Cleaning surface

Abstract

The present disclosure relates to a cleaning surface 100 of a contact cleaning device. The cleaning surface is releasably attachable to a contact cleaning device and comprises a substrate 110 supporting a first polymer layer 130 having a surface 132. A first topographical feature 140 or layer is applied and / or formed in at least a portion of the first polymer layer, and the first polymer layer is radiation cured. The present invention also relates to a method of forming the contact cleaning surface.

Description

Technical Field

[0001] [Related Applications] This application claims the benefit of UK Patent Application No. 2008260.8, filed on June 2, 2020, entitled "Cleaning Surface". The entire disclosure of UK Patent Application No. 2008260.8 is hereby incorporated by reference in its entirety.

[0002] [Field of Disclosure] The present invention relates to a contact cleaning surface of a contact cleaning device, and more particularly, but not exclusively, to a contact cleaning surface having topographical features and comprising a substrate that is detachably attached to the device. The present invention also relates to a method of forming a contact cleaning surface.

Background Art

[0003] [Background] Contact cleaning is used to clean the surface of a substrate or a workpiece. After cleaning, the workpiece can be used in various delicate processes such as the manufacture of electronic devices, optoelectronic devices, and flat panel displays. Typically, a contact cleaning roller made of rubber or elastomer is used to remove contaminant particles from the surface of the substrate, and then an adhesive roll can be used to remove the contaminant particles or debris from the cleaning roller. This ensures that the cleaning roller remains free of debris and maximizes the efficiency of the cleaning roller in removing contaminant particles from the surface of the substrate or the workpiece.

[0004] The cleaning roller typically comprises a shaft or core to which an elastomeric coating is applied on the outer surface. The elastomer is then cured on the core such that its outer surface forms the cleaning surface. Optionally, the cleaning surface can be micro-roughened to increase or maximize the contact surface area between the cleaning surface and the small particles that cause contamination.

[0005] Alternatively, known cleaning rollers are formed by attaching a polymer-coated flexible substrate, cut from a flexible sheet material, to a roller core. The polymer-coated flexible substrate is fixed to the core using adhesive or laser welding.

[0006] One drawback of conventional technology is that when an elastomer coating is applied directly to the roller core, it becomes difficult to remove the coating at the end of its effective life. Furthermore, it is difficult to apply fine surface roughening to the outer surface of the elastomer coating formed around the core.

[0007] Systems using flexible substrates cut from flexible sheet material do not offer the ability to customize or adapt the substrate to the device to which it is mounted, because it is formed as a sheet of continuous length. Furthermore, if adhesive is used to attach the substrate to the roller core, the adhesive also becomes difficult to remove at the end of its effective life. [Overview of the project]

[0008] Therefore, an object of the present invention is to provide a contact cleaning surface that can be easily adapted to an intended contact cleaning application. A further object of the present invention is to provide a method for forming a contact cleaning surface that maximizes flexibility in terms of form and function. Certain embodiments offer the advantage that the surface is adapted or customized so that portions of the contact cleaning surface are optimized or modified in various ways. In this way, the contact cleaning surface is adapted or adapted to the configuration of the substrate surface, one or more workpieces to be cleaned by the contact cleaning device, for example, the shape, orientation or surface characteristics of the substrate surface, one or more workpieces.

[0009] [overview] According to the present invention, a cleaning surface for a contact cleaning device is provided, as described in the appended claims.

[0010] According to the present invention, a contact cleaning roller is provided as described in the attached claims.

[0011] According to the present invention, a contact cleaning system is provided as described in the appended claims.

[0012] According to the present invention, a method for forming a cleaning surface of a contact cleaning device is provided, as described in the appended claims.

[0013] According to a first aspect of the present invention, the cleaning surface of a contact cleaning device is, It is detachably mountable to a contact cleaning device and comprises a substrate supporting a first polymer layer having a surface, The first topographic feature portion or layer is applied and / or formed in at least a portion of the first polymer layer. The first polymer layer described above is radiation-cured, providing a cleaning surface.

