Substrate support device, cleaning device, device and method for calculating the rotation speed of a substrate, and machine learning device.

Abstract

To provide a technique capable of accurately obtaining a rotational speed of a substrate while increasing the maintainability in a substrate support device which holds and rotates a peripheral part of the substrate with a plurality of rollers.SOLUTION: A substrate support device comprises: a plurality of rollers which are arranged in a housing and hold a peripheral part of a substrate; a rotation drive unit which rotates the substrate by rotationally driving the plurality of rollers; a vibration transmission mechanism which is provided so as to extend to the housing from the roller or rotation drive unit and transmits the vibration generated due to the contact of a notch or orientation flat of the peripheral part of the substrate with the roller to the housing; a detection sensor which is arranged on the outer side of the housing, and detects at least one of the sound, vibration and distortion generated from the housing to output a signal corresponding to it; and a rotational speed calculation unit which calculates the rotational speed of the substrate on the basis of the signal output from the detection sensor.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to a substrate support device, a cleaning device, a device and method for calculating the rotational speed of a substrate, and a machine learning device. [Background technology]

[0002] In the manufacturing process of semiconductor devices, various processes such as film deposition, etching, and polishing are performed on the surface of substrates such as semiconductor wafers. Before and after these processes, it is necessary to keep the surface of the substrate clean, so the substrate is cleaned. For substrate cleaning, cleaning machines are widely used, which rotate the substrate by holding its periphery with multiple rollers and driving the rollers to rotate, and then press a cleaning material against the rotating substrate to clean it.

[0003] As described above, in a cleaning machine that holds and rotates the peripheral edge of a substrate with multiple rollers, the cleaning component applies a predetermined pressure to the surface of the substrate while rubbing it to remove dirt (particles, etc.) from the substrate surface. As a result, slippage may occur between the substrate and the rollers, causing the substrate's rotation speed to drop below the set rotation speed. Furthermore, even outside of substrate cleaning processes, there is a need for improved methods for calculating the rotation speed of substrates when holding and rotating them with rollers.

[0004] Currently, there is a method to determine whether slip has occurred between the substrate and the roller by contacting the periphery of the substrate with an idler and measuring the actual rotational speed of the substrate. However, this method suffers from reduced cleaning performance due to the accumulation of dirt from the idler and can lead to mismeasurements due to slip that occurs between the substrate and the idler. Therefore, a method for measuring the actual rotational speed of the substrate without using an idler is desired.

[0005] Patent Document 1 discloses a technique in which vibrations generated in a roller when a notch on a rotating substrate comes into contact with the roller are detected by a vibration sensor attached to the roller, and it is determined whether or not slip has occurred between the substrate and the roller based on the detection of the vibrations. [Prior art documents] [Patent Documents]

[0006] [Patent Document 1] Japanese Patent Publication No. 2003-77881 [Overview of the Initiative] [Problems that the invention aims to solve]

[0007] However, in Patent Document 1, the vibration sensor for detecting vibrations is directly attached to the roller, which presents maintenance problems. To improve maintainability, it is conceivable to attach the sensor to the outer casing from the outside, but in this case, there is a problem that noise from external equipment or noise from noise or vibration generated inside the housing that is unrelated to the rotation speed of the circuit board (for example, noise and vibration generated by the flow of cleaning fluid) will be mixed in.

[0008] The present invention has been made in consideration of the above points. An object of the present invention is to provide a technology that can accurately determine the rotation speed of a substrate while improving maintainability in a substrate support device that holds and rotates the peripheral edge of a substrate with a plurality of rollers. Another object of the present invention is to provide a technology for estimating whether or not a rotational abnormality has occurred and the degree of the rotational abnormality in a substrate support device that rotates a substrate while supporting it. [Means for solving the problem]

[0009] A substrate support device according to a first aspect of the present invention is: Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A vibration transmission mechanism is provided extending from the roller or rotary drive unit to the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing. A detection sensor is positioned on the outside of the housing and detects at least one of sound, vibration, and distortion generated from the housing, and outputs a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, It is equipped with.

[0010] In this configuration, the detection sensor is located on the outside of the housing, resulting in good maintainability. Furthermore, the vibration transmission mechanism is provided so as to extend from the roller or rotary drive unit to the outer panel of the housing, transmitting vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing. Therefore, even if the detection sensor is located on the outside of the housing, vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller are more easily transmitted to the detection sensor, improving the signal-to-noise ratio. Consequently, the detection accuracy of vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller can be improved, making it possible to accurately determine the rotation speed of the substrate while improving maintainability. In addition, in this configuration, since the detection sensor is located on the outside of the housing, waterproofing of the detection sensor is unnecessary, and explosion-proofing of the detection sensor is unnecessary even when flammable cleaning fluids are used inside the housing.

[0011] A substrate support device according to a second aspect of the present invention is a substrate support device according to a first aspect, The natural frequency of the vibration transmission mechanism is adjusted to correspond to the frequency of vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller.

[0012] According to such an aspect, in the vibration transmission mechanism, vibrations in the band around the natural frequency are amplified, and vibrations in a high frequency band are attenuated. Therefore, vibrations generated when a notch or orifice at the peripheral edge of the substrate hits the roller can be emphasized and transmitted to the housing, and the detection accuracy of vibrations by a detection sensor arranged outside the housing can be improved.

[0013] The substrate support device according to the third aspect of the present invention is the substrate support device according to the first or second aspect, and A part of the longitudinal direction of the vibration transmission mechanism is composed of an elastic body.

[0014] According to such an aspect, since the natural frequency of the vibration transmission mechanism is reduced, only vibrations of a low frequency can be made easier to transmit and emphasized.

[0015] The substrate support device according to the fourth aspect of the present invention is the substrate support device according to the third aspect, and The elastic body is compressed.

[0016] According to such an aspect, the rigidity of the elastic body increases, and reflection at its joint part decreases, so that the loss of vibration transmission can be reduced.

[0017] The substrate support device according to the fifth aspect of the present invention is the substrate support device according to the third or fourth aspect, and It has an adjustment mechanism for adjusting the compression amount or effective length of the elastic body.

[0018] According to such an aspect, by adjusting the compression amount or effective length of the elastic body by the adjustment mechanism, it becomes possible to arbitrarily adjust the natural frequency of the vibration transmission mechanism.

[0019] The substrate support device according to the sixth aspect of the present invention is the substrate support device according to the fifth aspect, and The adjustment mechanism refers to a database in which the correspondence relationship between the rotation speed and the compression amount or effective length is stored in advance, and adjusts the compression amount or effective length of the elastic body so as to be the compression amount or effective length stored in the database according to the set value of the rotation speed of the substrate.

[0020] According to such an aspect, the compression amount or effective length of the elastic body can be adjusted to an appropriate value according to the set value of the rotation speed of the substrate, whereby the vibration generated when the notch or orifice at the peripheral portion of the substrate hits the roller can be appropriately emphasized and transmitted to the housing.

[0021] The substrate support device according to the seventh aspect of the present invention is the substrate support device according to the fifth aspect, The adjustment mechanism adjusts the compression amount or effective length of the elastic body according to the value detected by the first strain gauge attached to a part of the longitudinal direction of the vibration transmission mechanism.

[0022] According to such an aspect, the compression amount or effective length of the elastic body can be adjusted to an appropriate value according to the value detected by the first strain gauge, whereby the vibration generated when the notch or orifice at the peripheral portion of the substrate hits the roller can be appropriately emphasized and transmitted to the housing.

[0023] The substrate support device according to the eighth aspect of the present invention is the substrate support device according to the fifth aspect, The adjustment mechanism adjusts the compression amount or effective length of the elastic body according to the frequency of the signal output from the detection sensor.

[0024] According to such an aspect, the compression amount or effective length of the elastic body can be adjusted to an appropriate value according to at least one of the frequency of the sound, vibration, and strain detected by the detection sensor, whereby the vibration generated when the notch or orifice at the peripheral portion of the substrate hits the roller can be appropriately emphasized and transmitted to the housing.

[0025] A substrate support device according to the ninth aspect of the present invention is a substrate support device according to the eighth aspect, The adjustment mechanism refers to a database in which the correspondence between rotational speed and compression amount or effective length is stored in advance, and adjusts the compression amount or effective length of the elastic body so that it matches the compression amount or effective length stored in the database according to the rotational speed calculated by the rotational speed calculation unit.

[0026] According to this embodiment, the amount of compression or effective length of the elastic body can be adjusted to an appropriate value according to the actual rotational speed of the substrate, thereby enabling the vibrations generated when the notches or orientation flats at the peripheral edge of the substrate come into contact with the rollers to be appropriately amplified and transmitted to the housing.

[0027] A substrate support device according to the tenth aspect of the present invention is a substrate support cleaning device according to any of the first to ninth aspects, The detection sensor is at least one of a microphone, a vibration sensor, and a second strain gauge attached to the housing.

[0028] A substrate support device according to the 11th aspect of the present invention is a substrate support device according to any of the 1st to 10th aspects, At least the end of the vibration transmission mechanism on the roller or rotational drive unit side is oriented so as to extend in a direction perpendicular to the tangent of the substrate at the point where the substrate contacts the roller, in a plan view.

[0029] The vibrations generated by the reaction force the roller receives from the substrate are perpendicular to the tangent line of the substrate at the point where the substrate contacts the roller. Therefore, in this configuration, the vibration transmission mechanism can efficiently transmit vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing.

[0030] A substrate support device according to the twelfth aspect of the present invention is a substrate support device according to any of the first to eleventh aspects, The rotation speed calculation unit calculates the rotation speed of the substrate based on the fundamental wave and harmonics of the signal.

