Block valve for substrate processing apparatus and substrate processing apparatus

Abstract

The present invention relates to a block valve for a substrate processing apparatus and a substrate processing apparatus, which includes a valve section having an opening / closing section that contracts and expands, a drive section that drives the opening / closing section, and a block main body that includes a storage section in which the opening / closing section is housed, the block main body including a gas inlet connected to the storage section and a gas outlet connected to the storage section, and the opening / closing section opens and closes the gas inlet or the gas outlet within the storage section.

Description

[Technical Field]

[0001] The present invention relates to a substrate processing apparatus for performing processing steps such as deposition and etching on a substrate. [Background technology]

[0002] Generally, in order to manufacture solar cells, semiconductor devices, flat panel displays, etc., a predetermined thin film layer, thin film circuit pattern, or optical pattern must be formed on a substrate. To this end, substrate processing processes are performed, such as a deposition process in which a thin film of a specific material is deposited on the substrate, a photo process in which a photosensitive material is used to selectively expose the thin film, and an etching process in which the exposed portions of the thin film are selectively removed to form a pattern. These substrate processing processes are performed using substrate processing equipment.

[0003] FIG. 1 is a schematic diagram of a conventional substrate processing apparatus.

[0004] Referring to FIG. 1, a conventional substrate processing apparatus 100 includes a substrate processing section 110, a gas supply section 120, a gas block 130, and a valve section 140.

[0005] The substrate processing unit 110 performs a processing process on a substrate using the gas supplied by the gas supply unit 120 .

[0006] The gas supply unit 120 supplies gases used in the processing steps and is connected to the substrate processing unit 110 via the gas block 130 and the valve unit 140.

[0007] The gas block 130 is connected to the gas supply unit 120, the valve unit 140, and the substrate processing unit 110. The gas block 130 is connected to the gas supply unit 120 and the valve unit 140 via a supply passage 131. An inlet side of the supply passage 131 is connected to the gas supply unit 120 via a pipe, and an outlet side of the supply passage 131 is connected to the valve unit 140 via a pipe. The gas block 130 is connected to the valve unit 140 and the substrate processing unit 110 via an exhaust passage 132. An inlet side of the exhaust passage 132 is connected to the valve unit 140 via a pipe, and an outlet side of the exhaust passage 132 is connected to the substrate processing unit 110 via a pipe.

[0008] The valve unit 140 is connected to the gas block 130 via a pipe. The valve unit 140 includes an on-off passage 141 connected to each of the supply passage 131 and the discharge passage 132, a valve body 142 in which the on-off passage 141 is formed, and an on-off mechanism 143 for opening and closing the on-off passage 141.

[0009] When the opening and closing mechanism 143 opens the open / close flow path 141, the gas supplied by the gas supply unit 120 is supplied to the substrate processing unit 110 via the supply flow path 131 of the gas block 130, the open / close flow path 141 of the valve unit 140, and the exhaust flow path 132 of the gas block 130. When the opening and closing mechanism 143 closes the open / close flow path 141, the gas supplied by the gas supply unit 120 is supplied to the open / close flow path 141 of the valve unit 140 via the supply flow path 131 of the gas block 130, and then is blocked by the open / close mechanism 143, so that it is not supplied to the exhaust flow path 132 of the gas block 130. The opening and closing mechanism 143 opens and closes the open / close flow path 141 in accordance with preset process information, and the substrate processing unit 110 performs a processing process on the substrate in accordance with the process information.

[0010] As described above, the open / close flow path 141 is provided for selectively supplying gas, and the supply flow path 131 and the exhaust flow path 132 are provided for connecting the gas supply unit 120 and the substrate processing unit 110, respectively. Therefore, in the conventional substrate processing apparatus 100, selective gas supply is essentially performed by the open / close flow path 141 and the open / close mechanism 143, resulting in unnecessary dead spaces in the supply flow path 131 and the exhaust flow path 132. Therefore, in the conventional substrate processing apparatus 100, the dead spaces reduce gas flow rate, adversely affecting the substrate processing process. Furthermore, the longer the flow path connecting the gas supply unit 120 and the substrate processing unit 110, the more particles may be generated in the supply flow path 131 and the exhaust flow path 132. Furthermore, the lengths of the supply passage 131 and the exhaust passage 132, etc., become longer, which further exacerbates the problems of reduced gas fluidity, adverse effects on the substrate processing process, and the occupancy of a large amount of space above the chamber of the substrate processing unit 110. Summary of the Invention [Problem to be solved by the invention]

[0011] The present invention has been devised to solve the above-mentioned problems, and aims to provide a block valve and a substrate processing apparatus that can reduce dead space when implementing selective gas supply. [Means for solving the problem]

[0012] In order to solve the above problems, the present invention can include the following configurations.

