Chamber for Coating Components by Atomic Layer Deposition
The reactor design with ALD process addresses the high cost and long cycle time of batch coating by enabling rapid and efficient coating of reactor components, significantly reducing manufacturing costs and cycle times.
Patent Information
- Application Number
- JP2024515651
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2021-09-09
- Filing Date
- 2022-09-06
- Publication Date
- 2025-07-15
- Estimated Expiration
- 2042-09-06
AI Technical Summary
The high cost and long cycle time associated with batch coating processes for reactor components, such as gas distribution plates and showerheads, in microelectronic device manufacturing, despite the advantage of coating multiple parts simultaneously.
A reactor design for component coating using an atomic layer deposition (ALD) process, featuring a lower body and lid assembly with heaters, coolant channels, gas passages, and independent plenums, allowing for rapid and efficient coating of individual components.
Reduces the cycle time and cost for manufacturing coated components by an order of magnitude, improving throughput and reducing the cost per unit of coated parts.
Smart Images

Figure 0007708968000001 
Figure 0007708968000002 
Figure 0007708968000003
Abstract
Description
Technical Field
[0001] Embodiments of the present disclosure generally relate to apparatuses and techniques for coating components.
Background Art
[0002] Many microelectronic device manufacturing processes are carried out in reactors having coated parts or components. Such coated components can provide one or more advantages, such as reducing contamination of substrates placed in the reactor during processing, improving process results, and improving chamber operation time until maintenance is required. The inventors have observed that the cost of coating reactor parts, such as gas distribution plates, showerheads, etc., can be very high. For example, conventionally, such parts are coated in a batch reactor that can hold, for example, about 2 to 8 plates per batch. However, the coating process can take about 3 to 8 days per batch, depending on the specific part configuration and the desired coating applied. Thus, despite having the advantage of coating multiple parts at once, the cost per unit of such coated parts remains high.
[0003] Accordingly, the inventors have provided improved apparatuses and techniques for coating reactor components.
Summary of the Invention
[0004] A method and apparatus for coating reactor components are provided herein. In some embodiments, a reactor for component coating includes a lower body and a lid assembly that together define and surround an internal volume; one or more heaters disposed within the lid assembly; one or more coolant channels disposed within the lid assembly for flowing a heat transfer medium; a plurality of gas passages disposed through the lid assembly to facilitate the supply of one or more gases to the internal volume, the plurality of gas passages including a plurality of fluidically independent plenums disposed within the lid assembly; and one or more mounting brackets for facilitating the connection of a workpiece to the lid assembly.
[0005] In some embodiments, a reactor for component coating includes a lower body and a lid assembly that together define and surround an internal volume; one or more heaters disposed within the lid assembly; one or more coolant channels disposed within the lid assembly for flowing a heat transfer medium; a plurality of gas passages disposed through the lid assembly to facilitate the supply of one or more gases to the internal volume, the plurality of gas passages including a plurality of fluidically independent plenums disposed within the lid assembly; another heat conduction choke provided within the lid assembly to promote reduction of heat transfer from an upper central portion of the lid assembly above the internal volume; one or more mounting brackets for facilitating the connection of a workpiece to the lid assembly; a central opening formed through the lower body to receive a shaft of a pedestal heater; and a pedestal hub connected to a bottom plate of the lower body and surrounding and enclosing the shaft of the pedestal heater during installation.
[0006] In some embodiments, a method of coating a component by atomic layer deposition includes fixing a workpiece to be coated to a portion facing the internal volume of a component coating reactor; and performing an ALD process on the fixed workpiece within the component coating reactor. In some embodiments, the workpiece is a showerhead. In some embodiments, the workpiece is a substrate support pedestal, such as a pedestal heater, configured to support a planar substrate.
[0007] Other embodiments and further embodiments of the present disclosure will be described below.
[0008] The embodiments of the present disclosure briefly summarized above and described in more detail below can be understood by reference to the exemplary embodiments of the present disclosure shown in the accompanying drawings. However, since the present disclosure may admit other equally effective embodiments, the accompanying drawings illustrate only the typical embodiments of the present disclosure and should not be regarded as limiting the scope.
Brief Description of the Drawings
[0009]
Figure 1
Figure 2
Figure 3
Figure 4
Figure 5
Figure 6
Figure 7
Figure 8
Figure 9
Figure 10
Figure 11
Figure 12
Figures 13A-C
Figure 14
DETAILED DESCRIPTION OF THE INVENTION
[0010] For ease of understanding, where possible, the same reference numbers are used to denote the same elements common to the drawings. The figures are not drawn to scale and may be simplified for clarity. The elements and features of one embodiment can be beneficially incorporated into other embodiments without further description.
[0011] Embodiments of a reactor for component coating are provided herein. In some embodiments, the reactor for component coating is configured to deposit a material on a component using an atomic layer deposition (ALD) process. The methods and apparatuses of the present disclosure advantageously reduce the cycle time and cost for manufacturing coated components by an order of magnitude.
[0012] FIG. 1 is a schematic side view of a component coating reactor according to some embodiments of the present disclosure. As shown in FIG. 1, a component coating system 100 having a component coating reactor 102 disposed on a support 104 is shown. The support 104 is illustratively shown as including a frame assembly 106. The frame assembly 106 is shown as having wheels, but alternatively or additionally, the frame assembly 106 can include leveling feet, stabilization brackets, or other elements for supporting the component coating reactor 102. In some embodiments, the frame assembly 106 can be omitted and the component coating reactor 102 can be placed or mounted on some other type of support 104, such as, for example, a base, a transfer chamber of a cluster tool, a component handling system for supplying and retrieving components to / from the component coating reactor 102, etc.
[0013] A cover 138 can be provided to enclose the component coating reactor 102. The cover 138 can be disposed on the support 104 or otherwise coupled to the component coating reactor 102. The cover 138 can include a plurality of openings for facilitating the flow of air therethrough to cool the component coating reactor 102. A fan 140 can be provided to enhance air cooling outside the component coating reactor 102.
[0014] The reactor 102 for component coating generally includes a lower body 108 and a lid assembly 110 that together define and surround an internal volume 112. The internal volume can be small, such as from about 1 to about 1.5 liters. Each of the lower body 108 and the lid assembly 110 can include cavities formed in opposing faces of the components that together define the internal volume 112 when the lower body 108 and the lid assembly 110 are assembled together. For example, the lower body 108 can include a bottom plate 182 and a side wall 184 that extends upward from the bottom plate 182 and partially surrounds the internal volume 112. Similarly, the lid assembly 110 can include an upper plate 178 and a side wall 180 that extends downward from the upper plate 178 and partially surrounds the internal volume 112. In some embodiments, each of the side walls 180, 184 can have the same or substantially the same dimensions (e.g., the diameter of a circular chamber configuration) that define the internal volume 112. In some embodiments, the dimensions (e.g., the inner diameter) of the entire internal volume 112 within the side walls 180, 184 are from about 14 to about 20 inches. In some embodiments, the lid assembly 110 and the lower body 108 can be connected together, for example, by clamping, bolting, screwing, etc. For example, as shown in FIGS. 3, 7, and 12, a plurality of holes 308 can be provided to connect the lid assembly to the lower body using bolts, for example, that extend to corresponding threaded holes in the lower body 108. In some embodiments, the holes 308 can be countersunk to receive the heads of corresponding bolts, screws, etc. The plurality of holes 308 can be arranged, for example, to prevent leakage of gas supplied to the internal volume 112 so as to provide a uniform seal between the lid assembly 110 and the lower body 108. A lift system (not shown) can be provided to lift the lid assembly 110 to facilitate insertion and removal of the workpiece to be coated or for other maintenance or operations that require access to the internal volume 112. The lid assembly 110 and the lower body can be manufactured from any suitable process-compatible material such as aluminum, stainless steel, etc.
