Spatial light modulation device, processing device, and position estimation method

Abstract

To provide a spatial light modulation device capable of easily estimating an incident position of light on a spatial light modulation portion.SOLUTION: In a spatial light modulation device 10, a detection portion 7 detects light modulated in a spatial light modulation portion 3. An estimation portion 35 estimates an incident position P2 of light on the spatial light modulation portion 3 on the basis of a detection result in the detection portion 7. A phase pattern P1 set by a pattern setting portion 31 includes a phase pattern so as to form, in the detection portion 7, a plurality of light collection spots by light modulated in the phase pattern P1. The detection portion 7 detects intensity information of the light collection spots. The estimation portion 35 estimates the incident position P2 of the light on the spatial light modulation portion 3 on the basis of a comparison result of the intensity information of the plurality of light collection spots detected in the detection portion 7.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a spatial light modulation device, a processing device, and a position estimation method. [Background technology]

[0002] A processing device that processes a workpiece by irradiating it with light is known (see, for example, Non-Patent Document 1). The processing device modulates light using a phase pattern and processes the workpiece by irradiating the workpiece with the modulated light. [Prior art documents] [Non-patent literature]

[0003] [Non-Patent Document 1] Haruyasu Ito, Satoshi Hasegawa, Yoshio Hayasaki, Haruyoshi Toyoda, "Holographic laser processing using spatial light phase modulator", Laser Research, Vol. 43, No. 4, pp. 227-232 [Non-patent document 2] “Binary phase masks for easysystem alignment and basic aberration sensing with spatial light modulators inSTED microscopy”, SCIENTIFIC REPORTS 7, Article number:15699 (2017) Summary of the Invention [Problem to be solved by the invention]

[0004] The processing device modulates light in a spatial light modulation unit that displays a phase pattern. The spatial light modulation unit includes, for example, a spatial light modulator (SLM). The light is modulated by the phase pattern formed by the SLM. For example, the modulated light is irradiated onto a workpiece by a computer-generated hologram (CGH) formed in the SLM. In such a configuration, a problem has arisen in that the light incident on the phase pattern is misaligned with respect to the phase pattern.

[0005] In Non-Patent Document 1, an image formed by a CGH is captured and observed by an imaging device in order to adjust a phase pattern displayed on a spatial light modulation unit. This imaging device captures a far-field pattern (FFP) of light modulated by the phase pattern. In this configuration, it is possible to determine whether an image is formed by the CGH displayed on the spatial light modulation unit, but it is difficult to identify the incident position of the light relative to the spatial light modulation unit. Therefore, when the incident light on the phase pattern is misaligned with the phase pattern, it is difficult to adjust the positional relationship between the incident light on the phase pattern and the phase pattern.

[0006] Non-Patent Document 2 describes that a point spread function is shaped as an FFP by a spatial light modulation unit, and an image of the shaped point spread function is observed. With this configuration, even if aberrations caused by misalignment of the optical system or the like can be identified, it is difficult to identify the incident position of light on the spatial light modulation unit.

[0007] It is also conceivable to capture the NFP (Near Field Pattern) of incident light on a phase pattern using an imaging device and observe the movement of the NFP in the captured image. The NFP in the captured image moves relatively together with the incident light to the spatial light modulation unit. Therefore, if the field of view of the captured image and the position of the spatial light modulation unit are strictly correlated, the incident position of the incident light to the spatial light modulation unit can also be identified according to the position of the NFP in the captured image. However, external factors such as vibration or changes in environmental temperature can cause a deviation between the field of view of the captured image and the position of the spatial light modulation unit. Therefore, in order to estimate the incident position of the incident light to the spatial light modulation unit from the captured image of the NFP, calibration of the field of view of the captured image and the position of the spatial light modulation unit is required.

[0008] An object of each aspect of the present invention is to provide a spatial light modulation device, a processing device, and a position estimation method that can easily estimate the incident position of light on a spatial light modulation unit. [Means for solving the problem]

[0009] A spatial light modulation device according to one aspect of the present invention includes a spatial light modulation unit, a pattern setting unit, a detection unit, and an estimation unit. The spatial light modulation unit displays a phase pattern that modulates incident light and modulates the light using the phase pattern. The pattern setting unit sets the phase pattern to be displayed on the spatial light modulation unit. The detection unit detects light modulated by the spatial light modulation unit. The estimation unit estimates the incident position of the light relative to the spatial light modulation unit based on the detection result by the detection unit. The phase pattern set by the pattern setting unit includes a phase pattern configured to form multiple focused spots on the detection unit using light modulated by the phase pattern. The detection unit detects intensity information of the focused spots. The estimation unit estimates the incident position of the light relative to the spatial light modulation unit based on the comparison result of the intensity information of the multiple focused spots detected by the detection unit.

[0010] In one aspect, the phase pattern set by the pattern setting unit includes a phase pattern configured to form multiple focused spots on the detection unit using light modulated by the spatial light modulation unit. The estimation unit estimates the incident position of light with respect to the spatial light modulation unit based on a comparison result of intensity information of the multiple focused spots. The inventors of the present application have found that the incident position of light in the phase pattern can be easily estimated based on the comparison result of intensity information of the multiple focused spots. With this configuration, the incident position of light with respect to the spatial light modulation unit can be easily estimated.

[0011] In one aspect, the estimation unit may estimate the incident position of the light with respect to the spatial light modulation unit based on a positional relationship between the phase pattern and the incident light with respect to the phase pattern, where the intensities of at least two of the plurality of light-focusing spots are equal to each other. In this case, the incident position of the light with respect to the spatial light modulation unit can be estimated more accurately.

[0012] In one aspect, the estimation unit may estimate the incident position of light with respect to the spatial light modulation unit based on a comparison result of intensity information of a pair of focused spots formed by light incident on a pair of adjacent regions in a first direction in the phase pattern and a comparison result of intensity information of a pair of focused spots formed by light incident on a pair of adjacent regions in a second direction in the phase pattern. The second direction intersects with the first direction. In this case, the incident position of light with respect to the spatial light modulation unit can be estimated in both the first direction and the second direction. As a result, the incident position of light with respect to the spatial light modulation unit can be estimated more accurately.

[0013] In one of the above aspects, the spatial light modulation device may further include a position adjustment unit. The position adjustment unit may adjust the positional relationship between the incident light on the phase pattern and the phase pattern based on intensity information of the focused spots. The detection unit may further detect intensity information of multiple focused spots after the positional relationship has been adjusted by the position adjustment unit. The estimation unit may estimate the incident position of the light with respect to the spatial light modulation unit based on a comparison result of the intensity information of the multiple focused spots detected after the positional relationship has been adjusted. In this case, the positional relationship between the incident light on the phase pattern and the phase pattern can be further adjusted using the intensity information after the positional relationship between the incident light on the phase pattern and the phase pattern has been adjusted. Therefore, the positional relationship between the incident light on the phase pattern and the phase pattern can be adjusted more easily and accurately.

[0014] In the above-described aspect, the position adjustment unit may perform at least one of changing the phase pattern displayed on the spatial light modulation unit and changing the optical axis position of the light incident on the phase pattern in adjusting the positional relationship. In this case, the positional relationship between the light incident on the phase pattern and the phase pattern can be adjusted more easily.

[0015] In one of the above aspects, the optical system may further include a position adjustment unit that adjusts the positional relationship between the light incident on the phase pattern and the phase pattern based on intensity information of the focused spot. In adjusting the positional relationship, the position adjustment unit may perform at least one of changing the phase pattern displayed on the spatial light modulation unit and changing the optical axis position of the light incident on the phase pattern. In this case, the positional relationship between the light incident on the phase pattern and the phase pattern can be more easily adjusted.

[0016] In one aspect, the position adjustment unit may adjust the positional relationship based on intensity information of the plurality of focused spots so that the value of the intensity ratio of the plurality of focused spots approaches 1. In this case, the incident position of light with respect to the spatial light modulation unit can be estimated more easily and accurately.

[0017] In one aspect, the pattern setting unit may set a plurality of phase patterns having different configurations as phase patterns configured to form a plurality of focused spots on the detection unit. The spatial light modulation unit may sequentially display the plurality of phase patterns. The estimation unit may estimate the incident position of light on the spatial light modulation unit based on intensity information of the focused spots formed by each of the plurality of phase patterns. In this case, the positional relationship between the incident light on the phase pattern and the phase pattern can be adjusted more easily and accurately.

[0018] In one of the above aspects, each of the multiple phase patterns may include multiple types of subpatterns. The multiple types of subpatterns are located in different regions of the phase pattern and form different focused spots. The multiple phase patterns may have different arrangements of the regions in which the multiple types of subpatterns are located. In this case, the intensity information of each focused spot may differ for each phase pattern. This makes it easier to estimate the incident position of incident light in the phase pattern. This makes it even easier to estimate the incident position of light in the spatial light modulation unit.

[0019] In one aspect described above, the detection unit may include an imaging device that acquires a captured image of the light-focusing spots formed in the imaging region. The captured image may include intensity information and position information of the light-focusing spots. The estimation unit may estimate the incident position of light in the spatial light modulation unit based on the intensity information and position information of the light-focusing spots included in the captured image. In this case, the intensity information of the light-focusing spots can be easily classified based on the position information of the light-focusing spots in the captured image. Therefore, the incident position of the incident light in the phase pattern can be more easily estimated.

[0020] According to another aspect of the present invention, a processing apparatus includes the spatial light modulator described above and a processing unit. The processing unit irradiates a workpiece with light modulated by the spatial light modulator. In this case, deviation between the light incident on the phase pattern and the phase pattern can be suppressed by estimating the incident position of the light on the spatial light modulator. According to this processing apparatus, the light modulated by the spatial light modulator is guided not only to the detection unit but also to the workpiece, so that the workpiece can be processed more accurately with the light modulated by the phase pattern.

[0021] In the above-described another aspect, the pattern setting unit may set at least one of a phase pattern for incident position estimation and a phase pattern for machining as the phase pattern to be displayed on the spatial light modulation unit. The phase pattern for incident position estimation is used to estimate the incident position. The phase pattern for machining is used to machine the workpiece by the machining unit. In this case, after the incident position of light with respect to the spatial light modulation unit is estimated by the phase pattern for incident position estimation, the workpiece can be machined by the phase pattern for machining. Therefore, the workpiece can be machined in a state in which a deviation between the light incident on the phase pattern for machining and the phase pattern for machining is suppressed.

[0022] A position estimation method according to yet another aspect of the present invention includes displaying a phase pattern in a spatial light modulation unit that modulates incident light and irradiating light onto the phase pattern. The phase pattern is configured to form multiple focused spots in response to the incident light. The phase estimation method further includes detecting intensity information of the multiple focused spots formed by the incident light, comparing the detected intensity information of the multiple focused spots, and estimating the incident position of the light relative to the spatial light modulation unit. The incident position of the light relative to the spatial light modulation unit is estimated based on the comparison result of the intensity information of the multiple focused spots.

[0023] In the above-described another aspect, the phase pattern is configured to form a plurality of focused spots in response to the incidence of light. The position of incidence of light with respect to the spatial light modulation unit is estimated based on a comparison result of intensity information of the plurality of focused spots. The position of incidence of light in the phase pattern can be easily estimated based on the comparison result of intensity information of the plurality of focused spots. Therefore, the position of incidence of light with respect to the spatial light modulation unit can be easily estimated. [Effects of the Invention]

[0024] The aspects of the present invention can provide a spatial light modulation device, a processing device, and a position estimation method that can easily estimate the incident position of light on a spatial light modulation unit. [Brief explanation of the drawings]

[0025] [Figure 1] FIG. 1 is a schematic diagram illustrating an example of a processing device according to an embodiment. [Figure 2] FIG. 10 is a plan view showing an example of a phase pattern for processing. [Figure 3] 1A is a plan view showing an example of a phase pattern for estimating an incident position, and FIG. 1B is a diagram showing an image captured by an intensity detection unit. [Figure 4] 1A is a plan view showing an example of a phase pattern for estimating an incident position, and FIG. 1B is a diagram showing an image captured by an intensity detection unit. [Figure 5] 10(a) and 10(b) are diagrams for explaining an example of changing the positional relationship between the light incident on the phase pattern and the phase pattern. FIG. [Figure 6] 10A to 10E are diagrams showing the relationship between the phase pattern for estimating the incident position and the focused spot. [Figure 7] 10 is a flowchart illustrating a location estimation process. [Figure 8] 10 is a flowchart illustrating a location estimation process. [Figure 9] 10(a) and 10(b) are graphs plotting the comparison results of the intensity information of the focused spot for each phase pattern for estimating the incident position. [Figure 10] 10 is a flowchart illustrating a position estimation process in a modified example of the present embodiment. [Figure 11] 10 is a flowchart illustrating a position estimation process in yet another modified example of the present embodiment. [Figure 12] 10A and 10B are diagrams showing the relationship between a phase pattern for estimating an incident position and a focused spot in a modified example of this embodiment. [Figure 13] FIG. 10 is a diagram showing the relationship between a phase pattern for estimating an incident position and a focused spot in yet another modified example of the present embodiment. [Figure 14] 10A to 10D are diagrams for explaining the shift of the focused spot according to the shift of the intensity detection unit. DETAILED DESCRIPTION OF THE INVENTION

[0026] Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the description, the same elements or elements having the same functions will be denoted by the same reference numerals, and redundant description will be omitted.

