Substrate transport system and transfer robot

Abstract

A substrate transport system (1) comprises: a transport unit (2) on which a range of transport of a substrate is defined; a first placement unit (3) and a second placement unit (4) on which the substrate is placed; and a transfer robot (5) that is provided inside the transport unit to transport the substrate from the first placement unit to the second placement unit. The transfer robot comprises a body unit (51) which is disposed in the transport unit, a turning support unit (52) which is linked with the body unit, an arm support unit (53) which is linked with the turning support unit, an arm unit (54) which is linked with the arm support unit, and a holding unit (55) which is linked with the arm unit. The turning support unit comprises a first end portion (52a) rotatably linked with the body unit, and a second end portion (52b) to which the arm support unit is rotatably linked. The turning support unit rotates about a link portion thereof with the body unit as a rotational axis. The arm unit is linked rotatably about a portion thereof linked with the arm support unit as a rotational axis in plan view. In the transfer robot, the body unit is disposed such that the central portion of the turning support unit supported on the body unit is positioned at the central portion in the range of the transport unit.

Description

Substrate transport system and transfer robot

[0001] The present invention relates to a substrate transport system and a transfer robot. This application claims priority to International Patent Application PCT / JP2022 / 016244, filed in Japan on March 30, 2022, the contents of which are incorporated herein by reference.

[0002] A substrate transfer system is known in which a transfer robot is installed in a vacuum chamber (clean room) to transfer semiconductor substrates (wafers) from a load port attached to the front of the chamber. In the substrate transfer system, the wafers are taken into the chamber by the transfer robot and transferred to the chamber or to a process module attached to the chamber, where various semiconductor processes such as film deposition are performed. After processing in the process module, the wafers are transferred back to the load port by the transfer robot and sent to the next process.

[0003] For example, Patent Documents 1 to 3 disclose substrate transport systems in which a transfer robot is fixed inside a chamber and transports wafers without the transfer robot moving inside the chamber, thereby preventing particles from being stirred up or airflow disturbances from occurring inside the chamber.

[0004] Japanese Patent No. 2011-119556 Japanese Patent No. 5199117 Japanese Patent No. 4746027

[0005] The substrate transfer system includes a robot that transfers wafers within a chamber having a predetermined length in a first direction, and multiple wafer transfer destination ports that are provided outside the chamber and aligned at predetermined intervals in the first direction. The robot includes multiple arms that can rotate horizontally to transfer wafers to each port within the chamber, which has a limited range of motion. The lengths of the multiple arms are set to correspond to the movement distance in the first direction within the chamber. The arm lengths are limited by the length within the chamber in a second direction perpendicular to the first direction.

[0006] Therefore, the installation position of the robot in the second direction is set as far away from the port as possible, and by keeping the distance in the second direction large, the rotation space of the robot arm is secured. As a result, the operating distance of the arm becomes large, which causes problems in the efficiency of the transport work. Furthermore, if another port is configured on the other side of the second direction opposite to the port configured on one side of the second direction, the length in the second direction must be even longer, which may reduce the efficiency of the transport work.

[0007] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate transport system and a transfer robot that can efficiently transport substrates.

[0008] A substrate transport system according to the present invention includes a transport section defining a range in which a substrate is transported, first and second mounting sections on which the substrate is placed, and a transfer robot provided inside the transport section and transporting the substrate from the first mounting section to the second mounting section, wherein the range of the transport section is set to a predetermined first length in a first direction that allows a plurality of the first mounting sections and the second mounting sections to be arranged side by side, and a second length in a second direction orthogonal to the first direction that is shorter than the first length, and the transfer robot includes a main body section disposed within the transport section, a swivel support section connected to the main body section, an arm support section connected to the swivel support section, an arm section connected to the arm support section, and a holder connected to the arm section and for holding the substrate, and the swivel support section has a first end section rotatably connected to the main body section, and a second end to which the arm support portion is rotatably connected, wherein the arm portion comprises a first arm connected to the arm support portion and a second arm connected to the holding portion, wherein the swivel support portion is rotatably connected in a planar view with the connection portion with the main body portion as a rotation axis, and the arm support portion is rotatably connected in a planar view with the connection portion with the swivel support portion as a rotation axis, a center line of rotation of the arm support portion relative to the second end of the swivel support portion and a center line of rotation of the arm portion relative to the arm support portion are set on the same line, and the arm portion is rotatably connected in a planar view with the connection portion with the arm support portion as a rotation axis, and the transfer robot is a substrate transport system in which the main body portion is arranged so that the center of the swivel support portion supported by the main body portion is located in the center of the range of the transport portion.

[0009] In the substrate transport system of the present invention, the transport section may include a robot support section that supports the main body section of the transfer robot, and a plurality of placement and installation sections on which the first placement section and the second placement section are provided.

[0010] In the substrate transport system of the present invention, the spacing between the multiple mounting and installation sections arranged in the first direction may be set to the same value as the diameter of the circle formed by the circumferential orbit of the rotation axis of the swivel support section to which the arm support section is connected.

[0011] In the substrate transfer system according to the present invention, when the number of the substrate placement units is odd, the center of the swivel support unit and the center of the substrate placement unit installed in the middle may be set at the same position in the first direction. When the number of the substrate placement units is even, the center between adjacent substrate placement units and the center of the swivel support unit may be set at the same position in the first direction.

[0012] In the substrate transfer system according to the present invention, the range in which the substrate is transferred in the transfer section may be set to a first region on one side in the second direction and a second region on the other side in the second direction, with the main body as a boundary. The lengths of the first region and the second region may be set to a distance equal to a swivel tip length, which is set as the length between a first rotation axis set at the first end of the swivel support section and an outer tip of the swivel support section on the second end side.

[0013] In the substrate transfer system according to the present invention, the second arm may be supported by the first arm so as to be rotatable about a connection portion with the first arm as a rotation axis. When transferring the substrates between the first and second mount parts, the bending posture of the first and second arms of the arm part, which bends around a rotation axis about which the second arm rotates relative to the first arm, may be maintained in either a first posture in which the arm part bends in one direction or a second posture in which the arm part bends in another direction different from the one direction.

[0014] In the substrate transfer system according to the present invention, the main body may include a robot control unit that controls the driving of the transfer robot.

[0015] In the substrate transfer system according to the present invention, the first arm may include a first arm base end rotatably connected to the arm support portion, and a first arm moving end opposite the first arm base end and rotatably supporting the second arm. The second arm may include a second arm base end rotatably connected to the first arm moving end, and a second arm moving end opposite the second arm base end and rotatably supporting the holder.

[0016] In the substrate transport system of the present invention, the holding section may include a first holding hand and a second holding hand provided below the first holding hand, and the first holding hand and the second holding hand may each include a hand tip portion that holds the substrate and a hand base portion that is rotatably supported relative to the second arm moving end portion.

[0017] In the substrate transport system of the present invention, the first and second mounting sections may be arranged along the periphery of the transport section, and the transfer robot may be arranged between the first and second mounting sections.

[0018] In the substrate transport system of the present invention, the first and second loading sections may be provided in plurality, facing each other along the periphery of the transport section, with the transfer robot sandwiched between them in a planar view, and the plurality of first loading sections and the plurality of second loading sections may each be arranged at regular intervals in the first direction.

[0019] In the substrate transport system of the present invention, the transport section may be provided with a plurality of transfer robots, and may include a first transport section that can be transported by a first transfer robot and a second transport section that can be transported by a second transfer robot, a first placement section group that is provided in the first transport section and on which the substrates are placed, and a second placement section group that is provided in the second transport section and on which the substrates are placed, and an intermediary placement section where the substrates are transferred between the first transfer robot and the second transfer robot, and the intermediary placement section may be provided around the transport section, between the first placement section group and the second placement section group.

[0020] A transfer robot according to the present invention is a transfer robot that transfers a substrate from a first platform to a second platform provided along a transport section that defines a range in which the substrate is transported, and includes a main body section arranged inside the transport section, a swivel support section connected to the main body section, an arm support section connected to the swivel support section, an arm section connected to the arm support section, and a holder connected to the arm section and holding the substrate, the swivel support section having a first end section rotatably connected to the main body section and a second end section to which the arm support section is rotatably connected, the arm section having a first arm connected to the arm support section, and the holder and a second arm connected to the swivel support portion, wherein the swivel support portion is rotatably connected in a planar view with the connection portion with the main body portion as a rotation axis, the arm support portion is rotatably connected in a planar view with the connection portion with the swivel support portion as a rotation axis, the center line of rotation of the arm support portion relative to the second end of the swivel support portion and the center line of rotation of the arm portion relative to the arm support portion are set on the same line, the arm portion is rotatably connected in a planar view with the connection portion with the arm support portion as a rotation axis, and the main body portion is positioned so that the center of the swivel support portion supported by the main body portion is located in the center of the range of the transport portion.

