Source-reagent-based fluid delivery with high material flux for batch deposition

Abstract

A system, a reagent support tray, a particle suppression device and a method are disclosed. In one aspect, the system includes a vaporizer vessel (100) having one or more interior walls enclosing an interior volume, and a plurality of reagent support trays (110, 120, 130, 140) configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a gas flow (103, 107, 109) traveling between adjacent reagent support trays in the stack of reagent support trays such that the gas flow interacts with a source reagent material (101) in a particular reagent support tray before traveling into a next one of the plurality of reagent support trays in the stack of reagent support trays.

Description

[Technical Field]

[0001] [CROSS-REFERENCE TO RELATED APPLICATIONS]

[0001] On May 31, 2012, Brian C. Hendricks and others released a song called "Battle SOURCE REAGENT-BASED FLUID DELIVERY WITH HIGH MATERIAL FLUX FOR CHIP DEPOSITION Filing of "Delivery of Fluid with High Material Flux for Batch Deposition" The benefit of priority to U.S. Provisional Patent Application No. 61 / 654,077 filed under 35 U.S.C. § 119 of the U.S. Provisional Patent Application No. 61 / 654,077. No. 60 / 699,999, filed on Dec. 23, 2003, which is incorporated herein by reference in its entirety for all purposes.

[0002]

[0002] This disclosure relates to vaporization devices and systems, and methods for chemical vapor deposition (CVD), atomic layer deposition (ALD), and the like. of source reagent materials, such as liquid and solid source reagents, used in ALD and ion implantation processes. Concerning related techniques for vaporization. [Background technology]

[0003]

[0003] Liquid and When solid materials are used, various reagent materials are employed. These reagent materials can be evaporated or injected. The source reagent can be heated to form a source reagent vapor that is delivered to the process equipment for input. Successful VD, ALD and ion implantation require consistent, controlled and The source reagent vapor must be delivered at a reproducible rate.

[0004] For example, when generating reagent vapors for single wafer deposition or implantation, the source reagent It is important to heat the drug material uniformly. If the source reagent material is not heated uniformly, the There may be cold or hot spots between the units. Such uneven heating can result in fluctuations in the reagent vapor flow. A carrier gas is circulated between the source reagent material and the generated reagent vapor. It may also be desirable to mix the source reagent vapor thus produced with a carrier gas.

[0005]

[0005] For solid source reagents, the sublimation temperature is the temperature at which thermal dissociation occurs and downstream deposition or ion implantation takes place. Restrictions may be imposed in vaporization applications when temperatures approach those that produce thermal decomposition by-products that are harmful to the input process. It is particularly difficult to control the surface morphology of the solid source reagent during vaporization. Both the presence of a carrier gas and the depletion of the solid source material during vaporization are These may also result in changes in the surface area of ​​the solid source material being used. Delivery can be complicated.

[0006]

[0006] When generating reagent vapors for deposition or implantation on a batch of multiple wafers Another problem is that deposition or implantation of a batch of wafers requires more reagents. A larger vapor flow may be required. A larger vapor flow requires heating of a larger amount of source reagent material. This requires a larger vaporizer vessel and a larger It may be necessary to use a support structure. Larger vaporizer vessels can accommodate larger volumes of The source reagent material is used to provide a source reagent material and a reagent produced by the source reagent material. The vapor is then mixed with the carrier gas in a consistent manner to produce a reagent vapor in the resulting gas mixture. Furthermore, it can be more difficult to efficiently entrain larger amounts of source reagent material. Uniform heating can be more difficult than uniform heating of small amounts of source reagent material. Also, to generate a larger amount of reagent vapor, a larger amount of source reagent material must be added more frequently. The task of refilling the heater with source reagent material may need to be replaced. Simplification may be desirable.

[0007] At the same time, the relatively low reagent vapor flow prevents non-vapor particles from entering the reagent vapor flow. The problems associated with making the steam flow larger become more significant when generating more steam. By heating a larger amount of source reagent material, the resulting thermal decomposition during heating can be reduced. These unwanted particles can be generated in larger quantities as the deposition or implantation process The reagent vapor stream may be filtered to prevent it from being entrained in the buffer. Remove particles from more reagent vapor streams, such as those used for vapor deposition or batch injection. This can be more complicated than filtering a smaller reagent vapor stream. Summary of the Invention

[0008]

[0008] The present disclosure relates to vaporizer vessel devices and systems, as well as chemical vapor deposition (CVD), atomic layer Implications for vaporization of source reagent materials used in deposition (ALD) and ion implantation processes In certain embodiments, the vaporizer vessel is configured to hold a wafer or other object. Single wafer or single on-wafer deposition and injection of reagent vapors for batches of The steam flow is configured to generate a larger amount of steam than the steam flow generated by the object.

[0009]

[0009] According to the present disclosure, a reagent support tray in a stack of reagent support trays for use with a vaporizer vessel The reagent support tray includes a plurality of gas flow openings. The gas flow openings are connected to one or more of the reagent support trays. The gas flow openings may include channels within the dividers or may be located between the plurality of reagent support trays. The channels in the compartment may be positioned to one side of one or more of the reagent support trays. extends below the bottom of a particular reagent support tray to redirect gas at the bottom of this support tray. This gas must be allowed to pass through the bottom of the support tray before it can proceed into the next reagent support tray. Alternatively, the gas flow openings in the one-sided arrangement may be arranged to circulate the vapor. Gas entering one reagent support tray on one side of the vaporizer vessel is redirected and directed to the opposite side of the vaporizer vessel. The reagent support tray is advanced into the next reagent support tray through an opening disposed toward the side. before flowing across the reagent support tray (and the reagent source material received therein). do.

[0010]

[0010] According to an embodiment of the present disclosure, a system has one or more interior walls enclosing an interior volume. a vaporizer vessel configured to receive the vaporizer and a plurality of reagent support trays configured to be vertically stackable within the interior volume; and each of the plurality of reagent support trays is arranged to form a stack of reagent support trays. One or more of the plurality of reagent support trays are configured to be vertically stackable within the interior volume. The reagent support tray advances between adjacent reagent support trays in the stack of reagent support trays. The gas flow is redirected so that the gas flow passes through multiple layers in the stack of reagent support trays. in a particular reagent support tray before proceeding to the next of several reagent support trays. The reagent is configured to interact with the source reagent material.

[0011] In one aspect, each of the plurality of reagent support trays has a support surface at least partially The at least one partition extends across the bottom. a lower end extending a first distance below the surface, an upper end, and at least one partition; The at least one channel extends between the lower end and the upper end through the The gas below the bottom surface is circulated away from the bottom surface, and the gas At the lower end it reaches at least one channel.

[0012] In another aspect, each of the plurality of reagent support trays is positioned on one side of the support surface. The gas flow openings allow gas to flow from below the bottom surface to above the top surface. Multiple reagent support trays may be included in a stack. a gas flow opening of one of the plurality of reagent support trays being stacked; a first side of the rack, and a reagent support tray stacked on the reagent support tray among a plurality of reagent support trays; The gas flow openings of the stacked upper reagent support trays are aligned on a first side of the stack and on a second side of the stack opposite the first side of the stack. As a result, the reagent support tray is configured to be mounted on the side of the support surface. Then, gas flowing through the gas flow openings in the reagent support tray flows across the top surface of the reagent support tray. The gas flows through the upper reagent support tray, reaches the gas flow openings in the upper reagent support tray, and flows from the support surface of the reagent support tray to the upper It will flow onto the support surface of the reagent support tray.

[0013] According to another embodiment of the present disclosure, a predetermined size that can be produced by a source reagent material. A particle suppression device for suppressing particles from an output is provided. a vaporizer vessel including a port and one or more reagent support trays for supporting source reagent materials; The particle suppression device may be used in a vessel. The housing includes a housing configured to be positioned between the The gas mixture is passed through a plurality of parallel filters positioned at a distance from each other. Remove particles of a predetermined size or sizes from the gas mixture before it reaches the outlet port The signal passes through one of several parallel filters.

[0014] Another aspect of the present disclosure relates to a method for generating a reagent vapor, the method comprising: The source reagents are placed in multiple reagent support trays contained in a stack of reagent support trays received at the same time. Each reagent support tray redirects the gas flow so that the gas flow Interacting with source reagent material in one of the plurality of reagent support trays one or more gas cartridges adapted to subsequently advance to an upper support tray in a stack of reagent support trays. The carrier gas flow is emitted into or through the reagent support tray. the inlet port of the vaporizer vessel so that it is either discharged adjacent to the holding tray. Heat is applied to the vaporizer vessel, heating the source reagent material and gas within the vaporizer vessel. This application of heat dissipates the gas in the vaporizer vessel from the reagent support tray. This will advance to the upper reagent support tray.

[0015] Another aspect of the present disclosure is a method for removing particles from a reagent vapor produced in a vaporizer vessel. The method comprises providing a carrier gas stream into an interior volume of a vaporizer vessel. The source reagent material is vaporized in one or more support trays within the interior volume of the vaporizer vessel. When this reagent vapor mixes with the carrier gas, the reagent vapor and A gas mixture consisting of a carrier gas and reagent particles generated by the source reagent material is formed. A portion of the gas mixture is drawn into the vent hole between one or more support trays and the outlet port of the vaporizer vessel. A predetermined number of the reagent particles are passed through a plurality of parallel filters spaced apart within the housing. Multiple parallel filters are used to remove particles that exceed the size of these multiple filters. The reagent vapor and carrier gas are transported at a rate faster than can be achieved using one of the filters. This allows for filtration of the mixture with agarose.

[0016]

[0016] Other aspects, features, and embodiments of the present disclosure are set forth in the following disclosure and appended claims. It will become more fully clear from [Brief explanation of the drawings]

[0017] [Figure 1]

[0017] A side cross-sectional view of a vaporizer vessel and associated components of a particular exemplary embodiment of the present disclosure adapted to redirect the mixed gas flow as it flows throughout the vaporizer vessel. [Figure 2]

[0018] FIG. 10 is an exploded perspective view of a vaporizer vessel and associated components according to another specific embodiment of the present disclosure. [Figure 3]

[0019] FIG. 4 is a perspective view of a reagent support tray in a specific exemplary embodiment according to the present disclosure, using multiple channels for transmitting gas flow in the form of multiple holes passing through a partition, where the reagent support tray of FIG. 3 has a first height. [Figure 4]

[0020] 4 is a perspective view of a reagent support tray of a specific exemplary embodiment according to the present disclosure, using multiple channels for transmitting gas flow in the form of multiple holes penetrating a partition, wherein the reagent support tray of FIG. 4 has a second height that is higher than the first height of the reagent support tray of FIG. 3. [Figure 5]

[0021] FIG. 5 is a perspective view of a reagent support tray in a specific exemplary embodiment according to the present disclosure, using multiple channels for transmitting gas flow, the channels being in the form of slots extending through each of multiple partitions, where the reagent support tray of FIG. 5 has a first height. [Figure 6]

[0022] 6 is a perspective view of a reagent support tray of a specific exemplary embodiment according to the present disclosure, using multiple channels for transmitting gas flow, the channels being in the form of slots extending through each of multiple partitions, wherein the reagent support tray of FIG. 6 has a second height that is higher than the first height of the reagent support tray of FIG. 5. [Figure 7]

[0023] 9 is a perspective view of a particular exemplary embodiment reagent support tray similar to the reagent support tray of FIG. 3, except that the reagent support tray of FIG. 8 only includes dividers that extend completely across the support surface of the reagent support tray. [Figure 8]

[0024] 8 is a perspective view of a particular exemplary embodiment reagent support tray similar to the reagent support tray of FIG. 5, except that the reagent support tray of FIG. 7 only includes dividers that extend completely across the support surface of the reagent support tray. [Figure 9]

