Analysis system, analysis method, analysis program

Abstract

The purpose of the present disclosure is to reliably obtain spectrum information of transition metals and to secure measurement throughput, in a case where a sample is analyzed using two or more element analysis devices having different energy resolutions. An analysis system according to the present disclosure is configured such that, when a first element analysis device is used to analyze a first X ray of a sample and a transition metal element is detected, a second analysis device, which has a higher energy resolution than the first element analysis device, is used to analyze a second X ray of the sample.

Description

Technical Field

[0001] The present disclosure relates to an analysis system for analyzing elements contained in a sample.

Background Art

[0002] By combining an electron microscope and an elemental analyzer, information such as the elemental species and elemental distribution of a site observed using the electron microscope can be obtained. As the elemental analyzer, for example, an energy dispersive X-ray spectroscopy (EDS) device or the like is used. As the electron microscope, for example, a scanning electron microscope (SEM) or the like is used.

[0003] The following Patent Document 1 describes a technique for analyzing elemental distribution using EDS and performing further elemental analysis on each distribution region obtained as a result using a wavelength dispersive X-ray spectrometer (WDS).

[0004] The following Non-Patent Document 1 describes an X-ray analyzer using a transition edge sensor (TES) having higher energy resolution than EDS.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Non-Patent Documents

[0006]

Non-Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0007] Whether or not a transition metal is contained in a sample may be of great interest to the user. In this case, as a user, one does not want to miss even a small X-ray peak of the transition metal. However, compared with TES, although EDS has a high measurement throughput, its energy resolution is low. Therefore, the peak of the transition metal may be buried in a rough X-ray spectrum, and there is a possibility that information about the transition metal cannot be sufficiently identified from the X-ray spectrum.

[0008] Therefore, when elements cannot be sufficiently identified using EDS, it is conceivable to switch the measuring device to TES for further analysis. However, although TES has a high energy resolution, its throughput is low. Therefore, if TES is used too much, there is a concern that the measurement throughput will decrease too much.

[0009] Although Non-Patent Document 1 compares the characteristics of EDS and TES, it does not describe how to switch between the two devices. Patent Document 1 creates an elemental distribution map using EDS and then uses WDS for each elemental phase, and does not fully consider the compatibility between energy resolution and throughput between EDS and WDS. Also, none of these documents focus on the spectral information of transition metals.

[0010] The present disclosure has been made in view of the above problems, and aims to reliably obtain spectral information of transition metals and ensure measurement throughput when analyzing a sample using two or more types of elemental analyzers having different energy resolutions.

Means for Solving the Problems

[0011] When the analysis system according to the present disclosure detects a transition metal element by analyzing the first X-ray of a sample using a first elemental analyzer, it analyzes the second X-ray of the sample using a second elemental analyzer having a higher energy resolution than the first elemental analyzer.

Effects of the Invention

[0012] According to the analysis system according to the present disclosure, when analyzing a sample using two or more types of elemental analyzers having different energy resolutions, it is possible to reliably obtain spectral information of transition metals and ensure measurement throughput. Other problems, configurations, advantages, etc. of the present disclosure will become clear from the description of the following embodiments.

Brief Description of the Drawings

[0013]

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Mode for Carrying Out the Invention

[0014] <Embodiment 1> FIG. 1 is a configuration diagram of the analysis system 1 according to Embodiment 1 of the present disclosure. The analysis system 1 is an apparatus for analyzing the elements of the sample 16. Generally, the analysis system 1 includes a first element analyzer 11, a second element analyzer 12, a computer system 13, an electron beam control device 14, and an electron beam generator 15.

[0015] The first element analysis device 11 is a device for analyzing the elements contained in the sample 16, and can be constituted by, for example, an EDS device. The second element analysis device 12 is a device for analyzing the elements contained in the sample 16, and has a higher energy resolution than the first element analysis device 11. The second element analysis device 12 can be constituted by, for example, a TES device. The electron beam generation device 15 irradiates the sample 16 with an electron beam 151. The electron beam control device 14 controls the electron beam generation device 15. The sample 16 is, for example, a semiconductor substrate.