[0021] In the transfer robot according to the present invention, the range of the transport unit may be set to a predetermined first length in a first direction that allows a plurality of the first placement units and the second placement units to be arranged side by side, and a second length in a second direction perpendicular to the first direction that is shorter than the first length. A distance between a rotation axis to which the arm support unit is connected to the main body unit of the arm support unit and a rotation axis to which the swivel support unit is connected may be set to half the distance between the plurality of first placement units and the second placement units arranged in the first direction.

[0022] In the transfer robot of the present invention, the rotation tip length, which is set as the length between the first rotation axis set at the first end of the swivel support part and the outer tip of the second end side of the swivel support part, may be set to a length equal to the length of one of the areas in which the first placement part and the second placement part are arranged, centered on the main body part.

[0023] In the transfer robot according to the present invention, the main body may include a robot control unit that controls driving of the transfer robot.

[0024] The transfer robot according to the present invention may be provided with a swivel motor that rotates the swivel support part relative to the main body part, an arm support drive motor that rotates the arm support part relative to the swivel support part, and an arm motor that rotates the arm part relative to the arm support part.

[0025] In the transfer robot according to the present invention, the arm support section may include the arm motor and an arm drive mechanism that operates the arm section.

[0026] In the transfer robot according to the present invention, the first arm may include a first arm base end rotatably connected to the arm support portion, and a first arm moving end that is an end opposite to the first arm base end and rotatably supports the second arm. The second arm may include a second arm base end rotatably connected to the first arm moving end, and a second arm moving end that is an end opposite to the second arm base end and rotatably supports the holding portion.

[0027] In the transfer robot of the present invention, the holding unit may include a first holding hand and a second holding hand provided below the first holding hand, and the first holding hand and the second holding hand may each include a hand tip portion that holds the substrate and a hand base portion that is rotatably supported relative to the second arm moving end portion.

[0028] According to the present invention, it is possible to provide a substrate transport system and a transfer robot that can efficiently transport substrates.

[0029] 1 is a plan view showing a substrate transport system according to the present invention. FIG. 2 is a perspective view showing a transfer robot according to the present invention. FIG. 3 is a perspective view showing a transfer robot according to the present invention. FIG. 4 is a partial plan view showing an operating procedure for a transfer robot according to the present invention. FIG. 5 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 6 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 7 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 8 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 9 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 10 is a plan view showing a substrate transport system according to the present invention. FIG. 11 is a cross-sectional view taken along line A-A in FIG. 2. FIG. 12 is a cross-sectional view taken along line B-B in FIG. 2. FIG. 13 is a plan view showing another embodiment of a substrate transport system according to the present invention.

[0030] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a substrate transport system and a transfer robot according to the present invention will be described below.

[0031] As shown in FIG. 1 , the substrate transport system 1 includes a transport unit 2 in which the range of transport work is set, a first placement unit 3 , a plurality of second placement units 4 , and a transfer robot 5 .

[0032] The substrate transfer system 1 is a transfer system that operates a transfer robot 5 to transfer a substrate 10 from a first mounting part 3 to a second mounting part 4. The substrate 10 is a disk-shaped semiconductor wafer (hereinafter, "substrate 10" will be referred to as "wafer 10"). The wafer 10 has a mark 10a (e.g., an orientation flat or a notch) (see FIG. 4B ) formed thereon that indicates the orientation and surface of the wafer 10.

[0033] The transport unit 2 is formed, for example, as a shell having a rectangular shape in a plan view. The transport unit 2 defines a range in which the substrate is transported. The transport unit 2 includes a first long wall 2a and a second long wall 2b arranged opposite each other and extending in a first direction X, and a first short wall 2c and a second short wall 2d arranged opposite each other and perpendicular to the first direction. The first long wall 2a and the second long wall 2b have a first length. The first short wall 2c and the second short wall 2d have a second length different from the first length. The transport unit 2 includes a lower support 2e at its bottom that is connected to the first long wall 2a, the second long wall 2b, the first short wall 2c, and the second short wall 2d. The transport unit 2 includes a plurality of placement and installation sections on which a first placement section 3 and a plurality of second placement sections 4 are installed. The transport unit 2 has a first mounting section 3 provided on a mounting installation section provided on the first long wall 2a, and a plurality of second mounting sections 4 connected to a plurality of mounting installation sections provided on the second long wall 2b at regular intervals along the second long wall 2b. The first length is a length that allows a plurality of first mounting sections 3 and / or second mounting sections 4 to be arranged side by side in the first direction X. In the transport unit 2, a robot support section 2e1 that supports a transfer robot 5 is provided on the lower support body 2e.

[0034] Hereinafter, the longitudinal direction (extension direction of the first long wall 2a and the second long wall 2b) which is the first direction of the conveying section 2 will be referred to as the X direction, the short direction (extension direction of the first short wall 2c and the second short wall 2d) which is perpendicular to the first direction and is the second direction of the conveying section 2 will be referred to as the Y direction, and the height direction (up and down direction) of the conveying section 2 which is perpendicular to the X direction and the Y direction will be referred to as the Z direction.

[0035] The inside of the area of ​​the transport unit 2 surrounded by the first long wall 2a, the second long wall 2b, the first short wall 2c, and the second short wall 2d is set as a movement area A, which is the range of the transport operation. A transfer robot 5 is disposed inside the transport unit 2, and a first placement unit 3 and multiple second placement units 4 are disposed along the periphery of the transport unit 2. The transfer robot 5 is disposed in the center of the movement area A. The movement area A is defined as follows: a first movement area A1 (first area) on one side in the Y direction, with the center C2 of the center where the transfer robot 5 is disposed as the boundary, and a second movement area A2 (second area) on the other side in the Y direction. The first movement area A1 is the area on the second long wall 2b side where the second placement unit 4 is disposed. The second movement area A2 is the area on the first long wall 2a side where the first placement unit 3 is disposed.

[0036] The inside of the transfer section 2 is normally maintained at a positive pressure by controlling the airflow so that it moves from above to below. In the transfer section 2, a load port 21 serving as a first placement section 3 is connected to the first long wall 2a, and a plurality of processing ports 22 serving as a plurality of second placement sections 4 are connected to the second long wall 2b. The processing ports 22 are connected at regular intervals in the longitudinal direction of the second long wall 2b. The transfer section 2 maintains a positive internal air pressure and controls the airflow from above to below to maintain a clean interior.

[0037] The load port 21 is a port for supplying and retrieving wafers 10, and the multiple processing ports 22 are ports used as relay ports between the wafers 10 and processing steps for performing various semiconductor surface treatments, such as film formation. The wafers 10 are transported from the load port 21 to the processing ports 22 by the transfer robot 5. In this case, the load port 21 corresponds to the first mounting part 3, and the processing ports 22 correspond to the second mounting part 4. The wafers 10 that have undergone surface treatment are placed on the processing port 22 and then transferred by the transfer robot 5 from the processing port 22 back to the load port 21, where they are replaced with the next wafer 10 to be surface treated. In this case, the processing port 22 corresponds to the first mounting part 3, and the load port 21 corresponds to the second mounting part 4. A container that holds multiple wafers 10 is placed on the load port 21, and the wafers 10 are sequentially transported to the processing ports 22 by the transfer robot 5. One example of a configuration of the container is one in which a predetermined number of wafers 10, for example, about 25, are stacked at predetermined intervals in the Z direction. The load port 21 and the processing port 22 are provided with entrance / exit sections for taking in and out the wafers 10 from the transfer section 2. The entrance / exit sections for the wafers 10 of the plurality of processing ports 22 are formed to face in the same direction.

[0038] The load port 21 is connected to a load port mounting / installation section 2a1 provided in the center of the first long wall 2a in the X direction. In the illustrated example, four processing ports 22 (four ports) are provided at equal intervals in the X direction and connected to processing port mounting / installation sections 2b1 provided in the second long wall 2b. The multiple processing ports 22 are arranged so that the center C1 of the X-direction interval L1 between the two processing ports 22, 22 arranged in the center in the X direction substantially coincides with the center of the first long wall 2a in the X direction.

