Vaporization device, substrate processing system, and vaporization method

Abstract

To provide a technology that can monitor temperature of liquid stored in a vaporizing device with high accuracy.SOLUTION: A vaporizing device includes: a housing; a tray installed in the housing to store a liquid raw material; a temperature sensor embedded in a bottom wall of the tray; and a heater for heating the liquid raw material.SELECTED DRAWING: Figure 7

Description

[Technical Field]

[0001] The present disclosure relates to a vaporization apparatus, a substrate processing system, and a vaporization method. [Background technology]

[0002] A technique is known in which liquid precursors stored in a plurality of trays are vaporized and the vaporized precursors are supplied to a process chamber (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2015-110837 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique for monitoring the temperature of a liquid stored in a vaporizer with high accuracy. [Means for solving the problem]

[0005] A vaporization device according to one aspect of the present disclosure includes a housing, a tray provided in the housing for storing a liquid source, a temperature sensor embedded in a bottom wall of the tray, and a heater for heating the liquid source. death , The tray has a sensor hole in which the temperature sensor is embedded, the sensor hole extending in a horizontal direction, the sensor hole communicating with the outside of the housing and not communicating with the inside of the housing. . [Effects of the Invention]

[0006] According to the present disclosure, the temperature of the liquid stored in the vaporizer can be monitored with high accuracy. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a schematic diagram illustrating a substrate processing system according to an embodiment; [Figure 2] FIG. 1 is a left side view showing a vaporizer according to a first configuration example of an embodiment. [Figure 3] FIG. 1 is a front view showing a vaporizer according to a first configuration example of an embodiment; [Figure 4] FIG. 1 is a right side view showing a vaporizer according to a first configuration example of an embodiment. [Figure 5] Cross-sectional view of Figure 2 taken along the line 1A-1A [Figure 6] Cross-sectional view of Figure 2 taken along the arrows 1B-1B [Figure 7] Cross-sectional view of Figure 3 taken along the line 1C-1C [Figure 8] 1D-1D cross-sectional view of Figure 4 [Figure 9] FIG. 10 is a left side view showing a vaporizer according to a second configuration example of an embodiment. [Figure 10] FIG. 10 is a front view showing a vaporizer according to a second configuration example of an embodiment. [Figure 11] FIG. 10 is a right side view showing a vaporizer according to a second configuration example of an embodiment. [Figure 12] 2A-2A cross-sectional view of Figure 9 [Figure 13] 2B-2B cross-sectional view of Figure 9 [Figure 14] 2C-2C cross-sectional view of Figure 10 DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the accompanying drawings, the same or corresponding reference numerals are used to designate the same or corresponding members or components, and redundant descriptions will be omitted.

[0009] [Substrate Processing System] A substrate processing system 1 according to an embodiment will be described with reference to FIG.

[0010] The substrate processing system 1 includes a liquid source supply source 2, a liquid source vaporization supply device 3, and a processing vessel 4. The substrate processing system 1 supplies a liquid source (liquid precursor) supplied from the liquid source supply source 2 to the liquid source vaporization supply device 3. The substrate processing system 1 vaporizes the liquid source in the liquid source vaporization supply device 3 and supplies the vaporized source gas to the processing vessel 4, thereby performing a desired process (e.g., a film formation process) on a substrate W placed on a mounting table 5 in the processing vessel 4.

[0011] The liquid raw material supply source 2 stores a liquid raw material and supplies the liquid raw material to the liquid raw material vaporization supply device 3 .

[0012] The liquid raw material vaporization supply system 3 vaporizes the liquid raw material supplied from the liquid raw material supply source 2 and stores the vaporized raw material gas. The liquid raw material vaporization supply system 3 supplies the stored raw material gas to a processing vessel 4. The liquid raw material vaporization supply system 3 includes a liquid supply valve 10, a vaporizer 20, a gas flow rate regulator 30, and a controller 40.

[0013] Liquid supply valve 10 is, for example, an on-off valve, and is provided in a supply path that supplies the liquid source from liquid source supply source 2 to liquid source vaporization supply device 3. Opening and closing of liquid supply valve 10 is controlled by control device 40.

[0014] The vaporizer 20 vaporizes the liquid source to generate a source gas, and supplies the generated source gas to the processing chamber 4. The configuration of the vaporizer 20 will be described later.

[0015] The gas flow rate adjusting device 30 includes a pressure sensor 31 , a flow rate sensor 32 , and a flow rate control valve 33 .

