Substrate-conveying system and transfer robot control device

Abstract

A substrate-conveying system (1) comprises: a conveying unit (2); a first placement portion (3) and a second placement portion (4); and a transfer robot (5). The transfer robot comprises a body (51) disposed inside the conveying unit, a pivot support unit (52) coupled to the body, an arm support unit (53) coupled to the pivot support unit, an arm unit (54) coupled to the arm support unit, and a holding unit (55) coupled to the arm unit. The arm unit comprises a first arm (541), and a second arm (542) supporting the holding unit and being supported by the first arm. The pivot support unit rotates in a plan view, with a coupling portion that couples the pivot support unit to the body as the axis of rotation. The arm support unit rotates in a plan view, with a coupling portion that couples the arm support unit to the pivot support unit as the axis of rotation. The arm unit rotates in a plan view, with the arm support unit as the axis of rotation. The holding unit rotates in a plan view relative to the second arm, with the portion supported by the first arm as the axis of rotation.

Description

Substrate transport system and transfer robot control device

[0001] The present invention relates to a substrate transport system and a transfer robot control device. This application claims priority to International Patent Application PCT / JP2022 / 016231, filed in Japan on March 30, 2022, the contents of which are incorporated herein by reference.

[0002] A substrate transfer system is known in which a transfer robot is installed in a vacuum chamber (clean room) to transfer semiconductor substrates (wafers) from a load port attached to the front of the chamber. In the substrate transfer system, the wafers are taken into the chamber by the transfer robot and transferred to the chamber or to a process module attached to the chamber, where various semiconductor processes such as film deposition are performed. After processing in the process module, the wafers are transferred back to the load port by the transfer robot and sent to the next process.

[0003] For example, Patent Documents 1 to 3 disclose substrate transport systems in which a transfer robot is fixed inside a chamber and transports wafers without the transfer robot moving inside the chamber, thereby preventing particles from being stirred up or airflow disturbances from occurring inside the chamber.

[0004] Japanese Patent No. 2011-119556 Japanese Patent No. 5199117 Japanese Patent No. 4746027

[0005] In the above-mentioned substrate transport system, the robot's arm has sufficient space to rotate by keeping a large gap between the robot transporting the wafer and the port to which the wafer is transported. This means that the wafer has to travel a long distance, which poses a challenge to the efficiency of the transport operation.

[0006] The present invention has been made in view of the above circumstances, and has as its object to provide a substrate transport system and a transfer robot control device that can efficiently transport substrates.

[0007] A substrate transport system according to the present invention includes a transport section that defines a range in which a substrate is transported, a first platform and a second platform on which the substrate is placed, and a transfer robot that is provided inside the transport section and transports the substrate from the first platform to the second platform, wherein the transfer robot includes a main body section supported within the transport section, a swivel support section that is connected to the main body section and rotates relative to the main body section, an arm support section that is connected to the swivel support section and rotates relative to the swivel support section, and an arm section that is connected to the arm support section and rotates relative to the arm support section. and a holding portion connected to the arm portion and holding the substrate, the arm portion comprising a first arm supported by the arm support portion and a second arm supporting the holding portion and supported by the first arm, the swivel support portion rotates in a planar view around a connection portion with the main body portion as a rotation axis, the arm support portion rotates in a planar view around a connection portion with the swivel support portion as a rotation axis, the arm portion rotates in a planar view around the arm support portion as a rotation axis, and the holding portion rotates in a planar view relative to the second arm around a portion supported by the first arm as a rotation axis.

[0008] In the substrate transport system of the present invention, the transfer robot may include a swivel motor that rotates the swivel support portion relative to the main body portion, an arm support drive motor that rotates the arm support portion relative to the swivel support portion, and an arm motor that rotates the arm portion relative to the arm support portion.

[0009] In the substrate transfer system according to the present invention, the arm support section may include an arm motor including an arm drive mechanism that operates the arm section.

[0010] In the substrate transfer system according to the present invention, the arm support unit may include a swivel mount connected to the swivel support unit and an arm mount connected to the arm unit. A center line of rotation of the arm support unit relative to the swivel support unit and a center line of rotation of the arm unit relative to the arm support unit may be set on the same line.

[0011] The substrate transport system according to the present invention may further include a robot control unit that controls a transport operation of the transfer robot to transport the substrate. The robot control unit may control operations of the arm support unit, the arm unit, and the holder so that, when transferring the substrate between a first placement position set on the first placement unit and a first pre-placement position set opposite the first placement unit, the holder is moved while maintaining an orientation of the holder holding the substrate in a predetermined direction along a center line connecting the first placement position and the first pre-placement position in a plan view, and may control operations of the arm support unit, the arm unit, and the holder so that, when transferring the substrate between a second placement position set on the second placement unit and the second pre-placement position set opposite the second placement unit, the holder is moved while maintaining an orientation of the holder holding the substrate in the predetermined direction along a center line connecting the second placement position and the second pre-placement position in a plan view.

[0012] The substrate transport system according to the present invention may further include a robot control unit that controls a substrate transport operation by the transfer robot. When transferring the substrate between a first pre-placement position set opposite the first placement position set on the first placement unit and a second pre-placement position set opposite the second placement position set on the second placement unit, the robot control unit may control operations of the swivel support unit, the arm support unit, the arm unit, and the holder so as to move the holder, which holds the attitude of the substrate, along a center line connecting the first pre-placement position and the second pre-placement position in a predetermined direction.

[0013] In the substrate transport system of the present invention, the robot control unit may control the operation of the swivel support unit, the arm support unit, and the arm unit so that, when the holding unit moves between the first pre-placement position and the second pre-placement position, the swivel support unit is rotated in a first direction and the arm support unit is rotated in a second direction.

[0014] The substrate transfer system according to the present invention may further include a robot control unit that controls the substrate transfer operation of the transfer robot, and the robot control unit may control operations of the swivel support unit, the arm support unit, the arm unit, and the holder so that a rotation angle of the second arm relative to the first arm in a plan view is 180 degrees or less clockwise in a plan view from a state in which the first arm and the second arm are arranged in the same direction.

[0015] The transfer robot control device of the present invention is a control device that controls the substrate transport operation by a transfer robot that transports a substrate between a first loading section and a second loading section provided inside a transport section, and is equipped with: a main body section supported inside the transport section; a swivel support section connected to the main body section and rotating relative to the main body section; an arm support section connected to the swivel support section and rotating relative to the swivel support section; an arm section connected to the arm support section and rotating relative to the arm support section; and a holding section connected to the arm section and holding the substrate, wherein the arm section is equipped with a first arm supported on the arm support section and a second arm that supports the holding section and is supported by the first arm. The processing apparatus includes a storage unit and a processing unit, and the processing unit includes a target position acquisition unit, a target position determination unit, and an operation control unit. The storage unit stores set position information in which position information of a first placement position set on the first placement unit, position information of a first pre-placement position set at a position opposite to the first placement unit, position information of a second placement position set on the second placement unit, and position information of a second pre-placement position set at a position opposite to the second placement unit are set in advance. The target position acquisition unit determines a movement target position of at least the holder when transporting the substrate between the first placement unit and the second placement unit. and transmits the obtained position information to the target position determination unit, and the target position determination unit determines movement information from at least the current position of the holding unit to the movement target position based on current position information of at least the current position of the holding unit and the target position information of the movement target position obtained by the target position acquisition unit, and the operation control unit controls the operation of the holding unit, the arm unit, the arm support unit, and the swivel support unit, namely, the rotation of the swivel support unit relative to the main body unit, the rotation of the arm support unit relative to the swivel support unit, the rotation of the arm unit relative to the arm support unit, and the rotation of the holding unit relative to the arm unit.

[0016] In the transfer robot control device of the present invention, the swivel support unit rotates in a planar view with the connection unit with the main body unit as a rotation axis, the arm support unit rotates in a planar view with the connection unit with the swivel support unit as a rotation axis, and the arm unit rotates in a direction opposite to that of the swivel support unit in a planar view with the connection unit with the arm support unit as a rotation axis, and the operation control unit may control the rotation direction, rotation amount, and rotation angle of the swivel support unit and the arm unit according to the target movement position of the holding unit.

[0017] In the transfer robot control device of the present invention, the processing unit may be provided with an operation determination unit that determines the operation of the swivel support unit, the arm support unit, and the arm unit to be either a planar linear interpolation operation or a stop operation to move to the movement target position in accordance with a planar rotation operation, and determines the operation of the holding unit to be either a planar linear interpolation operation or a stop operation to move to the movement target position in accordance with the planar rotation operation of the swivel support unit, the arm support unit, and the arm unit.

[0018] In the transfer robot control device of the present invention, the operation control unit may control the operation of the swivel support unit, the arm support unit, the arm unit, and the holding unit so that the planar rotation angle of the second arm relative to the first arm is 180 degrees or less clockwise in plan view from a state in which the first arm and the second arm are arranged in the same direction.

[0019] According to the present invention, it is possible to provide a substrate transport system and a transfer robot control device that can efficiently transport substrates.