[0015] The lid assembly 110 includes one or more heaters 132. In the embodiment shown in FIG. 1, two annular heaters 132 are shown. The one or more heaters 132 can be connected to a heater power supply 160. In some embodiments, the one or more heaters 132 include ring-shaped heaters disposed in an annular channel on the upper surface of the lid assembly 110 (e.g., the top surface of the upper plate 178). For example, as best shown in FIGS. 2-3 and 8, the one or more heaters 132 are disposed within an annular channel formed in the upper surface of the lid assembly 110. To hold the heaters within the annular channel, an annular cap 212 can be disposed over each of the one or more heaters 132. In some embodiments, the annular cap 212 can span over the one or more heaters 132 and the one or more coolant channels 134 that can be disposed within the lid assembly 110. As shown in FIGS. 3, 7, and 12, a plurality of receptacles 306 are formed in the upper surface of the lid assembly 110 to receive corresponding protrusions 702 from the annular cap 212. The annular cap 212 can be secured to the upper plate 178 of the lid assembly 110, for example, by a plurality of fasteners 704 (e.g., bolts, screws, etc.).
[0016] Returning to FIG. 1, the thermostat 162 can be disposed within the lid assembly 110 or connected to the lid assembly 110 to monitor the temperature of the lid assembly 110 and, in some embodiments, to facilitate feedback control of the temperature during use. The thermostat 162 can be provided at any suitable location for monitoring the temperature of the lid assembly 110, such as on the side of the lid assembly 110 (as shown in FIG. 1) or on the top surface of the lid assembly 110 (as shown in FIGS. 2 and 7).
[0017] To flow a heat transfer medium, one or more coolant channels 134 can be provided in at least one of the lower body 108 or the lid assembly 110. For example, a coolant source 142 can be connected to the one or more coolant channels 134 to circulate the coolant. In some embodiments, as shown, for example, in FIG. 8, the one or more coolant channels 134 are disposed only within the lower body 108 and not in the lid assembly 110. In some embodiments, as shown, for example, in FIG. 2, the one or more coolant channels 134 can include a first coolant channel formed in the upper part of the lid assembly 110, and a cap 214 can be disposed over the first coolant channel. In some embodiments, for example, when the one or more heaters 132 include a pair of heaters 132, at least one (and in some embodiments all) of the one or more coolant channels 134 can be disposed between the pair of heaters 132. In some embodiments, as shown, for example, in FIG. 3, the one or more coolant channels 134 can be a single annular channel having an inlet 302 and an outlet 304 connected to a coolant source such as the coolant source 142 shown in FIG. 1 for circulating the coolant through the coolant channel 134 (e.g., a single annular channel). In some embodiments, the coolant source 142 and the coolant channel 134 are configured to maintain the temperature of the lid assembly 110 between about 50 degrees Celsius and about 75 degrees Celsius.
[0018] In some embodiments, one or more coolant channels 236 can be provided in the lower body 108 for flowing a heat transfer medium. For example, a coolant source 142 can be connected to the one or more coolant channels 236 to circulate the coolant. Alternatively, the one or more coolant channels 236 can be connected to different coolant sources (not shown). In some embodiments, the coolant source 142 (or other different supply source) and the coolant channels 236 are configured to maintain the temperature of the lower body 108 at about 50 degrees Celsius to about 75 degrees Celsius. The small volume and configuration of the coolant channels 134, 236 advantageously facilitate the rapid cooling of the parts coating reactor 102, remove the completed workpieces, load new workpieces to be coated, and thus improve throughput.
[0019] Returning to FIG. 1, the lid assembly 110 includes a plurality of gas passages 136 disposed therein to facilitate the supply of one or more gases to the internal volume 112 of the parts coating reactor 102. A gas source 114 is fluidly connected to the internal volume 112 via a plurality of conduits 116 connected to the plurality of gas passages 136 to supply a process gas to the internal volume 112 during an operation such as an ALD operation for coating a workpiece (or part) disposed within the internal volume 112, as described below. For example, the gas source can include a high-speed pulse valve, a purge valve, etc. for supplying a precursor ampoule, one or more inert gases, and deposition gases, carrier gases, purge gases, etc. to perform an ALD process to coat a workpiece. For example, as shown in FIG. 1, for supplying three different gases such as a first precursor, a second precursor, and an inert gas to the internal volume 112, a first conduit 118, a second conduit 120, and a third conduit 122 can be provided. The first conduit 118, the second conduit 120, and the third conduit 122 can be connected to the internal volume 112 via the lid assembly 110, for example, via the plurality of gas passages 136 (as discussed in detail below) and / or via the central opening 121.
[0020] In a non-limiting example, the coating formed can be an aluminum oxide (Al2O3) coating. In such an embodiment, for example, the gas source can be configured to supply a deposition gas (e.g., a precursor gas) containing trimethylaluminum (TMA) and water (H2O) together with an inert gas such as nitrogen (N2) or a noble gas such as argon (Ar). Other ALD deposited films can be obtained in the same manner, and without limitation, for example, films having basic formulas such as MOx, MOxFy, MFx, SiOx, SiCx, SiN, M1M2Ox, etc., where M is a metal, M1 is a first metal, and M2 is a second metal different from the first metal. Such films can be deposited using appropriate ALD precursors and deposition processes within the apparatus described herein.
[0021] In some embodiments, the component coating reactor 102 is configured to supply one or more process gases in a dispersed manner. For example, in some embodiments, the component coating reactor 102 is configured to supply one or more process gases to a plurality of zones of the internal volume 112. For example, the lid assembly 110 can include a plurality of fluidically independent plenums each connected to a gas source 114. Each of the fluidically independent plenums is configured to provide one or more process gases to a specific zone of the internal volume 112, and at least some of the specific zones are different from each other. The fluidically independent plenums advantageously provide gas separation and prevent unwanted reactions and / or depositions within the conduits or the lid assembly 110.
[0022] For example, as shown in FIG. 2, the lid assembly 110 can include an outer annular plenum 208 and one or more inner annular plenums 210. The outer annular plenum 208 facilitates the supply of one or more gases to the peripheral region of the internal volume 112 and to the peripheral region of the workpiece to be coated. In some embodiments, for example, an inert gas can be supplied to the outer annular plenum 208 to prevent deposition on the peripheral edge of the workpiece and / or the peripheral edge of the internal volume 112. In the embodiment shown in FIG. 2, two inner annular plenums 210 are shown. The inner annular plenum facilitates the supply of one or more gases, such as different deposition gases or precursor gases for an ALD process, to a more radially inner portion of the internal volume closer to the region of the workpiece to be coated.
[0023] The annular plenum can be formed, for example, by respective annular channels disposed on the top surface of the upper plate 178. A cap 246 can be disposed over each channel to define each plenum. To fluidly connect the plenum to the internal volume 112, a plurality of holes 248 can be provided in each plenum, for example, along the bottom surface of the plenum. The plurality of holes 248 can be sized and arranged to provide an appropriate gas flow from the plenum to the internal volume 112. In some embodiments, the plurality of holes 248 can be arranged equidistantly or substantially equidistantly along the plenum. In some embodiments, the plurality of holes 248 can be arranged in sets of holes, and the holes in each set can be arranged equidistantly or substantially equidistantly along the plenum.
[0024] Each of the plenums can be connected to the gas source 114 via a different one of the first, second, or third conduits 118, 120, 122. For example, the first annular plenum 210A of the one or more inner annular plenums 210 can be connected to the gas source 114 via the first conduit 118. The second annular plenum 210B of the one or more inner annular plenums 210 can be connected to the gas source 114 via the second conduit 120. The outer annular plenum 208 can be connected to the gas source 114 via the third conduit 122.
[0025] As best shown in FIGS. 2 and 7, the first conduit 118 can be connected to one of the inner annular plenums 210 (e.g., 210A) via a plurality of legs 202 (e.g., the first plurality of legs). Similarly, the second conduit 120 can be connected to a different one of the inner annular plenums 210 (e.g., 210B) via a different plurality of legs 204 (e.g., the second plurality of legs). Similarly, the third conduit 122 can be connected to the outer annular plenum 208 via a different plurality of legs 206 (e.g., the third plurality of legs). Each of the plurality of legs 202, 204, 206 can be connected to the respective inner annular plenums 210A, 210B, and outer annular plenum 208 via respective inlets along the plenum, as described with respect to FIG. 5, for example.
[0026] In some embodiments, one or more of the first conduit 118, the second conduit 120, or the third conduit 122 can be connected to the respective plenum at a plurality of positions along the plenum. The plurality of positions can be two or more positions, three or more positions, four or more positions, etc. For example, as shown in FIG. 7, the plurality of positions can be six positions.
