Inspection device, method for manufacturing a template, and method for inspecting a template
JP7877080B2Active Publication Date: 2026-06-22KIOXIA CORP
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- KIOXIA CORP
- Filing Date
- 2022-06-21
- Publication Date
- 2026-06-22
AI Technical Summary
Technical Problem
Defect inspection of semiconductor templates with varying heights is challenging due to focus issues, leading to reduced inspection accuracy.
Method used
An inspection apparatus and method that adjusts focal positions based on height information to capture multiple images, synthesizes these images to correct for brightness and positional deviations, and determines defects in a composite image.
Benefits of technology
Enables high-accuracy defect inspection of semiconductor templates with varying heights by ensuring all patterns are in focus and aligned, improving inspection precision.
✦ Generated by Eureka AI based on patent content.
Smart Images

Figure 0007877080000001 
Figure 0007877080000002 
Figure 0007877080000003
Abstract
To perform a defect inspection of a plurality of patterns having a different height with high accuracy.SOLUTION: An inspection device of an embodiment, is an inspection device that performs a defect inspection of a sample having a plurality of patterns of which a height from a reference surface is different, and comprises: an imaging part that images the plurality of patterns; a focal point determination part that determines a plurality of focal positions for focusing a focal point of the imaging part in a height direction of the plurality of patterns; an image acquisition part that causes the imaging part to image a plurality of images obtained by imaging the plurality of patterns from the height direction, the plurality of images of which the focal point being focused in each of the plurality of focal positions; an image composition part that generates a composition image by extracting a region containing a pattern of which the focal point of the plurality of patterns is focused from each of the plurality of images; and a defect determination part that performs an inspection of a defect of the sample from the composite image.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
JP1999287618A
JP2011151165A
JP2012078164A
JP2017129385A
JP2020148615A