Mask support, mask support manufacturing method, mask device, organic device manufacturing method, and organic device

Abstract

To suppress the occurrence of deformation in a mask support.SOLUTION: A mask support 40 for supporting a mask 50 in the state of applying tension to the mask includes a frame 41 including an opening 43 and a crosspiece 42 positioned at the opening and connected to the frame. The frame includes: a first surface 41a of the frame having a fixed mask, a second surface of the frame positioned on the side opposite to the first surface of the frame; an inner surface positioned between the first surface of the frame and the second surface of the frame and connected with the crosspiece; and an outer surface positioned on the side opposite to the inner surface. The crosspiece includes: a first surface of the crosspiece positioned on the side of the first surface of the frame; a second surface of the crosspiece positioned on the side opposite to the first surface of the crosspiece; and a crosspiece side surface positioned between the first surface of the crosspiece and the second surface of the crosspiece. The first surface of the crosspiece is continuous with the first surface of the frame.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] TECHNICAL FIELD Embodiments of the present disclosure relate to a mask support, a method for manufacturing a mask support, a mask apparatus, a method for manufacturing an organic device, and an organic device. [Background technology]

[0002] Organic electroluminescence (EL) display devices have been attracting attention in the field of display devices used in portable devices such as smartphones and tablet PCs. Known methods and apparatuses for manufacturing organic semiconductor devices such as organic EL display devices include a method and apparatus for forming pixels in a desired pattern using a mask with through-holes arranged in a desired pattern. For example, a mask fixed to a frame is first combined with a substrate for the organic EL display device. Next, a deposition material containing an organic material is attached to the substrate through the through-holes in the mask. By performing this deposition process, pixels having a deposition layer containing the deposition material can be formed on the substrate in a pattern corresponding to the pattern of the through-holes in the mask. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 5382259 Summary of the Invention [Problem to be solved by the invention]

[0004] When a mask support, such as a frame, that supports a mask is deformed, the position of the mask fixed to the mask support changes. It is therefore necessary to suppress deformation of the mask support. [Means for solving the problem]

[0005] According to one embodiment of the present disclosure, a mask support for supporting a mask while applying tension to the mask includes a frame including an opening, and a rung located in the opening and connected to the frame. The frame includes a frame first surface to which the mask is fixed, a frame second surface located opposite the frame first surface, an inner surface located between the frame first surface and the frame second surface and to which the rung is connected, and an outer surface located opposite the inner surface. The rung includes a rung first surface located on the side of the frame first surface, a rung second surface located opposite the rung first surface, and a rung side surface located between the rung first surface and the rung second surface. The frame first surface and the rung first surface are continuous. [Effects of the Invention]

[0006] According to the present disclosure, deformation of the mask support can be suppressed. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a cross-sectional view illustrating an example of an organic device. [Figure 2] FIG. 2 is an enlarged cross-sectional view showing the organic device of FIG. [Figure 3] FIG. 1 is a cross-sectional view showing an example of a vapor deposition apparatus. [Figure 4] FIG. 2 is a plan view showing an example of a mask device of a vapor deposition device. [Figure 5] FIG. 2 is a plan view showing an example of an intermediate portion of a mask of the mask device. [Figure 6] 4 is a cross-sectional view showing an example of the cross-sectional shape of a through-hole in a mask. FIG. [Figure 7] FIG. 5 is a plan view showing a state in which the mask is removed from the mask device of FIG. [Figure 8] 8 is a cross-sectional view of the mask device of FIG. 4 taken along line VIII-VIII. [Figure 9] 9 is a cross-sectional view of the mask device of FIG. 4 taken along line IX-IX. [Figure 10A] 8 is an enlarged plan view showing an example of the mask support in the area surrounded by the dotted line marked with the symbol X in FIG. 7. FIG. [Figure 10B] 10B is an enlarged plan view showing the first connection portion of FIG. 10A. FIG. [Figure 11A] 10B is a cross-sectional view of the mask support taken along line XI-XI of FIG. 10A. [Figure 11B] 11B is an enlarged cross-sectional view of the second connection portion of FIG. 11A. FIG. [Figure 12] 10A to 10C are cross-sectional views showing an example of a method for manufacturing a mask support. [Figure 13] 10A to 10C are cross-sectional views showing an example of a method for manufacturing a mask support. [Figure 14] 14 is a plan view showing the plate of FIG. 13 as viewed from the second surface side. FIG. [Figure 15] FIG. 1 is a cross-sectional view showing an example of a vapor deposition layer formed using a mask device. [Figure 16] FIG. 1 is a plan view showing an example of a mask device. [Figure 17] FIG. 17 is a cross-sectional view of the mask device of FIG. 16 taken along line XVII-XVII. [Figure 18] FIG. 1 is a plan view showing an example of a mask device. [Figure 19] FIG. 19 is a plan view showing a state in which the mask is removed from the mask device of FIG. 18. [Figure 20] FIG. 20 is a cross-sectional view of the mask device of FIG. 18 taken along line XX-XX. [Figure 21] FIG. 20 is a cross-sectional view of the mask device of FIG. 18 taken along line XXI-XXI. [Figure 22A] 20 is an enlarged plan view showing an example of a mask support in the area surrounded by the dotted line indicated by the reference numeral XXII in FIG. 19. [Figure 22B] 22B is an enlarged plan view showing the first connection portion of FIG. 22A. FIG. [Figure 23A] 22B is a cross-sectional view of the mask support taken along line XXIII-XXIII of FIG. 22A. [Figure 23B] 23B is an enlarged cross-sectional view of the second connection portion of FIG. 23A. FIG. [Figure 24] FIG. 1 is a plan view showing an example of a mask device. [Figure 25] FIG. 25 is a plan view showing a state in which the mask is removed from the mask device of FIG. 24. [Figure 26]FIG. 26 is a cross-sectional view of the mask device of FIG. 24 taken along line XXVI-XXVI. [Figure 27] 27 is an enlarged cross-sectional view showing the welding area of ​​the second rail member of the mask device of FIG. 26 and its surroundings. FIG. [Figure 28] FIG. 1 is a plan view showing an example of a mask device. [Figure 29] FIG. 29 is a plan view showing a state in which the mask is removed from the mask device of FIG. 28. [Figure 30] FIG. 29 is a cross-sectional view of the mask device of FIG. 28 taken along line XXX-XXX. [Figure 31] FIG. 31 is a cross-sectional view of the mask device of FIG. 28 taken along line XXXI-XXXI. [Figure 32A] 30 is an enlarged plan view showing an example of a mask support in the area surrounded by the dotted line indicated by the reference numeral XXXII in FIG. 29. FIG. [Figure 32B] 32B is an enlarged plan view showing the third connection portion of FIG. 32A. FIG. [Figure 33] FIG. 2 is a plan view showing an example of a mask support; [Figure 34] FIG. 2 is a plan view showing an example of a mask support; [Figure 35] 34 is a cross-sectional view showing a mask device including the mask support shown in FIG. 33, taken along line XXXV-XXXV in FIG. 33. FIG. [Figure 36] 35 is a cross-sectional view showing a mask device including the mask support shown in FIG. 34, taken along line XXXVI-XXXVI in FIG. 34. FIG. [Figure 37] FIG. 1 is a cross-sectional view showing an example of a mask device. [Figure 38] FIG. 1 is a cross-sectional view showing an example of a mask device. [Figure 39] FIG. 1 is a cross-sectional view showing an example of a mask device. [Figure 40] FIG. 1 is a cross-sectional view showing an example of a mask device. [Figure 41] FIG. 2 is a plan view showing a mask support according to an embodiment. [Figure 42] 10 is a table showing the results of a simulation. [Figure 43]10 is a graph showing the results of a simulation. [Figure 44] 10 is a graph showing the results of a simulation. DETAILED DESCRIPTION OF THE INVENTION

[0008] In this specification and drawings, unless otherwise specified, terms that refer to a material that forms the basis of a certain configuration, such as "substrate," "base material," "plate," "sheet," and "film," are not to be distinguished from one another solely on the basis of differences in name.

[0009] In this specification and drawings, unless otherwise specified, terms that specify shapes, geometric conditions, and their degrees, such as "parallel" and "orthogonal," and values ​​of lengths and angles, are not bound by strict meanings, but are interpreted to include a range within which similar functions can be expected.

[0010] In this specification and drawings, unless otherwise specified, when a certain component, such as a certain region, is referred to as "above" or "below," "upper" or "lower," or "upward" or "below" another component, such as another region, this includes cases where the component is in direct contact with the other component. It also includes cases where another component is contained between the component and the other component, i.e., cases where the components are in indirect contact. Furthermore, unless otherwise specified, the terms "above," "upper side," or "upper," or "under," "lower side," or "lower" may be used in the up-down direction.

[0011] In this specification and drawings, unless otherwise specified, the same or similar symbols are used to designate the same parts or parts having similar functions, and repeated explanations may be omitted. Furthermore, for the sake of convenience, the dimensional ratios of the drawings may differ from the actual ratios, and some components may be omitted from the drawings.

[0012] Unless otherwise specified in the present specification and drawings, one embodiment of the present specification may be combined with other embodiments to the extent that no contradiction occurs. In addition, other embodiments may also be combined with each other to the extent that no contradiction occurs.

[0013] Unless otherwise specified, in this specification and drawings, when a plurality of steps are disclosed in a method such as a manufacturing method, other steps that are not disclosed may be performed between the disclosed steps. In addition, the order of the disclosed steps is arbitrary within the range that does not cause contradictions.

[0014] In this specification and drawings, unless otherwise specified, a numerical range expressed by the symbol "to" includes the numerical values ​​before and after the symbol "to." For example, the numerical range defined by the expression "34 to 38 mass%" is the same as the numerical range defined by the expression "34 mass% or more and 38 mass% or less."

[0015] Hereinafter, an embodiment of the present disclosure will be described in detail with reference to the drawings. Note that the embodiment described below is an example of an embodiment of the present disclosure, and the present disclosure should not be interpreted as being limited to only these embodiments.

[0016] A first aspect of the present disclosure is a mask support that supports a mask while applying tension to the mask, a frame including an opening; a crosspiece located in the opening and connected to the frame; the frame includes a frame first surface to which the mask is fixed, a frame second surface located opposite to the frame first surface, an inner surface located between the frame first surface and the frame second surface and to which the crosspiece is connected, and an outer surface located opposite to the inner surface, the crosspiece includes a crosspiece first surface located on the frame first surface side, a crosspiece second surface located on the opposite side of the crosspiece first surface, and a crosspiece side surface located between the crosspiece first surface and the crosspiece second surface, The first surface of the frame and the first surface of the crosspiece are continuous with each other, making it a mask support.

[0017] A second aspect of the present disclosure is the mask support according to the first aspect, wherein the frame first surface and the crosspiece first surface may be located on the same plane.

[0018] A third aspect of the present disclosure is a mask support according to either the first aspect or the second aspect described above, wherein when the mask support is viewed along the normal direction of the frame first surface, the inner surface and the rib side surface may be connected via a first connection portion having a first radius of curvature.

[0019] A fourth aspect of the present disclosure is a mask support according to each of the first to third aspects described above, wherein the inner surface and the second surface of the bar may be connected via a second connection portion having a second radius of curvature.

[0020] A fifth aspect of the present disclosure is a mask support according to each of the first to fourth aspects described above, the frame includes a pair of first sides extending in a first direction and a pair of second sides extending in a second direction intersecting the first direction; the mask is fixed to the second side, The crosspiece may include a first crosspiece connected to the first side.

[0021] A sixth aspect of the present disclosure is a mask support according to each of the first to fourth aspects described above, the frame includes a pair of first sides extending in a first direction and a pair of second sides extending in a second direction intersecting the first direction; the mask is fixed to the second side, The crosspiece may include a second crosspiece connected to the second side.

[0022] A seventh aspect of the present disclosure is a mask support according to each of the first to fourth aspects described above, the frame includes a pair of first sides extending in a first direction and a pair of second sides extending in a second direction intersecting the first direction; the mask is fixed to the second side, The crosspiece includes a first crosspiece connected to the first side and a second crosspiece connected to the second side, When the mask support is viewed along the normal direction of the first frame surface, the side surface of the first bar and the side surface of the second bar may be connected via a third connection portion having a third radius of curvature.

[0023] An eighth aspect of the present disclosure is a mask support according to each of the first to seventh aspects described above, The width of the bar on the first surface of the bar may be greater than the width of the bar on the second surface of the bar.

[0024] A ninth aspect of the present disclosure is a mask support according to each of the first to eighth aspects described above, The crosspiece may include a portion in which the width of the crosspiece decreases toward the second crosspiece surface in a thickness direction of the crosspiece.