[0027] In some embodiments, at least one of the first conduit 118, the second conduit 120, or the third conduit 122, and in some embodiments all of them, are connected azimuthally symmetrically to their respective plenums. In some embodiments, each of the positions within each plenum is equally spaced from adjacent positions within each plenum. In some embodiments, none of the plurality of positions are radially aligned with each other. For example, as best shown in FIG. 7, each plenum includes a plurality of inlets (e.g., the openings 510 shown in FIG. 5) that can be equally spaced from each other. Each of the inlets of each plenum can be angularly offset from each other. In some embodiments, each plenum has an equal number of inlets.
[0028] In some embodiments, at least one of the length, residence time, or conductance can be equal or substantially equal from the gas source 114 to each respective plenum. For example, in embodiments where the conduits are routed to the plenum at multiple locations, one or more of the distance from the gas source, or the residence time the gas travels through the conduit, or the overall conductance of the conduit can be equal or substantially equal. As used herein, substantially equal means within about 10% of each other, or in some embodiments within about 5% of each other. For example, in embodiments consistent with FIGS. 2 and 7, each of the first, second, and third conduits 118, 120, 122 can be divided at joints vertically aligned along the central axis of the internal volume 112 and / or the lid assembly 110 into respective ones of the plurality of legs 202, 204, 206. Additionally, the individual legs within each of the plurality of legs 202, 204, 206 can have equal or substantially equal lengths and / or conductances. Additionally, the individual legs within each of the plurality of legs 202, 204, 206 can have equal or substantially equal angular spacing (e.g., such that the locations where the legs are connected to each respective annular plenum are equally or substantially equally spaced). In some embodiments, the legs within a common one of the plurality of legs 202, 204, 206 have a horizontal portion disposed in a common plane and a vertical portion extending from the common plane to the lid assembly 110, and the legs within different ones of the plurality of legs 202, 204, 206 have respective horizontal portions disposed in different planes. Alternatively, the legs within a common one of the plurality of legs 202, 204, 206 are disposed in a common space, while the legs within different ones of the plurality of legs 202, 204, 206 are disposed in different spaces (e.g., the common legs are grouped and spaced apart from other groups of the other legs).
[0029] Each of the first, second, or third conduits 118, 120, or 122 can be connected to a respective plenum via a fixture 250 disposed at an end of each conduit and aligning the conduit with an inlet to the plenum. For example, as shown in FIG. 2, the fixture 250 is disposed at an end of each of the plurality of legs 202, 204, 206. As shown in more detail in FIG. 5, the body 502 of the fixture 250 can be connected to an end of the first conduit 118 (or its leg 202). The through-hole 504 extends through the body in alignment with the first conduit 118 (or its leg 202). A flange 506 can be provided at an end of the body 502 opposite the conduit, and the flange 506 can include one or more openings 508 to facilitate connection of the fixture to the lid assembly 110 through a mating opening of the lid assembly 110. At the location where the conduit is connected to the plenum, the cap 246 includes an opening 510 (e.g., a plenum inlet) aligned with the through-hole 504 of the fixture 250 to fluidly connect the conduit to the plenum.
[0030] Referring again to FIG. 1, in some embodiments, a remote plasma source (RPS) 127 can be connected to the internal volume 112, for example, through a central opening 121 of the lid assembly 110, to facilitate cleaning of the component coating reactor 102 as needed. Alternatively or in combination, a gas source 114 can be connected to the internal volume 112 (e.g., via the first conduit 118, the second conduit 120, and the third conduit 122) through the central opening 121. For example, as shown in FIG. 2, the central opening 121 can be connected to a gas source 240. The gas source 240 can include one or more of the gas source 114 or the RPS 127. In some embodiments, the central opening is connected to the gas source 240 via a cap 252. In some embodiments, the cap 252 can be configured similarly to the cap 246 described above.
[0031] In some embodiments, one or more mounting brackets 156 are provided to facilitate connecting a workpiece or component to be coated, such as workpiece 158, to lid assembly 110. In some embodiments, workpiece 158 partially defines the processing volume portion of internal volume 112. For example, in some embodiments, workpiece 158 can be a showerhead, a gas distribution plate (or panel), etc. In such embodiments, workpiece 158 includes a bottom plate having a peripheral lip extending from the bottom plate, and a central recess can be defined within the peripheral lip. A plurality of gas distribution holes 220 are disposed through the bottom plate to facilitate the flow of gas from the central recess through the bottom plate and into the space on the opposite side of the bottom plate (e.g., into the processing volume of the chamber where the showerhead is installed). Workpiece 158 can be connected to lid assembly 110 such that the lower surface of the workpiece (such as the bottom plate of the showerhead) is spaced from the support surface of pedestal heater 124 disposed within component coating reactor 102 by about 1 to about 5 mm, such as about 3 mm. The showerhead (e.g., the workpiece) can include a plurality of openings that penetrate the bottom plate radially outside of the peripheral lip to facilitate connecting the workpiece to lid assembly 110 via mounting brackets 156.
[0032] For example, in some embodiments, one or more mounting brackets 156 can be a plurality of posts, such as post 244 shown in FIG. 2. In some embodiments, as shown in FIG. 2, workpiece 158 is a showerhead and can be connected to lid assembly 110 via a plurality of posts 244. Post 244 can be inserted, for example, into existing mounting holes of workpiece 158 and includes through holes for bolting the workpiece to mating threaded openings of lid assembly 110.
[0033] Referring further to FIG. 2, in some embodiments, the spacer 218 can be provided to facilitate maintaining a gap between the workpiece 158 and the lid assembly 110. The gap between the workpiece 158 and the lid assembly 110 promotes the flow of gas therebetween, such as the flow of gas on the surface of the workpiece 158 during use. In some embodiments, the spacer 218 can be configured to align with the workpiece 158. For example, the spacer 218 can include features that interface with corresponding features of the workpiece 158, such as the periphery of the workpiece 158. For example, in embodiments where the workpiece 158 is circular, the spacer 218 can be an annular ring having a radially outer lip such that the spacer 218 is disposed over the workpiece along the periphery of the workpiece and the radially outer lip can extend along the sidewall of the workpiece 158. The spacer 218 can further facilitate the formation of a seal between the workpiece 158 and the lid assembly 110 such that the gas supplied to the internal volume 112 flows substantially toward and over the surface of the workpiece 158 disposed radially inward of the spacer 218 rather than around the radially outer surface of the workpiece 158. In some embodiments, the spacer is made of polyetheretherketone (PEEK), aluminum, or an aluminum alloy (such as AL6061 or AL1005), or similar materials.
[0034] In some embodiments, the component coating reactor 102 is configured to coat workpieces of a given size. For example, if the workpiece 158 is a showerhead, the showerhead can be configured for use within a processing chamber configured to process substrates of a given size. For example, the workpiece 158 can be a showerhead configured to process semiconductor wafers, such as semiconductor wafers having a diameter of 150 mm, 200 mm, 300 mm, or rectangular substrates for solar, display, or other applications. Accordingly, the spacer 218 has a size such that the spacer 218 is disposed between the outer annular plenum 208 and the one or more inner annular plenums 210. During operation, for example, a processing gas (e.g., a deposition gas) for a deposition process, such as an ALD deposition process, can be supplied to the one or more inner annular plenums 210 (or via the central opening 121), while an inert gas, such as argon, can be supplied to the outer annular plenum 208. Accordingly, the processing gas supplied to the one or more inner annular plenums 210 (or via the central opening 121) flows over the surface radially inward (with respect to the spacer 218) of the workpiece 158 and through the openings (such as the gas distribution holes 220) of the workpiece 158 to coat the workpiece with material from the deposition process. The processing gas supplied to the one or more inner annular plenums 210 (or through the central opening 121) is substantially prevented from flowing radially outward of the spacer 218 and over the surface radially outward (with respect to the spacer 218) of the workpiece 158. Similarly, a gas, such as an inert gas supplied to the outer annular plenum 208, flows over the surface radially outward of the workpiece 158 and is substantially prevented from flowing over the surface radially inward of the workpiece 158. The inert gas supplied to the outer annular plenum 208 further limits or prevents the deposition of material along the outer sidewalls of the lid assembly 110. Diagrams of the gas flow into the component coating reactor 102 are indicated by the arrows shown in FIGS. 2, 8, and 5. Diagrams of the gas flow out of the component coating reactor are indicated by the arrows in FIGS. 2 and 6.