[0016] The pressure sensor 31 detects the pressure of the source gas. The pressure sensor 31 is provided in a supply path that supplies the source gas from the vaporizer 20 to the processing chamber 4. The pressure of the source gas detected by the pressure sensor 31 is output to the control device 40.

[0017] The flow rate sensor 32 detects the flow rate of the source gas. The flow rate sensor 32 is provided in a supply path that supplies the source gas from the vaporizer 20 to the processing chamber 4. The flow rate of the source gas detected by the flow rate sensor 32 is output to the control device 40.

[0018] Flow control valve 33 is provided in a supply path that supplies the source gas from vaporizer 20 to processing vessel 4, and controls the flow rate of the source gas supplied from vaporizer 20 to processing vessel 4. The opening (flow rate) of flow control valve 33 is controlled by controller 40.

[0019] The control device 40 controls the opening and closing of the liquid supply valve 10 based on the pressure of the source gas detected by the pressure sensor 31. The control device 40 controls the opening and closing of the flow rate control valve 33 based on the flow rate of the source gas detected by the flow rate sensor 32.

[0020] [Vaporization device] A vaporizer 20 according to a first configuration example of the embodiment will be described with reference to FIGS.

[0021] Vaporizer 20 includes housing 21, a plurality of trays 22a to 22d, a plurality of temperature sensors 23a to 23d, and a plurality of heaters 24a to 24d.

[0022] The housing 21 has a substantially rectangular parallelepiped shape. The housing 21 defines a vaporization chamber A therein. The liquid source material is vaporized in the vaporization chamber A. The housing 21 includes a bottom wall 21a, a top wall 21b, a front wall 21c, a rear wall 21d, a first side wall 21e, and a second side wall 21f. The bottom wall 21a, the top wall 21b, the front wall 21c, the rear wall 21d, the first side wall 21e, and the second side wall 21f are integrally formed by, for example, 3D printing. However, they may also be formed separately and then welded together. A liquid source material inlet port 21g is formed at the top of the first side wall 21e. The liquid source material inlet port 21g penetrates the first side wall 21e and introduces the liquid source material supplied from the liquid source supply source 2 into the vaporization chamber A within the housing 21. A gas outlet port 21h is formed in the top wall 21b. Gas exhaust port 21h supplies the source gas stored in vaporization chamber A to processing vessel 4. Housing 21 is made of a material having high thermal conductivity and corrosion resistance, such as SUS316L.

[0023] The plurality of trays 22a to 22d are arranged in multiple stages within the housing 21. Each of the trays 22a to 22d stores a liquid source material. Storing the liquid source material in each of the trays 22a to 22d increases the surface area of ​​the liquid source material in the vaporization chamber A, thereby improving the vaporization rate and enabling a large flow rate of source gas to be supplied to the processing vessel 4. The liquid source material introduced from the liquid source introduction port 21g flows from the uppermost tray to the lowermost tray of the plurality of trays 22a to 22d arranged in multiple stages. That is, the liquid source material introduced from the liquid source introduction port 21g is introduced into the uppermost tray 22a. When the liquid source material stored in the uppermost tray 22a exceeds the height of the partition 22p, the liquid source flows from the uppermost tray 22a to the second-stage tray 22b. When the liquid raw material stored in the second tray 22b exceeds the height of the partition 22q, the liquid raw material flows from the second tray 22b to the third tray 22c. When the liquid raw material stored in the third tray 22c exceeds the height of the partition 22r, the liquid raw material flows from the third tray 22c to the fourth tray 22d.

[0024] Each of the trays 22a to 22d is formed integrally with the front wall 21c, the rear wall 21d, the first side wall 21e, and the second side wall 21f by, for example, 3D printing. However, each may be formed separately and then integrated by welding. Each of the trays 22a to 22d is formed, for example, from the same material as the housing 21. A sensor hole 22h and a heater hole 22i are provided in the bottom of each of the trays 22a to 22d.

[0025] The sensor holes 22h extend horizontally within the bottom of each of the trays 22a to 22d. The sensor holes 22h are formed so as to communicate with the outside (atmosphere side) of the housing 21 and not communicate with the vaporization chamber A. The sensor holes 22h are, for example, through holes whose one end 22h1 and the other end 22h2 communicate with the outside (atmosphere side) of the housing 21 (see FIG. 6). However, the sensor holes 22h may be blind holes in which either one of the one end 22h1 or the other end 22h2 is closed. Furthermore, a plurality of sensor holes 22h may be provided in the bottom of each of the trays 22a to 22d.

