Fluid cabinet exhaust control method and substrate processing apparatus

Abstract

To properly exhaust the atmosphere in a fluid cabinet according to the state of liquid leakage in the fluid cabinet.SOLUTION: An exhaust control method for a fluid cabinet (120) includes: a standard exhaust step of exhausting the atmosphere in the fluid cabinet (120) under a standard exhaust condition; an abnormality detection step of detecting an abnormality in the fluid cabinet (120); an abnormal state determination step of determining an abnormal state in the fluid cabinet (120) on the basis of the detection result in the abnormality detection step; a forced exhaust condition determination step of determining a forced exhaust condition set to an exhaust volume larger than the exhaust volume of the standard exhaust condition on the basis of the determination result in the abnormal state determination step; and a forced exhaust step of exhausting the atmosphere in the fluid cabinet (120) under the forced exhaust condition determined in the forced exhaust condition determination step.SELECTED DRAWING: Figure 6

Description

[Technical Field]

[0001] The present invention relates to an exhaust control method for a fluid cabinet and a substrate processing apparatus. [Background technology]

[0002] 2. Description of the Related Art Substrate processing apparatuses are known that process substrates. Substrate processing apparatuses are suitable for processing semiconductor substrates. Typically, substrate processing apparatuses process substrates using a processing liquid such as a chemical solution.

[0003] When using a processing liquid, if pressure fluctuations or the like occur within the container, the chemical liquid may come into contact with the surrounding atmosphere, causing the properties of the chemical liquid to fluctuate. For this reason, studies have been conducted to prevent the chemical liquid from coming into contact with the surrounding atmosphere by supplying a specific gas to the chemical liquid cabinet (see Patent Document 1). Patent Document 1 describes a substrate cleaning apparatus that prevents the chemical liquid from coming into contact with the surrounding atmosphere by supplying an organic-free gas with a controlled amount of organic contamination to the chemical liquid preparation cabinet. In the substrate cleaning apparatus of Patent Document 1, the organic-free gas supplied to the space above the chemical liquid surface in the concentration / temperature control container is exhausted through an exhaust duct from a pipe installed at the top of the concentration / temperature control container. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2010-56209 Summary of the Invention [Problem to be solved by the invention]

[0005] In the substrate cleaning apparatus of Patent Document 1, a chemical liquid piping system and a concentration / temperature control container are arranged in a chemical liquid preparation cabinet. If the chemical liquid flowing through the chemical liquid piping system and the concentration / temperature control container leaks into the chemical liquid preparation cabinet, it is exhausted through an exhaust duct. However, if the exhaust flow rate through the exhaust duct is low, the leaked chemical liquid cannot be exhausted sufficiently. On the other hand, if the exhaust flow rate of the exhaust duct is set too high, the air blowing mechanism must be driven at high speed, which places an excessive burden on the environment.

[0006] The present invention has been made in consideration of the above-mentioned problems, and its purpose is to provide a fluid cabinet exhaust control method and a substrate processing apparatus that can appropriately exhaust the atmosphere inside the fluid cabinet depending on the condition inside the fluid cabinet. [Means for solving the problem]

[0007] According to one aspect of the present invention, a method for controlling exhaust of a fluid cabinet is a method for exhausting the atmosphere within a space partitioned by a fluid cabinet in which fluid piping is arranged through which fluid supplied to a substrate processing unit flows, and includes a standard exhaust process for exhausting the atmosphere within the fluid cabinet under standard exhaust conditions, an abnormality detection process for detecting an abnormality within the fluid cabinet, an abnormal state determination process for determining an abnormal state within the fluid cabinet based on the detection result in the abnormality detection process, a forced exhaust condition determination process for determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume of the standard exhaust conditions based on the determination result in the abnormal state determination process, and a forced exhaust process for exhausting the atmosphere within the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination process.

[0008] In one embodiment, the abnormality detection process includes a leakage detection process for detecting leakage that has occurred within the fluid cabinet, and the abnormal state determination process includes a leakage state determination process for determining the leakage state within the fluid cabinet based on the detection results in the leakage detection process.

[0009] In one embodiment, the abnormality detection process includes an exhaust pressure drop detection process that detects a drop in exhaust pressure within the fluid cabinet, and the abnormal state determination process includes an exhaust pressure drop state determination process that determines a drop in the exhaust pressure of the fluid cabinet based on the detection results in the exhaust pressure drop detection process.

[0010] In one embodiment, the forced exhaust process includes a first forced exhaust process, which transitions from the standard exhaust process and exhausts the atmosphere inside the fluid cabinet under first forced exhaust conditions set to a first forced exhaust volume that is larger than the exhaust volume under the standard exhaust conditions, and a second forced exhaust process, which, if no abnormality is detected inside the fluid cabinet after a predetermined time has elapsed since transitioning from the standard exhaust process to the first forced exhaust process, exhausts the atmosphere inside the fluid cabinet under second forced exhaust conditions set to a second forced exhaust volume that is larger than the exhaust volume under the standard exhaust conditions and smaller than the first forced exhaust volume.

[0011] In one embodiment, in the standard exhaust step, the standard exhaust conditions are set based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping.

[0012] In one embodiment, the forced exhaust process includes a process of determining whether or not to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition in the previous fluid cabinet determined in the forced exhaust process.

[0013] In one embodiment, the fluid cabinet includes a first fluid housing and a second fluid housing connected to a common exhaust pipe shared with the first fluid housing, and if an abnormality is detected in the first fluid housing in the abnormality detection process, the atmosphere in the first fluid housing is exhausted under the forced exhaust conditions in the forced exhaust process.

[0014] In one embodiment, in the forced exhaust step, the amount of exhaust gas flowing through the common exhaust pipe is increased.

[0015] In one embodiment, if an abnormality is detected in the first fluid housing in the abnormality detection process, the forced exhaust process increases the exhaust volume of the first fluid housing without changing the exhaust volume of the exhaust circulating through the common exhaust piping.

[0016] In one embodiment, the abnormal state determination process determines the abnormal state by comparing the detection result with a predetermined reference value, and a first reference value, which is the reference value for determination corresponding to the first fluid housing, and a second reference value, which is the reference value for determination corresponding to the second fluid housing, are different.

[0017] In one embodiment, in the forced exhaust condition determination process, a first housing forced exhaust condition corresponding to the first fluid housing and a second housing forced exhaust condition corresponding to the second fluid housing are determined, and the first housing forced exhaust condition and the second housing forced exhaust condition are different.

[0018] In one embodiment, if an abnormality in the fluid cabinet is detected in the abnormality detection process, the forced exhaust process reduces the exhaust volume of a dummy cabinet connected to a common exhaust piping shared with the fluid cabinet below the exhaust volume of the standard exhaust process, and increases the exhaust volume of the fluid cabinet above the exhaust volume of the standard exhaust process.

[0019] According to another aspect of the present invention, a substrate processing apparatus includes a substrate processing unit for processing substrates, a fluid cabinet in which fluid piping is disposed to allow fluids supplied to the substrate processing unit to flow, an abnormality detection unit for detecting an abnormality within the fluid cabinet, an exhaust unit for exhausting an atmosphere within the fluid cabinet, and a control unit for controlling the exhaust unit. The control unit controls the exhaust unit to exhaust the atmosphere within the fluid cabinet under standard exhaust conditions, the control unit determines an abnormal state within the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality within the fluid cabinet, the control unit determines forced exhaust conditions based on the determination result of the abnormal state, the control unit sets an exhaust volume greater than the exhaust volume under the standard exhaust conditions, and the control unit controls the exhaust unit to exhaust the atmosphere within the fluid cabinet under the forced exhaust conditions.

[0020] In one embodiment, the abnormality detection unit includes a liquid leakage detection unit that detects liquid leakage in the fluid cabinet.

[0021] In one embodiment, the abnormality detection unit includes an exhaust pressure detection unit that detects exhaust pressure inside the fluid cabinet.

[0022] In one embodiment, the control unit controls the exhaust unit to switch from the standard exhaust condition and exhaust the atmosphere inside the fluid cabinet under a first forced exhaust condition set to a first forced exhaust volume that is larger than the exhaust volume of the standard exhaust condition, and if a predetermined time has elapsed since the switch from the standard exhaust condition to the first forced exhaust condition and no abnormality is detected inside the fluid cabinet, controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under a second forced exhaust condition set to a second forced exhaust volume that is larger than the exhaust volume of the standard exhaust condition and smaller than the first forced exhaust volume.

[0023] In one embodiment, the control unit sets the standard exhaust condition based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping.

[0024] In one embodiment, the control unit determines whether to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition in the fluid cabinet determined when exhausting the atmosphere in the fluid cabinet under the forced exhaust conditions.

[0025] In one embodiment, the fluid cabinet includes a first fluid housing and a second fluid housing connected to a common exhaust pipe shared with the first fluid housing, and the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid housing under the forced exhaust condition when the abnormality detection unit detects an abnormality in the first fluid housing.

[0026] In one embodiment, the control unit increases the amount of exhaust gas flowing through the common exhaust pipe under a forced exhaust condition.

[0027] In one embodiment, when the abnormality detection unit detects an abnormality in the first fluid housing, the control unit increases the exhaust volume of the first fluid housing under the forced exhaust condition without changing the exhaust volume of the exhaust circulating through the common exhaust piping.

[0028] In one embodiment, the control unit determines the abnormal state by comparing the detection result with a predetermined reference value, and a first reference value, which is the reference value for the determination corresponding to the first fluid container, and a second reference value, which is the reference value for the determination corresponding to the second fluid container, are different.

[0029] In one embodiment, the control unit determines, as the forced exhaust conditions, a first housing forced exhaust condition corresponding to the first fluid housing and a second housing forced exhaust condition corresponding to the second fluid housing, and the first housing forced exhaust condition and the second housing forced exhaust condition are different.

[0030] In one embodiment, the substrate processing apparatus further includes a dummy cabinet and a common exhaust pipe connected to each of the fluid cabinet and the dummy cabinet, and when the abnormality detection unit detects an abnormality in the fluid cabinet, the control unit reduces the exhaust volume of the dummy cabinet below the exhaust volume under the standard exhaust conditions and increases the exhaust volume of the fluid cabinet above the exhaust volume under the standard exhaust conditions. [Effects of the Invention]

[0031] According to the present invention, the atmosphere inside the fluid cabinet can be appropriately exhausted depending on the state of leakage inside the fluid cabinet. [Brief explanation of the drawings]

[0032] [Figure 1] 1 is a schematic diagram of a substrate processing apparatus according to an embodiment of the present invention; [Figure 2] 2 is a schematic view of a substrate processing unit in the substrate processing apparatus of the present embodiment. FIG. [Figure 3] FIG. 2 is a schematic view of a fluid cabinet in the substrate processing apparatus of the present embodiment. [Figure 4] 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; [Figure 5] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 6] FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. [Figure 7] 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; [Figure 8] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 9] 10(a) and 10(b) are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 10] FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. [Figure 11] 10(a) and 10(b) are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 12] FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. [Figure 13] 10(a) and 10(b) are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 14] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 15] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 16] FIG. 2 is a schematic view of a fluid cabinet in the substrate processing apparatus of the present embodiment. [Figure 17] 1A and 1B are schematic diagrams of a fluid cabinet in the substrate processing apparatus of the present embodiment. [Figure 18] 1A and 1B are schematic diagrams of a fluid cabinet in the substrate processing apparatus of the present embodiment. [Figure 19] 10(a) and 10(b) are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 20] 1A and 1B are schematic diagrams of a fluid cabinet and a common exhaust pipe in the substrate processing apparatus of the present embodiment. [Figure 21] 1A and 1B are schematic diagrams of a fluid cabinet and a common exhaust pipe in the substrate processing apparatus of the present embodiment. [Figure 22](a) is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in a substrate processing apparatus of this embodiment, (b) is a schematic diagram of a fluid cabinet in a substrate processing apparatus of this embodiment, (c) is a schematic diagram of a dummy cabinet in a substrate processing apparatus of this embodiment, and (d) is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in a substrate processing apparatus of this embodiment. [Figure 23] 3 is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in the substrate processing apparatus of the present embodiment. FIG. [Figure 24] 1A and 1B are schematic diagrams of a dummy cabinet in the substrate processing apparatus of the present embodiment. [Figure 25] 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; [Figure 26] FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. [Figure 27] 1A is a schematic diagram of a fluid cabinet in the substrate processing apparatus of the present embodiment, and FIG. 1B is a graph showing the change over time in exhaust pressure in the method for controlling exhaust of a fluid cabinet according to the present embodiment. [Figure 28] 10(a) to 10(c) are schematic diagrams illustrating exhaust from the fluid cabinet according to the present embodiment. [Figure 29] 10(a) to 10(d) are schematic views for explaining the operation of the exhaust unit in the substrate processing apparatus of the present embodiment. [Figure 30] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. [Figure 31] 1(a) to 1(c) are schematic diagrams for explaining the method for controlling exhaust from a fluid cabinet according to the present embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0033] Hereinafter, embodiments of a fluid cabinet exhaust control method and a substrate processing apparatus according to the present invention will be described with reference to the drawings. In the drawings, identical or corresponding parts are designated by the same reference numerals, and descriptions thereof will not be repeated. In this specification, to facilitate understanding of the invention, mutually orthogonal X-, Y-, and Z-axes may be described. Typically, the X- and Y-axes are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0034] First, an embodiment of a substrate processing apparatus 100 according to the present invention will be described with reference to Fig. 1. Fig. 1 is a schematic plan view of the substrate processing apparatus 100 of this embodiment.

[0035] The substrate processing apparatus 100 processes a substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface treatment, property imparting, treatment film formation, removal of at least a portion of a film, and cleaning on the substrate W.

[0036] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W has a substantially circular disk shape. Here, the substrate processing apparatus 100 processes the substrates W one by one.

[0037] 1, the substrate processing apparatus 100 includes a plurality of substrate processing units 10, a fluid box 110, a fluid cabinet 120, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a controller 101. The controller 101 controls the load ports LP, the indexer robot IR, and the center robot CR. The controller 101 includes a control unit 102 and a memory unit 104.

[0038] Each load port LP accommodates a plurality of stacked substrates W. The indexer robot IR transports the substrates W between the load port LP and the center robot CR. The center robot CR transports the substrates W between the indexer robot IR and the substrate processing units 10. The fluid cabinet 120 supplies fluids used to process the substrates W to the substrate processing units 10 via the fluid box 110. For example, the fluid cabinet 120 supplies a processing liquid to the substrate processing units 10 via the fluid box 110. Each substrate processing unit 10 discharges a processing liquid onto the substrate W to process the substrate W. The fluid cabinet 120 accommodates the processing liquid.

[0039] Specifically, the substrate processing units 10 form a plurality of towers TW (four towers TW in FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes a plurality of substrate processing units 10 stacked one above the other (three substrate processing units 10 in FIG. 1). Each fluid box 110 corresponds to a plurality of towers TW. Fluid in the fluid cabinet 120 is supplied to the tower TW corresponding to the fluid box 110 via one of the fluid boxes 110. Either a processing liquid or a gas may be supplied to the substrate processing units 10 and the fluid cabinet 120.

[0040] The processing liquid may include a so-called chemical liquid. The chemical liquid includes hydrofluoric acid. For example, the hydrofluoric acid may be heated to 40°C or higher and 70°C or lower, or 50°C or higher and 60°C or lower. However, the hydrofluoric acid does not have to be heated. The chemical liquid may also include water or phosphoric acid.