[0027] First, the configuration of a processing device according to this embodiment will be described with reference to Fig. 1. Fig. 1 is a schematic perspective view showing an example of a processing device according to this embodiment.

[0028] The processing device 1 irradiates a workpiece S with light L and processes the workpiece S into a desired shape. The light L irradiated onto the workpiece S is, for example, laser light. The processing device 1 includes an optical system. In FIG. 1, the light L guided by the optical system is indicated by a dashed line. The processing device 1 makes the light L incident on a phase pattern and irradiates the workpiece S with the light L modulated by the phase pattern.

[0029] The processing apparatus 1 includes an optical axis adjustment unit 2, a spatial light modulation unit 3, an image transfer unit 4, a processing unit 5, a monitor unit 6, a detection unit 7, and a control unit 9. The processing apparatus 1 may further include a light source (not shown). The light source is, for example, a laser. The processing apparatus 1 displays a phase pattern P1 in the spatial light modulation unit 3 and processes the workpiece S with light L modulated by the phase pattern P1 of the spatial light modulation unit 3. The processing apparatus 1 includes a spatial light modulation device 10 that estimates the incident position P2 of the light L relative to the spatial light modulation unit 3. "Estimating the incident position of the light L relative to the spatial light modulation unit" means at least one of estimating the incident position P2 of the light L already incident on the spatial light modulation unit 3 and estimating an appropriate incident position P2 on the spatial light modulation unit 3. The spatial light modulation device 10 includes at least the spatial light modulation unit 3, the detection unit 7, and the control unit 9. The spatial light modulator 10 may further include an optical axis adjustment unit 2, an image transfer unit 4, and a monitor unit 6.

[0030] The optical axis adjustment unit 2 guides the light L incident from the light source to the spatial light modulation unit 3. The optical axis adjustment unit 2 includes, for example, lenses 11 and 12. For example, the light L incident from the light source is guided to the spatial light modulation unit 3 via the lenses 11 and 12. The optical axis adjustment unit 2 adjusts the optical axis of the light L emitted from the lenses 11 and 12 by changing at least one of the positions and attitudes of the lenses 11 and 12. By adjusting the optical axis of the light L emitted from the lenses 11 and 12, the optical axis adjustment unit 2 changes the incident position P2 at which the light L enters the spatial light modulation unit 3.

[0031] The spatial light modulation unit 3 modulates and emits the incident light L. The spatial light modulation unit 3 displays a phase pattern P1 that modulates the incident light L. The spatial light modulation unit 3 includes a display unit 13 that displays the phase pattern P1. The spatial light modulation unit 3 modulates the incident light L using the phase pattern P1. The spatial light modulation unit 3 includes, for example, a spatial light modulator (SLM). In this case, the display unit 13 is configured with a plurality of pixels. Therefore, the phase pattern P1 is configured with a plurality of pixels. The phase pattern P1, for example, diffracts the light L incident on the phase pattern P1. The light L incident on the phase pattern P1 displayed on the spatial light modulation unit 3 is modulated according to the configuration of the phase pattern P1. The spatial light modulation unit 3 sequentially displays a plurality of mutually different phase patterns P1 in accordance with a control signal input from the control unit 9.

[0032] The spatial light modulation unit 3 displays, as the phase pattern P1, at least one of a phase pattern P10 for processing and a phase pattern P20 for estimating the incident position. Figures 2, 3(a), and 4(a) show examples of the phase pattern P1 displayed by the spatial light modulation unit 3. In Figures 2, 3(a), and 4(a), the incident position P2 of light L incident on the phase pattern P1 is indicated by a dashed line. Hereinafter, the phase pattern displayed by the spatial light modulation unit 3 will be simply referred to as the "phase pattern."

[0033] The phase pattern P10 is a phase pattern P1 used for processing the workpiece S by the processing unit 5. The phase pattern P10 is configured to form light L that processes the workpiece S by light L modulated in the phase pattern P10. The phase pattern P10 forms a focused spot on the processing surface SP of the workpiece S.

[0034] FIG. 2 shows an example of a processing phase pattern P10. In FIG. 2, the phase pattern P10 is, for example, a phase pattern that forms a virtual Fresnel lens. In other words, the phase pattern P10 shown in FIG. 2 is a Fresnel lens-shaped phase pattern. The phase pattern P10 may be a phase pattern that forms a virtual lens other than a Fresnel lens. The phase pattern P10 may be a phase pattern that is used for purposes other than forming a virtual lens.

[0035] The phase pattern P10 shown in Fig. 2 is formed in a concentric circle shape. The incident position P2 of the incident light shown in Fig. 2 is located at the center of the phase pattern P10. The light L incident on the incident position P2 is modulated by the phase pattern P10 and guided to the workpiece S.

[0036] 3(a) and 4(a) show an example of a phase pattern P20 for estimating the incident position. 3(b) and 4(b) show an example of a focused spot detected by the detector 7. 3(b) and 4(b) show an image M1 captured by the intensity detector 22.

[0037] The phase pattern P20 for estimating the incident position is a phase pattern used for estimating the incident position. The phase pattern P20 is configured to form a focused spot on the detection unit 7 in response to the incidence of light L. The focused spot is formed by light L modulated by the phase pattern P20. The phase pattern P20 includes multiple types of sub-patterns. The multiple types of sub-patterns are located in different regions of the phase pattern P20 and form different focused spots.

[0038] In this embodiment, the phase pattern P20 for estimating the incident position includes a phase pattern P21 for estimating the incident position and a phase pattern P22 for estimating the incident position. As shown in FIGS. 3(a) and 4(a), the phase pattern P21 and the phase pattern P22 have different configurations. As shown in FIG. 3(b), the phase pattern P21 is configured to form multiple focused spots F1 and F2 on the detection unit 7. As shown in FIG. 4(b), the phase pattern P22 is configured to form multiple focused spots F3 and F4 on the detection unit 7. The arrangement direction of the multiple focused spots F1 and F2 formed by the phase pattern P21 is different from the arrangement direction of the multiple focused spots F3 and F4 formed by the phase pattern P22. The arrangement direction of the multiple focused spots F1 and F2 formed by the phase pattern P21 and the arrangement direction of the multiple focused spots F3 and F4 formed by the phase pattern P22 intersect with each other.

[0039] The spatial light modulation unit 3 sequentially displays, for example, a plurality of phase patterns P21 having mutually different configurations. The plurality of phase patterns P21 differ from one another in terms of the arrangement of regions in which the plurality of types of sub-patterns are located in each phase pattern P21. Furthermore, the spatial light modulation unit 3 sequentially displays a plurality of phase patterns P22 having mutually different configurations. The plurality of phase patterns P22 differ from one another in terms of the arrangement of regions in which the plurality of types of sub-patterns are located in each phase pattern P22.

[0040] The phase pattern P21 includes a subpattern PS1 located in region R1 and a subpattern PS2 located in region R2. Regions R1 and R2 are regions that divide the display unit 13 in, for example, the X-axis direction. Regions R1 and R2 are adjacent to each other in the left-right direction. Regions R1 and R2 are arranged in the left-right direction, and the display unit 13 is composed of regions R1 and R2. In this specification, the "left-right direction" corresponds to the horizontal direction, i.e., the X-axis direction. Region R1 is located to the left of region R2. In the example shown in FIG. 3(a), regions R1 and R2 are configured to divide the phase pattern P21 into two in the left-right direction. The boundary between regions R1 and R2 extends along the Z-axis direction.

[0041] The sub-patterns PS1 and PS2 are arranged in the left-right direction. The sub-patterns PS1 and PS2 are configured to form focused spots F1 and F2 at different positions. The sub-pattern PS1 is configured to form the focused spot F1. The sub-pattern PS2 is configured to form the focused spot F2. As shown in FIG. 3(b), the phase pattern P21 is configured so that the focused spots F1 and F2 are arranged in the left-right direction.

[0042] The phase pattern P22 includes a subpattern PS3 located in region R3 and a subpattern PS4 located in region R4. Regions R3 and R4 are regions that divide the display unit 13 in, for example, the Z-axis direction. Regions R3 and R4 are adjacent to each other in the vertical direction. Regions R3 and R4 are arranged in the vertical direction, and the display unit 13 is composed of regions R3 and R4. In this specification, the "vertical direction" refers to the vertical direction, i.e., the Z-axis direction. Region R3 is located below region R4. In the example shown in FIG. 3(b), regions R3 and R4 are configured to divide the phase pattern P22 into two in the vertical direction. The boundary between regions R3 and R4 extends along the X-axis direction.

[0043] The sub-patterns PS3 and PS4 are arranged in the vertical direction. The sub-patterns PS3 and PS4 are configured to form focused spots F3 and F4 at different positions. The sub-pattern PS3 is configured to form the focused spot F3. The sub-pattern PS4 is configured to form the focused spot F4. As shown in FIG. 4(b), the phase pattern P22 is configured so that the focused spots F3 and F4 are arranged in the vertical direction.

[0044] The image transfer unit 4 adjusts the position where an image is formed by the light L emitted from the spatial light modulation unit 3. The image transfer unit 4 includes, for example, lenses 14 and 15. For example, the light L emitted from the spatial light modulation unit 3 is incident on the lens 14 and then on the lens 15. The lenses 14 and 15 are arranged so that the focal point of the lens 14 and the focal point of the lens 15 are located between the lenses 14 and 15.

[0045] The processing unit 5 irradiates the workpiece S with the light L modulated by the spatial light modulation unit 3, thereby processing the workpiece S. The processing unit 5 includes, for example, a mirror 16 and a lens 17. The light L emitted from the spatial light modulation unit 3 is incident on the mirror 16 via the image transfer unit 4. The mirror 16 guides the light L emitted from the spatial light modulation unit 3 to the lens 17. The mirror 16 is, for example, a half mirror. For example, the mirror 16 separates the light L emitted from the image transfer unit 4 into reflected light and transmitted light. In the example shown in FIG. 1 , the mirror 16 guides the reflected light to the lens 17 and guides the transmitted light to the monitor unit 6 and the detection unit 7. The lens 17 focuses the light L guided from the mirror 16 onto the processing surface SP of the workpiece S. The workpiece S is placed at a predetermined position.

[0046] The monitor unit 6 monitors the phase pattern P1 displayed on the spatial light modulation unit 3. For example, the monitor unit 6 acquires an image of the phase pattern P1 displayed on the spatial light modulation unit 3. For example, the monitor unit 6 includes a mirror 18 and an imaging device 19. For example, the light L emitted from the spatial light modulation unit 3 is incident on the mirror 18 via the image transfer unit 4 and the mirror 16. The mirror 18 guides the light L emitted from the spatial light modulation unit 3 to the imaging device 19. The mirror 18 is, for example, a half mirror. For example, the mirror 18 separates the light L emitted from the spatial light modulation unit 3 into reflected light and transmitted light. In the example shown in FIG. 1 , the mirror 18 guides the reflected light to the imaging device 19 and guides the transmitted light to the detection unit 7.

[0047] The imaging device 19 captures an image formed by the light L guided from the mirror 18. The image captured by the imaging device 19 is an NFP. The image captured by the imaging device 19 is displayed, for example, on a display unit (not shown). In this case, the phase pattern P1 displayed on the spatial light modulation unit 3 can be directly observed from the image captured by the imaging device 19. The image captured by the imaging device 19 may be observed by a user or may be mechanically processed by a computing device 30 (described later) or the like. With these configurations, it can be confirmed by the monitor unit 6 whether a desired phase pattern is displayed on the spatial light modulation unit 3. For example, feedback control of the phase pattern P1 displayed on the spatial light modulation unit 3 can be realized by the control unit 9 through monitoring by the monitor unit 6.

[0048] The detection unit 7 detects the light L modulated by the spatial light modulation unit 3. The detection unit 7 detects intensity information of the incident light L. The detection unit 7 detects intensity information of the focused spot formed by the phase pattern P1 displayed on the spatial light modulation unit 3. For example, the detection unit 7 includes a lens 21 and an intensity detection unit 22. For example, the light L emitted from the spatial light modulation unit 3 is incident on the lens 21 via the image transfer unit 4 and mirrors 16 and 18. The lens 21 guides the light L emitted from the spatial light modulation unit 3 to the intensity detection unit 22. The lens 21 forms a focused spot by focusing the light L emitted from the spatial light modulation unit 3. In this specification, as shown in FIG. 1, the X-axis direction corresponds to the horizontal direction, the Y-axis direction corresponds to the incident direction of the light L to the intensity detection unit 22, and the Z-axis direction corresponds to the vertical direction.

[0049] The intensity detection unit 22 detects intensity information of the focused spot formed by the lens 21. The intensity detection unit 22 measures the intensity of the focused spot as the intensity information of the focused spot. The intensity detection unit 22 detects a plurality of focused spots formed by the phase pattern P20. The intensity detection unit 22 may further detect positions at which the focused spots are formed.