[0035] The spacers 218 shown in FIGS. 2 and 5 are exemplary, and the spacers can have other configurations based on the geometric shape of the workpiece 158 and / or based on the geometric shape of the lid assembly 110. For example, FIGS. 13A-13C show three non-limiting examples of spacers suitable for use in accordance with the present disclosure. As shown in FIG. 13A, a spacer 1300A having a configuration similar to the spacer 218 shown in FIG. 2 is shown. The spacer 1300A has an annular body having a form factor suitable for closely surrounding the workpiece 158 during installation. The annular body includes a flat disk 1302 having an outer lip extending downward from the outer edge of the flat disk 1302. For example, in use, the flat disk 1302 can be disposed on the workpiece 158 with the outer lip 1304 extending downward along the side surface of the workpiece 158. Thus, the spacer 1300A defines the distance between the workpiece 158 and the lid assembly 110 or partially defines the internal housing between the workpiece 158 and the lid assembly 110 and prevents or restricts the radially outward gas flow through the spacer 1300A.
[0036] As shown in FIG. 13B, a spacer 1300B having a configuration similar to that of the spacer 818 shown in FIG. 8 is shown. The spacer 1300B has an annular body 1306 having a diameter smaller than that of the workpiece 158 during installation. The annular body 1306 can have an axially elongated side wall corresponding to an axis extending centrally through the opening of the annular body 1306. For example, in use, the annular body 1306 can be disposed on the workpiece 158, for example, within a groove (such as an O-ring groove) disposed on the workpiece 158. In some embodiments, the annular body 1306 can similarly interface with an annular groove disposed within the lid assembly 110 (as shown, for example, in FIG. 8). Thus, the spacer 1300B defines the distance between the workpiece 158 and the lid assembly 110 or partially defines an inner housing between the workpiece 158 and the lid assembly 110, preventing or restricting the radially outward gas flow passing through the spacer 1300B. In some embodiments, as shown in FIG. 13C, the spacer 1300C can be provided in the same manner as the spacer 1300B, but can further include an annular protrusion or rib 1308 extending from the annular body 1306 to enhance the structural integrity of the spacer 1300C.
[0037] Returning to FIG. 1, in some embodiments, the liner 157 is provided to surround a workpiece or component (e.g., the workpiece 158) to be coated in order to protect the lid assembly 110. The liner 157 can have any suitable shape for surrounding the workpiece 158 and protecting the inner wall of the lid assembly 110 (e.g., the outer periphery of the internal volume adjacent to the lid assembly). For example, to surround the workpiece and fill the void or space between the workpiece and the side wall of the component coating reactor 102, such as the side wall of the lid assembly 110, the general shape of the inner periphery of the liner can be configured to surround a workpiece having a given shape or size.
[0038] In some embodiments, as shown in FIG. 4, the liner 157 can have an annular body 402 having a plurality of alternating flat surfaces 406 and recessed portions 408 along the inner wall of the annular body 402. The plurality of openings 404 can be provided through the annular body 402 to facilitate connection of the liner 157 to the bottom surface of the lid assembly 110. The liner 157 can be manufactured from any process-compatible material such as aluminum.
[0039] In some embodiments, as shown in FIG. 11, the liner 157 and the mounting bracket 156 can be joined into a single component. For example, in such an embodiment, the liner 157 can have an annular body 402 provided with a plurality of openings 404 passing through the annular body 402 to facilitate connection of the liner 157 to the bottom surface of the lid assembly 110. The liner 157 further includes a plurality of openings 1102 configured to receive fasteners such as set screws, grub screws, etc. to secure the liner 157 to the workpiece 158 and thus secure the workpiece 158 to the lid assembly 110. The plurality of openings 404 can be provided in a raised portion 1104 (e.g., a protrusion) that provides a standoff of the liner 157 such that a gap (e.g., the gap 1010 shown in FIG. 10) is defined between the upper surface 1108 of the annular body 402 and the lower surface of the lid assembly 110. The gap facilitates the flow of gas around the liner 157 for exhaust. A recessed portion 1106 can be provided on the opposite side of each raised portion 1104 to facilitate receipt of the head of the fastener passing through each opening 404 of the annular body 402. The liner 157 can include a plurality of through holes 1110 formed through the side wall of the annular body that further facilitate the flow of gas around the liner 157 and towards the exhaust port.
[0040] Returning to FIG. 1, the lower body 108 is sized and configured to receive the pedestal heater 124. For example, the lower body 108 can include an opening 126 formed through the bottom plate 182 to receive the shaft of the pedestal heater 124 (e.g., the shaft 228 shown in FIG. 2). A pedestal hub 128 can be coupled to the bottom plate 182 to surround and enclose the shaft of the pedestal heater 124. In some embodiments, the shaft of the pedestal heater 124 can be coupled to and supported by the pedestal hub 128 such that the bottom surface of the pedestal heater 124 is disposed above and opposed to the top surface of the bottom plate 182 of the lower body 108. For example, as shown in FIG. 6, one or more openings 610 can be provided through the pedestal hub 128 to secure the shaft 228 of the pedestal heater 124 to the pedestal hub 128. Returning to FIG. 1, the pedestal heater power supply 130 is coupled to a heater electrode 125 disposed within the pedestal heater 124, e.g., via the pedestal hub 128, to supply power to the pedestal heater 124 during use. The heater electrode 125 can be configured with one zone, or multiple zones such as two zones. In some embodiments, the pedestal heater 124 is configured to heat at a rate of up to about 5 degrees Celsius per minute to a maximum of about 600 degrees Celsius (e.g., in the range of about 100 to about 600 degrees Celsius, or about 200 to about 500 degrees Celsius).
[0041] As shown in more detail in FIG. 2, the pedestal heater 124 can include a heater plate 238 and a central shaft 228. The heater plate 238 includes heater electrodes 125 and can include a substantially flat upper surface. In some embodiments, the heater plate can be configured to support a planar substrate, such as a semiconductor wafer. In some embodiments, the heater plate 238 can include a flat or substantially flat raised upper surface and a substantially flat ledge disposed radially outward of the raised upper surface. The pedestal heater 124 can have a diameter larger than the workpiece 158 to be coated. For example, the pedestal heater 124 can have a diameter at least larger than the inner diameter of the liner 157. In some embodiments, the pedestal heater 124 can have a diameter from about 500 to about 600 mm.
[0042] The lower body 108 is sized to define a small gap between the pedestal heater 124 and the internal volume 112 facing the surface of the lower body 108. For example, a first gap 258 is formed between the inner surface of the side wall 184 and the outer peripheral edge of the heater plate 238. In some embodiments, the first gap 258 can be from about 2 to about 4 mm, such as about 3 mm. A second gap 260 is formed between the upper surface of the bottom plate 182 and the opposing lower surface of the heater plate 238. In some embodiments, the second gap 260 can be from about 3 to about 6 mm, such as about 4 mm. The opening 126 is larger than the outer diameter of the shaft 228 such that a third gap 262 is formed between the opening 126 and the shaft 228. In some embodiments, the third gap 262 can be from about 3 to about 6 mm, such as about 4 mm.
[0043] The pedestal hub 128 is connected to the lower body 108 around the shaft 228 and the opening 126. The pedestal of 128 can be bolted or otherwise fixed to the lower body 108 using a plurality of fasteners that are disposed, for example, through corresponding openings 234 formed in the flange 232 of the pedestal hub 128 and that extend into corresponding threaded openings in the lower body 108. In some embodiments, one or more grooves 251 can be provided in one or both of the pedestal hub 128 and the lower body 108 to facilitate the formation of a seal therebetween. For example, a gasket such as an O-ring can be disposed in the groove 251.
[0044] The pedestal hub 128 has an inner diameter that is larger than the outer diameter of the shaft 228. In some embodiments, the pedestal hub has an inner diameter that is larger than the inner diameter of the opening 126. In some embodiments, as shown in FIG. 2, a choke cup 230 can be provided to regulate the exhaust flow of gas exiting the internal volume 112. The choke cup 230 can be disposed between the pedestal hub 128 and the lower body 108. The choke cup 230 provides a flow conductance choke point to condition the flow exiting the component coating reactor 102 such that the azimuthal angle is more uniform. For example, the choke cup 230 can be a tubular member that includes a flange 254 that can be seated on a corresponding ledge 256 formed along the inner diameter of the pedestal hub 128. The flange 254 can have a thickness that is equal to or substantially equal to the height of the ledge 256 such that the flange 254 abuts the bottom of the lower body 108 when the pedestal hub 128 is connected to the lower body 108.