[0041] The chemical solution may also include hydrogen peroxide, SC1 (ammonia-hydrogen peroxide mixture), SC2 (hydrochloric acid-hydrogen peroxide mixture), or aqua regia (a mixture of concentrated hydrochloric acid and concentrated nitric acid).

[0042] Alternatively, the processing liquid may include a so-called rinse liquid, such as deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water (e.g., about 10 ppm to 100 ppm), or reduced water (hydrogen water).

[0043] The fluid cabinet 120 defines a specific space within the substrate processing apparatus 100. In the substrate processing apparatus 100, a boundary wall BW is disposed between an area where the center robot CR and the substrate processing units 10 are installed and an area where the fluid cabinet 120 is installed. The fluid cabinet 120 defines a part of the space in the area outside the boundary wall BW of the substrate processing apparatus 100.

[0044] The fluid cabinet 120 uses a housing to partition a specific space within the substrate processing apparatus 100. The fluid cabinet 120 has fluid piping within the housing through which a fluid flows. For example, the fluid cabinet 120 has processing liquid piping within the housing through which a processing liquid flows. Furthermore, the fluid cabinet 120 typically has a preparation tank (tank) for preparing the processing liquid. The fluid cabinet 120 may have a preparation tank for one type of processing liquid or may have preparation tanks for multiple types of processing liquid. Furthermore, the fluid cabinet 120 may have a pump, a nozzle, and / or a filter for circulating the processing liquid.

[0045] Here, the fluid cabinet 120 has a first fluid housing 122a and a second fluid housing 122b. The first fluid housing 122a and the second fluid housing 122b are arranged opposite each other. The first fluid housing 122a and the second fluid housing 122b define a specific space within the substrate processing apparatus 100. Note that, in order to avoid overly complicating the drawing, FIG. 1 shows the flow of fluid in the first fluid housing 122a being supplied to the tower TW corresponding to the fluid box 110 via one of the fluid boxes 110, and omits the flow of fluid in the second fluid housing 122b.

[0046] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computer.

[0047] The memory unit 104 stores data and computer programs. The data includes recipe data. The recipe data includes information indicating a plurality of recipes. Each of the plurality of recipes defines the processing content and processing procedure for the substrate W. The data includes exhaust conditions for exhausting the atmosphere in the fluid cabinet 120. The exhaust conditions may include standard exhaust conditions and forced exhaust conditions.

[0048] The control unit 102 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the exhaust conditions stored in the memory unit 104. For example, the control unit 102 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions or the forced exhaust conditions stored in the memory unit 104.

[0049] For example, the storage unit 104 may have a table classified according to at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120. For example, the storage unit 104 may have a table classified according to a combination of at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120 and an abnormal state within the fluid cabinet 120. The storage unit 104 may also have a table classified according to a combination of at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120 and a leakage state within the fluid cabinet 120.

[0050] Furthermore, the memory unit 104 may store a predetermined reference value that serves as a reference for determining the exhaust condition. The predetermined reference value is compared with the detection result of an abnormality in the fluid cabinet 120 to determine an abnormal state in the fluid cabinet 120. For example, the predetermined reference value may be a threshold value.

[0051] The storage unit 104 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may include removable media. The control unit 102 executes computer programs stored in the storage unit 104 to perform substrate processing operations.

[0052] Next, the substrate processing unit 10 in the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 2. Fig. 2 is a schematic diagram of the substrate processing unit 10 in the substrate processing apparatus 100.

[0053] The substrate processing unit 10 includes a chamber 12, a substrate holding part 20, and a processing liquid supply part 30. The chamber 12 accommodates a substrate W. The substrate holding part 20 holds the substrate W.

[0054] The chamber 12 is generally box-shaped and has an internal space. The chamber 12 accommodates the substrates W. Here, the substrate processing apparatus 100 is a single-wafer type that processes the substrates W one by one, and the chamber 12 accommodates the substrates W one by one. The substrates W are accommodated in the chamber 12 and processed in the chamber 12. The chamber 12 accommodates at least a part of each of the substrate holder 20 and the processing liquid supply unit 30.

[0055] The substrate holding unit 20 holds the substrate W. The substrate holding unit 20 holds the substrate W horizontally so that the top surface (front surface) Wa of the substrate W faces upward and the back surface (bottom surface) Wb of the substrate W faces vertically downward. The substrate holding unit 20 also rotates the substrate W while holding it. The substrate holding unit 20 rotates the substrate W while holding it.

[0056] For example, the substrate holding unit 20 may be a clamping type that clamps the edge of the substrate W. Alternatively, the substrate holding unit 20 may have any mechanism that holds the substrate W from the back surface Wb. For example, the substrate holding unit 20 may be a vacuum type. In this case, the substrate holding unit 20 holds the substrate W horizontally by adsorbing the central portion of the back surface Wb of the substrate W, which is the surface on which devices are not formed, to its upper surface. Alternatively, the substrate holding unit 20 may be a combination of a clamping type that brings multiple chuck pins into contact with the peripheral edge surface of the substrate W, and a vacuum type.

[0057] For example, the substrate holder 20 includes a spin base 21, a chuck member 22, a shaft 23, an electric motor 24, and a housing 25. The chuck member 22 is provided on the spin base 21. The chuck member 22 chucks the substrate W. Typically, the spin base 21 is provided with a plurality of chuck members 22.

[0058] The shaft 23 is a hollow shaft. The shaft 23 extends vertically along the rotation axis Ax. The spin base 21 is coupled to the upper end of the shaft 23. The substrate W is placed above the spin base 21.

[0059] The spin base 21 is disk-shaped and supports the substrate W horizontally. The shaft 23 extends downward from the center of the spin base 21. The electric motor 24 applies a rotational force to the shaft 23. The electric motor 24 rotates the shaft 23 in a rotational direction, thereby rotating the substrate W and the spin base 21 around the rotation axis Ax. The housing 25 surrounds the shaft 23 and the electric motor 24.

[0060] The processing liquid supply unit 30 supplies the processing liquid to the substrate W. Typically, the processing liquid supply unit 30 supplies the processing liquid to the upper surface Wa of the substrate W.

[0061] The processing liquid supply unit 30 includes a pipe 32, a valve 34, and a nozzle 36. The nozzle 36 ejects the processing liquid onto the upper surface Wa of the substrate W. The nozzle 36 is connected to the pipe 32. The processing liquid is supplied to the pipe 32 from a supply source. The valve 34 opens and closes a flow path in the pipe 32. The nozzle 36 is preferably configured to be movable relative to the substrate W. The nozzle 36 can move horizontally and / or vertically according to a movement mechanism controlled by the control unit 102. It should be noted that the movement mechanism is omitted in this specification to avoid overly complicated drawings.

[0062] The valve 34 adjusts the opening of the pipe 32 to regulate the flow rate of the processing liquid supplied to the pipe 32. Specifically, the valve 34 includes a valve body (not shown) having a valve seat provided therein, a valve element that opens and closes the valve seat, and an actuator (not shown) that moves the valve element between an open position and a closed position.

[0063] The substrate processing apparatus 100 further includes a cup 80. The cup 80 collects the processing liquid splashed from the substrate W. The cup 80 moves up and down. For example, the cup 80 moves up vertically to the side of the substrate W during the period in which the processing liquid supply unit 30 supplies the processing liquid to the substrate W. In this case, the cup 80 collects the processing liquid splashed from the substrate W due to the rotation of the substrate W. Furthermore, when the period in which the processing liquid supply unit 30 supplies the processing liquid to the substrate W ends, the cup 80 moves down vertically from the side of the substrate W.

[0064] As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the substrate holder 20, the processing liquid supply unit 30, and / or the cup 80. In one example, the control unit 102 controls the electric motor 24 and the valve 34.

[0065] The substrate processing apparatus 100 of this embodiment is suitable for use in the manufacture of semiconductor devices having semiconductors. Typically, in semiconductor devices, conductive layers and insulating layers are stacked on a substrate. The substrate processing apparatus 100 is suitable for use in cleaning and / or processing (e.g., etching, changing characteristics, etc.) the conductive layers and / or insulating layers during the manufacture of semiconductor devices.

[0066] 2, the processing liquid supply part 30 is capable of supplying one type of processing liquid to the substrate W, but the processing liquid supply part 30 may be capable of supplying multiple types of processing liquid to the substrate W. For example, the processing liquid supply part 30 may include multiple pipes 32, multiple valves 34, and multiple nozzles 36.

[0067] Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 3. Figure 3 is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

[0068] As shown in FIG. 3, the fluid cabinet 120 includes a housing 122, an intake port 123, an exhaust unit 124, an abnormality detection unit 130, a processing liquid pipe 132, and a preparation tank 134.

[0069] The housing 122 is provided with an intake port 123 and an exhaust section 124. The housing 122 also houses an abnormality detection section 130. The housing 122 defines the fluid cabinet 120.

[0070] The housing 122 has an openable door 122d. An operator can enter the housing 122 by opening the door 122d.

[0071] An air intake 123 is provided in the housing 122. Outside air is drawn into the housing 122 through the air intake 123. Here, the air intake 123 is provided in the door 122d.

[0072] The exhaust unit 124 exhausts the atmosphere inside the housing 122. The exhaust unit 124 can exhaust the atmosphere inside the housing 122 by changing the amount of exhaust per unit time. Note that in this specification, the amount of exhaust per unit time may be simply referred to as the "exhaust amount."

[0073] An airflow is formed within the housing 122 due to the positions of the intake port 123 and the exhaust section 124 within the housing 122. The gas drawn into the housing 122 through the intake port 123 is exhausted to the outside through the exhaust section 124. In order to prevent stagnation of the gas within the housing 122, the intake port 123 and the exhaust section 124 are preferably positioned apart from each other. For example, when the intake port 123 and the exhaust section 124 are positioned on opposing wall surfaces, it is preferable that one of the intake port 123 and the exhaust section 124 is positioned at a relatively high position and the other of the intake port 123 and the exhaust section 124 is positioned at a relatively low position. Here, the intake port 123 is positioned at approximately the same height as the bottom of the preparation tank 134, and the exhaust section 124 is positioned at a higher position than the top of the preparation tank 134.

[0074] Furthermore, the housing 122 may be provided with one exhaust section 124 and a plurality of intake ports 123. This makes it possible to suitably prevent gas from stagnating inside the housing 122.

[0075] Exhaust unit 124 may include exhaust piping 125 and an exhaust amount adjustment mechanism 126. Typically, the air pressure inside fluid cabinet 120 is higher than the external air pressure via exhaust piping 125. When the atmosphere inside housing 122 is exhausted, the gas inside housing 122 flows through exhaust piping 125 and is discharged to the outside.

[0076] The exhaust amount adjustment mechanism 126 adjusts the flow rate (exhaust amount) of gas flowing through the exhaust pipe 125. The exhaust amount adjustment mechanism 126 can increase or decrease the amount of exhaust flowing through the exhaust pipe 125. The exhaust amount adjustment mechanism 126 may be disposed inside the fluid cabinet 120 or may be disposed outside the fluid cabinet 120. For example, the exhaust amount adjustment mechanism 126 may be disposed at the end of the exhaust pipe 125. Alternatively, the exhaust amount adjustment mechanism 126 may be disposed inside the exhaust pipe 125.

[0077] For example, the exhaust amount adjustment mechanism 126 may include a damper that adjusts the opening degree of the exhaust pipe 125. Alternatively, the exhaust amount adjustment mechanism 126 may include a fan that determines the flow rate of the exhaust gas flowing through the exhaust pipe 125.

[0078] The abnormality detection unit 130 detects an abnormality in the fluid cabinet 120. Based on the detection result of the abnormality detection unit 130, the control unit 102 determines the abnormality in the fluid cabinet 120. For example, the abnormality detected by the abnormality detection unit 130 is a liquid leak in the fluid cabinet 120. In this case, the abnormality detection unit 130 may detect a liquid leak in the fluid cabinet 120. Alternatively, the abnormality detected by the abnormality detection unit 130 is a drop in exhaust pressure in the fluid cabinet 120. In this case, the abnormality detection unit 130 may detect the exhaust pressure.

[0079] The abnormality detection unit 130 may include a liquid detection sensor. Typically, the liquid detection sensor detects leakage of processing liquid within the fluid cabinet 120.

[0080] The abnormality detection unit 130 may include a gas detection sensor. Typically, the gas detection sensor detects a leak that has occurred in the fluid cabinet 120 by detecting gas generated by evaporation of the processing liquid generated in the fluid cabinet 120.

[0081] The abnormality detection unit 130 may include a camera. The camera has an imaging element. Typically, the camera captures an image of the inside of the fluid cabinet 120 and detects a leak that has occurred in the fluid cabinet 120 by analyzing the captured image.

[0082] The abnormality detection unit 130 may include two or more flow meters. Typically, a leak occurring in the fluid cabinet 120 may be detected based on the difference between the readings of the two or more flow meters.

[0083] The abnormality detection unit 130 includes a differential pressure gauge or a manometer. The abnormality detection unit 130 may detect an abnormality in the exhaust pressure inside the fluid cabinet 120 based on the difference between the air pressure inside the fluid cabinet 120 and the air pressure in the exhaust pipe 125 that connects the fluid cabinet 120 to the outside.

[0084] The abnormality detection unit 130 may acquire a detection amount that is a quantification of the detection result. The detection amount varies depending on the degree of the abnormality. Alternatively, the control unit 102 may acquire a detection amount that indicates the degree of the abnormality in the fluid cabinet 120 by quantification of the detection result from the abnormality detection unit 130.

[0085] The processing liquid flows through the processing liquid pipe 132. Typically, the processing liquid pipe 132 is connected to the processing liquid supply part 30 of the substrate processing unit 10, and the processing liquid flows to the processing liquid supply part 30.

[0086] The preparation tank 134 stores the treatment liquid. The treatment liquid flows into the preparation tank 134 via the treatment liquid pipe 132, and then flows out of the preparation tank 134 via the treatment liquid pipe 132.

[0087] As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the exhaust unit 124 and the abnormality detection unit 130. For example, the control unit 102 determines an abnormal state in the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. In one example, the control unit 102 determines a liquid leakage state in the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. Alternatively, the control unit 102 determines a drop in exhaust pressure in the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. The control unit 102 determines exhaust conditions based on the abnormal state in the fluid cabinet 120, and controls the exhaust unit 124 in accordance with the determined exhaust conditions.

[0088] Next, a substrate processing apparatus 100 according to this embodiment will be described with reference to Figures 1 to 4. Figure 4 is a block diagram of the substrate processing apparatus 100.

[0089] 4, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 20, and the processing liquid supply unit 30. Specifically, the control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 20, and the processing liquid supply unit 30 by transmitting control signals to the indexer robot IR, the center robot CR, the substrate holding unit 20, and the processing liquid supply unit 30.

[0090] Specifically, the control unit 102 controls the indexer robot IR to transfer the substrate W by the indexer robot IR.

[0091] The control unit 102 controls the center robot CR to transfer the substrate W. For example, the center robot CR receives an unprocessed substrate W and transports the substrate W into one of the substrate processing units 10. The center robot CR also receives a processed substrate W from the substrate processing unit 10 and transports the substrate W out.

[0092] The control unit 102 controls the substrate holding unit 20 to start rotation of the substrate W, change the rotation speed, and stop rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 20 to change the rotation speed of the substrate holding unit 20. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 24 of the substrate holding unit 20.