[0050] In this embodiment, the intensity detection unit 22 is, for example, an imaging device. The intensity detection unit 22 acquires an image of a focused spot formed in an imaging region. The imaging region corresponds to the imaging surface of an imaging element. The imaging surface is made up of a plurality of pixels arranged two-dimensionally in a matrix. The captured image is made up of information acquired for each of the plurality of pixels constituting the imaging surface. The acquired captured image includes intensity information and position information of the focused spot. The image acquired by the intensity detection unit 22 is an FFP.

[0051] As a modification of this embodiment, the intensity detection unit 22 may be a device for measuring light intensity other than an imaging device, or may be a plurality of optical power meters spaced apart from one another. For example, the plurality of optical power meters may be a plurality of photodiodes spaced apart from one another. In this modification, the plurality of optical power meters are arranged so as to correspond to the positions where the plurality of focused spots formed by the phase pattern P20 are formed. For example, the plurality of optical power meters are arranged in a one-to-one relationship at the positions where the plurality of focused spots are formed.

[0052] The control unit 9 controls the spatial light modulation unit 3 and estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3. The control unit 9 may further control the optical axis adjustment unit 2. The control unit 9 includes a calculation device 30. The calculation device 30 includes one or more computers configured by these hardware components and software such as programs. When the calculation device 30 is configured by multiple computers, these computers may be connected locally or may be connected via a communication network such as the Internet or an intranet.

[0053] The control unit 9 is configured, for example, by a computing device 30. The computing device 30 includes, for example, a processor, a main memory device, an auxiliary memory device, a communication device, an input device, an output device, and a display device. The computing device 30 may include a cloud. The processor executes an operating system and application programs, etc. The main memory device is configured by a ROM (Read Only Memory) and a RAM (Random Access Memory). The auxiliary memory device is a storage medium configured by a hard disk, flash memory, etc. The communication device is configured by a network card or a wireless communication module. The input device is configured by a keyboard, a mouse, a touch panel, etc. The output device is configured by a display, a printer, etc.

[0054] In this embodiment, the control unit 9 executes a machining process for machining the workpiece S and a position estimation process for estimating the incident position P2 of the light L relative to the spatial light modulation unit 3. In the machining process, a phase pattern P10 for machining is used. In the position estimation process, a phase pattern P20 for incident position estimation is used. For example, the position estimation process is executed before the machining process is executed. This allows the positional relationship between the phase pattern P10 in the machining process and the incident position P2 of the light L on the phase pattern P10 to be adjusted. By adjusting this positional relationship, the light L can be incident on a desired position of the phase pattern P10 in the machining process. The position estimation process may be executed during the machining process.

[0055] As a modification of this embodiment, the time when the position estimation process is performed and the time when the machining process is performed may overlap. In this case, the machining phase pattern P10 may also serve as the incident position estimation phase pattern P20. In this case, the light L modulated by the phase pattern P10 is used to machine the workpiece S in the machining unit 5, and is also used by the detection unit 7 and the control unit 9 to estimate the incident position P2 of the light L with respect to the spatial light modulation unit 3.

[0056] In this embodiment, the control unit 9 includes a pattern setting unit 31, an information acquisition unit 32, a comparison unit 33, a position adjustment unit 34, and an estimation unit 35. When the calculation device 30 is configured by multiple computers, the pattern setting unit 31, the information acquisition unit 32, the comparison unit 33, the position adjustment unit 34, and the estimation unit 35 are logically constructed by connecting these computers. In this embodiment, one calculation device 30 configures the pattern setting unit 31, the information acquisition unit 32, the comparison unit 33, the position adjustment unit 34, and the estimation unit 35. As a variation of this embodiment, the pattern setting unit 31, the information acquisition unit 32, the comparison unit 33, the position adjustment unit 34, and the estimation unit 35 may be configured by multiple calculation devices 30 that are spaced apart from one another.

[0057] The pattern setting unit 31 controls the phase pattern P1. The pattern setting unit 31 sets the phase pattern P1 to be displayed on the spatial light modulation unit 3. The pattern setting unit 31 generates the phase pattern P1 to be set in the spatial light modulation unit 3, for example.

[0058] As a modification of the present embodiment, the pattern setting unit 31 may acquire a phase pattern P1 generated outside the processing apparatus 1. The pattern setting unit 31 may store at least one of the phase pattern P1 generated outside the processing apparatus 1 and the phase pattern P1 generated in advance by the pattern setting unit 31. In this case, the pattern setting unit 31 may set the pre-stored phase pattern P1 in the spatial light modulation unit 3.

[0059] The pattern setting unit 31 sets at least one of a phase pattern P10 for processing and a phase pattern P20 for incident position estimation as the phase pattern P1 to be displayed on the spatial light modulation unit 3. In this embodiment, the phase pattern P1 set by the pattern setting unit 31 includes both the phase pattern P10 and the phase pattern P20. In this embodiment, the pattern setting unit 31 sets phase patterns P21 and P22 for incident position estimation, which have different types of configurations.

[0060] For example, the pattern setting unit 31 sets a phase pattern P10 in the spatial light modulation unit 3 during the machining process. The phase pattern P10 forms light L to be irradiated onto the workpiece S during the machining process. As a result, the spatial light modulation unit 3 displays the phase pattern P10 for machining during the machining process, modulates the light L incident on the phase pattern P10, and emits the light L to be irradiated onto the workpiece S during machining. For example, the light L modulated by the phase pattern P10 is collected by the lens 17 of the machining unit 5 and irradiated onto the machining surface SP of the workpiece S.

[0061] For example, the pattern setting unit 31 sets a phase pattern P20 in the spatial light modulation unit 3 in the position estimation process. The phase pattern P20 forms light L used to estimate the incident position P2 in the position estimation process. As a result, the spatial light modulation unit 3 displays the phase pattern P20 for incident position estimation in the position estimation process, modulates the light L incident on the phase pattern P20, and emits the light L used to estimate the incident position P2. The light L modulated by the phase pattern P20 is focused by the lens 21 of the detection unit 7, and forms multiple focused spots on the intensity detection unit 22.

[0062] The information acquisition unit 32 acquires the detection results from the intensity detection unit 22. The information acquisition unit 32 acquires intensity information of each of the plurality of focused spots based on the detection results acquired from the intensity detection unit 22. In the present embodiment, the information acquisition unit 32 further acquires position information of each of the plurality of focused spots based on the detection results acquired from the intensity detection unit 22. The information acquisition unit 32 determines the position of the focused spot formed by the phase pattern P20 based on, for example, the detection result in the intensity detection unit 22. For example, the information acquisition unit 32 associates the intensity information of the focused spot with the position of the focused spot for each focused spot.

[0063] When the intensity detection unit 22 detects not only the intensity information of the light-focused spot but also the position of the light-focused spot, the information acquisition unit 32 acquires the intensity information and the position of the light-focused spot detected by the intensity detection unit 22. In this embodiment, the intensity detection unit 22 captures an image of the light-focused spot. In this case, for example, the information acquisition unit 32 acquires the intensity information of the light-focused spot based on the luminance of pixels in the captured image, and acquires the position information of the light-focused spot based on the pixel position in the captured image.

[0064] As a modification of the present embodiment, when each of the plurality of focused spots is detected by a plurality of intensity detection units 22, the information acquisition unit 32 acquires the position of the focused spot based on the type of the intensity detection unit 22 that detected the focused spot. The type of the intensity detection unit 22 may be, for example, the individual number of the intensity detection unit 22 or the position of each intensity detection unit 22.

[0065] The information acquisition unit 32 acquires input information and output information to the control unit 9, as well as the results of calculations in the control unit 9. The information acquisition unit 32 stores the acquired information in an auxiliary storage device.

[0066] The comparison unit 33 compares intensity information of the multiple focused spots based on the information acquired by the information acquisition unit 32. For example, the comparison unit 33 compares intensity information of the multiple focused spots included in one captured image captured by the intensity detection unit 22. For example, the comparison unit 33 determines whether the intensities of the multiple focused spots are equal to each other. For example, the comparison unit 33 calculates the intensity ratio of two focused spots formed by the phase pattern P20.

[0067] "The intensities of the multiple focused spots are equal to each other" means that, in all combinations when two focused spots are selected from the multiple focused spots, the value of the intensity ratio of the two focused spots is within a predetermined range based on 1. The predetermined range depends, for example, on the significant digits of the intensities detected by the intensity detection unit 22. The predetermined range is, for example, from 0.99 to 1.01. When the intensities of the focused spots are measured multiple times for the same phase pattern P20, the value of the intensity ratio described above is calculated based on the average, maximum, median, or mode of the intensities measured multiple times.

[0068] For example, the comparison unit 33 may determine whether the incident position P2 with respect to the phase pattern P20 is appropriate based on intensity information of the focused spot. For example, if the comparison unit 33 determines that the incident position P2 with respect to the phase pattern P20 is inappropriate, the position adjustment unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20. For example, if the comparison unit 33 determines that the incident position P2 with respect to the phase pattern P20 is appropriate, the information acquisition unit 32 stores information about the configuration of the current phase pattern P20. The stored information is used to set the processing phase pattern P10 in the processing process.

[0069] As a modified example of this embodiment, when the comparison unit 33 determines that the incident position P2 with respect to the phase pattern P20 is appropriate, the information acquisition unit 32 may store information regarding the current setting of the optical axis adjustment unit 2. The stored information is used for setting the optical axis adjustment unit 2 in the machining process. As a further modified example, when the comparison unit 33 determines that the incident position P2 with respect to the phase pattern P20 is appropriate, the position adjustment unit 34 may maintain the current setting of the optical axis adjustment unit 2 until the machining process.

[0070] The position adjustment unit 34 adjusts the positional relationship between the incident light on the phase pattern P1 and the phase pattern P1. In adjusting the positional relationship between the incident light on the phase pattern P1 and the phase pattern P1, the position adjustment unit 34 performs at least one of changing the phase pattern P1 displayed on the spatial light modulation unit 3 and changing the optical axis position of the incident light on the phase pattern P1.

[0071] For example, as shown in FIG. 5(a), the position adjustment unit 34 changes the phase pattern P1 so that the configuration of the phase pattern P1 moves in the direction of arrow α with respect to the spatial light modulation unit 3. This changes the positional relationship between the light incident on the phase pattern P1 and the phase pattern P1. For example, as shown in FIG. 5(b), the position adjustment unit 34 changes the position of the optical axis of the incident light so that the incident position P2 of the light incident on the phase pattern P1 moves in the direction of arrow β. This also changes the positional relationship between the light incident on the phase pattern P1 and the phase pattern P1. FIGS. 5(a) and 5(b) are diagrams for explaining an example of changing the positional relationship between the light incident on the phase pattern P1 and the phase pattern P1.

[0072] In this embodiment, in adjusting the positional relationship between the incident light on the phase pattern P1 and the phase pattern P1, the position adjustment unit 34 instructs the pattern setting unit 31 to reset the phase pattern P1, and changes the phase pattern P1 displayed on the spatial light modulation unit 3. As a modification of this embodiment, in adjusting the positional relationship between the incident light on the phase pattern P1 and the phase pattern P1, the position adjustment unit 34 may control the optical axis adjustment unit 2 to adjust the optical axis position of the incident light on the spatial light modulation unit 3.

[0073] For example, the position adjusting unit 34 adjusts the positional relationship between the light incident on the phase pattern P1 and the phase pattern P1 to a preset positional relationship. For example, the position adjusting unit 34 adjusts the positional relationship between the light incident on the phase pattern P1 and the phase pattern P1 based on the detection result of the intensity detecting unit 22.

[0074] For example, the position adjustment unit 34 adjusts the positional relationship between the light incident on the processing phase pattern P10 and the phase pattern P10 based on the estimation result by the estimation unit 35. For example, the position adjustment unit 34 performs at least one of changing the phase pattern P10 displayed on the spatial light modulation unit 3 and changing the optical axis position of the light incident on the phase pattern P10, and makes the light L incident on the phase pattern P10 at the incident position P2 estimated by the estimation unit 35.

[0075] For example, the position adjustment unit 34 adjusts the positional relationship between the incident light on the phase pattern P20 for estimating the incident position and the phase pattern P20, based on the detection result of the intensity detection unit 22 acquired by the information acquisition unit 32. For example, the position adjustment unit 34 performs at least one of changing the phase pattern P20 displayed on the spatial light modulation unit 3 and changing the optical axis position of the incident light on the phase pattern P20, and makes the light L incident on the phase pattern P20.

[0076] For example, the position adjusting unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 based on the intensity information of the focused spot. The position adjusting unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 based on the intensity information of the focused spot and the position information of the focused spot.

[0077] The position adjustment unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 so that intensity information of a plurality of focused spots is detected by the intensity detection unit 22. When the intensity detection unit 22 detects intensity information of only one focused spot, the position adjustment unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 so that intensity information of a plurality of focused spots is detected by the intensity detection unit 22.

[0078] In this embodiment, the position adjustment unit 34 changes the positional relationship between the phase pattern P20 and the light incident on the phase pattern P20 in the position estimation process by gradually changing the phase pattern P20 to be displayed on the spatial light modulation unit 3. In this embodiment, the position adjustment unit 34 gradually adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 until intensity information of the focused spots is acquired for all of the preset phase patterns P20.