[0016] <Embodiment 1: Schematic operation of the analysis system 1> The electron beam generation device 15 focuses the electron beam 151 on a specific location of the sample 16. As a result, secondary particles 152 are generated from the sample 16. The detector 153 detects the secondary particles 152 and outputs a detection signal representing the intensity thereof to the electron beam control device 14. The computer system 13 generates an observation image (SEM image) of the sample 16 using the detection signal. The computer system 13 specifies, on the observation image, (a) a target portion 141 (target sample) to be analyzed for elements, and (b) a reference portion 142 (reference sample) for comparing the composition with the target portion 141.

[0017] The positions of the target portion 141 and the reference portion 142 may be specified by the user while viewing the observation image, or may be specified by the computer system 13 itself by searching for a specific shape pattern by an appropriate method such as template matching. For example, the positions of fine particles on the sample (e.g., foreign matter if the sample 16 is a semiconductor substrate), defects in the shape pattern, etc. can be specified as the target portion 141, and the positions where these do not exist can be specified as the reference portion 142.

[0018] The target portion 141 and the reference portion 142 may be different positions on the same sample, or the reference portion 142 may be specified on a reference sample different from the sample having the target portion 141. In any case, the target portion 141 is the target sample for which element analysis is to be performed, and the reference portion 142 is the reference sample serving as the comparison reference.

[0019] The electron beam generator 15 irradiates the target part 141 and the reference part 142 with an electron beam 151 over a certain period of time. The first element analyzer 11 acquires X-rays 161 (first X-rays) emitted from the target part 141 and X-rays 161 (second X-rays) emitted from the reference part 142, respectively.

[0020] The computer system 13 acquires data describing the results of the first element analyzer 11 detecting the X-rays 161, and uses this to acquire the energy spectrum (first energy spectrum) of the target part 141 and the energy spectrum (second energy spectrum) of the reference part 142, respectively. The energy spectrum represents the wavelength on the horizontal axis in terms of energy (eV), and the number of detected photons (count number) on the vertical axis.

[0021] The computer system 13 determines whether to further perform element analysis using the second element analyzer 12 by comparing the first energy spectrum and the second energy spectrum. Details of this determination procedure will be described later.

[0022] Figure 2 is a flowchart for explaining the operation of the analysis system 1. Hereinafter, the procedure for the analysis system 1 to analyze the elements contained in the sample 16 will be described with reference to Figure 2. Each step can be implemented by the computer system 13 controlling each part of the analysis system 1.

[0023] (Figure 2: Steps S201~S202) The first element analyzer 11 detects X-rays 161 from the target part 141 and the reference part 142, respectively. The computer system 13 acquires the energy spectrum (S201: first energy spectrum) of the target part 141 and the energy spectrum (S202: second energy spectrum) of the reference part 142, respectively.

[0024] (Figure 2: Steps S203~S204) The computer system 13 extracts feature quantities from region B on the energy spectrum by comparing the first energy spectrum and the second energy spectrum (S203), and extracts feature quantities (S204). Examples of region B will be described later.

[0025] (FIG. 2: Steps S205 to S206) When one or more feature quantities are extracted in region B (S205: Yes), the computer system 13 further analyzes the elements in the target part 141 using the second elemental analyzer 12 (S206). When no feature quantity is extracted (S205: No), this flowchart ends without using the second elemental analyzer 12.

[0026] FIG. 3 shows examples of the first energy spectrum 31 and the second energy spectrum 32 in S203. In FIG. 3, examples of the energy spectra from which feature quantities corresponding to carbon (C) and oxygen (O) are extracted are shown on the energy spectrum acquired by the first elemental analyzer 11.

[0027] The computer system 13 can set, for example, the peripheral region of the characteristic X-ray of the assumed elemental species as region B. In this example, the energy range of ±40 eV before and after the characteristic X-rays of carbon and oxygen (C-Kα ray: 273 eV, O-Kα ray: 525 eV) is set as region B.

[0028] Alternatively, the computer system 13 may set the energy range in which a significant difference occurs between the first energy spectrum 31 and the second energy spectrum 32 as region B. In the example shown in FIG. 3, a significant difference occurs between the two in the energy ranges before and after the characteristic X-rays of carbon and oxygen respectively. Therefore, the computer system sets the same energy range as described above as region B. The difference between the energy spectra can be calculated, for example, by summing the squares of the differences in count values between the spectra for each energy value.

