Parsing method

Abstract

To provide a technique advantageous for analyzing a process in a short term and at low cost.SOLUTION: An analysis method for analyzing a process for producing a semiconductor device comprises: a preparation step for preparing a plurality of data sets each of which includes, input to a simulator for simulating the process, and output from the simulator; a generation step for generating a plurality of pieces of learning data in which, on the basis of the plurality of data sets, a value of information to be interested, out of pieces of process information related to at least one of control of the process and a state of the process, is taken as a value of an explanatory variable, and a value of evaluation information for evaluating the process is taken as a value of an objective variable; and a learning step for performing learning on the basis of the plurality of pieces of learning data which are generated in the generation step, for generating a model expressing the process.SELECTED DRAWING: Figure 9

Description

[Technical Field]

[0001] The present invention relates to an analysis method. [Background technology]

[0002] Machine learning, which has been attracting attention in recent years, is also considered useful for analyzing the process for manufacturing semiconductor devices. However, generating a model using machine learning requires a huge amount of information, and obtaining this huge amount of information by actually executing the process requires a lot of time and cost. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-27349 Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present invention is to provide an advantageous technique for analyzing a process in a short time and at low cost. [Means for solving the problem]

[0005] One aspect of the present invention relates to an analysis method for analyzing a process for manufacturing a semiconductor device by an imprint apparatus, the analysis method including: a preparation step of preparing a plurality of data sets, each including an input to a simulator that simulates the process and an output from the simulator; a generation step of generating a plurality of learning data based on the plurality of data sets, the values ​​of noteworthy information among process information related to control and state of the process being used as values ​​of explanatory variables, and values ​​of evaluation information for evaluating the process being used as values ​​of target variables; and a learning step of generating a model that expresses the process by performing learning based on the plurality of learning data generated in the generation step, wherein the preparation step causes the simulator to execute a simulation, and intermediate data that is information indicating a state of the process and is output together with a result of the simulation is accumulated in a database; and the generation step uses the intermediate data as values ​​of the explanatory variables, the intermediate data including a position profile of an imprint head in the imprint apparatus, a velocity profile of the imprint head, a moment profile of the imprint head, and, Curvature profile of a mold in the imprinting apparatus , at least one of An analysis method comprising: [Effects of the Invention]

[0006] The present invention provides an advantageous technique for analyzing processes in a short amount of time and at low cost. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a diagram illustrating an example of a hardware configuration of an analysis system according to an embodiment. [Figure 2] FIG. 2 is a diagram illustrating an example of the hardware configuration of a terminal and a server that constitute the analysis system. [Figure 3] FIG. 1 is a diagram illustrating an example of a logical configuration of an analysis system according to an embodiment. [Figure 4] FIG. 2 is a diagram schematically illustrating the flow of data or information in the analysis system of one embodiment. [Figure 5] FIG. 2 is a diagram schematically illustrating the flow of data or information in the analysis system of one embodiment. [Figure 6] FIG. 1 is a diagram schematically illustrating an example of a model (trained model) generated by a learning unit. [Figure 7] FIG. 10 is a diagram illustrating the operation of the analysis system in the simulation phase, more specifically, the operation of the simulation server. [Figure 8] FIG. 10 is a diagram illustrating the operation of the analysis system in the data collection phase, more specifically, the operation of the data collection server. [Figure 9] 10A and 10B are diagrams illustrating the operation of the analysis system in the learning phase and the utilization phase, more specifically, the operation of the estimation server. [Figure 10] FIG. 1 is a diagram illustrating an example of the configuration of an imprint apparatus. [Figure 11] FIG. 2 is a diagram illustrating the configuration of a driving unit of an imprint head. [Figure 12] FIG. 10 is a diagram schematically illustrating a state in which the mesa region of the mold is deformed into a convex shape toward the substrate. [Figure 13] FIG. 10 is a diagram illustrating an imprint process. [Figure 14] 10A and 10B are diagrams showing experimental results of observing the occurrence of unfilled defects. [Figure 15] 17A to 17C are diagrams schematically showing the states shown in FIG. 16. [Figure 16] FIG. 10 is a diagram illustrating the relationship between the contact boundary diameter and the mold curved shape. [Figure 17] FIG. 10 is a diagram illustrating the relationship between the contact boundary diameter and the inclination of the mold. [Figure 18] A diagram showing the verification results of the generated model. [Figure 19] A diagram showing the verification results of the generated model. [Figure 20] A diagram showing the verification results of the generated model. [Figure 21] A diagram showing the verification results of the generated model. [Figure 22] A diagram explaining explanatory variables. [Figure 23] FIG. 1 is a diagram for explaining a response variable. [Figure 24] FIG. 10 is a diagram illustrating a parent database. [Figure 25] FIG. 10 is a diagram illustrating an example of a database list for each module. [Figure 26] FIG. 10 is a diagram illustrating an example of a database list for each module. [Figure 27] FIG. 10 is a diagram illustrating an example of a database list of device information. [Figure 28] FIG. 10 is a diagram illustrating an example of a database of stamp profiles. [Figure 29] FIG. 10 is a diagram illustrating an example of a database list of intermediate data of device information. [Figure 30] FIG. 10 is a diagram illustrating a database of curvature profiles. [Figure 31] FIG. 10 is a diagram illustrating an example of a database of response variable information. [Figure 32] FIG. 10 is a diagram illustrating an example of a database of response variable information. [Figure 33] FIG. 10 is a diagram illustrating a search list for generating learning data. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0009] FIG. 1 is a diagram illustrating the hardware configuration of an analysis system AS according to one embodiment. The analysis system AS may have a configuration in which, for example, one or more terminals 101 and 105 constituting a user interface and multiple servers 102, 103, and 104 that execute data processing are connected via a network 100. The network 100 may be of any type. The multiple servers 102, 103, and 104 may be replaced by a single computer. In one example, the server 102 is configured as a simulation server, the server 103 is configured as a data collection server, and the server 104 is configured as an estimation server. The analysis system AS will be described below based on such an example configuration.

[0010] The simulation server 102 includes a simulator that simulates a process for manufacturing a semiconductor device. The simulator can be configured by installing computer software in a computer or by causing a computer to execute computer software. The data collection server 103 is configured to collect and store data sets generated by the simulation executed by the simulation server 102. The estimation server 104 performs learning based on multiple learning data generated from multiple data sets extracted or searched from the multiple data sets stored by the data collection server 103, and generates a model that represents the process for manufacturing a semiconductor device. The estimation server 104 also uses the model to estimate the execution results of the process.

[0011] 2 illustrates an example of the hardware configuration of terminals 101 and 105 and servers 102, 103, and 104. Note that terminals 101 and 105 and servers 102, 103, and 104 may have the same hardware configuration or different hardware configurations. The hardware configuration may include a system bus 201, a CPU 202, a ROM 203, a RAM 204, an HDD 205, a GPU 209, a NIC 206, an input unit 207, and a display unit 208. The GPU 209 is advantageous for shortening the time required for learning, and may perform calculations together with the CPU 202.

[0012] Fig. 3 shows an example of the logical configuration of an analysis system AS configured using the hardware configuration shown in Fig. 1 and Fig. 2. Figs. 4 and 5 show schematic diagrams of the flow of data or information in the analysis system AS. As described above, the analysis system AS may include one or more terminals 101, 105, a simulation server 102, a data collection server 103, and an estimation server 104. In this example, the simulation server 102, the data collection server 103, and the estimation server 104 are configured by separate computers, but they may also be configured by a single computer, or each may be configured by multiple computers.

[0013] The terminals 101 and 105 may include a user interface (UI) 301. By operating the user interface 301, a user can input or specify information to be provided to the simulation server 102, the data collection server 103, and the estimation server 104. Such information may include, for example, conditions for the simulation to be executed by the simulation server 102, explanatory variables and target variables of the model to be generated by the estimation server 104, conditions for the process to be verified using the model, and the like.