[0079] As a modification of this embodiment, the position adjustment unit 34 may adjust in stages the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 based on the comparison result of the intensity information of the plurality of light-focusing spots. For example, the position adjustment unit 34 may adjust in stages the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 until the intensities of at least two of the plurality of light-focusing spots become equal to each other.

[0080] As a further modification of the present embodiment, the position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 so that the intensity ratio between a pair of the multiple focused spots approaches 1. In other words, the position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 so that the intensities of a pair of the multiple focused spots are equal to each other. For example, the position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 based on the detection result of the intensity detection unit 22 so that the intensity ratio between the multiple focused spots is 0.99 or more and 1.01 or less. In this modification, the position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20, for example, using a bisection method in which the positions in the spatial light modulation unit 3 are used as sections and the value of the intensity ratio is used as a solution.

[0081] In the present embodiment, in adjusting the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20, the position adjustment unit 34 instructs the pattern setting unit 31 to reset the phase pattern P20, and changes the phase pattern P20 to be displayed on the spatial light modulation unit 3. For example, when instructed by the position adjustment unit 34 to reset the phase pattern P21, the pattern setting unit 31 causes the spatial light modulation unit 3 to display a phase pattern P21 having a different arrangement of the subpatterns PS1 and PS2. In other words, when instructed by the position adjustment unit 34 to reset the phase pattern P21, the pattern setting unit 31 changes the arrangement of the subpatterns PS1 and PS2 in the phase pattern P21 to be displayed on the spatial light modulation unit 3. As a modified example of the present embodiment, in adjusting the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20, the position adjustment unit 34 may control the optical axis adjustment unit 2 to adjust the optical axis position of the incident light to the spatial light modulation unit 3.

[0082] The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the detection result of the intensity detection unit 22. In other words, the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information detected by the intensity detection unit 22. For example, the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information of the focused spots formed by each of a plurality of phase patterns P20 having mutually different configurations.

[0083] Specifically, the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3, for example, based on a comparison result between the positional relationship between the phase pattern P20 and the incident light to the phase pattern P20 adjusted by the position adjustment unit 34 and the intensity information of the focused spots formed by the phase pattern P20. For example, the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3, based on the positional relationship between the phase pattern P20 and the incident light to the phase pattern P20, such that the intensities of at least two of the multiple focused spots are equal to each other.

[0084] For example, the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the configuration of a phase pattern P20 in which the intensities of at least two of the multiple light condensing spots are equal to each other. For example, the estimation unit 35 estimates the position of the boundary between the subpattern PS1 and the subpattern PS2 in a phase pattern P21 in which the intensities of at least two of the multiple light condensing spots are equal to each other as the incident position P2 of the light L with respect to the spatial light modulation unit 3. Similarly, the estimation unit 35 estimates the position of the boundary between the subpattern PS3 and the subpattern PS4 as the incident position P2 of the light L with respect to the spatial light modulation unit 3 in a phase pattern P22 in which the intensities of at least two of the multiple light condensing spots are equal to each other.

[0085] The estimation unit 35 estimates an incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information of the pair of light-focusing spots F1 and F2 and the comparison result of the intensity information of the pair of light-focusing spots F3 and F4. The pair of light-focusing spots F1 and F2 are formed by the light L incident on the pair of regions R1 and R2, respectively. The pair of regions R1 and R2 are adjacent to each other in the X-axis direction in the phase pattern P21. The pair of light-focusing spots F3 and F4 are formed by the light L incident on the pair of regions R3 and R4, respectively. The pair of regions R3 and R4 are adjacent to each other in the Z-axis direction in the phase pattern P22. For example, if the X-axis direction corresponds to the first direction, the Z-axis direction corresponds to the second direction.

[0086] As a modification of this embodiment, the estimation unit 35 may calculate the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on a comparison result of the intensity information of the multiple light-focusing spots. For example, the estimation unit 35 may calculate the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the intensity ratio of the multiple light-focusing spots. The estimation unit 35 may calculate the amount of deviation of the incident position P2 with respect to the spatial light modulation unit 3 during the processing based on a change in the intensity ratio of the multiple light-focusing spots. The position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P10 and the phase pattern P10 based on the amount of deviation of the incident position P2 calculated by the estimation unit 35 so as to compensate for the deviation.

[0087] Next, with reference to Figures 6(a) to 6(e), a detailed description will be given of a change in the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20 in the position estimation process. Figures 6(a) to 6(e) are diagrams showing the relationship between the phase pattern P20 for incident position estimation and the focused spots F1 and F2. In this embodiment, the position adjustment unit 34 changes the phase pattern P20 displayed on the spatial light modulation unit 3 in stages to change the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20 in the position estimation process.

[0088] In the position estimation process, the processing apparatus 1 uses, for example, a plurality of phase patterns P21 for estimating the incident position as the phase pattern P20. In this case, the pattern setting unit 31 sets the plurality of phase patterns P21 in the spatial light modulation unit 3. For example, the position adjustment unit 34 causes the spatial light modulation unit 3 to sequentially display the plurality of phase patterns P21. The intensity detection unit 22 sequentially detects the focused spots F1 and F2 formed by each phase pattern P21. In other words, in the position estimation process, the processing apparatus 1 repeatedly changes the phase pattern P21 by the position adjustment unit 34 and detects the focused spots formed by the phase pattern P21 by the intensity detection unit 22.

[0089] The intensity detection unit 22 further detects intensity information of the plurality of condensed spots F1 and F2 after the position adjustment unit 34 adjusts the positional relationship between the incident light on the phase pattern P21 and the phase pattern P21. The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on a comparison result of the intensity information of the plurality of condensed spots F1 and F2 detected after the positional relationship between the incident light on the phase pattern P21 and the phase pattern P21 is adjusted. A position search process is executed to search for the incident position P2 of the light L in the phase pattern P21 by combining the change of the phase pattern P21 and the detection of the condensed spots.

[0090] 6(a) to 6(e) show the relationship between the phase pattern P20 for estimating the incident position and the focused spots F1 and F2 in an example in which the phase pattern P20 displayed on the spatial light modulation unit 3 is changed in the position estimation process. In this embodiment, the position adjustment unit 34 adjusts the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 in stages, from the state shown in FIG. 6(a) to the state shown in FIG. 6(e). In other words, the position adjustment unit 34 causes the spatial light modulation unit 3 to sequentially display the multiple phase patterns P21 shown in FIG. 6(a) to 6(e).

[0091] Each phase pattern P21 includes multiple types of subpatterns PS1 and PS2. The arrangement of the subpatterns PS1 and PS2 in the phase pattern P21 differs for each phase pattern P21. Light L is incident on each of the phase patterns P21 shown in Figures 6(a) to 6(e). The light L is modulated by the phase pattern P21 and emitted toward the detection unit 7.

[0092] In the phase pattern P21 shown in Figures 6(a) to 6(e), the subpatterns PS1 and PS2 are arranged in the X-axis direction. In the multiple phase patterns P21 shown in Figures 6(a) to 6(e), the area ratio of the region R1 where the subpattern PS1 is located to the region R2 where the subpattern PS2 is located differs for each phase pattern P21. In the multiple phase patterns P21 shown in Figures 6(a) to 6(e), the length ratio of the region R1 to the region R2 in the X-axis direction differs for each phase pattern P21. In the multiple phase patterns P21 shown in Figures 6(a) to 6(e), the position of the boundary between the region R1 and the region R2 differs for each phase pattern P21. In the multiple phase patterns P21 shown in Figures 6(a) to 6(e), the position where light L is incident is the same.

[0093] The subpattern PS1 modulates light L1 that is incident on the subpattern PS1 out of the light L, and forms a focused spot F1 on the intensity detection unit 22. The subpattern PS2 modulates light L2 that is incident on the subpattern PS2 out of the light L, and forms a focused spot F2 on the intensity detection unit 22. The intensity detection unit 22 captures an image M1 in which the focused spots formed on the intensity detection unit 22 are displayed.

[0094] In the phase pattern P21 shown in Fig. 6(a), the length of region R2 in the X-axis direction is greater than the length of region R1 in the X-axis direction. In Fig. 6(a), light L is incident only on subpattern PS2 of the phase pattern P21. Therefore, the focused spot F1 is not formed on the intensity detection unit 22, and only the focused spot F2 is formed on the intensity detection unit 22. As a result, only the focused spot F2 is displayed on the image M1.

[0095] In the phase pattern P21 shown in FIG. 6(b), the length of region R2 in the X-axis direction is longer than the length of region R1 in the X-axis direction. In the X-axis direction, the length of region R2 in FIG. 6(b) is shorter than the length of region R2 in FIG. 6(a), and the length of region R1 in FIG. 6(b) is longer than the length of region R1 shown in FIG. 6(a). In FIG. 6(b), light L is incident on subpatterns PS1 and PS2. As a result, focused spots F1 and F2 are displayed in image M1. In phase pattern P21, the area of ​​light L2 is larger than the area of ​​light L1. Therefore, the intensity of focused spot F2 is greater than the intensity of focused spot F1.

[0096] In the phase pattern P21 shown in Fig. 6(c), the length of region R2 in the X-axis direction is equal to the length of region R1 in the X-axis direction. In Fig. 6(c), light L is incident on subpatterns PS1 and PS2. As a result, focused spots F1 and F2 are displayed in image M1. In the phase pattern P21, the area of ​​light L2 is equal to the area of ​​light L1. Therefore, the intensity of focused spot F2 is equal to the intensity of focused spot F1.

[0097] In the phase pattern P21 shown in FIG. 6(d), the length of region R2 in the X-axis direction is smaller than the length of region R1 in the X-axis direction. In FIG. 6(d), light L is incident on subpatterns PS1 and PS2. As a result, focused spots F1 and F2 are displayed in image M1. In phase pattern P21, the area of ​​light L2 is smaller than the area of ​​light L1. Therefore, the intensity of focused spot F2 is smaller than the intensity of focused spot F1.

[0098] In the phase pattern P21 shown in FIG. 6(e), the length of region R2 in the X-axis direction is smaller than the length of region R1 in the X-axis direction. In the X-axis direction, the length of region R2 in FIG. 6(e) is smaller than the length of region R2 shown in FIG. 6(d), and the length of region R1 in FIG. 6(e) is larger than the length of region R1 shown in FIG. 6(d). In FIG. 6(e), light L is incident only on subpattern PS1 of the phase pattern P21. Therefore, the focused spot F2 is not formed on the intensity detection unit 22, and only the focused spot F1 is formed on the intensity detection unit 22. As a result, only the focused spot F1 is displayed on the image M1.

[0099] Intensity information of the different focused spots F1 and F2 is detected by the phase pattern P21 shown in FIGS. 6(a) to 6(e). The value of the intensity ratio of the focused spots F1 and F2 is closest to 1 in the phase pattern P21 shown in FIG. 6(c). Therefore, the estimation unit 35 estimates that the light L is incident at a position corresponding to the phase pattern P21 shown in FIG. 6(c). This allows the estimation of the incident position P2 of the light L on the spatial light modulation unit 3. For example, the position of the boundary between the subpatterns PS1 and PS2 of the phase pattern P21 shown in FIG. 6(c) is estimated as the incident position P2 of the light L on the spatial light modulation unit 3 in the X-axis direction. In other words, the position of the boundary between the regions R1 and R2 is estimated as the incident position P2 of the light L on the spatial light modulation unit 3 in the X-axis direction.

[0100] The above description is of an example in which the change in the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 in the position estimation process is performed by changing the phase pattern P20 displayed on the spatial light modulation unit 3. The change in the positional relationship may also be achieved by a similar process of changing the optical axis position of the light incident on the phase pattern P20.

[0101] For example, when the optical axis position of the incident light on the phase pattern P20 is changed, the position adjustment unit 34 sequentially changes the incident position P2 of the incident light on the phase pattern P21 by changing the optical axis position. The intensity detection unit 22 sequentially detects focused spots formed by the incident light having different incident positions P2. In other words, in the position estimation process, the machining apparatus 1 repeatedly changes the optical axis position of the incident light on the phase pattern P1 by the position adjustment unit 34 and detects focused spots formed by the phase pattern P21 by the intensity detection unit 22. In this case, too, the intensity detection unit 22 further detects intensity information of multiple focused spots after the position adjustment unit 34 adjusts the positional relationship between the incident light on the phase pattern P21 and the phase pattern P21. In this way, a position search process may be performed to search for the incident position P2 of the light L on the phase pattern P21 by combining the change of the optical axis position and the detection of focused spots.

[0102] Next, an example of a position estimation method executed by the spatial light modulator 10 will be described with reference to Figures 7, 8, 9(a) and 9(b). Figures 7 and 8 are flowcharts for explaining the position estimation process. Figures 9(a) and 9(b) are graphs showing intensity ratio values ​​of multiple focused spots.

[0103] In the position estimation process, the control unit 9 executes a position search process using a pattern setting unit 31, an information acquisition unit 32, a comparison unit 33, a position adjustment unit 34, and an estimation unit 35. The position estimation process is executed, for example, according to the flowchart shown in FIG.

