Apparatus and method for manufacturing a structure

Abstract

The purpose of the present invention is to provide an apparatus and a method whereby it becomes possible to reduce the difference between the length of a slurry layer formed in an inside part of a wall-flow-type substrate when observed in the direction of diameter of the wall-flow-type substrate and the length of the slurry layer formed in an outside part of the wall-flow-type substrate when observed in the direction of diameter of the wall-flow-type substrate. In the apparatus and the method, when a slurry M supplied to a first edge surface (T1) of a porous substrate (1) is absorbed from the side of a second edge surface (T2) of the porous substrate (1), a flow straightening member (40) that covers a center region (T12, T22) of either one of the first edge surface (T1) or the second edge surface (T2) and exposes at least a portion of an outer edge region (T11, T21) of the edge surface is provided on the side of the first edge surface (T1) or the second edge surface (T2).

Description

[Technical Field]

[0001] The present invention relates to an apparatus and method for producing a structure (for example, an exhaust gas purification catalyst or a precursor thereof) comprising a porous substrate and a functional layer (for example, a catalyst layer or a precursor layer thereof) provided on the porous substrate. [Background technology]

[0002] Conventionally, there has been known an apparatus and method for manufacturing an exhaust gas purification catalyst, in which a slurry containing raw materials for a catalyst layer is supplied to one end face side of a substrate, and the supplied slurry is sucked from the other end face side of the substrate, thereby forming a slurry layer on the substrate (for example, Patent Document 1).

[0003] On the other hand, a wall-flow type substrate is known as a substrate for an exhaust gas purification catalyst. The wall-flow type substrate includes a porous cylindrical portion, a porous partition portion provided within the cylindrical portion, and cells separated by the partition portion. The cells in the wall-flow type substrate are composed of exhaust gas inlet-side cells that are open at the end on the exhaust gas inlet side and closed at the end on the exhaust gas outlet side, and exhaust gas outlet-side cells that are open at the end on the exhaust gas outlet side and closed at the end on the exhaust gas inlet side. In the wall-flow type substrate, exhaust gas that flows in from the exhaust gas inlet-side end (opening) of the exhaust gas inlet-side cell passes through the porous partition portion and flows out from the exhaust gas outlet-side end (opening) of the exhaust gas outlet-side cell. At this time, particulate matter (PM) in the exhaust gas is collected in the pores of the partition portion. Therefore, the wall-flow type substrate is useful as a filter having a PM trapping function, for example, a particulate filter for a gasoline engine (GPF: Gasoline Particulate Filter) or a particulate filter for a diesel engine (DPF: Diesel Particulate Filter). [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2006-15205 Summary of the Invention [Problem to be solved by the invention]

[0005] In the wall-flow substrate, both the cylindrical portion and the partition portion are porous. Therefore, when slurry is supplied to one end face of the wall-flow substrate and the supplied slurry is sucked from the other end face of the wall-flow substrate, air flows in from the outer peripheral surface of the cylindrical portion of the wall-flow substrate, and the suction force at the radially outer portion of the wall-flow substrate is lower than the suction force at the radially inner portion of the wall-flow substrate.

[0006] When forming a slurry layer on the inner walls of the exhaust gas inlet cells of a wall flow substrate, the slurry is supplied to the end face of the wall flow substrate on the exhaust gas inlet side. At the end face of the wall flow substrate on the exhaust gas inlet side, the ends of the exhaust gas inlet cells are open, but the ends of the exhaust gas outlet cells are closed. Therefore, when the slurry supplied to the end face of the wall flow substrate on the exhaust gas inlet side is sucked from the end face of the wall flow substrate on the exhaust gas outlet side, the suction force is not easily transmitted to the slurry, making it difficult to form a slurry layer on the inner walls of the exhaust gas inlet cells. The same applies to forming a slurry layer on the inner walls of the exhaust gas outlet cells. Therefore, if the suction force at the radially outer portion of the wall flow substrate is weaker than the suction force at the radially inner portion of the wall flow substrate, the length of the slurry layer formed on the radially outer portion of the wall flow substrate becomes significantly shorter than the length of the slurry layer formed on the radially inner portion of the wall flow substrate, which deteriorates the PM capture function of the wall flow substrate.

[0007] Therefore, the present invention aims to provide an apparatus and method for manufacturing a structure (e.g., an exhaust gas purification catalyst or its precursor) comprising a porous substrate and a functional layer (e.g., a catalyst layer or its precursor layer) provided on the porous substrate, which can reduce the difference in length between the slurry layer formed on the radially inner part of the wall-flow type substrate and the slurry layer formed on the radially outer part of the wall-flow type substrate. [Means for solving the problem]

[0008] In order to solve the above problems, the present invention provides an apparatus for manufacturing a structure, comprising: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The device comprises: a slurry supply unit that supplies a slurry containing raw materials for the functional layer to the first end surface side; a slurry suction section that sucks the slurry supplied to the first end face side from the second end face side and forms a slurry layer on an inner wall of the first cell that does not reach the second end face; and a straightening member that is positioned on the first end face side or the second end face side and that covers at least a portion of a central region of the first end face or the second end face and exposes at least a portion of an outer edge region when the slurry supplied to the first end face side is sucked from the second end face side.

[0009] The present invention also provides a method for producing a structure, comprising the steps of: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The method comprises the steps of: (a) supplying a slurry containing raw materials for the functional layer to the first end surface side; and (b) sucking the slurry supplied to the first end face side from the second end face side to form a slurry layer on the inner wall of the first cell that does not reach the second end face; Including, In step (b), when the slurry supplied to the first end face side is sucked from the second end face side, a straightening member that covers at least a part of a central region of the first end face or the second end face and exposes at least a part of an outer edge region is disposed on the first end face side or the second end face side. [Effects of the Invention]

[0010] According to the present invention, there is provided an apparatus and method for manufacturing a structure (e.g., an exhaust gas purification catalyst or its precursor) comprising a porous substrate and a functional layer (e.g., a catalyst layer or its precursor layer) provided on the porous substrate, which can reduce the difference in length between the slurry layer formed on the radially inner part of the wall-flow type substrate and the slurry layer formed on the radially outer part of the wall-flow type substrate. [Brief explanation of the drawings]

[0011] [Figure 1] FIG. 1 is a side view of a porous substrate according to one embodiment. [Figure 2]FIG. 2 is an end view taken along line AA in FIG. [Figure 3] FIG. 3 is an enlarged view of the area indicated by the symbol R in FIG. [Figure 4] FIG. 4 is an end view taken along line BB in FIG. [Figure 5] FIG. 5 is a schematic diagram showing the configuration of a structure manufacturing apparatus according to one embodiment. [Figure 6] FIG. 6 is a schematic plan view showing the configuration of a substrate material processing unit according to one embodiment. [Figure 7] Fig. 7 is a schematic partial end view showing the configuration of a coating processing unit according to one embodiment, which shows the state before the porous substrate is subjected to the coating processing. [Figure 8] Fig. 8 is a schematic partial end view showing the configuration of a coating processing unit according to one embodiment, which shows the state when a coating process is performed on a porous substrate. [Figure 9] FIG. 9 is a plan view of a second end surface of a porous substrate according to one embodiment. [Figure 10] FIG. 10 is an end view of a porous substrate after a coating process according to one embodiment (an end view corresponding to FIG. 4). [Figure 11] FIG. 11 is an enlarged view of the inside of the suction pipe provided with the flow rectifying member according to the first embodiment. [Figure 12] FIG. 12 is a plan view of a rectifying plate included in the rectifying member according to the first embodiment. [Figure 13] FIG. 13 is an enlarged view of the inside of a suction pipe provided with a flow rectifying member according to the second embodiment. [Figure 14] FIG. 14 is a plan view of a first rectifying plate included in the rectifying member according to the second embodiment. [Figure 15] FIG. 15 is a plan view of a second current plate included in the current member according to the second embodiment. [Figure 16] FIG. 16 is a plan view showing an embodiment in which through holes are formed in the second portion of the rectifying plate shown in FIG. [Figure 17]FIG. 17 is a plan view showing an embodiment in which through holes are formed in the second current plate shown in FIG. [Figure 18] FIG. 18 is a plan view of a rectifying plate according to a modified example. [Figure 19] FIG. 19 is an end view illustrating a modified example in which a gap is formed between the suction tube and the end of the porous substrate on the second end face side that has entered the suction tube. [Figure 20] Fig. 20 is a schematic partial end view showing the configuration of a coating processing unit according to a modified example, which shows the state when a coating process is performed on a porous substrate. [Figure 21] FIG. 21 is a plan view of a first end surface of a porous substrate according to a modified example. [Figure 22] FIG. 22 is a plan view of a current plate according to a modified example. [Figure 23] Fig. 23 is a schematic partial end view showing the configuration of a coating processing unit according to a modified example, which shows the state before the slurry supplying process and the coating process are performed on the porous substrate. [Figure 24] Fig. 24 is a schematic partial end view showing the configuration of a coating processing unit according to a modified example, which shows the state when a slurry supply process is performed on a porous substrate. [Figure 25] Fig. 25 is a schematic partial end view showing the configuration of a coating processing unit according to a modified example, which shows the state when a coating process is performed on a porous substrate. [Figure 26] FIG. 26 is a diagram illustrating the outer and inner parts in the radial direction of the porous substrate. DETAILED DESCRIPTION OF THE INVENTION

[0012] ≪Porous base material≫ Hereinafter, an embodiment of a porous substrate used in the present invention will be described with reference to Figures 1 to 4. Figure 1 is a side view of a porous substrate 1, Figure 2 is an end view taken along line AA in Figure 1, Figure 3 is an enlarged view of the region indicated by symbol R in Figure 2, and Figure 4 is an end view taken along line BB in Figure 1.

[0013] The porous substrate 1 has a porous structure that allows air to pass through. The material constituting the porous substrate 1 is not particularly limited and can be appropriately selected from materials commonly used in the field of exhaust gas purification catalysts. The constituent material is preferably one that can stably maintain the shape of the porous substrate 1 even when exposed to high-temperature exhaust gas (e.g., 400°C or higher). Examples of the constituent material include ceramics. Examples of ceramics include alumina, zirconia, mullite, zircon, cordierite, aluminum titanate, silicon carbide, silicon nitride, and boron nitride.

[0014] As shown in FIG. 1, the porous substrate 1 extends in the axial direction X and has an end face S1 located on one side in the axial direction X and an end face S2 located on the other side in the axial direction X.

[0015] The length P1 of the porous substrate 1 is, for example, 40 mm or more and 300 mm or less, and the diameter P2 of the end faces S1 and S2 of the porous substrate 1 is, for example, 30 mm or more and 250 mm or less. When the end faces S1 and S2 of the porous substrate 1 are circular, the diameter P2 of the end faces S1 and S2 of the porous substrate 1 means the diameter of the circle, and when the end faces S1 and S2 of the porous substrate 1 have a shape other than a circle (for example, a polygon such as a rectangle), it means the diameter of a circle circumscribing the shape.

[0016] As shown in Figures 2 to 4, the porous substrate 1 comprises a porous cylindrical portion 11 that defines the outer shape of the porous substrate 1, porous partition portions 12 provided within the cylindrical portion 11, and cells 13 separated by the partition portions 12.

[0017] Both the cylindrical portion 11 and the partition portion 12 have a porous structure that allows air to pass through. In one embodiment, the cylindrical portion 11 and the partition portion 12 are integrally molded. In another embodiment, the cylindrical portion 11 and the partition portion 12 are separate bodies that are joined to each other. The porosity of the cylindrical portion 11 and the porosity of the partition portion 12 may or may not be the same.

[0018] The thickness of the cylindrical portion 11 and the partition portions 12 can be adjusted as appropriate, but the thickness of the cylindrical portion 11 is, for example, 100 μm or more and 3000 μm or less, and the thickness of the partition portions 12 is, for example, 20 μm or more and 1500 μm or less.

[0019] 2, the tubular portion 11 has a cylindrical shape, but the shape of the tubular portion 11 can be changed as appropriate. The tubular portion 11 may have, for example, an elliptical cylindrical shape, a rectangular cylindrical shape, or the like.

[0020] 3, the shape of the cell 13 in a plan view is a square, but the shape of the cell 13 in a plan view can be changed as appropriate. The shape of the cell 13 in a plan view may be, for example, a quadrangle other than a square, a triangle such as an equilateral triangle, a hexagon such as a regular hexagon, an octagon such as a regular octagon, a circle, an ellipse, or the like.

[0021] As shown in FIG. 3, a partition wall 12 exists between adjacent cells 13, and adjacent cells 13 are separated by the partition wall 12.

[0022] As shown in FIG. 4, the partitions 12 and the cells 13 extend in the axial direction X.

[0023] As shown in Fig. 4, the porous substrate 1 is a wall-flow type substrate. That is, the porous substrate 1 has plugging portions 14 that plug the ends of some of the cells 13 on the end face S2 side, and plugging portions 15 that plug the ends of the remaining cells 13 on the end face S1 side. As a result, some of the cells 13 extend in the axial direction X, are open at the ends on the end face S1 side, and are cells 13a whose ends on the end face S2 side are blocked by the plugging portions 14, while the remaining cells 13 extend in the axial direction X, are open at the ends on the end face S2 side, and are cells 13b whose ends on the end face S1 side are blocked by the plugging portions 15.

[0024] As shown in FIG. 4, cells 13a and 13b are arranged such that a plurality of cells 13b (for example, four cells) are adjacent to one cell 13a, and cell 13a and cell 13b adjacent to cell 13a are separated by a partition wall 12.

[0025] The number of cells 13 per square inch of the porous substrate 1 can be adjusted as appropriate, but for example, 100 cells / inch 2 Over 1000 cells / inch 2 The number of cells 13 per square inch of the porous substrate 1 is the total number of cells 13a and cells 13b per square inch on a cross section obtained by cutting the porous substrate 1 along a plane perpendicular to the axial direction X.

[0026] ≪Structure manufacturing equipment≫ Hereinafter, an embodiment of a structure manufacturing apparatus according to the present invention will be described with reference to the drawings.

[0027] <Configuration of structure manufacturing equipment> The configuration of a structure manufacturing apparatus according to one embodiment will be described below with reference to Fig. 5. Fig. 5 is a schematic diagram showing the configuration of a structure manufacturing apparatus 100.

[0028] As shown in FIG. 5, the structure manufacturing apparatus 100 includes a base material processing unit 2 and a control unit 3 that controls the operation of the base material processing unit 2.