[0025] A tenth aspect of the present disclosure is a mask support according to each of the first to ninth aspects described above, The inner surface may include a portion that becomes more distant from the center of the opening in a plan view as it approaches the frame second surface in a thickness direction of the frame.

[0026] An eleventh aspect of the present disclosure is a mask support according to each of the first to tenth aspects described above, The thickness of the frame may be 5 mm or more and 40 mm or less.

[0027] A twelfth aspect of the present disclosure is a mask support according to each of the first to eleventh aspects described above, The thickness of the crosspiece may be 50 μm or more and 1000 μm or less.

[0028] A thirteenth aspect of the present disclosure is a mask support according to each of the first to twelfth aspects described above, The thickness of the crosspiece may be smaller than the thickness of the frame.

[0029] A fourteenth aspect of the present disclosure is a mask support according to each of the first to thirteenth aspects described above, The ratio of the thickness of the crosspiece to the thickness of the frame may be 0.85 or less.

[0030] A fifteenth aspect of the present disclosure is a mask support according to each of the first to fourteenth aspects described above, The width of the crosspiece may be 1 mm or more and 100 mm or less.

[0031] A sixteenth aspect of the present disclosure is a method for manufacturing a mask support according to any one of the first to fifteenth aspects described above, providing a plate including a first surface and a second surface opposite the first surface; A method for manufacturing a mask support, comprising a processing step of forming the crosspiece by processing the central region of the plate from the second surface side when the plate is viewed along the normal direction of the second surface.

[0032] A seventeenth aspect of the present disclosure is a mask device, comprising: A mask support according to any one of the first to fifteenth aspects described above; a mask including a through hole and fixed to the first frame surface of the mask support.

[0033] An eighteenth aspect of the present disclosure is a mask device according to the seventeenth aspect described above, The mask support has two or more openings defined by the bars, the mask includes two or more active areas; the effective area includes a group of regularly arranged through holes; In a plan view, two or more of the effective areas may overlap one of the openings.

[0034] A nineteenth aspect of the present disclosure is a method for manufacturing an organic device, comprising: A method for manufacturing an organic device, comprising a vapor deposition step of forming a vapor deposition layer on a substrate by depositing an organic material on the substrate through the through-holes of the mask of the mask apparatus according to each of the seventeenth aspect or the eighteenth aspect.

[0035] A twentieth aspect of the present disclosure is an organic device, comprising: The organic device includes the deposition layer formed on the substrate by the deposition step of the method for producing an organic device according to the nineteenth aspect described above.

[0036] Hereinafter, an embodiment of the present disclosure will be described in detail with reference to the drawings. Note that the embodiment described below is an example of an embodiment of the present disclosure, and the present disclosure should not be interpreted as being limited to only these embodiments.

[0037] FIG. 1 is a cross-sectional view showing an example of an organic device 100. The organic device 100 may include a substrate 110 including a first surface 111 and a second surface 112 located on the opposite side of the first surface 111, and a plurality of elements 105 arranged along an in-plane direction of the first surface 111 of the substrate 110. Although not shown, the elements 105 may also be arranged in the depth direction of FIG. 1. For example, the elements 105 may be arranged periodically in two arrangement directions along the in-plane direction of the first surface 111. The elements 105 may include a first electrode layer 120, a deposition layer 130 located on the first electrode layer 120, and a second electrode layer 140 located on the deposition layer 130.

[0038] 2 is an enlarged cross-sectional view of the organic device of FIG. 1. The deposition layer 130 may include a first deposition layer 131 located on the first electrode layer 120 and a second deposition layer 132 located on the first electrode layer 120. The first deposition layer 131 and the second deposition layer 132 may be adjacent to each other in the arrangement direction of the elements 105 in a planar view. For example, the first electrode layer 120 overlapping the first deposition layer 131 and the first electrode layer 120 overlapping the second deposition layer 132 may be adjacent to each other in the arrangement direction of the elements 105 in a planar view.

[0039] Although not shown, the deposited layer 130 may include other deposited layers such as a third deposited layer adjacent to the first deposited layer 131 or the second deposited layer 132 in the arrangement direction of the elements 105.

[0040] 2, the organic device 100 may include an insulating layer 160 located between two adjacent first electrode layers 120 in a plan view. The insulating layer 160 may contain, for example, polyimide. The insulating layer 160 may overlap the ends of the first electrode layers 120.

[0041] The substrate 110 may be an insulating plate-like member, may be transparent to transmit light, or may include glass.

[0042] The first electrode layer 120 may include a conductive material. For example, the first electrode layer 120 may include a metal, a conductive metal oxide, or other inorganic material. The first electrode layer 120 may include a transparent and conductive metal oxide, such as indium tin oxide.

[0043] The first deposition layer 131, the second deposition layer 132, and the third deposition layer may be organic layers containing organic materials. When the organic device 100 is an organic electroluminescence display device, the first deposition layer 131, the second deposition layer 132, and the third deposition layer may be light-emitting layers, respectively. For example, the first deposition layer 131, the second deposition layer 132, and the third deposition layer may be red, green, and blue light-emitting layers, respectively.

[0044] The first deposition layer 131, the second deposition layer 132, and the third deposition layer may each be formed by depositing an organic material onto the substrate 110 through a through-hole in a deposition apparatus in which a corresponding mask is installed.

[0045] Although not shown, the element 105 may include a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, etc., located between the first electrode layer 120 and the deposited layer 130, or between the deposited layer 130 and the second electrode layer 140.

[0046] The second electrode layer 140 may include a conductive material such as a metal. Materials that can be used to form the second electrode layer 140 include platinum, gold, silver, copper, iron, tin, chromium, aluminum, indium, lithium, sodium, potassium, calcium, magnesium, chromium, carbon, and alloys thereof.

[0047] 2, the second electrode layer 140 may extend across two adjacent vapor deposition layers 130 in a plan view. Although not shown, the second electrode layer 140 may be formed so that there is a gap between the second electrode layer 140 located on the two adjacent vapor deposition layers 130.

[0048] A description will be given of a vapor deposition apparatus 10 for forming a vapor deposition layer 130 on the first surface 111 of the substrate 110. FIG.

[0049] As shown in FIG. 3, the vapor deposition apparatus 10 may include therein a vapor deposition source 6, a heater 8, and a mask device 30. The vapor deposition apparatus 10 may further include an exhaust means for creating a vacuum atmosphere inside the vapor deposition apparatus 10. The vapor deposition source 6 is, for example, a crucible, and contains a vapor deposition material 7 such as an organic light-emitting material. The heater 8 heats the vapor deposition source 6. As a result, the heater 8 evaporates the vapor deposition material 7 under a vacuum atmosphere. The mask device 30 is disposed opposite the crucible 6.

[0050] As shown in FIG. 3 , the mask device 30 may include at least one mask 50 and a mask support 40 that supports the mask 50. The mask support 40 may include a frame 41 including a first frame surface 41a to which the mask 50 is fixed and a second frame surface 41b located opposite the first frame surface 41a. The mask support 40 may include an opening 43 that penetrates the mask support 40 from the first frame surface 41a side to the second frame surface 41b side inside the frame 41. The mask 50 may be fixed to the frame 41 so as to cross the opening 43 in a plan view. The frame 41 may support the mask 50 with tension applied to the mask 50 to prevent the mask 50 from bending. The term "plan view" refers to a view of the mask device 30 along the normal direction of the first frame surface 41a of the frame 41.

[0051] The mask 50 of the mask device 30 of one vapor deposition device 10 may correspond to one type of vapor deposition layer 130, for example, the first vapor deposition layer 131. In this case, the manufacturing apparatus for the organic device 100 may include multiple vapor deposition devices 10. For example, the manufacturing apparatus for the organic device 100 may include a vapor deposition device 10 corresponding to the first vapor deposition layer 131, a vapor deposition device 10 corresponding to the second vapor deposition layer 132, and a vapor deposition device 10 corresponding to the third vapor deposition layer. The substrate 110 is sequentially loaded into the multiple vapor deposition devices 10. By performing the vapor deposition process, the first vapor deposition layer 131, the second vapor deposition layer 132, and the third vapor deposition layer can be formed on the substrate 110.

[0052] 3, the mask device 30 is placed in the vapor deposition device 10 so that the mask 50 faces the substrate 110, which is an object to which the vapor deposition material 7 is to be attached. The mask 50 includes a plurality of through holes 56 that allow the vapor deposition material 7 coming from the vapor deposition source 6 to pass through. In the following description, of the surfaces of the mask 50, the surface that faces the substrate 110 will be referred to as a first surface 55a, and the surface that faces the opposite side to the first surface 55a will be referred to as a second surface 55b.

[0053] As shown in FIG. 3 , the deposition apparatus 10 may include a substrate holder 2 that holds a substrate 110. The substrate holder 2 may be movable in the thickness direction of the substrate 110. The substrate holder 2 may be movable in the surface direction of the substrate 110. The substrate holder 2 may be configured to control the tilt of the substrate 110. For example, the substrate holder 2 may include multiple chucks attached to the outer edge of the substrate 110, and each chuck may be independently movable in the thickness direction or the surface direction of the substrate 110.

[0054] 3, the deposition apparatus 10 may include a mask holder 3 that holds a mask device 30. The mask holder 3 may be movable in the thickness direction of the mask 50. The mask holder 3 may be movable in the surface direction of the mask 50. For example, the mask holder 3 may include a plurality of chucks attached to the outer edge of the mask support 40, and each chuck may be independently movable in the thickness direction or the surface direction of the mask 50.

[0055] By moving at least one of the substrate holder 2 and the mask holder 3, the position of the mask 50 of the mask device 30 relative to the substrate 110 can be adjusted.

[0056] 3, the deposition apparatus 10 may include a cooling plate 4 disposed on a second surface 112 of the substrate 110, which is the surface opposite to the mask device 30. The cooling plate 4 may have a flow path for circulating a coolant inside the cooling plate 4. The cooling plate 4 can suppress an increase in temperature of the substrate 110 during the deposition process.

[0057] As shown in FIG. 3 , the deposition apparatus 10 may include a magnet 5 disposed on a second surface 112 of the substrate 110, which is the surface opposite the mask device 30. As shown in FIG. 3 , the magnet 5 may be disposed on the cooling plate 4 on the surface opposite the mask device 30. The magnet 5 can attract the mask 50 of the mask device 30 toward the substrate 110 by magnetic force. This can reduce or eliminate the gap between the mask 50 and the substrate 110. This can suppress the occurrence of shadows during the deposition process, thereby improving the dimensional accuracy and positional accuracy of the deposition layer 130. In this application, a shadow refers to a phenomenon in which the deposition material 7 enters the gap between the mask 50 and the substrate 110, resulting in an uneven thickness of the deposition layer 130. The mask 50 may be attracted toward the substrate 110 using an electrostatic chuck that utilizes electrostatic force.

[0058] The mask device 30 will be described in detail. FIG. 4 is a plan view showing the mask device 30 as viewed from the first surface 55a side of the mask 50. As shown in FIG. 4, the mask device 30 may include a plurality of masks 50. In this embodiment, the shape of each mask 50 may be a rectangle extending in a first direction D1. In the mask device 30, the plurality of masks 50 are arranged in a direction intersecting the first direction D1, which is the longitudinal direction of the masks 50. As shown in FIG. 4, the plurality of masks 50 may be arranged in a second direction D2, which is the width direction of the masks 50 perpendicular to the longitudinal direction of the masks 50. Each mask 50 may be fixed to the frame 41 of the mask support 40 at both longitudinal ends of the mask 50 by, for example, welding.