[0014] In a particular embodiment, a second topographic feature or layer is applied and / or formed in at least one further portion of the polymer layer. Thus, the surface debris collection efficiency is adapted to various ranges within the first topographic feature, within the second topographic feature, and outside both the first and second topographic feature.

[0015] In a particular embodiment, the second topographic feature portion differs in dimensions from the first topographic feature portion. In a particular embodiment, the first topographic feature portion includes a regular or irregular pattern. Thus, when the cleaning surface is used to collect debris in a contact cleaning system, the portion of the roller that contacts the substrate surface or workpiece being cleaned has a region adapted along its length. The adapted region that contacts the substrate surface or workpiece being cleaned may change as the cleaning roller rotates. Therefore, these regions are adapted to accommodate various aspects of the substrate surface or workpiece being cleaned.

[0016] In a particular embodiment, the substrate provides dimensional stability to the cleaning surface. In a particular embodiment, the substrate includes a plastic film or a metal foil. In a particular embodiment, the substrate includes a mesh. The substrate and the polymer layer supported thereon are flexible so that the cleaning surface can be attached to the roller. Due to its properties, such as composition and / or thickness, the substrate can provide dimensional stability to the cleaning surface while not hindering the attachment of the cleaning surface around the core of the cleaning roller. In this way, the substrate provides the cleaning surface with improved compatibility with the cleaning roller without affecting the resilience of the cleaning surface.

[0017] In certain embodiments, the first polymer layer contains an antistatic agent. In certain embodiments, the first polymer layer is electrostatically dissipative. In this way, the cleaning surface can be adapted to reduce the effect of static charge on the cleaning roller or in the contact cleaning system, thereby preventing damage to the workpiece or substrate surface being cleaned.

[0018] In a particular embodiment, the first polymer layer includes an elastomer.

[0019] In certain embodiments, the cleaning surface can be formed into a cylindrical body or a cylindrical cover. In certain embodiments, the cleaning surface is provided as a belt or a sheet. In this way, the cleaning surface is adaptable not only to various cleaning rollers but also to various contact cleaning systems.

[0020] In a particular embodiment, a second polymer layer is provided between the substrate and the first polymer layer. In a particular embodiment, the second polymer layer contains a polymer different from that of the first polymer layer. In this way, the second polymer layer can improve the fit between the substrate and the first polymer layer. The second polymer layer can provide additional properties to the cleaning surface, such as antistatic properties or electrostatic diffusion properties.

[0021] According to a second aspect of the present invention, a contact cleaning roller comprising a core and a contact cleaning surface detachably attached to at least a portion of the core, wherein the contact cleaning surface comprises a substrate supporting a first polymer layer having a surface, The first topographic feature portion or layer is applied and / or formed in at least a portion of the first polymer layer. A first polymer layer is provided, which is cured, and a contact cleaning roller is provided.

[0022] A third aspect of the present invention provides a contact cleaning device having a contact cleaning roller comprising a core and a contact cleaning surface detachably attached to at least a portion of the core, wherein the contact cleaning surface comprises a substrate supporting a first polymer layer having a surface, The first topographic feature portion or layer is applied and / or formed in at least a portion of the first polymer layer. A first polymer layer is provided, which is cured, and a contact cleaning device is provided.

[0023] In certain embodiments, the contact cleaning roller is adapted to be operably movable and engageable with a work surface such that the contact cleaning surface collects debris from the work surface. In this way, when the cleaning surface is used to collect debris within the contact cleaning system, the portion of the roller that contacts the work has one or more regions adapted along its length. The one or more adapted regions that contact the work can vary as the cleaning roller rotates. Therefore, these regions are adapted to correspond to various aspects of the work being cleaned.

[0024] According to a fourth aspect of the present invention, a method of forming a cleaning surface of a contact cleaning device, comprising: providing a substrate detachably attachable to the contact cleaning device; applying a polymer layer to the substrate to form the cleaning surface; providing at least a first topographical feature or layer on at least one portion of the polymer layer; A method is provided.

[0025] In certain embodiments, the method further comprises curing the polymer layer by radiation, and providing the at least first topographical feature is performed before, during, or after the curing.

[0026] In certain embodiments, the method further comprises attaching the substrate to the contact cleaning device after curing the polymer layer.