[0029] The substrate treatment unit 2 performs various treatments on the porous substrate 1. The various treatments performed by the substrate treatment unit 2 will be described later.

[0030] The control unit 3 is, for example, a computer, and includes a main control unit and a storage unit. The main control unit is, for example, configured with a CPU (Central Processing Unit), and controls the operation of the substrate processing unit 2 by reading and executing programs stored in the storage unit.

[0031] <Configuration of the substrate processing unit> The configuration of a substrate processing unit according to one embodiment will be described with reference to Fig. 6. Fig. 6 is a schematic plan view showing the configuration of a substrate processing unit 2. The dotted line in Fig. 6 represents the porous substrate 1.

[0032] As shown in FIG. 6, the substrate processing unit 2 includes a loading / unloading station 21 and a processing station 22 provided adjacent to the loading / unloading station 21.

[0033] 6, the carry-in / out station 21 includes a placement section 211. On the placement section 211, the porous substrate 1 is placed.

[0034] 6, the processing station 22 includes a transport path 221 extending in a predetermined direction, and a transport mechanism 222 provided on the transport path 221. The transport mechanism 222 includes a holding mechanism that holds the porous substrate 1, and is configured to be capable of moving in the horizontal and vertical directions and rotating around a vertical axis.

[0035] As shown in FIG. 6, the processing station 22 includes a coating processing unit 4 .

[0036] The processing station 22 may include a baking processing section, which bakes the porous substrate 1 that has been coated by the coating processing section 4, after drying it as necessary.

[0037] The transport mechanism 222 transports the porous substrate 1 between the placement unit 211 and the coating treatment unit 4. For example, the transport mechanism 222 transports the porous substrate 1 placed on the placement unit 211 into the coating treatment unit 4, and transports the porous substrate 1 after the coating treatment from the coating treatment unit 4 and places it on the placement unit 211. The transport mechanism 222 may transport the porous substrate 1 between the coating treatment unit 4 and the baking treatment unit, and between the baking treatment unit and the placement unit 211. For example, the transport mechanism 222 may transport the porous substrate 1 placed on the placement unit 211 into the coating treatment unit 4, transport the porous substrate 1 after the coating treatment from the coating treatment unit 4 and into the baking treatment unit, and transport the porous substrate 1 after the baking treatment from the baking treatment unit and place it on the placement unit 211.

[0038] <Configuration of Coating Processing Unit> The configuration of a coating processing unit according to one embodiment will be described with reference to Figures 7 to 10. Figures 7 and 8 are partial schematic end views showing the configuration of the coating processing unit 4, Figure 9 is a plan view of the second end face T2 of the porous substrate 1, and Figure 10 is an end view of the porous substrate 1 after coating (an end view corresponding to Figure 4). Note that Figure 7 shows the state before coating processing is performed on the porous substrate 1, and Figure 8 shows the state when coating processing is performed on the porous substrate 1.

[0039] The coating processing unit 4 performs a coating process on the porous substrate 1. In the coating process, the porous substrate 1 is coated with a slurry M, and a slurry layer N is formed on the porous substrate 1 (see FIG. 10). The slurry layer N is dried as necessary and then fired to form a catalyst layer.

[0040] 7 and 8, the coating processing unit 4 includes a chamber C. The coating processing of the porous substrate 1 is performed in the chamber C.

[0041] 7 and 8, the coating processing unit 4 includes a substrate holding unit 41 that holds the porous substrate 1. The coating processing of the porous substrate 1 is performed in a state where the porous substrate 1 is held by the substrate holding unit 41.

[0042] The substrate holding unit 41 has a holding mechanism that holds the porous substrate 1. The substrate holding unit 41 has a chuck mechanism such as a hand chuck, and holds the porous substrate 1 by gripping the center of the cylindrical portion 11 of the porous substrate 1 with the chuck mechanism. The substrate holding unit 41 may be configured to allow the held porous substrate 1 to move in the horizontal and vertical directions, rotate around a vertical axis, rotate around a horizontal axis, etc.

[0043] As shown in Figures 7 and 8, the substrate holding unit 41 holds the porous substrate 1 so that the first end face T1 of the porous substrate 1 faces the nozzle 422 side of the slurry supply unit 42 (upper side in Figures 7 and 8), and the second end face T2 of the porous substrate 1 faces the suction pipe 461 side of the slurry suction unit 46 (lower side in Figures 7 and 8).

[0044] The first end face T1 of the porous substrate 1 is one of the end faces S1 and S2 of the porous substrate 1, and the second end face T2 of the porous substrate 1 is the other of the end faces S1 and S2 of the porous substrate 1. That is, when the slurry M is supplied to the end face S1 of the porous substrate 1 and the supplied slurry M is sucked from the end face S2 side of the porous substrate 1, the end face S1 corresponds to the first end face T1 and the end face S2 corresponds to the second end face T2. When the slurry M is supplied to the end face S2 of the porous substrate 1 and the supplied slurry M is sucked from the end face S1 side of the porous substrate 1, the end face S2 corresponds to the first end face T1 and the end face S1 corresponds to the second end face T2. In this embodiment, the end face S1 corresponds to the first end face T1 and the end face S2 corresponds to the second end face T2.

[0045] As shown in Fig. 9, the second end surface T2 of the porous substrate 1 is divided by a boundary line L2 into an annular (e.g., annular) outer peripheral region T21 located radially outward from the second end surface T2 and a central region T22 located inside the outer peripheral region T21. The boundary line L2 is an imaginary line. Note that the openings of the cells 13b present in the second end surface T2 are omitted in Fig. 9.

[0046] The area of ​​the central region T22 is preferably 40% to 90% of the area of ​​the second end face T2, and more preferably 65% ​​to 85%.

[0047] The shape of the central region T22 and the shape of the second end face T2 are preferably similar to each other. The shape of the central region T22 refers to the shape defined by the outline of the central region T22 (i.e., the boundary line L2), and the shape of the second end face T2 refers to the shape defined by the outline of the second end face T2.

[0048] The outer peripheral region T21 is preferably formed with a predetermined width along the outline of the second end face T2 so that the shape of the central region T22 and the shape of the second end face T2 are similar. As long as the shape of the central region T22 and the shape of the second end face T2 are similar, the width of the outer peripheral region T21 may or may not be constant.

[0049] The porous substrate 1 carried into the coating processing unit 4 by the transport mechanism 222 may be held by the transport mechanism 222 as is. In this case, the transport mechanism 222 functions as the substrate holding unit 41.

[0050] As shown in FIGS. 7 and 8, the coating processing unit 4 includes a slurry supply unit 42 that supplies a slurry M to the first end face T1 side of the porous substrate 1.

[0051] As shown in Figures 7 and 8, the slurry supply section 42 includes a storage tank 421 in which the slurry M is stored, a nozzle 422 that ejects the slurry M toward the first end face T1 of the porous substrate 1, and a supply pipe 423 that supplies the slurry M in the storage tank 421 to the nozzle 422.

[0052] The slurry supply unit 42 supplies the slurry M in the storage tank 421 to the nozzle 422 through the supply pipe 423 and ejects it from the nozzle 422 onto the first end surface T1 of the porous substrate 1, thereby supplying the slurry M to the first end surface T1 of the porous substrate 1.

[0053] The slurry M contains raw materials for the functional layer to be provided on the porous substrate 1 .

[0054] The viscosity of Slurry M was measured using a cone-and-plate viscometer at a temperature of 25 °C and a shear rate of 380 s -1 When measured at a shear rate of 4 s, for example, the viscosity is 100 mPa·s or more and 1000 mPa·s or less. -1 When measured as above, the viscosity is, for example, 1000 mPa·s or more and 10000 mPa·s or less.

[0055] The functional layer is a layer having a predetermined function, and the type of functional layer is appropriately selected depending on the type of structure to be manufactured.

[0056] In this embodiment, the structure to be produced is an exhaust gas purification catalyst or a precursor thereof, and the functional layer is a catalyst layer or a precursor layer thereof. The catalyst layer is formed by drying a slurry layer N as necessary and then calcining it. The precursor layer of the catalyst layer includes the slurry layer N before drying and the slurry layer N after drying. The exhaust gas purification catalyst is a structure including a porous substrate 1 and a catalyst layer provided on the porous substrate 1. The precursor of the exhaust gas purification catalyst includes a structure including a porous substrate 1 and a slurry layer N provided on the porous substrate 1 before drying, and a structure including a porous substrate 1 and a slurry layer N provided on the porous substrate 1 after drying.

[0057] The slurry M contains a catalytically active component and a dispersing medium.

[0058] Examples of catalytically active components include precious metal elements such as Au (gold), Ag (silver), Pt (platinum), Pd (palladium), Rh (rhodium), Ir (iridium), Ru (ruthenium), and Os (osmium). Slurry M contains, for example, the precious metal elements in the form of salts of the precious metal elements, which are supply sources of the precious metal elements. Examples of salts of the precious metal elements include nitrates, ammine complex salts, and chlorides. The content of the precious metal elements in Slurry M can be adjusted as appropriate.

[0059] Examples of the dispersion medium include water and organic solvents. The dispersion medium may be one type of solvent or a mixture of two or more types of solvents. Examples of the organic solvent include alcohol, acetone, dimethyl sulfoxide, and dimethylformamide.

[0060] The slurry M may contain a support that supports a catalytically active component. The catalytically active component is supported on the support by, for example, being physically or chemically adsorbed or held on the outer surface or inner pore surfaces of the support.

[0061] Examples of the carrier include inorganic oxide particles, etc. The inorganic oxide constituting the inorganic oxide particles may be an inorganic oxide having oxygen storage capacity (OSC) (hereinafter referred to as "oxygen storage component"), or may be an inorganic oxide other than the oxygen storage component.

[0062] Examples of oxygen storage components include cerium oxide and composite oxides containing cerium and zirconium (hereinafter referred to as "CeO2-ZrO2-based composite oxides"). The CeO2-ZrO2-based composite oxides may contain metal elements other than cerium and zirconium. Examples of metal elements other than cerium and zirconium include rare earth elements other than cerium, alkaline earth metals, and transition metals.

[0063] Examples of inorganic oxides other than the oxygen storage component include alumina, silica, silica-alumina, alumino-silicate, alumina-zirconia, alumina-chromia, alumina-ceria, alumina-lanthana, and titania.

[0064] The slurry M may contain a stabilizer. Examples of the stabilizer include nitrates, carbonates, oxides, and sulfates of alkaline earth metal elements.

[0065] The slurry M may contain a binder component, such as an inorganic binder such as alumina sol.

[0066] As shown in FIGS. 7 and 8, the coating processing unit 4 includes a nozzle moving mechanism 43 that moves the nozzle 422.

[0067] As shown in FIGS. 7 and 8, the nozzle moving mechanism 43 includes a nozzle holding part 431 that holds the nozzle 422, and an elevation mechanism 432 that raises and lowers the nozzle holding part 431.

[0068] The nozzle moving mechanism 43 lowers the nozzle holding part 431 using the lifting mechanism 432, thereby moving the nozzle 422 closer to the porous substrate 1 and to the slurry supply position shown in Fig. 8. The nozzle moving mechanism 43 also raises the nozzle holding part 431 using the lifting mechanism 432, thereby moving the nozzle 422 away from the porous substrate 1 and to the standby position shown in Fig. 7. At the slurry supply position shown in Fig. 8, the nozzle 422 ejects the slurry M toward the first end surface T1 of the porous substrate 1.

[0069] In this embodiment, the relative position between the porous substrate 1 and the nozzle 422 is changed by moving the nozzle 422 using the nozzle moving mechanism 43, but the relative position between the porous substrate 1 and the nozzle 422 may also be changed by moving the porous substrate 1 using the substrate holding unit 41.

[0070] As shown in FIGS. 7 and 8, the coating processing unit 4 includes a jig 44.

[0071] As shown in FIGS. 7 and 8, the jig 44 has a cylindrical shape such as a cylinder, and the inner diameter of the jig 44 is larger than the outer diameter of the porous substrate 1.

[0072] 7 and 8, the jig 44 is attached to the nozzle holder 431 so as to surround the nozzle 422. Therefore, the jig 44 is moved together with the nozzle 422 by the nozzle moving mechanism 43.

[0073] As shown in Figure 8, when the nozzle 422 is moved to the slurry supply position by the nozzle moving mechanism 43, the end portion of the porous substrate 1 on the first end face T1 side enters the jig 44, and a storage space V1 is formed within the jig 44 to store the slurry M supplied to the first end face T1 side of the porous substrate 1.

[0074] As shown in FIGS. 7 and 8, the coating processing section 4 includes a first substrate fixing section 45.

[0075] As shown in FIGS. 7 and 8 , the first substrate fixing portion 45 is provided at the lower end of the jig 44 and fixes the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44 within the jig 44. The first substrate fixing portion 45 has a chuck mechanism, such as a balloon-type chuck. The balloon of the balloon-type chuck is not inflated so as not to hinder the entry of the end of the porous substrate 1 on the first end face T1 side into the jig 44. However, after the end of the porous substrate 1 on the first end face T1 side has entered the jig 44, the balloon inflates due to air pressure and fixes the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44 within the jig 44. At this time, the balloon of the balloon-type chuck fills the gap between the jig 44 and the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44, preventing leakage of the slurry M from the storage space V1.

[0076] As shown in Figures 7 and 8, the coating processing unit 4 is equipped with a slurry suction unit 46 that sucks the slurry M supplied to the first end face T1 side of the porous substrate 1 from the second end face T2 side of the porous substrate 1 and forms a slurry layer N on the inner wall of the first cell of the porous substrate 1.

[0077] The first cells of the porous substrate 1 are cells that have openings on the first end face T1 of the porous substrate 1. When the end face S1 is the first end face T1, the cells 13a are the first cells and the cells 13b are the second cells. When the end face S2 is the first end face T1, the cells 13b are the first cells and the cells 13a are the second cells. In this embodiment, the cells 13a are the first cells and the cells 13b are the second cells.

[0078] As shown in FIGS. 7 and 8, the slurry suction unit 46 includes a suction pipe 461 and a suction mechanism 462 connected to the lower end of the suction pipe 461 .

[0079] 7 and 8, the suction pipe 461 is cylindrical, for example, and the inner diameter of the suction pipe 461 is larger than the outer diameter of the porous substrate 1. When the suction pipe moving mechanism 47 moves the suction pipe 461 closer to the porous substrate 1 and moves it to the slurry suction position shown in Fig. 8, the end of the porous substrate 1 on the second end face T2 side enters the suction pipe 461, and a suction space V2 is formed inside the suction pipe 461, which allows the slurry M supplied to the first end face T1 side of the porous substrate 1 to be sucked.