[0031] When the frequency of a signal corresponding to at least one of sound, vibration, and distortion fluctuates, the amount of fluctuation in the peak waveform increases with higher harmonics (for example, 1% fluctuation of a 100Hz fundamental wave is 1Hz, but 1% fluctuation of a 200Hz second harmonic is 2Hz, which is twice the amount of fluctuation of the fundamental wave). Therefore, in this embodiment, the rotation speed of the substrate can be determined with greater accuracy by using not only the fundamental wave but also the harmonics of the signal to calculate the substrate's rotation speed.

[0032] A substrate support device according to the 13th aspect of the present invention is a substrate support device according to any of the 1st to 12th aspects, The rotation drive unit further includes a rotation speed setting unit for setting a set value for the rotation speed of the substrate, The rotation speed calculation unit calculates the rotation speed of the substrate, taking into consideration the setting value obtained from the rotation speed setting unit.

[0033] A substrate support device according to the 14th aspect of the present invention is a substrate support device according to any of the 1 to 13 aspects, The system further includes a display control unit that displays the rotation speed calculated by the rotation speed calculation unit on a display.

[0034] A substrate support device according to the 15th aspect of the present invention is a substrate support device according to the 14th aspect, The display control unit averages the past rotation speeds calculated by the rotation speed calculation unit and displays them on the display.

[0035] A substrate support device according to the 16th aspect of the present invention is a substrate support device according to any of the 1 to 15 aspects, The system further includes an abnormality determination unit that determines whether or not there is an abnormality based on the rotation speed calculated by the rotation speed calculation unit.

[0036] A substrate support device according to the 17th aspect of the present invention is a substrate support device according to the 16th aspect, The abnormality determination unit determines whether or not there is an abnormality based on the average value of the past multiple rotation speeds calculated by the rotation speed calculation unit.

[0037] A substrate support device according to the 18th aspect of the present invention is a substrate support device according to the 16th or 17th aspect, The system further includes an abnormality alarm unit that, if the abnormality detection unit determines that an abnormality exists, issues an abnormality alarm and / or instructs the rotary drive unit to stop.

[0038] A substrate support device according to the 19th aspect of the present invention is a substrate support device according to any of the 16th to 18th aspects, The abnormality determination unit calculates the difference or ratio between the rotational speed calculated by the rotational speed calculation unit and the set value obtained from the rotational speed setting unit, and determines that there is an abnormality if the difference or ratio exceeds a predetermined threshold.

[0039] A substrate support device according to the 20th aspect of the present invention is a substrate support device according to any of the 16th to 19th aspects, The abnormality determination unit determines that there is an abnormality if the rotational speed calculated by the rotational speed calculation unit is zero and the set value obtained from the rotational speed setting unit is not zero, or if an abnormality signal is output from the detection sensor.

[0040] A substrate support device according to the 21st aspect of the present invention is a substrate support device according to any of the 16th to 20th aspects, The abnormality detection unit determines whether or not there is an abnormality by considering fluctuations in the current flowing to the motor that rotates the cleaning member.

[0041] A substrate support device according to the 22nd aspect of the present invention is a substrate support device according to any of the 15th to 21st aspects, The abnormality detection unit determines whether or not there is an abnormality by taking into account fluctuations in the air pressure inside the housing.

[0042] A substrate support device according to the 23rd aspect of the present invention is a substrate support device according to the 13th aspect, The rotation speed calculation unit changes the cutoff frequency of the filter applied to the signal according to the set value.

[0043] A cleaning device according to a 24th aspect of the present invention is: Multiple rollers that hold the peripheral edge of the substrate, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A cleaning member that contacts the substrate and cleans the substrate, A cleaning solution supply nozzle for supplying cleaning solution to the substrate, A housing that houses the plurality of rollers, the cleaning member, and the cleaning liquid supply nozzle, A vibration transmission mechanism is provided extending from the roller or rotary drive unit to the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing. A detection sensor is positioned on the outside of the housing and can detect at least one of sound, vibration, and distortion originating from the housing and output a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, It holds.

[0044] The apparatus according to the 25th aspect of the present invention is Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A device for calculating the rotational speed of a substrate in a substrate support device equipped with the following: A vibration transmission mechanism is provided extending from the roller or rotary drive unit to the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing. A detection sensor is positioned on the outside of the housing and detects at least one of sound, vibration, and distortion generated from the housing, and outputs a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, It is equipped with.

[0045] The method according to the 26th aspect of the present invention is: Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A method for calculating the rotational speed of a substrate in a substrate support device equipped with the following: The steps include transmitting vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the housing by a vibration transmission mechanism provided so as to extend from the roller or rotary drive unit to the housing, The steps include: detecting at least one of sound, vibration, and distortion emanating from the housing using a detection sensor located on the outside of the housing and outputting a corresponding signal; The steps include: calculating the rotation speed of the substrate based on the signal output from the detection sensor; Includes.

[0046] A method according to the 27th aspect of the present invention is a method according to the 26th aspect, The step of adjusting at least one of the material, length, cross-sectional shape, and mass added to the vibration transmission mechanism so that the natural frequency of the vibration transmission mechanism corresponds to the frequency of vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller. It also includes.

[0047] A machine learning device according to the 28th aspect of the present invention is A data acquisition unit acquires data obtained from a detection sensor as input data, when a substrate held by rollers at its periphery is rotated within the housing, vibrations generated when a notch or orientation flat at the periphery of the substrate strikes the rollers are transmitted to the housing via a vibration transmission mechanism, and data obtained from a detection sensor is acquired as input data based on at least one of the sound, vibration, and distortion generated from the housing. A label acquisition unit acquires label data indicating the degree of rotational abnormality during substrate rotation based on the substrate rotation conditions included in the input data. A learning unit that performs supervised learning and generates a trained model using the input data acquired by the input data acquisition unit and the label data acquired by the label acquisition unit, It is equipped with.

[0048] According to this embodiment, in a substrate support device that rotates a substrate while supporting it, it is possible to estimate with greater accuracy whether or not a rotational abnormality has occurred and to what level the rotational abnormality is.

[0049] A machine learning apparatus according to the 29th aspect of the present invention is a machine learning apparatus according to the 28th aspect, The aforementioned input data is a moving average of data obtained by a detection sensor based on at least one of sound, vibration, and distortion over a predetermined period from a time prior to the reference time to the reference time.

[0050] According to this embodiment, in a substrate support device that rotates a substrate while supporting it, when estimating whether a rotational abnormality has occurred and the degree of the rotational abnormality based on data obtained from a detection sensor based on at least one of sound, vibration, and strain, it is possible to reduce misjudgments and improve accuracy.

[0051] A machine learning apparatus according to the 30th aspect of the present invention is a machine learning apparatus according to the 28th aspect, The learning unit identifies whether the source of vibration during substrate rotation is a notch or an orientation flat, and learns by associating data obtained from a detection sensor with the degree of rotational abnormality based on at least one of the sounds, vibrations, and distortions generated from the housing corresponding to the type of source, as training data.

[0052] In this embodiment, in a substrate support device that rotates a substrate while supporting it, when estimating the degree of rotational abnormality, the accuracy of the determination can be automatically improved as the cumulative usage time increases while the device is continuously used. [Effects of the Invention]

[0053] According to the present invention, in a substrate support device that holds and rotates the peripheral edge of a substrate using multiple rollers, the rotation speed of the substrate can be accurately determined while improving maintainability. Furthermore, according to the present invention, the level of rotational abnormality of the substrate can be estimated in the substrate support device. [Brief explanation of the drawing]