[0014] The simulation server 102 may include an input / output unit 311, a simulator 312, and a data storage unit 313. The input / output unit 311 may receive information from the terminal 101, 105, or the user interface 301, and may transmit information to the terminal 101, 105, or the user interface 301. The simulator 312 may generate a data set by simulating a process for manufacturing a semiconductor device (hereinafter simply referred to as a "process"). The data set may include input to and output from the simulator 312 that simulates the process. The data storage unit 313 may temporarily store the data set.

[0015] The data collection server 103 may include an input / output unit 321, a data manipulation unit 322, and a data storage unit 323. The input / output unit 321 may receive information from the terminals 101, 105, or the user interface 301, and may transmit information to the terminals 101, 105, or the user interface 301. The data manipulation unit 322 may receive or acquire datasets generated by simulation from the simulation server 102 and register them in a database configured by the data storage unit 323. In addition, the data manipulation unit 322 may search for multiple datasets that match a request from the multiple datasets registered in the database configured by the data storage unit 323, in accordance with a request from the estimation server 104, and provide the multiple datasets to the estimation server 104. The simulation server 102 and the data collection server 103 may each be understood as devices that perform a preparation process to prepare multiple datasets, including inputs to and outputs from a simulator that simulates a process.

[0016] The estimation server 104 may include an input / output unit 331, a data generation unit 332, a learning unit 333, an estimation unit 334, a determination unit 335, and a data storage unit 336. The input / output unit 331 may receive information from the terminal 101, 105, or the user interface 301, and may transmit information to the terminal 101, 105, or the user interface 301. The data generation unit 332 may execute a generation step of generating multiple pieces of training data based on multiple data sets provided by the data collection server 103. Each piece of training data may have values ​​of noteworthy information (attention information) among process information related to at least one of the control and state of the process as explanatory variable values, and values ​​of evaluation information for evaluating the process as target variable values. The process information may be control information for controlling the process, or intermediate data (information indicating the state of the process) calculated by a simulator based on the control information. The learning unit 333 may execute a learning step of generating a model representing the process by performing learning based on the multiple pieces of training data generated in the generation step executed by the data generation unit 332. The model may be stored in the data storage unit 336. The estimation unit 334 may use the model executed by the learning unit 33 and generated in the learning process to determine the value of the dependent variable based on the value of the explanatory variable provided from the terminal 101 or 105, and provide the value of the dependent variable to the terminal 101 or 105. The determination unit 335 may use the model executed by the learning unit 33 and generated in the learning process to determine the value of the explanatory variable so as to satisfy the target performance, and provide the value of the explanatory variable to the terminal 101 or 105.

[0017] The terminal 101 or 105 may provide control information for controlling a process to the simulation server 102 as an input for the simulator 312, and cause the simulator 312 to execute a simulation based on the control information. In this way, the simulator 312 may generate a data set. The terminal 101 or 105 may provide various control information to the simulation server 102 and cause the simulator 312 to execute a simulation, thereby generating a large number of data sets and storing them in the data collection server 103.

[0018] The terminal 101 or 105 can provide the estimation server 104 with control information for controlling a process and cause the estimation server 104 to prepare a model that matches the control information. If a model that matches the control information provided from the terminal 101 or 105 already exists, the estimation server 104 can determine evaluation information (values ​​of the objective variable) based on the control information (values ​​of the explanatory variables) in accordance with the model and provide the evaluation information to the terminal 101 or 105. If no model that matches the control information provided from the terminal 101 or 105 exists, the estimation server 104 can request the data collection server 103 to provide multiple datasets for generating the model by learning. This request can include, for example, control information for controlling the process. In response to a request from the estimation server 104, the data collection server 103 can search for multiple datasets that match the request from among the many accumulated datasets and provide the retrieved multiple datasets to the estimation server 104. If the data collection server 103 does not have stored multiple data sets that meet the request from the estimation server 104, it may request the simulation server 102 to generate multiple data sets that meet the request by simulation. The simulation server 102 may run a simulation using the simulator 312 in accordance with the request and provide the multiple data sets generated thereby to the data collection server 103. The data collection server 103 may provide the multiple data sets to the estimation server 104. The estimation server 104 may generate multiple training data using the multiple data sets and perform training using the multiple training data to generate a model that meets the conditions provided from the terminal 101 or 105.

[0019] FIG. 6 schematically illustrates an example of a model (trained model) generated by the learning unit 333. The model may be configured by a neural network 400. The neural network 400 may have, for example, an input layer 401, two hidden layers 402 and 403, and an output layer 404. A sample for each variable used in learning is assigned to each node in the input layer 401. Each node in each layer except the input layer 401 is configured by a linear sum of weighting coefficients and an activation function, and this model enables nonlinear propagation from the hidden layer 402 to the hidden layer 403 and finally to the output layer 404. Learning may be performed so as to minimize the difference between the value of the output layer 404 and training data prepared for learning. The output layer 404 is configured by one node, but may also include multiple nodes. The learning unit 333 may include an error detection unit and an update unit. The error detection unit obtains the error between the training data and the output data output from the output layer 404 of the neural network 400 in response to the input data input to the input layer 401. The error detection unit may use a loss function to calculate the error between the output data from the neural network 400 and the training data. The update unit updates the connection weighting coefficients between the nodes of the neural network 400 based on the error obtained by the error detection unit so as to reduce the error. This update unit may update the connection weighting coefficients using, for example, an error backpropagation method. The error backpropagation method is a technique for adjusting the connection weighting coefficients between the nodes of each neural network 400 so as to reduce the error.

[0020] 7 illustrates the operation of the analysis system AS in the simulation phase, more specifically, the operation of the simulation server 102. In step S001, the simulation server 102 receives index information and information identifying an input (input for simulation) to the simulator 312 from the terminal 101 or 105. Here, multiple input candidates for the simulator 312 may be stored in the simulation server 102, and the information provided from the terminal 101 or 105 may be information for selecting at least one of the multiple input candidates. The index information is information for identifying the content (conditions) of the simulation. In step S002, the simulation server 102 causes the simulator 312 to execute a simulation based on the information received in step S001. In step S003, the simulation server 102 stores a data set including the input and output of the simulation in step S002 in the data storage unit 313, in association with the index information.

[0021] 8 illustrates the operation of the analysis system AS in the data collection phase, more specifically, the operation of the data collection server 103. In step S011, the data collection server 103 receives, from the terminal 101 or 105, index information assigned when the simulation server 102 executed the simulation. In step S012, the data collection server 103 acquires, from the simulation server 102, a data set generated by execution of the simulation identified by the index information received in step S011. In step S013, the simulation server 102 registers the data set acquired in step S012 together with the index information in the database of the data storage unit 323.

[0022] 9 illustrates the operation of the analysis system AS in the learning phase and the utilization phase, more specifically, the operation of the estimation server 104. In step S021, the estimation server 104 receives information specifying the conditions for generating a model from the terminal 101 or 105. In step S022, the estimation server 104 identifies information necessary for learning, specifically information specifying explanatory variables and target variables, based on the information received in step S021, and requests the data collection server 103 to provide it. In response to this, the data operation unit 322 in the data collection server 103 searches for or extracts multiple data sets registered or stored in the database of the data storage unit 323 based on the information necessary for learning, and provides the data to the estimation server 104.

[0023] In step S023, the estimation server 104 acquires multiple datasets provided from the data collection server 103. The estimation server 104 checks whether the multiple datasets provided from the data collection server 103 are suitable for learning, for example, whether the number of datasets is appropriate, and if there is any deficiency, may notify the data collection server 103. In response to this, the data collection server 103 may provide the estimation server 104 with additional datasets or multiple new datasets.

[0024] In step S024, the data generation unit 332 in the estimation server 104 generates multiple training data sets based on multiple datasets. This process may include, for example, dividing the multiple datasets into a group of datasets for normal training and a group of datasets for acceptance testing. The ratio of the number of datasets for normal training to the number of datasets for validation may be, for example, 8:2 or 7:3, but is not limited to this. The datasets for normal training and validation may be determined by random sampling. The model generation process in step S025 may include a process of validating the model provisionally generated by training, and the validation dataset may be used for this validation. If the validation results are unsatisfactory, for example, the training method may be changed and training may be performed again. Specific examples of machine learning algorithms include nearest neighbor algorithms, naive Bayes algorithms, decision trees, and support vector machines. Deep learning, which uses a neural network to automatically generate features and connection weighting coefficients for training, may also be used. Any of the above algorithms that can be used can be used appropriately in this embodiment.

