Wiping device, wiping method, and liquid dispensing device

Abstract

To provide a wiping device that can efficiently wipe ink tightly adhering to a nozzle surface and suppress poor discharge due to wiping.SOLUTION: The wiping device comprises wiping means that wipes a nozzle surface 41 in a liquid discharge head 4, which is configured to apply washing liquid to the wiping means, press the wiping means against the nozzle surface and wipe the nozzle surface by moving the liquid discharge head and the wiping means relatively. The wiping means is an absorber 320 that can absorb the washing liquid, where a predetermined application quantity of the washing liquid is 50 μg / cm2 or mere and 150 μg / cm2 or less, and linear pressure of the wiping means at the time when the wiping means is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to a wiping device, a wiping method, and a liquid dispensing device. [Background technology]

[0002] In liquid ejection devices such as inkjet printers, foreign matter on the nozzle formation surface can cause malfunctions such as poor ejection, requiring periodic cleaning. A known method for cleaning the nozzle formation surface involves combining a long sheet-like absorbent material, such as nonwoven or woven fabric, with the nozzle formation surface.

[0003] Patent Document 1 discloses a wiping means for wiping the nozzle surface of a discharge head, which includes protruding fibers, wherein the protruding fibers have a protruding shape in a cross section perpendicular to the fiber axis, and the protruding shape is continuous in the direction of the fiber axis. According to Patent Document 1, this can improve wiping performance.

[0004] Patent Document 2 discloses a cleaning device that applies a cleaning solution to an absorbent wiping member and cleans the nozzle surface by running the wiping member, and also discloses a detection means for detecting the amount of light reflected from the wiping member to which the cleaning solution has been applied. According to Patent Document 2, by detecting that the wiping member has been applied a cleaning solution, it is possible to prevent cleaning in a dry wiping state. [Overview of the project] [Problems that the invention aims to solve]

[0005] However, when using an absorbent wiping means to wipe the nozzle surface with a cleaning solution, there was a problem of discharge failure caused by the wiping process. For example, when wiping away dried ink, increasing the amount of cleaning solution to wipe efficiently resulted in excessive application of the cleaning solution to the nozzle surface, which affected ink discharge. On the other hand, reducing the amount of cleaning solution to avoid discharge failure made efficient wiping impossible. There was a trade-off between wiping away dried ink from the nozzle surface and the resulting discharge failure, which could not be achieved with conventional technology. Furthermore, repeated wiping of the nozzle surface could cause damage to the nozzle surface, and this damage could affect the discharge failure.

[0006] Therefore, the present invention aims to provide a wiping device that can efficiently wipe away ink adhering to the nozzle surface and suppress ejection failures caused by wiping. [Means for solving the problem]

[0007] To solve the above problems, the present invention provides a wiping device having a wiping means for wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, wherein the wiping means is an absorbent capable of absorbing the cleaning liquid, and the amount of cleaning liquid applied, determined as follows, is 50 μg / cm³. 2 More than 150μg / cm 2 The following: The required coating efficiency is 2% to 7% as follows: The wiping means is characterized in that the linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Coating amount of cleaning liquid (μg / cm 2 ) = {Weight of slide glass after wiping (μg) - Weight of slide glass before wiping (μg)} / Area of slide glass (cm 2 ) [Application efficiency] The coating efficiency is determined as follows when X mg of the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the glass slide to wipe. However, the conditions for determining the coating efficiency are the same as those for wiping the nozzle surface, except that the glass slide is wiped once. Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / X (mg)] × 100

Advantages of the Invention

[0008] According to the present invention, it is possible to provide a wiping device that can efficiently wipe the ink stuck to the nozzle surface and suppress ejection failure caused by wiping.

Brief Description of the Drawings

[0009] [Figure 1] It is a diagram schematically showing an example of an image forming apparatus incorporating a wiping device. [Figure 2] It is a diagram schematically showing an example of the nozzle surface of a liquid ejection head. [Figure 3] It is a diagram schematically showing an example of a wiping device. [Figure 4] It is a diagram for schematically explaining a method for measuring the coating amount of the cleaning liquid.

Embodiments for Carrying Out the Invention

[0010] Hereinafter, a wiping device, a wiping method, and a liquid ejection device according to the present invention will be described with reference to the drawings. Note that the present invention is not limited to the embodiments shown below, and can be changed within the scope that those skilled in the art can conceive, such as other embodiments, additions, modifications, deletions, etc., and as long as the functions and effects of the present invention are achieved in any aspect, it is included in the scope of the present invention.

[0011] The wiping device of the present invention has wiping means for wiping the nozzle surface in a liquid discharge head that discharges a liquid composition from nozzles formed on the nozzle surface. The wiping means is provided with a cleaning liquid, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by relative movement of the liquid discharge head and the wiping means. The wiping means is an absorber capable of absorbing the cleaning liquid, and the amount of the cleaning liquid applied as determined below is 50 μg / cm 2 or more and 150 μg / cm 2 or less. When the wiping means is pressed against the nozzle surface to wipe the nozzle surface, the linear pressure of the wiping means is 0.6 N / cm or less.

[0012] The wiping method of the present invention has a wiping step of wiping the nozzle surface in a liquid discharge head that discharges a liquid composition from nozzles formed on the nozzle surface with wiping means. The wiping means is provided with a cleaning liquid, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by relative movement of the liquid discharge head and the wiping means. The wiping means is an absorber capable of absorbing the cleaning liquid, and the amount of the cleaning liquid applied as determined below is 50 μg / cm 2 or more and 150 μg / cm 2 or less. When the wiping means is pressed against the nozzle surface to wipe the nozzle surface, the linear pressure of the wiping means is 0.6 N / cm or less.

[0013] The liquid discharge device of the present invention includes a liquid discharge head that discharges a liquid composition from nozzles formed on a nozzle surface, and wiping means for wiping the nozzle surface in the liquid discharge head. The wiping means is provided with a cleaning liquid, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by relative movement of the liquid discharge head and the wiping means. The wiping means is an absorber capable of absorbing the cleaning liquid, and the amount of the cleaning liquid applied as determined below is 50 μg / cm 2 or more and 150 μg / cm 2The following is the case, characterized in that the linear pressure of the wiping means when the wiping means is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less.

[0014] [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Cleaning solution application amount (μg / cm²) 2 ) = {Weight of the slide glass after wiping (μg) - Weight of the slide glass before wiping (μg)} / Area of ​​the slide glass (cm²) 2 )

[0015] Figure 1 illustrates an example of a liquid dispensing device. Here, a serial-type liquid dispensing device is used as an example.

[0016] In this example, the liquid dispensing device holds the carriage 3 movably by a main guide member 1 and a secondary guide member horizontally mounted on the left and right side plates. The carriage 3 reciprocates in the main scanning direction via a timing belt 8 stretched between a drive pulley 6 and a driven pulley 7, driven by a main scanning motor 5. The main scanning direction may also be referred to as the carriage movement direction.