[0093] The control unit 102 controls the valve 34 of the processing liquid supply unit 30 to switch the state of the valve 34 between an open state and a closed state. Specifically, the control unit 102 controls the valve 34 of the processing liquid supply unit 30 to open the valve 34, thereby allowing the processing liquid flowing through the pipe 32 toward the nozzle 36 to pass. Furthermore, the control unit 102 controls the valve 34 of the processing liquid supply unit 30 to close the valve 34, thereby stopping the supply of the processing liquid flowing through the pipe 32 toward the nozzle 36.

[0094] The control unit 102 can control the exhaust of the exhaust unit 124 by switching the exhaust conditions for exhausting the atmosphere inside the fluid cabinet 120. Specifically, the control unit 102 can control the exhaust unit 124 by switching the exhaust conditions between standard exhaust conditions and forced exhaust conditions. Furthermore, the control unit 102 can determine one of a plurality of forced exhaust conditions and control the exhaust unit 124 in accordance with the determined forced exhaust condition. Note that the control unit 102 may stop exhaust by the exhaust unit 124.

[0095] The control unit 102 can control the abnormality detection unit 130 to detect an abnormality in the fluid cabinet 120. Furthermore, the control unit 102 can determine an abnormal state in the fluid cabinet 120 based on the detection result from the abnormality detection unit 130.

[0096] The substrate processing apparatus 100 of this embodiment is preferably used for forming semiconductor elements. For example, the substrate processing apparatus 100 is preferably used for processing a substrate W used as a semiconductor element having a stacked structure. The semiconductor element is a so-called 3D structure memory (storage device). As an example, the substrate W is preferably used as a NAND flash memory.

[0097] Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 5. Figures 5(a) to 5(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment. Note that in Figures 5(a) to 5(c), the processing liquid piping 132 and the preparation tank 134 are omitted for the purpose of simplifying the drawings.

[0098] 5(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid pipe 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the pipe.

[0099] The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust can prevent the atmosphere inside the housing 122 from leaking outside the housing 122.

[0100] As shown in FIG. 5( b), when an abnormality is detected in the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust rate greater than the standard exhaust rate. Specifically, when an abnormality occurs in the fluid cabinet 120, the abnormality detection unit 130 detects the abnormality in the fluid cabinet 120. The control unit 102 determines an abnormal state in the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. The control unit 102 determines the forced exhaust conditions according to the abnormal state. For example, the forced exhaust conditions are set based on a combination of the type of processing liquid flowing through the processing liquid pipe 132 in the fluid cabinet 120 or the flow rate of the processing liquid flowing through the processing liquid pipe 132, and the abnormal state. The exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 according to the determined forced exhaust conditions.

[0101] Here, the abnormality detection unit 130 detects a relatively small abnormality within the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions, which are set to a forced exhaust amount greater than the standard exhaust amount, in accordance with the abnormal state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

[0102] 5(c), when a relatively large abnormality occurs in the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the abnormality detection unit 130 detects a relatively large abnormality in the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set at an even larger forced exhaust volume in accordance with the abnormal state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, thereby allowing the exhaust unit 124 to forcibly exhaust the atmosphere in the fluid cabinet 120.

[0103] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust amount of the exhaust unit 124 can be controlled in accordance with the abnormal state inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the degree of the abnormal state inside the fluid cabinet 120.

[0104] 5, the abnormal state and forced exhaust conditions in the fluid cabinet 120 are divided into two stages, but this embodiment is not limited to this. The abnormal state and forced exhaust conditions in the fluid cabinet 120 may be divided into three or more stages.

[0105] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 6. Figure 6 is a flow chart of the method for controlling exhaust from the fluid cabinet 120 of this embodiment.

[0106] 6, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

[0107] In step S104, it is determined whether or not an abnormality is detected in the fluid cabinet 120. If an abnormality occurs in the fluid cabinet 120, the abnormality detection unit 130 detects the abnormality.

[0108] If no abnormality is detected in the fluid cabinet 120 (No in step S104), the process returns to step S102. This allows the exhaust unit 124 to repeatedly detect and determine whether an abnormality has occurred while exhausting the atmosphere in the fluid cabinet 120 according to the standard exhaust conditions. On the other hand, if an abnormality is detected in the fluid cabinet 120 (Yes in step S104), the process proceeds to step S106.

[0109] In step S106, the control unit 102 determines whether there is an abnormal state in the fluid cabinet 120. The control unit 102 determines whether there is an abnormal state in the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. For example, the control unit 102 may determine whether there is an abnormal state in the fluid cabinet 120 based on the detection amount based on the detection result of the abnormality detection unit 130.

[0110] In step S108, the control unit 102 determines forced exhaust conditions. The control unit 102 determines forced exhaust conditions according to the abnormal state from a plurality of forced exhaust conditions. The plurality of forced exhaust conditions are set to forced exhaust amounts greater than the standard exhaust amount. For example, the control unit 102 determines forced exhaust conditions according to the abnormal state from two levels of forced exhaust conditions. Alternatively, the control unit 102 determines forced exhaust conditions according to the abnormal state from three or more levels of forced exhaust conditions.

[0111] In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. Therefore, the fluid cabinet 120 is forcedly exhausted.

[0112] In step S112, it is determined again whether or not an abnormality is detected within the fluid cabinet 120. If the exhaust of the processing liquid within the fluid cabinet 120 has not been completed, the abnormality detection unit 130 detects an abnormality.

[0113] If an abnormality is detected in the fluid cabinet 120 (Yes in step S112), the process returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If an abnormality is not detected in the fluid cabinet 120 (No in step S112), the process proceeds to step S114.

[0114] In step S114, it is determined whether or not to end the exhaust process. When the control unit 102 receives an instruction to end the exhaust process, the control unit 102 ends the exhaust process. Alternatively, when maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 ends the exhaust process.

[0115] If the exhaust process is not to be ended (No in step S114), the process returns to S102. In this case, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be ended (Yes in step S114), the process ends.

[0116] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the forced exhaust conditions of the fluid cabinet 120 can be changed depending on the abnormal state inside the fluid cabinet 120. This allows the atmosphere inside the fluid cabinet 120 to be exhausted depending on the degree of abnormality inside the fluid cabinet 120.

[0117] In the description with reference to FIGS. 1 to 6, abnormality detection unit 130 detects an abnormality in fluid cabinet 120, but abnormality detection unit 130 may also detect a liquid leak that occurs in fluid cabinet 120.

[0118] Next, a substrate processing apparatus 100 according to this embodiment will be described with reference to Figures 1 to 7. Figure 7 is a block diagram of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Figure 7 has the same configuration as the substrate processing apparatus 100 shown in Figure 4, except that it includes a liquid leakage detection unit 130p that detects liquid leakage that occurs in the fluid cabinet 120 instead of the abnormality detection unit 130, and therefore, redundant description will be omitted to avoid redundancy.

[0119] 7, the substrate processing apparatus 100 includes a liquid leakage detection unit 130p. The liquid leakage detection unit 130p detects a liquid leakage in the fluid cabinet 120. The control unit 102 determines the state of a liquid leakage in the fluid cabinet 120 based on the detection result of the liquid leakage detection unit 130p.

[0120] The liquid leakage detector 130p may include a liquid detection sensor. Typically, the liquid detection sensor detects leakage of the processing liquid within the fluid cabinet 120.

[0121] The liquid leakage detector 130p may include a gas detection sensor. Typically, the gas detection sensor detects a liquid leakage that has occurred in the fluid cabinet 120 by detecting gas generated by evaporation of the processing liquid generated in the fluid cabinet 120.

[0122] The liquid leakage detector 130p may include a camera. The camera has an imaging element. Typically, the camera captures an image of the inside of the fluid cabinet 120 and detects a liquid leakage that has occurred inside the fluid cabinet 120 by analyzing the captured image.

[0123] The liquid leakage detector 130p may include two or more flow meters. Typically, a liquid leakage occurring in the fluid cabinet 120 may be detected based on the difference between the readings of the two or more flow meters.

[0124] The liquid leakage detection unit 130p may acquire a detection amount that is a digitized version of the detection result. Alternatively, the control unit 102 may acquire a detection amount that indicates the degree of liquid leakage in the fluid cabinet 120 by digitizing the detection result from the liquid leakage detection unit 130p.

[0125] Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 8. Figures 8(a) to 8(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment. Note that in Figures 8(a) to 8(c), the processing liquid piping 132 and the preparation tank 134 are omitted for the purpose of simplifying the drawings.

[0126] 8(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid pipe 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the pipe.

[0127] The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust can prevent the atmosphere inside the housing 122 from leaking outside the housing 122.

[0128] As shown in FIG. 8(b), when a processing liquid leaks in the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when a processing liquid leaks in the fluid cabinet 120, the liquid leakage detection unit 130p detects the leakage in the fluid cabinet 120. The control unit 102 determines the leakage state in the fluid cabinet 120 based on the detection result of the liquid leakage detection unit 130p. The control unit 102 determines the forced exhaust conditions according to the leakage state. For example, the forced exhaust conditions are set based on a combination of the type of processing liquid flowing through the processing liquid piping 132 in the fluid cabinet 120 or the flow rate of the processing liquid flowing through the processing liquid piping 132, and the leakage state. The exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 according to the determined forced exhaust conditions.

[0129] Here, the liquid leakage detection unit 130p detects a small amount of processing liquid in the fluid cabinet 120. In this case, the control unit 102 determines forced exhaust conditions that are set to a forced exhaust amount greater than the standard exhaust amount depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere inside the fluid cabinet 120.

[0130] 8(c), when a large amount of processing liquid leaks inside the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the liquid leakage detection unit 130p detects a large amount of liquid leakage inside the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set at an even greater forced exhaust volume depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, so that the exhaust unit 124 can forcibly exhaust the atmosphere inside the fluid cabinet 120.

[0131] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust amount of the exhaust unit 124 can be controlled in accordance with the state of leakage inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the amount of processing liquid that has leaked inside the fluid cabinet 120.

[0132] 8, the leakage state and forced exhaust conditions in the fluid cabinet 120 are divided into two stages, but this embodiment is not limited to this. The leakage state and forced exhaust conditions in the fluid cabinet 120 may be divided into three or more stages.

[0133] Next, with reference to Figures 1 to 9, the change in the detection amount over time and changes in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment will be described. Figures 9(a) and 9(b) are graphs showing the change in the detection amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment. In the graphs of Figures 9(a) and 9(b), the horizontal axis represents time, and the vertical axis represents the detection amount, which is a numerical representation of the detection state. The greater the amount of processing liquid leaked inside the fluid cabinet 120, the higher the value of the detection amount.

[0134] 9(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate.

[0135] When a predetermined time has passed and processing liquid begins to leak inside the fluid cabinet 120, the detected amount increases. When the detected amount exceeds a threshold value t1, the exhaust conditions are changed from standard exhaust conditions to forced exhaust conditions. The threshold value t1 is used as a criterion for determining whether or not there is a leak inside the fluid cabinet 120. The threshold value t1 is an example of a predetermined reference value.

[0136] The control unit 102 changes the exhaust conditions from the standard exhaust conditions to the forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the forced exhaust conditions. The exhaust volume under the forced exhaust conditions is greater than the standard exhaust volume. Thereafter, the detection volume begins to decrease due to the forced exhaust in accordance with the forced exhaust conditions.

[0137] When the detected amount falls below threshold t1, the exhaust conditions are changed from the forced exhaust conditions back to the standard exhaust conditions. Specifically, when the detected amount falls below threshold t1, control unit 102 changes the exhaust conditions from the forced exhaust conditions to the standard exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 according to the standard exhaust conditions. The exhaust volume under the standard exhaust conditions is smaller than the forced exhaust volume.

[0138] In this embodiment, the atmosphere inside the fluid cabinet 120 can be efficiently exhausted by changing the forced exhaust conditions according to the detected amount indicating the leakage state inside the fluid cabinet 120. As described above, the exhaust conditions may be switched between the standard exhaust conditions and the forced exhaust conditions according to whether the detected amount exceeds the threshold value t1.

[0139] 9(a), the detected amount indicating the amount of processing liquid leaked inside the fluid cabinet 120 was relatively small, but more processing liquid may leak inside the fluid cabinet 120. For example, if a large amount of processing liquid leaks from the processing liquid piping 132 inside the fluid cabinet 120, the detected amount cannot be reduced unless the exhaust volume is significantly increased.

[0140] As shown in FIG. 9(b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

[0141] When a predetermined time has passed and the processing liquid begins to leak inside the fluid cabinet 120, the detected amount increases. For example, when the detected amount exceeds threshold value t1, the control unit 102 changes the exhaust conditions from standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 according to the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume that is larger than the standard exhaust volume. By changing the exhaust conditions from the standard exhaust conditions to the first forced exhaust conditions, the slope of the increase in the detected amount decreases, but the detected amount itself increases.

[0142] Thereafter, when the detected amount exceeds threshold value t2, control unit 102 changes the exhaust conditions from the first forced exhaust conditions to second forced exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 according to the second forced exhaust conditions. Threshold value t2 is an example of a predetermined reference value. Here, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the second forced exhaust conditions, which are set to a second forced exhaust volume that is larger than the first forced exhaust volume. As the exhaust conditions change from the first forced exhaust conditions to the second forced exhaust conditions, the detected amount itself also begins to decrease.

[0143] Subsequently, when the detected amount falls below threshold value t2, control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the third forced exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 according to the third forced exhaust conditions. Here, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the third forced exhaust conditions, which are set to a third forced exhaust volume. The third forced exhaust volume is smaller than the second forced exhaust volume and larger than the standard exhaust volume. Note that the third forced exhaust volume may be equal to the first forced exhaust volume, and the third forced exhaust condition may be equal to the first forced exhaust condition. By changing the exhaust conditions from the second forced exhaust condition to the third forced exhaust condition, the detected amount itself continues to decrease, but the slope of the decrease in the detected amount slows.

[0144] Thereafter, when the detected amount falls below threshold value t1, control unit 102 changes the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 according to the standard exhaust conditions. Here, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the third forced exhaust volume. By changing the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, the slope of the decrease in the detected amount further slows.

[0145] As described above, by changing the forced exhaust conditions according to the detected amount indicating the leakage state inside the fluid cabinet 120, the atmosphere inside the fluid cabinet 120 can be efficiently exhausted according to the environment of the fluid cabinet 120.

[0146] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 10. Figure 10 is a flow chart of the method for controlling exhaust from the fluid cabinet 120 of this embodiment.

[0147] 10, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

[0148] In step S104, it is determined whether or not a liquid leak is detected in the fluid cabinet 120. If a processing liquid leaks in the fluid cabinet 120, the liquid leak detector 130p detects the liquid leak.

[0149] When the liquid leakage detector 130p includes a liquid detection sensor, the liquid leakage detector 130p detects the processing liquid leaking from the processing liquid pipe 132. The liquid leakage detector 130p may detect the amount of processing liquid that comes into contact with the liquid detection sensor.

[0150] When the liquid leakage detector 130p includes a gas detection sensor, the liquid leakage detector 130p detects gas generated in the fluid cabinet 120. The gas detection sensor may detect the concentration of gas of the processing liquid generated in the fluid cabinet 120.