[0013] The block valve for a substrate processing apparatus according to the present invention may include a valve unit having an opening / closing unit that contracts and expands, a drive unit that drives the opening / closing unit, and a block body including a housing unit that houses the opening / closing unit. The block body may include a gas inlet connected to the housing unit and a gas outlet connected to the housing unit. The opening / closing unit may open and close the gas inlet or the gas outlet within the housing unit.

[0014] A block valve for a substrate processing apparatus according to the present invention is a block valve for selectively supplying gas supplied from a gas supply unit to a substrate processing unit where a substrate processing process is performed, and includes a block body connected to each of the gas supply unit and the substrate processing unit, a valve unit coupled to the block body, and a drive unit for driving the valve unit. The block body may include a gas inlet connected to the gas supply unit, a gas outlet connected to the substrate processing unit, and a housing connected to each of the gas inlet and the gas outlet between the gas inlet and the gas outlet. The valve unit may include an opening / closing unit for opening and closing either the gas inlet or the gas outlet, and a valve body to which the opening / closing unit is movably coupled. The valve body may be inserted and coupled to the block body so that the opening / closing unit moves within the housing to open and close either the gas inlet or the gas outlet.

[0015] A substrate processing apparatus according to the present invention may include a chamber providing a processing space, a support for supporting at least one substrate, a gas injection unit for injecting gas toward the support, a gas supply unit for supplying gas to the gas injection unit, and block valves connected to the gas supply unit and the gas injection unit. The block valve may include a block body connected to the gas supply unit and the gas injection unit, a valve unit coupled to the block body, and a drive unit for driving the valve unit. The block body may include a gas inlet connected to the gas supply unit, a gas outlet connected to the gas injection unit, and a housing connected to the gas inlet and the gas outlet between the gas inlet and the gas outlet. The valve unit may include an opening / closing unit for opening and closing either the gas inlet or the gas outlet, and a valve body to which the opening / closing unit is movably coupled. The valve body may be inserted into and coupled to the block body so that the opening / closing unit moves within the housing to open and close either the gas inlet or the gas outlet. [Effects of the Invention]

[0016] According to the present invention, the following effects can be obtained.

[0017] The present invention is embodied to provide both a connection function between a gas supply unit and a substrate processing unit and a selective gas supply function using a block body. Therefore, the present invention can reduce the dead space of the gas passage through which gas flows within the block body, i.e., the space above the chamber. Therefore, the present invention can improve the fluidity of the gas, thereby improving the quality of the substrate after the processing process is completed.

[0018] The present invention does not include a separate flow path for gas flow within the valve unit, thereby reducing the overall size of the valve unit. Also, the present invention allows the valve unit to be inserted into the block body, thereby further reducing the overall size of the block valve. Therefore, the present invention allows the block valve to be implemented compactly, thereby reducing the area it occupies in the installation space. [Brief explanation of the drawings]

[0019] [Figure 1] FIG. 1 is a schematic diagram illustrating the configuration of a substrate processing apparatus according to the prior art. [Figure 2] 1 is a schematic configuration diagram of a substrate processing apparatus according to the present invention; [Figure 3] 1 is a schematic cross-sectional side view of a substrate processing apparatus according to the present invention; [Figure 4] 1 is a schematic cross-sectional side view of a substrate processing apparatus according to the present invention; [Figure 5] 1 is a schematic exploded side cross-sectional view of a substrate processing apparatus according to the present invention; [Figure 6] FIG. 5 is an enlarged side cross-sectional view of part A in FIG. 4. [Figure 7] 1 is a schematic side cross-sectional view showing an embodiment in which a substrate processing apparatus according to the present invention includes a connecting main body. [Figure 8] 1 is a schematic side cross-sectional view showing an embodiment of a substrate processing apparatus according to the present invention, in which a block body includes a plurality of gas outlets. DETAILED DESCRIPTION OF THE INVENTION

[0020] Hereinafter, an embodiment of a substrate processing apparatus according to the present invention will be described in detail with reference to the accompanying drawings. Since the block valve according to the present invention can be included in the substrate processing apparatus according to the present invention, the block valve will be described together with the embodiment of the substrate processing apparatus according to the present invention.

