unit 110.3 along the circumferential direction U. Here, the thickness dimension D can increase as the angular distance to the nearest support boundary unit 110.3 increases. Due to such a change in the thickness dimension D, in any case, it is possible to finely set the deformation characteristics of the support film element 110.4, and thus (either alone or together with other measures described herein) to obtain the desired narrow-band rigidity distribution between the holding units 110.2. As an addition or an alternative thereto, for this purpose, it is of course also possible to change the thickness dimension D of the support film element 110.4 along the radial direction R. Here, the thickness dimension D can vary particularly according to the rigidity profile of the support film element desired to be achieved in the radial direction.

[0124] Furthermore, in certain deformation configurations, the support film element 110.4 can have at least one through-opening in at least one region, particularly in each region between two directly adjacent holding units 110.2, positioned circumferentially U between two directly adjacent holding units 110.2 as shown by the dashed contour 113 in FIG. 4. In this way, correspondingly, options are obtained that further affect the deformation characteristics of the support film element 110.4 and also the narrow-band stiffness distribution between the holding units 110.2. In this case, it is possible to particularly accurately affect the stiffness by the size and / or position and / or shape of each through-opening 113.

[0125] As can be seen particularly from FIG. 3, each holding unit 110.2 of this example has a first clamping element 110.15 (in this case the outer clamping element in the radial direction R) and a second clamping element 110.16 (in this case the inner clamping element in the radial direction R). Here, the first clamping element 110.15 can be connected to the base unit 110.1 via a first connection portion 110.17 as shown by the dashed contour 110.17 in FIG. 3. However, there may also be no first connection portion 110.17, and the first clamping element 110.15 may not be directly connected to the base unit 110.1. In any case, the second clamping element 110.16 is connected to the base unit 110.1 via a second connection portion 110.18.

[0126] For the purpose of establishing a clamping connection to the optical element 109, the first clamping element 110.15 and the second clamping element 110.16 are clamped against each other by a tensioning element 111 in the form of a tensioning screw. Here, the relevant boundary portion 109.3 of the optical element 109 is clamped between the first clamping element 110.15 and the second clamping element 110.16 of each holding unit 110.2, respectively.

[0127] However, in other deformation forms, the clamp connection between each holding unit 110.2 and the optical element 109 can also have a different design. Therefore, when the clamp element 110.15 or 110.16 is pressed against the relevant contact surface on the boundary portion 109.3 of the optical element 109 by a suitable tension device (for example, the connection portions 110.17 or 110.18 under appropriate pretension in the radial direction R) to obtain the frictional engagement of the clamp connection, the frictional engagement required for the clamp can also be realized by a single clamp element 110.15 or 110.16 per holding unit 110.2 if appropriate. In that case, the contact forces acting on the optical element 109 in the assembled state cancel each other out at least partially but at least overall, and corresponding reaction forces can be applied by one or more adjacent holding units 110.2 so that the specified position and orientation of the optical element 109 can be obtained.

[0128] In this example, the tension element 111 is designed like a tie rod. The tension element 111 extends into the recess 109.4 of the boundary portion 109.3 with a play, and as a result, a particularly uniform distribution of the clamping force is obtained. The play between the tension element 111 and the boundary portion 109.3 of the region of the recess 109.4 avoids the contact between the tension element 111 and the boundary portion 109.3 that could otherwise lead to parasitic stresses in the optical element 109.

[0129] Therefore, here, perpendicular to the radial direction R, there is only the frictional engagement of the clamp connection precisely defined by the pretension of the tension element 111 between the contact surfaces of the clamp elements 110.15, 110.16 and the relevant contact surface of the boundary portion 109.3. This is advantageous because the holding force obtained from the clamp, and thus the contact force on the clamp surface, can be set with relatively high precision by the pretension of the tension element 111.

[0130] The tension element 111 is passed through the passage opening of the outer first clamp element 110.16 and the recess 109.9. In this example, the tension element 111 includes a threaded portion 111.1, which is screwed into the corresponding threaded hole of the inner second clamp element 110.16 for tightening. On the other hand, the screw head 111.2 of the tension element 111 rests on the outer first clamp element 110.16.

[0131] In this example, a compensation spring device 111.3 is provided between the screw head 111.2 and the first clamp element 110.16, and the compensation spring device is configured to reduce the loss of the tension force of the tension element 111. In principle, this compensation spring device 111.3 can be designed in any suitable way. For this purpose, in this example, the compensation spring device 111.3 is simply designed like a disc spring or a disc spring packet. However, any other suitable compensation spring device can also be used.

[0132] As shown in FIG. 3, the first connection portion 110.17 can be connected to the second connection portion 110.18. This is advantageous when the connection portions 110.17 and 110.18 of the two clamp elements 110.15 and 110.16 limit the rotational freedom about an axis extending substantially parallel to the longitudinal axis of the threaded portion 111.1. Thereby, it can be ensured in a simple way that each of the connection portions 110.17 and 110.18 absorbs at least most of the tightening torque of the screw connection so that there is no or only very little parasitic stress introduced into the optical element at this point.

[0133] For this purpose, as in this example, each of the connection portions 110.17 and 110.18 can be configured in a leaf spring manner, and the leaf spring extends substantially in a plane perpendicular to the radial direction R in this example. Thereby, a particularly simple and compact configuration is obtained. Furthermore, as a result, each of the connection portions 110.17 and 110.18 has compliance in the radial direction R. In particular, this is advantageous when the thermal expansion coefficients of the optical element 109 and the holding device 110 are different. In that case, due to this radial compliance, good thermal deformation separation can be obtained between the optical element 109 and the holding device 110.

[0134] The first clamping part 110.17 and the second clamping part 119.18 extend substantially parallel to each other, resulting in a design that is particularly easy to manufacture and assemble. Furthermore, this configuration is advantageous from a dynamic perspective because it has advantageous rigidity in the degrees of freedom parallel to the plane of each connecting part 110.17, 110.18.

[0135] In the case of wavy deformation due to gravity of the holding device 110 (between the support boundary units 110.3 to which the support structure 102.1 is connected), in any case, there may be an inclination of the holding unit 110.2 with respect to each other around an inclination axis parallel to the radial direction R. In this case, due to the rigidity of the connecting part 110.18 resulting in a change in the distance between adjacent clamping elements 110.16, parasitic stresses are introduced into the optical element 109. Since the support film element 110.4 can absorb the generated restraint forces by elastic deformation in the form of local bulges, the connection of the connecting part 110.18 to the support film element 110.4 can significantly reduce these parasitic stresses.

[0136] In yet another deformation mode, when the first connecting part 110.17 is similarly configured as a linear leaf spring extending parallel to the second connecting part 110.18, a parallel guide can be realized by the first connecting part 110.17 and the second connecting part 110.18. Here, a slightly modified design in which both leaf springs are coupled to the support film element 110.4 is advantageous in that case. In that case, the clamping elements 110.15, 110.16 that are clamped against each other are thereby guided substantially parallel to the radial direction R. Thus, in the remaining degrees of freedom, it is possible to obtain the above-mentioned radial compliance (for thermal deformation separation) while still having a dynamically advantageous high rigidity.