[0029] <Embodiment 1: Matching Process between Spectra> As an example of the feature quantity in S204 to S205, assume a case where the difference between spectra is used. If the difference is equal to or greater than the threshold value, the difference can be used as the feature quantity of the energy spectrum of the target part 141. However, in order to appropriately extract the difference, for the energy region where there is no difference in elemental composition between the target part 141 and the reference part 142, the spectral values (count values on the vertical axis) need to match (not necessarily exactly, but at least match to the extent that the difference between spectra is less than the reference value). Therefore, the computer system 13 adjusts any energy spectrum so that the difference between spectra in the region other than region B (region A in FIG. 3) is less than the reference value according to the following procedure.

[0030] The computer system 13 preferably sets the energy region where the feature quantity is not extracted (that is, the energy region other than region B) as region A, and adjusts any energy spectrum so that the difference between the energy spectra in region A is less than the reference value. Specifically, by multiplying an appropriate coefficient by the count value (spectral value) at each energy, the scale of the count value is adjusted so that the difference in region A is less than the reference value. As a result, for the energy region (region A) where there is no difference in elemental composition between the target part 141 and the reference part 142, the energy spectra will match. That is, the difference in elemental composition clearly appears as a feature quantity in region B. The process of adjusting the difference between the energy spectra in such region A to be less than the reference value is called the matching process between spectra.

[0031] If the target part 141 is small, it is desirable to lower the acceleration voltage of the electron beam 151. On the other hand, in order to generate the target characteristic X-rays, it is necessary to make the energy of the electron beam 151 higher than the energy of the characteristic X-rays. For example, assuming that the element of the target part 141 is a transition metal, the energy of the characteristic X-rays of the transition metal is 1.5 keV or less. Considering the X-ray generation efficiency, the acceleration voltage of the electron beam 151 is preferably 2.5 kV to 3 kV. In this case, the generation efficiency of characteristic X-rays of 2 keV or more is low, and the intensity of continuous X-rays is more dominant than the intensity of characteristic X-rays. That is, the possibility of setting the energy region of 2 keV or more as region B is low. Therefore, when assuming a transition metal as the target part 141, the energy region of 2 keV or more is suitable as region A.

[0032] FIG. 4 is a diagram showing another example of the matching process between energy spectra. Here, it is assumed that the sample 16 is a silicon substrate. In this case, Si-Kα rays are always obtained as X-rays from the silicon substrate. Furthermore, O-Kα rays are always obtained as X-rays from oxygen attached to the substrate surface. Therefore, in this example, the energy regions corresponding to Si-Kα and O-Kα in the energy spectrum are always set as region B.

[0033] If the spectral peak of O-Kα is shifted between the target part 141 and the reference part 142, the difference between the target part 141 and the reference part 142 in the spectral tail region of the O-Kα ray becomes small, and there is a possibility of failing to detect weak characteristic X-rays buried in the tail region. The same situation also occurs for Si-Kα. Such a spectral peak shift is caused by the absorption of the Si-Kα ray and O-Kα ray of the substrate by the target part 141.

[0034] Therefore, computer system 13 matches the spectral peaks of O-Kα and Si-Kα, and then obtains the difference between the energy spectrum of target portion 141 and the energy spectrum of reference portion 142. This makes it possible to more reliably extract the difference between the two in the tail region. Specifically, computer system 13 adjusts one of the energy spectra so that the difference between the spectral peaks of O-Kα and Si-Kα is less than a reference value. That is, by multiplying the count value at each energy by an appropriate coefficient, the scale of the count value is adjusted so that the difference between the spectral peaks in region B is less than the reference value. Figure 4 shows the result. This process of matching spectral peaks is also an example of a spectral matching process.

[0035] After performing matching on the spectral peaks, the computer system 13 compares spectra 31 and 32 in the energy range outside of the peaks. In Fig. 4, the difference between the spectra is evident in the base of region B. Based on the comparison results, the computer system 13 can extract a feature (in this example, the difference between the spectra).

