Drawing system, drawing method, and program

Abstract

To reduce a workload for a designer required for generation of a template.SOLUTION: A matching position determination part sets a temporary template region 951a which has the same size as a template corresponding to a temporary matching position 95a, and sets a check region 952a which is larger than an imaging visual field of an imaging part with the temporary template region 951a as a center. The matching position determination part confirms presence / absence of an overlapping region which indicates the same pattern as the temporary template region 951a in the check region 952a. If the overlapping region exists in the check region 952a, the matching position determination part repeats moving the temporary matching position 95a in a prescribed direction, resetting the temporary template region 951a and the check region 952a and confirming presence / absence of the overlapping region. On the other hand, if there is no overlapping region in the check region 952a, the matching position determination part determines the temporary matching position 95a as a matching position.SELECTED DRAWING: Figure 16

Description

Technical Field

[0001] The present invention relates to a technique for irradiating a substrate with light to draw a pattern.

Background Art

[0002] Conventionally, by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as "substrate"), pattern drawing has been performed. In such a drawing apparatus for performing such drawing, an alignment process is performed in which the position of an alignment mark provided on the substrate is detected and the pattern drawing position is automatically adjusted.

[0003] In recent years, in the drawing of printed circuit boards, in order to increase the number of pieces that can be collected from a single substrate, reduction of the space for arranging alignment marks has been demanded. Therefore, without providing a dedicated alignment mark on the substrate, a part of the pattern on the substrate is used as an alignment mark.

[0004] For example, in the exposure apparatus of Patent Document 1, in the image obtained by imaging the pattern on the substrate, a part of the pattern is set as a reference mark model (that is, a template) used for the alignment process and registered in advance. Then, when the substrate to be exposed is carried into the exposure apparatus, a part of the pattern on the substrate is imaged, and pattern matching is performed between the obtained image and the reference mark model, and the alignment process of the substrate is performed.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] By the way, in the exposure apparatus of Patent Document 1, in order to obtain a template for pattern matching, a substrate is placed at a predetermined position of the exposure apparatus, the pattern on the substrate is imaged, and a partial pattern to be a template is extracted from the obtained image. For this reason, the amount of work required for generating the template increases, and the working time also becomes long.

[0007] In addition, when a part of the pattern on the substrate is used as a template, it is necessary for the designer to select a part to be a template from the pattern. The part to be the template needs to be a part where there is no pattern identical or similar to the template in the surrounding area. Therefore, the amount of work of the designer when selecting the part to be the template also increases.

[0008] The present invention has been made in view of the above problems, and an object thereof is to reduce the amount of work of the designer required for generating a template.

Means for Solving the Problems

[0009] The invention according to claim 1 is a drawing system, comprising: a drawing device that irradiates a substrate with light to perform pattern drawing; and a data processing device that creates template generation information and sends it to the drawing device. The drawing device includes: a stage that holds the substrate on which a first pattern is previously provided on an upper surface; a drawing head that irradiates the upper surface of the substrate with modulated light; a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; an imaging unit that images a part of the first pattern; a position detection unit that detects the position of the substrate by performing pattern matching using a template on an imaging image acquired by the imaging unit; a storage unit that stores second CAD data, which is CAD data of a second pattern drawn on the first pattern; a data generation unit that rasterizes the second CAD data to generate second raster data; and a drawing control unit that controls the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, thereby causing the second pattern to be drawn on the substrate that relatively moves in the scanning direction with respect to the drawing head. The storage unit further stores the template generation information including coordinates indicating a matching position where pattern matching by the position detection unit is performed on the first pattern. The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template. The data processing device includes: an initial setting unit that sets a provisional matching position on the first pattern; sets a provisional template region having the same size as the template corresponding to the provisional matching position; sets a check region larger than the imaging field of view of the imaging unit centered on the provisional template region; checks for the presence of an overlapping region indicating the same pattern as the provisional template region in the check region; and if the overlapping region exists, repeatedly moves the provisional matching position in a predetermined direction, resets the provisional template region and the check region, and checks for the presence of the overlapping region. If the overlapping region does not exist,A matching position determination unit that determines the temporary matching position as the matching position, and an information creation unit that creates the template generation information including coordinates indicating the matching position determined by the matching position determination unit.

[0010] The invention according to claim 2 is the drawing system according to claim 1, wherein the moving direction of the temporary matching position by the matching position determination unit when the overlapping region exists is the scanning direction.

[0011] The invention according to claim 3 is the drawing system according to claim 1 or 2, wherein the initial setting unit sets a group of temporary matching positions in which a plurality of temporary matching position columns, each of which is a set of temporary matching positions arranged in the scanning direction, are arranged at equal intervals in the width direction perpendicular to the scanning direction, and the pitch in the width direction of the plurality of temporary matching position columns is set to be equal to or less than a predetermined value.

[0012] The invention according to claim 4 is the drawing system according to claim 1 or 2, wherein the initial setting unit sets a group of temporary matching positions in which a plurality of temporary matching position columns, each of which is a set of temporary matching positions arranged in the scanning direction, are arranged at equal intervals in the width direction perpendicular to the scanning direction, and the number of the plurality of temporary matching position columns is set to be a predetermined number.

[0013] The invention according to claim 5 is the drawing system according to any one of claims 1 to 4, wherein on the upper surface of the substrate, a plurality of partial drawing regions are arranged in a matrix in the scanning direction and the width direction perpendicular to the scanning direction, and the same pattern is drawn on each of them. The initial setting unit sets a temporary matching position in one of the plurality of partial drawing regions, the matching position determination unit determines a matching position in the one partial drawing region based on the temporary matching position, and in another partial drawing region among the plurality of partial drawing regions, the matching position is determined so that the relative position with respect to the other partial drawing region is the same as the relative position of the matching position with respect to the one partial drawing region.

[0014] The invention according to claim 6 is the drawing system according to any one of claims 1 to 4, wherein on the upper surface of the substrate, a plurality of partial drawing areas are set to be arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction, and in the partial drawing area on the one side in the scanning direction and on the one side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the one side in the scanning direction and on the one side in the width direction, and in the partial drawing area on the one side in the scanning direction and on the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the one side in the scanning direction and on the other side in the width direction, and in the partial drawing area on the other side in the scanning direction and on the one side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the other side in the scanning direction and on the one side in the width direction, and in the partial drawing area on the other side in the scanning direction and on the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the other side in the scanning direction and on the other side in the width direction.

[0015] The invention according to claim 7 is the drawing system according to any one of claims 1 to 6, wherein the data processing device clips partial data, which is CAD data corresponding to a predetermined area including the matching position among the first patterns, and sends the clipped partial data to the drawing device, and in the data generation unit of the drawing device, only the partial data is rasterized to create the intermediate data.

[0016] The invention according to claim 8 is the drawing system according to claim 7, wherein on the upper surface of the substrate, a plurality of partial drawing areas are set to be arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction, and the partial data corresponds to the partial drawing area including the matching position.

[0017] The invention according to claim 9 is the drawing system according to any one of claims 1 to 8, wherein the template generation information further includes coordinates indicating other matching positions determined by a designer.

[0018] The invention according to claim 10 is a drawing method for performing pattern drawing by irradiating a substrate with light, comprising: a) a step of holding a substrate having a first pattern previously provided on an upper surface thereof; b) a step of generating a template used for detecting the position of the substrate; c) a step of imaging a part of the first pattern; d) a step of detecting the position of the substrate by performing pattern matching on the captured image obtained in step c) using the template; e) a step of rasterizing second CAD data, which is CAD data of a second pattern to be drawn on the first pattern, to generate second raster data; f) a step of irradiating the upper surface of the substrate with modulated light based on the second raster data and the position of the substrate detected in step d), and a scanning mechanism for relatively moving the substrate in a scanning direction parallel to the upper surface of the substrate with respect to the drawing head, thereby controlling the drawing head to perform drawing of the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head. The step b) comprises: b1) a step of preparing template generation information including coordinates indicating a matching position where the pattern matching is performed on the first pattern; b2) a step of rasterizing the CAD data of the first pattern to create intermediate data, and generating, as the template, image data of a region having a predetermined size corresponding to the matching position from the intermediate data. The step b1) comprises: b3) a step of setting a provisional matching position on the first pattern; b4) setting a provisional template region having the same size as the template corresponding to the provisional matching position, setting a check region larger than the imaging field of view in step c) centered on the provisional template region, checking for the presence of an overlapping region showing the same pattern as the provisional template region in the check region, and if the overlapping region exists, repeatedly moving the provisional matching position in a predetermined direction to reset the provisional template region and the check region and check for the presence of the overlapping region, and if the overlapping region does not exist, determining the provisional matching position as the matching position; b5) a step of creating the template generation information including coordinates indicating the matching position determined in step b4).