[0137] In this example, each boundary part 109.3 of the optical element 109 is formed as a protrusion 109.5 that extends circumferentially (in the circumferential direction U) in a ring shape on the back side (opposite to the optical surface 109.1) of the optical element 109. Here, the protrusion 109.5 extends in the circumferential direction U and in a direction perpendicular to the main extension plane of the optical element 109 (i.e., the plane defined by the circumferential direction U and the radial direction R).

[0138] In this example, all the boundary portions 109.3 are formed in a common protruding portion 109.5. However, in other variants, the protruding portion 109.5 may be interrupted in the circumferential direction U, so that the boundary portions 109.3 may be provided individually or in groups in separate circumferential segments of the protruding portion 109.5, respectively.

[0139] In this example, since each boundary portion 109.3 is formed by a boundary element 109.6 that connects to the optical element 109 in the region of the protruding portion 109.5, a design that can be realized particularly easily and with high precision is obtained. The boundary element 109.6 is configured as a connection bush having a collar 109.7, and is inserted into a recess 109.8 of the protruding portion 109.5 of the optical element 109 and attached thereto in a suitable manner (for example, by material connection such as adhesive bonding, soldering, etc.).

[0140] Since the connection bush 109.6 forms contact surfaces for the clamping elements 110.15, 110.16, this configuration is particularly easy to manufacture. It is substantially easier to provide these contact surfaces for the clamping elements 110.15, 110.16 at the ends of the connection bush 109.6 rather than at the protruding portion 109.5. Therefore, it is only necessary to form a radial recess 109.8 in the protruding portion 109.5 that allows the connection bush 109.6 to be attached with a sufficiently high precision and relatively easily.

[0141] However, it should be understood that in other variants, each boundary portion 109.3 can also be formed directly on the body 109.2 of the optical element 109, particularly on the protruding portion 109.5.

[0142] The boundary portion 109.3 and the holding unit 110.2 can be combinable with each other as desired. That is, a specific pairing may not be defined between the boundary portion 109.3 and the holding unit 110.2 (therefore, for example, the optical element 109 and the base unit 110.1 having the holding unit 110.2 can be rotated arbitrarily relative to each other along the circumferential direction U).

[0143] However, in other variants, such a specific pair can be defined by appropriately different designs and / or arrangements of the components of the boundary part 109.3 and the holding unit 110.2. In this case, the boundary part 109.3 can be configured to be combinable with one (first) holding unit 110.2 but not combinable with another (second) holding unit 110.2.

[0144] Regarding stress-free or defined assembly (where the generation of parasitic stress in the optical element 109 is at least generally avoided), it is particularly advantageous if each clamping connection between the three holding units 110.2 of the holding device 110 and the optical element 109 is established first in a first step during assembly such that the optical element is spatially fixed relative to the base unit 110.1. Thus, a fixation like the conventional three-point support can be achieved as a result first.

[0145] This can be achieved by three (first) holding units 110.2 that are specifically designed for this initial attachment of the optical element 109 and are different from the remaining holding units 110.2. In this example, these can be holding units 110.2 at three positions 112.1, 112.2, and 112.3 (see Figure 2) that are each rotated 120° circumferentially relative to each other. In particular, these three (first) holding units 110.2 can have a substantially higher rigidity design than the remaining (second) holding units 110.2.

[0146] In that case, each clamping connection between the remaining (second) holding units 110.2 of the holding device 110 and the optical element 109 is established in a second step following the first step of the assembly. The remaining (second) holding units 110.2 can have a significantly lower rigidity than the three (first) holding units 110.2 in the movement direction required for clamping (i.e., in the radial direction R in this example), so that manufacturing errors can be compensated without generating significant restoring forces and thus parasitic stress.

[0147] In this example, the inner clamping element 110.16 of each holding unit 110.2 represents a holding boundary unit for connecting the optical element 109 in the sense of the present disclosure. For each holding unit 110.2, a first rigidity S1 in a first direction (i.e., the z - direction in this example) perpendicular to the main extension plane of the optical element 109 and a second rigidity S2 around an axis parallel to the radial direction R are defined for this holding boundary unit 110.16 with respect to each of the support boundary units 110.3.

[0148] By adapting the presented influence parameters, for all support boundary units 110.3 and for a (first) group of holding units 110.2 including more than 80%, preferably more than 90%, and even more preferably 95% - 100% of the holding units 110.2, the Difference first rigidity S1 between the holding units 110.2 of this (first) group of holding units 110.2 of the holding units 110.2 is such that it is 900% or less, preferably 100% or less, and even more preferably 10% - 1% of the minimum first rigidity S1 of the holding units 110.2 of this (first) group of holding units 110.2 (i.e., the minimum value of the first rigidity S1 between the holding units 110.2 of this (first) group of holding units 110.2). The holding device 110, in particular its base unit 110.1 and in particular the part including at least one support film element 110.4, is configured in this way. Thus, a particularly suitable narrow - band rigidity distribution in the first direction (i.e., perpendicular to the main extension plane of the optical element 109) is advantageously obtained.

[0149] In principle, it will be understood that it may be sufficient to adapt the rigidity distribution between the holding units 110.2 in this way for a single degree of freedom, in particular for any applicable degree of freedom, in particular for the degree of freedom where a main impact load is expected. Preferably, such adaptation is also carried out for further degrees of freedom. Similarly, it is of course possible to carry out the adaptation with only one or more other degrees of freedom.

[0150] In this example, such adaptation is preferably also carried out with respect to the second stiffness S2. For this purpose, for all support boundary units 110.3 and for this further (second) group of holding units 110.2 of the holding unit 110.2, including more than 80%, preferably more than 90%, more preferably 95% - 100% of another (second) group of holding units 110.2, the second stiffness S2 between the holding units 110.2 of this further (second) group of holding units 110.2 Difference is such that it is 900% or less, preferably 100% or less, more preferably 10% - 1% of the minimum second stiffness S2 of the holding units 110.2 of this further (second) group of holding units 110.2. The holding device 110, in particular the base unit 110.1 and in particular the part including at least one support film element 110.4, is configured. It will be understood that the first and second groups of holding units 110.2 may be the same. However, these may be different for one or more holding units 110.2.

[0151] In principle, the optical element 109 can be manufactured from any suitable material in a single - part or multi - part form. Preferably, the optical element 109 is such that at least the region of the protrusion 109.5 is manufactured from a ceramic material containing in particular SiSiC and / or from a material containing Zerodur and / or from a lens material. In the above - mentioned deformed form having the boundary element 109.6, it is preferable that the boundary element can be manufactured from a material containing invar and / or stainless steel and / or molybdenum.