[0036] 5 is a flowchart illustrating the operation of the analysis system 1 when matching energy spectra between the target portion 141 and the reference portion 142. In this flowchart, in addition to the flowchart described in FIG. 2, S501 is added between S202 and S203. In S501, the computer system performs matching between energy spectra as described in FIGS. 3 and 4. These matching processes can also be used in combination.

[0037] <Embodiment 2> Figure 6 shows an example of an energy spectrum obtained using EDS and a TES. In this example, a weak Cu-Lα line (930 eV) is present near the transition metal Ni-Lα line (853 eV) and Ni-Lβ line (868 eV).

[0038] Transition metal information can be important information for the user, and as a user, the user does not want to miss even the small X-ray peak information of the transition metal. However, when there are minute sub-peaks near the main peak as shown in FIG. 6, there is a high possibility of missing such weak sub-peaks when only using the first elemental analyzer 11 (EDS). In Embodiment 2 of the present disclosure, a procedure for detecting such sub-peaks will be described. The configuration of the analysis system 1 is the same as that in Embodiment 1.

[0039] As illustrated in FIG. 6, an example of burying minute sub-peaks is a case where the peak of the energy spectrum of the transition metal is large. In FIG. 6, the Ni spectrum of 853 eV corresponds to this. Therefore, in the present embodiment, when there is a characteristic quantity of the transition metal (for example, a peak corresponding to Ni) in the energy spectrum of the target part 141 (or the reference part 142), in order to detect sub-peaks that may be buried, the second elemental analyzer 12 is used. The buried sub-peaks can be either a transition metal or an element other than the transition metal. In FIG. 6, an example where both the large peak and the sub-peak are transition metals is shown.

[0040] FIG. 7 is a flowchart for explaining the operation of the analysis system 1 in the present Embodiment 2. In this flowchart, in addition to the flowchart described in FIG. 2, S701 to S702 are added after S205: None. For convenience of description, the part before S204 is omitted.

[0041] (FIG. 7: Step S701) If one or more characteristic quantities are not extracted in S205, the computer system 13 further determines whether the characteristic quantity of the transition metal is included in the first energy spectrum. The energy range for determining the presence or absence of the transition metal may be region B or other than that. If the transition metal is included, the process proceeds to S206, and the second elemental analyzer 12 is used to analyze the transition metal in detail. If the transition metal is not included, the process proceeds to S701. Whether the transition metal is included or not can be determined by whether the spectral peak corresponding to the transition metal (the peak of Ni at 853 eV in FIG. 6) exists or not.

[0042] (FIG. 7: Step S702) The computer system 13 determines whether the target part 141 is an inorganic substance or an organic substance. In the present embodiment, since it is assumed that the user is interested in inorganic substances, if it is an organic substance, this flowchart is terminated. If it is an inorganic substance, the process proceeds to S206, and the second elemental analyzer 12 is used to analyze the inorganic substance in detail. The procedure for determining whether it is an inorganic substance or an organic substance will be described below.

[0043] FIG. 8 is a cross-sectional side view schematically showing the acceleration voltage of the electron beam 151 and the spread of the electron beam 151 in the sample 16. The higher the acceleration voltage of the electron beam 151 and the smaller the size of the target part 141, the higher the probability that the electron beam 151 penetrates the target part 141, and the smaller the amount of X-rays 161 from the target part 141. On the other hand, there is a correlation between the ionization cross section, which is an index of X-ray generation efficiency, and the overvoltage ratio. When the overvoltage ratio is approximately 3, the ionization cross section becomes the largest. Since the characteristic X-ray energy of carbon, which is the main component of the organic substance, is 273 eV, the acceleration voltage of the electron beam 151 is preferably about 1 kV in order to maximize the ionization cross section.