[0054] [Figure 1] Figure 1 is a plan view showing the overall configuration of a polishing apparatus according to one embodiment. [Figure 2] Figure 2 is a side view showing the internal configuration of a cleaning device according to one embodiment. [Figure 3] Figure 3 is a plan view showing the arrangement of rollers in the cleaning apparatus shown in Figure 2. [Figure 4] Figure 4 is a side view illustrating one modified example of the arrangement of the vibration transmission mechanism. [Figure 5] Figure 5 is a side view illustrating another modified configuration of the vibration transmission mechanism. [Figure 6A] Figure 6A is a side view showing a modified example of the vibration transmission mechanism configuration. [Figure 6B] Figure 6B is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6C]Figure 6C is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6D] Figure 6D is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6E] Figure 6E is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6F] Figure 6F is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6G] Figure 6G is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6H] Figure 6H is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6I] Figure 6I is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6J] Figure 6J is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6K] Figure 6K is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6L] Figure 6L is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6M] Figure 6M is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 6N] Figure 6N is a side view showing another modified configuration of the vibration transmission mechanism. [Figure 7A] Figure 7A is a plan view showing another modified configuration of the vibration transmission mechanism. [Figure 7B] Figure 7B is a plan view illustrating the operation of the vibration transmission mechanism shown in Figure 7A. [Figure 7C] Figure 7C is a plan view showing another modified configuration of the vibration transmission mechanism. [Figure 7D] Figure 7D is a plan view showing another modified configuration of the vibration transmission mechanism. [Figure 7E] Figure 7E is a plan view showing another modified configuration of the vibration transmission mechanism. [Figure 8A] Figure 8A is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8B] Figure 8B is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8C] Figure 8C is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8D] Figure 8D is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8E] Figure 8E is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8F] Figure 8F is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 8G] Figure 8G is a plan view showing another modified arrangement of the vibration transmission mechanism. [Figure 9] Figure 9 shows an example of a signal processing flow for calculating the rotation speed of a circuit board based on sound or vibration detected by a detection sensor. [Figure 10] Figure 10 is a block diagram showing a configuration in which the rotation speed of a substrate is calculated based on sound or vibration detected by a detection sensor. [Figure 11A] Figure 11A shows an example of a signal processing flow for adjusting the amount of compression of an elastic body. [Figure 11B] Figure 11B shows a modified example of a signal processing flow for adjusting the effective length of an elastic body. [Figure 11C] Figure 11C shows a modified example of a signal processing flow for adjusting the amount of compression of an elastic body. [Figure 11D] Figure 11D shows a modified example of a signal processing flow for adjusting the effective length of an elastic body. [Figure 12A] Figure 12A is an example of a graph showing the raw waveform of a sound or vibration signal detected by a detection sensor under normal conditions. [Figure 12B] Figure 12B is an example graph showing the waveform of a sound or vibration signal detected by a detection sensor under normal conditions, after passing through a BPF or HPF. [Figure 12C] Figure 12C is an example graph showing the waveform after absolute value processing of the sound or vibration signal detected by the detection sensor under normal conditions. [Figure 12D] Figure 12D is an example graph showing the waveform of a sound or vibration signal detected by a detection sensor under normal conditions after passing through an LPF (low-pass filter). [Figure 12E] Figure 12E is an example graph showing the FFT analysis results of sound or vibration signals detected by the detection sensor under normal conditions. [Figure 13A] Figure 13A is an example of a graph that shows the raw waveforms of sound or vibration signals detected by a detection sensor under normal and abnormal conditions, superimposed on each other. [Figure 13B] Figure 13B is an example of a graph that shows the waveforms of sound or vibration signals detected by a detection sensor under normal and abnormal conditions, superimposed after passing through a BPF or HPF. [Figure 13C] Figure 13C is an example of a graph that shows the waveforms of sound or vibration signals detected by a detection sensor under normal and abnormal conditions, after the absolute value processing has been applied. [Figure 13D] Figure 13D is an example of a graph that shows the waveforms of sound or vibration signals detected by the detection sensor after passing through the low-pass filter, both under normal and abnormal conditions. [Figure 13E] Figure 13E is an example of a graph that shows the FFT analysis results of sound or vibration signals detected by the detection sensor under normal and abnormal conditions, superimposed on each other. [Figure 14] Figure 14 is a diagram showing an example of a functional block diagram illustrating a functional configuration example of a numerical control system according to one embodiment. [Figure 15] Figure 15 shows an example of a trained model provided from a machine learning device to an estimation device. [Modes for carrying out the invention]

[0055] Embodiments of the present invention will be described in detail below with reference to the attached drawings. In the following description and the drawings used therein, the same reference numerals will be used for parts that can be identically configured, and redundant explanations will be omitted.

[0056] <Substrate Processing Equipment> Figure 1 is a plan view showing the overall configuration of a substrate processing apparatus (also called a polishing apparatus) 1 according to one embodiment.

[0057] As shown in Figure 1, the substrate processing apparatus 1 has a substantially rectangular housing 10 and a load port 12 on which a substrate cassette (not shown) for stocking multiple substrates W (see Figure 2, etc.) is mounted. The load port 12 is located adjacent to the housing 10. The load port 12 can be equipped with an open cassette, an SMIF (Standard Manufacturing Interface) pod, or a FOUP (Front Opening Unified Pod). The SMIF pod and FOUP are sealed containers that house a substrate cassette inside and are covered with a partition wall, thereby maintaining an environment independent of the external space. Examples of substrates W include semiconductor wafers.

[0058] The housing 10 contains several (four in the embodiment shown in Figure 1) polishing units 14a to 14d, a first cleaning unit 16a and a second cleaning unit 16b for cleaning the substrate W after polishing, and a drying unit 20 for drying the substrate W after cleaning. The polishing units 14a to 14d are arranged along the longitudinal direction of the housing 10, and the cleaning units 16a, 16b and the drying unit 20 are also arranged along the longitudinal direction of the housing 10.

[0059] A first transport robot 22 is positioned in the area enclosed by the load port 12, the polishing unit 14a located on the load port 12 side, and the drying unit 20. A transport unit 24 is positioned parallel to the longitudinal direction of the housing 10 between the area where the polishing units 14a to 14d are arranged and the area where the washing units 16a, 16b and the drying unit 20 are arranged. The first transport robot 22 receives the substrate W before polishing from the load port 12 and hands it over to the transport unit 24, and receives the dried substrate W removed from the drying unit 20 from the transport unit 24.

[0060] A second transport robot 26 is positioned between the first cleaning unit 16a and the second cleaning unit 16b to transfer the substrate W between the first cleaning unit 16a and the second cleaning unit 16b. A third transport robot 28 is positioned between the second cleaning unit 16b and the drying unit 20 to transfer the substrate W between the second cleaning unit 16b and the drying unit 20.

[0061] Furthermore, the substrate processing apparatus 1 is provided with a polishing control device 30 that controls the movement of each of the devices 14a-14d, 16a, 16b, 22, 24, 26, and 28. For example, a programmable logic controller (PLC) can be used as the polishing control device 30. In the embodiment shown in Figure 1, the polishing control device 30 is located inside the housing 10, but it is not limited to this, and the polishing control device 30 may be located outside the housing 10.

[0062] As the first cleaning unit 16a and / or the second cleaning unit 16b, a roll cleaning device (cleaning device 16 according to one embodiment described later) may be used, in which, in the presence of a cleaning liquid, a roll cleaning member extending linearly over substantially the entire length of the diameter of the substrate W is brought into contact with the surface of the substrate W, and the surface of the substrate W is scrubbed while the roll cleaning member rotates; a pencil cleaning device (not shown) may be used, in which, in the presence of a cleaning liquid, a cylindrical pencil cleaning member extending vertically is brought into contact with the surface of the substrate W, and the surface of the substrate W is scrubbed while the pencil cleaning member rotates and moves in one direction parallel to the surface of the substrate W; a buff cleaning and polishing device (not shown) may be used, in which, in the presence of a cleaning liquid, a buff cleaning and polishing member having a rotation axis extending vertically is brought into contact with the surface of the substrate W, and the surface of the substrate W is scrubbed while the buff cleaning and polishing member rotates and moves in one direction parallel to the surface of the substrate W; or a two-fluid jet cleaning device (not shown) may be used, which cleans the surface of the substrate W with a two-fluid jet. Furthermore, the first cleaning unit 16a and / or the second cleaning unit 16b may be a combination of two or more of the roll cleaning device, pencil cleaning device, buff cleaning and polishing device, and two-fluid jet cleaning device.

[0063] The cleaning solution includes a rinsing solution such as distilled water (DIW) and a chemical solution such as ammonia hydrogen peroxide (SC1), hydrochloric acid hydrogen peroxide (SC2), sulfuric acid hydrogen peroxide (SPM), sulfuric acid hydrochloride, or hydrofluoric acid. Unless otherwise specified in this embodiment, the cleaning solution refers to either the rinsing solution or the chemical solution.

[0064] The drying unit 20 may be a spin drying apparatus that dries the substrate W by spraying isopropyl alcohol (IPA) vapor from a spray nozzle that moves in one direction parallel to the surface of the substrate W toward the rotating substrate W, and further dries the substrate W by centrifugal force by rotating the substrate W at high speed.

[0065] <Cleaning equipment> Next, a cleaning device 16 according to one embodiment will be described. Figure 2 is a side view showing the internal configuration of the cleaning device 16 according to one embodiment, and Figure 3 is a plan view showing the arrangement of rollers 42a to 42d in the cleaning device 16. The cleaning device 16 according to one embodiment may be used as the first cleaning unit 16a and / or the second cleaning unit 16b in the substrate processing apparatus 1 described above.

[0066] As shown in Figures 2 and 3, the cleaning apparatus 16 includes a housing 41 that defines a cleaning space for cleaning the substrate W, a substrate support device 50 that supports and rotates the substrate W, cleaning members 44a and 44b that contact the substrate W and clean the substrate W, and a cleaning liquid supply nozzle 45 that supplies cleaning liquid to the substrate W. The substrate support device 50 is located inside the housing 41 and includes a plurality of rollers 42a to 42d (four in the illustrated example) that hold the peripheral edge of the substrate W, and rotational drive units 43a and 43b that rotate the substrate W by rotating the plurality of rollers 42a to 42d.

[0067] In this embodiment, the rotary drive units 43a and 43b each have motors. In the illustrated example, the motors of the rotary drive units 43a and 43b are located below the bottom plate of the housing 41. The motor of the rotary drive unit 43a and the rollers 42a and 42d are supported on one drive unit mounting base 46, while the motor of the rotary drive unit 43b and the rollers 42b and 42c are supported on another drive unit mounting base 46. The drive unit mounting base 46 is structured to slide vertically relative to a mounting support member 47 fixed to the bottom plate of the housing 41. When the cleaning device 16 is in operation, the mounting support member 47 is sandwiched between the drive unit mounting base 46 and the bottom plate of the housing 41. Therefore, when the cleaning device 16 is in operation, vibrations generated when the notches or orientation flats (not shown) on the peripheral edge of the substrate W come into contact with the rollers 42a to 42d are transmitted from the rollers 42a to 42d to the drive unit mounting base 46 and the mounting support member 47.

[0068] In the illustrated example, the motor of the rotary drive unit labeled 43a rotates the rollers labeled 42a and 42d via a pulley and belt, and the motor of the rotary drive unit labeled 43b rotates the rollers labeled 42b and 42c via a pulley and belt. As the multiple rollers 42a to 42d are rotated in the same direction (counterclockwise in the example shown in Figure 3) by the rotary drive units 43a and 43b, the substrate W held by the multiple rollers 42a to 42d is rotated in the opposite direction to the rotation of each roller 42a to 42d (clockwise in the example shown in Figure 3) due to the frictional force acting between each roller 42a to 42d and the peripheral edge of the substrate W.