[0059] In FIG. 4 , the symbol L1 represents the dimension of the mask 50 in the first direction D1, i.e., the length of the mask 50. The dimension L1 may be, for example, 150 mm or more, 300 mm or more, 450 mm or more, or 600 mm or more. The dimension L1 may be, for example, 750 mm or less, 1000 mm or less, 1500 mm or less, or 2000 mm or less. The range of the dimension L1 may be defined by a first group consisting of 150 mm, 300 mm, 450 mm, and 600 mm, and / or a second group consisting of 750 mm, 1000 mm, 1500 mm, and 2000 mm. The range of the dimension L1 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the dimension L1 may be defined by a combination of any two of the values ​​included in the first group. The range of the dimension L1 may be defined by a combination of any two of the values ​​included in the second group mentioned above.For example, it may be 150 mm or more and 2000 mm or less, 150 mm or more and 1500 mm or less, 150 mm or more and 1000 mm or less, 150 mm or more and 750 mm or less, 150 mm or more and 600 mm or less, 150 mm or more and 450 mm or less, 150 mm or more and 300 mm or less, 300 mm or more and 2000 mm or less, 300 mm or more and 1500 mm or less, 300 mm or more and 1000 mm or less, 300 mm or more and 750 mm or less, 300 mm or more and 600 mm or less, 300 mm or more and 450 mm or less, 450 mm or more and 2000 mm or less, It may be 50 mm or more and 1500 mm or less, 450 mm or more and 1000 mm or less, 450 mm or more and 750 mm or less, 450 mm or more and 600 mm or less, 600 mm or more and 2000 mm or less, 600 mm or more and 1500 mm or less, 600 mm or more and 1000 mm or less, 600 mm or more and 750 mm or less, 750 mm or more and 2000 mm or less, 750 mm or more and 1500 mm or less, 750 mm or more and 1000 mm or less, 1000 mm or more and 2000 mm or less, 1000 mm or more and 1500 mm or less, or 1500 mm or more and 2000 mm or less.

[0060] In FIG. 4 , the symbol W1 represents the dimension of the mask 50 in the second direction D2, i.e., the width of the mask 50. The dimension W1 may be, for example, 50 mm or more, 100 mm or more, 150 mm or more, or 200 mm or more. The dimension W1 may be, for example, 250 mm or less, 300 mm or less, 350 mm or less, or 400 mm or less. The range of the dimension W1 may be defined by a first group consisting of 50 mm, 100 mm, 150 mm, and 200 mm, and / or a second group consisting of 250 mm, 300 mm, 350 mm, and 400 mm. The range of the dimension W1 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the dimension W1 may be defined by a combination of any two of the values ​​included in the first group. The range of the dimension W1 may be defined by a combination of any two of the values ​​included in the second group mentioned above.For example, it may be 50 mm or more and 400 mm or less, 50 mm or more and 350 mm or less, 50 mm or more and 300 mm or less, 50 mm or more and 250 mm or less, 50 mm or more and 200 mm or less, 50 mm or more and 150 mm or less, 50 mm or more and 100 mm or less, 100 mm or more and 400 mm or less, 100 mm or more and 350 mm or less, 100 mm or more and 300 mm or less, 100 mm or more and 250 mm or less, 100 mm or more and 200 mm or less, 100 mm or more and 150 mm or less, 150 mm or more and 400 mm or less, It may be 50mm or more and 350mm or less, 150mm or more and 300mm or less, 150mm or more and 250mm or less, 150mm or more and 200mm or less, 200mm or more and 400mm or less, 200mm or more and 350mm or less, 200mm or more and 300mm or less, 200mm or more and 250mm or less, 250mm or more and 400mm or less, 250mm or more and 350mm or less, 250mm or more and 300mm or less, 300mm or more and 400mm or less, 300mm or more and 350mm or less, or 350mm or more and 400mm or less.

[0061] As shown in FIG. 4, the mask 50 may have a pair of ears 51 overlapping the mask support 40 and an intermediate portion 52 located between the ears 51. The ears are also referred to as end portions. The intermediate portion 52 may have at least one effective area 53 and a peripheral area 54 located around the effective area 53. In the example shown in FIG. 4, the intermediate portion 52 includes multiple effective areas 53 arranged at predetermined intervals along the first direction D1. The peripheral area 54 surrounds the multiple effective areas 53.

[0062] 5 is a plan view showing an example of the intermediate portion 52 of the mask 50. The effective area 53 of the intermediate portion 52 may include a plurality of through holes 56. The deposition material may adhere to the substrate 110 by passing through each of the through holes 56 of the intermediate portion 52. The deposition material adhered to the substrate 110 may constitute a deposition layer 130 on the substrate 110. In this case, the effective area 53 includes a group of through holes 56 regularly arranged at a period corresponding to the deposition layer 130 in a plan view.

[0063] 5, the peripheral region 54 may not include the through holes 56. Although not shown, the peripheral region 54 may include the through holes 56. In this case, the through holes 56 located in the peripheral region 54 may not be arranged periodically in a plan view. The through holes 56 located in the peripheral region 54 may be arranged regularly with a period that does not correspond to the deposition layer 130.

[0064] When a display device such as an organic EL display device is fabricated using the mask 50, one effective area 53 corresponds to the display area of ​​one organic EL display device. Therefore, the mask device 30 shown in Figures 4 and 5 allows for multi-surface deposition of an organic EL display device. Note that one effective area 53 may correspond to multiple display areas. Although not shown, multiple effective areas 53 may also be arranged at predetermined intervals in the width direction of the mask 50.

[0065] The effective area 53 may have a rectangular outline in a plan view. The effective area 53 may have an outline of various shapes depending on the shape of the display area of ​​the organic EL display device. For example, the effective area 53 may have a circular outline.

[0066] FIG. 6 is a cross-sectional view showing an example of a mask 50. As shown in FIG. 6, the mask 50 includes a metal plate 55 and a through-hole 56 penetrating from a first surface 55a to a second surface 55b of the metal plate 55. The through-hole 56 may include a first recess 561 located on the first surface 55a side of the metal plate 55 and a second recess 562 located on the second surface 55b side and connected to the first recess 561. In a plan view, a dimension r2 of the second recess 562 may be larger than a dimension r1 of the first recess 561. The first recess 561 and the second recess 562 may be formed by processing the metal plate 55 from the first surface 55a side and the second surface 55b side by etching, laser, or the like.

[0067] The first recess 561 and the second recess 562 are connected via a circumferential connecting portion 563. The connecting portion 563 may define a through portion 564 where the opening area of ​​the through hole 56 is minimized when the mask 50 is seen in a plan view.

[0068] The dimension r of the through portion 564 may be, for example, 10 μm or more, 15 μm or more, 20 μm or more, or 25 μm or more. The dimension r of the through portion 564 may be, for example, 40 μm or less, 45 μm or less, 50 μm or less, or 55 μm or less. The range of the dimension r of the through portion 564 may be defined by a first group consisting of 10 μm, 15 μm, 20 μm, and 25 μm, and / or a second group consisting of 40 μm, 45 μm, 50 μm, and 55 μm. The range of the dimension r of the through portion 564 may be defined by a combination of any one of the values ​​included in the first group described above with any one of the values ​​included in the second group described above. The range of the dimension r of the through portion 564 may be defined by a combination of any two of the values ​​included in the first group described above. The range of the dimension r of the through portion 564 may be determined by a combination of any two of the values ​​included in the second group described above.For example, it may be 10 μm or more and 55 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 45 μm or less, 10 μm or more and 40 μm or less, 10 μm or more and 25 μm or less, 10 μm or more and 20 μm or less, 10 μm or more and 15 μm or more and 15 μm or more and 55 μm or less, 15 μm or more and 50 μm or less, 15 μm or more and 45 μm or less, 15 μm or more and 40 μm or less, 15 μm or more and 25 μm or less, 15 μm or more and 20 μm or more and 55 μm or less. Alternatively, the thickness may be 20 μm or more and 50 μm or less, 20 μm or more and 45 μm or less, 20 μm or more and 40 μm or less, 20 μm or more and 25 μm or less, 25 μm or more and 55 μm or less, 25 μm or more and 50 μm or less, 25 μm or more and 45 μm or less, 25 μm or more and 40 μm or less, 40 μm or more and 55 μm or less, 40 μm or more and 50 μm or less, 40 μm or more and 45 μm or less, 45 μm or more and 50 μm or less. An AMIC-1710 manufactured by Sinto S Precision can be used as a measuring device for measuring the dimension r of the through portion 564.

[0069] 6 shows an example in which the second surface 55b of the metal plate 55 remains between two adjacent second recesses 562, but this is not limiting. Although not shown, etching may be performed so that two adjacent second recesses 562 are connected. In other words, there may be a location between two adjacent second recesses 562 where the second surface 55b of the metal plate 55 does not remain.

[0070] Next, the mask support 40 will be described. FIG. 7 is a diagram showing a state in which the mask 50 has been removed from the mask device 30 of FIG. 4. The mask support 40 may include a frame 41 including an opening 43, as well as crosspieces 42 connected to the frame 41. The crosspieces 42 may extend across the openings 43. During the vapor deposition process described below, the crosspieces 42 can be positioned below an area of ​​the mask 50 that overlaps with the openings 43 in a plan view. The crosspieces 42 may support the mask 50 from below during the vapor deposition process. This can prevent the mask 50 from bending due to its own weight.

[0071] The frame 41, the crosspiece 42, and the opening 43 will be described. First, the frame 41 will be described.

[0072] As shown in FIGS. 4 and 7 , the frame 41 may include a pair of first sides 411 facing each other across the opening 43 and a pair of second sides 412 facing each other across the opening 43. The first sides 411 and the second sides 412 extend in different directions. For example, as shown in FIG. 4 , the first sides 411 may extend in a first direction D1, which is the longitudinal direction of the mask 50, and the second sides 412 may extend in a second direction D2 perpendicular to the first direction D1. As shown in FIG. 4 , the end 51 of the mask 50 may be fixed to the second sides 412. Furthermore, the second sides 412 to which the mask 50 is fixed may be longer than the first sides 411. The opening 43 of the frame 41 may be surrounded by the pair of first sides 411 and the pair of second sides 412.

[0073] In FIG. 4, the symbol L21 represents the dimension of the opening 43 of the frame 41 in the first direction D1. The symbol L22 represents the dimension of the opening 43 of the frame 41 in the second direction D2. L22 / L21 may be, for example, 0.6 or greater, 0.8 or greater, 1.0 or greater, or 1.2 or greater. L22 / L21 may be, for example, 1.4 or less, 1.6 or less, 1.8 or less, or 2.0 or less. The range of L22 / L21 may be defined by a first group consisting of 0.6, 0.8, 1.0, and 1.2, and / or a second group consisting of 1.4, 1.6, 1.8, and 2.0. The range of L22 / L21 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of L22 / L21 may be determined by a combination of any two of the values ​​included in the first group described above. The range of L22 / L21 may be determined by a combination of any two of the values ​​included in the second group described above. For example, the range may be 0.6 or more and 2.0 or less, 0.6 or more and 1.8 or less, 0.6 or more and 1.6 or less, 0.6 or more and 1.4 or less, 0.6 or more and 1.2 or less, 0.6 or more and 1.0 or less, 0.6 or more and 0.8 or less, 0.8 or more and 2.0 or less, 0.8 or more and 1.8 or less, 0.8 or more and 1.6 or less, 0.8 or more and 1.4 or less, 0.8 or more and 1.2 or less, 0.8 or more and 1.0 or less, or 1.0 or more and 2.0 or less. Alternatively, it may be 1.0 or more and 1.8 or less, 1.0 or more and 1.6 or less, 1.0 or more and 1.4 or less, 1.0 or more and 1.2 or less, 1.2 or more and 2.0 or less, 1.2 or more and 1.8 or less, 1.2 or more and 1.6 or less, 1.2 or more and 1.4 or less, 1.4 or more and 2.0 or less, 1.4 or more and 1.8 or less, 1.4 or more and 1.6 or less, 1.6 or more and 2.0 or less, 1.6 or more and 1.8 or less, or 1.8 or more and 2.0 or less.

[0074] The dimension L21 of the opening 43 in the first direction D1 may be, for example, 150 mm or more, 300 mm or more, 450 mm or more, or 600 mm or more. The dimension L21 may be, for example, 750 mm or less, 1000 mm or less, 1500 mm or less, or 2000 mm or less. The range of the dimension L21 may be defined by a first group consisting of 150 mm, 300 mm, 450 mm, and 600 mm, and / or a second group consisting of 750 mm, 1000 mm, 1500 mm, and 2000 mm. The range of the dimension L21 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the dimension L21 may be defined by a combination of any two of the values ​​included in the first group. The range of the dimension L21 may be defined by a combination of any two of the values ​​included in the second group.For example, it may be 150 mm or more and 2000 mm or less, 150 mm or more and 1500 mm or less, 150 mm or more and 1000 mm or less, 150 mm or more and 750 mm or less, 150 mm or more and 600 mm or less, 150 mm or more and 450 mm or less, 150 mm or more and 300 mm or less, 300 mm or more and 2000 mm or less, 300 mm or more and 1500 mm or less, 300 mm or more and 1000 mm or less, 300 mm or more and 750 mm or less, 300 mm or more and 600 mm or less, 300 mm or more and 450 mm or less, 450 mm or more and 2000 mm or less, It may be 50 mm or more and 1500 mm or less, 450 mm or more and 1000 mm or less, 450 mm or more and 750 mm or less, 450 mm or more and 600 mm or less, 600 mm or more and 2000 mm or less, 600 mm or more and 1500 mm or less, 600 mm or more and 1000 mm or less, 600 mm or more and 750 mm or less, 750 mm or more and 2000 mm or less, 750 mm or more and 1500 mm or less, 750 mm or more and 1000 mm or less, 1000 mm or more and 2000 mm or less, 1000 mm or more and 1500 mm or less, or 1500 mm or more and 2000 mm or less.

