Remote plasma architecture for true radical processing

JP7743509B2Active Publication Date: 2025-09-24LAM RES CORP
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Patent Information

Application Number
JP2023518344
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-09-28
Filing Date
2021-09-21
Publication Date
2025-09-24
Estimated Expiration
2041-09-21

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Abstract

The showerhead includes first, second, and third components. The first component includes a disk-shaped portion and a cylindrical portion extending perpendicularly from the disk-shaped portion. The disk-shaped portion includes first and second sets of holes having first and second diameters, respectively, extending from the center of the disk-shaped portion to the inner diameter of the cylindrical portion. The second component is disk-shaped and attached to the disk-shaped portion of the first component. The second component defines a plenum in fluid communication with the second set of holes and includes a pair of arc-shaped grooves at opposite ends of the top surface along the periphery and a plurality of grooves extending between the pair of arc-shaped grooves. The third component is disk-shaped and attached to the second component. The third component includes a gas inlet connected to the plenum and a fluid inlet and outlet connected to the arc-shaped grooves.
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Citation Information

Patent Citations

  • Multi-plenum showerhead with temperature control function

    JP2014220231A

  • Integrated showerhead with temperature control to deliver radical and precursor gases to a downstream chamber to enable remote plasma film deposition

    JP2020502793A