[0020] 1 is a plan view showing a substrate transport system according to the present invention. FIG. 2 is a perspective view showing a transfer robot according to the present invention. FIG. 3 is a perspective view showing a transfer robot according to the present invention. FIG. 4 is a block diagram of a robot control device for a transfer robot according to the present invention. FIG. 5 is a partial plan view showing an operating procedure for a transfer robot according to the present invention. FIG. 6 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 7 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 8 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 9 is a plan view schematically showing an operating procedure for a transfer robot according to the present invention. FIG. 10 is a plan view showing a substrate transport system according to the present invention. FIG. 11 is a flow chart showing a control method for a substrate transport system according to the present invention. FIG. 12 is a cross-sectional view taken along line A-A in FIG. 2. FIG. 13 is a cross-sectional view taken along line B-B in FIG. 2. FIG. 14 is a plan view showing another embodiment of a substrate transport system according to the present invention.

[0021] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a substrate transport system and a transfer robot control device according to the present invention will be described below.

[0022] As shown in FIG. 1, the substrate transport system 1 includes a transport unit 2 in which the range of transport work is set, a first platform 3, a plurality of second platform units 4, and a transfer robot 5.

[0023] The substrate transfer system 1 is a transfer system that operates a transfer robot 5 to transfer a substrate 10 from a first mounting part 3 to a second mounting part 4. The substrate 10 is a disk-shaped semiconductor wafer (hereinafter, "substrate 10" will be referred to as "wafer 10"). The wafer 10 has a mark 10a (for example, an orientation flat or a notch) formed thereon that indicates the orientation and surface of the wafer 10.

[0024] The transport unit 2 is formed, for example, as a shell having a rectangular shape in a plan view. The transport unit 2 defines a range in which the substrate is transported. The transport unit 2 includes a first long wall 2a and a second long wall 2b arranged opposite each other and extending in a first direction X, and a first short wall 2c and a second short wall 2d arranged opposite each other and perpendicular to the first direction. The first long wall 2a and the second long wall 2b have a first length. The first short wall 2c and the second short wall 2d have a second length different from the first length. The transport unit 2 includes a lower support 2e at its bottom that is connected to the first long wall 2a, the second long wall 2b, the first short wall 2c, and the second short wall 2d. The transport unit 2 includes a plurality of placement and installation sections on which a first placement section 3 and a plurality of second placement sections 4 are installed. The transport unit 2 has a first mounting section 3 provided on a mounting installation section provided on the first long wall 2a, and a plurality of second mounting sections 4 connected to a plurality of mounting installation sections provided on the second long wall 2b at regular intervals along the second long wall 2b. The transport unit 2 has a robot support section 2e1 provided on the lower support body 2e for supporting a transfer robot 5.

[0025] Hereinafter, the longitudinal direction (extension direction of the first long wall 2a and the second long wall 2b) which is the first direction of the conveying section 2 will be referred to as the X direction, the short direction (extension direction of the first short wall 2c and the second short wall 2d) which is perpendicular to the first direction and is the second direction of the conveying section 2 will be referred to as the Y direction, and the height direction (up and down direction) of the conveying section 2 which is perpendicular to the X direction and the Y direction will be referred to as the Z direction.

[0026] The inside of the area of ​​the transport unit 2 surrounded by the first long wall 2a, the second long wall 2b, the first short wall 2c, and the second short wall 2d is set as a movement area A, which is the range of the transport operation. A transfer robot 5 is disposed inside the transport unit 2, and a first placement unit 3 and multiple second placement units 4 are disposed along the periphery of the transport unit 2. The transfer robot 5 is disposed in the center of the movement area A. With respect to the center C2 of the center where the transfer robot 5 is disposed, the area on one side in the Y direction of the movement area A is set as a first movement area A1, and the area on the other side in the Y direction is set as a second movement area A2. The first movement area A1 is the area on the second long wall 2b side where the second placement unit 4 is disposed. The second movement area A2 is the area on the first long wall 2a side where the first placement unit 3 is disposed.

[0027] The inside of the transfer section 2 is normally maintained at a positive pressure by controlling the airflow so that it moves from above to below. In the transfer section 2, a load port 21 serving as a first placement section 3 is connected to the first long wall 2a, and a plurality of processing ports 22 serving as a plurality of second placement sections 4 are connected to the second long wall 2b. The processing ports 22 are connected at regular intervals in the longitudinal direction of the second long wall 2b. The transfer section 2 maintains a positive internal air pressure and controls the airflow from above to below to maintain a clean interior.

[0028] The load port 21 is a port for supplying and retrieving wafers 10, and the multiple processing ports 22 are ports used as relay ports between the wafers 10 and processing steps for performing various semiconductor surface treatments, such as film formation. The wafers 10 are transported from the load port 21 to the processing ports 22 by the transfer robot 5. In this case, the load port 21 corresponds to the first mounting part 3, and the processing ports 22 correspond to the second mounting part 4. The wafers 10 that have undergone surface treatment are placed on the processing port 22 and then transferred by the transfer robot 5 from the processing port 22 back to the load port 21, where they are replaced with the next wafer 10 to be surface treated. In this case, the processing port 22 corresponds to the first mounting part 3, and the load port 21 corresponds to the second mounting part 4. A container that holds multiple wafers 10 is placed on the load port 21, and the wafers 10 are sequentially transported to the processing ports 22 by the transfer robot 5. One example of a configuration of the container is one in which a predetermined number of wafers 10, for example, about 25, are stacked at predetermined intervals in the Z direction. The load port 21 and the processing port 22 are provided with entrance / exit sections for taking in and out the wafers 10 from the transfer section 2. The entrance / exit sections for the wafers 10 of the plurality of processing ports 22 are formed to face in the same direction.

[0029] The load port 21 is connected to a load port mounting / installation section 2a1 provided in the center of the first long wall 2a in the X direction. In the illustrated example, four processing ports 22 (four ports) are provided at equal intervals in the X direction and connected to processing port mounting / installation sections 2b1 provided in the second long wall 2b. The multiple processing ports 22 are arranged so that the center C1 of the X-direction interval L1 between the two processing ports 22, 22 arranged in the center in the X direction substantially coincides with the center of the first long wall 2a in the X direction.

[0030] The transfer robot 5 is provided inside the transport unit 2 and transports wafers 10 between the load port 21 and the multiple processing ports 22. The transfer robot 5 is a robot configured to place and move wafers 10. Transport of wafers 10 includes exchange transport, in which wafers 10 are exchanged between the multiple processing ports 22, and sequential transport, in which wafers 10 are transported to the multiple processing ports 22 in a preset order. The transfer robot 5 is disposed midway in the Y direction between the first long wall 2a and the second long wall 2b in a plan view, and is disposed between the load port 21 and the multiple processing ports 22 in a plan view. In other words, the transfer robot 5 is disposed between the load port 21 and the multiple processing ports 22 in a plan view. The load port 21 and the multiple processing ports 22 face each other across the transfer robot 5 in a plan view.

[0031] The transfer robot 5, load port 21, and processing port 22 are arranged so that the center of the transfer robot 5 in a plan view is center C2, the center of the load port 21 in a plan view is center C3, and the center of the X-direction spacing L1 between the two central processing ports 22, 22 in the X direction is center C1, with the positions of centers C1 to C3 in the X direction approximately coinciding on a line extending in the Y direction. When the number of load ports 21 and processing ports 22 installed is odd, the center of the port located at the center in the X direction in a plan view is center C3. When the number of load ports 21 and processing ports 22 installed is even, the center of the X-direction spacing between the two central ports in the X direction in a plan view is center C1. The center C2 of the transfer robot 5 is set at the center of the transport unit 2 in the Y direction.

[0032] 2 and 3 are perspective views of the transfer robot 5. Fig. 3 omits a portion of the transfer robot 5. As shown in Fig. 2 and 3 , the transfer robot 5 includes a main body 51, a swivel support 52, an arm support 53, an arm 54, and a holder 55.

[0033] As shown in FIG. 3 , the main body 51 includes a base 511, an elevator 512, an elevator motor 513, a swivel motor 514, an arm support drive motor 515, a robot control device 516 (robot control unit) (hereinafter referred to as the "control device 516"), and a storage body 517. The base 511 is fixed to a robot support 2e1 provided on a lower support body 2e that forms the bottom of the transfer unit 2. The main body 51 is supported within the transfer unit 2 via the base 511. The elevator 512, the elevator motor 513, the swivel motor 514, and the arm support drive motor 515 are housed within the storage body 517. The control device 516 corresponds to the control unit of the transfer robot 5 and is disposed inside the storage body 517 on the base 511, outside the storage body 517.