[0017] Carriage 3 is equipped with liquid ejection heads 4a and 4b. When liquid ejection heads 4a and 4b are not distinguished, they may be referred to as liquid ejection head 4. The liquid ejection head ejects a liquid composition from nozzles formed on its nozzle surface. Liquid ejection head 4 ejects ink droplets of various colors, such as yellow (Y), cyan (C), magenta (M), and black (K). Carriage 3 is equipped with liquid ejection head 4 such that the direction of ink droplet ejection from liquid ejection head 4 is downward.

[0018] As shown in Figure 2, the liquid discharge head 4 has two nozzle rows Na and Nb, each consisting of multiple nozzles 4n. Furthermore, the nozzle rows 4n of the liquid discharge head 4 are arranged in a sub-scanning direction perpendicular to the main scanning direction.

[0019] As the liquid ejection head 4, for example, a piezoelectric actuator such as a piezoelectric element, or a thermal actuator that utilizes a phase change due to film boiling of a liquid using an electrothermal conversion element such as a heating resistor, can be used. As the liquid ejection head, for example, an inkjet head can be used.

[0020] The liquid dispensing device in this example is equipped with a conveyor belt 12, which is a conveying means for transporting paper 10. The conveyor belt 12 transports the paper 10 by electrostatic attraction, for example, to a position facing the liquid dispensing head 4. The conveyor belt 12 is, for example, an endless belt and is stretched between the conveyor roller 13 and the tension roller 14.

[0021] The conveyor roller 13 is rotationally driven by the sub-scanning motor 16 via the timing belt 17 and timing pulley 18. As the conveyor roller 13 is rotationally driven, the conveyor belt 12 moves in a circular motion in the sub-scanning direction. As the conveyor belt 12 moves in a circular motion, it is charged (charged) by the charging roller.

[0022] In this example of a liquid dispensing device, the maintenance and recovery mechanism 20 is located on one side of the carriage 3 in the main scanning direction and to the side of the conveyor belt 12. The maintenance and recovery mechanism 20 maintains and recovers the liquid dispensing head 4. Furthermore, in the liquid dispensing device of this example, the empty discharge receiver 21 is located on the other side of the carriage 3 in the main scanning direction, and to the side of the conveyor belt 12. The empty discharge receiver 21 receives empty liquid from the liquid dispensing head 4.

[0023] The maintenance and recovery mechanism 20 includes, for example, a cap member 20a, a wiping device 20b, and an empty discharge receiver 21. The cap member 20a caps the nozzle surface of the liquid discharge head 4. The wiping device 20b wipes the nozzle surface. The empty discharge receiver 21 receives droplets that do not contribute to image formation. The nozzle surface is the surface on which the nozzle is formed, and may also be referred to as the nozzle-forming surface.

[0024] In this example, an encoder scale 23 with a predetermined pattern is stretched between the plates on both sides of the carriage 3 along the main scanning direction. The carriage 3 is equipped with an encoder sensor 24, which consists of a transmissive photosensor that reads the pattern on the encoder scale 23. The encoder scale 23 and the encoder sensor 24 constitute a linear encoder (main scanning encoder) that detects the movement of the carriage 3.

[0025] Furthermore, a code wheel 25 is attached to the shaft of the conveyor roller 13. An encoder sensor 26, which consists of a transmissive photosensor that detects the formed pattern, is provided on this code wheel 25. The code wheel 25 and the encoder sensor 26 constitute a rotary encoder (sub-scan encoder) that detects the amount of movement and the position of movement of the conveyor belt 12.

[0026] In the liquid dispensing device of this example, for example, paper 10 is fed from a paper tray. The paper 10 is attracted onto a charged transport belt 12 and transported in the sub-scanning direction by the circumferential movement of the transport belt 12.

[0027] In this example, the liquid ejection device moves the carriage 3 in the main scanning direction and drives the liquid ejection head 4 in accordance with the image signal, ejecting ink droplets onto the stationary paper 10 to record one line. Next, after transporting a predetermined amount of paper 10, it records the next line. Upon receiving a recording completion signal or a signal that the rear end of the paper 10 has reached the recording area, the recording operation ends and the paper 10 is ejected into the output tray.

[0028] When cleaning the liquid ejection head, the carriage is moved to the maintenance and recovery mechanism 20 while the printer is in print (record) standby mode, and the maintenance and recovery mechanism 20 performs the cleaning. The maintenance and recovery mechanism 20 may also be referred to as the cleaning unit.

[0029] Figure 2 illustrates an example of the nozzle surface of a liquid dispensing head. The liquid dispensing head 4 shown in Figure 1 has two nozzle rows Na and Nb, each consisting of multiple nozzles 4n. For example, one nozzle row Na of liquid dispensing head 4a dispenses black (K) droplets, and the other nozzle row Nb dispenses cyan (C) droplets. In this case, for example, one nozzle row Na of liquid dispensing head 4b dispenses magenta (M) droplets, and the other nozzle row Nb dispenses yellow (Y) droplets.

[0030] Preferably, a water-repellent film is formed on the nozzle surface 41 of the liquid discharge head 4.

[0031] Next, a detailed example of the wiping device of this embodiment will be described. The wiping device of this embodiment has a wiping means for wiping the nozzle surface of a liquid discharge head, and a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the nozzle surface and the wiping means.

[0032] Figure 3 is a schematic diagram illustrating an example of the wiping device of this embodiment. The wiping device in this example includes an absorbent 320, a pressing roller 400, a feeding roller 410, a winding roller 420, and a cleaning fluid application unit 430.

[0033] The absorbent body 320 is an example of a wiping means, and here it is in the form of a sheet. The shape, number, size, etc. of the wiping means are not limited thereto and can be changed as appropriate. The wiping means may also be called a wiping member or the like. The feed roller 410 feeds out the sheet-like absorbent material 320. The pressing roller 400 presses the dispensed absorbent 320 against the nozzle surface 41. The winding roller 420 winds up and collects the absorbent material 320 that has been used for wiping.

[0034] The cleaning solution application unit 430 applies the cleaning solution to the absorbent body 320. The method of application is not particularly limited; for example, the cleaning solution can be dropped onto the absorbent body 320. Other methods include spray coating the cleaning solution, dispensing the cleaning solution, or applying the cleaning solution using a roller or the like.

[0035] Furthermore, the wiping device in this example may have, in addition to the absorbent body 320, a rubber blade or the like for wiping the nozzle surface. If the wiping device in this example has a rubber blade or the like, the absorbent body 320 may be brought into contact with the rubber blade or the like for cleaning.

[0036] The pressing roller 400 presses the absorbent 320 against the nozzle surface using a biasing means, such as a spring. For example, in a liquid discharge device, the pressing force of the wiping device can be adjusted by adjusting the distance between the wiping device and the nozzle surface. Alternatively, the pressing force of the wiping device can be adjusted by adjusting the biasing force of the biasing means.

[0037] In this example, a pressing roller 400 is used as the pressing member that presses the absorbent against the nozzle surface, but this is not the only option, and other materials can be used as appropriate. Other materials that can be used as the pressing member include, for example, a pad-shaped resin or rubber material.

