Plasma equipment for powder surface treatment using a flat filter electrode

Abstract

The plasma device for powder surface treatment according to the present invention is flat and has a porous filter electrode that is stacked to maximize the treatment capacity at one time, thereby improving treatment efficiency. Furthermore, by adsorbing powder onto the surface of the filter electrode using an adsorption means and applying vibration to the filter electrode using a vibration generator, the powder is uniformly dispersed and mixed on the surface of the filter electrode, thereby achieving uniform surface treatment of the powder.

Description

[Technical Field]

[0001] The present invention relates to a plasma device for powder surface treatment using a flat filter electrode, and more particularly to a plasma device for powder surface treatment that can perform more uniform surface treatment by dispersing and adsorbing nano- or micro-sized powder on a porous flat filter electrode. [Background technology]

[0002] Generally, carbon nanopowder materials such as carbon nanotubes and graphene tend to aggregate together despite their excellent physical properties, so in order to commercialize them, dispersion technology that allows them to be mixed uniformly with the base material or solvent is essential.

[0003] Conventional dispersion techniques are classified into mechanical methods such as milling, wet methods using chemical reactions, and dry methods using plasma.

[0004] Mechanical and wet methods have problems such as complicated processes, long processing times, damage to materials, residual impurities, and generation of wastewater.

[0005] On the other hand, the dry plasma method is a preferred method when considering mass production and environmental friendliness, but in order to perform plasma surface treatment on carbon nanopowder, it is necessary to use equipment such as a rotating or stirring device to mix the carbon nanopowder uniformly.As the powder size becomes smaller, it becomes increasingly difficult to achieve uniform surface treatment, and the efficiency of functionalization is low and the treatment time is long.

[0006] Recently, dry methods have been adopted to mix powder uniformly using mechanical methods such as rotation and stirring, but this poses the problem of how difficult it is to uniformly and efficiently plasma treat the large amount of powder floating in the chamber. Summary of the Invention [Problem to be solved by the invention]

[0007] SUMMARY OF THE INVENTION The object of the present invention is to provide a plasma device for powder surface treatment using a flat filter electrode that can uniformly treat nanopowder, shorten the treatment time, and improve the treatment capacity. [Means for solving the problem]

[0008] According to one aspect of the present invention, a plasma device for powder surface treatment using a flat filter electrode includes: a chamber forming a space in which plasma is generated; a flat, porous filter electrode disposed within the chamber, which generates plasma when power is applied to the filter electrode, thereby functionalizing the surface of the powder by treating it; adsorption means for reducing the internal pressure of the filter electrode to adsorb the powder onto the surface of the filter electrode; and a vibration generator disposed in either the chamber or the filter electrode, which applies vibrations to the filter electrode in at least one of a vertical direction and a horizontal direction to disperse the powder on the surface of the filter electrode.

[0009] The filter electrodes are stacked to form spaces between each other, and the filter electrodes further include a powder injector disposed at each space to supply the powder to the spaces so that the powder is adsorbed on the upper and lower surfaces of the filter electrodes.

[0010] The filter electrodes are stacked to form spaces between each other, and further include a powder injector that is movable along the spaces and supplies the powder to the spaces in succession so that the powder is adsorbed on the upper and lower surfaces of the filter electrodes.

[0011] The filter electrode assembly may further include a rack provided inside the chamber and configured to receive the filter electrodes, and a shock absorbing member provided between the rack and the filter electrodes to absorb shock when the filter electrodes vibrate.

[0012] The adsorption means includes a vacuum pump that sucks air from the lower part of each of the plurality of filter electrodes to create a vacuum inside each of the filter electrodes, and a vacuum flow path that connects the vacuum pump to the lower part of each of the plurality of filter electrodes.

[0013] The suction means includes a vacuum pump that sucks air from inside the filter electrode to create a vacuum inside the filter electrode.

[0014] The filter electrode includes an upper filter part forming an upper surface and having a porous structure, a lower filter part forming a lower surface and having a porous structure, and a vacuum part formed between the upper filter part and the lower filter part and evacuated by the vacuum pump.

[0015] The filter electrodes are stacked vertically with a plurality of filter electrodes spaced apart from one another, and the filter electrodes further include a powder injector for supplying the powder into the spaces between the filter electrodes.

[0016] The vibration generator includes an acoustic vibration module that generates and resonates sound and applies acoustic vibrations.