[0080] The suction mechanism 462 includes, for example, a pump, and reduces the pressure in the suction space V2 in the suction pipe 461. This generates an airflow from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1, and the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked toward the second end face T2 of the porous substrate 1. Specifically, the slurry M supplied to the first end face T1 of the porous substrate 1 is introduced into the cells 13a and flows along the inner walls of the cells 13a from the first end face T1 to the second end face T2 of the porous substrate 1. As a result, as shown in FIG. 10, a slurry layer N is formed on the inner walls of the cells 13a, extending from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1, without reaching the second end face T2 of the porous substrate 1.

[0081] As shown in FIGS. 7 and 8, the coating processing unit 4 includes a suction pipe moving mechanism 47 that moves the suction pipe 461.

[0082] The suction pipe moving mechanism 47 raises the suction pipe 461 to move it closer to the porous substrate 1, thereby moving the suction pipe 461 to the slurry suction position shown in Fig. 8. The suction pipe moving mechanism 47 also lowers the suction pipe 461 to move it away from the porous substrate 1, thereby moving the suction pipe 461 to the standby position shown in Fig. 7. The suction mechanism 462 reduces the pressure in the suction space V2 inside the suction pipe 461 when the suction pipe 461 is at the slurry suction position shown in Fig. 8.

[0083] In this embodiment, the relative position between the porous substrate 1 and the suction tube 461 is changed by moving the suction tube 461 using the suction tube moving mechanism 47, but the relative position between the porous substrate 1 and the suction tube 461 may also be changed by moving the porous substrate 1 using the substrate holding unit 41.

[0084] As shown in FIGS. 7 and 8, the coating processing section 4 includes a second substrate fixing section 48.

[0085] The second substrate fixing portion 48 is provided at the upper end of the suction tube 461 and fixes the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461 within the suction tube 461. The second substrate fixing portion 48 has a chuck mechanism such as a balloon-type chuck. The balloon of the balloon-type chuck is not inflated so as not to hinder the entry of the end of the porous substrate 1 on the second end face T2 side into the suction tube 461. However, after the end of the porous substrate 1 on the second end face T2 side has entered the suction tube 461, the balloon inflates due to air pressure and fixes the end of the porous substrate 1 on the second end face T2 side within the suction tube 461. At this time, the balloon of the balloon-type chuck fills the gap between the suction tube 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461, sealing the suction space V2. For this reason, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the air outside the suction pipe 461 does not flow along the outer peripheral surface of the porous substrate 1 into the through holes formed in the rectifying member 40 inside the suction pipe 461. For example, in the first embodiment described below, the air outside the suction pipe 461 does not flow along the outer peripheral surface of the porous substrate 1 into the through holes formed in the rectifying plate 49a inside the suction pipe 461 (for example, the first through holes G formed in the first portion 491 of the rectifying plate 49a). Furthermore, in the second embodiment described later, air outside the suction pipe 461 does not flow along the outer peripheral surface of the porous substrate 1 into the through holes formed in the first straightening plate 49b and the second straightening plate 50 within the suction pipe 461 (for example, the first through hole G formed in the first part 491 of the first straightening plate 49b, the second through hole J formed in the second part 492 of the first straightening plate 49b, the through hole formed in the second straightening plate 50, etc.).

[0086] 7 and 8, the coating processing unit 4 includes a rectifying member 40. Note that in FIGS. 7 and 8, the rectifying member 40 is depicted in a simplified form.

[0087] 7 and 8, the flow rectifying member 40 is disposed inside the suction pipe 461. The flow rectifying member 40 is fixed inside the suction pipe 461 so that its position does not change even when the suction space V2 inside the suction pipe 461 is depressurized. The flow rectifying member 40 can be fixed inside the suction pipe 461 by, for example, a holding mechanism or a support mechanism.

[0088] As shown in Figures 7 and 8, the straightening member 40 is arranged between a second substrate fixing portion 48 provided at the upper end of the suction pipe 461 and a suction mechanism 462 connected to the lower end of the suction pipe 461.

[0089] 7 and 8, when the suction pipe 461 is moved to the slurry suction position by the suction pipe moving mechanism 47, the rectifying member 40 is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. That is, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is suctioned from the second end face T2 side of the porous substrate 1, the rectifying member 40 is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0090] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the straightening member 40 covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1 and exposes at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1.

[0091] The phrase "the flow rectifying member 40 covers at least a part of the central region T22 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the flow rectifying member 40 are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8, the part of the flow rectifying member 40 other than the through holes overlaps with at least a part of the central region T22 of the second end face T2 of the porous substrate 1. The flow rectifying member 40 may cover the entire central region T22 of the second end face T2 of the porous substrate 1, or may cover only a part of the central region T22 of the second end face T2 of the porous substrate 1.

[0092] The phrase "the flow rectifying member 40 exposes at least a part of the outer peripheral region T21 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the flow rectifying member 40 are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8, the through holes formed in the flow rectifying member 40 overlap with at least a part of the outer peripheral region T21 of the second end face T2 of the porous substrate 1. The flow rectifying member 40 may expose the entire outer peripheral region T21 of the second end face T2 of the porous substrate 1, or may expose a part of the outer peripheral region T21 of the second end face T2 of the porous substrate 1.

[0093] When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the arrangement of the flow rectifying member 40 on the second end face T2 of the porous substrate 1 provides the following effect: When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer portion of the porous substrate 1 decreases. However, because the flow rectifying member 40 covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, air does not flow easily in the radially inner portion of the porous substrate 1. However, because the flow rectifying member 40 exposes at least a portion of the outer peripheral region T21 of the second end face T2 of the porous substrate 1, air flows easily in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radial inner portion of the porous substrate 1 and the suction force applied to the radial outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radial inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radial outer portion of the porous substrate 1 becomes smaller.

[0094] Hereinafter, an embodiment of the flow regulating member 40 will be described.

[0095] First Embodiment The flow rectifying member 40a according to the first embodiment will be described below with reference to Figures 11 and 12. Figure 11 is an enlarged view of the inside of a suction pipe 461 in which the flow rectifying member 40a is provided, and Figure 12 is a plan view of a flow rectifying plate 49a provided in the flow rectifying member 40a. Note that Figure 11 is an enlarged view of the inside of the suction pipe 461 in the slurry suction position shown in Figure 8.

[0096] In the first embodiment, the flow rectifying member 40 is a flow rectifying member 40a.

[0097] 11, the flow rectifying member 40a includes a flow rectifying plate 49a. The flow rectifying member 40a may be configured with the flow rectifying plate 49a, or may include a member other than the flow rectifying plate 49a as long as the effect of the flow rectifying member 40a, which will be described later, is exhibited.

[0098] The material of the rectifying plate 49a is, for example, resin, ceramic, metal, or the like.

[0099] The thickness of the rectifying plate 49a can be adjusted as appropriate, for example, to between 1 mm and 15 mm, and preferably between 1 mm and 5 mm. The thickness of the rectifying plate 49a may or may not be constant. When the thickness of the rectifying plate 49a is not constant, it is preferable that both the minimum and maximum thicknesses of the rectifying plate 49a be within the above ranges.

[0100] 11, the rectifying plate 49a is disposed inside the suction pipe 461. The rectifying plate 49a is fixed inside the suction pipe 461 so that its position does not change even when the suction space V2 inside the suction pipe 461 is depressurized. The rectifying plate 49a can be fixed inside the suction pipe 461 by, for example, a holding mechanism (for example, a chuck mechanism (for example, a hand chuck) that is provided on the inner wall of the suction pipe 461 and grips the outer edge of the rectifying plate 49a) or by a support mechanism (for example, a support rod that is provided between the rectifying plate 49a and the suction mechanism 462 and supports the surface of the rectifying plate 49a that faces the suction mechanism 462).

[0101] As shown in FIG. 11, the current plate 49a is disposed between the second substrate fixing portion 48 provided at the upper end of the suction pipe 461 and the suction mechanism 462 connected to the lower end of the suction pipe 461.

[0102] 11, when the suction pipe 461 is moved to the slurry suction position by the suction pipe moving mechanism 47, the rectifying plate 49a is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. That is, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the rectifying plate 49a is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0103] 11, when the suction pipe 461 is moved to the slurry suction position by the suction pipe moving mechanism 47, the distance between the rectifying plate 49a and the second end face T2 of the porous substrate 1 becomes a distance D2a. The distance D2a is the distance between the main surface of the rectifying plate 49a on the second end face T2 side and the second end face T2 of the porous substrate 1.

[0104] 11, the main surface of the current plate 49a on the second end face T2 side is substantially parallel to the second end face T2 of the porous substrate 1. In this specification, "substantially parallel" means that the angle between the two surfaces is preferably 0° or more and 10° or less, more preferably 0° or more and 5° or less. Note that "substantially parallel" also includes "parallel."

[0105] As shown in Figures 11 and 12, the straightening plate 49a has an annular (e.g., annular) first portion 491, a second portion 492 located inside the first portion 491, and an annular (e.g., annular) third portion 493 located outside the first portion 491.

[0106] When the second end face T2 of the porous substrate 1 and the straightening plate 49a are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), as shown in Figures 11 and 12, the part of the straightening plate 49a that overlaps with the outer edge region T21 of the second end face T2 of the porous substrate 1 is the first part 491, and the part that overlaps with the central region T22 of the second end face T2 of the porous substrate 1 is the second part 492. In Figure 12, the outline of the second end face T2 projected onto the plan view of the straightening plate 49a and the outline of the central region T22 (i.e., the boundary line L2) are indicated by dotted lines and two-dot chain lines, respectively.

[0107] As shown in FIGS. 11 and 12 , a first portion 491 of the rectifying plate 49a has a first through hole G formed therein, which is elongated and extends in the circumferential direction of the first portion 491. The first through hole G has a long, narrow shape with a width W in a plan view. The shape and number of the first through holes G in a plan view can be changed as appropriate. The shape of the first through hole G in a plan view may be, for example, a circle, an ellipse, a square, a rectangle, or a rectangle with rounded corners. The number of first through holes G may be one, or two or more. In this embodiment, the number of first through holes G is four.

[0108] As shown in FIGS. 11 and 12, no through-hole is formed in the second portion 492 of the current plate 49a, but a through-hole (hereinafter referred to as a "second through-hole") may be formed therein.

[0109] As shown in Figures 11 and 12, the second portion 492 of the straightening plate 49a covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, and the first through hole G formed in the first portion 491 of the straightening plate 49a exposes at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1.

[0110] "The second portion 492 of the straightening plate 49a covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the straightening plate 49a are viewed in a plane from the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), the portion of the second portion 492 of the straightening plate 49a other than the second through hole overlaps with at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, as shown in Figures 11 and 12. When a second through hole is not formed in the second portion 492 of the straightening plate 49a, the second portion 492 of the straightening plate 49a covers the entire central region T22 of the second end face T2 of the porous substrate 1, and when a second through hole is formed in the second portion 492 of the straightening plate 49a, the second portion 492 of the straightening plate 49a covers a portion of the central region T22 of the second end face T2 of the porous substrate 1.

[0111] "The first through hole G formed in the first portion 491 of the straightening plate 49a exposes at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the straightening plate 49a are viewed in a plane from the axial direction X of the porous substrate 1 while the suction pipe 461 is in the slurry suction position shown in Figure 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), the first through hole G formed in the first portion 491 of the straightening plate 49a overlaps with at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1, as shown in Figures 11 and 12.

[0112] When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the arrangement of the rectifying member 40a on the second end face T2 of the porous substrate 1 provides the following effect: When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer portion of the porous substrate 1 decreases. However, because the second portion 492 of the rectifying plate 49a covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, air does not flow easily in the radially inner portion of the porous substrate 1. However, because the first through-holes G formed in the first portion 491 of the rectifying plate 49a expose at least a portion of the outer peripheral region T21 of the second end face T2 of the porous substrate 1, air flows easily in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radial inner portion of the porous substrate 1 and the suction force applied to the radial outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radial inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radial outer portion of the porous substrate 1 becomes smaller.

[0113] Second Embodiment The following describes the flow rectifying member 40b according to the second embodiment with reference to Figures 13 to 15. Figure 13 is an enlarged view of the inside of a suction pipe 461 in which the flow rectifying member 40b is provided, Figure 14 is a plan view of a first flow rectifying plate 49b provided in the flow rectifying member 40b, and Figure 15 is a plan view of a second flow rectifying plate 50 provided in the flow rectifying member 40b. Note that Figure 13 is an enlarged view of the inside of the suction pipe 461 in the slurry suction position shown in Figure 8.

[0114] In the second embodiment, the flow rectifying member 40 is a flow rectifying member 40b.

[0115] 13, the flow rectifying member 40b includes a first flow rectifying plate 49b and a second flow rectifying plate 50. The flow rectifying member 40b may be configured with the first flow rectifying plate 49b and the second flow rectifying plate 50, or may include members other than the first flow rectifying plate 49b and the second flow rectifying plate 50 as long as the effects of the flow rectifying member 40b, which will be described later, are exhibited.

[0116] The first current rectifying plate 49b is made of a material such as resin, ceramics, or metal.

[0117] The thickness of the first current rectifying plate 49b can be adjusted as appropriate, for example, to between 1 mm and 15 mm, and preferably between 1 mm and 5 mm. The thickness of the first current rectifying plate 49b may or may not be constant. When the thickness of the first current rectifying plate 49b is not constant, it is preferable that both the minimum and maximum thicknesses of the first current rectifying plate 49b be within the above ranges.

[0118] 13, the first current rectifying plate 49b is disposed inside the suction pipe 461. The first current rectifying plate 49b is fixed inside the suction pipe 461 so that its position does not change even when the suction space V2 inside the suction pipe 461 is depressurized. The first current rectifying plate 49b can be fixed inside the suction pipe 461 by, for example, a holding mechanism (for example, a chuck mechanism (for example, a hand chuck) provided on the inner wall of the suction pipe 461 that grips the outer edge of the first current rectifying plate 49b) or by a support mechanism (for example, a support rod provided between the first current rectifying plate 49b and the suction mechanism 462 that supports the surface of the first current rectifying plate 49b facing the suction mechanism 462).

[0119] As shown in Figure 13, the first straightening plate 49b is arranged between the second substrate fixing portion 48 provided at the upper end of the suction pipe 461 and the suction mechanism 462 connected to the lower end of the suction pipe 461.

