Process kit with tall deposition ring and small diameter electrostatic chuck (ESC) for PVD chamber

Abstract

An embodiment of a process kit is provided herein. In some embodiments, the process kit includes a deposition ring configured to be disposed on a substrate support, the deposition ring includes an annular band having an upper surface and a lower surface, the lower surface including a step between a radially inner portion and a radially outer portion, the step extending downward from the radially inner portion to the radially outer portion; an inner lip extending upward from the upper surface of the annular band and adjacent to the inner surface of the annular band, the outer surface of the inner lip extending radially outward and downward from the upper surface of the inner lip to the upper surface of the annular band; a channel disposed radially outward of the annular band; and an outer lip extending upward and disposed radially outward of the channel.

Description

[Technical Field]

[0001] FIELD Embodiments of the present disclosure generally relate to substrate processing apparatus. [Background technology]

[0002] A process kit can be used to separate a processing volume from a non-processing volume within a physical vapor deposition (PVD) chamber. Over time, the process kit accumulates deposition material from deposition processes performed in the PVD chamber. The process kit may include a process shield, a deposition ring, a cover ring, etc. For high-deposition processes, the buildup of deposits on the deposition ring can become significant to the point where the deposits can accumulate on the backside of the substrate. At that point, the deposits can adhere or stick to the backside of the substrate, which can cause problems with handling the substrate and lead to substrate damage. While the deposition ring can be removed and replaced with a clean deposition ring, the rapid accumulation of deposited material on the deposition ring leads to more frequent downtime to replace the deposition ring. The inventors have also observed that the deposition ring can be prone to cracking or breaking over time.

[0003] Accordingly, the inventors have provided the improved deposition ring embodiments disclosed herein. Summary of the Invention

[0004]

[0006] In some embodiments, the process kit includes a deposition ring configured to be disposed on a substrate support, the deposition ring comprising: an annular band configured to rest on a lower ledge of the substrate support, the annular band having an upper surface and a lower surface, the lower surface including a step between a radially inner portion and a radially outer portion, the step extending downward from the radially inner portion to the radially outer portion; an inner lip extending upward from the upper surface of the annular band and adjacent to the inner surface of the annular band, the inner surfaces of the inner lip and the annular band together forming a central opening of the deposition ring, the outer surface of the inner lip extending radially outward and downward from the upper surface of the inner lip to the upper surface of the annular band; a channel disposed radially outward of the annular band; and an outer lip extending upward and radially outward of the channel, wherein the upper surface of the outer lip and the channel are disposed below the lower surface of the annular band.

[0005] In some embodiments, the process kit includes a deposition ring configured to be disposed on a substrate support, the deposition ring comprising: an annular band configured to rest on a lower ledge of a substrate, the annular band having an upper surface and a lower surface, the lower surface including a step between a radially inner portion and a radially outer portion, the step extending downwardly from the radially inner portion to the radially outer portion; an inner lip extending upwardly from the upper surface of the annular band and adjacent an inner surface of the annular band, The deposition ring comprises an inner lip, the inner surface of which and the inner surface of the annular band together form a central opening of the deposition ring, and the outer surface of the inner lip extends at an angle of about 5 degrees to about 15 degrees from the central axis of the deposition ring; a first leg extending downwardly adjacent the outer surface of the annular band; a second leg extending radially outward from a bottom of the first leg; and an outer lip extending upwardly from the second leg, wherein the first leg, second leg, and outer lip together define a channel.

[0006] In some embodiments, the substrate support includes a process kit including a pedestal having a substrate support surface with a given diameter for receiving a substrate and having an electrostatic chuck disposed thereon, the pedestal including a lower ledge extending radially outward, and a deposition ring disposed on the lower ledge, the deposition ring comprising: an annular band resting on the lower ledge, the annular band having an upper surface and a lower surface, the lower surface including a step between a radially inner portion and a radially outer portion, the step extending downward from the radially inner portion to the radially outer portion; an inner lip extending upward from the upper surface of the annular band and adjacent to the inner surface of the annular band, the outer surface of the inner lip extending radially outward and downward from the upper surface of the inner lip to the upper surface of the annular band; a channel disposed radially outward of and below the annular band; and an outer lip extending upward and radially outward of the channel.

[0007] Other and further embodiments of the present disclosure are described below.

