Foreign Object Detection Device, Substrate Processing Device, and Foreign Object Detection Method

Abstract

To enable confirmation of whether a foreign matter detection operation is normally performed.SOLUTION: A foreign matter detection apparatus is an apparatus that is configured to detect a foreign matter which is contained in a process liquid for processing a substrate. The foreign matter detection apparatus comprises: a process liquid flow passage forming unit that forms a process liquid flow passage in which the process liquid supplied to the substrate flows; an inspection liquid flow passage forming unit that forms an inspection liquid flow passage in which an inspection liquid being different from the process liquid flows; an irradiation unit that is configured to irradiate each of the process liquid flow passage and the inspection liquid flow passage with irradiation light from a light source; and a light receiving unit that is configured to receive each of light emitted from the process liquid flow passage due to irradiation of the irradiation light and light emitted from the inspection liquid flow passage due to irradiation of the irradiation light.SELECTED DRAWING: Figure 7

Description

Technical Field

[0001] The present disclosure relates to a foreign object detection device, a substrate processing device, and a method for confirming the operation of the foreign object detection device.

Background Art

[0002] Patent Document 1 discloses a detection device for submicron particles present as insoluble substances in a fluid. This detection device includes an optical system that condenses light from a coherent light source, a cell that is disposed near the focal point of the light beam condensed by this optical system and through which a flow of fluid containing fine particles passes inside, a photodetector that is disposed on the optical path of the light beam and on the side opposite to the light source of the light beam with respect to the cell, and an electric circuit that measures the number of fine particles in the fluid from the electric signal from this photodetector.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] The present disclosure provides a foreign object detection device, a substrate processing device, and a method for confirming the operation of the foreign object detection device that can confirm whether the foreign object detection operation is being performed normally.

Means for Solving the Problems

[0005] A foreign object detection device according to one exemplary embodiment is a device configured to detect foreign objects contained in a processing liquid for substrate processing. This foreign object detection device includes a processing liquid flow path forming unit that forms a processing liquid flow path through which the processing liquid supplied to the substrate flows, an inspection liquid flow path forming unit that forms an inspection liquid flow path through which an inspection liquid different from the processing liquid flows, an irradiation unit configured to irradiate irradiation light from a light source toward the processing liquid flow path and the inspection liquid flow path, respectively, and a light receiving unit configured to receive light emitted from the processing liquid flow path by the irradiation of the irradiation light and light emitted from the inspection liquid flow path by the irradiation of the irradiation light, respectively.

Effects of the Invention

[0006] According to the present disclosure, there are provided a foreign object detection device capable of confirming whether a foreign object detection operation is being performed normally, a substrate processing device, and a method for confirming the operation of the foreign object detection device.

Brief Description of the Drawings

[0007]

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DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, various exemplary embodiments will be described.

[0009] A foreign matter detection device according to one exemplary embodiment is a device configured to detect foreign matter contained in a processing liquid for substrate processing. This foreign matter detection device includes a processing liquid flow path forming unit that forms a processing liquid flow path through which the processing liquid supplied to the substrate flows, an inspection liquid flow path forming unit that forms an inspection liquid flow path through which an inspection liquid different from the processing liquid flows, an irradiation unit configured to irradiate the irradiation light from the light source toward the processing liquid flow path and the inspection liquid flow path, respectively, and a light receiving unit configured to receive the light emitted from the processing liquid flow path by the irradiation of the irradiation light and the light emitted from the inspection liquid flow path by the irradiation of the irradiation light, respectively.

[0010] In this foreign matter detection device, in addition to the light emitted from the processing liquid flow path by the irradiation of the irradiation light, the light emitted from the inspection liquid flow path by the irradiation of the irradiation light is received. Therefore, regarding performing foreign matter detection based on the light from the processing liquid flow path, it is possible to confirm the detection operation based on the light from the inspection liquid flow path. Therefore, it is possible to confirm whether the foreign matter detection operation is being performed normally.

[0011] The light emitted from the processing liquid flow path may be the light scattered by the irradiation light in the processing liquid flow path, and the light emitted from the inspection liquid flow path may be the light scattered by the irradiation light in the inspection liquid flow path. In this case, since the intensity difference of the detection light due to the presence or absence of foreign matter in the processing liquid or the inspection liquid is large, it becomes possible to more reliably perform foreign matter detection and its operation confirmation.

[0012] The processing liquid flow path and the inspection liquid flow path may be formed so as to extend along the first direction and arranged side by side along the second direction orthogonal to the first direction. The foreign matter detection device may further include a driving unit configured to move the irradiation unit and the light receiving unit along the second direction. In this case, it becomes possible to share the irradiation unit that irradiates the flow path with irradiation light and the light receiving unit that receives the light from the flow path between the processing liquid flow path and the inspection liquid flow path.

[0013] The irradiation unit may include an optical member configured to irradiate the processing liquid flow path and the inspection liquid flow path with irradiation light respectively by changing the direction of the irradiation light from the light source. The driving unit may be configured to move the optical member along the second direction. In this case, since it is not necessary to move the light source of the irradiation light, it becomes possible to simplify the driving unit.

[0014] In the second direction, the light source, the processing liquid flow path, and the inspection liquid flow path may be arranged in this order. In this case, due to the provision of the inspection liquid flow path, the optical path of the irradiation light with respect to the processing liquid flow path does not change. Therefore, it becomes possible to suppress the influence on the accuracy of foreign matter detection by the inspection liquid flow path.

[0015] The foreign matter detection device may further include a control unit that controls the driving unit to move the irradiation unit and the light receiving unit to a predetermined standby position in the second direction when the irradiation unit does not irradiate the processing liquid flow path with irradiation light. The inspection liquid flow path may be arranged at a position where it can be irradiated with the irradiation light from the irradiation unit arranged at the standby position. With this configuration, it becomes possible to shorten the setting time for operation confirmation when shifting from the state where the processing liquid flow path is not irradiated with irradiation light to the confirmation of the foreign matter detection operation.

[0016] The foreign matter detection device may further include a control unit that controls the driving unit so that the irradiation light is irradiated onto the processing liquid flow path at least in part of the period during which the processing liquid is supplied to the substrate, and controls the driving unit so that the irradiation light is irradiated onto the inspection liquid flow path at least in part of the period during which the processing liquid is not supplied to the substrate. In this case, when the processing liquid is not supplied to the substrate, it is possible to suppress the influence of the irradiation light from the light source on the processing liquid flow path.

[0017] A substrate processing apparatus according to an exemplary embodiment includes a processing liquid supply unit having a nozzle that discharges a processing liquid for substrate processing and a supply unit that supplies the processing liquid to the nozzle, and a foreign matter detection unit configured to detect foreign matter contained in the processing liquid discharged from the nozzle toward the substrate in the supply unit. The foreign matter detection unit includes a processing liquid flow path forming unit that forms a processing liquid flow path through which the processing liquid flows, an inspection liquid flow path forming unit that forms an inspection liquid flow path through which an inspection liquid different from the processing liquid flows, an irradiation unit configured to irradiate irradiation light from a light source toward the processing liquid flow path and the inspection liquid flow path, respectively, and a light receiving unit configured to receive light emitted from the processing liquid flow path by the irradiation of the irradiation light and light emitted from the inspection liquid flow path by the irradiation of the irradiation light, respectively. In this substrate processing apparatus, it is possible to confirm whether the foreign matter detection operation is normally performed, similar to the above-described foreign matter detection device.

[0018] An operation confirmation method of a foreign matter detection device according to an exemplary embodiment is an operation confirmation method of a foreign matter detection device configured to detect foreign matter contained in a processing liquid for substrate processing. This operation confirmation method includes irradiating irradiation light from a light source into an inspection liquid flow path different from the processing liquid flow path through which the processing liquid supplied to the substrate flows while the inspection liquid flow path is filled with an inspection liquid different from the processing liquid, and receiving light emitted from the inspection liquid flow path by the irradiation of the irradiation light. In this operation confirmation method, it is possible to confirm whether the foreign matter detection operation is normally performed, similar to the above-described foreign matter detection device.

[0019] Irradiating the inspection liquid flow path filled with the inspection liquid with irradiation light may include irradiating the inspection liquid flow path with irradiation light while the inspection liquid is flowing through the inspection liquid flow path. In this case, it is possible to suppress contamination of the inspection liquid flow path due to the inspection liquid remaining in the inspection liquid flow path.

[0020] Irradiating the inspection liquid flow path filled with the inspection liquid with irradiation light may include irradiating the inspection liquid flow path filled with a suspension containing reference particles with irradiation light. In this case, it becomes possible to confirm the foreign matter detection function by detecting a change in the intensity of the detection light due to the reference particles.

[0021] Hereinafter, an embodiment will be described with reference to the drawings. In the description, the same reference numerals are assigned to the same elements or elements having the same function, and redundant descriptions are omitted. In some of the drawings, a rectangular coordinate system defined by the X-axis, Y-axis, and Z-axis is shown. In the following embodiments, the Z-axis corresponds to the vertical direction, and the X-axis and Y-axis correspond to the horizontal direction.

[0022] [Substrate Processing System] The substrate processing system 1 (substrate processing apparatus) shown in FIG. 1 is a system that forms a photosensitive film, exposes the photosensitive film, and develops the photosensitive film on a workpiece W. The workpiece W to be processed is, for example, a substrate, or a substrate in a state where a film or a circuit or the like is formed by performing a predetermined process. The substrate included in the workpiece W is, as an example, a wafer containing silicon. The workpiece W (substrate) may be formed in a circular shape. The workpiece W to be processed may be a glass substrate, a mask substrate, an FPD (Flat Panel Display), or the like, or may be an intermediate obtained by performing a predetermined process on these substrates or the like. The photosensitive film is, for example, a resist film.

[0023] The substrate processing system 1 includes a coating / developing apparatus 2 and an exposure apparatus 3. The exposure apparatus 3 is an apparatus that exposes a resist film (photosensitive film) formed on a workpiece W (substrate). Specifically, the exposure apparatus 3 irradiates an energy beam onto the exposed portion of the resist film by a method such as immersion exposure. The coating / developing apparatus 2 performs a process of applying a resist (chemical solution) onto the surface of the workpiece W to form a resist film before the exposure process by the exposure apparatus 3, and performs a developing process of the resist film after the exposure process.