[0120] 13, when the suction pipe 461 is moved to the slurry suction position by the suction pipe moving mechanism 47, the first straightening plate 49b is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. That is, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the first straightening plate 49b is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0121] 13, when the suction pipe 461 is moved to the slurry suction position by the suction pipe moving mechanism 47, the distance between the first current rectifying plate 49b and the second end face T2 of the porous substrate 1 becomes a distance D2b. The distance D2b is the distance between the main surface of the first current rectifying plate 49b on the second end face T2 side and the second end face T2 of the porous substrate 1.

[0122] 13, the main surface of the first current plate 49b on the second end face T2 side is substantially parallel to the second end face T2 of the porous substrate 1. The meaning of "substantially parallel" is as described above.

[0123] 13 and 14, the first current rectifying plate 49b differs from the current rectifying plate 49a according to the first embodiment in that a second through-hole J is formed in the second portion 492. The other configuration of the first current rectifying plate 49b is the same as that of the current rectifying plate 49a, and in the first current rectifying plate 49b, the same members or parts as those in the current rectifying plate 49a are denoted by the same reference numerals as those in the current rectifying plate 49a. The above description of the current rectifying plate 49a also applies to the first current rectifying plate 49b, unless otherwise specified.

[0124] 14, the shape of the second through hole J in a plan view is circular, and the number of second through holes J is one. The shape of the second through hole J in a plan view can be changed as appropriate and may be other shapes, such as an ellipse, a square, a rectangle, or a rectangle with rounded corners. The number of second through holes J can be changed as appropriate and may be two or more. As shown in FIG. 14, the second through hole J is not continuous with the first through hole G formed in the first portion 491, but it may be continuous with it.

[0125] In order to further improve the effect of the flow rectifying member 40b described below, it is preferable that the shape of the central region T22 and the shape of the second through-hole J in a plan view are similar to each other.

[0126] As shown in FIGS. 13 and 14, the second through-holes J expose at least a part of the central region T22 of the second end face T2 of the porous substrate 1.

[0127] "The second through hole J exposes at least a part of the central region T22 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the first straightening plate 49b are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the first straightening plate 49b), as shown in Figures 13 and 14, the second through hole J overlaps with at least a part of the central region T22 of the second end face T2 of the porous substrate 1. In Figure 14, the outline of the second end face T2 projected onto the plan view of the first straightening plate 49b and the outline of the central region T22 (i.e., the boundary line L2) are indicated by dotted lines and two-dot chain lines, respectively.

[0128] The second through holes J may expose the entire central region T22 of the second end face T2 of the porous substrate 1, or may expose a portion of the central region T22 of the second end face T2 of the porous substrate 1. When the second through holes J expose a portion of the central region T22 of the second end face T2 of the porous substrate 1, the second portion 492 of the first current plate 49b covers the remainder of the central region T22 of the second end face T2 of the porous substrate 1.

[0129] "The second through hole J exposes a portion of the central region T22 of the second end face T2 of the porous substrate 1, and the second portion 492 of the first current straightening plate 49b covers the remainder of the central region T22 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the first current straightening plate 49b are viewed in a plane from the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the first current straightening plate 49b), as shown in Figures 13 and 14, the second through hole J overlaps with a portion of the central region T22 of the second end face T2 of the porous substrate 1, and the portion of the second portion 492 of the first current straightening plate 49b other than the second through hole J overlaps with the remainder of the central region T22 of the second end face T2 of the porous substrate 1.

[0130] When the second through holes J expose a part of the central region T22 and the second portion 492 of the first current rectifying vane 49b covers the remainder of the central region T22, it is preferable that the portion of the second portion 492 of the first current rectifying vane 49b other than the second through holes J be formed with a predetermined width along the outline of the second portion 492 so that the shape of the central region T22 in a plan view and the shape of the second through holes J are similar to each other. That is, it is preferable that the shape of the portion of the second portion 492 of the first current rectifying vane 49b other than the second through holes J be annular (for example, circular). As long as the shape of the central region T22 in a plan view and the shape of the second through holes J in a plan view are similar to each other, the width of the portion of the second portion 492 of the first current rectifying vane 49b other than the second through holes J may or may not be constant.

[0131] The second current plate 50 is made of a material such as resin, ceramic, or metal.

[0132] The thickness of the second current plate 50 can be adjusted as appropriate, for example, from 1 mm to 15 mm, preferably from 1 mm to 5 mm. The thickness of the second current plate 50 may or may not be constant. When the thickness of the second current plate 50 is not constant, it is preferable that both the minimum and maximum thicknesses of the second current plate 50 are within the above ranges.

[0133] 13, the second current rectifying plate 50 is disposed in the suction pipe 461. The second current rectifying plate 50 is fixed in the suction pipe 461 so that its position does not change even when the suction space V2 in the suction pipe 461 is depressurized. The second current rectifying plate 50 can be fixed in the suction pipe 461 by, for example, a connecting member that connects the first current rectifying plate 49b and the second current rectifying plate 50 (for example, a connecting member 70 (see FIG. 13) that connects the third portion 493 of the first current rectifying plate 49b and the second current rectifying plate 50), by a holding mechanism (for example, a chuck mechanism (for example, a hand chuck, etc.) that is provided on the inner wall of the suction pipe 461 and that grips the outer edge of the second current rectifying plate 50), or by a support mechanism (for example, a support rod that is provided between the second current rectifying plate 50 and the suction mechanism 462 and that supports the surface of the second current rectifying plate 50 facing the suction mechanism 462). In FIG. 14, the connecting member 70 is omitted.

[0134] When the flow straightening member 40b is viewed from above in the axial direction X of the porous substrate 1, the connecting member 70 overlaps with a portion of the first through hole G formed in the first portion 491 of the first flow straightening plate 49b. The area of ​​the portion of the first through hole G overlapping with the connecting member 70 is preferably 20% or less of the area of ​​the first through hole G, more preferably 10% or less, and even more preferably 5% or less. In this case, the connecting member 70 does not obstruct the flow of air passing through the first through hole G, thereby further improving the effect of the flow straightening member 40b described below. The lower limit of the area of ​​the portion of the first through hole G overlapping with the connecting member 70 can be appropriately adjusted taking into account the strength of the connecting member 70, etc. Note that, when two or more first through holes G are formed in the first portion 491 of the first flow straightening plate 49b, the "area of ​​the first through hole G" means the total area of ​​the two or more first through holes G. Moreover, the "area of ​​the first through hole G" is the area of ​​the first through hole G when viewed from above in the axial direction X of the porous substrate 1.

[0135] 13, the second current rectifying plate 50 is disposed between the first current rectifying plate 49b and the suction mechanism 462 connected to the lower end of the suction pipe 461. That is, the second current rectifying plate 50 is disposed on the opposite side of the first current rectifying plate 49b from the second end face T2 of the porous substrate 1. This positional relationship remains unchanged whether the suction pipe 461 is in the slurry suction position or the standby position. Therefore, when the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the second current rectifying plate 50 is disposed on the opposite side of the first current rectifying plate 49b from the second end face T2 of the porous substrate 1.

[0136] 13, the distance between the first current rectifying plate 49b and the second current rectifying plate 50 is distance D3. Distance D3 is the distance between the main surface of the first current rectifying plate 49b facing the second current rectifying plate 50 and the main surface of the second current rectifying plate 50 facing the first current rectifying plate 49b. Distance D3 remains unchanged whether the suction pipe 461 is in the slurry suction position or in the standby position. Therefore, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the distance between the first current rectifying plate 49b and the second current rectifying plate 50 is distance D3.

[0137] 13, the main surface of the second flow straightening plate 50 on the second end face T2 side is substantially parallel to the second end face T2 of the porous substrate 1. The meaning of "substantially parallel" is as described above.

[0138] As shown in FIG. 15, the second current plate 50 does not have any through-holes formed therein, but may have through-holes formed therein.

[0139] As shown in FIGS. 13 to 15, the second current plate 50 covers at least a part of the second through-hole J.

[0140] The phrase "the second current rectifying plate 50 covers at least a portion of the second through-hole J" means that when the first current rectifying plate 49b and the second current rectifying plate 50 are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in FIG. 8 (for example, when the second current rectifying plate 50 is projected onto the plan view of the first current rectifying plate 49b, or when the second through-hole J is projected onto the plan view of the second current rectifying plate 50), as shown in FIGS. 13 to 15, portions of the second current rectifying plate 50 other than the through-holes overlap with at least a portion of the second through-hole J. Note that in FIG. 14, the outline of the second current rectifying plate 50 projected onto the plan view of the first current rectifying plate 49b is indicated by a dotted line. Furthermore, in FIG. 15, the outline of the second through-hole J projected onto the plan view of the second current rectifying plate 50 is indicated by a dotted line.

[0141] When no through hole is formed in the second rectifying plate 50, the second rectifying plate 50 covers the entire second through hole J, and when a through hole is formed in the second rectifying plate 50, the second rectifying plate 50 covers only a portion of the second through hole J.

[0142] When the first current rectifying plate 49b and the second current rectifying plate 50 are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second current rectifying plate 50 is projected onto the plan view of the first current rectifying plate 49b), as shown in Figures 13 and 14, the outline of the second current rectifying plate 50 is preferably located outside the outline of the second through-hole J. When the outline of the second current rectifying plate 50 is located outside the outline of the second through-hole J, by adjusting the opening area of ​​the second current rectifying plate 50, it is possible to cover the entire second through-hole J with the second current rectifying plate 50 or to cover only a portion of the second through-hole J with the second current rectifying plate 50.

[0143] When the first current rectifying plate 49b and the second current rectifying plate 50 are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in Figure 8 (for example, when the second current rectifying plate 50 is projected onto the plan view of the first current rectifying plate 49b), it is preferable that the outline of the second current rectifying plate 50 is located inside the outline of the second portion 492 of the first current rectifying plate 49b, as shown in Figures 13 and 14. In this case, the second current rectifying plate 50 does not obstruct the flow of air passing through the first through holes G, thereby further improving the effect of the current rectifying member 40b, which will be described later.

[0144] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the following effect is achieved by disposing the flow straightening member 40b on the second end face T2 side of the porous substrate 1: When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer part of the porous substrate 1 is reduced. However, the second through holes J formed in the first flow straightening plate 49b expose at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, and the second flow straightening plate 50 covers at least a portion of the second through holes J formed in the first flow straightening plate 49b, making it difficult for air to flow in the radially inner portion of the porous substrate 1. On the other hand, the first through holes G formed in the first flow straightening plate 49b expose at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1, making it easy for air to flow in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radially inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radially outer portion of the porous substrate 1 becomes smaller.

[0145] Furthermore, when the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked through the second end face T2 of the porous substrate 1, the following effect is achieved by arranging the rectifying member 40b on the second end face T2 of the porous substrate 1. When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked through the second end face T2 of the porous substrate 1, if the rectifying plate 49a is arranged on the second end face T2 of the porous substrate 1, turbulence may occur between the second portion 492 of the rectifying plate 49a and the second end face T2 of the porous substrate 1, causing variations in length between the slurry layers N (particularly variations in length between the slurry layers N formed in the radially inner portion of the porous substrate 1). Hereinafter, the distance between the rectifying plate 49a and the second end face T2 of the porous substrate 1 that causes turbulence is defined as Dx. In contrast, in the flow straightening member 49b, the second through holes J are formed in the second portion 492 of the first flow straightening plate 49b, and therefore, even if the distance between the first flow straightening plate 49b and the second end face T2 of the porous substrate 1 is Dx, turbulence is unlikely to occur between the second portion 492 of the first flow straightening plate 49b and the second end face T2 of the porous substrate 1. Furthermore, in the flow straightening member 49b, the second flow straightening plate 50 is disposed on the opposite side of the first flow straightening plate 49b from the second end face T2 of the porous substrate 1. Therefore, even if the distance between the first flow straightening plate 49b and the second end face T2 of the porous substrate 1 is Dx, the distance between the second flow straightening plate 50 and the second end face T2 of the porous substrate 1 is larger than Dx, and therefore turbulence is unlikely to occur between the second flow straightening plate 50 and the second end face T2 of the porous substrate 1. Therefore, when the first straightening plate 49b and the second straightening plate 50 are used, the occurrence of variation in length between the slurry layers N (particularly, variation in length between the slurry layers N formed in the radially inner portion of the porous substrate 1) can be prevented more effectively than when the straightening plate 49a is used.

[0146] ≪Structure manufacturing method≫ Hereinafter, an embodiment of the method for manufacturing a structure of the present invention will be described.

[0147] The method for manufacturing a structure of the present invention includes the following steps: (a) supplying a slurry M containing raw materials for the functional layer to the first end surface T1 side of the porous substrate 1; and (b) A step of sucking the slurry M supplied to the first end face T1 side of the porous substrate 1 from the second end face T2 side of the porous substrate 1 to form a slurry layer N on the inner wall of the first cell of the porous substrate 1, the slurry layer N extending from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1 but not reaching the second end face T2 of the porous substrate 1. Includes.

[0148] The structure manufacturing method of the present invention can be carried out by a structure manufacturing apparatus 100. When the structure manufacturing method of the present invention is carried out by the structure manufacturing apparatus 100, steps (a) and (b) are carried out by a coating processing unit 4. At this time, the operation of the coating processing unit 4 is controlled by a control unit 3.

[0149] The following describes an embodiment of the structure manufacturing method performed by the structure manufacturing apparatus 100. In this embodiment, the end face S1 is the first end face T1, the end face S2 is the second end face T2, the cell 13a is the first cell, and the cell 13b is the second cell.

[0150] First, a substrate carrying-in step is performed. In the substrate carrying-in step, the porous substrate 1 is carried into the coating processing unit 4. The control unit 3 controls the operation of the transport mechanism 222 to carry the porous substrate 1 placed on the placement unit 211 into the coating processing unit 4.

[0151] After the substrate carrying-in step, a substrate holding step is performed. In the substrate holding step, the porous substrate 1 carried into the coating processing unit 4 is held by the substrate holding unit 41. The porous substrate 1 carried into the coating processing unit 4 by the transport mechanism 222 may be held by the transport mechanism 222 as is. In this case, the transport mechanism 222 functions as the substrate holding unit 41.

[0152] After the substrate holding step, a nozzle moving step and a suction tube moving step are performed. The order of the nozzle moving step and the suction tube moving step is not particularly limited. The nozzle moving step may be performed after the suction tube moving step, or the nozzle moving step may be performed after the suction tube moving step, or the nozzle moving step and the suction tube moving step may be performed simultaneously.