[0008] Embodiments of the present disclosure, briefly summarized above and described in more detail below, can be understood by reference to the exemplary embodiments thereof as illustrated in the accompanying drawings. However, because the present disclosure is susceptible to other equally effective embodiments, the accompanying drawings illustrate only typical embodiments of the present disclosure and therefore should not be considered limiting in scope. [Brief explanation of the drawings]

[0009] [Figure 1] 1 is a schematic cross-sectional view of a processing chamber according to some embodiments of the present disclosure. [Figure 2] 1 is a cross-sectional view of a process kit according to some embodiments of the present disclosure. [Figure 3] 1 is a cross-sectional view of a portion of a deposition ring according to some embodiments of the present disclosure. [Figure 4] FIG. 1 is a top isometric view of a deposition ring according to some embodiments of the present disclosure. [Figure 5]1 is a schematic cross-sectional view of a deposition ring and clamping assembly according to some embodiments of the present disclosure. [Figure 6] FIG. 1 is a top view of a pedestal and a deposition ring according to some embodiments of the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0010] To facilitate understanding, the same reference numerals have been used, where possible, to designate identical elements common to the figures. The figures are not drawn to scale and may be simplified for clarity. Elements and features of one embodiment may be beneficially incorporated in other embodiments without further description.

[0011] Embodiments of process kits and process chambers incorporating such process kits are provided herein. In some embodiments, the process kit includes an integrated process kit shield and a tall deposition ring, as provided herein. The deposition ring can advantageously increase the buildup of deposition material on the deposition ring. As a result, the deposition ring can be subjected to more process cycles before cleaning, since deposits do not adhere as quickly to the backside of the substrate being processed, compared to conventional deposition rings. The deposition ring can also have an appropriate wall thickness and contour to advantageously reduce or prevent cracking or breakage due to thermal cycling and / or buildup of deposition material.

[0012] To further mitigate the problem of deposit adhesion to the backside of the substrate, a clamping assembly can be provided to hold down the deposition ring if deposits on the deposition ring adhere to the backside of the substrate, thereby advantageously avoiding damage caused by lifting of the deposition ring with the substrate due to deposits on the backside of the substrate because the clamping assembly prevents the deposition ring from lifting.

[0013] 1 shows a schematic cross-sectional view of a processing chamber 100 (e.g., a PVD chamber) having a process kit shield according to some embodiments of the present disclosure. Other processing chambers can also benefit from the inventive apparatus disclosed herein.

[0014] The processing chamber 100 includes chamber walls 106 that enclose an interior volume 108. The chamber walls 106 include sidewalls 116, a bottom wall 120, and a ceiling 124. The processing chamber 100 may be a stand-alone chamber or part of a multi-chamber platform (not shown) having a cluster of interconnected chambers connected by a substrate transfer mechanism that transfers the substrate 104 between the various chambers. The processing chamber 100 may be a PVD chamber capable of sputter depositing materials onto the substrate 104. Non-limiting examples of materials suitable for sputter deposition include one or more of aluminum, copper, tantalum, tantalum nitride, titanium, titanium nitride, tungsten, tungsten nitride, etc.

[0015] The processing chamber 100 generally includes a substrate support 130 with a pedestal 134 for supporting the substrate 104. The pedestal 134 has a substrate support surface 138 having a plane substantially parallel to a sputtering surface 139 of a sputtering target 140 disposed in the upper section of the processing chamber 100. The substrate support surface 138 of the pedestal 134 is designed to support the substrate 104 having a predetermined width during processing. The width of the substrate 104 can be a diameter if the substrate 104 is circular or a width if the substrate is square / rectangular. The substrate support surface 138 can have a predetermined diameter, for example, about 285 mm to about 293 mm. The predetermined diameter of the substrate support surface 138 can be smaller than the predetermined width of the substrate 104 such that the substrate has an overhanging edge 114. The pedestal 134 can include at least one of an electrostatic chuck or a heater (e.g., an electrical resistance heater, a heat exchanger, or other suitable heating device).

[0016] During operation, a substrate 104 is introduced into the processing chamber 100 through a substrate load entrance 142 in the sidewall 116 of the processing chamber 100 and placed on the substrate support 130. The substrate support 130 can be raised and lowered by a support lift mechanism, and a lift finger assembly can be used to raise and lower the substrate 104 on the substrate support 130 as the substrate 104 is placed on the substrate support 130 by a robotic arm. The pedestal 134 can be maintained at an electrically floating potential during plasma operation or can be grounded.

[0017] 2 , the processing chamber 100 also includes a process kit 102, which includes various components that can be easily removed from the processing chamber 100, for example, to remove sputtering deposits from component surfaces, to replace or repair corroded components, or to adapt the process chamber 100 for other processes. The process kit 102 can include an integrated shield 110. In some embodiments, the integrated shield 110 includes a cylindrical body 126 having a diameter sized to encompass the sputtering surface 139 of the sputtering target 140 and the substrate support 130 (e.g., a diameter larger than the sputtering surface 139 and larger than the support surface of the substrate support 130). The cylindrical body 126 has an upper portion 128 that encompasses the outer edge of the sputtering surface 139 of the sputtering target 140 and a lower portion 132 that encompasses the substrate support 130.