[0025] 4 is a perspective view of a particular exemplary embodiment of a reagent support tray similar to that of FIG. 3, except that the sides of the dividers are not parallel in the plane of the support surface. [Figure 10]

[0026] FIG. 10 is a cross-sectional side view of a vaporizer vessel and associated components of another specific exemplary embodiment of the present disclosure adapted to redirect a mixed gas flow as it flows throughout the vaporizer vessel. [Figure 11]

[0027] FIG. 1 is a perspective view of a reagent support tray according to a specific exemplary embodiment of the present disclosure, the reagent support tray having gas flow openings disposed on one side of the reagent support tray, inside a side wall of the reagent support tray. [Figure 12]

[0028] FIG. 1 is a perspective view of a reagent support tray according to a specific exemplary embodiment of the present disclosure, having a gas flow opening on one side of the reagent support tray, positioned between a side wall of the reagent support tray and an inner wall of a vaporizer vessel. [Figure 13]

[0029] 8 is a perspective view of a particular exemplary embodiment of a reagent support tray similar to that of FIG. 7, the reagent support tray including a plurality of protrusions extending from a support surface thereof. [Figure 14]

[0030] 12 is a perspective view of a particular exemplary embodiment of the reagent support tray similar to that of FIG. 11, the reagent support tray including a plurality of hollow protrusions extending from the support surface of the reagent support tray. [Figure 15]

[0031] 10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 16] 10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 17] 10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 18] 10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 19]10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 20] 10A-10C are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different sizes combined into a stack of reagent support trays disposed within a vaporizer vessel. [Figure 21]

[0032] 1 is a side cross-sectional view of a reagent support tray that supports source reagent materials of various shapes. [Figure 22] 1 is a side cross-sectional view of a reagent support tray that supports source reagent materials of various shapes. [Figure 23] 1 is a side cross-sectional view of a reagent support tray that supports source reagent materials of various shapes. [Figure 24] 1 is a side cross-sectional view of a reagent support tray that supports source reagent materials of various shapes. [Figure 25] 1 is a side cross-sectional view of a reagent support tray that supports source reagent materials of various shapes. [Figure 26]

[0033] 1 is a perspective view of the top surface of a particle suppression device according to a specific exemplary embodiment employing multiple spaced parallel filters in accordance with the present disclosure; [Figure 27]

[0034] 1 is a perspective view of a lower surface of a particle suppression device according to a specific exemplary embodiment employing multiple spaced parallel filters in accordance with the present disclosure; [Figure 28]

[0035] 28 is a cross-sectional view of a plurality of filter elements that may be included among the multiple filter elements in the plurality of filters of FIG. 27. [Figure 29]

[0036] FIG. 1 is a block diagram of a deposition or injection system using a vapor delivery system according to the present disclosure. [Figure 30]

[0037] FIG. 1 is a flow diagram of a particular exemplary embodiment method for generating reagent vapor from a reagent source material using an embodiment of a reagent support tray according to the present disclosure. [Figure 31]

[0038] FIG. 10 is a flow diagram of another particular exemplary embodiment method for generating reagent vapor from a reagent source material using an embodiment of a reagent support tray according to the present disclosure. [Figure 32]

[0039] FIG. 10 is a flow diagram of another particular exemplary embodiment of a method for generating reagent vapor from a reagent source material using an embodiment of a reagent support tray according to the present disclosure. [Figure 33]

[0040] 1 is a flow diagram of a method of certain exemplary embodiments for removing particles from a reagent vapor used in batch processing, such as deposition or injection of material onto multiple units, in accordance with the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0018]

[0041] The present disclosure provides a vaporizer container apparatus, a reagent support tray, a particle suppression device, a source reagent The present invention relates to methods of vaporizing and other aspects of producing a reagent vapor deposition or injection of a reagent material. In certain embodiments, the vaporizer vessel is configured to vaporize a batch of wafers or other objects. A single wafer or single object may be used to allow deposition and injection of reagent vapors onto the wafer. 1. The method is configured to generate a larger amount of reagent vapor than in the case of

[0019]

[0042] According to the present disclosure, a reagent support tray in a stack for use with a vaporizer vessel is The reagent support tray includes a plurality of gas flow openings. The gas flow openings are connected to one or more of the reagent support trays. Alternatively, the gas flow openings may include channels in the partitions of the plurality of reagent support trays. One or more of the reagent support trays may be located on one side of the channel in the divider. The pipe extends below the bottom of a particular reagent support tray to direct gas at the bottom of that support tray. The gas is circulated away from the bottom of the support tray before proceeding into the next reagent support tray. Alternatively, the gas flow opening can be positioned so that the vaporizer vessel can be opened. The gas flowing into one reagent support tray on one side of the and the reagent source material received therein) before flowing to the other side of the vaporizer vessel. The reagent support tray advances through the forwardly disposed opening into the next reagent support tray.

[0020]

[0043] FIG. 1 illustrates a vaporizer device 100 and associated components according to a particular exemplary embodiment of the present disclosure. The vaporizer vessel 100 includes a body 102 and a lid 104. The lid 104 is configured to receive a carrier gas flow (not shown in FIG. 1). The lid 104 includes an inlet port 106 through which the carrier gas and the reagent vapor (also shown in FIG. 1) are introduced. It also includes an outlet port 108 that can produce a mixture with a clamp, bolt, or When the cover 104 is fixed to the body 102 using other devices, the body 102 and the cover 104 defines an enclosed interior volume 105 of the vaporizer vessel 100 .

[0021]

[0044] In the particular exemplary embodiment of FIG. 1, multiple reagent support trays of approximately the same size are provided. Reagent support trays 110, 120, 130 and 140 are accepted. 130 and 140 are configured or expected to generate a reagent vapor 103. The reservoir 102 is configured to receive a supply of source reagent material 101 .

[0022]

[0045] The source reagent material 101 may comprise a solid source reagent material. Alternatively, the source reagent material may be in another form. A source reagent material (not shown), such as a liquid source reagent material (not shown) or a solution dissolved in a solvent. Alternatively, a solid source reagent material (also not shown) may be used. If in solid form, the source reagent material Material 101 may be in a discontinuous form containing multiple separate units of solid source reagent material. The solid source reagent material 101 may also be in the form of a powder or beads, or a porous bulk article. Illustratively, the source reagent material may take the form of dimethylhydrazine, trimethyl Aluminum (TMA), hafnium chloride (HfCl4), zirconium chloride (ZrCl 4), indium trichloride, aluminum trichloride, titanium iodide, tungsten carbonyl , Ba(DPM)2, bisdipivaloylmethanatostrontium (Sr(DPM)2), TiO(DPM)2, tetradipivaloylmethanatozirconium (Zr(DPM)4), Decaborane, boron, magnesium, gallium, indium, antimony, copper, phosphorus, arsenic The compound is composed of silicon, lithium, sodium tetrafluoroborate, and alkyl-amidinate ligands. Precursors containing hydroxybenzoates, organometallic precursors, zirconium tert-butoxide (Zr(t-OBu) 4), tetrakisdiethylaminozirconium (Zr(Net2)4), tetrakisdiethylaminozirconium (Zr(Net2)4), dimethylaminohafnium (Hf(Net2)4), tetrakis(dimethylamino)titanium ( TDMAT), tert-butyliminotris(diethylamino)tantalum (TBTDET ), pentakis(demethylamino)tantalum (PDMAT), pentakis(ethylmethyl Amino)tantalum (PEMAT), Tetrakisdimethylaminozirconium (Zr(NM e2)4), hafnium tertiary butoxide (Hf(tOBu)4), xenon difluoride ( Xenon tetrafluoride (XeF2), xenon hexafluoride (XeF6), and Many compounds, including compatible combinations and mixtures of two or more of these may include:

[0023]

[0046] Each of the plurality of reagent support trays 110, 120, 130, and 140 is shown in FIGS. It should be understood that the dimensions may be different as shown in As further explained with reference to Figure 2. Furthermore, both Figures 1 and 2 show multiple reagents Support trays 110, 120, 130 and 140 include four individual reagent support trays. Although shown, any number of reagent support trays may be used.

[0024]

[0047] Reagent support trays 110, 120, 130 and 140 and vaporizer vessel 100 The reagent support may be constructed of a thermally conductive material to facilitate heating of the source reagent material. The carrier trays 110, 120, 130 and 140 preferably contain, for example, a carrier gas, a solvent, and a reacts with the source reagent material or the reagent vapor produced by vaporizing the source reagent material. For example, the reagent support trays 110, 12 may be made of metal or other materials. 0, 130 and 140, and / or the vaporizer vessel 100 is made of silver, silver alloy, copper, copper alloy, Aluminum, aluminum alloy, lead, nickel clad, stainless steel, graphite , silicon carbide coated graphite, boron nitride, ceramic materials, and the like, It may be composed of any thermally conductive material, including combinations, mixtures and alloys of two or more types.

[0025]

[0048] FIG. 1 also illustrates the use of at least one particle suppression device 180 within the vaporizer vessel 100. The particle suppression device is shown for use with a plurality of reagent support trays 110, 12 0, 130 and 140 and the exit port 108. before the gas and reagent vapor mixture leaves the vaporizer vessel 100 through the outlet port 108. By passing through the at least one particle suppression device 180, the source reagent material Particles above a certain size that may be produced as part of the vaporization are removed by filtration. In certain embodiments, particle suppression device 180 is remotely located within housing 184. According to a particular embodiment, the filter includes a plurality of parallel filters 182. By using 182, particle suppression device 180 can be achieved without a single filter (not shown in FIG. 1). mixing of large amounts of carrier gas and reagent vapor at a rate faster than would be possible with a conventional gas turbine (as shown in the figure) It may be possible to pass and filter things.

[0026]

[0049] In certain exemplary embodiments, and as further described with reference to FIG. Each of the plurality of filters 182 is connected to one another to sequentially remove particles of different sizes. For example, the plurality of filter elements may include: It may include multiple successive layers of filter material to block particles of progressively smaller size. One or more of the plurality of filters 182 may have a size larger than a predetermined allowable size. at least one frit configured to prevent particles from passing through Alternatively or additionally, one or more of the plurality of filters 182 may include a metal The particle suppression device 180 may also include a carrier. an electrostatic particle collector configured to remove particles from the mixture of the gas and the source reagent vapor; It may also include data.

[0027]

[0050] In operation, a vaporizer vessel 100, a plurality of reagent support trays 110, 120, 130, and 140, the source reagent material 101 and other components may be heated. The gas flow 107 can be introduced through an inlet port 106. In certain embodiments, the inlet A carrier gas flow 107 received through port 106 flows through downtube 150. The air is transmitted downward to the bottom of the enclosed interior volume 105 via the down tube 150. The carrier gas flow 107 is directed to a plurality of reagent support trays 110, 120, 130 and 140. The bottom tray of the heated carrier can be introduced under the The carrier gas expands and moves upward toward the outlet port 108. A stream 107 flows through the contents of each of a plurality of reagent support trays 110, 120, 130 and 140. The carrier gas flow 107 passes through a plurality of reagent support trays 110. Interaction between the carrier gas and the source reagent material 101 in 120, 130 and 140 To further facilitate this use, a flow disperser is used to create a vortex of carrier gas. ) 152 through down tube 150. The carrier gas is then The heated source reagent material 101 interacts with the carrier gas 107 and the source reagent A mixture gas 109 of vapor 103 and, in some cases, pseudoparticles (not shown in FIG. 1) is Particles above a predetermined size are filtered out by the spaced filter 182 of the particle suppression device 180. The filtered carrier gas and source reagent vapor mixture 190 is then discharged to the outlet port. The vaporizer exits the vaporizer vessel 100 via port 180.