[0075] The dimension L22 of the opening 43 in the second direction D2 may be, for example, 600 mm or more, 800 mm or more, 1000 mm or more, or 1200 mm or more. The dimension L22 may be, for example, 1400 mm or less, 1600 mm or less, 1800 mm or less, or 2000 mm or less. The range of the dimension L22 may be defined by a first group consisting of 600 mm, 800 mm, 1000 mm, and 1200 mm, and / or a second group consisting of 1400 mm, 1600 mm, 1800 mm, and 2000 mm. The range of the dimension L22 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the dimension L22 may be defined by a combination of any two of the values ​​included in the first group. The range of the dimension L22 may be defined by a combination of any two of the values ​​included in the second group mentioned above.For example, it may be 600 mm or more and 2000 mm or less, 600 mm or more and 1800 mm or less, 600 mm or more and 1600 mm or less, 600 mm or more and 1400 mm or less, 600 mm or more and 1200 mm or less, 600 mm or more and 1000 mm or less, 600 mm or more and 800 mm or less, 800 mm or more and 2000 mm or less, 800 mm or more and 1800 mm or less, 800 mm or more and 1600 mm or less, 800 mm or more and 1400 mm or less, 800 mm or more and 1200 mm or less, 800 mm or more and 1000 mm or less, 1000 mm or more and 2000 mm or less, or 1000 mm or more. The length may be 1,000 mm or more and 1,600 mm or less, 1,000 mm or more and 1,400 mm or less, 1,000 mm or more and 1,200 mm or less, 1,200 mm or more and 2,000 mm or less, 1,200 mm or more and 1,800 mm or less, 1,200 mm or more and 1,600 mm or less, 1,200 mm or more and 1,400 mm or more and 2,000 mm or less, 1,400 mm or more and 1,800 mm or less, 1,400 mm or more and 1,600 mm or less, 1,600 mm or more and 2,000 mm or less, 1,600 mm or more and 1,800 mm or less, or 1,800 mm or more and 2,000 mm or less.

[0076] Fig. 8 is a cross-sectional view of the mask device 30 of Fig. 4 taken along line VIII-VIII. Fig. 9 is a cross-sectional view of the mask device 30 of Fig. 4 taken along line IX-IX. As shown in Figs. 8 and 9, the frame 41 is located between the frame first surface 41a and the frame second surface 41b and may include an inner surface 41e facing the opening 43 and an outer surface 41f located opposite the inner surface 41e. As shown in Figs. 8 and 9, the inner surface 41e and the outer surface 41f may extend along a normal direction of the frame first surface 41a.

[0077] The crosspiece 42 will now be described. The crosspiece 42 is connected to the inner surface 41e of the frame 41 and is a region that crosses the opening 43 in a plan view. As shown in FIGS. 4 and 7 , the crosspiece 42 may include a first crosspiece 421 connected to the inner surface 41e of the first side 411 of the frame 41. The first crosspiece 421 may extend in the second direction D2. For example, the first side 411 may include a pair of crosspiece side surfaces 42c extending in the second direction D2 in a plan view, and the crosspiece side surfaces 42c may be connected to the inner surface 41e of the first side 411 of the frame 41. A plurality of first crosspieces 421 may be arranged along the first direction D1. The length of the first side 411 may be the same as the dimension L22 of the opening 43 of the frame 41 in the second direction D2.

[0078] 8 and 9, the first crosspiece 421 may include a crosspiece first surface 42a located on the frame first surface 41a side and a crosspiece second surface 42b located on the opposite side of the crosspiece first surface 42a. The crosspiece first surface 42a may be in contact with the second surface 55b of the mask 50. The first crosspiece 421 can prevent the mask 50 from bending due to its own weight.

[0079] The structure of the boundary between the frame 41 and the crosspiece 42 will be described with reference to Figures 10A and 11A. Figure 10A is an enlarged plan view showing an example of the mask support 40 in the area surrounded by the dotted line marked with the symbol X in Figure 7. Figure 11A is a cross-sectional view of the mask support 40 taken along line XI-XI in Figure 10A.

[0080] 10A and 11A, the frame first surface 41a of the frame 41 and the crosspiece first surface 42a of the crosspiece 42 may be continuous at the boundary between the frame 41 and the crosspiece 42. For example, the frame 41 and the crosspiece 42 may both be produced by mechanically processing a single plate. In this case, the continuous frame first surface 41a and crosspiece first surface 42a can be formed by processing the plate so that the frame first surface 41a of the frame 41 and the crosspiece first surface 42a of the crosspiece 42 are formed by one surface of the plate.

[0081] Whether the frame first surface 41a of the frame 41 and the crosspiece first surface 42a of the crosspiece 42 are continuous may be determined by whether the frame first surface 41a and the crosspiece first surface 42a are located on the same plane around the boundary between the frame 41 and the crosspiece 42. Specifically, the positions of the frame first surface 41a and the frame second surface 41b in the normal direction of the frame first surface 41a are measured in the region around the boundary between the frame 41 and the crosspiece 42. The region around the boundary is the region of the frame first surface 41a and the frame second surface 41b within a radius S1 centered on the connection point 42e shown in FIG. 10A. If the position of the region around the boundary in the normal direction of the frame first surface 41a is within a range of the average value ± a first threshold, it is determined that the frame first surface 41a and the crosspiece first surface 42a are located on the same plane. The first threshold is, for example, 0.5 mm.

[0082] The connection point 42e is the center point of the end 42d of the crosspiece 42. The end 42d is defined as the portion where an extension line of the inner surface 41e of the frame 41 to which the crosspiece 42 is connected intersects with the crosspiece 42 in a plan view. In the example shown in FIG. 10A, the end 42d is the portion where an extension line of the inner surface 41e of the first side 411 extending in the first direction D1 intersects with the first crosspiece 421 extending in the second direction D2 in a plan view. The connection point 42e is the center point of the end 42d in the first direction D1 along which the inner surface 41e extends. The radius S1 is, for example, 2.5 mm.

[0083] A laser displacement meter LK-G85 manufactured by Keyence Corporation can be used as a measuring instrument to measure the positions of the first frame surface 41a and the second frame surface 41b in the normal direction of the first frame surface 41a. The measurement conditions for the LK-G85 are as follows: Measurement interval: 100μm

[0084] When the frame 41 and the crosspieces 42 are fabricated by mechanically processing a single plate, the connection between the frame 41 and the crosspieces 42 may have a shape resulting from the processing. As shown in FIG. 10A , the mask support 40 includes a first connection portion 42f where the inner surface 41e of the frame 41 and the crosspiece side surface 42c of the crosspiece 42 are connected in a plan view. FIG. 10B is an enlarged plan view of the first connection portion 42f. For example, when processing is performed using a cutting tool, the first connection portion 42f may include a transition portion 42fa. The transition portion 42fa is a portion of the mask support 40 defined by an extension line H1 of the inner surface 41e and an extension line H2 of the crosspiece side surface 42c. The rigidity of the mask support 40 when the first connection portion 42f includes the transition portion 42fa is greater than the rigidity of the mask support 40 when the first connection portion 42f does not include the transition portion 42fa. That is, the transition portion 42fa can increase the rigidity of the mask support 40.

[0085] The transition portion 42fa may include a curved portion having a first radius of curvature S2. The first radius of curvature S2 may be, for example, 1.0 mm or more, 1.5 mm or more, or 2.0 mm or more. The first radius of curvature S2 may be, for example, 3.0 mm or less, 4.0 mm or less, or 5.0 mm or less. The range of the first radius of curvature S2 may be defined by a first group consisting of 1.0 mm, 1.5 mm, and 2.0 mm and / or a second group consisting of 3.0 mm, 4.0 mm, and 5.0 mm. The range of the first radius of curvature S2 may be defined by a combination of any one of the values ​​included in the first group described above with any one of the values ​​included in the second group described above. The range of the first radius of curvature S2 may be defined by a combination of any two of the values ​​included in the first group described above. The range of the first radius of curvature S2 may be defined by a combination of any two of the values ​​included in the second group described above. For example, the radius of curvature S2 may be 1.0 mm or more and 5.0 mm or less, 1.0 mm or more and 4.0 mm or less, 1.0 mm or more and 3.0 mm or less, 1.0 mm or more and 2.0 mm or less, 1.0 mm or more and 1.5 mm or less, 1.5 mm or more and 5.0 mm or less, 1.5 mm or more and 4.0 mm or less, 1.5 mm or more and 3.0 mm or less, 1.5 mm or more and 2.0 mm or less, 2.0 mm or more and 5.0 mm or less, 2.0 mm or more and 4.0 mm or less, 2.0 mm or more and 3.0 mm or less, 3.0 mm or more and 5.0 mm or less, 3.0 mm or more and 4.0 mm or less, or 4.0 mm or more and 5.0 mm or less. The measuring device for measuring the first radius of curvature S2 may be an AMIC-1710 manufactured by Shinto S Precision.

[0086] Although not shown, the inner surface 41e and the crosspiece surface 42c may be connected without a curved portion.

[0087] As shown in FIG. 11A, in a longitudinal cross-sectional view, the mask support 40 includes a second connection portion 42g connecting the inner surface 41e of the frame 41 and the second crosspiece surface 42b of the crosspiece 42. FIG. 11B is an enlarged cross-sectional view of the second connection portion 42g. For example, when processing is performed using a cutting tool, the second connection portion 42g may include a transition portion 42ga. The transition portion 42ga is a portion of the mask support 40 defined by an extension line H3 of the inner surface 41e and an extension line H4 of the second crosspiece surface 42b. When the second connection portion 42g includes the transition portion 42ga, the rigidity of the mask support 40 is greater than when the second connection portion 42g does not include the transition portion 42ga. In other words, the transition portion 42ga can increase the rigidity of the mask support 40.

[0088] The transition portion 42ga may have a second radius of curvature S3. The second radius of curvature S3 may be, for example, 1.0 mm or more, 1.5 mm or more, or 2.0 mm or more. The second radius of curvature S3 may be, for example, 3.0 mm or less, 4.0 mm or less, or 5.0 mm or less. The range of the second radius of curvature S3 may be defined by a first group consisting of 1.0 mm, 1.5 mm, and 2.0 mm and / or a second group consisting of 3.0 mm, 4.0 mm, and 5.0 mm. The range of the second radius of curvature S3 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the second radius of curvature S3 may be defined by a combination of any two of the values ​​included in the first group. The range of the second radius of curvature S3 may be defined by a combination of any two of the values ​​included in the second group. For example, the second radius of curvature S3 may be 1.0 mm or more and 5.0 mm or less, 1.0 mm or more and 4.0 mm or less, 1.0 mm or more and 3.0 mm or less, 1.0 mm or more and 2.0 mm or less, 1.0 mm or more and 1.5 mm or less, 1.5 mm or more and 5.0 mm or less, 1.5 mm or more and 4.0 mm or less, 1.5 mm or more and 3.0 mm or less, 1.5 mm or more and 2.0 mm or less, 2.0 mm or more and 5.0 mm or less, 2.0 mm or more and 4.0 mm or less, 2.0 mm or more and 3.0 mm or less, 3.0 mm or more and 5.0 mm or less, 3.0 mm or more and 4.0 mm or less, or 4.0 mm or more and 5.0 mm or less. An AMIC-1710 manufactured by Shinto S Precision can be used as a measuring device for measuring the second radius of curvature S3.

[0089] Although not shown, the inner surface 41e and the crosspiece second surface 42b may be connected without a curved portion.

[0090] The opening 43 will now be described. Because the crosspiece 42 extends across the opening 43, the opening 43 is divided into two or more regions in a plan view. For example, as shown in Fig. 7, the opening 43 includes two or more first openings 43A. The two or more first openings 43A are aligned in the first direction D1.

[0091] 7, the outline of the first opening 43A may include a pair of first edges 431 extending in the first direction D1 and a pair of second edges 432 extending in the second direction D2. At least one of the pair of first edges 431 may be formed by the inner surface 41e of the first side 411. Either of the pair of first edges 431 may be formed by the inner surface 41e of the first side 411. The second edge 432 may be formed by the inner surface 41e of the second side 412 or the crosspiece side surface 42c of the first crosspiece 421.