[0021] 2 and 3, a substrate processing apparatus 1 according to the present invention performs a processing process on a substrate (S). The substrate (S) may be a glass substrate, a silicon substrate, a metal substrate, or the like. The substrate processing apparatus 1 according to the present invention can perform a deposition process for depositing a thin film on the substrate (S), an etching process for removing a portion of the thin film deposited on the substrate (S), and the like. Hereinafter, the substrate processing apparatus 1 according to the present invention will be described based on an embodiment in which the deposition process is performed. However, it will be obvious to those skilled in the art to which the present invention pertains that the substrate processing apparatus 1 according to the present invention can be used in other embodiments to perform other processing processes, such as the etching process.

[0022] The substrate processing apparatus 1 according to the present invention may include a substrate processing unit 2 , a gas supply unit 3 , and a block valve 4 .

[0023] <Substrate processing section> 2, the substrate processing unit 2 performs a processing process on a substrate. The substrate processing unit 2 can perform the processing process using gas supplied from the gas supply unit 3. The substrate processing unit 2 can include a chamber 21, a support unit 22, and a gas injection unit 23.

[0024] The chamber 21 provides the processing space 21a. In the processing space 21a, processing processes such as deposition processes and etching processes can be performed on the substrate. The processing space 21a can be disposed inside the chamber 21. An exhaust port (not shown) for exhausting gas from the processing space 21a can be connected to the chamber 21. The chamber 21 can be provided with the support part 22 and the gas injection part 23.

[0025] The support part 22 supports the substrate. The support part 22 can support one substrate or multiple substrates. When multiple substrates are supported on the support part 22, processing processes can be performed on multiple substrates at once. The support part 22 can be coupled to the chamber 21. The support part 22 can be disposed inside the chamber 21.

[0026] The gas injection unit 23 injects gas toward the support unit 22. The gas injection unit 23 may be coupled to the chamber 21. The gas injection unit 23 may be disposed to face the support unit 22. The processing space 21a may be disposed between the gas injection unit 23 and the support unit 22. The gas injection unit 23 may be coupled to a lead 21b. The lead 21b is coupled to the chamber 21 to cover the upper part of the chamber 21.

[0027] <Gas supply section> Referring to FIG. 2, the gas supply unit 3 supplies gas. The gas supplied by the gas supply unit 3 is injected into the processing space 21a through the gas injection unit 23, and can be used in a processing process for the substrate. The gas supply unit 3 can supply a source gas containing a thin film material to be deposited on the substrate, a reaction gas that reacts with the source gas, and a purge gas for purging gas present in the processing space 21a. The gas supply unit 3 can include at least one storage tank (not shown) for storing gas. The gas supply unit 3 can be connected to the substrate processing unit 2 through the block valve 4. As a result, the gas supplied by the gas supply unit 3 can be supplied to the substrate processing unit 2 through the block valve 4.

[0028] <Valve section> 2 to 5, the block valve 4 selectively supplies the gas supplied by the gas supply unit 3 to the substrate processing unit 2. The block valve 4 may be embodied as the block valve 4 for a substrate processing apparatus according to the present invention. The block valve 4 may be connected to both the gas supply unit 3 and the substrate processing unit 2. In this case, the block valve 4 may be connected to the gas injection unit 23 of the substrate processing unit 2. When the block valve 4 allows gas to pass, the gas supplied by the gas supply unit 3 passes through the block valve 4 and is supplied to the substrate processing unit 2, and then injected into the processing space 21a via the gas injection unit 23. When the block valve 4 blocks gas passage, the gas supplied by the gas supply unit 3 cannot pass through the block valve 4 and is not supplied to the substrate processing unit 2. The block valve 4 may selectively pass the gas supplied by the gas supply unit 3 according to preset process information. The process information may be preset by an operator, such as a gas injection time, gas injection duration, and gas flow rate according to the processing process. The process information can be stored in a control unit (not shown). In this case, the block valve 4 can selectively pass the gas supplied by the gas supply unit 3 under the control of the control unit.

[0029] The block valve 4 may include a block body 41 , a valve portion 42 , and a drive portion 43 .