[0152] In principle, the holding device 110 can be configured in any suitable way from a plurality of separate components in a so - called differential configuration. In this example, as a result of the base unit 110.1 being in a monolithic configuration with the support film element 110.4 and all holding units 110.2, a particularly robust and highly precisely manufactured design is obtained.

[0153] In principle, any suitable material can be used for the holding device 110 or its components. This can be, for example, stainless steel, aluminum (Al), or beryllium (Be), either individually or in any desired combination. Further suitable materials are aluminum alloys, especially aluminum silicon (AlSi), beryllium alloys, especially aluminum beryllium (AlBe), ceramic materials, especially SiSiC, but also glass fiber reinforced plastics (GFRP) or carbon fiber reinforced plastics (CFRP).

[0154] Using the design described above, it is possible to carry out the method according to the present invention described above. Therefore, in this regard, reference is made to the above description to avoid repetition.

[0155] Second Embodiment Still another preferred embodiment of the arrangement configuration 208 according to the present invention that can be used instead of the arrangement configuration 108 of the imaging device 101 will be described below with reference to FIGS. 1, 2, and 5 to 7. Since the basic design and functionality of the arrangement configuration 208 correspond to the arrangement configuration 108 of FIGS. 2 to 4, only the differences will be described here. In particular, the same reference numerals are provided for the same components, and reference numerals obtained by adding 100 to the values are provided for similar components. Unless otherwise specified below, reference is made to the above description of the first embodiment regarding the features, functions, and advantages of these components.

[0156] The difference from the design of the first embodiment lies substantially in the design of the base unit 210. In this example, the support film element 210.4 is connected to a circumferential support ring structure 210.21 that extends in the circumferential direction U on the back side opposite to its front side (or the optical element 109). Here, three support boundary units 110.3 are also formed in the support ring structure 210.21 in this case. Here too, in certain deformations, an even distribution of the support boundary units 110.3 can be provided over the circumference of the base unit 210. However, in this example, since the advantages of the design with the support film element 210.4 are particularly well reflected, the support boundary units 110.3 are also distributed at irregular intervals along the circumferential direction in this case.

[0157] In this example, the support film element 210.4 is connected to the support ring structure 210.21. Therefore, there is no gap (similar to the gap 110.12) between the support ring structure 210.21 and the support film element 210.4. However, in other variants, it should be understood that such a gap (similar to the gap 110.12) can also be provided at least partially as described above in relation to the web element 110.11 of the first embodiment in order to at least partially release the deformability of the support film structure 210.4 in this region.

[0158] Also in the design of this example, the force flow between the support boundary unit 110.3 and the individual holding units 210.2, and thus the stiffness distribution between the holding units 210.2, can be set by the design and / or path of the support ring structure 210.21. For this purpose, in this example, each distance of the support ring structure 210.21 from the inner part 210.5 (especially the inner edge 210.22) of the support film element 210.4 changes along the circumferential direction U between the support boundary units 110.3 adjacent to each other in the circumferential direction.

[0159] In this example, the support ring structure 210.21 connects the support boundary units 110.3 adjacent to each other in the circumferential direction essentially along the shortest path without protruding radially inward beyond the inner edge 201.22 of the support film element 210.4. In this way, a particularly favorable force flow distribution can be obtained.

[0160] It will be understood that a combination of the support film element 210.4 and the support ring structure 210.21 is in principle sufficient as the holding device 210. However, in this example, the support ring structure is connected on the back side opposite to the support film element 210.4 to a thin supplementary stiffening film element 210.23 that mainly extends along the circumferential direction U and the radial direction R. As a result, the stiffness of the entire holding device 210 can be advantageously increased, and in particular, a favorable high resonance frequency of the holding device 210 can be obtained.

[0161] Here, in principle, the stiffening film element 210.23 can be designed in any suitable way to obtain the desired stiffening effect. In this example, this has substantially the same structure as the support film element. Therefore, the stiffening film element 210.23 is also configured like a thin-walled ring-shaped disk having a cross-sectional contour that extends substantially parallel to the radial direction R in the cross-section shown in FIG. 5. Regarding the design and arrangement of the stiffening film element 210.23 as well, the above description regarding the support film element 110.4 or 210.4 applies in principle, so please refer to it in this regard.

[0162] Even with these designs, in principle, the holding unit 210.2 can be configured in any suitable form for holding the optical element 109. In this example, the holding unit 210.2 is connected to the support film element 210.4 via the separation part 210.24. Thereby, it is easily ensured that the limitation of the deformation ability of the support film element 210.4 by the rear support ring structure 210.21 is compensated by this separation part 210.24. Here, in principle, the separation via the separation part 210.24 can be of any design and can be matched to one or more required degrees of freedom for which separation is necessary. In this example, since the separation part 210.24 is configured as a narrow web, the separation part 210.24 releases the degree of freedom of inclination around an inclined axis parallel to the radial direction R.

[0163] As can be seen from FIGS. 6 and 7, in particular, the difference between the holding unit 210.2 and the holding unit of the first embodiment is that compliance of the holding element 210.2 in the radial direction R occurs due to the inner clamping element 110.16 being held by the leaf spring element 210.18. The leaf spring element 210.18 is elongated along the circumferential direction U and extends (in the circumferential direction U) on both sides of the clamping element 110.16 in a plane perpendicular to the radial direction R. The leaf spring element 210.18 is connected to the base body 210.25 of the holding unit 210.2 at both its ends. Also in this case, the main body 210.25 is connected to the support film element 210.4 via the separation part 210.24.

[0164] As a result of this design of the holding unit 210.2, it is possible to obtain a configuration in which the size in the direction perpendicular to the main extension plane of the optical element 109 is small. Thereby, it becomes possible to save the installation space in the direction perpendicular to the main extension plane of the optical element 109 (here, the z - direction), or to increase the dimensions of the support ring structure 210.21 in this direction, and as a result, the rigidity of the base unit 210.1 can be significantly improved. This is advantageous especially from the dynamic point of view regarding the resonance frequency of the holding device 210.

[0165] This design also enables the above - described method according to the present invention to be realized in the same way, so reference is made to the above description in this regard.

[0166] It should be particularly understood that the adaptation of the rigidity distribution between the holding units 210.2 can be achieved to the same extent as described above for the first and second rigidities and / or for any other single or multiple degrees of freedom, particularly any applicable degrees of freedom, particularly the degrees of freedom where a main impact load is expected. This can also be achieved, in particular, via the adaptation of the influencing parameters presented in the present disclosure, through the holding device 210, particularly its base unit 210.1 and particularly the part including the support film element 210.4.

[0167] The present invention has been described only based on examples from the field of microlithography. However, it should be understood that the present invention can also be used in connection with any other optical applications where similar problems occur with respect to the support of heavy optical units, particularly imaging methods at different wavelengths.

