Polishing composition and method for producing the same, polishing method, and method for producing substrate

The polishing composition with silica and polyalkylene glycol addresses the challenge of achieving high selectivity and step reduction in semiconductor manufacturing by optimizing pH and molecular weight distribution, enhancing polishing performance for silicon nitride and polycrystalline silicon.

JP7727430B2Active Publication Date: 2025-08-21FUJIMI INCORPORATED
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Patent Information

Application Number
JP2021118843
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-09-29
Filing Date
2021-07-19
Publication Date
2025-08-21
Estimated Expiration
2041-07-19

AI Technical Summary

Technical Problem

Existing polishing compositions struggle to achieve a high polishing rate for specific materials while maintaining high selectivity and significantly reducing steps between different materials in semiconductor manufacturing, particularly for materials like silicon nitride and polycrystalline silicon.

Method used

A polishing composition containing silica with an organic acid fixed to its surface and polyalkylene glycol, with a specific molecular weight distribution and pH range of 3 to 6, is used to enhance polishing rates and selectivity between materials.

Benefits of technology

The composition achieves a high polishing rate for specific materials, particularly silicon nitride, while significantly improving selectivity and reducing steps between different materials, such as silicon nitride and polycrystalline silicon.

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Patent Text Reader

Abstract

To provide means capable of achieving a remarkably high selectivity and a remarkably high step reduction effect between different materials while achieving a high polishing rate for a specific material.SOLUTION: A polishing composition according to the present invention includes silica with organic acid fixed on the surface and polyalkylene glycol, and the polyethylene glycol-equivalent molecular weight distribution of polyalkylene glycol by gel permeation chromatography (GPC) has two or more peaks within a predetermined molecular weight range, at least one of which is a peak derived from polyethylene glycol, and pH is 3 or more and 6 or less.SELECTED DRAWING: None
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Citation Information

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