[0027] In certain embodiments, the at least one topographical feature is provided by masking, printing, or embossing the polymer layer. In this way, the topographical feature is applied and / or formed on the surface of the polymer layer by known means.

[0028] In a particular embodiment, the masking includes a negative-type photoresist or a positive-type photoresist.

[0029] In a particular embodiment, the at least one topographic feature portion includes a plurality of topographic feature portions provided continuously on the polymer layer. In this way, the cleaning surface can be fitted or adapted in stages, maximizing flexibility in the manufacturing process and allowing the cleaning surface to be very specifically adapted to a workpiece or a specific embodiment of a particular cleaning application.

[0030] In certain embodiments of all aspects of the present invention, the curing radiation is ultraviolet radiation.

[0031] In certain embodiments of all aspects of the present invention, the curing radiation is microwave radiation.

[0032] [Brief description of the drawing] Hereinafter, embodiments of the present invention will be described only as examples, with reference to the attached drawings. [Brief explanation of the drawing]

[0033] [Figure 1] a) a cross-sectional view and b) a top view of a first exemplary embodiment of a cleaning surface according to a first aspect of the present invention.

[0034] [Figure 2] a) a cross-sectional view and b) a top view of a second exemplary embodiment of a cleaning surface according to a first aspect of the present invention.

[0035] [Figure 3] Figure 2 is a perspective view of the cleaning surface attached to the contact cleaning roller.

[0036] [Figure 4] This figure shows a first method according to a further aspect of the present invention.

[0037] [Figure 5] This figure shows a second method according to a further aspect of the present invention.

[0038] [Figure 6] This is a perspective view of a third exemplary embodiment of a cleaning surface attached to a contact cleaning roller. [Modes for carrying out the invention]

[0039] In drawings, similar reference numbers indicate similar parts.

[0040] [Detailed explanation] The use of certain terms in the following explanation is for convenience only and is not limiting. The words "upper" and "lower" specify the direction in the referenced drawings and refer to the components being described during assembly; their specific meanings will be readily apparent from the context of the explanation.

[0041] Furthermore, as used herein, the terms “connected,” “fixed,” “joined,” and “attached” are intended to include both direct connections between two members, in which no other members are interposed, and indirect connections between members, in which one or more other members are interposed. These terms specifically include the words described above, their derivatives, and words with similar meanings.

[0042] Furthermore, unless otherwise specified, the use of ordinal adjectives such as "first," "second," and "third" merely indicates that different instances of similar objects are being referred to, and does not imply any obligation that the objects described in this way be in a given temporal or spatial order, ranking, or any other arbitrary form.

[0043] Referring here to Figure 1, a cleaning surface 100 according to a first aspect of the present invention is shown. The cleaning surface 100 comprises a substrate 110 supporting a polymer layer 130 having a surface 132. A portion of the surface 132 of the polymer layer 130 is provided with a first topographic feature portion 140, and the polymer layer 130 is radiation-cured to fix the topographic feature portion. In this way, the portion can be adapted so that the cleaning surface 100 is adapted for a specific cleaning task.

[0044] The substrate 110 is formed from a plastic film and provides an upper and lower surface that extends substantially parallel to each other. The substrate 110 is rectangular and has a pair of parallel long sides 112, 114 that are perpendicular to a pair of parallel short sides 116, 118.

[0045] The polymer layer 130 extends substantially over the entire upper surface of the substrate. The polymer layer 130 is provided as a coating of the substrate 110 and is applied to substantially cover the upper surface of the substrate. Once applied, the polymer layer 130 provides a surface 132 to the cleaning surface 100. The polymer layer 130 can be any polymer suitable for contact cleaning of debris from the workpiece, such as an elastomer. Non-limiting illustrative materials for the polymer layer include silicone rubber, polyurethane, and polyether.

[0046] A first topographic feature portion 140 is provided on the surface 132 of the polymer layer. The first topographic feature portion 140 extends with a uniform width between the long sides 112 and 114 in a direction parallel to the short sides 116 and 118. In this way, the first topographic feature portion 140 forms a region that extends across the surface 132.