[0024] (Substrate processing apparatus) Hereinafter, as an example of the substrate processing apparatus, the configuration of the coating / developing apparatus 2 will be described. As shown in FIGS. 1 and 2, the coating / developing apparatus 2 includes a carrier block 4, a processing block 5, an interface block 6, and a control device 18.

[0025] The carrier block 4 introduces the workpiece W into the coating / developing apparatus 2 and discharges the workpiece W from the coating / developing apparatus 2. For example, the carrier block 4 can support a plurality of carriers C for the workpiece W and incorporates a transfer device A1 including a transfer arm. The carrier C accommodates, for example, a plurality of circular workpieces W. The transfer device A1 takes out the workpiece W from the carrier C and delivers it to the processing block 5, and receives the workpiece W from the processing block 5 and returns it into the carrier C. The processing block 5 has a plurality of processing modules 11, 12, 13, 14.

[0026] The processing module 11 incorporates a liquid processing unit U1, a heat treatment unit U2, and a transfer device A3 that transfers the workpiece W to these units. The processing module 11 forms an underlayer film on the surface of the workpiece W by the liquid processing unit U1 and the heat treatment unit U2. The liquid processing unit U1 applies a processing liquid for forming the underlayer film onto the workpiece W. The heat treatment unit U2 performs various heat treatments associated with the formation of the underlayer film.

[0027] The processing module 12 incorporates a liquid processing unit U1, a heat treatment unit U2, and a transfer device A3 for transferring the workpiece W to these units. The processing module 12 forms a resist film on the lower layer film by means of the liquid processing unit U1 and the heat treatment unit U2. The liquid processing unit U1 applies a processing liquid (resist) for forming the resist film onto the lower layer film. The heat treatment unit U2 performs various heat treatments associated with the formation of the resist film.

[0028] The processing module 13 incorporates a liquid processing unit U1, a heat treatment unit U2, and a transfer device A3 for transferring the workpiece W to these units. The processing module 13 forms an upper layer film on the resist film by means of the liquid processing unit U1 and the heat treatment unit U2. The liquid processing unit U1 applies a processing liquid for forming the upper layer film onto the resist film. The heat treatment unit U2 performs various heat treatments associated with the formation of the upper layer film.

[0029] The processing module 14 incorporates a liquid processing unit U1, a heat treatment unit U2, and a transfer device A3 for transferring the workpiece W to these units. The processing module 14 performs development processing of the resist film subjected to exposure processing and heat treatments associated with the development processing by means of the liquid processing unit U1 and the heat treatment unit U2. The liquid processing unit U1 performs development processing of the resist film by applying a developer onto the surface of the exposed workpiece W and then flushing it with a rinse liquid. The heat treatment unit U2 performs various heat treatments associated with the development processing. Specific examples of the heat treatments include pre-development heat treatment (PEB: Post Exposure Bake), post-development heat treatment (PB: Post Bake), etc.

[0030] A shelf unit U10 is provided on the side of the carrier block 4 within the processing block 5. The shelf unit U10 is partitioned into a plurality of cells arranged in the vertical direction. A transfer device A7 including a lifting arm is provided in the vicinity of the shelf unit U10. The transfer device A7 raises and lowers the workpiece W between the cells of the shelf unit U10.

[0031] On the interface block 6 side within the processing block 5, a shelf unit U11 is provided. The shelf unit U11 is partitioned into a plurality of cells arranged in the vertical direction.

[0032] The interface block 6 transfers the workpiece W to and from the exposure apparatus 3. For example, the interface block 6 incorporates a transfer device A8 including a transfer arm and is connected to the exposure apparatus 3. The transfer device A8 transfers the workpiece W arranged in the shelf unit U11 to the exposure apparatus 3. The transfer device A8 receives the workpiece W from the exposure apparatus 3 and returns it to the shelf unit U11.

[0033] The control device 18 controls the coating / development apparatus 2 to execute the coating / development process according to the following procedure, for example. First, the control device 18 controls the transfer device A1 to transfer the workpiece W in the carrier C to the shelf unit U10, and controls the transfer device A7 to place this workpiece W in the cell for the processing module 11.

[0034] Next, the control device 18 controls the transfer device A3 to transfer the workpiece W in the shelf unit U10 to the liquid processing unit U1 and the heat treatment unit U2 within the processing module 11. Also, the control device 18 controls the liquid processing unit U1 and the heat treatment unit U2 to form a lower layer film on the surface of this workpiece W. Thereafter, the control device 18 controls the transfer device A3 to return the workpiece W on which the lower layer film has been formed to the shelf unit U10, and controls the transfer device A7 to place this workpiece W in the cell for the processing module 12.

[0035] Next, the control device 18 controls the transfer device A3 to transfer the workpiece W in the shelf unit U10 to the liquid processing unit U1 and the heat treatment unit U2 within the processing module 12. Also, the control device 18 controls the liquid processing unit U1 and the heat treatment unit U2 to form a resist film on the surface of this workpiece W. Thereafter, the control device 18 controls the transfer device A3 to return the workpiece W to the shelf unit U10, and controls the transfer device A7 to place this workpiece W in the cell for the processing module 13.

[0036] Next, the control device 18 controls the transfer device A3 to transfer the workpiece W of the shelf unit U10 to each unit in the processing module 13. Further, the control device 18 controls the liquid processing unit U1 and the heat treatment unit U2 to form an upper layer film on the resist film of the workpiece W. Thereafter, the control device 18 controls the transfer device A3 to transfer the workpiece W to the shelf unit U11.

[0037] Next, the control device 18 controls the transfer device A8 to send out the workpiece W of the shelf unit U11 to the exposure device 3. Thereafter, the control device 18 controls the transfer device A8 to receive the workpiece W subjected to the exposure process from the exposure device 3 and place it in the cell for the processing module 14 in the shelf unit U11.

[0038] Next, the control device 18 controls the transfer device A3 to transfer the workpiece W of the shelf unit U11 to each unit in the processing module 14, and controls the liquid processing unit U1 and the heat treatment unit U2 to perform a development process on the resist film of the workpiece W. Thereafter, the control device 18 controls the transfer device A3 to return the workpiece W to the shelf unit U10, and controls the transfer device A7 and the transfer device A1 to return the workpiece W into the carrier C. Thus, the coating / development process for one workpiece W is completed. The control device 18 also causes the coating / development device 2 to execute the above coating / development process for each of the subsequent plurality of workpieces W.

[0039] (Liquid Processing Unit) Subsequently, with reference to FIGS. 3 and 4, an example of the liquid processing unit U1 will be described in detail. Here, the liquid processing unit U1 (processing liquid supply unit) in the processing module 12 for forming a resist film will be described as an example. As shown in FIG. 3, the liquid processing unit U1 includes a rotation holding unit 20 and a processing liquid supply unit 30.

[0040] The rotation holding unit 20 holds and rotates the workpiece W based on the operation instruction of the control device 18. The rotation holding unit 20 has, for example, a holding unit 22 and a rotation driving unit 24. The holding unit 22 supports the central portion of the workpiece W horizontally placed with the surface Wa facing upward, and holds the workpiece W by, for example, vacuum adsorption or the like. The rotation driving unit 24 is an actuator including a power source such as an electric motor, and rotates the holding unit 22 around the vertical axis Ax. As a result, the workpiece W on the holding unit 22 rotates.

[0041] The processing liquid supply unit 30 supplies the processing liquid to the surface Wa of the workpiece W by discharging the processing liquid toward the surface Wa of the workpiece W based on the operation instruction of the control device 18. The processing liquid supplied by the processing liquid supply unit 30 is a solution for substrate processing used for processing the workpiece W. As a type of the processing liquid, a solution (resist) used for forming a resist film and a solution (e.g., thinner) used for a prewetting process for enhancing the wettability of the surface Wa with respect to the resist can be mentioned. The processing liquid supply unit 30 has, for example, a plurality of nozzles 32, a holding head 34, and a supply unit 36.

[0042] The plurality of nozzles 32 respectively discharge the processing liquid onto the surface Wa of the workpiece W held by the holding unit 22. The plurality of nozzles 32 are arranged, for example, above the workpiece W while being held by the holding head 34, and individually discharge the processing liquid downward. The holding head 34 may be configured to be movable in a direction along the surface Wa of the workpiece W by a driving unit (not shown). The number of the plurality of nozzles 32 is not limited, but hereinafter, a case where the processing liquid supply unit 30 has 12 nozzles 32 (hereinafter referred to as "nozzles 32A to 32L") will be described as an example.

[0043] The processing liquid is supplied to each of the nozzles 32A to 32L from the supply unit 36. Different types of processing liquids may be supplied from the supply unit 36 to the nozzles 32A to 32L. As an example, different types of resists are respectively supplied from the supply unit 36 to the nozzles 32A to 32J, and different types of thinners are respectively supplied from the supply unit 36 to the nozzles 32K and 32L.

[0044] As shown in FIG. 4, the supply unit 36 includes a plurality of supply pipes 42A to 42L and a plurality of supply sources 44A to 44L. The supply pipe 42A forms a flow path between the supply source 44A, which is a liquid source of the processing liquid to be supplied to (discharged from) the nozzle 32A, and the nozzle 32A. The supply source 44A includes, for example, a bottle in which the processing liquid is stored and a pump that pumps the processing liquid from the bottle toward the nozzle 32A. Similarly to the supply pipe 42A, the supply pipes 42B to 42L each form a flow path between the supply sources 44B to 44L, which are liquid sources of the processing liquid, and the nozzles 32B to 32L.

[0045] The supply unit 36 further includes a plurality of on-off valves V provided in the plurality of supply pipes 42A to 42L respectively. The on-off valve V switches between an open state and a closed state based on an operation instruction from the control device 18. By switching the open / closed states of the plurality of on-off valves V, the flow paths of the supply pipes 42A to 42L are opened and closed respectively. For example, when the on-off valve V is in the open state, the processing liquid flows into the flow paths of the supply pipes 42A to 42L, and the processing liquid is discharged from the nozzles 32A to 32L onto the surface Wa of the workpiece W.

[0046] (Foreign Matter Detection Unit) The coating / developing apparatus 2 further includes a foreign matter detection unit 50 (foreign matter detection device) configured to detect foreign matter (particles) contained in the processing liquid supplied to the workpiece W. The foreign matter detection unit 50 is configured to detect foreign matter in the processing liquid flowing through the flow paths of the plurality of supply pipes 42A to 42L respectively. The foreign matter detection unit 50 may be arranged near the liquid processing unit U1 or may be arranged inside the housing of the liquid processing unit U1. Some elements of the foreign matter detection unit 50 may be provided between the on-off valve V on the flow path of the supply pipes 42A to 42L and the nozzles 32A to 32L. Hereinafter, with reference to FIGS. 5 to 11 as well, an example of the foreign matter detection unit 50 will be described.