[0017] The vibration generator includes an ultrasonic vibrator that generates ultrasonic waves to apply vibrations.

[0018] The powder includes nano- or micro-sized powder.

[0019] According to another aspect of the present invention, a plasma device for surface treating powder using a flat filter electrode includes: a chamber forming a space in which plasma is generated; a flat, porous filter electrode disposed within the chamber, which generates plasma when power is applied to the filter electrode, thereby functionalizing the surface of the powder by surface treating it; adsorption means for reducing the internal pressure of the filter electrode to adsorb the powder onto the surface of the filter electrode; and a vibration generator disposed in either the chamber or the filter electrode, which applies vibrations to the filter electrode in at least one of a vertical direction and a horizontal direction to disperse the powder on the surface of the filter electrode; wherein the filter electrodes are stacked with a space between them, and the adsorption means includes a vacuum pump that draws air from within the filter electrodes to create a vacuum inside each of the filter electrodes, and a vacuum channel connecting the vacuum pump to the filter electrodes; and the vibration generator includes an ultrasonic vibrator disposed in each filter electrode to generate and vibrate ultrasonic waves.

[0020] The powder includes nano- or micro-sized powder.

[0021] According to another aspect of the present invention, there is provided a plasma apparatus for surface treating powder using a flat filter electrode, the apparatus comprising: a chamber forming a space in which plasma is generated; a flat, porous filter electrode disposed within the chamber, the filter electrode generating plasma when power is applied to the filter electrode, thereby functionalizing the surface of the powder by surface treating the powder; adsorption means for reducing the internal pressure of the filter electrode to adsorb the powder onto the surface of the filter electrode; and a vibration generator disposed in either the chamber or the filter electrode, the vibration generator applying vibrations to the filter electrode in at least one of a vertical direction and a horizontal direction to disperse the powder on the surface of the filter electrode; wherein the filter electrodes are stacked with a space between them, and the adsorption means includes a vacuum pump disposed in the chamber for sucking air from within the filter electrodes to create a vacuum inside each of the filter electrodes, and a vacuum channel connecting the vacuum pump to the filter electrodes; and the vibration generator includes an acoustic vibration module disposed in each filter electrode to generate acoustic vibrations by generating and resonating sound.

[0022] The powder includes nano- or micro-sized powder.

[0023] According to another aspect of the present invention, a plasma device for powder surface treatment using a flat filter electrode includes: a flat filter electrode having a porous structure, which generates plasma when power is applied to treat and functionalize the surface of nano- or micro-sized powder; a vibration generator that applies vibration to the filter electrode to vibrate and disperse the powder on the surface of the filter electrode; and adsorption means that reduces the internal pressure of the filter electrode to prevent the vibration-dispersed powder from escaping from the filter electrode, thereby adsorbing the powder to the surface of the filter electrode.

[0024] The vibration generator includes at least one of an ultrasonic vibrator that generates ultrasonic waves to apply vibrations, and an acoustic vibration module that generates sound, resonates it, and applies acoustic vibrations.

[0025] The suction means includes a vacuum pump that sucks air from inside the filter electrode to create a vacuum inside the filter electrode.

[0026] The filter electrodes are stacked and arranged with a plurality of electrodes spaced apart from each other.

[0027] According to another aspect of the present invention, a plasma device for surface treating powder using a flat filter electrode includes: a filter electrode formed of a flat plate having a porous structure, which generates plasma when power is applied to treat and functionalize the surface of powder; a ground electrode formed of a flat plate corresponding to the filter electrode and grounded, which is stacked and spaced apart from the filter electrode in the vertical direction; and adsorption means for reducing the internal pressure of one of the filter electrode and the ground electrode to adsorb the powder to a surface of one of the filter electrode and the ground electrode.

[0028] A plurality of the filter electrodes are stacked to have a space therebetween, and a plurality of the ground electrodes are stacked alternately with the filter electrodes.

[0029] The device further includes a vibration generator that applies vibration to one of the filter electrode and the ground electrode to vibrate and disperse the powder on the surface of the one of the filter electrode and the ground electrode.

[0030] The vibration generator includes at least one of an ultrasonic vibrator that generates ultrasonic waves to apply vibrations, and an acoustic vibration module that generates sound, resonates it, and applies acoustic vibrations.