[0069] In this embodiment, the cleaning members 44a and 44b are cylindrical, elongated roll cleaning members (roll sponges) made of, for example, polyvinyl alcohol (PVA), but are not limited to this. They may also be cylindrical pencil cleaning members extending in the vertical direction, or buff cleaning and polishing members having a rotation axis extending in the vertical direction.

[0070] As shown in Figure 2, the multiple rollers 42a to 42d, the cleaning members 44a and 44b, and the cleaning fluid supply nozzle 45 are arranged inside the housing 41, preventing the cleaning fluid supplied onto the substrate W from splashing outside the cleaning space.

[0071] As shown in Figure 2, the substrate support device 50 according to this embodiment includes a vibration transmission mechanism 70 that extends from rollers 42a to 42d or rotation drive units 43a and 43b to the housing 41 and transmits vibrations generated when a notch or orientation flat (not shown) on the peripheral edge of the substrate W strikes the rollers 42a to 42d to the housing 41; a detection sensor 51 that is positioned outside the housing 41 and detects at least one of sound, vibration, and distortion emanating from the housing 41 and outputs a corresponding signal; and a rotation speed calculation unit 52 that calculates the rotation speed of the substrate W based on the signal output from the detection sensor 51. In one embodiment of the rotation speed calculation unit 52, a rotation speed calculation circuit is employed, and the control unit 30 can be configured to include this rotation speed calculation circuit and a rotation speed setting circuit as a rotation speed setting unit 56. In one embodiment, the rotation speed calculation circuit can be configured to (i) receive a signal output from the detection sensor 51, (ii) read a rotation speed setting value previously stored in the rotation speed setting circuit as a rotation speed setting unit 56, (iii) perform calculation processing as described later, calculate the rotation speed of the substrate W corresponding to the value of the signal received from the detection sensor 51 by comparing the calculation processing result with the rotation speed setting value, and (iv) output a signal corresponding to the calculated rotation speed of the substrate to the display control unit 53. Furthermore, in one embodiment, the rotation speed setting value pre-stored in the rotation speed setting circuit, which functions as the rotation speed setting unit 56, can be the one set during initial calibration.

[0072] As the detection sensor 51, at least one of the following can be used: a microphone, a vibration sensor, and a strain sensor (hereinafter sometimes referred to as the "second strain sensor"). In the case of a microphone, the detection sensor 51 may be placed in close contact with the outer panel of the housing 41, or at a distance from the outer panel of the housing 41, as long as it is in a position where it can detect sound generated from the housing 41. In the case of a vibration sensor, the detection sensor 51 is placed in close contact with the outer panel of the housing 41 so as to be able to detect vibrations generated from the housing 41. In the case of a strain sensor, the detection sensor 51 is attached to the outer panel of the housing 41 so as to be able to detect strain generated in the housing 41. It is desirable that the detection sensor 51 be placed near the end of the vibration transmission mechanism 70 so as to be able to efficiently detect vibrations transmitted to the housing 41 by the vibration transmission mechanism 70.

[0073] In the illustrated example, the vibration transmission mechanism 70 has an elongated rod shape, with one end in contact with the rollers 42a-42d or the rotary drive units 43a, 43b, and the other end in contact with the housing 41. This connects the rollers 42a-42d or the rotary drive units 43a, 43b to the housing 41 via the solid vibration transmission mechanism 70. The vibration transmission mechanism 70 may be located on the outside or inside of the housing 41. In the example shown in Figure 2, one end of the vibration transmission mechanism 70 is fixed (or loosely in contact) to a mounting support member 47, which is positioned between the drive unit mounting base 46 and the bottom plate of the housing 41, and the other end is fixed to the outer plate of the housing 41 from the outside. As a modified example, as shown in Figure 4, one end of the vibration transmission mechanism 70 may be fixed (or loosely in contact) to the drive unit mounting base 46, and the other end may be fixed to the outer plate of the housing 41 from the outside. As another variation, as shown in Figure 5, one end of the vibration transmission mechanism 70 may be fixed (or loosely in contact with) the bearing (or support) of the roller 42a, and the other end may be fixed (or loosely in contact with) the outer plate of the housing 41 from the inside.

[0074] As the vibration transmission mechanism 70, for example, extruded materials having various cross-sectional shapes such as round bars, square bars, L-shaped, H-shaped, and I-shaped plates, pipes, and bent plates can be used. When the vibration transmission mechanism 70 is located inside the housing 41, it is desirable that the material of the vibration transmission mechanism 70 be a chemical-resistant resin. When the vibration transmission mechanism 70 is located outside the housing 41, the material of the vibration transmission mechanism 70 may be resin or metal, provided there are no restrictions on use.

[0075] The natural frequency of the vibration transmission mechanism 70 may be adjusted to correspond to the frequency of vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d. As the rotational speed of the substrate W increases, the frequency of vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d also increases. The vibration transmission mechanism 70 has a natural frequency, and vibrations are amplified in the frequency band around that frequency, and attenuated in the frequency band above that frequency. Therefore, by adjusting the natural frequency of the vibration transmission mechanism 70, it is possible to select or emphasize the necessary vibration components, making it easier to transmit the frequency components of vibrations generated according to the rotational speed of the substrate W. The natural frequency is proportional to the square root of the Young's modulus and inversely proportional to the square root of the density. For example, the natural frequency f0 for a rod shape with a constant cross-sectional area is expressed by the following equation (1). f0 = (n / 2L) * (E / μ) 1 / 2 (1) Here, n is a natural number, L is the rod length, E is the Young's modulus, and μ is the density.

[0076] For example, the material (resin, metal), length, and cross-sectional shape of the vibration transmission mechanism 70 may be adjusted as shown in Figures 6A and 6B so that the natural frequency of the vibration transmission mechanism 70 corresponds to the frequency of vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W come into contact with the rollers 42a to 42d, or a mass 71 may be added to a part of the longitudinal direction of the vibration transmission mechanism 70 as shown in Figure 6C.

[0077] As one variation, as shown in Figures 6D and 6E, a portion of the longitudinal direction of the vibration transmission mechanism 70 may be composed of an elastic body 72. The elastic body 72 may be rubber, as shown in Figure 6D, or a spring material such as a coil spring, as shown in Figure 6E. The elastic body 72 has a lower natural frequency compared to a highly rigid material such as metal. Therefore, by making a portion of the longitudinal direction of the vibration transmission mechanism 70 out of an elastic body 72, the natural frequency of the vibration transmission mechanism 70 is reduced. This makes it possible to transmit and emphasize only low-frequency vibrations (vibrations caused by low rotational speeds). For example, the natural frequency f0 when a portion of the longitudinal direction of a rod shape with a constant cross-sectional area is composed of an elastic body is expressed by the following equation (2). f0=(λ i ( / 2πL)·(E / μ) 1 / 2 (2) Here, .'' i The following equation (3) is satisfied. cotλ i =-(kL / AE) 1 / λ i (3) Here, k is the spring constant of the elastic body, L is the rod length, A is the cross-sectional area, E is the Young's modulus, and μ is the density. λ1 takes values ​​from π / 2 to π. Therefore, the natural frequency f0 expressed by equation (2) above is 1 to 1 / 2 times the natural frequency f0 expressed by equation (1) above. In other words, by having a portion of the longitudinal direction of the vibration transmission mechanism 70 composed of the elastic body 72, the natural frequency of the vibration transmission mechanism 70 can be reduced to about 1 / 2. λ2 and beyond take values ​​from 3π / 2 to 2π, 5π / 2 to 3π, 7π / 2 to 4π, ...

[0078] In the examples shown in Figures 6D and 6E, the elastic body 71 was positioned in the middle of the longitudinal direction of the vibration transmission mechanism 70. However, the position of the elastic body 71 is not limited to this. For example, as shown in Figure 6G, it may be positioned at the end of the vibration transmission mechanism 70 that abuts against the rollers 42a to 42d or the rotary drive units 43a and 43b. As shown in Figure 6F, it may be positioned at the end of the vibration transmission mechanism 70 that abuts against the outer plate of the housing 71 from the inside. As shown in Figure 6H, when the vibration transmission mechanism 70 penetrates the outer plate of the housing 41, it is sufficiently sealed between the inside and outside of the housing 41 to prevent leakage of gas and liquid in both directions.

[0079] As another variation, as shown in Figure 6I, a portion of the longitudinal direction of the vibration transmission mechanism 70 may be composed of a pair of elastic bodies 721 and 722, with a mass body 723 sandwiched between the pair of elastic bodies 721 and 722. In this case, the natural frequency f0 of the vibration transmission mechanism 70 is expressed by the following equation (4). f0 = (1 / 2π) * ((k1 + k2) / m) 1 / 2 (4) Here, k1 and k2 are the spring constants of the elastic body, and m is the mass of the mass body. Therefore, the influence of the elastic body becomes dominant, and the natural frequency of the vibration transmission mechanism 70 expressed in equation (4) above can be further reduced from the natural frequency f0 expressed in equation (2) above.

[0080] As another modified example, as shown in Figure 6J, a portion of the vibration transmission mechanism 70 in the longitudinal direction is composed of an elastic body 72, and this elastic body 72 may be compressed. Compression of the elastic body 72 increases its rigidity, reducing reflection at its joints and thus reducing vibration transmission loss.

[0081] As another variation, as shown in Figures 6K to 6M, a portion of the vibration transmission mechanism 70 in the longitudinal direction is composed of an elastic body 72, and an adjustment mechanism 74 is provided to adjust the amount of compression or effective length of the elastic body 72.