[0151] When the liquid leakage detection unit 130p includes a camera, the liquid leakage detection unit 130p captures an image of the inside of the fluid cabinet 120. The camera or the control unit 102 may detect a liquid leakage in the fluid cabinet 120 by processing the captured image.

[0152] A liquid with a temperature higher than room temperature may be used as the processing liquid. In this case, the liquid leakage detection unit 130p may include a temperature sensor. If the liquid leakage detection unit 130p includes a temperature sensor, the liquid leakage detection unit 130p measures the temperature inside the fluid cabinet 120. In this case, if the processing liquid leaks inside the fluid cabinet 120, the leakage can be detected by the temperature sensor. The temperature sensor may be of a contact type or a non-contact type. The temperature sensor may detect infrared rays emitted by the processing liquid.

[0153] If no leakage is detected in the fluid cabinet 120 (No in step S104), the process returns to step S102. This allows the exhaust unit 124 to repeatedly detect and determine leakage while exhausting the atmosphere in the fluid cabinet 120 according to the standard exhaust conditions. On the other hand, if leakage is detected in the fluid cabinet 120 (Yes in step S104), the process proceeds to step S106.

[0154] In step S106, the control unit 102 determines the leakage state in the fluid cabinet 120. The control unit 102 determines the leakage state in the fluid cabinet 120 based on the detection result of the leakage detection unit 130p. For example, the control unit 102 may determine the leakage state in the fluid cabinet 120 according to the amount of detection based on the detection result of the leakage detection unit 130p.

[0155] In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the leakage state from a plurality of forced exhaust conditions. The plurality of forced exhaust conditions are set to forced exhaust amounts greater than the standard exhaust amount. For example, the control unit 102 determines the forced exhaust conditions according to the leakage state from two levels of forced exhaust conditions. Alternatively, the control unit 102 determines the forced exhaust conditions according to the leakage state from three or more levels of forced exhaust conditions.

[0156] In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. Therefore, the fluid cabinet 120 is forcedly exhausted.

[0157] In step S112, it is determined again whether or not a liquid leak is detected in the fluid cabinet 120. If the exhaust of the processing liquid in the fluid cabinet 120 is not complete, the liquid leak detector 130p detects a liquid leak.

[0158] If a leak is detected in the fluid cabinet 120 (Yes in step S112), the process returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If a leak is not detected in the fluid cabinet 120 (No in step S112), the process proceeds to step S114.

[0159] In step S114, it is determined whether or not to end the exhaust process. When the control unit 102 receives an instruction to end the exhaust process, the control unit 102 ends the exhaust process. Alternatively, when maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 ends the exhaust process.

[0160] If the exhaust process is not to be ended (No in step S114), the process returns to S102. In this case, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be ended (Yes in step S114), the process ends.

[0161] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the forced exhaust conditions of the fluid cabinet 120 can be changed depending on the state of leakage inside the fluid cabinet 120. This allows the atmosphere inside the fluid cabinet 120 to be exhausted depending on the level of leakage inside the fluid cabinet 120.

[0162] 9(a) and 9(b), the exhaust conditions are immediately changed in response to a change in the detected amount, but this embodiment is not limited to this. The exhaust conditions do not have to be immediately changed in response to a change in the detected amount.

[0163] Next, the change in the detection amount over time and the change in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment will be described with reference to Figures 1 to 11. Figures 11(a) and 11(b) are graphs showing the change in the detection amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment.

[0164] As shown in FIG. 11(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

[0165] When the processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. Here, even if the detected amount exceeds threshold value t1, the exhaust conditions are not immediately changed, and acquisition of the detected amount continues for a predetermined time. Thereafter, the exhaust conditions are controlled according to the detected amount after a predetermined time Ta has elapsed since the detected amount exceeded threshold value t1. Here, because the detected amount after the predetermined time Ta is higher than threshold value t1 and lower than threshold value t2, the control unit 102 changes the exhaust conditions to forced exhaust conditions according to the detected amount, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. By changing the exhaust conditions from standard exhaust conditions to forced exhaust conditions, the detected amount itself begins to decrease.

[0166] Thereafter, when the detected amount falls below threshold value t1, control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the standard exhaust conditions. Even when the exhaust conditions are changed from forced exhaust conditions to standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions reduces the slope of the decrease in the detected amount.

[0167] 11(a), the exhaust conditions are changed so that the exhaust volume increases after a predetermined time has elapsed since the detected amount exceeded the threshold value t1, but this embodiment is not limited to this. The exhaust conditions may be changed so that the exhaust volume increases after the detected amount reaches the threshold value, and then changed so that the exhaust volume decreases after a predetermined period has elapsed since the exhaust conditions were changed.

[0168] As shown in FIG. 11(b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

[0169] When the processing liquid begins to leak from the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. Here, even if the detected amount exceeds threshold value t1, the control unit 102 does not immediately change the exhaust conditions, but continues to acquire the detected amount for a predetermined time. Thereafter, the control unit 102 changes the exhaust conditions after the detected amount exceeds threshold value t2. In this case, when the detected amount exceeds threshold value t2, the control unit 102 changes the exhaust conditions from standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 according to the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume that is larger than the standard exhaust volume. The detected amount also increases once the exhaust conditions are changed from the standard exhaust conditions to the first forced exhaust conditions, and then begins to decrease.

[0170] Even if the detected amount subsequently decreases and reaches threshold value t2, the control unit 102 does not immediately change the exhaust conditions and continues to acquire the detected amount for a predetermined time. The control unit 102 then controls the exhaust conditions based on the detected amount acquired a predetermined time Tb after the detected amount reached threshold value t1. In this embodiment, because the detected amount after predetermined time Tb is lower than threshold value t1, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions, which are set to a second forced exhaust volume that is greater than the standard exhaust volume and smaller than the first forced exhaust volume. Even if the exhaust conditions are changed from the first forced exhaust conditions to the second forced exhaust conditions, the detected amount itself continues to decrease.

[0171] The exhaust conditions are then controlled based on the detected amount obtained after a predetermined time Tc has elapsed since the exhaust conditions were changed from the first forced exhaust conditions to the second forced exhaust conditions. In this embodiment, because the detected amount after the predetermined time Tc is lower than the threshold value t1, the control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume smaller than the second forced exhaust volume. Typically, even when the exhaust conditions are changed from the second forced exhaust conditions to the standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions further reduces the slope of the decrease in the detected amount.

[0172] Next, with reference to Figures 1 to 12 (mainly Figures 11(b) and 12), an exhaust control method for the fluid cabinet 120 of this embodiment will be described. Figure 12 is a flow diagram of the exhaust control method for the fluid cabinet 120 of this embodiment. The flow diagram of Figure 12 has the same steps as the flow diagram shown in Figure 10, except that the forced exhaust process (step S110) is divided into multiple steps, and duplicated explanations will be omitted to avoid redundancy.

[0173] As shown in FIG. 12, steps S102 to S106 are the same as steps S102 to S106 shown in FIG. 10, and therefore a description thereof will be omitted.

[0174] In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the leakage state. For example, the control unit 102 determines the forced exhaust conditions according to the leakage state from two or more stages of forced exhaust conditions according to the leakage state.

[0175] In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. Therefore, the fluid cabinet 120 is forcibly exhausted under the forced exhaust conditions set to a forced exhaust volume larger than the standard exhaust volume.

[0176] Specifically, in step S110a, the exhaust conditions are controlled based on the detected amount. For example, when the detected amount exceeds threshold value t2, control unit 102 changes the exhaust conditions from standard exhaust conditions to first forced exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the first forced exhaust conditions. The exhaust volume under the first forced exhaust conditions is greater than the exhaust volume under the standard exhaust conditions.

[0177] In step S110b, it is determined whether a predetermined time Tb has elapsed. If the predetermined time Tb has not elapsed (No in step S110b), the process returns to step S110a. Therefore, forced exhaust continues until the predetermined time Tb has elapsed. If the predetermined time Tb has elapsed (Yes in step S110b), the process proceeds to step S110c.

[0178] In step S110c, it is determined whether or not a liquid leak is detected in the fluid cabinet 120. If a liquid leak occurs in the fluid cabinet 120, the liquid leak detection unit 130p detects the liquid leak. For example, the control unit 102 determines whether or not the detected amount is lower than a threshold value t1.

[0179] If a leak is detected in the fluid cabinet 120 (Yes in step S110c), the process returns to step S110a. In this case, the control unit 102 continues the forced evacuation of the fluid cabinet 120. If a leak is not detected in the fluid cabinet 120 (No in step S110c), the process proceeds to step S110d.

[0180] In step S110d, the exhaust condition is changed from the first forced exhaust condition to the second forced exhaust condition, where the second forced exhaust amount set in the second forced exhaust condition is larger than the standard exhaust amount and smaller than the first forced exhaust amount.

[0181] In step S110e, it is determined whether or not a predetermined time Tc has elapsed. If the predetermined time Tc has not elapsed (No in step S110e), the process returns to step S110d. In this case, exhaust unit 124 continues to exhaust the atmosphere inside fluid cabinet 120 under the second forced exhaust condition until the predetermined time Tc has elapsed. If the predetermined time Tc has elapsed (Yes in step S110e), the process proceeds to step S112.

[0182] The steps from step S112 onwards are the same as those described above with reference to Fig. 10. As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, it is possible to control the amount of exhaust of the fluid cabinet 120 in accordance with the state of leakage inside the fluid cabinet 120. Furthermore, in this embodiment, the exhaust conditions are changed based on the detected amount after a predetermined time has elapsed, so it is possible to prevent the exhaust conditions from being changed excessively in accordance with fluctuations in the detected amount.

[0183] In the above description with reference to the graphs shown in Figures 9(a), 9(b), 11(a), and 11(b), the exhaust conditions are changed based on the detected amount and / or elapsed time, but this embodiment is not limited to this. The exhaust conditions may also be changed based on changes in the detected state over time.

[0184] Next, the change in the detection amount over time and the change in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment will be described with reference to Figures 1 to 13. Figures 13(a) and 13(b) are graphs showing the change in the detection amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment.

[0185] As shown in FIG. 13(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

[0186] When a predetermined time has passed and the processing liquid begins to leak inside the fluid cabinet 120, the detected amount increases. When the detected amount exceeds threshold value t1, the control unit 102 changes the exhaust conditions from standard exhaust conditions to forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the forced exhaust conditions. The exhaust amount under the forced exhaust conditions is greater than the exhaust amount under the standard exhaust conditions. Thereafter, the detected amount begins to decrease due to the forced exhaust under the forced exhaust conditions.

[0187] Here, the detected amount decreases rapidly due to forced exhaust. For example, the ratio (ΔS / ΔT) of the difference (ΔS) between the peak value of the detected amount and the threshold value t1 and the time (ΔT) from the time when the detected amount reaches the peak value to the time when the detected amount reaches the threshold value t1 is greater than the ratio threshold.

[0188] In this case, when the detected amount falls below threshold value t1, the exhaust conditions are changed back from the forced exhaust conditions to the standard exhaust conditions. Specifically, the control unit 102 changes the exhaust conditions from the forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the forced exhaust volume. Even when the exhaust conditions are changed from the forced exhaust conditions to the standard exhaust conditions, the detected amount further decreases. However, the change in the exhaust conditions reduces the slope of the decrease in the detected amount.

[0189] 13(a), the exhaust conditions are changed when the detected amount falls below the threshold value t1, but this embodiment is not limited to this. The exhaust conditions may be changed based not only on the detected amount but also on changes in the detected amount over time.

[0190] As shown in FIG. 13(b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the standard exhaust conditions. Under the standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

[0191] After a predetermined time has passed, when the processing liquid begins to leak inside the fluid cabinet 120, the detected amount increases. When the detected amount exceeds threshold value t1, the exhaust condition is changed from standard exhaust condition to forced exhaust condition. The exhaust amount under the forced exhaust condition is greater than the standard exhaust amount. Thereafter, the detected amount begins to decrease due to forced exhaust according to the forced exhaust condition.

[0192] Here too, the detected amount tends to decrease due to forced evacuation. However, the detected amount fluctuates greatly over time, and the detected amount gradually decreases while fluctuating. The ratio (ΔS / ΔT) of the difference (ΔS) between the peak value of the detected amount and the threshold value t1 and the time (ΔT) from the time when the detected amount reaches its peak value to the threshold value t1 is smaller than the ratio threshold.

[0193] In this case, even if the detected amount reaches threshold value t1, control unit 102 does not change the exhaust conditions back from the forced exhaust conditions to the standard exhaust conditions. Therefore, even if the detected amount reaches threshold value t1, control unit 102 maintains the exhaust conditions as the forced exhaust conditions, and exhaust unit 124 continues to exhaust the atmosphere inside fluid cabinet 120 under the forced exhaust conditions.

[0194] Here, when the detected amount reaches a threshold value t1s that is lower than the threshold value t1, the control unit 102 changes the exhaust conditions from the forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions. In this case, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the forced exhaust volume. Even when the exhaust conditions are changed from the forced exhaust conditions to the standard exhaust conditions, the detected amount further decreases. However, the change in the exhaust conditions reduces the slope of the decrease in the detected amount.

[0195] 13(a) and 13(b), the conditions for changing the exhaust conditions may be changed based on the ratio (ΔS / ΔT) of the difference (ΔS) between the peak value of the plate detection amount and the threshold value t1 and the time (ΔT) from the time when the detection amount reaches the peak value to the time when it reaches the threshold value t1. In this way, it may be determined whether to return the exhaust conditions from the restricted exhaust conditions to the standard exhaust conditions based on the pattern of changes in the leakage state over time.

[0196] In the fluid cabinet 120, the exhaust amount adjustment mechanism 126 may be a damper that adjusts the opening of the exhaust pipe 125.

[0197] Next, a method for controlling exhaust from the fluid cabinet 120 according to the embodiment will be described with reference to Fig. 14. Fig. 14(a) to Fig. 14(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 according to the present embodiment.

[0198] As shown in FIG. 14(a), the exhaust unit 124 has an exhaust pipe 125 and a damper 127. When the atmosphere inside the housing 122 is exhausted, the air inside the housing 122 flows through the exhaust pipe 125. The damper 127 controls the opening degree of the exhaust pipe 125. The damper 127 functions as an exhaust volume adjustment mechanism for the exhaust pipe 125. The opening degree of the damper 127 may be controlled by a cylinder or a motor. Alternatively, the opening degree of the damper 127 may be controlled by turning off a lock pin.

[0199] Here, the damper 127 is located outside the exhaust pipe 125. Specifically, the damper 127 is disposed at a position that covers the end of the exhaust pipe 125. The opening degree of the damper 127 is controlled by the control unit 102.

[0200] In Figure 14(a), no leakage is detected in fluid cabinet 120. Therefore, the atmosphere inside fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. Control unit 102 controls the opening of damper 127 to a relatively narrow degree, so that exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under standard exhaust conditions. As exhaust unit 124 exhausts air, air is drawn into fluid cabinet 120 through intake port 123.

[0201] As shown in FIG. 14(b), when processing liquid leaks inside the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume that is larger than the standard exhaust volume. In detail, when processing liquid leaks inside the fluid cabinet 120, the liquid leakage detection unit 130p detects leakage inside the fluid cabinet 120. The control unit 102 determines the leakage state inside the fluid cabinet 120 based on the detection result of the liquid leakage detection unit 130p. The control unit 102 determines the forced exhaust conditions according to the leakage state and increases the opening degree of the damper 127. The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 according to the determined forced exhaust conditions.