[0031] The suction means includes a vacuum pump that sucks air from either the filter electrode or the ground electrode to create a vacuum inside the electrode. [Effects of the Invention]

[0032] The plasma device for powder treatment according to the present invention is flat and has a plurality of porous filter electrodes stacked on top of each other, thereby maximizing the treatment capacity that can be treated at one time and improving treatment efficiency.

[0033] In addition, by adsorbing the powder onto the surface of the filter electrode using an adsorption means and then vibrating the filter electrode using a vibration generator, the powder is uniformly dispersed and mixed on the surface of the filter electrode, thereby enabling the powder to be uniformly surface-treated. [Brief explanation of the drawings]

[0034] [Figure 1] 1 is a schematic diagram illustrating a configuration of a plasma device for powder surface treatment using a flat filter electrode according to a first embodiment of the present invention. [Figure 2] FIG. 2 is a side view showing the flat filter electrode shown in FIG. 1. [Figure 3] FIG. 2 is a perspective view showing the flat filter electrode shown in FIG. 1. [Figure 4] FIG. 4 is a cross-sectional view showing a filter electrode according to a second embodiment of the present invention. [Figure 5] 10 is a schematic view of a plasma device for powder surface treatment using a flat filter electrode according to a third embodiment of the present invention. [Figure 6] 10 is a schematic view of a plasma device for powder surface treatment using a flat filter electrode according to a fourth embodiment of the present invention. [Figure 7] 10 is a schematic view of a plasma device for powder surface treatment using a flat filter electrode according to a fifth embodiment of the present invention. [Figure 8] 10 is a schematic view of a plasma device for powder surface treatment using a flat filter electrode according to a sixth embodiment of the present invention. [Figure 9] 10 is a schematic view of a plasma device for powder surface treatment using a flat filter electrode according to a seventh embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0035] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

[0036] Fig. 1 is a schematic diagram illustrating a plasma device for powder surface treatment using a flat-plate filter electrode according to an embodiment of the present invention. Fig. 2 is a side view of the flat-plate filter electrode shown in Fig. 1. Fig. 3 is a perspective view of the flat-plate filter electrode shown in Fig. 1.

[0037] 1 to 3, a plasma apparatus for powder surface treatment using a flat filter electrode according to an embodiment of the present invention includes a chamber 10, a filter electrode 20, an adsorption means 30, and a vibration generator.

[0038] The chamber 10 accommodates the plurality of filter electrodes 20 and defines a space in which plasma is generated.

[0039] A power supply (not shown) and a gas supply unit (not shown) for supplying an external gas are connected to the chamber 10. The chamber 10 is grounded and serves as a ground electrode.

[0040] A rack 25 into which the plurality of filter electrodes 20 are inserted is provided inside the chamber 10. However, without being limited thereto, the plurality of filter electrodes 20 may be stacked vertically at a predetermined distance from each other without using the rack 25.

[0041] The rack 25 may be fixed inside the chamber 10, or may be retractable from the chamber 10, and may be retracted again after the filter electrodes 20 are inserted therein.

[0042] The filter electrode 20 is a power electrode to which power is applied from the power supply (not shown). When power is applied from the power supply (not shown) and gas is supplied to the chamber 10 from the gas supply unit (not shown), the filter electrode 20 generates plasma within the chamber 10. In this embodiment, a single filter electrode 20 is used to utilize radio frequency (RF) plasma discharge, and RF power is applied to the filter electrode 20. However, the present invention is not limited to this. AC plasma discharge or DC plasma discharge is also possible. The filter electrode 20 may be configured as a first electrode and include a second electrode having a potential difference from the first electrode. The filter electrode 20 may be used as a second electrode by grounding its periphery. In the case of AC plasma discharge, each electrode is covered with a dielectric.

[0043] The plasma generated in the filter electrode 20 functions by surface treating the powder. The surface functionalization of the powder disperses the powder particles to prevent aggregation without deteriorating their existing physical properties, and can improve the interfacial bonding strength between the powder and different materials.

[0044] The filter electrode 20 is formed in a flat plate shape so that powder can be placed on the upper surface. The filter electrode 20 is described as having a rectangular plate shape, but is not limited thereto and may have a circular plate shape.

[0045] The filter electrodes 20 are stacked vertically or horizontally with a gap between them. In this embodiment, ten filter electrodes 20 are inserted vertically into the rack 25. The number of stacked filter electrodes 20 can be adjusted depending on the treatment capacity.

