Method for manufacturing a multilayer wiring board

Abstract

To solve the problem in which, when partially forming a modified layer inside a glass substrate by laser irradiation, it is extremely difficult to control a modification depth so that, if a through-hole is formed by etching a modified portion, variation may occur in a depth direction or radial direction.SOLUTION: A multilayer wiring board manufacturing method for forming a through-hole in a glass substrate having a first surface and a second surface includes: a first step of bonding a support to the second surface of the glass substrate; a second step of forming a modified portion by irradiating both the glass substrate and the support with laser; a third step of peeling off and removing the support; and a fourth step of forming a through-hole by etching processing in the glass substrate.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to a method for manufacturing a multilayer wiring board. [Background technology]

[0002] In recent years, as electronic devices have become more functional and smaller, there has been a demand for even higher precision in multilayer wiring substrates, such as interposers, that are mounted on electronic devices. In particular, recent multilayer wiring boards use glass substrates, through holes formed in the glass substrates to provide through electrodes, and multilayer wiring boards are used in which a conductor layer, an insulating resin layer, and another conductor layer are sequentially laminated on both sides of the glass substrate. However, when the glass thickness of the glass substrate is about 100 μm, problems such as cracks are likely to occur in the glass substrate during the manufacturing process of the multilayer wiring board.

[0003] Therefore, in order to prevent such cracks, Patent Document 1 employs a process in which a support is adhered to the glass substrate via a release layer, and the support is peeled off and removed after the wiring is formed. Specifically, the method includes the steps of: forming a first wiring on a first surface of a glass substrate; supporting the first wiring side of the glass substrate on which the first wiring has been formed with a support; forming a laser-modified portion of the glass substrate, which serves as the starting point for forming a through hole, by irradiating the glass substrate with a laser from the surface opposite to the first surface; etching the glass substrate from the surface opposite to the first surface toward the first surface using a hydrogen fluoride etching solution to thin the glass substrate and form a through hole; forming a through electrode inside the through hole after the through hole forming step, and forming a second wiring on the surface of the glass substrate opposite to the first surface, connecting the first wiring and the second wiring via the through electrode; and removing the support from the glass substrate after the second wiring has been formed. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] International Publication No. 2019 / 235617 Summary of the Invention [Problem to be solved by the invention]

[0005] Although it is possible to form a laser-modified portion in a part of a glass substrate by laser irradiation, when forming a modified layer partially inside the glass substrate, it is difficult to control the depth of the modification, which can result in variations in the depth of the modified portion. As a result, when the through-holes are formed by etching, the diameters of the through-holes may vary.

[0006] The present invention has been made in consideration of the above-mentioned problems, and aims to provide a technology for forming through holes with high precision in a method for manufacturing a multilayer wiring board, in which a laser-modified portion is formed in the core material of the multilayer wiring board and then a through hole is formed by etching. [Means for solving the problem]

[0007] One of the representative methods for producing a glass multilayer wiring substrate of the present invention is to A method for manufacturing multilayer wiring in which through holes are formed in a glass substrate having a first surface and a second surface, a first step of adhering a support to the second surface of the glass substrate; a second step of forming modified portions on both the glass substrate and the support by laser irradiation; A third step of peeling off the support A fourth step of forming through holes in the glass substrate by etching. It has. [Effects of the Invention]