[0082] In the example shown in Fig. 6K, the elastic body 72 is rubber, and the adjustment mechanism 74 has a screw rod 74a whose tip is abutted against the elastic body 72 and a dial 74b fixed to the base end portion of the screw rod 74b. By rotating the dial 74b, the screw rod 74a is rotated and slides in the left - right direction of the paper surface. As a result, the extrusion amount (i.e., the compression amount of the elastic body 72) by which the tip of the screw rod 74a extrudes the elastic body 72 is adjusted.

[0083] In the example shown in Fig. 6L, the elastic body 72 is rubber, and the adjustment mechanism 74 has a piezoelectric element 74c arranged so as to be sandwiched in a part of the longitudinal direction of the vibration transmission mechanism 70 and an adjustment part 74d that supplies a voltage to the piezoelectric element 74c. The adjustment part 74d may be realized by a computer. By supplying a voltage (adjustment signal) from the adjustment part 74d to the piezoelectric element 74c, the piezoelectric element 74c is deformed. As a result, the extrusion amount (i.e., the compression amount of the elastic body 72) by which the piezoelectric element 74a extrudes the elastic body 72 is adjusted.

[0084] In the example shown in Fig. 6M, the elastic body 72 is a coil spring, and the adjustment mechanism 74 has a screw rod 74a whose tip moves helically along the spring and a dial 74b fixed to the base end portion of the screw rod 74b. By rotating the dial 74b, the screw rod 74a is rotated, and the tip of the screw rod 74a moves helically along the spring. As a result, the effective length D of the elastic body 72 (coil spring) is adjusted.

[0085] As a supplementary explanation, the spring constant k of the coil spring is expressed by the following formula (5). k = P / δ=(G·d 4 ) / (8·Na·D) (5) Here, P: the load applied to the spring, δ: the deflection of the spring, G: the shear modulus, Na: the number of active turns, D: the mean coil diameter, d: the wire diameter. That is, the spring constant k is inversely proportional to the number of active turns Na of the spring. Since the number of active turns Na of the spring is proportional to the length of the spring, by changing the length that effectively acts as the spring (effective length D), the spring constant k can be adjusted, and thereby, the natural frequency of the vibration transmission mechanism 70 can be adjusted.

[0086] As shown in Figure 6N, a motor 75 may be connected to the dial 74b via a gear (not shown), and the motor 75 may rotate the dial 74b by a predetermined amount in response to an adjustment signal transmitted from the adjustment unit 74d, thereby adjusting the effective length D of the elastic body 72 (coil spring).

[0087] As shown in Figures 11A and 11B, the adjustment unit 74d of the adjustment mechanism 74 may obtain the set value of the rotation speed of the substrate W from the rotation speed setting unit 56 (described later), refer to a database 76 in which the correspondence between rotation speed and compression amount or effective length is stored in advance, and adjust the compression amount or effective length of the elastic body 72 by sending an adjustment signal to the piezoelectric element 74c (see Figure 6L) or motor 75 (see Figure 6N) so that the compression amount or effective length becomes the amount stored in the database 76 according to the set value of the rotation speed of the substrate W. This makes it possible to adjust the compression amount or effective length of the elastic body 72 to an appropriate value according to the set value of the rotation speed of the substrate W, thereby appropriately amplifying and transmitting vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W come into contact with the rollers 42a to 42d to the housing 41.

[0088] As a variation, as shown in Figures 11C and 11D, the adjustment mechanism 74 may adjust the compression amount or effective length of the elastic body 41 according to the frequency of the sound or vibration detected by the detection sensor 51. Specifically, for example, the adjustment unit 74d of the adjustment mechanism 74 may acquire information on the rotational speed of the substrate W calculated based on the sound or vibration signal detected by the detection sensor 51 from the rotational speed calculation unit 52 (described later), refer to a database 76 in which the correspondence between rotational speed and compression amount or effective length is stored in advance, and adjust the compression amount or effective length of the elastic body 72 by sending an adjustment signal to the piezoelectric element 74c (see Figure 6L) or motor 75 (see Figure 6N) so that the compression amount or effective length becomes the compression amount or effective length stored in the database 76 according to the rotational speed calculated by the rotational speed calculation unit 52. This allows the compression amount or effective length of the elastic body 72 to be adjusted to an appropriate value according to the frequency of sound or vibration detected by the detection sensor 51, thereby enabling the vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W come into contact with the rollers 42a to 42d to be appropriately amplified and transmitted to the housing 41.

[0089] As another modified example, referring to Figure 8G, a strain gauge 77 is attached to a part of the longitudinal direction of the vibration transmission mechanism 70, and the adjustment unit 74d of the adjustment mechanism 74 adjusts the compression amount or effective length of the elastic body 42 by transmitting an adjustment signal to the piezoelectric element 74c (see Figure 6L) or motor 75 (see Figure 6N) according to the value detected by the strain gauge 77.

[0090] Incidentally, as shown in Figures 7A and 7B, when attaching and detaching the substrate W to the multiple rollers 42a to 42d, it is necessary to move the positions of the rollers 42a to 42d (in the illustrated example, they are moved left and right). For this reason, as shown in Figures 7A and 7B, the vibration transmission mechanism 70 may have a bendable pin joint 701 so that even if the position of the rollers 42a to 42d changes, the pin joint 701 may bend to follow the movement. In this case, when attaching and detaching the substrate W, it becomes unnecessary to disconnect the connection by the vibration transmission mechanism 70 and then reconnect it after the substrate W is attached.

[0091] As one variation, as shown in Figure 7C, the vibration transmission mechanism 70 may have a spring structure, and even if the position of the rollers 42a to 42d changes, the spring may be compressed to follow the movement. In this case as well, when attaching or detaching the substrate W, it is unnecessary to disconnect the connection by the vibration transmission mechanism 70 and then reconnect it after the substrate W is attached.

[0092] As another variation, as shown in Figure 7D, the vibration transmission mechanism 70 may have a bendable structure (flexible structure), so that even if the position of the rollers 42a to 42d changes, the vibration transmission mechanism 70 may bend to follow the movement. In this case as well, when attaching or detaching the substrate W, it is unnecessary to disconnect the connection by the vibration transmission mechanism 70 and then reconnect it after the substrate W is attached.

[0093] As another variation, as shown in Figure 7E, the vibration transmission mechanism 70 may have a bendable structure (flexible structure) and be in non-fixed contact with the drive device mounting base 46. Even if the positions of the rollers 42a to 42d change, the vibration transmission mechanism 70 may bend in accordance with the movement, and its end may slide along the drive device mounting base 46 to follow. In this case as well, when attaching or detaching the substrate W, it is unnecessary to disconnect the connection by the vibration transmission mechanism 70 and then reconnect it after the substrate W is attached.

[0094] As shown in Figure 8A, there is one vibration transmission mechanism 70, and this single vibration transmission mechanism 70 may be provided for only one roller 42d. In this case, the detection accuracy of the detection sensor 51 can be improved by amplifying the signal from one roller 42d.

[0095] As one variation, as shown in Figure 8B, the number of vibration transmission mechanisms 70 may be two or more, and each vibration transmission mechanism 70 may be provided for different rollers 42a and 42d. In this case, the detection accuracy of the detection sensor 51 can be improved by amplifying the signals from multiple rollers 42d.

[0096] As shown in Figure 8C, at least the end of the vibration transmission mechanism 70 on the roller 42d side may be oriented so as to extend in a direction perpendicular to the tangent to the substrate W at the point where the substrate W contacts the roller 42d, in a plan view. The vibration generated by the reaction force that the roller 42d receives from the substrate W is in a direction perpendicular to the tangent to the substrate W at the point where the substrate W contacts the roller 42d. Therefore, according to this embodiment, the vibration transmission mechanism 70 can efficiently transmit vibrations generated when a notch or orientation flat on the peripheral edge of the substrate W contacts the roller 42d to the housing 41.

[0097] As an example of a planar arrangement of the vibration transmission mechanism 70, as shown in Figure 8D, the vibration transmission mechanism 70 may be provided only on rollers 42c and 42b, which are positioned relatively far from the detection sensor 51 among the multiple rollers 42a to 42d. In this case, by amplifying the signals from rollers 42c and 42b, which are positioned relatively far from the detection sensor 51, the signals from each roller 42a to 42d can be equalized, making it possible to detect signals accurately with a single detection sensor 51.

[0098] As one modified example, as shown in Figure 8E, the vibration transmission mechanism 70 is provided only on rollers 42c and 42b, which are positioned relatively far from the detection sensor 51 among the plurality of rollers 42a to 42d, and at least the ends of the vibration transmission mechanism 70 on the rollers 42c and 42b side may be oriented so as to extend in a direction perpendicular to the tangent of the substrate W at the point where the substrate W contacts the rollers 42c and 42b in a plan view. In this case, the vibration transmission mechanism 70 can efficiently transmit vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W come into contact with the rollers 42c and 42b to the housing 41.

[0099] As another variation, as shown in Figure 8F, the vibration transmission mechanism 70 may be provided for each of the rollers 42a to 42d. In this case, the overall signal-to-noise ratio can be improved.

[0100] As another variation, as shown in Figure 8G, a vibration transmission mechanism 70 is provided for each of the rollers 42a to 42d, and a strain gauge 77 (hereinafter sometimes referred to as the "first strain gauge") is attached to each vibration transmission mechanism 70. The adjustment mechanism 74 may be configured to adjust the compression amount or effective length of the elastic body (not shown in Figure 8G) according to the value detected by the strain gauge 77. In this configuration, the signal detected by the strain gauge 77 can also be input to the rotation speed calculation unit 52 to calculate the rotation speed. Since no external noise is introduced, the signal-to-noise ratio can be improved.