[0047] The foreign object detection unit 50 forms flow paths (hereinafter referred to as "processing liquid flow paths") for respectively flowing the processing liquid flowing through the supply pipes 42A to 42L. The foreign object detection unit 50 detects foreign objects in the processing liquid flowing through the processing liquid flow path by receiving the light generated by irradiating the processing liquid flow path with irradiation light (for example, laser light). As shown in FIG. 5, the foreign object detection unit 50 includes, for example, a housing 52, a flow path forming unit 60, and a measurement unit 70. The housing 52 includes an upper wall 54a, a bottom wall 54b, and side walls 56a to 56d (see also FIG. 8). As an example, the upper wall 54a and the bottom wall 54b are respectively arranged horizontally (along the X-Y plane). Also, the side walls 56a and 56b are respectively arranged vertically along the Y-axis direction (along the Y-Z plane) and face each other in the X-axis direction (the first direction). Further, the side walls 56c and 56d are respectively arranged vertically along the X-axis direction (along the X-Z plane) and face each other in the Y-axis direction (the second direction). The housing 52 houses the flow path forming unit 60 and the measurement unit 70.

[0048] The flow path forming unit 60 forms a plurality of processing liquid flow paths respectively provided on the flow paths of the supply pipes 42A to 42L. Each of the plurality of processing liquid flow paths formed by the flow path forming unit 60 is used to detect foreign objects contained in the processing liquid flowing through the processing liquid flow path. The flow path forming unit 60 has, for example, a plurality of processing liquid flow path forming parts 62A to 62L as shown in FIG. 6. The plurality of processing liquid flow path forming parts 62A to 62L are similarly configured to each other. Hereinafter, the details of the processing liquid flow path forming part will be described taking the processing liquid flow path forming part 62A as an example.

[0049] As shown in FIG. 5, the processing liquid flow path forming part 62A forms a processing liquid flow path 64 on the flow path of the supply pipe 42A connecting the supply source 44A and the nozzle 32A (see also FIG. 4). The upstream and downstream ends of the processing liquid flow path 64 are connected to the supply pipe 42A. Thereby, the processing liquid pumped from the supply source 44A passes through a part of the flow path of the supply pipe 42A, the processing liquid flow path 64 of the processing liquid flow path forming part 62A, and the remaining part of the flow path of the supply pipe 42A in this order, and is discharged from the nozzle 32A onto the surface Wa of the workpiece W.

[0050] The processing liquid flow path forming section 62A includes, for example, a block body 66 inside which a processing liquid flow path 64 is formed. The block body 66 is made of a material that can transmit the laser light used during foreign object detection. Examples of the material constituting the block body 66 include quartz and sapphire. The block body 66 may be formed in a rectangular parallelepiped shape, and one surface of the block body 66 may face the side wall 56a. As an example, an inlet 64a and an outlet 64b of the processing liquid flow path 64 are formed on the surface of the block body 66 that faces the side wall 56a. The inlet 64a may be located below the outlet 64b.

[0051] The processing liquid flow path 64 includes, for example, a first flow path 68a, a second flow path 68b, and a third flow path 68c. The first flow path 68a is formed to extend horizontally along the bottom wall 54b (along the X-axis direction in the drawing). One end of the first flow path 68a close to the side wall 56a constitutes the inlet 64a, and the other end of the first flow path 68a close to the side wall 56b is connected to the second flow path 68b. The second flow path 68b is formed to extend along the side wall 56a in the vertical direction (along the Z-axis direction). One end of the second flow path 68b close to the bottom wall 54b is connected to the first flow path 68a, and the other end of the second flow path 68b close to the upper wall 54a is connected to the third flow path 68c. The third flow path 68c is formed to extend horizontally along the bottom wall 54b (along the X-axis direction). One end of the third flow path 68c close to the side wall 56b is connected to the second flow path 68b, and the other end of the third flow path 68c close to the side wall 56a constitutes the outlet 64b.

[0052] The inlet 64a is connected to a supply pipe (hereinafter referred to as the "upstream supply pipe 46") of the supply pipe 42A on the upstream side of the processing liquid flow path forming portion 62A. The outlet 64b is connected to a supply pipe (hereinafter referred to as the "downstream supply pipe 48") of the supply pipe 42A on the downstream side of the processing liquid flow path forming portion 62A. The upstream supply pipe 46 and the downstream supply pipe 48 penetrate the side wall 56a facing the block body 66. With the above configuration, the processing liquid sent out from the supply source 44A passes through the upstream supply pipe 46, the first flow path 68a, the second flow path 68b, the third flow path 68c, and the downstream supply pipe 48 in this order, and is supplied from the nozzle 32A to the workpiece W.

[0053] As described above, the processing liquid flow path forming portions 62A to 62L shown in FIG. 6 are similarly configured to each other. Therefore, the processing liquid flow path forming portions 62B to 62L each include a block body 66 in which a processing liquid flow path 64 is formed inside, similar to the processing liquid flow path forming portion 62A. The processing liquid flow paths 64 of the processing liquid flow path forming portions 62B to 62L each include a first flow path 68a, a second flow path 68b, and a third flow path 68c. The upstream supply pipes 46 of the supply pipes 42B to 42L are respectively connected to the inlets 64a (first flow path 68a) of the processing liquid flow path forming portions 62B to 62L. The downstream supply pipes 48 of the supply pipes 42B to 42L are respectively connected to the outlets 64b (third flow path 68c) of the processing liquid flow path forming portions 62B to 62L.

[0054] In addition to the processing liquid flow path forming portions 62A to 62L, the flow path forming portion 60 further has an inspection liquid flow path forming portion 63 that forms a flow path (hereinafter referred to as the "inspection liquid flow path") for confirming the operation of the foreign matter detection unit 50. The inspection liquid flow path forming portion 63 may be configured similarly to the processing liquid flow path forming portion 62A, for example, as shown in FIG. 7. The inspection liquid flow path forming portion 63 includes, for example, a block body 67 in which an inspection liquid flow path 65 is formed inside. The block body 67 is configured similarly to the block body 66.

[0055] The inspection liquid flow path 65 in the inspection liquid flow path forming section 63 includes a first flow path 69a, a second flow path 69b, and a third flow path 69c. The first flow path 69a, the second flow path 69b, and the third flow path 69c are each configured in the same manner as the first flow path 68a, the second flow path 68b, and the third flow path 69c of the treatment liquid flow path 64. Different from the treatment liquid flow path forming sections 62A to 62L, supply pipes through which the treatment liquid flows are not connected to the inlet 65a (one end close to the side wall 56a of the first flow path 69a) and the outlet 65b (one end close to the side wall 56a of the third flow path 69c) of the inspection liquid flow path 65. For example, the inlet 65a opens to the outside of the housing 52 via the upstream connection pipe 97, and the outlet 65b opens to the outside of the housing 52 via the downstream connection pipe 98. By flowing a solution for operation confirmation different from the treatment liquid (hereinafter referred to as "inspection liquid") through the inspection liquid flow path, the operation of the foreign matter detection unit 50 is confirmed. The operation confirmation of the foreign matter detection unit 50 will be described later.

[0056] The treatment liquid flow path forming sections 62A to 62L and the inspection liquid flow path forming section 63 are arranged side by side along the direction from the side wall 56d to the side wall 56c (along the Y-axis direction) with each facing the side wall 56a. The treatment liquid flow path forming sections 62A to 62L and the inspection liquid flow path forming section 63 may be arranged in this order with a space therebetween. The height positions (positions in the Z-axis direction) of the first flow paths 68a of the treatment liquid flow path forming sections 62A to 62L may be substantially the same as each other. The height position of the first flow path 69a of the inspection liquid flow path forming section 63 may be substantially the same as the height position of the first flow path 68a.

[0057] The distances (positions in the X-axis direction) of the second flow paths 68b of the treatment liquid flow path forming sections 62A to 62L from the side wall 56a may be substantially the same as each other. The distance of the second flow path 69b of the inspection liquid flow path forming section 63 from the side wall 56a may be substantially the same as the distance of the second flow path 68b from the side wall 56a. The height positions (distances from the bottom wall 54b) of the third flow paths 68c of the treatment liquid flow path forming sections 62A to 62L may be substantially the same as each other. The height position of the third flow path 69c of the inspection liquid flow path forming section 63 may be substantially the same as the height position of the third flow path 68c.

[0058] The first flow paths 68a of the processing liquid flow path forming parts 62A to 62L and the first flow path 69a of the inspection liquid flow path forming part 63 are arranged side by side along the Y-axis direction. The second flow paths 68b of the processing liquid flow path forming parts 62A to 62L and the second flow path 69b of the inspection liquid flow path forming part 63 are arranged side by side along the Y-axis direction. The third flow paths 68c of the processing liquid flow path forming parts 62A to 62L and the third flow path 69c of the inspection liquid flow path forming part 63 are arranged side by side along the Y-axis direction.

[0059] Returning to FIG. 5, the measuring unit 70 includes a light source 72, an irradiation unit 74, a light receiving unit 76, a holding unit 78, and a driving unit 80. The light source 72 generates laser light as irradiation light for detecting foreign substances in the processing liquid. The light source 72 emits, for example, laser light having a wavelength of about 400 nm to 600 nm and an output of about 600 mW to 1000 mW. The light source 72 is provided, for example, on the bottom wall 54b as shown in FIG. 8 and is disposed below the processing liquid flow path forming parts 62A to 62L and the inspection liquid flow path forming part 63. The light source 72 emits laser light in a direction from the side wall 56d toward the side wall 56c (negative Y-axis direction) as an example. The light source 72 is disposed at a position different from that of the processing liquid flow path forming part 62A in the Y-axis direction. The light source 72 is disposed at a distance from the processing liquid flow path forming part 62A in the Y-axis direction. In the Y-axis direction, for example, the light source 72, the processing liquid flow path forming parts 62A to 62L (processing liquid flow path 64), and the inspection liquid flow path forming part 63 (inspection liquid flow path 65) are arranged in this order side by side.