[0039] The transfer robot 5 is provided inside the transport unit 2 and transports wafers 10 between the load port 21 and the multiple processing ports 22. The transfer robot 5 is a robot configured to place and move wafers 10. Transport of wafers 10 includes exchange transport, in which wafers 10 are exchanged between the multiple processing ports 22, and sequential transport, in which wafers 10 are transported to the multiple processing ports 22 in a preset order. The transfer robot 5 is disposed midway in the Y direction between the first long wall 2a and the second long wall 2b in a plan view, and is disposed between the load port 21 and the multiple processing ports 22 in a plan view. In other words, the transfer robot 5 is disposed between the load port 21 and the multiple processing ports 22 in a plan view. The load port 21 and the multiple processing ports 22 face each other across the transfer robot 5 in a plan view.

[0040] The transfer robot 5, load port 21, and processing port 22 are arranged so that the center of the transfer robot 5 in a plan view is center C2, the center of the load port 21 in a plan view is center C3, and the center of the X-direction spacing L1 between the two central processing ports 22, 22 in the X direction is center C1, with the positions of centers C1 to C3 in the X direction approximately coinciding on a line extending in the Y direction. When the number of load ports 21 and processing ports 22 installed is odd, the center of the port located at the center in the X direction in a plan view is center C3. When the number of load ports 21 and processing ports 22 installed is even, the center of the X-direction spacing between the two central ports in the X direction in a plan view is center C1. The center C2 of the transfer robot 5 is set at the center of the transport unit 2 in the Y direction.

[0041] 2 and 3 are perspective views of the transfer robot 5. Fig. 3 omits a portion of the transfer robot 5. As shown in Fig. 2 and 3 , the transfer robot 5 includes a main body 51, a swivel support 52, an arm support 53, an arm 54, and a holder 55.

[0042] As shown in FIG. 3 , the main body 51 includes a base 511, an elevator 512, an elevator motor 513, a swing motor 514, an arm support drive motor 515, a control unit 516, and a storage body 517. As shown in FIG. 2 , the base 511 is fixed to a robot support 2e1 provided on a lower support body 2e that forms the bottom of the transfer unit 2. The main body 51 is supported within the transfer unit 2 via the base 511. As shown in FIG. 3 , the elevator 512, the elevator motor 513, the swing motor 514, and the arm support drive motor 515 are built into the storage body 517. The arm support drive motor 515 is located at the upper end in the Z direction within the storage body 517. The control unit 516 is located inside the storage body 517 on the base 511.

[0043] The lifting unit 512 is provided in a storage body 517 on the base 511 so as to be movable up and down. A swivel support unit 52 is supported on the upper part of the lifting unit 512 so as to be rotatable relative to the lifting unit 512. A ball screw mechanism including a ball screw extending in the lifting direction and a guide member (nut) that is threadedly engaged with the ball screw, moves in the lifting direction by the operation of the ball screw, and is connected to the lifting unit 512 is used as the lifting mechanism for the lifting unit 512 using the lifting motor 513. The lifting unit 512 lifts and lowers the swivel support unit 52, arm support unit 53, arm unit 54, and holder 55, which are arranged above the main body 51 in the Z direction, together with the main body 51 by rotating the ball screw using the lifting motor 513. The transfer robot 5 can change the holding height of the wafer 10 according to the respective arrangement heights of the load port 21 and the multiple processing ports 22 by adjusting the height using the lifting unit 512. In addition, by configuring the heights of the first placement unit 3 and the second placement unit 4 to be changeable, the lifting unit 512 and the lifting motor 513 of the transfer robot 5 may be omitted.

[0044] The control unit 516 is provided in the storage body 517 and controls the transport operation of the wafer 10 by the transfer robot 5. By arranging the control unit 516 on the base 511 of the main body 51 of the transfer robot 5, the control unit 516 is arranged close to the control devices (for example, output devices such as various motors and detection devices such as sensors) configured in the transfer robot 5. This makes it possible to shorten the length of electrical wiring including control lines and improve the control speed.

[0045] The swivel support unit 52 is disposed above the main body unit 51 in the Z direction. A first end 52a of the swivel support unit 52 is connected to the upper end of the lifting unit 512 of the main body unit 51, and the swivel support unit 52 is disposed above the main body unit 51 in the Z direction. The swivel support unit 52 has an arm shape extending laterally, and the first end 52a, which is one end of the swivel support unit 52 in the longitudinal direction, is connected to the upper end of the lifting unit 512 of the main body unit 51. The swivel support unit 52 rotates relative to the main body unit 51 in a plan view, using the swivel motor 514, with the first end 52a as a rotation axis (hereinafter referred to as the "first rotation axis 61"). The first rotation axis 61 is centered on a center line CZ1, which is the same as the center C2. The swivel support unit 52 has a first end 52a corresponding to the center line CZ1 and a second end 52b corresponding to a center line CZ2 different from the center line CZ1. The first rotation shaft 61 is disposed along the Z direction and rotates around a center line CZ1. The swivel support part 52 rotates in a substantially horizontal direction around the center line CZ1. The main body part 51 is disposed within the conveying part 2 so that the center (central part) of the swivel support part 52 is aligned with the center C2.

[0046] The arm support portion 53 includes a swivel mounting portion 53a and an arm mounting portion 53b. The arm support portion 53 is disposed above the swivel support portion 52 in the Z direction. A second end portion 52b is provided below the swivel mounting portion 53a in the Z direction and on the opposite side of the first end portion 52a in the longitudinal direction of the swivel support portion 52. The swivel mounting portion 53a is connected to the second end portion 52b of the swivel support portion 52. The arm mounting portion 53b is provided above in the Z direction and is connected to the arm portion 54.

[0047] 9A and 9B, the second end 52b of the swivel support 52 includes an arm support rotation mechanism 530. The arm support rotation mechanism 530 includes an arm support drive motor 515, a drive pulley 515a, a transmission member 514c, a driven pulley 51b, and a rotating body 515d. The transmission member 515c transmits the rotation of the arm support drive motor 515 to the drive pulley 515a. The transmission member 515c is, for example, a steel belt. The drive pulley 515a and the driven pulley 51b are engaged with the transmission member 515c. The rotating body 515d includes a swivel mounting portion 53a. The swivel mounting portion 53a is connected to the driven pulley 515b and has the arm support 53 attached thereto. The arm support rotation mechanism 530 also includes a first shaft member 62a to which the rotating body 515d and the driven pulley 515b are attached so as to be rotatable about the center line CZ2.

[0048] The arm support 53 rotates in a plan view relative to the swivel support 52 by the arm support rotation mechanism 530. The rotational drive force of the arm support drive motor 515 is transmitted to the rotating body 515d via the drive pulley 515a, the transmission member 515c, and the driven pulley 51b. The transmitted rotational drive force causes the rotating body 515d to rotate around the first shaft member 62a.

[0049] A center line CZ2 is set at the second end 52b, and the arm support unit 53 is supported by the swivel support unit 52 so as to be rotatable around the center line CZ2. The arm support unit 53 includes an arm motor 543. The arm motor 543 includes an arm drive mechanism 543a that operates the arm unit 54 around the center line CZ2.

[0050] The arm drive mechanism 543a includes a transmission member 543a2, a driven pulley 543a3, and a rotating body 543a4. The transmission member 543a2 transmits rotation of the arm motor 543 to the driven pulley 543a3. The transmission member 543a2 is, for example, a steel belt. The driven pulley 543a3 is engaged with the transmission member 543a2. The rotating body 543a4 is connected to the driven pulley 543a3 and includes an arm mounting portion 53b to which the arm portion 54 is attached. The arm drive mechanism 543a also includes a second shaft member 62d to which the rotating body 543a4 and the driven pulley 543a3 are mounted so as to be rotatable about the center line CZ2.

[0051] The arm unit 54 includes a first arm 541, a second arm 542, an arm operating mechanism 54a, a first holding hand motor 544, a second holding hand motor 545, and a hand drive transmission mechanism 546. The arm unit 54 is disposed above the arm support unit 53 in the Z direction. The arm operating mechanism 54a transmits the driving force of the arm motor 543, causing the first arm 541 and the second arm 542 to perform predetermined operations.

[0052] The first arm 541 has a first end 541a as a first arm base end and a second end 541b as a first arm moving end. The first end 541a is rotatably supported by the arm support portion 53 and is connected to the arm attachment portion 53b. The second end 541b rotatably supports the second arm 542. The first end 541a and the second end 541b are located at both longitudinal ends of the first arm 541. The first arm 541 is supported by the arm support portion 53 with the first end 541a connected to the arm attachment portion 53b of the arm support portion 53. The first arm 541 is disposed below the second arm 542. The first end 541a of the first arm 541 is connected to an arm drive mechanism 543a.