[0030] The block body 41 is connected to both the gas supply unit 3 and the substrate processing unit 2. The valve unit 42 can be coupled to the block body 41. As a result, the block body 41 functions as a gas passage for supplying gas from the gas supply unit 3 to the substrate processing unit 2, and the gas passage is selectively opened and closed by the valve unit 42. That is, the block body 41 is provided to implement both connection to both the gas supply unit 3 and the substrate processing unit 2 and selective supply of gas. Therefore, the substrate processing apparatus 1 according to the present invention can achieve the following effects.

[0031] 1, in the comparative example, a valve body 142 having an on-off flow path 141 for selectively supplying gas, and a gas block 130 having a supply flow path 131 and an exhaust flow path 132 for connecting a gas supply unit 120 and a substrate processing unit 110 are separately provided. The presence of overlapping flow paths in the two blocks results in unnecessary dead space. This dead space reduces the fluidity of the gas in the comparative example, adversely affecting the substrate processing process. Furthermore, as the length of the flow path connecting the gas supply unit 120 and the substrate processing unit 110 increases, the dead space between the supply flow path 131 and the exhaust flow path 132 increases, further exacerbating the problem of reduced gas fluidity and adversely affecting the substrate processing process.

[0032] In contrast, in the substrate processing apparatus 1 according to the present invention, the block body 41 is configured to have both a function of connecting the gas supply unit 3 and the substrate processing unit 2 and a function of selectively supplying gas. Therefore, compared to the comparative example, the substrate processing apparatus 1 according to the present invention can reduce dead space and improve gas flowability. As a result, the substrate processing apparatus 1 according to the present invention can improve the quality of substrates after processing. Furthermore, even if the length of the flow path connecting the gas supply unit 3 and the substrate processing unit 2 increases, the substrate processing apparatus 1 according to the present invention can improve its adaptability to changes in the length of the flow path connecting the gas supply unit 3 and the substrate processing unit 2 by replacing the block body 41 with a length that matches the increased length of the flow path.

[0033] The block body 41 may be coupled to the substrate processing unit 2. For example, the block body 41 may be coupled to the lead 21b. In this case, the block body 41 may be disposed at a position remote from the gas supply unit 3. The block body 41 may be connected to the gas supply unit 3 via a pipe or the like. The block body 41 may also be disposed at a position remote from the substrate processing unit 2. In this case, the block body 41 may be connected to the gas injection unit 23 via a pipe or the like.

[0034] The block body 41 may include a gas inlet 411 , a gas outlet 412 , and a receiving portion 413 .

[0035] The gas inlet 411 is connected to the gas supply unit 3. The gas inlet 411 may function as an inlet passage through which the gas supplied by the gas supply unit 3 flows in. The gas inlet 411 may be formed by drilling the block body 41.

[0036] The gas outlet 412 is connected to the substrate processing unit 2. The gas outlet 412 may function as an outlet passage through which gas flowing in through the gas inlet 411 flows out to the substrate processing unit 2. The gas outlet 412 may be formed by a drilling process on the block main body 41. The gas outlet 412 may be located on the bottom surface of the receiving unit 413. In this case, the gas inlet 411 may be located on the side surface of the receiving unit 413. The gas outlet 412 may also be located on the side surface of the receiving unit 413. In this case, the gas inlet 411 may be located on the bottom surface of the receiving unit 413.

[0037] The receiving portion 413 is connected to the gas inlet 411 and the gas outlet 412 between the gas inlet 411 and the gas outlet 412. The receiving portion 413 may function as a connection passage connecting the gas inlet 411 and the gas outlet 412. The receiving portion 413 may be formed by drilling the block body 41.

[0038] 2 to 6, the valve unit 42 opens and closes the gas inlet 411 or the gas outlet 412. FIGS. 3 to 8 show an embodiment in which the valve unit 42 is arranged to open and close the gas outlet 412, and it would be obvious to one skilled in the art to which the present invention pertains to deriving from this an embodiment in which the valve unit 42 is arranged to open and close the gas inlet 411. The following description will be based on the embodiment in which the valve unit 42 is arranged to open and close the gas outlet 412, and it would be obvious to one skilled in the art to which the present invention pertains to deriving from this an embodiment in which the valve unit 42 is arranged to open and close the gas inlet 411.

[0039] As shown in FIG. 3, when the valve unit 42 opens the gas outlet 412, the gas supplied by the gas supply unit 3 can be supplied to the substrate processing unit 2 via the gas inlet 411, the storage unit 413, and the gas outlet 412.

[0040] 4, when the valve unit 42 closes the gas outlet 412, the gas supplied by the gas supply unit 3 may be blocked from flowing out through the gas outlet 412. As a result, the gas supplied by the gas supply unit 3 is not supplied to the substrate processing unit 2.