[0018] The upper portion 128 includes an adapter section 136 for supporting the integrated shield 110 on the sidewall 116 and a covering section 122 for positioning around the peripheral wall 112 of the substrate support 130. The process kit 102 further includes a deposition ring, such as deposition ring 125, disposed below the covering section 122. The deposition ring 125 sits on a lower ledge 135 of the substrate support 130. A bottom surface of the covering section 122 interfaces with the deposition ring 125. In some embodiments, the distance between the substrate support surface 138 and the upper surface of the lower ledge 135 is about 8 to about 11 mm. In some embodiments, the lower ledge 135 has a thickness of about 10 mm to about 15 mm.

[0019] The deposition ring 125 includes an annular band 215 that extends around and surrounds the peripheral wall 112 of the substrate support 130, as shown in FIGS. 2 and 3. FIG. 3 illustrates a cross-sectional view of a portion of the deposition ring 125 in accordance with some embodiments of the present disclosure. The annular band 215 includes an upper surface 220 and a lower surface 226. The annular band 215 includes an inner surface 304 and an outer surface 306. In some embodiments, the distance from the inner surface 304 to the outer surface 306 is from about 20.0 mm to about 26.0 mm. The upper surface 220 is substantially flat and includes a horizontal portion. In some embodiments, the annular band 215 includes a first radius 310 at the interface between the outer surface 306 and the upper surface 220. In some embodiments, the annular band 215 includes a second radius 312 at the interface between the lower surface 226 and the inner surface 304.

[0020] The lower surface 226 of the annular band 215 includes a radially inner portion 322 and a radially outer portion 324, with a step 338 therebetween. The step 338 extends downward from the radially inner portion 322 to the radially outer portion 324. The radially inner portion 322 of the lower surface 226 rests on the lower ledge 135 of the substrate support 130 when disposed thereon, while the radially outer portion 324 surrounds the lower ledge 135. In some embodiments, the thickness of the annular band 215 at the radially inner portion 322 from the upper surface 220 to the lower surface 226 is about 2.55 mm to about 3.0 mm. In some embodiments, the thickness of the annular band 215 at the radially outer portion 324 from the upper surface 220 to the lower surface 226 is about 4.76 mm to about 5.0 mm. The thicker outer portion of the annular band 215 corresponding to the radially outer portion 324 advantageously provides additional support to the thinner inner portion of the annular band 215 corresponding to the radially inner portion 322, thereby reducing cracking or fracture of the deposition ring 125.

[0021] In some embodiments, the diameter of the inner surface 304 of the inner lip 250 is about 285 mm to about 295 mm. In some embodiments, the outer diameter of the deposition ring is about 340 mm to about 380 mm. In some embodiments, the distance from the inner surface 304 of the annular band 215 to the step 338 (e.g., the radially inner portion 322) is about 12.0 mm to about 15.0 mm. In some embodiments, the diameter of the step is about 315 mm to about 345 mm.

[0022] The inner lip 250 extends upward from the upper surface 220 adjacent to the inner surface 304 of the annular band 215. The inner lip 250 is substantially parallel to the peripheral wall 112 of the substrate support 130 such that the inner surface 308 of the inner lip 250 and the inner surface 304 of the annular band 215 are aligned and together form a central opening of the deposition ring 125 having a width that is less than a given width of the substrate 104. The central opening may define an inner diameter of the deposition ring 125. In some embodiments, the inner diameter of the deposition ring 125 is about 285 to about 295 mm.

[0023] The inner lip 250 terminates just below the overhanging edge 114 of the substrate 104. The inner lip 250 defines an inner periphery of the deposition ring 125 that surrounds the substrate support 130 to protect areas of the substrate support 130 not covered by the substrate 104 during processing. For example, the inner lip 250 surrounds and at least partially covers the peripheral wall 112 of the substrate support 130 that would otherwise be exposed to the processing environment, reducing or even completely preventing the deposition of sputtered deposits on the peripheral wall 112. Advantageously, the deposition ring 125 is easily removable to remove sputtered deposits from its exposed surface so that the substrate support 130 can be cleaned without disassembly. The deposition ring 125 can also function to protect exposed side surfaces of the substrate support 130 to reduce erosion by excited plasma species.

[0024] The inner lip 250 advantageously has a width small enough to reduce the buildup of sputter deposits on its outer surface 314, yet large enough to reduce or prevent cracking or breakage of the deposition ring 125. The outer surface 314 of the inner lip 250 extends radially outward and downward from the upper surface 326 of the inner lip 250 to the upper surface 220 of the annular band 215, strengthening the inner lip 250. The inventors have observed that the tapered outer surface 314 makes the deposition ring 125 less susceptible to cracking or breakage. In some embodiments, the outer surface 314 of the inner lip 250 extends at an angle 380 of about 5 degrees to about 15 degrees from the central axis 370 of the deposition ring 125.