[0104] First, the control unit 9 executes a position search process using left and right spots (process S1). The control unit 9 executes a position search process using left and right spots. The left and right spots correspond to the focused spots F1 and F2 arranged in the X-axis direction as shown in FIG. 3(b). In process S1, a phase pattern P21 for estimating the incident position is used, in which sub-patterns PS1 and PS2 are arranged in the left and right direction as shown in FIG. 3(a). In process S1, the pattern setting unit 31 sets the phase pattern P21 to the spatial light modulation unit 3. The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on intensity information of the focused spots F1 and F2 formed by the phase pattern P21.

[0105] Next, the control unit 9 executes a position search process using upper and lower spots (process S2). The upper, lower, and right spots correspond to the focused spots F3 and F4 arranged in the Z-axis direction as shown in FIG. 4(b). In process S2, a phase pattern P22 for estimating the incident position is used, in which sub-patterns PS3 and PS4 are arranged in the vertical direction as shown in FIG. 4(a). In process S2, the pattern setting unit 31 sets the phase pattern P22 to the spatial light modulation unit 3. The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on intensity information of the focused spots F3 and F4 formed by the phase pattern P22.

[0106] The incident position P2 in the left-right and up-down directions is estimated by processes S1 and S2. The control unit 9 ends the position estimation process when processes S1 and S2 are completed. As a modification of this embodiment, the control unit 9 may execute a position search process using left-right spots after a position search process using up-down spots.

[0107] Next, the position search process using the left and right spots will be described in detail with reference to Fig. 8. In this phase search process, setting of the positional relationship between the incident light to the phase pattern P20 for estimating the incident position and the phase pattern P20 and detection of intensity information of the focused spots are repeated until intensity information is acquired for all of the multiple phase patterns P20. Below, an example will be described in which the positional relationship between the incident light to the phase pattern P20 and the phase pattern P20 is changed by changing the phase pattern P20 displayed on the spatial light modulation unit 3.

[0108] First, a phase pattern P20 for estimating the incident position is displayed on the spatial light modulation unit 3 (process S11). For example, the pattern setting unit 31 causes the spatial light modulation unit 3 to display the phase pattern P20. In the first process S11 after the position search process is executed, the pattern setting unit 31 sets a predetermined phase pattern P20 on the spatial light modulation unit 3 and causes it to be displayed. For example, the predetermined phase pattern P20 is a phase pattern P21 in which the length ratio of region R2 to region R1 in the X-axis direction is the largest. In other words, the predetermined phase pattern P20 is a phase pattern P21 in which the number of pixels in region R2 in the X-axis direction is the largest. As a modified example, the predetermined phase pattern P20 may be a phase pattern P21 in which the number of pixels in region R2 in the X-axis direction is the smallest. In the position search process using left and right spots, the pattern setting unit 31 sets the phase pattern P21 on the spatial light modulation unit 3.

[0109] Next, intensity information of the left and right spots is acquired (process S12). For example, in process S11, light L is incident on the phase pattern P21 displayed on the spatial light modulation unit 3, and multiple focused spots F1 and F2 are formed on the intensity detection unit 22. The multiple focused spots F1 and F2 formed on the intensity detection unit 22 are left and right spots. The intensity detection unit 22, for example, detects intensity information of the left and right spots and outputs it to the information acquisition unit 32. The information acquisition unit 32 acquires the intensity information of the left and right spots detected by the intensity detection unit 22. For example, the information acquisition unit 32 acquires a captured image captured by the intensity detection unit 22. In this case, the captured image includes intensity information and position information of the left and right spots. In process S12, the intensities of the left and right spots may be acquired multiple times for the same phase pattern P20. In this case, the information acquisition unit 32 may calculate the average, maximum, median, or mode of the intensities acquired multiple times and acquire the calculation result as intensity information.

[0110] Next, it is determined whether all the intensity information has been acquired (process S13). For example, the information acquisition unit 32 determines whether all the intensity information has been acquired. For example, if the phase pattern P20 initially set in process S11 is the phase pattern P21 having the largest number of pixels in the region R2 in the X-axis direction, the information acquisition unit 32 determines that all the intensity information has been acquired if the intensity information of the left and right spots by the phase pattern P21 having the smallest number of pixels in the region R2 in the X-axis direction has been acquired. If the phase pattern P20 initially set in process S11 is the phase pattern P21 having the smallest number of pixels in the region R2 in the X-axis direction, the information acquisition unit 32 determines that all the intensity information has been acquired if the intensity information of the left and right spots by the phase pattern P21 having the largest number of pixels in the region R2 in the X-axis direction has been acquired.

[0111] If it is not determined that all the intensity information has been acquired (NO in process S13), the phase pattern P20 is reset (process S14). For example, the position adjustment unit 34 causes the pattern setting unit 31 to reset the phase pattern P20. For example, if the phase pattern P20 initially set in process S11 is the phase pattern P21 having the largest number of pixels in the region R2 in the X-axis direction, the position adjustment unit 34 causes the spatial light modulation unit 3 to set a phase pattern P21 in which the number of pixels in the region R2 in the X-axis direction is one step smaller than the phase pattern P21 previously set. For example, if the phase pattern P20 initially set in process S11 is the phase pattern P21 having the smallest number of pixels in the region R2 in the X-axis direction, the position adjustment unit 34 causes the spatial light modulation unit 3 to set a phase pattern P21 in which the number of pixels in the region R2 in the X-axis direction is one step larger than the phase pattern P21 previously set. When process S14 ends, the process returns to process S11.

[0112] If it is determined that all intensity information has been acquired (YES in process S13), the intensity information of the left and right spots is compared (process S15). For example, the comparison unit 33 compares the intensity information of the left and right spots. The comparison unit 33 acquires the intensity information of the left and right spots stored for each phase pattern P21, and compares the intensity information of the left spot and the intensity information of the right spot corresponding to each phase pattern P21. For example, the comparison unit 33 acquires the intensity information of the left and right spots stored for each phase pattern P21, and calculates the intensity ratio value between the intensity information of the left spot and the intensity information of the right spot corresponding to each phase pattern P21. For example, the comparison unit 33 outputs the comparison result of the intensity information of the left and right spots to the information acquisition unit 32, where it is stored.

[0113] 9(a) is a graph plotting the comparison results of the intensity information of the left and right spots for each phase pattern P20 stored in process S15. In FIG. 9(a), the vertical axis represents the intensity ratio of the left spot intensity to the right spot intensity, and the horizontal axis represents the pixel position corresponding to each phase pattern P21. The pixel position corresponding to phase pattern P21 is the pixel position where the boundary between subpatterns PS1 and PS2 in phase pattern P21 is located.

[0114] When process S15 is completed, the incident position P2 of the light L on the spatial light modulation unit 3 is estimated (process S16). For example, the estimation unit 35 estimates the incident position P2 of the light L on the spatial light modulation unit 3. The estimation unit 35 estimates the incident position P2 of the light L on the spatial light modulation unit 3 based on the comparison result of the intensity information of the left and right spots in process S15. For example, the estimation unit 35 estimates the pixel position where the intensity of the left spot and the intensity of the right spot are equal as the incident position P2 of the light L on the spatial light modulation unit 3. For example, the estimation unit 35 determines that the intensities of the left spot and the right spot are equal when the value of the intensity ratio of the left and right spots is equal to or greater than 0.99 and equal to 1.01. For example, the estimation unit 35 may determine that the intensities of the left spot and the right spot are equal when the value of the intensity ratio of the left and right spots is closest to 1 in the comparison result of the intensity information of the left and right spots in process S15.

[0115] 9(a), when the intensity ratio between the left and right spots is 1.0, the pixel position where the boundary between subpatterns PS1 and PS2 is located is "628." Therefore, the estimation unit 35 estimates that light L is incident on position "628" among the pixel positions of the display unit 13 in the X-axis direction. For example, the estimation unit 35 estimates that the center of gravity of incident position P2 is located at position "628" among the pixel positions of the display unit 13 in the X-axis direction.

[0116] The control unit 9 also executes the position search process using the upper and lower spots in the same manner as steps S11 to S16. The position search process using the upper and lower spots differs from the position search process using the left and right spots only in that phase pattern P22 is used instead of phase pattern P21 and that intensity information of the upper and lower spots is compared. FIG. 9(b) is a graph plotting the comparison results of the intensity information of the upper and lower spots for each phase pattern P22. In FIG. 9(b), the vertical axis represents the intensity ratio of the upper spot to the lower spot, and the horizontal axis represents the pixel position corresponding to each phase pattern P22. The pixel position corresponding to phase pattern P22 is the pixel position where the boundary between subpatterns PS3 and PS4 is located in phase pattern P22.

[0117] 9(b), when the intensity ratio between the upper and lower spots is 1.0, the pixel position where the boundary between subpatterns PS3 and PS4 is located is "464." Therefore, the estimation unit 35 estimates that light L is incident on position "464" among the pixel positions of the display unit 13 in the Z-axis direction. For example, the estimation unit 35 estimates that the center of gravity of incident position P2 is incident on position "464" among the pixel positions of the display unit 13 in the Z-axis direction.

[0118] Although an example of a position estimation method executed by the spatial light modulator 10 has been described above, the order of each process and the subject of each process are not limited to this. For example, instead of the information acquisition unit 32, the comparison unit 33, the position adjustment unit 34, or the estimation unit 35 may execute process S13. For example, the intensity information for both the left and right spots and the top and bottom spots may all be acquired before the respective pieces of intensity information are compared. For example, the intensity information for both the left and right spots and the top and bottom spots may all be acquired before the respective pieces of intensity information are compared.

[0119] For example, the intensity information of the left and right spots or the upper and lower spots in each phase pattern P20 may be compared immediately after the intensity information is acquired. In other words, process S15 may be executed between process S12 and process S13. In this case, for example, the comparison unit 33 compares the intensity information of the left spot and the intensity information of the right spot acquired in the immediately preceding process S12, and outputs the comparison result of the intensity information of the left and right spots to the information acquisition unit 32. For example, the intensity information of the left and right spots and the upper and lower spots may be compared immediately after the intensity information is acquired.

[0120] Next, a modified example of the position estimation method executed by the spatial light modulator 10 will be described with reference to FIG. 10. FIG. 10 is a flowchart for explaining the position estimation process in a modified example of this embodiment. In this phase search process, setting of the positional relationship between the incident light to the phase pattern P20 for incident position estimation and the phase pattern P20 and acquisition of intensity information of the focused spots are repeated until it is determined that the intensity information of the left and right focused spots is equal. Below, an example will be described in which the positional relationship between the incident light to the phase pattern P20 and the phase pattern P20 is changed by changing the phase pattern displayed on the spatial light modulator 3. Below, explanations that overlap with the position estimation method described with reference to FIG. 8 will be omitted.

[0121] First, a phase pattern P20 for estimating the incident position is displayed on the spatial light modulation unit 3 (step S21). For example, in step S21, the same process as step S11 described above is executed.

[0122] Next, intensity information of the left and right spots is acquired (step S22). For example, in step S22, the same process as in step S12 described above is executed.

[0123] Next, the intensity information of the left and right spots is compared (process S23). For example, the comparison unit 33 compares the intensity information of the left and right spots. The comparison unit 33 compares the intensity information of the left spot and the intensity information of the right spot acquired in the immediately preceding process S22. For example, the comparison unit 33 calculates the value of the intensity ratio between the intensity information of the left spot and the intensity information of the right spot acquired in the immediately preceding process S22. For example, the comparison unit 33 outputs the comparison result of the intensity information of the left and right spots to the information acquisition unit 32, where it is stored.

[0124] Next, it is determined whether the intensity information of the left and right spots is equal to each other (process S24). For example, the comparison unit 33 determines whether the intensity information of the left and right spots acquired in process S23 is equal to each other. For example, the comparison unit 33 calculates the value of the intensity ratio between the intensity of the left spot and the intensity of the right spot, and determines that the intensity of the left spot and the intensity of the right spot are equal to each other if the value of the intensity ratio of the left and right spots is 0.99 or more and 1.01 or less. If it is determined that the intensity information of the left and right spots is equal to each other (YES in process S24), the process proceeds to process S27.

[0125] If the intensity information of the left and right spots is not determined to be equal to each other (NO in process S24), it is determined whether all the intensity information has been compared (process S25). For example, the comparison unit 33 determines whether all the intensity information has been compared. For example, if the phase pattern P20 initially set in process S21 is the phase pattern P21 with the largest number of pixels in region R2 in the X-axis direction, the comparison unit 33 determines that all the intensity information has been compared when the intensity information of the left and right spots based on the phase pattern P21 with the smallest number of pixels in region R2 in the X-axis direction is compared. If the phase pattern P20 initially set in process S21 is the phase pattern P21 with the smallest number of pixels in region R2 in the X-axis direction, the comparison unit 33 determines that all the intensity information has been compared when the intensity information of the left and right spots based on the phase pattern P21 with the largest number of pixels in region R2 in the X-axis direction is compared.

[0126] If it is determined that all of the intensity information has not been compared (NO in process S25), the phase pattern P20 is reset (process S26). For example, the position adjustment unit 34 causes the pattern setting unit 31 to reset the phase pattern P20. For example, in process S24, the same process as process S14 described above is executed. If it is determined that all of the intensity information has been compared (YES in process S25), the process proceeds to process S27.