[0041] In this way, the gas supplied by the gas supply unit 3 can be selectively supplied to the substrate processing unit 2 depending on whether the valve unit 42 opens or closes the gas outlet 412 .

[0042] The valve unit 42 can be coupled to the block main body 41. In this case, the valve unit 42 can be inserted into the accommodation portion 413. As a result, the valve unit 42 can open and close the gas outlet port 412 while being inserted into the block main body 41 via the accommodation portion 413. Therefore, the substrate processing apparatus 1 according to the present invention can achieve the following advantageous effects.

[0043] First, the substrate processing apparatus 1 according to the present invention is configured to have both a function of connecting the gas supply unit 3 and the substrate processing unit 2 and a function of selectively supplying gas using the block body 41 and the valve unit 42. Therefore, the substrate processing apparatus 1 according to the present invention can reduce dead space in the gas passage through which gas flows inside the block body 41, thereby improving gas fluidity. As a result, the substrate processing apparatus 1 according to the present invention can improve the quality of substrates after the processing process is completed.

[0044] Second, in the substrate processing apparatus 1 according to the present invention, a separate flow path for gas flow is not provided inside the valve unit 42, thereby reducing the overall size of the valve unit 42. Also, in the substrate processing apparatus 1 according to the present invention, the valve unit 42 is inserted into the block body 41 via the receiving portion 413, thereby further reducing the overall size of the block valve 4. Therefore, in the substrate processing apparatus 1 according to the present invention, the block valve 4 can be implemented compactly, thereby reducing the area occupied in the installation space.

[0045] The valve section 42 may include an opening / closing section 421 and a valve body 422 .

[0046] The opening and closing part 421 is movably coupled to the valve body 422. The opening and closing part 421 can open and close the gas outlet 412 while moving in a state coupled to the valve body 422. The opening and closing part 421 can also open and close the gas outlet 412 while contracting and expanding. When the valve body 422 is inserted into and coupled to the block body 41, the opening and closing part 421 can move within the receiving part 413 to open and close the gas outlet 412.

[0047] The opening / closing part 421 may include an opening / closing member 4211 , an opening / closing flange 4212 , and a blocking member 4213 .

[0048] The opening / closing member 4211 may be movably coupled to the valve body 422. One end of the opening / closing member 4211 may protrude from the valve body 422, and the other end may be disposed inside the valve body 422. One end of the opening / closing member 4211 may be used to open and close the gas outlet 412. The other end of the opening / closing member 4211 may be used to move for opening and closing the gas outlet 412. In this case, the driving unit 43 may move the other end of the opening / closing member 4211 to move the opening / closing member 4211.

[0049] The opening and closing flange 4212 protrudes outward from the opening and closing member 4211. When the opening and closing part 421 closes the gas outlet 412, the opening and closing flange 4212 comes into contact with the inner wall of the block main body 41 to cover the gas outlet 412. This allows the gas outlet 412 to be closed. When the opening and closing part 421 opens the gas outlet 412, the opening and closing flange 4212 can be separated from the inner wall of the block main body 41. This allows the gas outlet 412 to be opened. The opening and closing flange 4212 and the opening and closing member 4211 can also be formed integrally.

[0050] The blocking member 4213 is coupled to the opening / closing flange 4212. When the opening / closing part 421 closes the gas outlet 412, the blocking member 4213 is disposed between the opening / closing flange 4212 and the block body 41 to block the passage of gas. Thus, the blocking member 4213 can strengthen the sealing force for the gas outlet 412. The blocking member 4213 may be implemented as an O-ring.

[0051] The opening / closing part 421 may include an elastic member 4214 .

[0052] The elastic member 4214 may provide an elastic force to the opening / closing member 4211 so that the opening / closing member 4211 moves elastically. The elastic member 4214 may be disposed between the opening / closing flange 4212 and the valve body 422. When the opening / closing member 4211 moves to close the gas outlet 412, the elastic member 4214 may be stretched and have a restoring force. In this case, the restoring force of the elastic member 4214 can be used when the opening / closing member 4211 moves to open the gas outlet 412. The elastic member 4214 may be disposed to surround the opening / closing member 4211. In this case, the opening / closing member 4211 may be disposed inside the elastic member 4214. The elastic member 4214 may be implemented as a bellows.

[0053] The opening / closing portion 421 may include a guide member 4215 .