[0060] The irradiation unit 74 is configured to irradiate the irradiation light from the light source 72 toward the processing liquid flow paths 64 and the inspection liquid flow paths 65 of the processing liquid flow path forming parts 62A to 62L, respectively. The irradiation unit 74 is configured to irradiate the irradiation light individually toward the processing liquid flow paths 64 and the inspection liquid flow paths 65 of the processing liquid flow path forming parts 62A to 62L, for example. The irradiation unit 74 may be disposed below the processing liquid flow path 64 and the inspection liquid flow path 65. The irradiation unit 74 has, for example, an optical member 82 configured to irradiate the irradiation light toward the processing liquid flow path 64 and the inspection liquid flow path 65 by changing the direction of the irradiation light from the light source 72.

[0061] The optical member 82 includes, for example, a reflection member 82a and a condenser lens 82b. The reflection surface of the reflection member 82a faces the light source 72 in the Y-axis direction. The reflection surface of the reflection member 82a reflects the irradiation light emitted substantially horizontally from the light source 72 upward. The condenser lens 82b is disposed above the reflection member 82a and condenses the irradiation light reflected by the reflection member 82a at a measurement position set in the processing liquid flow path 64 or the inspection liquid flow path 65. The condenser lens 82b is configured such that, for example, the irradiation light is irradiated at a measurement position set in the first flow path 68a of the processing liquid flow path 64 or the first flow path 69a of the inspection liquid flow path 65.

[0062] The holding portion 78 holds the optical member 82 movably. The holding portion 78 has, for example, a guide rail 88 and a slide base 84. The guide rail 88 may be provided on the bottom wall 54b and formed to extend along the direction from the side wall 56c toward the side wall 56d (along the Y-axis direction). The guide rail 88 may extend, for example, along the Y-axis direction at least between the processing liquid flow path forming portion 62A and the inspection liquid flow path forming portion 63 as shown in FIG. 8. The guide rail 88 supports the slide base 84 movably.

[0063] The slide base 84 is disposed below the processing liquid flow path forming portions 62A to 62L and the inspection liquid flow path forming portion 63 and supports the optical member 82 (reflection member 82a). The slide base 84 is formed to extend, for example, along a direction intersecting the guide rail 88 (for example, the X-axis direction) as shown in FIG. 5 or FIG. 7. For example, when viewed from the side, one end portion of the slide base 84 close to the side wall 56a is located below the processing liquid flow path forming portion 62A, and the other end portion close to the side wall 56b is located closer to the side wall 56b than the position of the processing liquid flow path forming portion 62A. As an example, the optical member 82 is disposed at one end portion of the slide base 84 close to the side wall 56a.

[0064] The drive portion 80 moves the slide base 84 along the guide rail 88 by a power source such as an electric motor. As the slide base 84 moves along the guide rail 88, the irradiation portion 74 (optical member 82) moves along the Y-axis direction.

[0065] The light receiving unit 76 is configured to receive the light emitted from the processing liquid flow path 64 and the light emitted from the inspection liquid flow path 65, respectively, by the irradiation of the irradiation light from the irradiation unit 74. The light receiving unit 76 is configured to receive, for example, the light emitted from the processing liquid flow path 64 and the light emitted from the inspection liquid flow path 65 individually. The light receiving unit 76 may be arranged so as to sandwich the processing liquid flow path forming portions 62A to 62L and the inspection liquid flow path forming portion 63 between it and the side wall 56a.

[0066] The light receiving unit 76 includes, for example, an optical member 92 and a light receiving element 94. In the direction from the side wall 56a toward the side wall 56b (X-axis direction), the processing liquid flow path forming portion 62A (inspection liquid flow path forming portion 63), the optical member 92, and the light receiving element 94 are arranged in this order. The height positions of the optical member 92 and the light receiving element 94 substantially coincide with the height positions of the first flow path 68a of the processing liquid flow path 64 and the first flow path 69a of the inspection liquid flow path 65, for example.

[0067] The optical member 92 includes, for example, a condenser lens that condenses the light emitted from the processing liquid flow path 64 or the inspection liquid flow path 65 toward the light receiving element 94. A wavelength filter that allows only light having a specific wavelength to pass through may be provided inside the optical member 92. The light receiving element 94 receives the light condensed by the optical member 92 and generates an electrical signal corresponding to the received light (detected light). The light receiving element 94 includes, for example, a photodiode that performs photoelectric conversion.

[0068] The optical member 92 and the light receiving element 94 are attached to a support member 86 that extends along the vertical direction. The support member 86 is connected to the slide base 84. For example, the lower end of the support member 86 is connected to the end of the slide base 84 on the side opposite to the end where the optical member 82 is provided. As the slide base 84 moves by the driving unit 80, the optical member 92 and the light receiving element 94 move along the Y-axis direction.

[0069] With the above configuration, the drive unit 80 moves the slide table 84 to move both the irradiation unit 74 and the light receiving unit 76 along the Y-axis direction. The drive unit 80 moves the irradiation unit 74 and the light receiving unit 76, for example, between a position where the irradiation unit 74 and the light receiving unit 76 respectively face the processing liquid flow path forming unit 62A and a position where the irradiation unit 74 and the light receiving unit 76 respectively face the inspection liquid flow path forming unit 63. Hereinafter, a position where the irradiation unit 74 and the light receiving unit 76 respectively face any one of the processing liquid flow path forming units (inspection liquid flow path forming units) is referred to as a position corresponding to the processing liquid flow path forming unit (inspection liquid flow path forming unit).

[0070] As an example, with the irradiation light from the light source 72 to the optical member 82 continuing, when the drive unit 80 moves the optical member 82 below any one of the processing liquid flow paths 64 of the processing liquid flow path forming units 62A to 62L, the irradiation light from the irradiation unit 74 is irradiated onto the processing liquid flow path 64. At this time, the light receiving element 94 receives the light emitted from the processing liquid flow path 64. With the irradiation light from the light source 72 to the optical member 82 continuing, when the drive unit 80 moves the optical member 82 below the inspection liquid flow path 65 of the inspection liquid flow path forming unit 63, the irradiation light from the irradiation unit 74 is irradiated onto the inspection liquid flow path 65. At this time, the light receiving element 94 receives the light emitted from the inspection liquid flow path 65.

[0071] As described above, the irradiation unit 74 is disposed below the measurement position set in the processing liquid flow path 64 or the inspection liquid flow path 65, and the light receiving unit 76 is disposed on the side of the measurement position. Therefore, when the irradiation light is irradiated onto the processing liquid flow path 64, the light receiving unit 76 receives a part of the light (scattered light) generated by the scattering of the irradiation light at the measurement position in the processing liquid flow path 64. When the irradiation light is irradiated onto the inspection liquid flow path 65, the light receiving unit 76 receives a part of the light (scattered light) generated by the scattering of the irradiation light at the measurement position in the inspection liquid flow path 65. When the irradiation light is irradiated into the processing liquid flow path 64 (inspection liquid flow path 65) through which a solution such as a processing liquid flows, scattered light is generated regardless of the presence or absence of foreign matter. When no foreign matter is contained in the solution, most of the irradiation light passes through the processing liquid flow path 64 (inspection liquid flow path 65). On the other hand, when foreign matter is contained in the solution, the degree of scattering of the irradiation light in the processing liquid flow path 64 (inspection liquid flow path 65) increases, and the intensity of the light received by the light receiving unit 76 (a part of the scattered light directed toward the light receiving unit 76) becomes greater than when no foreign matter is contained.

[0072] Note that, as shown in FIG. 8, the foreign matter detection unit 50 may further include a heat sink 58. The heat sink 58 may be provided outside the housing 52. The heat sink 58 may be provided, for example, at a position corresponding to the light source 72 on the outer surface of the bottom wall 54b. The heat sink 58 may be a water-cooled heat sink. The heat sink 58 suppresses an increase in the temperature inside the housing 52 due to optical members such as the light source 72. Thereby, the influence on the processing liquid (substrate processing) due to the heat generated by the optical members such as the light source 72 is reduced.

[0073] The foreign object detection unit 50 may further include a control unit 100. The control unit 100 controls each element of the foreign object detection unit 50. The control unit 100 is disposed, for example, inside the housing 52. The control unit 100 may operate the foreign object detection unit 50 in either a monitoring mode or an operation confirmation mode. The monitoring mode is set when substrate processing on the workpiece W is executed, and is a mode for monitoring the presence or absence of foreign objects in the processing liquid. The operation confirmation mode is a mode set when the operation of the foreign object detection unit 50 is confirmed without performing substrate processing on the workpiece W. As an example, the control unit 100 switches the operation mode to the monitoring mode or the operation confirmation mode according to the input information of the operator.

[0074] As shown in FIG. 9, the control unit 100 includes, as a functional configuration (hereinafter referred to as a "function module"), for example, a mode setting unit 110, a signal acquisition unit 102, a foreign object determination unit 104, a processing information acquisition unit 106, a drive control unit 108, a reference information holding unit 112, an operation determination unit 114, and an output unit 116. The processes executed by the mode setting unit 110, the signal acquisition unit 102, the foreign object determination unit 104, the processing information acquisition unit 106, the drive control unit 108, the reference information holding unit 112, the operation determination unit 114, and the output unit 116 correspond to the processes executed by the control unit 100.

[0075] The mode setting unit 110 switches the operation of the foreign object detection unit 50 to the monitoring mode or the operation confirmation mode. The mode setting unit 110 sets the operation of the foreign object detection unit 50 to either the monitoring mode or the operation confirmation mode according to the input information from the operator input via the control device 18, for example.

[0076] The signal acquisition unit 102 acquires an electrical signal corresponding to the intensity of the detection light from the light receiving unit 76. When the operation of the foreign matter detection unit 50 is set to the monitoring mode, the signal acquisition unit 102 acquires, for example, an electrical signal corresponding to the intensity of the light emitted from the processing liquid flow path 64 (first flow path 68a) through which the processing liquid to be monitored among the processing liquid flow path forming units 62A to 62L flows, from the light receiving element 94. When the operation of the foreign matter detection unit 50 is set to the operation confirmation mode, the signal acquisition unit 102 acquires, for example, an electrical signal corresponding to the intensity of the light emitted from the inspection liquid flow path 65 (first flow path 69a) of the inspection liquid flow path forming unit 63 through which the inspection liquid flows, from the light receiving element 94. The signal acquisition unit 102 acquires, for example, an electrical signal having an amplitude corresponding to the intensity of the detection light.