[0034] The lifting unit 512 is provided in a storage body 517 on the base 511 so as to be movable up and down. A swivel support unit 52 is supported on the upper part of the lifting unit 512 so as to be rotatable relative to the lifting unit 512. A ball screw mechanism including a ball screw extending in the lifting direction and a guide member (nut) that is threadedly engaged with the ball screw, moves in the lifting direction by the operation of the ball screw, and is connected to the lifting unit 512 is used as the lifting mechanism for the lifting unit 512 using the lifting motor 513. The lifting unit 512 lifts and lowers the swivel support unit 52, arm support unit 53, arm unit 54, and holder 55, which are arranged above the main body 51 in the Z direction, together with the main body 51 by rotating the ball screw using the lifting motor 513. The transfer robot 5 can change the holding height of the wafer 10 according to the respective arrangement heights of the load port 21 and the multiple processing ports 22 by adjusting the height using the lifting unit 512. In addition, by configuring the heights of the first placement unit 3 and the second placement unit 4 to be changeable, the lifting unit 512 and the lifting motor 513 of the transfer robot 5 may be omitted.

[0035] The control device 516 is provided in the storage body 517 and controls the transport operation of the wafer 10 by the transfer robot 5. By arranging the control device 516 on the base 511 of the main body 51 of the transfer robot 5, the length of electrical wiring including control lines can be shortened and the control speed can be improved by arranging the control device 516 close to the control devices (for example, output devices such as various motors and detection devices such as sensors) configured in the transfer robot 5.

[0036] The swivel support unit 52 is disposed above the main body unit 51 in the Z direction. A first end 52a of the swivel support unit 52 is connected to the upper end of the lifting unit 512 of the main body unit 51, and the swivel support unit 52 is disposed above the main body unit 51 in the Z direction. The swivel support unit 52 has an arm shape extending laterally, and the first end 52a, which is one end of the swivel support unit 52 in the longitudinal direction, is connected to the upper end of the lifting unit 512 of the main body unit 51. The swivel support unit 52 rotates relative to the main body unit 51 in a plan view, using the swivel motor 514, with the first end 52a as a rotation axis (hereinafter referred to as the "first rotation axis 61"). The first rotation axis 61 is centered on a center line CZ1, which is the same as the center C2. The swivel support unit 52 has a first end 52a corresponding to the center line CZ1 and a second end 52b corresponding to a center line CZ2 different from the center line CZ1. The first rotation shaft 61 is disposed along the Z direction and rotates around a center line CZ1. The swivel support part 52 rotates in a substantially horizontal direction around the center line CZ1. The main body part 51 is disposed within the conveying part 2 so that the center (central part) of the swivel support part 52 is aligned with the center C2.

[0037] The arm support portion 53 includes a swivel mounting portion 53a and an arm mounting portion 53b. The arm support portion 53 is disposed above the swivel support portion 52 in the Z direction. A second end portion 52b is provided below the swivel mounting portion 53a in the Z direction and on the opposite side of the first end portion 52a in the longitudinal direction of the swivel support portion 52. The swivel mounting portion 53a is connected to the second end portion 52b of the swivel support portion 52. The arm mounting portion 53b is provided above in the Z direction and is connected to the arm portion 54.

[0038] 9A and 9B, the second end 52b of the swivel support 52 includes an arm support rotation mechanism 530. The arm support rotation mechanism 530 includes an arm support drive motor 515, a drive pulley 515a, a transmission member 514c, a driven pulley 51b, and a rotating body 515d. The transmission member 515c transmits the rotation of the arm support drive motor 515 to the drive pulley 515a. The transmission member 515c is, for example, a steel belt. The drive pulley 515a and the driven pulley 51b are engaged with the transmission member 515c. The rotating body 515d includes a swivel mounting portion 53a. The swivel mounting portion 53a is connected to the driven pulley 515b and has the arm support 53 attached thereto. The arm support rotation mechanism 530 also includes a first shaft member 62a to which the rotating body 515d and the driven pulley 515b are attached so as to be rotatable about the center line CZ2.

[0039] The arm support 53 rotates in a plan view relative to the swivel support 52 by the arm support rotation mechanism 530. The rotational drive force of the arm support drive motor 515 is transmitted to the rotating body 515d via the drive pulley 515a, the transmission member 515c, and the driven pulley 51b. The transmitted rotational drive force causes the rotating body 515d to rotate around the first shaft member 62a.

[0040] A center line CZ2 is set at the second end 52b, and the arm support unit 53 is supported by the swivel support unit 52 so as to be rotatable around the center line CZ2. The arm support unit 53 includes an arm motor 543. The arm motor 543 includes an arm drive mechanism 543a that operates the arm unit 54 around the center line CZ2.

[0041] The arm drive mechanism 543a includes a transmission member 543a2, a driven pulley 543a3, and a rotating body 543a4. The transmission member 543a2 transmits rotation of the arm motor 543 to the driven pulley 543a3. The transmission member 543a2 is, for example, a steel belt. The driven pulley 543a3 is engaged with the transmission member 543a2. The rotating body 543a4 is connected to the driven pulley 543a3 and includes an arm mounting portion 53b to which the arm portion 54 is attached. The arm drive mechanism 543a also includes a second shaft member 62d to which the rotating body 543a4 and the driven pulley 543a3 are mounted so as to be rotatable about the center line CZ2.

[0042] The arm unit 54 includes a first arm 541, a second arm 542, an arm operating mechanism 54a, a first holding hand motor 544, a second holding hand motor 545, and a hand drive transmission mechanism 546. The arm unit 54 is disposed above the arm support unit 53 in the Z direction. The arm operating mechanism 54a transmits the driving force of the arm motor 543, causing the first arm 541 and the second arm 542 to perform predetermined operations.

[0043] The first arm 541 has a first end 541a as a first arm base end and a second end 541b as a first arm moving end. The first end 541a is rotatably supported by the arm support portion 53 and is connected to the arm attachment portion 53b. The second end 541b rotatably supports the second arm 542. The first end 541a and the second end 541b are located at both longitudinal ends of the first arm 541. The first arm 541 is supported by the arm support portion 53 with the first end 541a connected to the arm attachment portion 53b of the arm support portion 53. The first arm 541 is disposed below the second arm 542. The first end 541a of the first arm 541 is connected to an arm drive mechanism 543a.

[0044] The first arm 541 rotates relative to the swivel support part 52 in a plan view with the first end part 541a as a rotation axis (hereinafter referred to as the "second rotation axis 62") in conjunction with the rotation of the swivel mounting part 53a. Furthermore, the first arm 541 rotates relative to the arm support part 53 in a plan view with the first end part 541a as a rotation axis (hereinafter referred to as the "second rotation axis 62") due to the rotational operation of the arm drive mechanism 543a by the arm motor 543. The second rotation axis 62 is centered on a center line CZ2 different from the center line CZ1. The center line CZ2 is a line along the Z direction and a line parallel to the center line CZ1. The first arm 541 rotates around the second rotation axis 62 at the first end part 541a with the center line CZ2 as a center. The center line CZ2 of rotation of the arm support part 53 relative to the swivel support part 52 and the center line CZ2 of rotation of the arm part 54 relative to the arm support part 53 are set to be on the same line.

[0045] The arm support section 53 serves as a pivot base for the swivel support section 52 and the arm section 54, which are positioned above and below in the Z direction. The arm support section 53 rotates independently with respect to the swivel support section 52 and the arm section 54. Specifically, the arm support section 53 is rotated independently with respect to the swivel support section 52 by an arm support drive motor 515. The arm section 54 is rotated independently with respect to the arm support section 53 by an arm motor 543.

[0046] The second arm 542 includes a first end 542a as a second arm base end rotatably coupled to a second end 541b as a first arm moving end, and a second end 542b as a second arm moving end that rotatably supports the holding unit 55. The first end 542a and the second end 542b are located at both longitudinal ends of the second arm 542. The second arm 542 is supported by the first arm 541, with the first end 542a coupled to the second end 541b of the first arm 541. The second arm 542 rotates relative to the first arm 541 in plan view around the first end 542a as a rotation axis (hereinafter referred to as the "third rotation axis 63") by the rotation operation of the arm drive mechanism 543a driven by the arm motor 543. In other words, the second arm 542 rotates relative to the first arm 541 in plan view around the portion supported by the first arm 541 as a rotation axis. The third rotation shaft 63 is centered on a center line CZ3 that is different from the center lines CZ1 and CZ2. The center line CZ3 is a line along the Z direction and parallel to the center lines CZ1 and CZ2. The second arm 542 rotates around the third rotation shaft 63 at the first end 542a, with the center line CZ3 as the center.

[0047] The second arm 542 has a first holding hand motor 544 and a second holding hand motor 545 built in, and a hand drive transmission mechanism 546 built in at the second end 542b side. The first holding hand motor 544 and the second holding hand motor 545 are arranged in parallel in the Y direction. The hand drive transmission mechanism 546 includes a first hand drive transmission mechanism 546a that transmits the drive force of the first holding hand motor 544, and a second hand drive transmission mechanism 546b that transmits the drive force of the second holding hand motor 545.

[0048] The hand drive transmission mechanism 546 includes a first hand drive transmission mechanism 546 a that transmits the driving force of the first holding hand motor 544 , and a second hand drive transmission mechanism 546 b that transmits the driving force of the second holding hand motor 545 .