[0045] The choke cup 230 can have an inner diameter substantially equal to the inner diameter of the opening 126 such that a fourth gap 264 is defined between the inner surface of the choke cup 230 and the outer surface of the shaft 228. The choke cup 230 further has an outer diameter smaller than the inner diameter of the pedestal hub 128 such that a fifth gap 266 is defined therebetween. The choke cup 230 further includes a plurality of openings 231 formed therethrough to fluidly connect the fourth gap 264 to the fifth gap 266.
[0046] As shown in more detail in FIG. 6, the choke cup 230 can have a length such that the bottom of the choke cup 230 is spaced from the inner surface of the bottom of the pedestal hub 128, defining a sixth gap 602 therebetween. In some embodiments, a groove 604 can be formed in the inner bottom surface of the pedestal hub 128 having a width greater than the wall thickness of the choke cup 230. The bottom of the choke cup 230 can extend partially into the groove such that a sixth gap 602 is defined between the side walls and bottom of the groove and the portion of the wall of the choke cup 230 that extends partially into the groove.
[0047] An opening 606 can be formed in the pedestal hub 128 to facilitate connection of the pedestal hub 128 to the exhaust assembly (e.g., exhaust assembly 144 described below) of the component coating reactor 102. For example, the opening 606 can be fluidly connected to the fifth gap 266. A conduit 608 can connect the opening 606 to the pump 150 via the exhaust assembly.
[0048] Returning to FIG. 1, the exhaust assembly 144 of the component coating reactor 102 is fluidly connected to the internal volume 112 via a pedestal hub 128 (e.g., via the opening 606 described with respect to FIG. 6). The exhaust assembly 144 includes a throttle valve 146 arranged in a row along a conduit 148 that connects a pump 150 to the internal volume 112. The throttle valve 146 facilitates control of the pressure within the internal volume 112. A pressure gauge 152 is also connected to the conduit 148 to monitor the pressure within the conduit 148 (and, by association, the pressure within the internal volume). In some embodiments, additional valves, such as isolation valve 154, bypass valve 155, etc., can be provided to facilitate isolation and / or disconnection of the component coating reactor 102 from the conduit 148 and the pump 150, for example, for maintenance.
[0049] The component coating system 100 also includes a controller 170 connected to the component coating reactor 102. The controller 170 controls the operation of the component coating reactor 102 using direct control or, alternatively, by controlling a computer (or controller) associated with the component coating reactor 102. During operation, the controller 170 enables data collection and feedback for optimizing the performance of the component coating reactor 102. The controller 170 generally includes a central processing unit (CPU) 172, a memory 174, and support circuitry 176. The CPU 172 can be any form of general-purpose computer processor suitable for use in an industrial environment. The support circuitry 176 is conventionally connected to the CPU 172 and can include a cache, a clock circuit, an input / output subsystem, a power supply, etc. Software routines, such as the methods described herein, are stored in the memory 174 and, when executed by the CPU 172, can transform the CPU 172 into a special-purpose computer (controller 170). The software routines can also be stored and / or executed by a second controller (not shown) located remotely from the component coating reactor 102.
[0050] Memory 174 is in the form of a computer-readable storage medium that includes instructions for facilitating the operation of the component coating reactor 102 when executed by the CPU 172. The instructions in the memory 174 are in the form of a program product such as a program that implements the device of the present disclosure. The program code may conform to any one of a number of different programming languages. In one example, the present disclosure can be implemented as a program product stored in a computer-readable storage medium for use in a computer system. The program(s) of the program product define the functions of the aspects. Exemplary computer-readable storage media include, but are not limited to: non-writable storage media in which information is permanently stored (e.g., CD-ROM disks readable by a CD-ROM drive, flash memory, ROM chips, or any type of solid-state non-volatile semiconductor memory, such as a read-only memory device in a computer); and writable storage media in which modifiable information is stored (e.g., floppy disks in a diskette drive or hard disk drive, or any type of solid-state random access semiconductor memory). Such a computer-readable storage medium is an aspect of the present disclosure when it carries computer-readable instructions that direct the functions of the component coating reactor 102 described herein, for example, in accordance with method 1400.
[0051] Further details of a reactor for component coating according to some embodiments of the present disclosure are shown in FIG. 2, which is a schematic cross-sectional side view of a portion of a reactor for component coating, such as the reactor for component coating 102. As shown in FIG. 2, the lid assembly 110 is connected to the lower body 108 and at least partially defines an internal volume 112. In some embodiments, a seal can be provided at the interface between the lid assembly 110 and the lower body 108. For example, in order to facilitate maintaining the seal between the lid assembly 110 and the lower body 108 during assembly, a groove 226 can be provided in one or more of the lid assembly 110 or the lower body 108 to receive a gasket, such as an O-ring. In some embodiments, another alignment feature can be provided to facilitate alignment and interconnection of the lid assembly 110 and the lower body 108. For example, a protrusion or lip 222 can be disposed around the periphery of one of the lid assembly 110 or the lower body 108. A mating recess 224 can be provided in the other of the lid assembly 110 or the lower body 108 to receive and interface with the lip 222. In the embodiment shown in FIG. 2, the lip 222 is shown protruding downward from the lid assembly 110, and the mating recess 224 is shown formed in the periphery of the lower body 108.
[0052] In some embodiments, another heat conduction choke can be provided in the lid assembly 110 to promote reduction of heat transfer from the upper central portion of the lid assembly above the internal volume 112. For example, a plurality of recesses 216 can be formed in the lid assembly 110 to impede conductive heat transfer through the lid assembly 110. In some embodiments, the plurality of recesses 216 include elongated slots. The plurality of recesses 216 can be formed in either or both of the upper surface or side surface of the lid assembly 110.
[0053] In the embodiment shown in FIG. 2, as clearly shown by FIGS. 3 and 7, a first plurality of recesses 216 (first plurality of recesses 316A in FIG. 3) can be formed on the top surface of the lid assembly 110. The first plurality of recesses 216 (316A) can be arranged, for example, along a circle proximate to the outer peripheral edge of the lid assembly 110 and radially outside the radius of the internal volume 112. In some embodiments, the first plurality of recesses 216 (316A) can be elongated slots having a major axis that is aligned or substantially aligned with the circle on which they are arranged (as an example, tangentially aligned with the circle, for example, at the center of an elongated slot).
[0054] In the embodiment shown in FIG. 2, as clearly shown by FIG. 3, a second plurality of recesses 216 (second plurality of recesses 316B in FIG. 3) can be formed on the side surface of the lid assembly 110. The second plurality of recesses 216 (316B) can be arranged, for example, along one or more circular rows (two circular rows in the figure) along the outer peripheral edge of the lid assembly 110. In embodiments where a plurality of circular rows of recesses are provided, the recesses in each row can be arranged alternately or overlapped to reduce the path of conductive heat transfer from the top surface of the lid assembly 110 to the side surface of the lid assembly 110 (for example, to form a tortuous path for heat conduction). In some embodiments, the second plurality of recesses 216 (316B) can be elongated slots having a major axis that is aligned or substantially aligned with the circular row on which they are arranged.
[0055] The foregoing description of the various components of the reactor 102 for component coating is exemplary, and other variations are possible within the scope of the present disclosure. For example, FIGS. 8-10 and 12 show a lid assembly 110 according to at least some embodiments of the present disclosure that is different from the lid assembly 110 shown in FIGS. 2-5 and 7. Parts of the lid assembly similar to those described above with respect to FIGS. 2-5 and 7 have the same reference numerals and may not be described individually below.