[0046] The filter electrodes 20 are each formed to have a porous structure.

[0047] The filter electrode 20 includes a filter part 20a made of a porous body or a porous mesh, and a vacuum part 20b formed below the filter part 20a and evacuated by a vacuum pump 32 (described later). The filter electrode 20 may be formed so that only the upper surface thereof has a porous structure.

[0048] The filter part 20a is preferably processed to a nano- or micro-unit size, and the holes are formed smaller than the size of the powder, or the filter part 20a is provided with a nano-nonwoven fabric so that the powder cannot pass through.

[0049] The adsorption means 30 is a device for reducing the internal pressure of the filter electrode 20 to adsorb the powder onto the surface of the filter electrode 20 .

[0050] The adsorption means 30 includes a vacuum pump 32, a vacuum passage 33, and a powder blocking section (not shown) for filtering the powder.

[0051] The vacuum pump 32 is installed outside the chamber 10 and sucks air from the inside of the plurality of filter electrodes 20 to create a vacuum state inside the plurality of filter electrodes 20 .

[0052] The vacuum flow path 33 is a flow path connecting the vacuum pump 32 and the lower portions of the plurality of filter electrodes 20. One end of the vacuum flow path 33 is connected to the lower portions of the plurality of filter electrodes 20, and the other end is connected to the vacuum pump 32. The vacuum flow path 33 is connected to the vacuum portion 20b of the filter electrode 20.

[0053] However, the present invention is not limited thereto, and the vacuum pump 32 may be provided below each of the filter electrodes 20 or on the rack 25 .

[0054] The vibration generator applies vibration to the filter electrode 20 in at least one of a vertical direction and a horizontal direction to disperse the powder on the surface of the filter electrode 20. That is, the vibration generator generates vibrations that have a striking effect on the lower part of the filter electrode 20 to disperse the powder.

[0055] The vibration generator may be an acoustic vibration module (not shown) or an ultrasonic vibrator 40 .

[0056] The acoustic vibration module (not shown) is an acoustic resonance vibrator that generates and resonates sound to generate acoustic vibrations in the filter electrode 20. The acoustic vibration module may be attached to the filter electrode 20 or may be provided on the rack 25.

[0057] Hereinafter, with reference to FIG. 3, the present embodiment will be described using the ultrasonic vibrator as an example.

[0058] The ultrasonic vibrators 40 are provided on the filter electrodes 20, respectively, and generate ultrasonic waves and vibrations when power is applied from the power supply (not shown).

[0059] The ultrasonic vibrators 40 are described as being attached to each lower part of the filter electrode 20. A plurality of ultrasonic vibrators 40 are attached at predetermined intervals. In the present embodiment, three ultrasonic vibrators 40 are described as being provided at the lower center of the filter electrode 20. The ultrasonic vibrators 40 apply vibrations to the lower center of the filter electrode 20, thereby dispersing the powder on the surface of the filter electrode 20 from the center to the edges.

[0060] In this embodiment, the ultrasonic vibrator 40 is attached to the lower surface of the vacuum portion 20b of the filter electrode 20 as an example, but this is not limited thereto, and the ultrasonic vibrator 40 may be installed at a predetermined distance from the filter electrode 20.

[0061] The ultrasonic vibrator 40 may also be provided on the rack 25 to apply vibration to the rack 25 and vibrate the plurality of filter electrodes 20 .

[0062] Meanwhile, the powder includes nano- or micro-sized powder such as carbon nanotube, graphene, etc.

[0063] The operation of the plasma device according to the embodiment of the present invention configured as above will now be described.

[0064] After powder is placed on the upper surface of each of the plurality of filter electrodes 20, the filter electrodes 20 are inserted into the rack 25 and arranged in a stack.

[0065] In this embodiment, the plurality of filter electrodes 20 are stacked by being inserted into the rack 25, but this is not limited to this. It is also possible to stack the plurality of filter electrodes 20 at a predetermined distance from each other without using the rack 25.

[0066] Furthermore, without being limited to the above embodiment, it is also possible to supply powder to the plurality of filter electrodes 20 installed inside the chamber 10.

[0067] When the vacuum pump 32 is operated, the internal pressure of the vacuum portion 20b of the filter electrode 20 is reduced by the suction pressure of the vacuum pump 32.