[0168] Furthermore, the present invention can be used in connection with the inspection of an object, for example, a so-called mask inspection for inspecting the integrity of a mask used in microlithography. In FIG. 1, for example, a sensor unit that detects the imaging of the projection pattern of the mask 104.1 (for further processing) serves as the substrate 105.1 at this time. This mask inspection can be performed at substantially the same wavelength as that used in the subsequent microlithography process. However, it is also equally possible to use any desired wavelength deviating from that wavelength for the inspection.

[0169] Finally, the present invention has been described based on specific embodiments showing specific combinations of features defined in the appended claims. It is particularly pointed out here that the subject matter of the present invention is not limited to these combinations of features, but all other combinations of features as will be apparent from the appended claims also belong to the subject matter of the present invention.

Claims

1. An arrangement configuration of a microlithography imaging apparatus for using light, particularly in the extreme ultraviolet (EUV) region, a holding device (110; 210) for holding an optical element (109) is provided, and the optical element (109) includes an optical surface (109.1) and defines a main extension plane, and the radial direction and the circumferential direction are defined in the main extension plane, the holding device (110; 210) includes a base unit (110.1; 210.1) and a plurality of separate holding units (110.2; 210.2), particularly four or more separate holding units (110.2; 210.2), the base unit (110.1; 210.1) includes a plurality of support boundary units (110.3) spaced apart from each other in the circumferential direction for connecting the holding device (110; 210) to a support structure (102.1), the holding units (110.2; 210.2) are connected to the base unit (110.1; 210.1), are distributed along the circumferential direction, and are arranged to be spaced apart from each other, and in an arrangement configuration in which the holding units (110.2; 210.2) are configured to hold the optical element (109) with respect to the base unit (110.1; 210.1), the base unit includes at least one support film element (110.4; 210.4), the at least one support film element (110.4; 210.4) mainly extends along the circumferential direction and the radial direction, the at least one support film element (110.4; 210.4) has a thickness dimension transverse to the circumferential direction and the radial direction, and the holding units (110.2; 210.2) are arranged on the front side of the at least one support film element (110.4; 210.4) facing the optical element (109), the at least one support film element (110.4; 210.4) has an inner portion (110.5; 210.5) and an outer portion (110.6) spaced apart therefrom in the radial direction, particularly, the at least one support film element (110.4; 210.4) has an intermediate portion (110.7) between the inner portion (110.5; 210.5) and the outer portion (110.6), and / or At least one, preferably a plurality, in particular all of the holding units (110.2; 210.2) are arranged such that they are connected in the radial direction between the inner part (110.5; 210.5) and the outer part (110.6) to the at least one support film element (110.4; 210.4).

2. In the arrangement according to claim 1, the at least one support film element (110.4; 210.4) is configured like a thin-walled ring-shaped disk or like a thin-walled hollow frustum, and / or the at least one support film element (110.4; 210.4) has a cross-section extending perpendicular to the radial direction and the circumferential direction, and is inclined by 10° or less, preferably 5° or less, more preferably 2° or less in the radial direction, and / or the at least one support film element (110.4; 210.4) has an arrangement extending at least substantially parallel to the radial direction.

3. In the arrangement according to claim 1, the at least one support film element (110.4) is connected in the region of the outer part (110.6) to a circumferentially extending circumferential outer ring structure (110.8), and the outer ring structure (110.8) is arranged, in particular, on the back side of the at least one support film element (110.4) opposite to the front side of the at least one support film element (110.4), and / or the at least one support film element (110.4) is connected in the region of the inner part (110.5) to a circumferentially extending circumferential inner ring structure (110.9), in particular a thin-walled inner ring structure (110.9), and the inner ring structure (110.9) is arranged, in particular, on the back side of the at least one support film element (110.4; 210.4) opposite to the front side of the at least one support film element (110.4; 210.4), in particular at least some, in particular three, of the support boundary units (110.3) are formed in the outer ring structure (110.8) or the inner ring structure, and the support boundary units (110.3) are arranged, in particular, at irregular intervals along the circumferential direction.

4. In the arrangement according to claim 3, At least one web element (110.10) interconnecting the outer ring structure (110.8) and the inner ring structure (110.9) is provided, and a gap is formed between the at least one web element (110.10) and the at least one support film element (110.4; 210.4) in the direction of the thickness dimension, in particular, The gap extends over 50% or more, preferably 70% or more, more preferably 90% to 100% of the length of the web element (110.10) between the outer ring structure (110.8) and the inner ring structure (110.9). **Claim 5** In the arrangement according to claim 4, At least one pair (110.11) of web elements (110.10) assigned to each other is provided, in particular, three pairs (110.11) of web elements (110.10) assigned to each other are provided, and the two web elements (110.10) of the at least one pair (110.11) engage with the inner ring structure (110.9) adjacent to each other in the circumferential direction, in particular, The two web elements (110.10) of the at least one pair (110.11) engage with the outer ring structure (110.8) adjacent to each other in the circumferential direction, and / or The two web elements (110.10) of the at least one pair (110.11) engage with the outer ring structure (110.8) between two adjacent support boundary units (110.3) in the circumferential direction, and / or The two web elements (110.10) of the at least one pair (110.11) each define a longitudinal axis, and the two longitudinal axes extend inclined to each other by 10° or less, preferably 5° or less, more preferably 2° or less, particularly 0° in the plan view of the main extension plane, and / or The two web elements (110.10) of the at least one pair (110.11) each define a longitudinal axis, and at least one of the two longitudinal axes, preferably each of the two longitudinal axes, extends inclined by 30° or less, preferably 10° or less, more preferably 2° or less with respect to the connection line connecting two support boundary units (110.3) of the outer ring structure (110.8) adjacent to each other in the circumferential direction in the plan view of the main extension plane, and each web element (110.11) is arranged to engage between the two support boundary units (110.3). **Claim 6** In the arrangement according to claim 1, The at least one support film element (210.4) is connected on its back side, opposite to its front side, to a circumferentially extending circumferential support ring structure (210.21), The support boundary units (110.3), in particular three support boundary units (110.3), are formed in the support ring structure (210.21), and the support boundary units (110.3) are distributed at irregular intervals, in particular along the circumferential direction, the distance of the support ring structure (210.21) from the inner part (210.5) of the at least one support film element (110.4; 210.4), in particular from the inner edge (210.22), varies along the circumferential direction between at least two, in particular all, support boundary units (110.3) adjacent to each other in the circumferential direction, and / or the support ring structure (210.21) is arranged to connect at least two, in particular all, support boundary units (110.3) adjacent to each other in the circumferential direction along a substantially shortest path without protruding radially inwards beyond the inner edge (210.22) of the at least one support film element (210.4).