[0028]

[0051] In certain embodiments, a plurality of reagent support trays 110, 120, 130 and 1 At least one of the partitions 162, 164, and 166 is provided. 1. Through each partition, one of the plurality of reagent support trays 110, 120, 130 and 140 can be inserted. from the volume on one tray to multiple reagent support trays 110, 120, 130 and 140 another tray, for example, the next reagent support tray stacked above the first support tray. A gas mixture 109 (alternatively, a carrier gas flow 107 or a reagent vapor 103) is introduced into the volume above the one or more partitions 162 through which extend one or more channels 168 for carrying The one or more partitions 162, 164, and 166 may be configured to separate the mixed gas. The flow of the gas mixture 109 is redirected to promote entrainment of the reagent vapor 103 into the gas mixture 109. 103. The reagent vapor 103 is configured to interact with the source reagent material 101. do.

[0029]

[0052] The configuration of the multiple reagent support trays 110, 120, 130 and 140 shown in FIG. To further illustrate this embodiment, a plurality of reagent support trays 110, 120, 130 and 140 are shown. Assume that all of the 40 reagent support trays have the same dimensions and configuration. However, as will be described in more detail below, multiple reagent support trays of FIG. 1 having the same dimensions may be used. 110, 120, 130 and 140 are assumed only for the example of FIG. However, as will be made clear below with reference to FIGS. 15 to 20, the test piece disposed in the vaporizer vessel The stack of drug support trays may include reagent support trays of different heights or different dimensions. In some cases, it may be desirable to have

[0030]

[0053] It is also assumed that the dividers 162, 164, and 166 have the same dimensions and configuration. 120 , 130 and 140 and / or one or more of the partitions 162, 164 and 166 The description of the configuration and / or operation of one of the plurality of reagent support trays 110, 120, 130 and 140 or other compartments of the plurality of compartments 162, 164, and 166. Also, instead of including reference numerals for identical parts of each tray of the plurality of reagent support trays 110, 120, 130, and 140, for the sake of visual clarity, the plurality of reagent support trays 120 , 130 and 140 Elements of each tray that are described when referring to the operation of the vaporizer 100 are numbered, but corresponding elements of other trays of the plurality of reagent support trays 110, 120, 130, and 140 may not be numbered. However, it should be understood that a reference to the construction or operation of an element of one tray of the plurality of reagent support trays 110, 120, 130, and 140 also applies to corresponding elements of other trays of the plurality of reagent support trays 110, 120, 130, and 140, which may not be individually numbered and described.

[0031]

[0054] Also, embodiments of configurations of multiple reagent support trays 110, 120, 130 and 140 To further explain the state, the reagent support tray 120 will be referred to simply as the support tray 120. The reagent support tray 110 stacked below the tray 120 is called the lower support tray 110. The reagent support tray 130 stacked on the support tray 120 is referred to as the upper support tray 130. This nomenclature is used to simplify the following description and is intended to refer to the reagent support trays 110, 120, and 13. Relative positions of reagent support trays 110, 120 and 130 in vertical stacks of 0 and 140 The gas flowing through the vaporizer vessel 100 is a carrier gas. The gas stream 107 may include the reagent vapor 103 and the gas mixture 109, but for ease of explanation, Hereinafter, the gas stream within vaporizer vessel 100 will be referred to as mixed gas 109 .

[0032]

[0055] The support tray 120 includes a support surface 121 having a top surface 122 and a bottom surface 123. The top surface 122 is an upward-facing surface configured to support the source reagent material 101. The bottom surface 123 is a downward-facing surface that may function to enclose a lower volume 117 between the support tray 120 and the lower support tray 110. In certain embodiments, the lower volume 117 or other similar volume may be bounded by the support surfaces 111 and 121 of the support trays 110 and 120, respectively, and the interior sidewall 155 of the vaporizer vessel 100. Alternatively, the support trays 110 and 120 may include sidewalls 114 and 124 extending perpendicularly from their peripheries, respectively, to enclose respective volumes on each of the support trays 110 and 120, such as the lower volume 117 on the lower support tray 110. Each side wall 114 and 124 extends from a lower edge 115 and 125 to an upper edge 116 of the lower support tray 110, for example, such that a lower edge 125 of the support tray 120 engages an upper edge 116 of the lower support tray 110 to close a lower volume 117 above the lower support tray 110. 116 and 126. For example, a gasket (not shown in FIG. 1 ) may be used to provide a seal between edge 116 and edge 125 to further enclose lower volume 117. Similarly, corresponding elements of support tray 120 and upper support tray 130 may be configured to enclose volume 127 on support tray 120, and similarly for each of the multiple reagent support trays 110, 120, 130, and 140.

[0033]

[0056] The divider 162 extends through the support surface 121 of the support tray 120 and a first distance 172 below the bottom surface 123 of the support surface 121; The partition 162 also extends to the upper support surface 171 of the upper support tray 130. 31 has an upper end 173 that extends within a second distance 174 from the bottom surface 133 of the divider. 162 has a channel, such as channel 168, extending between its lower end 171 and upper end 173. and from the lower volume 117 on the lower support tray 110 to the volume 127 on the support tray 120. and the mixed gas 109. Similarly, a channel (not shown) in the partition 164 The mixed gas flows from the volume 127 on the tray 120 to the upper volume 137 on the upper support tray 130. 109, and so on.

[0034]

[0057] In certain embodiments, the bottom edge 171 of the divider 162 is flush with the bottom surface of the support tray 120. 123 1 , the mixed gas 109 flowing out of the channels 168 at the upper ends 173 of the partitions 162 of the support tray 120 is closer to the bottom surface 133 of the upper support surface 131 of the upper support tray 130 than to the lower ends 175 of the partitions 164 of the upper support tray 130. As a result, as shown in FIG. 1 , the mixed gas 109 flowing out of the channels 168 at the partitions 162 of the support tray 120 is circulated away from the bottom surface 133 of the upper support surface 131 of the upper support tray 130 before circulating back to the bottom surface 133 of the upper support surface 131 of the upper support tray 130. 130162. Thus, as the flow of gas mixture 109 proceeds from upper end 173 of partition 162 toward bottom surface 133 of upper support surface 131 of upper support tray 130, it is redirected toward source reagent material 101 and circulates through source reagent vapor 103 to promote entrainment of source reagent vapor 103 in gas mixture 109. This serpentine flow path of gas mixture 109 is repeated as it flows between and within the volumes bounded by each of the multiple reagent support trays 110, 120, 130, and 140.

[0035]

[0058] The above description of FIG. 1 assumes that the carrier gas introduced through the inlet port 106 150. The figure illustrates an example of an operating mode in which the liquid flows downward through the tube 150 and is discharged at the lower end thereof. The carrier gas thus vented is directed to the fine particles associated with the reagent support tray. It flows outward and upward through the holes and passages, and then into the carburetor via the outlet port 108 is discharged from the container.

[0036]

[0059] In the other "reverse flow" mode, the aforementioned inlet port 106 is now connected to the outlet port of the vessel. The outlet port 108 is now utilized as the inlet port of the vessel. The vaporizer vessel is positioned relative to the carrier gas flow so that the carrier gas source ( 1) is a gas supply system for the port 108 (which has become the inlet port). In such a configuration, the particle suppression device 180 is removed from the vaporizer structure. may be removed or otherwise constructed and / or adapted to accommodate a reverse flow mode of operation. The carrier gas introduced in this way enters from the top of the vaporizer vessel. and then flows outward and downward through the pores and passages associated with the reagent support tray. , flowing upward through tube 150 (which becomes the up tube in this reverse mode). This allows the carrier gas (outlet port) to entrain the vaporized source reagent material inside. The vaporizer exits the vaporizer vessel through port 106.

[0037]

[0060] Such a reverse flow mode may be used in any of the vaporizer configurations of the present disclosure. and the saturation of the source reagent material in the carrier gas mixture exiting the vaporizer vessel. It will be appreciated that there may be advantages in particular implementations to increase

[0038]

[0061] FIG. 2 illustrates another specific embodiment of a vaporizer vessel 200 and associated components according to the present disclosure. 2 is an exploded perspective view showing the components of the vaporizer vessel 200. The vaporizer vessel 200 of FIG. 2 is identified by like reference numerals. It contains many identical components identified in the same file.

[0039]

[0062] The vaporizer container 200 includes a body 202 and a lid 204. The lid 204 is 2. The device includes an inlet port 206 configured to receive a gas flow (not shown in FIG. 2). The inlet port 206 is located at the bottom of the vaporizer vessel 200 as described with reference to FIG. The cap 20 is coupled to the down tube 250 to carry the carrier gas flow. 4 can generate a mixture of carrier gas and reagent vapor (also not shown in FIG. 2). It also includes an outlet port 208. The components of the vaporizer vessel 200 are assembled and clamped together. When the cover 204 is secured to the body 202 using bolts or other devices, the structure shown in FIG. As described with reference to the accompanying drawings, the vaporizer vessel 200 is closed by the body 202 and the lid 204. An internal volume (not shown in FIG. 2) is defined.

[0040]

[0063] The vaporizer vessel 200 of FIG. 2, like the vaporizer vessel 100 of FIG. 1, has a total of four Reagent support trays 210, 220, 230 and 240 are received. Although the use of four reagent support trays is shown, embodiments of the present disclosure may be modified to accommodate specific vaporizers. The specific number of reagents that can be accommodated in the container 100 (FIG. 1) or the vaporizer container 200 (FIG. 2) It is not limited to using a support tray.

[0041]

[0064] 1, Figure 2 illustrates that the plurality of reagent support trays 210, 220, 230, and 240 received within the vaporizer vessel 200 may have different dimensions. That is, in the example of Figure 2, the reagent support trays 210 and 220 located at the bottom of the stack of the plurality of reagent support trays 210, 220, 230, and 240 have a first depth 241, and this first depth 241 is greater than the second depth 243 of the reagent support trays 230 and 240. Furthermore, although the plurality of reagent support trays 210, 220, 230 and 240 are shown having two different depths 241 and 243, the plurality of reagent support trays 210 ~ 240 may have as many different depths as there are reagent support trays.

[0042]

[0065] As further described with reference to FIGS. 3-6, a plurality of reagent support trays 210; One or more of the trays 220, 230 and 240 may be reagent support trays 220 and 230, respectively, may include partitions such as partitions 262 and 264. 200. The apparatus accommodates gas flow between a plurality of reagent support trays 210, 220, 230, and 240 in the apparatus. There are channels through these partitions to facilitate the placement of reagents in the trays. 10, 220, 230 and 240 (in FIG. 2 To facilitate gas flow between the reagent support trays 210, 220, 2 30 and 240 may be arranged with a relative angular offset to each other. and a plurality of reagent support trays 210, 220, 230 and 240 are provided with dividers 262 and 26 4 may be positioned so that the dividers are not vertically aligned, e.g. The gas flowing through the channels in the compartments 262 of the reagent support tray 220 is directed to the next reagent. Divider 2 of reagent support tray 230 to allow upward flow into support tray 230 Before reaching the channels in 64, the source reagent material received in the reagent support tray 220 Therefore, the plurality of reagent support trays 210, 220, 230 and 240 The partitions are positioned at an angle offset to allow the gas in the vaporizer vessel 200 to flow smoothly. and source reagent materials contained in a plurality of reagent support trays 210, 220, 230, and 240. It may be easier to interact with

[0043]

[0066] FIG. 2 also illustrates at least one particle suppression device 202 within the vaporizer vessel 200. 1, particle suppression device 280 is shown using multiple and the outlet port 208. Therefore, the reagents can pass through multiple reagent support trays 210, 220, 230 and 240. The mixture of carrier gas and reagent vapor exits vaporizer vessel 200 via outlet port 208. The particle suppression device 280 is passed through before being discharged from the device. The vapor may be generated as part of the vaporization of the source reagent material by passing through the vaporization device 280. In certain embodiments, particles above a predetermined size are removed by filtration. The particle suppression device 280 includes a plurality of spaced apart filters 282, the various filters of which are shown in FIG. The particle suppression device 280 is described below with reference to Figures 7, 8 and 9. Further explained.