[0077] The foreign matter determination unit 104 detects the presence or absence of foreign matter in the processing liquid based on the intensity such as the amplitude of the electrical signal corresponding to the detection light (hereinafter referred to as "signal intensity"). FIG. 10 shows a graph illustrating an example of the temporal change of the signal intensity obtained from the signal acquisition unit 102. For example, as shown in FIG. 10, the foreign matter determination unit 104 determines that foreign matter is contained in the processing liquid when the signal intensity is greater than a predetermined threshold Th. The foreign matter determination unit 104 determines that no foreign matter is contained in the processing liquid when the signal intensity is equal to or less than the predetermined threshold Th. The threshold Th is a value set in advance in consideration of the intensity of the scattered light when the irradiation light is scattered by the foreign matter in the processing liquid.

[0078] The processing information acquisition unit 106 acquires information on the processing executed by the liquid processing unit U1 from the control device 18 (hereinafter referred to as "processing information"). The processing information includes, for example, information indicating the nozzle (processing liquid to be monitored) from which discharge is performed in the liquid processing unit U1, and information indicating the supply start timing and supply time of the processing liquid. The processing information acquisition unit 106 may acquire the processing information from the control device 18 before the supply of the processing liquid for each process using one processing liquid.

[0079] The drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 by moving the slide table 84 with the drive unit 80 between the processing liquid flow path forming unit 62A and the inspection liquid flow path forming unit 63. When the operation of the foreign matter detection unit 50 is set to the monitoring mode, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 to a position corresponding to the processing liquid flow path 68 through which the processing liquid passes among the processing liquid flow path forming units 62A to 62L, for example, according to the processing liquid indicated by the processing information, by the drive unit 80. For example, in the monitoring mode, when the irradiation light is not irradiated on the processing liquid flow path 68, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 to a predetermined standby position by the drive unit 80. In one example, the standby position is set to a position corresponding to the inspection liquid flow path 65 (a position where the irradiation light from the irradiation unit 74 is irradiated on the inspection liquid flow path 65). In other words, the inspection liquid flow path 65 is arranged at a position where the irradiation light from the irradiation unit 74 arranged at the standby position can be irradiated.

[0080] In the monitoring mode, the drive control unit 108 controls the drive unit 80 so that the irradiation light is irradiated on the processing liquid flow path 68 at least in part of the period during which the processing liquid is supplied to the workpiece W, and controls the drive unit 80 so that the irradiation light is irradiated on the inspection liquid flow path 65 at least in part of the period during which no processing liquid is supplied to the workpiece W. When the operation of the foreign matter detection unit 50 is set to the operation confirmation mode, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 to a position corresponding to the inspection liquid flow path 65 (the above-mentioned standby position) by the drive unit 80.

[0081] The reference information holding unit 112 holds reference information for confirming the operation of the foreign matter detection unit 50 in the operation confirmation mode. The reference information includes, for example, information indicating the detection result obtained when the foreign matter detection unit 50 is operated in the operation confirmation mode when the operation of the foreign matter detection unit 50 is normal. The reference information may be stored in the reference information holding unit 112 in advance by an operator, for example.

[0082] In the operation confirmation mode, the operation determination unit 114 determines whether the operation of the foreign object detection unit 50 is normal based on the detection result. For example, the operation determination unit 114 compares the detection result obtained based on the signal intensity corresponding to the light generated by the scattering of the irradiation light in the inspection liquid flow path 65 (the first flow path 69a) with the reference information to determine whether the operation of the foreign object detection unit 50 is normal.

[0083] The output unit 116 outputs the determination result to the outside of the foreign object detection unit 50. The output unit 116 may output the determination result to the control device 18, or may output the result to a display or the like that notifies the operator. For example, in the monitoring mode, when the foreign object determination unit 104 determines that a foreign object is included, the output unit 116 outputs an alarm signal indicating that the processing liquid to be monitored contains a foreign object. The output unit 116 outputs the determination result by the operation determination unit 114 in the operation confirmation mode.

[0084] The control unit 100 is composed of one or more control computers. For example, the control unit 100 has a circuit 200 shown in FIG. 11. The circuit 200 has one or more processors 202, a memory 204, a storage 206, an input / output port 208, and a timer 212. The storage 206 has a computer-readable storage medium such as a hard disk. The storage medium stores a program for causing the control unit 100 to execute an operation confirmation method described later. The storage medium may be a removable medium such as a non-volatile semiconductor memory, a magnetic disk, or an optical disk. The memory 204 temporarily stores the program loaded from the storage medium of the storage 206 and the calculation result by the processor 202.

[0085] The processor 202 cooperates with the memory 204 to execute the above program, thereby constituting each functional module. The input / output port 208 performs input / output of electrical signals with the control device 18, the light receiving unit 76, the driving unit 80, etc. according to commands from the processor 202. The timer 212 measures the elapsed time, for example, by counting reference pulses with a fixed period. Note that the hardware configuration of the control unit 100 is not necessarily limited to constituting each functional module by a program. For example, each functional module of the control unit 100 may be constituted by a dedicated logic circuit or an ASIC (Application Specific Integrated Circuit) integrating the same.

[0086] [Foreign Object Detection Method] Subsequently, with reference to FIG. 12, a foreign object detection method (foreign object detection procedure) executed when the operation mode of the foreign object detection unit 50 is set to the monitoring mode will be described. FIG. 12 is a flowchart showing an example of the foreign object detection method.

[0087] In a state where the irradiation of the irradiation light from the light source 72 is continued, for example, when the processing information acquisition unit 106 acquires processing information from the control device 18, the control unit 100 executes step S01. In step S01, for example, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 by moving the slide table 84 by the drive unit 80 to a position corresponding to the processing liquid flow path 64 through which the processing liquid to be monitored indicated by the processing information flows. Thereby, the irradiation light is irradiated from the irradiation unit 74 to the processing liquid flow path 64 through which the processing liquid to be monitored flows, and the light emitted from the processing liquid flow path 64 is received by the light receiving unit 76.

[0088] Next, the control unit 100 executes steps S02 and S03. In step S02, for example, the signal acquisition unit 102 acquires the signal intensity corresponding to the detection light received by the light receiving unit 76. In step S03, for example, the foreign matter determination unit 104 determines whether the signal intensity obtained in step S02 is greater than the threshold value Th. In step S03, if it is determined that the signal intensity is greater than the threshold value Th (step S03: YES), the control unit 100 executes step S04. In step S04, for example, the output unit 116 outputs an alarm signal indicating that the processing liquid to be monitored contains foreign matter. On the other hand, in step S03, if it is determined that the signal intensity is equal to or less than the threshold value Th (step S03: NO), the control unit 100 does not execute step S04.

[0089] Next, the control unit 100 executes step S05. In step S05, for example, the control unit 100 determines whether the supply of the processing liquid to be monitored has ended. The control unit 100 may determine whether the supply of the processing liquid has ended by measuring the elapsed time from the supply start timing included in the processing information. In step S05, if it is determined that the supply of the processing liquid to be monitored has not ended (step S05: NO), the control unit 100 repeats the processing of steps S02 and S03. Thereby, during the supply period of the processing liquid, the monitoring of whether the processing liquid contains foreign matter is continued.

[0090] In step S05, when it is determined that the supply of the processing liquid to be monitored has ended (step S05: YES), the control unit 100 executes step S06. In step S06, for example, the control unit 100 determines the presence or absence of a standby time based on the supply start timing (hereinafter referred to as "next supply start timing") for the next processing liquid to be monitored. As an example, when the time until the next supply start timing is greater than a predetermined time, it is determined that there is a standby time, and the control unit 100 executes step S07. In step S07, for example, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 to the standby position by the drive unit 80. In one example, the drive control unit 108 moves the irradiation unit 74 and the light receiving unit 76 by the drive unit 80 to a position corresponding to the inspection liquid flow path 65 where no processing liquid is flowing. Thereby, the irradiation light is irradiated from the irradiation unit 74 to the inspection liquid flow path 65.

[0091] Next, the control unit 100 executes step S08. In step S08, for example, the control unit 100 waits until it is time to start monitoring the next processing liquid to be monitored. For example, the control unit 100 waits until the time until the next supply start timing becomes shorter than the above-mentioned predetermined time. In step S08, when it is time to start monitoring the next processing liquid to be monitored (step S08: YES), or when it is determined in step S06 that there is no standby time (step S06: NO), the control unit 100 repeats the processing of steps S01 to S06.

[0092] [Operation Confirmation Method] Subsequently, with reference to FIGS. 13 to 16, an operation confirmation method of the foreign matter detection unit 50 that is executed when the operation mode of the foreign matter detection unit 50 is set to the monitoring mode will be described. When the operation confirmation method of the foreign matter detection unit 50 is executed, as shown in FIG. 13, the inspection liquid supply unit 150 is connected to the inspection liquid flow path 65 of the inspection liquid flow path forming unit 63. The inspection liquid supply unit 150 has, for example, a supply source 152, a supply pipe 154, an opening / closing valve V1, a drain pipe 162, and a recovery bottle 164.

[0093] The supply source 152 is a liquid source of an inspection liquid different from the processing liquid. The inspection liquid is, for example, a solution for operation confirmation not used for processing the workpiece W. As the inspection liquid, for example, at least one of pure water (DIW: Deionized Water) and a suspension may be used. The suspension contains reference particles having a predetermined (known) size at a predetermined concentration. For example, the size of the reference particles and the concentration of the reference particles are set to such an extent that the foreign object detection unit 50 can detect the reference particles as foreign objects when the inspection liquid flow path 65 is filled with the inspection liquid. The supply source 152 includes, for example, a storage unit such as a tank or a bottle for storing the inspection liquid, and a pressurizing unit for pressurizing the inside of the storage unit with nitrogen gas or the like.