[0068] When the inside of the vacuum portion 20b of the filter electrode 20 is in a vacuum state, the powder is adsorbed onto the surface of the filter electrode 20. That is, an adsorption force (A) acts on the powder in a direction toward the surface of the filter electrode 20.

[0069] Furthermore, when the ultrasonic vibrator 40 is activated, the ultrasonic vibrator 40 applies vibration to the filter electrode 20 .

[0070] When vibration is applied to the lower part of the filter electrode 20, the powder is uniformly dispersed while changing its position on the upper surface of the filter electrode 20. That is, a dispersion force (B) acts on the powder in a direction that repels it from the surface of the filter electrode 20.

[0071] In this case, the adsorption force (A) and the dispersion force (B) can be adjusted by the suction force of the vacuum pump 30 and the vibration strength of the ultrasonic vibrator 40. The optimal values ​​of the adsorption force (A) and the dispersion force (B) can be calculated through experiments, etc. By appropriately adjusting the adsorption force (A) and the dispersion force (B), the powder can only move relative to each other without flying off the surface of the filter electrode 20, and the entire powder can be uniformly plasma surface treated.

[0072] In addition, the accumulation of powder on the surface of the filter electrode 20 is prevented from exceeding a certain thickness.

[0073] In addition, by using the ultrasonic vibrator 40 to strike the filter electrode 20, it is not necessary to repeat the process of completely removing and dispersing the powder on the surface of the filter electrode 20, thereby shortening the processing time.

[0074] Therefore, the powder can be moved while being adsorbed on the surface of the filter electrode 20, and is uniformly mixed, so that the powder can be uniformly surface-treated by the plasma.

[0075] The plasma surface treatment is performed for a predetermined time, after which the plasma treatment is stopped and the powder is collected.

[0076] As described above, in the present invention, powder is adsorbed and dispersed on the surfaces of the plurality of filter electrodes 20, and then the surfaces are treated with plasma.

[0077] Therefore, the capacity that can be treated at one time can be maximized depending on the number of stacked filter electrodes 20.

[0078] In addition, by appropriately adjusting the adsorption force (A) and the dispersion force (B), the powder can move relative to one another without flying off the surface of the filter electrode 20, and the entire powder can be uniformly plasma surface treated.

[0079] In addition, the above method does not require repeated processes of completely removing and dispersing the powder from the surface of the filter electrode 20, so surface treatment can be performed in one go, and the treatment time is shortened compared to the treatment volume.

[0080] Furthermore, by applying vibration to the filter electrode 20, the powder can be uniformly mixed and dispersed, which is advantageous in that uniform surface treatment can be achieved.

[0081] FIG. 4 is a cross-sectional view showing a filter electrode according to a second embodiment of the present invention.

[0082] Referring to FIG. 4, the filter electrode 220 according to the second embodiment of the present invention differs from the first embodiment in that it includes an upper filter portion 220a, a lower filter portion 220b, and a vacuum portion 220c. However, the remaining configurations and functions are similar to those of the first embodiment. Therefore, the following description will focus on the different configurations, and a detailed description of the similar configurations will be omitted.

[0083] The filter electrode 220 is formed to have a porous structure, and a plurality of filter electrodes 220 are stacked vertically with a space therebetween.

[0084] The upper filter part 220a and the lower filter part 220b are formed of a porous body or a porous mesh. The upper filter part 220a and the lower filter part 220b are preferably processed to a nano- or micro-size so that the holes are smaller than the size of the powder, or are formed with a nano-nonwoven fabric so that the powder cannot pass through.

[0085] The vacuum part 220c is formed between the upper filter part 220a and the lower filter part 220b and is evacuated by the vacuum pump 32. A vacuum channel 33 is connected to the vacuum part 220c.

[0086] When the vacuum pump 32 is operated, the vacuum pump 32 sucks the air inside the vacuum section 220c, creating a vacuum inside the vacuum section 220c.

[0087] When the inside of the vacuum part 220c is evacuated, the powder supplied to the inside of the chamber 10 or around the filter electrode 220 is adsorbed onto the surfaces of the upper filter part 220a and the lower filter part 220b.

[0088] Therefore, the powder is adsorbed on both the upper and lower surfaces of the filter electrode 220 and is subjected to plasma surface treatment, thereby increasing the plasma treatment capacity.