[0054] The guide member 4215 protrudes from the open / close member 4211. The guide member 4215 may protrude from the open / close member 4211 in a direction from the open / close member 4211 toward the gas outlet 412. The guide member 4215 may be formed to decrease in size as it protrudes from the open / close member 4211. For example, the guide member 4215 may be formed to decrease in diameter as it protrudes from the open / close member 4211. When the open / close unit 421 moves to close the gas outlet 412, the guide member 4215 may be inserted into the gas outlet 412 before the open / close member 4211. Therefore, the guide member 4215 may have a function of guiding the open / close unit 421 to accurately close the gas outlet 412. The guide member 4215 and the open / close member 4211 may be formed integrally.

[0055] 2 to 6, the valve body 422 is coupled to the block body 41. The opening / closing member 4211 may be movably coupled to the valve body 422. The valve body 422 may be inserted into and coupled to the block body 41 so that the opening / closing member 4211 moves within the accommodation portion 413 to open and close the gas outlet 412.

[0056] The valve body 422 may be inserted into an insertion groove 414 formed in the block body 41. The insertion groove 414 is formed to be connected to the receiving portion 413. Based on the direction in which the open / close member 4211 moves, the receiving portion 413 may be disposed between the gas outlet 412 and the insertion groove 414. The insertion groove 414 may be formed to be larger in size than the receiving portion 413. When both the insertion groove 414 and the receiving portion 413 are formed in a circular shape, the insertion groove 414 may be formed to have a larger diameter than the receiving portion 413. Thus, a step may be formed at a portion where the receiving portion 413 and the insertion groove 414 of the block body 41 are connected.

[0057] The valve body 422 may include a first valve flange 4221 .

[0058] The first valve flange 4221 may be inserted into the insertion groove 414. The first valve flange 4221 may protrude outward from the valve body 422. The first valve flange 4221 may be supported on an inner wall of the block body 41 in which the insertion groove 414 is formed. A sealing member 422a may be disposed between the first valve flange 4221 and the block body 41 within the insertion groove 414. The sealing member 422a seals the gap between the first valve flange 4221 and the block body 41 to prevent gas from leaking between the first valve flange 4221 and the block body 41. The sealing member 422a may be implemented as a metal gasket. The sealing member 422a may also be implemented as an O-ring. When the valve body 422 is coupled to the block body 41, the first valve flange 4221 may apply pressure to the first valve flange 4221. This makes it possible to further strengthen the sealing force provided by the sealing member 422a.

[0059] 2 to 6, the driving unit 43 drives the valve unit 42. The driving unit 43 can drive the opening / closing unit 421 of the valve unit 42. As a result, the opening / closing unit 421 can be moved by the driving unit 43 to open or close the gas outlet 412. For example, the driving unit 43 can drive the valve unit 42 using air pressure. The driving unit 43 can move the opening / closing member 4211 located inside the valve body 422 by supplying gas to the valve body 422 or discharging gas from the valve body 422. As a result, the opening / closing member 4211 can open or close the gas outlet 412 while moving. The driving unit 43 can be disposed so as to be connected to the internal space of the valve body 422. The driving unit 43 can be connected to the internal space of the valve body 422 via piping or the like. The driving unit 43 can also drive the valve unit 42 using hydraulic pressure.

[0060] Referring to FIGS. 2 to 6, the block valve 4 may include a fixing portion 44.

[0061] The fixing part 44 is inserted into the block main body 41. The fixing part 44 can be inserted into the insertion groove 414 to pressurize the first valve flange 4221. As a result, the sealing member 422a disposed between the first valve flange 4221 and the block main body 41 can tightly seal the gap between the first valve flange 4221 and the block main body 41 by the pressure of the first valve flange 4221 and the pressure of the fixing part 44. Therefore, the substrate processing apparatus 1 according to the present invention can prevent leakage of gas supplied from the gas supply unit 3 to the substrate processing unit 2 by using the sealing member 422a. A through hole can be formed in the fixing part 44. The valve body 422 can be inserted into the through hole.

[0062] When the fixing portion 44 is provided, the valve body 422 may include a second valve flange 4222. The second valve flange 4222 may be disposed apart from the first valve flange 4221. The fixing portion 44 may be disposed between the second valve flange 4222 and the first valve flange 4221. As a result, the second valve flange 4222 presses the fixing portion 44 to pressurize the first valve flange 4221, and presses the first valve flange 4221 to pressurize the sealing member 422a. Therefore, the substrate processing apparatus 1 according to the present invention presses the sealing member 422a using the second valve flange 4222, the fixing portion 44, and the first valve flange 4221, thereby further strengthening the blocking force for blocking gas leakage by increasing the pressure applied to the sealing member 422a. The second valve flange 4222 may protrude outward from the valve body 422.