[0202] Here, the liquid leakage detection unit 130p detects a small amount of processing liquid in the fluid cabinet 120. In this case, the control unit 102 determines forced exhaust conditions that are set to a forced exhaust amount greater than the standard exhaust amount depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere inside the fluid cabinet 120.

[0203] As shown in FIG. 14(c), when a large amount of processing liquid leaks inside the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Here, when the liquid leakage detection unit 130p detects a large amount of liquid leakage inside the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set to an even greater forced exhaust volume depending on the state of the liquid leakage. In this case, the control unit 102 further widens the opening of the damper 127. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, so that the exhaust unit 124 can forcibly exhaust the atmosphere inside the fluid cabinet 120.

[0204] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the amount of exhaust from the exhaust unit 124 can be controlled by adjusting the opening of the damper 127 in accordance with the state of leakage inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the amount of processing liquid that has leaked inside the fluid cabinet 120.

[0205] 1 to 14, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120, thereby drawing air into fluid cabinet 120 through intake port 123, but this embodiment is not limited to this. Gas may be supplied into fluid cabinet 120 as exhaust unit 124 exhausts air.

[0206] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 15. Figures 15(a) to 15(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 of this embodiment.

[0207] As shown in FIG. 15( a), the exhaust unit 124 further includes an air supply unit 128. The air supply unit 128 is disposed within the housing 112. The air supply unit 128 supplies gas to the fluid cabinet 120. Here, the fluid cabinet 120 does not have an air intake port 123. As described above, the damper 127 exhausts the atmosphere within the fluid cabinet 120 depending on its opening degree, but supplies air to the fluid cabinet 120 via the air supply unit 128. By supplying air to the fluid cabinet 120 via the air supply unit 128, the amount of exhaust air from the atmosphere within the fluid cabinet 120 to the outside can be controlled even if the opening degree of the damper 127 is constant. In one example, even if the opening degree of the damper 127 is maintained constant while the damper 127 is open, the air supply unit 128 can supply a predetermined amount of gas to the fluid cabinet 120, thereby exhausting the atmosphere within the fluid cabinet 120 to the outside.

[0208] The gas supply unit 128 may supply an inert gas. The inert gas includes nitrogen. Alternatively, the gas supply unit 128 may supply air. In this case, the gas supply unit 128 may supply air used for downflow in a clean room.

[0209] Since the fluid cabinet 120 does not have the intake port 123, it is possible to prevent the processing liquid from leaking to the outside even if the processing liquid leaks inside the fluid cabinet 120. It is also possible to prevent external light from entering the fluid cabinet 120, and to prevent fluctuations in the properties of the processing liquid.

[0210] For example, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 at a standard exhaust rate, and the air supply unit 128 supplies air to the fluid cabinet 120 at a standard air supply rate. This allows the inside of the fluid cabinet 120 to be maintained at a constant air pressure.

[0211] As shown in FIG. 15(b), when leakage occurs in the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 at a forced exhaust rate that is greater than the standard exhaust rate.

[0212] Here, liquid leakage detection unit 130p detects a small amount of liquid leakage within fluid cabinet 120. In this case, control unit 102 determines forced exhaust conditions that are set to a forced exhaust rate greater than the standard exhaust rate in accordance with the state of liquid leakage, and exhaust unit 124 exhausts the atmosphere within fluid cabinet 120 under the forced exhaust conditions. Control unit 102 also sets a forced air supply rate greater than the standard air supply rate in accordance with the state of liquid leakage, and air supply unit 128 supplies air into fluid cabinet 120 at the forced air supply rate. Control unit 102 controls exhaust unit 124 under the determined forced exhaust conditions and air supply unit 128 at the set forced air supply rate, thereby allowing exhaust unit 124 to purify the atmosphere within fluid cabinet 120.

[0213] As shown in FIG. 15(c), when a relatively large amount of processing liquid leaks inside the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 at an exhaust rate greater than the standard exhaust rate. Here, the liquid leakage detection unit 130p detects a large amount of liquid leakage inside the fluid cabinet 120. In this case, the control unit 102 sets a forced exhaust rate greater than the standard exhaust rate depending on the state of the liquid leakage. Furthermore, the air supply unit 128 supplies air to the fluid cabinet 120 at an even greater supply rate depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 according to the determined forced exhaust conditions and the air supply unit 128 at the set air supply rate, thereby allowing the exhaust unit 124 to exhaust the atmosphere inside the fluid cabinet 120.

[0214] 15, the leakage state in the fluid cabinet 120 is divided into two stages, but this embodiment is not limited to this. The leakage state in the fluid cabinet 120 may be divided into three or more stages.

[0215] Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 16. Fig. 16 is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

[0216] 16, the fluid cabinet 120 further includes a pump 136a, a temperature control device 136b, and a filter 136c in addition to a housing 122, an intake port 123, an exhaust unit 124, a liquid leakage detection unit 130p, a treatment liquid pipe 132, and a preparation tank 134. The treatment liquid pipe 132 supplies the treatment liquid to the preparation tank 134. The treatment liquid pipe 132 also flows the treatment liquid from the preparation tank 134 to the outside.

[0217] The processing liquid pipe 132 extends from the outside of the fluid cabinet 120 to the inside of the fluid cabinet 120. Furthermore, the processing liquid pipe 132 extends from the inside of the fluid cabinet 120 to the outside of the fluid cabinet 120. In this specification, a boundary portion of the processing liquid pipe 132 where the processing liquid flows from the outside of the fluid cabinet 120 to the inside of the fluid cabinet 120 is referred to as an inlet 132p, and a boundary portion of the processing liquid where the processing liquid flows from the inside of the fluid cabinet 120 to the outside of the fluid cabinet 120 is referred to as an outlet 132q. Furthermore, in this specification, a portion of the processing liquid pipe 132 from the inlet 132p to the preparation tank 134 may be referred to as an upstream processing liquid pipe 132a, and a portion from the preparation tank 134 to the outlet 132q may be referred to as a downstream processing liquid pipe 132b.

[0218] The pump 136a, the temperature adjusting device 136b, and the filter 136c are attached to the processing liquid pipe 132. In particular, the pump 136a, the temperature adjusting device 136b, and the filter 136c are attached to the downstream processing liquid pipe 132b.

[0219] The pump 136a sends the processing liquid to the processing liquid pipe 132. The temperature regulator 136b heats the processing liquid flowing through the processing liquid pipe 132. The temperature regulator 136b regulates the temperature of the processing liquid. The filter 136c filters the processing liquid flowing through the processing liquid pipe 132.

[0220] The liquid leakage detector 130p may be disposed below the preparation tank 134. Alternatively, the liquid leakage detector 130p may be disposed near the processing liquid pipe 132.

[0221] A space may be provided at the top of the housing 122 for arranging electrical components.

[0222] Furthermore, multiple types of liquid leakage detectors 130p may be arranged inside the fluid cabinet 120. In this case, a liquid leakage inside the fluid cabinet 120 may be determined based on the detection result of any one of the multiple types of liquid leakage detectors 130p or a combination of multiple detection results.

[0223] Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 17. Figure 17(a) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment. The fluid cabinet 120 shown in Figure 17(a) has the same configuration as the fluid cabinet 120 shown in Figure 16, except that the liquid leakage detection unit 130p includes a liquid detection sensor 130a and a camera 130b, and therefore, duplicated descriptions will be omitted to avoid redundancy.

[0224] 17(a), the liquid leakage detector 130p includes a liquid detection sensor 130a and a camera 130b. The liquid detection sensor 130a is disposed below the housing 122. The camera 130b is disposed above the housing 122.

[0225] The liquid leakage detection unit 130p may detect a liquid leakage in the fluid cabinet 120 based on the detection results of either the liquid detection sensor 130a or the camera 130b. Alternatively, the liquid leakage detection unit 130p may detect a liquid leakage in the fluid cabinet 120 based on the detection results of both the liquid detection sensor 130a and the camera 130b.

[0226] The liquid leakage detector 130 p may detect a liquid leakage from the fluid cabinet 120 based on the flow rate of the processing liquid flowing through the processing liquid pipe 132 .

[0227] Figure 17(b) is a schematic diagram of fluid cabinet 120 in substrate processing apparatus 100 of this embodiment. Fluid cabinet 120 shown in Figure 17(b) has the same configuration as fluid cabinet 120 shown in Figure 17(a), except that liquid leakage detection unit 130p includes flowmeter 136d and flowmeter 136e instead of liquid detection sensor 130a and camera 130b, and therefore, redundant description will be omitted to avoid redundancy.

[0228] 17(b), the fluid cabinet 120 further includes a flow meter 136d and a flow meter 136e. The flow meter 136d is attached to the upstream processing liquid pipe 132a and measures the flow rate of the processing liquid flowing through the upstream processing liquid pipe 132a. The flow meter 136e is attached to the downstream processing liquid pipe 132b and measures the flow rate of the processing liquid flowing through the downstream processing liquid pipe 132b.

[0229] When a constant amount of processing liquid flows from the inlet 132p to the outlet 132q of the processing liquid pipe 132, the flow rate measured by the flow meter 136d is equal to the flow rate measured by the flow meter 136e. Typically, when the processing liquid circulates through the fluid cabinet 120, the flow rate measured by the flow meter 136d is equal to the flow rate measured by the flow meter 136e.

[0230] However, if the processing liquid leaks from either the upstream processing liquid pipe 132a or the downstream processing liquid pipe 132b, the flow rate measured by the flow meter 136d will not be equal to the flow rate measured by the flow meter 136e. Therefore, the flow meters 136d and 136e can detect a liquid leak in the fluid cabinet 120, and the flow meters 136d and 136e can function as the liquid leak detector 130p.

[0231] In the above description with reference to FIGS. 1 to 17, the fluid cabinet 120 has one partitioned space, but the fluid cabinet 120 may have a plurality of partitioned spaces.

[0232] Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 18. Figures 18(a) and 18(b) are schematic top views of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

[0233] As shown in FIG. 18(a), the fluid cabinet 120 has a first fluid housing 122a and a second fluid housing 122b. Here, the first fluid housing 122a and the second fluid housing 122b are disposed adjacent to each other. The fluid cabinet 120 is partitioned from other components. Furthermore, the first fluid housing 122a and the second fluid housing 122b are each partitioned. As a result, the fluid cabinet 120 has a plurality of partitioned spaces.

[0234] The first fluid casing 122a is provided with a processing liquid pipe 132 and a preparation tank 134. The second fluid casing 122b is provided with a processing liquid pipe 132 and a preparation tank 134.

[0235] The processing liquid flowing through the first fluid housing 122a may be the same as or different from the processing liquid flowing through the second fluid housing 122b. For example, the processing liquid in the first fluid housing 122a may be of a different type from the processing liquid in the second fluid housing 122b. Alternatively, the concentration of the processing liquid in the first fluid housing 122a may be different from the concentration of the processing liquid in the second fluid housing 122b. Alternatively, one of the processing liquids in the first fluid housing 122a and the second fluid housing 122b may supply the processing liquid to the substrate processing unit 10, and the other may circulate the processing liquid before supplying the processing liquid to the substrate processing unit 10.

[0236] The first fluid casing 122a has an exhaust section 124a, which has an exhaust pipe 125a and a damper 127a.

[0237] The second fluid casing 122b has an exhaust section 124b, which has an exhaust pipe 125b and a damper 127b.

[0238] A common exhaust pipe 140 is attached to the fluid cabinet 120. The common exhaust pipe 140 is connected to the exhaust pipe 125a of the first fluid casing 122a and the exhaust pipe 125b of the second fluid casing 122b. Therefore, the atmosphere in the first fluid casing 122a is exhausted via the exhaust pipe 125a and the common exhaust pipe 140, and the atmosphere in the second fluid casing 122b is exhausted via the exhaust pipe 125b and the common exhaust pipe 140.

[0239] The common exhaust pipe 140 has a connecting pipe 142 and a main pipe 144. The connecting pipe 142 connects the exhaust pipe 125a of the first fluid casing 122a, the exhaust pipe 125b of the second fluid casing 122b, and the main pipe 144. The atmosphere inside the first fluid casing 122a is exhausted via the exhaust pipe 125a, the connecting pipe 142, and the main pipe 144. The atmosphere inside the second fluid casing 122b is exhausted via the exhaust pipe 125b, the connecting pipe 142, and the main pipe 144.

[0240] 18(b), when the processing liquid leaks in the first fluid casing 122a, the liquid leakage detection unit 130p of the first fluid casing 122a detects the liquid leakage in the fluid cabinet 120. The control unit 102 determines the liquid leakage state in the fluid cabinet 120. The control unit 102 sets the forced exhaust amount according to the liquid leakage state. Here, the control unit 102 increases the opening degree of the damper 127a according to the liquid leakage state.

[0241] On the other hand, there is no leakage of the processing liquid within the second fluid casing 122b, and therefore the liquid leakage detection unit 130p of the second fluid casing 122b does not detect any liquid leakage within the fluid cabinet 120. Therefore, the control unit 102 continues to maintain a constant opening degree of the damper 127b in accordance with the state of liquid leakage.

[0242] In this way, by exhausting the atmospheres in the first fluid housing 122a and the second fluid housing 122b, which are different from each other, via the common exhaust pipe 140, the atmospheres in the first fluid housing 122a and the second fluid housing 122b, which are partitioned from each other, can be exhausted together with a relatively simple configuration. As described above, the processing liquids flowing through the first fluid housing 122a and the second fluid housing 122b may be different. However, it is preferable that the processing liquids flowing through the first fluid housing 122a and the second fluid housing 122b have one in common, that is, acidic, alkaline, or an organic solvent. In this case, the exhaust gases that have flowed through the common exhaust pipe 140 can be treated together.

[0243] If the volumes of the first fluid housing 122a and the second fluid housing 122b, or the type, temperature, or application of the processing liquid flowing through the first fluid housing 122a and the second fluid housing 122b are different, the criteria for determining whether there is a leak and / or the criteria for determining the leak state may be different for the first fluid housing 122a and the second fluid housing 122b. Furthermore, the forced exhaust conditions for the first fluid housing 122a may be different from the forced exhaust conditions for the second fluid housing 122b.

[0244] Next, with reference to Figures 1 to 19 (mainly Figures 18 and 19), the change in the detected amount over time and changes in the exhaust conditions in the exhaust control method for fluid cabinet 120 according to this embodiment will be described. Figure 19(a) is a graph showing the change in the detected amount over time in the exhaust control method for first fluid casing 122a of fluid cabinet 120 according to this embodiment, and Figure 19(b) is a graph showing the change in the detected amount over time in the exhaust control method for second fluid casing 122b of fluid cabinet 120 according to this embodiment.

[0245] As shown in FIG. 19(a), initially, the processing liquid does not leak inside the first fluid housing 122a.

[0246] When the processing liquid begins to leak from the first fluid housing 122a after a predetermined time has elapsed, the detected amount increases. For example, when the detected amount exceeds a threshold value t1a, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the first forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the first forced exhaust conditions, which are set to a first forced exhaust amount that is larger than the standard exhaust amount.

[0247] Thereafter, when the detected amount exceeds the threshold value t2a, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the second forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the second forced exhaust conditions, which are set to a second forced exhaust amount that is larger than the first forced exhaust amount.

[0248] Thereafter, when the detected amount falls below the threshold value t2a, the control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the third forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the third forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the third forced exhaust conditions, which are set to a third forced exhaust amount that is smaller than the second forced exhaust amount and larger than the standard exhaust amount.