[0089] FIG. 5 is a schematic view showing a plasma device for powder surface treatment using a flat filter electrode according to a third embodiment of the present invention.

[0090] Referring to FIG. 5, the plasma apparatus for powder processing using a flat filter electrode according to the third embodiment of the present invention includes a chamber 310, a filter electrode 320, an adsorption means 330, and a vibration generator. However, unlike the first embodiment, the vibration generator is an acoustic vibration module 355. The remaining configurations and functions are similar, so the following description will focus on the different configurations and omit detailed descriptions of the similar configurations.

[0091] The acoustic vibration module 355 is an acoustic resonance vibrator that generates and resonates sound to generate acoustic vibrations in the filter electrode 320 .

[0092] The upper portion of the acoustic vibration module 355 is connected to the filter electrode 320 by a connecting member 352 .

[0093] In the present embodiment, the filter electrode 320 is described as being disposed as an example, but is not limited thereto, and a plurality of filter electrodes 320 may be disposed at predetermined intervals in the vertical or horizontal direction.

[0094] A vacuum channel 333 connected to a vacuum pump (not shown) is connected inside the filter electrode 320 .

[0095] In addition, a rack may be provided inside the chamber, into which the filter electrode 320 is inserted, and a shock absorbing member (not shown) may be provided between the rack and the filter electrode 320 to absorb shock when the filter electrode 320 vibrates.

[0096] FIG. 6 is a schematic view showing a plasma device for powder surface treatment using a flat filter electrode according to a fourth embodiment of the present invention.

[0097] Referring to FIG. 6, the fourth embodiment of the plasma apparatus for powder processing using a flat filter electrode according to the present invention differs from the third embodiment in that a plurality of filter electrodes 420 are arranged vertically at predetermined intervals, and each filter electrode 420 includes an upper filter portion 420a, a lower filter portion 420b, and a vacuum portion 420c. However, the remaining configurations and functions are similar, so the following description will focus on the different configurations and omit detailed description of the similar configurations.

[0098] The filter electrodes 420 are stacked vertically with a space therebetween, and the number of stacked filter electrodes 420 can be adjusted depending on the treatment capacity.

[0099] The upper filter part 420a and the lower filter part 420b are formed of a porous body or a porous mesh, and are preferably processed to a nano- or micro-size, with holes smaller than the size of the powder, so that the powder cannot pass through.

[0100] The vacuum part 420c is formed between the upper filter part 420a and the lower filter part 420b and is evacuated by the vacuum pump 432. A vacuum channel 433 is connected to the vacuum part 420c.

[0101] When the vacuum pump 432 is operated, the vacuum pump 432 sucks the air inside the vacuum section 420c, and the inside of the vacuum section 420c becomes a vacuum state.

[0102] When the inside of the vacuum part 420c is evacuated, powder supplied to the inside of the chamber 310 or around the filter electrode 420 is adsorbed onto the surfaces of the upper filter part 420a and the lower filter part 420b.

[0103] Therefore, the powder is adsorbed on both the upper and lower surfaces of the filter electrode 420 and is subjected to plasma surface treatment, thereby increasing the plasma treatment capacity.

[0104] In the above embodiment, it has been described as an example that the vacuum portions 420c of the plurality of filter electrodes 420 are brought into a vacuum state by one vacuum pump 432, but this is not limited thereto, and it is also possible that each of the vacuum portions 420c of the plurality of filter electrodes 420 is connected to a vacuum flow path and a vacuum pump.

[0105] In addition, a powder injector (not shown) for injecting and supplying powder is provided in the space between the plurality of filter electrodes 420 .

[0106] The powder injectors (not shown) may be disposed in each of the spaces between the filter electrodes 420 to inject powder into the spaces all at once, or one powder injector (not shown) may be installed to be movable in the vertical direction and move to inject powder into each of the spaces between the filter electrodes 420 successively. The powder injectors (not shown) may also inject powder into the chamber 310.

[0107] FIG. 7 is a schematic view showing a plasma device for powder surface treatment using a flat filter electrode according to a fifth embodiment of the present invention.

[0108] Referring to FIG. 7, the plasma apparatus for powder surface treatment using a flat filter electrode according to the fifth embodiment of the present invention differs from the first embodiment in that a filter electrode 520 and a ground electrode 530 are vertically spaced apart from each other, and powder is supplied between the filter electrode 520 and the ground electrode 530. Since the remaining configurations and functions are similar to those of the first embodiment, only the differences will be described in detail.

