Design device, design method and program

The design device addresses the challenge of iris thickness in sub-terahertz bandpass filters by calculating iris width or thickness, enhancing filter design precision and bandwidth.

JP7750422B2Active Publication Date: 2025-10-07NIPPON TELEGRAPH & TELEPHONE CORP
View PDF 3 Cites 0 Cited by

Patent Information

Application Number
JP2024541357
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-08-18
Publication Date
2025-10-07
Estimated Expiration
2042-08-18

AI Technical Summary

Technical Problem

Conventional bandpass filter design methods fail to account for the significant iris thickness in the sub-terahertz band, leading to degraded bandwidth characteristics and difficulty in designing filters with arbitrary thickness due to reliance on processing accuracy.

Method used

A design device that includes a unit to acquire design parameters and calculate iris width or thickness, considering the iris thickness to optimize filter characteristics.

Benefits of technology

Enables precise design of bandpass filters by accounting for iris thickness, improving bandwidth characteristics and allowing for arbitrary thickness considerations.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 0007750422000006
    Figure 0007750422000006
  • Figure 0007750422000007
    Figure 0007750422000007
  • Figure 0007750422000008
    Figure 0007750422000008
Patent Text Reader

Abstract

Provided is a design device for designing a bandpass filter including an iris and a cavity resonator. The design device includes: a design parameter information acquisition unit configured to acquire information indicating design parameters including the thickness of the iris; and an iris width calculation unit configured to calculate a width of the iris on the basis of design parameters including the thickness of the iris.
Need to check novelty before this filing date? Find Prior Art

Description

[Technical Field]

[0001] The present invention relates to a design apparatus, a design method, and a program. [Background technology]

[0002] Methods for designing bandpass filters have been studied. For example, Patent Document 1 discloses a technology for assisting design by inputting required specifications of a bandpass filter, virtually configuring a bandpass filter in which resonators that satisfy the required specifications are connected in multiple stages between the input and output ends, and simulating the characteristics of the bandpass filter. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2007-072590 Summary of the Invention [Problem to be solved by the invention]

[0004] When designing a wideband iris-coupled waveguide bandpass filter with a passband of tens of GHz or more in the sub-terahertz band, an iris thickness of 100 μm or more is required to ensure precision in the cutting process. Although the iris thickness affects the iris coupling reactance, in the low-frequency bands used in conventional technology, it is sufficiently small relative to the wavelength, allowing the design to be performed with the thickness assumed to be zero. However, in the sub-terahertz band, the iris thickness becomes significant relative to the wavelength, causing degradation of the bandwidth characteristics. Therefore, the design must take into account the change in reactance due to iris thickness. Furthermore, because the iris thickness is determined by the processing accuracy of the waveguide, it is necessary to be able to calculate the reactance value at any thickness. Conventional design methods require that the iris thickness be determined in advance and then the overall parameters be analyzed each time to determine the filter characteristics, making it difficult to design a filter with an arbitrary thickness.

[0005] The disclosed technology aims to realize a bandpass filter design that takes into account the thickness of the iris. [Means for solving the problem]

[0006] The disclosed technology is a design device for designing a bandpass filter including an iris and a cavity resonator, the design device including: a design parameter information acquisition unit configured to acquire information indicating design parameters including a thickness of the iris; and an iris width calculation unit configured to calculate a width of the iris based on the design parameters including the thickness of the iris. [Effects of the Invention]

[0007] It is possible to design a bandpass filter that takes into account the thickness of the iris. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 1 is a diagram illustrating an example of a functional configuration of a design apparatus according to a first embodiment of the present invention. [Figure 2] FIG. 10 is a diagram illustrating an example of a band-pass filter. [Figure 3] FIG. 10 is a diagram for explaining design parameters of a bandpass filter. [Figure 4] 1 is a flowchart showing an example of the flow of a design process according to Example 1 of an embodiment of the present invention. [Figure 5] 10 is a flowchart showing an example of the flow of an iris width calculation process according to Example 1 of the embodiment of the present invention. [Figure 6] FIG. 10 is a diagram illustrating an example of a functional configuration of a design apparatus according to Example 2 of an embodiment of the present invention. [Figure 7] 10 is a flowchart showing an example of the flow of a design process according to Example 2 of the embodiment of the present invention. [Figure 8] FIG. 2 illustrates an example of a hardware configuration of a computer. DETAILED DESCRIPTION OF THE INVENTION

[0009] Hereinafter, an embodiment of the present invention (the present embodiment) will be described with reference to the drawings. The embodiment described below is merely an example, and the embodiment to which the present invention is applied is not limited to the following embodiment.

[0010] (Outline of this embodiment) In this embodiment, a method will be described in which a design device for designing a bandpass filter designs the width of an iris in consideration of the thickness of the iris provided in the bandpass filter.