[0019] The invention according to claim 11 is a program executed in a drawing system that irradiates a substrate with light to draw a pattern. The drawing system includes a drawing device that irradiates the substrate with light to draw a pattern, and a data processing device that creates template generation information and sends it to the drawing device. The drawing device includes a stage that holds a substrate on which a first pattern is previously provided on an upper surface, a drawing head that irradiates the upper surface of the substrate with modulated light, a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate, an imaging unit that images a part of the first pattern, a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit, a storage unit that stores second CAD data, which is CAD data of a second pattern drawn on the first pattern, a data generation unit that rasterizes the second CAD data to generate second raster data, and a drawing control unit that controls the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit to execute drawing of the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head. When the program is executed by a computer, g) a step of setting a provisional matching position on the first pattern; h) setting a provisional template area having the same size as the template corresponding to the provisional matching position, setting a check area larger than the imaging field of view of the imaging unit with the provisional template area as the center, checking for the presence or absence of an overlapping area showing the same pattern as the provisional template area in the check area, and if the overlapping area exists, repeatedly moving the provisional matching position in a predetermined direction to reset the provisional template area and the check area and check for the presence or absence of the overlapping area, and if the overlapping area does not exist, the provisional matching position is On the first pattern, the pattern matching is performedA step of determining a matching position and a step of creating the template generation information including coordinates indicating the matching position determined in the step h) are executed in the data processing apparatus. A step of rasterizing the CAD data of the first pattern to create intermediate data and generating, from the intermediate data, image data of a region of a predetermined size corresponding to the matching position as the template is executed in the data generation unit of the drawing apparatus.

Advantages of the Invention

[0020] In the present invention, the workload of an operator required for generating a template can be reduced.

Brief Description of the Drawings

[0021]

Figure 1

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Mode for Carrying Out the Invention

[0022] FIG. 1 is a perspective view showing a drawing system 5 according to an embodiment of the present invention. The drawing system 5 includes a drawing device 1 and a data processing device 6. The drawing device 1 is a direct drawing device that irradiates a photosensitive material on a substrate 9 with spatially modulated substantially beam-shaped light and scans the irradiation area of the light on the substrate 9 to draw a pattern. The data processing device 6 is a device that performs preprocessing and the like of data used for drawing in the drawing device 1. The data processing device 6 is, for example, a normal computer, but is conceptually drawn as a substantially rectangular parallelepiped in FIG. 1. In FIG. 1, three directions orthogonal to each other are shown as the X direction, the Y direction, and the Z direction by arrows. In the example shown in FIG. 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same applies to other figures.

[0023] FIG. 2 is a plan view showing the main surface on the (+Z) side of the substrate 9 (hereinafter also referred to as the "upper surface 90"). The substrate 9 is, for example, a plate-like member having a substantially rectangular shape in plan view. The substrate 9 is, for example, a multilayer printed wiring board (hereinafter simply referred to as a "printed board"). In the present embodiment, a circuit pattern formed of copper (Cu) or the like is previously formed on the upper surface 90 of the substrate 9, and a resist film formed of a photosensitive material is provided on the circuit pattern. Then, in the drawing apparatus 1, a solder pattern is drawn (i.e., formed) on the resist film of the substrate 9. The solder pattern is drawn on the above-described circuit pattern in accordance with the circuit pattern.

[0024] In the following description, the pattern (i.e., the circuit pattern) previously formed on the upper surface 90 of the substrate 9 is also referred to as the "first pattern", and the pattern (i.e., the solder pattern) to be drawn on the upper surface 90 of the substrate 9 in the drawing apparatus 1 is also referred to as the "second pattern". Note that the type, shape, etc. of the substrate 9 may be variously changed. Also, the pattern drawn on the substrate 9 by the drawing apparatus 1 is not limited to the solder pattern and may be variously changed.

[0025] On the upper surface 90 of the substrate 9 illustrated in FIG. 2, a plurality of partial drawing regions 94 each partitioned into a substantially rectangular shape by grid-like division planned lines 93 are set. The same pattern is drawn in each of the plurality of partial drawing regions 94. Each partial drawing region 94 corresponds to a piece finally obtained from the substrate 9. In the example shown in FIG. 2, each partial drawing region 94 is substantially square. The plurality of partial drawing regions 94 are arranged in a matrix in the X direction and the Y direction. In FIG. 2, each partial drawing region 94 is drawn larger than actual, and the number of partial drawing regions 94 is drawn smaller than actual. The substrate 9 is not provided with an alignment mark dedicated to the position detection process (i.e., the alignment process) described later.

[0026] As shown in FIG. 1, the drawing apparatus 1 includes a stage 21, a stage moving mechanism 22, an imaging unit 3, a drawing unit 4, and a control unit 10. The control unit 10 controls the stage moving mechanism 22, the imaging unit 3, the drawing unit 4, etc. The stage 21 is a substantially flat substrate holding unit that holds the horizontally placed substrate 9 from below (i.e., on the (-Z) side) below the imaging unit 3 and the drawing unit 4. The stage 21 is, for example, a vacuum chuck that adsorbs and holds the lower surface of the substrate 9. The stage 21 may have a structure other than a vacuum chuck. The upper surface 90 of the substrate 9 placed on the stage 21 is substantially perpendicular to the Z direction and substantially parallel to the X direction and the Y direction.

[0027] The stage moving mechanism 22 is a moving mechanism that relatively moves the stage 21 in the horizontal direction (i.e., a direction substantially parallel to the upper surface 90 of the substrate 9) with respect to the imaging unit 3 and the drawing unit 4. The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 linearly moves the stage 21 in the X direction along the guide rail. The first moving mechanism 23 linearly moves the stage 21 in the Y direction along the guide rail together with the second moving mechanism 24. The drive sources of the first moving mechanism 23 and the second moving mechanism 24 are, for example, linear servo motors or those in which a motor is attached to a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be variously changed.

[0028] In the drawing apparatus 1, a stage rotation mechanism that rotates the stage 21 about a rotation axis extending in the Z direction may be provided. Also, a stage lifting mechanism that moves the stage 21 in the Z direction may be provided in the drawing apparatus 1. As the stage rotation mechanism, for example, a servo motor can be used. As the stage lifting mechanism, for example, a linear servo motor can be used. The structures of the stage rotation mechanism and the stage lifting mechanism may be variously changed.

[0029] The imaging unit 3 includes a plurality of (two in the example shown in FIG. 1) imaging heads 31 arranged in the X direction. Each imaging head 31 is supported above the stage 21 and the stage moving mechanism 22 by a head support portion 30 provided across the stage 21 and the stage moving mechanism 22. Of the two imaging heads 31, one imaging head 31 is fixed to the head support portion 30, and the other imaging head 31 is movable in the X direction on the head support portion 30. Thereby, the distance in the X direction between the two imaging heads 31 can be changed. Note that the number of imaging heads 31 of the imaging unit 3 may be 1 or may be 3 or more.

[0030] Each imaging head 31 is a camera including an imaging sensor and an optical system (not shown). Each imaging head 31 is, for example, an area camera that acquires a two-dimensional image. The imaging sensor includes, for example, a plurality of elements such as a plurality of CCDs (Charge Coupled Devices) arranged in a matrix. In each imaging head 31, the reflected light of the illumination light guided from a light source (not shown) to the upper surface 90 of the substrate 9 is guided to the imaging sensor through the optical system. The imaging sensor receives the reflected light from the upper surface 90 of the substrate 9 and acquires an image of a substantially rectangular imaging region. As the above-described light source, various light sources such as LEDs (Light Emitting Diodes) can be used. Note that each imaging head 31 may be another type of camera such as a line camera.

[0031] The drawing unit 4 includes a plurality of (five in the example shown in FIG. 1) drawing heads 41 arranged in the X direction and the Y direction. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by a head support portion 40 provided across the stage 21 and the stage moving mechanism 22. The head support portion 40 is arranged on the (+Y) side of the head support portion 30 of the imaging unit 3. Note that the number of drawing heads 41 of the drawing unit 4 may be one or may be plural.

[0032] Each drawing head 41 includes a light source, an optical system, and a spatial light modulator (not shown). As the spatial light modulator, various elements such as a DMD (Digital Micro Mirror Device) and a GLV (Grating Light Valve: registered trademark of Silicon Light Machines (Sunnyvale, California)) can be used. As the light source, various light sources such as an LD (Laser Diode) can be used. The plurality of drawing heads 41 have substantially the same structure.

[0033] In the drawing apparatus 1, while irradiating the light modulated (i.e., spatially light-modulated) from the plurality of drawing heads 41 of the drawing unit 4 onto the upper surface 90 of the substrate 9, the substrate 9 is moved in the Y direction by the stage moving mechanism 22. Thereby, the irradiation region of the light from the plurality of drawing heads 41 is scanned in the Y direction on the substrate 9, and the pattern is drawn on the substrate 9. In the following description, the Y direction is also referred to as the "scanning direction", and the X direction is also referred to as the "width direction". The stage moving mechanism 22 is a scanning mechanism that moves the irradiation region of the light from each drawing head 41 in the scanning direction on the substrate 9.

[0034] In the drawing apparatus 1, the drawing on the substrate 9 is performed in a so-called single-pass (one-pass) method. Specifically, the stage 21 is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the stage moving mechanism 22, and the irradiation region of the light from the plurality of drawing heads 41 is scanned only once in the Y direction (i.e., the scanning direction) on the upper surface 90 of the substrate 9. Thereby, the drawing on the substrate 9 is completed. Note that in the drawing apparatus 1, the drawing on the substrate 9 may be performed by a multi-pass method in which the movement of the stage 21 in the Y direction and the step movement in the X direction are repeated. When the multi-pass method of drawing is performed in the drawing apparatus 1, the Y direction is the main scanning direction, and the X direction is the sub-scanning direction. Further, the first moving mechanism 23 of the stage moving mechanism 22 is a main scanning mechanism that moves the stage 21 in the main scanning direction, and the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 in the sub-scanning direction.