[0101] Figure 10 is a block diagram showing a configuration in which the rotational speed of the substrate W (also called the actual rotational speed) is calculated based on sound or vibration detected by the detection sensor 51.

[0102] As shown in Figure 10, the rotational speed calculation unit 52 has a signal input unit 52a, a calculation unit 52b, and a result output unit 52c, and calculates the rotational speed (actual rotational speed) of the substrate W based on the sound or vibration detected by the detection sensor 51. Here, the rotational speed calculation unit 52 may calculate the rotational speed of the substrate W based on the fundamental wave of the sound detected by the detection sensor 51, or it may calculate the rotational speed of the substrate W based on the fundamental wave and harmonics of the sound detected by the detection sensor 51.

[0103] Figure 9 shows an example of a signal processing flow for calculating the rotational speed (actual rotational speed) of the substrate W based on sound or vibration detected by the detection sensor 51.

[0104] As shown in Figure 9, the rotational speed calculation unit 52 first amplifies the sound or vibration signal detected by the detection sensor 51 with an amplifier, then performs analog-to-digital (A / D) conversion, and then passes it through a bandpass filter (BPF) or high-pass filter (HPF). As an example, the sampling frequency fs = 10 kHz and sampling length Ts = 2 sec for A / D conversion, and the cutoff frequency fc = 2000 Hz for the HPF. Figure 12A is an example graph showing the raw waveform of the sound or vibration signal detected by the detection sensor 51 under normal conditions (i.e., the waveform before passing through the BPF or HPF), and Figure 12B is an example graph showing the waveform of the sound or vibration signal detected by the detection sensor 51 under normal conditions after passing through the BPF or HPF. Furthermore, Figure 13A is an example of a graph showing the raw waveform of the sound or vibration signal detected by the detection sensor during an abnormality, superimposed on the raw waveform of the sound or vibration signal detected by the detection sensor during normal operation. Figure 13B is an example of a graph showing the waveform of the sound or vibration signal detected by the detection sensor during an abnormality, after passing through a BPF or HPF, superimposed on the waveform of the sound or vibration signal detected by the detection sensor during normal operation after passing through a BPF or HPF. In Figures 13A and 13B, "×" indicates a point where a peak present during normal operation is absent during an abnormality, and "〇" indicates a point where a peak present during normal operation is added during an abnormality.

[0105] Next, the rotation speed calculation unit 52 performs envelope processing (also called envelope processing) by converting the signal that has passed through the HPF into an absolute value and then passing it through a low-pass filter (LPF). As an example, the cutoff frequency of the LPF is fc = 1000 Hz. Figure 12C is an example of a graph showing the waveform after the absolute value processing of the sound or vibration signal detected by the detection sensor 51 under normal conditions, and Figure 12D is an example of a graph showing the waveform after the LPF passed through the sound or vibration signal detected by the detection sensor 51 under normal conditions. Furthermore, Figure 13C is an example of a graph showing the waveform after the absolute value processing of the sound or vibration signal detected by the detection sensor under abnormal conditions superimposed on the waveform after the absolute value processing of the sound or vibration signal detected by the detection sensor under normal conditions, and Figure 13D is an example of a graph showing the waveform after the LPF passed through the sound or vibration signal detected by the detection sensor under abnormal conditions superimposed on the waveform after the LPF passed through the sound or vibration signal detected by the detection sensor under normal conditions. In Figures 13C and 13D, "×" indicates locations where a peak present in normal conditions is absent in abnormal conditions, and "〇" indicates locations where a peak present in normal conditions is added in abnormal conditions.

[0106] Next, the rotation speed calculation unit 52 performs a Fast Fourier Transform (FFT) on the signal that has passed through the LPF, for example, at 0 to 100 Hz, to generate a frequency spectrum. The rotation speed calculation unit 52 may also generate the frequency spectrum by averaging the results of multiple past FFT analyses. If averaging is not performed, the calculation can be performed in a shorter time. Figure 12E is an example of a graph showing the FFT analysis results of a sound signal detected by the detection sensor 51 under normal conditions. Figure 13E is a graph that shows the FFT analysis results of a sound or vibration signal detected by the detection sensor under abnormal conditions, superimposed on the FFT analysis results of the sound or vibration signal detected by the detection sensor under normal conditions. In Figure 13E, "×" indicates a point where a peak that was present under normal conditions is absent under abnormal conditions, and "〇" indicates a point where a peak that was not present under normal conditions is added under abnormal conditions. Referring to Figure 13E, comparing the FFT analysis results under normal conditions with those under abnormal conditions, the frequency (position coordinate on the horizontal axis) of the peak ("○") that appeared under abnormal conditions is lower than the frequency (position coordinate) of the peak ("△") under normal conditions. This indicates that the frequency component of the peak ("△") under normal conditions is smaller, suggesting that the rotation speed of the substrate W is lower under abnormal conditions compared to normal conditions.

[0107] Next, the rotation speed calculation unit 52 extracts peaks from the generated frequency spectrum (FFT analysis results) (for example, extracts the 1st to 5th peak frequencies), estimates the rotation frequency of the substrate W based on the extracted peak frequencies and the set value of the rotation speed of the substrate W obtained from the rotation speed setting unit 56 (also called the set rotation speed), and calculates the rotation speed of the substrate W (actual rotation speed) from the estimated rotation frequency T.

[0108] The rotation speed calculation unit 52 may change the cutoff frequency fc of the filter (i.e., BPF, HPF, or LPF) applied to the sound or vibration signal detected by the detection sensor 51, according to the set value (set rotation speed) of the rotation speed of the substrate W obtained from the rotation speed setting unit 56.

[0109] The rotation speed calculation unit 52 may change the cutoff frequency fc of the filter (i.e., BPF, HPF, or LPF) applied to the sound signal detected by the detection sensor 51, depending on the type of cleaning fluid (e.g., chemical solution, detergent, water, etc.) and the intrinsic values ​​of the structure (e.g., rollers 42a to 42d).

[0110] As shown in Figure 2, the substrate support device 50 according to this embodiment is further provided with a rotation speed setting unit 56, a display control unit 53, an abnormality determination unit 54, and an abnormality alarm unit 55.

[0111] The rotation speed setting unit 56 sets the set value (set rotation speed) of the rotation speed of the substrate W to the rotation drive units 43a and 43b. As described above, the rotation speed calculation unit 52 may calculate the rotation speed of the substrate W (actual rotation speed) by taking into account the set value (set rotation speed) of the rotation speed of the substrate W obtained from the rotation speed setting unit 56. The rotation speed setting unit 56 may be provided in the polishing control device 30 (see Figure 1).

[0112] The display control unit 53 displays the rotational speed calculated by the rotational speed calculation unit 52 on a display (not shown). The display control unit 53 may display the most recent rotational speed calculated by the rotational speed calculation unit 52 on the display, or it may average the past rotational speeds calculated by the rotational speed calculation unit 52 (for example, 10 times) and display the average value on the display.

[0113] The abnormality determination unit 54 determines whether or not there is an abnormality based on the rotational speed calculated by the rotational speed calculation unit 52. Here, the abnormality determination unit 54 may also determine whether or not there is an abnormality based on the average value of the past multiple (for example, 10) rotational speeds calculated by the rotational speed calculation unit 52. The abnormality determined by the abnormality determination unit 54 may be a rotational abnormality (for example, the occurrence of slip) or another abnormality (for example, a malfunction of the device).

[0114] Specifically, for example, the abnormality determination unit 54 calculates the difference or ratio between the rotational speed calculated by the rotational speed calculation unit 52 (actual rotational speed) and the set value of the rotational speed obtained from the rotational speed setting unit 56 (set rotational speed). If the difference or ratio exceeds a predetermined threshold (for example, if the actual rotational speed is 10% or more lower than the set rotational speed), it determines that there is a rotational abnormality (for example, slippage).

[0115] In the substrate support device 50, when the rollers 42a to 42d wear down and their diameter decreases, the peripheral speed of the rollers 42a to 42d decreases, and consequently, the rotation speed of the substrate W gradually slows down. Therefore, the abnormality determination unit 54 may calculate the difference or ratio between the rotation speed calculated by the rotation speed calculation unit 52 (actual rotation speed) and the set value of the rotation speed obtained from the rotation speed setting unit 56 (set rotation speed), and if the actual rotation speed is gradually decreasing compared to the set rotation speed, it may determine that there is an abnormality in the device (for example, wear of the rollers 42a to 42d).

[0116] Alternatively, for example, the abnormality determination unit 54 may determine that there is an abnormality (e.g., a crack in the wafer) if the rotational speed calculated by the rotational speed calculation unit 52 (actual rotational speed) is zero, and the set value of the rotational speed obtained from the rotational speed setting unit 56 (set rotational speed) is not zero, or if an abnormal sound is detected by the microphones 51a to 51c.

[0117] The abnormality detection unit 54 may determine whether or not there is an abnormality by considering fluctuations in the current flowing through the motor (not shown) that rotates the cleaning members 44a and 44b. In this case, by considering fluctuations in the current flowing through the motor (not shown) that rotates the cleaning members 44a and 44b, abnormalities in bearings and other components used in the rotation mechanism of the cleaning members 44a and 44b can be detected.

[0118] The abnormality detection unit 54 may determine whether or not there is an abnormality by taking into consideration fluctuations in the air pressure inside the housing 41 (for example, minute fluctuations in airflow near the notch or orientation flat).

[0119] The abnormality detection unit 54 may determine whether or not there is an abnormality by considering the fluctuation in the pressing force of the rollers 42a to 42d against the peripheral edge of the substrate W.