[0025] Step S026 is an example of the utilization phase, in which the estimation server 104 may use the model generated in step S025 to determine values ​​of explanatory variables that satisfy the target performance and provide the values ​​of the explanatory variables to the terminal 101 or 105. Alternatively, the estimation unit 334 may use the model generated in step S025 to determine values ​​of objective variables based on values ​​of explanatory variables provided from the terminal 101 or 105 and provide the values ​​of the objective variables to the terminal 101 or 105. The above-described method is advantageous for analyzing a process in a short time and at low cost.

[0026] The processing from the data collection phase to the learning phase, which has been described with reference to FIGS. 7, 8, and 9, will be described below with reference to a specific example of a database. FIG. 24 illustrates an example of a parent database configured by the data storage unit 323 of the data collection server 103. The first column of the parent database may be index information (Index). The index information may include, for example, a character string indicating the conditions for executing a simulation. Mold information (mold info), substrate information (substrate info), gas information (gas info), imprint material information (resist info), apparatus information (apparatus info), and objective variable information (objective variable info info) may be recorded in the same row in association with the index information.

[0027] Mold information is information about the mold. Substrate information is information about the substrate (wafer). Gas information is information about the gas supplied to the space between the substrate and the mold. Imprint material information is information about the imprint material. Apparatus information is information about the operation of an imprint apparatus that performs an imprint procedure. The imprint procedure can be a procedure in which an imprint material is placed on a substrate, the imprint material is brought into contact with the mold so as to form a liquid film of the imprint material, the liquid film is hardened to form a hardened film of the imprint material, and the hardened film is separated from the mold.

[0028] Each of the mold information, substrate information, gas information, imprint material information, apparatus information, and objective variable information may be called a module. A number (identifier) ​​called a key may be assigned to each module. The key is used to refer to the corresponding detailed information.

[0029] The keys assigned to each module will now be explained. Fig. 25 schematically shows a database list or template that collects various conditions for each module. Fig. 26 schematically shows a database list of mold information (mold info). The first column gives the key for mold information (mold info), and various conditions associated with that key, such as the mold name, mold dimensions, core diameter, and core thickness, are listed in the same row. The same is true for other modules, and Fig. 26 schematically shows gas information (gas info), substrate information (substrate info), and imprint material information (resist info).

[0030] 7 and 8 will be described along with the examples shown in FIGS. 24, 25, and 26. First, the operation of the simulation server 102 will be described illustratively with reference to FIG. 7. In step S001, the simulation server 102 receives index information (Index) and information specifying an input (input for simulation) to the simulator 312 from the terminal 101 or 105. In step S002, the simulation server 102 causes the simulator 312 to execute a simulation based on the information received in step S001. In step S003, the simulation server 102 stores a data set including the input and output in the simulation in step S002 in the data storage unit 313 in association with the index information (Index).

[0031] The operation of the data collection server 103 will be described by way of example with reference to Fig. 8. In step S011, the data collection server 103 receives, from the terminal 101 or 105, index information (Index) assigned when the simulation server 102 executed the simulation. In step S012, the data collection server 103 acquires, from the simulation server 102, a data set generated by the execution of the simulation identified by the index information (Index) received in step S011. In step S013, the simulation server 102 registers the data set acquired in step S012 in the database of the data storage unit 323 in the format exemplified in Figs. 24, 25, and 26 while associating the index information (Index) with the key of each module.

[0032] The device information (device info) will now be described. Figures 27, 28, 29, and 30 show examples of a device information (device info) database. Figure 27 shows a schematic diagram of a database list of device information (device info). The first column gives the key of the device information (device info), and in the same row, various profile conditions associated with that key are listed. From the left, the imprint head impression profile name, cavity pressure profile name, and further the time derivative of the impression profile and the ith-th order time derivative (i = 1, 2, ... n) can be listed. Various templates can be selected by the key.

[0033] Furthermore, with respect to the imprint profile name=CL500 in FIG. 27, there is a database such as that illustrated in FIG. 28 that can be referenced based on CL500. In the database of FIG. 28, a force value for each time is defined as a variable string associated with the imprint profile name. Furthermore, the device information (device info) may have an intermediate data database such as that illustrated in FIG. 29. The intermediate data database may include intermediate data output from the simulator 312 along with the simulation results. The intermediate data may include, for example, an imprint head position profile, an imprint head velocity profile, an imprint head moment profile, a mold curvature profile, etc. In the example of FIG. 29, there is a curvature profile name=W500 associated with key1 in FIG. 27, and the database of FIG. 30 referenced based on W500 defines the curvature amount for each time as a variable string associated with W500.

[0034] FIG. 31 shows a schematic diagram of a database of objective variable information (objective variable info). Unlike other modules, the first column of the objective variable information (objective variable info) database is index information (index), just like the parent database. In association with the index information (Index), wafer position (Waf position) (the wafer position may be identified by information such as S0, S1, S2, etc., indicating the position of the shot area on the wafer) may be arranged in the same row. Furthermore, in association with the index information (Index), information indicating the number of molecules at time i (i is an arbitrary time) for each specific area (p0, p1, . . . , pn) of the mold mesa (pattern area) may be arranged in the same row. While the number of molecules, a typical evaluation quantity, is used as the objective variable here, the evaluation quantity is not limited to this. For example, evaluation quantities such as the defect density in the cured film and the pass / fail judgment result of a mark filling image (an image showing the filling state of the imprint material in the alignment mark) may also be used as the objective variable. In addition, additional information such as location and / or time may be added. In this way, various evaluation quantities can be used as response variables.

[0035] Here, we will explain how to convert the mesa region of the mold into a variable with reference to Figure 32. As can be seen from Figure 31, the wafer position information (Waf position) (S0, S1, S2, ...) has a 1:1 correspondence with the index information (Index), and can therefore also be associated with the objective variable 1:1, and can be used as an explanatory variable as is during learning. However, when the mesa region of the mold is used as a variable, in order to associate it with the objective variable 1:1, it is necessary to convert the arrangement so that only the area variable corresponds to the corresponding objective variable on each row, as shown in Figure 32. Therefore, when generating data for learning, data such as the example shown in Figure 32 may be generated.

[0036] Next, a method for generating multiple learning data sets based on multiple data sets obtained from the databases described above will be described, with reference to the operation shown in FIG. 9 . First, in S021, the estimation server 104 receives a search database list such as that shown in FIG. 33 from the terminal 101 or 105, or may generate the list based on information received from the terminal 101 or 105. The first row of the search database list shown in FIG. 33 lists the module information names described above, and conditions (keys) can be entered for each module. By referencing the parent database shown in FIG. 24, data sets having the same index information (index) for multiple module combinations can be extracted. Therefore, by creating a search database list such as that shown in FIG. 33, a data set for learning (optimization) can be obtained. In the example shown in FIG. 33, by setting the key for imprint information (resist info) to any, only data that meets all conditions in the imprint information database list (template) and other module conditions can be searched for and used for learning.

[0037] An imprint apparatus will be described below as an example of a semiconductor manufacturing apparatus that executes a process for manufacturing a semiconductor device. FIG. 10 is a schematic diagram showing the configuration of the imprint apparatus IMP. The imprint apparatus IMP is a lithography apparatus used in lithography processes, which are manufacturing processes for semiconductor devices, magnetic storage media, liquid crystal display elements, and the like, and forms a pattern on a substrate. The imprint apparatus IMP functions as a molding apparatus that performs a molding process using a mold to mold an imprint material, which is a composition, on a substrate. In this embodiment, the imprint apparatus IMP brings the mold into contact with the imprint material supplied onto the substrate, and applies energy for curing to the imprint material, thereby forming a pattern in a cured product to which the mold pattern has been transferred. The mold is also referred to as a mold, template, or original.