[0038] In this embodiment, the linear pressure of the wiping means when it is pressed against the nozzle surface to wipe it is 0.6 N / cm or less. By keeping the linear pressure at 0.6 N / cm or less, damage to the nozzle surface caused by wiping can be suppressed. If the linear pressure exceeds 0.6 N / cm, repeated wiping will cause damage to the nozzle surface, affecting the discharge of the liquid composition.

[0039] The linear pressure of the wiping means is determined by measuring the pressing load using the I-SCAN surface pressure distribution measurement system (Nitta Corporation) and dividing it by the pressing width. The method of measuring the pressing load is not limited to this; methods such as direct measurement using a load cell are also acceptable. In addition to direct measurement, if a load is applied using a spring or the like, methods such as indirect calculation from the spring constant and the amount of penetration are also acceptable.

[0040] In this example, the wiping device applies cleaning solution to the absorbent body 320, then uses a pressing roller 400 to press the absorbent body 320 against the nozzle surface 41, moving the absorbent body 320 in the direction of the arrow in the figure, for example. This wipes away foreign matter 500 from the nozzle surface 41.

[0041] The direction of wiping is not particularly limited, as long as the liquid discharge head 4 and the wiping means (absorbent 320) move relative to each other. The liquid discharge head 4 may be moved, the wiping means may be moved, or the wiping device may be moved. Furthermore, the direction in which the absorbent 320 is pressed can be selected as appropriate, for example, by pressing the absorbent 320 from vertically downwards upwards.

[0042] Examples of foreign matter 500 adhering to the nozzle surface include mist ink generated when ink is ejected from the nozzle, ink that adheres when ink is sucked out from the nozzle during cleaning, solidified ink that has dried on the nozzle surface from mist ink or ink that has adhered to the cap component, and paper dust generated from the recording medium.

[0043] In this embodiment, the amount of cleaning solution applied from the absorbent to the nozzle surface during wiping is 50 μg / cm³. 2 More than 150μg / cm 2 The following applies: By applying the cleaning solution within this range, the ink adhering to the nozzle surface can be sufficiently swollen when wiping it away, enabling efficient wiping. Furthermore, applying the cleaning solution within this range helps suppress ejection problems caused by wiping. For example, the cleaning solution application amount is 150 μg / cm³. 2If the amount exceeds a certain limit, excessive cleaning solution will be applied to the nozzle surface during wiping, and a large amount of cleaning solution will remain on the nozzle surface even after wiping. The cleaning solution remaining on the nozzle surface after wiping can cause irregularities in the discharge of the liquid composition or even failure to discharge the liquid composition when it is dispensed from the nozzle. In addition, foreign matter such as air bubbles can enter the nozzle along with the excess cleaning solution, causing dispensing problems such as failure to discharge.

[0044] The amount of cleaning solution to be applied is determined as follows. The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Cleaning solution application amount (μg / cm²) 2 ) = {Weight of the slide glass after wiping (μg) - Weight of the slide glass before wiping (μg)} / Area of ​​the slide glass (cm²) 2 )

[0045] The conditions for calculating the amount of cleaning solution to be applied are the same as those for actually wiping the nozzle surface, except that the wiping is performed once on a slide glass instead of the nozzle plate. Examples of the conditions for calculating the amount of cleaning solution to be applied and the conditions for wiping the nozzle surface include the amount of cleaning solution dropped onto the wiping device, the linear pressure of the wiping device, the wiping speed, the wiping direction, the direction in which the wiping device is pressed, and the type of absorbent. Therefore, it is difficult to specify a particular value here for the conditions for determining the amount of cleaning solution to be applied, but for example, the amount of cleaning solution to be applied can be calculated by dropping 60 mg of cleaning solution onto the wiping device and wiping the slide glass once with a linear pressure of 0.4 N / cm. The wiping direction can be, for example, the longitudinal direction of the slide glass.

[0046] Figure 4 shows a schematic diagram to explain the method for measuring the amount of cleaning solution applied. First, as shown in Figure 4(a), the cleaning solution 510 is dropped onto the absorbent 320. Next, as shown in Figure 4(b), the absorbent 320 is pressed against the slide glass 520 using the pressure roller 400, and the slide glass 520 is wiped in the longitudinal direction. The linear pressure at this time is 0.4 N / cm. The absorbent 320 is pressed against the slide glass from below in a vertical direction upward. Then, as shown in Figure 4(c), the cleaning solution 510 is applied to the slide glass 520. The amount of cleaning solution applied can be determined by calculating the weight of the applied cleaning solution from the weight of the slide before and after application, and dividing it by the area of ​​the slide glass.

[0047] Furthermore, the above calculation of the cleaning solution application amount uses a microscope slide because it is used as a simulated nozzle plate for the liquid discharge head. If it is possible to measure the weight of the cleaning solution applied to the nozzle surface of the liquid discharge head, the cleaning solution application amount may be calculated using the actual nozzle plate or liquid discharge head. In this case, the cleaning solution application amount may be expressed as follows. Cleaning solution application amount (μg / cm²) 2 ) = Weight of cleaning solution applied to the nozzle plate (μg) / Area of ​​the nozzle plate (cm²) 2 )

[0048] The wiping means preferably has an application efficiency of 2% to 7% for the cleaning solution applied from the absorbent to the nozzle surface. When the application efficiency of the cleaning solution is within the above range, the cleaning solution applied to the absorbent is used efficiently, and it is possible to prevent an excessive amount of cleaning solution from being applied to the nozzle surface.

[0049] The coating efficiency of the cleaning solution can be determined, for example, as follows. The coating efficiency is determined as follows when X mg of the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / X (mg)] × 100

[0050] Similar to calculating the amount of cleaning solution applied, the conditions for calculating the application efficiency are the same as those for actually wiping the nozzle surface, except that the surface being wiped is a slide glass, not a nozzle plate, and the wiping is performed once. Examples of the conditions for calculating the application efficiency and the conditions for wiping the nozzle surface that should be the same include the amount of cleaning solution dropped onto the wiping means, the linear pressure of the wiping means, the wiping speed, the wiping direction, the direction in which the wiping means is pressed, and the type of absorbent. Therefore, it is difficult to specify a particular value here for the conditions for determining the application efficiency, but one example is calculating the application efficiency under the condition that 60 mg of cleaning solution is dropped onto the wiping means and the slide glass is wiped once with a linear pressure of 0.4 N / cm. In addition, similar to the above-mentioned amount of cleaning solution to be applied, the calculation may be performed using the actual nozzle plate or similar device instead of a microscope slide.

[0051] To ensure that the amount and efficiency of the cleaning solution applied from the absorbent to the nozzle surface during wiping are within the above range, methods such as adjusting the material, thickness, and density of the absorbent, or adjusting the linear pressure, can be used.

[0052] The wiping device of this embodiment may include a driven roller that moves with the absorbent material, and a control unit that reads the amount of rotation of the driven roller and controls the rotation of the winding roller. By including these, the wiping device can be given a function to control the amount of absorbent material transported. By controlling the amount of absorbent material transported, the wiping location of the absorbent material can be adjusted as appropriate.