[0044] FIG. 9 is a diagram illustrating the energy spectra when the target portion 141 is an organic substance and when it is an inorganic substance, respectively. The upper part of FIG. 9 shows a spectral image in the vicinity of the C-Kα line when the target portion 141 is an organic substance and the reference portion 142 is silicon. When the target portion 141 is carbon, the peak intensity of C-Kα becomes higher than that of the reference portion 142. The lower part of FIG. 9 shows a spectral image in the vicinity of the C-Kα line when the target portion 141 is an inorganic substance and the reference portion 142 is silicon. When the electron beam 151 irradiates the target portion 141 and the sample 16 (silicon), a carbon film is always formed on the surface (carbon contamination), depending on the degree of vacuum in the vacuum chamber housing the optical system unit 154. Thus, even when the target portion 141 is an inorganic substance, a carbon spectrum similar to that of the silicon substrate can be obtained from the target portion 141. Therefore, in this case, the difference in the C-Kα line peak between the target portion 141 and the reference portion 142 is small.

[0045] As described above, when the target portion 141 is an organic substance, the difference in the spectral peak of the C-Kα line is large between the target portion 141 and the reference portion 142, and when it is an inorganic substance, the difference is small. Based on this difference, the computer system 13 can determine whether the target portion 141 is an organic substance or an inorganic substance in S702. Specifically, if the difference in the spectral peak in the vicinity of the C-Kα line between the target portion 141 and the reference portion 142 is equal to or greater than the threshold value, it can be determined that the target portion 141 is an organic substance, and if it is less than the threshold value, it is an inorganic substance.

[0046] As described with reference to FIG. 8, the difference between such spectral peaks appears most prominently when the acceleration voltage of the electron beam 151 is about 1 kV (or less). Therefore, before starting S702 after S205, the computer system 13 changes the acceleration voltage of the electron beam 151 to 1 kV or less. Thereby, even when no feature amount is detected in S205, the difference between the spectral peaks described in FIG. 9 can be prominently identified.

[0047] The determination of organic and inorganic substances does not necessarily have to be carried out using the difference between spectral peaks, and features equivalent to the difference may be used. For example, it is conceivable to compare the spectral areas near the peaks between Spectra 31 and 32. Other similar features can also be used.

[0048] <Embodiment 3> In Embodiment 2, when there is no difference between the target part 141 and the reference part 142 (that is, when there is no feature of the energy spectrum, S205: none), it was explained that the process proceeds to S701 to analyze the transition metal. Instead of this, when a transition metal is obtained during the acquisition of the X-ray spectrum of the target part 141, the analysis using the second element analyzer 12 may be started. A specific example thereof will be described in Embodiment 3 of the present disclosure. The configuration of the analysis system 1 is the same as that in Embodiment 1.

[0049] FIG. 10 is a flowchart for explaining the operation of the analysis system 1 in the present Embodiment 3. In S1001, the computer system 13 acquires the energy spectrum of the target part 141 using the first element analyzer 11. The subsequent operations are the same as those after S701 in FIG. 7. That is, when a transition metal is detected when the energy spectrum is acquired by the first element analyzer 11, the spectrum of the reference part 142 is not acquired, and the analysis using the second element analyzer is started (S206). This is effective when shifting from the analysis using the first element analyzer 11 to the analysis using the second element analyzer 12 in a short time.

[0050] However, as described with reference to FIG. 9, when determining inorganic / organic substances, the acceleration voltage of the electron beam 151 may be switched. When switching the acceleration voltage again when proceeding from S702 to S206, a certain amount of time is required for the switching. Therefore, when the feature of the transition metal is not included in the energy spectrum in S701, both S702 and S206 may not be performed and the flowchart may end. As a result, the analysis of the transition metal is prioritized, and the shortening of the measurement time is prioritized.

[0051] The computer system 13 may switch whether to execute the flowchart of FIG. 10, for example, according to a user's designation. That is, if the user desires to shift from the analysis using the first elemental analyzer 11 to the analysis using the second elemental analyzer 12 in a short time, FIG. 10 may be executed; otherwise, the flowchart described in Embodiments 1 to 2 may be executed.

[0052] <Embodiment 4> FIG. 11 is a flowchart for explaining the operation of the analysis system 1 according to Embodiment 4 of the present disclosure. The inorganic / organic determination described with reference to FIG. 9 may be performed alone. In this case, the computer system 13 sets the acceleration voltage to 1 kV or less and then executes the procedure described with reference to FIG. 9. If the target portion 141 is an inorganic substance, further analysis is performed using the second elemental analyzer 12. This flowchart shows the above procedure.