[0038] The imprint material is a material (curable composition) that hardens when curing energy is applied. The curing energy may be electromagnetic waves, heat, or the like. Electromagnetic waves include, for example, light having a wavelength selected from the range of 10 nm to 1 mm, specifically infrared rays, visible light, ultraviolet rays, and the like.

[0039] The curable composition is a composition that cures upon irradiation with light or heat. The photocurable composition that cures upon irradiation with light contains at least a polymerizable compound and a photopolymerization initiator, and may further contain a non-polymerizable compound or a solvent, as necessary. The non-polymerizable compound is at least one selected from the group consisting of a sensitizer, a hydrogen donor, an internal mold release agent, a surfactant, an antioxidant, a polymer component, and the like.

[0040] The imprint material may be applied to the substrate in the form of a film using a spin coater or a slit coater. Alternatively, the imprint material may be applied to the substrate in the form of droplets, or in the form of islands or a film formed by connecting multiple droplets using a liquid jet head. The viscosity of the imprint material (at 25°C) is, for example, 1 mPa·s or more and 100 mPa·s or less.

[0041] The substrate may be made of glass, ceramics, metal, semiconductor, resin, etc., and may have a member made of a material different from the substrate formed on its surface as needed. Specifically, the substrate may be made of a silicon wafer, a compound semiconductor wafer, quartz glass, etc.

[0042] 10 , the imprint apparatus IMP has a substrate stage 3, a substrate chuck 5, an imprint head 6, a pressure adjustment unit 7, and a mold chuck 9. The imprint apparatus IMP also has a relay optical system 12, a bandpass filter 13, an observation unit 14, a first measurement unit 15, a second measurement unit 16, a control unit 18, a memory unit 19, and an irradiation system 30.

[0043] In this specification and the accompanying drawings, directions are indicated in an XYZ coordinate system, with the direction parallel to the surface of the substrate 4 being the XY plane. The directions parallel to the X-axis, Y-axis, and Z-axis in the XYZ coordinate system are defined as the X direction, Y direction, and Z direction, respectively, and rotation around the X-axis, rotation around the Y-axis, and rotation around the Z-axis are defined as θX, θY, and θZ, respectively. Control and drive (movement) about the X-axis, Y-axis, and Z-axis refer to control or drive (movement) in directions parallel to the X-axis, Y-axis, and Z-axis, respectively. Furthermore, control or drive about the θX-axis, θY-axis, and θZ-axis refer to control or drive in rotation around an axis parallel to the X-axis, rotation around an axis parallel to the Y-axis, and rotation around an axis parallel to the Z-axis, respectively.

[0044] The mold 1 has a rectangular outer shape and is made of a quartz substrate. The mold 1 has a mesa region (pattern region) 2 in the center of a first surface 1a facing the substrate, where a pattern (concave-convex pattern) to be transferred to the substrate 4 (the imprint material thereon) is formed. The mesa region 2 is formed to be higher than the surrounding region, i.e., to have a stepped structure, in order to prevent the region other than the mesa region 2 from contacting the substrate 4 when the imprint material is formed on the substrate. The mold 1 also has a core-out 8 (recessed structure), which is a cylindrical recess, on a second surface 1b opposite the first surface 1a including the mesa region 2. The core-out 8 is also called a cavity, and is generally formed so that the center of the core-out 8 overlaps the center of the mesa region 2.

[0045] The imprint head 6 holds the mold 1, for example, via a mold chuck 9 that vacuum- or electrostatically adsorbs the mold 1. The imprint head 6 also functions as a pressing unit (imprinting unit) that brings the mold 1, which is adsorbed on the mold chuck 9, into contact with and presses it against an imprint material on a substrate. The imprint head 6 includes a drive unit that drives (moves) the mold chuck 9. As shown in FIG. 11, this drive unit includes three-axis drive systems DZ1, DZ2, and DZ3. FIG. 11 is a diagram showing an example of the configuration of the drive unit of the imprint head 6. The drive systems DZ1, DZ2, and DZ3 are composed of actuators that can be driven independently in the Z direction, for example. The position and attitude (state) of the imprint head 6 can be measured (observed) in real time using various sensors provided in the imprint apparatus IMP, such as height sensors and force sensors (not shown) built into the imprint head 6.

[0046] The pressure adjusting unit 7 adjusts the pressure of the core-out 8 provided on the mold 1. The core-out 8 is provided for the purpose of deforming the mold 1, specifically the mesa region 2, into a convex shape toward the substrate when the mold 1 is brought into contact with the imprint material on the substrate, and gradually expanding the contact area with the imprint material from the center of the mesa region 2. Specifically, the pressure adjusting unit 7 makes the pressure of the core-out 8 higher than the external pressure, thereby deforming the mesa region 2 of the mold 1 into a convex shape toward the substrate. In this manner, the pressure adjusting unit 7 functions as a deformation unit that applies force to the second surface 1b of the mold 1 opposite to the first surface 1a, thereby deforming the first surface 1a into a convex shape toward the substrate. In this embodiment, the pressure adjusting unit 7 adjusts the pressure of the core-out 8 of the mold 1, thereby applying force to the core-out 8 (second surface 1b) and deforming the mesa region 2 (first surface 1a) into a convex shape toward the substrate. By deforming the mesa region 2 of the mold 1 into a convex shape toward the substrate, the gas present between the mold 1 (mesa region 2) and the substrate 4 (imprint material) can be pushed outward (to the outer periphery), thereby reducing the number of air bubbles that become mixed into the imprint material on the substrate.

[0047] In this embodiment, the relay optical system 12 is disposed inside the imprint head 6, and the bandpass filter 13 and the irradiation system 30 are disposed above the imprint head 6. With the imprint material on the substrate and the mold 1 in contact, the irradiation system 30 irradiates light (e.g., ultraviolet light) onto the imprint material on the substrate via the bandpass filter 13 and the relay optical system 12, thereby curing the imprint material.

[0048] The observation unit 14 is disposed above the imprint head 6. The observation unit 14 observes the mesa region 2 of the mold 1 and the shot region of the substrate 4 via the bandpass filter 13 and the relay optical system 12. Specifically, the observation unit 14 acquires images by observing how the imprint material on the substrate is pushed and spread by the mold 1 and the interference fringes formed by the narrow gap between the mold 1 and the substrate 4. The observation unit 14 also functions as an acquisition unit that acquires information regarding the spread of the contact area (contact region) between the mold 1 (mesa region 2) and the imprint material on the substrate.

[0049] The substrate stage 3 holds the substrate 4 via a substrate chuck 5 that vacuum- or electrostatically adsorbs the substrate 4. The substrate stage 3 drives (moves) the substrate chuck 5 in the X and Y directions, thereby enabling imprint processing on the entire surface of the substrate 4 (all shot areas).

[0050] The substrate stage 3 is provided with a first measurement unit 15 that measures the height of the first surface 1a on the substrate side of the mold 1, for example, the height of the mesa region 2. Therefore, by moving the substrate stage 3 so that the first measurement unit 15 passes under the mold 1, the first measurement unit 15 can measure the shape (surface shape) and tilt amount of the mesa region 2 of the mold 1.

[0051] The imprint apparatus IMP is also provided with a second measurement unit 16 that measures the height of the substrate 4, facing the substrate stage 3. Therefore, by moving the substrate stage 3 so that the substrate 4 passes under the second measurement unit 16, the second measurement unit 16 can measure the shape (surface shape) and tilt amount of the substrate 4.