[0047] The first topographic feature area 140 is provided as a series of recesses 142 formed on the surface 132. Each of the recesses 142 is substantially the same as the others and is arranged together to provide a regular pattern. In other words, the first topographic feature area 140 forms a consistent textured surface. The series of recesses 142 substantially increases the surface area of ​​the surface 132 in the region of the first topographic feature area 140, thereby adapting the debris collection efficiency in the region of the first topographic feature area 140.

[0048] Figure 2 shows the cleaning surface 200 of the second embodiment. If the features are the same as those of the previously described embodiment, the reference numerals are the same except that the first digit is "2". The embodiment shown in Figure 2 is similar to the embodiment shown in Figure 1, and the cleaning surface 200 comprises a substrate 210 on which a polymer layer 230 is supported, and a first topographic feature portion 240 is provided on the surface 232 of the polymer layer 230. A second topographic feature portion 250 is also provided on the surface 232 of the polymer layer 230.

[0049] The second topographic feature portion 250 extends with a uniform width between the long sides 212 and 214 in a direction parallel to the short sides 216 and 218 and parallel to the first topographic feature portion 240. In this way, the second topographic feature portion 250 forms a region that extends across the surface 232. The width of the second topographic feature portion 250 across the surface 232 is narrower than the width of the first topographic feature portion 240.

[0050] The first topographic feature area 240 is provided as a series of first recesses 242 on the surface 232. Similar to the example shown in Figure 1, the series of first recesses 242 increase the surface area of ​​the surface 232 in the region of the first topographic feature area 240, thereby adapting the debris collection efficiency in that region.

[0051] The second topographic feature area 250 is provided as a series of second recesses 252 on the surface 232. The second recesses 252 have different contour and opening shapes from the first recesses 242. The series of second recesses 252 increases the surface area of ​​the surface 232 in the region of the second topographic feature area 250 by a different range than that of the region of the first topographic feature area 240. As a result, the debris collection efficiency of the surface 232 is adapted to various ranges within the first topographic feature area 240, within the second topographic feature area 250, and outside both the first and second topographic feature areas 240 and 250.

[0052] Figure 3 shows the cleaning surface 200 described above, which includes a first topographic feature portion 240 and a second topographic feature portion 250 provided on the surface 232 of the polymer layer 230. The entire cleaning surface 200 is attached to a cleaning roller 300. The cleaning roller 300 includes a core 360 ​​having an axial length and a cylindrical outer surface. The cleaning surface 200 is attached to the core 360 ​​such that the cleaning surface wraps around and covers the cylindrical outer surface.

[0053] When forming the cleaning surface 200, the lengths of the long sides 212 and 214 of the cleaning surface 200 are selected to correspond to the axial length of the core 360. The lengths of the short sides 216 and 218 of the cleaning surface 200 are selected to correspond to the outer circumference of the core 360. In this way, when the cleaning surface 200 is attached to the cleaning roller 300, the cleaning surface 200 forms a single layer or sleeve around the core 360.

[0054] The cleaning surface 200 is attached to the cleaning roller 300 such that the first topographic feature section 240 and the second topographic feature section 250 provide an outer periphery band around the cleaning roller. In this way, when the cleaning roller is installed in the contact cleaning device and used to collect debris, the portion of the cleaning roller 300 that contacts the workpiece has an area adapted along its contact area. Therefore, as the workpiece moves in the machine direction within the contact cleaning device, the cleaning roller 300 rotates to consistently apply adapted cleaning across the width of the workpiece.

[0055] Next, referring to Figure 6, an alternative embodiment of the cleaning roller 600 is shown. If the features are the same as those of the previously described embodiment, the reference numerals are the same except that the first digit is "6". Thus, the cleaning surface is attached to the cleaning roller 600 with the substrate 610 of the cleaning surface wrapped around the core 660 of the cleaning roller, such that the surface 632 faces outward.

[0056] A single topographic feature area 640 is provided on the surface 632, extending continuously across the entire outer surface 632. This single topographic feature area 640 is configured to provide the roller 600 with a consistently textured surface.