[0025] In some embodiments, the inner lip 250 has a width of about 1.0 mm to about 4.0 mm. In some embodiments, the upper surface 326 of the inner lip 250 has a width of about 1.0 mm to about 2.5 mm. In some embodiments, when the deposition ring 125 is disposed on the pedestal 134, the upper surface 326 is about 0.1 mm to about 1.0 mm below the substrate support surface 138. In some embodiments, the outer surface 314 includes a radius 316 between the vertically extending portion of the outer surface 314 and the horizontally extending portion of the upper surface 220 of the annular band 215. A small radius can be advantageous to reduce the accumulation of sputtered deposits on the outer surface 314. In some embodiments, the radius is about 2.0 mm to about 3.0 mm. In some embodiments, the radius is about 2.4 mm to about 2.6 mm.

[0026] The deposition ring 125 further includes a first leg 210 extending downwardly adjacent the outer surface 306 of the annular band 215. A second leg 260 extends radially outward from a bottom 320 of the first leg 210. An outer lip 214 extends upwardly from the second leg 260. The first leg 210, the second leg 260, and the outer lip 214 together define a channel 240 of the deposition ring 125. In some embodiments, the channel 240 is disposed below the lower surface 226 of the annular band 215. In some embodiments, the first leg 210 has a length greater than the length of the inner lip 250.

[0027] In some embodiments, the depth 340 between the upper surface 220 of the annular band 215 and the upper surface 326 of the inner lip 250 is configured to accommodate a material deposit of at least about 6 mm or more. For example, the depth 340 can be between about 6.0 mm and about 12.0 mm. In some embodiments, the depth 340 can be between about 6.0 mm and about 9.0 mm. As a result, adhesion of material deposits to the underside of the overhanging edge 114 of the substrate 104 is substantially reduced or completely eliminated. In some embodiments, the distance between the upper surface 326 of the inner lip 250 and the substrate receiving surface of the pedestal 134 is between about 1.0 mm and about 2.0 mm. To accommodate a deposition ring 125 having a greater depth 340, the lower ledge 135 is positioned further away from the substrate support surface 138. The upper surface of the deposition ring 125 includes the upper surface 326 of the inner lip 250, the outer surface 314 of the inner lip 250, and a horizontal portion of the upper surface 220. The underside of the deposition ring 125 includes the underside 226 of the annular band 215 , the radially inner surface of the first leg 210 , the underside of the second leg 260 , and the radially outer surface of the outer lip 214 .

[0028] The covering section 122 at least partially covers the deposition ring 125. The deposition ring 125 and the covering section 122 cooperate to reduce the formation of sputter deposits on the peripheral wall of the substrate support 130 and the overhanging edge 114 of the substrate 104. In some embodiments, the covering section 122 includes a protrusion 230 configured to mate with a channel 240 of the deposition ring 125. A sidewall of the channel 240 is defined by a radially inner surface of the outer lip 214 and a radially outer surface of the first leg 210. A bottom wall of the channel 240 is defined by an upper surface of the second leg 260. The channel 212 is disposed radially outward of the inner lip 250. The outer lip 214 is disposed radially outward of the channel 212. The outer lip 214 is configured to mate with a corresponding recess 216 of the covering section 122. In some embodiments, the width of the outer lip 214 from the radially inner surface to the radially outer surface is about 2.0 mm to about 3.0 mm. In some embodiments, the upper surface 342 of the outer lip 214 is disposed below the lower surface 226 of the annular band 215. In some embodiments, the outer lip 214 has a length that is greater than the length of the inner lip 250.

[0029] FIG. 4 illustrates a top isometric view of a deposition ring according to some embodiments of the present disclosure. The deposition ring 125 is advantageously sized to surround the substrate support 130 with a minimal gap therebetween, such as about 0.1 mm to about 0.5 mm. In some embodiments, the inner diameter of the deposition ring 125 is about 285.0 mm to about 295.0 mm. In some embodiments, the inner diameter of the deposition ring 125 is about 285.0 mm to about 295.0 mm. In some embodiments, the outer diameter of the deposition ring 125 is about 340.0 mm to about 370.0 mm. In some embodiments, the deposition ring 125 does not include a protrusion extending radially inward from the inner surface 308 of the inner lip 250. In some embodiments, the outer lip 214 includes a slot 408. As shown in FIG. 4, the outer lip 214 includes two slots 408 positioned opposite each other around the deposition ring 125. Slots 408 are each configured to receive a clamp assembly 500, as described below with respect to FIG.