[0052] The control unit 18 is configured as an information processing device (computer) including a CPU, memory, etc., and controls the entire imprint apparatus IMP according to a program stored in the storage unit 19. The control unit 18 controls each unit of the imprint apparatus IMP to control a process of contacting the mesa region 2 (first surface 1a) of the mold 1 with an imprint material (composition) on the substrate to form an imprint material film between the mesa region 2 and the substrate 4. In this embodiment, the process of forming an imprint material film is an imprint process that forms a pattern of the imprint material in each of multiple shot regions on the substrate. The control unit 18 can analyze images acquired by the observation unit 14 to evaluate the imprint process and reflect the results in the imprint process. For example, the control unit 18 acquires measurement results from the first measurement unit 15 and the second measurement unit 16 (the surface shape and tilt amount of the mesa region 2 of the mold 1 and the surface shape and tilt amount of the substrate 4) to confirm the leveling state between the mold 1 and the substrate 4. Then, the control unit 18 controls the state (position and posture) of the imprint head 6 and the state (shape) of the mold 1 via the imprint head 6 and pressure adjustment unit 7 based on the leveling state between the mold 1 and the substrate 4.

[0053] Here, a typical imprint process will be described in detail with reference to FIG. 13. FIG. 13 is a flowchart for explaining a typical imprint process. The imprint process is usually performed while maintaining the leveling state of the mold 1 and the substrate 4 parallel. Specifically, an ideal imprint process is achieved by maintaining the leveling of the mesa region 2 of the mold 1 and the shot region of the substrate 4 parallel. Therefore, the surface shape (position in the height direction (Z direction)) and tilt amount of the mesa region 2 of the mold 1 are measured in advance by the first measurement unit 15 (on the apparatus), and further, the surface shape and tilt amount of the substrate 4 are measured globally in advance by the second measurement unit 16, thereby obtaining the leveling state of both. Then, in S402, a target tilt position (target tilt position) of the mold 1 or the substrate 4 is set, and the gap amount between the mesa region 2 of the mold 1 and the substrate 4 is also set.

[0054] Next, in S404, as shown in Fig. 12, pressure is applied to the core-out 8 of the mold 1 via the pressure adjustment unit 7, causing the mesa region 2 of the mold 1 to expand toward the substrate and deform into a convex shape. As described above, this is to make it less likely that air bubbles will be trapped in the imprint material on the substrate when contact between the mold 1 and the imprint material on the substrate begins. Note that the amount of deformation of the mesa region 2 of the mold 1, i.e., the value of the pressure applied from the pressure adjustment unit 7 to the core-out 8 of the mold 1, is set in advance. Fig. 12 is a diagram showing the state in which the mesa region 2 of the mold 1 has been deformed into a convex shape toward the substrate in the imprint apparatus IMP.

[0055] Next, in S406, a contacting process is initiated in which the mold 1 is brought into contact with the imprint material on the substrate. Specifically, the imprint head 6 lowers the mold chuck 9, which has adsorbed the mold 1, in the Z direction relative to the substrate 4, which has been positioned in the X and Y directions by the substrate stage 3, so that the center of the mesa region 2 of the mold 1 comes into contact with the imprint material on the substrate. Furthermore, while maintaining this state, the mold chuck 9 is lowered in the Z direction by force control until a predetermined force is reached, thereby spreading the imprint material on the substrate to the entire mesa region 2 of the mold 1. At this time, the height (position in the Z direction), tilt, and force of the mold 1 are controlled by controlling the driving of the drive systems DZ1, DZ2, and DZ3, which constitute the drive unit of the imprint head 6.

[0056] Next, once the imprint material on the substrate has been spread over the entire area of ​​the mesa region 2 of the mold 1, in S408, the pressure of the core-out 8 of the mold 1 is reduced (lowered) via the pressure adjustment unit 7, and the shape of the mesa region 2 of the mold 1 is restored to its original shape. In S408, the leveling state of the mold 1 and the substrate 4 is finally made parallel. Then, in S410, the process proceeds to a filling step in which the imprint material on the substrate is filled into the mold 1, and the leveling state of the mold 1 and the substrate 4 is maintained parallel for a predetermined period (until the imprint material on the substrate is filled into the mold 1). Note that the steps prior to the filling step, specifically the steps including steps S406 and S408, are also called a dynamic spreading step.

[0057] Next, in S412, once the imprint material on the substrate has been filled into the mold 1, the imprint material is irradiated with light from the irradiation system 30 to harden the imprint material (hardening step). After that, in S414, the mold chuck 9 is raised in the Z direction by the imprint head 6, and the mold 1 is separated from the hardened imprint material on the substrate (mold release step).

[0058] 13 has explained the normal sequence of the imprint process, but for the purpose of apparatus calibration, a similar sequence can be performed even when there is no imprint material on the substrate. Furthermore, pressure control (control for deforming the mold 1 into a convex shape toward the substrate), height control (position in the Z direction) of the mold 1, tilt control, and force control are stored in advance in the memory unit 19 as control profiles and are executed by the control unit 18.

[0059] In imprint processing, shortening the time required for the dynamic spreading process is required to further improve productivity (throughput). Figures 14(a), (b), and (c) show the results of an experiment in which the occurrence of unfilled defects was observed while varying the time required for the dynamic spreading process. Figures 14(a), (b), and (c) show the results when the time required for the dynamic spreading process was set to 0.6 seconds, 0.5 seconds, and 0.4 seconds, respectively. However, the time required for the filling process (the sum of the time required for the dynamic spreading process and the time required for the filling process) was kept constant at 0.8 seconds. Referring to Figures 14(a), (b), and (c), it can be seen that as the time required for the dynamic spreading process shortens, unfilled defects become more likely to occur, and the number of unfilled defects increases. Therefore, if the time required for the dynamic spreading process is shortened without due consideration, the number of unfilled defects increases, leading to a decrease in productivity.

[0060] Here, we consider the experimental results when the time required for the dynamic spreading process was changed. Figures 15(a), (b), and (c) are diagrams showing the contact state between the imprint material on the substrate and the mold 1 (mesa region 2), and images 40 corresponding to such contact states acquired by the observation unit 14, each showing a different contact state. In Figures 15(a), (b), and (c), the different contact states are represented as curved surfaces 50, 60, and 70 that indicate the shape (deformation amount) of the mold 1.

[0061] 15(a) shows a state in which the imprint material on the substrate and the mold 1 are not in contact, and in this state, no interference pattern is included in the image 40 acquired by the observation unit 14. FIG. 15(b) shows a state in which the imprint material on the substrate and the mold 1 are in contact with each other with a contact diameter (distance) defined by a contact boundary 43, which is the outer edge of the contact area, and in this state, the image 40 acquired by the observation unit 14 includes an interference pattern IF43. It can be seen that the spacing between the interference fringes in the vicinity of the contact boundary 43 is narrow, and therefore the slope of the convex shape of the mold 1 in the vicinity of the contact boundary 43 (the curvature of the curved surface 60) is large.

[0062] 15(c) shows a state in which the imprint material on the substrate and the mold 1 are in contact with each other with a contact diameter defined by a contact boundary 44, which is the outer edge of the contact area, and the image 40 acquired by the observation unit 14 in this state includes an interference pattern IF44. In detail, FIG. 15(c) shows a state in which the contact boundary 43 becomes a contact boundary 44 by continuing to press the mold 1 into the imprint material on the substrate while maintaining a constant pressure applied to the core-out 8 of the mold 1. In the interference pattern IF44, it can be seen that the spacing between the interference fringes near the contact boundary 44 is wide, and therefore the slope of the convex shape of the mold 1 (the curvature of the curved surface 70) is smaller than the slope of the convex shape of the mold 1 shown in FIG. 15(b) (the curvature of the curved surface 60).

[0063] 15(a), (b), and (c) will be described in detail with reference to Figures 16 and 17. In Figure 16, the shape (curved surface 50) of the mold 1 in a state where the imprint material on the substrate and the mold 1 are not in contact (Figure 15(a)) is shown by a height curve C50. Also, the shape (curved surface 60) of the mold 1 in a state where the imprint material on the substrate and the mold 1 are in contact with each other at a contact diameter defined by the contact boundary 43 (Figure 15(b)) is shown by a height curve C60. Similarly, the shape (curved surface 70) of the mold 1 in a state where the imprint material on the substrate and the mold 1 are in contact with each other at a contact diameter defined by the contact boundary 44 (Figure 15(c)) is shown by a height curve C70.