[0053] For controlling the amount of absorbent material being transported, a function to read the amount of absorbent material being transported is sufficient, and this function is not limited to driven rollers as described above. Alternatively, a method could be used where sensors read markings placed at regular intervals in the direction of the absorbent material's transport.

[0054] The absorbent material can be selected as appropriate, and it is preferable to use, for example, a nonwoven fabric, woven fabric, or knitted fabric that can absorb liquids such as ink. In particular, it is preferable to use a nonwoven fabric, as it is easy to blend various types of fibers.

[0055] Examples of fiber materials used in nonwoven, woven, and knitted fabrics include cotton, linen, silk, pulp, nylon, vinylon, polyester, polypropylene, polyethylene, rayon, cupro, acrylic, and polylactic acid.

[0056] The fiber shape is not particularly limited and can be selected as appropriate. For example, microfibers with a fiber diameter of several micrometers or nanofibers on the nano-order can be used, and filaments with cross-sectional shapes other than circular can also be used.

[0057] The absorbent material is not limited to nonwoven fabrics, woven fabrics, or knitted fabrics made of a single type of fiber, but may also be nonwoven fabrics, woven fabrics, or knitted fabrics made of multiple types of fibers. The fiber material can be appropriately selected and includes natural fibers, regenerated fibers, and synthetic fibers, with a preference for including natural fibers or regenerated fibers and synthetic fibers. By combining natural fibers or regenerated fibers, which have good water absorption, with synthetic fibers, which have poorer water absorption compared to these, it becomes easier to adjust the amount of cleaning solution applied from the absorbent material to the nozzle surface.

[0058] Among the above, it is preferable that the nonwoven fabric uses multiple types of fibers, and more preferably that it contains natural or regenerated fibers and synthetic fibers. Being a nonwoven fabric makes it easy to blend various types of fibers, and as mentioned above, it makes it easier to adjust the amount of cleaning solution applied from the absorbent to the nozzle surface.

[0059] When natural or regenerated fibers and synthetic fibers are included, the blending ratio can be selected as appropriate. For example, it is preferable that synthetic fibers be included in the absorbent material at a concentration of 20% to 80% by mass. In this case, it becomes easier to adjust the amount of cleaning solution applied from the absorbent material to the nozzle surface.

[0060] Methods for manufacturing nonwoven fabrics include wet or dry spinning, spunbonding, meltblown spinning, flash spinning, and airlaid spinning for web formation, and spunlace, thermal bonding, chemical bonding, and needle punching for bonding the webs.

[0061] Furthermore, the absorbent material may consist of multiple layers, or multiple layers with different properties. For example, a two-layer structure is provided with a highly absorbent layer on the side opposite to the wiping surface. Another example is a three-layer structure with a film backing to prevent ink from bleeding through and to improve the strength of the absorbent material. Yet another example is a multilayer structure with multiple absorbent layers with different absorbent properties provided as the second and subsequent layers. Yet another example is a multilayer structure with a porous material such as a sponge. Examples of the porous material include polyurethane, polyolefin, and PVA.

[0062] The thickness of the absorbent can be selected as appropriate, but is preferably between 0.1 mm and 2 mm. A thickness of 0.1 mm or more ensures sufficient saturation absorption of liquid per unit area of ​​the absorbent, allowing for adequate absorption of the ink being wiped. Furthermore, a thickness of 2 mm or less allows for miniaturization of the device.

[0063] The density of the absorbent can be selected as appropriate; for example, a density of 0.05 g / cm³ can be obtained as shown below. 3 More than 0.15g / cm 3 The following is preferable. When the density is within the above range, the cleaning solution can be efficiently applied to the nozzle surface. [density] Density (g / cm 3 ) = Basis weight (g / cm) 2 ) / Thickness (cm)

[0064] The form of the absorbent can be selected as appropriate. For example, as shown in Figure 3, the absorbent can be in the form of a sheet, which is fed and wound up by rollers. In this case, the absorbent can be stored, and the device can be made smaller. This embodiment is not limited to this, and for example, the absorbent may be made foldable, or it may be stored in a folded state.

[0065] <Cleaning solution> The cleaning solution preferably contains an organic solvent, a surfactant, water, and other components. By applying this cleaning solution directly or indirectly to the nozzle surface and then wiping it with a wiping means, the viscosity of the adhering material formed on the nozzle surface is reduced, making it easier to remove. Furthermore, it is preferable that the cleaning solution be filled, for example, into a cleaning solution container and mounted on the wiping device, and then applied from a cleaning solution application means (cleaning solution application unit).

[0066] -Organic Solvents- There are no particular restrictions on the organic solvent, and it can be appropriately selected depending on the purpose. Examples include water-soluble organic solvents. There are no particular restrictions on the water-soluble organic solvent, and it can be appropriately selected depending on the purpose. Examples include polyhydric alcohols, nitrogen-containing heterocyclic compounds, amides, amines, sulfur-containing compounds, propylene carbonate, ethylene carbonate, and polyol compounds having 8 or more carbon atoms. These may be used individually or in combination of two or more.

[0067] Specific examples of water-soluble organic solvents include, for example, ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,3-butanediol, triethylene glycol, polyethylene glycol, polypropylene glycol, 1,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 2,4-pentanediol, and 1,5-pentanediol. Polyhydric alcohols such as pentanediol, 1,2-hexanediol, 1,6-hexanediol, 1,3-hexanediol, 2,5-hexanediol, 1,5-hexanediol, glycerin, 1,2,6-hexanetriol, 2-ethyl-1,3-hexanediol, ethyl-1,2,4-butanetriol, 1,2,3-butanetriol, 2,2,4-trimethyl-1,3-pentanediol, petriol, ethylene glycol monoethyl ether, and ethylene glycol monobutyl ether. Examples include polyhydric alcohol alkyl ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, tetraethylene glycol monomethyl ether, and propylene glycol monoethyl ether; polyhydric alcohol aryl ethers such as ethylene glycol monophenyl ether and ethylene glycol monobenzyl ether; nitrogen-containing heterocyclic compounds such as 2-pyrrolidone, N-methyl-2-pyrrolidone, N-hydroxyethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, ε-caprolactam, and γ-butyrolactone; amides such as formamide, N-methylformamide, N,N-dimethylformamide, 3-methoxy-N,N-dimethylpropionamide, and 3-butoxy-N,N-dimethylpropionamide; amines such as monoethanolamine, diethanolamine, and triethylamine; sulfur-containing compounds such as dimethyl sulfoxide, sulfolane, and thiodiethanol; propylene carbonate; and ethylene carbonate.

[0068] Polyol compounds having 8 or more carbon atoms, and glycol ether compounds are also suitably used. Specific examples of polyol compounds having 8 or more carbon atoms include 2-ethyl-1,3-hexanediol and 2,2,4-trimethyl-1,3-pentanediol.

[0069] Specific examples of glycol ether compounds include polyhydric alcohol alkyl ethers such as ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, tetraethylene glycol monomethyl ether, and propylene glycol monoethyl ether; and polyhydric alcohol aryl ethers such as ethylene glycol monophenyl ether and ethylene glycol monobenzyl ether.