[0056] In some embodiments, as shown in FIGS. 8 - 10 and 12, the reactor 102 for component coating is configured to supply one or more process gases to an outer zone and a central zone. For example, the plurality of fluidly independent plenums of the lid assembly 110 can be connected to a gas source 114 such that a reactive gas can be supplied to the central opening 121 of the lid assembly 110 and one or more inert gases can be supplied to the outer annular plenum 208. As described above, portions of the embodiments shown in FIGS. 8 - 10 and 12 that are similar to the embodiments shown in FIGS. 2, 3, and 7 have reference numerals similar to the corresponding elements discussed herein with respect to FIGS. 2, 3, and 7.
[0057] As described above with respect to FIG. 2, the lid assembly 110 shown in FIG. 8 includes an outer annular plenum 208 and a central plenum 802. The outer annular plenum 208 facilitates the supply of one or more gases to the peripheral region of the internal volume 112 and to the peripheral region of the workpiece 158 to be coated. In some embodiments, for example, an inert gas can be supplied to the outer annular plenum 208 to prevent deposition on the peripheral edge of the workpiece and / or the peripheral edge of the internal volume 112. The central plenum 802 facilitates the supply of one or more gases, such as different deposition gases or precursor gases for an ALD process, to the radially inner portion (e.g., the central portion) of the internal volume near the region of the workpiece that is desired to be coated.
[0058] The central plenum 802 is disposed within the central opening 121 and facilitates the supply of one or more gases to the central region of the internal volume 112 and the central region of the workpiece 158 to be coated. For example, the central plenum 802 can be connected to the gas source 114 via a different one of the first, second, or third conduits 118, 120, 122. In some embodiments, the outer annular plenum 208 can be connected to the gas source 114, for example via the first conduit 118, and an inert gas, for example, can be supplied to the outer plenum 208. The central plenum 802 can be connected to the gas source 114, for example via the second and third conduits 120, 122, and a precursor for an ALD process, for example, can be supplied to coat the workpiece 158.
[0059] The central plenum 802 can include a nozzle assembly 804 that facilitates the distribution of process gas to the internal volume 112. The nozzle assembly can include a body 806 having an internal opening 910 that can insert and hold a nozzle 808. For example, the nozzle 808 can have an upper flange that can be inserted into the internal opening 910 and seated on a corresponding shoulder formed in the internal opening 910. A cap 908 can be connected to the upper portion of the body 806 to cover the top of the internal opening 910. One or more o-ring grooves 912 (one shown) can be provided in at least one opposing surface of the cap 908 or the body 806 to minimize or prevent leakage from the central plenum 802 along the interface of the body 806 and the cap 908.
[0060] As best shown in FIG. 9, the body 806 of the nozzle assembly 804 can be attached to the lid assembly 110 by a plurality of fasteners (not shown), such as screws, bolts, clamps, etc. One or more o-ring grooves 906 (one shown) can be provided in at least one opposing surface of the lid assembly 110 or the body 806 to minimize or prevent leakage from the central plenum 802 along the interface of the body 806 and the lid assembly 110.
[0061] For example, one or more passages may be provided in the central plenum 802 through the body 806, the cap 908, or a combination of the body 806 and the cap 908. As shown in FIG. 9, in some embodiments, a passage 914 can be provided to connect one of the conduits (e.g., 118, 120, 122) to the central plenum 802, and an independent second passage 916 can be provided to connect a different one of the conduits (e.g., 118, 120, 122) to the central plenum 802.
[0062] The body 806 and the nozzle 808 together define the central plenum 802. For example, the nozzle 808 includes an internal passage 902 that terminates at the bottom of the nozzle 808. One or more holes (e.g., hole 904 in FIG. 9) are disposed in the bottom portion of the nozzle 808 that is in fluid communication with the internal passage 902. In some embodiments, the one or more holes 904 are a plurality of holes. In some embodiments, the plurality of holes are four holes. The plurality of holes can be equally spaced from each other. The one or more holes can be provided in the bottom surface of the nozzle 808, the lower portion of the side wall of the nozzle 808, or a combination of the two. The nozzle 808 can extend into the internal volume 112 beyond the bottom surface of the lid assembly 110.
[0063] As best shown in FIG. 10, the outer plenum 208 can be formed by an annular channel disposed in the upper plate 178 of the lid assembly 110. A plurality of holes 248 are provided within the outer plenum 208, e.g., along the bottom surface of the plenum, and can fluidly connect the plenum to the internal volume 112. The plurality of holes 248 can be as described above. The cap 846 can be disposed over each channel to define the outer plenum 208 and can be connected to the upper plate 178 via a plurality of fasteners (e.g., screws, etc.). For example, a plurality of holes 1006 are formed through the cap 846 and are aligned with corresponding screw holes 1008 formed in the upper plate 178 to receive fasteners for fixing the cap 846 to the upper plate 178.
[0064] The cap 846 can be disposed within the recess 1002 formed in the upper plate 178. In some embodiments, the recess 1002 and the cap 846 can be sized such that the cap 846 is flush with the top surface of the upper plate 178 or does not protrude above the top surface of the upper plate 178. One or more O-ring grooves 1004 are formed in at least one of the opposing surfaces of the upper plate 178 or the cap 846 to receive an O-ring and facilitate reduction or elimination of leakage from the outer plenum 208. The outer plenum 208 can be connected to the gas source 114 through the cap 846 via one or more of the first, second, or third conduits 118, 120, 122 (e.g., one conduit for supplying one or more inert gases), as described above with respect to FIG. 5.
[0065] During operation, when gas is flowing through the component coating reactor 102, the gas first enters the component coating reactor 102 through the lid assembly 110. For example, the gas can be introduced through at least one of the gas passage 136 or the opening 126. Then, the gas flows around the workpiece. In some embodiments, the workpiece is a workpiece 158 such as a showerhead connected to the lid assembly 110. In such embodiments, the gas flows across the surface of the workpiece, such as into the central recess of the showerhead, through a plurality of gas distribution holes disposed through the showerhead, then through the space between the faces of the showerhead, and across the pedestal heater 124. Then, the gas flows around the periphery of the pedestal heater 124 (e.g., through the first gap 258), between the bottom of the pedestal heater 124 and the floor of the lower body 108 (e.g., through the second gap 260), through the choke cup 230 and the pedestal hub 128, etc. (e.g., through the third gap 262, the fourth gap 264, and the fifth gap 266 or the sixth gap 602), and is discharged out of the internal volume 112 through a position under the pedestal heater 124. A pump, such as the pump 150, is connected to the internal volume 112, for example, through the opening 606 of the pedestal hub 128.
[0066] For example, FIG. 14 is a flowchart of a method 1400 for coating a component within a component coating reactor according to some embodiments of the present disclosure. The method 1400 generally begins at 1402, where a workpiece is fixed to a portion facing the internal volume of the component coating reactor to be coated. In some embodiments, when the component to be coated is a component of a semiconductor substrate processing chamber, the coating process is performed on the component itself (e.g., the workpiece is the component to be coated), and thus, the coating process is performed without a conventional substrate (e.g., a semiconductor wafer, etc.) disposed on a substrate support (e.g., the pedestal heater 124) during the deposition process.
[0067] In some embodiments, the workpiece can be a workpiece 158 such as, for example, a showerhead. For example, the workpiece 158 can be fixed to the lid assembly 110 as described above. In some embodiments, a spacer (such as spacer 218) can be disposed between the workpiece and the lid assembly.
[0068] In some embodiments, the workpiece (e.g., the part to be coated) can be a substrate support pedestal configured to support a planar substrate, such as the pedestal heater 124 described above. For example, the substrate support pedestal can be connected to the lower body 108 of the component coating reactor 102 such that the support surface of the substrate support pedestal is disposed within the internal volume 112 on the side opposite the lid assembly 110. In such embodiments, the process can be carried out without fixing any workpiece 158 (such as a showerhead) to the lid assembly 110.
[0069] Next, at 1404, an ALD process is performed on the fixed workpiece within the component coating reactor. The ALD process can be any suitable ALD process for forming a coating on the workpiece (e.g., a showerhead, a substrate support pedestal, etc.).