[0053] The computer system 13 may switch whether to execute the flowchart of FIG. 11, for example, according to a user's designation. For example, when the position of the target portion 141 is specified in advance and it is desired to know whether an inorganic substance exists at that position, FIG. 11 may be executed. Otherwise, the flowcharts described in Embodiments 1 to 3 may be executed.

[0054] In Embodiment 4, by limiting the determination of the start of the second elemental analysis to the inorganic / organic category determination, the amount of elemental information in the analysis result presented to the user can be increased (for example, not only information on transition metals but also information on heavy metals can be presented together).

[0055] <Embodiment 5> FIG. 12 shows an example of a user interface provided by the computer system 13. In the above embodiments, the computer system 13 may receive an operation instruction from the user by displaying a user interface (GUI) as shown in FIG. 12 on the screen.

[0056] On the GUI, a first element analysis setting button and a second element analysis setting button are arranged. When each button is pressed, a pop-up screen (lower part of FIG. 12) for inputting respective times is displayed, and the user inputs the measurement time using the first element analyzer 11 and the measurement time using the second element analyzer 12 on that screen. If there are other necessary setting items besides time setting, they can be added arbitrarily.

[0057] The GUI further has a column in which position information output from an inspection device for identifying a particle position different from the analysis system 1 and particle (defect) number information are described. In this column, for example, the file name describing the first element analysis result and the file name describing the second element analysis result (spectrum, element information, etc.) are described. Further, a "Second Element Analysis Execution" column is provided so that it is possible to identify the samples 16 among the samples 16 analyzed using the first element analyzer 11 that have been transferred to the analysis using the second element analyzer 12, and an "〇" is described for the transferred samples 16.

[0058] When the first and second energy spectrum acquisition setting buttons are pressed, the computer system 13 displays on the screen a user interface described in FIG. 13 below.

[0059] FIG. 13 shows another example of the user interface provided by the computer system 13. The GUI displays an observation image (SEM image) of the sample 16. The SEM image includes a target part 141 and a reference part 142 respectively.

[0060] The GUI further has columns for setting the conditions for the first energy spectrum acquisition and the second energy spectrum acquisition. The user selects spot analysis or area analysis in the first energy spectrum acquisition and the second energy spectrum acquisition.

[0061] The GUI further has a field for selecting a method of matching between energy spectra. As the matching method, for example, (a) a manual method in which the user selects a range by themselves, (b) 2 keV or higher (the procedure described in FIG. 3), (c) a method using the peak of the S-Kα line or the O-Kα line (the procedure described in FIG. 4) can be selected. When using the Si-Kα line and the O-Kα line, an energy range (ROI: Region of Interest) for comparing the first energy spectrum and the second energy spectrum is set. When the setting end button is pressed, the screen returns to the screen of FIG. 12.

[0062] When the user presses the first element analysis execution button on the screen of FIG. 12, the operations of each flowchart are performed. For a sample with a "〇" in the second element analysis column, the analysis using the second element analyzer 12 may be automatically started, or this may be started when the second element analysis execution button is pressed.

[0063] The GUI may display each energy spectrum. For example, the energy spectrum of the target part 141, the energy spectrum of the reference part 142, etc. can be displayed. The result of the matching process and the process thereof may be displayed.

[0064] <Regarding the modification example of the present disclosure> The present disclosure is not limited to the above-described embodiments and includes various modification examples. For example, the above-described embodiments have been described in detail for easy understanding of the present disclosure, and it is not necessary to necessarily include all the configurations described. Also, a part of one embodiment can be replaced with the configuration of another embodiment. Also, the configuration of another embodiment can be added to the configuration of one embodiment. Also, for a part of the configuration of each embodiment, a part of the configuration of another embodiment can be added, deleted, or replaced.

[0065] In Embodiment 2, it was explained that an acceleration voltage of the electron beam 151 of about 1 kV is desirable, but this is just an example, and other acceleration voltages may be used. Also, the sub-peaks of the transition metals shown in FIG. 6 are just examples, and there may be cases where the L-lines of the transition metals are buried in the skirt regions of the K-lines of other light elements. Even in such cases, the buried transition metals can be detected by the procedure of Embodiment 2.