[0035] FIG. 3 is a diagram showing the configuration of the computer 100 included in the control unit 10. The computer 100 is a normal computer including a processor 101, a memory 102, an input / output unit 103, and a bus 104. The bus 104 is a signal circuit connecting the processor 101, the memory 102, and the input / output unit 103. The memory 102 stores various kinds of information. The memory 102 reads and stores, for example, the program 109 prestored in the storage medium 81. The storage medium 81 is, for example, a USB memory or a CD-ROM.

[0036] The processor 101 executes various processes (for example, numerical calculation and image processing) while using the memory 102 etc. according to the above program 109 etc. stored in the memory 102. The input / output unit 103 includes a keyboard 105 and a mouse 106 that receive inputs from an operator, and a display 107 that displays outputs from the processor 101 etc. Note that the control unit 10 may be a programmable logic controller (PLC), a circuit board, etc., or may be a combination of these and one or more computers.

[0037] FIG. 4 is a block diagram showing the functions of the control unit 10 realized by executing the above program 109 by the computer 100. In FIG. 4, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111, an imaging control unit 112, a position detection unit 113, a drawing control unit 114, and a data generation unit 115.

[0038] The storage unit 111 is mainly realized by the memory 102 and prestores various kinds of information related to pattern drawing in the drawing device 1. The information stored in the storage unit 111 includes, for example, information sent from the data processing device 6 to the drawing device 1. From the data processing device 6, for example, CAD data of the second pattern (hereinafter also referred to as "second CAD data") to be drawn on the substrate 9, and template generation information etc. which is information used for generating a template described later are sent to the drawing device 1.

[0039] The imaging control unit 112, the position detection unit 113, the drawing control unit 114, and the data generation unit 115 are mainly realized by the processor 101. The imaging control unit 112 controls the imaging unit 3 and the stage moving mechanism 22 to cause the imaging unit 3 to image a part of the upper surface 90 (see FIG. 2) of the substrate 9 and obtain an image of a part of the first pattern (hereinafter also referred to as an "imaging image"). The imaging image is sent to and stored in the storage unit 111. The data generation unit 115 rasterizes the second CAD data stored in the storage unit 111 to generate raster data (hereinafter also referred to as "second raster data") used for drawing the second pattern in the drawing device 1. The second raster data is, for example, run-length data. Further, the data generation unit 115 generates a template (that is, a reference image) used for detecting the position of the substrate 9.

[0040] The position detection unit 113 performs pattern matching on the imaging image of the first pattern described above using the template to detect the position of the substrate 9 on the stage 21 (see FIG. 1) (that is, the relative position of the substrate 9 with respect to the drawing unit 4). The drawing control unit 114 controls the drawing unit 4 and the stage moving mechanism 22 based on the second raster data described above and the position of the substrate 9 detected by the position detection unit 113, etc., to adjust the drawing position on the substrate 9 and cause the drawing unit 4 to execute drawing of the second pattern on the substrate 9.

[0041] Next, the flow of drawing a pattern on the substrate 9 by the drawing device 1 will be described with reference to FIGS. 5A and 5B. When drawing on the substrate 9, first, the substrate 9 is carried into the drawing device 1 shown in FIG. 1 and held by the stage 21 (step S11). The stage 21 is located on the (-Y) side of the imaging unit 3 and the drawing unit 4. A first pattern is provided in advance on the upper surface 90 of the substrate 9 held on the stage 21. The upper surface 90 of the substrate 9 is substantially parallel in the X direction and the Y direction.

[0042] Subsequently, a template used for the above pattern matching is generated by the data generation unit 115 (see FIG. 4) of the control unit 10 (step S12). In step S12, first, template generation information is created in the data processing device 6. The creation of the template generation information in the data processing device 6 will be described later. Subsequently, the second CAD data and the template generation information are sent from the data processing device 6 to the drawing device 1 and stored in the storage unit 111. Thereby, the second CAD data and the template generation information are prepared in the drawing device 1 (step S121). The template generation information includes the first CAD data, which is the CAD data of the first pattern, and coordinates indicating the position (hereinafter, also referred to as "matching position") where pattern matching is performed by the position detection unit 113 on the first pattern. The template generation information also includes template size information indicating the size of the template used for the pattern matching.

[0043] In the control unit 10, the template generation information stored in the storage unit 111 is read out by the data generation unit 115. The data generation unit 115 rasterizes the first CAD data included in the template generation information to generate first raster data (hereinafter, also referred to as "intermediate data"). The first raster data is, for example, run-length data.

[0044] Further, based on the coordinates indicating the matching positions included in the template generation information and the template size information, the data generation unit 115 extracts, from the first raster data, a region of a predetermined size (i.e., the size indicated by the template size information) corresponding to the matching position. As shown in FIG. 6, the region extracted from the first raster data (hereinafter, also referred to as the "extraction region 96") is, for example, a substantially square region with a side length of 2 mm centered on the matching position 95 indicated by a cross. In FIG. 6, among the plurality of partial drawing regions 94 of the substrate 9 on which the first pattern is drawn, a site near the upper left vertex of the upper left (i.e., the vertex on the (-X) side and the (+Y) side) partial drawing region 94 is enlarged and drawn. Note that the extraction region 96 does not necessarily have to be extracted centered on the matching position 95, and may be, for example, a substantially square region with the matching position 95 as the upper left vertex. Also, the shape and size of the extraction region 96 may be variously changed.

[0045] The data generation unit 115 generates a template by converting the data of the extraction region 96 extracted from the first raster data into image data in a format that can be used for pattern matching (step S122). FIG. 7 is a diagram showing an example of the template 97 generated by the data generation unit 115. As described above, the template 97 includes a part of the first pattern. Note that the shape of the pattern included in the template 97 is not limited to that shown in FIG. 7 and may be variously changed. In the present embodiment, the template is bitmap data. Note that the data format of the template may be other than the bitmap format.

[0046] The template generation information usually includes the coordinates of a plurality (for example, four or more) of the matching positions 95. The plurality of matching positions 95 are preset in the data processing device 6 and included in the template generation information. In the above-described step S12, a plurality of templates 97 respectively corresponding to the plurality of matching positions 95 are generated by the data generation unit 115 and stored in the storage unit 111.

[0047] FIG. 8 is a diagram showing an example of the arrangement of a plurality of matching positions 95 on the substrate 9. In the example shown in FIG. 8, four matching positions 95 are respectively arranged in four partial drawing areas 94 located at four corners among a plurality of partial drawing areas 94 arranged in a matrix on the substrate 9. Further, in each partial drawing area 94 where the matching position 95 is arranged, the matching position 95 is arranged near one corner farthest from the central portion of the substrate 9 among the four corners of the partial drawing area 94.

[0048] Specifically, in the partial drawing area 94 located at the corner on the (-X) side and the (+Y) side (that is, the partial drawing area 94 on the outermost side in the width direction and the outermost side in the scanning direction), the matching position 95 is arranged adjacent to the corner on the (-X) side and the (+Y) side of the partial drawing area 94. Further, the extraction area 96 corresponding to the matching position 95 is also arranged adjacent to the corner of the partial drawing area 94. The entire extraction area 96 is located within the partial drawing area 94 (that is, on the outer peripheral edge of the partial drawing area 94 and inside the outer peripheral edge). Preferably, the corner on the (-X) side and the (+Y) side of the extraction area 96 overlaps with the corner on the (-X) side and the (+Y) side of the partial drawing area 94, and the side on the (-X) side and the side on the (+Y) side of the extraction area 96 overlap with the side on the (-X) side and the side on the (+Y) side of the partial drawing area 94.

[0049] Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94. In this case, the distance between the side on the (-X) side of the extraction area 96 and the side on the (-X) side of the partial drawing area 94 is, for example, 2 mm or less (that is, 100% or less of the length of one side of the extraction area 96), preferably 1 mm or less (that is, 50% or less of the length of one side of the extraction area 96). The same applies to the distance between the side on the (+Y) side of the extraction area 96 and the side on the (+Y) side of the partial drawing area 94.

[0050] In the partial drawing area 94 located at the (+X) side and (+Y) side corner (i.e., the partial drawing area 94 on the outermost side in the width direction and the outermost side in the scanning direction), the matching position 95 and the extraction area 96 are arranged adjacent to the (+X) side and (+Y) side corners of the partial drawing area 94. The entire extraction area 96 is located within the partial drawing area 94. Preferably, the (+X) side and (+Y) side corners of the extraction area 96 overlap the (+X) side and (+Y) side corners of the partial drawing area 94, and the (+X) side and (+Y) side sides of the extraction area 96 overlap the (+X) side and (+Y) side sides of the partial drawing area 94 respectively. Note that, similar to the above, the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as that of the extraction area 96 arranged in the partial drawing area 94 on the outermost (-X) side and the outermost (+Y) side described above.

[0051] In the partial drawing area 94 located at the (+X) side and (-Y) side corner (i.e., the partial drawing area 94 on the outermost side in the width direction and the outermost side in the other scanning direction), the matching position 95 and the extraction area 96 are arranged adjacent to the (+X) side and (-Y) side corners of the partial drawing area 94. The entire extraction area 96 is located within the partial drawing area 94. Preferably, the (+X) side and (-Y) side corners of the extraction area 96 overlap the (+X) side and (-Y) side corners of the partial drawing area 94, and the (+X) side and (-Y) side sides of the extraction area 96 overlap the (+X) side and (-Y) side sides of the partial drawing area 94 respectively. Note that, similar to the above, the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as that of the extraction area 96 arranged in the partial drawing area 94 on the outermost (-X) side and the outermost (+Y) side described above.