[0044]

[0067] FIG. 3 is a perspective view of a reagent support tray 300 according to a specific exemplary embodiment of the present disclosure. As previously described with reference to FIG. 1, the reagent support tray 300 includes a plurality of compartments 310. and 312, and a mixed gas flow or Channels 320 extend through these partitions to carry other gas flows.

[0045]

[0068] The reagent support tray 300 has a top surface 30 which serves as the bottom of the reagent support tray 300. 2. The reagent support surface 301 is in the reagent support tray 300. The reagent support tray 300 supports source reagent materials (not shown in FIG. 3) placed on the tray. The reagent support surface 301 is configured to contain the reagent source material placed on the reagent support surface 301. The upper edge 306 of the side wall 304 is It can also be considered the upper edge of the reagent support tray 300. Similarly, the lower edge 305 of the reagent support surface 301 may also be considered the bottom edge of the reagent support tray 300 (as will be explained further below, The lower ends of 310 and 312, for example, lower end 311, are considered to be the lower edge of the reagent support tray 300. The height 340 of the reagent support tray 300 (measured from the inside) is (which may also be measured outside) extends from the lower edge 305 of the reagent support tray 300 to the upper edge 306 of the reagent support tray 3 00.

[0046]

[0069] In certain embodiments, the volume encompassed by the reagent support tray 300 is divided by a plurality of partitions 310 and 312. As already described with reference to FIG. 1, the plurality of partitions 310 and 312 extend vertically from the lower end 311 to the upper end 313 through the support surface 301, and a plurality of channels 320 extend between the lower end 311 and the upper end 313 of each of the plurality of partitions 310 and 312. In the embodiment of FIG. 3, the plurality of channels 320 include a plurality of holes 320 that extend through the partitions 310 and 312 and are generally parallel.

[0047] <000055l> ?

[0070] One or more of the plurality of partitions, for example, partition 310, may extend completely across the support surface 30 1. In certain embodiments, the partition 31 0 may include an opening 322 to receive a down-tube (down-tubes 150 and 250 shown in FIGS. 1 and 2, respectively), through which the down-tube may extend through the reagent support tray 30 0. One or more of the other plurality of partitions, for example, partition 31 2, may extend only partially across the support surface 301. In the embodiment of FIG. 3, both types of partitions 310 and 312 include a plurality of channels 320 that extend through these partitions. [[ID=?7]]

[0048]

[0071] As already described with reference to FIG. 1, in certain embodiments, the plurality of partitions 3 10 and 312 extend downwardly below the support surface 301 to the lower end 311 and have an upper end The relative lengths of the lower end 311 and the upper end 313 are: As described with reference to FIG. 1, the gas mixture is placed in a volume separated by a reagent support tray 300. The fluid is configured to facilitate passage out of the volume after circulating through the volume.

[0049]

[0072] Illustratively, the reagent support tray 300 has a diameter of 8.9 inches and extends from the bottom of the support surface to 1.18 inches from the bottom of the divider to the top edge of the side wall, and The partition may be 0.28 inches wide and It may contain a total of 52 channels as shown in Figure 3. The surface area of ​​the support surface is 49.68 square meters. inch, and a 75% fillable volume of 36.515 cubic inches. These dimensions and volumes are for example for semiconductors. A sufficient amount of source reagent vapor is used for the deposition or implantation of source material on a batch of solid wafers. (For comparison, a typical support for a single wafer application The tray provides a surface area of ​​7.99 square inches and holds a 75% fillable weight of 28 grams. To accommodate such a support tray, a vaporizer vessel of a suitable diameter is required. The height of the vaporizer vessel may be determined by the number of reagent support trays that can be accommodated. It may be selected to accommodate tacks.

[0050]

[0073] FIG. 4 is a perspective view of a reagent support tray 400 according to a specific exemplary embodiment of the present disclosure. The reagent support tray 400 in FIG. 4 has a different height than the reagent support tray 300 in FIG. 440. The tray 440 is similar to the reagent support tray 300.

[0051]

[0074] As already described with reference to FIG. 1, the reagent support tray 400 includes a plurality of partitions 41 0 and 412, and channels 420 extend through these partitions to convey a mixed gas flow or other gas flows between the volumes delimited by the reagent support tray.

[0052]

[0075] The reagent support tray 400 includes a reagent support surface 401 having an upper surface 40 2 that functions as the bottom of the reagent support tray 400. The reagent support surface 401 supports a source reagent material (not shown in FIG. 4) placed within the reagent support tray 400. The reagent support tray 400 [[ID=1s]]is delimited by side walls 404 that extend along the outer periphery of the support surface 40 1 so as to enclose the reagent source material placed on the reagent support surface 401. The upper edge 406 of the side wall 404 can be regarded as the upper edge of the reagent support tray 400. Similarly, the lower edge 405 of the reagent support surface 401 can be regarded as the lower edge of the reagent support tray 400 (as will be further described below, the lower ends of the partitions 410 and 412, for example, the lower end 411, can be regarded as the lower edge of the reagent support tray 400). The height 440 of the reagent support tray 400 (which may be measured either inside or, as shown in FIG. 4, outside) extends from the lower edge 405 of the reagent support tray 400 to the upper edge 406 of the reagent support tray 400. is also described below, the lower ends of the partitions 410 and 412, for example, the lower end 411, can be regarded as the lower edge of the reagent support tray 400). The height 440 of the reagent support tray 400 (which may be measured either inside or, as shown in FIG. 4, outside) extends from the lower edge 405 of the reagent support tray 400 to the upper edge 406 of the reagent support tray 400. 410 and 412, for example, the lower end 411, can be regarded as the lower edge of the reagent support tray 400). The height 440 of the reagent support tray 400 (which may be measured either inside or, as shown in FIG. 4, outside) extends from the lower edge 405 of the reagent support tray 400 to the upper edge 406 of the reagent support tray 400. to the upper edge 406 of the reagent support tray 400. to the upper edge 406 of the reagent support tray 400. 00.

[0053]

[0076] In certain embodiments, the volume encompassed by the reagent support tray 400 is divided by a plurality of partitions 410 and 412. As already described with reference to FIG. 1, the plurality of partitions 410 and 412 extend vertically in the direction from the lower end 411 to the upper end 413 through the support surface 401, and between the lower end 411 and the upper end 413 of each of the plurality of partitions 410 and 412 extends in the vertical direction from the lower end 411 to the upper end 413, and between the lower end 411 and the upper end 413 of each of the plurality of partitions 410 and 412 ​​​​A plurality of channels 420 extend through the

[0054]

[0077] One or more of the partitions, for example, partition 410, may be positioned on support surface 40. 1. In certain embodiments, the down tube (FIGS. 1 and 2) may extend completely across the down tube. 2, a partition 41 is provided to receive the down tubes 150 and 250, respectively. 0 may include an opening 422 through which the downtube may extend to the reagent support tray 40 0. One or more other partitions of the plurality of partitions, for example, partition 41 2 may extend only partially across the support surface 401. In the embodiment of FIG. Both types of partitions 410 and 412 have multiple channels extending therethrough. In the embodiment of FIG. 4, the plurality of channels 420 includes a partition 412 and 414 includes a plurality of generally parallel holes 420 extending therethrough.

[0055]

[0078] As already described with reference to FIG. 1, in certain embodiments, a plurality of compartments 4 10 and 412 extend downwardly below the support surface 401 to a lower end 411 and an upper end The relative lengths of the lower end 411 and the upper end 413 are: As described with reference to FIG. 1, the gas mixture is placed in a volume separated by a reagent support tray 400. The fluid is configured to facilitate passage out of the volume after circulating through the volume.

[0056]

[0079] As previously explained with reference to Figure 2, reagent support trays of different heights can be used. Reagent support trays of different heights may be used simultaneously in the vaporizer vessel. The height 340 of the reagent support tray 30 is measured from the lower edge 305 of the support surface 301 to the reagent support tray 30 0 to the top edge 306 of the dividers 310 and 312. The end may extend below the support surface 301 a first distance of 0.276 inches. The height 440 of the reagent support tray 400 is measured from the lower edge 405 of the support surface 401 to the The partitions 410 and 411 may be 2.36 inches measured to the top edge 406 of the partition 400. The lower ends of the two may also extend below the support surface 401 a first distance of 0.276 inches. do.

[0057]

[0080] Illustratively, the reagent support tray 400 has a diameter of 8.9 inches and a bottom support surface of 1.5 mm. 1.26 inches from the bottom of the divider to the top edge of the side wall, and The partition may be 0.28 inches wide and It may contain a total of 68 channels as shown in Figure 4. The surface area of ​​the support surface is 49.68 square meters. inch, and a 75% fillable volume of 80.483 cubic inches. These dimensions and volumes are suitable for, for example, semiconductor A sufficient amount of source reagent vapor is used for the deposition or implantation of source material on a batch of solid wafers. It allows for the generation of energy.

[0058]

[0081] FIG. 5 is a perspective view of a reagent support tray 500 according to a specific exemplary embodiment of the present disclosure. The reagent support tray 500 in FIG. 5 and the reagent support tray 600 in FIG. 6 are respectively 4, except that, as further described below, As such, support trays 500 and 600 are identical to the trays included in reagent support trays 300 and 400. The channel type is different from the channel type.

[0059]

[0082] As already described with reference to FIG. 1, the reagent support tray 500 includes a plurality of partitions 51 0 and 512, and channels 520 extend through these partitions to convey a mixed gas flow or other gas flows between the volumes separated by the reagent support tray.

[0060]

[0083] The reagent support tray 500 includes a reagent support surface 501 having an upper surface 50 2 that functions as the bottom of the reagent support tray 500. The reagent support surface 501 supports a source reagent material (not shown in FIG. 5) placed within the reagent support tray 500. The reagent support tray 500 is bounded by side walls 504 that extend along the outer periphery of the support surface 50 1 so as to enclose the reagent source material placed on the reagent support surface 50 1. The upper edge 506 of the side wall 504 may be regarded as the upper edge of the reagent support tray 500. Similarly, the lower edge 505 of the reagent support surface 501 may be regarded as the lower edge of the reagent support tray 500 (as will be further described below, the lower ends of the partitions 510 and 512, e.g., the lower end 511, may be regarded as the lower edge of the reagent support tray 500). The height 540 of the reagent support tray 500 (which may be measured either inside, as shown in FIG. 5, or outside) extends from the lower edge 505 of the reagent support tray 500 to the upper edge 506 of the reagent support tray 5 00. [[ID=​​​​​​​​​​​​​​ In the embodiment of FIG. 5, both types of dividers 5 510 and 512 are partitions 510 and 512 through which a plurality of channels 510 and 512 extend. In the embodiment of FIG. 5, the plurality of channels 520 are separated by partitions 510 and 511. 2 includes a hollow slot 520 extending through the

[0062]

[0085] One or more of the partitions, for example, partition 510, may be positioned on support surface 50. 1. In certain embodiments, the down tube (FIGS. 1 and 2) may extend completely across the down tube. 2, a partition 51 is provided to receive the down tubes 150 and 250, respectively. 0 may include an orifice 522 for receiving the downtube, Through this, a down tube can extend through the reagent support tray 500. One or more of the other partitions, such as partition 512, only partially crosses support surface 501. As already described with reference to FIG. 1, in certain embodiments, multiple The partitions 510 and 512 extend downwardly below the support surface 501 to a lower end 511, and extends upward to an upper end 513. The target length is the length at which the mixed gas is separated by the reagent support tray 500 as described with reference to FIG. selected to promote passage out of said volume after circulating through said volume. , and is composed of.