[0057] Next, referring to Figure 4, a method 400 for forming a cleaning surface according to a fourth aspect of the present invention is shown. Method 400 begins by providing a substrate, for example, substrates 110 and 210 as described with reference to Figures 1 to 3 (410). Next, a polymer layer is applied to the substrate to form a cleaning substrate (420). Next, at least a first topographic feature portion or layer is provided on at least a portion of the polymer layer (430).

[0058] Figure 5 shows an alternative method 500 for forming a cleaning surface according to a fourth aspect of the present invention. When the features are the same as the method in Figure 4, the reference numerals are the same except that the first digit is "5" instead of "4". The embodiment shown in Figure 5 is the same as the embodiment shown in Figure 4, and a substrate is provided (5 1 0) A polymer layer is applied thereon (520), and a first topographic feature portion or layer is provided on the first portion of the polymer layer (530). The method includes a further step 535 of providing a second topographic feature portion or layer on the second portion of the polymer layer. Thus, multiple topographic feature portions are provided in succession on the cleaning surface. Next, the polymer layer is cured by radiation.

[0059] Those skilled in the art will understand that the embodiments described above are illustrative and not limited in meaning, and that various changes and modifications are possible without departing from the scope of the invention as defined by the appended claims. Various modifications are possible to the detailed examples described above, for example, variations in the number, shape, size, arrangement, and assembly of contact cleaning surfaces, contact cleaning rollers, or adhesive rolls may exist. In particular, the cross-sectional shape of each topographic feature can take any suitable footprint, shape, or size.

[0060] In a particular embodiment, the topographic feature includes a series of uniform recesses arranged in a regular pattern. However, any regular or irregular pattern may be provided. The pattern may include recesses, openings or protrusions or roughened zones, or any suitable combination thereof.

[0061] In a particular example, a first topographic feature, or the first topographic feature and any additional topographic feature, is positioned on the cleaning surface in any suitable orientation. Thus, when the cleaning surface is attached to the roller core, the topographic feature can be provided in numerous configurations, for example, to form bands, helices, or patches of regular or irregular shapes. The morphology of the topographic feature can be a single, continuous shape, or it can consist of a broken pattern of smaller shapes.

[0062] In certain embodiments, the substrate is a plastic film. Alternatively, the substrate can be a mesh, such as a woven or nonwoven fabric, or a molded grid or lattice. The film or mesh can be formed from a polymer, such as polyethylene or nylon. Alternatively, the substrate can be a metal foil, such as aluminum, steel, or copper.

[0063] In certain embodiments, the antistatic agent may include conductive fibers dispersed within the polymer layer, such as nanowires made from silver or carbon nanotubes. The electrostatic dissipating agent may be, for example, a cyclic siloxane or a metal salt.

[0064] In certain embodiments, the polymer layer is provided as a relatively thin film, for example, with an average thickness in the range of about 1 mm to about 6 mm. The substrate can be provided with a thickness in the range of about 25 microns to about 3 mm.

[0065] In certain embodiments, the polymer layer may include adjacent sections of different polymers. Optionally, different topographic features can be applied to each polymer in the polymer layer, thereby providing topographic features adapted by both the physical morphology of the surface and the polymer material forming the topographic features.

[0066] In certain exemplary methods, radiation curing of the polymer layer can be performed as a single step after all topographic features have been formed. Alternatively, each topographic feature may be formed and then cured locally in sequence. Alternatively, one or more topographic features may be formed and cured simultaneously.

[0067] In certain exemplary methods, radiation curing may use UV or microwave radiation. Alternatively, other radiation curing methods, such as infrared or visible light, may be used.