[0063] Referring to FIG. 7, the block valve 4 may include a connecting body 45 and a sealing member 46 .

[0064] The connection body 45 is detachably connected to the block body 41. The connection body 45 may include a connection passage 451 for connection to the gas inlet 411 or the gas outlet 412. When the connection body 45 is connected to the block body 41 and the connection passage 451 is connected to the gas inlet 411, the connection passage 451 can function as a passage through which gas supplied from the gas supply unit 3 passes to supply the gas inlet 411. When the connection body 45 is connected to the block body 41 and the connection passage 451 is connected to the gas outlet 412, the connection passage 451 can function as a passage through which gas flowing out from the gas outlet 412 passes to supply the substrate processing unit 2.

[0065] As described above, the substrate processing apparatus 1 according to the present invention is embodied so that the length of the gas flow path passing through the block can be extended using the connection body 45. Therefore, the substrate processing apparatus 1 according to the present invention can improve the ease of extending the length of the gas flow path as needed. The connection body 45 can be detachably connected to the block body 41 using fastening means such as bolts.

[0066] The seal member 46 may be disposed between the connection body 45 and the block body 41. The seal member 46 may prevent gas flowing along the connection passage 451 from leaking between the connection body 45 and the block body 41. The seal member 46 may be implemented as an O-ring.

[0067] 8, the block body 41 may include a plurality of gas outlets 412. In this case, the gas inlet 411 may be formed in the block body 41 to be connected to each of the gas outlets 412. The block valve 4 may include a plurality of valve units 42. The valve units 42 may be coupled to the block body 41 to individually open and close the gas outlets 412. As a result, gas flowing along the gas inlet 411 may be supplied to the substrate processing unit 2 through the gas outlets 412 opened by the valve units 42. As such, the substrate processing apparatus 1 according to the present invention may be embodied as a manifold type that selectively discharges gas through a plurality of gas outlets 412 using one block body 41. The outlet portion where the gas outlet 412 is connected to the substrate processing unit 2 may be disposed in the receiving unit 413. As a result, when the valve section 42 opens the gas outlet 412, the gas supplied by the gas supply section 3 is supplied to the storage section 413 through the gas inlet 411 and the gas outlet 412, and then can be supplied to the substrate processing section 2 through the outlet portion 412a of the gas outlet 412.

[0068] 8 shows an example in which three gas outlets 412, 412', and 412'' are formed in the block body 41 and three valve units 42, 42', and 42'' are coupled thereto, but the present invention is not limited thereto. Two or four or more gas outlets 412 may be formed in the block body 41 and two or four or more valve units 42 may be coupled thereto. In this case, the number of the gas outlets 412 and the number of the valve units 42 may be the same.

[0069] The block body 41 may include a plurality of the receiving portions 413. In this case, the receiving portions 413 may be connected to the respective gas outlets 412. Outflow portions of the gas outlets 412 connecting to the substrate processing unit 2 may be disposed in the respective receiving portions 413. The block valve 4 may include a plurality of the valve portions 42. The valve portions 42 may be coupled to the block body 41 so as to be inserted into the respective receiving portions 413.

[0070] Although FIG. 8 shows an example in which three receiving portions 413, 413′, and 413″ are formed in the block body 41 and three valve portions 42, 42′, and 42″ are coupled thereto, the present invention is not limited thereto, and two or four or more receiving portions 413 may be formed in the block body 41 and two or four or more valve portions 42 may be coupled thereto. In this case, the number of receiving portions 413 and the number of valve portions 42 may be the same.

[0071] The present invention described above is not limited to the above-described embodiments and accompanying drawings, and it will be apparent to those skilled in the art to which the present invention pertains that various substitutions, modifications, and changes can be made without departing from the technical spirit of the present invention.