[0094] The supply pipe 154 connects the supply source 152 and the inlet 65a of the inspection liquid flow path 65. The supply pipe 154 is connected to the upstream connection pipe 97, thereby connecting the supply source 152 and the inspection liquid flow path 65 via the upstream connection pipe 97. An on-off valve V1 is provided in the supply pipe 154. The on-off valve V1 opens and closes the flow path of the supply pipe 154 by switching the open / closed state. One end of the drain pipe 162 is connected to the downstream connection pipe 98 connected from the outlet 65b of the inspection liquid flow path 65. The other end of the drain pipe 162 is connected to the recovery bottle 164. The recovery bottle 164 recovers the inspection liquid after passing through the inspection liquid flow path 65. With the above configuration, the inspection liquid pumped from the supply source 152 by nitrogen gas or the like passes through the supply pipe 154, the inspection liquid flow path 65, and the drain pipe 162 in this order and flows to the recovery bottle 164. The opening and closing of the on-off valve V1, the flow rate of the inspection liquid supplied from the supply pipe 154 (the flow rate per unit time), etc. may be controlled by the control device 18, the control unit 100 of the foreign object detection unit 50, or another control device (not shown). Hereinafter, the case where the control unit 100 controls the inspection liquid supply unit 150 will be described as an example.

[0095] (Reference setting procedure) The method for verifying the operation of the foreign object detection unit 50 may include a reference setting procedure for acquiring reference information and an operation verification procedure executed based on the reference information. This reference setting procedure may be performed at any time, before the foreign object detection unit 50 is installed in the coating / development apparatus 2 (liquid processing unit U1), or after the foreign object detection unit 50 is installed in the coating / development apparatus 2. For example, the reference setting procedure may be executed after the manufacture of the foreign object detection unit 50 and before shipment. FIG. 14 is a flowchart showing an example of the reference setting procedure included in the operation verification method. In the reference setting procedure, first, step S21 is performed. In step S21, as preparation for the operation verification in the subsequent steps, for example, an inspection liquid supply unit 150 is connected to the foreign object detection unit 50 by an operator or the like.

[0096] Next, step S22 is performed. In step S22, the operation of the foreign object detection unit 50 is verified using pure water. In step S22, for example, while the control unit 100 causes the inspection liquid supply unit 150 to supply pure water to the inspection liquid flow path 65, the control unit 100 acquires the signal intensity and determines the presence or absence of foreign objects. Details of step S22 will be described later.

[0097] Next, step S23 is performed. In step S23, the operation of the foreign object detection unit 50 is verified using the above-described suspension. In step S23, for example, after the inspection liquid of the supply source 152 is exchanged from pure water to the suspension by an operator or the like, the control unit 100 causes the inspection liquid supply unit 150 to supply the suspension to the inspection liquid flow path 65 while acquiring the signal intensity and determining the presence or absence of foreign objects. Details of step S23 will be described later.

[0098] Next, step S24 is performed. In step S24, the operation of the foreign object detection unit 50 is confirmed using pure water. In step S24, for example, after the inspection liquid of the supply source 152 is replaced from the suspension to pure water by an operator or the like, the control unit 100 causes the inspection liquid supply unit 150 to supply pure water to the inspection liquid flow path 65, and acquires the signal intensity and determines the presence or absence of foreign objects. The pure water used in step S24 may be the same as the pure water used in step S22. The details of step S24 will be described later.

[0099] Steps S22 to S24 may be executed in the same procedure as each other except for the type of the inspection liquid. First, the details of step S23 when using the suspension will be described. FIG. 15 is a flowchart showing an example of the process of step S23. In the process of step S23, the emission of the irradiation light from the light source 72 to the optical member 82 is continued, and with the irradiation unit 74 and the light receiving unit 76 arranged at positions corresponding to the inspection liquid flow path 65 of the inspection liquid flow path forming unit 63, the control unit 100 first executes step S31. In step S31, for example, the control unit 100 supplies an inspection liquid (suspension) to the inspection liquid flow path 65 at a predetermined flow rate from the supply pipe 154 by switching the on-off valve V1 to the open state. Thereby, the inspection liquid (suspension) starts to flow through the inspection liquid flow path 65.

[0100] Next, the control unit 100 executes steps S32 and S33. In step S32, for example, the signal acquisition unit 102 acquires the signal intensity corresponding to the light emitted from the inspection liquid flow path 65 in a state where the inspection liquid is flowing. In step S33, for example, the control unit 100 determines whether or not a predetermined time has elapsed since the start of the supply of the inspection liquid in step S31.

[0101] In step S33, if it is determined that the predetermined time has not elapsed (step S33: NO), the control unit 100 repeats steps S32 and S33. In step S33, if it is determined that the predetermined time has elapsed (step S33: YES), the control unit 100 executes step S34. In step S34, for example, the control unit 100 stops the supply of the test liquid to the test liquid flow path 65 by the test liquid supply unit 150. The predetermined time is set to about 20 seconds to 300 seconds as an example.

[0102] Next, the control unit 100 executes step S35. In step S35, for example, the control unit 100 acquires reference information based on the signal intensity obtained from the start to the stop of the supply of the test liquid (hereinafter referred to as "test signal intensity"). Specific examples of the reference information include the number of times the signal intensity exceeds the threshold value Th in the test signal intensity (the number of times standard particles are detected per unit time), the maximum value, minimum value, or average value of the signal intensity when the threshold value Th is exceeded, the frequency distribution obtained by frequency-analyzing the test signal intensity, the change in the signal intensity (for example, the intensity of background light) when the flow rate of the suspension supplied to the test liquid flow path 65 is changed, and the integral value of the signal intensity in the test signal intensity. The reference information holding unit 112 of the control unit 100 stores the reference information obtained in step S35.

[0103] In the operation confirmation when using pure water in steps S22 and S24, the control unit 100 first performs the same processing as steps S31 to S34. Next, instead of step S35, the control unit 100 determines whether the operation of the foreign object detection unit 50 is normal based on the test signal intensity. The operation determination unit 114 of the control unit 100 determines whether the operation of the foreign object detection unit 50 is normal by determining, for example, whether the number of times the threshold value Th is exceeded in the test signal intensity is less than a predetermined number of times (for example, 1 time). The operation determination unit 114 may determine that the operation of the foreign object detection unit 50 is normal when the number of times the threshold value Th is exceeded in the test signal intensity is less than a predetermined number of times (for example, 1 time).

[0104] (Operation confirmation procedure) Next, an operation confirmation procedure executed based on reference information will be described. This operation confirmation procedure may be executed after the foreign object detection unit 50 is installed in the coating / developing apparatus 2. For example, the operation confirmation procedure may be executed when the foreign object detection unit 50 is installed in the coating / developing apparatus 2 after being shipped, or may be executed during maintenance of the coating / developing apparatus 2. In this operation confirmation procedure as well, for example, processing similar to the processing of steps S21 to S24 may be executed.

[0105] FIG. 16 is a flowchart showing an example of an operation confirmation process using a suspension in the operation confirmation procedure. In this operation confirmation process, for example, the control unit 100 may execute steps S41 to S44 in the same manner as steps S31 to S34. In steps S41 to S44, the same type of suspension as that used in the above-described reference setting procedure (more specifically, the same size and concentration of standard particles) may be used, and the flow rate and supply time when supplying the suspension may be set to the same values.

[0106] Next, the control unit 100 executes step S45. In step S45, for example, the operation determination unit 114 compares the detection result based on the inspection signal intensity obtained in steps S41 to S44 with the reference information to determine whether the operation of the foreign object detection unit 50 is normal (for example, whether foreign object detection can be performed with the same accuracy as at the time of shipment). For example, when the number of times the signal intensity exceeds the threshold Th (hereinafter referred to as the "reference number of times") during the supply period is set as the reference information, the operation determination unit 114 compares the number of times the signal intensity exceeds the threshold Th (hereinafter referred to as the "detection number of times") with the reference number of times in the inspection signal intensity obtained in steps S41 to S44. The operation determination unit 114 may determine that the operation of the foreign object detection unit 50 is normal when the detection number of times is included in the range obtained by adding an allowable error to the reference number of times, or may determine that the operation of the foreign object detection unit 50 is not normal when the detection number of times is outside the range. The output unit 116 may output the operation determination result by the operation determination unit 114 to the outside, such as the control device 18.

[0107] [Effects of the Embodiment] In the foreign matter detection unit 50 illustrated above, a detection liquid flow path forming unit 63 that forms a detection liquid flow path 65 through which a detection liquid different from the processing liquid flows is provided, and the light emitted from the processing liquid flow path 64 by the irradiation of the irradiation light and the light emitted from the detection liquid flow path 65 by the irradiation of the irradiation light are respectively received by the light receiving unit 76. Therefore, in addition to detecting foreign matter based on the light from the processing liquid flow path 64, it is possible to confirm the detection operation based on the light from the detection liquid flow path 65. Accordingly, it becomes possible to confirm whether the foreign matter detection operation is being performed normally.

[0108] When detecting foreign matter in the processing liquid based on the light obtained by irradiating the flow path through which the processing liquid flows with irradiation light, the presence or absence of foreign matter in the processing liquid is determined by detecting whether a change occurs in the intensity of the received detection light. However, even if the detection operation (detection function) of the foreign matter detection device is not operating normally, no change occurs in the intensity of the detection light, and it may be determined that no foreign matter is contained in the processing liquid. In the above-described foreign matter detection unit 50, it is possible to confirm (diagnose) whether the device itself is operating normally, that is, whether it can appropriately detect foreign matter when the detection liquid actually contains foreign matter. Therefore, the detection result of foreign matter can be made more reliable. Further, since the operation confirmation is performed using the detection liquid flow path 65, which is a flow path different from the processing liquid flow path 64, the above diagnosis can be performed without affecting the processing of the workpiece W. In addition, since the above diagnosis can be performed without flowing the detection liquid through the processing liquid flow path 64, cleaning of the processing liquid flow path 64 is also unnecessary. Accordingly, in the above-described foreign matter detection unit 50, it is possible to easily diagnose the detection operation of the device.

[0109] The light emitted from the processing liquid flow path 64 is the light scattered by the irradiation light in the processing liquid flow path 64, and the light emitted from the detection liquid flow path 65 is the light scattered by the irradiation light in the detection liquid flow path 65. In this case, since the intensity difference of the detection light due to the presence or absence of foreign matter in the processing liquid or the detection liquid is large, it is possible to more reliably perform foreign matter detection and its operation confirmation. Further, when the intensity difference of the detection light is large, the difference between the detection result during normal operation and the detection result when it is not normal can be obtained more reliably, so that the diagnosis of the detection operation of the device can be performed more easily.

[0110] At least a part of the processing liquid flow path 64 and at least a part of the inspection liquid flow path 65 are formed so as to extend along the X-axis or Z-axis direction (first direction), and are arranged side by side along the Y-axis direction (second direction). The drive unit 80 moves the irradiation unit 74 and the light receiving unit 76 along the Y-axis direction. In this case, it is possible to share the irradiation unit 74 that irradiates the irradiation light to the flow path and the light receiving unit 76 that receives the light from the flow path between the processing liquid flow path 64 and the inspection liquid flow path 65. Therefore, the configuration of the foreign matter detection unit 50 can be simplified.