[0011] Hereinafter, examples 1 and 2 will be described as specific examples of this embodiment.

[0012] Example 1 In this embodiment, an example will be described in which the width of the iris is calculated based on parameters including the thickness of the iris.

[0013] 1 is a diagram illustrating an example of a functional configuration of a design apparatus according to a first embodiment of the present invention. The design apparatus 10 includes a design parameter information acquisition unit 11, an iris width calculation unit 12, and an iris width output unit 13.

[0014] The design parameter information acquisition unit 11 acquires information indicating design parameters of the bandpass filter. The design parameters include, for example, the waveguide long side a, the lower cutoff wavelength λ, and the like. g1 , upper cutoff wavelength λ g2 , order n, passband ripple r, iris thickness T, etc.

[0015] The iris width calculation unit 12 calculates the optimum iris width d based on the design parameters. Here, the iris width calculation unit 12 calculates the reactance, which indicates the characteristics of the bandpass filter, taking into account the iris thickness T, and calculates the iris width d taking into account the influence on the reactance. A specific calculation method will be described later.

[0016] The iris width output unit 13 outputs information indicating the calculated iris width d. For example, the iris width output unit 13 may display the information indicating the iris width d on a display or the like, or may transmit the information indicating the iris width d to another device (for example, a device for manufacturing a bandpass filter) via a communication line or the like.

[0017] Next, the bandpass filter to be designed will be described with reference to the drawings.

[0018] Fig. 2 shows an example of a bandpass filter. The bandpass filter 1 to be designed is an iris-coupled waveguide bandpass filter having a configuration in which multiple irises 2 and multiple cavity resonators 3 are alternately arranged on both sides in the longitudinal direction (the direction in which signals pass during use).

[0019] The filter characteristics of the bandpass filter 1 are determined by the length of the cavity resonator and the window width (the aforementioned iris width d) of the iris 2. Furthermore, the influence of the thickness of the iris 2 on the reactance, which indicates the filter characteristics, cannot be ignored relative to the wavelength in the sub-terahertz band.

[0020] FIG. 3 is a diagram for explaining the design parameters of the bandpass filter. T is the thickness of the iris 2 (iris thickness). d i is the window width (iris width) of the iris 2 (the i-th iris 2 among the irises 2 from 0 to n). The window of the iris 2 is the gap between the two irises 2 arranged on both sides, and corresponds to the area through which a signal passes when the bandpass filter 1 is in use.

[0021] a is the width of the bandpass filter 1 (the length in the Y direction when the longitudinal direction is defined as X). b is the height of the bandpass filter 1 (the length in the Z direction when the longitudinal direction is defined as X). i is the length (length in the X direction when the longitudinal direction is defined as X) of the cavity resonator 3 (the i-th cavity resonator 3 among the cavity resonators 3 from 0 to n).

[0022] As the iris thickness T increases, the reactance decreases, which reduces the passband width of the bandpass filter 1. In other words, the larger the iris thickness T, the greater the deviation from the theoretical value that does not take the value of T into account, and the reactance decreases. This is because the increase in the distance passing through the window of the iris 2 increases the effect of reducing the reactance. Therefore, the larger the value of T, the more attenuation correction is required from the theoretical value that does not take the value of T into account. Also, the smaller the d / a, the greater the deviation from the theoretical value, and the reactance decreases. This is because the electric field component reflected by the iris window increases, which acts to reduce the reactance.

[0023] Next, the operation of the design device 10 according to this embodiment will be described with reference to the drawings.

[0024] 4 is a flowchart showing an example of the flow of design processing according to Example 1 of the embodiment of the present invention. The design parameter information acquisition unit 11 acquires design parameter information (step S101). For example, the design parameter information acquisition unit 11 acquires the waveguide long side a, the lower cutoff wavelength λ, etc., by an input operation from a user or by receiving information from another device. g1 , upper cutoff wavelength λ g2 , order n, passband ripple r, iris thickness T, and other design parameter information are obtained.

[0025] Next, the iris width calculation unit 12 calculates the iris width d (step S102). The iris width d is, for example, the widths d0, d1, . . . , d of the iris 2 from 0 to n. n The process of step S102 will be described in detail later.

[0026] Next, the iris width output unit 13 outputs information indicating the calculated iris width d (step S103).

[0027] 5 is a flowchart showing an example of the flow of an iris width calculation process according to Example 1 of the embodiment of the present invention. In step S102 of the design process, the iris width calculation unit 12 executes the iris width calculation process. The iris width calculation unit 12 initializes a variable i to i=0 (step S201). Next, the iris width calculation unit 12 determines whether the variable i is equal to or less than the order n (step S202).