[0249] Thereafter, when the detected amount falls below the threshold value t1a, the control unit 102 changes the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the standard exhaust conditions.

[0250] The second fluid housing 122b may be set to exhaust conditions different from those of the first fluid housing 122a. Furthermore, the threshold value for determining the exhaust condition in the second fluid housing 122b may be different from the threshold value for determining the exhaust condition in the first fluid housing 122a.

[0251] As shown in FIG. 19(b), initially, the processing liquid does not leak inside the second fluid housing 122b.

[0252] When a predetermined time has passed and the processing liquid begins to leak from the second fluid housing 122b, the detected amount increases. For example, when the detected amount exceeds a threshold value t1b, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to the forced exhaust conditions, and the exhaust unit 124b exhausts the atmosphere in the second fluid housing 122b in accordance with the forced exhaust conditions. Note that the threshold value t1b may be different from the threshold value t1a. Furthermore, the forced exhaust conditions used by the exhaust unit 124b may be different from the first forced exhaust conditions used by the exhaust unit 124a.

[0253] After that, because the detected amount does not exceed the threshold value t2b, the control unit 102 maintains the exhaust conditions as the forced exhaust conditions, and the exhaust unit 124b exhausts the atmosphere inside the second fluid housing 122b in accordance with the forced exhaust conditions. Furthermore, the threshold value t2b may be different from the threshold value t2a.

[0254] Thereafter, when the detected amount falls below the threshold value t1b, the control unit 102 changes the exhaust conditions from the forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124b exhausts the atmosphere inside the second fluid housing 122b in accordance with the standard exhaust conditions.

[0255] As described above, the control unit 102 may individually set the conditions for detecting leakage, determining the leakage state, and / or exhausting depending on the first fluid housing 122a and the second fluid housing 122b.

[0256] 18, the first fluid housing 122a and the second fluid housing 122b are arranged adjacent to each other, but this embodiment is not limited to this. The first fluid housing 122a and the second fluid housing 122b may be arranged in different locations. Furthermore, when the first fluid housing 122a and the second fluid housing 122b are connected to the common exhaust pipe 140, the amount of exhaust air flowing through the common exhaust pipe 140 may be changed.

[0257] Next, the fluid cabinet 120 and the common exhaust pipe 140 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 20 (particularly Figures 18 to 20). Figures 20(a) and 20(b) are schematic diagrams of the fluid cabinet 120 and the common exhaust pipe 140 in the substrate processing apparatus 100 of this embodiment.

[0258] As shown in FIG. 20(a), the fluid cabinet 120 is connected to a common exhaust pipe 140. The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. Here, the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c are located apart. The first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c each have the same configuration. Note that the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c may also be arranged adjacent to each other.

[0259] A blower mechanism 146 is disposed in the common exhaust pipe 140. The blower mechanism 146 blows air so that the gas in the common exhaust pipe 140 flows in a direction away from the first fluid casing 122a, the second fluid casing 122b, and the third fluid casing 122c. Therefore, the blower mechanism 146 allows the gas in the common exhaust pipe 140 to circulate and be exhausted from each of the first fluid casing 122a, the second fluid casing 122b, and the third fluid casing 122c. For example, the blower mechanism 146 has a fan.

[0260] Here, no leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, or the third fluid housing 122c. Figure 19(a) shows the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the common exhaust pipe 140. The exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c are 1.0, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.0.

[0261] 20(b), when the treatment liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, the treatment liquid does not leak in the second fluid housing 122b and the third fluid housing 122c.

[0262] In this case, the control unit 102 determines the leakage state in the first fluid housing 122a. Thereafter, the control unit 102 determines the forced exhaust conditions for the first fluid housing 122a in accordance with the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere in the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the respective exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere in the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

[0263] At this time, the control unit 102 increases the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146 in accordance with the increase in the exhaust volume of the exhaust section 124 of the first fluid casing 122a. In this case, the exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, and the third fluid casing 122c are 1.5, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.5.

[0264] In this embodiment, the control unit 102 increases the exhaust rate of the first fluid housing 122a in accordance with the state of leakage in the first fluid housing 122a, and also increases the exhaust rate of the common exhaust pipe 140. This makes it possible to efficiently exhaust the first fluid housing 122a in which leakage has occurred.

[0265] 20, the amount of exhaust from the common exhaust pipe 140 is adjusted by controlling the blower mechanism 146 in response to the occurrence of a liquid leak, but this embodiment is not limited to this. The amount of exhaust from the common exhaust pipe 140 does not have to be adjusted regardless of whether a liquid leak occurs or not.

[0266] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Fig. 21. Fig. 21(a) and Fig. 21(b) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 of this embodiment.

[0267] 21(a), the fluid cabinet 120 is connected to a common exhaust pipe 140. The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. Here, no liquid leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, or the third fluid housing 122c.

[0268] 21(a) shows the respective exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, the third fluid casing 122c, and the common exhaust pipe 140. The exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, and the third fluid casing 122c are 1.0, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.0.

[0269] 21(b), when the treatment liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, the treatment liquid does not leak in the second fluid housing 122b and the third fluid housing 122c.

[0270] In this case, the control unit 102 determines the leakage state in the first fluid housing 122a. Thereafter, the control unit 102 determines the forced exhaust conditions for the first fluid housing 122a in accordance with the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere in the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the respective exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere in the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

[0271] Here, the control unit 102 does not increase the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146. As a result, the exhaust volume of the first fluid housing 122a increases, and the exhaust volumes of the second fluid housing 122b and the third fluid housing 122c decrease. For example, the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b and the third fluid housing 122c become 1.4, 0.8 and 0.8, respectively, and the exhaust volume of the common exhaust pipe 140 remains at 3.0.

[0272] In this embodiment, the control unit 102 increases the exhaust volume of the first fluid housing 122a in accordance with the state of leakage in the first fluid housing 122a, and reduces the exhaust volumes of the second fluid housing 122b and the third fluid housing 122c. This makes it possible to efficiently exhaust the first fluid housing 122a in which leakage has occurred without increasing the load on the blower mechanism 146.

[0273] 20 and 21, the first to third fluid housings 122a to 122c have the same configuration, but this embodiment is not limited to this. The first to third fluid housings 122a to 122c may have different configurations. For example, the volumes of the first to third fluid housings 122a to 122c may be different.

[0274] 20 and 21, the first to third fluid casings 122a to 122c, each equipped with the processing liquid piping 132, are connected to the common exhaust piping 140. However, this embodiment is not limited to this. A cabinet that does not have the processing liquid piping 132 may also be connected to the common exhaust piping 140.

[0275] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 22. Fig. 22(a) and Fig. 22(d) are schematic diagrams of the fluid cabinet 120, the common exhaust pipe 140, and the dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment. Fig. 22(b) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment, and Fig. 22(c) is a schematic diagram of the dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment.

[0276] 22(a), the common exhaust pipe 140 is connected to the fluid cabinet 120 and the dummy cabinet 150. The common exhaust pipe 140 allows the atmosphere inside the fluid cabinet 120 and the atmosphere inside the dummy cabinet 150 to be exhausted.

[0277] The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. The first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c are each equipped with at least a processing liquid pipe 132. On the other hand, the dummy cabinet 150 is not equipped with a processing liquid pipe 132.

[0278] Here, the first fluid housing 122a to the third fluid housing 122c have the same configuration. Therefore, the volumes of the first fluid housing 122a to the third fluid housing 122c are equal to one another. On the other hand, the volume of the dummy cabinet 150 is smaller than the volumes of the first fluid housing 122a to the third fluid housing 122c. Here, no liquid leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c.

[0279] 22(a) shows the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, the dummy cabinet 150, and the common exhaust pipe 140. For example, the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the dummy cabinet 150 are 1.0, 1.0, 1.0, and 0.5, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.5.

[0280] 22(b), the first fluid casing 122a includes a casing 122, an intake port 123, an exhaust unit 124, a liquid leakage detection unit 130p, a treatment liquid pipe 132, and a preparation tank 134, as well as a pump 136a, a temperature adjustment device 136b, and a filter 136c. The configuration of the first fluid casing 122a is similar to that of the fluid cabinet 120 described above with reference to FIG. 16, and a detailed description thereof will be omitted here. The configurations of the second fluid casing 122b and the third fluid casing 122c are also similar to that of the first fluid casing 122a.

[0281] 22(c), the dummy cabinet 150 includes a housing 152, an intake port 153, and an exhaust section 154. Here, unlike the first to third fluid housings 122a to 122c, no processing liquid flows through the dummy cabinet 150.

[0282] The exhaust unit 154 has an exhaust pipe 155 and an exhaust amount adjustment mechanism 156. When the atmosphere inside the housing 152 is exhausted, the gas inside the housing 152 flows through the exhaust pipe 155 and is exhausted to the outside.

[0283] The exhaust amount adjustment mechanism 156 adjusts the flow rate (exhaust amount) of gas flowing through the exhaust pipe 155. The exhaust amount adjustment mechanism 156 can increase or decrease the exhaust amount flowing through the exhaust pipe 155.

[0284] However, the dummy cabinet 150 may be provided with a liquid leakage detector 130p. When the dummy cabinet 150 is provided with the liquid leakage detector 130p, the intrusion of the processing liquid into the dummy cabinet 150 through the intake port 153 can be detected.

[0285] 22(d), when the treatment liquid leaks in the first fluid housing 122a, the liquid leakage detector 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, the treatment liquid does not leak in the second fluid housing 122b and the third fluid housing 122c.

[0286] In this case, the control unit 102 determines the leakage state in the first fluid housing 122a. Thereafter, the control unit 102 determines the forced exhaust conditions for the first fluid housing 122a in accordance with the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere in the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the respective exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere in the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

[0287] Furthermore, in response to changing the exhaust conditions of the first fluid housing 122a from the standard exhaust conditions to the forced exhaust conditions, the control unit 102 stops driving the exhaust unit 154 of the dummy cabinet 150. Therefore, the control unit 102 can increase the exhaust volume of the first fluid housing 122a without increasing the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146. For example, as shown in FIG. 22(d), the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the dummy cabinet 150 are 1.5, 1.0, 1.0, and 0.5, respectively, and the exhaust volume of the common exhaust pipe 140 remains at 3.5.

[0288] In this embodiment, the control unit 102 increases the exhaust volume of the first fluid housing 122a in accordance with the state of leakage in the first fluid housing 122a, while decreasing the exhaust volume of the dummy cabinet 150. This allows the first fluid housing 122a in which leakage has occurred to be efficiently exhausted without increasing the load on the blower mechanism 146.

[0289] 18 and 20 to 22, the fluid cabinet 120 is directly connected to the common exhaust pipe 140, but this embodiment is not limited to this. The fluid cabinet 120 may be connected to the common exhaust pipe 140 via a dummy cabinet 150.

[0290] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 23. Fig. 23 is a schematic diagram of the fluid cabinet 120, the common exhaust pipe 140, and the dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment.

[0291] 23, a dummy cabinet 150 is connected to the common exhaust pipe 140, and the fluid cabinet 120 is connected to the dummy cabinet 150. Here, the fluid cabinet 120 includes a first fluid housing 122a to a third fluid housing 122c. The first fluid housing 122a to the third fluid housing 122c are connected to the dummy cabinet 150. In this way, the fluid cabinet 120 is connected to the common exhaust pipe 140 via the dummy cabinet 150, so that the common exhaust pipe 140 may be connected to each of the fluid cabinets 120 and the dummy cabinet 150.

[0292] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 24 (mainly Figures 23 and 24). Figures 24(a) and 24(b) are schematic diagrams of a dummy cabinet 150 to which the exhaust pipes 125a to 125c of the first to third fluid casings 122a to 122c in the substrate processing apparatus 100 of this embodiment are connected.

[0293] 24(a), the dummy cabinet 150 is connected to the first to third fluid casings 122a to 122c. In particular, the dummy cabinet 150 is connected to the first to third fluid casings 122a to 122c. In addition, the dummy cabinet 150 is connected to the common exhaust pipe 140.

[0294] The exhaust unit 154 has an exhaust pipe 155 and a damper 157. The exhaust pipe 155 is disposed inside the housing 152. When the atmosphere inside the housing 152 is exhausted, the air inside the housing 152 flows through the exhaust pipe 155. The damper 157 controls the opening degree of the exhaust pipe 155. The damper 157 functions as an exhaust amount adjustment mechanism for the exhaust pipe 155.

[0295] The exhaust air that has flowed through the exhaust pipes 125a to 125c of the first to third fluid casings 122a to 122c flows into the exhaust pipe 155 inside the casing 152 of the dummy cabinet 150. Therefore, the exhaust pipe 155 discharges to the outside the gas that has flowed in via the damper 157 and the gas that has flowed in via the exhaust pipes 125a to 125c of the first to third fluid casings 122a to 122c.

[0296] For example, if the exhaust volumes of the exhaust pipe 155 via the first fluid casing 122a, the second fluid casing 122b, the third fluid casing 122c and the damper 157 are 1.0, 1.0, 1.0 and 0.5 respectively, the exhaust volume of the common exhaust pipe 140 is 3.5.

[0297] 24(b), when the treatment liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, the treatment liquid does not leak in the second fluid housing 122b and the third fluid housing 122c.

[0298] In this case, the control unit 102 determines the leakage state in the first fluid housing 122a. Thereafter, the control unit 102 determines the forced exhaust conditions for the first fluid housing 122a in accordance with the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere in the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the respective exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere in the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

[0299] Furthermore, in response to changing the exhaust conditions of the first fluid housing 122a from the standard exhaust conditions to the forced exhaust conditions, the control unit 102 reduces the exhaust volume of the exhaust pipe 155 via the damper 157. By controlling the damper 157 to be even narrower, the exhaust unit 154 can maintain the overall exhaust volume, and the control unit 102 does not need to increase the exhaust volume of the common exhaust pipe 140 via the blower mechanism 146. For example, the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the exhaust pipe 155 via the damper 157 can be 1.4, 1.0, 1.0, and 0.1, respectively, and the exhaust volume of the common exhaust pipe 140 can remain at 3.5. This allows efficient exhaust of the first fluid housing 122a in which a leak has occurred without increasing the load on the blower mechanism 146.

[0300] In the above description with reference to Figures 7 to 24, a form in which a liquid leak is detected as an abnormality occurring within the fluid cabinet 120 has been described, but a drop in exhaust pressure may also be detected as an abnormality within the fluid cabinet 120.

[0301] Next, a substrate processing apparatus 100 according to this embodiment will be described with reference to Figures 1 to 25. Figure 25 is a block diagram of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Figure 25 has the same configuration as the substrate processing apparatus 100 shown in Figure 4, except that it includes an exhaust pressure detection unit 130q that detects the exhaust pressure inside the fluid cabinet 120 instead of the abnormality detection unit 130, and therefore, redundant description will be omitted to avoid redundancy.

[0302] 25, the substrate processing apparatus 100 includes an exhaust pressure detection unit 130q. The exhaust pressure detection unit 130q detects the exhaust pressure inside the fluid cabinet 120. For example, if a malfunction occurs in the external piping, the exhaust pressure inside the fluid cabinet 120 may decrease. Alternatively, if the number of pipes connected to a common piping increases, the exhaust pressure inside the fluid cabinet 120 may decrease. In this case, the exhaust pressure detection unit 130q can detect the decrease in the exhaust pressure inside the fluid cabinet 120.