[0063]

[0086] FIG. 6 is a perspective view of a reagent support tray 600 according to a specific exemplary embodiment of the present disclosure. As previously described with reference to FIG. 1, the reagent support tray 600 includes a plurality of compartments 610. and including 612, the mixing gas flow or other gas flows are conveyed between volumes delimited by the reagent support tray, and channels 620 extend through these partitions.

[0064]

[0087] The reagent support tray 600 includes a reagent support surface 601 having an upper surface 60 2 that functions as the bottom of the reagent support tray 600. The reagent support surface 601 supports a source reagent material (not shown in FIG. 6) placed within the reagent support tray 600. The reagent support tray 600 is delimited by side walls 604 extending along the outer periphery of the support surface 60 1 so as to enclose the reagent source material placed on the reagent support surface 601. The upper edge 606 of the side wall 604 can also be regarded as the upper edge of the reagent support tray 600. Similarly, the lower edge 605 of the reagent support surface 601 can also be regarded as the lower edge of the reagent support tray 600 (as will be further explained below, the lower ends of the partitions 610 and 612, for example, the lower end 611, can be regarded as the lower edge of the reagent support tray 600). The height 640 of the reagent support tray 600 (which can be measured either inside or, as shown in FIG. 6, outside) extends from the lower edge 605 of the reagent support tray 600 to the upper edge 606 of the reagent support tray 6 00. 00.

[0065]

[0088] In certain embodiments, the volume encompassed by the reagent support tray 600 is divided by a plurality of partitions 610 and 612. As already described with reference to FIG. 1, the plurality of partitions 610 and 612 extend vertically in the direction from the lower end 611 to the upper end 613 through the support surface 601, and between the lower end 611 and the upper end 613 of each of the plurality of partitions 610 and 612 a plurality of channels 620 extend. As in the embodiment of FIG. 5, in the embodiment of FIG. 6 as well. Each of the plurality of channels 620 is a hollow slot extending through the partition 610 or 612. Includes To620.

[0066]

[0089] One or more of the partitions, for example, partition 610, may be positioned on support surface 60. 1. In certain embodiments, the down tube (FIGS. 1 and 2) may extend completely across the down tube. 2, a partition 61 is provided to receive the down tubes 150 and 250, respectively. 0 may include an orifice 622 for engaging the downtube, Through this, a down tube can extend through the reagent support tray 600. One or more of the other partitions, such as partition 612, extend only partially across support surface 601. In the embodiment of FIG. 6, both types of dividers 610 and 612 may extend These partitions include a channel 620 extending through them.

[0067]

[0090] As already described with reference to FIG. 1, in certain embodiments, a plurality of partitions 6 10 and 612 extend downwardly below the support surface 601 to a lower end 611 and an upper end The relative lengths of the lower end 611 and the upper end 613 are: As described with reference to FIG. 1, the gas mixture is placed in a volume separated by a reagent support tray 600. selected and configured to promote passage of the fluid out of the volume after circulating through the volume, will be done.

[0068]

[0091] As previously explained with reference to Figure 2, reagent support trays of different heights can be used. Additionally, reagent support trays of different heights may be used simultaneously within the vaporizer vessel. 5, the height 540 of the reagent support tray is the height of the reagent support tray from the lower edge 505 of the support surface 501 to the The partitions 510 and 511 may be 1.18 inches measured to the top edge 506 of the tray 500. The lower end of 12 may extend below the support surface 501 a first distance of 0.276 inches. On the other hand, the height 640 of the reagent support tray 600 is set to a value from the lower edge 605 of the support surface 601 to the reagent Measured to the top edge 606 of the support tray 600 may be 2.36 inches. and the lower end of 612 is also below the support surface 601 by a first distance of 0.276 inches. It can be extended.

[0069]

[0092] 7 and 8 are diagrams illustrating the reagent support tray 300 of FIG. 3 and the reagent support tray of FIG. 5, respectively. 7 shows reagent support trays 700 and 800 similar to tray 500. The reagent support tray 700 has a top surface 702 that serves as the bottom of the reagent support tray 700. The reagent support surface 701 includes a support surface 701. The reagent support surface 701 is configured to support a reagent placed in a reagent support tray 700. The reagent support tray 700 has multiple compartments. The container is divided into compartments by partitions 710, each of which has a total length extending therethrough. The casing 720 includes a plurality of parallel holes 720 as a casing.

[0070]

[0093] The difference between the reagent support tray 700 and the reagent support tray 300 of FIG. The difference is that the reagent support surface 701 includes only a partition that extends completely across the reagent support surface 701. 3, which includes a plurality of partitions 312 that extend only partially across the support surface 301. In contrast to the reagent support tray 300, all of the compartments 710 of the reagent support tray 700 are 3. The reagent support tray 700 extends completely across the surface 701. Thus, the reagent support tray 700 is the same as the reagent support tray 700 of FIG. The support surface 701 has a larger surface area than the support surface 301 of the support tray 300. In addition, in the reagent support tray 700, the partial partition 31 of the reagent support tray 300 2, allowing gas to pass into the volume represented by the reagent support tray 700. There are fewer channels (in the form of holes 720) to accommodate this.

[0071]

[0094] Referring to FIG. 8, the reagent support tray 800 includes a bottom portion of the reagent support tray 800. The reagent support surface 801 includes a reagent support surface 801 having an upper surface 802 that functions as a reagent support surface. Support tray 800 supports source reagent materials (not shown in FIG. 8) placed within it. The medication support tray 700 is divided into a plurality of compartments by a plurality of dividers 810, each of which contains a 10 includes a hollow slot 820 extending therethrough.

[0072]

[0095] The difference between the reagent support tray 800 and the reagent support tray 500 of Figure 5 is that the reagent support tray 800 includes only dividers that extend completely across the reagent support surface 801. That is, in contrast to the reagent support tray 500 of Figure 5, which includes a plurality of dividers 512 that extend only partially across the support surface 501, all of the dividers 810 of the reagent support tray 800 extend completely across the support surface 501. 801 Therefore, the reagent support tray 800 has a larger surface area on its support surface 801 compared to the support surface 501 of the reagent support tray 500 of Figure 5 and correspondingly has fewer channels (in the form of slots 820) to allow gas to pass into the volume represented by the reagent support tray 800 due to the absence of the partial dividers 512 of the reagent support tray 500.

[0073]

[0096] FIG. 9 illustrates a reagent support tray of a particular exemplary embodiment similar to the reagent support tray of FIG. The reagent support tray 900 is a perspective view of the reagent support tray 900. The reagent support surface 901 includes a reagent support having a functional upper surface 902. Supports source reagent materials (not shown in FIG. 9) placed in a carrier tray 900. The support tray 900 is divided into a plurality of compartments by a plurality of dividers 910, and each divider 91 The reagent support tray 900 includes a plurality of holes 920 and 921 extending therethrough. 7 differs from the reagent support tray 700 of FIG. 7 in that both sides of the divider 910 are Sides 990 are at points that are not parallel to the sides of partition 710. Because the surfaces 990 are not parallel, the holes 920 in the narrow portion of the partition 910 The holes 921 in the wider part cannot be as large. By employing a reagent support tray 900 having a support surface 901, the support surface 901 can be partially or completely The holes 920 and 921 allow for a larger area without including an additional partition extending completely across the It is possible to obtain a large channel area. By using the divider 910, which has a wider base than the 710 (Figure 7), This is made possible by the partition 710 having a parallel width that spans a smaller surface area than the partition 910. It is possible to obtain a support surface 901 having added structural rigidity to the structural rigidity of the support surface 901. becomes.

[0074]

[0097] 10 is a side cross-sectional view of another specific exemplary embodiment of a vaporizer device 1000 and associated components according to the present disclosure. The vaporizer vessel 1000 includes a body 1002 and a lid 1004. The lid 1004 is configured to allow for the flow of carrier gas (FIG. 10The lid 1004 includes an inlet port 1006 configured to receive a carrier gas and a reagent vapor (also not shown in the figure). 10 The vaporizer vessel 1000 also includes an outlet port 1008 through which a mixture of the vaporizer vessel 1000 and the vaporizer vessel 1000 can be produced. When the lid 1004 is secured to the body 1002 using a clamp, bolt, or other device, the body 1002 and the lid 1004 define an enclosed interior volume 1005 of the vaporizer vessel 1000.

[0075]

[0098] In the particular exemplary embodiment of FIG. 10, multiple reagent support trays of approximately the same size are provided. As already explained with reference to FIG. As noted above, the reagent support trays 1010, 1020, 1030, and 1040 are configured to accommodate reagent vapors. Source reagent material 100 configured or expected to produce 1003 1. A plurality of reagent support trays 1010, 1020, 1 It should be understood that each of the 030 and 1040 may be a different size. This will be further explained with reference to Figures 15 to 20. Drug support trays 1010, 1020, 1030 and 1040 are four individual reagent support trays Although shown including a reagent support tray, any number of reagent support trays may be used.

[0076]

[0099] As previously described with reference to FIG. 30 and 1040, and vaporizer vessel 1000 are configured to facilitate heating of the source reagent material. The heat conductive material may be made of a thermally conductive material such as a carrier gas. the source reagent material, or the reagent vapor produced by vaporizing the source reagent material. It may be made of a non-reactive metal or other material. 00 showing the use of at least one particle suppression device 1080, The particle suppression device 1080 includes a plurality of reagent support trays 1010, 1020, 1030. and 1040 and the outlet port 1008. The particle suppression device 1080 comprises a plurality of parallel flat plates spaced apart within a housing 1084. According to certain embodiments, multiple spaced filters 1082 are used. By doing so, particle suppression device 1080 can suppress the particle flow by a single filter (not shown in FIG. 10). passing a large amount of carrier gas and reagent vapor mixture at a velocity greater than would be possible with a conventional gas turbine; And it may be possible to filter this.

[0077]

[0100] In operation, the vaporizer vessel 1000, the plurality of reagent support trays 1010, 1020, 030 and 1040, the source reagent material 1001 and other components can be heated. A carrier gas flow 1007 may be introduced through an inlet port 1006. In this configuration, a carrier gas flow 1007 received through an inlet port 1006 The heat is transmitted downward through the down tube 1050 to the bottom of the enclosed interior volume 1005. The down tube 1050 allows the carrier gas flow 1007 to pass through a plurality of reagent support trays 10 It can be introduced under the bottom tray of 10, 1020, 1030 and 1040. This allows the heated carrier gas to expand towards the outlet port 1008. As the carrier gas stream 1007 travels upward, it contacts a plurality of reagent support trays 1010 , 1020, 1030 and 1040. The carrier gas flow 1007 passes through a plurality of reagent support trays 1010, 1020, 1030 and 1040. 040 and further promotes interaction between the carrier gas and the source reagent material 1001. To achieve this, the flow was distributed to a flow disperser 1052 that generates a vortex of carrier gas. The carrier gas may be introduced through a heated source tube 1050. The source reagent vapor 100 interacts with the source reagent material 1001 to generate a carrier gas 1007 and a source reagent vapor 100 3 and, in some cases, pseudo-particles (not shown in FIG. 10) to generate a mixed gas 109. Particles above a predetermined size are filtered out by the spaced filter 1082 of the particle suppression device 1080. The filtered carrier gas and source reagent vapor mixture 1090 is removed by the The vaporizer exits the vaporizer vessel 1000 via port 1008.

[0078]

[0101] In certain embodiments, multiple reagent support trays 1010, 1020, 103 100 and 1040 are arranged in a stack and have a plurality of reagent support trays 1010, 102 The mixed gas 1009 flowing through the nozzles 100, 1030 and 1040 passes through the nozzles 1009 to the left and right. 09, a source reagent material 1001 and a reagent vapor generated by the source reagent material 1001 The device is adapted to encourage engagement with the user's mind 1003.