[0053] The first arm 541 rotates relative to the swivel support part 52 in plan view with the first end part 541a as a rotation axis (hereinafter referred to as the "second rotation axis 62") in conjunction with the rotation of the arm attachment part 53b. Furthermore, the first arm 541 rotates relative to the arm support part 53 in plan view with the first end part 541a as a rotation axis (hereinafter referred to as the "second rotation axis 62") in conjunction with the rotation of the arm drive mechanism 543a by the arm motor 543. The second rotation axis 62 is centered on a center line CZ2 different from the center line CZ1. The center line CZ2 is a line along the Z direction and parallel to the center line CZ1. The first arm 541 rotates around the second rotation axis 62 at the first end part 541a, centered on the center line CZ2. The center line CZ2 of rotation of the arm support portion 53 relative to the second end portion 52b of the swivel support portion 52 and the center line CZ2 of rotation of the arm portion 54 relative to the arm support portion 53 are set on the same line.

[0054] The arm support section 53 serves as a pivot base for the swivel support section 52 and the arm section 54, which are positioned above and below in the Z direction. The arm support section 53 rotates independently with respect to the swivel support section 52 and the arm section 54. Specifically, the arm support section 53 is rotated independently with respect to the swivel support section 52 by an arm support drive motor 515. The arm section 54 is rotated independently with respect to the arm support section 53 by an arm motor 543.

[0055] The second arm 542 includes a first end 542a as a second arm base end rotatably connected to a second end 541b as a first arm moving end, and a second end 542b as a second arm moving end that rotatably supports the holding unit 55. The first end 542a and the second end 542b are located at both longitudinal ends of the second arm 542. The second arm 542 is supported by the first arm 541, with the first end 542a connected to the second end 541b of the first arm 541. The second arm 542 rotates relative to the first arm 541 in a plan view around the first end 542a as a rotation axis (hereinafter referred to as the "third rotation axis 63") by the rotation operation of the arm drive mechanism 543a driven by the arm motor 543. The third rotation axis 63 is centered on a center line CZ3 different from the center lines CZ1 and CZ2. The center line CZ3 is a line along the Z direction and is a line parallel to the center lines CZ1 and CZ2. The second arm 542 rotates around the third rotation shaft 63 at the first end 542a, with the center line CZ3 as the center.

[0056] The second arm 542 has a first holding hand motor 544 and a second holding hand motor 545 built in, and a hand drive transmission mechanism 546 built in at the second end 542b side. The first holding hand motor 544 and the second holding hand motor 545 are arranged in parallel in the Y direction. The hand drive transmission mechanism 546 includes a first hand drive transmission mechanism 546a that transmits the drive force of the first holding hand motor 544, and a second hand drive transmission mechanism 546b that transmits the drive force of the second holding hand motor 545.

[0057] The hand drive transmission mechanism 546 includes a first hand drive transmission mechanism 546 a that transmits the driving force of the first holding hand motor 544 , and a second hand drive transmission mechanism 546 b that transmits the driving force of the second holding hand motor 545 .

[0058] The arm unit 54 rotates the first arm 541 and the second arm 542 according to a predetermined operation in a plan view by transmitting the driving force of the arm motor 543 via the arm drive mechanism 543a, thereby bending and extending the entire arm unit 54 about the center line CZ3, thereby adjusting the maximum length of the arm unit 54. Specifically, the arm unit 54 adjusts the length of the arm unit 54 by transmitting the driving force of the arm motor 543 via the arm drive mechanism 543a, thereby moving the second end 542b, which serves as the second arm moving end, closer to or farther away from the first end 541a, which serves as the first arm base end, along a straight line connecting the center line CZ2 and the center line CZ4.

[0059] The holding unit 55 includes a first holding hand 551, a second holding hand 552, a first support unit 553, and a second support unit 554. The holding unit 55 is disposed above the arm unit 54 in the Z direction.

[0060] The first holding hand 551 and the second holding hand 552 are arranged with a fixed distance in the Z direction. The first holding hand 551 is provided above the second holding hand 552. The first holding hand 551 includes a first hand tip 551a that holds the wafer 10. The second holding hand 552 includes a second hand tip 552a that holds the wafer 10. The first holding hand 551 and the second holding hand 552 hold the wafer 10 at the first hand tip 551a and the second hand tip 552a, respectively, using holding mechanisms (not shown). The method of holding the wafer 10 is not limited, and a configuration may be adopted in which, for example, a hand is inserted below the wafer 10 to scoop up and place the wafer 10, and then the wafer 10 is adsorbed to the hand by negative pressure and held thereon.

[0061] 2, the first support portion 553 and the second support portion 554 are held by the second arm 542. The first support portion 553 has a first hand base end portion 551c rotatably supported by the second arm 542. The first holding hand 551 is connected to a distal end 551b of the first support portion 553. The second support portion 554 has a second hand base end portion 552c rotatably supported by the second arm 542. The second holding hand 552 is connected to a distal end 552b of the second support portion 554.

[0062] The first support member 553 rotates relative to the second arm 542 in a plan view by a first holding hand motor 544 shown in FIG. 3 . The second support member 554 rotates relative to the second arm 542 in a plan view by a second holding hand motor 545 shown in FIG. 3 . Hereinafter, the rotation axis of the first support member 553 will be referred to as the fourth rotation axis 64, and the rotation axis of the second support member 554 will be referred to as the fifth rotation axis 65. The centers of the fourth rotation axis 64 and the fifth rotation axis 65 coincide with a center line CZ4 that is different from the center lines CZ1, CZ2, and CZ3. The center line CZ4 is a line along the Z direction and is parallel to the center lines CZ1, CZ2, and CZ3. The first support member 553 and the second support member 554 rotate around the fourth rotation axis 64 and the fifth rotation axis 65, which are centered on the center line CZ4. The first support portion 553 and the second support portion 554 rotate independently of each other. For example, the first support portion 553 and the second support portion 554 rotate independently of each other in the forward and reverse directions.

[0063] 1 , in the transfer system 1, there are set placement positions, which are set as positions of the placement parts where the wafer 10 is placed on the first placement part 3 and the second placement part 4, respectively, and respective pre-placement positions, which correspond to the placement positions of the first placement part 3 and the second placement part 4 and are set as positions in front of the placement parts, within the range of the transfer part 2. In the load port 21 corresponding to the first placement part 3 in this embodiment, a placement position 21Pa is set as the position of the placement part 210, and a pre-placement position 21Fa is set as the position in front of the placement part 210. Furthermore, in the multiple processing ports 22 corresponding to the second placement part 4, placement positions 22Pa to 22Pd are set as positions of the placement parts 220a to 220d corresponding to the respective processing ports 22, and pre-placement positions 22Fa to 22Fd are set as positions in front of the placement parts 220a to 220d.

[0064] When controlling the transport operation of the wafer 10 by the transfer robot 5 or the removal operation of the wafer 10, the control unit 516 (robot control unit) controls the movement of the holding part 55 through each loading position and each pre-loading position set according to each operation control.

[0065] The control unit 516 includes a first movement control that moves the holder 55 between the placement position 21Pa and the pre-placement position 21Fa set in the load port 21, or between the placement positions 22Pa to 22Pd set in each of the processing ports 22 and the pre-placement positions 22Fa to 22Fd set corresponding to each of the placement positions 22Pa to 22Pd. The control unit 516 includes a second movement control that moves the holder 55 between the pre-placement positions 22Fa to 22Fd set along at least the first direction inside the transport unit 2.

[0066] The first movement control includes second linear interpolation movement control for linearly interpolating the holding unit 55 along the second direction. The second movement control includes first linear interpolation movement control for linearly interpolating the holding unit 55 along the first direction, a swivel rotation control for swivelly moving the swivel support unit 52 in a predetermined swivel direction, and an operation control (cancelling operation control) for rotationally moving the arm support unit 53 in a direction opposite to the swivel direction of the swivel support unit 52.

[0067] The control unit 516 executes first movement control by controlling the movement of the holder 55 in the second direction, or executes second movement control by controlling the movement of the holder 55 in the first direction, thereby moving the holder 55 while maintaining the mark 10a of the wafer 10 in the same constant direction relative to each placement position, thereby transporting the wafer 10. Each pre-placement position can be set so that the holder 55 can move from each placement position to another different placement position via the shortest movement path, allowing efficient substrate transport in the substrate transport system 1.

[0068] 4A to 7B, a method for transporting the wafer 10 by the transfer robot 5 in the substrate transport system 1 will be described below. Hereinafter, the swivel support unit 52, the arm support unit 53, the arm unit 54, and the holder unit 55 of the transfer robot 5 will be collectively referred to as the arm 50.

