Substrate processing equipment
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- TOKYO ELECTRON LTD
- Filing Date
- 2022-08-25
- Publication Date
- 2026-06-23
AI Technical Summary
【0007】 一態様によれば、回転テーブルの載置台に対して基板を安定的に載置することができる。
Smart Images

Figure 0007878837000001 
Figure 0007878837000002 
Figure 0007878837000003
Abstract
Claims
1. Vacuum container and A rotating table is provided rotatably inside the vacuum container, A mounting table having a mounting surface on which a substrate is placed at a position away from the rotation center of the aforementioned rotating table, A lift pin, which moves relative to the mounting base and raises or lowers the substrate, is provided through a through hole in the mounting base. The system includes a gas suction unit that applies an attractive force to the substrate through the through hole when the lift pin is lowered, The mounting base has a groove on its mounting surface that communicates with the through hole and extends from the through hole toward the center of the mounting base. Circuit board processing equipment.
2. The groove portion has a part that extends linearly from the through hole toward the center of the base described above. The substrate processing apparatus according to claim 1.
3. The groove portion has a portion that is in communication with the linearly extending portion and that circles a position away from the center of the base described above. The substrate processing apparatus according to claim 2.
4. The aforementioned circumferential portion is formed in an annular shape. The substrate processing apparatus according to claim 3.
5. The mounting platform rotates relative to the rotary table. A substrate processing apparatus according to any one of claims 1 to 4.
6. A housing portion for housing the aforementioned lift pin, When the substrate is placed on the mounting base, the mounting base has a cylindrical member that rises relative to the housing portion together with the lift pin on the back surface of the mounting base and contacts the mounting base, The gas suction section transmits suction force to the through hole and the groove through the inside of the housing section and the inside of the cylindrical member. A substrate processing apparatus according to any one of claims 1 to 4.
7. The gas suction unit is connected to the outer circumference of the vacuum container and transmits suction force to the through-holes, which are among the plurality of through-holes formed in the base described above and are located on the outer circumference side of the rotating table. The substrate processing apparatus according to claim 6.