Sample analyzing device

Abstract

This sample analyzing device for quantifying components for analysis within a sample comprises: a storage unit (41) for storing information relating to each of a plurality of known components, in which the amount of the component and the type and amount of a cleaning solution for removing the component are associated with one another; a quantitative analysis unit (42) into which a plurality of samples are introduced in a predetermined order, and which quantifies the components for analysis included in each sample; cleaning solution introducing units (13, 14) for introducing the cleaning solutions for cleaning the plurality of known components; and a cleaning execution unit (43) which, each time the components for analysis contained in one sample are quantified by the quantitative analysis unit, compares information relating to the components for analysis quantified by the quantitative analysis unit with the information stored in the storage unit to determine the type and amount of each cleaning solution, and performs a cleaning operation by operating the cleaning solution introducing units to remove the components for analysis from the analyzing device.

Description

Sample analyzer

[0001] The present invention relates to a sample analyzer that quantifies an analyte component contained in a sample.

[0002] Inductively coupled plasma mass sample analyzers are used to quantify harmful metal elements and other substances contained in liquid samples, such as environmental water collected from rivers, lakes, and other sources, or drinking water (see, for example, Patent Document 1). The inductively coupled plasma mass sample analyzer includes an inductively coupled plasma ion source and a mass analyzer. The inductively coupled plasma ion source generates inductively coupled plasma from argon gas, and atomized liquid samples are introduced into the plasma to generate atomic ions from components contained in the liquid samples. The atomic ions generated by the inductively coupled plasma ion source are introduced into the mass analyzer, where they are separated according to their mass-to-charge ratios and detected by an ion detector.

[0003] Due to their high sensitivity, inductively coupled plasma mass spectrometers are suitable for the detection and quantification of trace elements. However, elements from previous samples tend to remain in the analyzer, resulting in carryover. Therefore, when analyzing multiple samples consecutively, the analyzer is cleaned after each analysis by introducing a cleaning solution appropriate for the type and amount of elements expected to be present in the sample based on its attributes (tap water, river water, etc.).

[0004] JP 2017-156332 A JP 2001-324476 A

[0005] In actual analysis, to ensure carryover prevention, some analyzers overestimate the amount of elements contained in the sample and supply extra cleaning solution, or supply a cleaning solution appropriate for an element even if it is unlikely to be present. Increasing the amount and type of cleaning solution supplied in this way increases the cleaning time. It is common for ICP-MS sample analyzers to analyze hundreds of samples consecutively, and even an increase of just 30 seconds in the cleaning time can extend the analysis time by several hours.

[0006] Here, the problems in the prior art have been explained using an inductively coupled plasma mass spectrometer as an example, but similar problems exist in other sample analyzers that quantify the analyte components contained in a sample.

[0007] The problem to be solved by the present invention is to reduce the time required for continuous analysis while preventing carryover when multiple samples are continuously analyzed.

[0008] The present invention, which has been made to solve the above problems, is a sample analyzer that quantifies a target component contained in a sample, and comprises: a memory unit that stores information that corresponds, for each of a plurality of known components that may be contained in the sample, the amount of the known component with the type and amount of a cleaning solution for removing the known component; a quantitative analysis unit that introduces a plurality of samples into the sample analyzer in a predetermined order and quantifies the target component contained in each sample; a cleaning solution introduction unit that introduces a cleaning solution for washing the plurality of known components into the sample analyzer; and a cleaning execution unit that, each time a target component contained in a sample is quantified by the quantitative analysis unit, compares information about the target component quantified by the quantitative analysis unit with information stored in the memory unit to determine the type and amount of cleaning solution, and operates the cleaning solution introduction unit to perform a cleaning operation that removes the target component from the sample analyzer.

[0009] In the sample analyzer of the present invention, information associating the amount of each known component with the type and amount of cleaning solution used to remove that known component is stored in a memory unit. Each time the quantitative analysis unit quantifies the analyte component contained in a sample, the cleaning execution unit compares the information about the quantified analyte component with the information stored in the memory unit to determine the type and amount of cleaning solution, then operates the cleaning solution introduction unit to perform a cleaning operation to remove the analyte component from the sample analyzer using that type and amount of cleaning solution. This allows the sample analyzer to be cleaned with the appropriate type and amount of cleaning solution corresponding to the amount of analyte contained in the sample analyzed immediately before, thereby preventing carryover. The sample analyzer of the present invention does not overestimate the amount of component contained in the sample and therefore does not supply excess cleaning solution, nor does it perform a cleaning operation using cleaning solution intended to wash away components not contained in the sample, thereby shortening the time required to continuously analyze multiple samples.