[0008] According to the present invention, by forming the modified portions in both the core material and the first support, the modified portions can be formed uniformly on the glass substrate, and then, by performing an etching process, it becomes possible to form through-holes with high precision. Problems, configurations, and effects other than those described above will become apparent from the following description of the preferred embodiments. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a cross-sectional view illustrating a step of bonding a first support to a glass substrate. [Figure 2] FIG. 2 is a cross-sectional view illustrating the step of forming the laser modified portion. [Figure 3] FIG. 3 is a cross-sectional view illustrating the step of forming the first wiring layer. [Figure 4] FIG. 4 is a cross-sectional view illustrating the step of adhering the second support. [Figure 5] FIG. 5 is a cross-sectional view illustrating the step of peeling off the first support. [Figure 6] FIG. 6 is a cross-sectional view illustrating the step of forming a through hole by etching. [Figure 7] FIG. 7 is a cross-sectional view illustrating the step of forming the second wiring layer. [Figure 8] FIG. 8 is a cross-sectional view illustrating the step of peeling off the second support. [Figure 9] FIG. 9 is a cross-sectional view of a glass substrate in which wiring layers are formed on both sides. [Figure 10] FIG. 10 is a cross-sectional view illustrating the process of forming the build-up layer. [Figure 11] FIG. 11 is a cross-sectional view of the completed multilayer wiring board. [Figure 12] FIG. 12 is a cross-sectional view illustrating a process of forming a wiring layer in the second embodiment. [Figure 13] FIG. 13 is a cross-sectional view illustrating a step of forming a laser modified portion in the second embodiment. [Figure 14] FIG. 14 is a cross-sectional view illustrating a bonding step of the second support body in the third embodiment. [Figure 15] FIG. 15 is a cross-sectional view illustrating a step of forming a laser modified portion in the third embodiment. [Figure 16] FIG. 16 is a cross-sectional view of a multilayer wiring board manufactured according to the first to third embodiments. [Figure 17] FIG. 17 is a cross-sectional view of a multilayer wiring board manufactured according to the first to third embodiments. [Figure 18] FIG. 18 is a cross-sectional view illustrating the shape of the through-hole manufactured according to the first to third embodiments. [Figure 19] FIG. 19 is a cross-sectional view of a glass multilayer wiring substrate for passive components incorporating a capacitor structure. [Figure 20] FIG. 20 is a cross-sectional view of a structure in which an interposer with a plurality of semiconductor elements mounted thereon is mounted on a BGA substrate. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. It should be noted that the following description is of an example of the present invention, and the present invention is not limited thereto. In addition, in the drawings, the same parts are denoted by the same reference numerals. In order to facilitate understanding of the invention, the position, size, shape, range, etc. of each component shown in the drawings may not represent the actual position, size, shape, range, etc. Therefore, the present invention is not necessarily limited to the position, size, shape, range, etc. disclosed in the drawings.

[0011] In this disclosure, the term "surface" may refer not only to the surface of a plate-shaped member, but also to the interface of a layer contained in the plate-shaped member that is approximately parallel to the surface of the plate-shaped member. Furthermore, the terms "upper surface" and "lower surface" refer to the surface shown at the top or bottom of a drawing of a plate-shaped member or a layer contained in the plate-shaped member. The "upper surface" and "lower surface" may also be referred to as the "first surface" and "second surface."

[0012] Furthermore, the term "side surface" refers to a surface of a plate-like member or a layer included in a plate-like member, or a portion of the thickness of a layer. Furthermore, a portion of a surface and a side surface may be collectively referred to as an "end portion." Furthermore, "upward" refers to the direction vertically upward when the plate-like member or layer is placed horizontally. Furthermore, "upward" and its opposite, "downward," are sometimes referred to as the "positive Z-axis direction" and the "negative Z-axis direction," and the horizontal direction is sometimes referred to as the "X-axis direction" and the "Y-axis direction."

[0013] Furthermore, "planar shape" and "plan view" refer to the shape of a surface or layer when viewed from above. Furthermore, "cross-sectional shape" and "cross-sectional view" refer to the shape of a plate-like member or layer when cut in a specific direction and viewed from the horizontal direction. Furthermore, "center" means the center of a surface or layer, not the periphery, and "toward the center" means the direction from the periphery of the surface or layer toward the center of the planar shape of the surface or layer.

[0014] First Embodiment A method for manufacturing a multilayer wiring layer in the first embodiment will be described below with reference to FIGS. (Adhesion of first support) First, with reference to FIG. 1, the process of bonding the first support 61 to the glass substrate 60 will be described. As shown in FIG. 1, a first support 61 is bonded to a glass substrate 60 using a first adhesive layer 62, and a laminated structure 63 consisting of the glass substrate 60, the first adhesive layer 62, and the first support 61 is formed.

