The purpose of the present invention is to provide: a
radiation-sensitive composition capable of forming a
resist film that can exhibit sensitivity and CDU at satisfactory levels when next-generation technology is applied and can suppress development defects; and a
pattern formation method. The purpose of the present invention is also to provide a
radiation-sensitive acid generator that can be applied to said
radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing: a
polymer (A) containing a
structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator (B) represented by formula (1); and a
solvent (C). (In formula (1): A is an (n1+n2+n3+1)-valent aromatic ring; R1 is a nitro group, a cyano group, a
hydroxy group, an amino group, or a monovalent
organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; n1 is an integer of 1-5; n2 is an integer of 1-5; n3 is an integer of 0-5; m2 is an integer of 1-3; L is a
single bond or an (m2+1)-valent linking group; Rf1 and Rf2 are each independently a
fluorine atom or a monovalent fluorinated
hydrocarbon group having 1-20 carbon atoms; Rf3 and Rf4 are each independently a
hydrogen atom, a
fluorine atom, a monovalent
hydrocarbon group having 1-20 carbon atoms, or a monovalent fluorinated
hydrocarbon group having 1-20 carbon atoms; when there are multiple Rf3s and multiple Rf4s, the multiple Rf3s and the multiple Rf4s may each be the same or different from one another; m1 is an integer of 0-10; and M+ is a monovalent
onium cation.