[0010] The present invention relates to an inductively coupled plasma mass spectrometer, ...

[0011] An inductively coupled plasma mass spectrometer (ICP-MS) that is one embodiment of a sample analyzer according to the present invention will be described below with reference to the drawings.

[0012] 1 is a diagram showing the configuration of the main components of an inductively coupled plasma mass spectrometer 1 according to this embodiment. The inductively coupled plasma mass spectrometer 1 comprises a plasma ionization unit 10, a mass analysis unit 30, and a control and processing unit 40.

[0013] The plasma ionization unit 10 has a plasma torch 20, which includes a sample flow tube through which a liquid sample atomized by a nebulizer gas flows, a plasma gas tube formed around the sample flow tube, and a cooling gas tube further formed around the plasma gas tube. The sample flow tube is connected to an autosampler 11 that introduces the liquid sample, a nebulizer gas supply source 12 that supplies nebulizer gas that atomizes the liquid sample introduced from the autosampler 11, and a cleaning liquid introduction unit 13 that introduces a cleaning liquid. A flow path from the cleaning liquid introduction unit 13 is connected to the flow path from the autosampler 11 to the sample flow tube, and a flow path switching valve 14 is located at the connection point to switch the flow path so that either the autosampler 11 or the cleaning liquid introduction unit 13 is connected to the sample flow tube.

[0014] A plasma gas supply source 15 is connected to the plasma gas pipe. A cooling gas supply source (not shown) for supplying cooling gas is connected to the cooling gas pipe. Argon gas, for example, is used as the nebulizer gas, cooling gas, and plasma gas. In the plasma ionization unit 10, argon plasma 21 is generated at the tip of the plasma torch 20, and atomic ions are generated from the liquid sample by introducing an atomized liquid sample into the argon plasma 21.

[0015] The mass analysis section 30 comprises a first vacuum chamber 31 having a skimmer formed at the entrance facing the argon plasma 21, and a second vacuum chamber 32 having a skimmer formed between the first vacuum chamber 31 and a quadrupole mass filter 321 and a detector 322 disposed inside for detecting ions separated by the quadrupole mass filter 321.

[0016] The control / processing unit 40 includes a memory unit 41 and, as functional blocks, a quantitative analysis unit 42, a cleaning execution unit 43, and a cleaning setting change unit 44. The control / processing unit 40 is actually a personal computer, and each of the above functional blocks is realized by executing a dedicated program pre-installed on the processor. In addition, an input unit 60 such as a keyboard and a mouse, and a display unit 70 such as a liquid crystal display are connected to the control / processing unit 40.

[0017] The memory unit 41 stores information on the measurement conditions for the element to be measured (such as the mass-to-charge ratio of ions generated from the element, the mass-to-charge ratio of target ions in SIM measurement, and interfering ions). The element to be measured may include not only the element to be quantified (the element to be quantified), but also elements that must be measured to quantify the element to be quantified (related elements that generate interfering ions for the element to be quantified). The target ion in the SIM measurement is determined based on factors such as being unaffected (or only slightly affected) by interfering ions derived from other elements and having high detection sensitivity (see, for example, Patent Document 1).

[0018] The memory unit 41 also stores data on calibration curves that represent the relationship between the measured intensity and concentration of target ions for each element to be measured. The calibration curves are created, for example, by a user performing preliminary measurements using standard samples or the like prepared for each element to be measured, taking into account the attributes of the sample to be analyzed, and include information on the minimum concentration (lower limit of quantification) and the maximum concentration (upper limit of quantification) expected to be contained in the sample. The maximum concentration is the maximum concentration expected to be contained in the sample, and is usually determined by the user based on the attributes of the sample and the details of pretreatment.

