Inclination angle measuring device, charged particle device, and inclination angle measuring method
The tilt angle measuring device addresses the challenge of tilted sample surfaces in SEM inspection by measuring and correcting two-axis tilt angles using light and aperture systems, ensuring accurate SEM image alignment and high-speed measurement.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- HITACHI HIGH TECH CORP
- Filing Date
- 2023-07-13
- Publication Date
- 2026-07-24
AI Technical Summary
Existing SEM inspection systems struggle to accurately measure the shape of semiconductor patterns due to the sample surface being tilted, necessitating the measurement and correction of tilt angles to ensure perpendicular electron beam incidence.
A tilt angle measuring device that uses a light source, two-dimensional aperture, and light-receiving elements to measure the two-axis tilt angles of a sample surface by analyzing the feature quantities of the reflected light patterns.
Enables accurate measurement of the two-axis tilt angles, allowing for precise SEM image correction and high-speed, stable determination of sample surface orientation without requiring stage movement.
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