[0015] The first adhesive layer 62 for temporary fixation is an adhesive layer for temporarily fixing the first support 61 to the glass substrate 60. For this reason, the material of the first adhesive layer 62 can be appropriately selected from a resin that absorbs light such as UV light and becomes peelable by generating heat, sublimating, or changing in quality, a resin that becomes peelable by foaming due to heat, or a functional group, etc. To bond the first support to the glass substrate 60, for example, a laminator, a vacuum pressure press, a reduced pressure bonding machine, or the like can be used.

[0016] The first support 61 is preferably made of the same material as the glass substrate 60. When the glass substrate 60 is made of alkali-free glass, the first support 61 is preferably made of alkali-free glass. The thickness of the first support can be appropriately set depending on the thickness of the glass substrate 60. However, it is preferable that the thickness be such that the substrate can be transported during the manufacturing process, and the range is 300 to 1,500 μm.

[0017] (Formation of laser modified part) Next, the step of forming the laser-modified portion will be described with reference to Fig. 2. As shown in Fig. 2, a laser is irradiated onto the laminated structure 63 to form a laser-modified portion 65 that will serve as the starting point of the through-hole. The laser-modified portion 65 extends, for example, in a direction perpendicular to the glass substrate 60, and can be formed on almost the entire surface of the glass substrate 60. At this time, the laser-modified portion 65 may also be formed on the first adhesive layer 62 and the first support 61. In this embodiment, by irradiating the glass substrate 60 with the first support 61 superimposed thereon with a laser, it is possible to widen the processing conditions (process window) for laser irradiation and to reliably form the desired laser-modified portion on the glass substrate 60.

[0018] (Formation of the first wiring layer) Next, the process of forming the first wiring layer 21 will be described with reference to Fig. 3. As shown in Fig. 3, the first wiring layer 21 made of a conductive layer and an insulating resin layer is formed on the first surface 20, which is the upper surface of the glass substrate 60 of the laminated structure 63. At this time, a seed layer including a hydrofluoric acid resistant metal layer 15 is formed on the glass substrate 60, and then the through electrode connection parts 41 and the wiring 16 between the through electrodes are formed on the first surface 20 by a semi-additive (SAP) process, and after removing the unnecessary seed layer, the insulating resin layer 25 is formed.

[0019] The hydrofluoric acid-resistant metal layer 15 on the glass substrate 60 is a layer of chromium, nickel, or an alloy of both, and can be formed by sputtering to a thickness of 10 to 1,000 nm. A conductive metal film is then formed on the hydrofluoric acid-resistant metal layer to a desired thickness. The conductive metal film can be made of, for example, Cu, Ni, Al, Ti, Cr, Mo, W, Ta, Au, Ir, Ru, Pd, Pt, AlSi, AlSiCu, AlCu, NiFe, ITO, IZO, AZO, ZnO, PZT, TiN, or Cu3N4.

[0020] To form the first wiring layer using the semi-additive method, a photoresist can be used to form the desired pattern. Generally, a dry film resist is used, but liquid resist can also be used. After the desired pattern is formed by exposure and development, a plating film of 2 μm or more and 20 μm or less is formed by electroplating, and the unnecessary resist pattern is peeled off and the seed layer is etched to form the wiring.

[0021] The insulating resin layer 25 is preferably a liquid or film-like material containing at least one of epoxy resin, polyimide resin, and polyamide resin, and containing fillers such as silica, titanium oxide, and urethane. A liquid resin can be formed by spin coating, and a film-like resin can be formed by applying heat and pressure under vacuum using a vacuum laminator. The material for the insulating resin layer 25 can be appropriately selected as needed.

[0022] (Adhesion of second support) Next, the step of adhering the second support body will be described with reference to Fig. 4. As shown in Fig. 4, a second adhesive layer 71 and a second support body 70 are formed on the first wiring layer 21 of the laminated structure 63.