[0070] The total content of the organic solvent is preferably 10.0% by mass or more and 50.0% by mass or less, and more preferably 20.0% by mass or more and 30.0% by mass or less, relative to the total amount of the cleaning solution.

[0071] - Surfactants - Any of the following surfactants can be used: polyoxyalkylene surfactants, silicone surfactants, fluorine surfactants, amphoteric surfactants, nonionic surfactants, and anionic surfactants. However, polyoxyalkylene surfactants and silicone surfactants are preferred, and polyoxyalkylene surfactants are particularly preferred in terms of their ability to remove deposits using the cleaning solution and the storage stability of the cleaning solution. These may be used individually or in combination of two or more.

[0072] Examples of polyoxyalkylene surfactants include polyoxyethylene distyrenated phenyl ether and polyoxyethylene polyoxypropylene alkyl ether.

[0073] As the polyoxyalkylene surfactant, a suitably synthesized one may be used, or a commercially available product may be used. Examples of commercially available products include Emulgen A-60 (polyoxyethylene distyrenate phenyl ether), Emulgen LS-106 (polyoxyethylene polyoxypropylene alkyl ether), and Emulgen LS-110 (polyoxyethylene polyoxypropylene alkyl ether) (all manufactured by Kao Corporation, and are higher alcohol-based ether-type nonionic surfactants). These may be used individually or in combination of two or more.

[0074] There are no particular restrictions on the silicone-based surfactant, and it can be appropriately selected depending on the purpose. Examples include side-chain modified polydimethylsiloxane, both-end modified polydimethylsiloxane, one-end modified polydimethylsiloxane, and both-end modified polydimethylsiloxane. Polyether-modified silicone-based surfactants having a polyoxyethylene group or a polyoxyethylene-polyoxypropylene group as a modifying group are particularly preferred as they exhibit good properties as aqueous surfactants.

[0075] Furthermore, polyether-modified silicone surfactants can also be used as silicone surfactants. Examples include compounds in which a polyalkylene oxide structure is introduced into the Si side chain of dimethylsiloxane.

[0076] As for the silicone-based surfactant, you may use one that has been synthesized as appropriate, or you may use a commercially available product. Commercially available products include, for example, those from BIC Chemie Inc., Shin-Etsu Chemical Co., Ltd., Toray Dow Corning Silicone Co., Ltd., Nippon Emulsion Co., Ltd., and Kyoeisha Chemical Co., Ltd.

[0077] There are no particular restrictions on the polyether-modified silicone surfactant, and it can be appropriately selected depending on the purpose. For example, one example is a polyalkylene oxide structure represented by the general formula (S-1), in which a polyalkylene oxide structure is introduced into the Si side chain of dimethylpolysiloxane.

[0078] [ka]

[0079] (However, in general formula (S-1), m, n, a, and b each independently represent integers, R represents an alkylene group, and R' represents an alkyl group.)

[0080] Commercially available polyether-modified silicone surfactants can be used, such as KF-618, KF-642, KF-643 (Shin-Etsu Chemical Co., Ltd.), EMALEX-SS-5602, SS-1906EX (Nippon Emulsion Co., Ltd.), FZ-2105, FZ-2118, FZ-2154, FZ-2161, FZ-2162, FZ-2163, FZ-2164 (Toray Dow Corning Silicone Co., Ltd.), BYK-33, BYK-387 (BIC Chemie Co., Ltd.), TSF4440, TSF4452, TSF4453 (Toshiba Silicone Co., Ltd.).

[0081] Examples of fluorinated surfactants include perfluoroalkyl sulfonic acid compounds, perfluoroalkyl carboxylic acid compounds, perfluoroalkyl phosphate ester compounds, perfluoroalkyl ethylene oxide adducts, and polyoxyalkylene ether polymer compounds having perfluoroalkyl ether groups in their side chains, as they exhibit low foaming properties. Examples of perfluoroalkyl sulfonic acid compounds include perfluoroalkyl sulfonic acid and perfluoroalkyl sulfonate salts. Examples of perfluoroalkyl carboxylic acid compounds include perfluoroalkyl carboxylic acid and perfluoroalkyl carboxylic acid salts. Examples of polyoxyalkylene ether polymer compounds having perfluoroalkyl ether groups in their side chains include sulfate ester salts of polyoxyalkylene ether polymers having perfluoroalkyl ether groups in their side chains, and salts of polyoxyalkylene ether polymers having perfluoroalkyl ether groups in their side chains. Examples of counterions for the salts of these fluorinated surfactants include Li, Na, K, NH4, NH3CH2CH2OH, NH2(CH2CH2OH)2, and NH(CH2CH2OH)3.

[0082] Examples of amphoteric surfactants include laurylaminopropionate, lauryldimethylbetaine, stearyldimethylbetaine, and lauryldihydroxyethylbetaine.

[0083] Examples of nonionic surfactants include polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl esters, polyoxyethylene alkylamines, polyoxyethylene alkylamides, polyoxyethylene propylene block polymers, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters, and ethylene oxide adducts of acetylene alcohol.

[0084] Examples of anionic surfactants include polyoxyethylene alkyl ether acetate, dodecylbenzene sulfonate, lauryl salt, and salts of polyoxyethylene alkyl ether sulfate.

[0085] There are no particular restrictions on the surfactant content, and it can be appropriately selected depending on the purpose. However, from the viewpoint of storage stability, 0.001% to 5% by mass is preferred, 0.05% to 5% by mass is more preferred, and 0.1% to 3% by mass is even more preferred.

[0086] -water- Examples of water include pure water such as ion-exchanged water, ultrafiltered water, reverse osmosis water, and distilled water, or ultrapure water.

[0087] There are no particular restrictions on the water content, and it can be appropriately selected depending on the purpose. However, for example, 20.0% by mass or more and 80.0% by mass or less of the total amount of the washing solution is preferred, and 30.0% by mass or more and 60.0% by mass or less is more preferred.

[0088] -Other ingredients- Other ingredients are not particularly limited and can be selected as appropriate depending on the purpose. Examples include defoaming agents, antiseptics and antifungal agents, rust inhibitors, and pH adjusters.

[0089] --Antifoaming agent-- There are no particular restrictions on the defoaming agent; examples include silicone-based defoaming agents, polyether-based defoaming agents, and fatty acid ester-based defoaming agents. These may be used individually or in combination of two or more. Among these, silicone-based defoaming agents are preferred due to their superior foam-breaking effect.

[0090] --Preservative and fungicidal agent-- There are no particular restrictions on the preservatives and fungicides used; for example, 1,2-benzisothiazolin-3-one can be used.

[0091] --Rust Inhibitor-- There are no particular restrictions on the rust inhibitors used; examples include acidic sulfites and sodium thiosulfate.

[0092] --pH adjuster-- As a pH adjusting agent, there are no particular restrictions as long as it can adjust the pH to 7 or higher, and examples include amines such as diethanolamine and triethanolamine.