[0068] The polymer layer can be radiation-cured before the cleaning surface is attached to the cleaning roller, or it can be radiation-cured after it has been attached. [Configuration 1] The cleaning surface of a contact cleaning device, A substrate that can be detachably attached to the contact cleaning device, comprising a substrate supporting a first polymer layer having a surface, A first topographic feature or layer is applied and / or formed in at least a portion of the first polymer layer. The first polymer layer is radiation-cured. Cleaning surface. [Configuration 2] The cleaning surface according to configuration 1, wherein a second topographic feature portion or layer is applied and / or formed in at least one further portion of the polymer layer. [Configuration 3] The second topographic feature portion is a cleaning surface as described in configuration 2, having different dimensions from the first topographic feature portion. [Structure 4] The first topographic feature portion is a cleaning surface according to any one of configurations 1 to 3, which includes a regular or irregular pattern. [Composition 5] The substrate is a cleaning surface according to any one of configurations 1 to 4, which provides dimensional stability to the cleaning surface. [Composition 6] The substrate is a cleaning surface according to any one of configurations 1 to 5, comprising a plastic film or a metal foil. [Composition 7] The substrate is a cleaning surface according to any one of configurations 1 to 5, including a mesh. [Structure 8] The first polymer layer comprises an antistatic agent, and the cleaning surface is as described in any one of the configurations 1 to 7. [Composition 9] The first polymer layer is electrostatically diffusive, and the cleaning surface is one of the configurations 1 to 8. [Configuration 10] The cleaning surface according to any one of the configurations 1 to 9, wherein the first polymer layer includes an elastomer. [Composition 11] The cleaning surface is a cleaning surface according to any one of configurations 1 to 10, which can be formed into a cylindrical body or a cylindrical cover. [Composition 12] A cleaning surface according to any one of configurations 1 to 11, wherein a second polymer layer is provided between the substrate and the first polymer layer. [Composition 13] The cleaning surface according to configuration 12, wherein the second polymer layer comprises a polymer different from that of the first polymer layer. [Composition 14] The cleaning surface is provided as a belt or a sheet, as described in any one of configurations 1 to 13. [Composition 15] A contact cleaning roller comprising a core, wherein at least a portion of the core is detachably fitted with a contact cleaning surface according to any one of configurations 1 to 14. [Composition 16] A contact cleaning device comprising the contact cleaning roller described in configuration 15. [Composition 17] The contact cleaning device according to configuration 16, wherein the contact cleaning roller is adapted to engage operably and movably with the work surface so that the contact cleaning surface collects debris from the work surface. [Composition 18] A method for forming a cleaning surface of a contact cleaning device, The contact cleaning device is provided with a substrate that can be detachably attached, Applying a polymer layer to the substrate to form a cleaning surface, At least one topographic feature portion or layer is provided on at least one portion of the polymer layer, Methods that include... [Composition 19] The method according to configuration 18, further comprising curing the polymer layer by radiation, wherein providing the at least first topographic feature portion is performed before, during, or after the curing. [Configuration 20] The method according to configuration 19, further comprising attaching the substrate to the contact cleaning device after curing the polymer layer. [Composition 21] The method according to configuration 18, wherein the at least one topographic feature portion is provided by masking, printing, or embossing the polymer layer. [Composition 22] The method according to configuration 21, wherein the masking includes a negative-type photoresist or a positive-type photoresist. [Composition 23] The method according to any one of configurations 18 to 22, wherein the at least one topographic feature portion includes a plurality of topographic feature portions provided continuously on the polymer layer.

Claims

1. A method for forming a cleaning surface of a contact cleaning device, The contact cleaning device is provided with a substrate that can be detachably attached, A polymer layer containing an elastomer is applied to the substrate to form a cleaning surface, To provide at least one topographic feature portion or layer on at least one portion of the polymer layer, Includes, The process further includes curing the polymer layer with radiation, wherein the provision of the at least one topographic feature is performed before or during the curing. method.

2. The method according to claim 1, further comprising attaching the substrate to the contact cleaning device after curing the polymer layer.

3. The method according to claim 1, wherein the at least one topographic feature portion is provided by masking, printing, or embossing the polymer layer.

4. The method according to claim 3, wherein the masking includes a negative-type photoresist or a positive-type photoresist.

5. The method according to any one of claims 1 to 4, wherein the at least one topographic feature portion includes a plurality of topographic feature portions provided continuously on the polymer layer.

6. A cleaning surface of a contact cleaning device, A substrate that can be detachably attached to the contact cleaning device, comprising a substrate supporting a first polymer layer having a surface, The first topographic feature portion or layer is applied and / or formed in at least a portion of the first polymer layer. The first polymer layer is radiation-cured, The first polymer layer contains an antistatic agent, Cleaning surface.

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