[0052] In the partial drawing area 94 located at the corner on the (-X) side and (-Y) side (that is, the partial drawing area 94 on the outermost side in the width direction and the outermost side in the scanning direction), the matching position 95 and the extraction area 96 are arranged adjacent to the corner on the (-X) side and (-Y) side of the partial drawing area 94. The entire extraction area 96 is located within the partial drawing area 94. Preferably, the corner on the (-X) side and (-Y) side of the extraction area 96 overlaps with the corner on the (-X) side and (-Y) side of the partial drawing area 94, and the side on the (-X) side and the side on the (-Y) side of the extraction area 96 overlap with the side on the (-X) side and the side on the (-Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as that of the extraction area 96 arranged in the partial drawing area 94 on the most (-X) side and most (+Y) side described above.

[0053] The number and arrangement of the matching positions 95 on the substrate 9 are not limited to those shown in FIG. 8 and may be changed variously. For example, among the plurality of partial drawing areas 94, the matching positions 95 may also be arranged in the partial drawing areas 94 other than the partial drawing areas 94 located at the four corners. For example, as shown in FIG. 9, two matching positions 95 may be arranged in each partial drawing area 94 of the plurality of partial drawing areas 94 arranged in a matrix. In the example shown in FIG. 9, in each partial drawing area 94 located on the most (-Y) side among the plurality of partial drawing areas 94, the matching position 95 is arranged adjacent to the side on the (-Y) side, and in each partial drawing area 94 located on the most (+Y) side, the matching position 95 is arranged adjacent to the side on the (+Y) side. Also, in each partial drawing area 94 located on the most (-X) side, the matching position 95 is arranged adjacent to the side on the (-X) side, and in each partial drawing area 94 located on the most (+X) side, the matching position 95 is arranged adjacent to the side on the (+X) side.

[0054] In step S12, when a plurality of templates 97 corresponding to a plurality of matching positions 95 are generated respectively, the substrate 9 is moved in the (+Y) direction together with the stage 21 by the stage moving mechanism 22 shown in FIG. 1, and moves below the imaging unit 3. Note that step S12 may be performed before the loading and holding of the substrate 9 in step S11, or may be performed in parallel with step S11.

[0055] Subsequently, by controlling the imaging unit 3 and the stage moving mechanism 22 by the imaging control unit 112 (see FIG. 4), an imaging region of a predetermined size corresponding to each matching position 95 on the substrate 9 is imaged, and an imaging image including a part of the first pattern is acquired (step S13). The imaging region is a substantially rectangular region centered on the matching position 95 when the substrate 9 is accurately held at the design position on the stage 21. The imaging region has a pair of sides parallel to the X direction and the Y direction respectively, and is larger than the above-described extraction region 96 in both the X direction and the Y direction.

[0056] For example, the imaging region has a substantially rectangular shape in which the extraction region 96 is enlarged by a predetermined size on each of the (+X) side, (-X) side, (+Y) side, and (-Y) side. For example, the lengths in the X direction and the Y direction of the imaging region (that is, the lengths in the X direction and the Y direction of the imaging field of the imaging head 31) are 14 mm and 7 mm respectively. Therefore, even if the position of the substrate 9 on the stage 21 is slightly deviated from the design position, the pattern corresponding to the template 97 is included in the imaging image. In step S13, a plurality of imaging images corresponding to a plurality of matching positions 95 are acquired and stored in the storage unit 111. Note that step S13 may be performed before step S12, or may be performed in parallel with step S12. Also, the size of the imaging region may be changed variously.

[0057] Next, the position detection unit 113 of the control unit 10 performs pattern matching on the captured images corresponding to the respective matching positions 95 using the template 97 corresponding to the matching position 95. The pattern matching is performed by a known pattern matching method (for example, geometric shape pattern matching, normalized correlation search, etc.). Then, based on the position of the pattern identical to the template 97 in each captured image and the relative position between the substrate 9 and the imaging unit 3 when each captured image is acquired, the position of the substrate 9 on the stage 21 is detected by the position detection unit 113 (see FIG. 4) (step S14).

[0058] The position of the substrate 9 detected by the position detection unit 113 in step S14 includes information indicating the coordinates of the substrate 9 in the X and Y directions on the stage 21, the orientation of the substrate 9, and the deformation due to distortion of the substrate 9, etc. Further, the information indicating the deformation of the substrate 9 is information such as the shape of the deformed substrate 9 and the positions of a plurality of partial drawing regions 94 on the substrate 9.

[0059] In the control unit 10, further, the second CAD data is read from the storage unit 111 by the data generation unit 115 (see FIG. 4), and the second CAD data is rasterized to generate second raster data (step S15). The second raster data is, for example, run-length data. Step S15 may be performed after step S14, may be performed in parallel with step S14, or may be performed before step S14. When step S15 is performed before step S14, for example, step S15 may be performed in parallel with any one of steps S11 to S13, may be performed between any two of steps S11 to S14, or may be performed before step S11.

[0060] When the second raster data is generated, the drawing unit 4 and the stage moving mechanism 22 are controlled by a drawing control unit 114 (see FIG. 4) based on the second raster data and the position of the substrate 9 detected in step S14. As a result, the modulated light described above is irradiated onto the substrate 9 that is relatively moved in the Y direction with respect to the drawing head 41 of the drawing unit 4, and a second pattern is drawn on the upper surface 90 of the substrate 9 (step S16). In step S16, based on the position of the substrate 9 detected in step S14, the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 to the substrate 9, and the scanning position of the light beam on the substrate 9, etc. are mechanically and automatically corrected by a known correction method in the drawing unit 4 and the stage moving mechanism 22. Thereby, the second pattern can be drawn on the first pattern with high positional accuracy.

[0061] In the above description, in step S12, the first raster data obtained by rasterizing all of the first CAD data (that is, the entire first pattern) is used as intermediate data, and an extraction region 96 corresponding to the matching position 95 is extracted from the intermediate data to generate a template 97. However, the present invention is not limited to this. For example, in step S12, only partial data that is a part of the first CAD data may be rasterized by the data generation unit 115 to create the intermediate data. In this case, the partial data is CAD data corresponding to a region of a predetermined size (hereinafter, also referred to as a “clipping region”) including each matching position 95 in the first pattern. As described above, when a plurality of matching positions 95 are set, the partial data is CAD data corresponding to a set of a plurality of clipping regions respectively corresponding to the plurality of matching positions 95.

[0062] The positions and sizes of the plurality of clipping regions are preset in the data processing device 6 and included in the template generation information. In other words, the data processing device 6 clips the partial data corresponding to the clipping region in the first CAD data and sends it to the drawing device 1.

[0063] Each clipping region includes one matching position 95 as described above, and includes the entire extraction region 96 corresponding to the matching position 95. The clipping region is, for example, a substantially rectangular region having a pair of sides parallel to the X direction and the Y direction respectively, and having a size greater than or equal to the extraction region 96 in both the X direction and the Y direction. The clipping region has, for example, a shape obtained by expanding the extraction region 96 by a predetermined size (for example, the maximum positional deviation amount in the X direction and the Y direction of the assumed substrate 9) on each of the (+X) side, (-X) side, (+Y) side, and (-Y) side. Alternatively, as shown in FIG. 8, when the matching position 95 is arranged only in some of the plurality of partial drawing regions 94, the clipping region may be the same region as one partial drawing region 94 including the matching position 95. In this case, the partial data is CAD data corresponding to a plurality of partial drawing regions 94 each including a plurality of matching positions 95 (that is, a set of partial drawing regions 94 including the matching position 95). In this way, by rasterizing only a part of the first CAD data in the data generation unit 115, the time required for rasterization can be shortened.

[0064] Next, the data processing device 6 and the creation of template generation information will be described. The data processing device 6 is a device that creates the above-described template generation information and sends it to the drawing device 1. As shown in FIG. 10, the data processing device 6 is a normal computer including a processor 601, a memory 602, an input / output unit 603, and a bus 604. The bus 604 is a signal circuit that connects the processor 601, the memory 602, and the input / output unit 603. The memory 602 stores various information. The memory 602 reads and stores, for example, a program 609 stored in advance in the storage medium 82. The storage medium 82 is, for example, a USB memory or a CD-ROM.

[0065] The processor 601 executes various processes (e.g., numerical calculations and image processing) while using the memory 602 and the like in accordance with the above program 609 stored in the memory 602. The input / output unit 603 includes a keyboard 605 and a mouse 606 that receive input from an operator, a display 607 that displays the output from the processor 601 and the like, and a transmission unit 608 that transmits information to the drawing device 1 and the like.

[0066] FIG. 11 is a block diagram showing functions realized when the above program 609 is executed in the data processing device 6. The data processing device 6 includes a storage unit 611, an initial setting unit 612, a matching position determination unit 613, and an information creation unit 614. The storage unit 611 is mainly realized by the memory 602 and stores various information related to the creation of template generation information in advance. The information stored in the storage unit 611 includes, for example, first CAD data and second CAD data. The initial setting unit 612, the matching position determination unit 613, and the information creation unit 614 are mainly realized by the processor 601. The initial setting unit 612 sets a provisional matching position on the first pattern. The provisional matching position is an initial position temporarily set on the first pattern to determine the above-mentioned matching position 95. The matching position determination unit 613 determines the matching position 95 based on the provisional matching position. The information creation unit 614 creates template generation information including coordinates indicating the matching position 95 determined by the matching position determination unit 613.