[0092] The first opening 43A may overlap the effective area 53 of the mask 50 in a plan view. For example, as shown in Fig. 4, in the state of the mask device 30, two or more effective areas 53 aligned in the second direction D2 may overlap one first opening 43A in a plan view. Two or more effective areas 53 of the mask 50 may overlap one first opening 43A.

[0093] The materials of the mask 50 and mask support 40 of the mask device 30 will be described. A nickel-containing iron alloy can be used as the main material for the mask 50 and mask support 40. The iron alloy may further contain cobalt in addition to nickel. For example, an iron alloy containing nickel and cobalt in total at a content of 28% by mass or more and 54% by mass or less and a cobalt content of 0% by mass or more and 6% by mass or less can be used as the material for the metal plate 55 of the mask 50. This reduces the difference between the thermal expansion coefficients of the mask 50 and mask support 40 and the thermal expansion coefficient of the glass-containing substrate 110. This prevents the dimensional accuracy and positional accuracy of the deposition layer 130 formed on the substrate 110 from decreasing due to thermal expansion of the mask 50, mask support 40, substrate 110, etc.

[0094] The total content of nickel and cobalt in the metal plate 55 may be 28% by mass or more and 38% by mass or less. In this case, Invar, Super Invar, Ultra Invar, etc. can be used as the iron alloy containing nickel or nickel and cobalt. Invar is an iron alloy containing 34% by mass or more and 38% by mass or less of nickel, with the balance being iron and unavoidable impurities. Super Invar is an iron alloy containing 30% by mass or more and 34% by mass or less of nickel, cobalt, and the balance being iron and unavoidable impurities. Ultra Invar is an iron alloy containing 28% by mass or more and 34% by mass or less of nickel, 2% by mass or more and 7% by mass or less of cobalt, 0.1% by mass or more and 1.0% by mass or less of manganese, 0.10% by mass or less of silicon, 0.01% by mass or less of carbon, and the balance being iron and unavoidable impurities.

[0095] The total content of nickel and cobalt in the metal plate 55 may be 38% by mass or more and 54% by mass or less. In this case, a low-thermal expansion Fe-Ni-based plating alloy or the like can be used as the iron alloy containing nickel or nickel and cobalt. The low-thermal expansion Fe-Ni-based plating alloy is an iron alloy containing 38% by mass or more and 54% by mass or less of nickel, with the remainder being iron and unavoidable impurities.

[0096] If the temperatures of the mask 50, mask support 40, and substrate 110 do not reach high temperatures during the deposition process, there is no particular need to make the thermal expansion coefficients of the mask 50 and mask support 40 the same as or close to the thermal expansion coefficient of the substrate 110. In this case, materials other than the iron alloys described above may be used as the material for the mask 50. For example, iron alloys other than the nickel-containing iron alloys described above, such as iron alloys containing chromium, may be used. As the iron alloy containing chromium, for example, iron alloys known as stainless steel may be used. Alloys other than iron alloys, such as nickel or nickel-cobalt alloys, may also be used.

[0097] The thickness T1 of the metal plate 55 of the mask 50 may be, for example, 8 μm or more, 10 μm or more, 13 μm or more, or 15 μm or more. The thickness T1 of the metal plate 55 may be, for example, 20 μm or less, 30 μm or less, 40 μm or less, or 50 μm or less. The range of the thickness T1 of the metal plate 55 may be defined by a first group consisting of 8 μm, 10 μm, 13 μm, and 15 μm, and / or a second group consisting of 20 μm, 30 μm, 40 μm, and 50 μm. The range of the thickness T1 of the metal plate 55 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the thickness T1 of the metal plate 55 may be defined by a combination of any two of the values ​​included in the first group. The range of the thickness T1 of the metal plate 55 may be determined by a combination of any two of the values ​​included in the second group described above. For example, it may be 8 μm or more and 50 μm or less, 8 μm or more and 40 μm or less, 8 μm or more and 30 μm or less, 8 μm or more and 20 μm or less, 8 μm or more and 15 μm or less, 8 μm or more and 13 μm or less, 8 μm or more and 10 μm or less, 10 μm or more and 50 μm or less, 10 μm or more and 40 μm or less, 10 μm or more and 30 μm or less, 10 μm or more and 20 μm or less, 10 μm or more and 15 μm or less, 10 μm or more and 13 μm or less, 13 μm or more and 50 μm or less, or 1 It may be 3 μm or more and 40 μm or less, 13 μm or more and 30 μm or less, 13 μm or more and 20 μm or less, 13 μm or more and 15 μm or less, 15 μm or more and 50 μm or less, 15 μm or more and 40 μm or less, 15 μm or more and 30 μm or less, 15 μm or more and 20 μm or less, 20 μm or more and 50 μm or less, 20 μm or more and 40 μm or less, 20 μm or more and 30 μm or less, 30 μm or more and 50 μm or less, 30 μm or more and 40 μm or less, or 40 μm or more and 50 μm or less.

[0098] When the thickness T1 of the metal plate 55 is 50 μm or less, the proportion of the vapor deposition material 7 that gets caught on the wall surfaces of the through-holes 56 before passing through the through-holes 56 can be reduced. This improves the utilization efficiency of the vapor deposition material 7. Furthermore, when the thickness T1 of the metal plate 55 is 8 μm or more, the strength of the mask 50 can be ensured, and damage or deformation of the mask 50 can be suppressed.

[0099] The thickness T2 of the frame 41 may be, for example, 5 mm or more, 10 mm or more, 15 mm or more, or 20 mm or more. The thickness T2 of the frame 41 may be, for example, 25 mm or less, 30 mm or less, 35 mm or less, or 40 mm or less. The range of the thickness T2 of the frame 41 may be defined by a first group consisting of 5 mm, 10 mm, 15 mm, and 20 mm, and / or a second group consisting of 25 mm, 30 mm, 35 mm, and 40 mm. The range of the thickness T2 of the frame 41 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the thickness T2 of the frame 41 may be defined by a combination of any two of the values ​​included in the first group. The range of the thickness T2 of the frame 41 may be defined by a combination of any two of the values ​​included in the second group. For example, it may be 5 mm or more and 40 mm or less, 5 mm or more and 35 mm or less, 5 mm or more and 30 mm or less, 5 mm or more and 25 mm or less, 5 mm or more and 20 mm or less, 5 mm or more and 15 mm or less, 5 mm or more and 10 mm or less, 10 mm or more and 40 mm or less, 10 mm or more and 35 mm or less, 10 mm or more and 30 mm or less, 10 mm or more and 25 mm or less, 10 mm or more and 20 mm or less, 10 mm or more and 15 mm or less, 15 mm or more and 40 mm or less, It may be 5mm or more and 35mm or less, 15mm or more and 30mm or less, 15mm or more and 25mm or less, 15mm or more and 20mm or more and 20mm or more and 40mm or less, 20mm or more and 35mm or less, 20mm or more and 30mm or more and 20mm or more and 25mm or less, 25mm or more and 40mm or less, 25mm or more and 35mm or less, 25mm or more and 30mm or more and 30mm or more and 40mm or less, 30mm or more and 35mm or less, 35mm or more and 40mm or less.

[0100] By making the thickness T2 of the frame 41 5 mm or more, deformation such as bending of the frame 41 can be suppressed. Furthermore, by making the thickness T2 of the frame 41 40 mm or less, the weight of the frame 41 can be suppressed from becoming excessively large. This improves the handleability of the mask support 40. For example, the mask support 40 can be transported using a small lifter.

[0101] The thickness T3 of the crosspiece 42 may be, for example, 50 μm or more, 100 μm or more, 200 μm or more, or 300 μm or more. The thickness T3 of the crosspiece 42 may be, for example, 500 μm or less, 700 μm or less, 1 mm or less, or 10 mm or less. The range of the thickness T3 of the crosspiece 42 may be defined by a first group consisting of 50 μm, 100 μm, 200 μm, and 300 μm and / or a second group consisting of 500 μm, 700 μm, 1 mm, and 10 mm. The range of the thickness T3 of the crosspiece 42 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the thickness T3 of the crosspiece 42 may be defined by a combination of any two of the values ​​included in the first group. The range of the thickness T3 of the crosspiece 42 may be determined by a combination of any two of the values ​​included in the second group described above.For example, it may be 50 μm or more and 10 mm or less, 50 μm or more and 1 mm or less, 50 μm or more and 700 μm or less, 50 μm or more and 500 μm or less, 50 μm or more and 300 μm or less, 50 μm or more and 200 μm or less, 50 μm or more and 100 μm or less, 100 μm or more and 10 mm or less, 100 μm or more and 1 mm or less, 100 μm or more and 700 μm or less, 100 μm or more and 500 μm or less, 100 μm or more and 300 μm or less, 100 μm or more and 200 μm or more and 10 mm or less. Alternatively, it may be 200 μm or more and 1 mm or less, 200 μm or more and 700 μm or less, 200 μm or more and 500 μm or less, 200 μm or more and 300 μm or less, 300 μm or more and 10 mm or less, 300 μm or more and 1 mm or less, 300 μm or more and 700 μm or less, 300 μm or more and 500 μm or less, 500 μm or more and 10 mm or less, 500 μm or more and 1 mm or less, 500 μm or more and 700 μm or less, 700 μm or more and 10 mm or less, 700 μm or more and 1 mm or less, or 1 mm or more and 10 mm or less.

[0102] The thickness T3 of the crosspiece 42 may be smaller than the thickness T2 of the frame 41. The thicker the crosspiece 42, the greater the amount of vapor deposition material that adheres to the crosspiece 42 during the vapor deposition process. By making the thickness T3 of the crosspiece 42 smaller than the thickness T2 of the frame 41, it is possible to prevent the crosspiece 42 from interfering with the vapor deposition. Therefore, from the viewpoint of vapor deposition efficiency, it is preferable that the thickness T3 of the crosspiece 42 is small.

[0103] On the one hand, the greater the thickness T3 of the cross member 42, the higher the rigidity of the cross member 42. In the present embodiment, the frame 41 and the cross member 42 are integrally formed. Therefore, an increase in the rigidity of the cross member 42 leads to suppression of deformation of the frame 41. However, the greater the thickness T3 of the cross member 42, the greater the weight of the cross member 42. The increase in the weight of the cross member 42 leads to deformation of the frame 41 toward the inside. This is because the frame 41 is pulled by the gravitational force acting on the cross member 42. The inside means the direction from the frame 41 toward the center of the opening 43. When increasing the thickness T3 of the cross member 42 to suppress deformation of the frame 41, it is preferable to consider not only the rigidity of the cross member 42 but also the deformation of the frame 41 caused by the increase in the weight of the cross member 42.

[0104] As shown in the examples described later, the amount of deformation of the frame 41 may have a minimum value determined in relation to the thickness T3 of the cross member 42. When the amount of deformation of the frame 41 is at the minimum value, the amount of suppression of deformation of the frame 41 based on the rigidity of the cross member 42 and the amount of deformation of the frame 41 based on the self-weight of the cross member 42 are balanced. The thickness T3 when the amount of deformation of the frame 41 becomes the minimum value is also referred to as the conversion thickness. When the thickness T3 is less than or equal to the conversion thickness, the greater the thickness T3 of the cross member 42, the smaller the amount of deformation of the frame 41. On the other hand, when the thickness T3 is greater than the conversion thickness, the greater the thickness T3 of the cross member 42, the greater the amount of deformation of the frame 41.

[0105] The ratio of the thickness T3 to the thickness T2 when the amount of deformation of the frame 41 becomes the minimum value is also referred to as the conversion ratio. The conversion ratio may exist in the range of 0 < T3 / T2 < 1.

[0106] For example, T3 / T2 may be 0.1 or greater, 0.2 or greater, 0.3 or greater, or 0.4 or greater. T3 / T2 may be 0.5 or less, 0.6 or less, 0.7 or less, or 0.85 or less. The range of T3 / T2 may be determined by a first group consisting of 0.1, 0.2, 0.3, and 0.4, and / or a second group consisting of 0.5, 0.6, 0.7, and 0.85. The range of T3 / T2 may be determined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of T3 / T2 may be determined by a combination of any two of the values ​​included in the first group. The range of T3 / T2 may be determined by a combination of any two of the values ​​included in the second group. For example, it may be 0.1 or more and 0.85 or less, 0.1 or more and 0.7 or less, 0.1 or more and 0.6 or less, 0.1 or more and 0.5 or less, 0.1 or more and 0.4 or less, 0.1 or more and 0.3 or less, 0.1 or more and 0.2 or less, 0.2 or more and 0.85 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.5 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, or 0.3 or more and 0.85 or less. Alternatively, it may be 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.5 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.85 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.4 or more and 0.5 or less, 0.5 or more and 0.85 or less, 0.5 or more and 0.7 or less, 0.5 or more and 0.6 or less, 0.6 or more and 0.85 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.85 or less.

