Method for removing titanium oxide film and substrate processing apparatus

Abstract

Removing a titanium oxide film disposed on the surface of a substrate. A method for removing a titanium oxide film on the surface of a substrate includes the following steps: supplying a mixed gas containing hydrogen fluoride gas and ammonia gas to the surface of the titanium oxide film to cause a chemical reaction between the titanium oxide film and the mixed gas, generating a gaseous reaction product from the titanium oxide film and removing it from the surface of the substrate; and heating the substrate to remove the deposits that adhered to the substrate during the generation of the reaction product.

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