7. In the arrangement according to claim 6, the support ring structure (210.21) is connected on the back side, opposite to the support film element (210.4), to at least one stiffening film element (210.23) extending mainly along the circumferential and radial directions, in particular, the at least one stiffening film element (210.23) is configured like a thin-walled ring-shaped disk or like a thin-walled hollow frustum, and / or the at least one stiffening film element (210.23) extends with a cross-section extending perpendicular to the radial and circumferential directions and is inclined by 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction, and / or the at least one stiffening film element (210.23) is arranged to extend at least substantially parallel to the radial direction.

8. In the arrangement according to claim 6 or 7, at least one of two holding units (110.2; 210.2) positioned directly adjacent to each other in the circumferential direction, in particular each of the holding units (110.2; 210.2), is connected to the at least one support film element (210.4) via a separation part (210.24), in particular, the separation part (210.24) is arranged to release the degree of freedom of inclination around an inclination axis parallel to the radial direction.

9. In the arrangement according to any one of claims 1 to 8, In a cross-section perpendicular to the circumferential direction, the width dimension of the at least one support film element (110.4; 210.4) is defined, and the thickness dimension of the at least one support film element (110.4; 210.4) is 2% to 30%, preferably 5% to 25%, more preferably 10% to 20% of the width dimension of the at least one support film element (110.4; 210.4), and / or the thickness dimension of the at least one support film element (110.4; 210.4) varies along the circumferential direction, and the thickness dimension varies in particular according to the angular distance to the nearest support boundary unit (110.3) along the circumferential direction, and the thickness dimension increases in particular with an increase in the angular distance to the nearest support boundary unit (110.3), and / or the thickness dimension of the at least one support film element (110.4; 210.4) varies along the radial direction, and the thickness dimension varies in particular according to a predetermined rigidity profile of the support film element in the radial direction, and / or the at least one support film element (110.4; 210.4) has an arrangement configuration having at least one through-opening (113) in at least one region positioned between two directly adjacent holding units (110.2; 210.2) in the circumferential direction, in particular in each region between two directly adjacent holding units (110.2; 210.2). [

10. ] In the arrangement configuration according to any one of claims 1 to 9, each holding unit (110.2; 210.2) includes a holding boundary unit (110.16) for connecting the optical element (109), a first rigidity in a first direction perpendicular to the main extension plane and a second rigidity around an axis parallel to the radial direction are defined for each holding boundary unit (110.16) of each holding unit (110.2; 210.2) with respect to each support boundary unit (110.3). For at least one support boundary unit (110.3), preferably for all support boundary units (110.3), and for a group of holding units including 80% or more, preferably 90% or more, more preferably 95% to 100% of the holding units (110.2; 210.2), the difference in the first rigidity between the holding units (110.2; 210.2) of the group of holding units is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum first rigidity of the holding units (110.2; 210.2) of the group of holding units, the holding device (110; 210), in particular the base unit (110.1; 210.1), and in particular the at least one support film element (110.4; 210.4) are configured, in particular, For at least one support boundary unit (110.3), preferably for all support boundary units (110.3), and for another group of holding units including 80% or more, preferably 90%, more preferably 95% to 100% of the holding units (110.2; 210.2), the difference in the second rigidity between the holding units (110.2; 210.2) of the other group of holding units is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum second rigidity of the holding units (110.2; 210.2) of the other group of holding units, the holding device (110; 210), in particular the base unit (110.1; 210.1), and in particular the at least one support film element (110.4; 210.4) are configured in an arrangement configuration. [

11. ] In the arrangement configuration according to any one of claims 1 to 10, Each holding unit (110.2; 210.2) is configured to establish a clamping connection separate from other holding units (110.2; 210.1) between the optical element (109) and the base unit (110.1; 210.1), in particular, At least one, preferably each, of the holding units (110.2; 210.2) includes a holding boundary unit for connection to the optical element, and the holding boundary unit particularly includes a first clamping element (110.15) and a second clamping element (110.16). The first clamping element (110.15) and the second clamping element (110.16) are tightened against each other to establish the clamping connection, and the holding boundary portion (109.3) of the optical element (109) is clamped between the first clamping element (110.15) and the second clamping element (110.16).

12. In the arrangement according to claim 11, the first clamping element (110.15) and the second clamping element (110.16) are tightened against each other by a tension element (111) to establish the clamping connection, and in particular, the tension element (111) extends into the recess (109.4) of the holding boundary portion (109.3), particularly extends into the recess (109.4) with play, and / or an arrangement in which a compensation spring device (111.3) configured to reduce the loss of tension of the tension element (111) is provided.

13. In the arrangement according to any one of claims 1 to 12, each holding unit (110.2; 210.2) includes a holding boundary unit (110.15, 110.16) for connection to the optical element (109), and at least one of the holding boundary units (110.15, 110.16), particularly each of the holding boundary units (110.15, 110.16), is connected to the support film element (110.4; 210.4) via connection portions (110.17, 110.18; 210.18), and in particular, the connection portions (110.17, 110.18; 210.18) are configured to limit the rotational freedom about an axis extending substantially parallel to the radial direction, and / or the connection portions (110.17, 110.18; 210.18) are at least partially configured in a leaf spring manner, and / or the connection portions (110.17, 110.18; 210.18) are configured to have compliance in the radial direction, and / or the connection portions (110.17, 110.18; 210.18) at least partially extend in a plane substantially perpendicular to the radial direction, and / or The connecting portion (110.17, 110.18; 210.18) defines a longitudinal axis, and the longitudinal axis of the connecting portion (110.17, 110.18; 210.18) extends substantially perpendicular to the main extending plane or substantially parallel to the main extending plane.

14. In the arrangement according to any one of claims 1 to 13, At least one holding boundary portion (109.3) of the optical element (109) is formed by a protruding portion (109.5) of the optical element (109), in particular, a plurality of the holding boundary portions (109.3) are formed on a common protruding portion (109.5) of the optical element (109), and / or all the holding boundary portions (109.3) are formed on a ring-shaped protruding portion (109.5) of the optical element (109), and / or the protruding portion (109.5) of the optical element (109) extends in a circumferential direction and / or in a direction perpendicular to a plane defined by the circumferential direction and the radial direction.

15. In the arrangement according to any one of claims 1 to 13, At least one holding boundary portion (109.3) of the optical element (109) is formed by a holding boundary element (109.6) connected to the optical element (109), in particular, the holding boundary element (109.6) is inserted into a recess (109.8) of the optical element (109), in particular a recess (109.8) of the protruding portion (109.5) of the optical element (109), and / or the holding boundary element (109.6) includes a connection bush, in particular a connection bush having a collar (109.7).

16. In the arrangement according to claim 15, the optical element (109) is manufactured from a ceramic material containing at least the region of the protruding portion (109.5), in particular containing SiSiC, and / or from a material containing Zerodur and / or a lens material, and / or the boundary element (109.6) is manufactured from a material containing in particular invar and / or stainless steel and / or molybdenum.