[0067] Next, the flow of creating template generation information in the data processing device 6 will be described with reference to FIG. 12. Steps S21 to S29 shown in FIG. 12 are a detailed description of step S121 shown in FIG. 5B. Steps S21 to S28 are performed in the data processing device 6, and step S29 is performed in the drawing device 1.

[0068] When template generation information is created, first, a temporary matching position is set on the first pattern by the initial setting unit 612 (see FIG. 11) (step S21). FIGS. 13 and 14 are diagrams each showing an example of the arrangement of the temporary matching position 95a on the substrate 9. In FIGS. 13 and 14, the temporary matching position 95a is indicated by an X-shaped mark.

[0069] In the data processing device 6, a plurality of arrangement modes of the temporary matching position 95a are prepared, and one of the plurality of arrangement modes is selected by the designer. The initial setting unit 612 sets the coordinates of the plurality of temporary matching positions 95a according to the arrangement mode selected by the designer. FIG. 13 corresponds to an arrangement mode (hereinafter, also referred to as "first arrangement mode") in which the temporary matching position 95a is arranged only at the four corners of the drawing area of the substrate 9 (that is, the four corners of the minimum rectangle circumscribing the plurality of partial drawing areas 94 arranged in a matrix). The first arrangement mode is an arrangement mode for determining the matching position 95 shown in FIG. 8.

[0070] In the example shown in FIG. 13, the four temporary matching positions 95a are respectively arranged in the four partial drawing areas 94 located at the four corners among the plurality of partial drawing areas 94 arranged in a matrix on the substrate 9. Further, in each partial drawing area 94 where the temporary matching position 95a is arranged, the temporary matching position 95a is arranged in the vicinity of one corner farthest from the central portion of the substrate 9 among the four corners of the partial drawing area 94.

[0071] Specifically, in the partial drawing area 94 located at the corner on the (-X) side and the (+Y) side, the provisional matching position 95a is arranged adjacent to the corner on the (-X) side and the (+Y) side of the partial drawing area 94. Also, in the partial drawing area 94 located at the corner on the (+X) side and the (+Y) side, the provisional matching position 95a is arranged adjacent to the corner on the (+X) side and the (+Y) side of the partial drawing area 94. In the partial drawing area 94 located at the corner on the (+X) side and the (-Y) side, the provisional matching position 95a is arranged adjacent to the corner on the (+X) side and the (-Y) side of the partial drawing area 94. In the partial drawing area 94 located at the corner on the (-X) side and the (-Y) side, the provisional matching position 95a is arranged adjacent to the corner on the (-X) side and the (-Y) side of the partial drawing area 94.

[0072] FIG. 14 corresponds to an arrangement mode (hereinafter, also referred to as the "second arrangement mode") in which a plurality of provisional matching positions 95a are arranged in a matrix in the X direction and the Y direction in the drawing area of the substrate 9. The second arrangement mode is for determining the matching position 95 shown in FIG. 9. In the second arrangement mode, a group of provisional matching positions in which a plurality of provisional matching position columns 950a are arranged at substantially equal intervals in the X direction is set, and the pitch of the plurality of provisional matching position columns 950a in the X direction is set to be equal to or less than a predetermined upper limit value (for example, 200 mm). Each provisional matching position column 950a is a set of a plurality of provisional matching positions 95a arranged substantially parallel to each other in the Y direction, and is surrounded by a two-dot chain line in FIG. 14.

[0073] In the second arrangement mode, provisional matching position columns 950a are arranged on the (+X) side and the (-X) side of the drawing area on the substrate 9, and other provisional matching position columns 950a are arranged at equal intervals between the two provisional matching position columns 950a. In the example shown in FIG. 14, three provisional matching position columns 950a are set on the substrate 9, but the number of provisional matching position columns 950a increases as the length of the substrate 9 in the X direction increases. Also, the number of provisional matching position columns 950a decreases as the length of the substrate 9 in the X direction decreases. Note that the upper limit value of the pitch of the plurality of provisional matching position columns 950a in the X direction may be appropriately changed, and is appropriately determined, for example, in the range of 50 mm to 300 mm.

[0074] In each temporary matching position row 950a, a plurality of temporary matching positions 95a arranged in the Y direction are arranged at substantially equal intervals. The pitch in the Y direction of the plurality of temporary matching positions 95a in each temporary matching position row 950a may be a preset fixed value (for example, 50 mm), may be automatically adjusted according to the length of the substrate 9 in the Y direction, or may be appropriately determined by the designer. Also, in each temporary matching position row 950a, the temporary matching positions 95a are arranged at the outermost (+Y) side and the outermost (-Y) side of the drawing area on the substrate 9, and a predetermined number of temporary matching positions 95a may be arranged at equal intervals between the two temporary matching positions 95a.

[0075] In the data processing device 6, an arrangement mode other than the above-described first arrangement mode and second arrangement mode may also be selectable. For example, similar to FIG. 14, while a plurality of temporary matching position rows 950a are arranged at substantially equal intervals in the X direction, an arrangement mode (hereinafter, also referred to as "third arrangement mode") in which the number of the plurality of temporary matching position rows 950a is a predetermined number (for example, three) may be selectable. Also in the third arrangement mode, similar to the second arrangement mode, the temporary matching position rows 950a are arranged at the outermost (+X) side and the outermost (-X) side of the drawing area on the substrate 9, and other temporary matching position rows 950a are arranged at equal intervals between the two temporary matching position rows 950a. In the third arrangement mode, even if the length of the substrate 9 in the X direction changes, the number of the temporary matching position rows 950a arranged in the X direction does not change. Note that the number of the plurality of temporary matching position rows 950a arranged in the X direction may be appropriately changed, and is, for example, appropriately determined between two and six.

[0076] Next, as shown in FIG. 15, a temporary template area 951a corresponding to each temporary matching position 95a is set by a matching position determination unit 613 (see FIG. 11) (step S22). FIG. 15 shows an enlarged view of a part in the vicinity of a temporary matching position 95a arranged in the vicinity of the corner on the (-X) side and (+Y) side of a partial drawing area 94 located at the upper left corner in FIGS. 8 and 9. The temporary template area 951a is an area having the same size as the above-described template 97. The relative position of the temporary template area 951a with respect to the temporary matching position 95a is the same as the relative position of the extraction area 96 with respect to the above-described matching position 95. The temporary template area 951a is, for example, a substantially square area with a side length of 2 mm centered on the temporary matching position 95a.

[0077] Also, in the matching position determination unit 613, a check area 952a larger than the imaging field of view of the imaging head 31 of the imaging unit 3 (in the above example, a substantially rectangular area of 14 mm x 7 mm) is set centered on the temporary template area 951a (step S23). The check area 952a is substantially rectangular with a pair of sides parallel to the X direction and the Y direction, and is larger than the above-described imaging field of view in both the X direction and the Y direction. For example, the check area 952a is obtained by expanding the imaging field of view by a predetermined size (for example, the maximum position shift amount in the X direction and the Y direction of the assumed substrate 9) in each of the (+X) side, (-X) side, (+Y) side, and (-Y) side. When the maximum position shift amount is, for example, 3 mm, the check area 952a is a substantially rectangular area of 20 mm x 13 mm. Note that the size of the check area 952a may be changed variously.

[0078] When step S23 is completed, the matching position determination unit 613 checks for the presence of an overlapping area showing the same pattern as the temporary template area 951a in the check area 952a (step S24). The overlapping area is an area having the same shape as the temporary template area 951a located at a position different from the temporary template area 951a.

[0079] Specifically, the matching position determination unit 613 extracts a region having the same shape as the temporary template region 951a (hereinafter also referred to as the "comparison region") from the check region 952a, and compares the pattern indicated by the comparison region with the pattern indicated by the temporary template region 951a by a known method based on the first CAD data. If both patterns are the same, the comparison region is recognized as an overlapping region. If both patterns are different, the comparison region is recognized not to be an overlapping region. The matching position determination unit 613 performs the extraction of the comparison region and the pattern comparison with the temporary template region 951a for the entire area of the check region 952a. If no comparison region recognized as an overlapping region appears, it is determined that there is no overlapping region in the check region 952a. On the other hand, if a comparison region recognized as an overlapping region appears during the extraction of the comparison region in the check region 952a and the pattern comparison with the temporary template region 951a, the matching position determination unit 613 determines that there is an overlapping region in the check region 952a and stops the extraction of the comparison region.

[0080] When there is an overlapping region in step S24, the matching position determination unit 613 moves the temporary matching position 95a by a predetermined distance in a predetermined direction (step S25). The predetermined direction is, for example, the X direction or the Y direction. In the example shown in FIG. 15, since there is substantially no drawing area on the (+Y) side and (-X) side of the temporary matching position 95a, the moving direction of the temporary matching position 95a is substantially the (-Y) direction or the (+X) direction. The predetermined distance is, for example, 0.5 times to 1 time the length in the X direction or Y direction of the temporary template region 951a. In the case of the temporary matching position 95a located near the central portion of the substrate 9, the moving direction of the temporary matching position 95a can be set to any of the (-Y) direction, (+Y) direction, (-X) direction, and (+X) direction.