[0120] Referring to Figure 10, if the abnormality detection unit 54 determines that there is an abnormality, the abnormality detection unit 55 may issue an abnormality alert to the central control unit 61 or the cloud server 62, or it may send a stop signal to the rotary drive units 43a and 43b to instruct them to stop operation.

[0121] Furthermore, at least a portion of the rotation speed calculation unit 52, the display control unit 53, the abnormality determination unit 54, and the abnormality alarm unit 55 described above may be configured by one or more computers.

[0122] By the way, as mentioned in the section on the problems the invention aims to solve, conventionally, in order to determine whether or not slip has occurred between the substrate and the roller, there has been a method of measuring the actual rotational speed of the substrate by bringing an idler into contact with the peripheral edge of the substrate. However, this method has problems such as reduced cleaning performance and the occurrence of mismeasurements due to slip that occurs between the substrate and the idler.

[0123] Patent Document 1 discloses a technique in which vibrations generated in a roller when a notch or orientation flat of a rotating substrate comes into contact with the roller are detected by a vibration sensor attached to the roller, and it is determined whether or not slip has occurred between the substrate and the roller based on the detection of the vibrations. However, in this technique, the vibration sensor for detecting vibrations is directly attached to the roller, which presents maintenance problems.

[0124] To improve maintainability, one might consider mounting the sensor to the outer casing of the enclosure from the outside. However, in this case, there was a problem in that noise would be introduced from external equipment or from noise or vibration generated inside the enclosure that is unrelated to the rotation speed of the circuit board (for example, noise and vibration caused by the flow of cleaning fluid).

[0125] In contrast, according to the embodiment described above, the detection sensor 51 is located on the outside of the housing, resulting in good maintainability. Furthermore, the vibration transmission mechanism 70 is provided so as to extend from the rollers 42a to 42d or the rotation drive units 42a and 43d to the outer plate of the housing 41, and transmits vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d to the housing 41. Therefore, even though the detection sensor 51 is located on the outside of the housing 41, vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d are more easily transmitted to the detection sensor 51, improving the signal-to-noise ratio. Consequently, the detection accuracy of vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d can be improved, making it possible to accurately determine the rotation speed of the substrate W while improving maintainability. Furthermore, in this configuration, since the detection sensor 51 is located on the outside of the housing 41, waterproofing treatment of the detection sensor 51 is unnecessary, and even when a flammable cleaning solution is used inside the housing 41, explosion-proof treatment of the detection sensor 51 is unnecessary.

[0126] Furthermore, according to this embodiment, the natural frequency of the vibration transmission mechanism 70 is adjusted to correspond to the frequency of vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d. As a result, vibrations in the frequency band around the natural frequency are amplified, and vibrations in the higher frequency band are attenuated in the vibration transmission mechanism 70. Therefore, vibrations generated when the notches or orientation flats on the peripheral edge of the substrate W strike the rollers 42a to 42d can be amplified and transmitted to the housing 41, thereby improving the vibration detection accuracy of the detection sensor 51 located on the outside of the housing 41.

[0127] Furthermore, according to this embodiment, since a portion of the vibration transmission mechanism 70 in the longitudinal direction is composed of the elastic body 72, the natural frequency of the vibration transmission mechanism 70 is reduced. This makes it possible to transmit and amplify only low-frequency vibrations (vibrations caused by low rotational speeds).

[0128] Furthermore, according to this embodiment, since the elastic body 72 of the vibration transmission mechanism 70 is compressed, the rigidity of the elastic body 72 increases, and reflection at its joint is reduced. This makes it possible to reduce the loss of vibration transmission.

[0129] Furthermore, according to this embodiment, the compression amount or effective length of the elastic body 72 can be adjusted by the adjustment mechanism 74, thereby making it possible to appropriately adjust the natural frequency of the vibration transmission mechanism 70 to correspond to the frequency of vibrations generated when the notch or orientation flat at the peripheral edge of the substrate W comes into contact with the rollers 42a to 42d.

[0130] <Numerical Control System> Next, a numerical control system 100 according to one embodiment will be described.

[0131] Figure 14 is a functional block diagram showing an example of the functional configuration of a numerical control system 100 according to one embodiment. As shown in Figure 14, the numerical control system 100 includes a control device 30, a cleaning device 16, an estimation device 200, and a machine learning device 300. The control device 30, the cleaning device 16, the estimation device 200, and the machine learning device 300 may be directly connected to each other via a connection interface (not shown). Alternatively, they may be interconnected via a network (not shown), such as a LAN (Local Area Network) or the Internet.

[0132] The control device 30 is a numerical control device known to those skilled in the art, and generates operation commands based on control information and transmits the generated operation commands to the cleaning device 16. In this way, the control device 30 controls the operation of the cleaning device 16. The control device 30 also outputs the control information to the estimation device 200. The control information includes the cleaning recipe program and parameter values ​​set in the control device 30.

[0133] The control device 30 may store a list of identification information (hereinafter also referred to as "substrate ID") related to substrates that can be selected in the cleaning device 16 as a substrate data table in an HDD (Hard Disk Drive) or the like (not shown). The substrate data table may also include substrate information associated with each substrate ID. The cleaning device 16 feeds back information indicating the operating status based on the operation commands of the control device 30 to the control device 30.

[0134] Furthermore, the estimation device 200 may acquire vibration, sound, and strain data information selected by the operator of the control device 30 from the sensors of the cleaning device 16. The estimation device 200 can estimate the degree of rotational abnormality of the selected substrate by inputting the sensing data acquired from the sensors and information related to the rotation of the substrate into a trained model provided by the machine learning device 300, which will be described later.

[0135] The "substrate rotation abnormality level" indicates the degree of abnormality during the rotation of the substrate as it is rotated during the cleaning process by the cleaning device 16. The software in the control device 30 calculates the cumulative time over which the vibration sensing data during substrate rotation exceeds a pre-set "safety area" during a predetermined sensing period (e.g., 30 seconds). The abnormality level of the substrate rotation is then calculated as a percentage of the predetermined sensing period. For example, if the vibration sensing data during substrate rotation exceeds the "safety area" for 0 seconds during the predetermined sensing period of 30 seconds, the "substrate rotation abnormality level" will be "0%". If it exceeds the "safety area" for 3 seconds, the "substrate rotation abnormality level" may be "10%".

[0136] The "degree of abnormal board rotation" increases during high-speed rotation when board slippage is likely to occur, and can reach "100%" when the board needs to be reworked.

[0137] Figure 15 shows an example of a trained model provided from the machine learning device 300 to the estimation device 200. Here, the trained model is exemplified as a multilayer neural network, as shown in Figure 15, which takes basic processing conditions such as the rotation period of the substrate and background information, and sensing information such as vibration obtained when any selected substrate is rotated as input data to the input layer, and outputs data from the output layer that indicates the degree of abnormality of the substrate rotation when a specific sensing signal is obtained under a specific rotation speed.

[0138] In the example shown in Figure 15, the trained model is a multilayer neural network that uses basic processing conditions such as the rotation period of the substrate and background information, as well as sensing information such as vibrations obtained when any selected substrate is rotated, as input data to the input layer, and outputs data from the output layer indicating the degree of abnormality of the substrate rotation when a specific sensing signal is obtained under a specific rotation speed. However, the model is not limited to this configuration.

[0139] Next, a machine learning device 300 that constructs such a trained model will be described. The machine learning device 300 is implemented by one or more computers. As shown in Figure 14, the machine learning device 300 includes an input data acquisition unit 310, a label acquisition unit 320, a training unit 330, and a storage unit 340.

[0140] Of these, the memory unit 340 is a RAM (Random Access Memory) or the like, and stores input data acquired by the input data acquisition unit 310, label data acquired by the label acquisition unit 320, and trained models constructed by the learning unit 300.

[0141] The input data acquisition unit 310 acquires past data (sensing data) obtained by a detection sensor as input data. This data is acquired when a substrate, whose peripheral edge is held by rollers, is rotated within the housing of the cleaning device 15. The vibrations generated when the notches or orientation flats on the peripheral edge of the substrate come into contact with the rollers are transmitted to the housing via a vibration transmission mechanism. The data is then based on at least one of the sounds, vibrations, and distortions emanating from the housing. The input data can be a moving average of the data obtained by the detection sensor based on at least one of the sounds, vibrations, and distortions over a predetermined period from a time prior to an arbitrarily set reference time to that reference time.

[0142] The memory unit 340 has data pre-stored in the input data indicating the degree of abnormality of the board rotation based on sensing data, and the label acquisition unit 320 acquires this as label data (correct data).

[0143] The learning unit 330 accepts the above-mentioned input data and label pair as training data (teacher data), and uses the accepted training data to perform supervised learning, thereby constructing a trained model that estimates the degree of abnormality of substrate rotation during substrate rotation based on substrate rotation speed data for the workpiece to be cleaned and sensing data for the selected substrate. In one embodiment, the learning unit 330 identifies whether the source of vibration during substrate rotation is a notch or an orientation flat, and then uses data obtained from a detection sensor based on at least one of the sound, vibration, and distortion generated from the housing corresponding to the type of source, in association with the degree of rotational abnormality of the substrate, as teacher data for learning. This is preferable because it allows for effective learning of the presence or absence of vibration abnormalities from the teacher data, thereby achieving highly accurate estimation of the rotational abnormality level. The notch and orientation flat have different cutout shapes on the outer circumference of the wafer. Since a notch is a small indentation on the outer edge of the wafer, the change in sensing data occurs instantaneously once when it passes through the roller. However, since an orientation flat is a curved section of the outer edge of the wafer, the change in sensing data occurs twice with a short time interval when it passes through the roller. The memory unit 340 stores the time change patterns of the sensing data for both the notch and the orientation flat in advance, and the learning unit 330 acquires these and compares them with the sensing data to determine whether it is a notch or an orientation flat.