17. In the arrangement according to claims 1 to 16, the optical surface (109.1) is a reflective optical surface, the optical surface (109.1) is arranged on the body (109.2) of the optical element (109), and The body (109.2) includes at least one protrusion (109.5) on the side opposite to the optical surface (109.1), and the protrusion (109.5) forms a boundary portion (109.3) with respect to at least one of the holding units (110.2; 210.2).

18. In the arrangement according to any one of claims 1 to 17, the base unit (110.1; 210.1) has an annular configuration, and / or the base unit (110.1; 210.1) defines a main extension plane of the base unit (110.1; 210.1), and at least one of the holding units (110.2; 210.2) protrudes from the base unit (110.1; 210.1) substantially perpendicular to the main extension plane of the base unit (110.1; 210.1), in particular, all the holding units (110.2; 210.2) protrude from the base unit (110.1; 210.1) substantially perpendicular to the main extension plane of the base unit (110.1; 210.1), and / or the base unit (110.1; 210.1) has a monolithic configuration, and / or the support film element (110.4; 210.4) is configured to be monolithic with at least one of the holding units (110.2; 210.2).

19. In the arrangement according to any one of claims 1 to 18, six or more, nine or more, more preferably 18 to 36 holding units (110.2; 210.2) are provided, and / or the holding units (110.2; 210.2) are arranged in a substantially uniform distribution along the circumferential direction.

20. An arrangement of a microlithography imaging apparatus, particularly for using light in the extreme ultraviolet (EUV) region, comprising a holding device (110; 210) for holding an optical element (109), the optical element (109) includes an optical surface (109.1) and defines a main extension plane, and the radial direction and the circumferential direction are defined in the main extension plane, the holding device (110; 210) includes a base unit (110.1; 210.1) and a plurality of separate holding units (110.2; 210.2), particularly four or more separate holding units (110.2; 210.2). The base unit (110.1; 210.1) includes a plurality of support boundary units (110.3) spaced apart from each other in the circumferential direction for connecting the holding device (110; 210) to the support structure (102.1). The holding units (110.2; 210.2) are connected to the base unit (110.1; 210.1), are distributed along the circumferential direction and are arranged to be spaced apart from each other, and the holding units (110.2; 210.2) are configured to hold the optical element (109) with respect to the base unit (110.1; 110.2). Each holding unit (110.2; 210.2) includes a holding boundary unit (110.16) for connection to the optical element (109). For each of the support boundary units (110.3), a first rigidity in a first direction, particularly a first direction perpendicular to the main extension plane, is defined with respect to each holding boundary unit (110.16) of each holding unit (110.2; 210.2) in the arrangement configuration. The base unit (110.1; 210.1) includes at least one support film element (110.4; 210.4). The holding units (110.2; 210.2) are arranged on the at least one support film element (110.4; 210.4), particularly on the front side of the at least one support film element (110.4; 210.4) facing the optical element (109), and For at least one support boundary unit (110.3), preferably for all support boundary units (110.3), and for the holding unit group including more than 80%, preferably 90%, more preferably 95% to 100% of the holding units (110.2; 210.2) of the holding unit group, the difference in the first rigidity between the holding units (110.2; 210.2) of the holding unit group is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum first rigidity of the holding units (110.2; 210.2) of the holding unit group, at least a part of the holding device (110; 210) including the at least one support film element (110.4; 210.4) is configured. The at least one support film element (110.4; 210.4) has an inner part (110.5; 210.5) and an outer part (110.6) radially spaced therefrom, particularly The at least one support film element (110.4; 210.4) has an intermediate portion (110.7) between the inner portion (110.5; 210.5) and the outer portion (110.6), and / or At least one, preferably a plurality, in particular all of the holding units (110.2; 210.2) of the holding unit (110.2; 210.2) are connected to the at least one support film element (110.4; 210.4) radially between the inner portion (110.5; 210.5) and the outer portion (110.6), characterized by an arrangement configuration.

21. In the arrangement configuration according to claim 20, For each of the support boundary units (110.3), a second rigidity about an axis parallel to the radial direction is defined for each holding boundary unit (110.16) of each holding unit (110.2; 210.2), and For at least one support boundary unit (110.3), preferably for all support boundary units (110.3), and for a further separate holding unit group including more than 80%, preferably more than 90%, more preferably 95% to 100% of the holding units (110.2; 210.2) of the further separate holding unit group, the difference in the second rigidity between the holding units (110.2; 210.2) is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum second rigidity of the holding units (110.2; 210.2) of the holding unit group, and a part of the holding device (110; 210) including the at least one support film element (110.4; 210.4) is configured in an arrangement configuration.

22. In the arrangement configuration according to claim 20 or 21, The at least one support film element (110.4; 210.4) mainly extends along the circumferential direction and the radial direction, the at least one support film element (110.4; 210.4) has a thickness dimension transverse to the circumferential direction and the radial direction, and / or The at least one support film element (110.4; 210.4) is configured like a thin-walled ring-shaped disk or like a thin-walled hollow frustum, and / or The at least one support film element (110.4; 210.4) extends in a cross-section perpendicular to the radial direction and the circumferential direction, and is inclined by 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction, and / or The at least one support film element (110.4; 210.4) has an arrangement extending at least substantially parallel to the radial direction.

23. In the arrangement according to claim 20, the at least one support film element (110.4) is connected, in the region of the outer part (110.6), to a circumferential outer ring structure (110.8) extending in the circumferential direction, and the outer ring structure (110.8) is arranged, in particular, on the back side of the at least one support film element (110.4) opposite to the front side of the at least one support film element (110.4), and / or the at least one support film element (110.4) is connected, in the region of the inner part (110.5), to a circumferential inner ring structure (110.9), in particular a thin-walled inner ring structure (110.9), extending in the circumferential direction, and the inner ring structure (110.9) is arranged, in particular, on the back side of the at least one support film element (110.4; 210.4) opposite to the front side of the at least one support film element (110.4; 210.4), in particular, at least some, in particular three, support boundary units (110.3) of the support boundary unit (110.3) are formed in the outer ring structure (110.8) or the inner ring structure, and the support boundary units (110.3) are arranged, in particular, at irregular intervals along the circumferential direction.

24. In the arrangement according to claim 23, at least one web element (110.10) interconnecting the outer ring structure (110.8) and the inner ring structure (110.9) is provided, and a gap is formed between the at least one web element (110.10) and the at least one support film element (110.4; 210.4) in the direction of the thickness dimension, in particular, the gap extends over 50% or more, preferably 70% or more, more preferably 90% - 100% of the length of the web element (110.10) between the outer ring structure (110.8) and the inner ring structure (110.9).