[0079]

[0102] As shown in FIG. 10, a plurality of reagent support trays 1010, 1020, 103 100 and 1040 are diagrams showing the gas mixture 1009 being delivered to a plurality of reagent support trays 1010, 1020, 1030, 1040. 30 and 1040, the first side 1090 of the vaporizer vessel 1000 (e.g., 10) from a second side 1090 of the vaporizer vessel 1000 (e.g., the right side as shown in FIG. 10). The flow of the mixed gas 1090 is sequentially redirected to the left (as shown in Figure 0). The redirection of the gas mixture is performed by a plurality of reagent support trays, as further described below. A series of oppositely positioned gases arranged at 1010, 1020, 1030 and 1040 This can be achieved by the flow openings 1022, 1032 and 1042. The gas flow openings used at 10, 1020, 1030 and 1040 are suitable for multiple reagent support. The trays 1010, 1020, 1030, and 1040 may each have the same configuration. , or, as shown in FIG. 10, a plurality of reagent support trays 1010, 1020, 10 The configuration of the gas flow openings between 30 and 1040 may differ.

[0080]

[0103] As the gas mixture 1009 flows through the reagent support tray 1010 and therefrom into the reagent support tray 1020 (the upper support tray relative to the reagent support tray 1010), the gas mixture flows toward the first side 1090 because the only path from the volume 1017 above the reagent support tray 1010 to the reagent support tray 1020 is through the gas flow opening 1022. The gas flow opening 1022 may include an opening in the support surface 1021 of the reagent support tray 1020. The gas flow opening 1022 may be surrounded by a wall 1024 configured to contain the reagent source material 1001 received in the reagent support tray 1020 and prevent the reagent source material 1001 from falling through the gas flow opening 1022 into the reagent support tray 1010. Also, in certain embodiments, the walls 1024 of the gas flow openings 1022 may extend below the bottom surface 1023 of the support surface 1021, such that the portion of the gas mixture 1009 that impinges on the bottom surface 1023 of the support surface 1021 is directed downwardly from the support surface 1021. 102110 and circulates away from the bottom surface 1023 of the reagent support tray 1010 to reach the gas flow opening 1022. In this manner, the mixed gas may be further directed to interact with the source reagent material 1001 and reagent vapor 1003 in the volume 1017 above the reagent support tray 1010, as shown in FIG.

[0081]

[0104] When the gas mixture 1009 enters the volume 1027 above the reagent support tray 1020, the mixture Gas 1009 is directed to a second side 1092 of the vaporizer vessel 1000 because volume 1 This is because the only way out of gas flow opening 1032 is through gas flow opening 1032. This allows the gas mixture 1009 to enter the volume 1037 above the reagent support tray 1030. The gas flow opening 1032 is a section of the reagent support tray 1030 that is connected to the vaporizer vessel 1. 1000, but does not directly engage the inner wall 1099 of the reagent support tray 104 10. The support surface 1041 includes a sidewall 1033 that extends only partially toward the bottom surface 1043 of the support surface 1041. The compartment includes a space surrounded by the side wall 1033 and the inner wall 1099 of the vaporizer vessel 1000. The gap allows the gas mixture 1009 to flow into the volume 1037 above the reagent support tray 1030. The mixed gas 1009 then flows back into the first vaporizer vessel 1000. side 1090, where the mixed gas flows through gas flow openings 1042 to reagent support tray 1 The gas flows into a volume 1047 above the reagent support tray 1040. 042 indicates that the walls 1044 of the gas flow openings 1042 are aligned with the support surface 104 of the reagent support tray 1040. 1. The reagent support tray 1020 has a bottom surface 1043 formed thereon except that it does not extend below the bottom surface 1043 of the reagent support tray 1020. Similar to gas flow opening 1022.

[0082]

[0105] In this manner, the offset gas flow openings 1022, 1032 and 1042 Thus, the mixed gas passes through the spaced filter 1082 in the housing 1082 of the particle suppression device 1080. 084 and before exiting the vaporizer vessel 1000 via the outlet port 1008. 1009 is guided back and forth through the vaporizer vessel 1000 to form the source reagent material 100 1 and the resulting reagent vapor 1003, Within 009, the source reagent is entrained.

[0083]

[0106] FIG. 11 illustrates a reagent support tray 1100 according to a specific exemplary embodiment of the present disclosure. 1100 11 is a perspective view of a reagent support tray having a gas flow opening 1120 disposed inside a side wall 1103 of the reagent support tray 1100, on one side 1191 of the reagent support tray. The reagent support tray 1100 includes a support surface 1101 having an upper surface 1102 configured to receive a supply of source reagent material (not shown in FIG. 11 ). The gas flow opening 1120 is formed in the support surface 1101 and is surrounded by a wall 1124 which, as previously described, confines the source reagent material (not shown in FIG. 11 ) received in the reagent support tray 1100 and prevents the source reagent material from falling through the gas opening 1120. Except for this gas flow opening 1120 and the absence of a divider, the reagent support tray 1100 corresponds to the other reagent support trays previously described.

[0084]

[0107] FIG. 12 illustrates another exemplary embodiment of a reagent support tray 1200 according to the present disclosure. 1200 12 is a perspective view of a reagent support tray having gas flow openings 1220 disposed on one side 1291 of the vaporizer vessel. As previously described with reference to FIG. 10, the reagent support tray 1200, like the reagent support tray 1030 of FIG. 10, has gas flow openings 1220 disposed between the interior wall of the vaporizer vessel (not shown in FIG. 12) and a portion of the side wall 1233 of the reagent support tray 1200 that is on said one side 1291 of the vaporizer vessel.1220 Reagent support tray 1200 includes a support surface 1201 having an upper surface 1202 configured to receive a supply of source reagent material (not shown in FIG. 12). Support surface 1201 does not extend to or tightly engage the interior wall of the vaporizer vessel, leaving a gap between support surface 1201 and a portion of sidewall 1233 at one side 1291 of the vaporizer vessel, thereby forming a gas flow opening between said portion of sidewall 1233 and the interior wall of the vaporizer vessel. 1220 The portion of side wall 1233 that defines gas flow opening 1220 on one side 1291 may not extend to the same height as the other portion 1235 of the side wall, thereby leaving an opening to allow the flow of a gas mixture into the volume above reagent support tray 1200, for example, as described with reference to reagent support tray 1030 in Figure 10. Except for this gas flow opening 1220 and the absence of a divider, reagent support tray 1200 corresponds to the other reagent support trays previously described.

[0085]

[0108] FIG. 13 illustrates a particular exemplary embodiment of a reagent support tray similar to the reagent support tray 700 of FIG. A drug support tray 1300, the upper surface 13 of the support surface 1301 of the reagent support tray 1300 13 is a perspective view of a reagent support tray with the addition of multiple protrusions 1330 extending from the tray. 1330 are positioned between the partitions 1310, which have already been described. As noted, they may incorporate multiple channels 1320 extending therethrough. In an embodiment, the protrusions 1330 are thermally conductive and supported within the reagent support tray 1300. The source reagent material (not shown in FIG. 13) is in contact with the source reagent material, which may be thermally conductive. The protrusions 1330 are adapted to distribute the source reagent material throughout the volume of source reagent material contained in the reagent support tray 1300. It can be used to improve the distribution of thermal energy.

[0086]

[0109] FIG. 14 illustrates a specific exemplary embodiment similar to the reagent support tray 1200 of FIG. A reagent support tray 1400, the upper surface of the support surface 1401 of the reagent support tray 1400 14 is a perspective view of a reagent support tray with the addition of multiple protrusions 1430 extending from 1402. FIG. Comparing Figures 13 and 14, protrusions 1330 and 1430 are partitions within the reagent support tray. It may be used with or without the divider 1310 (Fig. 13). In certain embodiments, the protrusions 1430 are thermally conductive and the reagent support tray 1400. The source reagent material 1450 may be supported within the thermally conductive protrusion 1400. The source 1430 is a volume of source reagent material 1450 contained in a reagent support tray 1400 . This can be used to improve the distribution of thermal energy to the

[0087]

[0110] In certain embodiments, the protrusion 1430 has a channel extending therethrough. 1400 into the volume above the reagent support tray 1400. 4 (not shown) through the support surface 1401. 32. Thus, the channel 1432 may include the same components as those already described with reference to FIGS. 14. The reagent support tray 1400 has one side and a vaporizer container (not shown in FIG. 14) 14. The gas flow openings 1420 may be used to convey gas flow between the inner wall of the 13 also provides a reagent support from below the support surface 1301, as previously described. Channels 13 in partitions 1310 for conveying gas flow into the volume above tray 1300 13. A channel (shown in FIG. 13) extending through the protrusion 1330 functions in conjunction with the protrusion 1330. (not shown). Channels through which the protrusions 1330 and 1430 extend. 1432, the lower ends of the protrusions 1330 and 1430 are respectively connected to the support surface 130. 1 and 1401. Alternatively, the protrusions 1330 and 1401 may be flush with the bottom surfaces (not shown). 1430 extend below the bottom surfaces of the support surfaces 1301 and 1401, respectively, to form support surfaces The gas flow may be redirected away from the bottom surfaces of 1301 and 1401. 1, by extending the protrusions 1330 and 1430. Channels 168 in partitions 162 and 164 extend under 121 and 131, respectively. As described with reference to FIG. 1, a gas flow enters the channels 1432 in the protrusions 1330 and 1430. Before the gas flow and source reagent material or solution are inserted under the support surfaces 1301 and 1401, The ion exchange agent may be capable of readily interacting with the source reagent vapor.

[0088]

[0111] 15-20 are side cross-sectional views of certain exemplary embodiments of combinations of reagent support trays of the same or different dimensions combined into a stack of reagent support trays to be placed within a vaporizer vessel. As shown in the examples of FIGS. 15-20, the stack of reagent support trays may include reagent support trays of the same height, whether tall or short, or may include various combinations or arrangements of trays of different heights. The combination of one or more reagent support trays having a first height (e.g., tall trays) and one or more reagent support trays having a second height (e.g., short trays) may be selected based on a first proportion of first reagent vapor from a first reagent source material to be received in one or more reagent support trays having a first height and a second proportion of second reagent vapor from a second reagent source material to be received in one or more trays having a second height among the plurality of reagent support trays. Additionally, positioning a particular source reagent material in a lower layer of the vaporizer vessel, the vaporizer, containerIt may be advantageous to position the reagent source material on top of, or interpose it between, levels of one or more other reagent source materials.

[0089]

[0112] In the following example, the reagent support tray is available in two heights: a first height and a second height. Assume that the trays may only contain reagent support trays of different heights, except that a third height, a fourth height, The range of tray heights including the height of the tray shown in any of FIGS. 1 to 6 or this description. It is understood that a range of tray heights is possible, which may include heights higher or lower than those shown. Also, the stack of reagent support trays should be Contains up to three or up to six reagent support trays of a second height, while the trays of each height are More or less may be included. The reagent support tray is described with reference to Figures 1 to 9. The reagent support tray may include a divider containing a channel as shown in FIGS. The reagent may include gas flow openings positioned alternately on either side as described with reference to The support tray may have solid projections or channels as described with reference to FIGS. The reagent support tray may also have other configurations. The support trays may include a combination of trays having different characteristics.

[0090]

[0113] To illustrate examples of stacks of various reagent support trays, FIG. 15 shows all first A reagent tray including three high (e.g., tall) reagent support trays 1510, 1520, and 1530. FIG. 16 shows a stack 1500 of medication support trays, all of a second height (e.g., low). Six reagent support trays 1610, 1620, 1630, 1640, 1650 and 1660 16 shows a stack 1600 of reagent support trays including: It may contain only reagent support trays of the same height.