[0111] The irradiation unit 74 has an optical member 82 configured to irradiate the irradiation light toward the processing liquid flow path 64 and the inspection liquid flow path 65 respectively by changing the direction of the irradiation light from the light source 72. In this case, since it is not necessary to move the light source 72 of the irradiation light, the drive unit 80 can be simplified.

[0112] In the Y-axis direction, the light source 72, the processing liquid flow path 64, and the inspection liquid flow path 65 are arranged in this order. If the inspection liquid flow path 65 is arranged between the light source 72 and the processing liquid flow path 64, the optical path length from the light source 72 to the processing liquid flow path 64 may be larger than the case where the inspection liquid flow path 65 is not present. Therefore, the intensity of the irradiation light from the light source 72 may become small, and the accuracy of foreign matter detection in the processing liquid flow path 64 may be reduced. On the other hand, in the above configuration, it is possible to prevent the optical path length of the irradiation light with respect to the processing liquid flow path 64 from increasing due to the provision of the inspection liquid flow path 65. Therefore, it is possible to suppress the influence on the accuracy of foreign matter detection by the inspection liquid flow path 65. Further, when the inspection liquid flow path 65 is arranged at the position farthest from the light source 72 and it is confirmed that the operation of foreign matter detection using the inspection liquid flow path 65 is appropriate, it can be estimated that foreign matter detection can be appropriately performed in all the processing liquid flow paths 64 closer to the light source 72 than the inspection liquid flow path 65. Therefore, by adopting the above configuration, the reliability of the operation confirmation can also be enhanced.

[0113] When the irradiation unit 74 is not irradiating the processing liquid flow path 64 with irradiation light, the control unit 100 (drive control unit 108) controls the drive unit 80 to move the irradiation unit 74 and the light receiving unit 76 to a predetermined standby position in the Y-axis direction. The inspection liquid flow path 65 is arranged at a position where the irradiation light from the irradiation unit 74 arranged at the standby position can be irradiated. In this configuration, when shifting from a state where the processing liquid flow path 64 is not irradiated with irradiation light to the confirmation of the foreign object detection operation, it is not necessary to adjust the positions of the irradiation unit 74 and the light receiving unit 76, so it is possible to shorten the setting time for operation confirmation.

[0114] The control unit 100 (drive control unit 108) controls the drive unit 80 so that the processing liquid flow path 64 is irradiated with irradiation light at least in a part of the period during which the processing liquid is supplied to the workpiece W, and controls the drive unit 80 so that the inspection liquid flow path 65 is irradiated with irradiation light at least in a part of the period during which the processing liquid is not supplied to the workpiece W. In this case, when the processing liquid is not supplied to the workpiece W, it is possible to suppress the influence of the irradiation light from the light source 72 on the processing liquid flow path 64.

[0115] In the coating / developing apparatus 2 including the foreign object detection unit 50, it is possible to diagnose whether the foreign object detection function of the foreign object detection unit 50 itself is operating normally, and by detecting foreign objects in the processing liquid in the supply unit 36, it is possible to detect defects of the workpiece W caused by foreign objects at an early stage.

[0116] In the method for confirming the operation of the foreign object detection unit 50, the inspection liquid flow path 65 different from the processing liquid flow path 64 through which the processing liquid supplied to the workpiece W flows is filled with an inspection liquid different from the processing liquid, and the inspection liquid flow path 65 is irradiated with irradiation light from the light source 72. Further, the light emitted from the inspection liquid flow path 65 due to the irradiation of the irradiation light is received. In this operation confirmation method, it is possible to simply diagnose the foreign object detection function of the foreign object detection unit 50.

[0117] When irradiation light is irradiated into the inspection liquid flow path 65, the irradiation light is irradiated into the inspection liquid flow path 65 while the inspection liquid is flowing through the inspection liquid flow path 65. In this case, it is possible to suppress contamination of the inspection liquid flow path 65 due to the inspection liquid staying in the inspection liquid flow path 65.

[0118] When irradiation light is irradiated into the inspection liquid flow path 65, the irradiation light is irradiated into the inspection liquid flow path 65 filled with a suspension containing reference particles. In this case, by detecting the change in the intensity of the detection light due to the reference particles, it becomes possible to diagnose the foreign object detection function of the foreign object detection unit 50.

[0119] [Modification Example] In addition to performing the operation confirmation using the inspection liquid flow path 65, the control unit 100 may perform the detection operation confirmation by monitoring the background light included in the light from the processing liquid flow path 64. As described above, even when there is no foreign object in the processing liquid flowing through the processing liquid flow path 64, the irradiation light is scattered by the processing liquid in the processing liquid flow path 64. The light receiving unit 76 receives a part of the scattered light generated by the scattering as background light. The control unit 100 may perform the detection operation confirmation by acquiring the intensity of the background light and comparing the acquired intensity of the background light with the intensity of the background light when the foreign object detection unit 50 is normal (hereinafter referred to as "reference intensity"). The control unit 100 may further include, for example, as functional modules, an intensity information acquisition unit 122 and a state monitoring unit 124, as shown in FIG. 6.

[0120] The intensity information acquisition unit 122 acquires information indicating the intensity of the background light (hereinafter referred to as "intensity information") based on the signal intensity of the detection light. The intensity information acquisition unit 122 may acquire, as intensity information, the time average of the signal intensities included in a predetermined period based on the signal intensities acquired by the signal acquisition unit 102 at a predetermined sampling period. The intensity information acquisition unit 122 may, for example, calculate the time average of the acquired values of the signal intensities included in the predetermined period at the time when the predetermined period has passed. The intensity information acquisition unit 122 may calculate the average value of the acquired values of the signal intensities included in the predetermined period as the time average, or may calculate the integrated value obtained by integrating the time change of the signal intensities included in the predetermined period as the time average.

[0121] The intensity information acquisition unit 122 may acquire intensity information during the supply period from the start to the end of the supply of the processing liquid to be monitored. At the time when the supply period ends, the intensity information acquisition unit 122 may acquire (calculate) the intensity information during the supply period, or may acquire the intensity information at each sampling period within the supply period. The intensity information acquisition unit 122 may sequentially calculate the moving average of the intensity information at each sampling period during the supply period, or may calculate the moving average of the intensity information at the time when the supply period elapses.

[0122] The intensity information acquisition unit 122 may acquire intensity information at a timing different from the supply period of the processing liquid. For example, the intensity information acquisition unit 122 may acquire intensity information when the operation mode of the foreign matter detection unit 50 is set to the operation confirmation mode. In this case, the intensity information acquisition unit 122 may acquire the intensity information of the background light included in the light emitted from the inspection liquid flow path 65 in a state where the inside of the inspection liquid flow path 65 is filled with the inspection liquid.

[0123] The reference information holding unit 112 may hold (store) the reference intensity of the background light obtained when the foreign matter detection unit 50 is normal. For the reference information holding unit 112, for example, the reference intensity may be set in advance by an operator, or the reference intensity of the background light may be set based on the inspection signal intensity obtained when the same reference setting procedure as described above is performed.

[0124] The state monitoring unit 124 may monitor (determine) whether the operation of the foreign object detection unit 50 is normal by comparing the intensity information acquired by the intensity information acquisition unit 122 with the reference intensity. For example, the state monitoring unit 124 may perform the above comparison and determination at regular intervals for calculating the time average, or may perform the above comparison and determination each time a certain processing liquid is supplied. As an example, the state monitoring unit 124 may determine that the operation of the foreign object detection unit 50 is normal when the intensity indicated by the intensity information is included in the range obtained by adding the allowable error to the reference intensity, and may determine that the operation of the foreign object detection unit 50 is not normal when it is out of the said range. The output unit 116 may output the monitoring result (determination result) by the state monitoring unit 124 to the outside such as the control device 18.

[0125] The operation confirmation method according to the above-described embodiment is an example, and the order of steps, execution timing, execution content, etc. can be appropriately changed. For example, in the operation confirmation using the suspension in step S23, the inspection signal intensity may be acquired in a state where the inspection liquid does not flow in the inspection liquid flow path 65 and the inspection liquid flow path 65 is filled with the inspection liquid (stagnant state). In the above example, the operation confirmation of the foreign object detection unit 50 is performed by the control unit 100, but the operation confirmation may be performed by an operator instead of the control unit 100. In this case, the control unit 100 may output the inspection signal intensity obtained in the monitoring mode to the outside of the foreign object detection unit 50, and the operator may perform the operation confirmation of the foreign object detection unit 50 by comparing the output inspection signal intensity with the reference information. The above operation confirmation method may be performed in parallel with the foreign object detection method. For example, when the irradiation unit 74 and the light receiving unit 76 are arranged at the standby positions in the foreign object detection method, the operation confirmation of the foreign object detection unit 50 may be performed using the inspection liquid in the inspection liquid flow path 65.

[0126] At least a part of the processing liquid flow path 64 (inspection liquid flow path 65) flowing through the block body 66 (block body 67) may be formed to extend in a direction other than the horizontal and vertical directions. The inlet 64a and outlet 64b of the processing liquid flow path 64 (inlet 65a and outlet 65b of the inspection liquid flow path 65) may be formed on different surfaces of the block body, respectively. The processing liquid flow path 64 and the inspection liquid flow path 65 may be configured to be different from each other.

[0127] The processing liquid flow path forming portions 62A to 62L may include a supply liquid passage through which the processing liquid flows, instead of the block body 66. The processing liquid flow path 64 may be a flow path in the supply liquid passage. The inspection liquid flow path forming portion 63 may include an inspection liquid passage through which the inspection liquid flows, instead of the block body 67. The inspection liquid flow path 65 may be a flow path in the inspection liquid passage. These liquid passages may be formed of a material capable of transmitting irradiation light (for example, quartz or sapphire). The foreign matter detection unit 50 may have one processing liquid flow path forming portion instead of the processing liquid flow path forming portions 62A to 62L.