[0064] 15(a), (b), and (c), it can be seen that the spacing between the interference fringes near the contact boundary increases as the contact area between the imprint material on the substrate and the mold 1 increases. Referring to FIG. 16, where the height of half the pitch of the interference fringes is indicated by dashed line 80, a wider spacing between the interference fringes means a larger contact boundary. In other words, as the spacing between the interference fringes increases, the slope of the convex shape of the mold 1 (the curvature of curved surfaces 50, 60, and 70) decreases, as shown in FIG. 17.

[0065] 17, the inclination of the convex shape of the mold 1 at the contact boundary becomes smaller at the periphery of the shot area where the contact diameter becomes larger. Therefore, the relative inclination (curvature) between the mold 1 and the substrate 4 at the contact boundary becomes smaller at the periphery of the shot area. This means that the effect of deforming the mold 1 into a convex shape to push outward the gas present between the mold 1 and the substrate 4 faster than the spread of the imprint material and thereby reducing the number of air bubbles mixed in the imprint material on the substrate becomes smaller at the periphery of the shot area.

[0066] Returning to the experimental results described above, the distribution of unfilled defects shown in Figure 14(c) indicates that the relative tilt between the mold 1 and substrate 4 at the contact boundary becomes smaller, particularly around the periphery of the mesa region 2 (shot region), regardless of the time required for the dynamic spreading process. However, this trend also suggests that it becomes more pronounced when the time required for the dynamic spreading process is shortened. This can be explained by the physical phenomenon that increasing the speed at which the imprint material on the substrate is pushed out increases the pressure of the gas existing between the mold 1 and substrate 4, resulting in an increase in the number of gas molecules trapped between the mold 1 and substrate 4 (in the imprint material on the substrate).

[0067] The simulator 312 is configured to be able to reproduce the operation in an actual imprint process with sufficient accuracy. The simulator 312 executes a simulation of the process in the imprint apparatus IMP in accordance with the configuration of the imprint apparatus IMP, a sequence flow, and various other information. Here, the following can be given as examples of information taken into account in the simulation: Mold information (information on mold shape, dimensions, physical properties related to rigidity, patterns on the mold, etc.) Substrate information (information on the shape and dimensions of the substrate, layer structure (including dimensions), physical properties of the film on the substrate, topography of the substrate, etc.) Gas information (information on the type of gas, the physical properties of the gas that affect the filling properties of the imprint material, etc.) Imprint material (resist) information (information regarding imprint material application conditions, physical properties (e.g., viscosity, surface tension, droplet volume, contact angle, etc.), imprint material film thickness, and droplet arrangement (grid shape, droplet pitch, droplet pitch aspect ratio, etc.) of the imprint material) Device information (information regarding the specifications of the imprint device (e.g., device configuration, imprint sequence, imprint profile, etc.), information provided to the imprint device for controlling the imprint device, etc.) The simulator 312 may calculate, for example, the behavior of the imprint head, changes in gas pressure around the imprint head, flow of the imprint material under the mesa region, deformation of the mold, changes in mold curvature at the contact boundary, etc. This allows the simulator 312 to calculate how the imprint material fills the space between the substrate and the mold.

[0068] In this process, the simulator 312 may also calculate the loss rate of gas diffusing and dissolving in the mold, imprint material, and film on the substrate. As a result, the simulator 312 may calculate the number of gas molecules trapped between droplets of the imprint material on the substrate when the imprint material is deposited on the substrate in droplet form. The simulator 312 may also calculate the number of gas molecules on the substrate when the imprint material is spin-coated on the substrate. Furthermore, the simulator 312 may also calculate, over time, evaluation quantities such as the uniformity of the imprint material film thickness, seepage of the imprint material from the edges of the mesa region, mold deformation, and distortion due to the influence of the substrate topography.

[0069] 7, 8, and 9 and the process in the imprint apparatus IMP will be described below by way of example. In step S001, the following simulation conditions (input information 1) were used.

[0070] (Input information 1) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Imprinting profiles: 343 types Droplet types: 102 types Droplet volume: 0.6 / 0.9 / 1.2pl In addition to the above, standard parameters such as the dimensions of the cored-out mold shape, the size and thickness of the substrate, the gas diffusion and solubility coefficients, and physical properties such as the viscosity and surface tension of the imprint material, as well as the structure and performance values ​​of the device, and tabulated data can be input (set).

[0071] The imprint profile is the command value given to the imprint head during the dynamic spreading steps S406-S408 and the subsequent filling step S410. In this example, 343 imprint profile conditions were prepared and calculated for one type of droplet pattern. 102 types of droplet patterns were also prepared, with three types of droplet volume for each droplet pattern. To achieve randomness in the droplet volume, a random value was assigned within the range of 0.6-0.8 pl for the 0.6 pl setting. Similarly, a random value was assigned within the range of 0.8-1.0 pl for the 0.9 pl setting, and a random value was assigned within the range of 1.0-1.2 pl for the 1.2 pl setting. Index information was assigned to each of the above simulation conditions, a total of 1,055 conditions.

[0072] In step S002, simulations were performed for 1,055 conditions and the resulting data set was saved. The calculations took approximately 2-3 hours per condition. In step S003, the data set obtained by the simulation was saved in the simulation server in association with index information.

[0073] Next, in step S011, the data collection server also received the index information. In step S012, a data set was extracted from the simulation server based on the index information and stored in the data storage unit of the data collection server. The data storage unit of the data collection server stored a list of simulation variable information to be extracted, and data sets were extracted for each index based on that list. The list of variable information may include some of the variables set in the simulation and various evaluation quantities. The evaluation quantities may include, for example, traces related to the movement (position, force) of the imprint head, mold deformation, and mold curvature at the contact boundary. The evaluation quantities may also include, for example, the film thickness of the imprint material, gas pressure, distortion, and the number of gas molecules trapped between droplets. In step S013, the extracted variables were associated with the index information and registered in a database. The variables include explanatory variables and target variables.

[0074] In step S021, information regarding the conditions that the user actually wants to model is received by the estimation server 104. Here, the following modeling conditions (input information 2) were used.

[0075] (Input information 2) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Imprint profile: Normal Droplet types: 102 types Droplet volume: 0.6 / 0.9 / 1.2pl Evaluation value: Number of molecules between droplets In step S022, the variables to be learned from input information 2—here, all combinations of droplet types and droplet volumes and the corresponding number of molecules between droplets—are selected. A list of combinations of explanatory variables and objective variables is generated, or, if a saved input information template is available, the saved template can be loaded. As previously described, in steps S023–S025, multiple data sets are extracted from the data collection server and divided into training and validation sets to generate multiple training data sets. This data set is then used for training to generate a model. The objective variable in this case is an index of filling performance, i.e., the number of molecules between droplets. A threshold is set, and defects are extracted by binarizing the number of molecules using this threshold. The number of defects is then counted, and the set of molecule counts can be converted to the number of defects. However, the appropriate threshold is likely to depend on the process and measurement conditions.

[0076] Figure 18 shows the results of verifying a model generated by training using multiple training data sets. The horizontal axis represents the objective variable data of the validation data, which were considered to be true values. The vertical axis represents the estimated values ​​calculated using the generated model. Figure 18 also shows the correlation coefficient R^2 and root mean square residual RMSE values ​​between them. A correlation coefficient of 0.98 means that the simulation results can be estimated with high prediction accuracy. In other words, in the range of input conditions used in this study, by using the model to estimate the number of molecules between droplets for several unknown droplet patterns that are likely to have good filling properties with a high degree of probability, it is possible to select the optimal droplet from among them.

[0077] Furthermore, similar learning was performed on droplets with different imprint profiles. The other conditions were the same as for input information 2. (Input information 3) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Impression profile: High speed impression profile Droplet types: 102 types Droplet volume: 0.6 / 0.9 / 1.2pl Evaluation value: Number of molecules between droplets The input information 3 was set so that a profile for stamping faster than the above stamping profile, that is, a profile with a shorter stamping time, was selected and learned.