[0019] Furthermore, the memory unit 41 also stores information about cleaning solutions used to clean the plasma ionization unit 10 and the mass analysis unit 30. Specifically, information about the standard cleaning solution (type and supply time of the cleaning solution), the concentration threshold of each element to be measured, and information about additional cleaning solutions for each element to be measured (type and supply time of the cleaning solution) are stored.

[0020] FIG. 2 shows an example of cleaning liquid information. In this example, the information on the standard cleaning liquid is set to supply cleaning liquid a for 30 seconds, cleaning liquid b for 30 seconds, and cleaning liquid c for 30 seconds, in that order. The information on the additional cleaning liquids is set to supply cleaning liquid a for 30 seconds when the concentration of element A exceeds a threshold value (100 ppm), supply cleaning liquid b' for 20 seconds when the concentration of element B exceeds a threshold value (200 ppm), supply cleaning liquid c for 30 seconds when the concentration of element C exceeds a threshold value (100 ppm), and supply cleaning liquid c for 20 seconds when the concentration of element D exceeds a threshold value (150 ppm). Note that cleaning liquid b' is a cleaning liquid of the same type as cleaning liquid b but with a higher concentration. Information on the additional cleaning liquids may be set for all elements or for only some elements. In the latter case, the threshold value for the concentration of the element may be set, for example, to the maximum concentration of the calibration curve or infinity. The cleaning solution is typically a solvent such as hydrochloric acid, nitric acid, or hydrofluoric acid, which is used to dissolve target elements such as metals contained in the sample. These are all acidic solvents, but pure water, alkaline solvents, organic solvents, etc. may also be used.

[0021] Next, the procedure for continuously analyzing multiple liquid samples using the inductively coupled plasma mass spectrometer 1 of this embodiment will be described with reference to the flowchart in Figure 3. Here, the case of quantifying elements by the calibration curve method will be described as an example, but when quantifying elements by the internal standard method, an internal standard element is assigned in advance to the element to be quantified, and a specified amount of the internal standard element is added to each sample (see, for example, Patent Document 2).

[0022] The user sets in advance a plurality of samples to be analyzed in the autosampler 11. In addition, cleaning liquid a, cleaning liquid b, cleaning liquid b', cleaning liquid c, cleaning liquid d, . . . are set in the cleaning liquid inlet 13.

[0023] After setting a sample in the autosampler 11, when the user issues a command to perform measurement by performing a predetermined operation via the input unit 60, the quantitative analysis unit 42 displays a screen for specifying the elements to be quantified on the display unit 70. When the user specifies the elements to be quantified, the quantitative analysis unit 42 determines the specified elements to be quantified and their related elements as the elements to be measured, and reads out the measurement conditions for these elements to be measured and information on the cleaning solutions corresponding to each element from the memory unit 41. In the following description, elements A, B, C, and D are defined as the elements to be measured.

[0024] When the measurement conditions for the target element and the cleaning solution information are read, the cleaning setting change unit 44 displays the read cleaning solution information on the screen of the display unit 70. The displayed content is what is stored in the memory unit 41, for example, what was set by the system administrator when the system was installed, or what was changed and stored during subsequent analysis. The user checks the displayed cleaning solution content, makes changes as necessary, and then determines the cleaning solution information (Step 1). If the user makes changes, the cleaning setting change unit 44 saves the changed cleaning solution information in the memory unit 41.

[0025] Once the user has determined the information about the cleaning liquid, quantitative analysis unit 42 supplies the first sample set in a predetermined position in autosampler 11 to the sample introduction tube. In parallel with this, nebulizer gas is also supplied to the sample introduction tube from nebulizer gas supply source 12, plasma gas is supplied to the plasma gas tube from plasma gas supply source 15, and cooling gas is supplied to the cooling gas tube from cooling gas supply source.

[0026] A sample supplied to a sample introduction tube and atomized by a nebulizer gas is introduced into the argon plasma 21 generated at the tip of the plasma torch 20, generating atomic ions. The generated atomic ions are introduced into the mass analysis unit 30, mass-separated by a quadrupole mass filter 321, and then detected by a detector 322. The mass analysis unit 30 performs SIM measurement on ions (target ions) with a predetermined mass-to-charge ratio for each of the target elements A, B, C, and D of quantitative analysis. This is the case when there are no interfering ions for any of the elements A, B, C, and D. If there are interfering ions (isobaric ions for the ions of the element) for any of the elements, SIM measurement is also performed on ions with a different mass-to-charge ratio corresponding to the isobaric ions. Alternatively, when there are a large number of target elements of quantitative analysis, MS scan measurement may be performed.