[0049] The arm unit 54 rotates the first arm 541 and the second arm 542 according to a predetermined operation in a plan view by transmitting the driving force of the arm motor 543 via the arm drive mechanism 543a, thereby bending and extending the entire arm unit 54 about the center line CZ3, thereby adjusting the maximum length of the arm unit 54. Specifically, the arm unit 54 adjusts the length of the arm unit 54 by transmitting the driving force of the arm motor 543 via the arm drive mechanism 543a, thereby moving the second end 542b, which serves as the second arm moving end, closer to or farther away from the first end 541a, which serves as the first arm base end, along a straight line connecting the center line CZ2 and the center line CZ4.

[0050] The holding unit 55 includes a first holding hand 551, a second holding hand 552, a first support unit 553, and a second support unit 554. The holding unit 55 is disposed above the arm unit 54 in the Z direction.

[0051] The first holding hand 551 and the second holding hand 552 are arranged with a fixed distance in the Z direction. The first holding hand 551 is provided above the second holding hand 552. The first holding hand 551 includes a first hand tip 551a that holds the wafer 10. The second holding hand 552 includes a second hand tip 552a that holds the wafer 10. The first holding hand 551 and the second holding hand 552 hold the wafer 10 at the first hand tip 551a and the second hand tip 552a, respectively, by a holding mechanism (not shown). The method of holding the wafer 10 is not limited, and a configuration may be adopted in which, for example, a hand is inserted under the wafer 10 to scoop up and place the wafer 10, and then the wafer 10 is adsorbed to the hand by negative pressure and held.

[0052] 2, the first support portion 553 and the second support portion 554 are held by the second arm 542. The first support portion 553 has a first hand base end portion 551c rotatably supported by the second arm 542. The first holding hand 551 is connected to a distal end 551b of the first support portion 553. The second support portion 554 has a second hand base end portion 552c rotatably supported by the second arm 542. The second holding hand 552 is connected to a distal end 552b of the second support portion 554.

[0053] The first support member 553 rotates relative to the second arm 542 in a plan view by a first holding hand motor 544 shown in FIG. 3 . The second support member 554 rotates relative to the second arm 542 in a plan view by a second holding hand motor 545 shown in FIG. 3 . Hereinafter, the rotation axis of the first support member 553 will be referred to as the fourth rotation axis 64, and the rotation axis of the second support member 554 will be referred to as the fifth rotation axis 65. The centers of the fourth rotation axis 64 and the fifth rotation axis 65 coincide with a center line CZ4 that is different from the center lines CZ1, CZ2, and CZ3. The center line CZ4 is a line along the Z direction and is parallel to the center lines CZ1, CZ2, and CZ3. The first support member 553 and the second support member 554 rotate around the fourth rotation axis 64 and the fifth rotation axis 65, which are centered on the center line CZ4. The first support portion 553 and the second support portion 554 rotate independently of each other. For example, the first support portion 553 and the second support portion 554 rotate independently of each other in the forward and reverse directions.

[0054] In the transfer system 1, placement positions are set for the first placement part 3 and the second placement part 4 as positions of the placement parts where the wafer 10 is placed, and pre-placement positions are set for the first placement part 3 and the second placement part 4 as positions in front of the placement parts that correspond to the placement positions of the first placement part 3 and the second placement part 4 and are set within the range of the transfer part 2. In the load port 21 corresponding to the first placement part 3 in this embodiment, a placement position 21Pa is set as the position of the placement part 210, and a pre-placement position 21Fa is set as the position in front of the placement part 210. Furthermore, in the multiple processing ports 22 corresponding to the second placement part 4, placement positions 22Pa to 22Pd are set as positions of the placement parts 220a to 220d corresponding to the respective processing ports 22, and pre-placement positions 22Fa to 22Fd are set as positions in front of the placement parts 220a to 220d.

[0055] 4, the control device 516 includes a storage unit 516b and a processing unit 516c. The processing unit 516c includes a target position acquisition unit 516d, a target position determination unit 516e, a motion control unit 516f, and a motion determination unit 516g.

[0056] 10 , the storage unit 516b stores set position information i1, which is preset by an input unit (not shown) for the main body 51, the swivel support unit 52, the arm support unit 53, the arm unit 54, and the holder 55 of the transfer robot 5 according to position information required for the transfer trajectory of the wafer 10 (S1). The set position information i1 includes position information of the first mount unit 3 on which the wafer 10 to be transferred is placed, position information of a position in front of the first mount unit, position information of the second mount unit 4 to which the wafer 10 is to be transferred, and position information of a position in front of the second mount unit. The first mount unit front position and the second mount unit front position are positions facing the first mount unit 3 and the second mount unit 4 in the transfer unit 2 in the Y direction.

[0057] The target position acquisition unit 516d acquires position information corresponding to the target movement positions of the swivel support unit 52, arm support unit 53, arm unit 54 and holding unit 55 when transporting the substrate 10 from the first mounting unit 3 to the second mounting unit 4 as target position information i2 from the set position information i1 (S2).

[0058] The target position determination unit 516e determines movement information iM from the current positions of the swivel support unit 52, arm support unit 53, arm unit 54, and holding unit 55 to the movement target position P1 based on the current position information iR of the current positions of the swivel support unit 52, arm support unit 53, arm unit 54, and holding unit 55 and the target position information i2 acquired by the target position acquisition unit 516d (S3).

[0059] The operation control unit 516f controls the movement of the swivel support unit 52, arm support unit 53, arm unit 54 and holding unit 55 based on the movement information iM determined by the target position determination unit 516e, thereby operating each part of the transfer robot 5 and controlling it to move to the movement target position P1 (S4).

[0060] As shown in FIG. 4, the operation control unit 516f transmits control signals to the drive sources of the swivel support unit 52 and the arm unit 54, for example, and performs control to rotate the swivel support unit 52 and the arm unit 54 in a plan view.

[0061] The operation determination unit 516g determines the movement method of each part of the transfer robot 5. The operation determination unit 516g determines, for example, the operation of the swivel support unit 52 and the arm unit 54 to be either a rotational operation in a planar view, a linear interpolation operation in a planar view in which one of the swivel support unit 52 and the arm unit 54 moves to a movement target position P1 following the rotational operation in a planar view of the other, or a stopping operation (fixing operation) at the arrangement position. The operation determination unit 516g determines the operation of the holder 55 to be either a linear interpolation operation in a planar view in which the holder 55 moves to a movement target position P1 following the rotational operation in a planar view of the swivel support unit 52 and the arm unit 54, or a stopping operation (fixing operation) at the arrangement position.

[0062] The rotation angle of the second arm 542 relative to the first arm 541 in a plan view is 180 degrees or less clockwise in a plan view from a state in which the first arm 541 and the second arm 542 are arranged in the same direction (a state in which the arm unit 54 extends in one direction). The rotation angle of the second arm 542 in a plan view is controlled by an operation control unit 516f of the control device 516 so as to be 180 degrees or less clockwise in a plan view. The second arm 542 has a first holding hand motor 544 and a second holding hand motor 545 built in at the first end 542a side, and a hand drive transmission mechanism 546 built in at the second end 542b side. The first holding hand motor 544 and the second holding hand motor 545 are arranged in parallel in the Y direction.

[0063] 5A to 8B, a method for transporting the wafer 10 by the transfer robot 5 in the above-described substrate transport system 1 will be described below. Hereinafter, the swivel support unit 52, the arm support unit 53, the arm unit 54, and the holder unit 55 of the transfer robot 5 will be collectively referred to as the arm 50.

[0064] In the substrate transport system 1, as shown in FIG. 1 , the transfer robot 5 receives the wafer 10 from the load port 21 and operates the arm 50 to transport it to the processing port 22 to be transported. The control device 516 determines a movement target position using the target position acquisition unit 516d and the target position determination unit 516e based on the set position information i1 stored in the memory unit 516b, and the movement of the arm 50 to the movement target position is controlled by the operation control unit 516f and the operation determination unit 516g. The wafer 10 is first transported from the placement unit 210 (first placement unit 3) in the load port 21 to the placement unit 220a (second placement unit 4) in the first processing port 22a, and then transported to a surface treatment step via the first processing port 22a. The movement of the arm 50 is controlled by the control device 516 provided in the main body 51.

[0065] As shown in Figure 5A, the transfer robot 5 moves the arm support portion 53 and the arm portion 54 around the second rotation axis 62, moves the second arm 542 relative to the first arm 541 of the arm portion 54 around the third rotation axis 63, and moves the holding portion 55 around either the fourth rotation axis 64 or the fifth rotation axis 65, thereby removing the wafer 10 from the loading portion 220a.