[0078] Figure 19 shows the results of verifying a model generated by learning according to input information 3. The horizontal axis represents the objective variable data for the verification data, which were considered to be true values. The vertical axis represents the estimated values ​​calculated using the generated model. The results in Figure 19 were better than those in Figure 18 in terms of both the correlation coefficient and RMSE values. While there was an overall trend for the number of molecules between droplets to increase as the imprint profile became faster, it is believed that this wider variance improved the correlation coefficient.

[0079] When the two models trained in this embodiment were compared by sorting the droplet patterns with the best filling performance for the droplet type used, the names of almost the same droplet patterns were ranked at the top, with the rankings varying slightly. From these results, it can be inferred that the relationship between droplet pattern and imprint profile in terms of filling performance is a highly independent, linear relationship. By comparing the predicted values ​​of different models obtained by changing the input information, as in this embodiment, it is possible to understand the relationships between more essential variables, and it can be said that this system is capable of providing substantially optimal conditions from the user's perspective.

[0080] Below, we will explain how to learn the impression profile as a non-quantitative variable, i.e., a categorical variable. Here, we will explain the method of converting the impression profile into a quantitative variable and using it, and its effects. In step S021, the following input information 4 was used.

[0081] (Input information 4) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Imprinting profile: 343 types: F(t), dF / dt, t={t0, t1, tn} Droplet type: 1 type Droplet volume: 0.6 / 0.9 / 1.2pl Evaluation value: Number of molecules between droplets In step S022, variables F(t) and dF / dt were used as explanatory variables instead of the identification name of the impression profile. The impression profile input to the simulator is usually a time-series command value table or a matrix of coefficients of a higher-order function. In step S022, numerical values ​​were obtained as variables F(t) and dF / dt at any time. Furthermore, coefficients of higher-order functions such as spline coefficients may be used instead of variables F(t) and dF / dt. However, depending on the degree and the number of nodes, the number of variables may increase, resulting in high learning costs. Therefore, here, we will explain a method using force and its derivatives as variables. Optimizing time over an appropriate number of steps enables low-cost learning. F(t) is information that controls the mold drive, and dF / dt is information that can be derived from F(t).

[0082] In this example, several steps to a dozen or so steps were appropriate. Making the increments smaller did not contribute to accuracy, but instead increased the learning time. The imprint profile can be not only force, but also position, and in the case of a cavity, it becomes pressure. Other profiles include tilt or moment, and simulations can be performed using a combination of these.

[0083] Furthermore, instead of dF / dt, it is possible to increase the number of variables by using n-th order derivatives (n=1, 2, ...). Also, it is not necessary to use all n-th order derivatives as variables. F(t), dF / dt, and the n-th order derivatives of F(t) (n=1, 2, ...) can be understood as time-series data that indicate changes in the state of the imprint head. The n-th order derivatives of F(t) are information that can be derived from F(t).

[0084] For these impression profile variables, if the accuracy of the provisionally generated model does not satisfy the required accuracy in step S025, re-learning can be performed. This re-learning can be performed, for example, by increasing or decreasing the number of time steps and the n-th derivative value for F(t) and the n-th derivative (n=1, 2, . . .) of F(t).

[0085] In this example, both the F(t) and dF / dt variables were used, and the model was trained using a step increment of t = {t0, t1, t2...t7}, and then validated. The validation results are shown in Figure 20. Looking at the correlation coefficient of 0.94 and RMSE of 0.5185, both results are less accurate than the case in Figure 19, but are still at a level that can be used to predict optimal conditions.

[0086] Instead of command values ​​for the imprint profile, information indicating the process state, such as time-series imprint head movement or mold shape changes, output as intermediate data from the simulation, can also be used as explanatory variables. For example, if the imprint profile is commanded using force and / or pressure, the intermediate data can be time-series data on the corresponding imprint head position information. Regarding the imprint head tilt and / or moment, if one is given as a command value, the other can also be intermediate data. Alternatively, time-series data on the mold shape can also be intermediate data. Furthermore, for the mold shape, the diameter of the contact boundary, which is the outer edge of the area where the imprint material on the substrate and the mold come into contact, or the curvature of the mold at the contact boundary, can also be intermediate data. Furthermore, n-th order derivatives (n = 1, 2, ...) of these intermediate data can be used as explanatory variables, similar to the method of converting the imprint profile into explanatory variables.

[0087] Figure 21 shows the results of verifying a learning model when the force command value of the impression profile and the intermediate data of the imprint head position and its speed information were all used as explanatory variables. The correlation coefficient was 0.97 and the RMSE was 0.3635, showing a significant improvement in accuracy. However, care must be taken when using intermediate data for learning, as predictions from the model are limited to the conditions under which the intermediate data was previously used in the model. In other words, it may be difficult to make predictions from the model for unknown impression profiles. However, in cases where predictions are required within the constraints of a known impression profile, highly accurate predictions are possible.

[0088] So far, we have explained how to generate a prediction model for evaluation quantities from imprint profile information. By using this model, it is possible to provide imprint profile information that meets user requirements, and from that information, it is possible to generate an imprint profile that matches the actual device format and perform imprinting.

[0089] Below, we explain how to further improve prediction accuracy. Generally, NIL filling performance is expressed by the number of defects, but there are locations where defects are likely to occur and locations where they are not. As can be seen from the defect distribution in Figure 14, locations where defects are likely to occur include corners, distribution on concentric circles, and even on area boundary lines that depend on the mold pattern design. Furthermore, residual layer thickness uniformity (RLTU), which is the distribution of the imprint material thickness, and distortion are also performance variables that depend on location. In simulation, sequential analysis of the mold shape makes it possible to analyze each position within the shot area over time.

[0090] Furthermore, even the coordinates of the shot area, which depend on the position within the substrate, can be considered variables dependent on the equipment structure. Figures 10 and 12 show that the influence of the pressure from the atmosphere or gas used on the entire mold during imprinting differs depending on the structure of the substrate stage and substrate chuck, depending on whether imprinting is performed near the center of the substrate or on the periphery of the substrate. In the shot area near the center of the substrate, the entire mold is contained within the substrate, so the narrow gap area formed between the mold and the substrate surface during imprinting is the largest, and the influence of this pressure is significant. On the other hand, in the shot area near the periphery of the substrate, the narrow gap area formed between the mold and the substrate surface is about half, and the space below the part of the mold that is not on the substrate surface is not a narrow gap area, and gaps on the order of millimeters can occur. Therefore, the influence of the pressure on the mold is smaller than near the center of the substrate.

[0091] In the simulation, the gas pressure can be analyzed taking into account the position of the shot area on the substrate where the imprint is made, and further the position within the shot area. Therefore, by using such information as an explanatory variable, it is possible to generate a highly accurate model that can meet more detailed requirements. This will be explained in detail below.

[0092] In step S021, the following input information 5 was used.

[0093] (Input information 5) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Imprinting profile: 2 types Droplet types: 102 types Droplet volume: 0.6 / 0.9 / 1.2pl Shot area position: S0 Location in mesa: p0, p1, p2, p3, p4, p5, p6 Evaluation value: Number of molecules between droplets In step S022, the shot area positions within the substrate (wafer) shown in Figure 22 were identified using non-quantitative variables such as variables S0 and S1. Furthermore, within these shot areas, seven areas p0 to p6 were identified within the first quadrant, again using non-quantitative variables, taking into account factors such as the symmetry of mold designs and the fact that imprinting generally progresses concentrically. In step S022, the input information 5 was transferred to the data collection server, and in step S023, a dataset was extracted. Arbitrary evaluation values ​​within a 2 mm region were extracted for the positions corresponding to p0 to p6. These datasets were used for learning to generate a model. The results are shown in Figure 18. Although not explained up to this point, the area information within the shot areas p0 to p6 was used as an explanatory variable for Figures 19, 20, and 21, just as in Figure 18. However, even if the area information within the shot area is not used as an explanatory variable, it is possible to generate a model through learning.