[0093] <Liquid composition> The liquid composition dispensed by the liquid ejection head is not particularly limited and can be selected as appropriate. Ink, as an example of a liquid composition, is preferably filled into an ink container, which is an example of a liquid container, and mounted on the liquid ejection device. The liquid composition is not limited to ink; for example, it may be a pre-treatment liquid applied to the recording medium before ink ejection, or a post-treatment liquid applied to the ink ejection surface of the recording medium after ink ejection.

[0094] An example of a liquid composition, such as ink, preferably contains a colorant, resin, organic solvent, surfactant, water, and other components. Alternatively, the ink may be a clear ink containing resin but no colorant. Note that the organic solvent, surfactant, water, and other components can be the same as those contained in the cleaning solution, so their descriptions are omitted.

[0095] -Colorants- The coloring material is not particularly limited, and pigments and dyes can be used. As for pigments, inorganic or organic pigments can be used. These may be used individually or in combination of two or more. Mixed crystals may also be used.

[0096] Examples of pigments that can be used include black pigment, yellow pigment, magenta pigment, cyan pigment, white pigment, green pigment, orange pigment, and glossy or metallic pigments such as gold and silver. As inorganic pigments, titanium dioxide, iron oxide, calcium carbonate, barium sulfate, aluminum hydroxide, barium yellow, cadmium red, and chromium yellow can be used, as well as carbon black produced by known methods such as the contact method, furnace method, and thermal method. In addition, organic pigments such as azo pigments, polycyclic pigments (e.g., phthalocyanine pigments, perylene pigments, perinone pigments, anthraquinone pigments, quinacridone pigments, dioxazine pigments, indigo pigments, thioindigo pigments, isoindolinone pigments, quinophthalone pigments, etc.), dye chelates (e.g., basic dye type chelates, acid dye type chelates, etc.), nitro pigments, nitroso pigments, and aniline black can be used. Of these pigments, those with good affinity to the solvent are preferably used. Other uses such as resin hollow particles and inorganic hollow particles are also possible.

[0097] Specific examples of pigments include carbon blacks (CI Pigment Black 7) such as furnace black, lamp black, acetylene black, and channel black, or metals such as copper, iron (CI Pigment Black 11), and titanium dioxide, as well as organic pigments such as aniline black (CI Pigment Black 1). Furthermore, for color applications, we have CI Pigment Yellow 1, 3, 12, 13, 14, 17, 24, 34, 35, 37, 42 (yellow iron oxide), 53, 55, 74, 81, 83, 95, 97, 98, 100, 101, 104, 108, 109, 110, 117, 120, 138, 150, 153, 155, 180, 185, 213, and CI Pigment Ole. Orange 5, 13, 16, 17, 36, 43, 51, CI Pigment Red 1, 2, 3, 5, 17, 22, 23, 31, 38, 48:2, 48:2 (Permanent Red 2B(Ca)), 48:3, 48:4, 49:1, 52:2, 53:1, 57:1 (Brilliant Carmine 6B), 60:1, 63:1, 63:2, 64:1, 81, 83, 88, 101 (Bengara), 104, 105, 106, 108 (Cadmium Red), 112, 114, 122 (Quinacridone Magenta), 123, 146, 149, 166, 168, 170, 172, 177, 178, 179, 184, 185, 190, 193, 202, 207, 208, 209, 213, 219, 224, 254, 264, CI Pigment Violet 1 (Rhodamine Lake), 3, 5:1, 16, 19, 23, 38; CI Pigment Blue 1, 2, 15 (Phthalocyanine Blue), 15:1, 15:2, 15:3, 15:4 (Phthalocyanine Blue), 16, 17:1, 56, 60, 63; CI Pigment Green 1, 4, 7, 8, 10, 17, 18, 36, etc. are available.

[0098] The dyes used are not particularly limited and include acid dyes, direct dyes, reactive dyes, and basic dyes. They may be used individually or in combination of two or more types. As dyes, for example, CI Acid Yellow 17, 23, 42, 44, 79, 142, CI Acid Red 52, 80, 82, 249, 254, 289, CI Acid Blue 9, 45, 249, CI Acid Black 1, 2, 24, 94, CI Food Black 1, 2, CI Direct Yellow 1, 12, 24, 33, 50, 55, 58, 86, 132, 142, 144, Examples include 173, CI Direct Red 1, 4, 9, 80, 81, 225, 227, CI Direct Blue 1, 2, 15, 71, 86, 87, 98, 165, 199, 202, CI Direct Black 19, 38, 51, 71, 154, 168, 171, 195, CI Reactive Red 14, 32, 55, 79, 249, and CI Reactive Black 3, 4, 35.

[0099] The colorant content in the ink is preferably 0.1% by mass or more and 15% by mass or less, and more preferably 1% by mass or more and 10% by mass or less, from the viewpoint of improving image density, good fixation and ejection stability.

[0100] Methods for obtaining ink by dispersing pigments include introducing hydrophilic functional groups into the pigment to create a self-dispersible pigment, coating the surface of the pigment with a resin and dispersing it, and using a dispersant to disperse it. One method for creating self-dispersible pigments by introducing hydrophilic functional groups into pigments is to add functional groups such as sulfone groups or carboxyl groups to a pigment (e.g., carbon) to make it dispersible in water.

[0101] One method for coating and dispersing pigments with resin is to encapsulate the pigments in microcapsules, making them dispersible in water. This can be rephrased as resin-coated pigments. In this case, it is not necessary for all pigments incorporated into the ink to be coated with resin; uncoated pigments or partially coated pigments may be dispersed in the ink. Methods of dispersion using dispersants include the use of known low-molecular-weight dispersants, such as surfactants, and high-molecular-weight dispersants. Depending on the pigment, anionic surfactants, cationic surfactants, amphoteric surfactants, nonionic surfactants, etc., can be used as dispersants. Takemoto Oil & Fat Co., Ltd.'s RT-100 (nonionic surfactant) and sodium naphthalene sulfonate formalin condensate can also be suitably used as dispersants. Dispersants may be used individually or in combination of two or more.

[0102] -resin- There are no particular restrictions on the type of resin contained in the ink, and it can be appropriately selected according to the purpose. Examples include urethane resin, polyester resin, acrylic resin, vinyl acetate resin, styrene resin, butadiene resin, styrene-butadiene resin, vinyl chloride resin, acrylic styrene resin, and acrylic silicone resin. These may be used individually or in combination of two or more. Among these, urethane resin is preferred. Furthermore, it is preferable to use the resin as resin particles. It is possible to obtain ink by mixing the resin emulsion, in which the resin particles are dispersed with water as a dispersion medium, with materials such as colorants and organic solvents.

[0103] There are no particular restrictions on the volume-average particle size of the resin particles, and they can be appropriately selected depending on the purpose. However, from the standpoint of obtaining good adhesion and high image hardness, a size of 10 nm to 1,000 nm is preferred, 10 nm to 200 nm is more preferred, and 10 nm to 100 nm is particularly preferred. The volume-average particle size can be measured, for example, using a particle size analyzer (NanoTrac Wave-UT151, manufactured by MicroTrac-Bell Co., Ltd.).