[0066] The transfer robot 5 removes the wafer 10 from the placement unit 220a and rotates the swivel support unit 52 and the first arm 541 in opposite directions in plan view, respectively, around the second rotation axis 62 and the third rotation axis 63, depending on the movement direction of the holder 55 and the wafer 10. The transfer robot 5 rotates the first holding hand 551 in a predetermined rotation direction around the fourth rotation axis 64, and the second holding hand 552 in a predetermined rotation direction around the fifth rotation axis 65. These rotations position the holder 55 and the wafer 10 at a pre-placement position 22Fa before the placement unit 220a in the Y direction, while maintaining the mark 10a of the wafer 10 in the predetermined direction. Conditions such as the rotation direction, rotation amount, and rotation angle of the rotational movement of the swivel support unit 52 and the first arm 541 in plan view are controlled by the operation control unit 516f depending on the target movement position of the holder 55 holding the wafer 10. The second arm 542 rotates following the rotation of the first arm 541 while maintaining the posture of the wafer 10. The arm 50 adjusts the arm length by bending and extending a second end 542b serving as a second arm moving end portion along a straight line connecting the center lines CZ2 and CZ4 relative to a first end 541a serving as a first arm base end portion, as a result of the rotation of the swivel support part 52 and the first arm 541 in opposite directions in a plan view.

[0067] When the arm 54 is bent while maintaining the left arm position, it rotates counterclockwise, and when it is extended, it rotates clockwise. That is, in Figures 5A to 5C, when the arm support 53 is moved from the placement position 22Pd to the pre-placement position 22Fd with respect to the placement portion 220d of the processing port 22d, which is located at a position greater than the length of the swivel support 52 when the arm support 53 is located to the right of the main body 51, it rotates clockwise. When the arm support 53 is moved from the pre-placement position 22Fd to the placement position Pd, it rotates counterclockwise. When the arm support 53 is moved from the placement position 22Pa to the pre-placement position 22Fa with respect to the placement portion 220a of the processing port 22a, which is located at a position greater than the length of the swivel support 52 when the arm support 53 is located to the left of the main body 51 ... pre-placement position 22Fa to the placement position 22Pa, it rotates counterclockwise.

[0068] 5A , after the wafer 10 is placed in front of the placement part 220a in the Y direction, the first arm 541 is rotated clockwise in a plan view about the second rotation axis 62, and the second arm 542 is rotated clockwise in a plan view about the third rotation axis 63 so as to maintain the attitude of the wafer 10 relative to the rotation amount of the first arm 541. By the rotation of the arm 50, the wafer 10 is transported from the pre-placement position 22Fa to the placement position 22Pa while maintaining the attitude of the wafer 10, and the wafer 10 is transported to the first surface treatment step via the first processing port 22a.

[0069] As shown in Fig. 5A, when the wafer 10 that has undergone the first surface treatment is placed on the placement portion 220a of the first processing port 22a, the wafer 10 is transported from the placement portion 220a (first placement portion 3) to the placement portion 220b (second placement portion 4) in the second processing port 22b as shown in Figs. 5B to 6A. As shown in Fig. 5B, the transfer robot 5 rotates the arm support portion 53 and the arm portion 54 about the second rotation axis 62, and rotates the second arm 542 relative to the first arm 541 of the arm portion 54 about the third rotation axis 63, counterclockwise in a plan view. The transfer robot 5 rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. By these rotations, the mark 10a of the wafer 10 is maintained in a predetermined direction, and the wafer 10 is removed from the mounting section 220a while maintaining its posture, and then transported again to the pre-mounting position 22Fa, which is a position in front of the mounting section 220a in the Y direction.

[0070] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220a or removing the wafer 10 from the mounting portion 220a, the arm 50 moves the holding portion 55 along a center line VL21 (see FIG. 5A ) that is parallel to the Y direction and connects the center 22Pa in a plan view of the mounting portion 220a and the pre-mounting position 22Fa, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL21 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0071] As shown in FIG. 5C , when transporting the wafer 10 to one side in the X direction (first direction), the transfer robot 5 rotates the swivel support unit 52 clockwise in a plan view about the first rotation axis 61 (rotational movement) and rotates the arm support unit 53 counterclockwise in a plan view about the second rotation axis 62 (rotational movement) to transport the wafer 10. Rotational movement refers to both rotation and movement. Alternatively, when transporting the wafer 10 to the other side in the X direction (first direction), the transfer robot 5 rotates the swivel support unit 52 counterclockwise in a plan view about the first rotation axis 61 and rotates the arm support unit 53 clockwise in a plan view about the second rotation axis 62 to transport the wafer 10. By performing these transports, the wafer 10 can be transported from one of the pre-placement positions 22Fa to 22Fd (first pre-placement position) to a different pre-placement position (second pre-placement position) while maintaining the mark 10a of the wafer 10 in a predetermined orientation. For example, while maintaining the posture of the wafer 10, the wafer 10 can be moved from pre-placement position 22Fa, which is one of pre-placement positions 22Fa to 22Fd, in the Y direction before the placement section 220a, to the placement section 220b arranged in the X direction, and transported to pre-placement position 22Fb, which is in the Y direction before the placement section 220b, while maintaining the mark 10a of the wafer 10 in a predetermined direction.

[0072] 6A , after placing the wafer 10 at the pre-placement position 22Fb in front of the placement unit 220b in the Y direction, the transfer robot 5 rotates the arm support unit 53 and the arm unit 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm unit 54 clockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. These rotations allow the wafer 10 to be transported from the pre-placement position 22Fb to the placement unit 220b while maintaining the mark 10a of the wafer 10 in a predetermined direction and maintaining the orientation of the wafer 10. The wafer 10 is then transported to the second surface treatment process via the second processing port 22b.

[0073] When the wafer 10 that has undergone the second surface treatment is placed on the placement portion 220b of the second processing port 22b, as shown in FIG. 6B , the wafer 10 is transported from the placement portion 220b (first placement portion 3) to the placement portion 220c (second placement portion 4) in the third processing port 22c. The transfer robot 5 rotates the arm support portion 53 and the arm portion 54 counterclockwise in plan view about the second rotation axis 62, and rotates the second arm 542 counterclockwise in plan view relative to the first arm 541 of the arm portion 54 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. These rotations allow the wafer 10 to be removed from the placement portion 220b while maintaining the mark 10a of the wafer 10 in a predetermined direction and maintaining the orientation of the wafer 10, and then transports it again to the pre-placement position 22Fb, which is a position in front of the placement portion 220b in the Y direction.

[0074] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220b or removing the wafer 10 from the mounting portion 220b, the arm 50 moves the holding portion 55 along a center line VL22 that is parallel to the Y direction and connects the center 22Pb in a plan view of the mounting portion 220b and the pre-mounting position 22Fb, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL22 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0075] 7A , after the wafer 10 is moved from the pre-placement position 22Fb to the pre-placement position 22Fc, which is located before the placement unit 220c in the Y direction, the transfer robot 5 rotates the swivel support unit 52 counterclockwise in a plan view about the first rotation axis 61, and rotates the arm support unit 53 and the arm unit 54 counterclockwise in a plan view about the second rotation axis 62. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. By these rotations, the wafer 10 is transported to the placement unit 220c while maintaining the position of the wafer 10 and keeping the mark 10a of the wafer 10 in a predetermined direction, and the wafer 10 is then transported to the third surface treatment process via the third processing port 22c.

[0076] 7A, when the wafer 10 that has undergone the third surface treatment is placed on the placement portion 220c of the third processing port 22c, the wafer 10 is transported from the placement portion 220c (first placement portion 3) to the placement portion 220d (second placement portion 4) in the fourth processing port 22d as shown in FIG. 7B. The transfer robot 5 rotates the swivel support portion 52 clockwise in a plan view about the first rotation axis 61 as a rotation axis, and rotates the arm support portion 53 and the arm portion 54 clockwise in a plan view about the second rotation axis 62 as a rotation axis, thereby removing the wafer 10 from the placement portion 220c while maintaining the attitude of the wafer 10 and maintaining the mark 10a of the wafer 10 in a predetermined direction, and transports it again to a pre-placement position 22Fc, which is a position before the placement portion 220c in the Y direction.

[0077] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220c or removing the wafer 10 from the mounting portion 220c, the arm 50 moves the holding portion 55 along a center line VL23 (see FIG. 1 ) that is parallel to the Y direction and connects the center 22Pc in a plan view of the mounting portion 220c and the pre-mounting position 22Fc, thereby transferring the wafer 10. Specifically, the holding portion 55 is moved along the center line VL23 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0078] 8A , after moving the wafer 10 from the pre-placement position 22Fc to the pre-placement position 22Fd located before the placement unit 220d in the Y direction, the transfer robot 5 rotates the arm support unit 53 and the arm unit 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm unit 54 counterclockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. These rotations allow the wafer 10 to be transported from the pre-placement position 22Fd to the placement unit 220d while maintaining the mark 10a of the wafer 10 in a predetermined direction and maintaining the orientation of the wafer 10. The wafer 10 is then transported to a fourth surface treatment step via the fourth processing port 22d.

[0079] As shown in FIG. 8A , when the wafer 10 that has undergone the fourth surface treatment is placed on the placement portion 220d of the fourth processing port 22d, as shown in FIG. 8B , the wafer 10 is transported from the placement portion 220d (first placement portion 3) to the placement portion 210 (second placement portion 4) in the load port 21 again. The transfer robot 5 rotates the arm support portion 53 and the arm portion 54 clockwise in a plan view about the second rotation axis 62, and rotates the second arm 542 of the arm portion 54 clockwise in a plan view relative to the first arm 541 about the third rotation axis 63. The transfer robot 5 also rotates the holder 55 about either the fourth rotation axis 64 or the fifth rotation axis 65. With these rotations, the wafer 10 is removed from the placement portion 220d while maintaining the mark 10a of the wafer 10 in a predetermined direction and the orientation of the wafer 10, and is transported again to a pre-placement position 22Fd located before the placement portion 220d in the Y direction.

