Apparatus and method for printing and dyeing textiles based on electron beam irradiation

The electron beam irradiation-based textile printing and dyeing method forms covalent bonds between antibacterial agents and cotton fabric molecules, addressing the peeling issue and maintaining efficacy even after multiple washes, thus preventing skin adherence and environmental contamination.

JP7768611B2Active Publication Date: 2025-11-12SHENGZHOU SUNRISE NEW MATERIAL RES INST CO LTD
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Patent Information

Application Number
JP2024565351
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2023-02-15
Filing Date
2024-02-03
Publication Date
2025-11-12
Estimated Expiration
2044-02-03

AI Technical Summary

Technical Problem

Existing technologies have not effectively addressed the issue of antibacterial agents peeling off during normal use or multiple washes, and the antibacterial agents are easily peeled off during normal use or multiple washes, and the antibacterial agents are easily peeled off during antibacterial agents are easily peeled off during normal use or multiple washes, posing risks such as contamination.

Method used

A textile printing and dyeing finishing apparatus and method based on electron beam irradiation that forms a covalent bond between the antibacterial agent and the cotton fabric molecules, using an electron beam grafting method to prevent peeling, with a reaction time of 0.1 seconds and low energy consumption.

Benefits of technology

The antibacterial agent remains effective on the fabric for approximately 94-98% after 150 washes and 92% after 300 washes, preventing skin adherence and environmental contamination, while maintaining high efficiency and low energy consumption.

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Abstract

The present invention discloses a textile printing and dyeing finishing apparatus and method based on electron beam irradiation. The apparatus includes a fabric storage device and a padding mangle device, and further includes an electron beam generator and an electron beam downstream transmission device. Both the electron beam generator and the electron beam downstream transmission device are provided on a concrete frame. An irradiation chamber and a film chamber are provided in the concrete frame. The electron beam downstream transmission device is located in the irradiation chamber. The fabric after printing and dyeing enters the irradiation chamber via the fabric storage device and the padding mangle device. Then, when the electron beam generator irradiates the fabric with an electron beam, a covalent bond is formed and adheres to the surface of the fabric. The method further includes that after the fabric is conveyed via the fabric storage device to the edge unfolding centering device, it is conveyed to the padding mangle device for impregnation and mangling, and subsequently, when irradiated by the electron beam generator, a covalent bond is formed and adheres to the surface of the fabric. Since the present invention can prevent the antibacterial agent from peeling off, it effectively avoids the situation where the antibacterial agent adheres to the surface of the skin and destroys the normal colony after peeling off. In addition, the irradiation time is short, the energy consumption is low, and the efficiency is high.
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Citation Information

Patent Citations

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  • Antimicrobial fabrics utilizing graft copolymers

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