[0081] In the present embodiment, as shown in FIG. 16, the provisional matching position 95a moves in the (-Y) direction (i.e., the direction parallel to the scanning direction) from the position shown in FIG. 15 by a distance equal to 0.5 times the length in the Y direction of the provisional template region 951a. In FIG. 15, the moved provisional matching position 95a is shown by a solid line, and the provisional matching position 95a during the movement is shown by a two-dot chain line. Then, the process returns to step S22, and the provisional template region 951a and the check region 952a corresponding to the new provisional matching position 95a are set by the matching position determination unit 613 (steps S22, S23). In other words, the matching position determination unit 613 moves the provisional matching position 95a and re-sets the provisional template region 951a and the check region 952a. In FIG. 15, the re-set provisional template region 951a and check region 952a are shown by solid lines, and the provisional template region 951a and check region 952a before the re-set are shown by two-dot chain lines. Then, the presence or absence of an overlapping region in the check region 952a is confirmed again (step S24).

[0082] In the data processing apparatus 6, steps S22 to S25 are repeated until the non-existence of an overlapping region in the check region 952a is confirmed. Then, in step S24, if there is no overlapping region in the check region 952a, the provisional matching position 95a at that time is determined as the matching position 95 by the matching position determination unit 613 (step S26). In the data processing apparatus 6, steps S22 to S26 are performed for each of the plurality of provisional matching positions 95a, and a plurality of matching positions 95 corresponding to the plurality of provisional matching positions 95a are determined respectively.

[0083] Thereafter, the information creation unit 614 (see FIG. 11) creates template generation information including the coordinates of the plurality of matching positions 95 determined in step S26 (step S27). As described above, the template generation information also includes the first CAD data, the second CAD data, and the template size information. Further, the template generation information includes, for example, the clipping information regarding the above-described clipping region. The template generation information created in step S27 is sent from the transmission unit 608 (see FIG. 10) of the data processing device 6 to the drawing device 1 (step S28) and stored in the storage unit 111 of the drawing device 1 (step S29).

[0084] As described above, the drawing system 5 includes the drawing device 1 and the data processing device 6. The drawing device 1 irradiates light onto the substrate 9 to draw a pattern. The data processing device 6 creates template generation information and sends it to the drawing device 1. The drawing device 1 includes a stage 21, a drawing head 41, a scanning mechanism (in the above example, the stage moving mechanism 22), an imaging unit 3, a position detection unit 113, a storage unit 111, a data generation unit 115, and a drawing control unit 114. The stage 21 holds the substrate 9 on which the first pattern is previously provided on the upper surface 90. The drawing head 41 irradiates the modulated light onto the upper surface 90 of the substrate 9. The scanning mechanism relatively moves the stage 21 with respect to the drawing head 41 in a scanning direction parallel to the upper surface 90 of the substrate 9 (in the above example, the Y direction). The imaging unit 3 images a part of the first pattern.

[0085] The position detection unit 113 detects the position of the substrate 9 by performing pattern matching using the template 97 on the captured image acquired by the imaging unit 3. The storage unit 111 stores the second CAD data, which is the CAD data of the second pattern drawn on the first pattern. The data generation unit 115 rasterizes the second CAD data to generate the second raster data. The drawing control unit 114 controls the drawing head 41 and the scanning mechanism based on the second raster data and the position of the substrate 9 detected by the position detection unit 113, thereby causing the drawing head 41 to draw the second pattern on the substrate 9 that relatively moves in the scanning direction.

[0086] The memory unit 111 further stores template generation information including coordinates indicating a matching position 95 where pattern matching by the position detection unit 113 is performed on the first pattern. The data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and generates, as a template 97, image data of a region of a predetermined size (i.e., the extraction region 96) corresponding to the matching position 95 from the intermediate data.

[0087] The data processing device 6 includes an initial setting unit 612, a matching position determination unit 613, and an information creation unit 614. The initial setting unit 612 sets a provisional matching position 95a on the first pattern. The matching position determination unit 613 sets a provisional template region 951a having the same size as the template 97 corresponding to the provisional matching position 95a, and sets a check region 952a larger than the imaging field of the imaging unit 3 centered on the provisional template region 951a. The matching position determination unit 613 also checks for the presence of an overlapping region showing the same pattern as the provisional template region 951a in the check region 952a. When an overlapping region exists in the check region 952a, the matching position determination unit 613 repeatedly moves the provisional matching position 95a in a predetermined direction to reset the provisional template region 951a and the check region 952a and check for the presence of the overlapping region. On the other hand, when no overlapping region exists in the check region 952a, the matching position determination unit 613 determines the provisional matching position 95a as the matching position 95. The information creation unit 614 creates template generation information including coordinates indicating the matching position 95 determined by the matching position determination unit 613.

[0088] As described above, in the drawing system 5, when generating the template 97 used in the pattern matching at the time of detecting the position of the substrate 9, the template 97 can be generated from the CAD data of the first pattern without imaging the first pattern on the substrate 9 in the drawing apparatus 1. Therefore, when generating the template 97, it is not necessary to accurately place the substrate 9 at the design position on the stage 21 or image the first pattern on the substrate 9 by the imaging unit 3. For this reason, the generation of the template 97 can be performed easily and quickly. Also, since the position at which the above-described pattern matching is performed (that is, the matching position 95) can be automatically determined by the data processing apparatus 6, the work of determining the matching position 95 by the designer can be omitted. As a result, the amount of work of the designer required for generating the template can also be reduced.

[0089] As described above, in the data processing apparatus 6, when there is an overlapping region in the check region 952a, the moving direction of the temporary matching position 95a by the matching position determination unit 613 is preferably the scanning direction (in the above example, the Y direction). Thereby, since the positions in the width direction (in the above example, the X direction) of the plurality of matching positions 95 are the same, when imaging the plurality of matching positions 95 in the drawing apparatus 1, relative movement in the width direction of the imaging unit 3 becomes unnecessary. As a result, the time required for detecting the position of the substrate 9 in the drawing apparatus 1 can be shortened.

[0090] As described above, preferably, the initial setting unit 612 sets a group of temporary matching positions in which a plurality of temporary matching position columns 950a are arranged at equal intervals in the width direction perpendicular to the scanning direction. Each of the plurality of temporary matching position columns 950a is a set of temporary matching positions 95a arranged in the scanning direction. Also, the pitch in the width direction of the plurality of temporary matching position columns 950a is preferably set to a predetermined value or less. Thereby, an appropriate number of matching positions 95 can be set at appropriate positions on the substrate 9. As a result, the accuracy of detecting the position of the substrate 9 can be improved.

[0091] Alternatively, as described above, it is also preferable that the number of the plurality of temporary matching position sequences 950a be a predetermined number. Also in this case, in substantially the same manner as above, an appropriate number of matching positions 95 can be set at appropriate positions on the substrate 9, so that the accuracy of detecting the position of the substrate 9 can be improved. Further, by making the number of the temporary matching position sequences 950a constant regardless of the size of the substrate 9, the setting operation of the temporary matching positions 95a can be simplified.

[0092] As shown in FIG. 13, when a plurality of partial drawing areas 94 are set in a matrix pattern on the upper surface 90 of the substrate 9 in the scanning direction and the width direction perpendicular to the scanning direction, among the plurality of partial drawing areas 94, in the partial drawing area 94 on the one side in the scanning direction and the one side in the width direction (in the above example, the most (+Y) side and the most (-X) side), the temporary matching position 95a is preferably arranged adjacent to the corner on the one side in the scanning direction and the one side in the width direction (in the above example, the (+Y) side and the (-X) side). Also, among the plurality of partial drawing areas 94, in the partial drawing area 94 on the one side in the scanning direction and the other side in the width direction (in the above example, the most (+Y) side and the most (+X) side), the temporary matching position 95a is preferably arranged adjacent to the corner on the one side in the scanning direction and the other side in the width direction (in the above example, the (+Y) side and the (+X) side). Further, among the plurality of partial drawing areas 94, in the partial drawing area 94 on the other side in the scanning direction and the other side in the width direction (in the above example, the most (-Y) side and the most (+X) side), the temporary matching position 95a is preferably arranged adjacent to the corner on the other side in the scanning direction and the other side in the width direction (in the above example, the (-Y) side and the (+X) side). And, among the plurality of partial drawing areas 94, in the partial drawing area 94 on the other side in the scanning direction and the one side in the width direction (in the above example, the most (-Y) side and the most (-X) side), the temporary matching position 95a is preferably arranged adjacent to the corner on the other side in the scanning direction and the one side in the width direction (in the above example, the (-Y) side and the (-X) side).

[0093] In this way, by arranging four temporary matching positions 95a at the four corners of the minimum rectangle circumscribing a plurality of partial drawing areas 94 arranged in a matrix on the substrate 9, four matching positions 95 are arranged in the areas near the four corners. As a result, substantially the entire area where the second pattern is drawn can be surrounded by the four matching positions 95. Consequently, substantially the entire area where the second pattern is drawn can be accurately aligned, and the drawing accuracy of the second pattern can be improved.

[0094] The number and arrangement of the matching positions 95 on the substrate 9 are not limited to those shown in FIGS. 8 and 9, and may be variously changed. For example, as shown in FIG. 17, in the partial drawing areas 94 located at the four corners among the plurality of partial drawing areas 94 arranged in a matrix, the relative positions of the matching positions 95 in each partial drawing area 94 with respect to each partial drawing area 94 (for example, relative coordinates with the corner on the (-X) side and (+Y) side of the partial drawing area 94 as the origin) may be the same. In the example shown in FIG. 17, in each of the four partial drawing areas 94, the matching position 95 is arranged adjacent to the corner on the (-X) side and (+Y) side of the partial drawing area 94.