[0030] In some embodiments, the process kit 102 can further include a clamping assembly 500 for material deposition and to further advantageously prevent the deposition ring 125 from sticking to the backside of the overhanging edge 114 of the substrate 104. FIG. 5 shows a schematic cross-sectional view of the deposition ring 125 and clamping assembly 500 according to some embodiments of the present disclosure. Each slot 408 has a corresponding clamping assembly 500. The clamping assembly 500 includes a base plate 502 and a clamp 504 for clamping the deposition ring 125. The base plate 502 is coupled to the substrate support 130 (e.g., the bottom surface of the pedestal 134). The clamp 504 is disposed in an opening 516 in the base plate 502. The clamp 504 includes a shaft 518 and a tab 520 extending radially outward from the top of the shaft 518. The tab 520 is configured to rest on a lower surface 522 of the slot 408 of the deposition ring 125 and prevent the deposition ring 125 from lifting. The clamp 504 may be coupled to the base plate 502. For example, the clamp 504 may be coupled to the base plate 502 via a screw or a bolt. In some embodiments, the clamp 504 is rotatably coupled to the base plate 502. In some embodiments, the clamp 504 may be raised or lowered relative to the base plate 502 to position the tab 520 in or out of the slot 408.

[0031] In some embodiments, the clamp assembly 500 includes a bracket 512 and a bushing 510 that rests on an upper surface of the base plate 502. The bushing 510 is disposed in a central opening 514 in the bracket 512 and an opening 516 in the base plate 502. The bracket 512 includes a raised portion that extends radially inward from the central opening 514 and includes a step that overhangs the bushing 510. The step is configured to prevent the bushing 510 from lifting relative to the base plate 502. A washer 508 having an outer diameter larger than the diameter of the opening 516 is disposed below the base plate 502. A fastener 506 is disposed below the washer 508 to secure the washer 508 to the clamp 504 and connect the clamp 504 to the base plate 502. Washer 508 and tab 520 are configured to couple clamp 504 to base plate 502 while allowing clamp 504 to rotate within opening 516 and be raised or lowered (e.g., moved vertically) relative to base plate 502. Clamp 504 can be raised, rotated, and lowered to allow deposition ring 125 to be removed.

[0032] Although the deposition ring 125 is configured to accommodate greater material deposition compared to conventional deposition rings, if the deposition ring 125 is not cleaned after an intended thickness of material deposit has accumulated on the deposition ring 125, the material deposit will adhere to the underside of the overhanging edge 114 of the substrate 104. As a result, when the substrate 104 is lifted from the substrate support 130, the deposition ring 125 will lift along with the substrate 104. To address lifting of the deposition ring 125 due to improper use, the clamp assembly 500 is configured to interface with the deposition ring 125 and prevent vertical movement of the deposition ring, thereby advantageously avoiding damage to the substrate 104 or the deposition ring 125 caused by lifting the deposition ring 125 along with the substrate 104.

[0033] 1 , the integrated shield 110 surrounds the sputtering surface 139 of the sputtering target 140 facing the substrate support 130 and the outer periphery of the substrate support 130. The integrated shield 110 covers and shields the sidewalls 116 of the processing chamber 100, reducing the deposition of sputtering deposits from the sputtering surface 139 of the sputtering target 140 on components and surfaces behind the integrated shield 110. For example, the integrated shield 110 can protect the surface of the substrate support 130, the overhanging edge 114 of the substrate 104, the sidewalls 116, and the bottom wall 120 of the processing chamber 100.

[0034] The adapter section 136 supports the integral shield 110 and can function as a heat exchanger around the sidewall 116 of the processing chamber 100. In some embodiments, heat transfer channels 152 are disposed in the upper portion 128 for flowing a heat transfer medium. In some embodiments, the heat transfer channels 152 are disposed in the adapter section 136. Because the integral shield 110 is of one-piece construction, the heat transfer medium flowing through the heat transfer channels 152 directly cools / heats the regions of the integral shield 110 corresponding to the shield and covering (i.e., the cylindrical body 126 and covering section 122, respectively). Furthermore, the one-piece construction of the integral shield 110 advantageously allows for direct coupling of a heat transfer medium supply 180 to the shield, which was previously indirectly coupled to a heat transfer source via an adapter. The heat transfer medium supply 180 can flow a heat transfer medium through the heat transfer channels 152 at a flow rate sufficient to maintain a desired shield temperature.

[0035] The one-piece shield 110 allows for improved heat transfer from the one-piece shield 110, thereby reducing thermal expansion stresses on materials deposited on the shield. Portions of the one-piece shield 110 can become excessively heated by exposure to the plasma formed in the substrate processing chamber, causing the shield to thermally expand and sputter deposits formed on the shield to flake off the shield and fall onto and contaminate the substrate 104. The one-piece construction of the adapter section 136 and the cylindrical body 126 improves thermal conductivity between the adapter section 136 and the cylindrical body 126.