[0028] When the iris width calculation unit 12 determines that the variable i is equal to or smaller than the degree n (step S202: YES), it calculates K i,i+1 / Z0 is calculated (step S203).

[0029]

number

[0030]

number

[0031]

number

[0032] Next, the iris width calculation unit 12 calculates Z i,i+1 / Z0 is calculated (step S204).

[0033]

number

[0034] Next, the iris width calculation unit 12 substitutes the calculated value into equation (4) to obtain the iris width d i is calculated (step S205).

[0035]

number

[0036] Then, the iris width calculation unit 12 increments the variable i (i=i+1) (step S206), and returns to the processing of step S202.

[0037] If the iris width calculation unit 12 determines in the process of step S202 that the variable i is not equal to or less than the degree n (step S202: NO), it ends this iris width calculation process.

[0038] In step S205 of the iris width calculation process, the iris width calculation unit 12 may calculate β shown in equation (4) by an approximation formula using the wavelength λ. For example, the approximation formula may be an approximation formula that approximates β by a quadratic expression of λ, or may be an approximation formula derived by analysis using electromagnetic field simulation.

[0039] According to the design device 10 of this embodiment, the width of the iris is calculated based on parameters including the thickness of the iris, thereby enabling the design of a bandpass filter that takes the thickness of the iris into consideration.

[0040] Example 2 A second embodiment will be described below with reference to the drawings. The second embodiment differs from the first embodiment in that the thickness of the iris is calculated based on the width of the iris. Therefore, the following description of the second embodiment will focus on the differences from the first embodiment, and components having the same functional configuration as the first embodiment will be assigned the same reference numerals as those used in the description of the first embodiment, and descriptions thereof will be omitted.

[0041] 6 is a diagram illustrating an example of the functional configuration of a design device according to Example 2 of an embodiment of the present invention. The design device 10 according to this example has a configuration in which an iris thickness calculation unit 14 and an iris thickness output unit 15 are added to the design device 10 according to Example 1.

[0042] The iris thickness calculation unit 14 calculates the iris thickness based on the given iris width. For example, the iris thickness calculation unit 14 calculates the width d0, d1, . . . , d of each iris 2 from 0 to n. n Given, calculate the optimal iris thickness T using equation (4).

[0043] Iris thickness output unit 15 outputs information indicating the calculated iris thickness T. Iris thickness output unit 15 may, for example, display the information indicating the iris thickness T on a display or the like, or may transmit the information indicating the iris thickness T to another device (for example, a device for manufacturing a bandpass filter) via a communication line or the like.

[0044] Next, the operation of the design device 10 according to this embodiment will be described with reference to the drawings.

[0045] 7 is a flowchart showing an example of the flow of design processing according to Example 2 of the embodiment of the present invention. The design parameter information acquisition unit 11 acquires design parameter information (step S301). For example, the design parameter information acquisition unit 11 acquires the waveguide long side a, the lower cutoff wavelength λ, etc., by an input operation from a user or by receiving information from another device. g1 , upper cutoff wavelength λ g2 , order n, passband ripple r, iris width d (widths of each iris 2 from 0 to n, d0, d1, . . . , d n ) and other design parameter information.

[0046] Next, the iris thickness calculation unit 14 calculates the iris thickness T (step S302). Here, the iris thickness calculation unit 14 may calculate the iris thickness T by performing a process that is the reverse of the iris width calculation process shown in FIG.

[0047] Here, iris thickness calculation unit 14 may calculate β shown in equation (4) using an approximation formula using wavelength λ. For example, the approximation formula may be an approximation formula that approximates β with a quadratic expression of λ, or may be an approximation formula derived by analysis using electromagnetic field simulation.

[0048] Next, the iris thickness output unit 15 outputs information indicating the calculated iris thickness T (step S303).

[0049] According to the design device 10 of this embodiment, the iris thickness is calculated based on the iris width. This makes it possible to know the iris thickness for deriving the desired iris width, thereby enabling the design of a bandpass filter that takes the iris thickness into consideration.

[0050] Furthermore, it is also possible to combine the above-described Example 1 and Example 2. For example, the design device 10 can narrow down candidates for appropriate iris thickness and width by appropriately and repeatedly calculating an iris width based on a provisionally set iris thickness and calculating an iris thickness based on a provisionally set iris thickness.

[0051] <Hardware configuration> Finally, a description will be given of the hardware configuration of the design apparatus 10 according to this embodiment. The design apparatus 10 according to this embodiment is realized, for example, by the hardware configuration of a computer 500 shown in FIG.

[0052] 8 includes an input device 501, a display device 502, an external I / F 503, a communication I / F 504, a processor 505, and a memory device 506. Each of these pieces of hardware is connected to each other via a bus 507 so as to be able to communicate with each other.