[0107] A contact-type measurement method is used to measure the thickness T1 of the metal plate 55, the thickness T2 of the frame 41, and the thickness T3 of the crosspiece 42. For the contact-type measurement method, a length gauge "MT1271" by HEIDENHAIM-METRO, manufactured by Heidenhain, equipped with a ball bush guide type plunger, is used.

[0108] A method for manufacturing the above-mentioned mask device 30 will be described below. First, an example of a method for manufacturing the mask support 40 will be described.

[0109] First, as shown in FIG. 12, a plate 46 may be prepared, including a first surface 46a and a second surface 46b located on the opposite side of the first surface 46a. The material of the plate 46 may be the same as that of the metal plate 55 of the mask 50. For example, the material of the plate 46 may be an iron alloy containing nickel. The thickness T0 of the plate 46 is equal to or greater than the thickness T2 of the frame 41. The thickness T0 of the plate 46 may be the same as the thickness T2 of the frame 41. In FIG. 12, the point marked with the symbol 42d indicates the position where the end 42d appears, where the frame 41 and the crosspiece 42 are connected.

[0110] Next, a processing step may be performed in which a central region 46d of the plate 46, which is located more inward than the end 42d, is processed from the second surface 46b using a cutting tool or processing machine. As shown in FIG. 13, the processing step may include a first processing step in which the plate 46 is processed until the thickness T4 of the central region 46d becomes equal to the thickness T3 of the crosspiece 42. FIG. 14 is a plan view showing the plate 46 shown in FIG. 13 as viewed from the second surface 46b. A drill, a cutting tool, a milling cutter, an end mill, or the like can be used as a cutting tool for performing the first processing step. The processing method performed by the processing machine may be laser processing, water plasma processing, wire cutting, or the like.

[0111] The processing step may include a second processing step in which an opening extending from the second surface 46b to the first surface 46a is partially formed in the central region 46d by using a cutting tool or processing machine to process the central region 46d from the second surface 46b side. In this case, the remaining area of ​​the central region 46d without an opening forms the crosspiece 42. Examples of cutting tools that can be used for the second processing step include drills, turning tools, milling cutters, and end mills. Examples of processing methods that can be used with the processing machine include laser processing, water plasma processing, and wire cutting.

[0112] In this manner, a mask support 40 including a frame 41 and a crosspiece 42 can be manufactured as shown in Fig. 7. The second processing step may be performed after the first processing step, or the second processing step may be performed before the first processing step.

[0113] Subsequently, a fixing step may be performed to fix the mask 50 to the second side 412 of the frame 41. For example, the end 51 of the mask 50 may be fixed to the frame first surface 41a of the second side 412 while applying tension T to the mask 50 in the first direction D1. A welding method, for example, may be used to fix the mask 50 to the frame 41. A laser beam may be used in the welding method. The laser beam may be irradiated onto the end 51. The irradiated end 51 may be melted, thereby welding the end 51 to the frame first surface 41a of the second side 412. In this manner, the mask device 30 including the mask support 40 and the mask 50 can be manufactured as shown in FIG. 4.

[0114] A method for manufacturing an organic device 100 by using a vapor deposition apparatus 10 equipped with a masking device 30 will now be described.

[0115] First, a substrate 110 is prepared on which layers such as the first electrode layer 120 and the insulating layer 160 are formed. The substrate 110 is then carried into the vapor deposition apparatus 10. Before carrying the substrate 110 into the vapor deposition apparatus 10, the substrate 110 may be subjected to pretreatment such as cleaning.

[0116] Next, a deposition process is performed in which an organic material is deposited on the substrate 110 through the through-holes 56 of the mask 50 of the mask device 30. This allows a deposition layer 130 to be formed on the substrate 110. Thereafter, processes for forming other layers such as the second electrode layer 140 are performed, thereby manufacturing the organic device 100.

[0117] In the embodiment of the present disclosure, as described above, the mask support 40 is fabricated by mechanically processing a single plate 46. Therefore, the frame 41 and the crosspieces 42 of the mask support 40 are integrally configured. This improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend, compared to when the frame 41 and the crosspieces 42 are separate components. For example, when the crosspieces 42 include first crosspieces 421 extending in the second direction D2, the rigidity of the mask support 40 in the second direction D2 can be improved. This can prevent the frame 41 of the mask support 40 from deforming in the second direction D2 due to, for example, a force applied to the mask support 40 from the mask 50. This prevents the positions of the through-holes 56 of the mask 50, which are fixed to the frame 41, from shifting from their designed positions. The designed positions refer to ideal positions of the through-holes 56.

[0118] 15 is a cross-sectional view showing a portion of the mask 50 of the mask device 30 in a state where it is combined with the substrate 110. According to the embodiment of the present disclosure, it is possible to prevent the positions of the through-holes 56 of the mask 50 from being shifted from the designed positions. This makes it possible to improve the positional accuracy of the deposition layer 130 made of the deposition material that is deposited on the substrate 110 through the through-holes 56.

[0119] An example of the advantage of high positional accuracy of the deposited layer 130 will be described. When the organic device 100 includes an insulating layer 160 as shown in FIG. 15 , the dimensions of the insulating layer 160 in the surface direction of the substrate 110 may be set based on the positional accuracy of the deposited layer 130 in the deposition process. For example, the dimensions of the insulating layer 160 may be set smaller as the positional accuracy of the deposited layer 130 increases. When the pixel density of the organic device 100 is constant, the areas of the first electrode layer 120 and the deposited layer 130 can be increased as the dimensions of the insulating layer 160 decrease. This increases the driving efficiency of the organic device 100 and extends the life of the organic device 100.

[0120] When the first frame surface 41a of the frame 41 and the first crosspiece surface 42a of the crosspiece 42 are positioned on the same plane, there is an advantage in that it becomes easier to control the position of the surface of the mask 50 supported from below by the crosspiece 42 relative to the first frame surface 41a of the frame 41. This makes it easier to control the distance Z1 between the first surface 55a of the mask 50 and the first surface 111 of the substrate 110 in the vapor deposition process, as shown in FIG. 15 . This makes it easier to suppress or adjust shadows in the vapor deposition process, for example.

[0121] Next, other examples of the mask device 30 will be described with reference to Figures 16 and 17. Here, the case where the mask device 30 includes a first crosspiece member 47 that is configured as a separate member from the frame 41 will be described.

[0122] Fig. 16 is a plan view showing an example of the mask device 30. Fig. 17 is a cross-sectional view of the mask device 30 taken along line XVII-XVII in Fig. 16. The first crosspiece member 47 of the mask device 30 is fixed to the first frame surface 41a side of the first side 411 of the frame 41 by welding. Therefore, compared to the crosspiece 42 that is integrally formed with the frame 41, the first crosspiece member 47 makes a smaller contribution to the rigidity of the mask support 40 in the second direction D2.

[0123] Furthermore, because the first crosspiece member 47 is a separate member from the frame 41, misalignment is likely to occur between the frame first surface 41a and the first surface 47a of the first crosspiece member 47 in the normal direction of the frame first surface 41a of the frame 41. Therefore, the distance Z1 between the first surface 55a of the mask 50 and the first surface 111 of the substrate 110 is more likely to vary than when the crosspiece 42 described above, which is integral with the frame 41, is used.

[0124] 1 to 15, the frame 41 and the crosspieces 42 are integrally configured, which effectively improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend. In addition, the first frame surface 41a of the frame 41 and the first crosspiece surfaces 42a of the crosspieces 42 are located on the same plane, which makes it easier to control the position of the surface of the mask 50 relative to the first frame surface 41a of the frame 41.

[0125] The above-described embodiment can be modified in various ways. Hereinafter, other embodiments will be described with reference to the drawings as necessary. In the following description and the drawings used in the following description, parts that can be configured similarly to the above-described embodiment will be designated by the same reference numerals as those used for the corresponding parts in the above-described embodiment. Duplicate descriptions will be omitted. Furthermore, if it is clear that the effects obtained in the above-described embodiment can also be obtained in other embodiments, the descriptions may be omitted.

[0126] FIG. 18 is a plan view showing an example of the mask device 30 as viewed from the first surface 55a of the mask 50. FIG. 19 is a view showing a state in which the mask 50 is removed from the mask device 30 of FIG. 18. The crosspiece 42 may include a second crosspiece 422 connected to the inner surface 41e of the second side 412 of the frame 41. The second crosspiece 422 may extend in the first direction D1. For example, the second crosspiece 422 may include a pair of crosspiece side surfaces 42c extending in the first direction D1 in a plan view, and the crosspiece side surfaces 42c may be connected to the inner surface 41e of the second side 412 of the frame 41. A plurality of second crosspieces 422 may be arranged along the second direction D2. The length of the second crosspiece 422 may be the same as the dimension L21 of the opening 43 of the frame 41 in the first direction D1.

[0127] Fig. 20 is a cross-sectional view of the mask device 30 taken along line XX-XX in Fig. 18. Fig. 21 is a cross-sectional view of the mask device 30 taken along line XXI-XXI in Fig. 18. The second crosspiece 422 may overlap the gap between two masks 50 adjacent to each other in the second direction D2 in plan view. Providing the second crosspiece 422 can prevent the deposition material that has passed through the gap between the two masks 50 from adhering to the substrate 110.

[0128] The first crosspiece surface 42a of the second crosspiece 422 may be in contact with the second surface 55b of the mask 50. Similar to the first side 411 described above, the second crosspiece 422 can also prevent the mask 50 from bending due to its own weight.

[0129] The structure of the boundary between the second side 412 of the frame 41 and the second crosspiece 422 of the crosspiece 42 will be described with reference to Figures 22A and 23A. Figure 22A is an enlarged plan view showing an example of the mask support 40 in the area surrounded by the dotted line marked with reference numeral XXII in Figure 19. Figure 23A is a cross-sectional view of the mask support 40 taken along line XXIII-XXIII in Figure 22A.

[0130] 22A and 23A, the first frame surface 41a of the frame 41 and the first crosspiece surface 42a of the crosspiece 42 may be continuous at the boundary between the frame 41 and the crosspiece 42. For example, similar to the first side 411, the first frame surface 41a and the first crosspiece surface 42a may be located on the same plane around the boundary between the second side 412 of the frame 41 and the second crosspiece 422 of the crosspiece 42.

[0131] 22A, the mask support 40 includes, in a plan view, a first connection portion 42f that connects the inner surface 41e of the second side 412 of the frame 41 and the crosspiece side surface 42c of the second crosspiece 422 of the crosspiece 42. FIG. 22B is a plan view showing an enlarged view of the first connection portion 42f. For example, when processing is performed using a cutting tool, the first connection portion 42f may include a transition portion 42fa, as in the above-described embodiment. The transition portion 42fa may include a curved portion having a first radius of curvature S2.

[0132] As shown in Fig. 23A, in a longitudinal cross section, the mask support 40 includes a second connection portion 42g that connects the inner surface 41e of the second side 412 of the frame 41 and the second bar surface 42b of the second bar 422 of the bar 42. Fig. 23B is an enlarged cross-sectional view of the second connection portion 42g. For example, when processing is performed using a cutting tool, the second connection portion 42g may include a transition portion 42ga, as in the above-described embodiment. The transition portion 42ga may include a curved portion having a second radius of curvature S3.

[0133] The opening 43 will now be described. Because the crosspiece 42 extends across the opening 43, the opening 43 is divided into two or more regions in a plan view. For example, as shown in Fig. 19, the opening 43 includes two or more second openings 43B. The two or more second openings 43B are aligned in the second direction D2.

[0134] 19 , the outline of the second opening 43B may include a pair of first edges 431 extending in the first direction D1 and a pair of second edges 432 extending in the second direction D2. The first edges 431 may be formed by the inner surface 41 e of the first side 411 or the crosspiece side surface 42 c of the second crosspiece 422. At least one of the pair of second edges 432 may be formed by the inner surface 41 e of the second side 412. Both of the pair of second edges 432 may be formed by the inner surface 41 e of the second side 412.

[0135] The second opening 43B may overlap the effective area 53 of the mask 50 in a plan view. In the state of the mask device 30, two or more effective areas 53 aligned in the first direction D1 may overlap one second opening 43B in a plan view. Two or more effective areas 53 of one mask 50 may overlap one second opening 43B.