[0027] When the measurement of the sample is completed (step 2), the quantitative analysis unit 42 reads out the calibration curves of elements A, B, C, and D stored in the memory unit 41. Then, the measured intensities of the target ions of elements A, B, C, and D measured by SIM measurement are compared with the calibration curves to determine the concentration values ​​of elements A, B, C, and D (calculate the quantitative values) (step 3).

[0028] After determining the concentration values ​​of elements A, B, C, and D, the cleaning execution unit 43 compares the concentration value of each element with the threshold value for each element stored in the memory unit 41. If the concentration of any element is equal to or less than the threshold value (NO in step 4), the cleaning execution unit 43 operates the cleaning liquid introduction unit 13 and the flow path switching valve 14 to clean the plasma ionization unit 10 and the mass analysis unit 30 using a standard cleaning liquid based on the information stored in the memory unit 41 (step 5). On the other hand, if the concentration value of any element exceeds the threshold value (YES in step 4), the cleaning execution unit 43 operates the cleaning liquid introduction unit 13 and the flow path switching valve 14 to clean the plasma ionization unit 10 and the mass analysis unit 30 using the standard cleaning liquid, and further cleans the plasma ionization unit 10 and the mass analysis unit 30 using an additional cleaning liquid based on the information stored in the memory unit 41 (step 6).

[0029] Specifically, for example, if the concentration value of element A exceeds the threshold value (100 ppm), cleaning with the standard cleaning solution is performed, followed by an additional 30-second flow of cleaning solution a. If the concentrations of both element A and element B exceed the threshold values ​​(element A: 100 ppm, element B: 200 ppm), cleaning with the standard cleaning solution is performed, followed by an additional 30-second flow of cleaning solution a and an additional 20-second flow of cleaning solution b'. If the concentrations of elements shared by the additional cleaning solutions exceed the threshold values, an additional cleaning solution of the element with a longer supply time (or a larger supply amount) is supplied. In this example, if the concentrations of both element A and element C exceed the threshold values, cleaning with the standard cleaning solution is performed, followed by an additional 40-second flow of cleaning solution a.

[0030] When the cleaning operation by the cleaning execution unit 43 is completed, the quantitative analysis unit 42 checks whether the measurement of all samples has been completed. At this point, only the first sample has been measured, and there are still samples left to be measured (NO in step 7), so the process returns to step 2 to measure the next sample. If the measurement of all samples has been completed (YES in step 7), the series of measurement operations ends.

[0031] While ICP-MS instruments are highly sensitive and suitable for detecting and quantifying trace elements, they are prone to carryover if elements from a previously measured sample remain. To reliably prevent carryover, some instruments have overestimated the amount of an element contained in a sample and supplied extra cleaning solution, or supplied cleaning solution for an element that is unlikely to actually be present, taking into account the possibility that that element may be present.

[0032] In contrast, the inductively coupled plasma mass spectrometer 1 of this embodiment determines (quantifies) the concentration value of each element each time the analyte elements contained in a sample are quantified. If none of the element concentrations (quantitative values) exceed the threshold, the instrument is cleaned using only the standard cleaning solution. Only if any of the element concentrations (quantitative values) exceed the threshold is additional cleaning performed using a cleaning solution of the appropriate type and amount for that element. This allows the sample analyzer to be cleaned using the appropriate type and amount of cleaning solution for the amount of analyte contained in the sample analyzed immediately before, thereby preventing carryover. The inductively coupled plasma mass spectrometer 1 of this embodiment does not overestimate the amount of element contained in the sample and therefore does not supply extra cleaning solution, nor does it perform cleaning operations using cleaning solutions used to clean elements not contained in the sample, thereby reducing the time required to continuously analyze multiple samples.