[0036] In some embodiments, the one-piece shield 110 comprises a unitary structure made from a monolithic material. For example, the one-piece shield 110 can be formed from stainless steel or aluminum. The one-piece structure of the one-piece shield 110 is advantageous over shield designs that often include two or three separate pieces to form a complete shield. For example, a single-piece shield is more thermally uniform than a multi-component shield during both heating and cooling processes. For example, the one-piece shield 110 eliminates the thermal interface between the cylindrical body 126, the adapter section 136, and the covering section 122, allowing for more control over heat exchange between these sections. In some embodiments, the heat transfer medium supply 180 flows a coolant through the heat transfer channels 152 to address the adverse effects of an overheated shield on the sputtered material deposited on the substrate 104, as described above. In some embodiments, the heat transfer medium supply 180 flows a heated fluid through the heat transfer channels 152 to mitigate differences in the thermal expansion coefficients of the sputtered material and the shield.

[0037] Furthermore, a shield with multiple components is more difficult and laborious to remove for cleaning. The one-piece shield 110 has a continuous surface exposed to sputter deposits, without interfaces or corners that are more difficult to clean. The one-piece shield 110 more effectively protects the chamber walls 106 from sputter deposition during processing cycles. In some embodiments, the surface of the one-piece shield 110 exposed to the interior volume 108 within the processing chamber 100 may be bead blasted to reduce particle shedding and prevent contamination within the processing chamber 100.

[0038] The covering section 122 surrounds and at least partially covers the deposition ring 125, shielding it from the bulk of the sputtering deposits. The covering section 122 includes a protruding edge 270 that covers a portion of the deposition ring 125. The protruding edge 270 slopes radially inward and downward and includes an inclined surface 264 that surrounds the substrate support 130. The protruding edge 270 reduces the accumulation of sputtering deposits on the deposition ring 125. The covering section 122 is sized, shaped, and positioned to cooperate with and complement the deposition ring 125, forming a tortuous flow path between the covering section 122 and the deposition ring 125 and thus preventing process deposits from flowing onto the peripheral wall 112.

[0039] The tortuous flow path limits the accumulation of low-energy sputter deposits on the mating surfaces of the deposition ring 125 and the covering section 122 that would otherwise cause the deposition ring 125 and the covering section 122 to stick to each other or to the overhanging edge 114 of the substrate 104. The annular band 215 of the deposition ring 125 that extends below the overhanging edge 114 is designed in conjunction with shielding from the protruding lip 270 of the covering section 122 to collect sputter deposits within the sputtering chamber while reducing or substantially eliminating sputter deposition on the mating surfaces of the covering section 122 and the deposition ring 125.

[0040] 1 and 2, the sputtering target 140 includes a sputtering plate 144 attached to a backing plate 150. The sputtering plate 144 contains the material to be sputtered onto the substrate 104. The sputtering plate 144 may have a sputtering surface 139 that forms a plane parallel to the plane of the substrate 104. A peripheral sloped sidewall 288 surrounds the sputtering surface 139. The peripheral sloped sidewall 288 may be sloped relative to the plane of the sputtering surface 139. The peripheral sloped sidewall 288 may be sloped at an angle of at least about 60°, for example, from about 75° to about 85°, relative to the plane of the cylindrical mesa 286.

[0041] The peripheral sloped sidewalls 288 adjacent the top 128 of the integral shield 110 form a gap 200 that includes a dark space region. A dark space region is a region that is highly depleted of free electrons and can be modeled as a vacuum. Controlling the dark space region advantageously prevents plasma ingress into the dark space region, arcing, and plasma instabilities. The shape of the gap 200 prevents sputtered plasma species from passing through the gap 200, thus reducing the accumulation of sputtered deposits on the surface of the surrounding target area.

[0042] The sputtering plate 144 comprises a metal or a metal compound. For example, the sputtering plate 144 can be a metal, such as aluminum, copper, tungsten, titanium, cobalt, nickel, or tantalum. The sputtering plate 144 can also be a metal compound, such as tantalum nitride, tungsten nitride, or titanium nitride.

[0043] The backing plate 150 has a support surface 201 for supporting the sputtering plate 144 and a peripheral ledge 202 that extends beyond the radius of the sputtering plate 144. The backing plate 150 is made from a metal such as, for example, stainless steel, aluminum, copper-chromium, or copper-zinc. The backing plate 150 can be made from a material with a sufficiently high thermal conductivity to dissipate heat generated within the sputtering target 140 formed on both the sputtering plate 144 and the backing plate 150. Heat is generated from eddy currents that form within the sputtering plate 144 and the backing plate 150, and also from energetic ions from the plasma bombarding the sputtering surface 139 of the sputtering target 140. The higher thermal conductivity of the backing plate 150 allows heat generated within the sputtering target 140 to be dissipated to surrounding structures or even to a heat exchanger that may be attached behind the backing plate 150 or may reside within the backing plate 150 itself. For example, backing plate 150 can include channels (not shown) for circulating a heat transfer fluid therein. A suitably high thermal conductivity of backing plate 150 is at least about 200 W / m·K, e.g., from about 220 to about 400 W / m·K. Such a thermal conductivity level allows sputtering target 140 to operate for longer processing times by more efficiently dissipating heat generated within sputtering target 140.