[0303] For example, exhaust pressure detection unit 130q may include a differential pressure gauge or a manometer. Exhaust pressure detection unit 130q may detect a decrease in exhaust pressure within fluid cabinet 120 based on the difference between the air pressure within fluid cabinet 120 and the air pressure in exhaust piping 125 that connects fluid cabinet 120 to the outside.

[0304] In the above explanation with reference to Figures 7 to 24, we have described a form in which a liquid leak is detected as an abnormality occurring within the fluid cabinet 120, but it goes without saying that this is equally applicable to a form in which a drop in exhaust pressure is detected as an abnormality occurring within the fluid cabinet 120.

[0305] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 26. Figure 26 is a flow chart of the method for controlling exhaust from the fluid cabinet 120 of this embodiment.

[0306] 26, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

[0307] In step S104, it is determined whether a decrease in exhaust pressure is detected in the fluid cabinet 120. If the exhaust pressure in the fluid cabinet 120 decreases, the exhaust pressure detection unit 130q detects the decrease in exhaust pressure in the fluid cabinet 120.

[0308] If a decrease in exhaust pressure is not detected in fluid cabinet 120 (No in step S104), the process returns to step S102. This allows exhaust unit 124 to repeatedly detect and determine abnormalities while exhausting the atmosphere in fluid cabinet 120 according to the standard exhaust conditions. On the other hand, if a decrease in exhaust pressure is detected in fluid cabinet 120 (Yes in step S104), the process proceeds to step S106.

[0309] In step S106, the control unit 102 determines whether the exhaust pressure in the fluid cabinet 120 has decreased. The control unit 102 determines whether the exhaust pressure in the fluid cabinet 120 has decreased based on the detection result of the exhaust pressure detection unit 130q. For example, the control unit 102 may determine whether the exhaust pressure in the fluid cabinet 120 has decreased based on the detection amount based on the detection result of the exhaust pressure detection unit 130q.

[0310] In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the state of exhaust pressure drop from a plurality of forced exhaust conditions. The plurality of forced exhaust conditions are set to a forced exhaust amount greater than the standard exhaust amount. For example, the control unit 102 determines the forced exhaust conditions according to the state of exhaust pressure drop from two stages of forced exhaust conditions. Alternatively, the control unit 102 determines the forced exhaust conditions according to the state of exhaust pressure drop from three or more stages of forced exhaust conditions.

[0311] In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. Therefore, the fluid cabinet 120 is forcedly exhausted.

[0312] In step S112, it is determined again whether a decrease in exhaust pressure is detected within the fluid cabinet 120. If the exhaust of the processing liquid within the fluid cabinet 120 is not complete, the exhaust pressure detection unit 130q detects a decrease in exhaust pressure.

[0313] If a decrease in exhaust pressure is detected in the fluid cabinet 120 (Yes in step S112), the process returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If a decrease in exhaust pressure is not detected in the fluid cabinet 120 (No in step S112), the process proceeds to step S114.

[0314] In step S114, it is determined whether or not to end the exhaust process. When the control unit 102 receives an instruction to end the exhaust process, the control unit 102 ends the exhaust process. Alternatively, when maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 ends the exhaust process.

[0315] If the exhaust process is not to be ended (No in step S114), the process returns to S102. In this case, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be ended (Yes in step S114), the process ends.

[0316] Next, an exhaust control method for the fluid cabinet 120 according to an embodiment will be described with reference to Fig. 27. Fig. 27(a) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 according to this embodiment, and Fig. 27(b) is a graph showing the change in exhaust pressure over time in the exhaust control method for the fluid cabinet 120 according to this embodiment.

[0317] 27(a), the fluid cabinet 120 has a housing 122, an intake port 123, an exhaust section 124, and an exhaust pressure detection section 130q. The fluid cabinet 120 is partitioned by the housing 122. The intake port 123 and the exhaust section 124 are provided in the housing 122. The housing 122 also houses the exhaust pressure detection section 130q. The exhaust pressure detection section 130q detects the exhaust pressure inside the fluid cabinet 120.

[0318] The housing 122 has an openable door 122d. An operator can enter the housing 122 by opening the door 122d.

[0319] An air intake 123 is provided in the housing 122. Outside air is drawn into the housing 122 through the air intake 123. Here, the air intake 123 is provided in the door 122d.

[0320] The exhaust unit 124 exhausts the atmosphere inside the housing 122. The exhaust unit 124 can exhaust the atmosphere inside the housing 122 by changing the amount of exhaust per unit time.

[0321] The exhaust unit 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. Typically, the air pressure inside the fluid cabinet 120 is higher than the external air pressure via the exhaust pipe 125. When the atmosphere inside the housing 122 is exhausted, the gas inside the housing 122 flows through the exhaust pipe 125 and is discharged to the outside. Here, the exhaust pressure detection unit 130q is disposed on the exhaust pipe 125. The exhaust pressure detection unit 130q is located upstream of the exhaust volume adjustment mechanism 126. The exhaust pressure detection unit 130q detects the exhaust pressure of the exhaust gas flowing from the housing 122 through the exhaust pipe 125 via the exhaust volume adjustment mechanism 126.

[0322] The exhaust amount adjustment mechanism 126 adjusts the flow rate (exhaust amount) of gas flowing through the exhaust pipe 125. The exhaust amount adjustment mechanism 126 can increase or decrease the amount of exhaust gas flowing through the exhaust pipe 125. For example, by adjusting the exhaust amount adjustment mechanism 126 to increase the opening of the exhaust pipe 125, the amount of exhaust gas flowing through the exhaust pipe 125 can be increased.

[0323] As shown in Figure 27(b), the exhaust pressure is set to a target value Gv under standard exhaust conditions. Ideally, the exhaust pressure is maintained at the target value Gv under standard exhaust conditions. However, even in this case, the exhaust pressure may fluctuate slightly from the target value Gv.

[0324] If a malfunction occurs in the exhaust source connected to the exhaust pipe 125 of the fluid cabinet 120, the exhaust pressure inside the fluid cabinet 120 drops. For example, if the exhaust pressure falls below a first threshold Tv1, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 according to the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume in which the opening of the exhaust pipe 125 is increased from the standard exhaust volume.

[0325] Thereafter, when the exhaust pressure falls below second threshold Tv2, control unit 102 changes the exhaust conditions from the first forced exhaust conditions to second forced exhaust conditions, and exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 according to the second forced exhaust conditions. Here, exhaust unit 124 exhausts the atmosphere inside fluid cabinet 120 under the second forced exhaust conditions set to a second forced exhaust amount in which the opening of exhaust pipe 125 is further increased.

[0326] In this way, when the exhaust pressure detection unit 130q detects that the exhaust pressure has fallen below the first threshold value Tv1, the control unit 102 determines that an abnormal state has occurred and controls the exhaust amount adjustment mechanism 126 to increase the opening of the exhaust pipe 125. Furthermore, when the exhaust pressure detection unit 130q detects that the exhaust pressure has fallen below the second threshold value Tv2, the control unit 102 determines that an abnormal state has occurred and controls the exhaust amount adjustment mechanism 126 to further increase the opening of the exhaust pipe 125. Note that if the exhaust pressure returns to the target value Gv as a result of increasing the opening of the exhaust pipe 125, the control unit 102 may control the exhaust amount adjustment mechanism 126 to return the opening of the exhaust pipe 125 to its original value.

[0327] Next, a method for controlling exhaust from the fluid cabinet 120 according to the embodiment will be described with reference to Fig. 28. Fig. 28(a) to Fig. 28(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 according to the present embodiment.

[0328] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 28. Figures 28(a) to 28(c) are schematic diagrams for explaining exhaust from the fluid cabinet 120 of this embodiment.

[0329] 28(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid pipe 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the pipe.

[0330] The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust can prevent the atmosphere inside the housing 122 from leaking outside the housing 122.

[0331] As shown in FIG. 28(b), when the exhaust pressure in the fluid cabinet 120 decreases, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure in the fluid cabinet 120 decreases, the exhaust pressure detection unit 130q detects the decrease in the exhaust pressure in the fluid cabinet 120. The control unit 102 determines the decrease in the exhaust pressure in the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions according to the decrease in the exhaust pressure. For example, the forced exhaust conditions are set based on a combination of the type of processing liquid flowing through the processing liquid pipe 132 in the fluid cabinet 120 or the flow rate of the processing liquid flowing through the processing liquid pipe 132, and the decrease in the exhaust pressure. The exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 according to the determined forced exhaust conditions.

[0332] Here, exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure inside fluid cabinet 120. In this case, control unit 102 determines forced exhaust conditions that are set to a forced exhaust amount greater than the standard exhaust amount in accordance with the state of the decrease in exhaust pressure. Control unit 102 controls exhaust unit 124 under the determined forced exhaust conditions, causing exhaust unit 124 to exhaust the atmosphere inside fluid cabinet 120.

[0333] 28(c), when the exhaust pressure in the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects a relatively large drop in the exhaust pressure in the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set at an even larger forced exhaust volume in accordance with the state of the drop in exhaust pressure. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, thereby allowing the exhaust unit 124 to forcibly exhaust the atmosphere in the fluid cabinet 120.

[0334] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust amount of the exhaust unit 124 can be controlled in accordance with the decrease in the exhaust pressure inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the decrease in the exhaust pressure inside the fluid cabinet 120.

[0335] 28, the exhaust pressure reduction state and the forced exhaust conditions in the fluid cabinet 120 are divided into two stages, but this embodiment is not limited to this. The exhaust pressure reduction state and the forced exhaust conditions in the fluid cabinet 120 may be divided into three or more stages.

[0336] Next, the operation of the exhaust unit 124 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 29. Figures 29(a) to 29(d) are schematic views for explaining the exhaust unit 124 and / or the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

[0337] As shown in FIG. 29(a), the exhaust unit 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. The exhaust volume adjustment mechanism 126 is disposed inside the exhaust pipe 125. Here, an exhaust pressure detection unit 130q is also disposed inside the exhaust pipe 125. The exhaust pressure detection unit 130q detects the air pressure on the housing 122 side with respect to a rotation axis 126r of the exhaust volume adjustment mechanism 126. The exhaust volume adjustment mechanism 126 rotates around the rotation axis 126r. The opening of the exhaust pipe 125 can be adjusted by rotating the exhaust volume adjustment mechanism 126.

[0338] The displacement adjustment mechanism 126 may slide instead of rotating around the rotation shaft 126r.

[0339] As shown in FIG. 29(b), the exhaust unit 124 has an exhaust pipe 125 and an exhaust amount adjustment mechanism 126 that is slidable relative to the exhaust pipe 125. The exhaust amount adjustment mechanism 126 is disposed inside the exhaust pipe 125. The exhaust amount adjustment mechanism 126 is disposed so as to partially block at least a portion of the exhaust pipe 125. Here, the exhaust pressure detection unit 130q is located on the housing 122 side with respect to the rotation axis 126r of the exhaust amount adjustment mechanism 126. The opening of the exhaust pipe 125 can be adjusted by sliding the exhaust amount adjustment mechanism 126.

[0340] In the above description with reference to FIG. 15, the exhaust section 124 has the air supply section 128 located on the lower side of the housing 122, but this embodiment is not limited to this.

[0341] As shown in FIG. 29(c), the exhaust section 124 has an exhaust pipe 125 and an air supply section 128u. The air supply section 128u is located above the housing 122. The air supply section 128u supplies gas to the housing 122. The air supply section 128u may form a so-called downflow. The air supply section 128u changes the amount of air supplied based on the detection result of the exhaust pressure detection section 130q. The exhaust pressure of the exhaust section 124 is changed according to the amount of air supplied from the air supply section 128u.

[0342] When the exhaust pressure inside the fluid cabinet 120 is the target value Gv, the gas supply unit 128u supplies gas at a standard air supply rate into the fluid cabinet 120. In this case, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to the standard exhaust rate.

[0343] When a drop in exhaust pressure is detected in the fluid cabinet 120, the air supply unit 128u supplies air at a forced air supply rate that is greater than the standard air supply rate. In this case, the fluid cabinet 120 is exhausted under forced exhaust conditions set to a forced exhaust rate that is greater than the standard exhaust rate.

[0344] For example, when exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within fluid cabinet 120, control unit 102 determines a forced air supply condition that is set to a forced air supply amount greater than the standard air supply amount in accordance with the state of the decrease in exhaust pressure. Control unit 102 controls exhaust unit 124 under the determined forced air supply condition, causing exhaust unit 124 to exhaust the atmosphere within fluid cabinet 120.

[0345] Furthermore, when exhaust pressure detection unit 130q detects a relatively large decrease in exhaust pressure within fluid cabinet 120, control unit 102 determines forced air supply conditions that are set to a larger forced air supply amount in accordance with the state of the decrease in exhaust pressure. Control unit 102 controls exhaust unit 124 under the determined forced air supply conditions, thereby allowing exhaust unit 124 to forcibly exhaust the atmosphere within fluid cabinet 120.

[0346] In the above description, the exhaust pipe 125 extends in a straight line, but this embodiment is not limited to this. The exhaust pipe 125 may branch off midway.

[0347] As shown in FIG. 29(d), the exhaust unit 124 has an exhaust pipe 125 and an exhaust amount adjustment mechanism 126. The exhaust pipe 125 has a main pipe 125p and a branch pipe 125q. The main pipe 125p extends linearly in the vertical direction. The main pipe 125p branches off from the main pipe 125p. The branch point between the main pipe 125p and the branch pipe 125q is located downstream of the exhaust amount adjustment mechanism 126. Therefore, the exhaust amount adjustment mechanism 126 can adjust the amount of exhaust gas flowing through the main pipe 125p, while the branch pipe 125q exhausts a constant amount of gas regardless of the exhaust amount adjustment mechanism 126.

[0348] The branch pipe 125q extends obliquely upward from the main pipe 125p. The cross-sectional area of ​​the passage of the branch pipe 125q is smaller than the cross-sectional area of ​​the passage of the main pipe 125p. A separate blower mechanism may be provided in the branch pipe 125q.

[0349] 27 and 28, exhaust unit 124 changes the opening degree of exhaust pipe 125 that connects fluid cabinet 120 to the outside, but this embodiment is not limited to this. Exhaust unit 124 may also have an air supply unit that supplies gas to fluid cabinet 120.

[0350] Next, a method for controlling exhaust from the fluid cabinet 120 according to the embodiment will be described with reference to Fig. 30. Fig. 30(a) to Fig. 30(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 according to the present embodiment.

[0351] Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 30. Figures 30(a) to 30(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 of this embodiment. The fluid cabinet 120 shown in Figure 30 has the same configuration as the fluid cabinet 120 shown in Figure 28, except that it further includes an air supply unit 128, and therefore, duplicated descriptions will be omitted to avoid redundancy.

[0352] As shown in FIG. 30(a), the exhaust unit 124 here includes an exhaust pipe 125, an exhaust amount adjustment mechanism 126, and an air supply unit 128. The air supply unit 128 is attached to the air intake port 123. The air supply unit 128 includes, for example, a fan. The exhaust amount adjustment mechanism 126 can adjust the opening of the exhaust pipe 125. By controlling at least one of the exhaust amount adjustment mechanism 126 and the air supply unit 128, the amount of exhaust air exhausted from the fluid cabinet 120 to the outside can be adjusted. Note that the exhaust amount adjustment mechanism 126 may maintain the opening of the exhaust pipe 125 constant after the substrate processing apparatus 100 starts operating.