[0023] The second adhesive layer 71 can be appropriately selected from resins that absorb light such as UV light and become peelable by generating heat, sublimating, or changing properties, as with the first adhesive layer 62, resins that become peelable by foaming due to heat, or functional groups that temporarily fix the glass substrate 60 and the first support 61, etc., but it is desirable for the second adhesive layer 71 to be a material different from that of the first adhesive layer 62.

[0024] The second support 70 is preferably made of glass, and is preferably made of the same material as the glass substrate 60. When the glass substrate 60 is made of alkali-free glass, the first support 61 is preferably made of alkali-free glass as well. The thickness of the second support can be set appropriately depending on the thickness of the glass substrate 60. However, it is preferable that the thickness be such that the second support can be transported, and the range is 300 to 1,500 μm.

[0025] (Removal of first support) Next, the step of peeling off the first support will be described with reference to Fig. 5. As shown in Fig. 5, the first adhesive layer 62 and the first support 61 are peeled off from the interface between the glass substrate 60 and the first adhesive layer 62.

[0026] When peeling the first support 61 from the interface between the glass substrate 60 and the first adhesive layer 62, an appropriate peeling method is selected depending on the material used for the first adhesive layer from among UV light irradiation, heat treatment, physical peeling, etc. Furthermore, if any residue of the first adhesive layer 62 remains on the bonding surface between the glass substrate 60 and the first adhesive layer 62, plasma cleaning, ultrasonic cleaning, water washing, solvent cleaning using alcohol, etc. may be performed.

[0027] (Through-hole formation by etching) Next, with reference to FIG. 6, the through-hole forming process by etching will be described. As shown in FIG. 6, the laser-modified portion 65 of the glass substrate 60 is selectively removed by etching, and the through-hole 12 is formed from the lower surface in the figure. Wet etching using a hydrogen fluoride aqueous solution is suitable for this etching. The amount of etching using the hydrogen fluoride aqueous solution is set appropriately depending on the thickness of the glass multilayer wiring substrate. For example, when the thickness T1 of the glass substrate 60 is 200 μm, the amount of etching is preferably in the range of 50 μm or more and 175 μm or less. The thickness T2 of the glass substrate 60 after etching is preferably 25 μm or more and 150 μm or less.

[0028] (Formation of second wiring layer) Next, the process of forming the second wiring layer will be described with reference to Fig. 7. As shown in Fig. 7, a second wiring layer 22 made of a conductive layer and an insulating resin layer is formed on the second surface 30 below the glass substrate 60. To form the through holes 12 and the second wiring layer on the second surface side of the glass substrate 60, a seed layer for power supply is formed, a pattern is formed using a resist, and a plating process is performed to a thickness of 2 µm or more and 20 µm or less. After that, the unnecessary resist pattern is peeled off, the seed layer is removed, and an insulating resin is formed. Since the second wiring layer 22 does not require etching with a hydrogen fluoride solution in a subsequent process, a material different from the hydrofluoric acid-resistant metal can be used. In this case, a metal layer made of a material different from the hydrofluoric acid-resistant metal is formed on the side surface of the through hole 12. Examples of materials different from the hydrofluoric acid-resistant metal include Ti and Cu, and at least one metal layer made of such a material is formed on the side surface of the through hole 12 and on the second surface 30 of the glass substrate 60. The materials, number of layers, etc. are not limited to those described herein and can be set appropriately as needed.

[0029] (Removal of second support) Next, the step of peeling off the second support will be described with reference to Fig. 8. As shown in Fig. 8, the second adhesive layer 71 formed above the first wiring layer 21 on the first surface 20 side of the glass substrate 60 and the second support 70 are peeled off from the interface between the first wiring layer 21 on the first surface side and the second adhesive layer 71. This results in a glass substrate 60 in which the first wiring layer 21 is formed on the first surface 20 side of the glass substrate 60 and the second wiring layer 22 is formed on the second surface 30 side, as shown in Fig. 9. When peeling the second support 70 from the second wiring layer 22, an appropriate peeling method can be selected from UV light irradiation, heat treatment, physical peeling, etc., depending on the material used for the second adhesive layer 71. Furthermore, if residue of the second adhesive layer 71 remains on the bonding surface between the first wiring layer 21 and the second adhesive layer 71, plasma cleaning, ultrasonic cleaning, water washing, solvent cleaning using alcohol, etc. may be performed.