[0094] In imprint lithography, in addition to the number of defects (number of molecules between droplets), the filling and seepage of imprint material in specific locations, such as large marks and the edges of mesa regions, can also be inspected. The simulator 312 can have a global mode that calculates the entire mold, as well as a local mode that performs calculations focusing on a specific region within the mesa region. By closely coordinating information between the two modes, consistent output can be achieved. For example, a region of approximately 2 mm in the corner of the mesa region can be specified as the region to be calculated in local mode. In this case, the global mode calculation results up until just before the imprint reaches that region can be used to calculate the flow of imprint material in that region. Furthermore, immediately after imprinting in that region, the global mode calculation results can be linked to the state of the region so that they are consistent.

[0095] In step S001, by setting the local mode calculation for a specific region together with the global mode calculation during input, it is possible to evaluate the detailed filling state in the specific region. Such evaluation will be described below.

[0096] In step S021, the following input information 6 was used.

[0097] (Input information 6) Mold: Test#924 Substrate: Adhesion layer / Si substrate Gas Type: Helium Imprint profile: Normal Droplet types: 102 types Droplet volume: 0.6 / 0.9 / 1.2pl Shot area position: S0 Mesa location: p6 local mode region Evaluation value: Classification of filled images In this example, in step S025, the evaluation value of the objective variable is used to classify the filled image. Therefore, unlike the regression learning described above, a classification-type learning (logistic regression) is performed. In such learning, a method is generally used in which the classification is determined based on the fill level, rather than a continuous quantity, and represented by a discrete value. Figure 23 shows an example of a filled image of the mark area M1 output in local mode. Two unfilled defect areas D1 are visible. For example, to classify this image, the objective variable is defined as {0: good, 1: slight underfill, 2: moderate underfill, 3: large underfill, 4: small amount of seepage, 5: moderate seepage, 6: large amount of seepage}. For example, this image is treated as classification 2. This process can also be performed automatically using known image recognition machine learning techniques. Such a classification processing program may be processed within the data collection server, and the results may be saved. The image data classified using the above method is processed into the objective variable, and in step S026, learning is performed using a logistic regression model. General regression problems and classification problems have in common that, in the case of neural networks, processing proceeds from the input layer to the output layer using nonlinear functions called activation functions, such as step functions, sigmoid functions, and Relu functions. However, general regression problems and classification problems differ in the functions used in the output layer. In the case of regression problems, it is common to use an identity function, as you want to output the calculated value itself. In contrast, classification problems generally use a function called a softmax function, which outputs the probability that the sum of the probabilities of each classification will be 1, and classification is performed by selecting the one with the highest probability.

[0098] The above-mentioned method is also capable of making predictions in image classification, making it possible to narrow down the droplets.

[0099] The above explanation was given through examples of machine learning under specific process conditions. Information about mold conditions, substrate conditions, gas type, imprint material, and droplets can be arbitrarily set. It can also be arbitrarily set for the operating procedures of the imprinting apparatus. For example, mold conditions, such as the mold and core-out shape and their dimensions, can be arbitrarily set. Furthermore, information about the pattern density and pattern design of the mold's pattern area can be obtained as mold design data. Topography information can be input for substrate conditions, and calculations can be performed with different gas loss rates by changing the film properties of the underlayer. For gas types, diffusion coefficients and solubility coefficients can be input, allowing calculations with different gas loss rates. For imprint materials, application conditions such as spin coating and jetting, as well as physical properties such as viscosity and surface tension, can be input. For droplets, droplet volume and contact angle can be input.

[0100] The present invention is not limited to the imprint process, but can be applied to various processes.

[0101] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0102] IMP: imprint device, 1: mold, 2: mesa region, 4: substrate, 6: imprint head, 7: pressure adjustment unit, 8: core-out, 18: control unit

Claims

1. 1. An analysis method for analyzing a process for manufacturing a semiconductor device using an imprint apparatus, comprising: preparing a plurality of data sets, each including inputs to and outputs from a simulator that simulates the process; a generation step of generating, based on the plurality of data sets, a plurality of learning data sets in which values ​​of noteworthy information among process information related to the control and state of the process are used as values ​​of explanatory variables and values ​​of evaluation information for evaluating the process are used as values ​​of objective variables; a learning step of generating a model that represents the process by performing learning based on the plurality of learning data generated in the generating step; Including, In the preparation step, the simulator is caused to execute a simulation, and intermediate data, which is information indicating the state of the process and is output together with the results of the simulation, is stored in a database; In the generating step, the intermediate data is used as values ​​of the explanatory variables, an analysis method, characterized in that the intermediate data includes at least one of a position profile of an imprint head in the imprint apparatus, a velocity profile of the imprint head, a moment profile of the imprint head, and a curvature profile of a mold in the imprint apparatus.

2. a calculation step of calculating, using the model, a value of the response variable corresponding to a given value of the explanatory variable, The analysis method according to claim 1 .

3. a determining step of determining values ​​of the explanatory variables using the model so as to satisfy a target performance; The analysis method according to claim 1 .

4. The method further includes a step of causing the simulator to execute a simulation and storing the data set obtained thereby in a database; the preparation step includes a search step of searching the database for the plurality of data sets; 4. The analysis method according to claim 1, wherein the first and second components are the same or different.

5. In the searching step, the plurality of data sets are searched from the database based on the given value of the noteworthy information.

5. The analysis method according to claim 4.

6. The process includes the steps of placing an imprinting material on a substrate, contacting the imprinting material with the mold to form a liquid film of the imprinting material, curing the liquid film to form a hardened film of the imprinting material, and separating the hardened film from the mold.

6. The analysis method according to claim 1, wherein the first and second components are the same or different.

7. The noteworthy information includes at least one of mold information, which is information about the mold; substrate information, which is information about the substrate; gas information, which is information about gas supplied to a space between the substrate and the mold; imprint material information, which is information about the imprint material; and apparatus information, which is information about the operation of an imprint apparatus that performs the procedure. The analysis method according to claim 6 .

8. The noteworthy information includes at least the mold information, and the mold information includes information regarding at least one of the shape of the mold, the dimensions of the mold, the rigidity of the mold, and a pattern of the mold. The analysis method according to claim 7 .

9. The noteworthy information includes at least the substrate information, and the substrate information includes information on at least one of a shape of the substrate, a dimension of the substrate, a layer structure of the substrate, a physical property value of a film of the substrate, and a topography of the substrate.

9. The analysis method according to claim 7 or 8.

10. the noteworthy information includes at least the gas information, and the gas information includes information on at least one of the type of the gas and a physical property value of the gas that affects the filling property of the imprint material; 10. The analysis method according to claim 7, wherein the first and second components are the same or different.

11. the noteworthy information includes at least the imprint material information, and the imprint material information includes information regarding at least one of application conditions of the imprint material, physical property values ​​of the imprint material, a film thickness of the imprint material, and an arrangement of droplets of the imprint material; 11. The analysis method according to claim 7, wherein:

12. the notable information includes at least the device information, and the device information includes information regarding at least one of specifications of the imprinting device and information provided to the imprinting device for control of the imprinting device; 12. The analysis method according to claim 7, wherein the analysis method is a method for analyzing a sample.

13. the information of interest includes information regarding a location on the substrate where the procedure is to be performed; 13. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

14. The information to be noted includes information about a region to be noted among the pattern regions of the mold.

14. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

15. the noteworthy information includes information for controlling driving of the mold to control a step of bringing the imprint material into contact with the mold so as to form a liquid film of the imprint material; 15. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

16. the noteworthy information includes information derived from information for controlling the actuation of the mold to control a step of bringing the imprint material into contact with the mold so as to form a liquid film of the imprint material; 16. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

17. the notable information includes time series data indicative of changes in the state of an imprint head holding the mold; 17. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

18. the noteworthy information includes time series data showing changes in the shape of the mold; 17. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

19. the noteworthy information includes time-series data showing a change in the diameter of the outer edge of the area where the imprint material and the mold are in contact; 18. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

20. The evaluation information is information regarding defects of the cured film.

20. The analysis method according to claim 6, wherein the analysis method is a method for analyzing a sample.

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