[0109] The filter electrode 520 is formed in a flat plate shape with a porous structure, and generates plasma when power is applied to the filter electrode 520, thereby surface-treating and functionalizing the powder. The power source may be any one of RF, AC, and DC plasma power sources. In this embodiment, RF power is used as an example.

[0110] The filter electrode 520 includes a filter part 520a made of a porous material or a porous mesh, and a vacuum part 520b formed under the filter part 520a and evacuated by a vacuum pump (described later). The filter electrode 520 may be formed so that only its upper surface has a porous structure.

[0111] A space is formed between the filter electrode 520 and the ground electrode 530 .

[0112] The ground electrode 530 is formed in a flat plate shape to correspond to the filter electrode 520. The ground electrode 530 may have a porous structure, or may be formed in a general flat plate shape.

[0113] An adsorption means is provided under the filter electrode 520. The adsorption means further includes a vacuum channel 540 connected to the vacuum portion 520b of the filter electrode 520, and a vacuum pump (not shown) connected to the vacuum channel 540.

[0114] A vibration generator (not shown) for vibrating and dispersing the powder is provided below each of the filter electrode 520 and the ground electrode 530. The vibration generator (not shown) may be an ultrasonic vibrator, an acoustic vibration module, or the like.

[0115] FIG. 8 is a schematic view showing a plasma device for powder surface treatment using a flat filter electrode according to a sixth embodiment of the present invention.

[0116] Referring to FIG. 8, the plasma apparatus for powder surface treatment using a flat filter electrode according to the sixth embodiment of the present invention has a filter electrode 620 and a ground electrode 630 spaced apart from each other in the vertical direction, and differs from the fifth embodiment in that an adsorption means is provided below the ground electrode 630. Since the remaining configurations and functions are similar, the differences will be mainly described in detail.

[0117] The filter electrode 620 is formed in a flat plate shape with a porous structure, and generates plasma when power is applied to the filter electrode 620, thereby surface-treating and functionalizing the powder. The power source may be any one of RF, AC, and DC plasma power sources. In this embodiment, RF power is used as an example.

[0118] A space is formed between the filter electrode 620 and the ground electrode 630 .

[0119] The ground electrode 630 is formed in a flat plate shape corresponding to the filter electrode 620. The ground electrode 630 will be described as having a porous structure, for example. The ground electrode 630 includes a porous portion 630a formed of a porous body or a porous mesh, and a vacuum portion 630b formed below the porous portion 630a and evacuated by a vacuum pump (described later). The ground electrode 630 may be formed so that only its upper surface has a porous structure.

[0120] An adsorption means is provided under the ground electrode 630. The adsorption means further includes a vacuum passage 640 connected to the vacuum 630b of the ground electrode 630, and a vacuum pump (not shown) connected to the vacuum passage 640.

[0121] A vibration generator (not shown) for vibrating and dispersing the powder is provided below the ground electrode 630. The vibration generator (not shown) may be an ultrasonic vibrator, an acoustic vibration module, or the like.

[0122] FIG. 9 is a schematic view showing a plasma device for powder surface treatment using a flat filter electrode according to a seventh embodiment of the present invention.

[0123] Referring to FIG. 9, the plasma device according to the seventh embodiment of the present invention differs from the fifth embodiment in that a plurality of filter electrodes 720 are stacked vertically at a distance from each other, and a plurality of ground electrodes 730 are stacked alternately with the filter electrodes 720. However, the remaining configurations and functions are similar, so detailed description of similarities will be omitted and differences will be mainly described in detail.

[0124] The power applied to the filter electrode 720 may be any one of RF, AC, and DC power sources. In this embodiment, the RF power source is used as an example.

[0125] As described above, when the plurality of ground electrodes 730 are alternately stacked with the plurality of filter electrodes 720, the plasma density is relatively reduced compared to when a single ground electrode is used, but the effect of ion collision is improved.

[0126] Although the present invention has been described with reference to the embodiments shown in the drawings, these are merely illustrative, and those skilled in the art will recognize that various modifications and equivalent embodiments are possible. Therefore, the true technical scope of the present invention should be determined by the technical spirit of the claims. [Industrial Applicability]

[0127] According to the present invention, it is possible to manufacture a plasma device for powder surface treatment that can perform more uniform surface treatment.