[0136] The mask support 40 shown in FIGS. 18 to 23A can be fabricated by mechanically processing a single plate, similar to the mask support 40 of the above-described embodiment shown in FIGS. 1 to 15. Therefore, the frame 41 and the crosspieces 42 of the mask support 40 are integrally formed. This improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend, compared to when the frame 41 and the crosspieces 42 are separate components. For example, when the crosspieces 42 include second crosspieces 422 extending in the first direction D1, the rigidity of the mask support 40 in the first direction D1 can be improved. Therefore, for example, deformation of the frame 41 of the mask support 40 in the first direction D1 due to a force applied to the mask support 40 from the mask 50 can be prevented. This prevents the positions of the through-holes 56 of the mask 50, which are fixed to the frame 41, from shifting from their designed positions.

[0137] Furthermore, when the first frame surface 41a of the second side 412 of the frame 41 and the first crosspiece surface 42a of the second crosspiece 422 of the crosspiece 42 are positioned on the same plane, it becomes easier to control the position of the surface of the mask 50 supported from below by the crosspiece 42 relative to the first frame surface 41a of the frame 41. This makes it easier to control the distance Z1 between the first surface 55a of the mask 50 and the first surface 111 of the substrate 110. This makes it easier to suppress or adjust shadows in the vapor deposition process, for example.

[0138] As in the above-described embodiment, the thickness T3 of the crosspiece 42 may be smaller than the thickness T2 of the frame 41. T3 / T2 may be, for example, 0.1 or greater, 0.2 or greater, 0.3 or greater, or 0.4 or greater. T3 / T2 may be, for example, 0.5 or less, 0.6 or less, 0.7 or less, or 0.85 or less. The range of T3 / T2 may be defined by a first group consisting of 0.1, 0.2, 0.3, and 0.4 and / or a second group consisting of 0.5, 0.6, 0.7, and 0.85. The range of T3 / T2 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of T3 / T2 may be defined by a combination of any two of the values ​​included in the first group. The range of T3 / T2 may be defined by a combination of any two of the values ​​included in the second group. For example, it may be 0.1 or more and 0.85 or less, 0.1 or more and 0.7 or less, 0.1 or more and 0.6 or less, 0.1 or more and 0.5 or less, 0.1 or more and 0.4 or less, 0.1 or more and 0.3 or less, 0.1 or more and 0.2 or less, 0.2 or more and 0.85 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.5 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, or 0.3 or more and 0.85 or less. Alternatively, it may be 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.5 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.85 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.4 or more and 0.5 or less, 0.5 or more and 0.85 or less, 0.5 or more and 0.7 or less, 0.5 or more and 0.6 or less, 0.6 or more and 0.85 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.85 or less.

[0139] Other examples of the mask device 30 will be described with reference to Figures 24 to 27. Here, the case where the mask device 30 includes a second crosspiece member 48 that is configured as a separate member from the frame 41 will be described.

[0140] Fig. 24 is a plan view showing an example of the mask device 30. Fig. 25 is a plan view showing the mask device 30 of Fig. 24 with the mask 50 removed. Fig. 26 is a cross-sectional view of the mask device 30 of Fig. 24 taken along line XXVI-XXVI. The second crosspiece member 48 of the mask device 30 is fixed to the first frame surface 41a side of the second side 412 of the frame 41 by welding. Therefore, compared to the crosspiece 42 that is integrally formed with the frame 41, the second crosspiece member 48 makes a smaller contribution to the rigidity of the mask support 40 in the first direction D1.

[0141] Furthermore, when the second crosspiece member 48 is fixed to the second side 412 of the frame 41 by welding, the welded region of the second crosspiece member 48 may overlap the mask 50. FIG. 27 is an enlarged cross-sectional view of the welded region 48x of the second crosspiece member 48 and its surroundings. If the welded region 48x of the second crosspiece member 48 protrudes upward from the first frame surface 41a of the frame 41 as shown in FIG. 27, a portion of the mask 50 is pressed upward by the welded region 48x. In this case, as shown in FIG. 27, a gap may easily occur between the second surface 55b of the mask 50 and the first surface 48a of the second crosspiece member 48. Therefore, the distance Z1 between the first surface 55a of the mask 50 and the first surface 111 of the substrate 110 is more likely to vary than when the crosspieces 42 described above that are integral with the frame 41 are used.

[0142] 18 to 23B, the frame 41 and the crosspieces 42 are integrally configured, which effectively improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend. In addition, the first frame surface 41a of the frame 41 and the first crosspiece surfaces 42a of the crosspieces 42 are located on the same plane, which makes it easier to control the position of the surface of the mask 50 relative to the first frame surface 41a of the frame 41.

[0143] An example in which the mask support 40 of the mask device 30 includes both the first bars 421 and the second bars 422 will be described with reference to FIGS.

[0144] Fig. 28 is a plan view showing an example of the mask device 30. Fig. 29 is a plan view showing the mask device 30 of Fig. 28 with the mask 50 removed. The crosspiece 42 may include a first crosspiece 421 connected to the first side 411 of the frame 41 and a second crosspiece 422 connected to the second side 412 of the frame 41. The first crosspiece 421 may extend in the second direction D2 from one first side 411 to the other first side 411. The second crosspiece 422 may extend in the first direction D1 from one second side 412 to the other second side 412.

[0145] Figure 30 is a cross-sectional view of the mask device 30 taken along line XXX-XXX in Figure 28. Figure 31 is a cross-sectional view of the mask device 30 taken along line XXXI-XXXI in Figure 28. The first bars 421 and the second bars 422 may be in contact with the second surface 55b of the mask 50.

[0146] At the boundary between the frame 41 and the crosspiece 42, the first frame surface 41a of the frame 41 and the first crosspiece surface 42a of the crosspiece 42 may be continuous. The structure of the boundary between the first side 411 of the frame 41 and the first crosspiece 421 of the crosspiece 42 is similar to that in the embodiment described above and shown in Figures 10A and 11A, so a description thereof will be omitted. The structure of the boundary between the second side 412 of the frame 41 and the second crosspiece 422 of the crosspiece 42 is similar to that in the embodiment described above and shown in Figures 22A and 23A, so a description thereof will be omitted.

[0147] The structure of the connection portion between the first bar 421 and the second bar 422 of the bar 42 will be described with reference to Fig. 32A. Fig. 32A is an enlarged plan view showing an example of the mask support 40 in the area surrounded by the dotted line and marked with the reference character XXXII in Fig. 29.

[0148] The first crosspiece surface 42a of the first crosspiece 421 and the first crosspiece surface 42a of the second crosspiece 422 may be located on the same plane. For example, as shown in FIG. 32A, in an area within a radius S4 centered at the intersection 42i between the first crosspiece 421 and the second crosspiece 422, the position of the first crosspiece surface 42a in the normal direction is within a range of the average value ± a second threshold value. The second threshold value is, for example, 0.5 μm. The radius S4 is, for example, 10 mm.

[0149] As shown in FIG. 32A, the mask support 40 includes, in a plan view, a third connection portion 42h connecting the bar side surface 42c of the first bar 421 and the bar side surface 42c of the second bar 422 of the frame 41. FIG. 32B is an enlarged plan view of the third connection portion 42h. For example, when processing is performed using a cutting tool, the third connection portion 42h may include a transition portion 42ha. The transition portion 42ha is a portion of the bar 42 defined by an extension line H5 of the bar side surface 42c of the first bar 421 and an extension line H6 of the bar side surface 42c of the second bar 422. When the third connection portion 42h includes the transition portion 42ha, the rigidity of the bar 42 is greater than when the third connection portion 42h does not include the transition portion 42ha. In other words, the transition portion 42ha can increase the rigidity of the bar 42.

[0150] The transition portion 42ha may include a curved portion having a third radius of curvature S5. The third radius of curvature S5 may be, for example, 10 μm or more, 100 μm or more, 1 mm or more, or 2 mm or more. The third radius of curvature S5 may be, for example, 3 mm or less, 5 mm or less, 10 mm or less, or 20 mm or less. The range of the third radius of curvature S5 may be defined by a first group consisting of 10 μm, 100 μm, 1 mm, and 2 mm, and / or a second group consisting of 3 mm, 5 mm, 10 mm, and 20 mm. The range of the third radius of curvature S5 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of the third radius of curvature S5 may be defined by a combination of any two of the values ​​included in the first group. The range of the third radius of curvature S5 may be defined by a combination of any two of the values ​​included in the second group. For example, it may be 10 μm or more and 20 mm or less, 10 μm or more and 10 mm or less, 10 μm or more and 5 mm or less, 10 μm or more and 3 mm or less, 10 μm or more and 2 mm or less, 10 μm or more and 1 mm or less, 10 μm or more and 100 μm or more and 100 μm or more and 20 mm or less, 100 μm or more and 10 mm or less, 100 μm or more and 5 mm or less, 100 μm or more and 3 mm or less, 100 μm or more and 2 mm or less, 100 μm or more and 1 mm or less, or 1 mm or more and 20 mm m or less, may be 1 mm or more and 10 mm or less, may be 1 mm or more and 5 mm or less, may be 1 mm or more and 3 mm or less, may be 1 mm or more and 2 mm or less, may be 2 mm or more and 20 mm or less, may be 2 mm or more and 10 mm or less, may be 2 mm or more and 5 mm or less, may be 2 mm or more and 3 mm or less, may be 3 mm or more and 20 mm or less, may be 3 mm or more and 10 mm or less, may be 3 mm or more and 5 mm or less, may be 5 mm or more and 20 mm or less, may be 5 mm or more and 10 mm or less, may be 10 mm or more and 20 mm or less.The measuring device used to measure the third radius of curvature S3 is the AMIC-1710 manufactured by Shinto S Precision.

[0151] The opening 43 will now be described. In the present embodiment as well, the opening 43 is divided into two or more regions by the crosspieces 42 in a plan view. For example, as shown in Fig. 29, the opening 43 includes a plurality of third openings 43C. The plurality of third openings 43C are aligned in the first direction D1 and the second direction D2.

[0152] 29 , the contour of the third opening 43C may include a pair of first edges 431 extending in the first direction D1 and a pair of second edges 432 extending in the second direction D2. Both of the pair of first edges 431 may be formed by the bar side surface 42c of the second bar 422. Both of the pair of second edges 432 may be formed by the bar side surface 42c of the first bar 421.

[0153] The third opening 43C may overlap the effective area 53 of the mask 50 in a planar view. In the state of the mask device 30, one effective area 53 may overlap one third opening 43C in a planar view. In a planar view, two or more effective areas 53 may overlap one third opening 43C. For example, two or more effective areas 53 aligned in the first direction D1 may overlap one third opening 43C. For example, two or more effective areas 53 aligned in the second direction D2 may overlap one third opening 43C.

[0154] The mask support 40 shown in FIGS. 28 to 32A can be fabricated by mechanically processing a single plate, similar to the mask support 40 of the above-described embodiment shown in FIGS. 1 to 15 and 18 to 23A. Therefore, the frame 41 and the crosspieces 42 of the mask support 40 are integrally formed. This improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend, compared to when the frame 41 and the crosspieces 42 are separate components. For example, when the crosspieces 42 include second crosspieces 422 extending in the first direction D1 and first crosspieces 421 extending in the second direction D2, the rigidity of the mask support 40 in the first direction D1 and the second direction D2 can be improved. Therefore, for example, deformation of the frame 41 of the mask support 40 in the first direction D1 and the second direction D2 due to a force applied to the mask support 40 from the mask 50 can be prevented. This prevents the positions of the through-holes 56 of the mask 50, which are fixed to the frame 41, from shifting from their designed positions.

[0155] Furthermore, because the mask support 40 is fabricated by mechanically processing a single plate, the first crosspiece surface 42a of the first crosspiece 421 of the crosspiece 42 and the first crosspiece surface 42a of the second crosspiece 422 can be continuous. For example, the first crosspiece surface 42a of the first crosspiece 421 and the first crosspiece surface 42a of the second crosspiece 422 can be positioned on the same plane. This makes it easier to control the position of the surface of the mask 50 supported from below by the crosspiece 42 relative to the first frame surface 41a of the frame 41. This also makes it easier to control the distance Z1 between the first surface 55a of the mask 50 and the first surface 111 of the substrate 110. This makes it easier to suppress or adjust shadows during the vapor deposition process, for example.