[0153] In the nozzle moving step, the nozzle moving mechanism 43 moves the nozzle 422 from the standby position shown in FIG. 7 to the slurry supply position shown in FIG.

[0154] The control unit 3 controls the operation of the nozzle moving mechanism 43, and controls the timing at which the nozzle 422 moves from the standby position to the slurry supply position, and the timing at which the nozzle 422 moves from the slurry supply position to the standby position.

[0155] When the nozzle 422 moves to the slurry supply position, the end of the porous substrate 1 on the first end face T1 side enters the jig 44, and a storage space V1 is formed within the jig 44 to store the slurry M supplied to the first end face T1 side of the porous substrate 1.

[0156] The end of the porous substrate 1 on the first end face T1 side that has entered the jig 44 is fixed in the jig 44 by the first substrate fixing unit 45. The first substrate fixing unit 45 has a chuck mechanism such as a balloon-type chuck. The control unit 3 controls the operation of the first substrate fixing unit 45 to control the timing of fixing the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44 in the jig 44, the timing of releasing the fixation, etc. Specifically, the control unit 3 controls the operation of the first substrate fixing unit 45 so that when the end of the porous substrate 1 on the first end face T1 side enters the jig 44, the balloon of the balloon-type chuck is not inflated, and after the end of the porous substrate 1 on the first end face T1 side has entered the jig 44, the balloon of the balloon-type chuck is inflated by air pressure, thereby fixing the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44 in the jig 44. At this time, the balloon of the balloon-type chuck fills the gap between the jig 44 and the end of the porous substrate 1 on the first end face T1 side that has entered the jig 44, preventing leakage of the slurry M from the storage space V1.

[0157] In this embodiment, the nozzle moving mechanism 43 moves the nozzle 422 to change the relative position between the porous substrate 1 and the nozzle 422, but the substrate holding unit 41 may also move the porous substrate 1 to change the relative position between the porous substrate 1 and the nozzle 422.

[0158] In the suction pipe moving step, the suction pipe moving mechanism 47 moves the suction pipe 461 from the standby position shown in FIG. 7 to the slurry suction position shown in FIG.

[0159] The control unit 3 controls the operation of the suction pipe moving mechanism 47, and controls the timing of moving the suction pipe 461 from the standby position to the slurry suction position, and the timing of moving the suction pipe 461 from the slurry suction position to the standby position.

[0160] When the suction pipe 461 moves to the slurry suction position, the end of the porous substrate 1 on the second end face T2 side enters the suction pipe 461, and a suction space V2 is formed within the suction pipe 461, which enables the suction of the slurry M supplied to the first end face T1 side of the porous substrate 1.

[0161] The end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461 is fixed in the suction tube 461 by the second substrate fixing unit 48. The second substrate fixing unit 48 has a chuck mechanism such as a balloon-type chuck. The control unit 3 controls the operation of the second substrate fixing unit 48 to control the timing of fixing the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461 in the suction tube 461, the timing of releasing the fixation, etc. Specifically, the control unit 3 controls the operation of the second substrate fixing unit 48 so that when the end of the porous substrate 1 on the second end face T2 side enters the suction tube 461, the balloon of the balloon-type chuck is not inflated, and after the end of the porous substrate 1 on the second end face T2 side has entered the suction tube 461, the balloon of the balloon-type chuck is inflated by air pressure, thereby fixing the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461 in the suction tube 461. At this time, the balloon of the balloon chuck fills the gap between the suction pipe 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction pipe 461, sealing the suction space V2. Therefore, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, it does not flow into the rectifying member 40 inside the suction pipe 461. For example, in the first embodiment, air outside the suction pipe 461 does not flow along the outer peripheral surface of the porous substrate 1 into the through-holes formed in the rectifying plate 49a inside the suction pipe 461 (for example, the first through-hole G formed in the first portion 491 of the rectifying plate 49a). Furthermore, in the second embodiment, air outside the suction pipe 461 does not flow along the outer peripheral surface of the porous substrate 1 into the through holes formed in the first straightening plate 49b and the second straightening plate 50 within the suction pipe 461 (for example, the first through hole G formed in the first part 491 of the first straightening plate 49b, the second through hole J formed in the second part 492 of the first straightening plate 49b, the through hole formed in the second straightening plate 50, etc.).

[0162] In this embodiment, the suction tube moving mechanism 47 moves the suction tube 461 to change the relative position between the porous substrate 1 and the suction tube 461, but the relative position between the porous substrate 1 and the suction tube 461 may also be changed by moving the porous substrate 1 using the substrate holding unit 41.

[0163] After the nozzle moving step and the suction tube moving step, step (a) is carried out.

[0164] In the step (a), the slurry supply unit 42 supplies the slurry M to the first end face T1 of the porous substrate 1. The slurry M supplied to the first end face T1 side of the porous substrate 1 is stored in the storage space V1.

[0165] The control unit 3 controls the operation of the slurry supply unit 42, and controls the timing to start supplying the slurry M, the supply amount of the slurry M, the timing to stop supplying the slurry M, and the like.

[0166] After step (a), step (b) is carried out.

[0167] In step (b), the slurry suction unit 46 sucks the slurry M supplied to the first end face T1 of the porous substrate 1 from the second end face T2 of the porous substrate 1, forming a slurry layer N on the inner wall of the first cell of the porous substrate 1. Specifically, the suction mechanism 462 depressurizes the suction space V2 in the suction pipe 461. This generates an airflow from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1, and the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked toward the second end face T2 of the porous substrate 1, introduced into the first cell, and flows along the inner wall of the first cell from the first end face T1 to the second end face T2 of the porous substrate 1. As a result, as shown in FIG. 10, a slurry layer N is formed on the inner wall of the first cell, extending from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1.

[0168] As shown in FIG. 10 , the slurry layer N is formed on the surface of the partition wall portion 12 on the cell 13a side. The slurry layer N has a portion that protrudes from the surface of the partition wall portion 12 toward the cell 13a side. The slurry layer N may be composed of only the portion that protrudes from the surface of the partition wall portion 12 toward the cell 13a side, or may have the portion protruding from the surface of the partition wall portion 12 toward the cell 13a side and a portion that exists inside the partition wall portion 12. Because the partition wall portion 12 is porous, the slurry layer N usually has a portion that exists inside the partition wall portion 12. The slurry layer N may be composed of only the portion that exists inside the partition wall portion 12.

[0169] 10, the slurry layer N does not reach the second end surface T2 of the porous substrate 1. That is, the length PN of the slurry layer N is smaller than the length P1 of the porous substrate 1. The length PN of the slurry layer N is preferably 10% or more and 90% or less, more preferably 20% or more and 80% or less, of the length P1 of the porous substrate 1. When the length PN of the slurry layer N is within the above range, the porous substrate 1 is easily coated with the slurry uniformly.

[0170] The control unit 3 controls the operation of the slurry suction unit 46 so that the slurry layer N does not reach the second end face T2 of the porous substrate 1, and adjusts the timing to start depressurizing the suction space V2 in the suction pipe 461, the degree of depressurization, the timing to stop depressurization, etc.

[0171] The slurry layer N is dried as necessary and then fired, whereby a catalyst layer extending from the first end face T1 of the porous substrate 1 toward the second end face T2 of the porous substrate 1 so as not to reach the second end face T2 of the porous substrate 1 is formed on the surface of the cell 13a side of the partition wall portion 12. The catalyst layer has a portion that protrudes from the surface of the partition wall portion 12 toward the cell 13a side. The catalyst layer may be composed of only the portion that protrudes from the surface of the partition wall portion 12 toward the cell 13a side, or may have the portion protruding from the surface of the partition wall portion 12 toward the cell 13a side and a portion that is present inside the partition wall portion 12. Because the partition wall portion 12 is porous, the catalyst layer usually has a portion that is present inside the partition wall portion 12. The catalyst layer may be composed of only the portion that is present inside the partition wall portion 12.

[0172] When the suction pipe 461 moves to the slurry suction position, the rectifying member 40 is located on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. That is, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is suctioned from the second end face T2 side of the porous substrate 1, the rectifying member 40 is located on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0173] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the straightening member 40 covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1 and exposes at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1.

[0174] When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the arrangement of the flow rectifying member 40 on the second end face T2 of the porous substrate 1 provides the following effect: When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer portion of the porous substrate 1 decreases. However, because the flow rectifying member 40 covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, air does not flow easily in the radially inner portion of the porous substrate 1. However, because the flow rectifying member 40 exposes at least a portion of the outer peripheral region T21 of the second end face T2 of the porous substrate 1, air flows easily in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radial inner portion of the porous substrate 1 and the suction force applied to the radial outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radial inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radial outer portion of the porous substrate 1 becomes smaller.

[0175] Hereinafter, a case where the rectifying member 40a according to the first embodiment is used as the rectifying member 40 will be described.

[0176] When the suction pipe 461 moves to the slurry suction position, the rectifying plate 49a is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. Therefore, in step (b), when the slurry M supplied to the first end face T1 side of the porous substrate 1 is suctioned from the second end face T2 side of the porous substrate 1, the rectifying plate 49a is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0177] When the suction pipe 461 moves to the slurry suction position, the distance between the current plate 49a and the second end surface T2 of the porous substrate 1 becomes a distance D2a.

[0178] In step (b), when the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the rectifying plate 49a covers at least a part of the central region T22 of the second end face T2 of the porous substrate 1 and exposes at least a part of the outer peripheral region T21. Specifically, the second portion 492 of the rectifying plate 49a covers at least a part of the central region T22 of the second end face T2 of the porous substrate 1, and the first through-holes G formed in the first portion 491 of the rectifying plate 49a expose at least a part of the outer peripheral region T21 of the second end face T2 of the porous substrate 1.

[0179] When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the arrangement of the rectifying member 40a on the second end face T2 of the porous substrate 1 provides the following effect: When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer portion of the porous substrate 1 decreases. However, because the second portion 492 of the rectifying plate 49a covers at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, air does not flow easily in the radially inner portion of the porous substrate 1. However, because the first through-holes G formed in the first portion 491 of the rectifying plate 49a expose at least a portion of the outer peripheral region T21 of the second end face T2 of the porous substrate 1, air flows easily in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radial inner portion of the porous substrate 1 and the suction force applied to the radial outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radial inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radial outer portion of the porous substrate 1 becomes smaller.

[0180] Hereinafter, a case where the rectifying member 40b according to the second embodiment is used as the rectifying member 40 will be described.

[0181] When the suction pipe 461 moves to the slurry suction position, the first rectifying plate 49b is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1. That is, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is suctioned from the second end face T2 side of the porous substrate 1, the first rectifying plate 49b is positioned on the second end face T2 side of the porous substrate 1 and spaced apart from the second end face T2 of the porous substrate 1.

[0182] When the suction pipe 461 moves to the slurry suction position, the distance between the first current plate 49b and the second end face T2 of the porous substrate 1 becomes a distance D2b.

[0183] The second current rectifying plate 50 is disposed on the opposite side of the first current rectifying plate 49b from the second end face T2 of the porous substrate 1. This positional relationship remains unchanged whether the suction pipe 461 is in the slurry suction position or the standby position. Therefore, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the second current rectifying plate 50 is disposed on the opposite side of the first current rectifying plate 49b from the second end face T2 of the porous substrate 1.

[0184] The distance between the first current rectifying plate 49b and the second current rectifying plate 50 is distance D3. Distance D3 remains unchanged whether the suction pipe 461 is in the slurry suction position or in the standby position. Therefore, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the distance between the first current rectifying plate 49b and the second current rectifying plate 50 is distance D3.

[0185] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the following effect is achieved by disposing the flow straightening member 40b on the second end face T2 side of the porous substrate 1: When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, air flows in from the outer peripheral surface of the tubular portion 11 of the porous substrate 1, and the suction force in the radially outer part of the porous substrate 1 is reduced. However, the second through holes J formed in the first flow straightening plate 49b expose at least a portion of the central region T22 of the second end face T2 of the porous substrate 1, and the second flow straightening plate 50 covers at least a portion of the second through holes J formed in the first flow straightening plate 49b, making it difficult for air to flow in the radially inner portion of the porous substrate 1. On the other hand, the first through holes G formed in the first flow straightening plate 49b expose at least a portion of the outer edge region T21 of the second end face T2 of the porous substrate 1, making it easy for air to flow in the radially outer portion of the porous substrate 1. Therefore, the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1 becomes smaller, and the difference between the length of the slurry layer N formed in the radially inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radially outer portion of the porous substrate 1 becomes smaller.

[0186] Furthermore, when the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked through the second end face T2 of the porous substrate 1, the following effect is achieved by arranging the rectifying member 40b on the second end face T2 of the porous substrate 1. When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked through the second end face T2 of the porous substrate 1, if the rectifying plate 49a is arranged on the second end face T2 of the porous substrate 1, turbulence may occur between the second portion 492 of the rectifying plate 49a and the second end face T2 of the porous substrate 1, causing variations in length between the slurry layers N (particularly variations in length between the slurry layers N formed in the radially inner portion of the porous substrate 1). Hereinafter, the distance between the rectifying plate 49a and the second end face T2 of the porous substrate 1 that causes turbulence is defined as Dx. In contrast, in the flow straightening member 49b, the second through holes J are formed in the second portion 492 of the first flow straightening plate 49b, and therefore, even if the distance between the first flow straightening plate 49b and the second end face T2 of the porous substrate 1 is Dx, turbulence is unlikely to occur between the second portion 492 of the first flow straightening plate 49b and the second end face T2 of the porous substrate 1. Furthermore, in the flow straightening member 49b, the second flow straightening plate 50 is disposed on the opposite side of the first flow straightening plate 49b from the second end face T2 of the porous substrate 1. Therefore, even if the distance between the first flow straightening plate 49b and the second end face T2 of the porous substrate 1 is Dx, the distance between the second flow straightening plate 50 and the second end face T2 of the porous substrate 1 is larger than Dx, and therefore turbulence is unlikely to occur between the second flow straightening plate 50 and the second end face T2 of the porous substrate 1. Therefore, when the first straightening plate 49b and the second straightening plate 50 are used, the occurrence of variation in length between the slurry layers N (particularly, variation in length between the slurry layers N formed in the radially inner portion of the porous substrate 1) can be prevented more effectively than when the straightening plate 49a is used.

[0187] In any embodiment, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the air flow velocity in the radially inner part of the porous substrate 1 on the first end face T1 side is preferably 1 m / s or more and 10 m / s or less, more preferably 2 m / s or more and 5 m / s or less.