[0030] (Build-up layer formation) Next, the process of forming the build-up layer will be described with reference to FIG. 10, a conductive electrode 31 for connecting the first wiring layer on the first surface side and a conductive electrode 32 for connecting the second wiring layer on the second surface side are formed on the first wiring layer 21 on the first surface 20 side of the glass substrate 60 and the second wiring layer 22 on the second surface 30 side. The conductive electrodes 31 and 32 are formed by forming a via in the insulating resin layer 25 with a laser, forming a seed layer on the via, and then using a semi-additive process (resist pattern formation, plating, resist peeling, seed layer removal, insulating resin layer 25). The first wiring layer 21 and the second wiring layer 22 are each formed by stacking at least one layer, and the number of layers can be set appropriately as required.

[0031] The laser used to form the conductive electrodes 31 and 32 is different from the laser used to form the laser modified portion 65. For example, it is preferable to use a pulsed laser such as a carbon dioxide laser or a UV-YAG laser, and a laser with a pulse width of μs is suitable.

[0032] Next, as shown in FIG. 11, an outer protective film such as solder resist 55 is formed on the first wiring layer 21 and the second wiring layer 22, and then the semiconductor element bonding pads 51 and the substrate bonding pads 53 are subjected to surface treatment with Ni / Au, Ni / Pd / Au, IT, OSP (water-soluble preflux), etc., and solder 52 for bonding the semiconductor element and solder 54 for bonding the substrate are formed as needed, thereby completing the multilayer wiring substrate.

[0033] Second Embodiment Next, a second embodiment will be described with reference to FIGS. 1, 12, 13, and 4 to 11. FIG. The second embodiment differs from the first embodiment in that the laser modification step is performed after the formation of the first wiring layer. In the following description, the same or equivalent components as those in the first embodiment described above are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

[0034] (Adhesion of first support) In the method for manufacturing a multilayer wiring board according to the second embodiment, the first step, that is, the step of adhering a first support body, is the same as in the first embodiment described with reference to FIG. 1, and therefore description thereof will be omitted.

[0035] (Formation of the first wiring layer) Next, with reference to FIG. 12, a process for forming a wiring layer in the second embodiment will be described.

[0036] 12, following the bonding step of the first support, a first wiring layer 21 is formed on a glass substrate 60 of a laminated structure 63. At this time, a seed layer including a hydrofluoric acid resistant metal layer 15 is formed on the glass substrate 60, and then a through electrode connection portion 41 and wiring 16 between the through electrodes are formed by a semi-additive (SAP) method. After removing the unnecessary seed layer, an insulating resin layer 25 is formed. The materials and film-forming methods for the hydrofluoric acid resistant metal layer and the conductive metal film are the same as those in the first embodiment.

[0037] (Formation of laser modified part) Next, the step of forming a laser-modified portion in the second embodiment will be described with reference to Fig. 13. As shown in Fig. 13, a laser is irradiated onto the laminated structure 63 from the surface of the first support 61 to form a laser-modified portion 65 that will serve as the starting point of the through-hole. The laser-modified portion 65 extends, for example, in the vertical direction relative to the glass substrate 60 and is formed over the entire surface. At this time, the laser-modified portion 65 may be formed on the first adhesive layer 62 and the first support 61.

[0038] (Processes after bonding the second support) In the second embodiment, the processes after the bonding process of the second support, namely peeling off the first support, forming through holes by etching, forming the second wiring layer, peeling off the second support, and forming the build-up layer are the same as those in the first embodiment described with reference to Figures 4 to 11, and therefore will not be described again.