[0026] The heater holes 22i are provided in the bottom of each of the trays 22a to 22d separately from the sensor holes 22h. The heater holes 22i extend horizontally in the bottom of each of the trays 22a to 22d. The heater holes 22i are formed below the sensor holes 22h in the bottom of each of the trays 22a to 22d. However, the heater holes 22i may also be formed above the sensor holes 22h in the bottom of each of the trays 22a to 22d. The heater holes 22i and the sensor holes 22h may be one common hole. The heater holes 22i are formed to communicate with the outside of the housing 21 but not to communicate with the vaporization chamber A. The heater holes 22i are, for example, blind holes (see FIG. 8). However, the heater holes 22i may also be through holes. A plurality of heater holes 22i may be provided in the bottom of each of the trays 22a to 22d.

[0027] The temperature sensors 23a to 23d are installed in sensor holes 22h provided in the bottoms of the trays 22a to 22d. This allows them to detect temperatures that are extremely close to the temperatures of the liquid raw materials stored in each of the trays 22a to 22d. Therefore, the temperatures of the liquid raw materials stored in each of the trays 22a to 22d can be monitored with high accuracy. The temperature sensors 23a to 23d may be, for example, thermocouples or resistance temperature detectors. The temperatures detected by the temperature sensors 23a to 23d are output to the control device 40.

[0028] The heaters 24a-24d are installed in heater holes 22i provided at the bottoms of the trays 22a-22d. This provides a wide heating area and allows heating from a position extremely close to the liquid raw material stored in each tray 22a-22d. This allows for efficient heating of the liquid raw material. The heaters 24a-24d may be, for example, aluminum nitride heaters, space heaters, or cartridge heaters. The output of the heaters 24a-24d is controlled by a control device 40. The control device 40 controls the output of each heater 24a-24d based on the detected values ​​of each temperature sensor 23a-23d. For example, the control device 40 independently controls the output of each heater 24a-24d so that the temperatures detected by each temperature sensor 23a-23d are maintained at the set temperature. The set temperatures may be the same for each tray 22a-22d, or may be different. In the upper tray 22a near the gas discharge port 21h, the internal pressure is low and the liquid raw material tends to evaporate easily. Therefore, it is desirable to set the temperature to increase from tray 22a to tray 22d so that the liquid raw material in each of the trays 22a to 22d is consumed evenly.

[0029] In the vaporizer 20 according to the first configuration example described above, the temperature sensors 23a to 23d are embedded in the bottoms of the trays 22a to 22d. This allows the temperature sensors 23a to 23d to detect temperatures that are extremely close to the temperature of the liquid source stored in each of the trays 22a to 22d. This allows the temperature of the liquid source stored in each of the trays 22a to 22d to be monitored with high accuracy.

[0030] Furthermore, in the vaporizer 20 according to the first configuration example of the embodiment, the heaters 24a to 24d are embedded in the bottom of the trays 22a to 22d. This provides a wide heating area and allows heating from a position as close as possible to the liquid raw material stored in each of the trays 22a to 22d. Therefore, the liquid raw material can be heated efficiently.

[0031] Furthermore, in vaporizer 20 according to the first configuration example, control device 40 independently controls the output of each of heaters 24a-24d so that the temperatures detected by temperature sensors 23a-23d are maintained at the set temperatures, thereby making it possible to adjust the temperature of the liquid raw material for each of trays 22a-22d.

[0032] In the vaporizer 20 according to the first configuration example, the temperature sensors 23a-23d and the heaters 24a-24d are embedded in the bottoms of the trays 22a-22d, but the present invention is not limited to this. For example, it is sufficient that the temperature sensor and the heater are embedded in at least one of the trays 22a-22d.

[0033] Furthermore, in the vaporizer 20 according to the first configuration example, four trays 22a to 22d are provided in multiple stages, but the number of trays is not limited to this. The number of trays may be one or two, or may be five or more.

[0034] A vaporization device 20A according to a second configuration example of the embodiment will be described with reference to FIGS.

[0035] Vaporizer 20A differs from vaporizer 20 in that vaporizer 20A has heater 25 instead of the plurality of heaters 24a to 24d in vaporizer 20. The following description will focus on the differences from vaporizer 20.

[0036] Vaporization device 20A includes housing 21, a plurality of trays 22a to 22d, a plurality of temperature sensors 23a to 23d, and heater 25.