Claims

1. A block valve for selectively supplying a gas supplied by a gas supply unit to a substrate processing unit where a processing step on a substrate is performed, a block main body connected to each of the gas supply unit and the substrate processing unit; a plurality of valve portions coupled to the block body; and a plurality of actuators for respectively actuating the valve units; the block body includes a gas inlet connected to the gas supply unit, a plurality of gas outlets connected to the gas inlet, and a plurality of containers connected to the plurality of gas outlets, respectively; each of the plurality of valve units includes an opening / closing unit that opens and closes the plurality of gas outlet ports, and a valve body to which the opening / closing unit is movably coupled; the opening and closing part includes an opening and closing member movably coupled to the valve body, an opening and closing flange formed integrally with the opening and closing member, protruding outward from the opening and closing member and capable of covering the gas inlet or the gas outlet, and a guide member formed integrally with the opening and closing member, protruding from the opening and closing member in a direction toward the gas inlet or the gas outlet, the guide member is formed to decrease in size as it protrudes from the opening / closing member, and is inserted into the gas inlet or the gas outlet before the opening / closing member when the opening / closing unit moves to close the gas inlet or the gas outlet, the valve body is inserted into and coupled to the block body so that the opening / closing portion moves within the accommodation portion to open and close the gas outlet; the block body is formed to be connected to the receiving portion, has a diameter larger than that of the receiving portion, and includes an insertion groove having a step formed at a portion connected to the receiving portion; the valve body includes a first valve flange inserted into the insertion groove and supported on an inner wall of the block body on which the insertion groove is formed, and a second valve flange spaced apart from the first valve flange; a sealing member disposed within the insertion groove between the first valve flange and the block body; a fixing portion having a through hole into which the valve body is inserted is disposed between the first valve flange and the second valve flange in the insertion groove; The block valve for a substrate processing apparatus, wherein the second valve flange presses the fixing portion to pressurize the first valve flange, and the first valve flange presses the sealing member.

2. the opening / closing portion includes a blocking member coupled to the opening / closing flange, 2. The block valve for a substrate processing apparatus according to claim 1, wherein when the opening / closing portion closes the gas inlet or the gas outlet, the blocking member is disposed between the opening / closing flange and the block body to block the passage of gas.

3. the opening / closing portion includes an elastic member that provides an elastic force to the opening / closing member so that the opening / closing member moves elastically, 2. The block valve for a substrate processing apparatus according to claim 1, wherein the elastic member is disposed between the first valve flange and the opening / closing flange.

4. a connecting body detachably coupled to the block body; and a sealing member disposed between the connecting body and the block body, 2. The block valve for a substrate processing apparatus according to claim 1, wherein the connection body includes a connection passage for connecting to the gas inlet or the gas outlet.

5. a chamber providing a processing space; a support for supporting at least one substrate; a gas injection unit that injects gas toward the support unit; a gas supply unit that supplies gas to the gas injection unit; and block valves connected to the gas supply unit and the gas injection unit, The block valve is a block body connected to each of the gas supply unit and the gas injection unit; a plurality of valve portions coupled to the block body; and a plurality of actuators for respectively actuating the plurality of valve units; the block body includes a gas inlet connected to the gas supply unit, a plurality of gas outlets connected to the gas inlet, and a plurality of receiving portions connected to the plurality of gas outlets, respectively; each of the plurality of valve units includes an opening / closing unit that opens and closes the plurality of gas outlet ports, and a valve body to which the opening / closing unit is movably coupled; the opening and closing part includes an opening and closing member movably coupled to the valve body, an opening and closing flange formed integrally with the opening and closing member, protruding outward from the opening and closing member and capable of covering the gas inlet or the gas outlet, and a guide member formed integrally with the opening and closing member, protruding from the opening and closing member in a direction toward the gas inlet or the gas outlet, the guide member is formed to decrease in size as it protrudes from the opening / closing member, and is inserted into the gas inlet or the gas outlet before the opening / closing member when the opening / closing unit moves to close the gas inlet or the gas outlet, the valve body is inserted into and coupled with the block body so that the opening / closing portion moves within the accommodation portion to open and close the gas outlet port; the block body is formed to be connected to the receiving portion, has a diameter larger than that of the receiving portion, and includes an insertion groove having a step formed at a portion connected to the receiving portion; the valve body includes a first valve flange inserted into the insertion groove and supported on an inner wall of the block body on which the insertion groove is formed, and a second valve flange spaced apart from the first valve flange; a sealing member disposed within the insertion groove between the first valve flange and the block body; a fixing portion having a through hole into which the valve body is inserted is disposed between the first valve flange and the second valve flange in the insertion groove; The substrate processing apparatus, wherein the second valve flange presses the fixing portion to pressurize the first valve flange, and the first valve flange presses the sealing member.

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