[0127] If it is determined that the intensity information of the left and right spots are equal to each other (YES in process S24), or if it is determined that all the intensity information has been compared (YES in process S25), the incident position P2 of the light L on the spatial light modulation unit 3 is estimated (process S27). For example, the estimation unit 35 estimates the incident position P2 of the light L on the spatial light modulation unit 3.

[0128] For example, when it is determined that the intensity information of the left and right spots is equal to each other (YES in process S24), the estimation unit 35 estimates the pixel position corresponding to the phase pattern P21 for which it has been determined in process S24 that the intensity information of the left and right spots is equal as the incident position P2 of the light L with respect to the spatial light modulation unit 3. For example, the pixel position corresponding to the phase pattern P21 is the pixel position where the boundary between the subpatterns PS1 and PS2 is located in the phase pattern P21.

[0129] For example, when it is determined that all of the intensity information has been compared (YES in process S25), the estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison results of all of the intensity information. For example, the estimation unit 35 estimates the pixel position corresponding to the phase pattern P20, whose intensity ratio value between the left and right spots is closest to 1, as the incident position P2 of the light L with respect to the spatial light modulation unit 3. For example, the pixel position corresponding to the phase pattern P20 is the pixel position at which the boundary between the subpatterns PS1 and PS2 is located in the phase pattern P21.

[0130] In this modification, the control unit 9 also executes the position search process using the upper and lower spots by the same processes as steps S21 to S27. The position search process using the upper and lower spots differs from the position search process using the left and right spots only in that phase pattern P22 is used instead of phase pattern P21 and intensity information of the upper and lower spots is compared.

[0131] Although one variation of the position estimation method executed by the spatial light modulator 10 has been described above, the order of the processes and the subject of the processes are not limited to this. For example, the position adjustment unit 34 or the estimation unit 35 may execute process S24 instead of the comparison unit 33. For example, the information acquisition unit 32, the position adjustment unit 34, or the estimation unit 35 may execute process S25 instead of the comparison unit 33. For example, process S25 may be executed before process S24. In this case, for example, process S24 is executed when the result of process S25 is NO, and process S26 is executed when the result of process S24 is NO, and process S27 is executed when the result of process S24 is YES. When the result of process S25 is YES, process S27 is executed, and a process similar to process S16 described above is executed.

[0132] Next, with reference to FIG. 11, another modified example of the position estimation method executed by the spatial light modulator 10 will be described. FIG. 11 is a flowchart for explaining a position estimation process in another modified example of this embodiment. In this phase search process, a bisection method is used to repeatedly set the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20 and acquire intensity information. In this bisection method, the minimum value is set to 0, and the maximum value is set to the number of pixels of the display unit 13 in the X-axis direction or the Z-axis direction. In the following, an example will be described in which the positional relationship between the incident light on the phase pattern P20 and the phase pattern P20 is changed by changing the phase pattern displayed on the spatial light modulator 3. In the following, descriptions that overlap with the position estimation method described with reference to FIG. 8 or FIG. 10 will be omitted.

[0133] First, 0 is set to "min" and the number of pixels is set to "max" (process S31). "min" is a variable indicating the minimum value in the dichotomy. "max" is a variable indicating the maximum value in the dichotomy. For example, the position adjustment unit 34 sets 0 to "min" and sets the number of pixels of the display unit 13 in the X-axis direction to "max."

[0134] Next, (max+min) / 2 is set to "search" (process S32). "Search" is a variable that specifies the phase pattern P20 to be displayed by the spatial light modulation unit 3. "Search" indicates, for example, the pixel position at which the boundary between the subpattern PS1 and the subpattern PS2 is located in the phase pattern P20 to be displayed by the spatial light modulation unit 3. For example, the position adjustment unit 34 sets the value of (max+min) / 2 to "search".

[0135] Next, the phase pattern P20 for estimating the incident position is displayed on the spatial light modulation unit 3 (process S33). For example, the pattern setting unit 31 sets the phase pattern P20 corresponding to "search" set in process S32 on the spatial light modulation unit 3 and causes it to be displayed.

[0136] Next, intensity information of the left and right spots is acquired (step S34). For example, in step S34, the same process as step S12 described above is executed.

[0137] Next, the intensity information of the left and right spots is compared (step S35). For example, in step S35, the same process as step S23 described above is executed.

[0138] Next, the value of the intensity ratio between the left and right spots is determined (process S36). For example, the comparison unit 33 determines the value of the intensity ratio between the left and right spots. If the value of the intensity ratio between the left and right spots is smaller than the threshold, the process proceeds to process S37. If the value of the intensity ratio between the left and right spots is larger than the threshold, the process proceeds to process S38. If the value of the intensity ratio between the left and right spots is within the threshold range, the process proceeds to process S39. For example, the threshold range is a range in which the intensity of the left spot and the intensity of the right spot can be determined to be equal. For example, if the value of the intensity ratio between the left and right spots is smaller than 0.99, the process proceeds to process S37. If the value of the intensity ratio between the left and right spots is larger than 1.01, the process proceeds to process S38. If the value of the intensity ratio between the left and right spots is equal to or larger than 0.99 and equal to or smaller than 1.01, the process proceeds to process S39.

[0139] If the intensity ratio between the left and right spots is smaller than the threshold, "max" is set to "search" (process S37). For example, the position adjustment unit 34 sets the current value of "max" to "search." When process S37 ends, the process returns to process S32.

[0140] If the intensity ratio between the left and right spots is greater than the threshold, "min" is set to "search" (process S38). For example, the pattern setting unit 31 sets the current value of "min" to "search." When process S38 ends, the process returns to process S32.

[0141] If the value of the intensity ratio between the left and right spots is within the threshold range, the incident position P2 of the light L on the spatial light modulation unit 3 is estimated (process S39). For example, the estimation unit 35 estimates the pixel position corresponding to the phase pattern P20 set in the immediately preceding process S33 as the incident position P2 of the light L on the spatial light modulation unit 3. For example, the pixel position corresponding to the phase pattern P20 is the pixel position where the boundary between the subpatterns PS1 and PS2 is located in the phase pattern P21.

[0142] In this modification, the control unit 9 also executes the position search process using the upper and lower spots by the same processes as steps S31 to S39. The position search process using the upper and lower spots differs from the position search process using the left and right spots only in that the phase pattern P22 is used instead of the phase pattern P21, and that the intensity information of the upper and lower spots is compared.

[0143] Although one variation of the position estimation method executed by the spatial light modulator 10 has been described above, the subject of the processing is not limited to this. For example, the pattern setting unit 31 or the estimation unit 35 may execute processing S31 instead of the position adjustment unit 34. For example, the pattern setting unit 31 or the estimation unit 35 may execute processing S32 instead of the position adjustment unit 34. For example, the position adjustment unit 34 or the estimation unit 35 may execute processing S36 instead of the comparison unit 33. Furthermore, processing S36 may not be executed, and any of processing S37, processing S38, and processing S39 may be executed based on the comparison result of the intensity information in processing S35.

[0144] The example of the position estimation method described with reference to Fig. 8, the example of the position estimation method described with reference to Fig. 10, and the example of the position estimation method described with reference to Fig. 11 may be combined with each other. For example, the position search process using left and right spots and the position search process using up and down spots may be performed by different processes described in different examples.

[0145] Next, a spatial light modulator 10 according to a modification of this embodiment will be described with reference to Figures 12(a) and 12(b). Figures 12(a) and 12(b) are diagrams showing the relationship between the incident position estimation phase pattern P20 and the focused spot in this modification of this embodiment. This modification is generally similar to or the same as the above-described embodiment and modification. This modification differs from the above-described embodiment in terms of the configuration of the phase pattern P20. Below, the differences between the above-described embodiment and modification will be mainly described.

[0146] In this modification, the phase pattern P20 for estimating the incident position includes a phase pattern P25 instead of the phase pattern P21 and the phase pattern P22 described above. For example, the spatial light modulation unit 3 sequentially displays a plurality of phase patterns P25 for estimating the incident position, each having a different configuration. The plurality of phase patterns P25 differ from one another in terms of the arrangement of regions in which the plurality of types of sub-patterns are located in each phase pattern P25. In other words, the arrangement of the sub-patterns in the phase pattern P25 differs for each phase pattern P25.

[0147] Each phase pattern P25 includes multiple types of subpatterns PS11, PS12, PS13, and PS14. The arrangement of the subpatterns PS11, PS12, PS13, and PS14 in the phase pattern P25 differs for each phase pattern P25. The subpattern PS11 is located in region R11. The subpattern PS12 is located in region R12. The subpattern PS13 is located in region R13. The subpattern PS14 is located in region R14.

[0148] Regions R11, R12, R13, and R14 are regions that divide the display unit 13 in, for example, the X-axis direction and the Z-axis direction. Regions R11 and R12 are adjacent to each other in the left-right direction. Regions R11 and R13 are adjacent to each other in the up-down direction. Regions R13 and R14 are adjacent to each other in the left-right direction. Regions R12 and R14 are adjacent to each other in the up-down direction.

[0149] Regions R11 and R12 are arranged in the left-right direction. Regions R11 and R13 are arranged in the up-down direction. Regions R13 and R14 are arranged in the left-right direction. Regions R12 and R14 are arranged in the up-down direction. Regions R11, R12, R13, and R14 form the display unit 13. Region R11 is located to the left of region R12. Region R11 is located below region R13. Region R13 is located to the left of region R14. Region R12 is located below region R14. Regions R11, R12, R13, and R14 are configured to divide the phase pattern P25 into four parts in the X-axis direction and the Z-axis direction.

[0150] The boundary between region R11 and region R12 extends along the Z-axis direction. The boundary between region R13 and region R14 extends along the Z-axis direction. For example, the boundary between region R11 and region R12 and the boundary between region R13 and region R14 extend parallel to the Z-axis direction. In this specification, "parallel" includes a tolerance range that takes into account the positioning of the spatial light modulation unit 3. The boundary between region R11 and region R12 is continuous with the boundary between region R13 and region R14, and is located on the same straight line as the boundary between region R13 and region R14.

[0151] The boundary between region R11 and region R13 extends along the X-axis direction. The boundary between region R12 and region R14 extends along the X-axis direction. For example, the boundary between region R11 and region R13 and the boundary between region R12 and region R14 extend parallel to the X-axis direction. The boundary between region R11 and region R13 is continuous with the boundary between region R12 and region R14 and is located on the same straight line as the boundary between region R12 and region R14. The boundary between region R11 and region R12 and the boundary between region R11 and region R13 intersect with each other. For example, the boundary between region R11 and region R12 and the boundary between region R11 and region R13 are perpendicular to each other. In this specification, "perpendicular" includes a tolerance range that takes into account pixel positions in the display unit 13.

[0152] The sub-patterns PS11, PS12, PS13, and PS14 are configured to form focused spots F11, F12, F13, and F14 at different positions. The sub-pattern PS11 is configured to form the focused spot F11. The sub-pattern PS12 is configured to form the focused spot F12. The sub-pattern PS13 is configured to form the focused spot F13. The sub-pattern PS14 is configured to form the focused spot F14.

[0153] Light L is incident on each of the phase patterns P25 shown in Figures 12(a) and 12(b). The light L is modulated by the phase pattern P25 and emitted toward the detection unit 7. In the multiple phase patterns P25 set by the pattern setting unit 31, the area ratio of the regions R11, R12, R13, and R14 differs for each phase pattern P25. In the multiple phase patterns P25 set by the pattern setting unit 31, the positions of the boundaries between the regions R11, R12, R13, and R14 differ for each phase pattern P25. In the multiple phase patterns P25 shown in Figures 12(a) and 12(b), the position where light L is incident is the same.

[0154] The subpattern PS11 modulates light L11 that is incident on the subpattern PS11 of the light L, forming a focused spot F11 on the intensity detection unit 22. The subpattern PS12 modulates light L12 that is incident on the subpattern PS12 of the light L, forming a focused spot F12 on the intensity detection unit 22. The subpattern PS13 modulates light L13 that is incident on the subpattern PS13 of the light L, forming a focused spot F13 on the intensity detection unit 22. The subpattern PS14 modulates light L14 that is incident on the subpattern PS14 of the light L, forming a focused spot F14 on the intensity detection unit 22. The intensity detection unit 22 captures an image M10 in which the focused spots formed on the intensity detection unit 22 are displayed.

[0155] 12(a), light L is incident only on sub-patterns PS11 and PS12 of the phase pattern P25. Therefore, the focused spots F13 and F14 are not formed on the intensity detection unit 22, and only the focused spots F11 and F12 are formed on the intensity detection unit 22. As a result, only the focused spots F11 and F12 are displayed on the image M10. In the phase pattern P25, the area of ​​light L12 is larger than the area of ​​light L11. Therefore, the intensity of the focused spot F12 is larger than the intensity of the focused spot F11.