[0095] In this case, in the data generation unit 115 of the drawing device 1, instead of extracting four extraction areas 96 corresponding to the four matching positions 95 respectively and generating four templates 97, one template 97 corresponding to the matching position 95 of one of the partial drawing areas 94 located at the four corners is generated. Then, the one template 97 is shared for the pattern matching at the matching positions 95 of each of the four partial drawing areas 94 by the position detection unit 113. Thereby, the time required for generating the template 97 can be shortened.

[0096] Also, in the initial setting unit 612 of the data processing device 6, a temporary matching position 95a is set only in one of the four partial drawing areas 94, and in the matching position determination unit 613, the matching position 95 within the one partial drawing area 94 is determined based on the temporary matching position 95a. For the remaining three partial drawing areas 94, the matching position 95 having the same relative position as the relative position of the matching position 95 with respect to the one partial drawing area 94 described above is determined by the matching position determination unit 613. That is, for the remaining three partial drawing areas 94, the temporary matching position 95a is not set, and the determination of the matching position 95 based on the temporary matching position 95a is also omitted. Thereby, the time required for creating the template generation information including the coordinates of the matching position 95 can be shortened.

[0097] Note that in the example shown in FIG. 17, the case where the matching positions 95 are arranged at the same positions within each of the partial drawing areas 94 in the partial drawing areas 94 located at the four corners among the plurality of partial drawing areas 94 has been described. However, even in the case where the matching positions 95 are arranged at the same positions within each of two or more partial drawing areas 94 regardless of the positions within the plurality of partial drawing areas 94, substantially the same effect is achieved.

[0098] That is, when the relative positions of the matching positions 95 within each of two or more partial drawing areas 94 with respect to each of the partial drawing areas 94 are the same among the plurality of partial drawing areas 94, the data generation unit 115 above generates one template 97 corresponding to the matching position 95 of one of the partial drawing areas 94 among the two or more partial drawing areas 94, and it is preferable that the one template 97 is shared for pattern matching at the respective matching positions 95 of the two or more partial drawing areas 94 by the position detection unit 113. Thereby, the time required for generating the template 97 can be shortened.

[0099] Further, the matching position determination unit 613 sets a temporary matching position 95a in one of the two or more partial drawing areas 94, and the matching position determination unit 613 determines the matching position 95 within the one partial drawing area 94 based on the temporary matching position 95a. Then, in another partial drawing area 94 among the two or more partial drawing areas 94, it is preferable to determine the matching position 95 such that the relative position with respect to the other partial drawing area 94 is the same as the relative position of the matching position 95 with respect to the one partial drawing area 94. Thereby, the time required for creating the template generation information can be shortened.

[0100] In the above description, in the determination of the matching position 95 in the data processing device 6, steps S22 to S25 are repeated until the non-existence of the overlapping area in the check area 952a is confirmed. However, the number of repetitions of steps S22 to S25 may be limited to a predetermined upper limit number or less. In this case, if the matching position 95 is not determined even when steps S22 to S25 reach the upper limit number, for example, a message to that effect is displayed on the display 607 (see FIG. 10) and notified to the designer. The designer checks the missing position of the matching position 95 on the substrate 9 (that is, the position where the matching position 95 was not determined). If it is determined that the influence of the missing position on the alignment process is small, the data processing device 6 is made to continue creating the template generation information with the matching position 95 missing. In this case, in the drawing device 1, pattern matching at the missing position is not performed.

[0101] On the one hand, if the designer determines that the influence of the missing position on the alignment process is significant, in the area near the missing position (for example, within a range of 5 mm square from the missing position), an appropriate position is determined as the matching position 95, and the coordinates of the matching position 95 are included in the template generation information. The above-mentioned appropriate position is a position where, when the position is set as the temporary matching position 95a, there is no overlapping area showing the same pattern as the temporary template area 951a in the check area 952a. The presence or absence of the overlapping area is determined by the designer through visual inspection or the like. In this way, by further including the coordinates indicating other matching positions 95 determined by the designer in the template generation information, it is possible to prevent the template 97 from being missing at important positions such as the corners of the drawing area on the substrate 9. As a result, it is possible to suppress a decrease in the accuracy of position detection of the substrate 9.

[0102] As described above, the drawing method for irradiating light on the substrate to draw a pattern includes a step of holding the substrate 9 on which the first pattern is previously provided on the upper surface 90 (step S11), a step of generating the template 97 used for position detection of the substrate 9 (step S12), a step of imaging a part of the first pattern (step S13), a step of detecting the position of the substrate 9 by performing pattern matching using the template 97 on the captured image obtained in step S13 (step S14), a step of rasterizing the second CAD data, which is the CAD data of the second pattern drawn on the first pattern, to generate the second raster data (step S15), and based on the second raster data and the position of the substrate 9 detected in step S14, irradiating the upper surface 90 of the substrate 9 with modulated light using the drawing head 41, and a scanning mechanism (in the above example, the stage moving mechanism 22) that relatively moves the substrate 9 in the scanning direction parallel to the upper surface 90 of the substrate 9 (in the above example, the Y direction) with respect to the drawing head 41. By controlling these, a step of executing the drawing of the second pattern on the substrate 9 that relatively moves in the scanning direction with respect to the drawing head 41 is provided (step S16).

[0103] Step S12 includes a step of preparing coordinates indicating a matching position 95 where pattern matching is performed on the first pattern (step S121), and a step of rasterizing the CAD data of the first pattern to create intermediate data, and generating, from the intermediate data, image data of a region of a predetermined size corresponding to the matching position 95 as a template 97 (step S122).

[0104] Step S121 includes a step of setting a provisional matching position 95a on the first pattern (step S21), setting a provisional template region 951a having the same size as the template 97 corresponding to the provisional matching position 95a, setting a check region 952a larger than the imaging field of view in step S13 centered on the provisional template region 951a, checking for the presence or absence of an overlapping region showing the same pattern as the provisional template region 951a in the check region 952a, and if the overlapping region exists, repeatedly moving the provisional matching position 95a in a predetermined direction to reset the provisional template region 951a and the check region 952a and check for the presence or absence of the overlapping region, and if the overlapping region does not exist, determining the provisional matching position 95a as the matching position 95 (steps S22 to S26), and a step of creating template generation information including coordinates indicating the matching position 95 determined in steps S22 to S26 (step S27). As a result, similar to the above, the template 97 can be generated easily and quickly, and the workload of the designer required for template generation can also be reduced.

[0105] In the above example, the program 609 related to the creation of template generation information is stored in advance in the drawing device 1, and the program 109 related to the generation of the template 97 is stored in advance in the computer 100 of the drawing device 1, but it is not limited to this. For example, the programs 109 and 609 may be retrofitted (i.e., introduced later) to an already used drawing system 5. In this case, when the program 609 is executed by the data processing device 6, a step of setting a temporary matching position 95a on the first pattern (step S21), setting a temporary template area 951a having the same size as the template 97 corresponding to the temporary matching position 95a, and setting a check area 952a larger than the imaging field of view of the imaging unit 3 centered on the temporary template area 951a, checking for the presence or absence of an overlapping area showing the same pattern as the temporary template area 951a in the check area 952a, and if the overlapping area exists, repeatedly moving the temporary matching position 95a in a predetermined direction to reset the temporary template area 951a and the check area 952a to check for the presence or absence of the overlapping area, and if the overlapping area does not exist, determining the temporary matching position 95a as the matching position 95 (steps S22 to S26), and a step of creating template generation information including coordinates indicating the matching position 95 determined in steps S22 to S26 (step S27) are executed.

[0106] Thereby, similarly to the above, the workload of the designer required for the generation of the template can be reduced. Further, when the program 109 is executed by the computer 100, the data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a predetermined size area (i.e., the extraction area 96) corresponding to the matching position 95 from the intermediate data as the template 97. Thereby, similarly to the above, the generation of the template 97 can be performed easily and quickly.

[0107] In the above-described drawing system 5, drawing method, and programs 109 and 609, various modifications are possible.

[0108] For example, in the above example, the case where a plurality of partial drawing regions 94 each partitioned into a substantially rectangular shape by grid-like division planned lines 93 are set on the upper surface 90 of the substrate 9 has been described. However, as shown in FIG. 18, on the upper surface 90 of the substrate 9, a plurality of partition regions 92 partitioned into a substantially rectangular shape by partition lines 91 are set, and a plurality of partial drawing regions 94 arranged in a matrix may be set in the same arrangement within each partition region 92. In this case, after the matching position is determined for one partition region 92 by the same operation as S21 to S26 described above, in another partition region 92, the matching position may be determined so as to be at the same position as the relative position of the matching position for the one partition region 92, and template generation information may be created. Thereby, compared with the case of calculating the matching position for all the partition regions 92, the time required for creating the template generation information can be shortened.

[0109] Also, for example, in the above example, the drawing on one main surface of the substrate 9 has been described. However, in the drawing apparatus 1, pattern drawing may be performed on both main surfaces of the substrate 9. In this case, also when drawing on the other main surface of the substrate 9, in the same manner as above, a template used for pattern matching is automatically created in the data processing apparatus 6 from the CAD data of the pattern previously formed on the other main surface.