[0188] In any embodiment, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the air flow velocity in the radially outer portion of the porous substrate 1 on the first end face T1 side is preferably 1 m / s or more and 30 m / s or less, more preferably 5 m / s or more and 15 m / s or less.

[0189] After step (b), the porous substrate 1 on which the slurry layer N is formed may be dried and then fired, if necessary. As a result, the slurry layer N becomes a catalyst layer. The drying temperature is, for example, 70°C or higher and 150°C or lower, the drying time is, for example, 0.2 hours or higher and 3 hours or lower, the firing temperature is, for example, 400°C or higher and 900°C or lower, and the firing time is, for example, 1 hour or higher and 10 hours or lower. The firing can be carried out in an air atmosphere.

[0190] After the nozzle moving step, step (a) may be performed without performing the suction tube moving step. In this case, the suction tube moving step is performed during or after step (a), and step (b) is performed after step (a) and the suction tube moving step.

[0191] Preferred embodiments of the structure manufacturing apparatus and method of the present invention will be described below. When two or more preferred embodiments can be combined, such combinations are also encompassed by the present invention.

[0192] When no second through-holes are formed in the second portion 492 of the rectifying vane 49a, from the viewpoint of further improving the above-described effect of the rectifying member 40a, the area of ​​at least a portion of the central region T22 covered by the second portion 492 of the rectifying vane 49a is preferably 50% or more of the area of ​​the central region T22, more preferably 60% or more, even more preferably 70% or more, still more preferably 80% or more, still more preferably 90% or more, and still more preferably 95% or more, with the upper limit being 100%.

[0193] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, it is preferable that a second through hole be formed in the second part 492 of the straightening plate 49a in order to prevent turbulence from occurring between the second part 492 of the straightening plate 49a and the second end face T2 of the porous substrate 1, and thus to prevent variations in length between the slurry layers N (particularly variations in length between the slurry layers N formed in the radially inner part of the porous substrate 1).

[0194] FIG. 16 shows an embodiment in which second through holes are formed in the second portion 492 of the rectifying vane 49a. In the embodiment shown in FIG. 16, a large number of round second through holes Q are formed in the second portion 492 of the rectifying vane 49a. The planar shape of the second through holes Q can be changed as appropriate, and examples of the planar shape of the second through holes Q include a circle, an ellipse, a square, a rectangle, and a rectangle with rounded corners. The number of second through holes Q can be changed as appropriate, and the number of second through holes Q may be one, two, or more. The second through holes Q formed in the second portion 492 of the rectifying vane 49a may be continuous with the first through holes G formed in the first portion 491 of the rectifying vane 49a. The diameter of the second through holes Q is, for example, 1 mm or more and 5 mm or less. The diameter of the second through hole Q means the diameter of the circle if the second through hole Q is circular, and means the diameter of the circle circumscribing the shape if the second through hole Q is other than circular.

[0195] When the second through holes Q are formed in the second portion 492 of the straightening plate 49a, the second through holes Q expose a portion of the central region T22 of the second end face T2 of the porous substrate 1. "The second through holes Q expose a portion of the central region T22 of the second end face T2 of the porous substrate 1" means that when the second end face T2 of the porous substrate 1 and the straightening plate 49a are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in FIG. 8 (for example, when the second end face T2 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), as shown in FIG. 16, the second through holes Q overlap with a portion of the central region T22 of the second end face T2 of the porous substrate 1. Note that in FIG. 16, the outline of the second end face T2 and the outline of the central region T22 (i.e., the boundary line L2) projected onto the plan view of the straightening plate 49a are indicated by a dotted line and a two-dot chain line, respectively.

[0196] When the slurry M supplied to the first end face T1 of the porous substrate 1 is sucked from the second end face T2 of the porous substrate 1, the occurrence of turbulence is effectively prevented, and consequently, variations in length among the slurry layers N (particularly variations in length among the slurry layers N formed in the radially inner portion of the porous substrate 1) are effectively prevented. From this viewpoint, the area of ​​the portion of the central region T22 exposed by the second through holes Q is preferably 10% to 50% of the area of ​​the central region T22, and more preferably 20% to 40%. Note that, when two or more second through holes Q are formed in the second portion 492 of the straightening plate 49a, the "area of ​​the portion of the central region T22 exposed by the second through holes Q" refers to the total area of ​​the portions of the central region T22 exposed by the two or more second through holes Q.

[0197] From the viewpoint of further improving the above-described effect of the rectifying member 40a or 40b, the area of ​​at least a portion of the outer edge region T21 exposed by the first through holes G formed in the first portion 491 of the rectifying vane 49a is preferably 50% or more of the area of ​​the outer edge region T21, more preferably 60% or more, even more preferably 70% or more, even more preferably 80% or more, even more preferably 90% or more, and even more preferably 95% or more. The upper limit is 100%. When two or more first through holes G are formed in the first portion 491 of the rectifying vane 49a or 49b, "the area of ​​at least a portion of the outer edge region T21 exposed by the first through holes G" refers to the total area of ​​the portions of the outer edge region T21 exposed by the two or more first through holes G.

[0198] If the area of ​​at least a portion of the outer edge region T21 exposed by the first through hole G formed in the first part 491 of the straightening plate 49a or 49b is 100% of the area of ​​the outer edge region T21, the second part 492 and the third part 493 will be separated, but this will not cause any problems. When the second part 492 and the third part 493 are separated, the second part 492 can be fixed within the suction tube 461, for example, by a support mechanism (for example, a support rod provided between the second part 492 and the suction mechanism 462 to support the surface of the second part 492 facing the suction mechanism 462), and the third part 493 can be fixed within the suction tube 461, for example, by a holding mechanism (for example, a chuck mechanism (e.g., a hand chuck, etc.) provided on the inner wall of the suction tube 461 to grip the outer edge of the third part 493) or a support mechanism (for example, a support rod provided between the third part 493 and the suction mechanism 462 to support the surface of the third part 493 facing the suction mechanism 462). When the area of ​​at least a portion of the outer edge region T21 exposed by the first through hole G formed in the first portion 491 of the straightening plate 49a or 49b is 100% of the area of ​​the outer edge region T21, the straightening plate 49a or 49b may be composed of only the second portion 492.

[0199] When a second through hole Q is formed in the second portion 492 of the straightening plate 49a, from the viewpoint of further improving the above-mentioned effect of the straightening member 40a, it is preferable that the area ratio of a portion of the central region T22 exposed by the second through hole Q (area of ​​a portion of the central region T22 exposed by the second through hole Q / area of ​​the central region T22) is smaller than the area ratio of at least a portion of the outer edge region T21 exposed by the first through hole G formed in the first portion 491 of the straightening plate 49a (area of ​​at least a portion of the outer edge region T21 exposed by the first through hole G formed in the first portion 491 of the straightening plate 49a / area of ​​the outer edge region T21).

[0200] From the viewpoint of further improving the above-described effect of the rectifying member 40a or 40b, when the suction pipe 461 is in the slurry suction position, the distance D2a or D2b between the rectifying plate 49a or 49b and the second end face T2 of the porous substrate 1 is preferably 5 mm or more and 30 mm or less, and more preferably 5 mm or more and 15 mm or less. When the distance D2a or D2b is not constant, it is preferable that both the minimum value and the maximum value of the distance D2a or D2b are within the above range.

[0201] From the viewpoint of further improving the above-described effects of the rectifying member 40b, the area of ​​at least a portion of the central region T22 exposed by the second through holes J is preferably 50% or more, more preferably 60% or more, of the area of ​​the central region T22. The upper limit is 100%. Considering the ease of forming the second through holes J and the strength of the first rectifying plate 49b, the area of ​​at least a portion of the central region T22 exposed by the second through holes J is preferably 90% or less, more preferably 80% or less, of the area of ​​the central region T22. Each of these upper limits may be combined with any of the above-described lower limits. Note that, when two or more second through holes J are formed in the second portion 492, "the area of ​​at least a portion of the central region T22 exposed by the two or more second through holes J" refers to the total area of ​​the portions of the central region T22 exposed by the two or more second through holes J.

[0202] When no through holes are formed in the second flow straightening plate 50, the area of ​​at least a portion of the second through holes J covered by the second flow straightening plate 50 is preferably 50% or more of the area of ​​the second through holes J, more preferably 60% or more, even more preferably 70% or more, even more preferably 80% or more, even more preferably 90% or more, and even more preferably 95% or more, from the viewpoint of effectively reducing the difference between the suction force applied to the radially inner portion of the porous substrate 1 and the suction force applied to the radially outer portion of the porous substrate 1, and thus effectively reducing the difference between the length of the slurry layer N formed in the radially inner portion of the porous substrate 1 and the length of the slurry layer N formed in the radially outer portion of the porous substrate 1. The upper limit is 100%. Note that, when two or more second through holes J are formed in the second portion 492 of the first flow straightening plate 49b, the "area of ​​the second through holes J" refers to the total area of ​​the two or more second through holes J. Moreover, the "area of ​​the second through hole J" means the area of ​​the second through hole J when viewed from above in the axial direction X of the porous substrate 1.

[0203] In order to effectively prevent the occurrence of turbulence when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, and thus to effectively prevent the occurrence of length variations between the slurry layers N (particularly, length variations between the slurry layers N formed in the radially inner portion of the porous substrate 1), it is preferable that a through hole be formed in the second straightening plate 50 so that the second straightening plate 50 covers a portion of the second through hole J.

[0204] FIG. 17 shows an embodiment in which through holes are formed in the second flow rectifying plate 50. In the embodiment shown in FIG. 17, a large number of round through holes K are formed in the second flow rectifying plate 50. The planar shape of the through holes K can be changed as appropriate, and examples of the planar shape of the through holes K include a circle, an ellipse, a square, a rectangle, and a rectangle with rounded corners. The number of through holes K can be changed as appropriate, and the number of through holes K may be one, two, or more. The diameter of the through hole K is, for example, 1 mm or more and 5 mm or less. When the through hole K is circular, the diameter of the through hole K refers to the diameter of the circle. When the through hole K is a shape other than a circle, the diameter refers to the diameter of a circle circumscribing the shape.

[0205] When through holes K are formed in the second straightening plate 50, from the viewpoint of effectively preventing the occurrence of turbulence when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, and thus effectively preventing the occurrence of variation in length between the slurry layers N (particularly, variation in length between the slurry layers N formed in the radially inner portion of the porous substrate 1), it is preferable that the area of ​​the portion of the second through holes J covered by the second straightening plate 50 be 50% or more and 90% or less of the area of ​​the second through holes J, and more preferably 60% or more and 90% or less.

[0206] From the viewpoint of further improving the above-mentioned effect of the rectifying member 40b, the distance D3 between the first rectifying plate 49b and the second rectifying plate 50 when the suction pipe 461 is in the slurry suction position is preferably 5 mm or more and 30 mm or less, and more preferably 5 mm or more and 15 mm or less. When the distance D3 is not constant, it is preferable that both the minimum and maximum values ​​of the distance D3 are within the above ranges.

[0207] <Example of change> In the structure manufacturing apparatus and structure manufacturing method of the present invention, various modifications are possible as long as the same effects as those of the flow control member 40a or 40b described above are achieved.

[0208] Modified examples of the structure manufacturing apparatus and structure manufacturing method of the present invention will be described below. The above description of the structure manufacturing apparatus and structure manufacturing method of the present invention also applies to the modified examples unless otherwise specified. Note that when two or more modified examples can be combined, such combinations are also encompassed by the present invention.

[0209] <Change Example 1A> Modification example 1A will be described with reference to Fig. 18. Fig. 18 is a plan view of a current plate 49a' according to the modification. In Fig. 18, the outline of the second end face T2 and the outline of the central region T22 (i.e., boundary line L2) projected onto the plan view of the current plate 49a' are indicated by a dotted line and a two-dot chain line, respectively.

[0210] In the structure manufacturing apparatus and structure manufacturing method of the present invention, a rectifying plate 49a' may be used instead of the rectifying plate 49a. As shown in FIG. 18 , the rectifying plate 49a' differs from the rectifying plate 49a in that a number of circular through holes H are formed in the first portion 491 instead of the through holes G. The above description regarding the through holes G also applies to the through holes H unless otherwise specified. In this embodiment, the shape of the through holes H in a planar view is circular; however, the shape of the through holes H in a planar view may be other shapes, such as an ellipse, a square, a rectangle, or a rectangle with rounded corners. The diameter of the through holes H is, for example, 1 mm or more and 4 mm or less. When the through holes H are circular, the diameter of the through holes H refers to the diameter of the circle. When the through holes H are other than circular, the diameter refers to the diameter of a circle circumscribing the shape.

[0211] 18, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the second portion 492 of the current plate 49a' covers at least a part of the central region T22 of the second end face T2 of the porous substrate 1, and the through-holes H formed in the first portion 491 of the current plate 49a' expose at least a part of the outer peripheral region T21 of the second end face T2 of the porous substrate 1. Therefore, modified example 1A has the same effect as the above-mentioned effect of the current plate 40a.

[0212] <Change Example 1B> In the flow straightening member 40b, a large number of round through holes H may be formed in the first portion 491 of the first flow straightening plate 49b instead of the through holes G. The above description regarding the through holes H also applies to modified example 1B. Modified example 1B achieves the same effects as those of the flow straightening member 40b.

[0213] <Change example 2> Modified Example 2 will be described below with reference to Fig. 19. Fig. 19 is an end view illustrating a modified example in which a gap is formed between the suction tube 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction tube 461. Note that Fig. 19 is an end view when the upper end of the suction tube 461, the second substrate fixing portion 48, and the end of the porous substrate 1 on the second end face T2 side are cut along a plane perpendicular to the axial direction X of the porous substrate 1 with the suction tube 461 in the slurry suction position shown in Fig. 8.

[0214] 19, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, a gap V3 may be formed between the suction pipe 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction pipe 461. The gap V3 can be formed by the second substrate fixing part 48 not fixing the end of the porous substrate 1 on the second end face T2 side that has entered the suction pipe 461 within the suction pipe 461 (for example, if the second substrate fixing part 48 has a balloon-type chuck, not inflating the balloon).