[0069] 1 , in the substrate transfer system 1, the transfer robot 5 receives the wafer 10 from the load port 21 and operates the arm 50 to transfer the wafer 10 to the processing port 22 to be transferred. The wafer 10 is first transferred from the placement part 210 (first placement part 3) in the load port 21 to the placement part 220a (second placement part 4) in the first processing port 22a, and then transferred to a surface treatment step via the first processing port 22a. The movement of the arm 50 is controlled by a control unit 516 provided in the main body 51.

[0070] As shown in FIG. 4A, the transfer robot 5 moves the arm support portion 53 and the arm portion 54 around the second rotation axis 62, moves the second arm 542 relative to the first arm 541 of the arm portion 54 around the third rotation axis 63, and moves the holding portion 55 around either the fourth rotation axis 64 or the fifth rotation axis 65, thereby removing the wafer 10 from the loading portion 220a.

[0071] The transfer robot 5 takes out the wafer 10 from the placement unit 220a, and rotates the arm support unit 53 and the arm unit 54 around the second rotation axis 62 and the third rotation axis 63 in the same direction in a plan view according to the movement direction of the holder 55 and the wafer 10. The transfer robot 5 rotates the first holding hand 551 in a predetermined rotation direction around the fourth rotation axis 64, and rotates the second holding hand 552 in a predetermined rotation direction around the fifth rotation axis 65. By these rotations, the holder 55 is positioned at a pre-placement position 22Fa in front of the placement unit 220a in the Y direction while maintaining the mark 10a of the wafer 10 in the predetermined direction. The arm portion 54 adjusts the arm length by rotating the second arm 542 in the opposite direction in a planar view relative to the first arm 541, with the third rotation axis 63 as the rotation axis, and by moving the second end 542b, which serves as the second arm moving end, closer to or farther away from the first end 541a, which serves as the base end of the first arm, along a straight line connecting the center line CZ2 and the center line CZ4.

[0072] When the arm 54 is bent while maintaining the left arm position, it rotates counterclockwise, and when it is extended, it rotates clockwise. That is, in Figures 4A to 4C, when the arm support 53 is moved from the placement position 22Pd to the pre-placement position 22Fd with respect to the placement portion 220d of the processing port 22d, which is located at a position greater than the length of the swivel support 52 when the arm support 53 is located to the right of the main body 51, it rotates clockwise. When the arm support 53 is moved from the pre-placement position 22Fd to the placement position Pd, it rotates counterclockwise. When the arm support 53 is moved from the placement position 22Pa to the pre-placement position 22Fa with respect to the placement portion 220a of the processing port 22a, which is located at a position greater than the length of the swivel support 52 when the arm support 53 is located to the left of the main body 51, it rotates counterclockwise, and when the arm support 53 is moved from the pre-placement position 22Fa to the placement position 22Pa, it rotates counterclockwise.

[0073] 4A , after the wafer 10 is placed in front of the placement part 220a in the Y direction, the first arm 541 is rotated clockwise in a plan view about the second rotation shaft 62, and the second arm 542 is rotated clockwise in a plan view about the third rotation shaft 63 so as to maintain the attitude of the wafer 10 relative to the rotation amount of the first arm 541. By the rotation of the arm 50, the wafer 10 is transported from the pre-placement position 22Fa to the placement position 22Pa while maintaining the attitude of the wafer 10, and the wafer 10 is transported to the first surface treatment step via the first processing port 22a.

[0074] As shown in Fig. 4A , after the wafer 10 has been subjected to the first surface treatment and is placed on the placement portion 220a of the first processing port 22a, the wafer 10 is transported from the placement portion 220a (first placement portion 3) to the placement portion 220b (second placement portion 4) in the second processing port 22b as shown in Figs. 4B to 5A . As shown in Fig. 4B , the transfer robot 5 rotates the arm support portion 53 and the arm portion 54 about the second rotation axis 62, and rotates the second arm 542 relative to the first arm 541 of the arm portion 54 about the third rotation axis 63, counterclockwise in a plan view. The transfer robot 5 rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. By these rotations, the mark 10a of the wafer 10 is maintained in a predetermined direction, and the wafer 10 is removed from the mounting section 220a while maintaining its posture, and then transported again to the pre-mounting position 22Fa, which is a position in front of the mounting section 220a in the Y direction.

[0075] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220a or removing the wafer 10 from the mounting portion 220a, the arm 50 moves the holding portion 55 along a center line VL21 that is parallel to the Y direction and connects the center 22Pa in a plan view of the mounting portion 220a and the pre-mounting position 22Fa, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL21 (see FIG. 4A ) while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0076] 4C , when transporting the wafer 10 to one side in the X direction (first direction), the transfer robot 5 rotates the swivel support unit 52 clockwise in a plan view about the first rotation shaft 61 (rotational movement) and rotates the arm support unit 53 counterclockwise in a plan view about the second rotation shaft 62 (rotational movement) to transport the wafer 10. Alternatively, when transporting the wafer 10 to the other side in the X direction (first direction), the transfer robot 5 rotates the swivel support unit 52 counterclockwise in a plan view about the first rotation shaft 61 and rotates the arm support unit 53 clockwise in a plan view about the second rotation shaft 62 to transport the wafer 10. By performing these transport operations, the wafer 10 can be transported from one of the pre-loading positions 22Fa to 22Fd to a different pre-loading position while maintaining the mark 10a of the wafer 10 in a predetermined orientation. For example, while maintaining the posture of the wafer 10, the wafer 10 can be moved from a pre-placement position 22Fa in front of the placement unit 220a in the Y direction, which is one of the pre-placement positions 22Fa to 22Fd, to the placement unit 220b arranged in the X direction, and then transported to a pre-placement position 22Fb in front of the placement unit 220b in the Y direction while maintaining the mark 10a of the wafer 10 in a predetermined direction.

[0077] 5A , after placing the wafer 10 at the pre-placement position 22Fb located before the placement unit 220b in the Y direction, the transfer robot 5 rotates the arm support unit 53 and the arm unit 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm unit 54 clockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. These rotations allow the wafer 10 to be transported from the pre-placement position 22Fb to the placement unit 220b while maintaining the mark 10a of the wafer 10 in a predetermined direction and maintaining the orientation of the wafer 10. The wafer 10 is then transported to the second surface treatment process via the second processing port 22b.

[0078] When the wafer 10 that has undergone the second surface treatment is placed on the placement portion 220b of the second processing port 22b, as shown in FIG. 5B , the wafer 10 is transported from the placement portion 220b (first placement portion 3) to the placement portion 220c (second placement portion 4) in the third processing port 22c. The transfer robot 5 rotates the arm support portion 53 and the arm portion 54 counterclockwise in plan view about the second rotation axis 62, and rotates the second arm 542 of the arm portion 54 counterclockwise in plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. With these rotations, the wafer 10 is removed from the placement portion 220b while maintaining the mark 10a of the wafer 10 in a predetermined direction and the orientation of the wafer 10, and is then transported again to a pre-placement position 22Fb, which is a position before the placement portion 220b in the Y direction.

[0079] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220b or removing the wafer 10 from the mounting portion 220b, the arm 50 moves the holding portion 55 along a center line VL22 that is parallel to the Y direction and connects the center 22Pb in a plan view of the mounting portion 220b and the pre-mounting position 22Fb, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL22 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0080] 6A , after the wafer 10 is moved from the pre-placement position 22Fb to the pre-placement position 22Fc, which is located before the placement unit 220c in the Y direction, the transfer robot 5 rotates the swivel support unit 52 counterclockwise in plan view about the first rotation axis 61, and rotates the arm support unit 53 and the arm unit 54 counterclockwise in plan view about the second rotation axis 62. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. By these rotations, the wafer 10 is transported to the placement unit 220c while maintaining the position of the wafer 10 and keeping the mark 10a of the wafer 10 in a predetermined direction, and the wafer 10 is then transported to the third surface treatment process via the third processing port 22c.

[0081] 6A, when the wafer 10 that has undergone the third surface treatment is placed on the placement portion 220c of the third processing port 22c, the wafer 10 is transported from the placement portion 220c (first placement portion 3) to the placement portion 220d (second placement portion 4) in the fourth processing port 22d as shown in FIG. 6B. The transfer robot 5 rotates the swivel support portion 52 clockwise in a plan view about the first rotation axis 61 as a rotation axis, and rotates the arm support portion 53 and the arm portion 54 clockwise in a plan view about the second rotation axis 62 as a rotation axis, thereby removing the wafer 10 from the placement portion 220c while maintaining the attitude of the wafer 10 and maintaining the mark 10a of the wafer 10 in a predetermined direction, and transports it again to a pre-placement position 22Fc, which is a position before the placement portion 220c in the Y direction.