Claims

1. a filter electrode having a flat plate shape and a porous structure, which generates plasma when power is applied to the filter electrode, and functions by surface treating the powder, the filter electrode including a filter part formed of a porous mesh having holes through which the powder cannot pass, and a vacuum part formed under the filter part; a vibration generator that applies vibration to the filter electrode to vibrate and disperse the powder on the surface of the filter electrode; an adsorption means for adsorbing powder onto the surface of the filter part by making the vacuum part into a vacuum state so as to prevent the powder dispersed by the vibration from escaping from the filter electrode to the outside; A plasma device for powder surface treatment using a flat filter electrode, comprising:

2. The filter electrodes are stacked and arranged with a plurality of electrodes spaced apart from each other, 2. The plasma apparatus for powder surface treatment using a flat filter electrode according to claim 1, further comprising a powder injector disposed in each of the separated spaces and supplying the powder to the separated spaces so that the powder is adsorbed on the upper and lower surfaces of the filter electrode.

3. The filter electrodes are stacked and arranged with a plurality of electrodes spaced apart from each other, 10. The plasma apparatus for powder surface treatment using a flat filter electrode according to claim 1, further comprising a powder injector movable along the spaces and supplying the powder continuously to each space so that the powder is adsorbed on the upper and lower surfaces of the filter electrode.

4. A rack provided inside the chamber and configured to receive a plurality of filter electrodes; 2. The plasma device for powder surface treatment using a flat filter electrode according to claim 1, further comprising: a shock absorbing member disposed between the rack and the filter electrode, for absorbing a shock when the filter electrode vibrates.

5. The adsorption means is a vacuum pump that sucks air from the bottom of each of the plurality of filter electrodes to create a vacuum inside each of the filter electrodes; 3. The plasma device for powder surface treatment using a flat filter electrode according to claim 2, further comprising: a vacuum channel connecting the vacuum pump with each lower portion of the plurality of filter electrodes.

6. The adsorption means is 2. The plasma device for powder surface treatment using a flat filter electrode according to claim 1, further comprising a vacuum pump for sucking air from inside the filter electrode to create a vacuum inside the filter electrode.

7. The filter electrode is 7. The plasma device for powder surface treatment using the flat filter electrode of claim 6, comprising: an upper filter section forming an upper surface and having a porous structure; a lower filter section forming a lower surface and having a porous structure; and a vacuum section formed between the upper filter section and the lower filter section and created in a vacuum state by the vacuum pump.

8. The filter electrodes are stacked vertically so as to have a space therebetween, 8. The plasma device for powder surface treatment using a flat filter electrode according to claim 7, further comprising a powder injector for supplying the powder to the spaces between the plurality of filter electrodes.

9. The vibration generator includes:

2. A plasma device for powder surface treatment using the flat filter electrode according to claim 1, comprising an ultrasonic vibrator for generating ultrasonic waves to apply vibration.

10. The vibration generator includes:

2. The plasma device for powder surface treatment using the flat filter electrode according to claim 1, wherein the plasma device is provided in either the chamber or the filter electrode, and vibration is applied to the filter electrode in at least one of a vertical direction and a horizontal direction.

11. 2. The plasma device for powder surface treatment using a flat filter electrode according to claim 1, wherein the powder comprises nano- or micro-sized powder.

12. 10. The plasma device for powder surface treatment using the flat filter electrode according to claim 1, further comprising a ground electrode, which is stacked and spaced apart from the filter electrode in an up-down direction, and is formed as a flat plate corresponding to the filter electrode, and is grounded.

13. The filter electrodes are stacked and arranged with a plurality of electrodes spaced apart from each other, 13. The plasma device for powder surface treatment using a flat filter electrode according to claim 12, wherein a plurality of the ground electrodes are alternately stacked with the filter electrode.

14. The vibration generator includes:

13. A plasma device for powder surface treatment using the flat filter electrode according to claim 12, comprising an ultrasonic vibrator for generating ultrasonic waves to apply vibration.

15. The adsorption means is 13. The plasma device for powder surface treatment using a flat filter electrode according to claim 12, further comprising a vacuum pump configured to suck air from either the filter electrode or the ground electrode to create a vacuum inside the device.

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