[0091]

[0114] Alternatively, a stack of reagent support trays may include reagent support trays of different heights. FIG. 17 shows a stack of reagent support trays 1700 including two reagent support trays 1710 and 1720 of a first height (e.g., high) and two reagent support trays 1730 and 1740 of a second height (e.g., low). While FIG. 17 shows the same number of reagent support trays of the same height, with the second-height reagent support trays 1730 and 1740 positioned above the first-height reagent support trays 1710 and 1720, the reagent support trays need not necessarily be selected or stacked in this manner. For example, FIG. 18 shows a stack of reagent support trays 1800 in which two reagent support trays 1810 and 1820 of a second height (e.g., low) are stacked below two first-height (e.g., high) reagent support trays 1830 and 1840. 19 shows a stack 1900 of reagent support trays including a reagent support tray 1910 of a first height (e.g., high) below four reagent support trays 1920, 1930, 1940, and 1950 of a second height (e.g., low). Alternatively, the reagent support tray 1910 of the first height may be positioned above the reagent support trays 1920, 1930, 1940, and 1950. Additionally, reagent support trays of different heights may be interleaved. Thus, as shown in FIG. 20, a stack 2000 of reagent support trays may include: No. 1 The reagent support trays may include two reagent support trays 2010 and 2030 of a second height (e.g., lower) alternating between two / four reagent support trays 2020 and 2040 of a first height (e.g., higher). Thus, the number, Any combination of trays in terms of height and features may be used.

[0092]

[0115] 21-25 show reagent support trays for supporting various shapes of source reagent materials. 1 is a side cross-sectional view of various types of solid reagent source materials and liquids according to embodiments of the present disclosure. For example, Figures 1, 10 and 14 show solid but non-solid reagent source materials. The source reagent material 101, 1001, and 1450 are shown in various shapes, respectively. The reagent material can be provided in a myriad of shapes. For example, Figure 21 shows a solid, monolithic 21 shows a reagent support tray 2100 supporting a supply of source reagent material 2110 in the form of a block. FIG. 22 shows a reagent support tray 220 that supports a supply of beaded source reagent material 2210. 23 shows a reagent support tray that supports a supply of powdered source reagent material 2310. 2300. FIG. 24 shows a reagent support 2410 for supporting a supply of liquid source reagent material. 25 shows a tray 2400. FIG. 25 shows a liquid containing a solid source material dissolved in a liquid containing a solvent. A reagent support tray 2500 is shown supporting a supply of source reagent material 2510 in a solid form. The reagent material may be supplied in any of these forms.

[0093]

[0116] The source reagent material may also be in any of the forms previously described. As already explained with reference to Figures 1, 10 and 14, The discretely shaped solid source reagent material comprises a reagent support tray including a partition having a channel; A support tray including a gas flow opening on one side, or a reagent support tray including a projection extending through the tray. These and similar reagent support trays are solid, monolithic structures that can be accommodated within the tray. 21, a beaded reagent source material 2210 (Fig. 22), powdered reagent source material 2310 (FIG. 23), and liquid reagent source material 2410 (Figure 24), or a reagent solution containing solid reagent source material dissolved in a solvent or other liquid. The casing may contain a base material 2510 (FIG. 25).

[0094]

[0117] 26 is a top perspective view of an upper surface 2610 of a particular exemplary embodiment of a particle suppression device 2600 employing multiple spaced parallel filters (not shown in FIG. 26) according to the present disclosure. As described with reference to FIGS. 1, 2, and 10, particle suppression device 2600 may be installed between reagent support trays 110, 120, 130, and 140 of vaporizer vessel 100 and outlet port 108, between reagent support trays 210, 220, 230, and 240 of vaporizer vessel 200 and outlet port 208, or between reagent support trays 210, 220, 230, and 240 of vaporizer vessel 1000 of FIG. 1010 , 1020, 1030, and 1040 and the exit port 1008. And, particle suppression device 2600 is configured and positioned to capture particles above a predetermined size and prevent them from escaping through exit ports 108, 208, or 10008 as part of the mixed gas exiting vaporizer vessels 100, 200, and 1000, respectively.

[0095]

[0118] In certain embodiments, the particle suppression device is spaced apart within the housing 2610. In FIG. 26, the particle suppression device 2600 includes a plurality of parallel filters arranged in parallel. The upper surface 2611 of the housing 2610 shows an outlet 2612 within the housing 2610. A plurality of spaced apart particles are disposed around the housing 2610 of the particle suppression device 2600. By using parallel filters, it is possible to use one equivalent filter. This may allow for filtering and passing a larger volume of gas than can be achieved. This supports the production of higher fluxes of reagent vapor.

[0096]

[0119] Additionally, the upper surface 2611 of the housing 2610 of the particle suppression device 2600 , the down tubes 150, 250 described with reference to FIGS. 1, 2 and 10, respectively, or 1050. The central opening 2614 may include a down It is desirable that the size of the nozzle be a close fit to the outside dimensions of the tube, and that the gas be Exiting through port 2614 does not bypass the multiple filters of the particle suppression device. A gasket may be attached to the central opening 2614 so as to

[0097]

[0120] FIG. 27 illustrates a housing in a particle suppression device 2600 according to a specific exemplary embodiment. FIG. 27 is a bottom perspective view of the lower surface 2711 of the ring 2610. Parallel filters 2712 are shown. The multiple filters 2712 are part of the particle suppression device 26. 12 (FIG. 12) in the housing 2610 of the 00 to cover each outlet 2612 and to prevent the Particles are captured and removed.

[0098]

[0121] Each of the plurality of filters 2712 may include a single filtering element, as shown in FIG. for sequentially removing particles of different sizes, as further described below with reference to The filter may include multiple filter elements connected together in series.

[0099]

[0122] FIG. 28 is a cross-sectional view of one of the filters 2712 of FIG. 27, showing multiple filter elements that may be included among multiple filter elements in one or more of the filters 2712. 280027. For example, one or more of the plurality of filters 2712 may include a plurality of filter elements 2800 including at least one frit 2810 configured to block particles larger than a first predetermined tolerance size. Alternatively or additionally, one or more of the plurality of filters 2712 may include a plurality of filter elements 2800 including a thermally conductive mesh or foam material 2820, such as a metal foam material that may be formed from aluminum or stainless steel. The thermally conductive mesh or foam material may be configured to block particles larger than a second predetermined tolerance size that is smaller than the first predetermined tolerance size. Furthermore, one or more of the plurality of filters 2712 may include a plurality of filter elements 2800 including at least one additional filter 2830 made of wadding, fabric, or other material. This at least one additional filter 2830 The filter element may be configured to block particles larger than either a first or second predetermined acceptable size. 2800 The filter, which includes the filter, may successively remove particles of smaller and smaller size, thereby preventing the gas mixture produced by the vaporizer vessel from containing these particles.

[0100]

[0123] FIG. 29 illustrates a deposition or injection system 200 employing a vapor delivery system according to the present disclosure. 900. This system 2900 is similar to that shown in FIGS. 1 and 2. 1-28, and the vaporizer vessel 2910 as previously described. The vaporizer vessel 2910 uses such components and materials. A carrier gas source 2920 is connected to the source material 2920 to provide a flow of carrier gas. In another mode of introducing the source material, the liquid source material is introduced from the liquid source container 2930 into the vaporizer. The material may be introduced into the container 2910 or may be in the form of granules, powder, beads, porous material or the like. Alternatively, other forms of solid source reagent material (not shown in FIG. 29) may be placed in vaporizer vessel 2910. The vaporizer vessel 2910 may be pre-filled. An input valve 2912 is provided at the inlet port. The input valve 2912 may be opened to allow carrier gas to flow from the carrier gas source 2920. When the vaporizer vessel 2910 is closed, the carrier gas flow is prevented from rising sharply. Similarly, the outlet port of the vaporizer vessel 2910 may include a flow regulator valve positioned to allow The outlet may be provided with an outlet valve 2914. The outlet valve 2914 allows the flow of gas from a carrier gas source 2920 to the outlet. When the carrier gas begins to flow from the vaporizer vessel 2910 into the closed interior volume of the vaporizer vessel The pressure rise caused by the sudden increase in carrier gas flow entering the closed internal volume of the vessel 2910 is controlled. The device may include a gate overflow valve configured to limit the amount of overflow.

[0101]

[0124] The flow rate of the carrier gas supplied by the carrier gas source is The gas flow rate can be monitored and controlled by an input gas flow meter 2922 in line 2924. The flow rate of the gas discharged from the oxidizer vessel 2910 and supplied to the process unit 2940 is The flow rate is monitored and measured by an output gas flow meter 2942 installed in the carrier gas delivery line 2944. In certain embodiments, the process unit 2940 can process multiple wafers. Batch process units or other units capable of simultaneously depositing or injecting materials onto Includes 2948.

[0102]

[0125] The vaporizer vessel 2910 is also configured to control the temperature of the vaporizer vessel 2910. The temperature control assembly 2950 may be coupled to the temperature control assembly 2950. 2. Vaporizer vessel 2 between temperatures selected to facilitate vaporization of the source reagent material. The temperature control system 2 may be configured to enable temperature cycling of the temperature control system 910. 950 may include any thermal regulation system, for example, a system configured for controlled temperature operation. Constructed and arranged strip heater, radiant heater, heating enclosure, circulating fluid These include, but are not limited to, heaters, resistive heating systems, induction heating systems, etc. The temperature in the vaporizer vessel 2910 is measured using a thermocouple, a thermistor, or a thermocouple. It is positioned so as to contact the surface of the reagent support tray (not shown in FIG. 29) contained therein. The temperature may be detected by other suitable temperature measuring junctions or devices placed in the Such a temperature measuring device receives a temperature measuring signal from the temperature measuring device and controls the heater and and / or other controllable elements of the vaporization system to achieve the desired a general-purpose programmable computer configured to achieve the desired generation of source reagent vapor; Works with central processing units such as processors, programmable logic units, and microcontrollers It can be combined as possible.

[0103]

[0126] The vaporizer vessel 2910 is configured to vaporize the source reagent material in the vaporizer vessel 2910. Monitor at least one process variable that correlates with either gas or particle production. The process may be coupled to a process monitoring system 2960 configured to monitor and / or control the For example, the process monitoring system 2960, together with the temperature control assembly 2950, Regulating the temperature of the vaporizer vessel 2910 based on at least one monitored process variable For example, the process monitoring system may be configured to monitor the The temperature of the source reagent material (not shown in FIG. 29) is monitored and the source reagent material is maintained at the desired temperature. Temperature control assembly 2 to maintain the temperature at 100°C or cycle through a desired temperature range. 950. The process monitoring system 2960 may be configured to adjust the vaporizer vessel 2910 to determine when the source material is depleted or for other functions. It can also be used to fulfill

[0104]

[0127] The process monitoring system 2960 may include a vapor phase reagent monitoring system 2962. In certain embodiments, vapor phase reagent monitoring system 2962 monitors the amount of reagent in vaporizer vessel 2910. of the mixed gas flow or the mixed gas discharged by the vaporizer vessel through outlet valve 2914. The amount or concentration of source reagent vapor in either stream may be measured. , a filter for regulating the temperature of the vaporizer vessel 2910 by a temperature control assembly 2950 The temperature of the carrier gas dispensed from the carrier gas source 2920 is Or it may be used to adjust the flow rate or other controllable quantity. Reagent monitoring systems include, but are not limited to, infrared spectroscopy, Raman spectroscopy, or mass spectrometry. The concentration data may be obtained using one or more detection techniques that are not related to the deposition or implantation process. The temperature and temperature of the source reagents must be adjusted to achieve the appropriate material flux required to support the and / or carrier gas flow.