[0039] Third Embodiment Next, a third embodiment will be described with reference to FIGS. 1, 12, 14, 15, and 5 to 11. FIG. The third embodiment differs from the second embodiment in that the laser modification step is performed after the bonding step of the second support body. In the following description, the same or equivalent components as those in the first and second embodiments described above are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

[0040] (Attachment of first support and formation of first wiring layer) In the manufacturing method of the glass multilayer wiring board according to the third embodiment, the initial steps of adhering the first support and forming the first wiring layer are the same as those in the second embodiment described with reference to Figures 1 and 12, and therefore will not be described again.

[0041] (Adhesion of second support) Next, with reference to FIG. 14, the step of adhering the second support body in the third embodiment will be described. In the third embodiment, as shown in FIG. 14, a second adhesive layer 71 and a second support 70 are formed on the first wiring layer 21 of the laminated structure 63.

[0042] (Formation of laser modified part) 15 , the laminated structure 63 is irradiated with a laser to form laser-modified portions 65 that will become the starting points of the through holes. The laser-modified portions 65 extend, for example, in the vertical direction relative to the glass substrate 60 and are formed over the entire surface. At this time, the laser-modified portions 65 may also be formed in the first adhesive layer 62 and the first support 61.

[0043] (Steps after peeling off the first support) In the third embodiment, the processes after the step of peeling off the first support, such as forming through holes by etching, forming the second wiring layer, peeling off the second support, and forming the build-up layer, are the same as those in the first embodiment described with reference to Figures 5 to 11, and therefore will not be described again.

[0044] <Actions and Effects> According to the manufacturing methods described in the first to third embodiments, when forming the laser-modified portion, the glass substrate 60 is not the only target of laser irradiation, but the support member, which is made of the same material as the glass substrate 60, is also always the target of laser irradiation. This allows the laser-modified portion to be reliably formed over the entire thickness direction (z-axis direction) of the glass substrate 60. In other words, the end portion of the laser modification, where the laser modification may not be sufficiently performed, is present in the support member. Such unstable laser-modified portion is then peeled off and removed together with the support member in a subsequent process. This allows the laser-modified portion formed on the glass substrate 60 to be highly uniform and formed with precision, making it possible to form uniform through-holes even by subsequent etching. Conventionally, only the glass substrate 60 was the target of laser irradiation, and therefore the laser-modified portion was not necessarily formed uniformly near the surface of the glass substrate, resulting in variations in the shape of the through holes. However, the method for forming multilayer wiring disclosed herein can significantly improve this point.

[0045] <Glass multilayer wiring substrate according to an embodiment of the present invention> The structures of the multilayer wiring boards manufactured according to the first, second and third embodiments will be described with reference to FIGS. In the multilayer wiring board manufactured according to the first to third embodiments of the present invention, as shown in Figures 16, 17, and 18, the first wiring layer 21 on the first surface 20 side of the glass substrate 60 and the second wiring layer 22 on the second surface 30 side are electrically connected by a truncated cone-shaped through electrode 11.

[0046] The first wiring layer 21 and the through electrode 11 on the first surface 20 side are blocked by the through electrode connection portion 41 of the first wiring layer 21 on the first surface 20 side, and the through electrode connection portion 41 and the through electrode 11 sandwich the hydrofluoric acid-resistant metal layer 15.

[0047] The conductive electrodes 31 connecting the first wiring layer 21 on the first surface 20 side are formed on the through electrode connection portions 41 of the first wiring layer on the first surface 20 side. The conductive electrodes 32 connecting the second wiring layer 22 on the second surface 30 side are formed at positions away from the through electrodes 11. The conductive electrodes 31 connecting the first wiring layer 21 on the first surface 20 side can be formed on the through electrodes 11 by forming the first wiring layer 21 on the first surface 20 side on the glass substrate 60 and then forming through holes 12 by etching, and in the first wiring layer on the first surface side, it is possible to form wiring 16 between the through electrodes 11. The first wiring layer 21 on the first surface side offers greater freedom in wiring design than the second wiring layer 22 on the second surface side.