[0082] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220c or removing the wafer 10 from the mounting portion 220c, the arm 50 moves the holding portion 55 along a center line VL23 (see FIG. 4A ) that is parallel to the Y direction and connects the center 22Pc in a plan view of the mounting portion 220c and the pre-mounting position 22Fc, thereby transferring the wafer 10. Specifically, the holding portion 55 is moved along the center line VL23 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0083] 7A , after moving the wafer 10 from the pre-placement position 22Fc to the pre-placement position 22Fd located before the placement unit 220d in the Y direction, the transfer robot 5 rotates the arm support unit 53 and the arm unit 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm unit 54 counterclockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. These rotations allow the wafer 10 to be transported from the pre-placement position 22Fd to the placement unit 220d while maintaining the mark 10a of the wafer 10 in a predetermined direction and maintaining the orientation of the wafer 10. The wafer 10 is then transported to a fourth surface treatment step via the fourth processing port 22d.

[0084] As shown in FIG. 7A , when the wafer 10 that has undergone the fourth surface treatment is placed on the placement portion 220d of the fourth processing port 22d, as shown in FIG. 7B , the wafer 10 is transported from the placement portion 220d (first placement portion 3) to the placement portion 210 (second placement portion 4) in the load port 21 again. The transfer robot 5 rotates the arm support portion 53 and the arm portion 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm portion 54 clockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. With these rotations, the wafer 10 is removed from the placement portion 220d while maintaining the mark 10a of the wafer 10 in a predetermined direction and the orientation of the wafer 10, and is transported again to a pre-placement position 22Fd located before the placement portion 220d in the Y direction.

[0085] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220d or removing the wafer 10 from the mounting portion 220d, the arm 50 moves the holding portion 55 along a center line VL24 that is parallel to the Y direction and connects the center 22Pd in ​​a plan view of the mounting portion 220d and the pre-mounting position 22Fd, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL24 (see FIG. 4A ) while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0086] After the wafer 10 is transported again to a pre-placement position 22Fd in front of the placement unit 220d in the Y direction, the swivel support unit 52 and the arm unit 54 are rotated clockwise in a plan view. The holder 55 is rotated around either the fourth rotation shaft 64 or the fifth rotation shaft 65 as the rotation axis. Then, all of the wafers 10 that have undergone surface treatment in each processing port 22 are transported to the placement unit 210, completing the surface treatment of the wafers 10. When a single container contains multiple wafers 10 placed on the load port 21, the above operation is repeated to sequentially perform the surface treatment on all of the wafers 10 stored in the container.

[0087] The substrate transfer system 1 may have the first holding hand 551 and the second holding hand 552 each hold a wafer 10 and rotate the two holding hands relative to each other in a plan view, thereby simultaneously transferring two wafers 10 at offset positions in a plan view and performing continuous surface treatment. In this case, when transferring a wafer 10 to each processing port 22, the transfer robot 5 first transfers one of the wafers 10 to the placement portion of the processing port 22. The wafer 10 is then transferred to a surface treatment step via the transferred processing port 22, where the surface treatment of the wafer 10 is performed. Once the wafer 10 for which surface treatment has been completed is placed on the placement portion of the corresponding processing port 22, the transfer robot 5 removes it to a pre-placement position, which is a position in front of the placement portion of the processing port 22 in the Y direction.

[0088] Thereafter, the transfer robot 5 rotates the first support portion 553 and the second support portion 554 in a plan view about the center line CZ4, places the wafer 10 that has not yet been surface-treated at a pre-placement position 22Fa, which is a position in front of the placement portion of the processing port 22 in the Y direction, and transports the wafer 10 to the placement portion of the processing port 22 in the same procedure. The wafer 10 is then transported to the surface treatment step via the transferred processing port 22, thereby performing surface treatment on the wafer 10. After the surface treatment is completed, the wafer 10 that has undergone surface treatment is placed on the placement portion of the processing port 22, and the transfer robot 5 removes the wafer 10 that has undergone surface treatment from the placement portion of the processing port 22.

[0089] The rotation directions of the swivel support part 52 and the arm part 54 in a plan view when the wafer 10 is transferred to each second mount part 4 are not limited to those described above, and may be determined depending on conditions such as the layout of the substrate transfer system 1 and the order of transfer to each mount part. When the swivel support part 52 and the arm part 54 rotate, the arm support part 53 acts as an intervening element, so that the orientation of the wafer 10 is always maintained in a predetermined direction on one side or the other side of the Y direction (second direction).

[0090] The rotation of the arm support portion 53 and the arm portion 54 is an operation that prevents the movement trajectory of the wafer 10 supported by the holding portion 55 from deviating from the center line connecting the center of the second loading portion 4 in a planar view and the pre-loading position, which is a position in front of the second loading portion 4 in the Y direction.

[0091] When the wafer 10 is placed in a pre-placement position in front of the second placement section 4 in the Y direction, if the heights of the wafer 10 and the second placement section 4 in the Z direction are different, the height of the wafer 10 is adjusted using the lifting section 512 of the main body section 51.

[0092] 1 and 8 , the first movement area A1 has a first area length A1L set as the distance between the second long wall 2b and the center C2 in a plan view where the main body 51 of the transfer robot 5 is installed. The first area length A1L is set to a distance equivalent to a swivel tip length 52La set as the length between the first rotation axis 61 set at the first end 52a of the swivel support part 52 and the outer tip of the swivel support part 52 on the second end 52b side.

[0093] The second movement area A2 has a second area length A2L set as the distance between the first long wall 2a and the center C2 in a plan view where the main body 51 of the transfer robot 5 is installed. The second area length A2L is set to a distance equivalent to a swivel tip length 52La set as the length between the first rotation axis 61 set at the first end 52a of the swivel support part 52 and the outer tip of the second end 52b side of the swivel support part 52. In other words, the second area length A2L is set to the same distance as the first area length A1L, and the second movement area A2 is provided which is equivalent to the first movement area A1.

[0094] The swivel support part 52 is connected to the main body part 51 so as to be movable around a center C2 in a plan view at which the main body part 51 of the transfer robot 5 is installed relative to the first movement area A1 and the second movement area A2. In other words, the swivel support part 52 can swivel freely within the movement area A.

[0095] A port distance 22L is set as the spacing between the multiple processing ports 22 arranged along the second long wall 2b provided on the first movement region A1 side of the transport unit 2. The port distance 22L is set as twice the length of the pivot shaft length 52L, which is set as the length between the first rotation shaft 61 set at the first end 52a of the pivot support unit 52 and the second rotation shaft 62 set at the second end 52b of the pivot support unit 52. In other words, the pivot shaft length 52L is set to half the port distance 22L. In other words, the processing ports 22 are arranged at a distance equal to the diameter of a circle on which the second rotation shaft 62 set at the second end 52b of the pivot support unit 52 moves, rotating around the center C2. The port distance 22L is set to a value equal to the diameter of the circle on which the second rotation shaft 62 moves.

[0096] When an odd number of processing ports 22 are installed, the mounting position of one of the inner processing ports 22 arranged between other processing ports 22 is arranged at a position that coincides with the position of a straight line passing through the center C2. The inner processing port 22 and the other processing ports 22 arranged on both sides are arranged with a distance equal to the port distance 22L.

[0097] When the number of processing ports 22 to be installed is even, the position between any two processing ports 22, 22 that are located between other processing ports 22, 22, is aligned with the position of a straight line passing through center C2. The port distance 22La of the processing ports 22 located on one side and the other side of the position between the two processing ports 22, 22 is the same as the radius of the circle on which the second rotation shaft 62, which is set at the second end 52b of the rotation support 52 and rotates around center C2, moves. The other processing ports 22 located outside the two processing ports 22, 22 are spaced apart at a distance equal to the port distance 22L.

[0098] As described above, the positions at which the multiple processing ports 22 are arranged are spaced apart from each other by an integer multiple of the port distance 22La, which is set to the same distance as the inter-swivel axis length 52L around the center C2, and the odd-numbered positions are offset by one port distance 22La from the even-numbered positions. Furthermore, the load ports 21 arranged along the first long wall 2a on the second transfer region A2 side are also arranged at positions set by the port distance 22La as positions at which processing ports 22 should be arranged.

[0099] As described above, the positions and lengths of the transfer area A including the first transfer area A1 and the second transfer area A2 provided in the substrate transfer system 1, the load port 21 as the first receiver 3 arranged around the transfer area A, the multiple processing ports 22 as the multiple second receivers 4, and the pivot axis length 52L and the pivot tip length 52La of the swivel support unit 52 configured in the transfer robot 5 are set relative to the center C2. This setting allows the transfer robot 5 to move efficiently. Furthermore, the wafer 10 can be transferred by positioning the mark 10a of the wafer 10 relative to the load port 21 and the multiple processing ports 22 in a predetermined direction. Furthermore, the transfer trajectory of the wafer 10 within the transfer area A can be set to the shortest distance.