[0066] In the above embodiments, it was explained that the position for obtaining the energy spectrum of X-rays is specified using the observation image of the sample 16 formed using the electron beam 151. As an example, when the sample 16 is a semiconductor wafer, the position of the fine particles (or defects in the shape pattern) attached to the sample surface is specified by the observation image, and the elements of the fine particles are specified by each elemental analyzer, whereby the cause of the defect or the like can be analyzed.

[0067] In the above embodiments, the computer system 13 can be configured by an arithmetic device such as a processor that executes a program implementing the procedures of each flowchart, and a storage device that stores the program. Alternatively, instead of this program, the computer system 13 can also be configured by hardware such as a circuit device implementing the same procedures.

Description of Reference Numerals

[0068] 1: Analysis system 11: First elemental analyzer 12: Second elemental analyzer 13: Computer system 141: Target part 142: Reference part 16: Sample

Claims

1. An analysis system for analyzing elements contained in a sample, comprising a computer system that analyzes the elements contained in the sample using the result of detection of first X-rays generated from the sample by a first elemental analyzer or the result of detection of second X-rays generated from the sample by a second elemental analyzer, wherein the second elemental analyzer has a higher X-ray energy resolution than the first elemental analyzer, wherein the computer system determines whether the sample contains a transition metal element using the result of detection of the first X-rays by the first elemental analyzer, wherein when the computer system detects the transition metal element, the computer system analyzes the elemental species of the transition metal element by obtaining the result of detection of the second X-rays by the second elemental analyzer, wherein the first elemental analyzer is an energy dispersive X-ray analyzer, and wherein the second elemental analyzer is an X-ray analyzer using a superconducting transition edge sensor characterizing the analysis system.

2. The analysis system further includes an irradiation unit that irradiates the sample with an electron beam, wherein the computer system specifies the position on the sample where the second elemental analyzer analyzes the transition metal element using the result of detection of secondary particles obtained from the sample by irradiating the sample with the electron beam. The analysis system according to claim 1, characterized in that.

3. The sample is a semiconductor substrate, wherein the computer system obtains the position of fine particles adhering to the semiconductor substrate or the position of a defect on the semiconductor substrate using the result of detection of the secondary particles, and wherein the computer system specifies the position on the sample where the second elemental analyzer analyzes the transition metal element based on the obtained position of the fine particles or the obtained position of the defect. The analysis system according to claim 2, characterized in that.

4. The computer system obtains a first energy spectrum of the first X-rays generated from the sample using the first elemental analyzer, wherein the computer system determines whether a characteristic amount of the transition metal element exists in the first energy spectrum, and wherein when the characteristic amount of the transition metal element exists in the first energy spectrum, the computer system analyzes the elements contained in the sample using the second elemental analyzer. The analysis system according to claim 1, characterized in that.

5. When there is no characteristic quantity of the transition metal element in the first energy spectrum, the computer system further determines whether there is a characteristic quantity of an organic substance or an inorganic substance. When the computer system detects a characteristic quantity of an inorganic substance in the first energy spectrum, the computer system analyzes the elements contained in the sample using the second element analyzer. The analysis system according to claim 4, characterized in that.

6. The computer system acquires a second energy spectrum of X-rays generated from a reference sample using the first element analyzer. The computer system detects a difference between the first energy spectrum and the second energy spectrum as a characteristic quantity. If the difference is equal to or greater than a threshold value, the computer system determines that the difference is a characteristic quantity of an organic substance, and if the difference is less than the threshold value, the computer system determines that the difference is a characteristic quantity of an inorganic substance. The analysis system according to claim 4, characterized in that.

7. The analysis system further includes an irradiation unit that irradiates the sample with an electron beam. The computer system determines whether the characteristic quantity is a characteristic quantity of an organic substance by comparing the first energy spectrum and the second energy spectrum obtained by irradiating the electron beam at an acceleration voltage of 1 kV or less. The analysis system according to claim 6, characterized in that.

8. The computer system The energy spectrum of the first X-ray The energy spectrum of the second X-ray An observation image of the sample The analysis system according to claim 1, characterized in that it provides a user interface for presenting at least any one of them. The analysis system according to claim 1, characterized in that.