[0080] Under the control of the control device 516, when transferring the wafer 10 to the mounting portion 220d or removing the wafer 10 from the mounting portion 220d, the arm 50 moves the holding portion 55 along a center line VL24 (see FIG. 1 ) that is parallel to the Y direction and connects the center 22Pd in ​​a plan view of the mounting portion 220d and the pre-mounting position 22Fd, and transfers the wafer 10. Specifically, the holding portion 55 is moved along the center line VL24 while maintaining the orientation of the mark 10a of the wafer 10 held by the holding portion 55.

[0081] After the wafers 10 are transported again to the pre-loading position 22Fd, the swivel support part 52, the first arm 541, and the second arm 542 are rotated clockwise in a plan view, and the wafers 10 that have undergone all surface processing in each processing port 22 are transported to the loading part 210, completing the surface processing of the wafers 10. If a single container contains multiple wafers 10 loaded on the load port 21, the above operation is repeated to sequentially perform surface processing on all wafers 10 stored in the container. After the surface processing is completed, the wafers 10 are removed from the loading part of the processing port 22.

[0082] The rotation directions of the swivel support part 52 and the arm part 54 in a plan view when the wafer 10 is transferred to each second mount part 4 are not limited to those described above, and may be determined depending on conditions such as the layout of the substrate transfer system 1 and the order of transfer to each mount part. When the swivel support part 52 and the arm part 54 rotate, the arm support part 53 acts as an intervening element, so that the orientation of the wafer 10 is always maintained in a predetermined direction on one side or the other side of the Y direction (second direction).

[0083] The rotation of the arm support portion 53 and the arm portion 54 is an operation that prevents the movement trajectory of the wafer 10 supported by the holding portion 55 from deviating from the center line connecting the center of the second loading portion 4 in a planar view and the pre-loading position, which is a position in front of the second loading portion 4 in the Y direction.

[0084] When the wafer 10 is placed in a pre-placement position in front of the second placement section 4 in the Y direction, if the heights of the wafer 10 and the second placement section 4 in the Z direction are different, the height of the wafer 10 is adjusted using the lifting section 512 of the main body section 51.

[0085] 1 and 9 , the first movement area A1 has a first area length A1L set as the distance between the second long wall 2b and the center C2 in a plan view where the main body 51 of the transfer robot 5 is installed. The first area length A1L is set to a distance equivalent to a swivel tip length 52La set as the length between the first rotation axis 61 set at the first end 52a of the swivel support part 52 and the outer tip of the swivel support part 52 on the second end 52b side.

[0086] The second movement area A2 has a second area length A2L set as the distance between the first long wall 2a and the center C2 in a plan view where the main body 51 of the transfer robot 5 is installed. The second area length A2L is set to a distance equivalent to a swivel tip length 52La set as the length between the first rotation axis 61 set at the first end 52a of the swivel support part 52 and the outer tip of the second end 52b side of the swivel support part 52. In other words, the second area length A2L is set to the same distance as the first area length A1L, and the second movement area A2 is provided which is equivalent to the first movement area A1.

[0087] The swivel support part 52 is connected to the main body part 51 so as to be movable around a center C2 in a plan view at which the main body part 51 of the transfer robot 5 is installed relative to the first movement area A1 and the second movement area A2. In other words, the swivel support part 52 can swivel freely within the movement area A.

[0088] A port distance 22L is set as the spacing between the multiple processing ports 22 arranged along the second long wall 2b provided on the first movement region A1 side of the transport unit 2. The port distance 22L is set as twice the length of the pivot shaft distance 52L, which is set as the length between the first rotation shaft 61 set at the first end 52a of the pivot support unit 52 and the second rotation shaft 62 set at the second end 52b of the pivot support unit 52. In other words, the port distance 22L is set at the same distance as the diameter of a circle having a circumferential orbit along which the second rotation shaft 62 set at the second end 52b of the pivot support unit 52 moves, pivoting around the center C2.

[0089] When an odd number of processing ports 22 are installed, the mounting position of one of the inner processing ports 22 arranged between other processing ports 22 is arranged at a position that coincides with the position of a straight line passing through the center C2. The inner processing port 22 and the other processing ports 22 arranged on both sides are arranged with a distance equal to the port distance 22L.

[0090] When the number of processing ports 22 to be installed is even, the position between any two processing ports 22, 22 that are located between other processing ports 22, 22, is aligned with the position of a straight line passing through center C2. The port distance 22La of the processing ports 22 located on one side and the other side of the position between the two processing ports 22, 22 is the same as the radius of the circle on which the second rotation shaft 62, which is set at the second end 52b of the rotation support 52 and rotates around center C2, moves. The other processing ports 22 located outside the two processing ports 22, 22 are spaced apart at a distance equal to the port distance 22L.

[0091] As described above, the positions at which the multiple processing ports 22 are arranged are spaced apart from each other by an integer multiple of the port distance 22La, which is set to the same distance as the inter-swivel axis length 52L around the center C2, and the odd-numbered positions are offset by one port distance 22La from the even-numbered positions. Furthermore, the load ports 21 arranged along the first long wall 2a on the second transfer region A2 side are also arranged at positions set by the port distance 22La as positions at which processing ports 22 should be arranged.

[0092] As described above, the positions and lengths of the transfer area A including the first transfer area A1 and the second transfer area A2 provided in the substrate transfer system 1, the load port 21 as the first receiver 3 arranged around the transfer area A, the multiple processing ports 22 as the multiple second receivers 4, and the pivot axis length 52L and the pivot tip length 52La of the swivel support unit 52 configured in the transfer robot 5 are set relative to the center C2. This setting allows the transfer robot 5 to move efficiently. Furthermore, the wafer 10 can be transferred by positioning the mark 10a of the wafer 10 relative to the load port 21 and the multiple processing ports 22 in a predetermined direction. Furthermore, the transfer trajectory of the wafer 10 within the transfer area A can be set to the shortest distance.

[0093] The effects of the substrate transport system and transfer robot according to this embodiment will be described.

[0094] In the substrate transport system 1, by providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to facilitate the calculation and control for the movement within the first movement area A1 and the second movement area A2. Furthermore, by providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to move the arm 50 along a minimal movement trajectory. As a result, it is possible to narrow the range of the movement areas A1 and A2 (the lengths of the movement areas A1 and A2 in the Y direction). Therefore, it is possible to make the transport unit 2 in which the transfer robot 5 is installed compact. By providing the arm support part 53 between the swivel support part 52 and the arm part 54 of the arm 50 of the transfer robot 5, it is possible to make the movement of the arm 50 compact, thereby transporting wafers 10 with high efficiency.

[0095] The substrate transport system 1 includes an arm support 53 between the swivel support 52 and arm 54 of the arm 50 of the transfer robot 5. This configuration allows the wafer 10 to be transported while maintaining the orientation of the wafer 10 and keeping the mark 10a of the wafer 10 in a predetermined direction. This eliminates the need to adjust the orientation of the wafer 10 when loading the wafer 10 into each platform, allowing for efficient surface processing of the wafer 10 in the processing steps connected via each processing port 22. The transfer robot 5 includes the arm support 53 between the swivel support 52 and arm 54 and is operationally controlled. This control allows the wafer 10 to be transported while adjusting the orientation of the wafer 10 relative to the first platform 3 and the second platform 4, thereby enabling efficient transport of the wafer 10.

[0096] In the substrate transport system 1, the transfer robot 5, load port 21, and multiple processing ports 22 are arranged so that the X-direction positions of the center C2 of the transfer robot 5 in a plan view, the center C3 of the load port 21 in a plan view, and the center C1 of the X-direction spacing L1 between the two central processing ports 22, 22, 22, are approximately aligned in the Y direction. With the above configuration, the transfer robot 5 includes an arm support unit 53 between the swivel support unit 52 and the arm unit 54, and is arranged around the center C2 in the plan view of the transport unit 2, and the load port 21 and multiple processing ports 22 are set based on the swivel axis length 52L and the swivel tip length 52La of the swivel support unit 52, centered around the center C2. This shortens the travel distance of the arm 50, thereby improving the efficiency of wafer 10 transport.

[0097] The substrate transfer system 1 can remove the wafer 10 from each mounting portion parallel to the Y direction while maintaining the position of the mark 10a on the wafer 10 by rotating the arm 50 of the transfer robot 5. When moving the wafer 10 between a plurality of processing ports 22 arranged in the X direction, the substrate transfer system 1 can move the wafer 10 parallel to the X direction while maintaining the position of the mark 10a on the wafer 10 by rotating the arm 50. The transfer robot 5 transports the wafer 10 by linear movement while maintaining the orientation of the wafer 10. Therefore, the transfer robot 5 can shorten the operation of aligning the orientation of the wafer 10, allowing for efficient transport of the wafer 10.