[0128] The processing liquid channel forming units 62A to 62L and the inspection liquid channel forming unit 63 may be arranged along the Y-axis direction at substantially the same intervals as each other, or may be arranged at different intervals from each other. The processing liquid channel forming units 62A to 62L may be arranged at substantially the same intervals as each other, and the interval between the processing liquid channel forming unit 62L and the inspection liquid channel forming unit 63 may be larger than the interval between adjacent processing liquid channel forming units among the processing liquid channel forming units 62A to 62L. For example, the interval between the processing liquid channel forming unit 62L and the inspection liquid channel forming unit 63 may be larger than the width of one processing liquid channel forming unit in the Y-axis direction. One or a plurality of processing liquid channel forming units (for example, the processing liquid channel forming units 62K, 62L) adjacent to the inspection liquid channel forming unit 63 in the Y-axis direction may not be used for supplying the processing liquid to the workpiece W. That is, the processing liquid channel forming units 62A to 62J may be provided, and instead of the processing liquid channel forming units 62K, 62L, two dummy channel forming units not used for processing may be arranged between the processing liquid channel forming unit 62J and the inspection liquid channel forming unit 63. In these configurations, it is possible to suppress the influence (for example, temperature change of the processing liquid) on the inspection liquid channel 65 from the irradiation unit 74 arranged at the standby position or on the processing liquid in the processing liquid channel 64 due to the irradiation unit 74 and the light receiving unit 76 being located at the standby position.

[0129] The foreign matter detection unit 50 may include a monitoring irradiation unit that irradiates the processing liquid channel 64 of the processing liquid channel forming units 62A to 62L with irradiation light, and an operation confirmation irradiation unit that irradiates the inspection liquid channel 65 of the inspection liquid channel forming unit 63 with irradiation light. The foreign matter detection unit 50 may include a monitoring light receiving unit that receives light from the processing liquid channel 64, and an operation confirmation light receiving unit that receives light from the inspection liquid channel 65. The operation confirmation irradiation unit and the light receiving unit may be fixed at a fixed position, and the drive unit 80 may move the monitoring irradiation unit and the light receiving unit along the Y-axis direction. The inspection liquid channel forming unit 63 may not be arranged side by side with the processing liquid channel forming unit in the Y-axis direction.

[0130] The foreign object detection unit 50 may include a drive unit for irradiation that moves the irradiation unit 74 along the Y-axis direction, and a drive unit for light reception that moves the light reception unit 76 along the Y-axis direction. These two drive units may be configured to move the irradiation unit 74 and the light reception unit 76 along the Y-axis direction. The irradiation unit 74 may include a light source 72, and the irradiation light may be irradiated onto the processing liquid flow path 64 and the inspection liquid flow path 65 respectively without passing through the optical member 82.

[0131] The light reception unit 76 may receive a part of the transmitted light obtained by the irradiation light from the irradiation unit 74 passing through the processing liquid flow path 64. The light reception unit 76 may receive a part of the transmitted light obtained by the irradiation light from the irradiation unit 74 passing through the inspection liquid flow path 65. In this case, the irradiation unit 74 and the light reception unit 76 may be arranged so as to sandwich the processing liquid flow path forming parts 62A to 62L (inspection liquid flow path forming part 63) in the vertical direction (Z-axis direction).

[0132] Note that the specific configuration of the substrate processing apparatus is not limited to the configuration of the coating / developing apparatus 2 exemplified above. The substrate processing apparatus may be any one as long as it includes a foreign object detection unit 50 that detects foreign objects in the processing liquid supplied to the substrate. The processing liquid to be monitored by the foreign object detection unit 50 may be a solution for forming a film other than the resist film (for example, the lower layer film or the upper layer film described above), or a solution for substrate processing other than film formation. All or part of the functional modules of the control unit 100 of the foreign object detection unit 50 may be executed by the control device 18. In this case, the foreign object detection unit 50 and the control device 18 may constitute a foreign object detection device.

Explanation of Reference Numerals

[0133] 1... Substrate processing system, 2... Coating / developing apparatus, 30... Processing liquid supply unit, 32A to 32L... Nozzles, 36... Supply unit, 50... Foreign object detection unit, 60... Flow path forming part, 62A to 62L... Processing liquid flow path forming parts, 63... Inspection liquid flow path forming part, 64... Processing liquid flow path, 65... Inspection liquid flow path, 72... Light source, 74... Irradiation unit, 76... Light reception unit, 80... Drive unit, 82... Optical member, 100... Control unit, U1... Liquid processing unit, W... Workpiece.

Claims

1. A foreign matter detection device configured to detect foreign matter contained in a processing liquid for substrate processing, comprising: a plurality of processing liquid flow path forming parts, each of which forms a processing liquid flow path through which the processing liquid supplied to the substrate flows; an irradiation part configured to irradiate irradiation light from a light source toward each of the plurality of processing liquid flow paths formed by the plurality of processing liquid flow path forming parts; a light receiving part configured to receive light emitted from each of the plurality of processing liquid flow paths by the irradiation of the irradiation light; a driving part; a housing that houses the plurality of processing liquid flow path forming parts, the irradiation part, and the light receiving part; and the plurality of processing liquid flow paths are arranged side by side; the irradiation part has an optical member configured to irradiate the irradiation light toward the plurality of processing liquid flow paths by changing the direction of the irradiation light from the light source located in the housing; the driving part is configured to move the optical member and the light receiving part along the direction in which the plurality of processing liquid flow paths are arranged; each of the plurality of processing liquid flow path forming parts has one surface facing a side wall of the housing, and an inlet and an outlet provided on the one surface; an upstream supply pipe upstream of the processing liquid flow path is connected to the inlet; a downstream supply pipe downstream of the processing liquid flow path is connected to the outlet; each of the irradiation part and the light receiving part is located in a direction different from the direction in which the one surface is provided, with reference to a measurement position set in the processing liquid flow path. A foreign matter detection device.

2. The foreign matter detection device according to claim 1, wherein the light emitted from the processing liquid flow path is light scattered by the irradiation light in the processing liquid flow path.

3. The foreign matter detection device according to claim 1 or 2, wherein the plurality of processing liquid flow paths are formed to extend along a first direction and are arranged side by side along a second direction orthogonal to the first direction.

4. The foreign matter detection device according to any one of claims 1 to 3, wherein the light source and the plurality of processing liquid flow paths are arranged at different positions in the direction in which the plurality of processing liquid flow paths are arranged.

5. When the irradiation unit does not irradiate the irradiation light to the plurality of processing liquid channels, the drive unit is further controlled by a control unit to move the irradiation unit and the light receiving unit to a predetermined standby position in the direction in which the plurality of processing liquid channels are arranged. The foreign matter detection device according to any one of claims 1 to 4.

6. The processing liquid channel includes a first channel extending in the horizontal direction, The irradiation light from the irradiation unit is emitted upward toward the processing liquid channel, The measurement position is set in the first channel. The foreign matter detection device according to any one of claims 1 to 5.

7. The processing liquid channel further includes a third channel extending in the horizontal direction and a second channel connecting the first channel and the third channel, The first channel is connected to the inlet, The third channel is connected to the outlet, The first channel and the third channel are vertically separated from each other. The foreign matter detection device according to claim 6.

8. The drive unit is capable of moving the irradiation unit and the light receiving unit so that the irradiation light is irradiated to any one of the plurality of processing liquid channels formed by the plurality of processing liquid channel forming units, The light receiving unit receives a part of the light generated by the scattering of the irradiation light at the measurement position, The light receiving unit is arranged so as to sandwich the processing liquid channel between the side wall facing the one surface of the housing in the direction in which the first channel extends. The foreign matter detection device according to claim 7.

9. A processing liquid supply unit having a plurality of nozzles for discharging a processing liquid for substrate processing and a supply unit for supplying the processing liquid to each of the plurality of nozzles, A foreign matter detection unit configured to detect foreign matter contained in the processing liquid discharged from each of the plurality of nozzles toward the substrate in the supply unit, The foreign matter detection unit is A plurality of processing liquid channel forming units, each of which forms a processing liquid channel through which the processing liquid supplied to the substrate flows, An irradiation unit configured to irradiate irradiation light from a light source toward the plurality of processing liquid channels formed by the plurality of processing liquid channel forming units, A light receiving unit configured to receive the light emitted from the plurality of processing liquid channels by the irradiation of the irradiation light, A drive unit, A housing that houses the plurality of processing liquid channel forming units, the irradiation unit, and the light receiving unit, The plurality of processing liquid channels are arranged side by side, The irradiation unit has an optical member configured to irradiate the irradiation light from the light source located in the housing toward the plurality of processing liquid flow paths by changing the direction of the irradiation light, The driving unit is configured to move the optical member and the light receiving unit along the direction in which the plurality of processing liquid flow paths are arranged, Each of the plurality of processing liquid flow path forming portions has one surface facing the side wall of the housing and an inlet and an outlet provided on the one surface, An upstream supply pipe upstream of the processing liquid flow path is connected to the inlet, A downstream supply pipe downstream of the processing liquid flow path is connected to the outlet, The substrate processing apparatus, wherein each of the irradiation unit and the light receiving unit is located in a direction different from the direction in which the one surface is provided, with reference to a measurement position set in the processing liquid flow path.

10. A foreign matter detection method for detecting foreign matters contained in a processing liquid for substrate processing, Irradiating the irradiation light from a light source toward the plurality of processing liquid flow paths formed by the plurality of processing liquid flow path forming portions and through which the processing liquid supplied to the substrate flows, respectively, by an irradiation unit; Receiving the light emitted from the plurality of processing liquid flow paths by the irradiation of the irradiation light, respectively, by a light receiving unit; Driving the irradiation unit and the light receiving unit; Including, The plurality of processing liquid flow path forming portions, the irradiation unit, and the light receiving unit are stored in a housing, The plurality of processing liquid flow paths are arranged side by side, The irradiation unit has an optical member configured to irradiate the irradiation light from the light source toward the plurality of processing liquid flow paths by changing the direction of the irradiation light, Driving the irradiation unit and the light receiving unit includes moving the optical member and the light receiving unit along the direction in which the plurality of processing liquid flow paths are arranged, Each of the plurality of processing liquid flow path forming portions has one surface facing the side wall of the housing and an inlet and an outlet provided on the one surface, An upstream supply pipe upstream of the processing liquid flow path is connected to the inlet, A downstream supply pipe downstream of the processing liquid flow path is connected to the outlet, The foreign matter detection method, wherein each of the irradiation unit and the light receiving unit is located in a direction different from the direction in which the one surface is provided, with reference to a measurement position set in the processing liquid flow path.

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