[0215] When a gap V3 is formed between the suction pipe 461 and the end of the porous substrate 1 on the second end face T2 side that has entered the suction pipe 461, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the air outside the suction pipe 461 flows along the outer peripheral surface of the porous substrate 1 into the through holes formed in the rectifying member 40 inside the suction pipe 461. For example, in the first embodiment, the air outside the suction pipe 461 flows along the outer peripheral surface of the porous substrate 1 into the through holes (for example, the first through holes G formed in the first portion 491) formed in the rectifying plate 49a inside the suction pipe 461. Furthermore, in the second embodiment, air outside the suction pipe 461 flows along the outer peripheral surface of the porous substrate 1 into through holes (for example, the first through hole G formed in the first portion 491 of the first current rectifying plate 49b, the second through hole J formed in the second portion 492 of the first current rectifying plate 49b, the through hole K formed in the second current rectifying plate 50, etc.) formed in the suction pipe 461. This further reduces the difference between the suction force in the radially inner portion of the porous substrate 1 and the suction force in the radially outer portion of the porous substrate 1 at the end on the second end face T2 side of the porous substrate 1, and further reduces the difference in length between the slurry layer N formed in the radially inner portion of the porous substrate 1 and the slurry layer N formed in the radially outer portion of the porous substrate 1.

[0216] <Change example 3> Hereinafter, Modified Example 3 will be described with reference to Fig. 20. Fig. 20 is a schematic partial end view showing the configuration of a coating processing unit 4a according to the modified example. Fig. 20 shows the state when a coating process is performed on a porous substrate 1.

[0217] In the coating processing unit 4a, the same members or parts as those in the coating processing unit 4 are denoted by the same reference numerals as those in the coating processing unit 4. The above description of the coating processing unit 4 also applies to the coating processing unit 4a unless otherwise specified.

[0218] 20, the jig 44 may be moved by the jig moving mechanism 7 independently of the nozzle 422. In this case, the jig 44 is not attached to the nozzle holding portion 431.

[0219] <Change Example 4> Modified Example 4 will be described below with reference to Figures 20 to 22. Figure 20 is as described above, Figure 21 is a plan view of a first end face of a porous substrate according to the modified example, and Figure 22 is a plan view of a straightening plate according to the modified example.

[0220] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, as shown in Figures 20 to 22, the rectifying plate 49a may be disposed on the first end face T1 side of the porous substrate 1, covering at least a part of the central region T12 of the first end face T1 of the porous substrate 1 and exposing at least a part of the outer peripheral region T11. Modification Example 4 is an example in which the arrangement position of the rectifying plate 49a is changed. Therefore, the configuration of the rectifying plate 49a in Modification Example 4 is the same as that described above, and the above description of the rectifying plate 49a also applies to Modification Example 4 unless otherwise specified.

[0221] 20, the main surface of the current plate 49a on the first end face T1 side is substantially parallel to the first end face T1 of the porous substrate 1. The meaning of "substantially parallel" is as described above.

[0222] In Modification 4, the following steps are performed instead of the nozzle moving step. The jig 44 is moved by the jig moving mechanism 7, so that the end of the porous substrate 1 on the first end face T1 side enters the jig 44, and a storage space V1 is formed within the jig 44 to store the slurry M supplied to the first end face T1 side of the porous substrate 1. Next, the nozzle holding part 431 is lowered by the lifting mechanism 432, so that the nozzle 422 approaches the porous substrate 1 and is moved to the slurry supplying position. Next, at the slurry supplying position, the nozzle 422 supplies the slurry M to the first end face T1 of the porous substrate 1 from the nozzle 422. Next, the nozzle holding part 431 is raised by the lifting mechanism 432, so that the nozzle 422 is moved away from the porous substrate 1 and is moved to the standby position. Next, the rectifying plate 49a is positioned on the first end face T1 side of the porous substrate 1. The rectifying plate 49a may be positioned by a rectifying plate moving mechanism (not shown) or manually.

[0223] As shown in Fig. 21, the first end face T1 of the porous substrate 1 is divided by a boundary line L1 into an annular (e.g., annular) outer edge region T11 located radially outward from the first end face T1 and a central region T12 located inside the outer edge region T11. The boundary line L1 is an imaginary line. Note that in Fig. 21, the openings of the cells 13a present in the first end face T1 are omitted.

[0224] The area of ​​the central region T12 is preferably 40% to 90% of the area of ​​the first end face T1, and more preferably 65% ​​to 85%.

[0225] The shape of the central region T12 and the shape of the first end face T1 are preferably similar to each other. The shape of the central region T12 refers to the shape defined by the outline of the central region T12 (i.e., the boundary line L1), and the shape of the first end face T1 refers to the shape defined by the outline of the first end face T1.

[0226] The outer peripheral region T11 is preferably formed with a predetermined width along the outline of the first end face T1 so that the shape of the central region T12 and the shape of the first end face T1 are similar. As long as the shape of the central region T12 and the shape of the first end face T1 are similar, the width of the outer peripheral region T11 may or may not be constant.

[0227] As shown in Figures 20 and 21, the straightening plate 49a has an annular (e.g., circular) first portion 491, a second portion 492 located inside the first portion 491, and an annular (e.g., circular) third portion 493 located outside the first portion 491.

[0228] As shown in Figure 22, when the first end face T1 of the porous substrate 1 and the flow straightening plate 49a are viewed from above in the axial direction X of the porous substrate 1 with the flow straightening plate 49a arranged on the first end face T1 side of the porous substrate 1 (for example, when the first end face T1 of the porous substrate 1 is projected onto the plan view of the flow straightening plate 49a), the part of the flow straightening plate 49a that overlaps with the outer edge region T11 of the first end face T1 of the porous substrate 1 is the first part 491, and the part that overlaps with the central region T12 of the first end face T1 of the porous substrate 1 is the second part 492. In Figure 22, the outline of the first end face T1 and the outline of the central region T12 (i.e., the boundary line L1) projected onto the plan view of the flow straightening plate 49a are indicated by dotted lines and two-dot chain lines, respectively.

[0229] 22, no through-holes are formed in the second portion 492 of the rectifying plate 49a. Although it is preferable that no through-holes are formed in the second portion 492 of the rectifying plate 49a as in the present embodiment, a through-hole (hereinafter referred to as a "second through-hole") may be formed in the second portion 492 of the rectifying plate 49a. The above description regarding the second through-hole also applies to Modification Example 4.

[0230] When the second through holes are formed in the second portion 492 of the rectifying plate 49a, the second through holes expose a part of the central region T12 of the first end face T1 of the porous substrate 1. "The second through holes expose a part of the central region T12 of the first end face T1 of the porous substrate 1" means that when the first end face T1 of the porous substrate 1 and the rectifying plate 49a are viewed from above in the axial direction X of the porous substrate 1 with the suction pipe 461 in the slurry suction position shown in FIG. 8 (for example, when the first end face T1 of the porous substrate 1 is projected onto the plan view of the rectifying plate 49a), the second through holes overlap with a part of the central region T12 of the first end face T1 of the porous substrate 1. From the viewpoint of further improving the effect of the rectifying member 40a, the area of ​​the portion of the central region T12 exposed by the second through holes is preferably 50% or less of the area of ​​the central region T12, more preferably 40% or less, even more preferably 30% or less, even more preferably 20% or less, even more preferably 10% or less, and even more preferably 5% or less. When two or more second through holes are formed in the second portion 492 of the rectifying plate 49a, the "area of ​​the portion of the central region T12 exposed by the two or more second through holes" refers to the total area of ​​the portions of the central region T12 exposed by the two or more second through holes.

[0231] As shown in Figure 22, when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the second part 492 of the straightening plate 49a covers at least a part of the central region T12 of the first end face T1 of the porous substrate 1, and the first through hole G formed in the first part 491 of the straightening plate 49a exposes at least a part of the outer edge region T11 of the first end face T1 of the porous substrate 1.

[0232] "The second portion 492 of the straightening plate 49a covers at least a part of the central region T12 of the first end face T1 of the porous substrate 1" means that when the straightening plate 49a is positioned on the first end face T1 side of the porous substrate 1 and the first end face T1 of the porous substrate 1 and the straightening plate 49 are viewed in a plane from the axial direction X of the porous substrate 1 (for example, when the first end face T1 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), the part of the second portion 492 of the straightening plate 49a other than the second through hole overlaps with the central region T12 of the first end face T1 of the porous substrate 1, as shown in Figure 22. When a second through hole is not formed in the second portion 492 of the straightening plate 49a, the second portion 492 of the straightening plate 49a covers the entire central region T12 of the first end face T1 of the porous substrate 1, and when a second through hole is formed in the second portion 492 of the straightening plate 49a, the second portion 492 of the straightening plate 49a covers a portion of the central region T12 of the first end face T1 of the porous substrate 1.

[0233] "The first through hole G formed in the first portion 491 of the straightening plate 49a exposes at least a portion of the outer edge region T11 of the first end face T1 of the porous substrate 1" means that when the straightening plate 49a is positioned on the first end face T1 side of the porous substrate 1 and the first end face T1 of the porous substrate 1 and the straightening plate 49a are viewed in a plane from the axial direction X of the porous substrate 1 (for example, when the first end face T1 of the porous substrate 1 is projected onto the plan view of the straightening plate 49a), as shown in Figure 22, the first through hole G formed in the first portion 491 of the straightening plate 49a overlaps with at least a portion of the outer edge region T11 of the first end face T1 of the porous substrate 1.

[0234] When the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, even when the straightening plate 49a is positioned on the first end face T1 side of the porous substrate 1, the same effect as when the straightening plate 49a is positioned on the second end face T2 side of the porous substrate 1 is achieved.

[0235] In Modification Example 4, from the viewpoint of further improving the above-described effect of the rectifying vane 49a, the area of ​​at least a portion of the central region T12 covered by the second portion 492 of the rectifying vane 49a is preferably 50% or more of the area of ​​the central region T12, more preferably 60% or more, even more preferably 70% or more, still more preferably 80% or more, still more preferably 90% or more, and still more preferably 95% or more, with the upper limit being 100%.

[0236] In Modification Example 4, from the viewpoint of further improving the above-described effect of the rectifying vane 49a, the area of ​​at least a portion of the outer edge region T11 exposed by the first through holes G formed in the first portion 491 of the rectifying vane 49a is preferably 50% or more of the area of ​​the outer edge region T11, more preferably 60% or more, even more preferably 70% or more, even more preferably 80% or more, even more preferably 90% or more, and even more preferably 95% or more. The upper limit is 100%. When two or more first through holes G are formed in the first portion 491 of the rectifying vane 49a, "the area of ​​at least a portion of the outer edge region T11 exposed by the first through holes G formed in the first portion 491 of the rectifying vane 49a" refers to the total area of ​​the portions of the outer edge region T21 exposed by the two or more first through holes G.

[0237] In Modification Example 4, from the viewpoint of further improving the above-described effect of the current rectifying plate 49a, when the current rectifying plate 49a is arranged on the first end face T1 side of the porous substrate 1, the distance D1 between the current rectifying plate 49a and the first end face T1 of the porous substrate 1 is preferably 5 mm or more and 30 mm or less, and more preferably 5 mm or more and 15 mm or less. The distance D1 is the distance between the main surface of the current rectifying plate 49a on the first end face T1 side and the first end face T1 of the porous substrate 1. When the distance D1 is not constant, it is preferable that both the minimum and maximum values ​​of the distance D1 are within the above range.

[0238] <Change Example 5> Modified Example 5 will be described below with reference to Figures 23 to 25. Figures 23 to 25 are partial end views showing the configuration of a coating processing unit 4b according to the modified example. Note that Figure 23 shows the state before the slurry supplying process and the coating process are performed on the porous substrate 1, Figure 24 shows the state when the slurry supplying process is performed on the porous substrate 1, and Figure 25 shows the state when the coating process is performed on the porous substrate 1.

[0239] 23, coating processing unit 4b differs from coating processing unit 4 in that it does not include the slurry supply unit 42, the nozzle movement mechanism 43, and the first substrate fixing unit 45, but includes a storage tank 42b in which slurry M is stored. In coating processing unit 4b, the same members or parts as those in coating processing unit 4 are denoted by the same reference numerals as those in coating processing unit 4. The above description of coating processing unit 4 also applies to coating processing unit 4b, unless otherwise specified.

[0240] As shown in FIG. 23, the storage tank 42b is placed below the porous substrate 1 held by the substrate holding part 41.

[0241] As shown in FIG. 23, the substrate holding part 41 holds the porous substrate 1 so that the first end face T1 of the porous substrate 1 faces the storage tank 42b side (the lower side in FIG. 23).

[0242] In the fifth modification, after the substrate holding step, the step (a) is carried out without carrying out the nozzle moving step and the suction tube moving step.

[0243] In step (a), the substrate holding unit 41 lowers the porous substrate 1. As a result, as shown in Fig. 24, the end of the porous substrate 1 on the first end face T1 side is immersed in the slurry M in the storage tank 42b, and the slurry M is supplied to the first end face T1 side of the porous substrate 1. Therefore, in Modified Example 5, the substrate holding unit 41 and the storage tank 42b function as a slurry supply unit that supplies the slurry M to the first end face T1 side of the porous substrate 1.

[0244] After the slurry M is supplied to the first end face T1 side of the porous substrate 1, the substrate holding unit 41 raises the porous substrate 1, removes the end of the porous substrate 1 on the first end face T1 side from the slurry M in the storage tank 42b, inverts the porous substrate 1, and moves the porous substrate 1 above the suction tube 461. As a result, as shown in FIG. 25, the second end face T2 of the porous substrate 1 held above the suction tube 461 by the substrate holding unit 41 faces the suction tube 461 side (the lower side in FIG. 25). After the porous substrate 1 is moved above the suction tube 461, the porous substrate 1 may be inverted.

[0245] The control unit 3 controls the operation of the substrate holding unit 41, and controls the timing of immersing the end of the porous substrate 1 on the first end face T1 side into the slurry M in the storage tank 42b, the immersion time (amount of slurry M supplied), the timing of removing the end of the porous substrate 1 on the first end face T1 side from the slurry M in the storage tank 42b, the timing of inverting the porous substrate 1, the timing of moving the porous substrate 1 above the suction tube 461, etc.

[0246] After the step (a), a suction tube moving step is performed in which the suction tube moving mechanism 47 moves the suction tube 461 from the standby position shown in FIGS. 23 and 24 to the slurry suction position shown in FIG.

[0247] After the step of moving the suction tube, step (b) is carried out. [Example]

[0248] Example 1 A cylindrical porous substrate 1 shown in Figures 1 to 4 was prepared. The length of the porous substrate 1 was 127 mm, the diameter of the porous substrate 1 was 118 mm, and the total number of cells per square inch of the porous substrate 1 was 300 cells per square inch.