[0048] Furthermore, according to the present invention, the opening diameter D2 of the second wiring layer 22 on the second surface 30 side can be stably formed, and problems such as blocking of the opening diameter D2 can be prevented. Therefore, as shown in FIG. 18 , the relationship between the opening diameter D1 of the first wiring layer 21 on the first surface 20 side of the glass substrate 60 and the opening diameter D2 of the second wiring layer 22 on the second surface 30 of the through hole 12, i.e., the through electrode 11, is D2>D1, and the first surface 20 side opening diameter D1 / second surface side opening D2 is approximately 0.3 to 0.8, thereby ensuring adhesion of the seed layer to the side and bottom surfaces of the through electrode 11. This ensures adhesion to the side and bottom surfaces of the through electrode 11, resulting in high bonding reliability.

[0049] The above-described method for manufacturing a glass multilayer wiring board using thin glass with a glass thickness of 150 μm or less can be used for devices such as a glass multilayer wiring board for passive components with a built-in capacitor structure as shown in FIG. 19, and an interposer with multiple semiconductor elements mounted thereon as shown in FIG. 20. This embodiment makes it easy to use thin glass with a glass thickness of 150 μm or less and enables through holes and through electrodes to be formed easily, and can therefore be used for various devices using a glass multilayer wiring board with through electrodes.

[0050] The scope of the present invention is not limited to the illustrated and described exemplary embodiments, but includes various modifications. For example, the above-described embodiments have been described in detail to clearly explain the present invention, and the present invention is not necessarily limited to an embodiment including all of the described configurations. It is also possible to replace part of the configuration of one embodiment with the configuration of another embodiment, or to add the configuration of another embodiment to the configuration of one embodiment, or to add, delete, or replace part of the configuration of each embodiment with the configuration of another embodiment. Furthermore, the present invention also includes all embodiments that provide effects equivalent to those intended by the present invention. [Explanation of symbols]

[0051] 1: Glass multilayer wiring board 11:Through electrode 12:Through hole 15: Hydrofluoric acid resistant metal layer 16: Wiring 21: 1st wiring layer 22: 2nd wiring layer 25: Insulating resin layer 31: Conduction electrode 32: Conduction electrode 41: Through electrode connection part 42: Through electrode connection part 51: Bonding pad for semiconductor element 52:Solder for joining semiconductor elements 53:Bonding pad for circuit board 54:Bonding solder for circuit boards 55: Solder resist 60: Glass substrate 61: First support 62: 1st adhesive layer 63:Laminated structure 65: Laser modification section 70:Second support 71:Second adhesive layer 80: Capacitor structure 90:BGA board 100: Semiconductor element D1: Through-hole first side opening diameter D2: Through-hole second side opening diameter

Claims

1. a glass substrate having a first surface and a second surface, a first wiring layer being formed on the first surface; a removable first support made of glass is adhered to the second surface; a modified portion is formed on both the glass substrate and the first support by laser irradiation, A through-hole can be formed in the glass substrate by etching, the modified portion is formed over the entire thickness direction of the glass substrate, an end of the modified portion is present in a first support; The modified portion of the glass substrate is a multilayer wiring substrate that serves as a starting point for the through hole.

2. 2. The multilayer wiring board according to claim 1, A removable second support is adhered above the first wiring layer. A multilayer wiring board characterized by:

3. 3. The multilayer wiring board according to claim 2, The first support is peeled off and removed, and a modified portion by laser irradiation is exposed on the second surface of the glass substrate. A multilayer wiring board characterized by:

4. 4. The multilayer wiring board according to claim 3, Through holes are formed in the glass substrate by etching. A multilayer wiring board characterized by:

5. 5. The multilayer wiring board according to claim 4, a second wiring layer is provided on the second surface of the glass substrate; A part of the second wiring layer is connected to a through electrode formed on a side surface of the through hole. A multilayer wiring board characterized by:

6. 6. The multilayer wiring board according to claim 5, The multilayer wiring board is characterized in that the second wiring layer and at least one of the through electrodes are formed of a metal material different from a hydrofluoric acid-resistant metal.

7. 7. The multilayer wiring board according to claim 5, The second support is peeled off and removed, and build-up layers can be formed above the first wiring layer and below the second wiring layer. A multilayer wiring board characterized by:

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