[0098] The substrate transfer system 1 selects, as target position information i2, set position information i1 required for transferring the wafer 10 from set position information i1 for each position stored in the memory unit 516b through processing by the processing unit 516c. The control device 516 determines, through a target position determination unit 516e, target positions for movement of each part of the arm 50, using the target position information i2, which is the target position for movement of each part of the arm 50 to be acquired by the target position acquisition unit 516d, and the current position of each part of the arm 50. The control device 516 controls, through an operation control unit 516f and an operation determination unit 516g, the operation of each part of the arm 50 according to the determined target positions for movement of each part of the arm 50, and transfers the wafer 10.

[0099] With the above configuration, the substrate transfer system 1 can control the operation of the transfer robot 5 by the memory unit 516b and the processing unit 516c of the control device 516 so that the wafer 10 can be transferred over a short distance while maintaining the mark 10a of the wafer 10 in a predetermined direction. Therefore, the control of the operation of the transfer robot 5 by the control device 516 can improve the efficiency of the transfer of the wafer 10.

[0100] The substrate transfer system 1 can remove the wafer 10 from each platform parallel to the Y direction. Therefore, there is no need to make each port and platform large in consideration of the operating range of the arm 50 when transferring the wafer 10, and each port and platform can be small. The substrate transfer system 1 can move the wafer 10 in a linear direction. Therefore, control of the arm direction when transferring the wafer 10 to the second platform 4 is not complicated, and arm control can be simplified.

[0101] The arm 50 of the substrate transfer system 1 moves while the arm section 54, which includes two connected arms that can be bent around a connecting section, is maintained in either a first position in which the arm section 54 is bent in one direction or a second position in which the arm section 54 is bent in the other direction. With this configuration, the arm 50 can transfer the wafer 10 without changing the direction of the bent position of the arm section 54. This eliminates shocks and vibrations that occur when the bent position of the arm section 54 is changed.

[0102] In the substrate transfer system 1, the rotation angle of the second arm 542 relative to the first arm 541 in a plan view is 180 degrees or less clockwise in a plan view from a state in which the arm unit 54 is extended in one direction (a state in which the first arm 541 and the second arm 542 are linear). With this configuration, by controlling the second arm 542 to always bend in the transfer direction relative to the first arm 541, it is possible to prevent the amount of rotation of the second arm 542 from exceeding 180 degrees clockwise in a plan view. Therefore, it is possible to reduce impact and vibration of the arm 50 that accompanies rotation when the amount of rotation of the second arm 542 exceeds 180 degrees clockwise in a plan view.

[0103] The substrate transfer system 1 includes one load port 21 and four process ports 22, but is not limited to the above configuration. The substrate transfer system may also be configured with, for example, one load port 21 and three process ports 224. The substrate transfer system may also be configured with, for example, three load ports 21 and three process ports 224. The substrate transfer system may also be configured with, for example, multiple load ports 21 and one process port 22. The maximum number of load ports 21 and process ports 22 is four. The load ports 21 and process ports 22 are arranged so that the X-direction positions of the center C2 of the transfer robot 5 in a plan view, the center C3 of the load port 21 in an X-direction plan view, and the center C1 of the process port 22 in an X-direction plan view are approximately aligned. When there is one load port 21 or one process port 22 and two or more of the other, the transfer robot 5 may be arranged to face one of the two or more mounting units in the Y direction.

[0104] In the substrate transport system 1, the load port 21 is disposed on the first long wall 2a side in the Y direction across the transfer robot 5, and the processing port 22 is disposed on the second long wall 2b side in the Y direction, but the configuration is not limited to the above. The substrate transport system may also be configured, for example, with the load port 21 and the processing port 22 arranged in parallel in either the X direction or the Y direction. In the above configuration, a plurality of transfer robots 5 may be arranged in the same direction as the load port 21 and the processing port 22, and an intermediary unit may be provided between the load port 21 and the processing port 22 to relay the wafer 10 removed from the load port 21 before transferring it to the processing port 22. The transfer robot 5 on the load port 21 side transfers the wafer 10 to the intermediary unit, and the transfer robot 5 on the processing port 22 side transfers the wafer 10 from the intermediary unit to the processing port 22. In the above configuration, the intermediary unit serves as the second placement unit 4 when the transferred wafer 10 is temporarily placed thereon and as the first placement unit 3 when the temporarily placed wafer 10 is removed therefrom.

[0105] A program for realizing the functions of the control device 516 described above may be recorded on a computer-readable recording medium, and the program recorded on the recording medium may be read into a computer system and executed to perform the processing of the control device 516 described above. Here, "reading a program recorded on a recording medium into a computer system and executing it" includes installing the program into a computer system. The term "computer system" here includes hardware such as an OS and peripheral devices. The "computer system" may also include multiple computer devices connected via a network including a communication line. The recording medium may also include an internal or external recording medium accessible from a distribution server for distributing the program.

[0106] Another embodiment of the substrate transfer system of the present embodiment will be described with reference to Fig. 12. As shown in Fig. 12, the substrate transfer system 100 includes a transfer section 102 equipped with two transfer robots 105A and 105B.

[0107] In the transport unit 102, as transportable areas, an area that can be transported by the first transfer robot 105A is set as a first transport unit 111, and an area that can be transported by the second transfer robot 105B is set as a second transport unit 112. A first placement unit group 121 on which substrates can be placed is provided around the first transport unit 111, and a second placement unit group 122 on which substrates can be placed is provided around the second transport unit 112.

[0108] The transport unit 102 is provided with an intermediary placement unit 130 that transfers substrates between the first transfer robot 105A and the second transfer robot 105B. The intermediary placement unit 130 is included in the transportable areas of the first transport unit 111 and the second transport unit 112, and is provided between the first placement unit group 121 and the second placement unit group 122.

[0109] For example, the substrate is transferred by the first transfer robot 105A from a relay port (not shown) to the first port 121a of the first placement unit group 121, where the first processing is performed on the substrate, and then the substrate is transferred by the first transfer robot 105A from the first port 121a to the second port 121b, where the second processing is performed on the substrate.

[0110] The substrate that has been subjected to the second process is transported to the first relay port 130a of the relay mount part 130 by the first transfer robot 105A.

[0111] The substrate transported to the first relay port 130a of the intermediate mount part 130 is transported by the second transfer robot 105B to the third port 122a, where the substrate is subjected to a third process. The substrate is then transported by the second transfer robot 105B sequentially from the third port 122a to the fourth port 122b and the fifth port 122c, which are aligned in one direction in the transport direction. The substrate transported to the fourth port 122b and the fifth port 122c is subjected to a fourth process in the fourth port 122b and a fifth process in the fifth port 122c. The substrate that has been subjected to the fifth process is transported from the fifth port 122c to the sixth port 122d by the second transfer robot 105B, where the substrate is subjected to a sixth process.

[0112] The substrates that have been subjected to the sixth process are transported by the second transfer robot 105B from the sixth port 122d to the seventh port 122e and the eighth port 122f, which are arranged in the other direction opposite to the one transport direction. The substrates transported to the seventh port 122e and the eighth port 122f are subjected to the seventh process at the seventh port 122e and the eighth process at the eighth port 122f.

[0113] The substrate that has been subjected to the eighth process is transported to the second relay port 130b, and then transported to a relay port (not shown) by the first transfer robot 105A. In the transport unit 102, the wafers 10 are transported sequentially from the first relay port 130a in a clockwise direction as shown by arrow D in FIG.

[0114] The same effects as those of the above embodiment can be obtained in the substrate transfer system 100 configured in this manner. The placement of the transfer unit, the placement unit group, and the intermediate placement unit can be set arbitrarily, and each unit may be appropriately placed within the range that can be transported by the transfer robot.

[0115] The substrate transfer system 1 includes one load port 21 and four processing ports 22, but is not limited to the above configuration. The substrate transfer system 1 may also be configured with, for example, one load port 21 and three processing ports 22. The substrate transfer system 1 may also be configured with, for example, three load ports 21 and three processing ports 22. The substrate transfer system 1 may also be configured with, for example, multiple load ports 21 and one processing port 22. When there is one load port 21 or one processing port 22 and two or more of the other, the transfer robot 5 may be positioned to face one of the two or more mounting units in the Y direction.

[0116] In the substrate transport system 1, the load port 21 is disposed on the first long wall 2a side in the Y direction with the transfer robot 5 in between, and the processing port 22 is disposed on the second long wall 2b side in the Y direction, but this configuration is not limited to the above. The substrate transport system 1 may also be configured, for example, with the load port 21 and the processing port 22 arranged in parallel in either the X direction or the Y direction. In the above configuration, a plurality of transfer robots 5 may be arranged in the same direction as the arrangement of the load port 21 and the processing port 22, and an intermediary unit may be provided between the load port 21 and the processing port 22 to temporarily place the wafer 10 between adjacent transfer robots 5, 5. In the above configuration, the intermediary unit serves as the second placement unit 4 when the transferred wafer 10 is temporarily placed thereon and as the first placement unit 3 when the temporarily placed wafer 10 is removed therefrom.