[0033] In the above embodiment, the apparatus is configured to clean the interior using only the standard cleaning solution when the concentration of any of the elements to be measured does not exceed the threshold, and to clean using the additional cleaning solution when the concentration of any of the elements exceeds the threshold. However, other configurations can also be employed. Below, several examples of such configurations will be described. The configurations described below can be implemented by the cleaning setting change unit 44 changing the settings related to cleaning of the apparatus in response to a predetermined input operation by the user.

[0034] In the above example, the threshold value is set as a concentration value (absolute value). However, it may also be set as a percentage based on the maximum concentration in the calibration curve of each element. Specifically, for example, 80% of the maximum concentration in the calibration curve can be set as a common threshold for elements A, B, C, and D. Alternatively, 80%, 70%, 75%, and 95% of the maximum concentration in the calibration curve can be set as thresholds individually for elements A, B, C, and D. In this case, for example, cleaning solution information such as that shown in FIG. 4 may be stored in advance in the memory unit 41.

[0035] In each of the above examples, one cleaning liquid is associated with each element, but multiple cleaning liquids may be associated with one element. For example, a cleaning sequence may be set up such that, when the concentration value of element E exceeds a threshold value, in addition to cleaning with the standard cleaning liquid, the apparatus is cleaned by flowing cleaning liquid A for 30 seconds, cleaning liquid B for 20 seconds, and pure water for 30 seconds, in that order; and, when the concentration value of element F exceeds a threshold value, the apparatus is cleaned by flowing cleaning liquid A for 40 seconds, cleaning liquid C for 30 seconds, and pure water for 30 seconds, in that order, in addition to cleaning with the standard cleaning liquid. By setting up such cleaning sequences for one or more elements that tend to remain in the flow paths, etc. within the apparatus, cleaning operations using multiple cleaning liquids can be performed, thereby more reliably removing those elements from the apparatus.

[0036] Alternatively, instead of the information on the standard cleaning solution and the additional cleaning solution, a cleaning solution associated with each element may be supplied for a time (amount) corresponding to the quantitative value of the element. In this case, for example, information representing the relationship between the quantitative value of the element and the amount or supply time of the cleaning solution (e.g., a mathematical formula for calculating the amount or supply time of the cleaning solution using the quantitative value as a variable) may be stored in the memory unit 41, and the cleaning execution unit 43 may determine the amount or supply time of the cleaning solution based on the mathematical formula. In this case, the interior of the device can be cleaned using different amounts of cleaning solution depending on the concentrations (quantitative values) of the elements actually contained in the sample. Note that, when a common cleaning solution is associated with multiple elements, the longest supply time of the cleaning solution calculated from the mathematical formulas corresponding to the multiple elements may be used.

[0037] The above embodiment is merely an example and can be modified as appropriate in accordance with the spirit of the present invention.

[0038] Although the above embodiment is an inductively coupled plasma mass spectrometer, the same configuration can also be used in devices that detect atomic ions generated by an inductively coupled plasma ion source using other measurement methods. Furthermore, the same configuration can also be used in various analytical devices that use other ion sources, or that perform analysis without generating ions from the target sample, and that perform analysis of multiple samples to quantify components contained in the sample. In particular, the same configuration can be suitably used in atomic absorption spectrometry, which, like an inductively coupled plasma mass spectrometer, quantifies trace elements contained in a sample.

[0039] In addition, in the above embodiment, only one threshold value is set for each element, but multiple threshold values ​​may be set, and a cleaning operation may be performed using a predetermined type and amount (or supply time) of additional cleaning liquid each time each threshold value is exceeded.

[0040] Aspects It will be apparent to those skilled in the art that the exemplary embodiments described above are examples of the following aspects.

[0041] (Item 1) One aspect of the present invention is a sample analyzer that quantifies a target component contained in a sample, comprising: a memory unit that stores information that associates, for each of a plurality of known components that may be contained in the sample, the amount of the known component with the type and amount of a cleaning solution for removing the known component; a quantitative analysis unit that introduces a plurality of samples into the sample analyzer in a predetermined order and quantifies the target component contained in each sample; a cleaning solution introduction unit that introduces a cleaning solution for washing the plurality of known components into the sample analyzer; and a cleaning execution unit that, each time a target component contained in a sample is quantified by the quantitative analysis unit, compares information about the target component quantified by the quantitative analysis unit with information stored in the memory unit to determine the type and amount of cleaning solution, and operates the cleaning solution introduction unit to perform a cleaning operation that removes the target component from the sample analyzer.