[0105]

[0128] The improved reagent support tray, particle suppression device or the like described herein The vaporizer vessel, which incorporates other features of the AT Danbury, Connecticut, USA It is marketed under the trademark ProE-Vap® by MI, Inc. oE-Vap vaporizers utilize stacked trays that contain source reagents. In this case, the carrier gas is introduced from the top end and flows through a feed tube extending downward. The liquid flows to the bottom of the vessel and is then dispersed through each tray within the vessel's interior volume and then flows upward. In this manner, the vessel, when heated, flows in a direction opposite to the direction of flow within the vessel's internal volume. The tray is conductively heated to generate vapor from the source reagent on the tray. The resulting source reagent vapor is then entrained in a carrier gas. The carrier gas mixture exits the top end of the vaporizer through an outlet port in the vessel. From the port, the carrier gas mixture containing the source reagent vapor passes to the exhaust valve of the vaporizer. The outlet valve is connected to a downstream process unit such as a chemical vapor deposition chamber, an ALD chamber, or an ion implanter. a carrier gas mixture containing a source reagent vapor coupled to a flow circuit associated with the source reagent vapor; may be allowed to flow from the vaporizer vessel to such downstream fluid process equipment.

[0106]

[0129] Other vaporizers may be used in the practice of this disclosure. European Patent Application No. 1508, published February 23, 2005, the disclosure of which is incorporated herein. No. 631: "Method and Apparatus for Delivering Precursor Materials."

[0107]

[0130] Another exemplary vaporizer that may be used in the broad practice of the present disclosure is incorporated herein by reference. No. 200,000,200, published February 2, 2006, the disclosure of which is incorporated herein. No. 6 / 0024439: "System for controlling the sublimation of a reactant."

[0108]

[0131] Other vaporizers that may be used in the broad practice of this disclosure are incorporated herein by reference. No. 6,921,066, issued July 26, 2005, the contents of which are incorporated herein. No. 2: Listed in "Vaporizer Delivery Ampoule".

[0109]

[0132] FIG. 30 illustrates a reagent support tray as described with reference to FIGS. 1-25 in accordance with the present disclosure. Specific exemplary implementations for generating reagent vapor from a reagent source material using embodiments of the present invention are shown. FIG. 3 is a flow diagram of a method 3000 of an embodiment.

[0110]

[0133] 3002, a stack of reagent support trays received in a vaporizer vessel; A plurality of stackable reagent support trays are included, each of which is supplied with source reagent material. The tray redirects the gas flow so that the gas flow reaches one of the reagent support trays. After interacting with the source reagent material in the support tray, The one or more gas flow openings may be configured to pass to a gas support tray. The gas flow openings may be channels in the partitions as described with reference to FIGS. 1 to 9, Gas flow openings provided on one side of the reagent support tray as described with reference to FIG. 14. The protrusion may include a channeled projection as described with reference to 14.

[0111]

[0134] At 3004, a carrier gas stream is vaporized to be discharged onto a reagent support tray. For example, Figure 29 shows a vaporizer vessel receiving a carrier gas stream. At 3006, a carrier gas source adapted to supply the vaporizer vessel is shown. The application of heat heats the source reagent material and gases within the vaporizer vessel. By adding the gas in the vaporizer vessel, the gas in the vaporizer vessel is transported from the reagent support tray to its upper reagent support. The gases include a carrier gas and a source reagent material. For example, FIG. 29 shows a vaporizer vessel that introduces heat into the vaporizer vessel. A device for doing so is shown.

[0112]

[0135] FIG. 31 illustrates a reagent support tray as described with reference to FIGS. 1-25 in accordance with the present disclosure. Another specific example for generating a reagent vapor from a reagent source material using an embodiment of the present invention is shown in FIG. 31 is a flow diagram of a method 3100 of an embodiment.

[0113]

[0136] In 3102, a stack of reagent support trays received in a vaporizer vessel A plurality of reagent support trays are included to provide source reagent materials. 15-20 show a stack of reagent support trays. The carrier gas flow is directed toward the bottom of the vaporizer vessel. For example, FIG. 29 shows a vaporizer vessel with a carrier gas At 3106, a carrier gas source adapted to provide a vaporizing gas is shown. Heat is applied to the vaporizer vessel, heating the source reagent material and gases within the vaporizer vessel. This gas includes the carrier gas and vapors evaporated from the source reagent material. For example, FIG. 29 shows a device for introducing heat into a vaporizer vessel.

[0114]

[0137] In 3108, a reagent support tray in a stack of reagent support trays is heated. As the heated gas rises, a portion of this heated gas is transported to the stack of reagent support trays. the reagent support tray only through the lower end of the channel in the bottom surface of the upper reagent support tray The lower end of the channel allows the heated gas to exit the bottom of the upper reagent support tray. the source reagent material or solution in said reagent support tray by being redirected away from said The next reagent support tray is then positioned so that it interacts with the source reagent vapor and then exits into the channel. The direction of the heated gas is It is explained with reference to FIG.

[0115]

[0138] FIG. 32 illustrates a reagent support tray as described with reference to FIGS. 1-25 in accordance with the present disclosure. Another specific example for generating a reagent vapor from a reagent source material using an embodiment of the present invention is shown in FIG. 32 is a flow diagram of a method 3200 of an embodiment.

[0116]

[0139] At 3202, a stack of reagent support trays received within a vaporizer vessel. The source reagent materials are provided in a plurality of reagent support trays contained in FIGS. 15-20 show a stack of reagent support trays. The carrier gas flow is directed toward the bottom of the vaporizer vessel. For example, FIG. 29 shows a vaporizer vessel with a carrier gas At 3206, a carrier gas source adapted to provide a vaporizing gas is shown. Heat is applied to the vaporizer vessel, heating the source reagent material and gases within the vaporizer vessel. This gas includes the carrier gas and vapors evaporated from the source reagent material. For example, FIG. 29 shows a device for introducing heat into a vaporizer vessel.

[0117]

[0140] In 3208, as the heated gas rises within the vaporizer vessel, A portion of the introduced gas is directed through a first gas flow opening on a first side of the stack of reagent support trays. 321 into the first reagent support tray in the stack of reagent support trays. At 0, as the heated gas continues to rise in the vaporizer vessel, The portion is a second gas flow opening in a second reagent support tray of the plurality of reagent support trays. The second gas flow opening allows the reagents to exit the first reagent support tray only through the opening. On a second side of the stack of reagent support trays opposite the first side of the stack of drug support trays. Diversion of gas in this manner is described with reference to FIG.

[0118]

[0141] FIG. 33 illustrates a method of a particular exemplary embodiment for generating a reagent vapor for use in batch processing, such as deposition or injection of material onto multiple units, in accordance with the present disclosure. 3300 1 is a flow diagram of a reagent vaporizer vessel as previously described with reference to FIGS.

[0119]

[0142] In 3302, a source reagent material is deposited on a plurality of stacked reagent supports within a vaporizer vessel. Each reagent support tray is positioned within the reagent support tray. Such a system is configured to allow gas to flow between a plurality of reagent support trays. It comprises a number of compartments that are entirely free of obstacles and are separated by a number of hollow partitions. As previously explained, the generally hollow partition may have a slot extending therethrough. The partition may include a slot-like channel or a plurality of generally parallel holes extending through the partition. Alternatively, as described with reference to Figures 10 to 12, multiple reagent support trays may be provided. a gas flow opening adapted to direct the gas stream from side to side as the gas stream travels through the vaporizer vessel; It may include the mouth.

[0120]

[0143] In 3304, a carrier gas stream is provided to the inlet port of the vaporizer vessel, as also described with reference to FIGS. 3306 In the method described with reference to FIG. 29, the source reagent material is heated by applying heat to the vaporizer vessel.

[0121]

[0144] In 3308, the reagent vapor and carrier generated in response to heating of the vaporizer vessel The reagent vapor and carrier gas are then passed through multiple parallel filters to separate the mixture. The mixture is filtered. A number of parallel filters are arranged to prevent particles above a predetermined size from exiting the vaporizer vessel. Multiple parallel filters can achieve faster speeds than can be achieved with a single filter. This allows the mixture of carrier gas and reagent vapor to be filtered.

[0122]

[0145] Reference is made herein to certain aspects, features and exemplary embodiments of the present disclosure. Although embodiments have been described, the utility of the described embodiments is not limited to those described. but many other possibilities, as would be suggested to one of ordinary skill in the art based on the disclosure herein. It is understood that the present invention extends to and encompasses variations, modifications and alternative embodiments. Similarly, embodiments as set forth in the following claims are intended to be within the spirit and scope of the present invention. shall be broadly construed and interpreted to include all such modifications, alterations and alternative embodiments. It is intended that

Claims

1. a vaporizer vessel having one or more interior walls enclosing an interior volume; a plurality of reagent support trays disposed within the interior volume of the vaporizer vessel; each of the plurality of reagent support trays includes a support surface having an upper surface configured to support a supply of source reagent material and a lower edge, each of the plurality of reagent support trays further includes a sidewall extending vertically away from the support surface to a top edge, each of the plurality of reagent support trays has a height from the bottom edge of the support surface to the top edge of the sidewall, at least two reagent support trays of the plurality of reagent support trays have different heights, and a reagent support tray located at the bottom of a stack of reagent support trays has a first height that is greater than a second height of a reagent support tray located at the top of the stack or reagent support trays; the plurality of reagent support trays are configured to be vertically stackable within the interior volume to form a stack of reagent support trays, and one or more of the plurality of reagent support trays are configured to redirect a gas flow traveling between two or more adjacent reagent support trays of the stack of reagent support trays so that the gas flow interacts with the source reagent material in a particular reagent support tray of the plurality of reagent support trays before traveling into a next reagent support tray of the plurality of reagent support trays of the stack of reagent support trays; each of the plurality of reagent support trays includes at least one partition extending only partially across the support surface from a sidewall toward a center a length less than a length of a radius of the support surface, the at least one partition having a lower end extending a first distance below the lower edge and an upper end; and at least one channel extending through the at least one partition between the lower end and the upper end, wherein gas below the lower edge is circulated away from the lower edge to reach the at least one channel at the lower end of the at least one partition; A particle suppression device is provided for suppressing particles of a predetermined size that may be produced by a source reagent material, the particle suppression device including a housing configured to be positioned between one or more reagent support trays and an outlet port of a vaporizer vessel, the housing supporting a plurality of parallel filters positioned in a spaced relationship within the housing; the at least one partition is generally hollow such that the at least one channel includes a slot extending through the at least one partition; At least one reagent support tray of the plurality of reagent support trays includes at least one partition having non-parallel opposing sides in a plane defined by the support surface.

2. The system of claim 1 , wherein the sidewall generally surrounds an outer periphery of the support surface, and the sidewall is configured to closely engage the one or more inner walls along the outer periphery of the support surface.

3. 2. The system of claim 1, wherein the plurality of reagent support trays include a support tray and a lower support tray, and the at least one partition of the lower support tray is configured to be offset relative to the at least one partition of the support tray so that when the lower support tray is stacked vertically below the support tray, gas flow below the lower edge of the lower support tray through the at least one channel of the at least one partition of the lower support tray does not flow linearly into the at least one channel of the at least one partition of the support tray.

4. The system of claim 1 , wherein at least one reagent support tray of the plurality of reagent support trays includes at least one divider extending at least partially across the support surface.

5. 2. The system of claim 1, wherein at least one reagent support tray of the plurality of reagent support trays includes at least one partition having generally parallel, opposing sides in a plane defined by the support surface.

6. 2. The system of claim 1, wherein each of the plurality of reagent support trays includes an opening configured to allow a tube to extend through the at least one partition and the support surface, the tube configured to flow carrier gas from an upper portion of the vaporizer vessel to a lower portion of the internal volume of the vaporizer vessel or from a lower portion of the internal volume of the vaporizer vessel to an upper portion of the vaporizer vessel.

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