[0053] The input device 501 is, for example, a keyboard, a mouse, a touch panel, etc. The display device 502 is, for example, a display, etc. Note that the computer 500 does not necessarily have to have at least one of the input device 501 and the display device 502.

[0054] The external I / F 503 is an interface with an external device such as a recording medium 503a. Examples of the recording medium 503a include a CD (Compact Disc), a DVD (Digital Versatile Disk), an SD memory card (Secure Digital memory card), and a USB (Universal Serial Bus) memory card.

[0055] The communication I / F 504 is an interface for performing data communication with other devices, equipment, systems, etc. The processor 505 is, for example, various types of arithmetic devices such as a CPU, etc. The memory device 506 is, for example, various types of storage devices such as an HDD, SSD, RAM (Random Access Memory), ROM (Read Only Memory), flash memory, etc.

[0056] The design apparatus 10 according to this embodiment can realize the various processes described above by having the hardware configuration of the computer 500 shown in Fig. 8. Note that the hardware configuration of the computer 500 shown in Fig. 8 is an example, and the computer 500 may have other hardware configurations. For example, the computer 500 may have multiple processors 505 or multiple memory devices 506.

[0057] The design device 10 according to this embodiment is realized by reading a program for causing the computer 500 to execute each of the above-described processes and executing the processes defined in the program. The program may be recorded on a recording medium 503a or the like, or may be provided via a network.

[0058] (Summary of the embodiment) This specification describes at least the design apparatus, design method, and program described in the following sections. (Section 1) A design device for designing a bandpass filter including an iris and a cavity resonator, comprising: a design parameter information acquisition unit configured to acquire information indicating design parameters including a thickness of the iris; an iris width calculation unit configured to calculate a width of the iris based on design parameters including a thickness of the iris. Design equipment. (Section 2) the iris width calculation unit is configured to calculate the width of the iris by using a derivation formula of reactance indicating a characteristic of the band-pass filter based on a thickness of the iris. 1. The design device according to claim 1. (Section 3) the iris width calculation unit is configured to calculate the width of the iris by approximating a parameter included in a derivation formula of the reactance based on a predetermined approximation formula. 3. The design device according to claim 2. (Section 4) the design parameter information acquisition unit is configured to acquire information indicating design parameters including a thickness of the iris; an iris thickness calculation unit configured to calculate a thickness of the iris based on design parameters including a width of the iris; A design device according to any one of items 1 to 3. (Section 5) A design method executed by a design device for designing a bandpass filter including an iris and a cavity resonator, comprising: obtaining information indicative of design parameters including a thickness of the iris; and calculating a width of the iris based on design parameters including a thickness of the iris. Design method. (Section 6) A program for causing a computer to function as each part of the design device described in any one of paragraphs 1 to 4.

[0059] Although the present embodiment has been described above, the present invention is not limited to such a specific embodiment, and various modifications and changes are possible within the scope of the gist of the present invention described in the claims. [Explanation of symbols]

[0060] 10 Design equipment 11 Design parameter information acquisition unit 12 Iris width calculation section 13 Iris width output section 14 Iris thickness calculation unit 15 Iris Thickness Output Section 500 computers 501 Input Device 502 Display device 503 External I / F 503a Recording media 504 Communication I / F 505 processor 506 Memory Device 507 Bus

Claims

1. A design device for designing a bandpass filter including an iris and a cavity resonator, comprising: a design parameter information acquisition unit configured to acquire information indicating design parameters including a thickness of the iris; an iris width calculation unit configured to calculate a width of the iris based on design parameters including a thickness of the iris. Design equipment.

2. the iris width calculation unit is configured to calculate the width of the iris by using a derivation formula of reactance indicating a characteristic of the band-pass filter based on a thickness of the iris. The design device according to claim 1 .

3. the iris width calculation unit is configured to calculate the width of the iris by approximating a parameter included in a derivation formula of the reactance based on a predetermined approximation formula. The design device according to claim 2 .

4. the design parameter information acquisition unit is configured to acquire information indicating design parameters including a thickness of the iris; further comprising an iris thickness calculation unit configured to calculate a thickness of the iris based on design parameters including a width of the iris. The design device according to claim 1 .

5. A design method executed by a design device for designing a bandpass filter including an iris and a cavity resonator, comprising: obtaining information indicative of design parameters including a thickness of the iris; and calculating a width of the iris based on design parameters including a thickness of the iris. Design method.

6. A program for causing a computer to function as each unit in the design apparatus according to any one of claims 1 to 4.

Citation Information

Patent Citations

  • Bandpass filter design support system, method for designing bandpass filter, and bandpass filter design support program

    JP2007072590A

  • Inductive iris coupled waveguide filter

    JP2016184831A

  • Method of designing band-pass filter

    JP2018006824A