[0156] As in the above-described embodiment, the thickness T3 of the crosspiece 42 may be smaller than the thickness T2 of the frame 41. T3 / T2 may be, for example, 0.1 or greater, 0.2 or greater, 0.3 or greater, or 0.4 or greater. T3 / T2 may be, for example, 0.5 or less, 0.6 or less, 0.7 or less, or 0.85 or less. The range of T3 / T2 may be defined by a first group consisting of 0.1, 0.2, 0.3, and 0.4 and / or a second group consisting of 0.5, 0.6, 0.7, and 0.85. The range of T3 / T2 may be defined by a combination of any one of the values ​​included in the first group and any one of the values ​​included in the second group. The range of T3 / T2 may be defined by a combination of any two of the values ​​included in the first group. The range of T3 / T2 may be defined by a combination of any two of the values ​​included in the second group. For example, it may be 0.1 or more and 0.85 or less, 0.1 or more and 0.7 or less, 0.1 or more and 0.6 or less, 0.1 or more and 0.5 or less, 0.1 or more and 0.4 or less, 0.1 or more and 0.3 or less, 0.1 or more and 0.2 or less, 0.2 or more and 0.85 or less, 0.2 or more and 0.7 or less, 0.2 or more and 0.6 or less, 0.2 or more and 0.5 or less, 0.2 or more and 0.4 or less, 0.2 or more and 0.3 or less, or 0.3 or more and 0.85 or less. Alternatively, it may be 0.3 or more and 0.7 or less, 0.3 or more and 0.6 or less, 0.3 or more and 0.5 or less, 0.3 or more and 0.4 or less, 0.4 or more and 0.85 or less, 0.4 or more and 0.7 or less, 0.4 or more and 0.6 or less, 0.4 or more and 0.5 or less, 0.5 or more and 0.85 or less, 0.5 or more and 0.7 or less, 0.5 or more and 0.6 or less, 0.6 or more and 0.85 or less, 0.6 or more and 0.7 or less, or 0.7 or more and 0.85 or less.

[0157] Other examples of the mask device 30 will be described with reference to Figures 33 to 36. Here, the mask device 30 will be described as including a first crosspiece member 47 and a second crosspiece member 48 that are formed from members separate from the frame 41.

[0158] 33 and 34 are plan views showing a mask support 40 including a first crosspiece member 47 and a second crosspiece member 48 that are configured as separate members from the frame 41. In the example shown in FIG. 33, the first crosspiece member 47 is located between the first frame surface 41a of the frame 41 and the second crosspiece member 48. In the example shown in FIG. 34, the second crosspiece member 48 is located between the first frame surface 41a of the frame 41 and the first crosspiece member 47.

[0159] Figure 35 is a cross-sectional view showing a mask device 30 including the mask support 40 shown in Figure 33, cut along line XXXV-XXXV in Figure 33. In the configuration shown in Figures 33 and 35, the second cross member 48 is located between the first cross member 47 and the second surface 55b of the mask 50. In this case, the ends of the mask 50 in the second direction D2 are in contact with the second cross member 48 and are therefore supported from below, but the center portion in the second direction D2 is not in contact with anything. For this reason, it is conceivable that the mask 50 will bend along the second direction D2, which is the width direction of the mask 50.

[0160] Fig. 36 is a cross-sectional view showing the mask device 30 including the mask support 40 shown in Fig. 34, cut along line XXXVI-XXXVI in Fig. 34. In the configuration shown in Figs. 34 and 36, the first crosspiece member 47 is located between the second crosspiece member 48 and the second surface 55b of the mask 50. Therefore, a gap corresponding to the thickness of the first crosspiece member 47 is generated in the thickness direction of the mask 50 between the gap between two masks 50 adjacent to each other in the second direction D2 and the second crosspiece member 48. As a result, the vapor deposition material can easily pass through the gap between the two masks 50 in the vapor deposition process.

[0161] In contrast, in the embodiment shown in FIGS. 28 to 32B , the frame 41 and the crosspieces 42 are integrally configured. This effectively improves the rigidity of the mask support 40 in the direction in which the crosspieces 42 extend. Furthermore, the first crosspiece 421 and the second crosspiece 422 of the crosspieces 42 are integrally configured. This allows the crosspiece first surface 42a of the first crosspiece 421 and the crosspiece first surface 42a of the second crosspiece 422 to be positioned on the same plane. This prevents gaps from being generated between the first crosspiece 421 and the second crosspiece 422 of the crosspieces 42 and the second surface 55b of the mask 50. This effectively supports the mask 50 from below by the crosspieces 42. This also prevents the vapor deposition material from entering the gaps between the second surface 55b of the mask 50 and the crosspieces 42.

[0162] Fig. 37 is a cross-sectional view showing an example of the mask device 30 cut along the second direction D2. As shown in Fig. 37, the second crosspiece 422 of the crosspiece 42 may include a portion in which the width W3 of the crosspiece 42 decreases toward the crosspiece second surface 42b in the thickness direction of the crosspiece 42. Furthermore, the width W31 of the crosspiece 42 at the crosspiece first surface 42a may be greater than the width W32 of the crosspiece 42 at the crosspiece second surface 42b.

[0163] The width W3 of the crosspiece 42 decreases toward the crosspiece second surface 42b in the thickness direction of the crosspiece 42, thereby preventing the deposition material from adhering to the crosspiece 42 during the deposition process. In addition, the width W31 of the crosspiece 42 at the crosspiece first surface 42a is increased, thereby improving the rigidity of the crosspiece 42. Therefore, according to the embodiment shown in FIG. 37, for example, the rigidity of the crosspiece 42 can be maintained while preventing the deposition material from adhering to the crosspiece 42 during the deposition process.

[0164] Fig. 38 is a cross-sectional view showing an example of the mask device 30 cut along the first direction D1. As shown in Fig. 38, the first bar 421 of the bar 42 may include a portion in which the width W3 of the bar 42 decreases toward the bar second surface 42b in the thickness direction of the bar 42. The width W31 of the bar 42 at the bar first surface 42a may be greater than the width W32 of the bar 42 at the bar second surface 42b.

[0165] According to the embodiment shown in FIG. 38, similarly to the embodiment shown in FIG. 37, it is possible to prevent the deposition material from adhering to the crosspiece 42 during the deposition process while maintaining the rigidity of the crosspiece 42.

[0166] 39, the first side 411 of the frame 41 may be located between the first frame surface 41a and the second frame surface 41b in the thickness direction of the frame 41 and may include a third frame surface 41h located outward from the first frame surface 41a in a plan view. Furthermore, the inner surface 41e of the first side 411 may include an inclined surface 41g that displaces outward as it approaches the second frame surface 41b in the thickness direction of the frame 41. The "outward" refers to the side away from the center point of the opening 43 of the frame 41 in a plan view.

[0167] The inclined surface 41g on the inner surface 41e of the first side 411 can prevent the deposition material from adhering to the inner surface 41e of the first side 411 during the deposition process.

[0168] 40, the second side 412 of the frame 41 may include a frame third surface 41h that is located between the frame first surface 41a and the frame second surface 41b in the thickness direction of the frame 41 and is located outward of the frame first surface 41a in a plan view. The inner surface 41e of the second side 412 may include an inclined surface 41g that displaces outward as it approaches the frame second surface 41b in the thickness direction of the frame 41.

[0169] By including the inclined surface 41g on the inner surface 41e of the second side 412, it is possible to prevent the deposition material from adhering to the inner surface 41e of the first side 411 during the deposition process, similar to the case of the first side 411 shown in FIG. [Example]

[0170] Next, the embodiments of the present disclosure will be described more specifically with reference to examples. However, the embodiments of the present disclosure are not limited to the description of the following examples as long as they do not depart from the gist of the present disclosure.

[0171] The deformation occurring in the frame 41 was verified by simulation.

[0172] As shown in Figure 41, a mask support 40 was designed that includes a frame 41 and crosspieces 42. A first frame surface 41a of the frame 41 and a first crosspiece surface 42a of the crosspieces 42 are located on the same plane. The material that constitutes the frame 41 and crosspieces 42 is an iron alloy containing 36% by weight of nickel. The configuration, dimensions, etc. of the frame 41 and crosspieces 42 are as follows: Length of first side 411 L1: 1105mm Length of second side 412 (L2): 1701mm Number of pieces in the first section 421: 7 pieces Width of first crosspiece 421: W5: 3mm Number of pieces in the second cross section 422: 22 Width of second crosspiece 422: W6: 5.5mm Frame 41 thickness T2: 30mm Thickness T3 of crosspiece 42: 0.0mm, 1.7mm, 4.4mm, 7.0mm, 9.7mm, 12.3mm, 15.0mm, 20.0mm, 25.0mm, 30.0mm

[0173] As shown in Fig. 41, the deformation amount K that occurs in second side 412 when force T is applied to second side 412 in first direction D1 was calculated by simulation. Force T corresponds to the force that second side 412 receives from mask 50. Force T was set to 27 N. ADINA manufactured by ADINA R&D was used as the simulation software. The simulation results are shown in Fig. 42.

[0174] 43 and 44 show the relationship between the thickness T3 of the crosspiece 42 and the deformation amount K. The horizontal axis represents the ratio of the thickness T3 of the crosspiece 42 to the thickness T2 of the frame 41. The minimum ratio, which is the ratio T3 / T2 when the deformation amount K of the frame 41 reaches the minimum value MIN, is expected to be between 0.40 and 0.60.

Claims

1. A mask support that supports a plurality of masks extending in a first direction while applying tension to the plurality of masks in the first direction, a frame including an opening; a crosspiece located in the opening and connected to the frame; the frame includes a frame first surface to which the mask is fixed, a frame second surface located opposite to the frame first surface, an inner surface located between the frame first surface and the frame second surface and to which the bar is connected, and an outer surface located opposite to the inner surface, The crosspiece includes a crosspiece first surface located on the side of the frame first surface, a crosspiece second surface located on the opposite side of the crosspiece first surface, and a crosspiece side surface located between the crosspiece first surface and the crosspiece second surface, The frame first surface and the crosspiece first surface are continuous with each other, the frame includes a pair of first sides extending in the first direction and a pair of second sides extending in a second direction intersecting the first direction, The plurality of masks are fixed to the second side, The crosspiece includes a first crosspiece connected to the first side and a second crosspiece connected to the second side, A mask support, wherein the width of the second bar is greater than the width of the first bar.

2. The mask support according to claim 1 , wherein the first frame surface and the first crosspiece surface are located on the same plane.

3. 3. A mask support as described in claim 1 or 2, wherein when the mask support is viewed along the normal direction of the frame first surface, the inner surface and the rib side surface are connected via a first connection portion having a first radius of curvature.

4. The mask support according to claim 1 , wherein the inner surface and the second surface of the bar are connected via a second connecting portion having a second radius of curvature.

5. A mask support described in any one of claims 1 to 4, wherein, when the mask support is viewed along the normal direction of the first surface of the frame, the side surface of the first bar and the side surface of the second bar are connected via a third connection portion having a third radius of curvature.

6. The mask support according to claim 1 , wherein a width of the bar at the first bar surface is greater than a width of the bar at the second bar surface.

7. The mask support according to claim 1 , wherein the bar includes a portion in which the width of the bar decreases toward the second surface of the bar in a thickness direction of the bar.

8. The mask support according to claim 1 , wherein the inner surface includes a portion that becomes more distant from the center point of the opening in a plan view as it approaches the second frame surface in a thickness direction of the frame.

9. The mask support according to claim 1 , wherein the frame has a thickness of 5 mm or more and 40 mm or less.

10. The mask support according to claim 1 , wherein the thickness of the crosspiece is 50 μm or more and 1000 μm or less.

11. The mask support according to claim 1 , wherein the thickness of the bars is smaller than the thickness of the frame.

12. The mask support according to claim 11 , wherein the ratio of the thickness of the crosspiece to the thickness of the frame is 0.85 or less.

13. The mask support according to claim 1 , wherein the width of the bar is not less than 1 mm and not more than 100 mm.

14. A method for manufacturing a mask support according to any one of claims 1 to 13, comprising the steps of: providing a plate including a first surface and a second surface opposite the first surface; A method for manufacturing a mask support, comprising a processing step of forming the crosspiece by processing the central region of the plate from the second surface side when viewing the plate along the normal direction of the second surface.

15. 1. A mask device, comprising: A mask support according to any one of claims 1 to 13; a plurality of masks including through holes, fixed to the frame first surface of the second side of the mask support, and extending in the first direction.

16. The mask support has two or more openings defined by the bars, the mask includes two or more active areas; the effective area includes a group of regularly arranged through holes; The mask device according to claim 15 , wherein two or more of the effective areas overlap one of the openings in a plan view.

17. A method for manufacturing an organic device, comprising: A method for manufacturing an organic device, comprising a vapor deposition step of depositing an organic material onto a substrate through the through-holes of the mask of the mask apparatus according to claim 15 or 16, thereby forming a vapor deposition layer on the substrate.

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