25. In the arrangement according to claim 24, At least one pair (110.11) of web elements (110.10) are assigned to each other, in particular, three pairs (110.11) of web elements (110.10) are assigned to each other. The two web elements (110.10) of the at least one pair (110.11) engage with the inner ring structure (110.9) adjacent to each other in the circumferential direction, in particular, the two web elements (110.10) of the at least one pair (110.11) engage with the outer ring structure (110.8) adjacent to each other in the circumferential direction, and / or the two web elements (110.10) of the at least one pair (110.11) engage with the outer ring structure (110.8) between two support boundary units (110.3) adjacent to each other in the circumferential direction, and / or the two web elements (110.10) of the at least one pair (110.11) respectively define longitudinal axes, and the two longitudinal axes extend inclined to each other by 10° or less, preferably 5° or less, more preferably 2° or less, particularly 0° in the plan view of the main extension plane, and / or the two web elements (110.10) of the at least one pair (110.11) respectively define longitudinal axes, and at least one of the two longitudinal axes, preferably each of the two longitudinal axes, extends inclined by 30° or less, preferably 10° or less, more preferably 2° or less with respect to the connecting line connecting the two support boundary units (110.3) of the outer ring structure (110.8) adjacent to each other in the circumferential direction in the plan view of the main extension plane. Each web element (110.11) is arranged to engage between the two support boundary units (110.3).

26. In the arrangement according to claim 20, the at least one support film element (210.4) is connected on the back side opposite to its front side to a circumferential support ring structure (210.21) extending in the circumferential direction, the support boundary units (110.3), in particular three support boundary units (110.3), are formed on the support ring structure (210.21), and the support boundary units (110.3) are distributed at irregular intervals along the circumferential direction in particular, The distance of the support ring structure (210.21) from the inner part (210.5) of the at least one support film element (110.4; 210.4), in particular from the inner edge (210.22), varies along the circumferential direction between at least two, in particular all, circumferentially adjacent support boundary units (110.3), and / or The support ring structure (210.21) is arranged to connect at least two, in particular all, circumferentially adjacent support boundary units (110.3) along an essentially shortest path without protruding radially inwards beyond the inner edge (210.22) of the at least one support film element (210.4). **Claim 27** In the arrangement according to claim 26, The support ring structure (210.21) is connected to at least one stiffening film element (210.23) which mainly extends along the circumferential and radial directions on the back side opposite to the support film element (210.4), in particular, The at least one stiffening film element (210.23) is configured like a thin-walled ring-shaped disk or like a thin-walled hollow frustum, and / or The at least one stiffening film element (210.23) extends with a cross-section extending perpendicular to the radial and circumferential directions and is inclined to extend at an angle of 10° or less, preferably 5° or less, more preferably 2° or less with respect to the radial direction, and / or The at least one stiffening film element (210.23) is arranged to extend at least substantially parallel to the radial direction. **Claim 28** In the arrangement according to claim 26 or 27, At least one of two holding units (110.2; 210.2) positioned directly adjacent in the circumferential direction, in particular each of the holding units (110.2; 210.2), is connected to the at least one support film element (210.4) via a separation part (210.24), in particular, The separation part (210.24) is arranged to release the degree of freedom of inclination around an inclination axis parallel to the radial direction. **Claim 29** In the arrangement according to any one of claims 20 to 28, In a cross-section perpendicular to the circumferential direction, the width dimension of the at least one support film element (110.4; 210.4) is defined, and the thickness dimension of the at least one support film element (110.4; 210.4) is 2% to 30%, preferably 5% to 25%, more preferably 10% to 20% of the width dimension of the at least one support film element (110.4; 210.4), and / or The thickness dimension of the at least one support film element (110.4; 210.4) varies along the circumferential direction, and the thickness dimension varies in particular according to the angular distance to the nearest support boundary unit (110.3) along the circumferential direction. The thickness dimension increases in particular with an increase in the angular distance to the nearest support boundary unit (110.3), and / or The thickness dimension of the at least one support film element (110.4; 210.4) varies along the radial direction, and the thickness dimension varies in particular according to a predetermined rigidity profile of the support film element in the radial direction, and / or The at least one support film element (110.4; 210.4) has an arrangement configuration having at least one through opening (113) in at least one region positioned between two directly adjacent holding units (110.2; 210.2) in the circumferential direction, in particular in each region between two directly adjacent holding units (110.2; 210.2).

30. In the arrangement according to any one of claims 20 to 29, Each holding unit (110.2; 210.2) is configured to establish a clamping connection separate from other holding units (110.2; 210.1) between the optical element (109) and the base unit (110.1; 210.1), in particular At least one, preferably each, of the holding units (110.2; 210.2) includes a holding boundary unit for connection to the optical element. The holding boundary unit particularly includes a first clamping element (110.15) and a second clamping element (110.16). The first clamping element (110.15) and the second clamping element (110.16) are tightened against each other to establish the clamping connection, and a holding boundary portion (109.3) of the optical element (109) is clamped between the first clamping element (110.15) and the second clamping element (110.16).

31. In the arrangement according to claim 30, The first clamping element (110.15) and the second clamping element (110.16) are tightened against each other by a tension element (111) to establish the clamping connection, in particular The tension element (111) extends into a recess (109.4) of the holding boundary portion (109.3), in particular extends into the recess (109.4) with play, and / or An arrangement configuration in which a compensation spring device (111.3) configured to reduce the tension loss of the tension element (111) is provided.

32. In the arrangement configuration according to any one of claims 20 to 31, each holding unit (110.2; 210.2) includes holding boundary units (110.15, 110.16) for connection to the optical element (109), and at least one of the holding boundary units (110.15, 110.16), in particular each of the holding boundary units (110.15, 110.16), is connected to the support film element (110.4; 210.4) via connection parts (110.17, 110.18; 210.18), and in particular, the connection parts (110.17, 110.18; 210.18) are configured to limit the rotational freedom about an axis extending substantially parallel to the radial direction, and / or the connection parts (110.17, 110.18; 210.18) are at least partially configured in a leaf spring manner, and / or the connection parts (110.17, 110.18; 210.18) are configured to have compliance in the radial direction, and / or the connection parts (110.17, 110.18; 210.18) at least partially extend in a plane substantially perpendicular to the radial direction, and / or the connection parts (110.17, 110.18; 210.18) define a longitudinal axis, and the longitudinal axis of the connection parts (110.17, 110.18; 210.18) extends substantially perpendicular to the main extension plane or substantially parallel to the main extension plane.

33. In the arrangement configuration according to any one of claims 20 to 32, at least one holding boundary part (109.3) of the optical element (109) is formed by a protrusion (109.5) of the optical element (109), and in particular, a plurality of the holding boundary parts (109.3) are formed on a common protrusion (109.5) of the optical element (109), and / or all the holding boundary parts (109.3) are formed on a ring-shaped protrusion (109.5) of the optical element (109), and / or the protrusion (109.5) of the optical element (109) extends in a direction perpendicular to the plane defined by the circumferential direction and / or the circumferential direction and the radial direction.