[0110] In the above step S24, when there is an overlapping region that overlaps with the temporary template region 951a in the check region 952a, the moving direction of the temporary matching position 95a in step S25 is not limited to the X direction or the Y direction and may be changed in various ways. For example, the temporary matching position 95a may be moved in the X direction and the Y direction (i.e., diagonally). Alternatively, the temporary matching position 95a may be moved in a spiral shape centered on the initially set temporary matching position 95a.

[0111] The above-mentioned substrate 9 does not necessarily need to be provided with a plurality of partial drawing areas 94. Further, the substrate 9 is not necessarily limited to a printed circuit board. In the drawing apparatus 1, for example, drawing may be performed on a semiconductor substrate, a glass substrate for a flat panel display device such as a liquid crystal display device or an organic EL display device, a glass substrate for a photomask, a substrate for a solar cell panel, or the like.

[0112] The configurations in the above-described embodiments and each modification example may be appropriately combined as long as they do not conflict with each other.

Explanation of Reference Numerals

[0113] 1 Drawing apparatus 3 Imaging unit 5 Drawing system 6 Data processing apparatus 9 Substrate 21 Stage 22 Stage moving mechanism 41 Drawing head 90 (Upper surface of the) substrate 94 Partial drawing area 95 Matching position 95a Temporary matching position 96 Extraction area 97 Template 109, 609 The program 111 Storage unit 113 Position detection unit 114 Drawing control unit 115 Data generation unit 612 Initial setting unit 613 Matching position determination unit 614 Information creation unit 950a Temporary matching position sequence 951a Temporary template area 952a Check area S11~S16, S21~S29, S121~S122 Steps

Claims

1. A drawing system comprising: a drawing device that irradiates a substrate with light to draw a pattern; a data processing device that creates template generation information and sends it to the drawing device; and the drawing device includes: a stage that holds the substrate on which a first pattern is previously provided on an upper surface; a drawing head that irradiates the upper surface of the substrate with modulated light; a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; an imaging unit that images a part of the first pattern; a position detection unit that detects the position of the substrate by performing pattern matching using a template on an imaging image acquired by the imaging unit; a storage unit that stores second CAD data which is CAD data of a second pattern drawn on the first pattern; a data generation unit that rasterizes the second CAD data to generate second raster data; a drawing control unit that controls the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, thereby causing the drawing head to draw the second pattern on the substrate that relatively moves in the scanning direction; and the storage unit further stores the template generation information including coordinates indicating a matching position where pattern matching by the position detection unit is performed on the first pattern; the data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template; the data processing device includes: an initial setting unit that sets a provisional matching position on the first pattern; a matching position determination unit that sets a provisional template region having the same size as the template corresponding to the provisional matching position, sets a check region larger than the imaging field of view of the imaging unit centered on the provisional template region, checks for the presence of an overlapping region indicating the same pattern as the provisional template region in the check region, and if the overlapping region exists, repeatedly moves the provisional matching position in a predetermined direction to reset the provisional template region and the check region and check for the presence of the overlapping region, and if the overlapping region does not exist, determines the provisional matching position as the matching position; An information creation unit that creates the template generation information including coordinates indicating the matching position determined by the matching position determination unit; A drawing system characterized by comprising the above. **Claim 2** The drawing system according to claim 1, wherein a moving direction of the temporary matching position by the matching position determination unit when the overlapping region exists is the scanning direction. A drawing system characterized by this. **Claim 3** The drawing system according to claim 1 or 2, wherein the initial setting unit sets a group of temporary matching positions in which a plurality of temporary matching position columns, each of which is a set of temporary matching positions arranged in the scanning direction, are arranged at equal intervals in a width direction perpendicular to the scanning direction, and a pitch in the width direction of the plurality of temporary matching position columns is set to be a predetermined value or less. A drawing system characterized by this. **Claim 4** The drawing system according to claim 1 or 2, wherein the initial setting unit sets a group of temporary matching positions in which a plurality of temporary matching position columns, each of which is a set of temporary matching positions arranged in the scanning direction, are arranged at equal intervals in a width direction perpendicular to the scanning direction, and the number of the plurality of temporary matching position columns is set to be a predetermined number. A drawing system characterized by this. **Claim 5** The drawing system according to any one of claims 1 to 4, wherein on the upper surface of the substrate, a plurality of partial drawing regions are set to be arranged in a matrix in the scanning direction and a width direction perpendicular to the scanning direction, and the same pattern is drawn on each of them, the initial setting unit sets a temporary matching position in one of the plurality of partial drawing regions, the matching position determination unit determines a matching position in the one partial drawing region based on the temporary matching position, and in another partial drawing region among the plurality of partial drawing regions, determines a matching position so that a relative position with respect to the other partial drawing region becomes the same as a relative position of the matching position with respect to the one partial drawing region. A drawing system characterized by this. **Claim 6** The drawing system according to any one of claims 1 to 4, wherein on the upper surface of the substrate, a plurality of partial drawing regions are set to be arranged in a matrix in the scanning direction and a width direction perpendicular to the scanning direction, In the partial drawing area on one side in the scanning direction and one side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on one side in the scanning direction and one side in the width direction. In the partial drawing area on one side in the scanning direction and the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on one side in the scanning direction and the other side in the width direction. In the partial drawing area on the other side in the scanning direction and one side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the other side in the scanning direction and one side in the width direction. A drawing system, wherein in the partial drawing area on the other side in the scanning direction and the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is arranged adjacent to the corner on the other side in the scanning direction and the other side in the width direction.

7. A drawing system according to any one of Claims 1 to 6, wherein the data processing device clips partial data, which is CAD data corresponding to a predetermined area including the matching position in the first pattern, and sends it to the drawing device. A drawing system, wherein in the data generation unit of the drawing device, only the partial data is rasterized to create the intermediate data.

8. A drawing system according to Claim 7, wherein a plurality of partial drawing areas are set in a matrix on the upper surface of the substrate in the scanning direction and in a width direction perpendicular to the scanning direction. A drawing system, wherein the partial data corresponds to a partial drawing area including the matching position.

9. A drawing system according to any one of Claims 1 to 8, wherein the template generation information further includes coordinates indicating other matching positions determined by a designer.

10. A drawing method for irradiating a substrate with light to draw a pattern, comprising: a) a step of holding a substrate having a first pattern previously provided on an upper surface; b) a step of generating a template used for detecting the position of the substrate; c) a step of imaging a part of the first pattern; d) detecting the position of the substrate by performing pattern matching on the captured image obtained in the step c) using the template; e) generating second raster data by rasterizing second CAD data which is CAD data of a second pattern drawn on the first pattern; f) based on the second raster data and the position of the substrate detected in the step d), controlling a drawing head that irradiates modulated light onto the upper surface of the substrate, and a scanning mechanism that relatively moves the substrate in a scanning direction parallel to the upper surface of the substrate with respect to the drawing head, thereby causing the drawing head to execute drawing of the second pattern on the substrate that relatively moves in the scanning direction; comprising; the step b) b1) preparing template generation information including coordinates indicating a matching position where the pattern matching is performed on the first pattern; b2) rasterizing the CAD data of the first pattern to create intermediate data, and generating, from the intermediate data, image data of a region having a predetermined size corresponding to the matching position as the template; comprising; the step b1) b3) setting a provisional matching position on the first pattern; b4) setting a provisional template region having the same size as the template corresponding to the provisional matching position, setting a check region larger than the imaging field of view in the step c) with the provisional template region as the center, checking for the presence of an overlapping region showing the same pattern as the provisional template region in the check region, and if the overlapping region exists, repeatedly moving the provisional matching position in a predetermined direction to reset the provisional template region and the check region and check for the presence of the overlapping region, and if the overlapping region does not exist, determining the provisional matching position as the matching position; b5) creating the template generation information including coordinates indicating the matching position determined in the step b4); A drawing method characterized by comprising the above.

11. A program executed in a drawing system that irradiates light onto a substrate to perform pattern drawing, the drawing system a drawing device that irradiates light onto a substrate to perform pattern drawing; A data processing device that creates template generation information and sends it to the drawing device, comprising: The drawing device includes a stage that holds a substrate on which a first pattern is provided in advance on the upper surface, a drawing head that irradiates modulated light onto the upper surface of the substrate, a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate, an imaging unit that images a part of the first pattern, a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit, a storage unit that stores second CAD data, which is CAD data of a second pattern drawn on the first pattern, a data generation unit that rasterizes the second CAD data to generate second raster data, and a drawing control unit that controls the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, thereby causing the drawing head to draw the second pattern on the substrate that relatively moves in the scanning direction. comprising: When the program is executed by a computer, g) a step of setting a temporary matching position on the first pattern; h) setting a temporary template region having the same size as the template corresponding to the temporary matching position, setting a check region larger than the imaging field of view of the imaging unit with the temporary template region as the center, checking for the presence of an overlapping region showing the same pattern as the temporary template region in the check region, and if the overlapping region exists, repeatedly moving the temporary matching position in a predetermined direction to reset the temporary template region and the check region and check for the presence of the overlapping region, and if the overlapping region does not exist, determining the temporary matching position as a matching position where the pattern matching is performed on the first pattern; i) a step of creating the template generation information including coordinates indicating the matching position determined in step h); is executed in the data processing device. j) A step of rasterizing the CAD data of the first pattern to create intermediate data, and generating, from the intermediate data, image data of a region having a predetermined size corresponding to the matching position as the template is executed in the data generation unit of the drawing device. A program characterized by this.

Images