[0100] The effects of the substrate transport system and transfer robot according to this embodiment will be described.

[0101] In the substrate transport system 1, by providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to facilitate the calculation and control for the movement within the first movement area A1 and the second movement area A2. Furthermore, by providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to move the arm 50 along a minimal movement trajectory. As a result, it is possible to narrow the range of the movement areas A1 and A2 (the lengths of the movement areas A1 and A2 in the Y direction). Therefore, it is possible to make the transport unit 2 in which the transfer robot 5 is installed compact. By providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to make the movement of the arm 50 compact, thereby transporting wafers 10 with high efficiency.

[0102] The substrate transport system 1 includes an arm support 53 between the swivel support 52 and arm 54 of the arm 50 of the transfer robot 5. This configuration allows the wafer 10 to be transported while maintaining the orientation of the wafer 10 and keeping the mark 10a of the wafer 10 in a predetermined direction. This eliminates the need to adjust the orientation of the wafer 10 when loading the wafer 10 into each platform, allowing for efficient surface processing of the wafer 10 in the processing steps connected via each processing port 22. The transfer robot 5 includes the arm support 53 between the swivel support 52 and arm 54 and is operationally controlled. This control allows the wafer 10 to be transported while adjusting the orientation of the wafer 10 relative to the first platform 3 and the second platform 4, thereby enabling efficient transport of the wafer 10.

[0103] In the substrate transport system 1, the transfer robot 5, load port 21, and multiple processing ports 22 are arranged so that the X-direction positions of the center C2 of the transfer robot 5 in a plan view, the center C3 of the load port 21 in a plan view, and the center C1 of the X-direction spacing L1 between the two central processing ports 22, 22, 22, are approximately aligned in the Y direction. With the above configuration, the transfer robot 5 includes an arm support unit 53 between the swivel support unit 52 and the arm unit 54, and is arranged around the center C2 in the plan view of the transport unit 2, and the load port 21 and multiple processing ports 22 are set based on the swivel axis length 52L and the swivel tip length 52La of the swivel support unit 52, centered around the center C2. This shortens the travel distance of the arm 50, thereby improving the efficiency of wafer 10 transport.

[0104] The substrate transfer system 1 can remove the wafer 10 from each mounting portion parallel to the Y direction while maintaining the position of the mark 10a on the wafer 10 by rotating the arm 50 of the transfer robot 5. When moving the wafer 10 between a plurality of processing ports 22 arranged in the X direction, the substrate transfer system 1 can move the wafer 10 parallel to the X direction while maintaining the position of the mark 10a on the wafer 10 by rotating the arm 50. The transfer robot 5 transports the wafer 10 by linear movement while maintaining the orientation of the wafer 10. Therefore, the transfer robot 5 can shorten the operation of aligning the orientation of the wafer 10, allowing for efficient transport of the wafer 10.

[0105] The substrate transfer system 1 can remove the wafer 10 from each platform parallel to the Y direction. This eliminates the need to enlarge each port and each platform in consideration of the range of motion of the arm 50 when transferring the wafer 10, thereby preventing the device from becoming too large. Furthermore, the substrate transfer system 1 can move the wafer 10 in a linear direction. This eliminates the need for complex control of the arm direction when transferring the wafer 10 to the second platform 4, thereby simplifying arm control.

[0106] The arm 50 of the substrate transfer system 1 moves while the arm section 54, which includes two connected arms that can be bent around a connecting section, is maintained in either a first position in which the arm section 54 is bent in one direction or a second position in which the arm section 54 is bent in the other direction. With this configuration, the arm 50 can transfer the wafer 10 without changing the direction of the bent position of the arm section 54. This eliminates shocks and vibrations that occur when the bent position of the arm section 54 is changed.

[0107] Another embodiment of the substrate transfer system of the present embodiment will be described with reference to Fig. 10. As shown in Fig. 10, the substrate transfer system 100 includes a transfer section 102 equipped with two transfer robots 105A and 105B.

[0108] In the transport unit 102, as transportable areas, an area that can be transported by the first transfer robot 105A is set as a first transport unit 111, and an area that can be transported by the second transfer robot 105B is set as a second transport unit 112. A first placement unit group 121 on which substrates can be placed is provided around the first transport unit 111, and a second placement unit group 122 on which substrates can be placed is provided around the second transport unit 112.

[0109] The transport unit 102 is provided with an intermediary placement unit 130 that transfers substrates between the first transfer robot 105A and the second transfer robot 105B. The intermediary placement unit 130 is included in the transportable areas of the first transport unit 111 and the second transport unit 112, and is provided between the first placement unit group 121 and the second placement unit group 122.

[0110] For example, the substrate is transferred by the first transfer robot 105A from a relay port (not shown) to the first port 121a of the first placement unit group 121, where the first processing is performed on the substrate, and then the substrate is transferred by the first transfer robot 105A from the first port 121a to the second port 121b, where the second processing is performed on the substrate.

[0111] The substrate that has been subjected to the second process is transported to the first relay port 130a of the relay mount part 130 by the first transfer robot 105A.

[0112] The substrate transported to the first relay port 130a of the intermediate mount part 130 is transported by the second transfer robot 105B to the third port 122a, where the substrate is subjected to a third process. The substrate is then transported by the second transfer robot 105B sequentially from the third port 122a to the fourth port 122b and the fifth port 122c, which are aligned in one direction in the transport direction. The substrate transported to the fourth port 122b and the fifth port 122c is subjected to a fourth process in the fourth port 122b and a fifth process in the fifth port 122c. The substrate that has been subjected to the fifth process is transported from the fifth port 122c to the sixth port 122d by the second transfer robot 105B, where the substrate is subjected to a sixth process.

[0113] The substrates that have been subjected to the sixth process are transported by the second transfer robot 105B from the sixth port 122d to the seventh port 122e and the eighth port 122f, which are arranged in the other direction opposite to the one transport direction. The substrates transported to the seventh port 122e and the eighth port 122f are subjected to the seventh process at the seventh port 122e and the eighth process at the eighth port 122f.

[0114] The substrate that has undergone the eighth process is transported to the second relay port 130b, and then transported to a relay port (not shown) by the first transfer robot 105A. In the transport unit 102, the wafers 10 are transported sequentially from the first relay port 130a in a clockwise direction as shown by arrow D in FIG.

[0115] The same effects as those of the above embodiment can be obtained in the substrate transfer system 100 configured in this manner. The placement of the transfer unit, the placement unit group, and the intermediate placement unit can be set arbitrarily, and each unit may be appropriately placed within the range that can be transported by the transfer robot.

[0116] The substrate transfer system 1 includes one load port 21 and four processing ports 22, but is not limited to the above configuration. The substrate transfer system 1 may also be configured with, for example, one load port 21 and three processing ports 22. The substrate transfer system 1 may also be configured with, for example, three load ports 21 and three processing ports 22. The substrate transfer system 1 may also be configured with, for example, multiple load ports 21 and one processing port 22. When there is one load port 21 or one processing port 22 and two or more of the other, the transfer robot 5 may be positioned to face one of the two or more mounting units in the Y direction.

[0117] In the substrate transport system 1, the load port 21 is disposed on the first long wall 2a side in the Y direction with the transfer robot 5 in between, and the processing port 22 is disposed on the second long wall 2b side in the Y direction, but this configuration is not limited to the above. The substrate transport system 1 may also be configured, for example, with the load port 21 and the processing port 22 arranged in parallel in either the X direction or the Y direction. In the above configuration, a plurality of transfer robots 5 may be arranged in the same direction as the arrangement of the load port 21 and the processing port 22, and an intermediary unit may be provided between the load port 21 and the processing port 22 to temporarily place the wafer 10 between adjacent transfer robots 5, 5. In the above configuration, the intermediary unit serves as the second placement unit 4 when the transferred wafer 10 is temporarily placed thereon and as the first placement unit 3 when the temporarily placed wafer 10 is removed therefrom.

[0118] Although an embodiment of the present invention has been described above in detail with reference to the drawings, the specific configuration is not limited to this embodiment, and design changes that do not deviate from the gist of the present invention are included in the present invention.

[0119] The substrate transport system and the transfer robot can be used to efficiently transport substrates.

