Fluid dosing substrate dispenser
The substrate dispenser addresses inefficiencies in conventional systems by enabling on-demand fluid dosing and customization, ensuring fluid potency and substrate efficacy while reducing waste.
US20260191371A1Pending Publication Date: 2026-07-09DUAL STRATEGIES LLC
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- DUAL STRATEGIES LLC
- Filing Date
- 2025-12-30
- Publication Date
- 2026-07-09
AI Technical Summary
Technical Problem
Conventional wipe dispensing systems face issues such as drying out, non-uniform wipe saturation, chemical interaction between fluid and substrate, limited fluid options, and lack of flexibility in fluid formulations, leading to inefficiencies and waste.
Method used
A substrate dispenser that allows on-demand dosing of fluids, enabling customization of fluid application based on user preferences, using a computing system to control the application mechanism and substrate advancing mechanism, with multiple fluid reservoirs and sensors for precise fluid application.
Benefits of technology
Ensures fluid potency and substrate efficacy by applying fluids on demand, preventing premature interaction, and offering flexibility in fluid choices, reducing waste and cost.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure US20260191371A1-D00000_ABST
Abstract
A fluid dosing substrate dispenser comprises a housing with a first fluid reservoir and / or a first fluid reservoir holder configured to removably receive the first fluid reservoir and a second fluid reservoir and / or a second fluid reservoir holder configured to removably receive the second fluid reservoir. The dispenser includes a substrate advancing mechanism configured to receive substrate from a substrate source and to advance a portion of the substrate through the housing and an application mechanism configured to apply fluid from at least one of the first fluid reservoir or the second fluid reservoir to one or more portions of the substrate. A computing system is configured to select at least one of amount of fluid for application, composition of fluid for application, or portion of the substrate the fluid is applied based on an input received by the computing system indicating the user of the substrate dispenser.
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