[0249] Slurry M containing the raw materials for the catalyst layer was prepared. The viscosity of Slurry M was measured using a cone-and-plate viscometer at a temperature of 25 °C and a shear rate of 380 s -1 When measured at a shear rate of 4 s, the value is 500 mPa·s. -1When measured as a viscoelastic solution, the value was 5500 mPa·s.

[0250] A structure manufacturing apparatus 100 shown in FIGS. 5 to 8 was prepared. A rectifying plate 49a shown in FIGS. 11 and 12 was used as the rectifying member 40. The diameter of the second portion 492 of the rectifying plate 49a was adjusted to 108.4 mm, and the width W of the first through hole G was adjusted to 5 mm. The outer edge region T21 of the first portion 491 and the second end face T2 of the rectifying plate 49a was adjusted to 16% of the area of ​​the second end face T2, and the second portion 492 of the rectifying plate 49a and the central region T22 of the second end face T2 were adjusted to 84% of the area of ​​the second end face T2. The area of ​​the outer edge region T21 exposed by the first through hole G formed in the first portion 491 of the rectifying plate 49a was adjusted to 97% of the area of ​​the outer edge region T21, and the area of ​​the central region T22 covered by the second portion 492 of the rectifying plate 49a was adjusted to 100% of the area of ​​the central region T22. When the suction pipe 461 was at the slurry suction position, the distance D2a between the current plate 49a and the second end face T2 of the porous substrate 1 was adjusted to 6 mm.

[0251] Using the structure manufacturing apparatus 100, the slurry M supplied to the first end face T1 side of the porous substrate 1 was sucked from the second end face T2 side of the porous substrate 1, and a slurry layer N was formed on the inner wall of the first cell of the porous substrate 1, not reaching the second end face T2 of the porous substrate 1.

[0252] When the slurry M supplied to the first end face T1 side of the porous substrate 1 was sucked from the second end face T2 side of the porous substrate 1, the air flow velocity in the radially inner part of the porous substrate 1 on the first end face T1 side was 3.8 m / s, and the air flow velocity in the radially outer part of the porous substrate 1 on the first end face T1 side was 14 m / s.

[0253] The porous substrate 1 was cut along a plane parallel to the axial direction X, and the lengths of four slurry layers N in the radial outer portion Q1 of the porous substrate 1 (the left portion (5%) and the right portion (5%) of the porous substrate 1 as shown in FIG. 26) were measured and averaged. Similarly, the lengths of 36 slurry layers N in the radial inner portion Q2 of the porous substrate 1 (the central portion (90%) of the porous substrate 1 as shown in FIG. 26) were measured and averaged.

[0254] The difference (Z2-Z1) between the percentage Z2 (%) of the average length of the slurry layer N in the radial inner portion Q2 of the porous substrate 1 relative to the length of the porous substrate 1 and the percentage Z1 (%) of the average length of the slurry layer N in the radial outer portion Q1 of the porous substrate 1 relative to the length of the porous substrate 1 was 7.5%.

[0255] Example 2 19, the end of the second end face T2 side of the porous substrate 1 that has entered the suction tube 461 is not fixed by the second substrate fixing portion 48, and a gap is formed between the suction tube 461 and the end of the second end face T2 side of the porous substrate 1 that has entered the suction tube 461. The same operation as in Example 1 was performed except that. Note that when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the flow velocity of the air in the part on the first end face T1 side of the radial inner part of the porous substrate 1 was 3.1 m / s, and the flow velocity of the air in the part on the first end face T1 side of the radial outer part of the porous substrate 1 was 9.2 m / s.

[0256] The difference (Z2-Z1) between the percentage Z2 (%) of the average length of the slurry layer N in the radial inner portion Q2 of the porous substrate 1 relative to the length of the porous substrate 1 and the percentage Z1 (%) of the average length of the slurry layer N in the radial outer portion Q1 of the porous substrate 1 relative to the length of the porous substrate 1 was 6.3%.

[0257] Comparative Example 1 The same operation as in Example 1 was performed, except that the straightening plate 49a was not used. When the slurry M supplied to the first end face T1 side of the porous substrate 1 was sucked from the second end face T2 side of the porous substrate 1, the air flow velocity in the part on the first end face T1 side of the inner part of the radial direction of the porous substrate 1 was 14.6 m / s, and the air flow velocity in the part on the first end face T1 side of the outer part of the radial direction of the porous substrate 1 was 15.3 m / s.

[0258] The difference (Z2-Z1) between the percentage Z2 (%) of the average length of the slurry layer N in the radial inner portion Q2 of the porous substrate 1 relative to the length of the porous substrate 1 and the percentage Z1 (%) of the average length of the slurry layer N in the radial outer portion Q1 of the porous substrate 1 relative to the length of the porous substrate 1 was 10.8%.

[0259] Comparative Example 2 The same operation as in Example 2 was performed, except that the straightening plate 49a was not used. When the slurry M supplied to the first end face T1 side of the porous substrate 1 was sucked from the second end face T2 side of the porous substrate 1, the air flow velocity in the part on the first end face T1 side of the inner part of the radial direction of the porous substrate 1 was 12.1 m / s, and the air flow velocity in the part on the first end face T1 side of the outer part of the radial direction of the porous substrate 1 was 11.1 m / s.

[0260] The difference (Z2-Z1) between the percentage Z2 (%) of the average length of the slurry layer N in the radial inner portion Q2 of the porous substrate 1 relative to the length of the porous substrate 1 and the percentage Z1 (%) of the average length of the slurry layer N in the radial outer portion Q1 of the porous substrate 1 relative to the length of the porous substrate 1 was 11.5%.

[0261] From the results of Examples 1 to 2 and Comparative Examples 1 to 2, it became clear that when the slurry M supplied to the first end face T1 side of the porous substrate 1 is sucked from the second end face T2 side of the porous substrate 1, the difference in length between the slurry layer N formed in the radially inner portion of the porous substrate 1 and the slurry layer N formed in the radially outer portion of the porous substrate 1 becomes smaller by positioning the straightening plate 49a on the second end face T2 side of the porous substrate 1. [Explanation of symbols]

[0262] 1...Porous substrate, 11...Cylindrical portion, 12...Partition wall portion, 13...Cell, 13a...First cell, 13b...Second cell, T1(S1)...First end face, T11...Outer edge region of first end face, T12...Central region of first end face, T2(S2)...Second end face, T21...Outer edge region of second end face, T22...Central region of second end face, 100...Structure manufacturing apparatus, 2...Substrate processing portion, 3...Control portion, 4...Coating processing portion, 40... Flow straightening member, 40a...flow straightening member according to first embodiment, 40b...flow straightening member according to second embodiment, 41...substrate holding section, 42...slurry supply section, 43...nozzle moving mechanism, 44...jig, 45...first substrate fixing section, 46...slurry suction section, 47...suction tube moving mechanism, 48...second substrate fixing section, 49a...flow straightening plate, 49b...first flow straightening plate, 50...second flow straightening plate, G...through hole, M...slurry, N...slurry layer

Claims

1. An apparatus for manufacturing a structure, comprising: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The device comprises: a slurry supply unit that supplies a slurry containing raw materials for the functional layer to the first end surface side; a slurry suction section that sucks the slurry supplied to the first end face side from the second end face side and forms a slurry layer on an inner wall of the first cell that does not reach the second end face; a flow rectifying member that is disposed on the second end surface side and that covers at least a portion of a central region of the second end surface and exposes at least a portion of an outer edge region of the second end surface when the slurry supplied to the first end surface side is sucked from the second end surface side, the straightening member is provided with a straightening plate that is positioned on the second end face side at a distance from the second end face when the slurry supplied to the first end face side is sucked from the second end face side, covers at least a portion of the central region, and exposes at least a portion of the outer edge region.

2. The device according to claim 1 , wherein the distance between the current plate and the second end surface is 5 mm or more and 30 mm or less.

3. The device according to claim 1 or 2, wherein the straightening vane has a through hole exposing at least a portion of the outer edge region.

4. The device according to claim 3 , wherein the area of ​​at least a portion of the outer edge region exposed by the through-hole is 50% or more of the area of ​​the outer edge region.

5. The device according to any one of claims 1 to 4, wherein the area of ​​at least a portion of the central region covered by the current vane is 50% or more of the area of ​​the central region.

6. An apparatus for manufacturing a structure, comprising: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The device comprises: a slurry supply unit that supplies a slurry containing raw materials for the functional layer to the first end surface side; a slurry suction section that sucks the slurry supplied to the first end face side from the second end face side and forms a slurry layer on an inner wall of the first cell that does not reach the second end face; a flow rectifying member that is disposed on the second end surface side and that covers at least a portion of a central region of the second end surface and exposes at least a portion of an outer edge region of the second end surface when the slurry supplied to the first end surface side is sucked from the second end surface side, the flow rectifying member includes a first flow rectifying plate disposed on the second end surface side when the slurry supplied to the first end surface side is sucked from the second end surface side, and a second flow rectifying plate disposed on the opposite side of the first flow rectifying plate from the second end surface, the first current plate has a first through-hole exposing at least a portion of the outer edge region and a second through-hole exposing at least a portion of the central region; The device, wherein the second current plate covers at least a portion of the second through hole.

7. The device according to claim 6 , wherein an area of ​​at least a portion of the outer edge region exposed by the first through-hole is 50% or more of an area of ​​the outer edge region.

8. The device according to claim 6 or 7, wherein an area of ​​at least a portion of the central region exposed by the second through-hole is 50% or more of an area of ​​the central region.

9. The device according to any one of claims 6 to 8, wherein the area of ​​at least a portion of the second through-hole covered by the second straightening plate is 50% or more of the area of ​​the second through-hole.

10. The device according to any one of claims 6 to 9, wherein a through hole is formed in the second straightening plate such that the second straightening plate covers a portion of the second through hole.

11. The device according to claim 10 , wherein an area of ​​a portion of the second through-hole covered by the second current plate is 50% or more and 90% or less of an area of ​​the second through-hole.

12. The device according to any one of claims 6 to 11, wherein the distance between the first current plate and the second end surface is 5 mm or more and 30 mm or less.

13. The device according to any one of claims 6 to 12, wherein the distance between the first current plate and the second current plate is 5 mm or more and 30 mm or less.

14. When the slurry supplied to the first end face side is sucked from the second end face side, air flows into the straightening member along the outer peripheral surface of the porous substrate. The device according to any one of claims 1 to 13.

15. The device according to any one of claims 1 to 14, wherein the structure is a catalyst for purifying exhaust gases or a precursor thereof, and the functional layer is a catalyst layer or a precursor layer thereof.

16. 1. A method of manufacturing a structure, comprising: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The method comprises the following steps: (a) supplying a slurry containing raw materials for the functional layer to the first end surface side; and (b) sucking the slurry supplied to the first end face side from the second end face side to form a slurry layer on the inner wall of the first cell, the slurry layer not reaching the second end face. Including, In step (b), when the slurry supplied to the first end face side is sucked from the second end face side, a flow rectifying member that covers at least a part of a central region of the second end face and exposes at least a part of an outer edge region of the second end face is disposed on the second end face side; the straightening member comprises a straightening plate that is positioned on the second end face side at a distance from the second end face when the slurry supplied to the first end face side is sucked from the second end face side, covers at least a portion of the central region, and exposes at least a portion of the outer edge region.

17. The method according to claim 16 , wherein the distance between the current plate and the second end surface is 5 mm or more and 30 mm or less.

18. 18. The method of claim 16 or 17, wherein the straightening vane has a through hole exposing at least a portion of the outer edge region.

19. The method of claim 18 , wherein the area of ​​at least a portion of the outer edge region exposed by the through-hole is 50% or more of the area of ​​the outer edge region.

20. The method according to any one of claims 16 to 19, wherein the area of ​​at least a portion of the central region covered by the current vane is 50% or more of the area of ​​the central region.

21. A method for producing a structure, comprising: The structure is an axially extending porous substrate; A functional layer provided on the porous substrate, The porous substrate is a first end surface located on one side in the axial direction; a second end surface located on the other side in the axial direction; a first cell extending in the axial direction, having an open end on the first end face side and a closed end on the second end face side; a second cell extending in the axial direction, having an open end on the second end face side and a closed end on the first end face side, The method comprises the following steps: (a) supplying a slurry containing raw materials for the functional layer to the first end surface side; and (b) sucking the slurry supplied to the first end face side from the second end face side to form a slurry layer on the inner wall of the first cell, the slurry layer not reaching the second end face. Including, In step (b), when the slurry supplied to the first end face side is sucked from the second end face side, a flow rectifying member that covers at least a part of a central region of the second end face and exposes at least a part of an outer edge region of the second end face is disposed on the second end face side; the flow rectifying member includes a first flow rectifying plate disposed on the second end surface side when the slurry supplied to the first end surface side is sucked from the second end surface side, and a second flow rectifying plate disposed on the opposite side of the first flow rectifying plate from the second end surface, the first current plate has a first through-hole exposing at least a portion of the outer edge region and a second through-hole exposing at least a portion of the central region; The method, wherein the second current plate covers at least a portion of the second through hole.

22. The method of claim 21 , wherein the area of ​​at least a portion of the outer edge region exposed by the first through-hole is 50% or more of the area of ​​the outer edge region.

23. The method according to claim 21 or 22, wherein the area of ​​at least a portion of the central region exposed by the second through-hole is 50% or more of the area of ​​the central region.

24. The method according to any one of claims 21 to 23, wherein the area of ​​at least a portion of the second through hole covered by the second straightening plate is 50% or more of the area of ​​the second through hole.

25. The method according to any one of claims 21 to 24, wherein a through hole is formed in the second current plate such that the second current plate covers a portion of the second through hole.

26. The method according to claim 25 , wherein an area of ​​a portion of the second through-hole covered by the second current plate is 50% or more and 90% or less of an area of ​​the second through-hole.

27. The method according to any one of claims 21 to 26, wherein the distance between the first current plate and the second end surface is 5 mm or more and 30 mm or less.

28. The method according to any one of claims 21 to 27, wherein the distance between the first current plate and the second current plate is 5 mm or more and 30 mm or less.

29. In step (b), when the slurry supplied to the first end face side is sucked from the second end face side, air flows into the straightening member along the outer peripheral surface of the porous substrate. The method according to any one of claims 16 to 28.

30. The method according to any one of claims 16 to 29, wherein the structure is an exhaust gas purification catalyst or a precursor thereof, and the functional layer is a catalyst layer or a precursor layer thereof.

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