[0070] In one example, the coating to be formed can be an aluminum oxide (Al2O3) coating. In such an embodiment, the ALD process includes supplying a pulse of trimethylaluminum (TMA), then supplying a flow of an inert purge gas, for example through a first annular plenum 210A, then subsequently supplying a pulse of water (H2O), and then supplying a flow of the purge gas, for example through a second annular plenum 210B. In some embodiments, the pulse of trimethylaluminum (TMA) can supply the flow of the purge gas for about 30 to about 1000 milliseconds (ms), for example less than about 100 ms, followed by between about 100 ms and about 2000 ms, or in some embodiments, for about 200 to about 1000 ms, for example for about 1 second. In some embodiments, the pulse of water (H2O) can supply the flow of the purge gas for about 30 to about 1000 milliseconds (ms), for example less than about 100 ms, followed by between about 100 ms and about 5000 ms, or in some embodiments, for about 500 to about 5000 ms, for example for about 3.5 seconds. The ALD process can be carried out at a reaction pressure of about 1 to about 10 Torr, for example about 2 - 3 Torr. The ALD process can also be carried out at a temperature of about 300 degrees Celsius. The purge gas is an inert gas such as nitrogen (N2), or a noble gas such as argon (Ar) for example. The ALD process can be repeated as necessary to form a coating having a desired thickness.
[0071] For example, in some embodiments, the ALD process includes alternately flowing deposition gases throughout the workpiece through the lid assembly 110. The process gases can be exhausted through the exhaust assembly of the component coating reactor. In some embodiments, when the workpiece is a showerhead, the deposition gases flow into the central recess of the showerhead through a plurality of gas distribution holes disposed through the showerhead, and then flow between the faces of the showerhead and across the pedestal heater 124. The deposition gases are exhausted from the internal volume through a location below the pedestal heater 124 as described above. In some embodiments, performing the ALD process further includes flowing an inert gas around the periphery of the showerhead while alternately flowing the deposition gases.
[0072] In some embodiments, when the workpiece includes a substrate support pedestal, performing the ALD process includes alternately flowing deposition gases over the entire upper surface of the substrate support pedestal via the lid assembly. The deposition gases then flow around the periphery of the substrate support pedestal and are exhausted from the internal volume through a location below the substrate support pedestal as described above. In some embodiments, performing the ALD process further includes flowing an inert gas around the periphery of the substrate support pedestal while alternately flowing the deposition gases.
[0073] The inventors have observed that the deposition time required to coat a single component (e.g., a workpiece) within the component coating reactor described herein is advantageously shortened compared to conventional batch coating processes currently used for coating such processing chamber components.
[0074] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof.
Claims
1. A reactor for component coating, comprising: A lower body and a lid assembly that together define and surround an internal volume; One or more heaters disposed within the lid assembly; One or more coolant channels disposed within the lid assembly for flowing a heat transfer medium; A plurality of gas passages disposed through the lid assembly to facilitate the supply of one or more gases to the internal volume, the plurality of gas passages including a plurality of fluidly independent plenums disposed within the lid assembly; and One or more mounting brackets for facilitating the connection of a workpiece to the lid assembly A reactor for component coating.
2. A cover surrounding the reactor for component coating, the cover including a plurality of openings for promoting air flow, or A cover surrounding the reactor for component coating, the cover including a plurality of openings for promoting air flow, and a fan disposed on the cover for enhancing air cooling outside the reactor for component coating The reactor for component coating according to claim 1, further comprising.
3. The internal volume has a volume of 1 to 1.5 liters, or The dimensions of the entire internal volume are 14 to 20 inches The reactor for component coating according to claim 1, which is at least one of them.
4. The reactor for component coating according to claim 1, wherein each of the lower body and the lid assembly includes cavities formed on opposing surfaces that together define the internal volume when the lower body and the lid assembly are assembled together.
5. The reactor for component coating according to claim 4, wherein the lower body includes a bottom plate and side walls extending upward from the bottom plate to partially surround the internal volume, and the lid assembly includes an upper plate and side walls extending downward from the upper plate to partially surround the internal volume.
6. It further includes one or more alignment features that facilitate alignment and interconnection between the lid assembly and the lower body, and the one or more alignment features include a protrusion or lip disposed around the periphery of one of the lid assembly or the lower body, and a mating recess provided on the other of the lid assembly or the lower body for receiving the lip and interfacing with the lip. The reactor for component coating according to claim 5.
7. A seal disposed at the interface between the lid assembly and the lower body The reactor for component coating according to claim 1, further comprising.
8. The reactor for component coating according to claim 7, wherein the seal includes a groove disposed on one of the lid assembly or the lower body for receiving a gasket to facilitate maintaining the seal between the lid assembly and the lower body during assembly.
9. The one or more heaters include two annular heaters, The one or more heaters include a plurality of ring-shaped heaters disposed in an annular channel on the upper surface of the lid assembly, The one or more heaters include a plurality of ring-shaped heaters disposed in an annular channel on the upper surface of the lid assembly, and further include an annular cap disposed on each of the one or more heaters to hold the heater in each of the annular channels, or The one or more heaters include a plurality of ring-shaped heaters disposed in an annular channel on the upper surface of the lid assembly, and further include an annular cap disposed on each of the one or more heaters to hold the heater in each of the annular channels, the one or more coolant channels include a first coolant channel formed in the upper part of the lid assembly between the heaters of the plurality of ring-shaped heaters, and the annular cap is disposed on the first coolant channel. The reactor for component coating according to claim 1.
10. The one or more coolant channels are a single annular channel having an inlet and an outlet that facilitates connection to a coolant source and circulates coolant through a single annular channel during use, or It further includes one or more coolant channels disposed in the lower body for flowing a heat transfer medium. The reactor for component coating according to claim 1, which is at least one of them.
11. The reactor for component coating according to claim 1, wherein the plurality of fluidically independent plenums are configured to supply the one or more gases to a specific zone among a plurality of zones of the internal volume.
12. Each of the plurality of fluidically independent plenums An annular channel disposed on the top surface of the lid assembly, A cap disposed on the annular channel, One or more inlets disposed through the cap, and A plurality of holes disposed along the bottom surface of the plenum to fluidically connect the plenum to the internal volume The reactor for component coating according to claim 1, comprising.
13. The reactor for component coating according to claim 1, wherein at least one of length, residence time, or conductance is substantially equal from the gas source to each plenum of the plurality of fluidically independent plenums.
14. The reactor for component coating according to claim 1, wherein the one or more mounting brackets include a plurality of posts configured to be connected to the lid assembly.
15. A spacer for facilitating maintaining a gap between the workpiece and the lid assembly, or A liner configured to surround the workpiece and be disposed along the outer periphery of the internal volume adjacent to the lid assembly The reactor for component coating according to claim 1, further comprising at least one of them.
16. A controller connected to the reactor for component coating to control the operation of the reactor for component coating The reactor for component coating according to claim 1, further comprising.
17. A thermostat that can be disposed within the lid assembly or connected to the lid assembly to monitor the temperature of the lid assembly during use The reactor for component coating according to claim 1, further comprising.
18. The reactor for component coating according to claim 17, wherein the thermostat is connected to a controller configured to perform feedback control on the temperature of the lid assembly during use.
19. A plurality of conduits connected to the plurality of gas passages to supply one or more process gases to the internal volume during operation The reactor for component coating according to any one of claims 1 to 18, further comprising
20. The reactor for component coating according to claim 19, wherein the plurality of conduits includes a first conduit, a second conduit, and a third conduit for supplying three different gases to the internal volume.
21. Each of the fluidically independent plenums is connected to a different one of the first conduit, the second conduit, or the third conduit, respectively. Each of the fluidically independent plenums is connected to a different one of the first conduit, the second conduit, or the third conduit at a plurality of positions, respectively, or Each of the first conduit, the second conduit, and the third conduit is connected to each of the plenums in azimuthal symmetry. The reactor for component coating according to claim 20, which is at least one of the above.
22. The reactor for component coating according to any one of claims 1 to 18, wherein the plurality of fluidically independent plenums includes an outer annular plenum and one or more inner annular plenums.
23. The reactor for component coating according to claim 22, wherein the one or more inner annular plenums are two inner annular plenums.
24. The outer annular plenum is connected to a first conduit for supplying a first gas, and the two inner annular plenums are each connected to a different one of a second conduit for supplying a second gas and a third conduit for supplying a third gas, and the first gas, the second gas, and the third gas are different from each other, or The outer annular plenum is connected to the first conduit at a plurality of positions along the outer annular plenum, the first inner annular plenum is connected to the second conduit at a plurality of positions along the first inner annular plenum, and the second inner annular plenum is connected to the third conduit at a plurality of positions along the second inner annular plenum. The reactor for component coating according to claim 23.