[0353] The atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. When the exhaust pressure of the fluid cabinet 120 is maintained at the target value Gv, the gas supply unit 128 supplies gas to the fluid cabinet 120 at the standard gas supply volume. In this case, the gas supply unit 128 does not need to be driven.

[0354] The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust can prevent the atmosphere inside the housing 122 from leaking outside the housing 122.

[0355] As shown in FIG. 30(b), when the exhaust pressure from the fluid cabinet 120 decreases within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure within the fluid cabinet 120 decreases, the exhaust pressure detection unit 130q detects the decrease in exhaust pressure within the fluid cabinet 120. The control unit 102 determines the decrease in exhaust pressure within the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions according to the decrease in exhaust pressure. Specifically, the control unit 102 controls the air supply unit 128 to supply gas at a forced air supply volume greater than the standard air supply volume. This causes the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

[0356] Here, exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within fluid cabinet 120. In this case, control unit 102 determines a forced air supply condition that is set to a forced air supply amount greater than the standard air supply amount in accordance with the decrease in exhaust pressure. Control unit 102 controls air supply unit 128 under the determined forced air supply condition, thereby forcibly exhausting the atmosphere within fluid cabinet 120.

[0357] As shown in FIG. 30(c), when the exhaust pressure in the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced air supply conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects a relatively large drop in the exhaust pressure in the fluid cabinet 120, the control unit 102 determines forced air supply conditions set at an even greater forced air supply volume in accordance with the state of the drop in exhaust pressure. The control unit 102 controls the air supply unit 128 under the determined forced air supply conditions. This allows the atmosphere in the fluid cabinet 120 to be forcibly exhausted.

[0358] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust amount of the exhaust unit 124 can be controlled in accordance with the decrease in the exhaust pressure inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the decrease in the exhaust pressure inside the fluid cabinet 120.

[0359] Next, an exhaust control method for fluid cabinet 120 according to an embodiment will be described with reference to Figure 31. Figures 31(a) to 31(c) are schematic diagrams for describing an exhaust control method for fluid cabinet 120 according to this embodiment. Fluid cabinet 120 shown in Figure 31 has the same configuration as fluid cabinet 120 shown in Figure 28, except that it further includes branch pipe 125q and exhaust fan 129, and therefore, duplicated description will be omitted to avoid redundancy.

[0360] As shown in FIG. 31(a), the exhaust unit 124 here includes an exhaust pipe 125, an exhaust volume adjustment mechanism 126, and an exhaust fan 129. The exhaust pipe 125 includes a main pipe 125p and a branch pipe 125q. The main pipe 125p extends linearly. The branch pipe 125q branches off midway from the main pipe 125p. The exhaust volume adjustment mechanism 126 adjusts the opening of the exhaust pipe 125. The exhaust volume adjustment mechanism 126 is located upstream of the branch point of the main pipe 125p. The exhaust fan 129 increases the volume of exhaust from the fluid cabinet 120. The exhaust fan 129 is located on the branch pipe 125q. By controlling at least one of the exhaust volume adjustment mechanism 126 and the exhaust fan 129, the volume of exhaust air exhausted from the fluid cabinet 120 to the outside can be adjusted. The exhaust amount adjusting mechanism 126 may maintain the opening of the exhaust pipe 125 constant after the substrate processing apparatus 100 starts to operate.

[0361] The atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. When the exhaust pressure of the fluid cabinet 120 is maintained at the target value Gv, the exhaust fan 129 exhausts the atmosphere inside the fluid cabinet 120 at the standard exhaust volume. In this case, the exhaust fan 129 does not need to be driven.

[0362] The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust can prevent the atmosphere inside the housing 122 from leaking outside the housing 122.

[0363] As shown in FIG. 31(b), when the exhaust pressure from the fluid cabinet 120 decreases within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure within the fluid cabinet 120 decreases, the exhaust pressure detection unit 130q detects the decrease in exhaust pressure within the fluid cabinet 120. The control unit 102 determines the decrease in exhaust pressure within the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume of the exhaust fan 129 in accordance with the decrease in exhaust pressure. Specifically, the control unit 102 controls the exhaust fan 129 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120. The exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 in accordance with the determined forced exhaust conditions.

[0364] Here, exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within fluid cabinet 120. In this case, control unit 102 determines the forced exhaust conditions for exhaust fan 129, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the decrease in exhaust pressure. Control unit 102 controls exhaust fan 129 under the determined forced exhaust conditions, causing exhaust fan 129 to exhaust the atmosphere within fluid cabinet 120.

[0365] 31(c), when the exhaust pressure in the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under the forced exhaust conditions of the exhaust fan 129, which are set to a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects that the exhaust pressure in the fluid cabinet 120 has dropped relatively significantly, the control unit 102 determines the forced exhaust conditions of the exhaust fan 129, which are set to an even greater forced exhaust volume in accordance with the state of the drop in exhaust pressure. The control unit 102 controls the exhaust fan 129 under the determined forced exhaust conditions, so that the exhaust fan 129 can forcibly exhaust the atmosphere in the fluid cabinet 120.

[0366] As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust amount of the exhaust unit 124 can be controlled in accordance with the state of decrease in the exhaust pressure inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted in accordance with the amount of processing liquid that has leaked inside the fluid cabinet 120.

[0367] The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and can be embodied in various forms without departing from the spirit and scope of the present invention. Furthermore, various inventions can be formed by appropriately combining multiple components disclosed in the above embodiments. For example, some components may be omitted from all components shown in the embodiments. Furthermore, components from different embodiments may be appropriately combined. The drawings mainly show each component in a schematic manner to facilitate understanding. The thickness, length, number, spacing, etc. of each component shown may differ from the actual thickness, length, number, spacing, etc. of each component shown in the above embodiments due to the convenience of drawing. Furthermore, the materials, shapes, dimensions, etc. of each component shown in the above embodiments are merely examples and are not particularly limited. Various modifications are possible within a scope that does not substantially deviate from the effects of the present invention. [Industrial Applicability]

[0368] The present invention is suitable for use in venting fluid cabinets. [Explanation of symbols]

[0369] 10. Substrate Processing Unit 12 chambers 20 Board holding part 30 Processing liquid supply unit 100 Substrate processing apparatus 110 Fluid Box 120 Fluid Cabinet W substrate

Claims

1. 1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising: a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions; an abnormality detection step of detecting an abnormality in the fluid cabinet; an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step; a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step; a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step; It encompasses the abnormality detection step includes an exhaust pressure drop detection step of detecting a drop in exhaust pressure in the fluid cabinet, The method for controlling exhaust of a fluid cabinet, wherein the abnormal state determination step includes an exhaust pressure drop state determination step of determining a drop state of the exhaust pressure of the fluid cabinet based on the detection result in the exhaust pressure drop detection step.

2. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows, comprising: a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions; an abnormality detection step of detecting an abnormality in the fluid cabinet; an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step; a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step; a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step; It encompasses The forced evacuation step includes: a first forced evacuation step, which is a transition from the standard evacuation step and which evacuates the atmosphere inside the fluid cabinet under first forced evacuation conditions set to a first forced evacuation amount greater than the evacuation amount under the standard evacuation conditions; a second forced exhaust process in which, if no abnormality is detected in the fluid cabinet after a predetermined time has elapsed since the standard exhaust process was switched to the first forced exhaust process, the atmosphere in the fluid cabinet is exhausted under second forced exhaust conditions set to a second forced exhaust amount that is larger than the exhaust amount under the standard exhaust conditions and smaller than the first forced exhaust amount; A method for controlling exhaust from a fluid cabinet, comprising:

3. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising: a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions; an abnormality detection step of detecting an abnormality in the fluid cabinet; an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step; a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step; a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step; It encompasses The forced exhaust process is a method for controlling exhaust of a fluid cabinet, and includes a step of determining whether or not to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition in the previous fluid cabinet determined in the forced exhaust process.

4. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which a fluid supplied to a substrate processing unit flows, comprising: a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions; an abnormality detection step of detecting an abnormality in the fluid cabinet; an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step; a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step; a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step; It encompasses The fluid cabinet includes: a first fluid housing; a second fluid housing connected to a common exhaust pipe shared with the first fluid housing; Including, When an abnormality in the first fluid casing is detected in the abnormality detection step, the atmosphere in the first fluid casing is exhausted under the forced exhaust conditions in the forced exhaust step; In the forced exhaust condition determination step, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure are determined; A method for controlling exhaust of a fluid cabinet, wherein the first enclosure forced exhaust condition is different from the second enclosure forced exhaust condition.

5. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which a fluid supplied to a substrate processing unit flows is provided, comprising: a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions; an abnormality detection step of detecting an abnormality in the fluid cabinet; an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step; a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step; a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step; It encompasses A method for controlling exhaust of a fluid cabinet, in which, if an abnormality in the fluid cabinet is detected in the abnormality detection process, the exhaust volume of a dummy cabinet connected to a common exhaust piping shared with the fluid cabinet is reduced below the exhaust volume of the standard exhaust process, and the exhaust volume of the fluid cabinet is increased above the exhaust volume of the standard exhaust process, in the forced exhaust process.

6. the abnormality detection step includes a liquid leakage detection step of detecting a liquid leakage occurring in the fluid cabinet, 6. The method for controlling exhaust of a fluid cabinet according to claim 2, wherein the abnormal state determination step includes a leakage state determination step of determining a leakage state in the fluid cabinet based on the detection result in the leakage detection step.

7. 7. A method for controlling exhaust of a fluid cabinet according to claim 1, wherein in the standard exhaust process, the standard exhaust conditions are set based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping.

8. The fluid cabinet includes: a first fluid housing; a second fluid housing connected to a common exhaust pipe shared with the first fluid housing; Including, A method for controlling exhaust of a fluid cabinet as described in any one of claims 1 to 3 and 5, wherein if an abnormality is detected in the first fluid housing in the abnormality detection process, the atmosphere in the first fluid housing is exhausted under the forced exhaust conditions in the forced exhaust process.

9. 9. The method for controlling exhaust of a fluid cabinet according to claim 4, wherein the forced exhaust step comprises increasing an amount of exhaust gas flowing through the common exhaust pipe.

10. 9. An exhaust control method for a fluid cabinet as described in claim 4 or 8, wherein if an abnormality is detected in the first fluid housing during the abnormality detection process, the exhaust volume of the first fluid housing is increased during the forced exhaust process without changing the exhaust volume of the exhaust circulating through the common exhaust piping.

11. the abnormal state determination step determines the abnormal state by comparing the detection result with a predetermined reference value; A method for controlling exhaust of a fluid cabinet described in any one of claims 4 and 8 to 10, wherein a first reference value which is a reference value in the judgment corresponding to the first fluid housing and a second reference value which is a reference value in the judgment corresponding to the second fluid housing are different.

12. a substrate processing unit for processing a substrate; a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow; an abnormality detection unit that detects an abnormality in the fluid cabinet; an exhaust unit that exhausts the atmosphere inside the fluid cabinet; a control unit that controls the exhaust unit; Equipped with the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions; the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet, the abnormality detection unit includes an exhaust pressure detection unit that detects an exhaust pressure in the fluid cabinet, the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, The control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition.

13. A substrate processing unit for processing a substrate; a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow; an abnormality detection unit that detects an abnormality in the fluid cabinet; an exhaust unit that exhausts the atmosphere inside the fluid cabinet; a control unit that controls the exhaust unit; Equipped with the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions; the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet, the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition; The control unit controlling the exhaust unit so as to switch from the standard exhaust condition to a first forced exhaust condition set to a first forced exhaust amount greater than the exhaust amount under the standard exhaust condition, and exhausting the atmosphere inside the fluid cabinet; A substrate processing apparatus, wherein if no abnormality is detected within the fluid cabinet after a predetermined time has elapsed since transitioning from the standard exhaust condition to the first forced exhaust condition, the exhaust unit is controlled to exhaust the atmosphere within the fluid cabinet under second forced exhaust conditions set to a second forced exhaust amount that is greater than the exhaust amount of the standard exhaust condition and smaller than the first forced exhaust amount.

14. A substrate processing unit for processing a substrate; a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow; an abnormality detection unit that detects an abnormality in the fluid cabinet; an exhaust unit that exhausts the atmosphere inside the fluid cabinet; a control unit that controls the exhaust unit; Equipped with the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions; the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet, the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition; The control unit of the substrate processing apparatus determines whether or not to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition in the fluid cabinet determined when exhausting the atmosphere in the fluid cabinet under the forced exhaust conditions.

15. A substrate processing unit for processing a substrate; a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow; an abnormality detection unit that detects an abnormality in the fluid cabinet; an exhaust unit that exhausts the atmosphere inside the fluid cabinet; a control unit that controls the exhaust unit; Equipped with the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions; the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet, the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition; The fluid cabinet includes: a first fluid housing; a second fluid housing connected to a common exhaust pipe shared with the first fluid housing; Including, when the abnormality detection unit detects an abnormality in the first fluid casing, the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid casing under the forced exhaust condition, the control unit determines, as the forced exhaust conditions, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure; The substrate processing apparatus, wherein the first enclosure forced exhaust condition is different from the second enclosure forced exhaust condition.

16. A substrate processing unit for processing a substrate; a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow; an abnormality detection unit that detects an abnormality in the fluid cabinet; an exhaust unit that exhausts the atmosphere inside the fluid cabinet; a control unit that controls the exhaust unit; A dummy cabinet and a common exhaust pipe connected to each of the fluid cabinet and the dummy cabinet; Equipped with the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions; the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet, the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition; In a substrate processing apparatus, when the abnormality detection unit detects an abnormality in the fluid cabinet, the control unit reduces the exhaust volume of the dummy cabinet below the exhaust volume under the standard exhaust conditions and increases the exhaust volume of the fluid cabinet above the exhaust volume under the standard exhaust conditions.

17. The substrate processing apparatus according to claim 13 , wherein the abnormality detection unit includes a liquid leakage detection unit that detects liquid leakage in the fluid cabinet.

18. 18. The substrate processing apparatus according to claim 12, wherein the control unit sets the standard exhaust condition based on a type of fluid flowing through the fluid piping in the fluid cabinet or a flow rate of the fluid flowing through the fluid piping.

19. The fluid cabinet includes: a first fluid housing; a second fluid housing connected to a common exhaust pipe shared with the first fluid housing; Including, 17. The substrate processing apparatus of claim 12, wherein the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid enclosure under the forced exhaust conditions when the abnormality detection unit detects an abnormality in the first fluid enclosure.

20. 20. The substrate processing apparatus according to claim 15, wherein the control unit increases the amount of exhaust gas flowing through the common exhaust pipe under the forced exhaust condition.

21. 20. The substrate processing apparatus of claim 15, wherein when the abnormality detection unit detects an abnormality in the first fluid enclosure, the control unit increases the exhaust volume of the first fluid enclosure without changing the exhaust volume of the exhaust circulating through the common exhaust piping under the forced exhaust condition.

22. The control unit determines the abnormal state by comparing the detection result with a predetermined reference value, 22. The substrate processing apparatus according to claim 15, wherein a first reference value, which is a reference value for judgment corresponding to the first fluid enclosure, and a second reference value, which is a reference value for judgment corresponding to the second fluid enclosure, are different.

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