[0156] In the phase pattern P25 shown in FIG. 12(b), the light L is incident on all of the subpatterns PS11, PS12, PS13, and PS14 of the phase pattern P25. As a result, the focused spots F11, F12, F13, and F14 are displayed in the image M10. In the phase pattern P25, the areas of the light L11, L12, L13, and L14 are equal to each other. Therefore, the intensities of the focused spots F11, F12, F13, and F14 are equal to each other.

[0157] As described above, intensity information of the different light-focus spots F11, F12, F13, and F14 is detected by the different phase patterns P25. The intensities of the light-focus spots F11, F12, F13, and F14 are equal to each other in the phase pattern P25 shown in FIG. 12(b). Therefore, the estimation unit 35 estimates that the light L is incident at a position corresponding to the phase pattern P25 shown in FIG. 12(b). This allows the incident position P2 of the light L with respect to the spatial light modulation unit 3 to be estimated.

[0158] The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 in the X-axis direction based on, for example, the comparison result of the intensity information of the pair of light condensing spots F11, F12 and the comparison result of the intensity information of the pair of light condensing spots F13, F14. The pair of light condensing spots F11, F12 are formed by the light L incident on the pair of regions R11, R12, respectively. The pair of regions R11, R12 are adjacent to each other in the X-axis direction in the phase pattern P25. The pair of light condensing spots F13, F14 are formed by the light L incident on the pair of regions R13, R14, respectively. The pair of regions R13, R14 are adjacent to each other in the X-axis direction in the phase pattern P25.

[0159] For example, the estimation unit 35 further estimates an incident position P2 of the light L with respect to the spatial light modulation unit 3 in the Z-axis direction based on the comparison result of the intensity information of the pair of light-focusing spots F11 and F13 and the comparison result of the intensity information of the pair of light-focusing spots F12 and F14. The pair of light-focusing spots F11 and F13 are formed by the light L incident on the pair of regions R11 and R13, respectively. The pair of regions R11 and R13 are adjacent to each other in the Z-axis direction in the phase pattern P25. The pair of light-focusing spots F12 and F14 are formed by the light L incident on the pair of regions R12 and R14, respectively. The pair of regions R12 and R14 are adjacent to each other in the Z-axis direction in the phase pattern P25.

[0160] As a modification of this embodiment, the estimation unit 35 may estimate the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information of the pair of light focusing spots F11, F14 and the comparison result of the intensity information of the pair of light focusing spots F12, F13. The estimation unit 35 may estimate the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information of the light focusing spots F11, F12, F13, F14 using a combination other than the above-mentioned combinations.

[0161] For example, the position of the boundary between subpatterns PS11, PS12, PS13, and PS14 of the phase pattern P25 shown in Fig. 12(b) is estimated as the incident position P2 of light L onto the spatial light modulation unit 3 in the XZ axis direction. In other words, the position of the intersection of the boundaries formed by regions R11, R12, R13, and R14 is estimated as the incident position P2 of light L onto the spatial light modulation unit 3 in the XZ axis direction. In further other words, the position where the boundary between region R11 and region R12 and the boundary between region R13 and region R14 intersect is estimated as the incident position P2 of light L onto the spatial light modulation unit 3 in the XZ axis direction.

[0162] In this modification, an example has been described in which the change in the positional relationship between the phase pattern P1 and the incident light to the phase pattern P1 in the position estimation process is executed by changing the phase pattern P1 displayed on the spatial light modulation unit 3. The change in the positional relationship may be realized by a similar process of changing the optical axis position of the incident light to the phase pattern P1.

[0163] Next, with reference to FIG. 13, a spatial light modulator 10 according to yet another modification of this embodiment will be described. FIG. 13 is a diagram showing the relationship between a phase pattern P20 for estimating the incident position and a focused spot in this modification of this embodiment. This modification is generally similar to or the same as the modification described in FIGS. 12(a) and 12(b). This modification differs from the modification described in FIGS. 12(a) and 12(b) in terms of the configuration of the phase pattern P20. Below, the differences between this modification and the modification described in FIGS. 12(a) and 12(b) will be mainly described.

[0164] In this modification, the phase pattern P20 includes a phase pattern P26 instead of the above-described phase pattern P25. For example, the spatial light modulation unit 3 sequentially displays a plurality of phase patterns P26 having mutually different configurations. The plurality of phase patterns P26 differ from one another in terms of the arrangement of regions in which the plurality of types of sub-patterns are located in each phase pattern P26. In other words, the arrangement of the sub-patterns in the phase pattern P26 differs for each phase pattern P26.

[0165] Each phase pattern P26 includes multiple types of subpatterns PS21, PS22, PS23, and PS24, similar to the phase pattern P25. The arrangement of the subpatterns PS21, PS22, PS23, and PS24 in the phase pattern P26 differs for each phase pattern P26. The subpattern PS21 is located in region R21. The subpattern PS22 is located in region R22. The subpattern PS23 is located in region R23. The subpattern PS24 is located in region R24.

[0166] Regions R21, R22, R23, and R24 are regions that divide the display unit 13 in, for example, the X-axis direction and the Z-axis direction. The display unit 13 is configured by regions R21, R22, R23, and R24. Regions R21, R22, R23, and R24 are configured to divide the phase pattern P26 into four parts in the X-axis direction and the Z-axis direction. Regions R21 and R23 are adjacent to each other in a first inclination direction inclined toward the X-axis direction and the Z-axis direction. Regions R21 and R24 are adjacent to each other in a second inclination direction inclined toward the X-axis direction and the Z-axis direction. Regions R22 and R23 are adjacent to each other in a second inclination direction inclined toward the X-axis direction and the Z-axis direction. Regions R22 and R24 are adjacent to each other in a first inclination direction inclined toward the X-axis direction and the Z-axis direction. The first inclination direction and the second inclination direction intersect with each other.

[0167] The boundary between region R21 and region R23 is inclined with respect to the X-axis direction and the Z-axis direction. The boundary between region R22 and region R24 is inclined with respect to the X-axis direction and the Z-axis direction. The boundary between region R21 and region R23 is continuous with the boundary between region R22 and region R24 and is located on the same straight line as the boundary between region R22 and region R24.

[0168] The boundary between region R21 and region R24 is inclined with respect to the X-axis direction and the Z-axis direction. The boundary between region R22 and region R23 is inclined with respect to the X-axis direction and the Z-axis direction. The boundary between region R21 and region R24 is continuous with the boundary between region R22 and region R23 and is located on the same straight line as the boundary between region R22 and region R23. The boundary between region R21 and region R23 and the boundary between region R21 and region R24 intersect with each other. The boundary between region R21 and region R23 and the boundary between region R21 and region R24 may be perpendicular to each other.

[0169] The sub-patterns PS21, PS22, PS23, and PS24 are configured to form focused spots F21, F22, F23, and F24 at different positions. The sub-pattern PS21 is configured to form the focused spot F21. The sub-pattern PS22 is configured to form the focused spot F22. The sub-pattern PS23 is configured to form the focused spot F23. The sub-pattern PS24 is configured to form the focused spot F24.

[0170] The light L is modulated by the phase pattern P26 and emitted toward the detection unit 7. In the multiple phase patterns P26 set by the pattern setting unit 31, the area ratio of the regions R21, R22, R23, and R24 differs for each phase pattern P26. In the multiple phase patterns P26 set by the pattern setting unit 31, the positions of the boundaries of the regions R21, R22, R23, and R24 differ for each phase pattern P26.

[0171] The subpattern PS21 modulates light L21 that is incident on the subpattern PS21 of the light L, forming a focused spot F21 on the intensity detection unit 22. The subpattern PS22 modulates light L12 that is incident on the subpattern PS22 of the light L, forming a focused spot F22 on the intensity detection unit 22. The subpattern PS23 modulates light L23 that is incident on the subpattern PS23 of the light L, forming a focused spot F23 on the intensity detection unit 22. The subpattern PS24 modulates light L24 that is incident on the subpattern PS24 of the light L, forming a focused spot F24 on the intensity detection unit 22. The intensity detection unit 22 captures an image M20 in which the focused spots formed on the intensity detection unit 22 are displayed.

[0172] 13, light L is incident on all of the subpatterns PS21, PS22, PS23, and PS24 of the phase pattern P26. As a result, focused spots F21, F22, F23, and F24 are displayed in the image M20. In the phase pattern P26, the areas of the light L21, L22, L23, and L24 are equal to one another. Therefore, the intensities of the focused spots F21, F22, F23, and F24 are equal to one another.

[0173] As described above, the intensities of the focused spots F21, F22, F23, and F24 are equal to one another in the phase pattern P26 shown in Fig. 13. Therefore, the estimation unit 35 estimates that the light L is incident on a position corresponding to the phase pattern P26 shown in Fig. 13.

[0174] The estimation unit 35 estimates an incident position P2 of the light L with respect to the spatial light modulation unit 3, for example, based on a comparison result of the intensity information of the pair of light-focusing spots F21, F23 and a comparison result of the intensity information of the pair of light-focusing spots F22, F23. The pair of light-focusing spots F21, F23 are formed by the light L incident on the pair of regions R21, R23, respectively. The pair of regions R21, R23 are adjacent to each other in a first tilt direction in the phase pattern P26. The pair of light-focusing spots F22, F23 are formed by the light L incident on the pair of regions R22, R23, respectively. The pair of regions R22, R23 are adjacent to each other in a second tilt direction in the phase pattern P26. For example, when the first tilt direction corresponds to the first direction, the second tilt direction corresponds to the second direction.

[0175] As a modification of this embodiment, the boundary between region R21 and region R23 and the boundary between region R21 and region R24 may not be perpendicular to each other. The boundary between region R21 and region R23 may not be located on the same straight line as the boundary between region R22 and region R24. The boundary between region R21 and region R24 may not be located on the same straight line as the boundary between region R22 and region R23. In these cases, the intensity information of the focused spots F21, F22, F23, and F24 is compared in consideration of the angle formed by the intersection of the boundaries formed by regions R21, R22, R23, and R24 and each boundary, and the incident position P2 with respect to the spatial light modulation unit 3 is estimated.

[0176] Next, the effects of the processing device 1, the spatial light modulator 10, and the position estimation method will be described.

[0177] In the spatial light modulator 10, the phase pattern P1 set by the pattern setting unit 31 includes a phase pattern P20 for estimating the incident position. The phase pattern P20 is configured to form multiple focused spots on the intensity detection unit 22 by the light L modulated in the spatial light modulator 3. The estimation unit 35 estimates the incident position P2 of the light L relative to the spatial light modulator 3 based on the comparison result of the intensity information of the multiple focused spots. The incident position P2 of the light L in the phase pattern P1 can be easily estimated based on the comparison result of the intensity information of the multiple focused spots. Therefore, in the spatial light modulator 10, the incident position P2 of the light L relative to the spatial light modulator 3 can be easily estimated.

[0178] 14(a) and 14(b) show the relationship between the processing phase pattern P10 and the image captured by the imaging device 19. In FIGS. 14(a) and 14(b), the range D101 captured by the imaging device 19 corresponds to the range V101 in the spatial light modulation unit 3. The range D101 corresponds to the imaging plane, and the range V101 corresponds to the field of view range. In FIGS. 14(a) and 14(b), light is appropriately incident on the phase pattern P10 displayed on the display unit 13, and an image F101 is formed on the imaging device 19 by the phase pattern P10.

[0179] 14(c) and 14(d) show the relationship between the phase pattern P20 for estimating the incident position and the intensity information acquired by the intensity detection unit 22. In FIGS. 14(c) and 14(d), the range D1 from which the intensity detection unit 22 can acquire intensity information corresponds to the range V1 in the spatial light modulation unit 3. If the intensity detection unit 22 is an imaging device, the range D1 corresponds to the imaging plane, and the range V1 corresponds to the field of view range. In FIGS. 14(c) and 14(d), light is appropriately incident on the phase pattern P20 displayed on the display unit 13, and the phase pattern P20 forms focused spots F1 and F2 on the intensity detection unit 22.

[0180] In FIG. 14(a), the range V101 matches and appropriately corresponds to the range in which the display unit 13 displays the phase pattern P10. In FIG. 14(c), the range V1 also matches and appropriately corresponds to the range in which the display unit 13 displays the phase pattern P20. In FIG. 14(b), the range V101 is shifted from the range in which the display unit 13 displays the phase pattern P10. The state shown in FIG. 14(b) can occur, for example, when the spatial light modulation unit 3, the image capture device 19, or an optical system located between the image capture device 19 and the spatial light modulation unit 3 is displaced due to external factors such as vibration or a change in ambient temperature. In FIG. 14(d), the range V1 also deviates from the range in which the display unit 13 displays the phase pattern P20. The state shown in Figure 14(d) can occur, for example, when the spatial light modulation unit 3, the intensity detection unit 22, or the optical system located between the intensity detection unit 22 and the spatial light modulation unit 3 is displaced due to external factors such as vibration or changes in environmental temperature.

[0181] 14(b), the image F101 is shifted in the direction γ with respect to the range D101, even though the incident position of light with respect to the spatial light modulation unit 3 does not change between FIG. 14(a) and FIG. 14(b). In this way, there is no correlation between the movement of the image in the imaging device 19 and the movement of the incident position of light with respect to the spatial light modulation unit 3. For this reason, even if the spatial light modulation unit 3 and the imaging device 19 have been calibrated in the state shown in FIG. 14(a), the incident position P2 of light L with respect to the spatial light modulation unit 3 cannot be estimated from the movement of the image F101 captured by the imaging device 19.