[0104] There are no particular restrictions on the resin particle content, and it can be appropriately selected depending on the purpose. However, from the viewpoint of fixation and storage stability of the ink, it is preferable that the content be 1% to 30% by mass, and more preferably 5% to 20% by mass, relative to the total amount of ink.

[0105] <Recording medium> There are no particular restrictions on the recording medium on which the liquid composition is dispensed; ordinary paper, glossy paper, specialty paper, cloth, etc., can be used, but good image formation is possible even when using an impermeable substrate. Note that a recording medium refers to anything to which the liquid can adhere, even temporarily. A non-permeable substrate is a substrate with a surface that has low water permeability and absorption, and includes materials that have numerous internal cavities but do not open to the outside. More quantitatively, in the Bristow method, from the start of contact for 30 msec 1 / 2 Up to 10 mL / m² of water absorption capacity 2 The following refers to the base material.

[0106] As non-permeable substrates, plastic films such as polyvinyl chloride resin film, polyethylene terephthalate (PET) film, polypropylene, polyethylene, and polycarbonate film can be suitably used.

[0107] The recording medium is not limited to those commonly used as recording media; building materials such as wallpaper, flooring, and tiles, fabrics for clothing such as T-shirts, textiles, leather, etc., can be used as appropriate. Furthermore, by adjusting the configuration of the transport path for the recording medium, ceramics, glass, metal, etc., can also be used. [Examples]

[0108] The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples.

[0109] (Method of wiping) Nonwoven fabrics for Examples 1-4 and Comparative Examples 1-2 were prepared using the formulations shown in Table 1 below and used as wiping means (wiping members). The wiping means in Example 2 had a two-layer structure, with the first layer used as a contact layer for the nozzle surface.

[0110] In Table 1, PET represents polyethylene terephthalate, and PP represents polypropylene. Furthermore, PET and PP are synthetic fibers, while rayon is a regenerated fiber.

[0111] (Cleaning solution) The cleaning solution was prepared according to the following proportions. • 3-Methoxy-3-methyl-1-butanol (manufactured by Kuraray Co., Ltd.) 20% by mass • Polyether-modified silicone surfactant (Product name: WET270, manufactured by Evonik Degussa Japan Co., Ltd.) 1% by mass • Deionized water remaining amount

[0112] (Evaluation of cleaning solution application to nozzle surface) The evaluation was performed using the method shown in Figure 4. 60 mg of the prepared cleaning solution was dropped onto the wiping member. A microscope slide (2.45 cm wide, 9.2 cm long) was used as a simulated nozzle plate, and the wiping member with the cleaning solution was wiped once in the longitudinal direction of the microscope slide with a force of 1 N (linear pressure 0.4 N / cm). Here, wiping from one side to the other in the longitudinal direction of the microscope slide is considered one wipe. The coating efficiency and the amount of cleaning solution applied were calculated from the weight of the glass slide before and after application of the cleaning solution, as shown below.

[0113] Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / 60 (mg)] × 100

[0114] Cleaning solution application amount (μg / cm²) 2 ) = {Weight of the slide glass after wiping (μg) - Weight of the slide glass before wiping (μg)} / 22.54 (cm 2 )

[0115] (Evaluation of the ability to remove fixed ink) 0.1 ml of ink (RICOH Pro AR ink cartridge white L5160, manufactured by Ricoh Co., Ltd.) was dropped onto the nozzle surface of an inkjet head (MH5440, manufactured by Ricoh Co., Ltd.), and left for 15 hours to create a nozzle surface with solidified ink. For the wipeability evaluation, a wiper device as shown in Figure 3 was used, and the wiper material created above was attached to the device. 60 mg of the prepared cleaning solution was applied to the wiper material, and then the nozzle surface was wiped at a linear pressure of 0.4 N / cm and a wiping speed of 50 mm / s. The nozzle plate was visually inspected after wiping, and the number of wipes required to remove the solidified ink was evaluated. △ indicates a usable range, ○ is preferable, and ◎ is even preferable.

[0116] [Evaluation Criteria] ◎: Removes hardened ink from the nozzle plate with 5 or fewer wipes. ○: Removes stubborn ink from the nozzle plate with 6 or 7 wipes. △: Removes stubborn ink from the nozzle plate with 8 or 9 wipes. ×: After 10 wipes, stubborn ink remains.

[0117] (Evaluation of discharge performance after wiping) An inkjet head (MH5440, manufactured by Ricoh Co., Ltd.) was filled with ink (RICOH Pro AR ink cartridge black L5160, manufactured by Ricoh Co., Ltd.). For the ejection performance evaluation, a wiping device as shown in Figure 3 was used, and the wiping member prepared above was attached to the device. 60 mg of the prepared cleaning solution was dropped onto the wiping member, and the nozzle surface of the inkjet head was wiped at a linear pressure of 0.4 N / cm and a wiping speed of 50 mm / s. After wiping, ink was ejected from the inkjet head. One cycle consisted of dropping the cleaning solution, wiping, and ejecting the ink. This cycle was repeated 10 times, and the ejection reliability was evaluated based on the following evaluation criteria over the course of 10 cycles. △ indicates a usable range, ○ is preferable, and ◎ is even preferable.

[0118] [Evaluation Criteria] ◎: No discharge irregularities or non-discharge observed. ○: Discharge is irregular or not discharged from one or fewer nozzles. △: Discharge irregularities or non-discharge occurs in 2 to 4 nozzles. ×: Discharge is irregular or non-discharged when there are more than four nozzles.

[0119] Table 1 shows the fabricated absorbers and their evaluation results.

[0120] [Table 1]

[0121] As shown in Table 1, according to this embodiment, ink adhering to the nozzle surface can be efficiently wiped away, and ejection failures caused by wiping can be suppressed.

[0122] Furthermore, when the linear pressure was changed from 0.4 N / cm to 0.6 N / cm and the same wiping performance and dispensing performance evaluations were performed as described above, the evaluation results were the same as those for the 0.4 N / cm case. Note that when the linear pressure was changed to 0.6 N / cm, the calculation of the cleaning solution application amount and application efficiency was performed using a linear pressure of 0.6 N / cm. Furthermore, when the linear pressure was changed from 0.4 N / cm to a value greater than 0.6 N / cm and the above evaluation was performed, the nozzle surface was damaged by wiping, and the discharge performance after wiping deteriorated. [Explanation of Symbols]

[0123] 3 carriages 4, 4a, 4b recording heads 4n nozzle 20 Maintenance and recovery mechanism 20b Wiping device 41 Nozzle surface 320 Sheet-shaped wiping material 400 Pressing roller 410 Feed roller 420 winding roller 430 Cleaning solution dispensing unit 500 Foreign object [Prior art documents] [Patent Documents]

[0124] [Patent Document 1] Japanese Patent Publication No. 2021-146623 [Patent Document 2] Patent No. 5889036

Claims

1. A wiping device comprising a wiping means for wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, and the amount of cleaning solution applied, determined as follows, is 50 μg / cm³. ２ 150 μg / cm or more ２ The following conditions apply, and the required coating efficiency is between 2% and 7%. The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A wiping device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) ２ ) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) ２ ) [Application efficiency] The coating efficiency is determined as follows when X mg of the cleaning solution is dropped onto the wiping means and the wiping means is pressed against a glass slide to wipe it. However, the conditions for determining the coating efficiency are the same as the conditions for wiping the nozzle surface, except that the glass slide is wiped once. Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / X (mg)] × 100

2. The absorbent material is a nonwoven fabric and contains natural or regenerated fibers and synthetic fibers. The wiping device according to feature 1.