[0044] In combination with a backing plate 150 made of a material with high thermal conductivity and low resistivity, or individually and alone, the backing plate 150 can have a back surface with one or more grooves 252. For example, the backing plate 150 can have grooves 252, such as annular grooves or ridges, to cool the backside 141 of the sputtering target 140. The grooves 252 and ridges can also have other patterns, such as a rectangular grid pattern, a chicken-feet pattern, or simple straight lines running across the back surface.

[0045] In some embodiments, sputtering plate 144 can be attached to backing plate 150 by diffusion bonding, for example, by placing sputtering plate 144 on backing plate 150 and heating sputtering plate 144 and backing plate 150 to an appropriate temperature, typically at least about 200° C. Optionally, sputtering target 140 can be a monolithic structure comprising a single piece of material with sufficient depth to function as both a sputtering plate and a backing plate.

[0046] The peripheral ledge 202 of the backing plate 150 includes an outer footing 204 that rests on an isolator 154 within the processing chamber 100. The peripheral ledge 202 includes an O-ring groove 206 in which an O-ring 208 is placed to form a vacuum seal. The isolator 154 electrically insulates and separates the backing plate 150 from the processing chamber 100 and is typically a ring formed of a dielectric or insulating material such as aluminum oxide. The peripheral ledge 202 is shaped to block the flow or movement of sputtered material and plasma species through the gap between the sputtering target 140 and the isolator 154 and to prevent low-angle sputter deposits from entering the gap.

[0047] 1 , the sputtering target 140 is connected to one or both of a DC power supply 146 and an RF power supply 148. The DC power supply 146 can apply a bias voltage to the sputtering target 140 relative to the integral shield 110, which can cause it to be electrically floating during the sputtering process. Simultaneously, the DC power supply 146 provides power to the sputtering target 140, the integral shield 110, the substrate support 130, and other chamber components connected to the DC power supply 146. At least one of the DC power supply 146 and the RF power supply 148 excites the sputtering gas to form a plasma of the sputtering gas. The formed plasma impinges on and impacts the sputtering surface 139 of the sputtering target 140, sputtering material from the sputtering surface 139 onto the substrate 104.

[0048] In some embodiments, the processing chamber 100 can include a magnetic field generator 156 that forms a magnetic field around the sputtering target 140 to improve sputtering of the sputtering target 140. The capacitively generated plasma can be enhanced by the magnetic field generator 156, for example, where a permanent magnet or electromagnetic coil can provide a magnetic field within the processing chamber 100 having a rotating magnetic field with an axis of rotation perpendicular to the plane of the substrate 104. The processing chamber 100 can additionally or alternatively include a magnetic field generator 156 that generates a magnetic field near the sputtering target 140 of the processing chamber 100 to increase ion density in a high-density plasma region adjacent the sputtering target 140 and improve sputtering of the target material.

[0049] Sputtering gases are introduced into the processing chamber 100 through a gas supply system 158, which provides gases from a gas supply 160 through a conduit 162 having a gas flow control valve 164, such as a mass flow controller, for flowing a set flow rate of the gas. The gases are delivered to a mixing manifold (not shown), where the gases are mixed to form the desired process gas composition, and then to a gas distributor 166 having a gas outlet for introducing the gases into the processing chamber 100. The process gas may include a non-reactive gas, such as argon or xenon, that can energetically bombard the sputtering target 140 and sputter material from the sputtering target 140. The process gas may also include a reactive gas, such as one or more oxygen-containing and nitrogen-containing gases, that can react with the sputtered material to form a layer on the substrate 104. The gases are then excited by at least one of a DC power source 146 and an RF power source 148 to form a plasma for sputtering the sputtering target 140. Spent process gases and by-products are exhausted from the processing chamber 100 through an exhaust 168. The exhaust 168 includes an exhaust port 170 that receives the spent process gases and passes them to an exhaust conduit 172 that has a throttle valve for controlling the pressure of the gases within the processing chamber 100. The exhaust conduit 172 is connected to one or more exhaust pumps 174.