9. The analysis system further includes the first element analyzer and the second element analyzer. The analysis system according to claim 1, characterized in that.

10. An analysis method for analyzing the elements contained in a sample, The method includes a step of analyzing the elements contained in the sample using the result of the first element analyzer detecting the first X-ray generated from the sample or the result of the second element analyzer detecting the second X-ray generated from the sample. The second element analyzer has a higher X-ray energy resolution than the first element analyzer. In the step of analysis, using the result of the first element analyzer detecting the first X-ray, it is determined whether the sample has a transition metal element. In the step of analysis, when the transition metal element is detected, by obtaining the result of the second element analyzer detecting the second X-ray, the elemental species of the transition metal element is analyzed. The first element analyzer is an energy dispersive X-ray analyzer. The second element analyzer is an X-ray analyzer using a superconducting transition edge sensor. A method of analysis characterized by the above.

11. An analysis program for causing a computer to execute a process of analyzing elements contained in a sample, causing the computer to: execute a step of analyzing the elements contained in the sample using the result of the first element analyzer detecting the first X-ray generated from the sample or the result of the second element analyzer detecting the second X-ray generated from the sample; The second element analyzer has a higher X-ray energy resolution than the first element analyzer. In the step of analysis, causing the computer to execute a step of determining whether the sample has a transition metal element using the result of the first element analyzer detecting the first X-ray. In the step of analysis, when the transition metal element is detected, causing the computer to execute a step of analyzing the elemental species of the transition metal element by obtaining the result of the second element analyzer detecting the second X-ray. The first element analyzer is an energy dispersive X-ray analyzer. The second element analyzer is an X-ray analyzer using a superconducting transition edge sensor. An analysis program characterized by the above.

12. An analysis system for analyzing elements contained in a sample, comprising: a computer system that analyzes the elements contained in the sample using the result of the first element analyzer detecting the first X-ray generated from the sample or the result of the second element analyzer detecting the second X-ray generated from the sample; The second element analyzer has a higher X-ray energy resolution than the first element analyzer. The computer system determines whether the sample is an inorganic substance using the result of the first element analyzer detecting the first X-ray. When the computer system determines that the sample is an inorganic substance, the computer system analyzes the elemental species of the inorganic substance by obtaining the result of the second element analyzer detecting the second X-ray. The first element analyzer is an energy dispersive X-ray analyzer. The second element analyzer is an X-ray analyzer using a superconducting transition edge sensor. An analysis system characterized by the above.

13. An analysis method for analyzing the elements of a sample, comprising: analyzing the elements of the sample using the result of the first element analyzer detecting the first X-ray generated from the sample or the result of the second element analyzer detecting the second X-ray generated from the sample; the second element analyzer has a higher X-ray energy resolution than the first element analyzer; in the step of analyzing, determining whether the sample is an inorganic substance using the result of the first element analyzer detecting the first X-ray; in the step of analyzing, when it is determined that the sample is an inorganic substance, analyzing the elemental species of the inorganic substance by obtaining the result of the second element analyzer detecting the second X-ray; The first element analyzer is an energy dispersive X-ray analyzer. The second element analyzer is an X-ray analyzer using a superconducting transition edge sensor. An analysis method characterized by the above.

14. An analysis program for causing a computer to execute a process of analyzing the elements of a sample, the program causing the computer to: execute a step of analyzing the elements of the sample using the result of the first element analyzer detecting the first X-ray generated from the sample or the result of the second element analyzer detecting the second X-ray generated from the sample; the second element analyzer has a higher X-ray energy resolution than the first element analyzer; in the step of analyzing, causing the computer to execute a step of determining whether the sample is an inorganic substance using the result of the first element analyzer detecting the first X-ray; in the step of analyzing, when it is determined that the sample is an inorganic substance, causing the computer to execute a step of analyzing the elemental species of the inorganic substance by obtaining the result of the second element analyzer detecting the second X-ray; The first element analyzer is an energy dispersive X-ray analyzer. The second element analyzer is an X-ray analyzer using a superconducting transition edge sensor. An analysis program characterized by the above.

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