[0117] Although an embodiment of the present invention has been described above in detail with reference to the drawings, the specific configuration is not limited to this embodiment, and design changes that do not deviate from the gist of the present invention are included in the present invention.

[0118] By using the substrate transport system and the transfer robot control device, substrates can be transported efficiently.

[0119] REFERENCE SIGNS LIST 1 Substrate transport system 2 Transport unit 3 First mounting unit 4 Second mounting unit 5 Transfer robot 10 Substrate (wafer) 51 Main body unit 52 Swivel support unit 53 Arm support unit 54 Arm unit 55 Holding unit 516 Control device (robot control unit)

Claims

1. a transport section that defines a range in which the substrate is transported; a first placement part and a second placement part on which the substrate is placed; a transfer robot provided inside the transport unit and configured to transport the substrate from the first placement unit to the second placement unit; Equipped with The transfer robot is a body portion supported within the carrier; A pivot support part connected to the main body part and rotatable relative to the main body part; an arm support portion connected to the pivot support portion and rotatable relative to the pivot support portion; an arm portion connected to the arm support portion and rotatable relative to the arm support portion; a holder connected to the arm and holding the substrate, The arm portion is A first arm supported by the arm support portion; a second arm supporting the holding portion and supported by the first arm; Equipped with The swivel support portion rotates in a plan view about a connection portion with the main body portion as a rotation axis, the arm support portion rotates in a plan view about a connection portion with the swivel support portion as a rotation axis, the arm portion rotates about the arm support portion as a rotation axis in a plan view, the holding portion rotates relative to the second arm in a plan view about a portion supported by the first arm as a rotation axis; Substrate transport system.

2. The transfer robot is A rotation motor that rotates the rotation support part relative to the main body part; an arm support drive motor that rotates the arm support portion relative to the swivel support portion; an arm motor that rotates the arm portion relative to the arm support portion; Equipped with The substrate transfer system according to claim 1 .

3. The arm support unit includes an arm motor including an arm drive mechanism that operates the arm unit. The substrate transfer system according to claim 1 .

4. The arm support portion is A swivel mounting portion connected to the swivel support portion; an arm attachment portion to which the arm portion is connected, A center line of rotation of the arm support part relative to the swivel support part and a center line of rotation of the arm part relative to the arm support part are set on the same line. The substrate transfer system according to claim 1 .

5. a robot control unit for controlling a transport operation of the substrate by the transfer robot, The robot control unit controlling operations of the arm support unit, the arm unit, and the holding unit so that, when transferring the substrate between a first placement position set on the first placement unit and a first pre-placement position set opposite to the first placement unit, the holding unit is moved while maintaining an attitude of the holding unit that holds the substrate in a predetermined direction along a center line connecting the first placement position and the first pre-placement position in a plan view; when transferring the substrate between a second placement position set on the second placement section and a second pre-placement position set opposite the second placement section, operations of the arm support section, the arm section, and the holding section are controlled so as to move the holding section while maintaining the attitude of the holding section, which holds the attitude of the substrate, in the predetermined direction along a center line in a plan view connecting the second placement position and the second pre-placement position. The substrate transfer system according to claim 1 .

6. a robot control unit for controlling a transport operation of the substrate by the transfer robot, The robot control unit when transferring the substrate between a first pre-placement position set opposite to the first placement position set on the first placement unit and a second pre-placement position set opposite to the second placement position set on the second placement unit, operations of the swivel support unit, the arm support unit, the arm unit, and the holding unit are controlled so as to move the holding unit while maintaining the attitude of the holding unit, which holds the attitude of the substrate, in a predetermined direction along a center line connecting the first pre-placement position and the second pre-placement position in a plan view; The arm support unit is controlled by the robot control unit so as to rotate independently with respect to the swivel support unit and the arm unit. The substrate transfer system according to claim 1 .

7. The robot control unit controlling operations of the swivel support part, the arm support part, and the arm part so that, when the holding part moves between the first pre-placement position and the second pre-placement position, the swivel support part is rotated in a first direction and the arm support part is rotated in a second direction; The substrate transfer system according to claim 6 .

8. a robot control unit for controlling a transport operation of the substrate by the transfer robot, The robot control unit controlling operations of the swivel support unit, the arm support unit, the arm unit, and the holding unit so that a rotation angle of the second arm relative to the first arm in a plan view is 180 degrees or less in a clockwise direction in a plan view from a state in which the first arm and the second arm are arranged in the same direction; The substrate transfer system according to claim 1 .

9. Transporting the substrate between a first placement part and a second placement part provided inside the transport part; A main body supported within the transport unit; A pivot support part connected to the main body part and rotatable relative to the main body part; an arm support portion connected to the pivot support portion and rotatable relative to the pivot support portion; an arm portion connected to the arm support portion and rotatable relative to the arm support portion; a holder connected to the arm and configured to hold the substrate; Equipped with The arm portion is A first arm supported by the arm support portion; a second arm supporting the holding portion and supported by the first arm, The swivel support portion rotates in a plan view about a connection portion with the main body portion as a rotation axis, the arm support portion rotates in a plan view about a connection portion with the swivel support portion as a rotation axis, the arm portion rotates about the arm support portion as a rotation axis in a plan view, the holding portion rotates relative to the second arm in a plan view about a portion supported by the first arm as a rotation axis, The arm support portion is A swivel mounting portion connected to the swivel support portion; an arm attachment portion to which the arm portion is connected, a control device for controlling a transport operation of the substrate by a transfer robot, the control device comprising: a center line of rotation of the arm support part relative to the swivel support part and a center line of rotation of the arm part relative to the arm support part that are set on the same line; A storage unit; A processing section; Equipped with The processing unit includes a target position acquisition unit, a target position determination unit, and an operation control unit. The storage unit stores preset position information in which position information of a first placement position set on the first placement unit, position information of a first pre-placement position set at a position opposite to the first placement unit, position information of a second placement position set on the second placement unit, and position information of a second pre-placement position set at a position opposite to the second placement unit are preset, the target position acquisition unit acquires, as target position information, from the set position information, position information corresponding to at least a movement target position of the holder when the substrate is transported between the first placement part and the second placement part, and sends the acquired position information to the target position determination unit; the target position determination unit determines movement information from at least the current position of the holding unit to the movement target position based on at least current position information of the current position of the holding unit and target position information of the movement target position acquired by the target position acquisition unit; the operation control unit controls, based on the movement information, the rotation of the swivel support unit relative to the main body unit, the rotation of the arm support unit relative to the swivel support unit, the rotation of the arm unit relative to the arm support unit, and the rotation of the holding unit relative to the arm unit when moving to the movement target position. Transfer robot control device.

10. The swivel support portion rotates in a plan view about a connection portion with the main body portion as a rotation axis, the arm support portion rotates in a plan view about a connection portion with the swivel support portion as a rotation axis, the arm portion rotates in a direction opposite to that of the swivel support portion in a plan view, with a connection portion with the arm support portion as a rotation axis; the operation control unit controls a rotation direction, a rotation amount, and a rotation angle of the swivel support unit and the arm unit in response to the movement target position of the holding unit. The transfer robot control device according to claim 9.

11. The processing unit includes: a motion determination unit that, in response to a planar rotation motion, determines the motion of the swivel support unit, the arm support unit, and the arm unit to be either a planar linear interpolation motion or a stop motion for moving to the movement target position, and determines the motion of the holding unit to be either a planar linear interpolation motion or a stop motion for moving to the movement target position, in response to the planar rotation motion of the swivel support unit, the arm support unit, and the arm unit; The transfer robot control device according to claim 10.

12. the operation control unit controls the operations of the swivel support unit, the arm support unit, the arm unit, and the holding unit so that a rotation angle of the second arm relative to the first arm in a plan view is 180 degrees or less in a clockwise direction in a plan view from a state in which the first arm and the second arm are arranged in the same direction. The transfer robot control device according to any one of claims 9 to 11.

13. A transport section in which a range in which the substrate is transported is defined; a first placement part and a second placement part on which the substrate is placed; a transfer robot provided inside the transport part and configured to transport the substrate from the first placement part to the second placement part, The transfer robot is a body portion supported within the carrier; A pivot support part connected to the main body part and rotatable relative to the main body part; an arm support portion connected to the pivot support portion and rotatable relative to the pivot support portion; an arm portion connected to the arm support portion and rotatable relative to the arm support portion; a holder connected to the arm and holding the substrate, The arm portion is A first arm supported by the arm support portion; a second arm supporting the holding portion and supported by the first arm, The swivel support portion is a first end portion rotatably coupled to the body portion; a second end portion at which a first shaft member is disposed to which the arm support portion is rotatably connected; The arm support portion is A swivel mounting portion connected to the swivel support portion; an arm attachment portion in which a second shaft member to which the arm portion is connected is disposed, The first shaft member and the second shaft member are arranged on the same line. Substrate transport system.