3. The synthetic fiber is contained in the absorbent material in an amount of 20% by mass or more and 80% by mass or less. The wiping device according to feature 2.

4. A wiping device comprising a wiping means for wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, and the amount of cleaning solution applied, determined as follows, is 50 μg / cm² or more and 150 μg / cm² or less. When the wiping means is pressed against the nozzle surface to wipe the nozzle surface, the linear pressure of the wiping means is 0.6 N / cm or less. The absorbent material is a nonwoven fabric and contains natural or regenerated fibers and synthetic fibers. The synthetic fiber is contained in the absorbent material in an amount of 20% by mass or more and 80% by mass or less. A wiping device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²)

5. A wiping device comprising a wiping means for wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, wherein the amount of cleaning solution applied, as determined below, is 50 μg / cm² or more and 150 μg / cm² or less, and the density, as determined below, is 0.05 g / cm³ or more and 0.15 g / cm³ or less. The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A wiping device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) [density] Density (g / cm³) = Basis weight (g / cm²) / Thickness (cm)

6. The thickness of the wiping means is 0.1 mm or more and 2 mm or less. A wiping device according to any one of features 1 to 5.

7. A wiping method comprising a wiping step of wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning solution is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, and the amount of cleaning solution applied, determined as follows, is 50 μg / cm³. ２ 150 μg / cm or more ２ The following conditions apply, and the required coating efficiency is between 2% and 7%. The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A wiping method characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) ２ ) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) ２ ) [Application efficiency] The coating efficiency is determined as follows when X mg of the cleaning solution is dropped onto the wiping means and the wiping means is pressed against a glass slide to wipe it. However, the conditions for determining the coating efficiency are the same as the conditions for wiping the nozzle surface, except that the glass slide is wiped once. Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / X (mg)] × 100

8. A wiping method comprising a wiping step of wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, and the amount of cleaning solution applied, determined as follows, is 50 μg / cm² or more and 150 μg / cm² or less. When the wiping means is pressed against the nozzle surface to wipe the nozzle surface, the linear pressure of the wiping means is 0.6 N / cm or less. The absorbent material is a nonwoven fabric and contains natural or regenerated fibers and synthetic fibers. The synthetic fiber is contained in the absorbent material in an amount of 20% by mass or more and 80% by mass or less. A wiping method characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²)

9. A wiping method comprising a wiping step of wiping the nozzle surface of a liquid discharge head that discharges a liquid composition from a nozzle formed on the nozzle surface, wherein a cleaning liquid is applied to the wiping means, the wiping means is pressed against the nozzle surface, and the nozzle surface is wiped by the relative movement of the liquid discharge head and the wiping means, The wiping means is an absorbent capable of absorbing the cleaning solution, wherein the amount of cleaning solution applied, as determined below, is 50 μg / cm² or more and 150 μg / cm² or less, and the density, as determined below, is 0.05 g / cm³ or more and 0.15 g / cm³ or less. The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A wiping method characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) [density] Density (g / cm³) = Basis weight (g / cm²) / Thickness (cm)

10. A liquid dispensing head that dispenses a liquid composition from a nozzle formed on the nozzle surface, A liquid dispensing device comprising: a wiping means for wiping the nozzle surface of the liquid dispensing head; a wiping device for wiping the nozzle surface by applying a cleaning solution to the wiping means, pressing the wiping means against the nozzle surface, and the relative movement of the liquid dispensing head and the wiping means; The wiping means is an absorber capable of absorbing the cleaning liquid, and the amount of the cleaning liquid applied as determined below is 50 μg / cm ２ or more and 150 μg / cm ２ or less, and the application efficiency as determined below is 2% or more and 7% or less, The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A liquid dispensing device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) ２ ) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) ２ ) [Application efficiency] The coating efficiency is determined as follows when X mg of the cleaning solution is dropped onto the wiping means and the wiping means is pressed against a glass slide to wipe it. However, the conditions for determining the coating efficiency are the same as the conditions for wiping the nozzle surface, except that the glass slide is wiped once. Coating efficiency (%) = [{Weight of slide glass after wiping (mg) - Weight of slide glass before wiping (mg)} / X (mg)] × 100

11. A liquid dispensing head that dispenses a liquid composition from a nozzle formed on the nozzle surface, A liquid dispensing device comprising: a wiping means for wiping the nozzle surface of the liquid dispensing head; a wiping device for wiping the nozzle surface by applying a cleaning solution to the wiping means, pressing the wiping means against the nozzle surface, and the relative movement of the liquid dispensing head and the wiping means; The wiping means is an absorbent capable of absorbing the cleaning solution, and the amount of cleaning solution applied, determined as follows, is 50 μg / cm² or more and 150 μg / cm² or less. When the wiping means is pressed against the nozzle surface to wipe the nozzle surface, the linear pressure of the wiping means is 0.6 N / cm or less. The absorbent material is a nonwoven fabric and contains natural or regenerated fibers and synthetic fibers. The synthetic fiber is contained in the absorbent material in an amount of 20% by mass or more and 80% by mass or less. A liquid dispensing device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²)

12. A liquid dispensing head that dispenses a liquid composition from a nozzle formed on the nozzle surface, A liquid dispensing device comprising: a wiping means for wiping the nozzle surface of the liquid dispensing head; a wiping device for wiping the nozzle surface by applying a cleaning solution to the wiping means, pressing the wiping means against the nozzle surface, and the relative movement of the liquid dispensing head and the wiping means; The wiping means is an absorbent capable of absorbing the cleaning solution, wherein the amount of cleaning solution applied, as determined below, is 50 μg / cm² or more and 150 μg / cm² or less, and the density, as determined below, is 0.05 g / cm³ or more and 0.15 g / cm³ or less. The linear pressure of the wiping means when it is pressed against the nozzle surface to wipe the nozzle surface is 0.6 N / cm or less. A liquid dispensing device characterized by the following features. [Amount of cleaning solution to apply] The amount of cleaning solution applied is determined as follows when the cleaning solution is dropped onto the wiping means and the wiping means is pressed against the slide glass and wiped. However, the conditions for determining the amount of cleaning solution applied are the same as the conditions for wiping the nozzle surface, except that the slide glass is wiped once. Amount of cleaning solution applied (μg / cm²) = {Weight of the slide after wiping (μg) - Weight of the slide before wiping (μg)} / Area of ​​the slide (cm²) [density] Density (g / cm³) = Basis weight (g / cm²) / Thickness (cm)

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