[0042] In the sample analyzer according to paragraph 1, information associating the amount of each known component with the type and amount of cleaning solution used to remove that known component is stored in the memory unit. Each time the quantitative analysis unit quantifies the analyte component contained in a sample, the cleaning execution unit compares the information about the quantified analyte component with the information stored in the memory unit to determine the type and amount of cleaning solution, then operates the cleaning solution introduction unit to perform a cleaning operation to remove the analyte component from the sample analyzer using that type and amount of cleaning solution. This allows the sample analyzer to be cleaned with the appropriate type and amount of cleaning solution corresponding to the amount of analyte contained in the sample analyzed immediately before, thereby preventing carryover. The sample analyzer according to paragraph 1 does not overestimate the amount of element contained in the sample and therefore does not supply excess cleaning solution, nor does it perform a cleaning operation using cleaning solution used to remove elements not contained in the sample, thereby shortening the time required to continuously analyze multiple samples. While there are often multiple analyte components, there may be only one analyte component.

[0043] (Clause 2) The sample analyzer according to paragraph 2 is the sample analyzer according to paragraph 1, wherein the memory unit further stores information on the type and amount of standard cleaning solution, information on threshold values ​​associated with each of the plurality of known components, and information on the type and amount of additional cleaning solution to be used when the threshold value is exceeded, and the cleaning execution unit performs a cleaning operation using the standard cleaning solution when the quantitative value of the target component does not exceed the threshold value associated with the target component, and performs a cleaning operation using the standard cleaning solution as well as the additional cleaning solution associated with the target component when the quantitative value of the target component exceeds the threshold value associated with the target component.

[0044] In the sample analyzer according to paragraph 2, the analyzer can be cleaned using an appropriate type and amount of cleaning solution based on whether the quantitative value of each of the components to be analyzed exceeds a threshold. If the concentration values ​​of the components for which additional cleaning solutions are common exceed the threshold, the additional cleaning solution for the component supplied in greater quantity can be supplied.

[0045] (Clause 3) The sample analyzer according to clause 3 is the sample analyzer according to clause 2, wherein the memory unit further stores information on a calibration curve and maximum concentration for each of the plurality of known components, and the threshold is set as a percentage of the maximum concentration.

[0046] (4th paragraph) The sample analyzer according to the 4th paragraph is the sample analyzer according to the 3rd paragraph, wherein the ratio is set individually for the plurality of known components.

[0047] When a calibration curve is used to quantify a component contained in a sample, information on the minimum concentration representing the lower limit of quantification of the component and the maximum concentration expected to be contained in the sample is generally stored along with the calibration curve. In the sample analyzer according to paragraph 3, a threshold value can be set as a percentage of the stored maximum concentration, and the analyzer can be cleaned using an appropriate type and amount of cleaning solution. Note that in this case, the percentage of the maximum concentration may be a value common to multiple known components, or may be set individually as in the sample analyzer according to paragraph 4. In the latter case, the threshold value can be set more precisely.

[0048] (Clause 5) The sample analyzer according to clause 5 is the sample analyzer according to any one of clauses 1 to 4, wherein the memory unit further stores information representing the relationship between the quantitative values ​​of the plurality of known components and the amount of cleaning liquid, and the cleaning execution unit executes a cleaning operation using a quantity of cleaning liquid according to the quantitative values ​​of the components to be analyzed.

[0049] In the sample analyzer according to paragraph 5, information representing the relationship between the quantitative value of each known component and the amount or supply time of cleaning liquid (e.g., a formula for calculating the amount or supply time of cleaning liquid using the quantitative value as a variable) is stored in the memory unit, and the cleaning execution unit determines the amount or supply time of cleaning liquid based on the formula. In the sample analyzer according to paragraph 5, the interior of the analyzer can be cleaned using different amounts of cleaning liquid depending on the actual concentration (quantitative value) of elements contained in the sample. When a common cleaning liquid is associated with multiple components, the longest cleaning liquid supply time calculated from the formulas corresponding to the multiple components can be used.