[0037] The heater 25 is provided around the casing 21. The heater 25 heats the liquid raw material stored in each of the trays 22a to 22d from the periphery of the casing 21. The heater 25 may be, for example, a mantle heater. The output of the heater 25 is controlled by the control device 40. The control device 40 controls the output of the heater 25 based on any one of the detected values ​​of the temperature sensors 23a to 23d or the average value of the detected values ​​of the temperature sensors 23a to 23d. As an example, the control device 40 controls the output of the heater 25 so that the temperatures detected by the temperature sensors 23a to 23d are maintained at the set temperatures. The heater 25 may be divided into multiple units according to the height positions of the trays 22a to 22d.

[0038] According to vaporizer 20A of the second configuration example described above, temperature sensors 23a-23d are embedded in the bottoms of trays 22a-22d, similar to vaporizer 20. This allows temperatures that are extremely close to the temperatures of the liquid source stored in each of trays 22a-22d to be detected. Therefore, the temperatures of the liquid source stored in each of trays 22a-22d can be monitored with high accuracy.

[0039] The embodiments disclosed herein should be considered to be illustrative in all respects and not restrictive, and the above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0040] 20,20A Vaporizer 21. Cabinet 22a~22d Tray 23a~23d Temperature sensors 24a~24d Heater 25 Heater

Claims

1. The housing and a tray provided in the housing for storing a liquid raw material; a temperature sensor embedded in the bottom wall of the tray; a heater for heating the liquid raw material; and the tray has a sensor hole in which the temperature sensor is embedded; The sensor hole extends horizontally, the sensor hole communicates with the outside of the housing and does not communicate with the inside of the housing; Vaporizer.

2. The housing and a tray provided in the housing for storing a liquid raw material; a temperature sensor embedded in the bottom wall of the tray; a heater for heating the liquid raw material; and The trays are arranged in multiple stages, The liquid raw material flows from the upper stage to the lower stage of the trays provided in multiple stages. Vaporizer.

3. the tray has a sensor hole in which the temperature sensor is embedded; the sensor hole communicates with the outside of the housing and does not communicate with the inside of the housing; The vaporizer of claim 2 .

4. The sensor hole extends horizontally. The vaporizer of claim 3 .

5. The heater is embedded in the bottom wall of the tray.

5. The vaporizer according to claim 1.

6. the tray has a heater hole in which the heater is embedded, the heater hole communicates with the outside of the housing and does not communicate with the inside of the housing; The vaporizer of claim 5.

7. The heater hole extends horizontally. The vaporizer of claim 6.

8. a control device that controls the heater based on a detection value of the temperature sensor; 8. Vaporization device according to any one of claims 1 to 7.

9. a liquid feedstock source; a vaporizer that vaporizes the liquid raw material supplied from the liquid raw material supply source to generate a raw material gas; a processing vessel that accommodates a substrate and processes the substrate with the source gas generated by the vaporizer; Equipped with The vaporizer is The housing and a tray provided in the housing for storing the liquid source; a temperature sensor embedded in the bottom wall of the tray; a heater for heating the liquid raw material; and the tray has a sensor hole in which the temperature sensor is embedded; The sensor hole extends horizontally, the sensor hole communicates with the outside of the housing and does not communicate with the inside of the housing; Substrate processing system.

10. a liquid feedstock source; a vaporizer that vaporizes the liquid raw material supplied from the liquid raw material supply source to generate a raw material gas; a processing vessel that accommodates a substrate and processes the substrate with the source gas generated by the vaporizer; Equipped with The vaporizer is The housing and a tray provided in the housing for storing the liquid source; a temperature sensor embedded in the bottom wall of the tray; a heater for heating the liquid raw material; and The trays are arranged in multiple stages, The liquid raw material flows from the upper stage to the lower stage of the trays provided in multiple stages. Substrate processing system.

11. supplying a liquid source to a tray provided in the housing; adjusting the temperature of the liquid source based on a detection value of a temperature sensor embedded in a bottom wall of the tray, and vaporizing the liquid source; and the tray has a sensor hole in which the temperature sensor is embedded; The sensor hole extends horizontally, the sensor hole communicates with the outside of the housing and does not communicate with the inside of the housing; Vaporization method.

12. supplying a liquid source to a tray provided in the housing; adjusting the temperature of the liquid source based on a detection value of a temperature sensor embedded in a bottom wall of the tray, and vaporizing the liquid source; and The trays are arranged in multiple stages, The liquid raw material flows from the upper stage to the lower stage of the trays provided in multiple stages. Vaporization method.

Images