25. The outer annular plenum is connected to the first conduit at a plurality of positions along the outer annular plenum, the first inner annular plenum is connected to the second conduit at a plurality of positions along the first inner annular plenum, the second inner annular plenum is connected to the third conduit at a plurality of positions along the second inner annular plenum, and each of the plurality of positions along any one of the outer annular plenum and the two inner annular plenums is arranged at equal intervals from each other. The reactor for component coating according to claim 24.
26. The plurality of positions are at six positions within each of the annular plenums, or None of the plurality of positions are radially aligned with each other The reactor for component coating according to claim 25, which is at least one of them.
27. A first conduit connected to one of the fluidically independent plenums via a first plurality of legs, A second conduit connected to a different one of the fluidically independent plenums via a second plurality of legs different from the first plurality of legs, and A third conduit connected to a different one of the fluidically independent plenums via a third plurality of legs different from the first and second plurality of legs The reactor for component coating according to any one of claims 1 to 18, further comprising.
28. Individual legs within a common leg of the first, second, or third plurality of legs have a horizontal portion disposed in a common plane and a vertical portion extending from the common plane to the lid assembly, while legs within different legs of the first, second, or third plurality of legs have respective horizontal portions disposed in different planes. The reactor for component coating according to claim 27.
29. A remote plasma source (RPS) connected to the internal volume through the lid assembly The reactor for component coating according to any one of claims 1 to 18, further comprising.
30. A central opening disposed through the lid assembly, wherein the RPS is connected to the internal volume through the central opening. The reactor for component coating according to claim 29.
31. A gas source connected to the internal volume through the plurality of gas passages, the gas source being configured to supply a plurality of different gases to the internal volume through different gas passages of the plurality of gas passages. The reactor for component coating according to claim 30, further comprising
32. further comprising a central opening disposed through the lid assembly, wherein the gas source is connected to the internal volume through the central opening, or the plurality of fluidly independent plenums includes an outer annular plenum, a first inner annular plenum, and a second inner annular plenum, and the gas source is configured to supply an inert gas to the outer annular plenum, a first precursor to the first inner annular plenum, and a second precursor to the second inner annular plenum The reactor for component coating according to claim 31.
33. a pedestal heater disposed within the internal volume The reactor for component coating according to any one of claims 1 to 18, further comprising
34. The reactor for component coating according to claim 33, wherein the pedestal heater has a diameter of 500 to 600 mm.
35. an opening formed through the lower body to receive the shaft of the pedestal heater, and a pedestal hub connected to the bottom plate of the lower body and surrounding and enclosing the shaft of the pedestal heater The reactor for component coating according to claim 33, further comprising
36. A first gap of 2 to 4 mm is defined between the inner surface of the side wall of the lower body and the outer peripheral edge of the pedestal heater, a second gap of 3 to 6 mm is defined between the upper surface of the bottom plate of the lower body and the opposing lower surface of the pedestal heater, and a third gap of 3 to 6 mm is defined between the opening of the lower body and the shaft. The reactor for component coating according to claim 35.
37. a choke cup disposed around the shaft and between the pedestal hub and the lower body, the choke cup including a plurality of openings that provide a flow conductance choke point for regulating the flow exiting the reactor for component coating The reactor for component coating according to claim 35, further comprising
38. The choke cup includes a tubular member having a flange placed on a corresponding ledge formed along the inner diameter of the pedestal hub, a fourth gap being defined between the inner surface of the choke cup and the outer surface of the shaft, and a fifth gap being defined between the outer diameter of the choke cup and the inner diameter of the pedestal hub, the plurality of openings fluidly connecting the fourth gap to the fifth gap, the reactor for component coating according to claim 37.
39. The reactor for component coating according to claim 38, wherein the choke cup has a length such that the bottom of the choke cup is spaced from the inner surface of the bottom of the pedestal hub, defining a sixth gap therebetween.
40. A groove formed on the bottom surface inside the pedestal hub, the groove having a width greater than the wall thickness of the choke cup, a part of the bottom of the choke cup extending into the groove such that the sixth gap is defined between the side wall and the bottom of the groove and the part of the bottom of the choke cup The reactor for component coating according to claim 39, further comprising a groove.
41. An opening formed inside the pedestal hub to facilitate connection of the pedestal hub to the exhaust assembly of the reactor for component coating The reactor for component coating according to claim 35, further comprising an opening.
42. A central opening formed through the lower body to receive a shaft of a pedestal heater, and A pedestal hub connected to the bottom plate of the lower body and surrounding and enclosing the shaft of the pedestal heater during installation The reactor for component coating according to any one of claims 1 to 18, further comprising a pedestal hub.
43. An exhaust assembly fluidly connected to the internal volume via the pedestal hub The reactor for component coating according to claim 42, further comprising an exhaust assembly.
44. The exhaust assembly includes A throttle valve arranged in a row along a conduit to connect the internal volume to a pump during operation, A pressure gauge for monitoring the pressure inside the internal volume, or An isolation valve and / or a bypass valve for facilitating at least one of isolating or disconnecting the pump from the reactor for component coating A reactor for component coating, comprising at least one of them according to claim 43.
45. Another heat conduction choke provided in the lid assembly to promote reduction of heat transfer from the upper central portion of the lid assembly above the internal volume The reactor for component coating according to any one of claims 1 to 18, further comprising
46. The reactor for component coating according to claim 45, wherein the one or more heat conduction chokes include a plurality of recesses formed in the lid assembly to prevent conductive heat transfer through the lid assembly.
47. The reactor for component coating according to claim 46, wherein the plurality of recesses include at least one of a first plurality of recesses formed on the top surface of the lid assembly or a second plurality of recesses formed on the side surface of the lid assembly.
48. When present, the first plurality of recesses are arranged along a circle radially outside the internal volume, close to the outer peripheral edge of the lid assembly, and when present, the second plurality of recesses are arranged along one or more circular rows along the outer peripheral edge of the lid assembly. The reactor for component coating according to claim 47.
49. A method of coating a component by atomic layer deposition, comprising Fixing the workpiece to be coated to a portion facing the internal volume of the reactor for component coating, and Performing an ALD process on the workpiece fixed in the reactor for component coating Including The workpiece is a shower head, fixing the workpiece includes fixing the shower head to the lid assembly of the reactor for component coating, and performing the ALD process includes flowing deposition gases alternately into the central recess of the shower head through the lid assembly and through a plurality of gas distribution holes arranged through the shower head. A method.
50. Performing the ALD process further includes flowing an inert gas around the periphery of the shower head while flowing the deposition gases alternately. The method according to claim 49.
51. A method of coating a component by atomic layer deposition, comprising Fixing a workpiece to be coated to a portion facing the internal volume of a reactor for component coating, and Performing an ALD process on the workpiece fixed within the reactor for component coating comprising wherein the workpiece is a substrate support pedestal, and fixing the workpiece includes fixing the substrate support pedestal to a lower body of the reactor for component coating, and performing the ALD process includes alternately flowing deposition gases over the entire upper surface of the substrate support pedestal via a lid assembly connected to the lower body. A method.
52. The method according to claim 51, wherein performing the ALD process further includes flowing an inert gas around the periphery of the substrate support pedestal while alternately flowing the deposition gases.
53. A method of coating a component by atomic layer deposition, comprising Fixing a workpiece to be coated to a portion facing the internal volume of a reactor for component coating, and Performing an ALD process on the workpiece fixed within the reactor for component coating comprising performing the ALD process further includes flowing an inert gas around the periphery of the workpiece via an outer plenum and flowing deposition gases into the internal volume of the reactor for component coating via a plurality of inner plenums, or performing the ALD process further includes flowing an inert gas around the periphery of the workpiece via an outer plenum and flowing deposition gases into the internal volume of the reactor for component coating via a central plenum. A method.
Citation Information
Patent Citations
Treatment gas supply system and film deposition device
JP2010084156A
Temperature control module for showerhead electrode assembly for plasma processing equipment
JP2010541239A
High temperature coating for pre-clean and etching apparatus and related method
JP2020068382A
Ex-situ coating of chamber components for semiconductor processing
JP2021507513A
Plasma processing device and plasma processing method
WO2011125704A1