[0144] Furthermore, the learning unit 330 within the machine learning device 300 may update the previously constructed model by performing further supervised learning on the trained model if new training data is acquired after the trained model has been constructed.

[0145] Furthermore, the trained model may be shared with other machine learning devices (not shown). By sharing the trained model among multiple machine learning devices 300, it becomes possible to perform supervised learning in a distributed manner across each machine learning device 300, thereby improving the efficiency of supervised learning.

[0146] Although embodiments and modifications of the present invention have been described above by example, the scope of the present invention is not limited thereto, and it is possible to modify and transform it according to the purpose within the scope described in the claims. Furthermore, each embodiment and modification can be appropriately combined as long as the processing content is not contradictory. [Explanation of symbols]

[0147] 1. Substrate processing equipment (polishing equipment) 10 Housing 12 Load Ports 14a~14d Polishing Unit 16 Washing device 16a First cleaning unit (cleaning device) 16b Second cleaning unit (cleaning device) 20 drying units 22. First Transport Robot 24 Conveyor Units 26. Second Transport Robot 28. Third Transport Robot 30 Polishing control device 41 cabinets 42a~42d Laura 43a, 43b Rotary drive unit 44a, 44b Cleaning members 45 Cleaning solution supply nozzle 50 Substrate support device 51 detection sensors 52 Rotational speed calculation unit 53 Display Control Unit 54 Abnormality determination section 55 Abnormality reporting department 56 Rotation speed setting section 61 Central Control Unit 62 Cloud Servers 70 Vibration transmission mechanism 72 Elastic body 74 Adjustment mechanism

Claims

1. A substrate support device, Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A vibration transmission mechanism is provided in a plan view so as to extend from the roller or rotation drive unit to the side wall of the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the side wall of the housing. A detection sensor is positioned on the outside of the side wall of the housing and detects at least one of sound, vibration, and distortion generated from the housing and outputs a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, A substrate support device characterized by comprising the following features.

2. The natural frequency of the vibration transmission mechanism is adjusted to correspond to the frequency of vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller. The substrate support device according to feature 1.

3. A portion of the vibration transmission mechanism in the longitudinal direction is made of an elastic material. A substrate support device according to claim 1 or 2, characterized by the above.

4. The elastic body is compressed. The substrate support device according to feature 3.

5. The elastic body has an adjustment mechanism for adjusting the amount of compression or effective length of the elastic body. A substrate support device according to feature 3 or 4.

6. The adjustment mechanism refers to a database in which the correspondence between rotational speed and compression amount or effective length is stored in advance, and adjusts the compression amount or effective length of the elastic body so that it matches the compression amount or effective length stored in the database according to the set value of the rotational speed of the substrate. The substrate support device according to feature 5.

7. The adjustment mechanism adjusts the compression amount or effective length of the elastic body according to the value detected by the first strain gauge attached to a part of the longitudinal direction of the vibration transmission mechanism. The substrate support device according to feature 5.

8. The adjustment mechanism adjusts the amount of compression or the effective length of the elastic body according to the frequency of the signal output from the detection sensor. The substrate support device according to feature 5.

9. The adjustment mechanism refers to a database in which the correspondence between rotational speed and compression amount or effective length is stored in advance, and adjusts the compression amount or effective length of the elastic body so that it matches the compression amount or effective length stored in the database according to the rotational speed calculated by the rotational speed calculation unit. The substrate support device according to feature 8.

10. The detection sensor is at least one of a microphone, a vibration sensor, and a second strain gauge attached to the housing. A substrate support device according to any one of the features 1 to 9.

11. At least the end of the vibration transmission mechanism on the roller or rotational drive unit side is oriented so as to extend in a direction perpendicular to the tangent to the substrate at the point where the substrate contacts the roller, in a plan view. A substrate support device according to any one of the features 1 to 10.

12. The rotation speed calculation unit calculates the rotation speed of the substrate based on the fundamental wave and harmonics of the signal. A substrate support device according to any one of claims 1 to 11.

13. The rotation drive unit further includes a rotation speed setting unit for setting a set value for the rotation speed of the substrate, The rotation speed calculation unit calculates the rotation speed of the substrate, taking into consideration the setting value obtained from the rotation speed setting unit. A substrate support device according to any one of claims 1 to 12.

14. The system further includes a display control unit that displays the rotation speed calculated by the rotation speed calculation unit on a display. A substrate support device according to any one of the features 1 to 13.

15. The display control unit averages the past rotation speeds calculated by the rotation speed calculation unit and displays them on the display. The substrate support device according to feature 14.

16. The system further includes an abnormality determination unit that determines whether or not there is an abnormality based on the rotation speed calculated by the rotation speed calculation unit. A substrate support device according to any one of claims 1 to 15.

17. The abnormality determination unit determines whether or not there is an abnormality based on the average value of the past multiple rotation speeds calculated by the rotation speed calculation unit. The substrate support device according to claim 16.

18. The system further includes an abnormality alarm unit that, if the abnormality detection unit determines that an abnormality exists, issues an abnormality alarm and / or instructs the rotary drive unit to stop. The substrate support device according to claim 16 or 17.

19. The abnormality determination unit calculates the difference or ratio between the rotational speed calculated by the rotational speed calculation unit and the set value obtained from the rotational speed setting unit, and determines that there is an abnormality if the difference or ratio exceeds a predetermined threshold. A substrate support device according to any one of claims 16 to 18, referring to feature 13.

20. The abnormality determination unit determines that there is an abnormality if the rotational speed calculated by the rotational speed calculation unit is zero and the setting value obtained from the rotational speed setting unit is not zero, or if an abnormality signal is output from the detection sensor. A substrate support device according to any one of claims 16 to 19, referring to feature 13.

21. The abnormality detection unit determines whether or not there is an abnormality by considering fluctuations in the current flowing to the motor that rotates the cleaning member. A substrate support device according to any one of claims 16 to 20.

22. The abnormality detection unit determines whether or not there is an abnormality by taking into account fluctuations in the air pressure inside the housing. A substrate support device according to any one of claims 16 to 21.

23. The rotation speed calculation unit changes the cutoff frequency of the filter applied to the signal according to the set value. The substrate support device according to feature 13.

24. Multiple rollers that hold the peripheral edge of the substrate, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A cleaning member that contacts the substrate and cleans the substrate, A cleaning solution supply nozzle for supplying cleaning solution to the substrate, A housing that houses the plurality of rollers, the cleaning member, and the cleaning liquid supply nozzle, A vibration transmission mechanism is provided in a plan view so as to extend from the roller or rotation drive unit to the side wall of the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the side wall of the housing. A detection sensor is positioned on the outside of the side wall of the housing and detects at least one of sound, vibration, and distortion generated from the housing and outputs a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, has A polishing apparatus characterized by the following features.

25. Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A device for calculating the rotational speed of a substrate in a substrate support device equipped with the following: A vibration transmission mechanism is provided in a plan view so as to extend from the roller or rotation drive unit to the side wall of the housing, and transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the side wall of the housing. A detection sensor is positioned on the outside of the side wall of the housing and detects at least one of sound, vibration, and distortion generated from the housing and outputs a corresponding signal. A rotation speed calculation unit calculates the rotation speed of the substrate based on the signal output from the detection sensor, An apparatus characterized by being equipped with

26. Multiple rollers are arranged inside the enclosure to hold the peripheral edge of the circuit board, A rotation drive unit that rotates the substrate by rotating the plurality of rollers, A method for calculating the rotational speed of a substrate in a substrate support device equipped with the following: A vibration transmission mechanism provided to extend from the roller or rotary drive unit to the side wall of the housing in a plan view transmits vibrations generated when a notch or orientation flat on the peripheral edge of the substrate strikes the roller to the side wall of the housing to the side wall of the housing. The steps include: detecting at least one of sound, vibration, and distortion emanating from the housing using a detection sensor positioned on the outside of the side wall of the housing, and outputting a corresponding signal; The steps include: calculating the rotation speed of the substrate based on the signal output from the detection sensor; A method characterized by including the following.

27. The step of adjusting at least one of the material, length, cross-sectional shape, and mass added to the vibration transmission mechanism so that the natural frequency of the vibration transmission mechanism corresponds to the frequency of vibrations generated when the notch or orientation flat on the peripheral edge of the substrate strikes the roller. The method according to 26, further comprising:

28. A data acquisition unit acquires data obtained from a detection sensor located outside the side wall of the housing as input data, based on at least one of the sound, vibration, and distortion generated from the housing. This vibration is transmitted to the side wall of the housing via a vibration transmission mechanism provided to extend from the roller or the rotation drive unit that rotates the roller to the side wall of the housing in a plan view. The data acquisition unit acquires data obtained from a detection sensor located outside the side wall of the housing as input data. A label acquisition unit acquires label data indicating the degree of rotational abnormality during substrate rotation based on the substrate rotation conditions included in the input data. A learning unit that performs supervised learning and generates a trained model using the input data acquired by the input data acquisition unit and the label data acquired by the label acquisition unit, A machine learning device equipped with the following features.

29. A machine learning device according to claim 28, characterized in that the input data is a moving average of data obtained by a detection sensor based on at least one of sound, vibration, and distortion over a predetermined period from a time prior to a reference time to the reference time.

30. A machine learning apparatus according to claim 28, wherein the learning unit identifies whether the source of vibration during substrate rotation is a notch or an orientation flat, and learns by associating data obtained from a detection sensor with the degree of rotation abnormality based on at least one of the sound, vibration, and distortion generated from the housing corresponding to the type of source, as training data.

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