[0050] The various components of the processing chamber 100 can be controlled by a controller 176. The controller 176 comprises program code having instruction sets for operating the components to process the substrate 104. For example, the controller 176 can comprise program code including a substrate positioning instruction set for operating the substrate support 130 and the substrate transport mechanism; a gas flow control instruction set for operating gas flow control valves to set the sputtering gas flow into the processing chamber 100; a gas pressure control instruction set for operating an exhaust throttle valve to maintain the pressure in the processing chamber 100; a gas energizer control instruction set for operating at least one of the DC power supply 146 and the RF power supply 148 to set the gas excitation power level; a temperature control instruction set for controlling a temperature control system in the substrate support 130 or the heat transfer medium supply 180 to control the flow of heat transfer medium to the heat transfer channel 152; and a process monitoring instruction set for monitoring a process in the processing chamber 100.

[0051] 6 shows a top view of the pedestal 134 and deposition ring 125 according to some embodiments of the present disclosure. In some embodiments, the inner surface 308 of the inner lip 250 forms a continuous circle without protrusions or radially inwardly extending alignment tabs so that the deposition ring 125 can rotate relative to the pedestal 134 when positioned thereon. In some embodiments, the substrate support surface 138 includes an epoxy coating. In some embodiments, the epoxy coating has a thickness of about 2 to about 4 micrometers. In some embodiments, the pedestal 134 includes one or more lift pin openings 610 configured to allow lift pins to pass therethrough to facilitate raising and lowering the substrate 104 from the pedestal 134.

[0052] While the forgoing is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof.

Claims

1. 1. A processing kit comprising: a deposition ring configured to be disposed on the substrate support, the deposition ring comprising: an annular band configured to rest on a lower ledge of the substrate support, the annular band having an upper surface and a lower surface, the lower surface including a step between a radially inner portion and a radially outer portion, the step extending downwardly from the radially inner portion to the radially outer portion; an inner lip extending upwardly from the upper surface of the annular band and adjacent to an inner surface of the annular band, the inner surface of the inner lip and the inner surface of the annular band together defining a central opening of the deposition ring, the outer surface of the inner lip extending radially outward and downwardly from the upper surface of the inner lip to the upper surface of the annular band; a channel disposed radially outward of the annular band; and an outer lip extending upwardly and disposed radially outward of the channel, an upper surface of the outer lip and the channel disposed below the lower surface of the annular band; It is equipped with the outer surface of the inner lip extends at an angle of about 5 degrees to about 15 degrees from the central axis of the deposition ring; or the deposition ring has an outer diameter of about 340 mm to about 380 mm; or the inner surface of the inner lip forms a continuous circle without any protrusions extending radially inwardly At least one of Processing kit.

2. 10. The process kit of claim 1, wherein the inner lip has a width of from about 2.0 mm to about 4.5 mm.

3. 10. The process kit of claim 1, wherein the thickness of the annular band at the radially inner portion is from about 2.55 mm to about 3.0 mm.

4. 10. The process kit of claim 1, wherein the thickness of the annular band at the radially outer portion is from about 4.76 mm to about 5.0 mm.

5. 10. The process kit of claim 1, wherein the inner surface of the inner lip has a diameter of about 285 mm to about 295 mm.

6. The process kit of claim 1 , wherein the outer lip includes one or more slots configured to receive a clamping assembly.

7. A one-piece process kit shield having a cylindrical body having an upper portion and a lower portion and a covering section extending radially inward from the lower portion. further comprising the covering section including a protrusion extending into the channel of the deposition ring and a recess into which the outer lip extends to define a serpentine flow path between the covering section and the deposition ring. The treatment kit of any one of claims 1 to 5.

8. a first leg extending downwardly adjacent an outer surface of the annular band; a second leg extending radially outward from the bottom of the first leg; and an outer lip extending upwardly from the second leg, the first leg, the second leg, and the outer lip together defining the channel; The process kit of claim 1 , further comprising:

9. the first leg has a length greater than a length of the inner lip; the outer lip has a length greater than the length of the inner lip; or The step diameter is about 315 mm to about 345 mm. The process kit of claim 8 , wherein the process kit comprises at least one of:

10. A substrate support, a pedestal having a substrate support surface with a given diameter for receiving a substrate, the pedestal having an electrostatic chuck disposed thereon, the pedestal including a lower ledge extending radially outward; 6. The process kit of claim 1, wherein the deposition ring is disposed on the lower ledge. a substrate support comprising:

11. The substrate support of claim 10 , wherein the distance between the substrate support surface and the upper surface of the lower ledge is from about 8 to about 11 mm.

12. The substrate support of claim 10, wherein the given diameter is from about 285 mm to about 293 mm.

13. The substrate support of claim 10 , wherein the lower ledge has a thickness of about 10 mm to about 15 mm.

14. The substrate support of claim 10 , wherein the deposition ring is rotatable relative to the pedestal when positioned on the pedestal.

15. The substrate support of claim 10 , wherein the substrate receiving surface comprises an epoxy coating.

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