Acid generator, resist composition, and method for producing resist pattern

The salt represented by formula (I) in the acid generator improves CD uniformity in resist patterns by forming a resist composition that enhances pattern uniformity during semiconductor microfabrication.

JP7758475B2Active Publication Date: 2025-10-22SUMITOMO CHEM CO LTD
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Patent Information

Application Number
JP2021074428
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-05-15
Filing Date
2021-04-26
Publication Date
2025-10-22
Estimated Expiration
2041-04-26

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Abstract

To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [In the formula, R1 and R2 each independently represent an iodine atom, a fluorine atom or the like; R4, R5, R7 and R8 each independently represent a halogen atom, a hydroxy group, a C1-12 haloalkyl group or a C1-12 alkyl group, provided that -CH2- contained in the haloalkyl group and the alkyl group may be substituted with -O-, -CO- or the like; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1-5, m2 and m8 each represent an integer of 0-5, and m4, m5 and m7 each represent an integer of 0-4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; and AI- represents an organic anion.]SELECTED DRAWING: None
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Citation Information

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