[0182] 14(d), the light-focusing spots F1 and F2 are shifted in the direction γ2 with respect to the range D1, even though the incident position of light with respect to the spatial light modulation unit 3 does not change between FIG. 14(c) and FIG. 14(d). In this way, there is no correlation between the movement of the light-focusing spots on the intensity detection unit 22 and the movement of the incident position of light with respect to the spatial light modulation unit 3. For this reason, even if the spatial light modulation unit 3 and the intensity detection unit 22 have been calibrated in the state shown in FIG. 14(c), the incident position P2 of light L with respect to the spatial light modulation unit 3 cannot be estimated from the movement of the light-focusing spots F1 and F2 detected by the intensity detection unit 22.

[0183] In regard to the above points, the estimation unit 35 estimates the incident position P2 of light with respect to the spatial light modulation unit 3 based on the comparison result of the intensity information of the plurality of focused spots detected by the intensity detection unit 22. When the phase pattern P20 for incident position estimation is used, a plurality of focused spots can be formed on the intensity detection unit 22.

[0184] For example, when the phase pattern P20 for estimating the incident position is used as shown in FIGS. 14(c) and 14(d), the estimation unit 35 can estimate the incident position of light with respect to the spatial light modulation unit 3 based on the comparison result between the intensity information of the focused spot F1 and the intensity information of the focused spot F2. The ratio between the intensity of the focused spot F1 and the intensity of the focused spot F2 does not change between the state shown in FIG. 14(c) and the state shown in FIG. 14(d). Therefore, when the phase pattern P20 is used, the estimation unit 35 can estimate that the incident position of light with respect to the spatial light modulation unit 3 has not changed in FIG. 14(d) based on the comparison result between the intensity information of the focused spot F1 and the intensity information of the focused spot F2. Therefore, the spatial light modulation device 10 can easily and accurately estimate the incident position P2 of light L with respect to the spatial light modulation unit 3 without calibrating the spatial light modulation unit 3, the intensity detection unit 22, and other optical systems.

[0185] Since the incident position P2 of the light L on the spatial light modulation unit 3 can be easily estimated, it is possible to prevent the laser light from being unintentionally irradiated onto other optical elements of the processing device 1 due to deviation of the laser light. As a result, it is possible to prevent damage to other optical elements of the processing device 1. Furthermore, the spatial light modulation device 10 can achieve both adjustment of the phase pattern P1 and estimation of the incident position P2 even without an imaging device 19 that images the NFP.

[0186] The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on the positional relationship between the phase pattern P20 and the light incident on the phase pattern P20, where the intensities of at least two of the multiple light-focusing spots are equal to each other. This makes it possible to estimate the incident position P2 of the light L with respect to the spatial light modulation unit 3 more accurately.

[0187] The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on a comparison result between intensity information of a pair of focused spots formed by the light L incident on a pair of adjacent regions in the first direction in the phase pattern P20 and a comparison result between intensity information of a pair of focused spots formed by the light L incident on a pair of adjacent regions in the second direction in the phase pattern P20. The second direction intersects with the first direction. In this case, the incident position P2 of the light L with respect to the spatial light modulation unit 3 can be estimated in both the first direction and the second direction. As a result, the incident position P2 of the light L with respect to the spatial light modulation unit 3 can be estimated more accurately.

[0188] The position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 based on the intensity information of the focused spots. After the position adjustment unit 34 adjusts the positional relationship, the intensity detection unit 22 further detects intensity information of multiple focused spots. The estimation unit 35 estimates the incident position P2 of the light L with respect to the spatial light modulation unit 3 based on a comparison result of the intensity information of the multiple focused spots detected after the positional relationship has been adjusted. In this case, the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 can be further adjusted using the intensity information after the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 has been adjusted. Therefore, the positional relationship can be adjusted more easily and accurately.

[0189] In adjusting the positional relationship between the phase pattern P20 and the light incident on the phase pattern P20, the position adjustment unit 34 performs at least one of changing the phase pattern P20 displayed on the spatial light modulation unit 3 and changing the optical axis position of the light incident on the phase pattern P20. In this case, the positional relationship between the phase pattern P20 and the light incident on the phase pattern P20 can be adjusted more easily.

[0190] The position adjustment unit 34 may adjust the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20, based on the intensity information of the plurality of light-focusing spots, so that the value of the intensity ratio of the plurality of light-focusing spots approaches 1. In this case, the incident position P2 of the light L with respect to the spatial light modulation unit 3 can be estimated more easily and accurately.

[0191] The pattern setting unit 31 sets a plurality of phase patterns P20 having different configurations as the phase pattern P20 configured to form a plurality of focused spots on the intensity detection unit 22. The spatial light modulation unit 3 sequentially displays the plurality of phase patterns P20. The estimation unit 35 estimates the incident position P2 of the light L on the spatial light modulation unit 3 based on intensity information of the focused spots formed by each of the plurality of phase patterns P20. In this case, the positional relationship between the light incident on the phase pattern P20 and the phase pattern P20 can be adjusted more easily and accurately.

[0192] Each of the multiple phase patterns P20 includes multiple types of subpatterns. The multiple types of subpatterns are located in different regions of the phase pattern P20 and form different focused spots. The multiple phase patterns P20 differ from one another in the arrangement of the regions in which the multiple types of subpatterns are located. In this case, the intensity information of each focused spot may differ for each phase pattern P20. This makes it easier to estimate the incident position P2 of the incident light in the phase pattern P20. This makes it even easier to estimate the incident position P2 of the light L in the spatial light modulation unit 3.

[0193] The intensity detection unit 22 may include an imaging device that acquires a captured image of the light-focusing spots formed in the imaging region. The captured image may include intensity information and position information of the light-focusing spots. In this case, the estimation unit 35 estimates the incident position P2 of the light L in the spatial light modulation unit 3 based on the intensity information and position information of the light-focusing spots included in the captured image. The intensity information of the light-focusing spots can be easily classified based on the position information of the light-focusing spots in the captured image. This makes it even easier to estimate the incident position P2 of the incident light in the phase pattern P20.

[0194] The processing apparatus 1 includes the spatial light modulator 10 described above and a processing unit 5. The processing unit 5 irradiates the workpiece S with light L modulated by the spatial light modulator 3. In this case, by estimating the incident position P2 of the light L with respect to the spatial light modulator 3, it is possible to suppress deviation between the light incident on the phase pattern P20 and the phase pattern P20. According to the processing apparatus 1, the light L modulated by the spatial light modulator 3 is guided not only to the intensity detection unit 22 but also to the workpiece S, so that the workpiece S can be processed more accurately by the light L modulated by the phase pattern.

[0195] The pattern setting unit 31 sets at least one of a phase pattern P20 for estimating the incident position and a phase pattern P10 for machining as the phase pattern P1 to be displayed on the spatial light modulation unit 3. The phase pattern P20 is used to estimate the incident position. The phase pattern P10 is used to machine the workpiece S by the machining unit 5. In this case, after the incident position P2 of the light L with respect to the spatial light modulation unit 3 is estimated by the phase pattern P20, the workpiece S can be machined by the phase pattern P10. Therefore, the workpiece S can be machined in a state in which the deviation between the light incident on the phase pattern P10 and the phase pattern P10 is suppressed.

[0196] The above describes embodiments and modifications of the present invention, but the present invention is not necessarily limited to the above-described embodiments, and various modifications are possible without departing from the spirit of the present invention.

[0197] For example, in the above-described embodiment and modified examples, the spatial light modulator 10 is provided in the processing apparatus 1. However, the spatial light modulator 10 may be configured as a separate unit from the processing apparatus 1.

[0198] The processing apparatus 1 is provided with an imaging device 19 that captures an image of the NFP. However, even if the processing apparatus 1 does not include the imaging device 19, the problem that the present invention is intended to solve can be solved. [Explanation of symbols]

[0199] 1... processing device, 3... spatial light modulation unit, 5... processing unit, 7... detection unit, 10... spatial light modulation device, 22... intensity detection unit, P1, P10, P20, P21, P22, P25, P26... phase pattern, 31... pattern setting unit, 34... position adjustment unit, 35... estimation unit, F1, F2, F3, F4, F11, F12, F13, F14, F21, F22, F23, F24... focused spot, L... light, P2... incident position, PS1, PS2, PS3, PS4, PS11, PS12, PS13, PS14, PS21, PS22, PS23, PS24... sub-pattern, R1, R2, R3, R4, R11, R12, R13, R14, R21, R22, R23, R24... area, S... workpiece

Claims

1. a spatial light modulation unit that displays a phase pattern for modulating incident light and modulates the light using the phase pattern; a pattern setting unit that sets the phase pattern to be displayed on the spatial light modulation unit; a detection unit that detects light modulated by the spatial light modulation unit; an estimation unit that estimates an incident position of the light with respect to the spatial light modulation unit based on a detection result by the detection unit, the phase pattern set by the pattern setting unit includes a phase pattern configured to form a plurality of focused spots on the detection unit by light modulated in the phase pattern, the detection unit detects intensity information of the focused spot, The estimation unit estimates an incident position of the light with respect to the spatial light modulation unit based on a comparison result of intensity information of the plurality of focused spots detected by the detection unit.

2. 2. The spatial light modulation device according to claim 1, wherein the estimation unit estimates the incident position of the light with respect to the spatial light modulation unit based on a positional relationship between the phase pattern and the incident light on the phase pattern, such that the intensities of at least two of the plurality of focused spots are equal to each other.

3. the estimation unit estimates an incident position of the light with respect to the spatial light modulation unit based on a comparison result of intensity information of a pair of the light-focusing spots formed by light respectively incident on a pair of regions adjacent to each other in a first direction in the phase pattern and a comparison result of intensity information of a pair of the light-focusing spots formed by light respectively incident on a pair of regions adjacent to each other in a second direction in the phase pattern, The spatial light modulator according to claim 1 , wherein the first direction and the second direction intersect with each other.

4. a position adjusting unit that adjusts a positional relationship between the phase pattern and the light incident on the phase pattern based on the intensity information of the focused spot, the detection unit further detects the intensity information of the plurality of focused spots after the positional relationship has been adjusted by the position adjustment unit; 4. The spatial light modulation device according to claim 1, wherein the estimation unit estimates the incident position of the light relative to the spatial light modulation unit based on a comparison result of intensity information of the plurality of focused spots detected after the positional relationship is adjusted.

5. The spatial light modulation device according to claim 4 , wherein the position adjustment unit, in adjusting the positional relationship, performs at least one of changing the phase pattern displayed on the spatial light modulation unit and changing the optical axis position of light incident on the phase pattern.

6. a position adjusting unit that adjusts a positional relationship between the phase pattern and the light incident on the phase pattern based on the intensity information of the focused spot, 4. The spatial light modulation device according to claim 1, wherein the position adjustment unit, in adjusting the positional relationship, performs at least one of changing the phase pattern displayed on the spatial light modulation unit and changing the optical axis position of light incident on the phase pattern.

7. 6. The spatial light modulation device according to claim 4, wherein the position adjustment unit adjusts the positional relationship based on the intensity information of the plurality of focused spots so that a value of an intensity ratio between a pair of the plurality of focused spots approaches 1.

8. the pattern setting unit sets a plurality of phase patterns having different configurations as the phase pattern configured to form the plurality of focused spots on the detection unit, the spatial light modulation unit sequentially displays the plurality of phase patterns; 8. The spatial light modulation device according to claim 1, wherein the estimation unit estimates an incident position of the light in the spatial light modulation unit based on the intensity information of the focused spots formed by each of the plurality of phase patterns.

9. each of the plurality of phase patterns includes a plurality of types of sub-patterns that are located in different regions of the phase pattern and form different focused spots, The spatial light modulation device according to claim 8 , wherein the plurality of phase patterns differ from each other in the arrangement of regions in which the plurality of types of sub-patterns are located.

10. the detection unit includes an imaging device that acquires an image of the focused spot formed in an imaging area, the captured image includes intensity information of the focused spot and position information of the focused spot, 10. The spatial light modulation device according to claim 1, wherein the estimation unit estimates the incident position of the light in the spatial light modulation unit based on intensity information of the focused spot and position information of the focused spot included in the captured image.

11. A spatial light modulator according to any one of claims 1 to 10; a processing unit that irradiates a workpiece with the light modulated by the spatial light modulation unit.

12. 12. The processing device according to claim 11, wherein the pattern setting unit sets, as the phase pattern to be displayed on the spatial light modulation unit, at least one of a phase pattern for incident position estimation used to estimate the incident position and a phase pattern for processing used to process the workpiece by the processing unit.

13. a spatial light modulation unit that modulates incident light, and displays a phase pattern configured to form a plurality of focused spots in response to the incidence of the light; Incidentally, light is incident on the phase pattern; Detecting intensity information of the plurality of focused spots formed by the incidence of light; comparing the intensity information of the detected focused spots; and estimating an incident position of the light with respect to the spatial light modulation unit based on a comparison result of intensity information of the plurality of focused spots.

Images