34. In the arrangement configuration according to any one of claims 20 to 32, At least one holding boundary portion (109.3) of the optical element (109) is formed by a holding boundary element (109.6) connected to the optical element (109), in particular, the holding boundary element (109.6) is inserted into a recess (109.8) of the optical element (109), in particular a recess (109.8) of a protrusion (109.5) of the optical element (109), and / or the holding boundary element (109.6) includes an arrangement including a connection bush, in particular a connection bush having a collar (109.7).

35. In the arrangement according to claim 34, the optical element (109) is manufactured from a ceramic material containing at least SiSiC in the region of at least the protrusion (109.5), and / or is manufactured from a material containing Zerodur and / or a lens material, and / or the boundary element (109.6) is an arrangement manufactured from a material containing in particular Invar and / or stainless steel and / or molybdenum.

36. In the arrangement according to claims 20 to 35, the optical surface (109.1) is a reflective optical surface, the optical surface (109.1) is arranged on the body (109.2) of the optical element (109), and the body (109.2) includes at least one protrusion (109.5) on the side opposite to the optical surface (109.1), and the protrusion (109.5) forms a boundary portion (109.3) with respect to at least one of the holding units (110.2; 210.2).

37. In the arrangement according to any one of claims 20 to 36, the base unit (110.1; 210.1) has an annular configuration, and / or the base unit (110.1; 210.1) defines a main extension plane of the base unit (110.1; 210.1), and at least one of the holding units (110.2; 210.2) protrudes from the base unit (110.1; 210.1) substantially perpendicular to the main extension plane of the base unit (110.1; 210.1), in particular, all the holding units (110.2; 210.2) protrude from the base unit (110.1; 210.1) substantially perpendicular to the main extension plane of the base unit (110.1; 210.1), and / or the base unit (110.1; 210.1) has a monolithic configuration, and / or The support film element (110.4; 210.4) has an arrangement configuration that is monolithic with at least one of the holding units (110.2; 210.2).

38. In the arrangement configuration according to any one of claims 20 to 37, Six or more, nine or more, more preferably 18 to 36 holding units (110.2; 210.2) are provided, and / or The holding units (110.2; 210.2) are arranged in a substantially uniform distribution along the circumferential direction.

39. An optical imaging device, particularly a microlithography optical imaging device, comprising: An illumination device (102) including a first optical element group (106); An object device (104) for accommodating an object (104.1); A projection device (103) including a second optical element group (107); An image device (105) And the illumination device (102) is configured to illuminate the object (104.1), and In the optical imaging device, the projection device (103) is configured to project an image of the object (103.1) onto the image device (105), The illumination device (102) and / or the projection device (103) is an optical imaging device including at least one of the optical arrangement configurations (108) according to any one of claims 1 to 38.

40. A method for supporting a microlithography optical element (109), particularly for using light in the extreme ultraviolet (EUV) region, comprising: The optical element (109) including an optical surface and defining a main extension plane, and defining a radial direction and a circumferential direction in the main extension plane is held by a holding device (110; 210), The optical element (109) is held with respect to the base unit (110.1; 210.1) of the holding device (110; 210) by a plurality of separate holding units (110.2; 210.2) of the holding device (110; 210), particularly four or more separate holding units (110.2; 210.2), and the holding units are distributed along the circumferential direction and arranged to be spaced apart from each other, In the method, the base unit is connected to a support structure by a plurality of support boundary units (110.3) spaced apart from each other in the circumferential direction, At least one support film element (110.4; 210.4) of the base unit extends mainly along the circumferential direction and the radial direction, and the at least one support film element (110.4; 210.4) has a thickness dimension transverse to the circumferential direction and the radial direction, and The holding unit (110.2; 210.2) is arranged on the front side facing the optical element (109) of the at least one support film element (110.4; 210.4), The at least one support film element (110.4; 210.4) has an inner part (110.5; 210.5) and an outer part (110.6) spaced radially therefrom, in particular, The at least one support film element (110.4; 210.4) has an intermediate part (110.7) between the inner part (110.5; 210.5) and the outer part (110.6), and / or At least one, preferably a plurality, in particular all of the holding units (110.2; 210.2) of the holding unit (110.2; 210.2) are connected to the at least one support film element (110.4; 210.4) between the inner part (110.5; 210.5) and the outer part (110.6) in the radial direction. A method characterized by this.

41. A method for supporting a microlithography optical element (109), particularly for using light in the extreme UV (EUV) region, The optical element (109) including an optical surface and defining a main extension plane, and defining a radial direction and a circumferential direction in the main extension plane, is held by a holding device (110; 210), The optical element (109) is held with respect to the base unit (110.1; 210.1) of the holding device (110; 210) by a plurality of separate holding units (110.2; 210.2) of the holding device (110; 210), particularly four or more separate holding units (110.2; 210.2), and the holding units are distributed along the circumferential direction and arranged to be spaced apart from each other, The base unit is connected to the support structure by a plurality of support boundary units (110.3) spaced apart from each other in the circumferential direction, Each holding unit (110.2; 210.2) includes a holding boundary unit (110.16) connected to the optical element (109), In a method in which a first rigidity in a first direction perpendicular to the main extension plane is defined for each holding boundary unit (110.16) of each holding unit (110.2; 210.2) with respect to each of the support boundary units (110.3), The holding unit (110.2; 210.2) is disposed on at least one support film element (110.4; 210.4) of the base unit (110.1; 210.1), particularly on the front side of the at least one support film element (110.4; 210.4) facing the optical element (109), and for at least one support boundary unit (110.3), preferably for all support boundary units (110.3), and for the holding unit group including 80% or more, preferably 90%, more preferably 95% to 100% of the holding units (110.2; 210.2) of the holding unit group, the difference in the first rigidity between the holding units (110.2; 210.2) of the holding unit group is 900% or less, preferably 100% or less, more preferably 10% to 1% of the minimum first rigidity of the holding units (110.2; 210.2) of the holding unit group, at least a part of the holding device (110; 210) including the at least one support film element (110.4; 210.4) is configured such that the at least one support film element (110.4; 210.4) has an inner part (110.5; 210.5) and an outer part (110.6) spaced radially therefrom, particularly the at least one support film element (110.4; 210.4) has an intermediate part (110.7) between the inner part (110.5; 210.5) and the outer part (110.6), and / or at least one, preferably a plurality, particularly all of the holding units (110.2; 210.2) are connected to the at least one support film element (110.4; 210.4) between the inner part (110.5; 210.5) and the outer part (110.6) in the radial direction.

42. In the method according to claim 40 or 41, each connection between the three holding units (110.2; 210.2) of the holding device (110; 210) and the optical element (109) is established in a first step such that the optical element (109) is spatially fixed with respect to the base unit (110.1; 210.1). A method in which each connection between the remaining holding units (110.2; 210.2) of the holding device (110; 210) and the optical element (109) is established in a second step following the first step, respectively.

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