[0120] REFERENCE SIGNS LIST 1, 100 Substrate transport system 2, 102 Transport unit 3 First mounting unit 4 Second mounting unit 5, 105A, 105B Transfer robot 10 Wafer (substrate) 51 Main body unit 52 Swivel support unit 53 Arm support unit 54 Arm unit 55 Holding unit 516 Control unit (robot control unit)

Claims

1. a transport section that defines a range in which the substrate is transported; a first placement part and a second placement part on which the substrate is placed; a transfer robot provided inside the transport unit and configured to transport the substrate from the first placement unit to the second placement unit; Equipped with a range of the transport section is set to a predetermined first length in a first direction in which the first placement sections and the second placement sections can be arranged side by side, and a second length in a second direction perpendicular to the first direction, which is shorter than the first length; The transfer robot is A main body portion disposed within the transport portion; A rotation support part connected to the main body part; an arm support portion connected to the pivot support portion; an arm portion connected to the arm support portion; a holder connected to the arm and configured to hold the substrate; Equipped with The swivel support portion is a first end portion rotatably coupled to the body portion; a second end portion to which the arm support portion is rotatably coupled; Equipped with The arm portion includes a first arm connected to the arm support portion and a second arm connected to the holding portion, The swivel support portion is connected to the main body portion so as to be rotatable about a rotation axis of the connection portion with the main body portion in a plan view, the arm support portion is connected to the swivel support portion and the arm portion so as to be independently rotatable; the arm support portion is connected to the swivel support portion so as to be rotatable about a rotation axis of a connection portion with the swivel support portion in a plan view, a central axis of rotation of the arm support portion relative to the second end portion of the swivel support portion and a central axis of rotation of the arm portion relative to the arm support portion are arranged on the same line, the arm portion is connected to the arm support portion so as to be rotatable about a rotation axis of a connection portion with the arm support portion in a plan view, the transfer robot is disposed such that a center of rotation of the first end portion is located in a central portion of at least one of the first direction and the second direction within a range of the transport portion; Substrate transport system.

2. The conveying unit is a robot support unit that supports the main body unit of the transfer robot; The substrate transfer system according to claim 1 , further comprising: a plurality of placement placement parts on which the first placement part and the second placement part are provided.

3. 3. The substrate transport system of claim 2, wherein the spacing between the multiple mounting and placement parts arranged in the first direction is set to a value equal to the diameter of a circle formed by a circumferential orbit of a rotation axis of the swivel support part to which the arm support part is connected.

4. When the number of the mounting units is odd, the main body is disposed such that a center of rotation of the first end portion relative to the main body and a center of the mounting unit disposed in the center are set at the same position in the first direction, 3. The substrate transport system of claim 2, wherein when the number of the mounting sections is an even number, the main body section is positioned such that the center between adjacent mounting sections in the center of the first direction and the center of the first end relative to the main body section are set at the same position in the first direction.

5. a first region on one side in the second direction and a second region on the other side in the second direction are set with the main body portion as a boundary in the range in which the substrate is transported in the transport section; 2. The substrate transport system of claim 1, wherein the length of the first region and the second region is set to a distance equal to a rotation tip length which is set as the length between a first rotation axis set at the first end of the rotating support and an outer tip of the rotating support on the second end side.

6. the second arm is connected to the first arm so as to be rotatable around a rotation axis of a connection portion with the first arm in a plan view, 2. The substrate transport system of claim 1, wherein when the substrate is transferred between a plurality of the first and second mounting portions, a direction of a bending posture of the first arm and the second arm of the arm portion in which the second arm is bent about a rotation axis about which the second arm rotates relative to the first arm is maintained in either a first posture in which the first arm is bent in one direction, or a second posture in which the second arm is bent in another direction different from the one direction.

7. The substrate transport system according to claim 1 , further comprising a robot control unit for controlling the driving of the transfer robot in the main body.

8. The first arm is a first arm base end portion rotatably connected to the arm support portion; a first arm moving end portion that is an end portion opposite to the first arm base end portion and that rotatably connects the second arm, The second arm is a second arm base end portion rotatably connected to the first arm moving end portion; The substrate transfer system according to claim 1 , further comprising: a second arm moving end portion which is an end portion opposite to the second arm base end portion and which rotatably couples the holding portion.

9. The holding unit includes a first holding hand and a second holding hand provided below the first holding hand, The substrate transport system of claim 8 , wherein the first holding hand and the second holding hand each have a hand tip portion for holding the substrate, and a hand base portion each rotatably connected to the second arm moving end portion.

10. the first placement unit and the second placement unit are provided in a plurality of positions facing each other along a periphery of the transport unit with the transfer robot interposed therebetween in a plan view, 2. The substrate transport system of claim 1, wherein the plurality of first placement portions and the plurality of second placement portions are each arranged at regular intervals in the first direction based on the position of the center of rotation of the first end portion arranged in the central portion.

11. The transfer robot is provided in plurality on the transport section, The conveying unit is a first transport section as an area where the first transfer robot can transport; a second transport section as an area where transport can be performed by a second transfer robot; a first placement unit group provided around the first transport unit and including a plurality of the first placement units on which the substrate is placed; a second placement part group provided around the second transport part and including a plurality of the second placement parts on which the substrate is placed, the first transfer robot and the second transfer robot are disposed adjacent to each other in the first direction, and the main body is disposed such that a center of rotation of the first end is located in a center portion of at least one of the first direction and the second direction within a range of the corresponding transport section; an intermediate placement unit for transferring the substrate between the first transfer robot and the second transfer robot; The substrate transport system according to claim 1 , wherein the intermediate platform is provided between the first platform group and the second platform group.

12. A transfer robot that transports a substrate from a first platform to a second platform provided along a transport section that defines a range in which the substrate is transported, A main body portion disposed inside the conveying portion; A rotation support part connected to the main body part; an arm support portion connected to the pivot support portion; an arm portion connected to the arm support portion; a holder connected to the arm and holding the substrate, The swivel support portion is a first end portion rotatably coupled to the body portion; a second end to which the arm support is rotatably coupled; The arm portion is A first arm connected to the arm support portion; a second arm to which the holding portion is connected, The swivel support portion is connected to the main body portion so as to be rotatable about a rotation axis of the connection portion with the main body portion in a plan view, the arm support portion is connected to the swivel support portion so as to be rotatable about a rotation axis of a connection portion with the swivel support portion in a plan view, a central axis of rotation of the arm support portion relative to the second end portion of the swivel support portion and a central axis of rotation of the arm portion relative to the arm support portion are arranged on the same line, the arm portion is connected to the arm support portion so as to be rotatable about a rotation axis of a connection portion with the arm support portion in a plan view, the arm support portion is connected to the swivel support portion and the arm portion so as to be independently rotatable; The main body portion is arranged in a transfer robot such that the center of rotation of the first end portion is located in the center of at least one of the first and second directions within the range of the transport section, which is set to a predetermined first length in a first direction that allows the first and second mounting portions to be arranged side by side, and a second length in a second direction perpendicular to the first direction that is shorter than the first length.

13. A transfer robot as described in Claim 12, wherein the distance between the rotation axis to which the arm support part is connected to the main body part of the arm support part and the rotation axis to which the swivel support part is connected is set to half the distance between the multiple first mounting parts and second mounting parts arranged in the first direction.

14. The transfer robot of claim 12, wherein a rotation tip length, which is set as the length between a first rotation axis set at the first end of the swivel support portion and an outer tip of the second end side of the swivel support portion, is set to a length equal to the length of one of the areas in which the first placement portion and the second placement portion are arranged, centered on the main body portion.

15. The main body includes a robot control unit for controlling the driving of the transfer robot; a housing in which the robot control unit is disposed; The transfer robot according to claim 12 .

16. A rotation motor that rotates the rotation support part relative to the main body part; an arm support drive motor that rotates the arm support portion relative to the swivel support portion; an arm motor that rotates the arm portion relative to the arm support portion, the arm support part is rotated independently with respect to the swivel support part by the arm support drive motor; The transfer robot according to claim 12 , wherein the arm portion is independently rotated with respect to the arm support portion by the arm motor.

17. The first arm is a first arm base end portion rotatably connected to the arm support portion; a first arm moving end portion that is an end portion opposite to the first arm base end portion and that rotatably connects the second arm, The second arm is a second arm base end portion rotatably connected to the first arm moving end portion; The transfer robot according to claim 12 , further comprising: a second arm moving end portion which is an end portion opposite to the second arm base end portion and which rotatably couples the holding portion.

18. The holding unit includes a first holding hand and a second holding hand provided below the first holding hand, The transfer robot described in claim 17, wherein the first holding hand and the second holding hand each have a hand tip portion that holds the substrate and a hand base portion that is rotatably connected to the second arm moving end portion.