[0050] The sample analyzer according to paragraph 6 is the sample analyzer according to any one of paragraphs 1 to 5, wherein for at least one of the plurality of known components, a threshold value for the amount of the known component and a cleaning sequence are set, which is used when the quantitative value of the known component exceeds the threshold value, and which performs a cleaning operation using a plurality of cleaning solutions in sequence.

[0051] In the sample analyzer according to paragraph 6, for example, components that tend to remain in the analyzer can be more reliably removed from the analyzer by performing a cleaning operation using a plurality of cleaning solutions.

[0052] (Clause 7) The sample analyzer according to clause 7 is the sample analyzer according to any one of clauses 1 to 5, wherein the quantitative analysis unit includes an inductively coupled plasma ion source that generates atomic ions from components contained in the sample using inductively coupled plasma.

[0053] The more sensitive an analyzer is for detecting trace components contained in a sample, the more likely it is that carryover will occur, and it is often necessary to overestimate the amount of elements contained in the sample and supply an excess of cleaning solution, or to perform a cleaning operation using a cleaning solution that is used to clean elements not contained in the sample, so the configuration of the sample analyzer according to any one of items 1 to 6 can be suitably used. One such sample analyzer is an analyzer equipped with an inductively coupled plasma ion source, as described in item 7.

[0054] 1...Inductively coupled plasma mass spectrometer 10...Plasma ionization unit 11...Autosampler 12...Nebulizer gas supply source 13...Cleaning liquid introduction unit 14...Flow path switching valve 15...Plasma gas supply source 20...Plasma torch 21...Argon plasma 30...Mass analysis unit 31...First vacuum chamber 32...Second vacuum chamber 321...Quadrupole mass filter 322...Detector 40...Control and processing unit 41...Memory unit 42...Quantitative analysis unit 43...Cleaning execution unit 44...Cleaning setting change unit 60...Input unit 70...Display unit

Claims

1. A sample analyzer that quantifies an analyte component contained in a sample, comprising: a memory unit that stores information that corresponds, for each of a plurality of known components that may be contained in a sample, the amount of the known component with the type and amount of a cleaning solution for removing the known components; a quantitative analysis unit that introduces a plurality of samples into the sample analyzer in a predetermined order and quantifies the analyte component contained in each sample; a cleaning solution introduction unit that introduces a cleaning solution for washing the plurality of known components into the sample analyzer; and a cleaning execution unit that, each time the quantitative analysis unit quantifies an analyte component contained in a sample, compares information on the analyte component quantified by the quantitative analysis unit with information stored in the memory unit to determine the type and amount of the cleaning solution, and operates the cleaning solution introduction unit to perform a cleaning operation to remove the analyte component from the sample analyzer.

2. The sample analyzer of claim 1, wherein the memory unit further stores information on the type and amount of a standard cleaning solution, information on threshold values ​​corresponding to each of the plurality of known components, and information on the type and amount of an additional cleaning solution to be used when the threshold value is exceeded, and the cleaning execution unit performs a cleaning operation using the standard cleaning solution when the quantitative value of the target component does not exceed the threshold value corresponding to the target component, and performs a cleaning operation using the additional cleaning solution corresponding to the target component in addition to the cleaning operation using the standard cleaning solution when the quantitative value of the target component exceeds the threshold value corresponding to the target component.

3. The sample analyzer according to claim 2, wherein the memory unit further stores information on a calibration curve and a maximum concentration for each of the plurality of known components, and the threshold value is set as a percentage of the maximum concentration.

4. The sample analyzer according to claim 3, wherein the ratio is set individually for the plurality of known components.

5. The sample analysis apparatus of claim 1, wherein the memory unit further stores information representing the relationship between the quantitative values ​​of the plurality of known components and the amount of cleaning solution, and the cleaning execution unit executes a cleaning operation using an amount of cleaning solution corresponding to the quantitative value of the component to be analyzed.

6. The sample analyzer of claim 1, wherein a cleaning sequence is set for at least one of the plurality of known components, the cleaning sequence including a threshold amount for the known component and a cleaning operation using a plurality of cleaning solutions in sequence to be used when the quantitative value of the known component exceeds the threshold amount.

7. The sample analyzer according to claim 1, wherein the quantitative analysis section comprises an inductively coupled plasma ion source that generates atomic ions from components contained in the sample using inductively coupled plasma.